KR20200088528A - Pellicle mount system, stud attachment apparatus, pellicle attachment apparatus, and pellicle attachment method - Google Patents

Abstract

The present invention relates to a pellicle mounting system, which is used for mounting, a pellicle for ultra-ultraviolet lithography used as a dustproof film when manufacturing a semiconductor device, on a photomask. The present invention provides the pellicle mounting system which mounts a pellicle frame including a fixture and the pellicle including a pellicle film to the photomask, wherein the system comprises a stud attaching device configured to bring a stud into contact with the surface of the photomask and a pellicle mounting device which couples the stud and the fixture by manipulating the fixture of the pellicle.

Description

Pellicle mount system, stud attachment apparatus, pellicle attachment apparatus, and pellicle attachment method

The present invention relates to a pellicle mounting system used when mounting a pellicle for ultra-ultraviolet lithography used as an anti-vibration film when manufacturing a semiconductor device to a photo mask.

In the case of patterning a semiconductor wafer or a liquid crystal substrate in the manufacture of a semiconductor device or a liquid crystal display panel, a method called photolithography is used. In photolithography, a mask is used as the original patterning pattern, and the pattern on the mask is transferred to a wafer or a substrate for liquid crystal. When dust is attached to the mask, light is absorbed or reflected by the dust, and thus the transferred pattern is damaged, resulting in a decrease in performance or yield of semiconductor devices or liquid crystal displays. Therefore, these operations are usually performed in a clean room, but since dust is also present in the clean room, a method of attaching a pellicle is being performed to prevent dust from adhering to the mask surface. In this case, the dust is not directly attached to the surface of the mask, but is attached to the pellicle film, and in lithography, the focus is coincident on the pattern of the mask, so the dust on the pellicle is out of focus and is not transferred to the pattern.

The required resolution of the semiconductor manufacturing exposure apparatus is gradually increasing, and the wavelength of the light source is gradually shortening to realize the resolution. Specifically, the UV light source is gradually shorter in wavelength from ultraviolet light g-ray 436, I-line 365, KrF excimer laser 248, and ArF excimer laser 193 to extreme ultraviolet (EUV, extreme ultraviolet, 13.5 nm). Losing. The development of new light sources, resists, masks, and pellicles is indispensable in order to realize the exposure technology using ultra-ultraviolet rays. The conventional organic pellicle film has a problem that it is difficult to be used in pellicles for ultra-ultraviolet rays because the properties of the organic pellicle film are changed by an exposure light source having a high energy and the life is short. Various attempts have been made to solve this problem.

For example, JP 2009-0088396 discloses a pellicle made of an airgel film.

And Patent Publication No. 2009-0122114 discloses a pellicle for ultra-ultraviolet rays, comprising a pellicle film made of a silicon single crystal film and a base substrate supporting the pellicle film, wherein the base substrate forms an opening of 60% or more. .

However, in the pellicle for ultra-ultraviolet rays disclosed in Japanese Patent Publication No. 2009-0122114, a silicon single crystal film must be formed as a thin film in order to transmit ultra-ultraviolet rays. Since the silicon single crystal thin film can be easily damaged even by a small impact, a base substrate for supporting it is used. The reinforcement frame of the base substrate forms a constant pattern, and there is a problem that the pattern is transferred to the substrate in a lithography process. In addition, there is a problem that the transmittance is very low, about 60%.

Since ultra-ultraviolet rays have a short wavelength, energy is very high, and since the transmittance is low, a considerable amount of energy is absorbed by the pellicle film and the base substrate, and the pellicle film and the base substrate may be heated. Therefore, if the materials of the pellicle film and the base substrate are different from each other, there is also a problem that deformation may occur due to a difference in thermal expansion due to heat generated in the lithography process.

Also disclosed is a method of using a freestanding pellicle that does not use a separate base substrate to reinforce the pellicle film.

