KR20200082946A - Synthetic resin coating composition and method of manufacturing synthetic resin substrate using the same - Google Patents
Synthetic resin coating composition and method of manufacturing synthetic resin substrate using the same Download PDFInfo
- Publication number
- KR20200082946A KR20200082946A KR1020180174049A KR20180174049A KR20200082946A KR 20200082946 A KR20200082946 A KR 20200082946A KR 1020180174049 A KR1020180174049 A KR 1020180174049A KR 20180174049 A KR20180174049 A KR 20180174049A KR 20200082946 A KR20200082946 A KR 20200082946A
- Authority
- KR
- South Korea
- Prior art keywords
- group
- carbon atoms
- synthetic resin
- formula
- silsesquioxane polymer
- Prior art date
Links
- 229920003002 synthetic resin Polymers 0.000 title claims abstract description 119
- 239000000057 synthetic resin Substances 0.000 title claims abstract description 119
- 239000000758 substrate Substances 0.000 title claims abstract description 60
- 239000008199 coating composition Substances 0.000 title claims abstract description 30
- 238000004519 manufacturing process Methods 0.000 title abstract description 15
- 229920000642 polymer Polymers 0.000 claims abstract description 57
- 239000000126 substance Substances 0.000 claims abstract description 37
- 239000000463 material Substances 0.000 claims abstract description 22
- 239000002904 solvent Substances 0.000 claims abstract description 19
- 125000004432 carbon atom Chemical group C* 0.000 claims description 85
- 239000011247 coating layer Substances 0.000 claims description 19
- 125000003700 epoxy group Chemical group 0.000 claims description 19
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 15
- 229910052799 carbon Inorganic materials 0.000 claims description 15
- -1 silol group Chemical group 0.000 claims description 15
- 125000000217 alkyl group Chemical group 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 14
- YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 claims description 13
- 125000003118 aryl group Chemical group 0.000 claims description 13
- 229910052805 deuterium Inorganic materials 0.000 claims description 13
- 229910052736 halogen Inorganic materials 0.000 claims description 13
- 150000002367 halogens Chemical class 0.000 claims description 13
- 229910052739 hydrogen Inorganic materials 0.000 claims description 13
- 150000002431 hydrogen Chemical class 0.000 claims description 13
- 239000001257 hydrogen Substances 0.000 claims description 13
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 13
- 125000003342 alkenyl group Chemical group 0.000 claims description 12
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 12
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 12
- 125000001072 heteroaryl group Chemical group 0.000 claims description 12
- 125000000592 heterocycloalkyl group Chemical group 0.000 claims description 12
- 125000003545 alkoxy group Chemical group 0.000 claims description 11
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 8
- 125000003277 amino group Chemical group 0.000 claims description 8
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 7
- 229910052731 fluorine Inorganic materials 0.000 claims description 7
- 239000011737 fluorine Substances 0.000 claims description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 7
- 125000002560 nitrile group Chemical group 0.000 claims description 7
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 7
- 125000004104 aryloxy group Chemical group 0.000 claims description 6
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 6
- 229920000620 organic polymer Polymers 0.000 claims description 4
- 125000005110 aryl thio group Chemical group 0.000 claims description 3
- 229920003023 plastic Polymers 0.000 abstract description 23
- 239000004033 plastic Substances 0.000 abstract description 23
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 60
- 239000011248 coating agent Substances 0.000 description 56
- 238000000576 coating method Methods 0.000 description 52
- 239000004417 polycarbonate Substances 0.000 description 44
- 229920000515 polycarbonate Polymers 0.000 description 44
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 43
- 239000004926 polymethyl methacrylate Substances 0.000 description 42
- 239000011521 glass Substances 0.000 description 25
- 239000002985 plastic film Substances 0.000 description 23
- 229920005989 resin Polymers 0.000 description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 19
- 230000015572 biosynthetic process Effects 0.000 description 18
- 239000011347 resin Substances 0.000 description 18
- 238000003786 synthesis reaction Methods 0.000 description 18
- 229920006255 plastic film Polymers 0.000 description 17
- 238000002156 mixing Methods 0.000 description 14
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- 239000007864 aqueous solution Substances 0.000 description 9
- 238000003851 corona treatment Methods 0.000 description 9
- 235000019441 ethanol Nutrition 0.000 description 9
- 125000000524 functional group Chemical group 0.000 description 9
- 239000010410 layer Substances 0.000 description 9
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 8
- 239000002987 primer (paints) Substances 0.000 description 8
- 125000001424 substituent group Chemical group 0.000 description 8
- 239000012153 distilled water Substances 0.000 description 7
- 239000002253 acid Substances 0.000 description 6
- 239000005020 polyethylene terephthalate Substances 0.000 description 6
- 229920000139 polyethylene terephthalate Polymers 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- 229910008051 Si-OH Inorganic materials 0.000 description 4
- 229910006358 Si—OH Inorganic materials 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 4
- 230000007774 longterm Effects 0.000 description 4
- 239000011259 mixed solution Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 4
- 238000009832 plasma treatment Methods 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000002411 thermogravimetry Methods 0.000 description 4
- DOGMJCPBZJUYGB-UHFFFAOYSA-N 3-trichlorosilylpropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC[Si](Cl)(Cl)Cl DOGMJCPBZJUYGB-UHFFFAOYSA-N 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- 229910014033 C-OH Inorganic materials 0.000 description 3
- 229910014570 C—OH Inorganic materials 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- 239000004696 Poly ether ether ketone Substances 0.000 description 3
- 239000004697 Polyetherimide Substances 0.000 description 3
- 229910018557 Si O Inorganic materials 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000006482 condensation reaction Methods 0.000 description 3
- 238000010924 continuous production Methods 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 229920002530 polyetherether ketone Polymers 0.000 description 3
- 229920001601 polyetherimide Polymers 0.000 description 3
- 239000004814 polyurethane Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 3
- 239000011877 solvent mixture Substances 0.000 description 3
- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 description 2
- QPUYECUOLPXSFR-UHFFFAOYSA-N 1-methylnaphthalene Chemical compound C1=CC=C2C(C)=CC=CC2=C1 QPUYECUOLPXSFR-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000007606 doctor blade method Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000000088 plastic resin Substances 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 238000003892 spreading Methods 0.000 description 2
- 230000007480 spreading Effects 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- HBGPNLPABVUVKZ-POTXQNELSA-N (1r,3as,4s,5ar,5br,7r,7ar,11ar,11br,13as,13br)-4,7-dihydroxy-3a,5a,5b,8,8,11a-hexamethyl-1-prop-1-en-2-yl-2,3,4,5,6,7,7a,10,11,11b,12,13,13a,13b-tetradecahydro-1h-cyclopenta[a]chrysen-9-one Chemical compound C([C@@]12C)CC(=O)C(C)(C)[C@@H]1[C@H](O)C[C@]([C@]1(C)C[C@@H]3O)(C)[C@@H]2CC[C@H]1[C@@H]1[C@]3(C)CC[C@H]1C(=C)C HBGPNLPABVUVKZ-POTXQNELSA-N 0.000 description 1
- KKYDYRWEUFJLER-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6,6,7,7,10,10,10-heptadecafluorodecyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CCC(F)(F)F KKYDYRWEUFJLER-UHFFFAOYSA-N 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- PFRGGOIBYLYVKM-UHFFFAOYSA-N 15alpha-hydroxylup-20(29)-en-3-one Natural products CC(=C)C1CCC2(C)CC(O)C3(C)C(CCC4C5(C)CCC(=O)C(C)(C)C5CCC34C)C12 PFRGGOIBYLYVKM-UHFFFAOYSA-N 0.000 description 1
- APOYTRAZFJURPB-UHFFFAOYSA-N 2-methoxy-n-(2-methoxyethyl)-n-(trifluoro-$l^{4}-sulfanyl)ethanamine Chemical compound COCCN(S(F)(F)F)CCOC APOYTRAZFJURPB-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- 238000005133 29Si NMR spectroscopy Methods 0.000 description 1
- JVFPPVJPLCFTIW-UHFFFAOYSA-N 4,5-dimethylhexan-3-one Chemical compound CCC(=O)C(C)C(C)C JVFPPVJPLCFTIW-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 241000985630 Lota lota Species 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical compound CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 229920002873 Polyethylenimine Polymers 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- SOKRNBGSNZXYIO-UHFFFAOYSA-N Resinone Natural products CC(=C)C1CCC2(C)C(O)CC3(C)C(CCC4C5(C)CCC(=O)C(C)(C)C5CCC34C)C12 SOKRNBGSNZXYIO-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910002808 Si–O–Si Inorganic materials 0.000 description 1
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 1
- QLLQTNYSIXXXSM-UHFFFAOYSA-N [4,4,5,5,6,6,7,7,8,8,9,9-dodecafluoro-9-[1,1,2,2,3,3,4,4,5,5,6,6,10,10,10-pentadecafluoro-7-(2-triethoxysilylethyl)decyl]sulfanyl-3-(3,3,3-trifluoropropyl)nonyl]-triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCC(CCC(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)SC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(CCC(F)(F)F)CC[Si](OCC)(OCC)OCC QLLQTNYSIXXXSM-UHFFFAOYSA-N 0.000 description 1
- USZXYBGCSCUAPS-UHFFFAOYSA-N [4,4,5,5,6,6,7,7,8,8,9,9-dodecafluoro-9-[1,1,2,2,3,3,4,4,5,5,6,6,10,10,10-pentadecafluoro-7-(2-trimethoxysilylethyl)decyl]sulfanyl-3-(3,3,3-trifluoropropyl)nonyl]-trimethoxysilane Chemical compound CO[Si](OC)(OC)CCC(CCC(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)SC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(CCC(F)(F)F)CC[Si](OC)(OC)OC USZXYBGCSCUAPS-UHFFFAOYSA-N 0.000 description 1
- 239000011354 acetal resin Substances 0.000 description 1
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 1
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 1
- 229920001893 acrylonitrile styrene Polymers 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- JUPQTSLXMOCDHR-UHFFFAOYSA-N benzene-1,4-diol;bis(4-fluorophenyl)methanone Chemical compound OC1=CC=C(O)C=C1.C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 JUPQTSLXMOCDHR-UHFFFAOYSA-N 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- WKHHNUXTTZQGDL-UHFFFAOYSA-N diethoxy-(1,1,2,2,2-pentafluoroethoxy)-phenylsilane Chemical compound FC(F)(F)C(F)(F)O[Si](OCC)(OCC)C1=CC=CC=C1 WKHHNUXTTZQGDL-UHFFFAOYSA-N 0.000 description 1
- OHLKTJUGGBHLLU-UHFFFAOYSA-N dimethoxy-bis(2,3,4,5,6-pentafluorophenyl)silane Chemical compound FC=1C(F)=C(F)C(F)=C(F)C=1[Si](OC)(OC)C1=C(F)C(F)=C(F)C(F)=C1F OHLKTJUGGBHLLU-UHFFFAOYSA-N 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000005660 hydrophilic surface Effects 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 230000005923 long-lasting effect Effects 0.000 description 1
- SDQQBPKWLSANJO-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;toluene Chemical compound COC(=O)C(C)=C.CC1=CC=CC=C1 SDQQBPKWLSANJO-UHFFFAOYSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 230000002688 persistence Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 230000001699 photocatalysis Effects 0.000 description 1
- 239000011941 photocatalyst Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- SCUZVMOVTVSBLE-UHFFFAOYSA-N prop-2-enenitrile;styrene Chemical compound C=CC#N.C=CC1=CC=CC=C1 SCUZVMOVTVSBLE-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- ZGYICYBLPGRURT-UHFFFAOYSA-N tri(propan-2-yl)silicon Chemical compound CC(C)[Si](C(C)C)C(C)C ZGYICYBLPGRURT-UHFFFAOYSA-N 0.000 description 1
- PMQIWLWDLURJOE-UHFFFAOYSA-N triethoxy(1,1,2,2,3,3,4,4,5,5,6,6,7,7,10,10,10-heptadecafluorodecyl)silane Chemical compound CCO[Si](OCC)(OCC)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CCC(F)(F)F PMQIWLWDLURJOE-UHFFFAOYSA-N 0.000 description 1
- BOVWGKNFLVZRDU-UHFFFAOYSA-N triethoxy(trifluoromethyl)silane Chemical compound CCO[Si](OCC)(OCC)C(F)(F)F BOVWGKNFLVZRDU-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- ORVBHOQTQDOUIW-UHFFFAOYSA-N trimethoxy(trifluoromethyl)silane Chemical group CO[Si](OC)(OC)C(F)(F)F ORVBHOQTQDOUIW-UHFFFAOYSA-N 0.000 description 1
- XFFHTZIRHGKTBQ-UHFFFAOYSA-N trimethoxy-(2,3,4,5,6-pentafluorophenyl)silane Chemical compound CO[Si](OC)(OC)C1=C(F)C(F)=C(F)C(F)=C1F XFFHTZIRHGKTBQ-UHFFFAOYSA-N 0.000 description 1
- PZJJKWKADRNWSW-UHFFFAOYSA-N trimethoxysilicon Chemical compound CO[Si](OC)OC PZJJKWKADRNWSW-UHFFFAOYSA-N 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/70—Siloxanes defined by use of the MDTQ nomenclature
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/042—Coating with two or more layers, where at least one layer of a composition contains a polymer binder
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/043—Improving the adhesiveness of the coatings per se, e.g. forming primers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/046—Forming abrasion-resistant coatings; Forming surface-hardening coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D127/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
- C09D127/02—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
- C09D127/12—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/20—Diluents or solvents
Abstract
Description
본 발명은 합성 수지 코팅 조성물 및 이를 이용한 합성 수지 기재 제조 방법에 관한 것으로서, 더욱 상세하게는 과학, 산업 분야에서 사용되는 합성 수지 코팅 조성물 및 이를 이용한 합성 수지 기재 제조 방법에 관한 것이다.The present invention relates to a synthetic resin coating composition and a method for manufacturing a synthetic resin substrate using the same, and more particularly, to a synthetic resin coating composition used in the scientific and industrial fields and a method for manufacturing a synthetic resin substrate using the same.
