KR20200107649A - Apparatus for removing ozone generated during surface modification - Google Patents

Abstract

An ozone removal device is provided. The ozone removal device according to an embodiment of the present invention includes: a quartz tube formed with a fluid flow path and a heating source a heating quartz body pyrolyzing, by means of the heating source, ozone introduced through the fluid flow path after discharged from a surface modification treatment device of an object to be treated a cooling unit for cooling air discharged from the heating quartz body.

Description

Device for removing ozone generated during surface modification {Apparatus for removing ozone generated during surface modification}

The present invention relates to an ozone removal device, and in particular, a residual amount after surface modification treatment of an object to be treated in an apparatus that treats the surface of the object to be treated with UV (ultraviolet) light and by contacting ozone It relates to an ozone removal device that removes and discharges ozone below the emission limit.

Recently, the proportion of dental implants, which are artificial teeth, is increasing. The implant serves as a tooth by being coupled to a fixture inserted into the pubis.

The dental implant structure, which is usually an artificial tooth, is composed of three structures: an implant fixture (fixture-artificial tooth root), abutment (abutment), and a prosthesis (crown-artificial tooth), and the material of the fixture is generally titanium and titanium alloy. to be.

In an implant procedure, the area of the implant fixture inserted into the pubis needs to be completely placed in the pubis.

To this end, as a conventional technique, when UV light is irradiated onto the implant surface, especially the implant fixture, the surface modification phenomenon of the implant fixture through the ozone generated by UV light energy and UV light causes bone formation after the implant fixture is placed. It promotes cell proliferation and adhesion function to obtain excellent treatment results. These treatment results are largely explained for three reasons as follows.

First, the light energy of UV light and ozone generated by UV light decompose and evaporate carbon molecules attached to the surface of the implant fixture so that the bone-forming cells can be well attached to the surface of the implant fixture.

Second, the light energy of UV light and ozone generated by UV light change the surface charge of the implant fixture from negative (-) charge to positive (+) charge. Proteins that help adhesion and function are electrostatically attracted to the surface of the implant fixture so that they can be closely bonded.

Third, if the light energy of UV light and ozone generated by the UV light increase the hydrophilicity of the surface of the implant fixture, so that the blood is well wetted on the surface of the implant fixture, blood clots that are well formed on the surface of the implant fixture will later become bone-forming cells. It helps to adhere well to the surface of the implant fixture.

However, in the conventional surface modification treatment method of a surface modification treatment apparatus using UV light, ozone generated in a treatment chamber in which the implant fixture is disposed is harmful to the human body, and thus has been a problem when discharged after use for the surface modification treatment of the implant fixture. In addition, when the surface modification treatment of the implant fixture is performed in an environment in which ozone is not generated, it is difficult to remove organic matter adhered to the surface of the implant fixture with high efficiency because the surface modification treatment by ozone is inappropriate.

In Korean Patent Application Publication No. 10-2013-0054357 (cleaning treatment device for biological implants), after fixing a plurality of implant fixtures in a treatment chamber, ultraviolet rays are irradiated inside the treatment chamber to modify the surface of the aged surface of the implant fixture to hydrophilicity. The device is public.

However, in the above disclosed patent, it took a long time (5 to 30 minutes) to be surface-modified by ultraviolet rays, so that several fixtures had to be surface-modified at the same time, and an excessive treatment space for simultaneous treatment was required, so the size of the device was reduced. There was a growing problem.

In addition, the amount of ozone generated for the surface modification treatment could not be arbitrarily controlled. Immediately after the surface modification treatment, the fan was operated to remove the ozone after use by passing an ozone absorbent such as activated carbon. As the activated carbon is rapidly deteriorated, the cost is excessive due to the frequent replacement of activated carbon, and the unadsorbed ozone is discharged into the air as it is, or ozone leaked out during the surface modification treatment is lost to the human body. There were many problems, such as direct contact with.

Therefore, during the surface modification treatment, it is necessary to generate an appropriate amount of ozone while slowing the air inflow rate so that the surface modification by ozone is sufficiently achieved, and discharge quickly so as not to be exposed by the generated ozone after the surface modification treatment.

In order to solve the problems of the prior art as described above, according to an embodiment of the present invention, ozone generated in the process of surface modification treatment of an object to be treated can be removed below the emission limit and discharged into the air, and ozone after surface modification treatment is removed. It is intended to provide an ozone removal device that can remove ozone quickly and prevent direct contact of ozone, which is harmful to the human body.