For example, Patent No. 1552940 filed and registered by the present applicant discloses a method of forming a graphite thin film on a nickel foil and then etching the nickel foil using an aqueous solution containing iron chloride to obtain a separated graphite thin film. have.

In addition, Patent No. 1303795, filed and registered by the applicant, discloses a method of forming a zirconium or molybdenum metal thin film layer on an organic material substrate and dissolving the organic material substrate using a solvent to obtain a pellicle film.

In addition, with the introduction of a photolithography process using ultra-ultraviolet rays, new attempts have been made in a method of attaching a pellicle to a photomask.

Conventionally, the pellicle was attached to the photomask using an adhesive applied to the pellicle frame. However, since the photomask used in the photolithography process using ultra-ultraviolet rays has a very high flatness required, a change in the flatness of the photomask occurring in the process of pressing the pellicle and attaching it to the photomask may be fatal. If the value of'Pelicle Induced Distortion (PID)' becomes greater than a certain level, correction becomes impossible, and this leads to an overlay failure in which semiconductor devices are not aligned between layers, so that a semiconductor chip can be produced. There will be no.

In order to improve this problem, in Korean Patent Publication Nos. 2017-0088379 and 2017-0085118, an interlocking mechanism configured to engage a stud that is a protrusion attached to a photo mask is installed in a pellicle frame Disclosed is a pellicle for ultraviolet light and a system for mounting it on a photomask.

Unlike the conventional pellicle, the pellicle for ultra-ultraviolet rays is coupled to the photomask by fitting a stud attached to the photomask to the engagement mechanism. Therefore,'pellicle induced distortion (PID)' can be minimized.

The mounting system disclosed in Korean Patent Publication No. 2017-0085118 includes a stud attachment device and a pellicle attachment device (described in Korean Patent Publication No. 2017-0085118 as a pellicle frame attachment device). The stud attachment device is configured to contact the stud with the adhesive applied to the surface of the photo mask. The stud attachment device includes a manipulator that supports the stud and an actuator that moves the manipulator up and down. In addition, a coil spring is installed in the manipulator to serve as a buffer when the stud contacts the photo mask. However, in the process of buffering, the coil spring comes into contact with surrounding parts, and there is a problem that particles may be generated in this process. In addition, since such particles can contaminate the mask, the stud attachment device disclosed in Korean Patent Publication No. 2017-0085118 requires a complicated structure such as a partition wall for separating the stud attachment device from the controlled environment accommodating the photo mask. There is this.

In addition, the pellicle attachment device disclosed in Korean Patent Publication No. 2017-0085118 has a complicated structure including hook-like members, pins, and manipulator pins, as shown in FIG. 14 of Korean Patent Publication No. 2017-0085118, and the pellicle fixture In order to combine the studs of the photo mask and the problem, there is a problem that the complicated steps of FIGS. 18A to 18H of 2017-0085118 are required. In particular, using a pair of hook-like members and a pin, a complex step such as fixing each fixture and again separating a pair of hook-like members and a pin from each fixture can be performed. There was a problem to go through.

Published Patent No. 2009-0088396 Published Patent No. 2009-0122114 Patent No. 1552940 Registered Patent No. 1303795 Published Patent No. 2017-0088379 Published Patent No. 2017-0085118

The present invention aims to provide a pellicle mounting system that is relatively simple in structure and can prevent the generation of particles, to improve the above-described problems.

In order to achieve the above object, the present invention is a pellicle mounting system for mounting a pellicle comprising a pellicle frame and a pellicle film with a fixture to a photomask, a stud attachment device configured to contact a stud to the surface of the photomask And, it provides a pellicle mounting system including a pellicle mounting device for manipulating the fixture of the pellicle to combine the stud and the fixture.