최근 과학, 산업분야에서 유리 대체용 플라스틱 필름 및 시트 개발의 필요성이 점차 대두되고 있다. 플라스틱 소재는 다음과 같은 특성을 이용하고자 하는 소비자들의 대체 개발요구에서 기인한다.Recently, the need for the development of plastic films and sheets for glass replacement in the scientific and industrial fields is gradually emerging. The plastic material originates from the demand for alternative development by consumers who want to use the following characteristics.
상기 플라스틱을 형성하는 합성 수지는 제조방법에 따라 유리에 준하는 수준으로 투명할 수 있으며, 유리에 비해 매우 가볍고 충격에 견디는 강도특성이 매우 뛰어나고, 색상의 구현이 유리에 비해 자유로워 단순 유리 대체용부터 인테리어용 소재까지 다양한 응용분야로의 확장성을 가질 수 있다. 이와 같은 플라스틱 소재의 장점을 적절히 이용하면, 점진적으로 유리를 대체할 수 있는 수단재료로 적극 활용될 수 있을 것이다.The synthetic resin forming the plastic can be transparent to a level comparable to glass according to the manufacturing method, and is very light compared to glass and has excellent strength characteristics to withstand impact, and the implementation of color is free compared to glass, so from simple glass replacement It can have scalability to various application fields from interior materials. If the advantage of such a plastic material is properly used, it can be actively used as a material for gradually replacing glass.
그러나, 플라스틱을 형성하는 합성 수지의 투명 소재들은 유리에 비해 표면의 친수화가 힘들어, 표면에너지를 높은 수준으로 유도하기 어려운 단점이 있다. 이러한 단점으로 인해 플라스틱소재들은 제품의 가치를 결정하는 표면(외부) 처리에 아래와 같은 제한을 가지게 된다. (친수화 = 코팅액의 퍼짐특성 향상 = 기재 접착력향상 및 코팅불량 저감화)However, the transparent materials of synthetic resins forming plastics have a disadvantage that it is difficult to induce the surface energy to a high level because the surface is more hydrophilic than glass. Due to these shortcomings, plastic materials have the following limitations on the surface (external) treatment that determines the value of the product. (Hydrophilization = improvement of spreading property of coating solution = improvement of adhesion of substrate and reduction of coating defect)
상기 플라스틱을 형성하는 합성 수지는은 코팅액의 퍼짐 특성에 한계가 있으므로 내지문, 지문저감화, 슬립성 향상 등의 표면 특성부여를 위해 이용되는 화학제품의 적용이 매우 복잡하고 제한적이고, 저굴절, 난반사, 고/저반사 등의 광학적 특성을 결정짓는 코팅소재들과 계면에서 강한 접착력을 유도할 수 없어 외관의 고급화(유리화)를 달성하기 어렵다. 또한, 경도, 스크레치 등 물리적 특성을 강화하는 표면 코팅제의 적용이 제한적이다.Since the synthetic resin forming the plastic has a limitation in the spreading properties of the silver coating solution, the application of chemical products used for imparting surface properties such as fingerprint, fingerprint reduction, and improved slip properties is very complicated and limited, low refractive index, diffuse reflection , It is difficult to achieve high level of appearance (vitrification) because coating materials that determine optical properties such as high/low reflection cannot induce strong adhesion at the interface. In addition, the application of surface coating agents that enhance physical properties such as hardness and scratches is limited.
이로 인해, 플라스틱을 형성하는 합성 수지는 우수한 장점을 가지고 있으면서도, 유리가 적용되는 여러 분야에서 아직 대체제로 적극 활용되지 못하고 있다. 따라서, 이러한 플라스틱을 형성하는 합성 수지 기재의 단점을 극복하기 위해 많은 과학적/기술적 접근이 진행되고 있다.For this reason, the synthetic resin forming the plastic has excellent advantages, but has not been actively utilized as a substitute in various fields where glass is applied. Therefore, many scientific/technical approaches have been made to overcome the disadvantages of the synthetic resin base forming these plastics.
공개특허 10-2018-0100985에 의하면 상기의 문제점을 해결하기 위해 플라스틱 기재에 플라즈마 처리 후, 친수성을 가지는 프라이머 코팅제를 처리하여 친수 특성을 길게 유지할 수 있도록 하였고, 그 상부에 불소계 코팅제를 도포하여 내지문특성 및 슬립 특성의 향상을 발현할 수 있도록 하였다. 또한, 공개특허 10-2007-0034517에 따르면 광촉매 물질 및 가수분해된 유기실리케이트를 포함하는 친수성 결합제를 포함하는 코팅액으로 친수 특성을 유도할 수 있는 코팅액을 제조하여 표면특성이 친수인 기판을 제작할 수 있음을 보여주었다. According to Patent Publication No. 10-2018-0100985, after the plasma treatment on the plastic substrate in order to solve the above problems, a primer coating agent having hydrophilicity was treated to maintain the hydrophilic properties for a long time, and a fluorine-based coating agent was applied to the upper portion to prevent fingerprints. It was made possible to express an improvement in properties and slip properties. In addition, according to Patent Publication No. 10-2007-0034517, a coating solution capable of inducing hydrophilic properties can be prepared with a coating solution comprising a hydrophilic binder comprising a photocatalytic material and a hydrolyzed organosilicate to produce a substrate having hydrophilic properties. Showed.
그러나, 상기 방법들을 통해 문제점을 극복하기에는 몇 가지 문제점이 있다. However, there are some problems to overcome the problems through the above methods.
상기 프라이머를 이용한 친수 코팅층 도입은 플라스틱기재에 특정 gas 종류로 선택된 플라즈마 방법을 적용하여 순간적으로 표면 친수화처리 후, 프라이머 코팅을 진행하고 즉시 목적한 기능성 코팅제를 다시 코팅하는 복잡한 공정을 제시하고 있다. 상기 공정에서 플라스틱 기재에 순간적 플라즈마 처리로 만들어진 친수 표면은 유지 시간이 매우 짧아 수분~수시간 내에 원래의 표면 에너지값으로 원상 복구되는 단점이 예상된다. 그러므로, 매우 빠른 시간에 혹은 연속적으로 프라이머 코팅을 처리해야 하며, 처리 시간이 변화되면 프라이머 층과 기재의 접착력이 확보되지 않을 수 있다.The introduction of the hydrophilic coating layer using the primer suggests a complicated process of applying a plasma method selected as a specific gas type to the plastic substrate, and then immediately surface hydrophilizing treatment, then proceeding with the primer coating and immediately coating the desired functional coating agent again. In the above process, the hydrophilic surface made of instantaneous plasma treatment on the plastic substrate has a very short holding time, and is expected to be restored to its original surface energy value within minutes to hours. Therefore, it is necessary to treat the primer coating very quickly or continuously, and when the treatment time is changed, the adhesion between the primer layer and the substrate may not be secured.
또한, 광촉매 및 실리케이트를 포함한 친수코팅제는 사용하는 바인더와 확실한 화학결합을 유도할 수 없어 유리와 같은 높은 표면경도, 스크레치 저항성 등을 확보하기 어려운 방법으로 실제 적용에 있어서 많은 문제가 예상된다.In addition, a hydrophilic coating agent including a photocatalyst and a silicate cannot induce a positive chemical bond with a binder to be used, and thus it is difficult to secure a high surface hardness such as glass, scratch resistance, and the like, and thus many problems are expected in practical application.
따라서, 본 발명의 목적은 별도의 프라이머나 번거로운 연속공정 없이도 통상의 플라스틱 소재들의 표면에 친수 특성을 장기간 구현할 수 있는 합성 수지 코팅 조성물 및 이를 이용한 합성 수지 기재 제조 방법을 제공하는 것이다.Accordingly, it is an object of the present invention to provide a synthetic resin coating composition capable of realizing hydrophilic properties for a long time on the surface of ordinary plastic materials without a separate primer or cumbersome continuous process and a method of manufacturing a synthetic resin substrate using the same.
본 발명의 다른 목적은 기존 유리의 표면에 행하던 기능성 코팅층을 동일한 수준으로 구현할 수 있고, 유리를 대체하고자 하는 여러 응용분야에 활용될 수 있는 합성 수지 코팅 조성물 및 이를 이용한 합성 수지 기재 제조 방법을 제공하는 것이다. Another object of the present invention is to provide a synthetic resin coating composition and a synthetic resin substrate manufacturing method using the same, which can implement the functional coating layer used on the surface of the existing glass to the same level and can be utilized in various applications to replace the glass. will be.
상기 목적을 달성하기 위하여, 본 발명은 하기 화학식 1 및 화학식 2로 표시되는 반복단위를 포함하는 실세스퀴옥산 고분자 및 용매를 포함하는 합성 수지 코팅 조성물을 제공한다.In order to achieve the above object, the present invention provides a synthetic resin coating composition comprising a silsesquioxane polymer and a solvent comprising repeating units represented by the following Chemical Formulas 1 and 2.
[화학식 1][Formula 1]
[화학식 2] [Formula 2]
상기 화학식 1 및 화학식 2에 있어서, R1은 각각 독립적으로, 수소, 중수소, 할로겐, 아민기, 에폭시기, 사이클로헥실에폭시기, (메타)아크릴기, 히드록시기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기, 탄소수 1 내지 40의 알킬기, 탄소수 2 내지 40의 알케닐기, 탄소수 1 내지 40의 알콕시기, 탄소수 3 내지 40의 시클로알킬기, 탄소수 3 내지 40의 헤테로시클로알킬기, 탄소수 6 내지 40의 아릴기, 탄소수 3 내지 40의 헤테로아릴기, 탄소수 3 내지 40의 아르알킬기, 탄소수 3 내지 40의 아릴옥시기, 또는 탄소수 3 내지 40의 아릴사이올기이고, R2는 각각 독립적으로, 수소, 중수소, 할로겐, 이소시아네이트기, 탄소수 1 내지 40의 알킬기, 탄소수 2 내지 40의 알케닐기, 탄소수 3 내지 40의 시클로알킬기, 탄소수 3 내지 40의 헤테로시클로알킬기, 탄소수 6 내지 40의 아릴기, 탄소수 3 내지 40의 헤테로아릴기, 탄소수 3 내지 40의 아르알킬기 또는 탄소수 2 내지 40의 에폭시기이며, n 및 m은 각각 독립적으로 1 내지 100,000의 정수이며, n/m은 0.1 내지 10 이다.In Formula 1 and Formula 2, R1 is each independently hydrogen, deuterium, halogen, amine group, epoxy group, cyclohexyl epoxy group, (meth)acrylic group, hydroxy group, silol group, isocyanate group, nitrile group, nitro group, Alkyl group having 1 to 40 carbon atoms, alkenyl group having 2 to 40 carbon atoms, alkoxy group having 1 to 40 carbon atoms, cycloalkyl group having 3 to 40 carbon atoms, heterocycloalkyl group having 3 to 40 carbon atoms, aryl group having 6 to 40 carbon atoms, carbon number 3 To 40 heteroaryl group, 3 to 40 aralkyl group, 3 to 40 aryloxy group, or 3 to 40 arylthio group, R2 are each independently hydrogen, deuterium, halogen, isocyanate group, Alkyl group having 1 to 40 carbon atoms, alkenyl group having 2 to 40 carbon atoms, cycloalkyl group having 3 to 40 carbon atoms, heterocycloalkyl group having 3 to 40 carbon atoms, aryl group having 6 to 40 carbon atoms, heteroaryl group having 3 to 40 carbon atoms, carbon number It is an aralkyl group of 3 to 40 or an epoxy group of 2 to 40 carbon atoms, n and m are each independently an integer of 1 to 100,000, and n/m is 0.1 to 10.
또한, 본 발명은 상기 화학식 1 및 화학식 2로 표시되는 반복단위를 포함하는 실세스퀴옥산 고분자, 합성 수지 및 용매를 포함하는 합성 수지 코팅 조성물을 제공한다.In addition, the present invention provides a synthetic resin coating composition comprising a silsesquioxane polymer including a repeating unit represented by Formula 1 and Formula 2, a synthetic resin, and a solvent.
또한, 본 발명은 상기 화학식 1 및 화학식 2로 표시되는 반복단위를 포함하는 실세스퀴옥산 고분자 및 합성 수지를 포함하는 합성 수지 코팅 조성물을 포함하는 합성 수지 기재를 제공한다.In addition, the present invention provides a synthetic resin base material comprising a synthetic resin coating composition comprising a silsesquioxane polymer comprising a repeating unit represented by Formula 1 and Formula 2 and a synthetic resin.
