KR20200121933A - Siloxane and method for manufacturing the same - Google Patents

Siloxane and method for manufacturing the same Download PDF

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KR20200121933A
KR20200121933A KR1020190044044A KR20190044044A KR20200121933A KR 20200121933 A KR20200121933 A KR 20200121933A KR 1020190044044 A KR1020190044044 A KR 1020190044044A KR 20190044044 A KR20190044044 A KR 20190044044A KR 20200121933 A KR20200121933 A KR 20200121933A
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alkyl
silane
siloxane
allyl
substituted
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KR102229794B1 (en
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심다용
송아름
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주식회사 코이코리아
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/14Polysiloxanes containing silicon bound to oxygen-containing groups
    • C08G77/18Polysiloxanes containing silicon bound to oxygen-containing groups to alkoxy or aryloxy groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
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Abstract

A siloxane and a method of manufacturing the same are provided. The siloxane includes at least one of the compounds represented by chemical formula 1. In the chemical formula 1, n, m, R_1, R_2, R_3, R_4, R_5, R_6, R_7 and R_8 are the same as defined in the present specification, respectively. The present invention can provide the siloxane having excellent durability and storage stability.

Description

실록산 및 이의 제조방법{SILOXANE AND METHOD FOR MANUFACTURING THE SAME}Siloxane and its manufacturing method {SILOXANE AND METHOD FOR MANUFACTURING THE SAME}

본 발명은 실록산 및 이의 제조방법에 관한 것이다. The present invention relates to a siloxane and a method for preparing the same.

실록산은 도료 윤활제, 도료 첨가제, 코팅제 등으로 다양하게 사용되고 있다. 졸겔법을 이용하여 합성한 종래의 실록산의 경우 코팅제로서 저장 안정성과 균일성이 부족하였다. 구체적으로, 졸겔법을 이용하여 합성한 종래의 실록산은 상온에서 반응 시간이 길며, 가수분해 및 축합으로 인한 지속적인 에이징(aging)에 의해 시간이 지날수록 최종 도막에 크랙 등의 표면 결함을 유발하는 문제가 있었다. Siloxane is widely used as a paint lubricant, paint additive, and coating agent. In the case of the conventional siloxane synthesized using the sol-gel method, storage stability and uniformity as a coating agent were insufficient. Specifically, the conventional siloxane synthesized using the sol-gel method has a long reaction time at room temperature and causes surface defects such as cracks in the final coating film over time due to continuous aging due to hydrolysis and condensation. There was.

한편, 최근 발유 기능과 발수 기능을 동시에 요구하는 코팅제의 수요가 늘어나고 있다. 시중에 유통되고 있는 발유 및 발수 기능성 수입 코팅제는 열처리 공정이 필요하며, 열처리 공정이 없는 경우 기준 미달의 성능을 나타내어, 첨가제로서 사용이 어려운 한계가 있다.On the other hand, in recent years, the demand for coatings that require both oil and water repellent functions is increasing. Oil-repellent and water-repellent functional imported coatings that are distributed on the market require a heat treatment process, and if there is no heat treatment process, the performance is below the standard, making it difficult to use as an additive.

대한민국 등록특허 제10-0463926호(2004.12.20 등록)Korean Patent Registration No. 10-0463926 (registered on Dec. 20, 2004) 대한민국 공개특허 제10-2015-0113879호(2015.03.26 공개)Republic of Korea Patent Publication No. 10-2015-0113879 (published on March 26, 2015)

본 발명은 내구성 및 저장 안정성이 우수한 실록산을 제공하고자 한다.The present invention is to provide a siloxane excellent in durability and storage stability.

또한, 본 발명은 소수성 물질 및 친수성 물질과의 호환성이 우수한 실록산을 제공하고자 한다.In addition, the present invention is to provide a siloxane having excellent compatibility with a hydrophobic material and a hydrophilic material.

또한, 본 발명은 고온의 열처리 공정이 불필요한 상온 경화형 실록산을 제공하고자 한다. In addition, the present invention is to provide a room temperature-curable siloxane that does not require a high-temperature heat treatment process.

또한, 본 발명은 고온의 열처리 공정을 필요로 하지 않는 실록산의 제조방법을 제공하고자 한다.In addition, the present invention is to provide a method for producing siloxane that does not require a high-temperature heat treatment process.

본 발명의 실록산은 하기 화학식 1로 표시되는 화합물 중 적어도 하나를 포함한다:The siloxane of the present invention includes at least one of the compounds represented by the following formula 1:

<화학식 1><Formula 1>

Figure pat00001
Figure pat00001

상기 화학식 1에서, In Formula 1,

n 은 A-2로 표시되고, 이 때, A가 3의 배수, 4의 배수, 5의 배수, 6의 배수 및 7의 배수 중 어느 하나인 1 내지 100 중에서 선택된 적어도 하나의 자연수이고, n is represented by A-2, wherein A is at least one natural number selected from 1 to 100, which is any one of a multiple of 3, a multiple of 4, a multiple of 5, a multiple of 6, and a multiple of 7,

m 은 1 내지 100 중에서 선택된 적어도 하나의 자연수이며, m is at least one natural number selected from 1 to 100,

R1, R2, R4, R5, R7 및 R8 은 각각 독립적으로 C1~16 알킬, C2~16 알키닐, C2~16 알케닐 및 C3~16 알릴 중에서 선택된 적어도 하나의 탄화수소기이고, R 1 , R 2 , R 4 , R 5 , R 7 and R 8 are each independently at least one selected from C 1 to 16 alkyl, C 2 to 16 alkynyl, C 2 to 16 alkenyl and C 3 to 16 allyl Is a hydrocarbon group of,

R3 은 C1~16 알킬이며,R 3 is C 1-16 alkyl,

R6 은 C1~16 알킬, C3~16 알릴, 3 내지 17의 할로겐 원소로 치환된 C1~16 할로겐화알킬 및 3 내지 17의 할로겐 원소로 치환된 C3~16 할로겐화알릴 중에서 선택된 적어도 하나이다. R 6 is at least one selected from C 1 to 16 alkyl, C 3 to 16 allyl, C 1 to 16 halogenated alkyl substituted with 3 to 17 halogen elements, and C 3 to 16 allyl halide substituted with 3 to 17 halogen elements. .

상기 실록산은 환형 실록산과 알콕시 실란의 개환중합반응에 의해 얻어질 수 있다. 본 발명의 실록산의 제조방법은 환형 실록산과 금속 수산화물을 교반하는 것을 포함하는 제1 단계, 교반 후 알콕시 실란을 더 첨가하고 상기 화학식 1로 표시되는 화합물을 합성하는 제2 단계, 및 상기 합성 단계의 결과물에 중합정지제를 더 첨가하여 합성을 정지시키는 제3 단계를 포함한다.The siloxane may be obtained by ring-opening polymerization of cyclic siloxane and alkoxy silane. The method for preparing a siloxane of the present invention includes a first step including stirring a cyclic siloxane and a metal hydroxide, a second step of adding an alkoxy silane after stirring and synthesizing the compound represented by Formula 1, and the synthesis step. And a third step of stopping the synthesis by further adding a polymerization terminator to the resultant product.

본 발명은 내구성 및 저장 안정성이 우수한 실록산을 제공할 수 있으며, 본 발명에 따른 실록산은 양말단에 수산기를 가지므로 우수한 내구성 및 저장 안정성을 발휘할 수 있다. The present invention can provide a siloxane having excellent durability and storage stability, and since the siloxane according to the present invention has hydroxyl groups at both ends, excellent durability and storage stability can be exhibited.

또한, 본 발명은 소수성 물질 및 친수성 물질과의 호환성이 우수한 실록산을 제공할 수 있으며, 본 발명에 따른 실록산은 사슬의 양말단에 수산기를 가지며 그 사이에 지방족 탄화수소기를 포함하고 있어서 소수성 물질 및 친수성 물질과 우수한 호환성을 발휘할 수 있다.In addition, the present invention can provide a siloxane having excellent compatibility with a hydrophobic substance and a hydrophilic substance, and the siloxane according to the present invention has hydroxyl groups at both ends of the chain and contains an aliphatic hydrocarbon group therebetween, so that hydrophobic substances and hydrophilic substances And excellent compatibility.