Here, the stud attachment device,

A manipulator body having a first permanent magnet having alternating magnetic poles of N polarity and S polarity along its periphery as a cylindrical manipulator body, and a stud cup coupled to the manipulator body and on which the stud is seated A stud manipulator having a manipulator head provided,

As a hollow support structure to which the body of the stud manipulator is fitted, a second permanent magnet having alternating magnetic poles of N polarity and magnetic poles of S polarity is installed on its inner circumferential surface,

A two-dimensional stator disposed under the support structure and having a moving surface,

Is coupled to the support structure, and includes a mover (forcer) to move along the moving surface in a state spaced from the moving surface,

When the manipulator body moves linearly, a magnetic force is applied between the first permanent magnet and the second permanent magnet in a direction in which the manipulator body returns to its original position.

In addition, the pellicle mounting device, a gripper for fixing the photo mask to which the stud is attached, a coupling station chuck configured to fix the pellicle so that the fixture faces the stud near the side to which the stud of the photo mask is attached, A fixture manipulator having a manipulator pin configured to push the engagement tabs of the fixture to the stud side, a tracking surface on which the coupling station chuck and the fixture manipulator are installed, and the tracking surface is inclined upon contact of the stud and the fixture It provides a pellicle mounting system including an air gyro that closes the stud and the fixture while being built.

In addition, the present invention is a stud attachment device configured to contact a stud on a surface of a photomask, a first permanent magnet having alternating magnetic poles of N polarity and S polarity along its periphery as a cylindrical manipulator body. A manipulator body having a manipulator body, a stud manipulator having a manipulator head having a stud cup on which the stud is seated and coupled to the manipulator body, and a hollow support structure in which the body of the stud manipulator is fitted, N polarity A second permanent magnet having alternating magnetic poles and magnetic poles of S polarity is installed on the inner circumferential surface thereof, a two-dimensional stator disposed below the support structure, and formed with a moving surface, coupled to the support structure And includes a forcer moving along the moving surface in a state spaced apart from the moving surface, and when the manipulator body moves linearly, the first permanent magnet and the second in the direction in which the manipulator body returns to its original position Provided is a stud attachment device in which a magnetic force is applied between permanent magnets.

In addition, the present invention is a pellicle mounting device that combines the fixture and a stud attached to a photo mask by manipulating a fixture of the pellicle, a gripper for fixing the photo mask to which the stud is attached, and a stud of the photo mask is attached. A fixture manipulator having a coupling station chuck configured to secure the pellicle so that the fixture faces the stud near a surface, and a manipulator pin configured to push the engagement tabs of the fixture to the stud side, and the coupling station chuck and the fixture manipulator It provides a pellicle mounting device including an air gyro having a tracking surface to be installed and in contact with the stud and the fixture while the tracking surface is inclined when the stud contacts the fixture.

In addition, the present invention is a pellicle mounting method of combining a plurality of studs attached to a photo mask by manipulating a plurality of fixtures of the pellicle, respectively, comprising the steps of disposing a photo mask with a plurality of studs attached, Aligning and fixing the pellicle with respect to the photo mask so that the fixtures face the studs, pushing the engaging tabs of each fixture to the corresponding stud side using manipulator pins, and pushing the fixtures to the studs Moving the pellicle so that the head of each stud is located in a gap between the engaging tabs and the cap of the corresponding fixture, and the heads of the studs each contact the cap of the corresponding fixture. The step of moving the pellicle until, and the step of adhering each of the caps of the fixtures to the head of the corresponding stud using an air gyro, and lowering the manipulator pin to correspond to each of the engagement tabs of the fixture A method of mounting a pellicle comprising contacting the opposite side of the head of the stud.

The pellicle mounting system of the present invention is relatively simple in structure and can prevent particle generation.

1 is a schematic diagram of a pellicle mounting system according to an embodiment of the present invention.
FIG. 2 is a schematic view of the stud attachment device shown in FIG. 1.
3 is a perspective view of the stud shown in FIG. 1.
4 is a cross-sectional view of the stud manipulator and support structure shown in FIG. 2.
5 is a schematic view of the pellicle mounting apparatus shown in FIG. 1.
6 is a perspective view illustrating an example of the pellicle shown in FIG. 1.
7 to 10 are diagrams for explaining a method of engaging the fixture and the stud.

