KR20200071928A - Method for recovering electrical property of two-dimensional material using hydrogen plasma and device thereof - Google Patents

Abstract

The present invention relates to a method for recovering electrical properties of a two-dimensional material using hydrogen plasma without requiring a separate chamber and an apparatus thereof. More specifically, the method comprises the following steps of: (a) preparing a two-dimensional material in which atoms of a single or several layers form a predetermined crystalline structure; (b) forming a two-dimensional material film formed of a composite material of a film shape from the prepared two-dimensional material; (c) storing the formed two-dimensional material film at room temperature; (d) disposing the two-dimensional material film oxidized by room temperature storage in a room temperature chamber to use the same; (e) injecting hydrogen gas into the chamber in which the two-dimensional material film is disposed; and (f) recovering electric properties of the two-dimensional material film exposed to the injected hydrogen gas to a level before oxidization and generating plasma in the chamber at room temperature through a plasma generator to modify a surface through a change of a surface functional group, thereby processing the two-dimensional material film with the plasma.

Description

METHOD FOR RECOVERING ELECTRICAL PROPERTY OF TWO-DIMENSIONAL MATERIAL USING HYDROGEN PLASMA AND DEVICE THEREOF}

The present invention relates to a method and apparatus for recovering electrical properties of a two-dimensional material, and more particularly, when a two-dimensional material is oxidized and electrical properties are reduced, a two-dimensional hydrogen plasma is used to recover electrical properties through hydrogen plasma. It relates to a method for recovering the electrical properties of a material and a device therefor.

2-dimensional materials refers to a solid in a single-layer or a dew-layer in which atoms form a predetermined crystal structure, and one of them is a MAX phase, where M Silver transition metal, A is a group 13 or 14 element, X is carbon and/or nitrogen) is a quasi-ceramic property of MX, and a metal element A different from M is crystalline. It has electrical conductivity, oxidation resistance, and machinability. Excellent physical properties. To date, more than 60 types of MAX phases are known to be synthesized.

The MAX phase is a two-dimensional material, but unlike graphite or metal dichalcogenide materials, the transition metal carbides are stacked with weak chemical bonds between element A and transition metal M between layers of each other. Therefore, it is difficult to transform into a two-dimensional structure using a general mechanical peeling method or a chemical peeling method.

However, in 2011, researchers led by Professor Dr. Michel W. Barsoum of Drexel University transformed into a two-dimensional structure with completely different properties by selectively removing the aluminum layer using hydrofluoric acid from the MAX trader's three-dimensional titanium-aluminum carbide. Was successful. The researchers named the two-dimensional material obtained by exfoliating the MAX phase as "MXene." MXene has similar electrical conductivity and strength as graphene, and can be applied to various application technologies ranging from energy storage devices to biomedical applications and complexes.

However, such a maxine is dispersed in water to prepare a maxine solution, and this is formed into a film-like maxine film, so that it is oxidized by air, water, and heat during storage, so it is easy to lose its original properties.

Referring to FIG. 1, as a graph showing sheet resistance over time during plasma treatment of a maxine film, the sheet resistance gradually increases as time increases, and as the sheet resistance increases, the electrical properties of the maxine film decrease.

Therefore, there is a need for a method capable of restoring the electrical properties of the maxine film oxidized by air and water.

Published Patent Publication No. 10-2017-0036507 (2017.04.03.)

Technical problem to be achieved by the present invention, when the electrical properties of the oxidized two-dimensional material is reduced, by plasma-processing the two-dimensional material in a hydrogen atmosphere through plasma, it is possible to recover the electrical properties, and by treating the plasma at room temperature, separate It is to provide a method and apparatus for restoring electrical properties of a two-dimensional material utilizing hydrogen plasma that does not require a chamber.

The technical problem to be achieved by the present invention is not limited to the technical problems mentioned above, and other technical problems not mentioned can be clearly understood by a person having ordinary knowledge in the technical field to which the present invention belongs from the following description. There will be.