또한, 본 발명은 코팅제, 첨가제 등으로 다양하게 활용할 수 있는 실록산을 제공할 있으며, 본 발명에 따른 실록산은 소수성 물질 및 친수성 물질과 호환성이 우수하고, 사슬의 양말단의 수산기 및 그 사이의 알콕시기로 인해 내지문 코팅제부터 페인트 첨가제까지 응용이 다양한 장점이 있다. In addition, the present invention provides a siloxane that can be used in various ways as a coating agent, an additive, etc., and the siloxane according to the present invention has excellent compatibility with hydrophobic substances and hydrophilic substances, and has hydroxyl groups at both ends of the chain and alkoxy groups therebetween. Due to this, there are various advantages in applications ranging from anti-fingerprint coating agents to paint additives.

또한, 본 발명은 환형 실록산과 알콕시 실란의 저온 개환중합반응을 통해 실록산을 얻을 수 있어서 고온의 열처리 공정을 필요로 하지 않은 실록산의 제조방법을 제공할 수 있다. 본 발명에 따른 실록산의 제조방법은, 모노머의 변경을 통해 소수성의 정도, 경도, 발유기능 등을 제어할 수 있어서 다양한 특성을 가진 실록산을 저온 합성할 수 있다.In addition, the present invention can provide a method for producing a siloxane that does not require a high-temperature heat treatment process since siloxane can be obtained through a low-temperature ring-opening polymerization reaction of cyclic siloxane and alkoxy silane. In the method for producing siloxane according to the present invention, the degree of hydrophobicity, hardness, oil repellency, and the like can be controlled by changing the monomer, so that siloxanes having various characteristics can be synthesized at low temperature.

본 명세서 및 청구범위에 사용된 용어나 단어는 통상적이거나 사전적인 의미로 한정해서 해석되어서는 아니되면, 발명자는 그 자신의 발명을 가장 최선의 방법으로 설명하기 위해 용어의 개념을 적절하게 정의할 수 있다는 원칙에 입각하여 본 발명의 기술적 사상에 부합하는 의미와 개념으로 해석되어야 한다. Unless the terms or words used in this specification and claims are limited to their usual or dictionary meanings and should not be interpreted, the inventor may appropriately define the concept of the terms in order to describe his own invention in the best way. It should be interpreted as a meaning and concept consistent with the technical idea of the present invention based on the principle that there is.

본 명세서에서, 용어 "a 내지 b" 는 "a 이상이고 b 이하인 것"을 의미하는 것으로 정의되며, 용어 "Ca~b"는 탄소수가 a 내지 b 인 탄화수소 화합물 또는 탄화수소 유도체 또는 이들의 기능기(functional group) 로 정의된다. In the present specification, the term "a to b" is defined to mean "a or more and b or less", and the term "Ca to b" refers to a hydrocarbon compound or a hydrocarbon derivative or a functional group thereof having a to b carbon atoms ( functional group).

비록 제1, 제2 등이 다양한 구성요소들을 서술하기 위해서 사용되나, 이들 구성요소들은 이들 용어에 의해 제한되지 않음은 물론이다. 이들 용어들은 단지 하나의 구성요소를 다른 구성요소와 구별하기 위하여 사용하는 것이다. 따라서, 이하에서 언급되는 제1 구성요소는 본 발명의 기술적 사상 내에서 제2 구성요소일 수도 있음은 물론이다.Although the first, second, and the like are used to describe various components, it goes without saying that these components are not limited by these terms. These terms are only used to distinguish one component from another component. Therefore, it goes without saying that the first component mentioned below may be the second component within the technical idea of the present invention.

본 발명의 실록산은 사슬의 양말단에 수산기를 가진다. 본 발명의 실록산은 양말단에 수산기를 가지므로 우수한 내구성 및 저장 안정성을 발휘할 수 있다.The siloxane of the present invention has hydroxyl groups at both ends of the chain. Since the siloxane of the present invention has hydroxyl groups at both ends, it can exhibit excellent durability and storage stability.

본 발명의 실록산은 사슬의 양말단에 수산기를 가지며 그 사이에 지방족 탄화수소기 및 알콕시기를 포함한다. 본 발명의 실록산은 사슬의 양말단에 수산기를 가지며 그 사이에 지방족 탄화수소기 및 알콕시기를 포함하므로, 소수성 물질 및 친수성 물질과 우수한 호환성을 발휘할 수 있을 뿐만 아니라, 내지문 코팅제부터 페인트 첨가제까지 응용이 다양하다. The siloxane of the present invention has hydroxyl groups at both ends of the chain and includes an aliphatic hydrocarbon group and an alkoxy group therebetween. Since the siloxane of the present invention has hydroxyl groups at both ends of the chain and includes an aliphatic hydrocarbon group and an alkoxy group therebetween, it can exhibit excellent compatibility with hydrophobic substances and hydrophilic substances, as well as various applications from fingerprint coating agents to paint additives. Do.

본 발명의 실록산은 하기 화학식 1로 표시되는 화합물 중 적어도 하나를 포함한다:The siloxane of the present invention includes at least one of the compounds represented by the following formula 1:

<화학식 1><Formula 1>

Figure pat00002
Figure pat00002

상기 화학식 1에서, n 은 A-2로 표시되고, 이 때, A가 3의 배수, 4의 배수, 5의 배수, 6의 배수 및 7의 배수 중 어느 하나인 1 내지 100 중에서 선택된 적어도 하나의 자연수이다. 예를 들어, 상기 화학식 1에서, 상기 A는 4의 배수 또는 5의 배수일 수 있으며, 바람직하게는 상기 A가 4의 배수일 수 있다. In Formula 1, n is represented by A-2, in which case A is at least one selected from 1 to 100 which is any one of a multiple of 3, a multiple of 4, a multiple of 5, a multiple of 6, and a multiple of 7 It is a natural number. For example, in Formula 1, A may be a multiple of 4 or a multiple of 5, and preferably A may be a multiple of 4.

상기 화학식 1에서, m 은 1 내지 100 중에서 선택된 적어도 하나의 자연수이다.In Formula 1, m is at least one natural number selected from 1 to 100.

상기 화학식 1에서, R1, R2, R4, R5, R7 및 R8 은 각각 독립적으로 C1~16 알킬, C2~16 알키닐, C2~16 알케닐 및 C3~16 알릴 중에서 선택된 적어도 하나의 탄화수소기이다. In Formula 1, R 1 , R 2 , R 4 , R 5 , R 7 and R 8 are each independently C 1 to 16 alkyl, C 2 to 16 alkynyl, C 2 to 16 alkenyl and C 3 to 16 It is at least one hydrocarbon group selected from allyl.

상기 화학식 1에서, R3 은 C1~16 알킬이다. 예를 들어, 상기 R3 은 C1~8 알킬일 수 있으며, 구체적으로는 상기 R3 은 C1~2 알킬일 수 있고, 보다 구체적으로는 R3 은 메틸(methyl)일 수 있다. In Formula 1, R 3 is C 1-16 alkyl. For example, R 3 may be C 1 to 8 alkyl, specifically, R 3 may be C 1 to 2 alkyl, and more specifically R 3 may be methyl.

상기 화학식 1에서, R6 은 C1~16 알킬, C3~16 알릴, 3 내지 17의 할로겐 원소로 치환된 C1~16 할로겐화알킬 및 3 내지 17의 할로겐 원소로 치환된 C3~16 할로겐화알릴 중에서 선택된 적어도 하나이다. 일 예에서, 상기 R6 은 C1~8 알킬, C3~8 알릴, 3 내지 6의 불소 원소로 치환된 C1~8 불소화알킬 및 3 내지 6의 불소 원소로 치환된 C3~8 불소화알릴 중에서 선택된 적어도 하나일 수 있다. 한편, 다른 일 예에서, 상기 R6 은 3 내지 6의 불소 원소로 치환된 C1~8 불소화알킬 및 3 내지 6의 불소 원소로 치환된 C3~8 불소화알릴 중에서 선택된 적어도 하나일 수 있다.In Formula 1, R 6 is C 1 to 16 alkyl, C 3 to 16 allyl, C 1 to 16 halogenated alkyl substituted with 3 to 17 halogen elements, and C 3 to 16 halogenated substituted with halogen elements of 3 to 17 It is at least one selected from allyl. In one example, R 6 is C 1 to 8 alkyl, C 3 to 8 allyl, C 1 to 8 fluorinated alkyl substituted with 3 to 6 fluorine elements, and C 3 to 8 fluorinated substituted with 3 to 6 fluorine elements It may be at least one selected from allyl. Meanwhile, in another example, R 6 may be at least one selected from C 1 to 8 fluorinated alkyl substituted with 3 to 6 fluorine elements and C 3 to 8 fluorinated allyl substituted with 3 to 6 fluorine elements.

