KR20200095018A - Gradation film and preparation method thereof - Google Patents

Abstract

The present invention relates to a gradation film and a manufacturing method thereof, wherein the manufacturing method of the gradation film can form a single layer or a multi-layered inorganic material deposition layer on one surface of a base film by a roll-to-roll sputtering process. In addition, when forming the inorganic material deposition layer, various types of masks are provided on the material target to mask the material target at different ratios, thereby forming the inorganic material deposition layer having a different thickness in the width direction of the base film, and the inorganic deposition layer formed in this way has different colors, but has little color deviation, so that a gradient color can be realized. Therefore, the gradation film can be applied to various fields such as displays, automobiles, and home appliances to improve the aesthetics of the exterior.

Description

Gradation film and its manufacturing method {GRADATION FILM AND PREPARATION METHOD THEREOF}

The present invention relates to a gradient film and a method of manufacturing the same.

The technology in the electric and electronic communication field is changing day by day, and accordingly, electronic products of various designs are being released. In such an electronic product, the case and/or the decoration film (hereinafter, referred to as “deco film”) constituting the exterior needs to meet the design of color, pattern, and gloss in consideration of the user's aesthetic as well as its natural protection function.

In the past, most of the deco films that implement only one color have been used, but as the demand for implementing various colors has increased recently, an example of applying a gradation method to a deco film has been introduced (Korean Patent Publication No. 2018-0109360). However, the decor film disclosed in the patent includes a multi-layered gradation layer including a plurality of gradation layers exhibiting different gradation effects, and a color layer must be formed for each of the gradation layers. It is manufactured by separately forming a light reflective layer including, and has a disadvantage in that not only has a complex structure, but also the process is not simple.

Korean Patent Application Publication No. 2018-0109360

Accordingly, an object of the present invention is to provide a gradation film capable of implementing various colors, and a method of manufacturing the gradation film more simply using a continuous roll-to-roll process.

In order to achieve the above object, in the present invention, in continuously forming an inorganic deposition layer on one side of the base film by roll-to-roll sputtering a raw material target to the base film, the thickness of the inorganic material deposition layer is different in the width direction of the base film. It provides a method for producing a gradient film.

In order to achieve the above other object, the present invention is prepared by the above method, (a) a base film and (b) formed on one side of the base film and laminated with an inorganic deposition layer having a different thickness in the width direction of the base film. Included in the form, to provide a gradation film.

According to the manufacturing method of the gradation film of the present invention, it is possible to form a single layer or a multi-layered inorganic material deposition layer on one surface of a base film by a roll-to-roll sputtering process. In addition, when forming the inorganic material deposition layer, an inorganic material deposition layer having a different thickness in the width direction of the base film can be formed by placing various types of masks on the material target to mask the material target at different ratios. The layers have different colors, but there is little color deviation, so it is possible to implement a gradation color. Therefore, the gradation film can be applied to various fields such as displays, automobiles, and home appliances to improve the aesthetics of the exterior.

1 is a schematic diagram of a gradient film according to an embodiment of the present invention.
2 is a schematic diagram of a sputtering process for manufacturing a gradation film according to an embodiment of the present invention, showing positions of a base film 300, a raw material target 400, and a mask 500.
3 is a schematic diagram showing that the mask 500 masks the raw material target 400 at different levels, and a full masked portion 510, a half masked portion 520 and a non-masked portion 530 of the mask 500 Respectively.
4 is a schematic diagram showing a state in which masks 600, 700, 800, and 900 of different shapes are placed on the raw material target 400, respectively.

The present invention is not limited to the contents disclosed below, and may be modified in various forms unless the gist of the invention is changed.

In the present specification, "including" means that other components may be further included unless otherwise specified. In addition, all numbers and expressions representing amounts of components, reaction conditions, and the like described in the present specification are to be understood as being modified by the term "about" in all cases unless otherwise specified.