Hereinafter, preferred embodiments of the present invention will be described in detail based on the accompanying drawings. The following examples are provided as examples to ensure that the spirit of the present invention is sufficiently conveyed to those skilled in the art. Therefore, the present invention is not limited to the embodiments described below and may be embodied in other forms. In addition, in the drawings, the width, length, and thickness of components may be exaggerated for convenience. Throughout the specification, the same reference numbers refer to the same components.

1 is a schematic diagram of a pellicle mounting system according to an embodiment of the present invention. As shown in FIG. 1, the pellicle mounting system includes a stud attachment device 100 and a pellicle mounting device 200.

The stud attachment device 100 is used to attach the stud 6 to one side of the photo mask M. The pellicle mounting device 200 serves to mount the pellicle on the photo mask M to which the stud 6 is attached.

When the photo mask M is supplied to the pellicle mounting system while being stored in the mask pod, the mask pod is opened in a pod opening device (not shown). The photo mask M separated from the mask pod is supplied to the stud attachment device 100. In the stud attaching device 100, after applying the adhesive to the stud 6, the stud 6 is brought into close contact with one surface of the photo mask M, and then the adhesive is dried to bond the stud 6 to the photo mask M. .

The pellicle 1 having the photo mask M and the fixture 5 with the stud 6 attached is supplied to the pellicle mounting apparatus 200. The pellicle mounting apparatus 200 moves the pellicle 1 in the direction of the photomask M while operating the fixture 5, thereby inserting the pellicle 1 into a photomask (M) by inserting the stud 6 into the fixture 5. ).

FIG. 2 is a schematic view of the stud attachment device 100 shown in FIG. 1, and FIG. 3 is a perspective view of the stud 6 shown in FIG. 1. As shown in FIG. 3, the studs 6 are of a substantially disc-shaped body 61 and posts 62 and posts 62 extending from the body 61 attached to the photomask M. It includes a head 63 formed at the end. The head 63 is generally in the form of a rectangular plate, and the length of the long side is slightly smaller than the diameter of the body 61.

As shown in FIG. 2, the stud attachment device 100 includes a photo mask gripper 110, at least one stud manipulator 120, a support structure 130 equal to the number of stud manipulators 120, and a mover 140 ), the stator 150 and the support 160. In general, since four studs 6 are attached to the photomask M, the stud attachment device 100 includes four stud manipulators 120 and a support structure 130.

The photo mask gripper 110 serves to fix the photo mask (M).

Each stud manipulator 120 can move in the Z-axis direction with respect to the support structure 130, and the support structure 130 can move in the X-Y plane with respect to the stator 150. The support 160 may move in the Z-axis direction. When the support 160 moves in the direction of the photo mask M fixed by the mask support 110, the stud manipulators 120 are close to the photo mask M.

4 is a cross-sectional view of the stud manipulator 120 and the support structure 130 shown in FIG. 2. 2, the stud manipulator 120 includes a manipulator body 121 and a manipulator head 125 coupled to the manipulator body 121.

2 and 4, the manipulator body 121 is generally cylindrical. A first permanent magnet 122 is provided on the lower outer circumferential surface of the stud manipulator 120 alternately having magnetic poles of N polarity and magnetic poles of S polarity along the circumference. In addition, a heater (not shown) is installed on the head side of the manipulator body 121. The heater is used to heat and cure the adhesive applied to the stud 6.

The manipulator head 125 is coupled to the top of the manipulator body 121. In this embodiment, the manipulator head 121 is integral with the manipulator body 125. A stud cup 126 is formed in the center of the manipulator head 125 to support the stud 6. The stud cup 126 has a concave groove shape corresponding to the stud 6. The stud 6 to which the adhesive is applied is seated on the stud cup 126.

At least one exhaust hole (not shown) is formed around the stud cup 126. The exhaust hole is used to remove the gas generated in the process of heating and curing the adhesive applied to the stud 6. The exhaust hole is connected to an external vacuum generator and an exhaust channel (not shown) formed in the manipulator body 121. The gas generated while heating the adhesive needs to be removed because it may contaminate the photomask (M).

