KR20200071039A - A quinone-based ionic compound, a method for producing the same, transparent near infrared ray shielding film containing the quinone-based ionic compound and a method for producing the same - Google Patents
A quinone-based ionic compound, a method for producing the same, transparent near infrared ray shielding film containing the quinone-based ionic compound and a method for producing the same Download PDFInfo
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- KR20200071039A KR20200071039A KR1020190163472A KR20190163472A KR20200071039A KR 20200071039 A KR20200071039 A KR 20200071039A KR 1020190163472 A KR1020190163472 A KR 1020190163472A KR 20190163472 A KR20190163472 A KR 20190163472A KR 20200071039 A KR20200071039 A KR 20200071039A
- Authority
- KR
- South Korea
- Prior art keywords
- group
- formula
- quinoid
- ionic compound
- based ionic
- Prior art date
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- 150000008040 ionic compounds Chemical class 0.000 title claims abstract description 60
- 238000004519 manufacturing process Methods 0.000 title claims description 22
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 title 4
- 238000000034 method Methods 0.000 claims abstract description 12
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 81
- 230000000903 blocking effect Effects 0.000 claims description 50
- 125000000217 alkyl group Chemical group 0.000 claims description 37
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 36
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 34
- 125000004432 carbon atom Chemical group C* 0.000 claims description 34
- 239000000126 substance Substances 0.000 claims description 32
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 31
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims description 24
- 150000001875 compounds Chemical class 0.000 claims description 24
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 21
- -1 polyethylene Polymers 0.000 claims description 21
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 20
- 229910052757 nitrogen Inorganic materials 0.000 claims description 20
- 229910052698 phosphorus Inorganic materials 0.000 claims description 20
- 239000011574 phosphorus Substances 0.000 claims description 20
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 19
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 18
- 239000001257 hydrogen Substances 0.000 claims description 18
- 229910052739 hydrogen Inorganic materials 0.000 claims description 18
- 239000002904 solvent Substances 0.000 claims description 18
- 239000011259 mixed solution Substances 0.000 claims description 17
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 16
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 15
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 15
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 14
- 229910052799 carbon Inorganic materials 0.000 claims description 14
- 125000003545 alkoxy group Chemical group 0.000 claims description 13
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 12
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 11
- 125000003277 amino group Chemical group 0.000 claims description 11
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 11
- 229910052731 fluorine Inorganic materials 0.000 claims description 11
- 239000011737 fluorine Substances 0.000 claims description 11
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 claims description 11
- 239000011230 binding agent Substances 0.000 claims description 10
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 10
- 125000001153 fluoro group Chemical group F* 0.000 claims description 10
- 125000005843 halogen group Chemical group 0.000 claims description 10
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 10
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 10
- 125000003172 aldehyde group Chemical group 0.000 claims description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 8
- 125000001174 sulfone group Chemical group 0.000 claims description 8
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 8
- 238000000576 coating method Methods 0.000 claims description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 6
- 239000004695 Polyether sulfone Substances 0.000 claims description 6
- 230000004888 barrier function Effects 0.000 claims description 6
- 150000002431 hydrogen Chemical class 0.000 claims description 6
- 229920006393 polyether sulfone Polymers 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 150000002891 organic anions Chemical class 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 229910052717 sulfur Inorganic materials 0.000 claims description 5
- 150000003852 triazoles Chemical class 0.000 claims description 5
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 claims description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 4
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 claims description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical group OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
- 150000001555 benzenes Chemical class 0.000 claims description 4
- JHRWWRDRBPCWTF-OLQVQODUSA-N captafol Chemical compound C1C=CC[C@H]2C(=O)N(SC(Cl)(Cl)C(Cl)Cl)C(=O)[C@H]21 JHRWWRDRBPCWTF-OLQVQODUSA-N 0.000 claims description 4
- 238000007606 doctor blade method Methods 0.000 claims description 4
- 150000002460 imidazoles Chemical class 0.000 claims description 4
- 150000003536 tetrazoles Chemical class 0.000 claims description 4
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 3
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 3
- 239000007921 spray Substances 0.000 claims description 3
- 239000011593 sulfur Substances 0.000 claims description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims description 2
- 239000004952 Polyamide Substances 0.000 claims description 2
- 239000004698 Polyethylene Substances 0.000 claims description 2
- 239000004642 Polyimide Substances 0.000 claims description 2
- 239000004793 Polystyrene Substances 0.000 claims description 2
- 229910052810 boron oxide Inorganic materials 0.000 claims description 2
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 claims description 2
- BDUPRNVPXOHWIL-UHFFFAOYSA-N dimethyl sulfite Chemical compound COS(=O)OC BDUPRNVPXOHWIL-UHFFFAOYSA-N 0.000 claims description 2
- 238000003618 dip coating Methods 0.000 claims description 2
- 239000003208 petroleum Substances 0.000 claims description 2
- 229920000058 polyacrylate Polymers 0.000 claims description 2
- 229920002647 polyamide Polymers 0.000 claims description 2
- 229920000515 polycarbonate Polymers 0.000 claims description 2
- 239000004417 polycarbonate Substances 0.000 claims description 2
- 229920000728 polyester Polymers 0.000 claims description 2
- 229920000573 polyethylene Polymers 0.000 claims description 2
- 229920001721 polyimide Polymers 0.000 claims description 2
- 229920001184 polypeptide Polymers 0.000 claims description 2
- 229920002223 polystyrene Polymers 0.000 claims description 2
- 229920002635 polyurethane Polymers 0.000 claims description 2
- 239000004814 polyurethane Substances 0.000 claims description 2
- 102000004196 processed proteins & peptides Human genes 0.000 claims description 2
- 108090000765 processed proteins & peptides Proteins 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- 238000005507 spraying Methods 0.000 claims description 2
- 239000010408 film Substances 0.000 abstract description 61
- 239000003960 organic solvent Substances 0.000 abstract description 22
- 238000002834 transmittance Methods 0.000 abstract description 10
- 239000010409 thin film Substances 0.000 abstract description 9
- 229920000642 polymer Polymers 0.000 abstract description 7
- 238000002835 absorbance Methods 0.000 abstract description 4
- 230000001681 protective effect Effects 0.000 abstract description 4
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 38
- 239000000243 solution Substances 0.000 description 36
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 31
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 28
- 125000001424 substituent group Chemical group 0.000 description 28
- 238000002360 preparation method Methods 0.000 description 26
- 239000010410 layer Substances 0.000 description 19
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 16
- 239000000203 mixture Substances 0.000 description 15
- 229910052786 argon Inorganic materials 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 14
- 238000010992 reflux Methods 0.000 description 13
- 238000006243 chemical reaction Methods 0.000 description 12
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 12
- 238000005481 NMR spectroscopy Methods 0.000 description 11
- 125000003118 aryl group Chemical group 0.000 description 11
- LCPVQAHEFVXVKT-UHFFFAOYSA-N 2-(2,4-difluorophenoxy)pyridin-3-amine Chemical compound NC1=CC=CN=C1OC1=CC=C(F)C=C1F LCPVQAHEFVXVKT-UHFFFAOYSA-N 0.000 description 10
- 238000010521 absorption reaction Methods 0.000 description 10
- GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- CHQMHPLRPQMAMX-UHFFFAOYSA-L sodium persulfate Substances [Na+].[Na+].[O-]S(=O)(=O)OOS([O-])(=O)=O CHQMHPLRPQMAMX-UHFFFAOYSA-L 0.000 description 10
- 239000000047 product Substances 0.000 description 9
- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 description 8
- OLRIHBLOZLNIEU-UHFFFAOYSA-N 4-[[4-bis[4-(diethylamino)phenyl]phosphanylphenyl]-[4-(diethylamino)phenyl]phosphanyl]-N,N-diethylaniline Chemical compound CCN(CC)C1=CC=C(C=C1)P(C2=CC=C(C=C2)N(CC)CC)C3=CC=C(C=C3)P(C4=CC=C(C=C4)N(CC)CC)C5=CC=C(C=C5)N(CC)CC OLRIHBLOZLNIEU-UHFFFAOYSA-N 0.000 description 8
- 125000001072 heteroaryl group Chemical group 0.000 description 8
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 7
- 239000011777 magnesium Substances 0.000 description 7
- 229910052749 magnesium Inorganic materials 0.000 description 7
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 6
- JRNVZBWKYDBUCA-UHFFFAOYSA-N N-chlorosuccinimide Chemical compound ClN1C(=O)CCC1=O JRNVZBWKYDBUCA-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 125000001931 aliphatic group Chemical group 0.000 description 6
- 230000008033 biological extinction Effects 0.000 description 6
- 125000005549 heteroarylene group Chemical group 0.000 description 6
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 6
- 230000035699 permeability Effects 0.000 description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 5
- 150000001450 anions Chemical class 0.000 description 5
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 5
- 125000000732 arylene group Chemical group 0.000 description 5
- 125000004429 atom Chemical group 0.000 description 5
- 125000000753 cycloalkyl group Chemical group 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 230000020169 heat generation Effects 0.000 description 5
- 125000000623 heterocyclic group Chemical group 0.000 description 5
- FVZVCSNXTFCBQU-UHFFFAOYSA-N phosphanyl Chemical group [PH2] FVZVCSNXTFCBQU-UHFFFAOYSA-N 0.000 description 5
- QWWDMMUHJPQMDO-UHFFFAOYSA-N sodium 2-(trifluoromethyl)imidazol-3-ide-4,5-dicarbonitrile Chemical compound C(#N)C=1N=C([N-]C=1C#N)C(F)(F)F.[Na+] QWWDMMUHJPQMDO-UHFFFAOYSA-N 0.000 description 5
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- ZQAZFSBVTWLCAU-UHFFFAOYSA-N [N+](=O)([O-])C=1N=C([N-]C1[N+](=O)[O-])C(F)(F)F.[Na+] Chemical compound [N+](=O)([O-])C=1N=C([N-]C1[N+](=O)[O-])C(F)(F)F.[Na+] ZQAZFSBVTWLCAU-UHFFFAOYSA-N 0.000 description 4
- 125000003342 alkenyl group Chemical group 0.000 description 4
- 125000004414 alkyl thio group Chemical group 0.000 description 4
- 125000000304 alkynyl group Chemical group 0.000 description 4
- 125000005013 aryl ether group Chemical group 0.000 description 4
- 150000004832 aryl thioethers Chemical group 0.000 description 4
- 125000000392 cycloalkenyl group Chemical group 0.000 description 4
- JBFYUZGYRGXSFL-UHFFFAOYSA-N imidazolide Chemical compound C1=C[N-]C=N1 JBFYUZGYRGXSFL-UHFFFAOYSA-N 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 3
- NGYMZFJVHHKJQR-UHFFFAOYSA-N 4-bromo-n,n-diethylaniline Chemical compound CCN(CC)C1=CC=C(Br)C=C1 NGYMZFJVHHKJQR-UHFFFAOYSA-N 0.000 description 3
- DEXFNLNNUZKHNO-UHFFFAOYSA-N 6-[3-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperidin-1-yl]-3-oxopropyl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1CCN(CC1)C(CCC1=CC2=C(NC(O2)=O)C=C1)=O DEXFNLNNUZKHNO-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 150000001768 cations Chemical class 0.000 description 3