In order to achieve the above technical problem, a method for restoring electrical properties of a two-dimensional material using hydrogen plasma according to the present invention comprises the steps of (a) preparing a two-dimensional material in which atoms form a predetermined crystal structure as a single layer or a water layer solid, (b) forming the prepared two-dimensional material into a film of a two-dimensional material composed of a composite material in the form of a film, (c) storing the film of the formed two-dimensional material at room temperature, (d) oxidized through storage at room temperature Placing in a chamber at room temperature to use a film of a two-dimensional material, (e) injecting hydrogen gas into a chamber in which the film of the two-dimensional material is arranged, and (f) a two-dimensional material exposed to the injected hydrogen gas Plasma treatment of the film of the two-dimensional material by restoring the electrical properties of the film to a level before oxidation and generating a plasma at room temperature through the plasma generator in the chamber so that the surface is modified by changing the surface functional group. do.

In an embodiment of the present invention, the two-dimensional material includes at least one of a maxine solution composed of a transition metal carbide and a transition metal carbonitride of a two-dimensional structure, or doping or alloying a foreign material in the maxine solution or a complex with a different material. It is also possible to do.

In an embodiment of the present invention, the film of the two-dimensional material is a maxine film composed of a composite material in the form of a film so as to include at least one of a maxine solution or doping or alloying a foreign material in the maxine solution or a complex with a different material. It is also possible.

In an embodiment of the present invention, the maxinic solution is Ti ₂ C, Ti ₃ C ₂ , V ₂ C, Nb ₂ C, (Ti _0.5 , Nb _0.5 ) ₂ CT _x , Ti ₃ CN, (V _0.5 , Cr _0.5 ) ₃ C ₂ , Ta ₄ C ₃ and Nb ₄ C ₃ .

In the embodiment of the present invention, the maxinic solution may be formed of the formula M _n + ₁ X _n .

In an embodiment of the present invention, M in the formula of M _n + ₁ X _n may be a front transition metal.

In an embodiment of the present invention, X in the formula of M _n + ₁ X _n may include at least one of carbon and nitrogen.

In an embodiment of the present invention, the maxine film is plasma-treated through plasma at room temperature to restore electrical properties to a level before oxidation at a temperature of 900° C. or lower, and is surface-modified through changes in surface functional groups, oxidation Stability may be improved.

In an embodiment of the present invention, in the step (f), the plasma generator may be to generate a plasma through the RF antenna.

In an embodiment of the present invention, in order to minimize damage to the maxine film by preventing a direct collision of plasma generated from the af antenna, the af antenna may be disposed at a predetermined distance from the maxine film.

In the embodiment of the present invention, through the step (f), plasma of the RF antenna is plasma-processed with the output of 100W for 60 minutes through the step (f), so that the maxine film has a sheet resistance reduced by 20% compared to the initial sheet resistance. , By plasma treatment with an output of 400W, the maxin film may have a sheet resistance reduced by 45% than the initial sheet resistance oxidized.

In an embodiment of the present invention, the plasma-processed maxine film through step (f) is 20% less than the initial sheet resistance at which the maxine film is oxidized after 10 minutes by plasma treatment of plasma of 400 antennas with the output of 400W. It may have a sheet resistance, and may have a sheet resistance reduced by 45% than the initial sheet resistance oxidized after 60 minutes.

In an embodiment of the present invention, the film of the two-dimensional material plasma-treated at room temperature through step (f) may be applied to a stretchable or flexible substrate.

In order to achieve the above technical problem, in the apparatus for recovering electrical properties of a two-dimensional material utilizing hydrogen plasma according to the present invention, a body part formed in a hollow cylindrical shape, and an upper end of the body part is opened to form a gas to flow gas Inlet, a gas outlet that is opened so that gas introduced through the upper end of the body portion flows into the body portion and is discharged to the lower end of the body portion. Plasma generator provided to generate, a support portion formed in a plate shape so that a two-dimensional material is disposed and supported so as to be plasma-treated from the plasma generated through the plasma generator at the bottom of the inside of the body portion, and the plasma on one side of the body portion A power unit provided to supply power to the generator is provided.

In an embodiment of the present invention, the two-dimensional material may be a maxine film composed of a transition metal carbide and a transition metal carbonitride of a two-dimensional structure.

In an embodiment of the present invention, the plasma generator may be to generate plasma through the RF antenna.

In an embodiment of the present invention, the RF antenna may be formed in a coil shape surrounding the upper outer surface of the body portion to generate plasma by inducing an electric field.

In an embodiment of the present invention, the maxine film may be disposed at the bottom of the body portion to prevent damage due to direct collision of plasma generated from the RF antenna.