A seal 127 surrounding the stud cup 126 is provided around the radially outer periphery of the exhaust hole. The seal 127 serves to seal the space enclosed by the seal 127 in contact with the surface of the photo mask M.

2 and 4, the support structure 130 is generally in the form of a hollow cylinder. A stud manipulator insertion hole 131 into which the manipulator body 121 is fitted is formed on the upper surface of the support structure 130. The outer circumferential surface of the stud manipulator insertion hole 131 and the manipulator body 121 do not contact each other. This is because particles may be generated when contacted to contaminate the photomask M. In addition, a second permanent magnet 132 having alternating magnetic poles of N polarity and magnetic poles of S polarity is installed on the inner circumferential surface of the support structure 130.

When the stud manipulator 120 is fitted into the stud manipulator insertion hole 131 of the support structure 130, the first permanent magnet 122 is surrounded by the second permanent magnet 132. In addition, the magnetic pole of the N polarity of the first permanent magnet 122 faces the magnetic pole of the S polarity of the second permanent magnet 132, and the magnetic pole of the S polarity of the first permanent magnet 122 is the second permanent The magnetic pole of the N polarity of the magnet 132 is faced. The state where the first permanent magnet 122 and the second permanent magnet 132 are not in contact with each other because the attractive forces between the magnetic poles facing each other of the first permanent magnet 122 and the second permanent magnet 132 are balanced with each other The first permanent magnet 122 is in a floating state.

And the magnetic force between the first permanent magnet 122 and the second permanent magnet 132 serves to return the manipulator body 121 to its original position when the manipulator body 121 moves linearly.

Since the stud manipulator insertion hole 131 and the second permanent magnet 132 of the support structure 130 do not contact the manipulator body 121, particles due to contact do not occur even when the stud manipulator 120 moves up and down.

The stator 150 is disposed under the support structure 130. The stator 150 is generally plate-shaped, and a two-dimensional moving surface 151 is formed on the upper surface. A plurality of coils (not shown) are disposed under the moving surface 151.

The mover 140 is coupled to the lower surface of the support structure 130. The mover 140 moves along the moving surface spaced apart from the moving surface of the stator 150. Since the mover 140 moves away from the moving surface 151 of the stator 150, particles due to contact between the stator 150 and the mover 140 are not generated.

By supplying a current of an appropriate pattern to a plurality of coils of the stator 150, a driving force capable of moving the mover 140 to any position on the moving surface 151 can be generated. Since the planar motor using the mover 140 and the stator 150 is a well-known technique, detailed description will be omitted.

Hereinafter, the operation of the above-described stud attachment device 100 will be described.

First, the type of the photo mask M supplied to the stud attachment device 100 is checked.

Next, the pattern of the current applied to the coil of the stator 150 is adjusted according to the type of the photomask M to adjust the position of the support structure 130 in which the mover 140 is installed. The position to which the stud 6 is attached may be different depending on the type of the photo mask M, so it is necessary to adjust the position of the support structure 130. Since the mover 140 moves away from the stator 150, particles are not generated in the moving process.

The photo mask M supplied to the stud attachment device 100 is fixed by the mask support 110.

In addition, a stud 6 coated with an adhesive is disposed on the stud cup 121 of each stud manipulator 120.

Next, by the action of the actuator connected to the support 160, the support 160 is moved along the Z-axis direction so as to approach the photo mask (M). When the stud 6 contacts the surface of the photo mask M, the stud manipulator 120 descends. At this time, the magnetic force between the first permanent magnet 122 and the second permanent magnet 132 gently supports the stud manipulator 120. In the process of the stud manipulator 120 descending, there is no contact between the stud manipulator 120 and the support structure 130, and thus particles are not generated.