상기 실록산은 환형 실록산과 알콕시 실란의 개환중합반응에 의해 얻어질 수 있다. 본 발명의 실록산의 제조방법은 고온의 열처리 공정을 필요로 하지 않으며, 모노머의 변경을 통해 소수성의 정도, 경도, 발유기능 등을 제어할 수 있어서 다양한 특성을 가진 실록산을 저온 합성할 수 있다.The siloxane may be obtained by ring-opening polymerization of cyclic siloxane and alkoxy silane. The manufacturing method of the siloxane of the present invention does not require a high-temperature heat treatment process, and the degree of hydrophobicity, hardness, oil repellency, and the like can be controlled by changing the monomer, so that siloxanes having various properties can be synthesized at a low temperature.

상기 환형 실록산은 옥타메틸시클로테트라실록산(Octamethyl cyclotetrasiloxane) 및 데카메틸시클로펜타실록산(Decamethyl cyclopentasiloxane) 중에서 선택된 적어도 하나일 수 있다. The cyclic siloxane may be at least one selected from octamethyl cyclotetrasiloxane and decamethyl cyclopentasiloxane.

상기 알콕시 실란은 Ra-Si(ORb)3 으로 표현되는 화합물 중 적어도 하나일 수 있으며, 이 때, Ra는 C1~16 알킬, C3~16 알릴, 3 내지 17의 할로겐 원소로 치환된 C1~16 할로겐화알킬 및 3 내지 17의 할로겐 원소로 치환된 C3~16 할로겐화알릴 중에서 선택된 적어도 하나일 수 있고, Rb는 C1~16 알킬일 수 있다.The alkoxy silane is R a -Si (OR b ) 3 In this case, R a may be at least one of the compounds represented by C 1 to 16 alkyl, C 3 to 16 allyl, C 1 to 16 halogenated alkyl substituted with 3 to 17 halogen elements, and 3 to 17 halogen It may be at least one selected from C 3 to 16 allyl halide substituted with an element, and R b may be C 1 to 16 alkyl.

일 예에서, 상기 Ra 는 C1~8 알킬, C3~8 알릴, 3 내지 6의 불소 원소로 치환된 C1~8 불소화알킬 및 3 내지 6의 불소 원소로 치환된 C3~8 불소화알릴 중에서 선택된 적어도 하나일 수 있고, Rb는 C1~8 알킬일 수 있다.In one example, the R a Is at least one selected from C 1 to 8 alkyl, C 3 to 8 allyl, C 1 to 8 fluorinated alkyl substituted with 3 to 6 fluorine elements, and C 3 to 8 fluorinated allyl substituted with 3 to 6 fluorine elements. And R b may be C 1-8 alkyl.

한편, 다른 일 예에서, 상기 Ra 는 3 내지 6의 불소 원소로 치환된 C1~8 불소화알킬 및 3 내지 6의 불소 원소로 치환된 C3~8 불소화알릴 중에서 선택된 적어도 하나일 수 있고, Rb 는 C1~2 알킬일 수 있다.On the other hand, in another example, the R a May be at least one selected from C 1 to 8 fluorinated alkyl substituted with 3 to 6 fluorine elements and C 3 to 8 allyl fluoride substituted with 3 to 6 fluorine elements, R b May be C 1-2 alkyl.

한편, 다른 일 예에서, 상기 Ra 는 3 내지 6의 불소 원소로 치환된 C1~8 불소화알킬 및 3 내지 6의 불소 원소로 치환된 C3~8 불소화알릴 중에서 선택된 적어도 하나일 수 있고, Rb 는 메틸일 수 있다.On the other hand, in another example, the R a May be at least one selected from C 1 to 8 fluorinated alkyl substituted with 3 to 6 fluorine elements and C 3 to 8 allyl fluoride substituted with 3 to 6 fluorine elements, R b May be methyl.

상기 알콕시 실란의 구체적인 예로는, 트리메톡시(옥틸)실란(Trimethoxy(octyl)silane), 트리에톡시(옥틸)실란(Triethoxy(octyl)silane),이소부틸(트리메톡시)실란(Isobutyl(trimethoxy)silane), 이소부틸(트리에톡시)실란(Isobutyl(triethoxy)silane), n-프로필트리에톡시실란(n-Propyltriethoxysilane), 트리메톡시(프로필)실란(Trimethoxy(propyl)silane), 트리에톡시(에틸)실란(Triethoxy(ethyl)silane), 트리에톡시메틸실란(Triethoxymethylsilane), 트리메톡시메틸실란(Trimethoxymethylsilane), 트리메톡시(3,3,3-트리플루오로프로필)실란(Trimethoxy(3,3,3-trifluoropropyl)silane) 및 트리에톡시(1H, 2H, 2H, 2H-퍼플루오로-1-옥틸)실란(Triethoxy(1H,1H,2H,2H-perfluoro-1-octyl)silane) 중에서 선택된 적어도 어느 하나를 들 수 있다. Specific examples of the alkoxy silane include trimethoxy (octyl) silane, triethoxy (octyl) silane, and isobutyl (trimethoxy) silane. )silane), Isobutyl (triethoxy) silane, n-Propyltriethoxysilane, Trimethoxy (propyl) silane, Triethoxy silane Triethoxy(ethyl)silane, Triethoxymethylsilane, Trimethoxymethylsilane, Trimethoxy(3,3,3-trifluoropropyl)silane 3,3,3-trifluoropropyl) silane) and triethoxy (1H, 2H, 2H, 2H-perfluoro-1-octyl) silane (Triethoxy (1H, 1H, 2H, 2H-perfluoro-1-octyl) silane ) May be at least one selected from.

본 발명의 실록산의 제조방법은 환형 실록산과 금속 수산화물을 교반하는 것을 포함하는 제1 단계, 교반 후 알콕시 실란을 더 첨가하고 상기 화학식 1로 표시되는 화합물을 합성하는 제2 단계, 및 상기 합성 단계의 결과물에 중합정지제를 더 첨가하여 합성을 정지시키는 제3 단계를 포함한다.The method for preparing a siloxane of the present invention includes a first step including stirring a cyclic siloxane and a metal hydroxide, a second step of adding an alkoxy silane after stirring and synthesizing the compound represented by Formula 1, and the synthesis step. And a third step of stopping the synthesis by further adding a polymerization terminator to the resultant product.

상기 제1 단계는 상기 환형 실록산과 상기 금속 수산화물의 조성물을 교반한 뒤, 대략 80 ~ 90℃로 승온하여 질소분위기하에서 잔류 수분과 공기를 제거하는 것을 더 포함할 수 있다.The first step may further include stirring the composition of the cyclic siloxane and the metal hydroxide, and then raising the temperature to about 80 to 90° C. to remove residual moisture and air under a nitrogen atmosphere.

상기 제3 단계에서, 상기 중합정지제는 산촉매, 금속알콕시드 촉매 등일 수 있으며, 상기 산 촉매는 염산, 황산, 말레익산 등일 수 있고, 상기 금속알콕사이드 촉매는 티타늄, 알루미늄, 징크 등일 수 있다.In the third step, the polymerization terminator may be an acid catalyst, a metal alkoxide catalyst, and the like, the acid catalyst may be hydrochloric acid, sulfuric acid, maleic acid, and the like, and the metal alkoxide catalyst may be titanium, aluminum, zinc, or the like.