또한, 본 발명은 합성 수지 기판 및 상기 합성 수지 기판의 일면 이상에 하기 화학식 1 및 화학식 2로 표시되는 반복단위를 포함하는 실세스퀴옥산 고분자 및 용매 또는 하기 화학식 1 및 화학식 2로 표시되는 반복단위를 포함하는 실세스퀴옥산 고분자, 합성수지 및 용매를 포함하는 합성 수지 코팅 조성물이 경화된 코팅층을 포함하는 합성 수지 기재를 제공한다.In addition, the present invention is a synthetic resin substrate and a silsesquioxane polymer and a repeating unit represented by the following Chemical Formula 1 and Chemical Formula 2 containing a repeating unit represented by Chemical Formula 1 and Chemical Formula 2 on one or more surfaces of the synthetic resin substrate. It provides a synthetic resin substrate comprising a coating layer cured synthetic resin coating composition comprising a silsesquioxane polymer, a synthetic resin and a solvent comprising a.
본 발명에 따른 합성 수지 코팅 조성물 및 이를 이용한 합성 수지 기재 제조 방법은 별도의 프라이머나 번거로운 연속공정 없이도 통상의 플라스틱 소재들의 표면에 친수 특성을 장기간 구현할 수 있으며, 기존 유리의 표면에 행하던 기능성 코팅층을 동일한 수준으로 구현할 수 있다.The synthetic resin coating composition according to the present invention and the method of manufacturing a synthetic resin substrate using the same can realize long-term hydrophilic properties on the surfaces of ordinary plastic materials without a separate primer or cumbersome continuous process, and the same functional coating layer used on the surface of existing glass Can be implemented at a level.
도 1은 본 발명의 실시예에 따른 합성 수지 성형품의 단면도.
도 2는 본 발명의 다른 실시예에 따른 합성 수지 성형품의 단면도.
도 3은 본 발명의 실시예에 따른 친수성을 가지는 합성 수지 성형품의 단면도.1 is a cross-sectional view of a synthetic resin molded article according to an embodiment of the present invention.
Figure 2 is a cross-sectional view of a synthetic resin molded article according to another embodiment of the present invention.
3 is a cross-sectional view of a synthetic resin molded article having hydrophilicity according to an embodiment of the present invention.
이하, 본 발명을 더욱 상세하게 설명한다.Hereinafter, the present invention will be described in more detail.
본 발명에 따른 합성 수지 코팅 조성물의 일 실시예로서, 하기 화학식 1 및 화학식 2로 표시되는 반복단위를 포함하는 실세스퀴옥산 고분자 및 용매를 포함한다.As an embodiment of the synthetic resin coating composition according to the present invention, it includes a silsesquioxane polymer and a solvent including repeating units represented by the following Chemical Formulas 1 and 2.
[화학식 1][Formula 1]
[화학식 2] [Formula 2]
상기 화학식 1 및 화학식 2에 있어서, R1은 각각 독립적으로, 수소, 중수소, 할로겐, 아민기, 에폭시기, 사이클로헥실에폭시기, (메타)아크릴기, 히드록시기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기, 탄소수 1 내지 40의 알킬기, 탄소수 2 내지 40의 알케닐기, 탄소수 1 내지 40의 알콕시기, 탄소수 3 내지 40의 시클로알킬기, 탄소수 3 내지 40의 헤테로시클로알킬기, 탄소수 6 내지 40의 아릴기, 탄소수 3 내지 40의 헤테로아릴기, 탄소수 3 내지 40의 아르알킬기, 탄소수 3 내지 40의 아릴옥시기 또는 탄소수 3 내지 40의 아릴사이올기이고, R2는 각각 독립적으로, 수소, 중수소, 할로겐, 이소시아네이트기, 탄소수 1 내지 40의 알킬기, 탄소수 2 내지 40의 알케닐기, 탄소수 3 내지 40의 시클로알킬기, 탄소수 3 내지 40의 헤테로시클로알킬기, 탄소수 6 내지 40의 아릴기, 탄소수 3 내지 40의 헤테로아릴기, 탄소수 3 내지 40의 아르알킬기 또는 탄소수 2 내지 40의 에폭시기이며, n 및 m은 각각 독립적으로 1 내지 100,000의 정수이며, n/m은 0.1 내지 10 이다. 상기 n/m의 값이 0.1 미만이면 오일리하여 기재(예를 들면, 플라스틱 기재)와 박리되며, 10을 초과하면 브리틀(brittle)하여 사용하는데 어려움이 있다. In Formula 1 and Formula 2, R1 is each independently hydrogen, deuterium, halogen, amine group, epoxy group, cyclohexyl epoxy group, (meth)acrylic group, hydroxy group, silol group, isocyanate group, nitrile group, nitro group, Alkyl group having 1 to 40 carbon atoms, alkenyl group having 2 to 40 carbon atoms, alkoxy group having 1 to 40 carbon atoms, cycloalkyl group having 3 to 40 carbon atoms, heterocycloalkyl group having 3 to 40 carbon atoms, aryl group having 6 to 40 carbon atoms, carbon number 3 It is a heteroaryl group of 40 to 40, an aralkyl group of 3 to 40 carbon atoms, an aryloxy group of 3 to 40 carbon atoms or an arylcyol group of 3 to 40 carbon atoms, and R2 are each independently hydrogen, deuterium, halogen, isocyanate group, carbon number Alkyl group of 1 to 40, alkenyl group of 2 to 40 carbon atoms, cycloalkyl group of 3 to 40 carbon atoms, heterocycloalkyl group of 3 to 40 carbon atoms, aryl group of 6 to 40 carbon atoms, heteroaryl group of 3 to 40 carbon atoms, carbon number 3 It is an aralkyl group of 40 to 40 or an epoxy group of 2 to 40 carbon atoms, n and m are each independently an integer of 1 to 100,000, and n/m is 0.1 to 10. If the value of n/m is less than 0.1, it is oily and peels off from the substrate (for example, a plastic substrate), and if it exceeds 10, it is difficult to use by brittle.
상기 화학식 1 및 화학식 2에 있어서, 상기 탄소수 1 내지 40의 알킬기는 구체적으로 메틸기, 에틸기, 프로필기, 이소프로필기, 부틸기, 이소부틸기, sec-부틸기, 펜틸기, 헥실기 등일 수 있고, 아릴기는 페닐기 등일 수 있다. 상기 화학식 2에 있어서, R2는 수소, 메틸기, 에틸기 또는 프로필기일 수 있고, -OR2는 산소를 포함함으로써, 실세스퀴옥산 고분자의 용해도, 분산성, 상용성을 조절한다.In Chemical Formulas 1 and 2, the alkyl group having 1 to 40 carbon atoms may specifically be a methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, sec-butyl group, pentyl group, hexyl group, or the like. , The aryl group may be a phenyl group. In Chemical Formula 2, R2 may be hydrogen, a methyl group, an ethyl group, or a propyl group, and -OR2 includes oxygen to control the solubility, dispersibility, and compatibility of the silsesquioxane polymer.
필요에 따라, 상기 R1 및 R2는 중수소, 할로겐, 아미노기, 비닐기, (메타)아크릴기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기 등의 치환기로 치환될 수 있다. 구체적으로, R1은 아미노기, (메타)아크릴기, 히드록시기, 사이올기 등의 반응성 치환기 또는 비닐기, 에폭시기 등의 반응성 작용기를 가질 수 있으며, 예를 들면, 상기 반응성 치환기 또는 작용기를 가지는 알킬기일 수 있고, 이와 같은 반응성 치환기 또는 작용기에 의해, 본 발명의 실세스퀴옥산 고분자가 가교 결합될 수 있다. 상기 반응성 치환기 또는 작용기를 가지는 R1으로는, (메타)아크릴옥시프로필기, 2-(3,4-에폭시시클로헥실)에틸기 등을 예시할 수 있다. If necessary, the R1 and R2 may be substituted with substituents such as deuterium, halogen, amino group, vinyl group, (meth)acrylic group, cyol group, isocyanate group, nitrile group, nitro group, and the like. Specifically, R1 may have a reactive substituent such as an amino group, a (meth)acrylic group, a hydroxy group, a silol group, or a reactive group such as a vinyl group or an epoxy group, and may be, for example, an alkyl group having the reactive substituent or functional group. , By this reactive substituent or functional group, the silsesquioxane polymer of the present invention can be crosslinked. Examples of R1 having the reactive substituent or functional group include (meth)acryloxypropyl group, 2-(3,4-epoxycyclohexyl)ethyl group, and the like.
본 발명의 실세스퀴옥산 고분자가 반응성 치환기 또는 반응성 작용기를 가지는 경우, 전체 R1에 대하여, 반응성 치환기 또는 반응성 작용기를 가지는 R1의 비율은 예를 들면, 10 내지 100%, 구체적으로는 50 내지 100%이다. 상기 반응성 치환기 또는 작용기의 함량이 너무 작으면, 실세스퀴옥산 고분자의 가교 결합력이 낮아, 최종 형성되는 코팅막의 경도가 저하되거나, 실세스퀴옥산 고분자의 가교 결합에 장시간이 소요되는 문제가 있다. When the silsesquioxane polymer of the present invention has a reactive substituent or a reactive functional group, the ratio of R1 having a reactive substituent or a reactive functional group with respect to total R1 is, for example, 10 to 100%, specifically 50 to 100% to be. If the content of the reactive substituent or functional group is too small, there is a problem in that the crosslinking power of the silsesquioxane polymer is low, the hardness of the coating film to be finally formed decreases, or the crosslinking of the silsesquioxane polymer takes a long time.
상기 실세스퀴옥산 고분자는 하기 화학식 3으로 표시되는 고분자를 포함할 수 있다.The silsesquioxane polymer may include a polymer represented by Formula 3 below.
[화학식 3] [Formula 3]
상기 화학식 3에 있어서, R1, R2, n 및 m은 상기 화학식 1 및 2에서 정의한 바와 같다.In Chemical Formula 3, R1, R2, n and m are as defined in Chemical Formulas 1 and 2.
상기 화학식 3으로 표시되는 실세스퀴옥산 고분자는 랜덤 구조를 가지고 있으며, 상기 R1과 OR2는 모두 동일한 유기관능기일 수 있고, 경우에 따라, 모두 다른 종류로 치환될 수 있으며, 상기 실세스퀴옥산 고분자의 중량평균 분자량은 2,000 내지 100,000이다.The silsesquioxane polymer represented by Chemical Formula 3 has a random structure, and both R 1 and OR 2 may be the same organic functional group, and in some cases, they may be substituted with different kinds, and the silsesqui The weight average molecular weight of the oxane polymer is 2,000 To 100,000.
상기 화학식 3에서 OR2 그룹의 도입량 조절로 합성 수지의 상용성을 조절할 수 있다. 상기 화학식 3에 포함된 Si-O-Si group은 플라즈마, 코로나, 강염 또는 강산에서 처리할 시, Si-OH 또는 Si-O로 유도되며, 상기 OR2 그룹은 C-OH 및 carboxyl grup(예를 들면, C-C=O 등) 등 친수성 작용기로 유도되므로, 유리와 동일하게 장기간 친수 특성을 유지할 수 있다. 따라서, 유리와 동일하게 장기간 친수성을 가지는 플라스틱 시트 및/또는 필름을 제조할 수 있다.In Formula 3, the compatibility of the synthetic resin can be controlled by adjusting the amount of introduction of the OR 2 group. The Si-O-Si group included in Chemical Formula 3 is induced to Si-OH or Si-O when treated in plasma, corona, strong salt or strong acid, and the OR 2 groups are C-OH and carboxyl grup (eg For example, CC=O, etc.), and the like, so that hydrophilic properties can be maintained for a long time in the same way as glass. Therefore, it is possible to manufacture a plastic sheet and/or film having a long-term hydrophilicity similar to glass.
상기 용매는 유기용매로, 합성 수지와 본 발명에 따른 실세스퀴옥산 고분자의 균일한 혼합을 도와주며, 예를 들면, 물(증류수), 메틸알콜, 에틸알콜, 이소프로필알콜, 부틸알콜 등의 알코올류, 아세톤, 메틸(아이소부틸)에틸케톤 등의 케톤류, 에틸렌글리콜 등의 글리콜류, 테트라하이드로퓨란 등의 퓨란계, 디메틸포름아미드, 디메틸아세트아미드, N-메틸-2-피롤리돈 등의 극성용매 뿐 아니라, 헥산, 사이클로헥산, 사이클로헥사논, 톨루엔, 자일렌, 크레졸, 클로로포름, 디클로로벤젠, 디메틸벤젠, 트리메틸벤젠, 피리딘, 메틸나프탈렌, 니트로메탄, 아크로니트릴, 메틸렌클로라이드, 옥타데실아민, 아닐린, 디메틸설폭사이드, 벤질알콜 등의 다양한 등의 용매를 이용할 수 있으나, 이에 제한되지는 않는다. 상기 용매의 함량은 실리콘계 조성물의 함량을 제외한 나머지를 포함한다.The solvent is an organic solvent, which helps uniform mixing of the synthetic resin and the silsesquioxane polymer according to the present invention, for example, water (distilled water), methyl alcohol, ethyl alcohol, isopropyl alcohol, butyl alcohol, etc. Alcohols, acetone, ketones such as methyl (isobutyl) ethyl ketone, glycols such as ethylene glycol, and furan systems such as tetrahydrofuran, dimethylformamide, dimethylacetamide, and N-methyl-2-pyrrolidone. As well as polar solvents, hexane, cyclohexane, cyclohexanone, toluene, xylene, cresol, chloroform, dichlorobenzene, dimethylbenzene, trimethylbenzene, pyridine, methylnaphthalene, nitromethane, acrylonitrile, methylene chloride, octadecylamine, Various solvents such as aniline, dimethyl sulfoxide, and benzyl alcohol may be used, but the present invention is not limited thereto. The content of the solvent includes the rest except for the content of the silicone-based composition.