According to an aspect of the present invention for solving the above problems, a quartz tube in which a fluid flow path is formed and a heating source are included, and ozone discharged from the surface modification treatment apparatus of the object to be treated and introduced through the fluid flow path is removed. A heating quartz body thermally decomposed by the heating source; And a cooling unit that cools the air discharged by pyrolysis from the heating quartz body.

In one embodiment, the heating quartz body may pyrolyze the ozone so that the ozone concentration is 0.05 ppm or less.

In one embodiment, the heating source may generate heat at a temperature of 200 to 900°C.

In one embodiment, the heating source may include a halogen lamp.

In one embodiment, the heating source may include a ceramic heater.

In one embodiment, the quartz tube is an inner tube provided with the heating source; An outer tube in which the fluid flow path is formed between the inner tube; An inlet pipe through which the ozone flows into the fluid passage; And a discharge pipe through which the pyrolyzed air is discharged from the fluid passage.

In one embodiment, the quartz tube is provided on the inside of the fluid flow path, the receiving portion in which the heating source is built; An inlet pipe through which the ozone flows into the fluid passage; And a discharge pipe through which the pyrolyzed air is discharged from the fluid passage.

In one embodiment, the heating quartz body may further include a heat shielding reflector provided along the outer periphery.

In one embodiment, the heat shielding reflector may be in the form of a foil of aluminum or stainless steel.

In one embodiment, the heating quartz body is an inlet pipe through which the ozone is introduced; And a discharge pipe through which the pyrolyzed air is discharged.

In one embodiment, the ozone removal device may further include a filter to remove residual ozone from air discharged from the cooling unit.

In one embodiment, the filter may include an ozone adsorbent.

In one embodiment, the cooling unit may have an air-cooled structure.

In one embodiment, the cooling unit may be provided with a flow path of a radiator structure.

In one embodiment, the ozone removal device may further include a fan that adjusts the flow rate of the air or the ozone.

In one embodiment, the object to be treated may be an implant fixture.

In one embodiment, the surface modification treatment device may be an ultraviolet discharge lamp device that generates UV light by a discharge gas and generates ozone by the UV light.

In one embodiment, the UV light may be excimer UV light.

In one embodiment, the UV light may be 172 nm excimer UV light.

In one embodiment, the surface modification treatment device is filled with a discharge gas for generating the UV light, the ultraviolet discharge container having a double cylindrical structure; An internal electrode and an external electrode provided inside the inner tube and outside the outer tube of the ultraviolet discharge container; And an ampoule holder inserted into the inner electrode to support the object to be processed.

In the ozone removal apparatus according to an embodiment of the present invention, ozone, which is essentially generated in the process of performing the surface modification treatment of the object to be treated, is thermally decomposed after surface modification, thereby discharging ozone into the atmosphere below the emission limit. Safety can be ensured because exposure can be prevented.

1 is a block diagram schematically showing an ozone removal apparatus according to an embodiment of the present invention;
Figure 2a is a perspective view of an example of the heating quartz body of Figure 1,
Figure 2b is a perspective view of another example of the heating quartz body of Figure 1,
Figure 3 is a cross-sectional view of the heating quartz body of Figure 1,
Figure 4 is a perspective view of the cooling unit of Figure 1,
5 is a cross-sectional view of FIG. 4;
6 is an exploded perspective view of the surface modification treatment apparatus of FIG. 1;
Figure 7 is a vertical cross-sectional view of Figure 6, and,
8 is a horizontal cross-sectional view of FIG. 6.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those of ordinary skill in the art can easily implement the present invention. The present invention may be implemented in various different forms, and is not limited to the embodiments described herein. In the drawings, parts irrelevant to the description are omitted in order to clearly describe the present invention, and the same reference numerals are assigned to the same or similar components throughout the specification.

The embodiments of the present invention are provided to more completely describe the present invention to those of ordinary skill in the art, and the embodiments described below may be modified in various different forms, and The scope is not limited to the following examples. Rather, these examples are provided to make the present invention more faithful and complete, and to fully convey the spirit of the present invention to those skilled in the art.