상기 제3 단계에서 상기 중합정지제는 용매와 함께 투입될 수 있으며, 이 때, 상기 용매는 이소프로필 알코올, 에틸알코올, 메톡시에탄올, 에틸아세토아세테이트 또는 이들의 혼합물 등일 수 있다. In the third step, the polymerization terminator may be added together with a solvent, and the solvent may be isopropyl alcohol, ethyl alcohol, methoxyethanol, ethyl acetoacetate, or a mixture thereof.

예를 들어, 상기 환형 실록산의 함량은 89 mol% 내지 94 mol% 의 범위 내일 수 있고, 상기 알콕시 실란의 함량은 6 mol% 내지 11 mol% 의 범위 내일 수 있으며, 상기 금속 수산화물의 함량은 상기 환형 실록산과 상기 알콕시 실란의 조성물의 총 중량에 대해 1 중량% 내지 4 중량%의 범위일 수 있다.For example, the content of the cyclic siloxane may be in the range of 89 mol% to 94 mol%, the content of the alkoxysilane may be in the range of 6 mol% to 11 mol%, and the content of the metal hydroxide is the cyclic It may range from 1% to 4% by weight based on the total weight of the composition of the siloxane and the alkoxy silane.

이하, 제조예 및 실험예들을 참조하여, 본 발명의 실록산 제조방법에 대해 보다 상세하게 설명하기로 한다. Hereinafter, with reference to Preparation Examples and Experimental Examples, the method for preparing the siloxane of the present invention will be described in more detail.

< 제조예 1 ><Production Example 1>

환형 실록산으로 옥타메틸시클로테트라실록산(Octamethyl cyclotetrasiloxane) 71.9g(0.024mol)을 반응기에 첨가하고, 이후 KOH 1 ~ 2g을 정량하여 반응기에 넣고 상온에서 30 분간 교반하였다. 반응기의 내부 온도를 80~85 ℃ 로 승온하여 약 1 시간 동안, 질소 분위기 하에서 잔류 수분 및 공기를 제거하였다.As a cyclic siloxane, 71.9 g (0.024 mol) of octamethyl cyclotetrasiloxane was added to the reactor, and then, 1 to 2 g of KOH was quantified, put into the reactor, and stirred at room temperature for 30 minutes. The internal temperature of the reactor was raised to 80 to 85° C. for about 1 hour to remove residual moisture and air under a nitrogen atmosphere.

질소 퍼지 후, 반응기에 트리메톡시메틸실란(Trimethoxymethylsilane) 4.15g(0.015mol)을 더 넣고 반응기 내부 온도를 120~130 ℃까지 올려 준 후 6~7시간 동안 반응하였다.After purging with nitrogen, 4.15 g (0.015 mol) of trimethoxymethylsilane was further added to the reactor, and the temperature inside the reactor was raised to 120 to 130°C, followed by reaction for 6 to 7 hours.

6~7시간 반응 종료 후, 촉매를 사용하여 1시간 동안 교반 후 합성을 종결하였다. 내용물을 상온에서 서서히 식힌 후 12시간 후 내용물을 150㎛ 필터에 거른 후 보관하였다.After completion of the reaction for 6-7 hours, the synthesis was terminated after stirring for 1 hour using a catalyst. The contents were gradually cooled at room temperature, and after 12 hours, the contents were filtered through a 150 μm filter and stored.

< 제조예 2 ><Production Example 2>

환형 실록산으로 옥타메틸시클로테트라실록산(Octamethyl cyclotetrasiloxane) 71.9g(0.024mol)을 반응기에 첨가하고, 이후 KOH 1 ~ 2g 을 정량하여 반응기에 넣고 상온에서 30 분간 교반하였다. 반응기의 내부 온도를 80~85 ℃ 로 승온하여 약 1 시간 동안, 질소 분위기 하에서 잔류 수분 및 공기를 제거하였다.As a cyclic siloxane, 71.9 g (0.024 mol) of octamethyl cyclotetrasiloxane was added to the reactor, and then 1 to 2 g of KOH was quantified, put into the reactor, and stirred at room temperature for 30 minutes. The internal temperature of the reactor was raised to 80 to 85° C. for about 1 hour to remove residual moisture and air under a nitrogen atmosphere.

질소 퍼지 후, 반응기에 트리메톡시메틸실란(Trimethoxymethylsilane) 8.3g(0.031mol)을 더 넣고 반응기 내부 온도를 120~130 ℃까지 올려 준 후 6~7시간 동안 반응하였다.After purging with nitrogen, 8.3 g (0.031 mol) of trimethoxymethylsilane was further added to the reactor, and the internal temperature of the reactor was raised to 120 to 130 °C, followed by reaction for 6 to 7 hours.

6~7시간 반응 종료 후, 촉매를 사용하여 1시간 동안 교반 후 합성을 종결하였다. 내용물을 상온에서 서서히 식힌 후 12시간 후 내용물을 150㎛ 필터에 거른 후 보관하였다. After completion of the reaction for 6-7 hours, the synthesis was terminated after stirring for 1 hour using a catalyst. The contents were gradually cooled at room temperature, and after 12 hours, the contents were filtered through a 150 μm filter and stored.

< 제조예 3 ><Production Example 3>

환형 실록산으로 옥타메틸시클로테트라실록산(Octamethyl cyclotetrasiloxane) 71.9 g(0.024mol)을 반응기에 첨가하고, 이후 KOH 1 ~ 2g 을 정량하여 반응기에 넣고 상온에서 30 분간 교반하였다. 반응기의 내부 온도를 80~85 ℃ 로 승온하여 약 1 시간 동안, 질소 분위기 하에서 잔류 수분 및 공기를 제거하였다.As a cyclic siloxane, 71.9 g (0.024 mol) of octamethyl cyclotetrasiloxane was added to the reactor, and then 1 to 2 g of KOH was quantified and put into the reactor, followed by stirring at room temperature for 30 minutes. The internal temperature of the reactor was raised to 80 to 85° C. for about 1 hour to remove residual moisture and air under a nitrogen atmosphere.

질소 퍼지 후, 반응기에 트리메톡시메틸실란(Trimethoxymethylsilane) 16.6g(0.062mol)을 더 넣고 반응기 내부 온도를 120~130 ℃까지 올려 준 후 6~7시간 동안 반응하였다.After purging with nitrogen, 16.6 g (0.062 mol) of trimethoxymethylsilane was further added to the reactor, and the internal temperature of the reactor was raised to 120 to 130°C, followed by reaction for 6 to 7 hours.

6~7시간 반응 종료 후, 촉매를 사용하여 1시간 동안 교반 후 합성을 종결하였다. 내용물을 상온에서 서서히 식힌 후 12시간 후 내용물을 150㎛ 필터에 거른 후 보관하였다. After completion of the reaction for 6-7 hours, the synthesis was terminated after stirring for 1 hour using a catalyst. The contents were gradually cooled at room temperature, and after 12 hours, the contents were filtered through a 150 μm filter and stored.

< 제조예 4 ><Production Example 4>

환형 실록산으로 데카메틸시클로펜타실록산(Decamethyl cyclopentasiloxane) 88.98g(0.024mol)을 반응기에 첨가하고, 이후 KOH 1 ~ 2g 을 정량하여 반응기에 넣고 상온에서 30 분간 교반하였다. 반응기의 내부 온도를 80~85 ℃ 로 승온하여 약 1 시간 동안, 질소 분위기 하에서 잔류 수분 및 공기를 제거하였다.88.98 g (0.024 mol) of Decamethyl cyclopentasiloxane was added to the reactor as a cyclic siloxane, and then, 1 to 2 g of KOH was quantified and put into the reactor, followed by stirring at room temperature for 30 minutes. The internal temperature of the reactor was raised to 80 to 85° C. for about 1 hour to remove residual moisture and air under a nitrogen atmosphere.

질소 퍼지 후, 반응기에 트리메톡시메틸실란(Trimethoxymethylsilane) 4.15g(0.015mol)을 더 넣고 반응기 내부 온도를 120~130 ℃까지 올려 준 후 6~7시간 동안 반응하였다.After purging with nitrogen, 4.15 g (0.015 mol) of trimethoxymethylsilane was further added to the reactor, and the temperature inside the reactor was raised to 120 to 130°C, followed by reaction for 6 to 7 hours.