Manufacturing method

The present invention is a method for producing a gradient film in which the thickness of the inorganic material deposition layer is changed in the width direction of the base film in successively forming an inorganic material deposition layer on one side of the base film by roll-to-roll sputtering of a raw material target to the base film Provides.

Hereinafter, the present invention will be described in detail with reference to the drawings.

According to the manufacturing method, the mask 500 is positioned between the base film 300 and the raw material target 400, but the level at which the mask 500 masks the raw material target 400 is determined by the level of the base film 300. By varying in the width direction, the thickness of the inorganic material deposition layer can be changed in the width direction of the base film 300.

Specifically, by gradually increasing or decreasing the width of the 　the 　mask in the width direction of the base film 300, the level at which the 　mask masks the raw material target may be gradually increased or decreased.

More specifically, referring to FIGS. 3 and 4, it can be seen that the shapes of the masks 500 to 900 posted on the raw material target 400 are various. That is, by applying various types of masks to the raw material target 400, the masked portion of the raw material target 400 and the masked level (degree) can be changed, so the inorganic material deposition layer formed on one surface of the base film 300 The thickness of the base film 300 may be formed differently in the width direction of the base film 300.

For example, the level of masking of the raw material target 400 may vary according to the applied mask type, and the mask 500 includes a full masking portion 510 and a half masking portion 520 ), and a portion 530 that does not mask (No masking).

The base film 300 is polypropylene (PP), polyethylene (PE), polystyrene (PS), acrylonitrile-butadiene-styrene copolymer (ABS), polycarbonate (PC), polyoxymethylene (POM), Polyamide (PA), polypropylene oxide (PPO), polybutylene terephthalate (PBT), polyethylene terephthalate (PET), polyvinyl chloride (PVC), polymethyl methacrylate (PMMA), polytetrafluoroethylene (PTFE), polyetheretherketone (PEEK), polyphenylene sulfide (PPS), polyimide (PI), polyamide-imide (PAI), and polyethyleneimide (PEI). Can be, specifically, it may be a PET material.

The raw material target 400 may include various inorganic materials, and specifically, may be at least one selected from the group consisting of niobium (Nb), silicon (Si), and indium (In).

The sputtering is, 5 x 10 ^{- 10} torr to about 5 x 10 ^-1 torr and then under a vacuum injection of an inert gas such as argon (Ar), helium (He) to said target material (400), from 5 to 50 KW, Alternatively, it may be performed by applying a voltage of 5 to 30 KW. Under the above conditions, each of the raw materials may be continuously sputtered from the raw material target 400 to one surface of the base film 300 by sputtering to be deposited.

Oxygen gas may be additionally injected into the raw material target 400. Specifically, the oxygen gas may be injected into the raw material target 400 in an amount of 5 to 20 sccm, or 10 to 15 sccm.

As oxygen gas is injected into the raw material target 400 together, the inorganic material is oxidized during sputtering and may be deposited on the base film 300 in an oxide state such as NbO, NbO ₂ , SiO, SiO ₂ , InO, etc. .

The inorganic material deposition layer having a thickness gradient may be formed as a single layer on one surface of the base film 300, or may be formed as a multilayer by sequentially arranging the raw material targets 400 and repeatedly performing sputtering. Alternatively, after sputtering without applying a mask to the raw material target 400 to form an inorganic material layer or an inorganic material oxide layer without a thickness gradient, an inorganic material deposited layer having a thickness gradient may be formed.

The inorganic material deposition layer may be formed more easily and quickly on one surface of the base film 300 by such a continuous roll-to-roll process. In addition, it is possible to form various inorganic material deposition layers having a desired color by simply changing the types of the raw material target 400 and the mask 500.

If necessary, prior to the formation of the inorganic material deposition layer, a metal layer or metal oxide layer without a thickness gradient may be formed on one side of the base film 300 through a roll-to-roll sputtering process, and after the formation of the inorganic material deposition layer It can also be formed on the other side of the inorganic material deposition layer.