상기 화학식 3으로 표시되는 실세스퀴옥산 고분자는 증류수와 알코올 용매를 혼합한 용매와 클로로실란 단량체를 합성하여 전구체를 제조하고, 반복단위 n과 m 구조를 도입하기 위하여 축합한 후, 정제하여 얻을 수 있다.The silsesquioxane polymer represented by Chemical Formula 3 can be obtained by synthesizing and introducing a repeating unit n and m structure to synthesize a precursor by synthesizing a solvent mixed with distilled water and an alcohol solvent and a chlorosilane monomer. have.
본 발명에 따른 합성 수지 코팅 조성물의 다른 실시예로서, 실세스퀴옥산 고분자, 합성 수지 및 용매를 포함한다. 상기 실세스퀴옥산 고분자 및 용매는 앞서 기술한 바와 동일하다.As another embodiment of the synthetic resin coating composition according to the present invention, it includes a silsesquioxane polymer, a synthetic resin and a solvent. The silsesquioxane polymer and solvent are the same as described above.
상기 합성 수지는 플라스틱을 형성하는 수지로서, 상용화된 유기계 고분자를 포함할 수 있다. 예를 들면, 폴리메틸메타아크릴레이트(polymethylmethacrylate, PMMA), 폴리에틸렌(polyethylene, PE), 폴리프로필렌(polypropylene, PP), 폴리스타이렌(polystyrene, PS), 폴리에틸렌 테레프탈레이트(polyethylene terephthalate, PET, 페트), 폴리아미드(polyamides, PA, 나일론), 폴리에스터(polyester, PES), 폴리염화비닐(polyvinyl chloride, PVC), 폴리우레탄(polyurethanes, PU), 폴리카보네이트(polycarbonate, PC), 고경도 폴리카보네이트(고경도 PC), 폴리염화비닐리덴(polyvinylidene chloride, PVDC), 폴리테트라플루오로에틸렌(polytetrafluoroethylene, PTFE), 폴리에테르에테르케톤(polyetheretherketone, PEEK) 및 폴리에테르이미드(polyetherimide, PEI) 등을 포함할 수 있으며, 상기 합성 수지는 칩(펠렛) 형태로 존재할 수 있다.The synthetic resin is a resin forming a plastic, and may include a commercially available organic polymer. For example, polymethylmethacrylate (PMMA), polyethylene (PE), polypropylene (PP), polystyrene (PS), polyethylene terephthalate (polyethylene terephthalate, PET, PET), poly Polyamides (PA, nylon), polyester (PES), polyvinyl chloride (PVC), polyurethane (polyurethanes, PU), polycarbonate (PC), high hardness polycarbonate (high hardness) PC), polyvinylidene chloride (PVDC), polytetrafluoroethylene (PTFE), polyetheretherketone (polyetheretherketone, PEEK) and polyetherimide (polyetherimide, PEI), and the like. The synthetic resin may be present in the form of chips (pellets).
상기 플라스틱을 형성하는 합성 수지와 상기 화학식 1 및 화학식 2로 표시되는 반복단위를 포함하는 실세스퀴옥산 고분자, 구체적으로, 상기 화학식 3으로 표시되는 실세스퀴옥산 고분자는 1:9 내지 9:1의 비율로 혼합되는 것이 바람직하며, 상기 비율을 만족하였을 때, 합성 수지(예를 들면, 플라스틱 등)의 표면 친수성의 지속력이 오래가는 특성이 있다.The silsesquioxane polymer comprising the synthetic resin forming the plastic and the repeating units represented by Formula 1 and Formula 2, specifically, the silsesquioxane polymer represented by Formula 3 is 1:9 to 9:1 It is preferred to be mixed at a ratio of, and when the ratio is satisfied, there is a property that the durability of the surface hydrophilicity of the synthetic resin (for example, plastic, etc.) is long lasting.
본 발명은 장기간 친수성이 유지되는 합성 수지 기재를 포함한다. 도 1은 본 발명의 실시예에 따른 합성 수지 기재(예를 들면, 플라스틱 필름 및 수지)의 단면도이다. 상기 도 1에 따른 합성 수지 기재는 구체적으로, 합성 수지(20)와 상기 화학식 1 및 화학식 2로 표시되는 반복단위를 포함하는 실세스퀴옥산 고분자(10)를 포함하는 합성 수지 코팅 조성물을 경화하여 합성 수지 기재를 형성할 수 있으며, 더욱 구체적으로, 합성 수지(20)와 상기 화학식 1 및 화학식 2로 표시되는 반복단위를 포함하는 실세스퀴옥산 고분자(10)를 혼합한 후 압출 성형하여 형성할 수 있다.The present invention includes a synthetic resin substrate whose hydrophilicity is maintained for a long time. 1 is a cross-sectional view of a synthetic resin substrate (eg, plastic film and resin) according to an embodiment of the present invention. The synthetic resin substrate according to FIG. 1 is specifically cured by a synthetic resin coating composition comprising a
도 2는 다른 실시예에 따른 합성 수지 기재(예를 들면, 플라스틱 필름 및 수지)의 단면도이다. 상기 도 2에 따른 합성 수지 기재는, 구체적으로, 합성 수지(20) 기판의 일면 이상에 합성 수지 코팅 조성물(10)로 코팅층을 형성하여 합성 수지 기재를 형성할 수 있으며, 더욱 구체적으로, 합성 수지(20) 기판 및 상기 합성 수지 기판의 일면 이상에 상기 실세스퀴옥산 고분자 또는 상기 합성 수지 및 실세스 퀴옥산 고분자를 포함하는 합성 수지 코팅 조성물(10)을 사용한 코팅층을 포함하여 합성 수지 기재를 형성할 수 있다.2 is a cross-sectional view of a synthetic resin substrate (eg, plastic film and resin) according to another embodiment. The synthetic resin substrate according to FIG. 2, specifically, may form a synthetic resin substrate by forming a coating layer with the synthetic
상기 합성 수지는 공지된 플라스틱 소재를 사용할 수 있으며, 예를 들어, 폴리에틸렌테레프탈레이트(PET) 수지, 폴리카보네이트계(PC) 수지, 폴리(메타)아크릴계 수지(예를 들면, 폴리(메틸메타아크릴)수지(PMMA)), 에틸렌초산비닐계(EVA) 수지, 폴리에스테르계 수지, 폴리아미드계 수지, 폴리이미드계 수지, 폴리아미드이미드계 수지, 폴리아릴프탈레이트계 수지, 실리콘계 수지, 폴리술폰계 수지, 폴리페닐렌술피드계 수지, 폴리에테르술폰계 수지, 폴리우레탄계 수지, 아세탈계 수지, 셀룰로오스계 수지(예를 들면, 트리아세틸셀룰로오스(TAC) 수지), 아크릴로니트릴-스티렌 공중합체(AS 수지), 아크릴로니트릴-부타디엔-스티렌 공중합체(ABS 수지), 폴리염화비닐계 수지 등을 포함할 수 있다.The synthetic resin may be a known plastic material, for example, polyethylene terephthalate (PET) resin, polycarbonate-based (PC) resin, poly (meth) acrylic resin (for example, poly (methyl methacrylate)) Resin (PMMA)), ethylene vinyl acetate (EVA) resin, polyester resin, polyamide resin, polyimide resin, polyamide imide resin, polyarylphthalate resin, silicone resin, polysulfone resin, Polyphenylene sulfide resin, polyether sulfone resin, polyurethane resin, acetal resin, cellulose resin (for example, triacetyl cellulose (TAC) resin), acrylonitrile-styrene copolymer (AS resin), Acrylonitrile-butadiene-styrene copolymer (ABS resin), polyvinyl chloride resin, and the like.
상기 코팅층은 본 발명에 따른 합성 수지 코팅 조성물이 경화되어 형성된다. 상기 합성 수지 코팅 조성물은 상기 화학식 1 및 화학식 2로 표시되는 반복단위를 포함하는 실세스퀴옥산 고분자 및 용매 또는 상기 화학식 1 및 화학식 2로 표시되는 반복단위를 포함하는 실세스퀴옥산 고분자, 합성 수지 및 용매를 포함할 수 있다. The coating layer is formed by curing the synthetic resin coating composition according to the present invention. The synthetic resin coating composition is a silsesquioxane polymer and a solvent containing a repeating unit represented by Formula 1 and Formula 2 or a silsesquioxane polymer comprising a repeating unit represented by Formula 1 and Formula 2, a synthetic resin And solvents.
본 발명에 따른 합성 수지 기재의 표면에 플라즈마 또는 코로나를 처리하거나, 습식으로 강산. 강염기 처리하면, 표면 에너지를 높임으로써 합성 수지와 상기 화학식 1 및 화학식 2로 표시되는 반복단위를 포함하는 실세스퀴옥산 고분자의 접착력을 강화시킬 수 있고, 상기 실세스퀴옥산 고분자의 Si-O-Si 구조가 Si-OH 또는 Si-O로 유도되거나, 상기 OR2 그룹은 C-OH 및 carboxyl grup(예를 들면, C-C=O 등) 등 친수성 작용기로 유도되므로, 유리와 동일한 친수성을 가질 수 있다. 이로 인해, 기존 유리의 표면에 행하던 기능성 코팅층을 동일한 수준으로 구현할 수 있고, 유리를 대체하고자 하는 여러 응용분야에 활용될 수 있다.Plasma or corona treatment on the surface of the synthetic resin substrate according to the present invention, or strong acid wet. When a strong base treatment is performed, the adhesion of the synthetic resin and the silsesquioxane polymer including the repeating units represented by Chemical Formulas 1 and 2 can be enhanced, and Si-O- of the silsesquioxane polymer is increased. Since the Si structure is derived from Si-OH or Si-O, or the OR 2 group is derived from a hydrophilic functional group such as C-OH and carboxyl grup (for example, CC=O, etc.), it may have the same hydrophilicity as glass. . For this reason, the functional coating layer used on the surface of the existing glass can be implemented at the same level, and can be utilized in various applications to replace the glass.
상기 합성 수지 기재는 필요에 따라, 불소계 코팅층을 더 포함할 수 있다. 상기 불소계 코팅층을 형성함으로써, 발수성을 더욱 장기간 유지시킬 수 있으며, 상기 불소계 코팅층은 트리플루오르메틸트리메톡시실란, 트리플루오르메틸트리에톡시실란, 트리플루오르프로필트리메톡시실란, 트리플루오르프로필트리에톡시실란, 노나플루오르부틸에틸트리메톡시실란, 노나플루오르부틸에틸트리에톡시실란, 노나플루오르헥실트리메톡시실란, 노나플루오르헥실트리에톡시실란, 헵타데카플루오르데실트리메톡시 실란, 헵타데카플루오르데실트리에톡시실란, 헵타테카플루오르데실트리이소프로필실란, 3-트리메톡시실릴프로필펜타데카플루오르옥테이트, 3-트리에톡시실릴프로필펜타데카플루오르옥테이트, 3-트리메톡시실릴프로필펜타데카플루오르옥틱아미드, 3-트리에톡시실릴프로필펜타데카플루오르옥틱아미드, 2-트리메톡시시릴에틸펜타데카플루오르데실술피드, 2-트리에톡시실릴에틸펜타데카플루오르데실술피드, 펜타플루오르페닐트리메톡시실란, 펜타플루오르페닐트리에톡시실란, 4-(퍼플루오르토릴)트리메톡시실란, 4-(퍼플루오르토릴)트리에톡시실란, 디메톡시비스(펜타플루오르페닐)실란, 디에톡시비스(4-펜타플루오르토릴)실란 등을 포함할 수 있다.If necessary, the synthetic resin substrate may further include a fluorine-based coating layer. By forming the fluorine-based coating layer, water repellency can be maintained for a longer period, and the fluorine-based coating layer is trifluoromethyltrimethoxysilane, trifluoromethyltriethoxysilane, trifluoropropyltrimethoxysilane, trifluoropropyltriethoxy. Silane, nonafluorobutylethyltrimethoxysilane, nonafluorobutylethyltriethoxysilane, nonafluorhexyltrimethoxysilane, nonafluorhexyltriethoxysilane, heptadecafluordecyltrimethoxy silane, heptadecafluordecyltri Ethoxysilane, heptatecafluordecyl triisopropylsilane, 3-trimethoxysilylpropylpentadecafluoroctate, 3-triethoxysilylpropylpentadecafluoroctate, 3-trimethoxysilylpropylpentadecafluorooctic Amide, 3-triethoxysilylpropylpentadecafluorooctamide, 2-trimethoxysilylethylpentadecafluordecylsulfide, 2-triethoxysilylethylpentadecafluordecylsulfide, pentafluorophenyltrimethoxysilane , Pentafluorphenyltriethoxysilane, 4-(perfluorotoryl)trimethoxysilane, 4-(perfluorotoryl)triethoxysilane, dimethoxybis(pentafluorophenyl)silane, diethoxybis(4-penta Fluoratoryl)silane and the like.