6~7시간 반응 종료 후, 촉매를 사용하여 1시간 동안 교반 후 합성을 종결하였다. 내용물을 상온에서 서서히 식힌 후 12시간 후 내용물을 150㎛ 필터에 거른 후 보관하였다. After completion of the reaction for 6-7 hours, the synthesis was terminated after stirring for 1 hour using a catalyst. The contents were gradually cooled at room temperature, and after 12 hours, the contents were filtered through a 150 μm filter and stored.

< 제조예 5 ><Production Example 5>

환형 실록산으로 데카메틸시클로펜타실록산(Decamethyl cyclopentasiloxane) 88.98g(0.024mol)을 반응기에 첨가하고, 이후 KOH 1 ~ 2g 을 정량하여 반응기에 넣고 상온에서 30 분간 교반하였다. 반응기의 내부 온도를 80~85 ℃ 로 승온하여 약 1 시간 동안, 질소 분위기 하에서 잔류 수분 및 공기를 제거하였다.88.98 g (0.024 mol) of Decamethyl cyclopentasiloxane was added to the reactor as a cyclic siloxane, and then, 1 to 2 g of KOH was quantified and put into the reactor, followed by stirring at room temperature for 30 minutes. The internal temperature of the reactor was raised to 80 to 85° C. for about 1 hour to remove residual moisture and air under a nitrogen atmosphere.

질소 퍼지 후, 반응기에 트리메톡시메틸실란(Trimethoxymethylsilane) 8.3g(0.031mol)을 더 넣고 반응기 내부 온도를 120~130 ℃까지 올려 준 후 6~7시간 동안 반응하였다.After purging with nitrogen, 8.3 g (0.031 mol) of trimethoxymethylsilane was further added to the reactor, and the internal temperature of the reactor was raised to 120 to 130 °C, followed by reaction for 6 to 7 hours.

6~7시간 반응 종료 후, 촉매를 사용하여 1시간 동안 교반 후 합성을 종결하였다. 내용물을 상온에서 서서히 식힌 후 12시간 후 내용물을 150㎛ 필터에 거른 후 보관하였다.After completion of the reaction for 6-7 hours, the synthesis was terminated after stirring for 1 hour using a catalyst. The contents were gradually cooled at room temperature, and after 12 hours, the contents were filtered through a 150 μm filter and stored.

< 제조예 6 ><Production Example 6>

환형 실록산으로 데카메틸시클로펜타실록산(Decamethyl cyclopentasiloxane) 88.98g(0.024mol)을 반응기에 첨가하고, 이후 KOH 1 ~ 2g 을 정량하여 반응기에 넣고 상온에서 30 분간 교반하였다. 반응기의 내부 온도를 80~85 ℃ 로 승온하여 약 1 시간 동안, 질소 분위기 하에서 잔류 수분 및 공기를 제거하였다.88.98 g (0.024 mol) of Decamethyl cyclopentasiloxane was added to the reactor as a cyclic siloxane, and then, 1 to 2 g of KOH was quantified and put into the reactor, followed by stirring at room temperature for 30 minutes. The internal temperature of the reactor was raised to 80 to 85° C. for about 1 hour to remove residual moisture and air under a nitrogen atmosphere.

질소 퍼지 후, 반응기에 트리메톡시메틸실란(Trimethoxymethylsilane) 16.6g(0.062mol)을 더 넣고 반응기 내부 온도를 120~130 ℃까지 올려 준 후 6~7시간 동안 반응하였다.After purging with nitrogen, 16.6 g (0.062 mol) of trimethoxymethylsilane was further added to the reactor, and the internal temperature of the reactor was raised to 120 to 130°C, followed by reaction for 6 to 7 hours.

6~7시간 반응 종료 후, 촉매를 사용하여 1시간 동안 교반 후 합성을 종결하였다. 내용물을 상온에서 서서히 식힌 후 12시간 후 내용물을 150㎛ 필터에 거른 후 보관하였다.After completion of the reaction for 6-7 hours, the synthesis was terminated after stirring for 1 hour using a catalyst. The contents were gradually cooled at room temperature, and after 12 hours, the contents were filtered through a 150 μm filter and stored.

< 제조예 7 ><Production Example 7>

환형 실록산으로 데카메틸시클로펜타실록산(Decamethyl cyclopentasiloxane) 88.98g(0.024mol)을 반응기에 첨가하고, 이후 KOH 1 ~ 2g 을 정량하여 반응기에 넣고 상온에서 30 분간 교반하였다. 반응기의 내부 온도를 80~85 ℃ 로 승온하여 약 1 시간 동안, 질소 분위기 하에서 잔류 수분 및 공기를 제거하였다.88.98 g (0.024 mol) of Decamethyl cyclopentasiloxane was added to the reactor as a cyclic siloxane, and then, 1 to 2 g of KOH was quantified and put into the reactor, followed by stirring at room temperature for 30 minutes. The internal temperature of the reactor was raised to 80 to 85° C. for about 1 hour to remove residual moisture and air under a nitrogen atmosphere.

질소 퍼지 후, 반응기에 트리메톡시메틸실란(Trimethoxymethylsilane) 33.2g(0.077mol)을 더 넣고 반응기 내부 온도를 120~130 ℃까지 올려 준 후 6~7시간 동안 반응하였다.After purging with nitrogen, 33.2 g (0.077 mol) of trimethoxymethylsilane was further added to the reactor, and the temperature inside the reactor was raised to 120 to 130 °C, and the reaction was performed for 6 to 7 hours.

6~7시간 반응 종료 후, 촉매를 사용하여 1시간 동안 교반 후 합성을 종결하였다. 내용물을 상온에서 서서히 식힌 후 12시간 후 내용물을 150㎛ 필터에 거른 후 보관하였다.After completion of the reaction for 6-7 hours, the synthesis was terminated after stirring for 1 hour using a catalyst. The contents were gradually cooled at room temperature, and after 12 hours, the contents were filtered through a 150 μm filter and stored.

< 실험예 1 ><Experimental Example 1>

제조예 1 내지 제조예 7의 최종산물을 별개의 슬라이드 글라스에 각각 코팅하고 접촉각과 내구성을 확인하였다. 표 1에는 측정결과가 정리되어 있다. The final products of Preparation Examples 1 to 7 were coated on separate slide glasses, respectively, and the contact angle and durability were checked. Table 1 summarizes the measurement results.

Trimethoxy methylsilane 의 전체 비율이 약 6 ~ 11mol%에서 우수한 소수성 특성이 나왔으며, 실란 비율이 20mol% 이상에서는 소수성 특성이 낮아지는 결과를 보였다.Excellent hydrophobic properties were obtained when the total ratio of trimethoxy methylsilane was about 6 to 11 mol%, and hydrophobic properties were decreased when the silane ratio was more than 20 mol%.

Octamethyl cyclotetrasiloxane(D4)를 사용할 경우 Decamethylcyclopentasiloxane(D5) 보다 평균적으로 우수한 결과를 얻었고 환형 실록산 D4의 고리열림이 D5보다 우수하여 합성결과가 향상되었다.When octamethyl cyclotetrasiloxane (D4) was used, the result was better on average than that of Decamethylcyclopentasiloxane (D5), and the cyclic siloxane D4 had better ring opening than D5, and the synthesis result was improved.

구분division 제조예 1Manufacturing Example 1 제조예 2Manufacturing Example 2 제조예 3Manufacturing Example 3 제조예 4Manufacturing Example 4 제조예 5Manufacturing Example 5 제조예 6Manufacturing Example 6 제조예 7Manufacturing Example 7 접촉각Contact angle 98.89°98.89° 104.34°104.34° 91.24°91.24° 100.55°100.55° 93.28°93.28° 95.03°95.03° 93.42°93.42° 내구성durability 우수Great 우수Great 낮음lowness 낮음lowness 낮음lowness 낮음lowness 낮음lowness

< 제조예 8 ><Production Example 8>

환형 실록산으로 옥타메틸시클로테트라실록산(Octamethyl cyclotetrasiloxane) 71.9g(0.024mol)을 반응기에 첨가하고, 이후 KOH 1 ~ 2g 을 정량하여 반응기에 넣고 상온에서 30 분간 교반하였다. 반응기의 내부 온도를 80~85 ℃ 로 승온하여 약 1 시간 동안, 질소 분위기 하에서 잔류 수분 및 공기를 제거하였다.As a cyclic siloxane, 71.9 g (0.024 mol) of octamethyl cyclotetrasiloxane was added to the reactor, and then 1 to 2 g of KOH was quantified, put into the reactor, and stirred at room temperature for 30 minutes. The internal temperature of the reactor was raised to 80 to 85° C. for about 1 hour to remove residual moisture and air under a nitrogen atmosphere.