When the stud 6 is in close contact with the photo mask M, the seal 127 surrounds the circumference of the stud 6, and when the heater and the vacuum generator are operated, the adhesive applied to the stud 6 is dried. Gas is sucked into the exhaust channel through the exhaust hole.

When the adhesive is completely dried, the support 160 is lowered. And the photo mask M with the stud 6 attached is transferred to the pellicle mounting apparatus 200 through a transfer device.

5 is a schematic view of the pellicle mounting apparatus shown in FIG. 1. The pellicle mounting apparatus 200 is supplied with a photomask M with a stud 6 and a pellicle 1, respectively. The pellicle mounting apparatus 200 serves to mount the pellicle 1 to the photomask M by inserting the stud 6 of the photomask M into the fixture 5 of the pellicle 1.

6 is a perspective view illustrating an example of the pellicle shown in FIG. 1. As shown in FIG. 6, the pellicle 1 for ultra-ultraviolet lithography includes a pellicle film 2 and a pellicle frame 4. The pellicle frame 4 includes a pair of long sides and a pair of short sides. In addition, the pellicle frame 4 includes fixtures 5 and fixtures that engage each of the pair of long sides of the pellicle frame 4. Two fixtures 5 are combined on one long side.

As shown in FIG. 7, the fixture 5 includes elastic engagement arms 51 extending in the x-direction. The engaging tabs 52 protrude from the engaging arms 51. A cap 55 is formed on the opposite side of the engaging arms 51 of the fixture 5.

As shown in FIG. 5, the pellicle firewood device includes a photo mask gripper 210, a stage 220, an air gyro 230, a coupling station chuck 240, and a fixture manipulator 250.

The photo mask gripper 210 serves to fix the photo mask M to which the stud 6 is attached.

The stage 220 is movable in the X, Y, and Z axis directions by an actuator, and can be rotated based on the Z axis.

The air gyro 230 may adjust the parallelism when the stud 6 contacts the fixture 5. The degree of parallelism between the fixture 5 and the stud 6 may vary depending on the processing precision of the material, movement conditions, or vibration. The degree of parallelism between the fixture 5 and the stud 6 can be more precisely adjusted through the air gyro 230.

The air gyro 230 is installed on the stage 220. The air gyro 230 includes a stator 231 having a concave spherical surface and a rotor 235 having a convex spherical surface. An air bearing space 238 is formed between the concave spherical and convex spherical surfaces. A porous layer 232 is formed on the concave spherical surface of the stator 231, and the porous layer 232 is connected to the chamber 233. The chamber 233 is connected to a gas supply device and a vacuum generator not shown.

When gas is supplied to the chamber 233 through the gas supply device, gas is supplied to the air bearing space 238 through the porous layer 232. Then, the rotor 235 floats on the stator 231. In this state, when pressure is applied to the tracking surface 236 which is the upper surface of the rotor 235, the rotor 235 rotates with respect to the stator 231, so that the pressure applied to the tracking surface 236 is balanced. .

When the trace surface 236 is inclined and the pressure is balanced, when the gas in the air bearing space is removed by the vacuum generating device, the concave spherical surface of the rotor 235 and the convex spherical surface of the stator 231 are in close contact with each other. It is fixed in a balanced state.

The mating station chuck 240 is installed on the tracking surface 236 of the air gyro 230. The coupling station chuck 240 serves to fix and fix the fixture 5 by vacuum. The engagement station chuck 240 includes a body portion 241 and a contact portion 242. The body portion 241 is coupled to the air gyro 230, and the contact portion 242 protrudes from the body portion 241. The contact portion 242 is a portion in contact with the fixture 5, and a vacuum hole 244 is formed. A vacuum channel 243 connected to the vacuum hole 244 of the contact portion 242 is formed in the body portion 241. The vacuum channel 243 of the body portion 241 is connected to a vacuum generating device (not shown).