The terms used in this specification are used to describe specific embodiments, and are not intended to limit the present invention. As used herein, the singular form may include a plural form unless the context clearly indicates another case. Also, as used herein, "comprise" and/or "comprising" specifies the presence of the mentioned shapes, numbers, steps, actions, members, elements and/or groups thereof. And does not exclude the presence or addition of one or more other shapes, numbers, actions, members, elements, and/or groups. As used herein, the term "and/or" includes any and all combinations of one or more of the corresponding listed items.

In the present specification, terms such as first and second are used to describe various members, regions and/or parts, but it is obvious that these members, parts, regions, layers and/or parts are not limited by these terms. . These terms do not imply any particular order, top or bottom, or superiority, and are only used to distinguish one member, region, or region from another member, region, or region. Therefore, the first member, region, or region to be described below may refer to the second member, region or region without departing from the teachings of the present invention.

Hereinafter, embodiments of the present invention will be described with reference to the drawings schematically showing embodiments of the present invention. In the drawings, for example, depending on manufacturing techniques and/or tolerances, variations of the illustrated shape can be expected. Therefore, the embodiments of the present invention should not be construed as being limited to the specific shape of the region shown in the present specification, but should include, for example, a change in shape caused by manufacturing.

1 is a block diagram schematically showing an ozone removal apparatus according to an embodiment of the present invention, FIG. 2A is a perspective view of an example of the heating quartz body of FIG. 1, and FIG. 2B is a perspective view of another example of the heating quartz body of FIG. 1 3 is a cross-sectional view of the heating quartz body of FIG. 1, FIG. 4 is a perspective view of the cooling unit of FIG. 1, and FIG. 5 is a cross-sectional view of FIG. 4.

Referring to FIG. 1, an ozone removal apparatus 10 according to an embodiment of the present invention includes a heating quartz body 200 and a cooling unit 300.

The ozone removal device 10 is for post-treatment of ozone (O ₃ ) used for surface modification treatment of an object to be treated, and may be removed by heat treating ozone to satisfy an emission limit of 0.05 ppm or less. That is, the ozone removal device 10 may remove ozone discharged from the surface modification treatment device 100.

Here, the surface modification treatment device 100 may be a surface modification treatment device of a dental implant, but is not limited thereto, and may be a surface modification treatment device for a living body or a surface modification treatment device using ozone. Hereinafter, the object to be treated will be described using the implant fixture 1 as an example, but it is of course possible to use another object that can be surface-modified by ozone.

The surface modification treatment device 100 generates UV light by the filled discharge gas and generates ozone by the generated UV light, thereby performing surface modification of the implant fixture 1 by UV light energy and ozone. can do.

In this case, the surface modification treatment apparatus 100 may include an ultraviolet discharge container 120, an internal electrode 110, and an external electrode 130. Here, the ultraviolet discharge vessel 120 is filled with a discharge gas that generates UV light and may have a double cylindrical structure. The inner electrode 110 and the outer electrode 130 are provided inside the inner tube and outside the outer tube of the ultraviolet discharge container 120 so that electric power may be supplied from the outside.

In the surface modification treatment apparatus 100, air may be introduced from the upper side of the ultraviolet discharge container 120. In addition, the surface modification treatment apparatus 100 may generate UV light by a gas for discharge. That is, the surface modification treatment apparatus 100 may function as a UV light source by a gas for discharge.

Here, since oxygen is included in the air introduced into the ultraviolet discharge vessel 120, the surface modification treatment apparatus 100 may change oxygen in the air into ozone (O ₃ ) by UV light. A specific configuration of the surface modification treatment apparatus 100 will be described later with reference to FIGS. 6 to 8.

The heating quartz body 200 thermally decomposes ozone so that the concentration of ozone discharged from the surface modification treatment apparatus 100 is 0.05 ppm or less. At this time, the heating quartz body 200 may pyrolyze ozone at a temperature of 200 to 900°C. Here, the pyrolyzed ozone is converted into oxygen (O ₂ ).

One side of the heating quartz body 200 may be connected to the surface modification treatment apparatus 100 through a connection pipe 160, and the other side may be connected to the cooling unit 300. Here, the heating quartz body 200 may include a quartz tube 201 and a heating source 210.

2A, the quartz tube 201 may be a double quartz tube including an inner tube and an outer tube. Here, the double quartz tube 201 may include an inner tube, an outer tube, an inlet tube 203, and an outlet tube 204.