질소 퍼지 후, 반응기에 이소부틸트리메톡시실란(Isobutyltrimethoxysilane) 5.52g(0.015mol)을 더 넣고 반응기 내부 온도를 120~130 ℃까지 올려 준 후 6~7시간 동안 반응하였다.After purging with nitrogen, 5.52 g (0.015 mol) of isobutyltrimethoxysilane was added to the reactor, and the internal temperature of the reactor was raised to 120 to 130°C, followed by reaction for 6 to 7 hours.

6~7시간 반응 종료 후, 촉매를 사용하여 1시간 동안 교반 후 합성을 종결하였다. 내용물을 상온에서 서서히 식힌 후 12시간 후 내용물을 150㎛ 필터에 거른 후 보관하였다.After completion of the reaction for 6-7 hours, the synthesis was terminated after stirring for 1 hour using a catalyst. The contents were gradually cooled at room temperature, and after 12 hours, the contents were filtered through a 150 μm filter and stored.

< 제조예 9 ><Production Example 9>

환형 실록산으로 옥타메틸시클로테트라실록산(Octamethyl cyclotetrasiloxane) 71.9g(0.024mol)을 반응기에 첨가하고, 이후 KOH 1 ~ 2g 을 정량하여 반응기에 넣고 상온에서 30 분간 교반하였다. 반응기의 내부 온도를 80~85 ℃ 로 승온하여 약 1 시간 동안, 질소 분위기 하에서 잔류 수분 및 공기를 제거하였다.As a cyclic siloxane, 71.9 g (0.024 mol) of octamethyl cyclotetrasiloxane was added to the reactor, and then 1 to 2 g of KOH was quantified, put into the reactor, and stirred at room temperature for 30 minutes. The internal temperature of the reactor was raised to 80 to 85° C. for about 1 hour to remove residual moisture and air under a nitrogen atmosphere.

질소 퍼지 후, 반응기에 이소부틸트리메톡시실란(Isobutyltrimethoxysilane) 11g(0.031mol)을 더 넣고 반응기 내부 온도를 120~130 ℃까지 올려 준 후 6~7시간 동안 반응하였다.After purging with nitrogen, 11 g (0.031 mol) of isobutyltrimethoxysilane was further added to the reactor, and the temperature inside the reactor was raised to 120 to 130° C., followed by reaction for 6 to 7 hours.

6~7시간 반응 종료 후, 촉매를 사용하여 1시간 동안 교반 후 합성을 종결하였다. 내용물을 상온에서 서서히 식힌 후 12시간 후 내용물을 150㎛ 필터에 거른 후 보관하였다.After completion of the reaction for 6-7 hours, the synthesis was terminated after stirring for 1 hour using a catalyst. The contents were gradually cooled at room temperature, and after 12 hours, the contents were filtered through a 150 μm filter and stored.

< 제조예 10 ><Production Example 10>

환형 실록산으로 옥타메틸시클로테트라실록산(Octamethyl cyclotetrasiloxane) 71.9g(0.024mol)을 반응기에 첨가하고, 이후 KOH 1 ~ 2g 을 정량하여 반응기에 넣고 상온에서 30 분간 교반하였다. 반응기의 내부 온도를 80~85 ℃ 로 승온하여 약 1 시간 동안, 질소 분위기 하에서 잔류 수분 및 공기를 제거하였다.As a cyclic siloxane, 71.9 g (0.024 mol) of octamethyl cyclotetrasiloxane was added to the reactor, and then 1 to 2 g of KOH was quantified, put into the reactor, and stirred at room temperature for 30 minutes. The internal temperature of the reactor was raised to 80 to 85° C. for about 1 hour to remove residual moisture and air under a nitrogen atmosphere.

질소 퍼지 후, 반응기에 이소부틸트리에톡시실란(Isobutyltriethoxysilane) 6.38g(0.015mol)을 더 넣고 반응기 내부 온도를 120~130 ℃까지 올려 준 후 6~7시간 동안 반응하였다.After purging with nitrogen, 6.38 g (0.015 mol) of isobutyltriethoxysilane was further added to the reactor, and the internal temperature of the reactor was raised to 120 to 130° C., followed by reaction for 6 to 7 hours.

6~7시간 반응 종료 후, 촉매를 사용하여 1시간 동안 교반 후 합성을 종결하였다. 내용물을 상온에서 서서히 식힌 후 12시간 후 내용물을 150㎛ 필터에 거른 후 보관하였다. After completion of the reaction for 6-7 hours, the synthesis was terminated after stirring for 1 hour using a catalyst. The contents were gradually cooled at room temperature, and after 12 hours, the contents were filtered through a 150 μm filter and stored.

< 제조예 11 ><Production Example 11>

환형 실록산으로 옥타메틸시클로테트라실록산(Octamethyl cyclotetrasiloxane) 71.9g(0.024mol)을 반응기에 첨가하고, 이후 KOH 1 ~ 2g 을 정량하여 반응기에 넣고 상온에서 30 분간 교반하였다. 반응기의 내부 온도를 80~85 ℃ 로 승온하여 약 1 시간 동안, 질소 분위기 하에서 잔류 수분 및 공기를 제거하였다.As a cyclic siloxane, 71.9 g (0.024 mol) of octamethyl cyclotetrasiloxane was added to the reactor, and then 1 to 2 g of KOH was quantified, put into the reactor, and stirred at room temperature for 30 minutes. The internal temperature of the reactor was raised to 80 to 85° C. for about 1 hour to remove residual moisture and air under a nitrogen atmosphere.

질소 퍼지 후, 반응기에 이소부틸트리에톡시실란(Isobutyltriethoxysilane) 13.66g(0.031mol)을 더 넣고 반응기 내부 온도를 120~130 ℃까지 올려 준 후 6~7시간 동안 반응하였다.After purging with nitrogen, 13.66 g (0.031 mol) of isobutyltriethoxysilane was further added to the reactor, and the temperature inside the reactor was raised to 120 to 130° C., followed by reaction for 6 to 7 hours.

6~7시간 반응 종료 후, 촉매를 사용하여 1시간 동안 교반 후 합성을 종결하였다. 내용물을 상온에서 서서히 식힌 후 12시간 후 내용물을 150㎛ 필터에 거른 후 보관하였다.After completion of the reaction for 6 to 7 hours, the synthesis was terminated after stirring for 1 hour using a catalyst. The contents were slowly cooled at room temperature, and after 12 hours, the contents were filtered through a 150 μm filter and stored.

< 제조예 12 ><Production Example 12>

환형 실록산으로 옥타메틸시클로테트라실록산(Octamethyl cyclotetrasiloxane) 71.9g(0.024mol)을 반응기에 첨가하고, 이후 KOH 1 ~ 2g 을 정량하여 반응기에 넣고 상온에서 30 분간 교반하였다. 반응기의 내부 온도를 80~85 ℃ 로 승온하여 약 1 시간 동안, 질소 분위기 하에서 잔류 수분 및 공기를 제거하였다.As a cyclic siloxane, 71.9 g (0.024 mol) of octamethyl cyclotetrasiloxane was added to the reactor, and then 1 to 2 g of KOH was quantified, put into the reactor, and stirred at room temperature for 30 minutes. The internal temperature of the reactor was raised to 80 to 85° C. for about 1 hour to remove residual moisture and air under a nitrogen atmosphere.

