KR20200123074A - Evaporation Source For Automatic Exchange Of Crucible And Evaporation Deposition System Having The Same - Google Patents

Abstract

Disclosed are an evaporation source for automatic exchange of a crucible and an evaporation deposition system including the same. According to an embodiment of the present invention, the evaporation source, as an evaporation source for supplying a vapor deposition material to a substrate in a vacuum chamber, comprises: a distribution pipe configured to eject the vapor deposition material through a nozzle; an evaporation crucible connected to the distribution pipe and accommodating the deposition material; an accommodating housing accommodating the evaporation crucible; and a first heater and a second heater installed in the accommodating housing and heating the evaporation crucible. According to the present invention, the crucible can be quickly and easily replaced.

Description

Evaporation Source For Automatic Exchange Of Crucible And Evaporation Deposition System Having The Same}

The present invention relates to an evaporation source for automatic crucible replacement and an evaporation deposition system including the same, and more particularly, an evaporation source for automatic crucible replacement that forms a thin film on the surface of a substrate by evaporating a deposition material in a vacuum chamber. And to an evaporation deposition system including the same.

Evaporation device refers to a device that forms a thin film on the surface of a substrate such as a wafer for semiconductor manufacturing, a substrate for LCD manufacturing, and a substrate for AMOLED manufacturing by using methods such as chemical vapor deposition (CVD), physical vapor deposition (PVD), and evaporation deposition. .

In the case of AMOLED manufacturing substrates, a process of forming a thin film on the surface of the substrate by evaporating organic matter, inorganic matter, metal, etc. is used in the deposition of evaporation materials. Devices and the like may be provided.

A conventional OLED deposition apparatus that forms a thin film by evaporating a deposition material (evaporation material) includes a deposition chamber (vacuum chamber) in which a deposition substrate is vertically loaded, and is installed inside the deposition chamber to evaporate the deposition material on the substrate. It may include an evaporation source that evaporates by heating, and the evaporation material is evaporated to form a thin film on the substrate surface.

In addition, the source may include an evaporation vessel in which the evaporation material is accommodated, a heater for heating the evaporation vessel, a tube coupled with the evaporation vessel, and a plurality of nozzles protruding toward the substrate and communicating with the tube.

There are various challenges in the process of depositing a deposition material on an OLED substrate. As an example, the evaporation material is limitedly accommodated in the evaporation vessel depending on the capacity of the evaporation vessel, and the capacity of the evaporation vessel is less than the total amount of evaporation material used to form a desired level of thin film on a large substrate. In order to deposit a thin film of a deposition material on a substrate to a desired level, the crucible needs to be replaced several to tens of times.

Since the crucible replacement is performed manually by an operator, an atmospheric pressure environment is created in the workspace where the crucible is replaced. Even if the filtered gas is injected into the working space, it is difficult to completely remove impurities or moisture during the filtration process, so that the deposition material, especially the deposition material of organic materials, contained in the gas easily penetrates.

It is also possible to consider a method of replacing the crucible using a robot, but since the crucible and the tube form a coupling force by bolting or clamping the flange part, a robot for fastening the flange part must be put together with the robot for moving the crucible.

The problem to be solved by the present invention is to quickly and easily replace the crucible, block impurity penetration into the deposition material during the crucible replacement process, and evaporate for automatic crucible replacement that allows the crucible and the tube to be quickly combined and separated. It is to provide a source and an evaporation deposition system including the same.

In order to achieve the above object, an evaporation source according to an embodiment of the present invention is an evaporation source for supplying a vapor deposition material to a substrate in a vacuum chamber, comprising: a distribution pipe for ejecting the vapor deposition material through a nozzle; An evaporation crucible connected to the distribution pipe and receiving the deposition material; A receiving housing accommodating the evaporation crucible; And a first heater and a second heater installed in the receiving housing and heating the evaporation crucible.

In the evaporation source according to an embodiment of the present invention, the receiving housing includes: a receiving portion having an opening through which the evaporation crucible enters and exits, the first heater coupled thereto; And a door portion to which the opening is opened and coupled with the second heater, and the first heater and the second heater may be formed to be in close contact with the outer surface of the evaporation crucible while the door portion is closed with the opening. have.

An evaporation source according to an embodiment of the present invention may include a support portion supporting the evaporation crucible, and an actuator for lifting the evaporation crucible may be installed at the support portion.

In the evaporation source according to an embodiment of the present invention, the actuator may include a driving unit for forming a force to lift the evaporation crucible; A lift panel that is lifted and lowered by the driving unit; A seating panel on which the evaporation crucible is seated and rotating together with the elevating panel; And an elastic member interposed between the seating panel and the elevating panel, and a connection portion between the distribution pipe and the evaporation crucible may be made in close contact with each other by a compressive force of the elastic member.

An evaporation source according to an embodiment of the present invention may include a support portion for supporting the evaporation crucible, and an actuator for lifting and rotating the evaporation crucible may be installed at the support portion.

In the evaporation source according to an embodiment of the present invention, the actuator may include a driving unit configured to generate a force for lifting and rotating the evaporation crucible; A lift panel that lifts and rotates by the drive unit; A seating panel on which the evaporation crucible is seated and rotating together with the elevating panel; And an elastic member interposed between the seating panel and the elevation panel, wherein a connection portion between the distribution pipe and the evaporation crucible may include a screw coupling portion screwed by rotation of the elevation panel; And an elastic contact portion that is in close contact with the elastic member by the compressive force of the elastic member.

In the evaporation source according to an embodiment of the present invention, a vertical bar is formed in the seating panel, and an insertion hole through which the vertical bar is inserted and slides is formed in the lifting panel, and when the elastic member recovers elasticity, the seating panel At the maximum distance between the panel and the elevation panel, a locking portion is formed that is caught by the elevation panel, the seating panel has an asymmetrical projection with respect to the center of rotation of the elevation panel, and the projection portion is on the bottom surface of the evaporation crucible. It may be made so that the insertion groove to be inserted is formed.

In the evaporation source according to an embodiment of the present invention, a first flange is formed at an upper end of the evaporation crucible, a second flange is formed at a lower end of the distribution pipe, and a first interposer is in close contact with the first flange. , A second interposer coupled to and separated from the first interposer is in close contact with the second flange, and the first interposer and the second interposer are non-wetting in relation to the vapor deposition material (Non- It can be made of a material that is wettable.