Among them, the quartz tube 201 has a double tube structure in which light emitted from the heating source 210, in particular, a halogen lamp can be transmitted, is excellent in thermal shock, and a space for thermal decomposition of ozone exists.

That is, the double quartz tube 201 may have a fluid flow path 220 formed between the inner tube and the outer tube. The fluid passage 220 is a space in which ozone flows and is thermally decomposed by heat generated from the heating source 210.

At this time, the inner tube is provided with a heating source 210. That is, the inner tube may be provided with a hollow portion 202 at the center thereof. Here, a heating source 210 may be provided in the hollow part 202. That is, the heating source 210 may be provided separately from the double quartz tube 201 and inserted into the double quartz tube 201.

The inlet pipe 203 and the discharge pipe 204 may be provided on one side of the double quartz pipe 201. At this time, the inlet pipe 203 and the discharge pipe 204 may be provided on the same side (eg, upper side) or different sides (eg, upper side and lower side) of the double quartz tube 201.

Here, the inlet pipe 203 and the discharge pipe 204 may be divided into a front end and a rear end of the double quartz tube 201, as shown in FIG. 1. In this case, the inlet pipe 203 may be provided at the front end of the double quartz pipe 201 and connected to the surface modification treatment apparatus 100 through the connection pipe 160. Ozone discharged from the surface modification treatment apparatus 100 may be introduced into the fluid passage 220 through the inlet pipe 203.

In addition, the discharge pipe 204 may be provided at the rear end of the double quartz pipe 201 and connected to the cooling unit 300. Air from which ozone is pyrolyzed through the discharge pipe 204 may be discharged from the fluid flow path 220.

The heating source 210 is for pyrolyzing ozone and may generate heat at a temperature of 200 to 900°C. For example, the heating source 210 may include a halogen lamp. Since such a halogen lamp has a low power consumption, it is possible to implement the heating source 210 at low cost, and the temperature rise time is shorter than that of a general heater, thereby providing excellent thermal efficiency.

As another example, the heating source 210 may include a ceramic heater.

2B, the quartz tube 201 ′ may be a single quartz tube. Here, the single quartz tube 201 ′ may include a receiving portion, an inlet pipe 203 and an outlet pipe 204.

The single quartz tube 201' has a single tube structure in which light emitted from the heating source 210, in particular, a halogen lamp can be transmitted, is excellent in thermal shock, and has a space for thermal decomposition of ozone.

That is, the single quartz tube 201 ′ may be provided with a receiving portion 202 ′ in the center thereof, and a fluid flow path 220 ′ outside the receiving portion 202 ′. Here, the fluid passage 220 ′ is a space in which ozone flows and is thermally decomposed by heat generated from the heating source 210.

In this case, the single quartz tube 201 ′ may include a heating source 210. That is, the receiving part 202 ′ may be provided inside the fluid flow path 220 ′. Here, the receiving portion 202 ′ may include a heating source 210. That is, the heating source 210 may be integrally formed with a single quartz tube 201'.

Accordingly, since heat generated from the heating source 210 is directly transferred to the fluid passage 220', the thermal efficiency is higher than that of the double quartz tube 201.

Here, although not shown in the drawing, a power supply line for applying power to the heating source 210 may be connected from the outside of the single quartz tube 201 ′ into the receiving part 202 ′.

Since the inlet pipe 203 and the discharge pipe 204 are the same as the case of the double quartz pipe 201 as shown in FIG. 2A, a detailed description thereof will be omitted. Referring to FIG. 3, the heating quartz body 200 may further include a heat shielding reflector 230 provided along the outer periphery. The heat shielding reflector 230 is for more efficient use of generated thermal energy or light energy, and heat generated from the heating source 210 may block emission to the outside. In addition, when the heating source 210 is a halogen lamp, the heat shielding reflector 230 has a function of reflecting light energy of UV light generated from the lamp to be condensed toward the fluid flow path 220.

For example, the heat shielding reflector 230 may be in the form of a foil made of aluminum or stainless steel.

Referring back to FIG. 1, the cooling unit 300 is connected to the discharge pipe 204 of the heating quartz body 200, and cools the air discharged by pyrolysis in the heating quartz body 200. In other words, air and oxygen cannot be discharged as they are because they are in a high temperature state due to thermal decomposition of ozone, so they must be cooled to a relatively low temperature state.