본 발명은 장기간 친수성이 유지되는 합성 수지 기재의 제조방법을 포함한다. 상기 합성 수지 기재의 제조 방법은 별도의 프라이머나 번거로운 연속공정 없이도 통상의 플라스틱 소재들의 표면에 친수성을 장기간 구현할 수 있으며, 상기 합성 수지 기재로는 예를 들면, 플라스틱 시트, 플라스틱 필름, 플라스틱 기판, 압출 또는 사출 성형 등이 다양한 방법으로 제조된 플라스틱 성형품을 포함할 수 있다.The present invention includes a method for producing a synthetic resin substrate that maintains hydrophilicity for a long time. The method of manufacturing the synthetic resin substrate can realize long-term hydrophilicity on the surface of ordinary plastic materials without a separate primer or cumbersome continuous process, and the synthetic resin substrate includes, for example, plastic sheet, plastic film, plastic substrate, and extrusion. Alternatively, injection molding or the like may include plastic molded products manufactured by various methods.
도 3은 본 발명의 실시예에 따른 친수성을 가지는 합성 수지 기재의 단면도이며, 구체적으로, 상기 도 1 및 도 2에 따른 플라스틱 필름 및 수지에 플라즈마 또는 코로나 처리하거나, 강염. 강산에서 습식으로 표면을 처리하여, 친수성(30)을 가지는 플라스틱 필름 및 수지의 단면도이다.3 is a cross-sectional view of a synthetic resin substrate having hydrophilicity according to an embodiment of the present invention, specifically, plasma or corona treatment or strong salts to the plastic films and resins according to FIGS. 1 and 2. It is a cross-sectional view of a plastic film and a
구체적으로, 상기 합성 수지 기재(성형체)의 기초 소재인 유기계 고분자에 내열성이 확보된 실세스퀴옥산을 첨가하여 기재(성형체)를 제작하고, 상기 기재(성형체)에 간단한 플라즈마, 코로나 또는 습식처리를 통해 유리와 같이 장기간 친수성이 유지되는 합성 수지 기재의 제조방법을 포함한다. 더욱 구체적으로, 합성 수지와 상기 화학식 1 및 화학식 2로 표시되는 반복단위를 포함하는 실세스퀴옥산 고분자(10)를 포함하는 합성 수지 코팅 조성물을 혼합한 후, 압출 성형한 후 경화시켜 합성 수지 기재를 제조하는 단계 및 상기 합성 수지 기재의 표면에 플라즈마 또는 코로나를 조사하거나, 습식으로 강산, 강염기를 처리하여 친수성을 가지는 합성 수지 기재를 제조하는 단계를 포함한다. Specifically, a base material (formed body) is prepared by adding silsesquioxane having heat resistance to an organic polymer that is a base material of the synthetic resin base material (formed body), and simple plasma, corona, or wet treatment is performed on the base material (formed body). It includes a method of manufacturing a synthetic resin substrate that maintains hydrophilicity over a long period of time, such as glass. More specifically, after mixing a synthetic resin and a synthetic resin coating composition comprising a silsesquioxane polymer (10) comprising a repeating unit represented by Chemical Formulas 1 and 2, extruded and cured, the synthetic resin substrate And manufacturing a synthetic resin substrate having hydrophilicity by irradiating plasma or corona on the surface of the synthetic resin substrate, or treating a strong acid or a strong base with wet.
상기 형성된 합성 수지 기재(예를 들면, 플라스틱 시트 또는 필름)의 두께는 가공법에 따라 변할 수 있고 특별히 두께에 따라 성능이 제한되지 않는다. 상기 합성 수지 기재의 제조방법은 코팅 공정없이, 상기 합성 수지 코팅 조성물을 혼합하여 압출 성형함으로써, 합성 수지 기재(성형품)의 자체 표면에 친수성을 가질 수 있다.The thickness of the formed synthetic resin substrate (eg, plastic sheet or film) may vary depending on the processing method, and performance is not particularly limited depending on the thickness. The method of manufacturing the synthetic resin substrate may have hydrophilicity on its own surface of the synthetic resin substrate (molded product) by mixing and extruding the synthetic resin coating composition without a coating process.
본 발명에 따른 장기간 친수성이 유지되는 합성 수지 기재 제조방법의 다른 실시예로는 합성 수지 기판에 상기 화학식 1 및 화학식 2로 표시되는 반복단위를 포함하는 실세스퀴옥산 고분자를 포함하는 상기 합성 수지 코팅 조성물로 코팅하는 단계 및 상기 코팅된 합성 수지 기판에 플라즈마 또는 코로나를 처리하거나 습식으로 강산. 강염기를 처리하여 친수성을 가지는 합성 수지 기재를 형성하는 단계를 더욱 포함한다. 구체적으로, 상기 합성 수지 기판에 상기 화학식 1 및 화학식 2로 표시되는 반복단위를 포함하는 실세스퀴옥산 고분자와 유기 용매를 포함한 합성 수지 코팅 조성물을 분사하거나 도포하여 코팅층을 형성할 수 있으며, 상기 코팅층에 고온의 열처리를 거쳐 유기 용매를 제거하는 단계를 더욱 포함할 수 있다. According to another embodiment of the method for manufacturing a synthetic resin substrate having long-term hydrophilicity according to the present invention, the synthetic resin coating comprising a silsesquioxane polymer comprising the repeating units represented by Chemical Formulas 1 and 2 on a synthetic resin substrate Coating with a composition and treating the plasma or corona with the coated synthetic resin substrate, or wet acid. The method further includes forming a synthetic resin substrate having hydrophilicity by treating the strong base. Specifically, a coating layer may be formed by spraying or applying a synthetic resin coating composition comprising a silsesquioxane polymer including the repeating units represented by Chemical Formulas 1 and 2 and an organic solvent on the synthetic resin substrate, and the coating layer It may further include the step of removing the organic solvent through a high temperature heat treatment.
또한, 상기 화학식 1 및 화학식 2로 표시되는 반복단위를 포함하는 실세스퀴옥산 고분자는 통상적인 코팅제와 혼합하여 코팅 조성물로 사용할 수 있으며, 필요에 따라, 광 개시제를 더욱 포함할 수 있다.In addition, the silsesquioxane polymer containing the repeating units represented by Chemical Formula 1 and Chemical Formula 2 can be used as a coating composition by mixing with a conventional coating agent, and if necessary, may further include a photoinitiator.
상기 코팅은 1회만으로도 충분히 플라스틱 표면에 고경도, 내스크레치 및 친수성을 부여할 수 있다. 상기 코팅층의 두께는 50nm 내지 100um이다. 상기 코팅층의 두께가 50um 미만의 박막에서는 코팅 후 공정인 코로나/플라즈마 처리 시 기판과 코팅면의 접착 계면의 약화가 발생될 수 있으며, 100um 이상의 두꺼운 코팅에서는 코팅면의 깨짐 현상이 발생될 수 있다. The coating can sufficiently impart high hardness, scratch resistance and hydrophilicity to the plastic surface even once. The thickness of the coating layer is 50nm to 100um. When the thickness of the coating layer is less than 50 μm, when the corona/plasma process, which is a post-coating process, may weaken the adhesion interface between the substrate and the coating surface, a coating surface may be cracked when the coating thickness is greater than 100 μm.
상기 합성 수지 기재에 친수성을 부여하는 방법에 있어서, 상기 합성 수지 성형품에 플라즈마 또는 코로나를 처리하거나, 습식으로 강산. 강염기 처리하면, 표면 에너지를 높임으로써 합성 수지와 상기 화학식 1 및 화학식 2로 표시되는 반복단위를 포함하는 실세스퀴옥산 고분자의 접착력을 강화시킬 수 있고, 상기 실세스퀴옥산 고분자의 Si-O-Si 구조가 Si-OH 또는 Si-O로 유도되거나, 상기 OR2 그룹은 C-OH 및 carboxyl grup(예를 들면, C-C=O 등) 등 친수성 작용기로 유도되므로, 유리와 동일한 친수성을 가질 수 있다. 이로 인해, 기존 유리의 표면에 행하던 기능성 코팅층을 동일한 수준으로 구현할 수 있고, 유리를 대체하고자 하는 여러 응용분야에 활용될 수 있다. 필요에 따라, 상기 친수성을 가지는 합성 수지 기재에 불소계 코팅제를 도포함으로써, 발수성을 더욱 장기간 유지시킬 수 있다.In the method of imparting hydrophilicity to the synthetic resin substrate, the synthetic resin molded article is treated with plasma or corona, or wetted with strong acid. When a strong base treatment is performed, the adhesion of the synthetic resin and the silsesquioxane polymer including the repeating units represented by Chemical Formulas 1 and 2 can be enhanced, and Si-O- of the silsesquioxane polymer is increased. Since the Si structure is derived from Si-OH or Si-O, or the OR 2 group is derived from a hydrophilic functional group such as C-OH and carboxyl grup (for example, CC=O, etc.), it may have the same hydrophilicity as glass. . For this reason, the functional coating layer used on the surface of the existing glass can be implemented at the same level, and can be utilized in various applications to replace the glass. If necessary, water repellency can be maintained for a longer period of time by applying a fluorine-based coating agent to the synthetic resin substrate having hydrophilicity.
이하, 실시예를 통하여 본 발명을 더욱 상세히 설명하나, 본 발명이 하기 실시예에 의하여 한정되는 것은 아니다. Hereinafter, the present invention will be described in more detail through examples, but the present invention is not limited by the following examples.
[합성예 1] 실세스퀴옥산 고분자 제조 [Synthesis Example 1] Preparation of silsesquioxane polymer
냉각관과 교반기를 구비한 건조된 플라스크에, 증류수 12g과 메탄올 50g을 혼합하여 준비하고, 3-(Trichlorosilyl)propyl methacrylate 200g을 10분에 걸쳐 천천히 적가하였다. 이때, 온도는 -4도의 온도를 유지하도록 하였다. 이후 20분간 교반한 후, 톨루엔 500g을 추가로 적가 한 후, 온도를 상온으로 올려 10분간 더 교반을 진행하였다. 상기 반응이 준비되는 동안, Na2CO3 20중량% 수용액을 별도로 제조하고, 5g을 위 반응기에 한번에 적가하였다. 이후, 온도를 50도로 올려 1일간 축합 반응을 진행하였다. In a dried flask equipped with a cooling tube and a stirrer, 12 g of distilled water and 50 g of methanol were prepared by mixing, and 200 g of 3-(Trichlorosilyl)propyl methacrylate was slowly added dropwise over 10 minutes. At this time, the temperature was maintained at -4 degrees. After stirring for 20 minutes, 500 g of toluene was additionally added dropwise, and the temperature was raised to room temperature to further agitate for 10 minutes. While the reaction was being prepared, Na 2 CO 3 A 20% by weight aqueous solution was separately prepared, and 5 g was added dropwise to the above reactor at once. Subsequently, the temperature was increased to 50 degrees to conduct a condensation reaction for 1 day.
상기 얻어진 화학식 1로 표시되는 구조체와 용매 혼합물은, 물과 톨루엔의 층분리 정제를 2차례 진행하고, pH가 중성임을 확인한 후, 톨루엔층을 얻어내어 진공 감압으로 톨루엔을 모두 제거한 후 수득하였다. The obtained structure and solvent mixture represented by the formula (1) were obtained by removing the toluene layer under vacuum and depressurizing to obtain a toluene layer after performing layer separation and purification of water and toluene twice and confirming that the pH was neutral.
분자량을 측정한 결과, 화학식 1로 표시되는 구조와 같은 선형구조의 실세스퀴옥산이 3,000 스티렌 환산 분자량을 가짐을 확인할 수 있었으며, 미 반응상태의 단량체는 존재하지 않는 것을 확인 할 수 있었다.As a result of measuring the molecular weight, it was confirmed that silsesquioxane having a linear structure such as the structure represented by Chemical Formula 1 has a molecular weight in terms of 3,000 styrene, and it was confirmed that no unreacted monomer exists.
TGA 분석을 통한 분해온도 측정법으로 알콕시의 잔존율은 1wt%였으며, 1H-NMR을 통해 측정한 결과n/m의 비율은 0.5의 값을 가짐을 확인할 수 있었다.As a result of measuring the decomposition temperature through TGA analysis, the residual ratio of alkoxy was 1 wt%, and as a result of measurement through 1H-NMR, it was confirmed that the ratio of n/m had a value of 0.5.
[합성예 2] 실세스퀴옥산 고분자 제조 [Synthesis Example 2] Preparation of silsesquioxane polymer
상기 합성예 1에서 얻어진 물질 50g을 냉각관과 교반기를 구비한 건조된 플라스크에 넣고 질소 분위기로 1시간 동안 치환 후, 톨루엔 100g을 천천히 넣어주었다. 이후 염산 수용액 50g을 넣고 온도를 50도로 올린 후 매우 강하게 3일간 교반 하였다. 50 g of the material obtained in Synthesis Example 1 was placed in a dried flask equipped with a cooling tube and a stirrer, and replaced with a nitrogen atmosphere for 1 hour, and then 100 g of toluene was slowly added. Then, 50 g of hydrochloric acid aqueous solution was added and the temperature was raised to 50 degrees, followed by stirring very strongly for 3 days.