In the evaporation source according to an embodiment of the present invention, a first flange is formed at an upper end of the evaporation crucible, a second flange is formed at a lower end of the distribution pipe, and a first interposer is in close contact with the first flange. , A second interposer coupled to and separated from the first interposer is in close contact with the second flange, the first interposer has a first coating layer formed on at least an upper surface, and the second interposer is at least a lower side A second coating layer is formed on the surface, and the first coating layer and the second coating layer may be made of a material that is non-wettable in relation to the vapor deposition material.

In order to achieve the above object, an evaporation deposition system according to an embodiment of the present invention includes: a vacuum chamber accommodating a substrate; And an evaporation source for supplying a vapor deposition material to the substrate, wherein the evaporation source comprises: a distribution pipe for ejecting the vapor deposition material through a nozzle; An evaporation crucible connected to the distribution pipe and receiving the deposition material; A receiving housing accommodating the evaporation crucible; And a first heater and a second heater installed in the receiving housing and heating the evaporation crucible.

In the evaporation deposition system according to an embodiment of the present invention, the receiving housing includes: a receiving portion having an opening through which the evaporation crucible enters and exits, and to which the first heater is coupled; And a door portion to which the opening is opened and coupled with the second heater, and the first heater and the second heater may be formed to be in close contact with the outer surface of the evaporation crucible while the door portion is closed with the opening. have.

An evaporation deposition system according to an embodiment of the present invention includes a maintenance chamber connected to the vacuum chamber and selectively isolated from the vacuum chamber by an opening/closing valve, and the evaporation crucible through the opening in the maintenance chamber. It may be made to be provided with a robot that replaces.

According to the evaporation source and the evaporation deposition system including the same according to embodiments of the present invention, the crucible is quickly and easily replaced, impurities penetration into the deposition material in the crucible replacement process is blocked, and the crucible and the tube are quickly combined. And can be separated.

1 is a schematic plan view of an evaporation deposition system according to an embodiment of the present invention.
2 is a schematic cross-sectional view of an evaporation deposition system according to an embodiment of the present invention.
3 and 4 are schematic cross-sectional views of an evaporation source according to an embodiment of the present invention.
5 is a schematic cross-sectional view of an evaporation source according to another embodiment of the present invention.
6 is a schematic plan view of an evaporation deposition system according to another embodiment of the present invention.
7 and 8 are schematic exploded cross-sectional views of an evaporation source according to another embodiment of the present invention.

Hereinafter, embodiments of the present invention will be described in more detail with reference to the accompanying drawings in order to describe the present invention in more detail. The same reference numerals denote the same elements throughout the detailed description.

1 is a schematic plan view of an evaporation deposition system according to an embodiment of the present invention, FIG. 2 is a schematic cross-sectional view of an evaporation deposition system according to an embodiment of the present invention, and FIGS. 3 and 4 are an embodiment of the present invention. Is a schematic cross-sectional view of the evaporation source according to.

1 and 2, the evaporation deposition system 1 according to an embodiment of the present invention is made to quickly and easily replace the crucible, and the evaporation source 10, the substrate 20, the vacuum It comprises a chamber 30 and a maintenance chamber 40. The evaporation deposition system 1 according to an embodiment of the present invention may be automatically controlled by a control unit (not shown).

The vacuum chamber 30 is configured to form a vacuum state therein, and transfer tracks 11 and 23 for transferring the substrate 20 and the evaporation source 10 are provided in the vacuum chamber 30, respectively. The transfer tracks 11 and 23 for transferring the substrate 20 and the evaporation source 10 are well-known technologies as disclosed in Korean Patent Application Publication No. 2018-0005285, so a detailed description thereof will be omitted. Although not shown, the vacuum chamber 30 forms a vacuum state by a vacuum pump.

As shown in FIGS. 1 and 2, the substrate 20 is provided in the vacuum chamber 30 in an erected state. Unexplained reference numeral 21 denotes a mask, and reference numeral 22 denotes a frame supporting the mask. The evaporation source 10 discharges the vapor deposition material toward the front surface of the substrate 20 while moving along the transfer track 11. Referring to Korean Patent Application Publication No. 2018-0005285, the substrate 20 may be supported by a substrate support part 400 connected to an alignment unit. R in FIG. 2 denotes a roller supporting the substrate 20.

The surface of the substrate 20 is coated with a vapor deposition material made of a metallic material or the like. The metallic material may be made of metal, calcium, aluminum, barium, ruthenium, magnesium, silver, or the like.

The maintenance chamber 40 is configured for maintenance of the evaporation source 10, and a robot 41 that replaces the evaporation crucible 200 is provided in the maintenance chamber 40. The maintenance chamber 40 is selectively connected or isolated from the vacuum chamber 30 by an opening/closing valve V.

As shown in FIG. 1, the on-off valve V is opened during maintenance of the evaporation source 10, and thus the vacuum chamber 30 and the maintenance chamber 40 are connected. At this time, the evaporation source 10 moves from the vacuum chamber 30 to the maintenance chamber 40 along the transfer track 11. When the evaporation source 10 is moved to the maintenance chamber 40, the on-off valve V is closed, and the vacuum chamber 30 and the maintenance chamber 40 are isolated. Although not shown, the maintenance chamber 40 forms a vacuum state by a vacuum pump.

6 shows an evaporation deposition system 1'in which one maintenance chamber 40 is connected or isolated by two vacuum chambers 30 and an on-off valve V, respectively.

1 and 2, the evaporation source 10 according to an embodiment of the present invention is a configuration for supplying a vapor deposition material to the substrate 20 in the vacuum chamber 30, the distribution pipe 100 ), an evaporation crucible 200, a receiving housing 300, and a support part 400. The evaporation source 10 discharges the vapor deposition material on the front surface of the erected substrate 20 while moving in the horizontal direction along the transfer track 11 in the vacuum chamber 30. 1 and 3 illustrate a type of evaporation source 10 according to an embodiment of the present invention, which includes a pair of distribution pipes 100 and a pair of evaporation crucibles 200.

As shown in FIG. 2, the distribution pipe 100 is configured to discharge a vapor deposition material through the nozzle 110 and is formed to be long in the vertical direction. Inside the distribution pipe 100, a long internal space is formed in the vertical direction. A plurality of nozzles 110 are formed in the distribution pipe 100 along the longitudinal direction.

Although not shown in detail, the distribution pipe 100 may have a multilayer structure. For example, the distribution pipe 100 includes a first layer that forms a boundary of an internal space and contacts a vapor deposition material, a second layer with a heater, a third layer that reflects the heat energy of the heater toward the second layer, and a distribution pipe ( 100) may be formed in a multi-layered structure such as a fourth layer through which the refrigerant flows.