In this case, the cooling unit 300 may have an air-cooled structure. In addition, the cooling unit 300 may be provided with a flow path 330 having a radiator structure. As an example, the cooling unit 300 may include a cooling pipe 310, a cooling fin 320, and a flow path 330.

Referring to FIG. 4, the cooling pipe 310 may be provided with a flow path 330 formed therethrough from the center side. Here, the cooling tube 310 may be a main body of the cooling unit 300. In addition, the cooling pipe 310 may be connected to the discharge pipe 204 of the heating quartz body 200.

Referring to FIG. 5, the flow path 330 may be provided in a meandering shape in cross section of the cooling tube 310. Here, the shape of the flow path 330 is not particularly limited, but it is preferably formed to have a sufficient length inside the cooling pipe 310 for effective cooling of the air introduced from the heating quartz body 200.

4 and 5, a plurality of cooling fins 320 may be formed inside the cooling tube 310. The cooling fins 320 may be formed of a plurality of protrusions to increase a surface area in order to dissipate heat emitted from the high-temperature air flowing through the cooling pipe 310 to the outside.

Meanwhile, the ozone removal apparatus 10 according to an embodiment of the present invention may further include a filter 400 and a fan 500.

The filter 400 may be connected to the rear end of the cooling unit 300. The filter 400 may remove the residual amount of ozone from the air discharged from the cooling unit 300. That is, when there is a trace amount of ozone that has not been pyrolyzed in the heating quartz body 200, the filter 400 may remove it. Here, the filter 400 may include an ozone adsorbent to remove ozone.

For example, the filter 400 may be a carbon filter. As another example, the filter 400 may include an ozone adsorbent such as activated carbon. Thereby, the filter 400 may discharge oxygen by removing residual ozone that has not been removed from the heating quartz body 200.

The fan 500 may control the flow rate of air introduced into the surface modification treatment apparatus 100 or ozone generated in the surface modification treatment apparatus 100. The fan 500 may be connected to the rear end of the filter 400.

As an example, the fan 500 may be driven at a low speed when ozone is generated in the surface modification treatment apparatus 100, that is, during the surface modification treatment. In addition, the fan 500 may be driven at high speed when ozone is discharged from the surface modification treatment apparatus 100, that is, after the surface modification treatment.

Although not shown in the drawing, the ozone removal apparatus 10 may further include a control unit for driving the fan 500 and controlling the surface modification treatment apparatus 100. Here, the control unit may control the speed of the fan 500 to maintain the ozone concentration of the surface modification treatment apparatus 100 within a predetermined range. That is, the speed of the fan 500 may be controlled to control the amount of air introduced into the surface modification treatment apparatus 100.

Hereinafter, the surface modification treatment apparatus 100 will be described in more detail with reference to FIGS. 6 to 8.

6 is an exploded perspective view of the surface modification treatment apparatus of FIG. 1, FIG. 7 is a vertical cross-sectional view of FIG. 6, and FIG. 8 is a horizontal cross-sectional view of FIG. 6.

1 and 6 to 8, the surface modification treatment apparatus 100 according to an embodiment of the present invention may be an ultraviolet discharge lamp device. Here, the surface modification treatment apparatus 100 includes an internal electrode 110, an ultraviolet discharge container 120, an external electrode 130, an ampoule holder 140, and an ampoule 150.

The internal electrodes 110 may be provided in a pair on both sides of the hollow portion 121 of the ultraviolet discharge container 120. In addition, the internal electrode 110 may have a cylindrical shape having a hollow portion 112. Here, the internal electrode 110 may be provided on the inner surface of the inner tube 123.

At this time, a void 110c may be formed between the first inner electrode 110a and the second inner electrode 110b so that the implant fixture 1 is disposed. That is, the first internal electrode 110a and the second internal electrode 110b may be separated at a predetermined interval so that the implant fixture 1 is disposed in the gap 110c therebetween.

Here, the UV light generated by the discharge gas charged in the ultraviolet discharge container 120 passes through the gap 110c between the pair of internal electrodes 110a and 110b, and the hollow portion 121 of the ultraviolet discharge container 120 Radiates inward.

Accordingly, since the UV light generated in the gas filling region 122 is not blocked by the internal electrode 110 and is directly radiated to the hollow portion 121 of the ultraviolet discharge container 120, it is uniform to the implant fixture 1 Can be investigated. In addition, a larger amount of UV light energy may be irradiated compared to the case where the internal electrode 110 is present around the implant fixture 1. Therefore, the surface modification of the implant fixture 1 is uniformly performed, and the surface modification treatment time can be rapidly shortened.