In an embodiment of the present invention, a maxine film may be a maxine device composed of an electrode material among two-dimensional materials manufactured through a method of restoring electrical properties of the two-dimensional material utilizing the hydrogen plasma.

According to an embodiment of the present invention, a method and apparatus for recovering electrical properties of a two-dimensional material using hydrogen plasma can recover electrical properties by plasma-processing the two-dimensional material in a hydrogen atmosphere through plasma, and process the plasma at room temperature By doing so, there is an effect that a separate chamber is not required.

It should be understood that the effects of the present invention are not limited to the above-described effects, and include all effects that can be deduced from the configuration of the invention described in the detailed description or claims of the present invention.

1 is a graph showing a sheet resistance according to a change in time during plasma treatment of a maxine film according to the prior art.
2 is a flowchart illustrating a method for recovering electrical properties of a two-dimensional material using hydrogen plasma according to an embodiment of the present invention.
3 is a graph showing a change in sheet resistance according to an output of plasma for plasma treatment of a maxine film of a method for recovering electrical properties of a two-dimensional material using hydrogen plasma according to an embodiment of the present invention.
4 is a graph showing a change in sheet resistance over time for plasma treatment of a maxine film of a method for recovering electrical properties of a two-dimensional material using hydrogen plasma according to an embodiment of the present invention.
5 is a graph showing the sheet resistance before and after hydrogen plasma treatment of an oxidized maxine film of a method for recovering electrical properties of a two-dimensional material using hydrogen plasma according to an embodiment of the present invention.
6 is a graph showing the surface change after XPS analysis (Ti) of a hydrogen plasma treatment of an oxidized maxine film of a method for recovering electrical properties of a two-dimensional material using hydrogen plasma according to an embodiment of the present invention.
7 is a graph showing the surface change after XPS analysis (O) after hydrogen plasma treatment of an oxidized maxine film of a method for recovering electrical properties of a two-dimensional material using hydrogen plasma according to an embodiment of the present invention.
8 is a cross-sectional view of a device for recovering electrical properties of a two-dimensional material utilizing hydrogen plasma according to an embodiment of the present invention.

Hereinafter, the present invention will be described with reference to the accompanying drawings. However, the present invention may be implemented in various different forms, and thus is not limited to the embodiments described herein. In addition, in order to clearly describe the present invention in the drawings, parts irrelevant to the description are omitted, and like reference numerals are assigned to similar parts throughout the specification.

Throughout the specification, when a part is "connected (connected, contacted, coupled)" with another part, it is not only "directly connected", but also "indirectly connected" with another member in between. "It also includes the case where it is. Also, when a part “includes” a certain component, this means that other components may be further provided instead of excluding other components, unless otherwise stated.

The terms used herein are only used to describe specific embodiments, and are not intended to limit the present invention. Singular expressions include plural expressions unless the context clearly indicates otherwise. In this specification, terms such as “include” or “have” are intended to indicate that a feature, number, step, operation, component, part, or combination thereof described in the specification exists, and that one or more other features are present. It should be understood that the existence or addition possibilities of fields or numbers, steps, operations, components, parts or combinations thereof are not excluded in advance.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

2 is a flowchart illustrating a method for recovering electrical properties of a two-dimensional material using hydrogen plasma according to an embodiment of the present invention.

Referring to FIG. 2, a method of restoring electrical properties of a two-dimensional material using hydrogen plasma according to the present invention includes: (a) preparing a two-dimensional material in which atoms form a predetermined crystal structure as a solid in a single layer or a water layer, (b) ) Forming the prepared two-dimensional material into a film of a two-dimensional material composed of a composite material in the form of a film, (c) storing the film of the formed two-dimensional material at room temperature, (d) two-dimensional material oxidized through storage at room temperature Placing in a chamber at room temperature to use the film of, (e) injecting hydrogen gas into a chamber in which the film of the two-dimensional material is disposed, and (f) a film of two-dimensional material exposed to the injected hydrogen gas. It provides a step of plasma treatment of the film of the two-dimensional material by restoring the electrical properties of the product to a level before oxidation and generating a plasma at room temperature through a plasma generator in the chamber so that the surface is modified through a change in the surface functional group.