The multi-layered structure of the distribution pipe 100 forms a structure that maximizes the thermal energy efficiency of the heater. The multilayered structure of the distribution pipe 100 is a well-known technique as disclosed in Korean Patent Publication No. 685431 and Korean Patent Publication No. 928136, so a detailed description thereof will be omitted.

As shown in FIG. 2, the evaporation crucible 200 accommodates a deposition material (not shown), and is disposed under the distribution pipe 100. Although not shown in detail, the evaporation crucible 200 may have a multilayer structure. For example, the evaporation crucible 200 may have a multilayer structure such as a first layer in contact with a deposition material, a second layer on which a heater is installed, and a third layer that reflects heat energy of the heater toward the second layer.

As shown in FIG. 2, a first flange P1 is formed at the upper end of the evaporation crucible 200, and a second flange P2 is formed at the lower end of the distribution pipe 100. The distribution pipe 100 and the evaporation crucible 200 are connected by a flange connection structure. Although not shown, the first flange P1 and the second flange P2 may be connected by fastening clamps or bolts.

As shown in FIGS. 2 and 3, the receiving housing 300 is configured to accommodate the evaporation crucible 200, and is formed on the upper side of the support part 400. The receiving housing 300 includes a receiving portion 310 and a door portion 320. In FIG. 2, only the first heater H1 and the second heater H2 are shown, and illustration of the receiving portion 310 and the door portion 320 is omitted.

As shown in FIGS. 3 and 4, the receiving portion 310 is a configuration in which the first heater H1 is coupled, and forms a space in which the evaporation crucible 200 is accommodated. An opening is formed in the receiving portion 310 to expose the evaporation crucible 200 in the lateral direction so that the evaporation crucible 200 can enter and exit. The door part 320 is a configuration in which the second heater H2 is coupled, and opens or closes the opening. The door part 320 rotates to open or close the opening laterally. An actuator (not shown) for rotating the door part 320 is installed in the door part 320.

2(a) and 4, the first heater H1 and the second heater H2 are configured to heat the evaporation crucible 200 together, and the door part 320 closes the opening. In this state, it is in close contact with the outer surface of the evaporation crucible 200. The first heater H1 and the second heater H2 surround the side surfaces of the evaporation crucible 200 together with the door part 320 closing the opening to transmit heat energy to the evaporation crucible 200.

As shown in FIGS. 1 and 2, the support part 400 is configured to support the evaporation crucible 200 and the distribution pipe 100, and is mounted to be movable on the transfer track 11. Referring to Korean Patent Application Publication No. 2018-0005285, a transmission device for forming a conveying force may be installed in the support part 400. As shown in FIG. 2, a support frame 420 for supporting the distribution pipe 100 may be formed on the support part 400. The support frame 420 is formed on the support part 400. The distribution pipe 100 is coupled to the support frame 420 to block the flow.

As shown in FIG. 2, an actuator 410 for lifting the evaporation crucible 200 is installed in the support part 400. The actuator 410 is configured to include a driving unit 411, a lifting panel 412, a seating panel 413, and an elastic member 414. The drive unit 411 is a component that generates a force to lift the evaporation crucible 200 and is provided with a hydraulic cylinder or a linear actuator. The driving unit 411 forms a structure in which the rod is raised and lowered by hydraulic pressure or driving force of a motor.

The lifting panel 412 is configured to be elevated by the driving unit 411 and is coupled to the upper end of the rod of the driving unit 411. The mounting panel 413 is a configuration in which the evaporation crucible 200 is mounted, and is disposed above the lifting panel 412. Each of the lifting panel 412 and the seating panel 413 may be manufactured in a flat plate shape.

The elastic member 414 is a configuration that closely contacts the contact surface between the evaporation crucible 200 and the distribution pipe 100, and is interposed between the seating panel 413 and the lifting panel 412. The elastic member 414 may be provided as a compression spring. The lifting panel 412 and the seating panel 413 are vertically spaced apart by an elastic member 414. As shown in Fig. 2(a), when the evaporation crucible 200 is replaced, the connection part between the distribution pipe 100 and the evaporation crucible 200 is in close contact with the elastic member 414 by the compressive force.

As shown in FIG. 2, a vertical bar (B) is formed in the seating panel 413, and an insertion hole into which the vertical bar (B) is inserted is formed in the lifting panel 412. No reference numeral was indicated for the insertion hole. The insertion hole should be understood as a hole formed in the longitudinal direction.

The vertical bar (B) slides in the vertical direction (Y) within the insertion hole. The lower end of the vertical bar (B) is formed with a locking portion (K) that is caught on the bottom of the lifting panel 412. When the elastic member 414 recovers elasticity, the locking portion K is caught on the bottom of the lifting panel 412 at the maximum distance between the seating panel 413 and the lifting panel 412.

There are various challenges in the process of depositing a deposition material on an OLED substrate. As an example, the evaporation material is limitedly accommodated in the evaporation vessel depending on the capacity of the evaporation vessel, and the capacity of the evaporation vessel is less than the total amount of evaporation material used to form a desired level of thin film on a large substrate. In order to deposit a thin film of a deposition material on a substrate to a desired level, the crucible needs to be replaced several to tens of times.

Since the crucible replacement is performed manually by an operator, an atmospheric pressure environment is created in the workspace where the crucible is replaced. Even if the filtered gas is injected into the working space, it is difficult to completely remove impurities or moisture during the filtration process, so that the deposition material, especially the deposition material of organic materials, contained in the gas easily penetrates.

It is also possible to consider a method of replacing the crucible using a robot, but since the crucible and the tube form a coupling force by bolting or clamping the flange part, a robot for fastening the flange part must be put together with the robot for moving the crucible.

The evaporation deposition system 1 according to an exemplary embodiment of the present invention facilitates replacement of the evaporation crucible 200 using the robot 41 by forming the receiving housing 300 and the actuator 410. Hereinafter, a process of replacing the evaporation crucible 200 through the evaporation deposition system 1 according to an embodiment of the present invention will be described.

As shown in FIGS. 3 and 4, the evaporation crucible 200 is heated by the first heater H1 and the second heater H2 in the receiving housing 300. The deposition material in the evaporation crucible 200 is heated by the thermal energy of the first heater H1 and the second heater H2 to be converted into a gas phase.

The evaporation source 10 moves horizontally along the transfer track 11 in the vacuum chamber 30 and discharges the vapor deposition material onto the substrate 20. The vacuum chamber 30 forms a vacuum state by a vacuum pump. The support part 400 is mounted to be movable on the transfer track 11. A transmission device for forming a conveying force is installed in the support part 400.