- 239000012153 distilled water Substances 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- ULYZAYCEDJDHCC-UHFFFAOYSA-N isopropyl chloride Chemical compound CC(C)Cl ULYZAYCEDJDHCC-UHFFFAOYSA-N 0.000 description 3
- AUONHKJOIZSQGR-UHFFFAOYSA-N oxophosphane Chemical compound P=O AUONHKJOIZSQGR-UHFFFAOYSA-N 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical class [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 3
- 125000004076 pyridyl group Chemical group 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- MVIVFAZKASWAPI-UHFFFAOYSA-M sodium 5-(trifluoromethyl)tetrazole-5-carboxylate Chemical compound FC(C1(N=NN=N1)C(=O)[O-])(F)F.[Na+] MVIVFAZKASWAPI-UHFFFAOYSA-M 0.000 description 3
- 229910052938 sodium sulfate Inorganic materials 0.000 description 3
- 235000011152 sodium sulphate Nutrition 0.000 description 3
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 2
- 125000001989 1,3-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([H])C([*:2])=C1[H] 0.000 description 2
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 2
- KJMXVHBTWJSSBL-UHFFFAOYSA-N 2-(trifluoromethyl)-1h-imidazole Chemical compound FC(F)(F)C1=NC=CN1 KJMXVHBTWJSSBL-UHFFFAOYSA-N 0.000 description 2
- DHWUWKLCGOTNEK-UHFFFAOYSA-N 5-bromo-N,N-dibutylpyridin-2-amine Chemical compound CCCCN(CCCC)C1=CC=C(Br)C=N1 DHWUWKLCGOTNEK-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- MKYBYDHXWVHEJW-UHFFFAOYSA-N N-[1-oxo-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propan-2-yl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(C(C)NC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 MKYBYDHXWVHEJW-UHFFFAOYSA-N 0.000 description 2
- NIPNSKYNPDTRPC-UHFFFAOYSA-N N-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 NIPNSKYNPDTRPC-UHFFFAOYSA-N 0.000 description 2
- PCLIMKBDDGJMGD-UHFFFAOYSA-N N-bromosuccinimide Chemical compound BrN1C(=O)CCC1=O PCLIMKBDDGJMGD-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical group C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
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- 229910000073 phosphorus hydride Inorganic materials 0.000 description 2
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- INGVZLYSYVSTRR-UHFFFAOYSA-N 4-n-[4-[4-[bis(2-methylpropyl)amino]-n-[4-[bis(2-methylpropyl)amino]phenyl]anilino]phenyl]-4-n-[4-[bis(2-methylpropyl)amino]phenyl]-1-n,1-n-bis(2-methylpropyl)benzene-1,4-diamine Chemical compound C1=CC(N(CC(C)C)CC(C)C)=CC=C1N(C=1C=CC(=CC=1)N(C=1C=CC(=CC=1)N(CC(C)C)CC(C)C)C=1C=CC(=CC=1)N(CC(C)C)CC(C)C)C1=CC=C(N(CC(C)C)CC(C)C)C=C1 INGVZLYSYVSTRR-UHFFFAOYSA-N 0.000 description 1
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- UOHAAGNYSULPTO-UHFFFAOYSA-N CC1=CC=CC=C1.FCC1=NC=CN1 Chemical compound CC1=CC=CC=C1.FCC1=NC=CN1 UOHAAGNYSULPTO-UHFFFAOYSA-N 0.000 description 1
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Divinylene sulfide Natural products C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- UDXKFQGJJAMWDL-UHFFFAOYSA-N N,N-dibutylthiophen-2-amine Chemical compound CCCCN(CCCC)C1=CC=CS1 UDXKFQGJJAMWDL-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
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- JAWMENYCRQKKJY-UHFFFAOYSA-N [3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-ylmethyl)-1-oxa-2,8-diazaspiro[4.5]dec-2-en-8-yl]-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]methanone Chemical compound N1N=NC=2CN(CCC=21)CC1=NOC2(C1)CCN(CC2)C(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F JAWMENYCRQKKJY-UHFFFAOYSA-N 0.000 description 1
- CSCPPACGZOOCGX-WFGJKAKNSA-N acetone d6 Chemical compound [2H]C([2H])([2H])C(=O)C([2H])([2H])[2H] CSCPPACGZOOCGX-WFGJKAKNSA-N 0.000 description 1
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 1
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 1
- 125000000499 benzofuranyl group Chemical group O1C(=CC2=C1C=CC=C2)* 0.000 description 1
- 125000004196 benzothienyl group Chemical group S1C(=CC2=C1C=CC=C2)* 0.000 description 1
- 239000012620 biological material Substances 0.000 description 1
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- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 description 1
- ZDVHQYVXWOYBEH-UHFFFAOYSA-N bis(2-methylpropyl)alumane hexane Chemical compound CCCCCC.[H][Al](CC(C)C)CC(C)C ZDVHQYVXWOYBEH-UHFFFAOYSA-N 0.000 description 1
- FJDQFPXHSGXQBY-UHFFFAOYSA-L caesium carbonate Chemical compound [Cs+].[Cs+].[O-]C([O-])=O FJDQFPXHSGXQBY-UHFFFAOYSA-L 0.000 description 1
- 229910000024 caesium carbonate Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000012230 colorless oil Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 1
- NHELIHXBJRANPL-UHFFFAOYSA-L copper;diperchlorate;hexahydrate Chemical compound O.O.O.O.O.O.[Cu+2].[O-]Cl(=O)(=O)=O.[O-]Cl(=O)(=O)=O NHELIHXBJRANPL-UHFFFAOYSA-L 0.000 description 1
- 150000003950 cyclic amides Chemical class 0.000 description 1
- 125000000596 cyclohexenyl group Chemical group C1(=CCCCC1)* 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 description 1
- 125000002433 cyclopentenyl group Chemical group C1(=CCCC1)* 0.000 description 1
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- 230000003247 decreasing effect Effects 0.000 description 1
- LXCYSACZTOKNNS-UHFFFAOYSA-N diethoxy(oxo)phosphanium Chemical compound CCO[P+](=O)OCC LXCYSACZTOKNNS-UHFFFAOYSA-N 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
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- 238000004146 energy storage Methods 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 125000003914 fluoranthenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC=C4C1=C23)* 0.000 description 1
- 125000005567 fluorenylene group Chemical group 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 125000001041 indolyl group Chemical group 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000002183 isoquinolinyl group Chemical group C1(=NC=CC2=CC=CC=C12)* 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- QSZMZKBZAYQGRS-UHFFFAOYSA-N lithium;bis(trifluoromethylsulfonyl)azanide Chemical compound [Li+].FC(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)F QSZMZKBZAYQGRS-UHFFFAOYSA-N 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical group [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000005561 phenanthryl group Chemical group 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 125000003386 piperidinyl group Chemical group 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000004309 pyranyl group Chemical group O1C(C=CC=C1)* 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- 125000001725 pyrenyl group Chemical group 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- JWVCLYRUEFBMGU-UHFFFAOYSA-N quinazoline Chemical compound N1=CN=CC2=CC=CC=C21 JWVCLYRUEFBMGU-UHFFFAOYSA-N 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 229910000104 sodium hydride Inorganic materials 0.000 description 1
- SYXYWTXQFUUWLP-UHFFFAOYSA-N sodium;butan-1-olate Chemical compound [Na+].CCCC[O-] SYXYWTXQFUUWLP-UHFFFAOYSA-N 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000012258 stirred mixture Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 150000003577 thiophenes Chemical class 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
- C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/5022—Aromatic phosphines (P-C aromatic linkage)
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
Abstract
Description
본 발명은 퀴노이드계 이온화합물, 이의 제조방법, 상기 퀴노이드계 이온화합물을 포함하는 근적외선 차단막 및 이의 제조방법에 관한 것이다.The present invention relates to a quinoid-based ionic compound, a method for manufacturing the same, a near-infrared blocking film comprising the quinoid-based ionic compound, and a method for manufacturing the same.
적외선은 지구에 도달하는 태양에너지의 약 40%를 차지하는 큰 에너지원으로써 특히 열에너지와 관련이 깊다. 800 nm 이상의 긴 파장으로 되어 있는 적외선은 일반적인 가시광선 차단막에 대한 투과도가 높아, 특정한 차단막을 설치하지 않으면 자동차, 건물 내부, 전자 기기 등에 과도한 열을 발생시킬 수 있다.Infrared is a large energy source that accounts for about 40% of the solar energy reaching the Earth, and is particularly related to thermal energy. Infrared rays having a long wavelength of 800 nm or more have high transmittance to a general visible light shielding film, and can generate excessive heat in automobiles, buildings, and electronic devices without a specific shielding film.
또한, 대부분의 전자기기에서 신호 전달에 적외선을 쓰기 때문에 기기에서 발생한 부산-근적외선을 차단해 주지 않으면 신호 오작동의 우려가 있어 효율적인 차단막이 필수적이다. In addition, since most electronic devices use infrared rays for signal transmission, there is a risk of signal malfunction if the Busan-Near Infrared rays generated from the equipment are not blocked, so an efficient barrier is essential.
상기 근적외선 차단막이 실생활 전반에 걸쳐 활용되기 위해서는 가시광에 대한 투과도가 높으면서 적외선만을 선택적으로 흡수해야 하는데, 이는 가시광을 흡광할 경우 시야에 방해가 될 수 있고, 미관이나 활용성이 떨어질 수 있기 때문이다. In order to utilize the near-infrared ray blocking film in real life, it is necessary to selectively absorb only infrared light while having high transmittance to visible light, because absorbing visible light may interfere with the field of view and deteriorate aesthetics or utility.
한편, 디이모늄계 물질은 가시광 영역에서의 투과 특성이 매우 우수하고, 800 nm 이상의 영역에서의 적외선 흡수 특성이 우수한 소재로 다른 물질에 비해서 매우 높은 몰 흡광 계수를 갖는다고 알려져 있다. On the other hand, the dimonium-based material is known to have a very high molar extinction coefficient compared to other materials as a material having excellent transmission characteristics in the visible light region and excellent infrared absorption characteristics in the region of 800 nm or more.
그러나 현재까지 알려진 디이모늄계 소재는 음이온에 중금속이 포함된 육플루오르화 안티몬산을 사용하여 독성으로 인한 활용에 제한이 있거나, 염소, 브롬 등 할로겐 이온을 사용하여 유기 용매에 대한 용해도에서 문제가 있다. 뿐만 아니라, 고분자와의 친화도가 좋지 않아 차단막 형성 후에 열에 의해서 쉽게 용출되어 차단막의 변색 현상이 있으며, 그로 인해 장기간 사용에 어렵다는 문제가 있다. 따라서, 기존의 근적외선 물질들의 단점을 보완하기 위하여 양이온과 음이온에 새로운 구조를 도입할 필요성이 있다.However, the dimonium-based materials known to date have limitations in use due to toxicity using antimonic hexafluoride containing heavy metals in anions, or there are problems in solubility in organic solvents using halogen ions such as chlorine and bromine. . In addition, since the affinity with the polymer is not good, it is easily eluted by heat after formation of the blocking film, and thus there is a problem of discoloration of the blocking film, and thus there is a problem that it is difficult to use for a long time. Therefore, there is a need to introduce new structures to cations and anions to compensate for the shortcomings of the existing near infrared materials.
따라서, 본 발명이 해결하고자 하는 기술적 과제는, 근적외선 영역(특히 900 내지 1100 nm의 파장)에서 높은 몰 흡광 계수를 가지며, 가시광 영역(특히 350 내지 700 nm의 파장)에서는 낮은 흡광 계수를 가지고, 내열성 및 내습성이 높은 퀴노이드계 이온화합물 및 이의 제조방법을 제공하는 것이다.Therefore, the technical problem to be solved by the present invention has a high molar extinction coefficient in the near infrared region (especially a wavelength of 900 to 1100 nm), a low extinction coefficient in the visible light region (especially a wavelength of 350 to 700 nm), and heat resistance. And it is to provide a quinoid-based ionic compound having high moisture resistance and a method for manufacturing the same.
본 발명이 해결하고자 하는 또 다른 기술적 과제는 상기 퀴노이드계 이온화합물을 포함하는 고내열과 고내습성 근적외선 차단막 및 이의 제조방법을 제공하는 것이다.Another technical problem to be solved by the present invention is to provide a high heat-resistant and high-humidity near-infrared blocking film including the quinoid-based ionic compound and a method for manufacturing the same.
상기한 목적을 달성하기 위한 본 발명의 일 측면은 하기 화학식 1로 표시되는 퀴노이드계 이온화합물을 제공한다.One aspect of the present invention for achieving the above object provides a quinoid-based ionic compound represented by the following formula (1).
[화학식 1][Formula 1]
상기 화학식 1에 있어서, n은 1 내지 4의 정수이고, A 및 B는 서로 동일하거나 상이하고, 각각 질소 또는 인이고, X-는 유기계 음이온으로, 치환 또는 비치환된 벤젠, 치환 또는 비치환된 이미다졸, 치환 또는 비치환된 트리아졸, 치환 또는 비치환된 테트라졸, 탄소수 1 내지 4의 알킬기의 수소가 플루오르로 치환된 술폰이미드 또는 옥살레이트기 사이에 탄소수 0 내지 4의 알킬기를 포함한 옥살라토보레이트이고, R1 내지 R4는 서로 동일하거나 상이하고, 각각 독립적으로 하기 화학식 2 또는 3으로 표시되는 화합물이다.In
[화학식 2] [Formula 2]
상기 화학식 2에서, A1은 질소, 인, 산소 또는 황이고, A2는 질소 또는 인이고, R29 및 R30은 서로 동일하거나 상이하고, 각각 독립적으로 수소, 치환 또는 비치환된 탄소수 1 내지 10의 선형 또는 가지형 알킬기이다.In Formula 2, A 1 is nitrogen, phosphorus, oxygen or sulfur, A 2 is nitrogen or phosphorus, R 29 and R 30 are the same or different from each other, and each independently hydrogen, substituted or
[화학식 3] [Formula 3]
상기 화학식 3에서 A3 및 A4는 서로 동일하거나 상이하고, 각각 탄소, 질소 또는 인이고, A5는 질소 또는 인이고, R31 및 R32은 서로 동일하거나 상이하고, 각각 독립적으로 수소, 치환 또는 비치환된 탄소수 1 내지 10의 선형 또는 가지형 알킬기이다. In Formula 3, A 3 and A 4 are the same as or different from each other, and each is carbon, nitrogen, or phosphorus, A 5 is nitrogen or phosphorus, and R 31 and R 32 are the same or different from each other, and each independently hydrogen, substituted Or an unsubstituted linear or branched alkyl group having 1 to 10 carbon atoms.