The fixture manipulator 250 is installed on the tracking surface 246 of the air gyro 230 like the coupling station chuck 240. The fixture manipulator 250 has a manipulator pin 251 which is installed to move linearly in the Z-axis direction. The manipulator pin 251 of the fixture manipulator 250 has a two-ended end. The manipulator pin 251 serves to push the engaging tabs 52 of the fixture 5 in the Z-axis direction.

7 to 10 are diagrams for explaining how the fixture 5 and the stud 6 are engaged.

First, with the fixture 5 fixed by the coupling station chuck 210, as shown in FIG. 7, the manipulator pin 251 is raised in the Z-axis direction, and the engagement tabs 52 are in the Z-axis direction. Push up. Then, the space between the engaging tabs 52 and the cap 55 is expanded. And the stud head 63 is disposed above the cap 55 between the engaging arms 51. At this time, the stud 6 and the fixture 5 do not contact.

Next, by moving the stage 220 in the -X axis direction, as shown in Fig. 8, the head 63 of the stud 6 is between the engaging tabs 52 and the cap 55 of the fixture 5 It should be located in the gap. At this time, the stud 6 and the fixture 5 are kept in a non-contact state.

Next, as shown in FIG. 9, the stage 220 is raised in the Z-axis direction until at least one of the heads 63 of the four studs 6 slightly contacts the cap 55. And when the gas is supplied to the air bearing space 238 of the air gyro 230, pressure is applied to the tracking surface 236 of the air gyro 230, and the tracking surface 236 of the air gyro 230 is inclined. Ascending, the head 63 of the four studs 6 and the four caps 55 are all in close contact.

It is also possible to maintain this state, by removing the gas in the air bearing space 238, while maintaining the inclination angle of the tracking surface 236, the tracking surface 236 is slightly lowered to be fixed, and then the stage 220 By increasing the height of the air bearing space 238 in the Z-axis direction, the head 63 and four caps 55 of the four studs 6 may be kept in close contact.

Next, the manipulator pin 251 is lowered to make the engagement tabs 52 of the fixture 5 contact the opposite side of the head 63 of the stud 6, as shown in FIG. Since the engaging arms 51 are elastic, when the manipulator pin 251 is lowered, the engaging tabs 52 of the fixture 5 are also lowered, while the head 63 of the stud 6 is removed from the fixture 5 It is pressed against the cap 55. In this way, the fixture 5 can be fixed to the stud 6.

Finally, when the vacuum of the coupling station chuck 240 is released, the pellicle 1 is separated from the coupling station chuck 240. The photomask M to which the pellicle 1 is coupled may be transported to the photolithography device by a transport device.

The embodiments described above are merely illustrative of preferred embodiments of the present invention, and the scope of the present invention is not limited to the described embodiments, and those skilled in the art within the technical spirit and claims of the present invention. Various changes, modifications, or substitutions may be made by, and such embodiments should be understood as belonging to the scope of the present invention.

100: stud attachment device
120: stud manipulator
122: first permanent magnet
130: support structure
132: second permanent magnet
140: mover
150: stator
200: pellicle mounting device
220: stage
230: Air gyro
240: mating station chuck
250: fixture manipulator

Claims (9)