Since the evaporation material is limitedly accommodated in the evaporation crucible 200 depending on the capacity of the evaporation crucible 200, the evaporation crucible 200 needs to be replaced several to tens of times in order to deposit a thin film of the evaporation material on a large substrate to a desired level do. A robot 41 for replacing the evaporation crucible 200 is provided in the maintenance chamber 40. The maintenance chamber 40 is selectively connected or isolated from the vacuum chamber 30 by an opening/closing valve V.

The opening/closing valve V is opened during maintenance of the evaporation source 10, and accordingly, the vacuum chamber 30 and the maintenance chamber 40 are connected. At this time, the evaporation source 10 moves from the vacuum chamber 30 to the maintenance chamber 40 along the transfer track 11. When the evaporation source 10 is moved to the maintenance chamber 40, the on/off valve V is closed, and thus the vacuum chamber 30 and the maintenance chamber 40 are isolated. The maintenance chamber 40 forms a vacuum state by a vacuum pump.

As shown in FIG. 2, the actuator 410 is preferentially operated for replacement of the evaporation crucible 200. In the state shown in Fig. 2(a), the control unit operates the driving unit 411 to lower the elevation panel 412. Even if the lifting panel 412 descends, the height of the seating panel 413 is maintained by the elastic recovery force of the elastic member 414 until the locking part K is caught on the bottom surface of the lifting panel 412.

Accordingly, the first flange P1 maintains a state in close contact with the second flange P2 until the locking portion K is caught on the bottom surface of the lifting panel 412. As shown in FIG. 2(b), from the point when the locking part K is caught on the bottom of the lifting panel 412, the seating member descends together with the lifting panel 412, and the first flange P1 and The second flange P2 is spaced apart.

Then, as shown in FIGS. 3 and 4, the door part 320 is opened for replacement of the evaporation crucible 200. An actuator (not shown) for rotating the door part 320 is installed in the door part 320.

As shown in Figure 1, the maintenance chamber 40 is provided with a table 42 for accommodating the evaporation crucible 200. The robot 41 takes out the used evaporation crucible 200 from the receiving part 310 and mounts it on the table 42. Then, the robot 41 moves the new evaporation crucible 200 from the table 42 to the inside of the receiving portion 310.

When the new evaporation crucible 200 is moved into the receiving part 310, the door part 320 closes the opening. The first heater H1 and the second heater H2 are in close contact with the outer surface of the evaporation crucible 200 together with the door part 320 closing the opening.

Accordingly, the first flange P1 is aligned at a precise position immediately below the second flange P2 in the process of closing the opening of the door part 320. The first heater H1 and the second heater H2 surround the side surfaces of the evaporation crucible 200 together with the door part 320 closing the opening to transmit heat energy to the evaporation crucible 200.

Then, the actuator 410 is operated to connect the first flange P1 and the second flange P2. The control unit operates the driving unit 411 to raise the elevation panel 412. The seating panel 413 rises together with the elevation panel 412 until the first flange P1 is in close contact with the second flange P2. The seating panel 413 maintains a height difference from the elevation panel 412 by the elastic recovery force of the elastic member 414 until the first flange P1 is in close contact with the second flange P2.

As shown in Figure 2 (a), after the first flange (P1) is in close contact with the second flange (P2), even if the lifting panel 412 rises, the seating panel 413 does not rise and maintains the height. do. After the first flange (P1) is in close contact with the second flange (P2), as the lifting panel 412 rises, the elastic member 414 is compressed between the lifting panel 412 and the seating panel 413. Accordingly, the first flange P1 and the second flange P2 are closely contacted by the elastic recovery force of the elastic member 414.

In the evaporation deposition system 1 according to an embodiment of the present invention, when the door part 320 closes the opening of the receiving part 310 when the evaporation crucible 200 is replaced, the first heater H1 and the second heater H2) is in close contact with the outer surface of the evaporation crucible 200, so that the first flange P1 is accurately aligned directly under the second flange P2.

Then, when the actuator 410 is operated, the first flange P1 and the second flange P2 are closely contacted by the elastic recovery force of the elastic member 414. Therefore, the evaporation deposition system 1 according to an embodiment of the present invention can form a close bonding force at the connection portion while simply replacing the evaporation crucible 200 with one robot 41 in the maintenance chamber 40. have.

5 is a schematic cross-sectional view of an evaporation source 10 according to another embodiment of the present invention.

1 and 5, the evaporation source 10 according to another embodiment of the present invention is a configuration for supplying a vapor deposition material to the substrate 20 in the vacuum chamber 30, the distribution pipe ( 100), an evaporation crucible 200, a receiving housing 300, and a support part 400. The evaporation source 10 discharges the vapor deposition material on the front surface of the erected substrate 20 while moving in the horizontal direction along the transfer track 11 in the vacuum chamber 30.

The distribution pipe 100 is a configuration for discharging the vapor deposition material through the nozzle 110, and is formed long in the vertical direction. Inside the distribution pipe 100, a long internal space is formed in the vertical direction. A plurality of nozzles 110 are formed in the distribution pipe 100 along the longitudinal direction.

Although not shown, the distribution pipe 100 may have a multilayer structure. For example, the distribution pipe 100 includes a first layer that forms a boundary of an internal space and contacts a vapor deposition material, a second layer with a heater, a third layer that reflects the heat energy of the heater toward the second layer, and a distribution pipe ( 100) may be formed in a multi-layered structure such as a fourth layer through which the refrigerant flows.

The multi-layered structure of the distribution pipe 100 forms a structure that maximizes the thermal energy efficiency of the heater. The multilayered structure of the distribution pipe 100 is a well-known technique as disclosed in Korean Patent Publication No. 685431 and Korean Patent Publication No. 928136, so a detailed description thereof will be omitted.

As shown in FIG. 5, the evaporation crucible 200 accommodates a deposition material and is disposed under the distribution pipe 100. Although not shown in detail, the evaporation crucible 200 may have a multilayer structure. For example, the evaporation crucible 200 may have a multilayer structure such as a first layer in contact with a deposition material, a second layer on which a heater is installed, and a third layer that reflects heat energy of the heater toward the second layer.

As shown in FIG. 5, a first connection part 210 is formed at the upper end of the evaporation crucible 200, and a second connection part 120 is formed at the lower end of the distribution pipe 100. The first connection part 210 and the second connection part 120 are each formed with a screw coupling part NP and an elastic contact part EP.

The screw coupling part NP is a part that is screwed to each other by rotation of the lifting panel 412. A male screw is formed in the screw coupling part NP of the first connection part 210, and a female screw is formed in the screw coupling part NP of the second connection part 120. The elastic contact portions EP are portions that are in close contact with each other by the compressive force of the elastic member 414. The gasket G is coupled to the elastic contact portion EP of the first connection portion 210 for airtightness.