본 발명의 다른 측면은 상기 퀴노이드계 이온화합물을 포함하는 근적외선 차단막을 제공한다.Another aspect of the present invention provides a near-infrared blocking film comprising the quinoid-based ionic compound.
본 발명의 또 다른 측면은 상기 퀴노이드계 이온화합물 및 바인더를 포함하는 혼합용액을 제조하는 단계; 및 상기 혼합용액을 이용하여 근적외선 차단막을 제조하는 단계;를 포함하는 근적외선 차단막의 제조방법을 제공한다.Another aspect of the present invention comprises the steps of preparing a mixed solution containing the quinoid-based ionic compound and a binder; And manufacturing a near-infrared blocking film using the mixed solution.
본 발명에 따른 퀴노이드계 이온화합물은 가시광 영역에서 높은 투과도와 근적외선 영역에서 높은 흡광도를 가져 효율적인 근적외선 차단이 가능하며, 유기 용매에 높은 용해도를 가져 박막으로 제조하기가 용이할 뿐만 아니라, 고분자와의 친화성이 우수하여 박막 상태에서 장시간 고내열, 고내습 특성을 유지할 수 있다. The quinoid-based ionic compound according to the present invention has high transmittance in the visible light region and high absorbance in the near-infrared region, so that it can block efficient near-infrared rays, and has a high solubility in organic solvents, making it easy to manufacture into a thin film, as well as with a polymer. It has excellent affinity and can maintain high heat resistance and high moisture resistance for a long time in a thin film state.
상기 퀴노이드계 이온화합물을 포함하는 근적외선 차단막은 전자기기를 보호하기 위한 보호 필름에 적용되기 적합하며, 단열 필름이나 빛에너지 흡수층으로도 활용될 수 있다.The near-infrared blocking film containing the quinoid-based ionic compound is suitable for application to a protective film for protecting electronic devices, and can also be used as an insulating film or a light energy absorbing layer.
도 1은 본 발명의 일 실시예에 따른 퀴노이드계 이온화합물의 용액상 UV-VIS-NIR 흡수 스펙트럼을 나타낸 그래프이다.
도 2는 본 발명의 실시예 2-2에 따른 근적외선 차단막 유무에 따른 광열 필름의 열상승 그래프이다.
도 3은 본 발명의 실시예 2-2에 따른 근적외선 차단막 유무에 따른 열생성을 확인한 열화상 사진이다.1 is a graph showing a UV-VIS-NIR absorption spectrum of a solution phase of a quinoid-based ionic compound according to an embodiment of the present invention.
Figure 2 is a heat rise graph of the photothermal film according to the presence or absence of a near-infrared blocking film according to Example 2-2 of the present invention.
3 is a thermal image confirming the heat generation according to the presence or absence of a near-infrared blocking film according to Example 2-2 of the present invention.
이하에서, 본 발명의 여러 측면 및 다양한 구현예에 대해 더욱 구체적으로 설명한다.Hereinafter, various aspects and various embodiments of the present invention will be described in more detail.
본 발명에 따른 퀴노이드계 이온화합물은 우수한 내열, 내습성을 가지며 근적외선 영역에서만 선택적으로 높은 몰 흡광 계수를 가진다. 또한, 유기 용매에 대해 높은 용해도를 가져 활용이 용이하며, 상기 화합물을 그 자체로, 혹은 바인더 유기 혹은 무기물, 혹은 바인더 없이 유기용매 상에서 혼합하여 근적외선 흡수 또는 차단막을 형성할 수 있다. 상기한 근적외선 차단막은 열과 빛에 취약한 전자기기나 생체 재료들을 보호하기 위한 보호 필름으로 활용될 수 있으며, 혹은 태양에서 오는 다량의 에너지를 효율적으로 흡수하여 에너지 저장 및 전달체로도 활용될 수 있다. The quinoid-based ionic compound according to the present invention has excellent heat and moisture resistance and selectively has a high molar extinction coefficient only in the near infrared region. In addition, it has a high solubility in an organic solvent and is easy to utilize, and the compound can be mixed by itself or on an organic solvent without a binder or an organic solvent to form a near infrared absorbing or blocking film. The near-infrared shielding film may be used as a protective film for protecting electronic devices or biomaterials that are vulnerable to heat and light, or may be used as an energy storage and transporter by efficiently absorbing a large amount of energy from the sun.
본 발명의 일 측면은 하기 화학식 1로 표시되는 퀴노이드계 이온화합물을 제공한다.One aspect of the present invention provides a quinoid-based ionic compound represented by the following formula (1).
[화학식 1][Formula 1]
상기 화학식 1에 있어서, n은 1 내지 4의 정수이고, A 및 B는 서로 동일하거나 상이하고, 각각 질소 또는 인이고, X-는 유기계 음이온으로, 치환 또는 비치환된 벤젠, 치환 또는 비치환된 이미다졸, 치환 또는 비치환된 트리아졸, 치환 또는 비치환된 테트라졸, 탄소수 1 내지 4의 알킬기의 수소가 플루오르로 치환된 술폰이미드 또는 옥살레이트기 사이에 탄소수 0 내지 4의 알킬기를 포함한 옥살라토보레이트이고, R1 내지 R4는 서로 동일하거나 상이하고, 각각 독립적으로 하기 화학식 2 또는 3으로 표시되는 화합물이다.In
[화학식 2] [Formula 2]
상기 화학식 2에서, A1은 질소, 인, 산소 또는 황이고, A2는 질소 또는 인이고, R29 및 R30은 서로 동일하거나 상이하고, 각각 독립적으로 수소, 치환 또는 비치환된 탄소수 1 내지 10의 선형 또는 가지형 알킬기이다.In Formula 2, A 1 is nitrogen, phosphorus, oxygen or sulfur, A 2 is nitrogen or phosphorus, R 29 and R 30 are the same or different from each other, and each independently hydrogen, substituted or
[화학식 3] [Formula 3]
상기 화학식 3에서 A3 및 A4는 서로 동일하거나 상이하고, 각각 탄소, 질소 또는 인이고, A5는 질소 또는 인이고, R31 및 R32은 서로 동일하거나 상이하고, 각각 독립적으로 수소, 치환 또는 비치환된 탄소수 1 내지 10의 선형 또는 가지형 알킬기이다. In Formula 3, A 3 and A 4 are the same as or different from each other, and each is carbon, nitrogen, or phosphorus, A 5 is nitrogen or phosphorus, and R 31 and R 32 are the same or different from each other, and each independently hydrogen, substituted Or an unsubstituted linear or branched alkyl group having 1 to 10 carbon atoms.
상기 화학식 2, 3 및 3-1에서 *은 이웃한 원자와의 결합 위치를 나타낸다.In Chemical Formulas 2, 3 and 3-1, * represents a bonding position with an adjacent atom.
구체적으로 상기 화학식 2 및 3은 치환 혹은 비치환된 티오펜, 피롤, 및 벤젠(예; nitrobenzene, dialkybenzene 등), 기타 방향족 그룹 하나이상을 포함한 화합물일 수 있다.Specifically, the formulas 2 and 3 may be substituted or unsubstituted thiophene, pyrrole, and benzene (eg, nitrobenzene, dialkybenzene, etc.), other compounds containing at least one aromatic group.
상기한 바와 같이, 상기 X는 유기계 음이온으로, 헤테로원소가 있거나 없는 방향족 고리이며, 치환 또는 비치환된 벤젠, 치환 또는 비치환된 이미다졸, 치환 또는 비치환된 트리아졸, 치환 또는 비치환된 테트라졸, 탄소수 1 내지 4의 알킬기의 수소가 플루오르로 치환된 술폰이미드 또는 옥살레이트기 사이에 탄소수 0 내지 4의 알킬기를 포함한 옥살라토보레이트이고, 상기 치환기로는 히드록시기, 싸이올기, 술폰기, 할로젠기, 나이트로기, 사이아노기, 카르복시기, 아민기, 알데히드기, 혹은 탄소수 1 내지 10의 알킬기나 알콕시기에 수소가 플루오르로 치환되거나 되지 않은 경우를 포함한다. 상기 벤젠, 이미다졸, 트리아졸, 테트라졸은 탄소, 질소, 산소, 혹은 직접 반복되어 연결될 수 있다.As described above, X is an organic anion, an aromatic ring with or without heteroatoms, substituted or unsubstituted benzene, substituted or unsubstituted imidazole, substituted or unsubstituted triazole, substituted or unsubstituted tetra Oxalatoborate including alkyl groups having 0 to 4 carbon atoms between sol, sulfonimide or oxalate groups in which hydrogen of an alkyl group having 1 to 4 carbon atoms is substituted with fluorine, and the substituents include hydroxy groups, thiol groups, sulfone groups, It includes the case where hydrogen is not substituted with fluorine in a halogen group, a nitro group, a cyano group, a carboxy group, an amine group, an aldehyde group, or an alkyl group or an alkoxy group having 1 to 10 carbon atoms. The benzene, imidazole, triazole, tetrazole may be directly connected to carbon, nitrogen, oxygen, or directly.
본 명세서에서 “알킬기” 혹은 “알콕시기”는 별도의 지칭이 없는 한, 분지형, 시클로형, 직쇄형과 그 복합형을 모두 포함한다.In the present specification, “alkyl group” or “alkoxy group” includes all branched, cyclo, straight chain, and combinations thereof, unless otherwise specified.
「치환 또는 비치환된」이라고 하는 경우에 있어서의 치환기로서는, 알킬기, 시클로알킬기, 복소환기, 알케닐기, 시클로알케닐기, 알키닐기, 알콕시기, 알킬티오기, 아릴에테르기, 아릴티오에테르기, 아릴기, 헤테로아릴기, 할로겐 원자, 시아노기, 아미노기, 카르보닐기, 카르복시기, 옥시카르보닐기, 카르바모일기가 바람직하고, 나아가, 각 치환기의 설명에 있어서 바람직한 것으로 하는, 구체적인 치환기가 바람직하다. 또한, 이들 치환기는, 추가로 상술한 치환기에 의해 치환되어 있어도 된다.Examples of the substituent in the case of "substituted or unsubstituted" include an alkyl group, cycloalkyl group, heterocyclic group, alkenyl group, cycloalkenyl group, alkynyl group, alkoxy group, alkylthio group, aryl ether group, arylthioether group, An aryl group, a heteroaryl group, a halogen atom, a cyano group, an amino group, a carbonyl group, a carboxy group, an oxycarbonyl group, and a carbamoyl group are preferred. Further, specific substituents, which are preferred in the description of each substituent, are preferred. Moreover, these substituents may be further substituted with the above-mentioned substituents.
이하에 설명하는, 화합물 또는 그의 부분 구조에 있어서, 「치환 또는 비치환된」이라고 하는 경우에 대해서도 상기와 마찬가지이다.The same applies to the case of "substituted or unsubstituted" in the compound or a partial structure thereof described below.
알킬기란, 예를 들어, 메틸기, 에틸기, n-프로필기, 이소프로필기, n-부틸기, sec-부틸기, tert-부틸기 등의, 포화 지방족 탄화수소기를 나타낸다. 알킬기는, 치환기를 갖고 있어도 되고, 갖고 있지 않아도 된다. 알킬기가 치환되어 있는 경우의 추가 치환기에는 특별히 제한은 없고, 예를 들어, 알킬기, 아릴기, 헤테로아릴기 등을 들 수 있고, 이 점은, 이하의 기재에도 공통된다. 또한, 알킬기의 탄소수는, 특별히 한정되지 않지만, 입수의 용이성이나 비용의 점에서, 바람직하게는 1 이상 20 이하, 보다 바람직하게는 1 이상 8 이하의 범위이다.The alkyl group represents, for example, a saturated aliphatic hydrocarbon group such as methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group or tert-butyl group. The alkyl group may or may not have a substituent. The additional substituent in the case where the alkyl group is substituted is not particularly limited, and examples thereof include an alkyl group, an aryl group, and a heteroaryl group. This point is common to the following description. Moreover, although carbon number of an alkyl group is not specifically limited, From the point of ease of availability and cost, Preferably it is 1 or more and 20 or less, More preferably, it is 1 or more and 8 or less.