Here, the power supply line 111 may be connected to the internal electrode 110 so that power can be supplied from the outside. In the drawing, the first inner electrode 110a is not shown to be connected to the power supply line 111 through an extension line with the second inner electrode 110b, but the first inner electrode 110a and the second inner electrode 110b Each may be connected to the power supply line 111.

Alternatively, the internal electrode 110 may be integrally formed. At this time, the internal electrode 110 may have a plurality of light-transmitting portions formed in a mesh shape, a grid pattern shape, or the like. UV light generated in the gas filling region 122 may be radiated into the inner electrode 110 through the light transmitting part.

The ultraviolet discharge container 120 is filled with a discharge gas that generates UV light, and has a double tube structure including an inner tube 123 and an outer tube. That is, the ultraviolet discharge container 120 has a cylindrical structure having a hollow portion 121 in the center as a whole. Here, a gas filling region 122 is formed between the inner tube 123 and the outer tube to be filled with a discharge gas generating UV light.

Here, the gas filling region 122 may be sealed to be filled with a discharge gas. In addition, one side of the hollow part 121 may be open so that the implant fixture 1 is inserted through the ampoule holder 140.

In addition, the hollow part 121 may be closed by means such as a cover so that the other side of the hollow part 121 is sealed when the implant fixture 1 is inserted. In this case, an air flow port may be formed in the cover so that air can be introduced from the outside into the hollow portion 121 of the ultraviolet discharge container 120.

Here, the discharge gas filled in the gas filling region 122 may change energy by electric energy applied to the internal electrode 110 and the external electrode 130. Therefore, UV light is generated by the discharge gas.

At this time, the discharge gas may include Xe (wavelength 172 nm), ArF (wavelength 193 nm), KrCl (wavelength 222 nm), KrF (wavelength 248 nm), XeCl (wavelength 308 nm), or XeF (wavelength 351 nm). A discharge gas that generates excimer UV light may be used.

In addition, the discharge gas may be a material capable of generating light in the UVC wavelength range (100 nm to 280 nm) or vacuum UV range.

Preferably, excimer UV light of 172 nm may be used as the discharge gas. In this case, the surface modification treatment of the implant fixture 1 may be performed in 5 to 40 seconds.

The external electrode 130 is provided along the outer surface of the outer tube of the ultraviolet discharge container 120. In addition, the external electrode 130 may have a cylindrical structure having a hollow portion 131.

Here, the external electrode 130 functions to reflect UV light generated by the discharge gas in the gas-filled region 122 into the hollow portion 121 of the ultraviolet discharge container 120. In this case, the external electrode 130 may be mirror-treated to reflect UV light.

In addition, the external electrode 130 may have a thin foil shape or a mesh shape. However, the present invention is not limited thereto, and the external electrode 130 may be used regardless of its shape as long as it is a conductive material for causing discharge.

Optionally, the external electrode 130 may further include a heat sink for cooling the ultraviolet discharge container 120. Here, the heat sink may be provided outside the external electrode 130. For example, the heat sink may have a cylindrical structure surrounding the external electrode 130. Optionally, the heat sink may include a protruding structure to increase the surface area for effective cooling.

The ampoule holder 140 is for inserting the implant fixture 1 into the ultraviolet discharge container 120, and the implant fixture 1 is positioned in the void 110c between the pair of internal electrodes 110a and 110b. It is possible to support the implant fixture (1) as possible.

At this time, the ampoule holder 140 may be inserted into the inner side of the pair of internal electrodes 110a and 110b to be coupled in a state capable of reciprocating movement in the insertion direction. That is, the ampoule holder 140 moves upward from the inside of the pair of internal electrodes 110a and 110b to expose the upper end to the upper side of the combination structure of the internal electrode 110, the ultraviolet discharge vessel 120, and the external electrode 30 Can be.

In addition, the ampoule holder 140 includes an ampoule 150 that fixes the implant fixture 1 on the exposed upper end, and moves downward while the implant fixture 1 is fixed to the ampoule to move the implant fixture ( 1) may be introduced into the hollow part 112 of the internal electrode 110.