Referring to FIG. 3, the receiving housing 300 is configured to accommodate the evaporation crucible 200 and is formed on the upper side of the support part 400. The receiving housing 300 includes a receiving portion 310 and a door portion 320.

The accommodation part 310 is a configuration in which the first heater H1 is coupled, and forms a space in which the evaporation crucible 200 is accommodated. An opening through which the evaporation crucible 200 enters and exits is formed in the receiving part 310. The door part 320 is a configuration in which the second heater H2 is coupled, and opens or closes the opening. The door part 320 rotates to open or close the opening. An actuator (not shown) for rotating the door part 320 is installed in the door part 320.

The first heater H1 and the second heater H2 are configured to heat the evaporation crucible 200 together, and are in close contact with the outer surface of the evaporation crucible 200 in a state in which the door part 320 is closed. The first heater H1 and the second heater H2 surround the side surfaces of the evaporation crucible 200 together with the door part 320 closing the opening to transmit heat energy to the evaporation crucible 200.

Referring to FIGS. 1 and 2, the support part 400 is configured to support the evaporation crucible 200 and the distribution pipe 100, and is mounted to be movable on the transfer track 11. Referring to Korean Patent Application Publication No. 2018-0005285, a transmission device for forming a conveying force may be installed in the support part 400. As shown in FIG. 2, a support frame 420 for supporting the distribution pipe 100 may be formed on the support part 400. The support frame 420 is formed on the support part 400. The distribution pipe 100 is coupled to the support frame 420 to block the flow.

As shown in FIG. 5, an actuator 410 for lifting and rotating the evaporation crucible 200 is installed on the support 400. The actuator 410 is configured to include a driving unit 411, a lifting panel 412, a seating panel 413, and an elastic member 414. The driving unit 411 is a component that forms a force to lift and rotate the evaporation crucible 200, and may be provided as a linear/rotation complex actuator system No. 1679170 of Korean Patent Application.

As shown in FIG. 5, the lifting panel 412 is configured to lift and rotate by the drive unit 411, and is coupled to the upper end of the rod of the drive unit 411. The mounting panel 413 is a configuration in which the evaporation crucible 200 is mounted, and is disposed above the lifting panel 412. Each of the lifting panel 412 and the seating panel 413 may be manufactured in a flat plate shape.

The seating panel 413 has an asymmetrical protrusion P based on the rotation center of the lifting panel 412, and an insertion groove 201 into which the protrusion P is inserted is formed at the bottom of the evaporation crucible 200. do. Accordingly, the evaporation crucible 200 rotates together with the lifting panel 412 in a state in which the protrusion P is inserted into the insertion groove 201.

The elastic member 414 is a configuration that closely contacts the contact surface between the evaporation crucible 200 and the distribution pipe 100, and is interposed between the seating panel 413 and the lifting panel 412. The elastic member 414 may be provided as a compression spring. The lifting panel 412 and the seating panel 413 are vertically spaced apart by an elastic member 414. As shown in FIG. 5(c), when the evaporation crucible 200 is replaced, the connection part between the distribution pipe 100 and the evaporation crucible 200 is screwed by the compressive force of the elastic member 414 and then closely adhered.

As shown in FIG. 5, a vertical bar (B) is formed in the seating panel 413, and an insertion hole into which the vertical bar (B) is inserted is formed in the lifting panel 412. The insertion hole is formed in the vertical direction. The vertical bar (B) slides in the vertical direction (Y) within the insertion hole. No reference numeral was indicated for the insertion hole.

The seating panel 413 and the lifting panel 412 are rotated together with respect to the rotation center of the lifting panel 412 as relative rotation is restricted by the vertical bar (B). The lower end of the vertical bar (B) is formed with a locking portion (K) that is caught on the bottom of the lifting panel 412. When the elastic member 414 recovers elasticity, the locking portion K is caught on the bottom of the lifting panel 412 at the maximum distance between the seating panel 413 and the lifting panel 412.

There are various challenges in the process of depositing a deposition material on an OLED substrate. As an example, the evaporation material is limitedly accommodated in the evaporation vessel depending on the capacity of the evaporation vessel, and the capacity of the evaporation vessel is less than the total amount of evaporation material used to form a desired level of thin film on a large substrate. In order to deposit a thin film of a deposition material on a substrate to a desired level, the crucible needs to be replaced several to tens of times.

Since the crucible replacement is performed manually by an operator, an atmospheric pressure environment is created in the workspace where the crucible is replaced. Even if the filtered gas is injected into the working space, it is difficult to completely remove impurities or moisture during the filtration process, so that the deposition material, especially the deposition material of organic materials, contained in the gas easily penetrates.

It is also possible to consider a method of replacing the crucible using a robot, but since the crucible and the tube form a coupling force by bolting or clamping the flange part, a robot for fastening the flange part must be put together with the robot for moving the crucible.

The evaporation deposition system 1 according to another embodiment of the present invention facilitates replacement of the evaporation crucible 200 using the robot 41. Hereinafter, a process of replacing the evaporation crucible 200 through the evaporation deposition system 1 according to another embodiment of the present invention will be described.

3 and 4, the evaporation crucible 200 is heated by the first heater H1 and the second heater H2 in the receiving housing 300. The deposition material in the evaporation crucible 200 is heated by the thermal energy of the first heater H1 and the second heater H2 to be converted into a gas phase.

The evaporation source 10 moves horizontally along the transfer track 11 in the vacuum chamber 30 and discharges the vapor deposition material onto the substrate 20. The vacuum chamber 30 forms a vacuum state by a vacuum pump. The support part 400 is mounted to be movable on the transfer track 11. A transmission device for forming a conveying force is installed in the support part 400.

Since the evaporation material is limitedly accommodated in the evaporation crucible 200 depending on the capacity of the evaporation crucible 200, the evaporation crucible 200 needs to be replaced several to tens of times in order to deposit a thin film of the evaporation material on a large substrate to a desired level do. A robot 41 for replacing the evaporation crucible 200 is provided in the maintenance chamber 40. The maintenance chamber 40 is selectively connected or isolated from the vacuum chamber 30 by an opening/closing valve V.

The opening/closing valve V is opened during maintenance of the evaporation source 10, and accordingly, the vacuum chamber 30 and the maintenance chamber 40 are connected. At this time, the evaporation source 10 moves from the vacuum chamber 30 to the maintenance chamber 40 along the transfer track 11. When the evaporation source 10 is moved to the maintenance chamber 40, the on/off valve V is closed, and thus the vacuum chamber 30 and the maintenance chamber 40 are isolated. The maintenance chamber 40 forms a vacuum state by a vacuum pump.