시클로알킬기란, 예를 들어, 시클로프로필기, 시클로헥실기, 노르보르닐기, 아다만틸기 등의, 포화 지환식 탄화수소기를 나타낸다. 시클로알킬기는, 치환기를 갖고 있어도 되고, 갖고 있지 않아도 된다. 시클로알킬기에 있어서의 알킬기 부분의 탄소수는, 특별히 한정되지 않지만, 바람직하게는 3 이상 20 이하의 범위이다.The cycloalkyl group represents, for example, a saturated alicyclic hydrocarbon group such as cyclopropyl group, cyclohexyl group, norbornyl group or adamantyl group. The cycloalkyl group may or may not have a substituent. The number of carbon atoms in the alkyl group portion in the cycloalkyl group is not particularly limited, but is preferably 3 or more and 20 or less.
복소환기란, 예를 들어, 피란환, 피페리딘환, 환상 아미드 등의, 탄소 이외의 원자를 환 내에 갖는 지방족환을 나타낸다. 복소환기는, 치환기를 갖고 있어도 되고, 갖고 있지 않아도 된다. 복소환은, 방향족성을 갖지 않는 한에 있어서, 환 내에 이중 결합을 1개 이상 갖고 있어도 된다. 복소환기의 탄소수는, 특별히 한정되지 않지만, 바람직하게는 2 이상 20 이하의 범위이다. The heterocyclic group represents, for example, an aliphatic ring having atoms other than carbon in the ring, such as a pyran ring, a piperidine ring, or a cyclic amide. The heterocyclic group may or may not have a substituent. The heterocycle may have one or more double bonds in the ring as long as it does not have aromaticity. The number of carbon atoms of the heterocyclic group is not particularly limited, but is preferably 2 or more and 20 or less.
알케닐기란, 예를 들어, 비닐기, 알릴기, 부타디에닐기 등의, 이중 결합을 포함하는 불포화 지방족 탄화수소기를 나타낸다. 알케닐기는, 치환기를 갖고 있어도 되고, 갖고 있지 않아도 된다. 알케닐기의 탄소수는, 특별히 한정되지 않지만, 바람직하게는 2 이상 20 이하의 범위이다.The alkenyl group represents, for example, an unsaturated aliphatic hydrocarbon group containing a double bond, such as a vinyl group, an allyl group, butadienyl group. The alkenyl group may or may not have a substituent. Although carbon number of an alkenyl group is not specifically limited, Preferably it is 2 or more and 20 or less.
시클로알케닐기란, 예를 들어, 시클로펜테닐기, 시클로펜타디에닐기, 시클로헥세닐기 등의, 이중 결합을 포함하는 불포화 지환식 탄화수소기를 나타낸다. 시클로알케닐기는, 치환기를 갖고 있어도 되고, 갖고 있지 않아도 된다. 시클로알케닐기의 탄소수는, 특별히 한정되지 않지만, 바람직하게는 4 이상 20 이하의 범위이다.The cycloalkenyl group represents, for example, an unsaturated alicyclic hydrocarbon group containing a double bond, such as a cyclopentenyl group, a cyclopentadienyl group, or a cyclohexenyl group. The cycloalkenyl group may or may not have a substituent. The number of carbon atoms of the cycloalkenyl group is not particularly limited, but is preferably 4 or more and 20 or less.
알키닐기란, 예를 들어, 에티닐기 등의, 삼중 결합을 포함하는 불포화 지방족 탄화수소기를 나타낸다. 알키닐기는, 치환기를 갖고 있어도 되고, 갖고 있지 않아도 된다. 알키닐기의 탄소수는, 특별히 한정되지 않지만, 바람직하게는 2 이상 20 이하의 범위이다.The alkynyl group represents, for example, an unsaturated aliphatic hydrocarbon group containing a triple bond, such as ethynyl group. The alkynyl group may or may not have a substituent. Although carbon number of an alkynyl group is not specifically limited, Preferably it is 2 or more and 20 or less.
알콕시기란, 예를 들어, 메톡시기, 에톡시기, 프로폭시기 등의, 에테르 결합을 통하여 지방족 탄화수소기가 결합한 관능기를 나타낸다. 이 지방족 탄화수소기는, 치환기를 갖고 있어도 되고, 갖고 있지 않아도 된다. 알콕시기의 탄소수는, 특별히 한정되지 않지만, 바람직하게는 1 이상 20 이하의 범위이다.The alkoxy group represents a functional group to which an aliphatic hydrocarbon group is bonded through an ether bond, such as a methoxy group, an ethoxy group, or a propoxy group. The aliphatic hydrocarbon group may or may not have a substituent. Although carbon number of an alkoxy group is not specifically limited, Preferably it is 1 or more and 20 or less.
알킬티오기란, 알콕시기의 에테르 결합의 산소 원자가 황 원자로 치환된 것이다. 알킬티오기의 탄화수소기는, 치환기를 갖고 있어도 되고, 갖고 있지 않아도 된다. 알킬티오기의 탄소수는, 특별히 한정되지 않지만, 바람직하게는 1 이상 20 이하의 범위이다.The alkylthio group is one in which the oxygen atom of the ether bond of the alkoxy group is substituted with a sulfur atom. The hydrocarbon group of the alkylthio group may or may not have a substituent. Although carbon number of an alkylthio group is not specifically limited, Preferably it is 1 or more and 20 or less.
아릴에테르기란, 예를 들어, 페녹시기 등, 에테르 결합을 개재한 방향족 탄화수소기가 결합한 관능기를 나타낸다. 이 방향족 탄화수소기는, 치환기를 갖고 있어도 되고, 갖고 있지 않아도 된다. 아릴에테르기의 탄소수는, 특별히 한정되지 않지만, 바람직하게는 6 이상 40 이하의 범위이다.The aryl ether group represents, for example, a functional group to which an aromatic hydrocarbon group via an ether bond is bonded, such as a phenoxy group. This aromatic hydrocarbon group may or may not have a substituent. The number of carbon atoms of the aryl ether group is not particularly limited, but is preferably in the range of 6 or more and 40 or less.
아릴티오에테르기란, 아릴에테르기의 에테르 결합의 산소 원자가 황 원자로 치환된 것이다. 아릴티오에테르기에 있어서의 방향족 탄화수소기는, 치환기를 갖고 있어도 되고, 갖고 있지 않아도 된다. 아릴티오에테르기의 탄소수는, 특별히 한정되지 않지만, 바람직하게는 6 이상 40 이하의 범위이다.An arylthioether group is one in which the oxygen atom of the ether bond of the arylether group is substituted with a sulfur atom. The aromatic hydrocarbon group in the arylthioether group may or may not have a substituent. The number of carbon atoms of the arylthioether group is not particularly limited, but is preferably 6 or more and 40 or less.
아릴기란, 예를 들어, 페닐기, 나프틸기, 비페닐기, 터페닐기, 페난트릴기, 안트라세닐기, 피레닐기, 플루오란테닐기 등의, 방향족 탄화수소기를 나타낸다. 아릴기는, 치환기를 갖고 있어도 되고, 갖고 있지 않아도 된다. 아릴기의 탄소수는, 특별히 한정되지 않지만, 바람직하게는 6 이상 40 이하의 범위이며, 보다 바람직하게는 6 이상 24 이하의 범위이다. 아릴기의 구체예로서는, 바람직하게는 페닐기, 1-나프틸기, 2-나프틸기이다.The aryl group represents, for example, an aromatic hydrocarbon group such as a phenyl group, a naphthyl group, a biphenyl group, a terphenyl group, a phenanthryl group, anthracenyl group, pyrenyl group, or fluoranthenyl group. The aryl group may or may not have a substituent. The number of carbon atoms of the aryl group is not particularly limited, but is preferably 6 or more and 40 or less, and more preferably 6 or more and 24 or less. As a specific example of an aryl group, Preferably it is a phenyl group, 1-naphthyl group, 2-naphthyl group.
헤테로아릴기란, 푸라닐기, 티오페닐기, 피리딜기, 퀴놀리닐기, 이소퀴놀리닐기, 피라지닐기, 피리미딜기, 나프티리딜기, 벤조푸라닐기, 벤조티오페닐기, 인돌릴기, 디벤조푸라닐기, 디벤조티오페닐기, 카르바졸릴기 등의, 탄소 이외의 원자를 1개 또는 복수개, 환 내에 갖는 환상 방향족기를 나타낸다. 헤테로아릴기는, 치환기를 갖고 있어도 되고, 갖고 있지 않아도 된다. 헤테로아릴기의 탄소수는, 특별히 한정되지 않지만, 바람직하게는 2 이상 30 이하의 범위이다. 헤테로아릴기의 구체예로서는, 바람직하게는 피리딜기, 퀴놀릴기, 카르바졸릴기, 디벤조푸라닐기, 디벤조티오페닐기이다.Heteroaryl group, furanyl group, thiophenyl group, pyridyl group, quinolinyl group, isoquinolinyl group, pyrazinyl group, pyrimidyl group, naphthyridyl group, benzofuranyl group, benzothiophenyl group, indolyl group, dibenzofuranyl group, A cyclic aromatic group having one or more atoms other than carbon in the ring, such as dibenzothiophenyl group and carbazolyl group. The heteroaryl group may or may not have a substituent. The number of carbon atoms of the heteroaryl group is not particularly limited, but is preferably 2 or more and 30 or less. As a specific example of a heteroaryl group, Preferably it is a pyridyl group, a quinoyl group, a carbazolyl group, a dibenzofuranyl group, and a dibenzothiophenyl group.
아미노기란, 치환 또는 비치환된 아미노기이다. 치환되는 경우의 치환기로서는, 예를 들어, 아릴기, 헤테로아릴기, 직쇄 알킬기, 분지 알킬기를 들 수 있다. 보다 구체적으로는, 페닐기, 비페닐기, 나프틸기, 피리딜기, 메틸기 등을 들 수 있고, 이들 치환기는 더 치환되어도 된다. 치환기의 탄소수는, 특별히 한정되지 않지만, 바람직하게는 6 이상 40 이하의 범위이다.An amino group is a substituted or unsubstituted amino group. Examples of the substituent in the case of substitution include an aryl group, a heteroaryl group, a straight chain alkyl group, and a branched alkyl group. More specifically, phenyl group, biphenyl group, naphthyl group, pyridyl group, methyl group, etc. may be mentioned, and these substituents may be further substituted. Although carbon number of a substituent is not specifically limited, Preferably it is the range of 6 or more and 40 or less.
할로겐 원자란, 불소, 염소, 브롬 및 요오드에서 선택되는 원자를 나타낸다.The halogen atom represents an atom selected from fluorine, chlorine, bromine and iodine.
카르보닐기, 카르복시기, 옥시카르보닐기, 카르바모일기 및 포스핀옥사이드 기는, 치환기를 갖고 있어도 되고, 갖고 있지 않아도 된다. 여기서, 치환기로서는, 예를 들어, 알킬기, 시클로알킬기, 아릴기, 헤테로아릴기 등을 들 수 있고, 이들 치환기는 더 치환되어도 된다.The carbonyl group, carboxyl group, oxycarbonyl group, carbamoyl group and phosphine oxide group may or may not have a substituent. Here, as a substituent, an alkyl group, cycloalkyl group, aryl group, heteroaryl group, etc. are mentioned, for example, These substituents may further be substituted.
아릴렌기란, 벤젠, 나프탈렌, 비페닐, 플루오렌, 페난트렌 등의 방향족 탄화수소기로부터 유도되는 2가 이상의 기를 나타낸다. 아릴렌기는, 치환기를 갖고 있어도 되고, 갖고 있지 않아도 된다. 바람직한 아릴렌기는, 2가 또는 3가의 아릴렌기이다. 아릴렌기로서는, 구체적으로는, 페닐렌기, 비페닐렌기, 나프틸렌기, 플루오레닐렌기 등을 들 수 있다. 보다 구체적으로는, 1,4-페닐렌기, 1,3-페닐렌기, 1,2-페닐렌기, 4,4'-비페닐렌기, 4,3'-비페닐렌기, 3,3'-비페닐렌기, 1,4-나프탈레닐렌기, 1,5-나프탈레닐렌기, 2,5-나프탈레닐렌기, 2,6-나프탈레닐렌기, 2,7-나프탈레닐렌기, 1,3,5-페닐렌기 등을 들 수 있다. 보다 바람직하게는, 1,4-페닐렌기, 1,3-페닐렌기, 4,4'-비페닐렌기, 4,3'-비페닐렌기이다.The arylene group represents a divalent or higher group derived from aromatic hydrocarbon groups such as benzene, naphthalene, biphenyl, fluorene and phenanthrene. The arylene group may or may not have a substituent. Preferred arylene groups are divalent or trivalent arylene groups. Specific examples of the arylene group include a phenylene group, a biphenylene group, a naphthylene group, and a fluorenylene group. More specifically, 1,4-phenylene group, 1,3-phenylene group, 1,2-phenylene group, 4,4'-biphenylene group, 4,3'-biphenylene group, 3,3'-bi Phenylene group, 1,4-naphthalenylene group, 1,5-naphthalenylene group, 2,5-naphthalenylene group, 2,6-naphthalenylene group, 2,7-naphthalenylene group, 1, And 3,5-phenylene groups. More preferably, it is a 1,4-phenylene group, 1,3-phenylene group, 4,4'-biphenylene group, and 4,3'-biphenylene group.