질소 퍼지 후, 반응기에 이소부틸트리에톡시실란(Isobutyltriethoxysilane) 19.14g(0.062mol)을 더 넣고 반응기 내부 온도를 120~130 ℃까지 올려 준 후 6~7시간 동안 반응하였다.After purging with nitrogen, 19.14 g (0.062 mol) of isobutyltriethoxysilane was further added to the reactor, and the internal temperature of the reactor was raised to 120 to 130° C., followed by reaction for 6 to 7 hours.

6~7시간 반응 종료 후, 촉매를 사용하여 1시간 동안 교반 후 합성을 종결하였다. 내용물을 상온에서 서서히 식힌 후 12시간 후 내용물을 150㎛ 필터에 거른 후 보관하였다.After completion of the reaction for 6-7 hours, the synthesis was terminated after stirring for 1 hour using a catalyst. The contents were gradually cooled at room temperature, and after 12 hours, the contents were filtered through a 150 μm filter and stored.

< 실험예 2 ><Experimental Example 2>

제조예 8 내지 제조예 12의 최종산물을 별개의 슬라이드 글라스에 각각 코팅하고 접촉각과 내구성을 확인하였다. 표 2에는 측정결과가 정리되어 있다. Isobutyltriethoxysilane 보다 Isobutyltrimethoxysilane을 사용할 때 결과가 우수하였다. Methoxy 가 ethoxy 보다 반응성이 우수하였다.The final products of Preparation Examples 8 to 12 were coated on separate slide glasses, respectively, and the contact angle and durability were checked. Table 2 summarizes the measurement results. The results were better when Isobutyltrimethoxysilane was used than isobutyltriethoxysilane. Methoxy was more reactive than ethoxy.

구분division 제조예 8Manufacturing Example 8 제조예 9Manufacturing Example 9 제조예 10 Manufacturing Example 10 제조예 11Manufacturing Example 11 제조예 12Manufacturing Example 12 접촉각Contact angle 98.69°98.69° 100.78°100.78° 94.37°94.37° 87.78°87.78° 93.22°93.22° 내구성durability 우수Great 우수Great 낮음lowness 낮음lowness 낮음lowness

< 제조예 13 ><Production Example 13>

환형 실록산으로 옥타메틸시클로테트라실록산(Octamethyl cyclotetrasiloxane) 71.9g(0.024mol)을 반응기에 첨가하고, 이후 KOH 1 ~ 2g 을 정량하여 반응기에 넣고 상온에서 30 분간 교반하였다. 반응기의 내부 온도를 80~85 ℃ 로 승온하여 약 1 시간 동안, 질소 분위기 하에서 잔류 수분 및 공기를 제거하였다.As a cyclic siloxane, 71.9 g (0.024 mol) of octamethyl cyclotetrasiloxane was added to the reactor, and then 1 to 2 g of KOH was quantified, put into the reactor, and stirred at room temperature for 30 minutes. The internal temperature of the reactor was raised to 80 to 85° C. for about 1 hour to remove residual moisture and air under a nitrogen atmosphere.

질소 퍼지 후, 반응기에 옥틸트리에톡시실란(Octyltriethoxysilane) 8.43g(0.015mol)을 더 넣고 반응기 내부 온도를 120~130 ℃까지 올려 준 후 6~7시간 동안 반응하였다.After purging with nitrogen, 8.43 g (0.015 mol) of octyltriethoxysilane was further added to the reactor, and the temperature inside the reactor was raised to 120 to 130° C., and then reacted for 6 to 7 hours.

6~7시간 반응 종료 후, 촉매를 사용하여 1시간 동안 교반 후 합성을 종결하였다. 내용물을 상온에서 서서히 식힌 후 12시간 후 내용물을 150㎛ 필터에 거른 후 보관하였다.After completion of the reaction for 6 to 7 hours, the synthesis was terminated after stirring for 1 hour using a catalyst. The contents were slowly cooled at room temperature, and after 12 hours, the contents were filtered through a 150 μm filter and stored.

< 제조예 14 ><Production Example 14>

환형 실록산으로 옥타메틸시클로테트라실록산(Octamethyl cyclotetrasiloxane) 71.9g(0.024mol)을 반응기에 첨가하고, 이후 KOH 1 ~ 2g 을 정량하여 반응기에 넣고 상온에서 30 분간 교반하였다. 반응기의 내부 온도를 80~85 ℃ 로 승온하여 약 1 시간 동안, 질소 분위기 하에서 잔류 수분 및 공기를 제거하였다.As a cyclic siloxane, 71.9 g (0.024 mol) of octamethyl cyclotetrasiloxane was added to the reactor, and then 1 to 2 g of KOH was quantified, put into the reactor, and stirred at room temperature for 30 minutes. The internal temperature of the reactor was raised to 80 to 85° C. for about 1 hour to remove residual moisture and air under a nitrogen atmosphere.

질소 퍼지 후, 반응기에 옥틸트리에톡시실란(Octyltriethoxysilane) 16.86g(0.031mol)을 더 넣고 반응기 내부 온도를 120~130 ℃까지 올려 준 후 6~7시간 동안 반응하였다.After purging with nitrogen, 16.86 g (0.031 mol) of octyltriethoxysilane was further added to the reactor, and the internal temperature of the reactor was raised to 120 to 130° C., and then reacted for 6 to 7 hours.

6~7시간 반응 종료 후, 촉매를 사용하여 1시간 동안 교반 후 합성을 종결하였다. 내용물을 상온에서 서서히 식힌 후 12시간 후 내용물을 150㎛ 필터에 거른 후 보관하였다.After completion of the reaction for 6 to 7 hours, the synthesis was terminated after stirring for 1 hour using a catalyst. The contents were slowly cooled at room temperature, and after 12 hours, the contents were filtered through a 150 μm filter and stored.

< 실험예 3 ><Experimental Example 3>

제조예 13 및 제조예 14의 최종산물을 별개의 슬라이드 글라스에 각각 코팅하고 접촉각과 내구성을 확인하였다. 표 3에는 측정결과가 정리되어 있다. The final products of Preparation Example 13 and Preparation Example 14 were coated on separate slide glasses, respectively, and the contact angle and durability were checked. Table 3 summarizes the measurement results.

구분division 제조예 13Manufacturing Example 13 제조예 14Manufacturing Example 14 접촉각Contact angle 97.83°97.83° 104.79°104.79° 내구성durability 우수Great 우수Great

Claims (7)

금속 수산화물과 환형 실록산을 교반하는 것을 포함하는 제1 단계;
상기 제1 단계의 결과물에 알콕시 실란을 더 첨가하고 하기 화학식 1로 표시되는 화합물을 합성하는 제2 단계; 및
상기 제2 단계의 결과물에 중합정지제를 더 첨가하여 합성을 정지하는 제3 단계;
를 포함하는 실록산의 제조방법:
<화학식 1>
Figure pat00003

상기 화학식 1에서,
n 은 A-2로 표시되고, 이 때, A가 3의 배수, 4의 배수, 5의 배수, 6의 배수 및 7의 배수 중 어느 하나인 1 내지 100 중에서 선택된 적어도 하나의 자연수이고,
m 은 1 내지 100 중에서 선택된 적어도 하나의 자연수이며,
R1, R2, R4, R5, R7 및 R8 은 각각 독립적으로 C1~16 알킬, C2~16 알키닐, C2~16 알케닐 및 C3~16 알릴 중에서 선택된 적어도 하나의 탄화수소기이고,
R3 은 C1~16 알킬이며,
R6 은 C1~16 알킬, C3~16 알릴, 3 내지 17의 할로겐 원소로 치환된 C1~16 할로겐화알킬 및 3 내지 17의 할로겐 원소로 치환된 C3~16 할로겐화알릴 중에서 선택된 적어도 하나이다.
A first step comprising stirring the metal hydroxide and cyclic siloxane;
A second step of further adding an alkoxy silane to the resultant of the first step and synthesizing a compound represented by the following formula (1); And
A third step of stopping the synthesis by adding a polymerization terminator to the result of the second step;
A method for producing a siloxane comprising:
<Formula 1>
Figure pat00003