Referring to FIG. 5, the actuator 410 is preferentially operated for replacement of the evaporation crucible 200. In the state shown in FIG. 5(c), the control unit operates the driving unit 411 to rotate the lifting panel 412 in a direction in which the screw connection of the screw connection unit NP is released.

As described above, the seating panel 413 and the lifting panel 412 are restricted in relative rotation by the vertical bar B so that they rotate together with respect to the rotation center of the lifting panel 412. In addition, the mounting panel 413 has an asymmetrical protrusion P based on the rotation center of the lifting panel 412, and an insertion groove 201 into which the protrusion P is inserted into the bottom of the evaporation crucible 200. Is formed. Accordingly, the evaporation crucible 200 rotates together with the lifting panel 412 in a state in which the protrusion P is inserted into the insertion groove 201.

When the screw connection of the screw coupling part NP is released, the controller operates the driving part 411 to lower the lifting panel 412. Referring to 5(b), even if the lifting panel 412 descends, the seating panel 413 is affected by the elastic recovery force of the elastic member 414 until the locking part K is caught on the bottom surface of the lifting panel 412. The height is maintained.

Accordingly, the pair of elastic contact portions EP maintain close contact with each other until the locking portion K is caught on the bottom surface of the lifting panel 412. Thereafter, from the point when the locking part K is caught on the bottom surface of the lifting panel 412, the seating member descends together with the lifting panel 412, and the first connection part 210 and the second connection part 120 are spaced apart from each other.

Referring to FIGS. 3 and 4, the door part 320 is then opened for replacement of the evaporation crucible 200. An actuator (not shown) for rotating the door part 320 is installed in the door part 320.

As shown in Figure 1, the maintenance chamber 40 is provided with a table 42 for accommodating the evaporation crucible 200. The robot 41 takes out the used evaporation crucible 200 from the receiving part 310 and mounts it on the table 42. Then, the robot 41 moves the new evaporation crucible 200 from the table 42 to the inside of the receiving portion 310.

When the new evaporation crucible 200 is moved into the receiving part 310, the door part 320 closes the opening. The first heater H1 and the second heater H2 are in close contact with the outer surface of the evaporation crucible 200 together with the door part 320 closing the opening.

Accordingly, the first flange P1 is aligned at a precise position immediately below the second flange P2 in the process of closing the opening of the door part 320. The first heater H1 and the second heater H2 surround the side surfaces of the evaporation crucible 200 together with the door part 320 closing the opening to transmit heat energy to the evaporation crucible 200.

Then, the actuator 410 is operated to connect the first flange P1 and the second flange P2. The control unit operates the driving unit 411 to raise the elevation panel 412.

The seating panel 413 rises together with the lifting panel 412 until the first connection part 210 is in close contact with the second connection part 120. The seating panel 413 maintains a height difference from the elevation panel 412 by the elastic recovery force of the elastic member 414 until the first connection part 210 is in close contact with the second connection part 120.

As shown in Fig. 5(b), after the first connection part 210 is in close contact with the second connection part 120, even if the lifting panel 412 rises, the seating panel 413 does not rise and maintains its height. do. After the first connection part 210 is in close contact with the second connection part 120, the lifting panel 412 rises and the elastic member 414 is compressed between the lifting panel 412 and the seating panel 413. In the state shown in FIG. 5(b), the control unit operates the driving unit 411 to rotate the lifting panel 412 in the direction in which the pair of screw coupling units NP are screwed.

As described above, the seating panel 413 and the lifting panel 412 are restricted in relative rotation by the vertical bar B so that they rotate together with respect to the rotation center of the lifting panel 412. In addition, the mounting panel 413 has an asymmetrical protrusion P based on the rotation center of the lifting panel 412, and an insertion groove 201 into which the protrusion P is inserted into the bottom of the evaporation crucible 200. Is formed.

Accordingly, the evaporation crucible 200 rotates together with the lifting panel 412 in a state in which the protrusion P is inserted into the insertion groove 201. As shown in FIG. 5(c), the pair of elastic contact portions EP are closely contacted by the elastic recovery force of the elastic member 414 after the screwing of the screw coupling portion NP is completed.

In the evaporation deposition system 1 according to another embodiment of the present invention, when the door part 320 closes the opening of the receiving part 310 when the evaporation crucible 200 is replaced, the first heater H1 and the second heater H2) is in close contact with the outer surface of the evaporation crucible 200, so that the first flange P1 is accurately aligned directly under the second flange P2.

Then, when the actuator 410 is operated, the pair of screw coupling portions (NP) are closely adhered by the screwing force, and the pair of elastic contact portions (EP) are closely adhered by the elastic recovery force of the elastic member 414 do. Therefore, the evaporation deposition system 1 according to another embodiment of the present invention can form a close bonding force at the connection portion while simply replacing the evaporation crucible 200 with one robot 41 in the maintenance chamber 40. have.

7 and 8 are schematic exploded cross-sectional views of an evaporation source 10' according to still another embodiment of the present invention.

The evaporation source 10' according to another embodiment of the present invention is used in an OLED evaporator that evaporates and deposits organic substances, inorganic substances, metals, etc. on a substrate for OLED (Organic Light Emitting Diode) manufacturing, and evaporation containing evaporation materials The crucible 200 and the distribution pipe 100 connected thereto are combined and separated from each other.

Further, another embodiment of the present invention is suitable for evaporation of high-temperature evaporation materials such as Al, Ag, Mg, and LiF, particularly when Al, Ag is used as evaporation materials. Hereinafter, in the present invention, the side where the evaporation crucible 200 is formed is set downward, and the side where the distribution pipe 100 is formed is set upward.

The evaporation source 10' according to another embodiment of the present invention is provided inside the vacuum chamber 30 in the evaporation process, and the evaporation crucible 200, the first interposer I1, and the distribution pipe 100 And a second interposer I2, and such a configuration may be stacked and combined in the vertical direction Y. And the evaporation source 10' according to another embodiment of the present invention may be formed in a symmetrical shape in the left and right direction (X). The evaporation crucible 200 may include a container part 220 and a first flange P1.

The container part 220 has a shape of a container opened upward, and a deposition material is accommodated therein. Accordingly, the container part 220 is provided with a bottom 221 and a side wall 222, and the side wall 222 is formed along the entire circumferential direction with respect to the axis of the vertical direction (Y) (front, rear, left, right all It is of course formed in the direction. Outside of the container part 220 (outside the space in which the deposition material is accommodated), a heater 50 such as a hot wire may be formed to heat the deposition material contained in the container part 220.