헤테로아릴렌기란, 피리딘, 퀴놀린, 피리미딘, 피라진, 트리아진, 퀴녹살린, 퀴나졸린, 디벤조푸란, 디벤조티오펜 등의, 탄소 이외의 원자를 1개 또는 복수개, 환 내에 갖는 방향족기로부터 유도되는 2가 이상의 기를 나타낸다. 헤테로아릴렌기는, 치환기를 갖고 있어도 되고, 갖고 있지 않아도 된다. 바람직한 헤테로아릴렌기는, 2가 또는 3가의 헤테로아릴렌기이다. 헤테로아릴렌기의 탄소수는, 특별히 한정되지 않지만, 바람직하게는 2 이상 30 이하의 범위이다. 헤테로아릴렌기로서는, 구체적으로는, 2,6-피리딜렌기, 2,5-피리딜렌기, 2,4-피리딜렌기, 3,5-피리딜렌기, 3,6-피리딜렌기, 2,4,6-피리딜렌기, 2,4-피리미디닐렌기, 2,5-피리미디닐렌기, 4,6-피리미디닐렌기, 2,4,6-피리미디닐렌기, 2,4,6-트리아디닐렌기, 4,6-디벤조푸라닐렌기, 2,6-디벤조푸라닐렌기, 2,8-디벤조푸라닐렌기, 3,7-디벤조푸라닐렌기 등을 들 수 있다.A heteroarylene group is an aromatic group having one or more atoms other than carbon, such as pyridine, quinoline, pyrimidine, pyrazine, triazine, quinoxaline, quinazoline, dibenzofuran, dibenzothiophene, in a ring. It represents a group of divalent or higher derivatives. The heteroarylene group may or may not have a substituent. Preferred heteroarylene groups are divalent or trivalent heteroarylene groups. The number of carbon atoms of the heteroarylene group is not particularly limited, but is preferably 2 or more and 30 or less. As a heteroarylene group, specifically, 2,6-pyridylene group, 2,5-pyridylene group, 2,4-pyridylene group, 3,5-pyridylene group, 3,6-pyridylene group, 2 ,4,6-pyridylene group, 2,4-pyrimidinylene group, 2,5-pyrimidinylene group, 4,6-pyrimidinylene group, 2,4,6-pyrimidinylene group, 2,4 ,6-triadinylene group, 4,6-dibenzofuranylene group, 2,6-dibenzofuranylene group, 2,8-dibenzofuranylene group, 3,7-dibenzofuranylene group, etc. Can be.
「치환 또는 비치환된」이라고 하는 경우에 있어서의 보다 바람직한 치환기로서는, 히드록시기, 싸이올기, 술폰기, 할로젠기, 나이트로기, 사이아노기, 카르복시기, 아민기, 알데히드기, 혹은 탄소수 1 내지 10의 알킬기나 알콕시기에 수소가 플루오르로 치환되거나 되지 않은 경우를 포함한다. As a more preferable substituent in the case of "substituted or unsubstituted", a hydroxy group, a thiol group, a sulfone group, a halogen group, a nitro group, a cyano group, a carboxy group, an amine group, an aldehyde group, or 1 to 10 carbon atoms. It includes the case where hydrogen is substituted or not substituted with fluorine in the alkyl group or the alkoxy group.
상기 화학식 1에서 질소나 인으로 반복적으로 연결되는 고리는 동일하거나 동일하지 않는 물질 모두 가능하다.Rings repeatedly connected to nitrogen or phosphorus in
상기 화학식 X에서 탄소, 질소, 산소 혹은 직접 반복적으로 연결되는 구조는 동일하거나 동일하지 않는 물질 모두를 포함한다.In the formula (X), carbon, nitrogen, oxygen or a structure that is directly and repeatedly connected includes all of the same or non-identical substances.
구체적으로 예를 들면, 상기 화학식 1의 양이온은 하기 화학식 4 내지 화학식 6로 이루어진 군에서 선택되는 하나일 수 있다.Specifically, for example, the cation of
[화학식 4][Formula 4]
[화학식 5][Formula 5]
[화학식 6][Formula 6]
상기 식에서 R1 내지 R4는 상기 화학식 1 내지 화학식 3 및 화학식 3-1에서 정의된 바와 같다.In the above formula, R 1 to R 4 are as defined in
일 구현예에 따르면, 상기 화학식 1의 X는 하기 화학식 7 내지 9 중에서 선택되는 어느 하나로 표시될 수 있다.According to one embodiment, X in
[화학식 7][Formula 7]
상기 화학식 7에서 R5 내지 R7는 서로 동일하거나 상이하고, 히드록시기, 싸이올기, 술폰기, 할로젠기, 나이트로기, 사이아노기, 카르복시기, 아민기, 알데하이드기, 탄소수 1 내지 10의 알킬기 또는 수소가 플루오르로 치환되거나 비치환된 알콕시기이다.In Formula 7, R 5 to R 7 are the same as or different from each other, and a hydroxy group, a thiol group, a sulfone group, a halogen group, a nitro group, a cyano group, a carboxy group, an amine group, an aldehyde group, or an alkyl group having 1 to 10 carbon atoms. Or an alkoxy group in which hydrogen is substituted or unsubstituted with fluorine.
[화학식 8][Formula 8]
상기 화학식 8에서 R8는 서로 동일하거나 상이하고, 히드록시기, 싸이올기, 술폰기, 할로젠기, 나이트로기, 사이아노기, 카르복시기, 아민기, 알데하이드기, 탄소수 1 내지 10의 알킬기 또는 수소가 플루오르로 치환되거나 비치환된 알콕시기이다.In Formula 8, R 8 is the same or different from each other, and a hydroxy group, a thiol group, a sulfone group, a halogen group, a nitro group, a cyano group, a carboxy group, an amine group, an aldehyde group, an alkyl group having 1 to 10 carbon atoms, or hydrogen It is an alkoxy group unsubstituted or substituted with fluorine.
[화학식 9][Formula 9]
상기 화학식 9에서 R9 내지 R12는 서로 동일하거나 상이하고, 히드록시기, 싸이올기, 술폰기, 할로젠기, 나이트로기, 사이아노기, 카르복시기, 아민기, 알데하이드기, 탄소수 1 내지 10의 알킬기 또는 수소가 플루오르로 치환되거나 비치환된 알콕시기이다.In Formula 9, R 9 to R 12 are the same as or different from each other, and a hydroxy group, a thiol group, a sulfone group, a halogen group, a nitro group, a cyano group, a carboxy group, an amine group, an aldehyde group, or an alkyl group having 1 to 10 carbon atoms. Or an alkoxy group in which hydrogen is substituted or unsubstituted with fluorine.
상기 화학식 7 내지 9는 이미다졸레이트 혹은 테트라졸레이트 구조를 갖는 화합물으로, 종래의 소재에서 중금속이 포함된 음이온을 사용함에 따른 독성으로 사용이 제한되는 문제를 해결할 수 있었다. 또한 상기 이미다졸레이트 혹은 테트라졸레이트 구조를 갖는 화합물을 음이온으로 포함하는 퀴노이드계 이온화합물은 상기 퀴노이드계 이온화합물을 도입한 근적외선 차단막의 제조에서 높은 유기용매 용해도를 바탕으로 용이한 제조가 가능하였다.The formulas 7 to 9 are compounds having an imidazolate or tetrazolate structure, and have been able to solve the problem of limited use due to toxicity by using anions containing heavy metals in conventional materials. In addition, the quinoid-based ionic compound containing the compound having an imidazolate or tetrazolate structure as an anion can be easily manufactured based on high solubility of an organic solvent in the production of a near-infrared barrier film incorporating the quinoid-based ionic compound. Did.
바람직한 구현예에 따르면, 상기 화학식 1에서 X는 상기 화학식 7로 표시되는 화합물이고, 상기 화학식 7에서 R5는 CF3이고, R6 및 R7은 서로 동일하고, 나이트로기 또는 사이아노기이다. 상기한 조건을 만족하는 화학식 7로 표시되는 화합물을 포함하는 퀴노이드계 이온 화합물은 유기용매 용해도가 우수함과 동시에 바인더 고분자와의 친화성이 우수하여 근적외선 차단막 형성 이후 열에 의한 음이온의 용출이 관찰되지 않았다.According to a preferred embodiment, X in
다른 구현예에 따르면, 상기 퀴노이드계 이온화합물은 하기 화학식 10 또는 11로 표시되는 화합물일 수 있다.According to another embodiment, the quinoid-based ionic compound may be a compound represented by
[화학식 10][Formula 10]
상기 화학식 10에서 R13 내지 R20는 서로 동일하거나 상이하고, 탄소수 1 내지 6의 알킬기이다.In
[화학식 11][Formula 11]
상기 화학식 11에서 R21 내지 R28는 서로 동일하거나 상이하고, 탄소수 1 내지 6의 알킬기이다. 상기 화학식 10 또는 11로 표시되는 퀴노이드계 이온화합물은 가시광 영역에서 우수한 투과 특성을 가졌으며 근적외선 전 영역(750 내지 1300 nm의 파장)에서 넓고 고른 흡광 효율을 가지는 것을 확인하였다.In Formula 11, R 21 to R 28 are the same as or different from each other, and are alkyl groups having 1 to 6 carbon atoms. It was confirmed that the quinoid-based ionic compound represented by
바람직한 구현예에 따르면, 상기 화학식 1에서 A 및 B는 인이고, n은 1일 수 있다. 상기 화학식 1의 이온화합물에서 퀴노이드계 양이온에 인이 포함될 경우, 근적외선 영역에서의 선택적인 높은 몰 흡광 계수를 가질 뿐만 아니라, 우수한 내열, 내습성이 확보되어 상기 퀴노이드계 이온화합물을 포함하여 제조된 근적외선 차단막은 박막 상태에서도 장시간 고내열, 고내습 특성을 유지할 수 있음을 확인하였다. According to a preferred embodiment, in
또 다른 구현예에 따르면, 상기 퀴노이드계 이온화합물은 하기 화학식 12 또는 13으로 표시되는 화합물일 수 있다.According to another embodiment, the quinoid-based ionic compound may be a compound represented by the following Chemical Formula 12 or 13.
[화학식 12][Formula 12]
[화학식 13][Formula 13]
상기 화학식 12 또는 13으로 표시되는 퀴노이드계 이온화합물은 유기계 음이온을 포함하여 인체에 무해하며, 유기용매에 높은 용해도를 가졌고, 가시광선 영역에서 높은 투과도 및 적외선 영역에서 높은 흡광도를 갖는 등 근적외선 차단막 제조에 도입되기에 매우 적합함을 확인하였다.The quinoid-based ionic compound represented by Chemical Formulas 12 or 13, including organic anions, is harmless to the human body, has high solubility in organic solvents, has high transmittance in the visible light region and high absorbance in the infrared region, etc. It was confirmed that it is very suitable to be introduced into.
가장 바람직한 구현예에 따르면, 상기 퀴노이드계 이온화합물은 하기 화학식 14 또는 15로 표시되는 화합물일 수 있다.According to the most preferred embodiment, the quinoid-based ionic compound may be a compound represented by Formula 14 or 15 below.