In addition, the ampoule holder 140 may be made of a material that does not affect the surface material of the implant fixture 1. As an example, the ampoule holder 140 may be made of a ceramic material so as not to react with UV light emitted from the gas filling region 122 and ozone generated by the UV light.

In addition, the ampoule holder 140 may include an air flow port 141 through which air is introduced and discharged along the longitudinal direction in the center. Here, the air flow port 141 may allow air to flow into the interior of the internal electrode 110 or into the ampoule in which the implant fixture 1 is accommodated.

Thereby, the ozone generation concentration can be adjusted so that ozone generated by UV light irradiation is limited to the vicinity of the implant fixture 1, that is, in a required space.

Optionally, the ampoule holder 140 may rotate inside the pair of internal electrodes 110a and 110b. Here, the ampoule holder 140 may be controlled by the control unit 400 to rotate, rise and fall.

The ampoule 150 accommodates the implant fixture 1 and is for inserting the implant fixture 1 into the ultraviolet discharge container 120. The ampoule 150 may be in the form of a capsule with a cap 153.

In addition, the ampoule 150 is installed on the upper end of the ampoule holder 140, and may be mounted or detached from the ampoule holder 140 by raising or lowering the ampoule holder 140. Here, the ampoule 150 includes an ampoule body 151, a hole 152, and a cap 153.

The ampoule body 151 may be made of a material that transmits UV light generated in the gas filling region 122. For example, the ampoule body 151 may be made of a quartz glass material. Preferably, the ampoule body 151 may be made of a synthetic quartz glass material having a transmittance of 60% or more at 172 nm based on a 1 mm thick quartz glass.

The hole 152 may be formed in the ampoule body 151 or the cap 153. These holes allow fluid flow such as air or ozone.

The cap 153 may have a hole through which fluid can flow. Here, the caps 153 may be provided on both sides or one side of the ampoule body 151 (eg, opposite sides of the ampoule holder 140 ).

In this way, since the implant fixture 1 is not withdrawn from the ampoule 150 and the surface modification treatment is possible while being accommodated in the ampoule 150, contamination of the implant fixture 1 that may occur during the surface modification process is prevented. Can be prevented.

Hereinafter, the operation of the ozone removal apparatus 10 according to an embodiment of the present invention will be described in more detail with reference to FIG. 1.

First, the implant fixture 1, which is an object to be treated, may be inserted into the surface modification treatment apparatus 100 while being accommodated in the ampoule 150. At this time, when the ampoule holder 140 rises and is exposed to the upper end of the ultraviolet discharge container 120, the ampoule 150 containing the implant fixture 1 is mounted on the ampoule holder 140. After the ampoule holder 140 in which the ampoule 150 is mounted is lowered and moved to the interior of the ultraviolet discharge container 120, a surface modification treatment is performed.

At this time, when power is applied to the internal electrode 110 and the external electrode 130, UV light is generated by the discharge gas filled in the gas filling region 122. Here, preferably, vacuum UV light having a wavelength of 200 nm or less may be generated, and more preferably, excimer UV light having a wavelength of 172 nm may be generated.

In addition, the UV light is reflected by an ultraviolet reflective film formed inside the ultraviolet discharge container 120 or an external electrode 130 formed outside the ultraviolet discharge container 120 and is condensed into the hollow portion 121.

As described above, the UV light generated in the gas filling region 122 is radiated into the hollow portion 121 of the ultraviolet discharge container 120 through the gap 110c between the pair of internal electrodes 110a and 110b. Optionally, UV light is radiated into the hollow portion 121 through the light transmitting portion of the internal electrode 110.

Here, the UV light passes through the ampoule 150 and is radiated to the implant fixture 1, whereby the surface modification treatment of the implant fixture 1 may be performed.

At this time, the fan 500 is operated. Air is introduced into the ultraviolet discharge container 120 from the top of the ultraviolet discharge container 120 by the operation of the fan 500.

Here, the fan 500 is operated at the same time as the UV lamp of the surface modification treatment apparatus 100 is turned on, and is stopped after about 1 to 5 seconds after the UV lamp is turned off. This takes into account the time at which air introduced into the surface modification treatment apparatus 100 is generated as ozone, used for surface modification treatment, and then pyrolyzed and finally discharged.

Here, UV light reacts with oxygen contained in the air to generate ozone. In this case, contaminants such as organic matter attached to the surface of the implant fixture 1 may be removed by contact with UV light and ozone generated by UV light.