In an embodiment of the present invention, a method for restoring electrical properties of a two-dimensional material using hydrogen plasma includes preparing a two-dimensional material in which atoms form a predetermined crystal structure as a single layer or a water layer (S110).

More specifically, the two-dimensional material is a monolayer or a water layer solid, and atoms are composed of a predetermined crystal structure, and a doping material or a doping material is formed in a maxine solution or a maxine solution composed of a transition metal carbide and a transition metal carbonitride of a two-dimensional structure, or It is configured to include at least one of an alloying or a complex with a heterogeneous material.

That is, the maxine solution, which is one of the two-dimensional materials, is a two-dimensional layered structure, and a layer composed of atoms is stacked to form a multi-layer structure. The two-dimensional multilayer structure, maxin solution, is light and has a low density, has excellent electrical conductivity, and can be easily separated from each other, and thus can be used as a radio wave absorber in various fields.

In addition, the step (S120) of forming the prepared two-dimensional material into a film of a two-dimensional material composed of a composite material in the form of a film.

More specifically, the two-dimensional material is a film form so as to include at least one of a dopant or alloying or a complex with a dissimilar material or a dissimilar material in the maxine solution or a dissimilar material composed of a transition metal carbide and a transition metal carbonitride of a two-dimensional structure. To form a maxine film composed of a composite material of.

At this time, the prepared maxine solution is prepared in a film form through spin coating, drop cast, and vacuum filtration to prepare a maxine film, and spin coating, drop casting, and By manufacturing the maxin film through various methods such as a vacuum filtration method, it is possible to effectively produce the maxin film according to the manufacturing conditions or conditions.

In addition, the step of storing the film of the formed two-dimensional material at room temperature (S130).

In more detail, when the film of the two-dimensional material, maxine film is not used, it can be stored at room temperature, and the maxine film is exposed to air and moisture to cause an oxidation reaction, thereby reducing sheet resistance and electrical properties.

In addition, the step (S140) of placing in a chamber at room temperature to use a film of a two-dimensional material oxidized through storage at room temperature.

More specifically, since the electrical properties of the film of the two-dimensional material oxidized through the storage at room temperature are reduced, it is placed in a chamber at room temperature to restore it.

In addition, the step of injecting hydrogen gas into the chamber in which the film of the two-dimensional material is disposed (S150).

In more detail, the maximal film, which is a film of a two-dimensional material, is exposed to hydrogen gas to reduce the oxidized maxine film. Therefore, the oxidized maxine film can be restored to a state before oxidation of electrical properties and sheet resistance values through a reduction process.

That is, the hydrogen gas is stored at room temperature, and oxygen and hydrogen gas are combined in the oxidized maxine film, and hydrogen gas is injected into the chamber to perform the reduction process of the maxine film.

Therefore, the hydrogen gas can reduce the oxidation degree of the maxine film and restore electrical properties.

In addition, the electrical properties of the film of the two-dimensional material exposed to the injected hydrogen gas are restored to a level before oxidation, and plasma is generated at room temperature through a plasma generator in the chamber so that the surface is modified by changing the surface functional group. Plasma treatment of the film of the two-dimensional material (S160).

More specifically, the film of the two-dimensional material, the maxine film is provided in the chamber and exposed to hydrogen gas, and plasma is generated through a plasma generator to plasma-process the maxine film in which the chamber is disposed. Therefore, since the maxine film is plasma-processed through plasma in a state exposed to hydrogen gas, it is possible to restore the original electrical properties through a reduction process in an oxidized state through storage at room temperature.

In addition, the two-dimensional material is composed of a transition metal carbide and a transition metal carbonitride of a maxine solution composed of a two-dimensional material, the film of the two-dimensional material may be a maxine film composed of a composite material in the form of a film through the maxine solution.

More specifically, the maxin solution is Ti ₂ C, Ti ₃ C ₂ , V ₂ C, Nb ₂ C, (Ti _0.5 , Nb _0.5 ) ₂ CT _x , Ti ₃ CN, (V _0.5 , Cr _0.5 ) ₃ C ₂ , Ta ₄ C ₃ And Nb ₄ C ₃ .

In addition, the maxin solution may be composed of the formula of M _n + ₁ X _{n, in} the formula of M _n + ₁ X _n , M is an early transition metal, and X is at least one of carbon and nitrogen. And n may be an integer from 1 to 4.