[화학식 14][Formula 14]
[화학식 15][Formula 15]
상기 화학식 14 또는 15으로 표시되는 퀴노이드계 이온화합물은 근적외선 영역의 몰 흡광 계수는 150,000 cm-1M-1 이상이고, 250 ℃ 이상의 온도에서 열분해되어 가장 우수한 근적외선 차단 성능 및 내열성을 가졌다. 게다가 다른 조건의 퀴노이드계 이온화합물에 비하여 적은 양을 포함하더라도 동등한 근적외선 차단 성능을 가지며 가시광선 투과도는 높았고, 유기용매에 비교적 적은 양이 포함됨을 바탕으로 가공성이 향상되어 두께 1 μm 이하 박막의 제조가 가능함을 확인하였다.The quinoid-based ionic compound represented by Chemical Formulas 14 or 15 has a molar extinction coefficient in the near-infrared region of 150,000 cm -1 M -1 or higher, and has the best near-infrared blocking performance and heat resistance by thermal decomposition at a temperature of 250°C or higher. In addition, even if it contains a small amount compared to other conditions of the quinoid-based ionic compound, it has an equivalent near-infrared ray blocking performance, has high visible light transmittance, and improves processability based on a relatively small amount contained in an organic solvent, thereby producing a thin film having a thickness of 1 μm or less It was confirmed that it is possible.
본 발명의 또 다른 측면은 상기 퀴노이드계 이온화합물을 포함하는 근적외선 차단막을 제공한다.Another aspect of the present invention provides a near-infrared blocking film comprising the quinoid-based ionic compound.
본 발명의 또 다른 측면은 상기 퀴노이드계 이온화합물 및 바인더를 포함하는 혼합용액을 제조하는 단계; 및 상기 혼합용액을 이용하여 근적외선 차단막을 제조하는 단계;를 포함하는 근적외선 차단막의 제조방법을 제공한다.Another aspect of the present invention comprises the steps of preparing a mixed solution containing the quinoid-based ionic compound and a binder; And manufacturing a near-infrared blocking film using the mixed solution.
상기 바인더는 폴리에틸렌, 폴리스타이렌, 폴리메틸메타아크릴레이트, 폴리에테르술폰, 폴리이미드, 폴리아크릴레이트, 폴리아미드, 폴리우레탄, 폴리펩타이드, 폴리에스테르, 폴리카보네이트 및 폴리락틱그라이콜릭산로 이루어진 군에서 선택되는 1종 이상인 고분자일 수 있다.The binder is selected from the group consisting of polyethylene, polystyrene, polymethyl methacrylate, polyethersulfone, polyimide, polyacrylate, polyamide, polyurethane, polypeptide, polyester, polycarbonate and polylactic glycolic acid It may be one or more polymers.
상기 고분자의 분자량은 4,000 내지 400,000일 수 있으며, 바람직하게는 10,000 내지 100,000, 보다 바람직하게는 10,000 내지 50,000일 수 있다.The molecular weight of the polymer may be 4,000 to 400,000, preferably 10,000 to 100,000, and more preferably 10,000 to 50,000.
또한 상기 바인더는 실리카, 타이타니아 및 보론옥시드로 이루어진 군에서 선택되는 1종 이상인 무기물일 수 있다.In addition, the binder may be at least one inorganic material selected from the group consisting of silica, titania and boron oxide.
상기 혼합용액의 용매는 아세톤, 디클로로메탄, 클로로포름, 톨루엔, 디에틸에테르, 페트롤리움에테르, 1,1,2,2-테트라클로로에탄, 아세토나이트릴, 1,4-디옥산, 테트라하이드로퓨란, 에틸아세테이트, 메탄올, 에탄올, 헥산, 디메틸포름아미드, 디메틸아세트아미드 및 디메톡시설폭사이드로 이루어진 군에서 선택되는 1종 이상일 수 있다.The solvent of the mixed solution is acetone, dichloromethane, chloroform, toluene, diethyl ether, petroleum ether, 1,1,2,2-tetrachloroethane, acetonitrile, 1,4-dioxane, tetrahydrofuran, It may be one or more selected from the group consisting of ethyl acetate, methanol, ethanol, hexane, dimethylformamide, dimethylacetamide and dimethoxysulfoxide.
상기 혼합용액에서 상기 퀴노이드계 이온화합물의 농도는 0.001 mg/ml 내지 100 mg/ml일 수 있으며, The concentration of the quinoid-based ionic compound in the mixed solution may be 0.001 mg/ml to 100 mg/ml,
상기 퀴노이드계 이온화합물은 상기 혼합용액 중량 대비 0.1 내지 20 중량%로 포함될 수 있으며, 바람직하게는 0.5 내지 10 중량%, 보다 바람직하게는 1.0 내지 5.0 중량% 포함될 수 있다.The quinoid-based ionic compound may be included in an amount of 0.1 to 20% by weight based on the weight of the mixed solution, preferably 0.5 to 10% by weight, and more preferably 1.0 to 5.0% by weight.
상기 바인더는 상기 혼합용액 중량 대비 3 내지 97 중량%로 포함될 수 있다.The binder may be included in 3 to 97% by weight based on the weight of the mixed solution.
상기 혼합용액을 이용하여 근적외선 차단막을 제조하는 단계는 딥 코팅법, 회전 도포법, 닥터 블레이드법 또는 스프레이 분사법에 의해 수행될 수 있다.The step of preparing the near-infrared barrier film using the mixed solution may be performed by a dip coating method, a rotation coating method, a doctor blade method, or a spray spraying method.
이하, 본 발명의 이해를 돕기 위하여 바람직한 실시예를 제시한다. 그러나, 이들 실시예는 본 발명을 보다 구체적으로 설명하기 위한 것으로, 본 발명의 범위가 이에 의하여 제한되지 않고, 본 발명의 범주 및 기술사상 범위 내에서 다양한 변경 및 수정이 가능함은 당업계의 통상의 지식을 가진 자에게 자명할 것이다.Hereinafter, preferred embodiments are provided to help understanding of the present invention. However, these examples are intended to illustrate the present invention in more detail, and the scope of the present invention is not limited thereto, and various changes and modifications can be made within the scope and technical scope of the present invention. It will be obvious to those who have knowledge.
하기 실시예에서 사용되는 시약 및 용매는 특별히 언급하지 않는 한 시그마 알드리치사(미국)와 TCI(일본)에서 구매하여 사용하였다.Reagents and solvents used in the following examples were purchased from Sigma Aldrich (USA) and TCI (Japan) unless otherwise specified.
실시예 1-1. 퀴노이드계 이온화합물 N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디이모늄 비스4,5-디사이아노-2-트리플루오로메틸 이미다졸레이트의제조Example 1-1. Quinoid-based ionic compounds N,N,N,N-tetrakis(4-diisobutylaminophenyl)-1,4-phenylenedimonium bis4,5-dicyano-2-trifluoromethyl imidazole Production of Late
유기계음이온 소듐 디사이아노 트리플루오로메틸 이미다졸레이트의 제조Preparation of organoanionic sodium dicyano trifluoromethyl imidazolate
환류기가 설치된 3구 플라스크에 디아미노말레오나이트릴 5.0 g을 1,4-디옥산 50 ml에 녹인 후, 트리플루오로아세트산 무수물 7.84 g을 가했다. 아르곤 환경 하에서 60℃에서 12시간 교반하였다. 반응 종결 여부를 얇은막 크로마토그래피로 확인한 후, 혼합물을 진공 증류기로 증류하였다. 점성이 있는 액체를 디에틸에테르 60 ml에 녹이고, 15% 탄산 나트륨 수용액 60 ml 로 추출했다. 추출해 낸 물층을 디에틸에테르로 두 번 추출해준 뒤, 활성 탄소를 넣고 50℃ 에서 5시간 교반하였다. 혼합액을 필터로 걸러준 뒤, 증류기로 용매를 완전히 제거했다. 용매를 제거하고 난 혼합물을 아세토나이트릴 50 ml에 녹인 뒤, 필터로 걸러 고체 석출물을 제거했다. 걸러진 용액을 중성 산화 알루미늄에 통과시킨 뒤, 용매를 제거해주면 소듐 4,5-디사이아노-2-트리플루오로메틸 이미다졸레이트 7.6 g을 수득하였다.After dissolving 5.0 g of diaminomaleonitrile in 50 ml of 1,4-dioxane in a three-necked flask equipped with a reflux, 7.84 g of trifluoroacetic anhydride was added. The mixture was stirred at 60°C for 12 hours under an argon environment. After confirming whether the reaction was completed by thin film chromatography, the mixture was distilled with a vacuum distiller. The viscous liquid was dissolved in 60 ml of diethyl ether, and extracted with 60 ml of a 15% aqueous sodium carbonate solution. After extracting the extracted water layer twice with diethyl ether, activated carbon was added and stirred at 50°C for 5 hours. After filtering the mixture with a filter, the solvent was completely removed with a distiller. After removing the solvent, the mixture was dissolved in 50 ml of acetonitrile, and then filtered through a filter to remove solid precipitate. After passing the filtered solution through neutral aluminum oxide, the solvent was removed to obtain 7.6 g of sodium 4,5-dicyano-2-trifluoromethyl imidazolate.
13C NMR (300 MHz; DMSO-d6)/ppm:114.4, 117.2, 118.8, 120.9, 147.4. 13 C NMR (300 MHz; DMSO-d 6 )/ppm: 114.4, 117.2, 118.8, 120.9, 147.4.
N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디이모늄 비스4,5-디사이아노-2-트리플루오로메틸 이미다졸레이트의제조Preparation of N,N,N,N-tetrakis(4-diisobutylaminophenyl)-1,4-phenylenedimonium bis4,5-dicyano-2-trifluoromethyl imidazolate
아르곤 상태 하에서, 상기 소듐 4,5-디사이아노-2-트리플루오로메틸이미다졸레이트 3.0 g와 N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디아민 5.0 g을 디클로로메탄 100 ml에 녹인 뒤, 이소부탄올 50 ml을 가하고 2시간 동안 환류시켰다. 그 후, 과황산나트륨 1.8 g, 물 100 ml을 가하고 2시간 동안 환류시켰다. 환류 종료 후, 디클로로메탄 100 ml와 물 100 ml를 추가한 뒤 유기용매 층을 분리하고 진공 증류시켜 N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디이모늄 비스4,5-디사이아노-2-트리플루오로메틸 이미다졸레이트 5.0 g을 수득하였다. 아래에 생성물의 화학식을 기재하였다.Under argon, 3.0 g of sodium 4,5-dicyano-2-trifluoromethylimidazolate and N,N,N,N-tetrakis(4-diisobutylaminophenyl)-1,4 -After dissolving 5.0 g of phenylenediamine in 100 ml of dichloromethane, 50 ml of isobutanol was added and refluxed for 2 hours. Then, 1.8 g of sodium persulfate and 100 ml of water were added and refluxed for 2 hours. After completion of reflux, 100 ml of dichloromethane and 100 ml of water were added, and the organic solvent layer was separated and vacuum distilled to make N,N,N,N-tetrakis(4-diisobutylaminophenyl)-1,4-phenyl. 5.0 g of rendimonium bis4,5-dicyano-2-trifluoromethyl imidazolate was obtained. The chemical formula of the product is described below.
실시예 1-2. 퀴노이드계 이온화합물 N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디이모늄 비스4,5-디니트로-2-트리플루오로메틸 이미다졸레이트의제조.Example 1-2. Quinoid-based ionic compounds N,N,N,N-tetrakis(4-diisobutylaminophenyl)-1,4-phenylenedimonium bis4,5-dinitro-2-trifluoromethyl imidazolate Agenda production.
소듐 4,5-디니트로-2-트리플루오로메틸 이미다졸레이트의 제조Preparation of sodium 4,5-dinitro-2-trifluoromethyl imidazolate
2-(트리플루오로메틸) 이미다졸 5.4 g을 발연 질산 20 g와 진한 황산 20 g을 혼합한 용액에 녹인 후 10 분간 환류 하에 가열하였다. 이 용액을 냉각시킨 후, 차가운 물에 붓고, 20 % 수산화나트륨으로 pH가 5 내지 6이 될 때까지 중화시키고 에틸 아세테이트로 추출하였다. 추출한 물질들은 모아서 황산나트륨을 이용하여 수분을 제거하고, 용매를 증류시켰다. 남은 물질을 에테르를 용리액으로 실리카 겔 1000ml 를 통과시고 분리하여, 소듐 4,5-디니트로-2-트리플루오로메틸 이미다졸레이트 4.5 g을 수득하였다. 5.4 g of 2-(trifluoromethyl) imidazole was dissolved in a solution of 20 g of fuming nitric acid and 20 g of concentrated sulfuric acid, and then heated under reflux for 10 minutes. After cooling, the solution was poured into cold water, neutralized with 20% sodium hydroxide until the pH was 5-6, and extracted with ethyl acetate. The extracted substances were collected and the moisture was removed using sodium sulfate, and the solvent was distilled off. The remaining material was separated by passing ether through 1000 ml of silica gel as an eluent, and 4.5 g of sodium 4,5-dinitro-2-trifluoromethyl imidazolate was obtained.