In Formula 1,
n is represented by A-2, wherein A is at least one natural number selected from 1 to 100, which is any one of a multiple of 3, a multiple of 4, a multiple of 5, a multiple of 6, and a multiple of 7,
m is at least one natural number selected from 1 to 100,
R 1 , R 2 , R 4 , R 5 , R 7 and R 8 are each independently at least one selected from C 1 to 16 alkyl, C 2 to 16 alkynyl, C 2 to 16 alkenyl and C 3 to 16 allyl Is a hydrocarbon group of,
R 3 is C 1-16 alkyl,
R 6 is at least one selected from C 1 to 16 alkyl, C 3 to 16 allyl, C 1 to 16 halogenated alkyl substituted with 3 to 17 halogen elements, and C 3 to 16 allyl halide substituted with 3 to 17 halogen elements. .
제1 항에 있어서,
상기 R3 은 C1~8 알킬이고,
상기 R6 은 C1~8 알킬, C3~8 알릴, 3 내지 6의 불소 원소로 치환된 C1~8 불소화알킬 및 3 내지 6의 불소 원소로 치환된 C3~8 불소화알릴 중에서 선택된 적어도 하나인 실록산의 제조방법.
The method of claim 1,
R 3 is C 1 to 8 alkyl,
Wherein R 6 is C 1 ~ 8-alkyl, C 3 ~ 8-allyl, 3 to 6 of elemental fluorine-substituted C 1 ~ 8 fluorinated alkyl, and 3 to 6 with elemental fluorine substituted C 3 ~ 8 at least selected from the group consisting of allyl fluorination of a Method for producing Hanain siloxane.
제2 항에 있어서,
상기 환형 실록산은 옥타메틸시클로테트라실록산(Octamethyl cyclotetrasiloxane) 및 데카메틸시클로펜타실록산(Decamethyl cyclopentasiloxane) 중에서 선택된 적어도 하나이며,
상기 알콕시 실란은 Ra-Si(ORb)3 으로 표현되며, 이 때, Ra는 C1~8 알킬, C3~8 알릴, 3 내지 6의 불소 원소로 치환된 C1~8 불소화알킬 및 3 내지 6의 불소 원소로 치환된 C3~8 불소화알릴 중에서 선택된 적어도 하나이고, Rb는 C1~8 알킬인 실록산의 제조방법.
The method of claim 2,
The cyclic siloxane is at least one selected from octamethyl cyclotetrasiloxane and Decamethyl cyclopentasiloxane,
The alkoxy silane is R a -Si (OR b ) 3 In this case, R a is C 1 to 8 alkyl, C 3 to 8 allyl, C 1 to 8 fluorinated alkyl substituted with 3 to 6 fluorine elements, and C 3 to substituted with 3 to 6 fluorine elements At least one selected from 8 fluorinated allyls, and R b is C 1 to 8 alkyl.
제3 항에 있어서,
상기 알콕시 실란은 트리메톡시(옥틸)실란(Trimethoxy(octyl)silane), 트리에톡시(옥틸)실란(Triethoxy(octyl)silane),이소부틸(트리메톡시)실란(Isobutyl(trimethoxy)silane), 이소부틸(트리에톡시)실란(Isobutyl(triethoxy)silane), n-프로필트리에톡시실란(n-Propyltriethoxysilane), 트리메톡시(프로필)실란(Trimethoxy(propyl)silane), 트리에톡시(에틸)실란(Triethoxy(ethyl)silane), 트리에톡시메틸실란(Triethoxymethylsilane), 트리메톡시메틸실란(Trimethoxymethylsilane), 트리메톡시(3,3,3-트리플루오로프로필)실란(Trimethoxy(3,3,3-trifluoropropyl)silane) 및 트리에톡시(1H, 2H, 2H, 2H-퍼플루오로-1-옥틸)실란(Triethoxy(1H,1H,2H,2H-perfluoro-1-octyl)silane) 중에서 선택된 어느 하나인 실록산의 제조방법.
The method of claim 3,
The alkoxy silane is trimethoxy (octyl) silane, triethoxy (octyl) silane, isobutyl (trimethoxy) silane, Isobutyl (triethoxy) silane, n-Propyltriethoxysilane, Trimethoxy (propyl) silane, Triethoxy (ethyl) Silane (Triethoxy(ethyl)silane), triethoxymethylsilane (Triethoxymethylsilane), trimethoxymethylsilane (Trimethoxymethylsilane), trimethoxy (3,3,3-trifluoropropyl) silane (Trimethoxy(3,3, 3-trifluoropropyl) silane) and triethoxy (1H, 2H, 2H, 2H-perfluoro-1-octyl) silane (Triethoxy (1H, 1H, 2H, 2H-perfluoro-1-octyl) silane) Method for producing Hanain siloxane.
제1 항에 있어서,
상기 환형 실록산의 함량은 89 mol% 내지 94 mol% 의 범위 내이고,
상기 알콕시 실란의 함량은 6 mol% 내지 11 mol% 의 범위 내이며,
상기 금속 수산화물의 함량은 상기 환형 실록산과 상기 알콕시 실란의 조성물의 총 중량에 대해 1 중량% 내지 4 중량%의 범위인 실록산의 제조방법.
The method of claim 1,
The content of the cyclic siloxane is in the range of 89 mol% to 94 mol%,
The content of the alkoxy silane is in the range of 6 mol% to 11 mol%,
The content of the metal hydroxide is in the range of 1% to 4% by weight based on the total weight of the composition of the cyclic siloxane and the alkoxy silane method for producing a siloxane.
하기 화학식 1로 표시되는 화합물 중 적어도 하나를 포함하는 실록산:
<화학식 1>
Figure pat00004

상기 화학식 1에서,
n 은 A-2로 표시되고, 이 때, A가 3의 배수, 4의 배수, 5의 배수, 6의 배수 및 7의 배수 중 어느 하나인 1 내지 100 중에서 선택된 적어도 하나의 자연수이고,
m 은 1 내지 100 중에서 선택된 적어도 하나의 자연수이며,
R1, R2, R4, R5, R7 및 R8 은 각각 독립적으로 C1~16 알킬, C2~16 알키닐, C2~16 알케닐 및 C3~16 알릴 중에서 선택된 적어도 하나의 탄화수소기이고,
R3 은 C1~16 알킬이며,
R6 은 C1~16 알킬, C3~16 알릴, 3 내지 17의 할로겐 원소로 치환된 C1~16 할로겐화알킬 및 3 내지 17의 할로겐 원소로 치환된 C3~16 할로겐화알릴 중에서 선택된 적어도 하나이다.
Siloxane containing at least one of the compounds represented by the following Formula 1:
<Formula 1>
Figure pat00004

In Formula 1,
n is represented by A-2, wherein A is at least one natural number selected from 1 to 100, which is any one of a multiple of 3, a multiple of 4, a multiple of 5, a multiple of 6, and a multiple of 7,
m is at least one natural number selected from 1 to 100,
R 1 , R 2 , R 4 , R 5 , R 7 and R 8 are each independently at least one selected from C 1 to 16 alkyl, C 2 to 16 alkynyl, C 2 to 16 alkenyl and C 3 to 16 allyl Is a hydrocarbon group of,
R 3 is C 1-16 alkyl,
R 6 is at least one selected from C 1 to 16 alkyl, C 3 to 16 allyl, C 1 to 16 halogenated alkyl substituted with 3 to 17 halogen elements, and C 3 to 16 allyl halide substituted with 3 to 17 halogen elements. .
제6 항에 있어서,
상기 A는 4의 배수 또는 5의 배수이고,
상기 R3 은 C1~8 알킬이며,
상기 R6 은 C1~8 알킬, C3~8 알릴, 3 내지 6의 불소 원소로 치환된 C1~8 불소화알킬 및 3 내지 6의 불소 원소로 치환된 C3~8 불소화알릴 중에서 선택된 적어도 하나인 실록산.
The method of claim 6,
A is a multiple of 4 or a multiple of 5,
R 3 is C 1-8 alkyl,
Wherein R 6 is C 1 ~ 8-alkyl, C 3 ~ 8-allyl, 3 to 6 of elemental fluorine-substituted C 1 ~ 8 fluorinated alkyl, and 3 to 6 with elemental fluorine substituted C 3 ~ 8 at least selected from the group consisting of allyl fluorination of a One, siloxane.
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