이후, 물과 톨루엔의 층분리 정제를 5차례 진행하고, pH가 중성임을 확인한 후, 톨루엔층을 얻어내어 진공감압으로 톨루엔을 모두 제거한 수 수득할 수 있었다. 분자량을 측정한 결과, 상기 화학식 1로 표시되는 구조에서 알콕시(alkoxy) 부분이 제거된 선형구조의 실세스퀴옥산이 2,500스티렌 환산 분자량을 가짐을 확인할 수 있었으며, TGA 분석을 통한 분해온도 측정법으로 알콕시가 존재하지 않으며 Si-OH로 변화되었음을 확인할 수 있었다, 1H-NMR을 통해 측정한 결과, n/m의 비율은 0.5의 비율로 변화가 없음을 확인할 수 있었다Subsequently, the layer-separated purification of water and toluene was performed 5 times, and after confirming that the pH was neutral, a toluene layer was obtained to remove all of the toluene under vacuum pressure. As a result of measuring the molecular weight, it was confirmed that the silsesquioxane having a linear structure in which the alkoxy portion was removed from the structure represented by Chemical Formula 1 has a molecular weight in terms of 2,500 styrene, and the alkoxy was used as a method for measuring the decomposition temperature through TGA analysis. It was confirmed that it does not exist and changed to Si-OH. As a result of measurement through 1H-NMR, it was confirmed that the ratio of n/m was not changed at a ratio of 0.5.
[합성예 3] 실세스퀴옥산 고분자 제조 [Synthesis Example 3] Preparation of silsesquioxane polymer
냉각관과 교반기를 구비한 건조된 플라스크에, 증류수 5g과 메탄올 100g을 혼합하여 준비하고, 3-(Trichlorosilyl)propyl methacrylate 261.61g을 10분에 걸쳐 천천히 적가 하였다. 이때, 온도는 -4도의 온도를 유지하도록 하였다. 이후 50분간 교반한 후, 톨루엔 500g을 추가로 적가 한 후, 온도를 상온으로 올려 10분간 더 교반을 진행하였다. 상기 반응이 준비되는 동안, KOH 20중량% 수용액을 별도로 제조하고, 5g을 상기 반응기에 한번에 적가하였다. 이후, 상온에서 7일간 축합 반응을 천천히 진행하였다. To a dried flask equipped with a cooling tube and a stirrer, 5 g of distilled water and 100 g of methanol were prepared by mixing, and 261.61 g of 3-(Trichlorosilyl)propyl methacrylate was slowly added dropwise over 10 minutes. At this time, the temperature was maintained at -4 degrees. After stirring for 50 minutes, 500 g of toluene was additionally added dropwise, and the temperature was raised to room temperature to further agitate for 10 minutes. While the reaction was being prepared, a 20% by weight aqueous solution of KOH was separately prepared, and 5 g was added dropwise to the reactor at once. Thereafter, the condensation reaction was slowly performed at room temperature for 7 days.
상기 얻어진 화학식 1로 표시되는 구조체와 용매 혼합물은, 물과 톨루엔의 층분리 정제를 2차례 진행하고, pH가 중성임을 확인한 후, 톨루엔층을 얻어내어 진공감압으로 톨루엔을 모두 제거한 수 수득할 수 있었다. The obtained structure and solvent mixture represented by Chemical Formula 1, the layer separation and purification of water and toluene were performed twice, and after confirming that the pH was neutral, a toluene layer was obtained to remove all of the toluene under vacuum pressure. .
분자량을 측정한 결과, 20,000 스티렌 환산 분자량을 가짐을 확인할 수 있었으며, 미 반응상태의 단량체는 존재하지 않는 것을 확인 할 수 있었다.As a result of measuring the molecular weight, it was confirmed that it has a molecular weight equivalent to 20,000 styrene, and it was confirmed that no monomer in an unreacted state was present.
TGA 분석을 통한 분해온도 측정법으로 알콕시는 존재하지 않았으며, 1H-NMR및 29Si-NMR 분석을 통해 n/m의 비율은 15인 것을 확인 할 수 있었다.As a method for measuring the decomposition temperature through TGA analysis, alkoxy was not present, and it was confirmed that the ratio of n/m was 15 through 1H-NMR and 29Si-NMR analysis.
[합성예 4] 실세스퀴옥산 고분자 제조 [Synthesis Example 4] Preparation of silsesquioxane polymer
냉각관과 교반기를 구비한 건조된 플라스크에, 증류수 0.1g과 메탄올 100g을 혼합하여 준비하고, 3-(Trichlorosilyl)propyl methacrylate 261.61g을 10분에 걸쳐 천천히 적가 하였다. 이때, 온도는 -4도의 온도를 유지하도록 하였다. 이후 50분간 교반한 후, 톨루엔 500g을 추가로 적가 한 후, 온도를 상온으로 올려 10분간 더 교반을 진행하였다. 상기 반응이 준비되는 동안, KOH 20중량% 수용액을 별도로 제조하고, 10g을 상기 반응기에 한번에 적가하였다. 이후, 상온에서 3일간 축합 반응을 천천히 진행하였다. To a dried flask equipped with a cooling tube and a stirrer, 0.1 g of distilled water and 100 g of methanol were prepared by mixing, and 261.61 g of 3-(Trichlorosilyl)propyl methacrylate was slowly added dropwise over 10 minutes. At this time, the temperature was maintained at -4 degrees. After stirring for 50 minutes, 500 g of toluene was additionally added dropwise, and the temperature was raised to room temperature to further agitate for 10 minutes. While the reaction was being prepared, a 20% by weight aqueous solution of KOH was prepared separately, and 10 g was added dropwise to the reactor at once. Thereafter, the condensation reaction was slowly performed at room temperature for 3 days.
상기 얻어진 화학식 1로 표시되는 구조체와 용매 혼합물은, 물과 톨루엔의 층분리 정제를 2차례 진행하고, pH가 중성임을 확인한 후, 톨루엔층을 얻어내어 진공감압으로 톨루엔을 모두 제거한 수 수득할 수 있었다. The obtained structure and solvent mixture represented by Chemical Formula 1, the layer separation and purification of water and toluene were performed twice, and after confirming that the pH was neutral, a toluene layer was obtained to remove all of the toluene under vacuum pressure. .
분자량을 측정한 결과, 30,000 스티렌 환산 분자량을 가짐을 확인할 수 있었으며, 미 반응상태의 단량체는 존재하지 않는 것을 확인 할 수 있었다.As a result of measuring the molecular weight, it was confirmed that it had a molecular weight equivalent to 30,000 styrene, and it was confirmed that no monomer in an unreacted state was present.
TGA 분석을 통한 분해온도 측정법으로 알콕시의 잔존율은 10wt%였으며, 1H-NMR을 통해 측정한 결과, n/m의 비율은 0.05의 값을 가짐을 확인할 수 있었다.As a result of measuring the decomposition temperature through TGA analysis, the residual rate of alkoxy was 10 wt%, and as a result of measurement through 1H-NMR, it was confirmed that the ratio of n/m had a value of 0.05.
[실시예 1 및 비교예 1 내지 3] 친수성 플라스틱 필름 제조 [Example 1 and Comparative Examples 1 to 3] Preparation of hydrophilic plastic film
상기 합성예 1과 폴리메틸메타아크릴레이트(PMMA, polymethyl methacrylate) 수지를 혼합하여 플라스틱 필름을 제조하였으며(실시예 1), 상기 합성예 1 대신에, 합성예 2 내지 4를 폴리메틸메타아크릴레이트 수지와 혼합하여 플라스틱 필름을 제조하였다(비교예 1 내지 3). A plastic film was prepared by mixing the Synthesis Example 1 and a polymethyl methacrylate (PMMA) resin (Example 1), and instead of Synthesis Example 1, Synthesis Examples 2 to 4 were polymethyl methacrylate resins. And mixed to prepare a plastic film (Comparative Examples 1 to 3).
상기 PMMA는 LG IH830이며, 톨루엔에 50wt%로 녹여 준비하였다. 준비된 PMMA 톨루엔 혼합용액과 상기 합성예 1 내지 4에서 얻은 물질을 각각 50wt%로 혼합하여 교반하였다. 3시간 교반 이후 혼합용액을 평면유리에 붓고, 닥터블레이드 코팅 후 50um, 500um, 2mm 두께의 시편을 제작하였다. 상기 제조한 플라스틱 필름 표면에 코로나 처리를 진행하였다(3DT社 multidyne, DC24V).The PMMA is LG IH830, and was prepared by dissolving in toluene at 50 wt%. The prepared PMMA toluene mixed solution and the materials obtained in Synthesis Examples 1 to 4 were mixed and stirred at 50 wt%, respectively. After stirring for 3 hours, the mixed solution was poured into a flat glass, and after the doctor blade coating, specimens of 50 um, 500 um, and 2 mm thickness were prepared. Corona treatment was performed on the prepared plastic film surface (3DT company multidyne, DC24V).
이때, 상기 합성예 3을 사용한 비교예 2는 부스러져 필름을 형성하지 못하였고, 합성예 2 및 4를 사용한 비교예 1 및 3은 고정되지 못하고, 흐르는 특성을 가지므로, 필름을 형성하지 못하였다.At this time, Comparative Example 2 using the Synthesis Example 3 did not form a film, and Comparative Examples 1 and 3 using the Synthesis Examples 2 and 4 were not fixed and had a flowing property, so that a film was not formed. .
[실시예 2 및 비교예 4 내지 6] 친수성 플라스틱 필름 제조 [Example 2 and Comparative Examples 4 to 6] Preparation of hydrophilic plastic film
상기 합성예 1과 폴리카보네이트(PC, polycarbonate) 수지를 혼합하여 플라스틱 필름을 제조하였으며(실시예 2), 상기 합성예 1 대신에, 합성예 2 내지 4를 사용하여 플라스틱 필름을 제조하였다(비교예 4 내지 6). 상기 PC는 롯데케미칼사의 PC-1220이며, 톨루엔에 50wt%로 녹여 준비하였다. 준비된 PC 톨루엔 혼합용액과 상기 합성예 1 내지 4에서 얻은 물질을 각각 50wt%로 혼합하여 교반하였다. 3시간 교반 이후 혼합용액을 평면유리에 붓고, 닥터블레이드 코팅 후 50um, 500um, 2mm 두께의 시편을 제작하였다. 상기 제조한 플라스틱 필름 표면에 코로나 처리를 진행하였다(3DT社 multidyne, DC24V). A plastic film was prepared by mixing the Synthesis Example 1 and a polycarbonate (PC, polycarbonate) resin (Example 2), and instead of the Synthesis Example 1, a Synthesis Example 2 to 4 was used to prepare a plastic film (Comparative Example). 4 to 6). The PC is PC-1220 of Lotte Chemical, and was prepared by dissolving in toluene at 50 wt%. The prepared PC toluene mixed solution and the materials obtained in Synthesis Examples 1 to 4 were mixed and stirred at 50 wt%, respectively. After stirring for 3 hours, the mixed solution was poured into a flat glass, and after the doctor blade coating, specimens of 50 um, 500 um, and 2 mm thickness were prepared. Corona treatment was performed on the prepared plastic film surface (3DT company multidyne, DC24V).
이때, 합성예 3을 사용한 비교예 5는 부스러져 필름을 형성하지 못하였고, 합성예 2 및 4를 사용한 비교예 4 및 6은 고정되지 못하고, 흐르는 특성을 가지므로, 필름을 형성하지 못하였다. At this time, Comparative Example 5 using Synthesis Example 3 did not form a film, and Comparative Examples 4 and 6 using Synthesis Examples 2 and 4 were not fixed and had a flowing property, so that a film was not formed.
[실시예 3 내지 4] 친수성 플라스틱 필름 제조 [Examples 3 to 4] Preparation of hydrophilic plastic film
상기 합성예 1에서 얻어진 상기 화학식 1의 구조체 50g을 메틸아이소부틸케톤에 50 wt%로 녹여 100g의 조성물을 제조하였다. 이후, 준비된 조성물 100g에 UV 개시제 irgacure-250(BAST社) 5g을 첨가하고 10분간 교반하여 광경화형 수지 조성물을 제조하였다. 제조된 광경화형 수지 조성물을 2mm 두께의 PMMA(에스폴리텍社) 시트(실시예 3)과 PC(에스폴리텍社) 시트(실시예 4)에 도포하고 85℃의 건조오븐에서 용매를 증발시킨 후 UV 장비를 이용하여 1 J/cm2의 UV를 조사하여 코팅막을 형성하였다. 이때 코팅 두께는 20 um였다. 상기 제조한 플라스틱 필름 표면에 코로나 처리를 진행하였다(3DT社 multidyne, DC24V).50 g of the structure of Formula 1 obtained in Synthesis Example 1 was dissolved in methyl isobutyl ketone at 50 wt% to prepare a composition of 100 g. Thereafter, 5 g of a UV initiator irgacure-250 (BAST) was added to 100 g of the prepared composition and stirred for 10 minutes to prepare a photocurable resin composition. The prepared photocurable resin composition was applied to a 2 mm thick PMMA sheet (Example 3) and a PC sheet (Example 4), and the solvent was evaporated in a drying oven at 85° C., followed by UV The coating film was formed by irradiating UV of 1 J/cm 2 using equipment. At this time, the coating thickness was 20 um. Corona treatment was performed on the prepared plastic film surface (3DT company multidyne, DC24V).