The manufacturing method of the gradation film may further include the step of forming the shielding layer 100. Since the shielding layer 100 can also be continuously performed by a roll-to-roll process, the process time and work degree are not reduced. . The shielding layer 100 may include a material commonly used for shielding purposes, and may have a thickness in a typical range.

gradation film

The present invention is prepared in the same manner as described above, and includes (a) a base film and (b) an inorganic deposition layer formed on one side of the base film and having a different thickness in the width direction of the base film in a laminated form, Provides a gradient film.

The base film (a) serves as a support in the gradation film, and specific types are as listed above. The base film (a) is not limited as long as it can be used in a roll-to-roll process, and may specifically be a film wound in a roll form. The base film (a) may have a thickness of 20 to 100 μm, or 30 to 80 μm.

The gradation film may include a single layer or a multi-layered inorganic material deposition layer (b) on one surface of the base film (a). In this case, the inorganic material deposition layer (b) may have a different thickness in the width direction of the base film (a) by a roll-to-roll sputtering process as described above.

The inorganic material deposition layer (b) may have a thickness of 50 to 400 nm, 50 to 300 nm, 100 to 300 nm, or 150 to 300 nm.

As described above, the inorganic material deposition layer (b) may include an inorganic material, an inorganic material oxide, or both.

The inorganic material deposition layer (b) can provide various colors by controlling brightness and/or saturation in various ways, as well as providing a gradation effect with little color deviation (see Evaluation Example).

The gradient film may include one or more layers of a metal layer, a metal oxide layer, or both between the base film (a) and the inorganic material deposition layer (b). Alternatively, when the inorganic material deposition layer (b) is included in multiple layers, the metal layer, the metal oxide layer, or both may be included between a plurality of inorganic material deposition layers.

The gradation film may further include a shielding layer on the other surface of the inorganic material deposition layer. The shielding layer may include, without limitation, colored pigments or dyes having a shielding effect at a color or wavelength to be blocked.

For example, according to FIG. 1, in the gradation film, a metal layer or metal oxide layer 220, 230, 240, and an inorganic material deposition layer 210 are sequentially stacked on one surface of the base film 300, and then a shielding layer ( 100) may be additionally stacked.

As described above, in the method of manufacturing a gradient film according to the present invention, it is possible to form a single layer or a multilayer inorganic material deposition layer on one surface of the base film by a roll-to-roll sputtering process. In addition, when forming the inorganic material deposition layer, an inorganic material deposition layer having a different thickness in the width direction of the base film can be formed by placing various types of masks on the material target and masking the material target at different ratios. The layers have different colors, but there is little color deviation, so it is possible to implement a gradation color. Therefore, the gradation film can be applied to various fields such as displays, automobiles, and home appliances to improve the aesthetics of the exterior.

The above contents will be described in more detail by the following examples. However, the following examples are only for illustrating the present invention, and the scope of the examples is not limited to these.

Example : gradation Production of film

A polyethylene terephthalate (PET) film (50 μm, U483, Toray) was prepared as a base film.

As a raw material target, a niobium target 5, an indium target 4, a niobium target 3, a silicon target 2, and a niobium target 1 were prepared and sequentially arranged. , On the last niobium target 1, a mask having a shape as shown in FIG. 3 (200 mm wide x 300 mm long) having a full masked portion, a half masked portion, and an unmasked portion was placed (see FIG. 3).

After the base film was introduced into a roll-to-roll machine, when the vacuum degree reached 5 x 10 ^-6 torr by pumping for 3 hours, a total of 3,000 sccm was added by 600 sccm of argon (Ar) to each of the raw material targets. Then, film running was started, and as shown in Table 1 below, oxygen was added while voltage was applied to adjust the thickness of each to form a deposition layer to prepare a gradient film.