In addition, the maxine film is plasma-treated through plasma at room temperature to restore electrical properties to a level before oxidation at a temperature of 900° C. or lower, and surface modification is achieved through changes in surface functional groups, and oxidation stability can be improved.

In addition, in the step (f), the plasma generator generates a plasma through the RF antenna, and prevents direct collision of plasma generated from the RF antenna to minimize damage to the pulse film and the predetermined film. The RF antenna may be arranged at a distance.

More specifically, when the plasma is generated, plasma species (ions, molecules, radicals, electrons, etc.) may be damaged by collision with the maxine film. Accordingly, the RF antenna is disposed at a predetermined distance from the maxine film, preferably, the RF antenna is disposed on one side inside the chamber, and the maxima film is disposed on the other side to prevent the plasma paper from colliding. .

In addition, through the step (f), plasma of the RF antenna was plasma-processed at a power output of 100 W for 60 minutes, so that the maxine film had a surface resistance reduced by 20% compared to the initial sheet resistance oxidized, and the plasma was output at 400 W. By treatment, the maxin film may have a sheet resistance reduced by 45% compared to the initial sheet resistance oxidized.

More specifically, referring to FIG. 3, FIG. 3 is a change in sheet resistance according to the output of plasma for plasma treatment of a maxine film of a method for recovering electrical properties of a two-dimensional material using hydrogen plasma according to an embodiment of the present invention. It is a graph showing.

Accordingly, the maxine film is oxidized by exposing it at a temperature of 70°C for 360 minutes, and the initial sheet resistance before oxidation of the maxine film is 44.7 ± 1.1 Ω/sq. And the sheet resistance after oxidation is increased to 112.5 ± 7.2 Ω/sq.

At this time, when the maxine film is placed inside the chamber and plasma-treated with plasma through af-antenna in a hydrogen atmosphere (hydrogen plasma treatment), the plasma of the af-antenna is plasma-processed at a power output of 100W for 60 minutes to produce the maxine film. Silver has a sheet resistance reduced by 20% compared to the initial sheet resistance of oxidation, and plasma treatment with an output of 400 W results in the sheet film having a sheet resistance reduced by 45% compared to the initial sheet resistance of oxidation.

In addition, the maxine film plasma-processed through the step (f) has a sheet resistance reduced by 20% than the initial sheet resistance in which the maxine film is oxidized after 10 minutes by plasma processing of plasma of 400W with the output of 400W, 60 It may have a sheet resistance reduced by 45% than the initial sheet resistance oxidized in minutes.

Therefore, in the hydrogen atmosphere, the surface resistance is reduced through plasma treatment through plasma of the RF antenna in the hydrogen atmosphere, thereby increasing electrical properties, and as the plasma treatment time increases, the surface resistance decreases.

In addition, the film of the two-dimensional material plasma-treated at room temperature through the step (f) may be applied to a stretchable or flexible substrate.

That is, since the plasma-treated film of the two-dimensional material can be processed at room temperature or at low temperature, it can be applied to stretchable, flexible substrates, and devices requiring low temperature processing.

More specifically, referring to FIG. 4, FIG. 4 shows a change in sheet resistance over time for plasma treatment of the maxine film of a method for recovering electrical properties of a two-dimensional material using hydrogen plasma according to an embodiment of the present invention. It is a graph.

Accordingly, the maxine film is oxidized by exposing it at a temperature of 70°C for 360 minutes, and the initial sheet resistance before oxidation of the maxine film is 44.7 ± 1.1 Ω/sq. And the sheet resistance after oxidation is increased to 112.5 ± 7.2 Ω/sq.

At this time, when the maxine film is placed inside the chamber and plasma-processed through the RF antenna in a hydrogen atmosphere, the plasma is plasma-processed with an output of 400 W, and the sheet resistance is reduced by 20% over the initial sheet resistance at which the maxine film is oxidized after 10 minutes. It has a sheet resistance reduced by 45% than the initial sheet resistance oxidized after 60 minutes.

Therefore, in the hydrogen atmosphere, the surface resistance is reduced through plasma treatment through plasma of the RF antenna in the hydrogen atmosphere, thereby increasing electrical properties, and as the plasma treatment time increases, the surface resistance decreases.