[실시예 5 내지 8] 친수성 플라스틱 필름 제조 [Examples 5 to 8] Preparation of hydrophilic plastic film
상기 실시예 1 내지 4에서 제조된 시트 및 필름을 코로나 처리 전에 각각 취하여 KOH 1kg, 에틸알콜 1kg, 증류수 1kg이 혼합된 알코올 수용액에 넣고 20분간 표면 처리 후, 증류수로 3회 수세하고 100℃ 오븐에 10분간 건조하는 것으로 실시예 5 내지 8을 제조하였다.The sheets and films prepared in Examples 1 to 4 were taken before corona treatment, respectively, placed in an alcohol aqueous solution containing 1 kg of KOH, 1 kg of ethyl alcohol, and 1 kg of distilled water, and after 20 minutes of surface treatment, washed three times with distilled water and washed in a 100° C. oven. Examples 5 to 8 were prepared by drying for 10 minutes.
[실험예 1] 수접촉각의 변화(친수성 비교) [Experimental Example 1] Change in water contact angle (comparison with hydrophilicity)
상기 코로나 처리된 실시예 1 내지 8의 수접촉각의 변화를 60일간 측정하여 하기 표 1에 나타내었다. 이때, 일반 유리인 소다라임글라스와 순수한 PC 및 PMMA 수지의 변화도 함께 측정하였다.The changes in the water contact angle of the corona-treated Examples 1 to 8 were measured for 60 days and are shown in Table 1 below. At this time, changes in soda lime glass, which is a general glass, and pure PC and PMMA resin were also measured.
(화학식1/PMMA혼합 필름)
+코로나Example 1
(Formula 1/PMMA mixed film)
+ Corona
(화학식1/PC혼합 필름)
+코로나Example 2
(Formula 1/PC mixed film)
+ Corona
(화학식1/PMMA코팅 필름)
+코로나Example 3
(Formula 1/PMMA coating film)
+ Corona
(화학식1/PC코팅 필름)
+코로나Example 4
(Formula 1 / PC coating film)
+ Corona
(화학식1/PMMA혼합 필름)
+KOH 알코올 수용액Example 5
(Formula 1/PMMA mixed film)
+KOH alcohol aqueous solution
(화학식1/PC혼합 필름)
+KOH 알코올 수용액Example 6
(Formula 1/PC mixed film)
+KOH alcohol aqueous solution
(화학식1/PMMA코팅 필름)
+KOH 알코올 수용액Example 7
(Formula 1/PMMA coating film)
+KOH alcohol aqueous solution
(화학식1/PC코팅 필름)
+KOH 알코올 수용액Example 8
(Formula 1 / PC coating film)
+KOH alcohol aqueous solution
상기 표 1을 참고하면, 본 발명에서 따른 실시예 1 내지 8은 유리와 동일한 표면 친수화를 가지는 것을 확인하였다.Referring to Table 1, it was confirmed that Examples 1 to 8 according to the present invention have the same surface hydrophilization as glass.
[실험 평가] 실세스퀴옥산 고분자의 n/m 비율에 대한 물리적 특성 비교[Experimental Evaluation] Comparison of physical properties of n-m ratio of silsesquioxane polymer
상기 실세스퀴옥산 고분자의 n/m의 비율에 따른 투명도, 부착력, 코팅 후 강도, 유연한 정도 등의 물리적 특성을 비교 평가하여, 하기 표 2에 기재하였다.Physical properties such as transparency, adhesion, strength after coating, and flexibility according to the ratio of n/m of the silsesquioxane polymer were compared and evaluated, and the results are shown in Table 2 below.
SSQ단독코팅PMMA/
SSQ single coating
SSQ단독코팅PMMA/
SSQ single coating
SSQ단독코팅PMMA/
SSQ single coating
SSQ단독코팅PMMA/
SSQ
SSQ단독코팅PC/
SSQ single coating
SSQ단독코팅PC/
SSQ single coating
SSQ단독코팅PC/
SSQ
합성코팅PMMA/
Synthetic coating
합성코팅PMMA/
Synthetic coating
합성코팅PMMA/
Synthetic coating
합성코팅PMMA/
합성코팅PC/
Synthetic coating
합성코팅PC/
Synthetic coating
합성코팅PC/
SSQ단독코팅PMMA/
SSQ single coating
SSQ단독코팅PMMA/
SSQ single coating
SSQ단독코팅PC/
SSQ single coating
SSQ단독코팅PC/
SSQ single coating
SSQ단독코팅PC/
SSQ single coating
합성코팅PMMA/
Synthetic coating
합성코팅PMMA/
Synthetic coating
합성코팅PC/
Synthetic coating
합성코팅PC/
Synthetic coating
합성코팅PC/
Synthetic coating
상기 표 2를 참고하면, 상기 실세스퀴옥산 고분자의 n/m의 비율이 0.1 내지 10을 만족하는 실험이 투명도, 부착력, 코팅 후 강도, 유연한 정도 등의 물리적 특성이 좋은 것을 알 수 있다.Referring to Table 2, it can be seen that an experiment in which the ratio of n/m of the silsesquioxane polymer satisfies 0.1 to 10 has good physical properties such as transparency, adhesion, strength after coating, and flexibility.
[실험 평가] 실세스퀴옥산 고분자와 PMMA 또는 PC의 혼합 비율에 따른 친수화 비교[Experimental Evaluation] Comparison of hydrophilization according to the mixing ratio of silsesquioxane polymer and PMMA or PC
상기 실세스퀴옥산 고분자와 PMMA 또는 PC의 혼합 비율을 하기 표 3에 기재된 혼합비로 혼합하여 필름을 제조하였다. 제조된 필름은 코로나 처리를 통해 친수화를 유도한 친수화 정도를 비교 평가하였고, 그 결과를 하기 표 3에 기재하였다.The mixing ratio of the silsesquioxane polymer and PMMA or PC was mixed at the mixing ratio shown in Table 3 to prepare a film. The prepared film was compared and evaluated for the degree of hydrophilization that induced hydrophilization through corona treatment, and the results are shown in Table 3 below.
(총합= 10)Mixing ratio
(Total = 10)
이하10 degrees
Below
이하10 degrees
Below
이하10 degrees
Below
이하10 degrees
Below
이하10 degrees
Below
이하10 degrees
Below
이하10 degrees
Below
이하10 degrees
Below
이하10 degrees
Below
이하10 degrees
Below
이하10 degrees
Below
이하10 degrees
Below
상기 표 3을 참고하면, 상기 실세스퀴옥산 고분자와 PMMA 또는 PC의 혼합 비율이 1:9 내지 9:1을 만족하는 실험이 친수화 정도가 좋고, 표면 친수성의 지속력이 오래가는 것을 알 수 있으며, 상기 표 1을 참고하면, 유리와 동일한 친수화 정도를 가지는 것을 알 수 있다.Referring to Table 3, it can be seen that the experiment in which the mixing ratio of the silsesquioxane polymer and PMMA or PC satisfies 1:9 to 9:1 has a good degree of hydrophilicity, and the persistence of surface hydrophilicity is long. , Referring to Table 1 above, it can be seen that it has the same degree of hydrophilization as glass.
Claims (12)
용매를 포함하는 합성 수지 코팅 조성물.
[화학식 1]
[화학식 2]
상기 화학식 1 및 화학식 2에 있어서, R1은 각각 독립적으로, 수소, 중수소, 할로겐, 아민기, 에폭시기, 사이클로헥실에폭시기, (메타)아크릴기, 히드록시기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기, 탄소수 1 내지 40의 알킬기, 탄소수 2 내지 40의 알케닐기, 탄소수 1 내지 40의 알콕시기, 탄소수 3 내지 40의 시클로알킬기, 탄소수 3 내지 40의 헤테로시클로알킬기, 탄소수 6 내지 40의 아릴기, 탄소수 3 내지 40의 헤테로아릴기, 탄소수 3 내지 40의 아르알킬기, 탄소수 3 내지 40의 아릴옥시기, 또는 탄소수 3 내지 40의 아릴사이올기이고, R2는 각각 독립적으로, 수소, 중수소, 할로겐, 이소시아네이트기, 탄소수 1 내지 40의 알킬기, 탄소수 2 내지 40의 알케닐기, 탄소수 3 내지 40의 시클로알킬기, 탄소수 3 내지 40의 헤테로시클로알킬기, 탄소수 6 내지 40의 아릴기, 탄소수 3 내지 40의 헤테로아릴기, 탄소수 3 내지 40의 아르알킬기 또는 탄소수 2 내지 40의 에폭시기이며, n 및 m은 각각 독립적으로 1 내지 100,000의 정수이며, n/m은 0.1 내지 10 이다.A silsesquioxane polymer comprising repeating units represented by the following Chemical Formulas 1 and 2; And
Synthetic resin coating composition comprising a solvent.
[Formula 1]
[Formula 2]
In Formula 1 and Formula 2, R1 is each independently hydrogen, deuterium, halogen, amine group, epoxy group, cyclohexyl epoxy group, (meth)acrylic group, hydroxy group, silol group, isocyanate group, nitrile group, nitro group, Alkyl group having 1 to 40 carbon atoms, alkenyl group having 2 to 40 carbon atoms, alkoxy group having 1 to 40 carbon atoms, cycloalkyl group having 3 to 40 carbon atoms, heterocycloalkyl group having 3 to 40 carbon atoms, aryl group having 6 to 40 carbon atoms, carbon number 3 To 40 heteroaryl group, 3 to 40 aralkyl group, 3 to 40 aryloxy group, or 3 to 40 arylthio group, R2 are each independently hydrogen, deuterium, halogen, isocyanate group, Alkyl group having 1 to 40 carbon atoms, alkenyl group having 2 to 40 carbon atoms, cycloalkyl group having 3 to 40 carbon atoms, heterocycloalkyl group having 3 to 40 carbon atoms, aryl group having 6 to 40 carbon atoms, heteroaryl group having 3 to 40 carbon atoms, carbon number It is an aralkyl group of 3 to 40 or an epoxy group of 2 to 40 carbon atoms, n and m are each independently an integer of 1 to 100,000, and n/m is 0.1 to 10.
합성 수지; 및
용매를 포함하는 합성 수지 코팅 조성물.
[화학식 1]
[화학식 2]
상기 화학식 1 및 화학식 2에 있어서, R1은 각각 독립적으로, 수소, 중수소, 할로겐, 아민기, 에폭시기, 사이클로헥실에폭시기, (메타)아크릴기, 히드록시기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기, 탄소수 1 내지 40의 알킬기, 탄소수 2 내지 40의 알케닐기, 탄소수 1 내지 40의 알콕시기, 탄소수 3 내지 40의 시클로알킬기, 탄소수 3 내지 40의 헤테로시클로알킬기, 탄소수 6 내지 40의 아릴기, 탄소수 3 내지 40의 헤테로아릴기, 탄소수 3 내지 40의 아르알킬기, 탄소수 3 내지 40의 아릴옥시기, 또는 탄소수 3 내지 40의 아릴사이올기이고, R2는 각각 독립적으로, 수소, 중수소, 할로겐, 이소시아네이트기, 탄소수 1 내지 40의 알킬기, 탄소수 2 내지 40의 알케닐기, 탄소수 3 내지 40의 시클로알킬기, 탄소수 3 내지 40의 헤테로시클로알킬기, 탄소수 6 내지 40의 아릴기, 탄소수 3 내지 40의 헤테로아릴기, 탄소수 3 내지 40의 아르알킬기 또는 탄소수 2 내지 40의 에폭시기이며, n 및 m은 각각 독립적으로 1 내지 100,000의 정수이며, n/m은 0.1 내지 10 이다.A silsesquioxane polymer comprising repeating units represented by the following Chemical Formulas 1 and 2;
Synthetic resins; And
Synthetic resin coating composition comprising a solvent.
[Formula 1]
[Formula 2]
In Formula 1 and Formula 2, R1 is each independently hydrogen, deuterium, halogen, amine group, epoxy group, cyclohexyl epoxy group, (meth)acrylic group, hydroxy group, silol group, isocyanate group, nitrile group, nitro group, Alkyl group having 1 to 40 carbon atoms, alkenyl group having 2 to 40 carbon atoms, alkoxy group having 1 to 40 carbon atoms, cycloalkyl group having 3 to 40 carbon atoms, heterocycloalkyl group having 3 to 40 carbon atoms, aryl group having 6 to 40 carbon atoms, carbon number 3 To 40 heteroaryl group, 3 to 40 aralkyl group, 3 to 40 aryloxy group, or 3 to 40 arylthio group, R2 are each independently hydrogen, deuterium, halogen, isocyanate group, Alkyl group having 1 to 40 carbon atoms, alkenyl group having 2 to 40 carbon atoms, cycloalkyl group having 3 to 40 carbon atoms, heterocycloalkyl group having 3 to 40 carbon atoms, aryl group having 6 to 40 carbon atoms, heteroaryl group having 3 to 40 carbon atoms, carbon number It is an aralkyl group of 3 to 40 or an epoxy group of 2 to 40 carbon atoms, n and m are each independently an integer of 1 to 100,000, and n/m is 0.1 to 10.