Raw material target Voltage(KW) Oxygen amount (sccm) Thickness (nm) Evaporation layer One Niobium 26 14 39~61 NbO 2 silicon 8 10 9 SiO 3 Niobium 16 14 39 NbO 4 indium 5 0 30 In 5 Niobium 15 13 30 NbO

Evaluation example : Color coordinates evaluation

For the gradation film prepared in the above example, the reflected light of the outermost deposition layer, that is, the inorganic deposition layer, was measured using the CM3600D model of Konica Minolta, and the results are shown in color coordinates in Table 2 below.

Outermost inorganic deposit layer
(NbO layer) thickness (nm) Color coordinates L* a* b* Condition 1 Masking X 61 49 17 -2 Condition 2 Half masking 50 49 14 -10 Condition 3 Full masking 39 50 9 -14

Looking at the results in Table 2, L* (brightness-related constant) showed similar levels in both full-, half-, and no masking conditions, but a*(+red/green-) and b*( +Yellow/blue-) values represent positive values (red area) and negative values (blue area), respectively, to implement red and blue colors, respectively, but the lighter and darker degree of color depends on the degree to which the raw material target is masked. It was confirmed that another, that is, a gradient layer was formed.

100: shielding layer
210: inorganic material deposition layer
220, 230, 240: metal layer or metal oxide layer
300: base film
400: raw material target
500, 600, 700, 800, 900: mask
510: full masking part, 520: half masking part, 530: no masking part

Claims (13)

In continuously forming an inorganic material deposition layer on one side of the base film by sputtering a raw material target with respect to the base film by roll-to-roll,
A method of manufacturing a gradient film, wherein the thickness of the inorganic material deposition layer is varied in the width direction of the base film. The method of claim 1,
By placing a mask between the base film and the raw material target, and varying the level at which the mask masks the raw material target in the width direction of the base film, the thickness of the inorganic material deposition layer is changed in the width direction of the base film. , Method for producing a gradient film. According to claim 2,
By gradually increasing or decreasing the width of the mask in the width direction of the base film, the level at which the mask masks the raw material target is gradually increased or decreased. The method of claim 1,
The base film is polypropylene (PP), polyethylene (PE), polystyrene (PS), acrylonitrile-butadiene-styrene copolymer (ABS), polycarbonate (PC), polyoxymethylene (POM), polyamide ( PA), polypropylene oxide (PPO), polybutylene terephthalate (PBT), polyethylene terephthalate (PET), polyvinyl chloride (PVC), polymethyl methacrylate (PMMA), polytetrafluoroethylene (PTFE) , Polyetheretherketone (PEEK), polyphenylene sulfide (PPS), polyimide (PI), polyamide-imide (PAI) and polyethyleneimide (PEI) containing at least one selected from the group consisting of, gradient Method of making a film. The method of claim 1,
The raw material target is at least one selected from the group consisting of niobium (Nb), silicon (Si) and indium (In), a method for producing a gradient film. The method of claim 1,
The sputtering is performed by injecting an inert gas into the raw material target under vacuum and then applying a voltage of 5 to 30 KW to produce a gradient film. The method of claim 6,
A method of manufacturing a gradient film, in which oxygen gas is additionally injected into the raw material target. The method of claim 7,
Injecting the oxygen gas into the raw material target in an amount of 5 to 20 sccm, a method for producing a gradient film. The method of claim 1,
A method for producing a gradient film, in which the inorganic material deposition layer is formed as a single layer or multiple layers. A gradient film comprising (a) a base film and (b) an inorganic deposition layer formed on one surface of the base film and having a different thickness in the width direction of the base film in a laminated form. The method of claim 10,
The gradient film includes at least one layer of a metal layer, a metal oxide layer, or both between the base film and the inorganic material deposition layer. The method of claim 10,
The inorganic material deposited layer has a thickness of 50 to 400 nm, a gradient film. The method of claim 10,
The gradient film further includes a shielding layer on the other surface of the inorganic material deposition layer.

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