5 is a graph showing the sheet resistance before and after hydrogen plasma treatment of an oxidized maxine film of a method for recovering electrical properties of a two-dimensional material using hydrogen plasma according to an embodiment of the present invention.

Referring to FIG. 5, before the initial oxidation proceeds, the maxine film having a sheet resistance of 44.7 ohm/sq. is oxidized under a condition of 360 minutes or less, and the maxine film having a sheet resistance of 112.5 ohm/sq. in a hydrogen atmosphere has a plasma power of 400 W , And plasma treatment for 60 minutes reduces the sheet resistance of maxine film to 60 ohm/sq.

Accordingly, by performing plasma treatment of the oxidized maxine film through a plasma in a hydrogen atmosphere, the sheet resistance can be reduced and electrical properties can be improved.

At this time, in the case of the maxine film oxidized for more than 360 minutes, the reduction in sheet resistance is not significantly reduced even when plasma treatment is performed through plasma in a hydrogen atmosphere.

Accordingly, the maxine film manufactured through a method for recovering electrical properties of a two-dimensional material utilizing hydrogen plasma according to the present invention is limited to oxidation in less than 360 minutes.

6 is a graph showing the surface change after XPS analysis (Ti) of a hydrogen plasma treatment of an oxidized maxine film of a method for recovering electrical properties of a two-dimensional material using hydrogen plasma according to an embodiment of the present invention.

Referring to FIG. 6, the result of examining the surface change after the hydrogen plasma treatment of the oxidized maxine film through XPS analysis [Ti 2p] shows a peak reduction of TiO ₂ .

More specifically, the peak of Ti-C is reduced and the peak of TiO ₂ is increased in the maxine film oxidized at a temperature of 70 degrees for 360 minutes.

At this time, when the oxidized maxine film is subjected to plasma treatment for 60 minutes with a plasma output of 400 W in a hydrogen atmosphere, the peak of Ti-C is increased, and the peak of TiO ₂ is decreased, returning to a state similar to the initial value.

Therefore, by restoring the oxidized and reduced electrical properties to a state similar to the initial value through hydrogen plasma treatment, electrical properties can be improved.

7 is a graph showing the surface change after XPS analysis (O) after hydrogen plasma treatment of an oxidized maxine film of a method for recovering electrical properties of a two-dimensional material using hydrogen plasma according to an embodiment of the present invention.

Referring to FIG. 7, the surface change after the hydrogen plasma treatment of the oxidized maxine film through XPS analysis [O 1s] shows a peak reduction of TiO ₂ .

More specifically, the peak of Ti-OH Ti-O-Ti is increased in the maxine film oxidized at a temperature of 70 degrees for 360 minutes.

At this time, when the oxidized maxine film is subjected to plasma treatment for 60 minutes at a plasma output of 400 W in a hydrogen atmosphere, the peak of Ti-OH Ti-O-Ti is reduced to return to a state similar to the initial value.

Therefore, by restoring the oxidized and reduced electrical properties to a state similar to the initial value through hydrogen plasma treatment, electrical properties can be improved.

In addition, various functional groups such as -O, -OH, and -F are bonded to the surface of the maxine film, and the proportion of fluorine bound to the surface is reduced through an oxidation process.

Accordingly, the maxine film stored at room temperature has a number of functional groups such as -O, -OH, and -F bonded to the surface. Plasma treatment is performed through plasma in a hydrogen atmosphere of the maxine film, so that the maxine film that has undergone oxidation and reduction has a surface. It can reduce the proportion of fluorine (-F), and improve the electrical properties.

8 is a cross-sectional view of a device for recovering electrical properties of a two-dimensional material utilizing hydrogen plasma according to an embodiment of the present invention.

Referring to FIG. 8, in the apparatus 200 for recovering electrical properties of a two-dimensional material utilizing hydrogen plasma according to the present invention, a body portion 210 formed in a hollow cylindrical shape and an upper end of the body portion 210 are The gas inlet 220 which is opened and formed to flow gas, and the gas introduced through the upper end of the body portion 210 flows into the body portion 210 to the lower end of the body portion 210. The gas discharge unit 230 opened to be discharged, the plasma generator 240 and the body unit 210 provided at the upper end of the body unit 210 to generate plasma inside the body unit 210 under normal temperature conditions. ), the plasma on one side of the support portion 250 and the body portion 210 formed in a plate shape so that a two-dimensional material is disposed and supported so as to be plasma-processed from plasma generated through the plasma generator 240. A power supply unit 260 provided to supply power to the generator 240 is provided.