The first flange (P1) is made in a form in which the diameter is expanded from the upper end of the container part 220, it is preferably made integrally with the container part 220. In addition, it goes without saying that the first flange P1 is formed along the entire circumferential direction with respect to the axis in the vertical direction Y. And in cross-section, the first flange (P1) is preferably made along a direction orthogonal to the side wall 222 of the container portion 220.

The first interposer I1 is formed separately from the evaporation crucible 200 and is fixedly coupled to the evaporation crucible 200. In particular, the first interposer I1 is coupled in close contact with the first flange P1 from the upper side of the evaporation crucible 200. When viewed from above, the first interposer I1 may have the same shape and size as the first flange P1. For example, the first interposer (I1) and the first flange (P1) may be formed in a circular ring shape having a flat top surface and a bottom surface, respectively, or the first interposer (I1) and the first flange (P1) are top The surface and the bottom surface may be formed in the shape of a flat square ring.

The first interposer I1 may be formed of a single material (see FIG. 7 ), or may be formed in a form in which the first coating layer C1 is formed on the surface (see FIG. 8 ). The first interposer I1 The and first flanges P1 may have their surfaces (contact surfaces) to closely contact each other over the entire area, and appropriate surface processing may be performed if necessary.

The distribution pipe 100 is combined with the evaporation crucible 200 to form a passage through which the evaporated evaporation material moves, and includes a moving channel and a second flange P2. However, the distribution pipe 100 is not coupled while directly in contact with the evaporation crucible 200, but is coupled through the first interposer I1 and the second interposer I2. That is, the first interposer I1 and the second interposer I2 block direct contact between the distribution pipe 100 and the evaporation crucible 200.

The moving channel forms a passage through which the evaporation material evaporated inside the container part 220 of the evaporation crucible 200 moves, and it may be formed in various forms depending on the conditions of the OLED evaporator to be applied. The moving channel communicates with the nozzle 110, and after the evaporation material evaporated through the nozzle 110 is discharged, it is deposited on the substrate 20.

The second flange P2 is formed in a form in which the diameter is expanded at the lower end of the moving channel, and is preferably formed integrally with the moving channel. In addition, it goes without saying that the second flange P2 is formed along the entire circumferential direction with respect to the axis in the vertical direction Y. And in cross-section, the second flange P2 is preferably made along a direction orthogonal to the side wall 222 of the moving channel, and is made parallel to the first flange P1 when combined with the evaporation crucible 200.

The second interposer I2 is formed separately from the distribution pipe 100 and is fixedly coupled to the distribution pipe 100. In particular, the second interposer I2 is coupled in close contact with the second flange P2 from the lower side of the distribution pipe 100. When viewed from the lower side, the second interposer I2 may have the same shape and size as the second flange P2. For example, the second interposer (I2) and the second flange (P2) may be formed in a circular ring shape having a flat top surface and a bottom surface, respectively, or the second interposer (I2) and the second flange (P2) are top The surface and the bottom surface may be formed in the shape of a flat square ring.

Also, when viewed from above, the second interposer I2 may have the same shape and size as the first interposer I1. The second interposer I2 may be made of a single material (see FIG. 7 ), or may be formed in a form in which the second coating layer C2 is formed on the surface (see FIG. 8 ).

The contact surfaces of the second interposer I2 and the second flange P2 may be formed to closely contact each other over the entire area, and surface processing may be performed if necessary. In addition, the first interposer I1 and the second interposer I2 may have contact surfaces such that they closely contact each other over the entire area, and surface processing may be performed if necessary.

The first flange (P1), the first interposer (I1), the second interposer (I2) and the second flange (P2) may be fixedly coupled to each other in a stacked form through a separate fixing means (not shown). . As the fixing means, ordinary bolts, clamps, and the like can be used.

As such, in another embodiment of the present invention, the evaporation crucible 200 and the distribution pipe 100 are combined with the first interposer I1 and the second interposer I2 interposed therebetween.

In the evaporation source 10 ′ according to another embodiment of the present invention, the first interposer I1 and the second interposer I2 described above are materials that are non-wettable in relation to the deposition material. Consists of In particular, when the evaporation crucible 200 and the distribution pipe 100 are made of a material that is wettable in relation to the deposition material, the first interposer I1 and the second interposer I2 are It is preferable to be made of a material that is non-wetting in relation to it.

For example, when the deposition material is silver (Ag) or aluminum (Al), the first interposer (I1) and the second interposer (I2) are graphite, PBN (Pyrolytic Boron Nitride), AlN (aluminium nitride), respectively. ), etc., most preferably made of graphite.

In addition, when the deposition material is silver (Ag) or aluminum (Al), the first interposer (I1) and the second interposer (I2) are PG (Pyrolytic Graphite), PBN (Pyrolytic Boron Nitride), or glassy (Glassy). It may be coated graphite.

That is, when the base material forming the first interposer I1 and the second interposer I2 is graphite, the first coating layer C1 and the second coating layer C2 are PG (Pyrolytic Graphite), PBN (Pyrolytic Graphite). Boron Nitride) or glassy (Glassy). In addition, when the base material forming the first interposer I1 and the second interposer I2 is an arbitrary metal, the first coating layer C1 and the second coating layer C2 may be formed of graphite.

In this case, the evaporation crucible 200 and the distribution pipe 100 may be made of a metal such as stainless steel, nickel, molybtenite, titanium, or tungsten.

In the evaporation source 10' according to another embodiment of the present invention, the first flange P1 and the first interposer I1, the first interposer I1 and the second interposer I2, and the second The interposer (I2) and the second flange (P2), respectively, to prevent leakage of the evaporation material and maintain a stable bonding state, it is preferable that the contact surfaces are physically bonded as closely as possible, but the inside of the evaporation crucible 200 When silver (Ag) or aluminum (Al), which is a deposition material contained in the material, is heated and evaporated, the fine particles of the evaporated material are formed between the first flange P1 and the first interposer I1. The possibility of penetrating through the fine gap between the interposer I1 and the second interposer I2 and between the second interposer I2 and the second flange P2 should be considered.

In particular, when the evaporation crucible 200 and the distribution pipe 100 are made of metal and the evaporation material is a metal such as silver (Ag) or aluminum (Al), the evaporation crucible 200 and the distribution pipe 100 ) Because it is wettable, it can move along the inner surface of the evaporation crucible 200 and the distribution pipe 100, and between the first flange P1 and the first interposer I1, the second The possibility of the evaporated material (deposited material) penetrating through the gap between the interposer I2 and the second flange P2 is relatively greater.