A pellicle mounting system for mounting a pellicle including a pellicle frame with a fixture and a pellicle film to a photomask, comprising: a stud attachment device configured to contact a stud to a surface of the photomask; In the pellicle mounting system comprising a pellicle mounting device for coupling the fixture,
The stud attachment device,
A manipulator body having a first permanent magnet having alternating magnetic poles of N polarity and S polarity along its periphery as a cylindrical manipulator body, and a stud cup coupled to the manipulator body and on which the stud is seated A stud manipulator having a manipulator head provided,
As a hollow support structure to which the body of the stud manipulator is fitted, a second permanent magnet having alternating magnetic poles of N polarity and magnetic poles of S polarity is installed on its inner circumferential surface,
A two-dimensional stator disposed under the support structure and having a moving surface,
Is coupled to the support structure, and includes a mover (forcer) to move along the moving surface in a state spaced from the moving surface,
A pellicle mounting system in which a magnetic force is applied between the first permanent magnet and the second permanent magnet in a direction in which the manipulator body returns to its original position when the manipulator body moves linearly. According to claim 1,
A pellicle mounting system in which at least one exhaust hole is formed around the stud cup of the manipulator head, and a seal surrounding the stud cup is disposed around the exhaust hole. According to claim 1,
A pellicle mounting system in which a heater is installed inside the manipulator body. According to claim 1,
The pellicle mounting device,
A gripper for fixing the photo mask to which the stud is attached,
A coupling station chuck configured to secure the pellicle so that the fixture faces the stud near the side to which the stud of the photo mask is attached;
A fixture manipulator having a manipulator pin configured to push the engagement tabs of the fixture to the stud side;
A pellicle mounting system including an air gyro in which the coupling station chuck and the tracking manipulator are provided with a tracking surface, and when the stud contacts the fixture, the tracking surface is inclined to closely contact the stud and the fixture. According to claim 4,
The coupling station chuck includes a body portion installed on a tracking surface of the air gyro and a body portion protruding in the direction of the pellicle, and includes a contact portion contacting the pellicle,
A vacuum hole is formed in the contact portion, and a pellicle mounting system in which one end is connected to a vacuum hole in the contact portion and the other end is formed with a vacuum channel connected to a vacuum generating device. According to claim 4,
The air gyro includes a stator and a rotor,
One of the stator and the rotor has a concave spherical surface, the other has a convex spherical surface, an air bearing space is formed between the concave spherical surface and a convex spherical surface, and a porous layer is formed on the concave spherical surface, and the porosity is formed. A pellicle mounting system in which gas is supplied to the air bearing space through a layer or gas in the air bearing space is sucked. A stud attachment device configured to contact a stud to a surface of a photo mask, comprising:
A manipulator body having a first permanent magnet having alternating magnetic poles of N polarity and S polarity along its periphery as a cylindrical manipulator body, and a stud cup coupled to the manipulator body and on which the stud is seated A stud manipulator having a manipulator head provided,
As a hollow support structure to which the body of the stud manipulator is fitted, a second permanent magnet having alternating magnetic poles of N polarity and magnetic poles of S polarity is installed on its inner circumferential surface,
A two-dimensional stator disposed under the support structure and having a moving surface,
Is coupled to the support structure, and includes a mover (forcer) to move along the moving surface in a state spaced from the moving surface,
A device for attaching a stud to which a magnetic force is applied between the first permanent magnet and the second permanent magnet in a direction in which the manipulator body returns to its original position when the manipulator body moves linearly. As a pellicle mounting device for manipulating the fixture of the pellicle and combining the stud attached to the photo mask and the fixture,
A gripper for fixing the photo mask to which the stud is attached,
A coupling station chuck configured to secure the pellicle so that the fixture faces the stud near the side to which the stud of the photo mask is attached;
A fixture manipulator having a manipulator pin configured to push the engagement tabs of the fixture to the stud side;
A pellicle mounting device including an air gyro in which the coupling station chuck and the fixture manipulator are provided with a tracking surface, and when the stud and the fixture are in contact, the tracking surface is inclined to close the stud and the fixture. A method of mounting a pellicle that combines a plurality of studs attached to a photo mask and the fixtures by manipulating a plurality of pellicle fixtures,
Disposing a photo mask to which a plurality of studs are attached;
Aligning and fixing a pellicle with respect to the photo mask so that the fixtures face the studs;
Pushing the engaging tabs of each of the fixtures to the corresponding stud side using manipulator pins,
Moving the fixtures relative to the studs, thereby moving the pellicle so that the head of each stud is located in a gap between the engagement tabs and the cap of the corresponding fixture;
Moving the pellicle until the heads of the studs respectively contact the cap of the corresponding fixture,
A step of adhering each of the caps of the fixtures to the head of the corresponding stud using an air gyro,
And lowering the manipulator pin to contact each of the engagement tabs of the fixture to the opposite side of the head of the corresponding stud.

Images