Further, the two-dimensional material may be a maxine film composed of a transition metal carbide and a transition metal carbonitride of a two-dimensional structure.

More specifically, the two-dimensional material is a maxine solution composed of a transition metal carbide and a transition metal carbonitride of a two-dimensional structure, and the maxine solution is formed of a maxine film composed of a composite material in the form of a film.

At this time, the prepared maxine solution is prepared in a film form through spin coating, drop cast, and vacuum filtration to prepare a maxine film, and spin coating, drop casting, and By manufacturing the maxin film through various methods such as a vacuum filtration method, it is possible to effectively produce the maxin film according to the manufacturing conditions or conditions.

In addition, the plasma generator 240 generates plasma through the RF antenna, and the RF antenna is formed in a coil shape surrounding the upper outer surface of the body part 210 to induce an electric field to generate plasma.

In more detail, the plasma generator 240 is an RF antenna formed in a coil shape surrounding the upper outer surface of the body portion 210, wherein the RF antenna surrounds the body portion 210 and a coil is formed to generate an electric field. By inducing, a plasma may be formed inside the body part 210, and the maxine film may be plasma-processed in a hydrogen atmosphere through the plasma.

In addition, the maxine film is disposed at the bottom of the body portion 210 to prevent damage due to direct collision of plasma generated from the RF antenna.

In more detail, the maxine film is disposed on the upper surface of the support part 250 provided at the bottom of the inside of the body part 210, and the RF antenna is disposed on the top of the body part 210, so that the RF film is It is possible to prevent the maxin film from being damaged from plasma species (ions, molecules, radicals, electrons, etc.) of the plasma generated from the antenna.

That is, since the maxine film and the av antenna are disposed at a predetermined distance, it is possible to prevent the maxin film from being damaged from plasma species (ions, molecules, radicals, electrons, etc.) generated from the av antenna.

In addition, the two-dimensional material produced through the method of restoring the electrical properties of the two-dimensional material using the hydrogen plasma may be configured as an electrode material as a maxine film as an electrode material.

The above description of the present invention is for illustration only, and those skilled in the art to which the present invention pertains can understand that the present invention can be easily modified into other specific forms without changing the technical spirit or essential features of the present invention. will be. Therefore, it should be understood that the embodiments described above are illustrative in all respects and not restrictive. For example, each component described as a single type may be implemented in a distributed manner, and similarly, components described as distributed may be implemented in a combined form.

The scope of the present invention is indicated by the following claims, and all modifications or variations derived from the meaning and scope of the claims and their equivalent concepts should be interpreted to be included in the scope of the present invention.

200: apparatus for restoring electrical properties of two-dimensional materials using hydrogen plasma
210: body part
220: gas inlet
230: gas discharge unit
240: plasma generator
250: support
260: power supply

Claims (19)