However, since the first interposer I1 and the second interposer I2 are non-wettable in relation to the deposition material, the particles of the deposition material are the first interposer I1 and the second interposer I2. When trying to penetrate through the gap of I2), it cannot move along the surfaces of the first interposer I1 and the second interposer I2, and eventually the first interposer I1 and the second interposer I2 It is possible to significantly reduce the possibility of the deposition material penetrating through the gap.

Accordingly, it is possible to effectively prevent the first interposer (I1) and the second interposer (I2) from being brazed to each other in the deposition process, and easy coupling between the evaporation crucible 200 and the distribution pipe 100 And separation is made.

In addition, even if the evaporated material penetrates between the gap between the first flange P1 and the first interposer I1, and between the gap between the second interposer I2 and the second flange P2, the evaporation crucible is accordingly. Not only does not affect the coupling and separation between the 200 and the distribution pipe 100, but also the penetration deposition material combines the first flange P1 and the first interposer I1, and also the second interposer I2. By combining the and the second flange P2, it is possible to prevent unintended leakage and penetration of the deposition material in the additional/following deposition process.

In the above, although specific embodiments of the present invention have been described and illustrated, the present invention is not limited to the described embodiments, and various modifications and variations can be made without departing from the spirit and scope of the present invention. It is self-evident to those who have. Therefore, such modifications or variations should not be individually understood from the technical spirit or point of view of the present invention, and the modified embodiments should be said to belong to the claims of the present invention.

1,1': evaporation deposition system
10,10': evaporation source
100: distribution pipe 200: evaporation crucible
110: nozzle 210: first connection
120: second connection part 201: insertion groove
NP: screw connection 220: container
EP: elastic contact part 221: bottom
G: gasket 222: side wall
P2: second flange P1: first flange
I2: second interposer I1: first interposer
C2: second coating layer C1: first coating layer
400: support part 300: receiving housing
410: actuator 310: receiving portion
411: drive part 320: door part
412: lifting panel H1: first heater
413: mounting panel H2: second heater
B: vertical bar
K: locking part
P: protrusion
414: elastic member
420: support frame
20: substrate 40: maintenance chamber
21: mask 41: robot
22: frame 42: table
11,23: transfer track 50: heater
30: vacuum chamber
V: On-off valve

Claims (12)

As an evaporation source that supplies a vapor deposition material to a substrate in a vacuum chamber,
A distribution pipe for ejecting the vapor deposition material through a nozzle;
An evaporation crucible connected to the distribution pipe and receiving the deposition material;
A receiving housing accommodating the evaporation crucible; And
Installed in the receiving housing, including a first heater and a second heater for heating the evaporation crucible,
Evaporation source. The method of claim 1,
The receiving housing,
A receiving portion having an opening through which the evaporation crucible enters and exits, and to which the first heater is coupled; And
Opening and closing the opening and including a door portion to which the second heater is coupled,
The first heater and the second heater are in close contact with the outer surface of the evaporation crucible in a state in which the door part is closed the opening,
Evaporation source. The method of claim 1,
Including a support for supporting the evaporation crucible,
An actuator for lifting the evaporation crucible is installed in the support part,
Evaporation source. The method of claim 3,
The actuator,
A driving unit that forms a force to lift the evaporation crucible;
A lift panel that is lifted and lowered by the driving unit;
A seating panel on which the evaporation crucible is seated and rotating together with the elevating panel; And
Including an elastic member interposed between the mounting panel and the lifting panel,
The connection portion between the distribution pipe and the evaporation crucible is in close contact with the compressive force of the elastic member,
Evaporation source. The method of claim 1,
Including a support for supporting the evaporation crucible,
An actuator for lifting and rotating the evaporation crucible is installed on the support part,
Evaporation source. The method of claim 5,
The actuator,
A driving unit configured to generate a force for lifting and rotating the evaporation crucible;
A lift panel that lifts and rotates by the drive unit;
A seating panel on which the evaporation crucible is seated and rotating together with the elevating panel; And
Including an elastic member interposed between the mounting panel and the lifting panel,
The connection part between the distribution pipe and the evaporation crucible,
A screw coupling part screwed by rotation of the lifting panel; And
Comprising an elastic contact portion in close contact by the compressive force of the elastic member,
Evaporation source. The method of claim 6,
Vertical bars are formed on the mounting panel,
The vertical bar is inserted into the lifting panel to form an insertion hole for slide movement,
The vertical bar is formed with a locking portion that is caught by the lifting panel at a maximum distance between the seating panel and the lifting panel when the elastic member recovers elasticity,
An asymmetrical protrusion is formed on the mounting panel based on the rotation center of the lifting panel,
An insertion groove into which the protrusion is inserted is formed on the bottom of the evaporation crucible,
Evaporation source. The method of claim 1,
A first flange is formed at the upper end of the evaporation crucible,
A second flange is formed at the lower end of the distribution pipe,
A first interposer is in close contact with the first flange,
A second interposer coupled to and separated from the first interposer is in close contact with the second flange,
The first interposer and the second interposer are made of a material that is non-wettable in relation to the vapor deposition material,
Evaporation source. The method of claim 1,
A first flange is formed at the upper end of the evaporation crucible,
A second flange is formed at the lower end of the distribution pipe,
A first interposer is in close contact with the first flange,
A second interposer coupled to and separated from the first interposer is in close contact with the second flange,
The first interposer has a first coating layer formed on at least an upper surface,
The second interposer has a second coating layer formed on at least a lower surface thereof,
The first coating layer and the second coating layer are made of a material that is non-wettable in relation to the vapor deposition material,
Evaporation source. A vacuum chamber accommodating a substrate; And
Includes an evaporation source for supplying a vapor deposition material to the substrate,
The evaporation source,
A distribution pipe for ejecting the vapor deposition material through a nozzle;
An evaporation crucible connected to the distribution pipe and receiving the deposition material;
A receiving housing accommodating the evaporation crucible; And
Installed in the receiving housing, including a first heater and a second heater for heating the evaporation crucible,
Evaporation deposition system. The method of claim 10,
The receiving housing,
A receiving portion having an opening through which the evaporation crucible enters and exits, and to which the first heater is coupled; And
Opening and closing the opening and including a door portion to which the second heater is coupled,
The first heater and the second heater are in close contact with the outer surface of the evaporation crucible in a state in which the door part is closed the opening,
Evaporation deposition system. The method of claim 11,
And a maintenance chamber connected to the vacuum chamber and selectively isolated from the vacuum chamber by an on/off valve,
The maintenance chamber is provided with a robot for replacing the evaporation crucible through the opening,
Evaporation deposition system.

Images