Ozone from which the contaminants of the implant fixture 1 have been removed may be introduced through the inlet pipe 203 of the heating quartz body 200 through the ampoule holder 140 and the connection pipe 160. At this time, while ozone passes through the fluid passage 220 of the heating quartz body 200, it may be thermally decomposed by heat from the heating source 210.

In this way, the heated air in the pyrolysis section may be introduced into the cooling unit 300 and cooled to room temperature.

Thereafter, the cooled air may remove residual ozone through the filter 400. That is, the filter 400 may remove ozone that may remain in the pyrolysis process using the ozone adsorbent. At this time, oxygen converted from ozone by the fan 500 may be discharged to the outside.

With such a configuration, the ozone removal apparatus 10 of the present invention can prevent the human body from being exposed to ozone by discharging ozone to the atmosphere below the emission limit, thereby ensuring safety.

Although an embodiment of the present invention has been described above, the spirit of the present invention is not limited to the embodiment presented in the present specification, and those skilled in the art who understand the spirit of the present invention can add components within the scope of the same idea Other embodiments may be easily proposed by changes, deletions, additions, etc., but it will also be said to fall within the scope of the present invention.

10: ozone removal device 100: surface modification treatment device
110: internal electrode 120: ultraviolet discharge container
130: external electrode 140: ampoule holder
150: ampoule 160: connector
200: heating quartz body 201: double quartz tube
202: hollow part 203: inlet pipe
204: discharge pipe 210: heating source
220: fluid passage 230: heat shield reflector
300: cooling unit 310: cooling pipe
320: cooling fin 330: flow path
400: filter 500: fan
1: Implant fixture

Claims (18)

A heating quartz body including a quartz tube and a heating source in which a fluid flow path is formed, and thermally decomposes ozone that is discharged from a surface modification treatment apparatus of a target object and introduced through the fluid flow path by the heating source; And
Ozone removal device comprising a; cooling unit for cooling the air exhausted by pyrolysis in the heating quartz body. The method of claim 1,
The heating quartz body is an ozone removal device for pyrolyzing the ozone so that the ozone concentration is less than 0.05 ppm. The method of claim 1,
The heating source is an ozone removal device that generates heat at a temperature of 200 ~ 900 ℃. The method of claim 1,
The heating source is an ozone removal device comprising a halogen lamp. The method of claim 1,
The heating source is an ozone removal device including a ceramic heater. The method of claim 1,
The quartz tube,
An inner tube provided with the heating source;
An outer tube in which the fluid flow path is formed between the inner tube;
An inlet pipe through which the ozone flows into the fluid passage; And
An ozone removal apparatus comprising a discharge pipe through which the pyrolyzed air is discharged from the fluid passage. The method of claim 1,
The quartz tube,
A receiving portion provided inside the fluid passage and in which the heating source is embedded;
An inlet pipe through which the ozone flows into the fluid passage; And
An ozone removal apparatus comprising a discharge pipe through which the pyrolyzed air is discharged from the fluid passage. The method of claim 1,
The heating quartz body further comprises a heat shield reflector provided along the outer periphery. The method of claim 6,
The heat shielding reflector is an ozone removal device in the form of a foil of aluminum or stainless steel. The method of claim 1,
An ozone removal device further comprising a filter for removing residual ozone from the air discharged from the cooling unit. The method of claim 10,
The filter is an ozone removal device containing an ozone adsorbent. The method of claim 1,
The cooling unit is an ozone removal device having an air-cooled structure. The method of claim 12,
The cooling unit is an ozone removal device provided with a flow path having a radiator structure. The method of claim 1,
An ozone removal device further comprising a fan for adjusting the flow rate of the air or the ozone. The method of claim 1,
The object to be treated is an apparatus for removing ozone that is an implant fixture. The method of claim 1,
The surface modification treatment apparatus is an ultraviolet discharge lamp device that generates UV light by discharge gas and generates ozone by the UV light. The method of claim 16,
The UV light is an excimer UV light ozone removal device. The method of claim 16,
The surface modification treatment device,
An ultraviolet discharge container filled with the discharge gas generating the UV light and having a double cylindrical structure;
An internal electrode and an external electrode provided inside the inner tube and outside the outer tube of the ultraviolet discharge container; And
An ozone removal apparatus including an ampoule holder inserted into the inner electrode to support the object to be processed.

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