[화학식 3]
상기 화학식 3에 있어서, R1, R2, n 및 m은 상기 화학식 1 및 화학식 2에서 정의한 바와 같다.The synthetic resin coating composition according to claim 1 or 2, wherein the silsesquioxane polymer comprises a polymer represented by the following Chemical Formula 3.
[Formula 3]
In Formula 3, R1, R2, n and m are as defined in Formula 1 and Formula 2.
[화학식 1]
[화학식 2]
상기 화학식 1 및 화학식 2에서, R1은 각각 독립적으로, 수소, 중수소, 할로겐, 아민기, 에폭시기, 사이클로헥실에폭시기, (메타)아크릴기, 히드록시기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기, 탄소수 1 내지 40의 알킬기, 탄소수 2 내지 40의 알케닐기, 탄소수 1 내지 40의 알콕시기, 탄소수 3 내지 40의 시클로알킬기, 탄소수 3 내지 40의 헤테로시클로알킬기, 탄소수 6 내지 40의 아릴기, 탄소수 3 내지 40의 헤테로아릴기, 탄소수 3 내지 40의 아르알킬기, 탄소수 3 내지 40의 아릴옥시기, 또는 탄소수 3 내지 40의 아릴사이올기이고, R2는 각각 독립적으로, 수소, 중수소, 할로겐, 이소시아네이트기, 탄소수 1 내지 40의 알킬기, 탄소수 2 내지 40의 알케닐기, 탄소수 3 내지 40의 시클로알킬기, 탄소수 3 내지 40의 헤테로시클로알킬기, 탄소수 6 내지 40의 아릴기, 탄소수 3 내지 40의 헤테로아릴기, 탄소수 3 내지 40의 아르알킬기 또는 탄소수 2 내지 40의 에폭시기이며, n 및 m은 각각 독립적으로 1 내지 100,000의 정수이며, n/m은 0.1 내지 10 이다.A synthetic resin base material comprising a synthetic resin coating composition comprising a silsesquioxane polymer comprising a repeating unit represented by the following Chemical Formulas 1 and 2 and a synthetic resin.
[Formula 1]
[Formula 2]
In Formula 1 and Formula 2, R1 is each independently hydrogen, deuterium, halogen, amine group, epoxy group, cyclohexyl epoxy group, (meth)acrylic group, hydroxy group, silol group, isocyanate group, nitrile group, nitro group, carbon number Alkyl group of 1 to 40, alkenyl group of 2 to 40 carbon atoms, alkoxy group of 1 to 40 carbon atoms, cycloalkyl group of 3 to 40 carbon atoms, heterocycloalkyl group of 3 to 40 carbon atoms, aryl group of 6 to 40 carbon atoms, 3 to 3 carbon atoms A heteroaryl group of 40, an aralkyl group of 3 to 40 carbon atoms, an aryloxy group of 3 to 40 carbon atoms, or an arylcyol group of 3 to 40 carbon atoms, and R2 are each independently hydrogen, deuterium, halogen, isocyanate group, carbon number Alkyl group of 1 to 40, alkenyl group of 2 to 40 carbon atoms, cycloalkyl group of 3 to 40 carbon atoms, heterocycloalkyl group of 3 to 40 carbon atoms, aryl group of 6 to 40 carbon atoms, heteroaryl group of 3 to 40 carbon atoms, carbon number 3 It is an aralkyl group of 40 to 40 or an epoxy group of 2 to 40 carbon atoms, n and m are each independently an integer of 1 to 100,000, and n/m is 0.1 to 10.
[화학식 3]
상기 화학식 3에 있어서, R1, R2, n 및 m은 상기 화학식 1 및 화학식 2에서 정의한 바와 같다.The method of claim 6, wherein the silsesquioxane polymer is a synthetic resin substrate comprising a polymer represented by the formula (3).
[Formula 3]
In Formula 3, R1, R2, n and m are as defined in Formula 1 and Formula 2.
상기 합성 수지 기판의 일면 이상에 하기 화학식 1 및 화학식 2로 표시되는 반복단위를 포함하는 실세스퀴옥산 고분자 및 용매 또는 하기 화학식 1 및 화학식 2로 표시되는 반복단위를 포함하는 실세스퀴옥산 고분자, 합성수지 및 용매를 포함하는 합성 수지 코팅 조성물이 경화된 코팅층을 포함하는 합성 수지 기재.
[화학식 1]
[화학식 2]
상기 화학식 1 및 화학식 2에서, R1은 각각 독립적으로, 수소, 중수소, 할로겐, 아민기, 에폭시기, 사이클로헥실에폭시기, (메타)아크릴기, 히드록시기, 사이올기, 이소시아네이트기, 니트릴기, 니트로기, 탄소수 1 내지 40의 알킬기, 탄소수 2 내지 40의 알케닐기, 탄소수 1 내지 40의 알콕시기, 탄소수 3 내지 40의 시클로알킬기, 탄소수 3 내지 40의 헤테로시클로알킬기, 탄소수 6 내지 40의 아릴기, 탄소수 3 내지 40의 헤테로아릴기, 탄소수 3 내지 40의 아르알킬기, 탄소수 3 내지 40의 아릴옥시기, 또는 탄소수 3 내지 40의 아릴사이올기이고, R2는 각각 독립적으로, 수소, 중수소, 할로겐, 이소시아네이트기, 탄소수 1 내지 40의 알킬기, 탄소수 2 내지 40의 알케닐기, 탄소수 3 내지 40의 시클로알킬기, 탄소수 3 내지 40의 헤테로시클로알킬기, 탄소수 6 내지 40의 아릴기, 탄소수 3 내지 40의 헤테로아릴기, 탄소수 3 내지 40의 아르알킬기 또는 탄소수 2 내지 40의 에폭시기이며, n 및 m은 각각 독립적으로 1 내지 100,000의 정수이며, n/m은 0.1 내지 10 이다.Synthetic resin substrates; And
Silsesquioxane polymer comprising a repeating unit represented by the following Chemical Formulas 1 and 2 and a solvent or silsesquioxane polymer comprising a repeating unit represented by the following Chemical Formulas 1 and 2 on one or more surfaces of the synthetic resin substrate, A synthetic resin substrate comprising a coating layer in which a synthetic resin coating composition comprising a synthetic resin and a solvent is cured.
[Formula 1]
[Formula 2]
In Formula 1 and Formula 2, R1 is each independently hydrogen, deuterium, halogen, amine group, epoxy group, cyclohexyl epoxy group, (meth)acrylic group, hydroxy group, silol group, isocyanate group, nitrile group, nitro group, carbon number Alkyl group of 1 to 40, alkenyl group of 2 to 40 carbon atoms, alkoxy group of 1 to 40 carbon atoms, cycloalkyl group of 3 to 40 carbon atoms, heterocycloalkyl group of 3 to 40 carbon atoms, aryl group of 6 to 40 carbon atoms, 3 to 3 carbon atoms A heteroaryl group of 40, an aralkyl group of 3 to 40 carbon atoms, an aryloxy group of 3 to 40 carbon atoms, or an arylcyol group of 3 to 40 carbon atoms, and R2 are each independently hydrogen, deuterium, halogen, isocyanate group, carbon number Alkyl group of 1 to 40, alkenyl group of 2 to 40 carbon atoms, cycloalkyl group of 3 to 40 carbon atoms, heterocycloalkyl group of 3 to 40 carbon atoms, aryl group of 6 to 40 carbon atoms, heteroaryl group of 3 to 40 carbon atoms, carbon number 3 It is an aralkyl group of 40 to 40 or an epoxy group of 2 to 40 carbon atoms, n and m are each independently an integer of 1 to 100,000, and n/m is 0.1 to 10.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020180174049A KR20200082946A (en) | 2018-12-31 | 2018-12-31 | Synthetic resin coating composition and method of manufacturing synthetic resin substrate using the same |
PCT/KR2019/018707 WO2020141830A1 (en) | 2018-12-31 | 2019-12-30 | Synthetic resin coating composition and synthetic resin substrate production method using same |
CN201980087285.8A CN113260686A (en) | 2018-12-31 | 2019-12-30 | Synthetic resin coating composition and method for producing synthetic resin substrate using same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020180174049A KR20200082946A (en) | 2018-12-31 | 2018-12-31 | Synthetic resin coating composition and method of manufacturing synthetic resin substrate using the same |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20200082946A true KR20200082946A (en) | 2020-07-08 |
Family
ID=71406543
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020180174049A KR20200082946A (en) | 2018-12-31 | 2018-12-31 | Synthetic resin coating composition and method of manufacturing synthetic resin substrate using the same |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR20200082946A (en) |
CN (1) | CN113260686A (en) |
WO (1) | WO2020141830A1 (en) |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005146154A (en) * | 2003-11-17 | 2005-06-09 | Univ Nihon | Hybrid material composed of polymethylmethacrylic acid and silsesquioxane and method for producing the same |
KR102016348B1 (en) * | 2013-02-28 | 2019-08-30 | 주식회사 동진쎄미켐 | Resin composition for packaging optical devices |
KR102363818B1 (en) * | 2014-02-28 | 2022-02-17 | 주식회사 동진쎄미켐 | Silsesquioxane composite polymer and method for manufacturing thereof |
KR102363819B1 (en) * | 2014-02-28 | 2022-02-17 | 주식회사 동진쎄미켐 | Silsesquioxane composite polymer and method for manufacturing thereof |
KR102414700B1 (en) * | 2014-03-07 | 2022-06-29 | 주식회사 동진쎄미켐 | A coating method for plastic using silsesquioxane composite polymer |
KR102325278B1 (en) * | 2014-03-07 | 2021-11-16 | 주식회사 동진쎄미켐 | A thermoplastic resin composion comprising silsesquioxane composite polymer |
KR102035831B1 (en) * | 2016-03-17 | 2019-11-18 | 주식회사 엘지화학 | Polyhedral oligomeric silsesquioxane and method for preparing the same |
CN111344334B (en) * | 2017-11-16 | 2022-09-16 | 株式会社东进世美肯 | Silsesquioxane polymer and coating composition comprising same |
-
2018
- 2018-12-31 KR KR1020180174049A patent/KR20200082946A/en not_active Application Discontinuation
-
2019
- 2019-12-30 CN CN201980087285.8A patent/CN113260686A/en active Pending
- 2019-12-30 WO PCT/KR2019/018707 patent/WO2020141830A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2020141830A1 (en) | 2020-07-09 |
CN113260686A (en) | 2021-08-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Liu et al. | Fabrication of advanced polydimethylsiloxane-based functional materials: Bulk modifications and surface functionalizations | |
JP7111611B2 (en) | Laminate and its manufacturing method | |
JP2021167426A (en) | Additive manufacturing using reactive compositions | |
Araki et al. | Syntheses of Dumbbell-Shaped Trifluoropropyl-Substituted POSS Derivatives Linked by Simple Aliphatic Chains and Their Optical Transparent Thermoplastic Films. | |
MXPA02005824A (en) | Layered article with improved microcrack resistance and method of making. | |
KR102036858B1 (en) | Preparation of UV Cured Hard Coating Fluid & Films Using Polysilazane | |
TWI657103B (en) | Silsesquioxane composite polymer and method for manufacturing thereof | |
CN114479665B (en) | High-transparency flexible scratch-resistant coating, functional coating and preparation method thereof | |
CN111902206B (en) | Hollow particles, method for producing same, and use thereof | |
CN107849259B (en) | Silicone elastomers, their preparation and use | |
WO2019177013A9 (en) | Hollow-particle dispersion | |
CA2477945A1 (en) | Hydrosilylation cure of silicone resin containing colloidal silica and a process for producing the same | |
EP3684826A1 (en) | Production of light-transmissive objects by additive manufacturing | |
US20100063237A1 (en) | Hydrophilic Surface Modification of Polydimethylsiloxane | |
Bender et al. | UV curing behavior of five heteroleptic POSS bearing methacrylate and Glycidyl groups and evaluation of their potential for hard yet flexible coatings | |
CN109641992B (en) | Fluoropolymer, method for producing same, and article having cured product of fluoropolymer | |
TW201540749A (en) | Silsesquioxane composite polymer and method for manufacturing thereof | |
JP4501451B2 (en) | Coating composition, method for producing transparent protective film using coating composition, and organic glass having transparent protective film | |
JPWO2019235108A1 (en) | Modifiers, compositions, hard coat films, articles with hard coat films, and image display devices | |
CN112194767B (en) | Benzoxazine resin containing zwitter-ion group and preparation method and application thereof | |
KR20220139560A (en) | A composition for producing a transparent hard coating film, transparent hard coating film and its manufacturing method | |
KR20200082946A (en) | Synthetic resin coating composition and method of manufacturing synthetic resin substrate using the same | |
US20210238340A1 (en) | Branched reactive blocked prepolymers for additive manufacturing | |
JP4836061B2 (en) | Coating composition, method for preparing coating composition, method for producing transparent protective film using coating composition, and organic glass having transparent protective film | |
CN110997842B (en) | Coating resin composition and coating film comprising cured product of the coating resin composition as coating layer |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
E902 | Notification of reason for refusal |