13C NMR (300 MHz; Acetone-d6)/ppm:121.0(q),138.2(q),140.5(s); 13 C NMR (300 MHz; Acetone-d 6 )/ppm: 121.0(q),138.2(q),140.5(s);
N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디이모늄 비스4,5-디니트로-2-트리플루오로메틸 이미다졸레이트의 제조Preparation of N,N,N,N-tetrakis(4-diisobutylaminophenyl)-1,4-phenylenedimonium bis4,5-dinitro-2-trifluoromethyl imidazolate
아르곤 상태 하에서, 상기 제조한 소듐 4,5-디니트로-2-트리플루오로메틸 이미다졸레이트 3.1 g와 N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디아민 5.0 g을 디클로로메탄 100 ml에 녹인 뒤, 이소부탄올 50 ml을 가하고 2시간 동안 환류시켰다. 그 후, 과황산나트륨 1.8 g, 물 100 ml을 가하고 2시간 동안 환류시켰다. 환류 종료 후, 디클로로메탄 100 ml와 물 100 ml를 추가한 뒤 유기용매 층을 분리하고 진공 증류시켜 N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디이모늄 비스4,5-디니트로-2-트리플루오로메틸 이미다졸레이트 5.4 g을 수득하였다. 아래에 생성물의 화학식을 기재하였다.Under argon, 3.1 g of sodium 4,5-dinitro-2-trifluoromethyl imidazolate prepared above and N,N,N,N-tetrakis(4-diisobutylaminophenyl)-1,4 -After dissolving 5.0 g of phenylenediamine in 100 ml of dichloromethane, 50 ml of isobutanol was added and refluxed for 2 hours. Then, 1.8 g of sodium persulfate and 100 ml of water were added and refluxed for 2 hours. After completion of reflux, 100 ml of dichloromethane and 100 ml of water were added, and the organic solvent layer was separated and vacuum distilled to make N,N,N,N-tetrakis(4-diisobutylaminophenyl)-1,4-phenyl. 5.4 g of rendimonium bis4,5-dinitro-2-trifluoromethyl imidazolate was obtained. The chemical formula of the product is described below.
실시예 1-3. 퀴노이드계 이온화합물 4-((4-(비스(4-(디에틸아미노)페닐)포스피노)페닐)(4-(디에틸아미노)페닐)포스피노)-N,N-디에틸벤젠아민 비스4,5-디니트로-2-트리플루오로메틸 이미다졸레이트의 제조Example 1-3. Quinoid-based ionic compound 4-((4-(bis(4-(diethylamino)phenyl)phosphino)phenyl)(4-(diethylamino)phenyl)phosphino)-N,N-diethylbenzeneamine Preparation of bis4,5-dinitro-2-trifluoromethyl imidazolate
4-브로모-N,N-디에틸벤젠아민의 제조Preparation of 4-bromo-N,N-diethylbenzeneamine
N,N-디에틸아닐린 15 g과 테트라부틸암모늄 브로마이드 65 g을 아세토나이트릴 500 ml에 녹였다. 과염소산구리 육수화물 75 g을 아세토나이트릴 300 ml에 녹인 뒤 위 혼합물에 넣고, 상온에서 1시간 교반하고, 탄산칼륨 100 g을 넣고 10분 더 교반하였다. 교반이 끝난 혼합물을 필터해준 후, 황산나트륨으로 물을 제거하고, 용매를 증류시켰다. 증류가 끝난 물질을 디에틸에테르에 녹여 중성 산화 알루미늄에 통과시킨 뒤 용매를 제거하여 4-브로모-N,N-디에틸벤젠아민 18 g을 수득하였다.15 g of N,N-diethylaniline and 65 g of tetrabutylammonium bromide were dissolved in 500 ml of acetonitrile. 75 g of copper perchlorate hexahydrate was dissolved in 300 ml of acetonitrile, put into the above mixture, stirred at room temperature for 1 hour, 100 g of potassium carbonate was added and stirred for another 10 minutes. After the stirred mixture was filtered, water was removed with sodium sulfate, and the solvent was distilled off. The distilled material was dissolved in diethyl ether, passed through neutral aluminum oxide, and the solvent was removed to obtain 18 g of 4-bromo-N,N-diethylbenzeneamine.
1H NMR (300 MHz; CDCl3):δ7.1(d),6.5(d),3.4(q),1.2(t). 1 H NMR (300 MHz; CDCl 3 ):δ7.1(d),6.5(d),3.4(q),1.2(t).
4,4-(비스(N,N-디에틸벤젠아민)포스핀 옥사이드의 제조Preparation of 4,4-(bis(N,N-diethylbenzeneamine)phosphine oxide
상기 4-브로모-N,N-디에틸벤젠아민 10 g (43.8 mmol, 3.3 eq) 을 THF 200 ml에 녹인 후, 마그네슘 1.1 g이 함유된 현탁액과 천천히 섞는다. 상온에서 4시간 섞어준 뒤, 온도를 0 ℃로 내리고, 디에틸포스파이트 1.83 g을 THF 10 ml에 녹여 넣었다. 혼합물을 0 ℃에서 20분간 교반하고, 상온에서 2시간 교반하였다. 온도를 0 ℃로 내리고, 0.1 M 염화수소 40 ml 를 5분에 걸쳐 천천히 가해준 뒤, 메틸 t-부틸에테르 40 ml를 넣고 10 분간 교반했다. 위에 뜬 유기 부유층을 따라내고, 디클로로메탄 50 ml를 가하고 흔들어 주었다. 혼합물을 필터해준 후, 디클로로메탄 50 ml에 녹여 젤라이트를 통과시켰다. 용매를 제거한 후에 에틸아세테이트와 헵탄 혼합용매로 재결정을 해주어 무색의 고체 4,4-비스(N,N-디에틸벤젠아민)포스핀 옥사이드 9.0 g을 수득하였다. 10 g (43.8 mmol, 3.3 eq) of 4-bromo-N,N-diethylbenzeneamine was dissolved in 200 ml of THF, and then slowly mixed with a suspension containing 1.1 g of magnesium. After mixing at room temperature for 4 hours, the temperature was lowered to 0° C., and 1.83 g of diethylphosphite was dissolved in 10 ml of THF. The mixture was stirred at 0°C for 20 minutes, and stirred at room temperature for 2 hours. The temperature was lowered to 0° C., and 40 ml of 0.1 M hydrogen chloride was slowly added over 5 minutes, and then 40 ml of methyl t-butyl ether was added and stirred for 10 minutes. The floating organic floating layer was decanted, 50 ml of dichloromethane was added and shaken. After filtering the mixture, it was dissolved in 50 ml of dichloromethane and passed through a gelite. After removing the solvent, recrystallization was performed with a mixed solvent of ethyl acetate and heptane to obtain 9.0 g of a colorless solid 4,4-bis(N,N-diethylbenzeneamine)phosphine oxide.
4,4-비스(N,N-디에틸벤젠아민) 포스핀의 제조Preparation of 4,4-bis(N,N-diethylbenzeneamine) phosphine
상기 4,4-비스(N,N-디에틸벤젠아민)포스핀 옥사이드 9.0 g을 THF 200 ml에 녹인 뒤, 그 용액을 1.0 M DIBAL-H 헥산 용액 80 ml에 천천히 섞어주고 30분간 상온에서 저어주었다. 그 후, 메틸 t-부틸에테르 100 ml를 10분에 걸쳐 천천히 넣어주었다. 그 혼합액을 0℃로 내린 후, 2.0 M 수산화 나트륨 용액을 30 mL를 15분에 걸쳐 천천히 넣어주고, 10 ml의 포화 염화나트륨 용액을 넣어주었다. 그 혼합액을 10분간 0℃에서 교반한 뒤 상온에서 층이 분리될 때까지 교반을 지속하였다. 유기층을 추출하여 용매를 제거하면 무색의 오일 4,4-(비스N,N-디에틸벤젠아민) 포스핀 6.5 g을 얻을 수 있었다.After dissolving 9.0 g of the 4,4-bis(N,N-diethylbenzeneamine)phosphine oxide in 200 ml of THF, slowly mix the solution in 80 ml of 1.0 M DIBAL-H hexane solution and stir at room temperature for 30 minutes. gave. Then, 100 ml of methyl t-butyl ether was slowly added over 10 minutes. After lowering the mixture to 0° C., 30 mL of a 2.0 M sodium hydroxide solution was slowly added over 15 minutes, and 10 ml of saturated sodium chloride solution was added. The mixture was stirred at 0° C. for 10 minutes, and stirring was continued until the layers separated at room temperature. When the organic layer was extracted and the solvent was removed, 6.5 g of a colorless oil 4,4-(bisN,N-diethylbenzeneamine) phosphine was obtained.
4-((4-(비스(4-(디에틸아미노)페닐)포스피노)페닐)(4-(디에틸아미노)페닐)포스피노)-N,N-디에틸벤젠아민의 제조Preparation of 4-((4-(bis(4-(diethylamino)phenyl)phosphino)phenyl)(4-(diethylamino)phenyl)phosphino)-N,N-diethylbenzeneamine
플라스크에 탄산 세슘 7.5 g 과 요오드화 구리 0.37 g 를 혼합하였다. 그 후, 톨루엔 50 mL에 1,4-디요오드 벤젠 6 g 과 4,4-(비스N,N-디에틸벤젠아민) 5 g 을 녹인 용액을 첨가했다. 110 ℃에서 24 시간 동안 가열한 후, 혼합물을 젤라이트를 통해 여과하고 디클로로메탄 (3 × 150 mL)으로 헹궈주었다. 그 후 용액을 물 (3 x 500 mL)로 세척하고 황산나트륨으로 건조했다. 용매를 제거한 후, 용리제로서 헥산 : 디클로로메탄 (2 : 1, v : v)을 사용하는 크로마토그래피로 정제하여 백색 분말의 물질 4-((4-(비스(4-(디에틸아미노)페닐)포스피노)페닐)(4-(디에틸아미노)페닐)포스피노)-N,N-디에틸벤젠아민 4.8 g을 얻을 수 있었다.The flask was mixed with 7.5 g of cesium carbonate and 0.37 g of copper iodide. Then, a solution of 6 g of 1,4-diiodine benzene and 5 g of 4,4-(bisN,N-diethylbenzeneamine) dissolved in 50 mL of toluene was added. After heating at 110° C. for 24 hours, the mixture was filtered through gelite and rinsed with dichloromethane (3×150 mL). The solution was then washed with water (3 x 500 mL) and dried over sodium sulfate. After removing the solvent, it was purified by chromatography using hexane:dichloromethane (2:1, v:v) as eluent to obtain a white powdery substance 4-((4-(bis(4-(diethylamino)phenyl) )Phosphino)phenyl)(4-(diethylamino)phenyl)phosphino)-N,N-diethylbenzeneamine 4.8 g was obtained.
아르곤 상태 하에서, 소듐 4,5-디니트로-2-트리플루오로메틸 이미다졸레이트 3.1 g와 상기 제조한 4-((4-(비스(4-(디에틸아미노)페닐)포스피노)페닐)(4-(디에틸아미노)페닐)포스피노)-N,N-디에틸벤젠아민 4.0 g을 디클로로메탄 100 ml에 녹인 뒤, 에탄올 50 ml을 가하고 2시간 동안 환류시켰다. 그 후, 과황산나트륨 1.8 g, 물 100 ml을 가하고 2시간 동안 환류시켰다. 환류 종료 후, 디클로로메탄 100 ml와 물 100 ml를 추가한 뒤 유기용매 층을 분리하고 진공 증류시켜 4-((4-(비스(4-(디에틸아미노)페닐)포스피노)페닐) (4-(디에틸아미노)페닐)포스피노)-N,N-디에틸벤젠아민 비스4,5-디니트로-2-트리플루오로메틸 이미다졸레이트 3.2 g을 수득하였다. 아래에 생성물의 화학식을 기재하였다.Under argon, 3.1 g of sodium 4,5-dinitro-2-trifluoromethyl imidazolate and 4-((4-(bis(4-(diethylamino)phenyl)phosphino)phenyl) prepared above 4.0 g of (4-(diethylamino)phenyl)phosphino)-N,N-diethylbenzeneamine was dissolved in 100 ml of dichloromethane, 50 ml of ethanol was added and refluxed for 2 hours. Then, 1.8 g of sodium persulfate and 100 ml of water were added and refluxed for 2 hours. After completion of reflux, 100 ml of dichloromethane and 100 ml of water were added, and the organic solvent layer was separated and vacuum distilled to give 4-((4-(bis(4-(diethylamino)phenyl)phosphino)phenyl) (4 -(Diethylamino)phenyl)phosphino)-N,N-diethylbenzeneamine bis4,5-dinitro-2-trifluoromethyl imidazolate 3.2 g was obtained. The chemical formula of the product is described below.