(a) preparing a two-dimensional material in which atoms form a predetermined crystal structure as a solid in a single layer or a water layer;
(b) forming the prepared two-dimensional material into a film of a two-dimensional material composed of a composite material in the form of a film;
(c) storing the formed two-dimensional film at room temperature;
(d) placing in a chamber at room temperature to use a film of a two-dimensional material oxidized through storage at room temperature;
(e) injecting hydrogen gas into a chamber in which the film of the two-dimensional material is disposed; And
(f) The electrical properties of the film of the two-dimensional material exposed to the injected hydrogen gas are restored to a level before oxidation, and plasma is generated at room temperature through a plasma generator in the chamber so that the surface is modified by changing the surface functional group. Causing the film of the two-dimensional material to be plasma treated;
Method for recovering electrical properties of a two-dimensional material using a hydrogen plasma comprising a. The method of claim 1, wherein the two-dimensional material is a maxine solution composed of a transition metal carbide and a transition metal carbonitride of a two-dimensional structure. The film of claim 2, wherein the film of the two-dimensional material is a maxine film composed of a composite material in the form of a film so as to include any one of a maxine solution or doping or alloying a foreign material in the maxine solution or a complex with a different material. A method of restoring electrical properties of a two-dimensional material using hydrogen plasma. The method of claim 3, wherein the maxine solution is Ti ₂ C, Ti ₃ C ₂ , V ₂ C, Nb ₂ C, (Ti _0.5 , Nb _0.5 ) ₂ CT _x , Ti ₃ CN, (V _0.5 , Cr _0.5 ) ₃ C ₂ , Ta ₄ C ₃ And Nb ₄ C ₃ A method for restoring electrical properties of a two-dimensional material using hydrogen plasma. [5] The method of claim 4, wherein the maxinic solution is formed of a chemical formula of M _n + ₁ X _n . The method of claim 5, wherein in the formula of M _n + ₁ X _n , M is a front transition metal. The method of claim 6, wherein X in the formula of M _n + ₁ X _n includes at least one of carbon and nitrogen. The method of claim 7, wherein the maxine film is plasma-treated through plasma at room temperature to restore electrical properties to a level before oxidation at a temperature of 900° C. or lower, and undergoes surface modification through changes in surface functional groups, and oxidation stability. A method of restoring electrical properties of a two-dimensional material utilizing hydrogen plasma, which is characterized by being improved. According to claim 7, In step (f),
The plasma generator is a method of restoring electrical properties of a two-dimensional material using hydrogen plasma, characterized in that to generate a plasma through the RF antenna. The hydrogen plasma according to claim 9, wherein the RF antenna is disposed at a predetermined distance from the MAX film to prevent damage to the MAX film by preventing a direct collision of the plasma generated from the RF antenna. A method of restoring the electrical properties of a two-dimensional material. 12. The method of claim 10, wherein through the step (f), plasma of the RF antenna is plasma-processed at a power output of 100 W for 60 minutes, the maxine film has a sheet resistance reduced by 20% than the initial sheet resistance oxidized, 400 W Plasma treatment with the output of the Maxine film is a method of restoring the electrical properties of a two-dimensional material using hydrogen plasma, characterized in that having a surface resistance reduced by 45% than the initial sheet resistance oxidized. 11. The method of claim 10, The plasma film processed through the step (f) is a plasma resistance of the plasma of the RF antenna 400W output after 10 minutes, the surface resistance is reduced by 20% compared to the initial sheet resistance after the oxidation of the maxine film 10 minutes With, and after 60 minutes, the method of restoring the electrical properties of the two-dimensional material using hydrogen plasma, characterized in that it has a surface resistance reduced by 45% than the initial sheet resistance oxidized. The method of claim 1, wherein the film of the two-dimensional material plasma-treated at room temperature through the step (f) is applied to a stretchable or flexible substrate. In the apparatus for recovering electrical properties of a two-dimensional material using hydrogen plasma,
A body portion formed in a hollow cylindrical shape;
The upper end of the body portion is opened to the gas inlet formed to flow gas;
A gas discharge unit opened to allow gas introduced through the upper end of the body portion to flow into the body portion and discharge to the lower end of the body portion;
A plasma generator provided at the upper end of the body portion to generate plasma inside the body portion at room temperature;
A support portion formed in a plate shape so that a two-dimensional material is disposed and supported to be plasma-processed from plasma generated through the plasma generator at the bottom of the inside of the body portion; And
A power supply unit provided at one side of the body unit to supply power to the plasma generator;
Apparatus for restoring electrical properties of a two-dimensional material using hydrogen plasma containing a. 15. The apparatus of claim 14, wherein the two-dimensional material is a maxine film composed of a transition metal carbide and a transition metal carbonitride of a two-dimensional structure. 16. The apparatus of claim 15, wherein the plasma generator generates plasma through an RF antenna. The apparatus for recovering electrical properties of a two-dimensional material using hydrogen plasma according to claim 16, wherein the RF antenna is formed in a coil shape surrounding the upper outer surface of the body portion to generate plasma by inducing an electric field. 18. The apparatus for recovering electrical properties of a two-dimensional material using hydrogen plasma according to claim 17, wherein the maxine film is disposed at the bottom of the body portion to prevent damage due to direct collision of plasma generated from the RF antenna. According to claim 1, Maxine device, characterized in that consisting of an electrode material of the two-dimensional material produced through the method of recovering the electrical properties of the two-dimensional material using the hydrogen plasma.

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