실시예 1-4. 퀴노이드계 이온화합물 4-((4-(비스(4-(디에틸아미노)페닐)포스피노)페닐) (4-(디에틸아미노)페닐)포스피노)-N,N-디에틸벤젠아민 비스(비스옥살라토보레이트)의 제조Example 1-4. Quinoid-based ionic compound 4-((4-(bis(4-(diethylamino)phenyl)phosphino)phenyl) (4-(diethylamino)phenyl)phosphino)-N,N-diethylbenzeneamine Preparation of bis(bisoxalatoborate)
아르곤 상태 하에서, 리튬 비스옥살라토보레이트 2.52 g와 상기 제조한 4-((4-(비스(4-(디에틸아미노)페닐)포스피노)페닐)(4-(디에틸아미노)페닐)포스피노)-N,N-디에틸벤젠아민 4.0 g을 디클로로메탄 100 ml에 녹인 뒤, 에탄올 50 ml을 가하고 2시간 동안 환류시켰다. 그 후, 과황산나트륨 1.8 g, 물 100 ml을 가하고 2시간 동안 환류시켰다. 환류 종료 후, 디클로로메탄 100 ml와 물 100 ml를 추가한 뒤 유기용매 층을 분리하고 진공 증류시켜 (4-((4-(비스(4-(디에틸아미노)페닐)포스피노)페닐)(4-(디에틸아미노)페닐)포스피노)-N,N-디에틸벤젠아민 비스(비스옥살라토보레이트) 4.8 g을 수득하였다. 아래에 생성물의 화학식을 기재하였다.Under argon state, 2.52 g of lithium bisoxalatovorate and 4-((4-(bis(4-(diethylamino)phenyl)phosphino)phenyl)(4-(diethylamino)phenyl)phosph prepared above Fino)-N,N-diethylbenzeneamine 4.0 g was dissolved in 100 ml of dichloromethane, 50 ml of ethanol was added and refluxed for 2 hours. Then, 1.8 g of sodium persulfate and 100 ml of water were added and refluxed for 2 hours. After completion of reflux, 100 ml of dichloromethane and 100 ml of water were added, and the organic solvent layer was separated and vacuum distilled to give (4-((4-(bis(4-(diethylamino)phenyl)phosphino)phenyl)( 4.8 g of 4-(diethylamino)phenyl)phosphino)-N,N-diethylbenzeneamine bis(bisoxalatoborate) was obtained The chemical formula of the product is described below.
실시예 1-5. 퀴노이드계 이온화합물 4-((4-(비스(4-(디에틸아미노)페닐)포스피노)페닐) (4-(디에틸아미노)페닐)포스피노)-N,N-디에틸벤젠아민) 비스트리풀로로메탄술폰이미드의 제조Example 1-5. Quinoid-based ionic compound 4-((4-(bis(4-(diethylamino)phenyl)phosphino)phenyl) (4-(diethylamino)phenyl)phosphino)-N,N-diethylbenzeneamine ) Preparation of bistrifuromethanesulfonimide
아르곤 상태 하에서, 리튬 트리풀로로메탄술폰이미드4.0 g와 상기 제조한 4-((4-(비스(4-(디에틸아미노)페닐)포스피노)페닐)(4-(디에틸아미노)페닐)포스피노)-N,N-디에틸벤젠아민 4.0 g을 디클로로메탄 100 ml에 녹인 뒤, 에탄올 50 ml을 가하고 2시간 동안 환류시켰다. 그 후, 과황산나트륨 1.8 g, 물 100 ml을 가하고 2시간 동안 환류시켰다. 환류 종료 후, 디클로로메탄 100 ml와 물 100 ml를 추가한 뒤 유기용매 층을 분리하고 진공 증류시켜 (4-((4-(비스(4-(디에틸아미노)페닐)포스피노)페닐)(4-(디에틸아미노)페닐)포스피노)-N,N-디에틸벤젠아민 비스트리풀로로메탄술폰이미드 6.3 g을 수득하였다. 아래에 생성물의 화학식을 기재하였다.Under argon, 4.0 g of lithium trifluoromethanesulfonimide and 4-((4-(bis(4-(diethylamino)phenyl)phosphino)phenyl) prepared above (4-(diethylamino) After dissolving 4.0 g of phenyl)phosphino)-N,N-diethylbenzeneamine in 100 ml of dichloromethane, 50 ml of ethanol was added and refluxed for 2 hours. Then, 1.8 g of sodium persulfate and 100 ml of water were added and refluxed for 2 hours. After completion of reflux, 100 ml of dichloromethane and 100 ml of water were added, and the organic solvent layer was separated and vacuum distilled to give (4-((4-(bis(4-(diethylamino)phenyl)phosphino)phenyl)( 6.3 g of 4-(diethylamino)phenyl)phosphino)-N,N-diethylbenzeneamine bistrifuromethanesulfonimide was obtained The chemical formula of the product is described below.
실시예 1-6. 퀴노이드계 이온화합물 N,N,N,N-테트라키스(5-디부틸아미노싸이오페닐)-1,4-페닐렌디이모늄 비스4,5-디사이아노-2-트리플루오로메틸 이미다졸레이트의 제조Example 1-6. Quinoid-based ionic compounds N,N,N,N-tetrakis(5-dibutylaminothiophenyl)-1,4-phenylenedimonium bis4,5-dicyano-2-trifluoromethyl imide Preparation of dazolate
N,N-디부틸싸이오펜-2-아민의 제조Preparation of N,N-dibutylthiophen-2-amine
마그네슘 0.3 g을 테트라하이드로퓨란 25 ml에 넣은 후 무수 염화리튬 0.43 g을 첨가하였다. 2-클로로프로판 0.8 g을 THF 25 ml에 넣은 용액을 상온에서 천천히 앞의 용액에 넣고 12 시간 동안 반응시켰다. 반응이 끝난 용액을 잔여 마그네슘과 분리하기 위해서 주사기로 뽑아 아르곤으로 채워진 새로운 플라스크에 옮겼다. 플라스크의 온도를 -15 ℃로 낮춘 후, 2-브로모사이오펜 1.6 g을 천천히 섞었다. 용액을 3 시간 동안 섞어주었다. 상기 용액에 티타늄 이소프로폭사이드 3 g을 넣고 온도를 -40 ℃로 낮췄다. 새로운 플라스크를 준비하고 디부틸아민 0.4 g과 N-클로로숙신이미드 0.52 g을 테트라하이드로퓨란 10 ml에서 1 시간 섞고, 천천히 상기 용액에 넣었다. 천천히 온도를 상온으로 올린 후 3 시간 동안 반응시켰다. 탄산 칼륨 포화용액으로 반응을 종결시킨 후, 에틸아세테이트를 부으면서 필터했다. 증류수로 여러 번 씻어주고, 용매를 제거하여 N.N-디부틸싸이오펜-2-아민 1.2g을 얻었다.After adding 0.3 g of magnesium to 25 ml of tetrahydrofuran, 0.43 g of anhydrous lithium chloride was added. The solution in which 0.8 g of 2-chloropropane was placed in 25 ml of THF was slowly added to the previous solution at room temperature and reacted for 12 hours. In order to separate the remaining solution from the remaining magnesium, it was pulled with a syringe and transferred to a new flask filled with argon. After the temperature of the flask was lowered to -15°C, 1.6 g of 2-bromothiophene was slowly mixed. The solution was mixed for 3 hours. 3 g of titanium isopropoxide was added to the solution and the temperature was lowered to -40 °C. A new flask was prepared, 0.4 g of dibutylamine and 0.52 g of N-chlorosuccinimide were mixed for 1 hour in 10 ml of tetrahydrofuran, and slowly added to the solution. After slowly raising the temperature to room temperature, the reaction was carried out for 3 hours. After the reaction was terminated with a saturated potassium carbonate solution, it was filtered while pouring ethyl acetate. Washed several times with distilled water and the solvent was removed to obtain 1.2 g of N.N-dibutylthiophen-2-amine.
1H NMR (300 MHz; CDCl3):δ6.75(t), 6.41(d), 5.84(d), 3.19(t), 1.63-1.55(m), 1.40-1.31(m), 0.95(t). 1 H NMR (300 MHz; CDCl 3 ):δ6.75(t), 6.41(d), 5.84(d), 3.19(t), 1.63-1.55(m), 1.40-1.31(m), 0.95(t ).
N,N,N,N-테트라키스-2-(5-디부틸아미노싸이오페닐)-1,4-페닐렌디아민의 제조Preparation of N,N,N,N-tetrakis-2-(5-dibutylaminothiophenyl)-1,4-phenylenediamine
N.N-디부틸싸이오펜-2-아민 1.2 g을 무수 클로로폼 15 ml에 넣고, N-브로모숙신이미드 1 g을 THF 10 ml에 녹여 천천히 넣고 상온에서 빛을 차단한 채로 3 시간 동안 반응시켰다. 반응이 끝난 후 물로 여러 번 씻어주고, 용매를 제거하여 5-브로모-N.N-디부틸싸이오펜-2-아민 1.4 g을 얻었다. 마그네슘 0.15 g을 테트라하이드로퓨란 15 ml에 넣은 후 무수 염화리튬 0.22 g을 첨가했다. 2-클로로프로판 0.4 g을 THF 15 ml에 넣은 용액을 상온에서 천천히 앞의 용액에 넣고 12 시간 동안 반응시켰다. 반응이 끝난 용액을 잔여 마그네슘과 분리하기 위해서 주사기로 뽑아 아르곤으로 채워진 새로운 플라스크에 옮겼다. 플라스크의 온도를 -15 ℃로 낮춘 후, 5-브로모-N.N-디부틸싸이오펜-2-아민 1.4 g을 천천히 섞었다. 용액을 3 시간 동안 섞었다. 상기 용액에 티타늄 이소프로폭사이드 1.5 g을 넣고 온도를 -40 ℃로 낮췄다. 새로운 플라스크를 준비하고 p-페닐렌다이아민 0.13 g과 N-클로로숙신이미드 0.25 g을 테트라하이드로퓨란 10 ml에서 1 시간 동안 섞고, 천천히 상기 용액에 넣었다. 천천히 온도를 상온으로 올린 후 3 시간 동안 반응시켰다. 탄산 칼륨 포화용액으로 반응을 종결시킨 후, 에틸아세테이트를 부으면서 필터해줬다. 증류수로 여러 번 씻어주고, 용매를 제거하여 N,N,N,N-테트라키스-(2-(5-디부틸아미노싸이오페닐))-1,4-페닐렌디아민 0.7 g을 얻었다.1.2 g of NN-dibutylthiophen-2-amine was added to 15 ml of anhydrous chloroform, 1 g of N-bromosuccinimide was dissolved in 10 ml of THF, slowly added, and reacted for 3 hours while blocking light at room temperature. . After the reaction was completed, it was washed several times with water, and the solvent was removed to obtain 1.4 g of 5-bromo-N.N-dibutylthiophen-2-amine. 0.15 g of magnesium was added to 15 ml of tetrahydrofuran, and 0.22 g of anhydrous lithium chloride was added. The solution containing 0.4 g of 2-chloropropane in 15 ml of THF was slowly added to the previous solution at room temperature and reacted for 12 hours. In order to separate the remaining solution from the remaining magnesium, it was pulled with a syringe and transferred to a new flask filled with argon. After lowering the temperature of the flask to -15 °C, 1.4 g of 5-bromo-N.N-dibutylthiophen-2-amine was slowly mixed. The solution was mixed for 3 hours. 1.5 g of titanium isopropoxide was added to the solution and the temperature was lowered to -40 °C. A new flask was prepared, 0.13 g of p-phenylenediamine and 0.25 g of N-chlorosuccinimide were mixed in 10 ml of tetrahydrofuran for 1 hour, and slowly added to the solution. After slowly raising the temperature to room temperature, the reaction was carried out for 3 hours. After the reaction was terminated with saturated potassium carbonate solution, it was filtered while pouring ethyl acetate. Washed several times with distilled water and the solvent was removed to obtain 0.7 g of N,N,N,N-tetrakis-(2-(5-dibutylaminothiophenyl))-1,4-phenylenediamine.
1H NMR (300 MHz; CDCl3):δ6.61(s), 5.66(s), 2.93(t), 1.60-1.27(m), 0.91(t). 1 H NMR (300 MHz; CDCl 3 ):δ6.61(s), 5.66(s), 2.93(t), 1.60-1.27(m), 0.91(t).
아르곤 상태 하에서, 상기 소듐 4,5-디사이아노-2-트리플루오로메틸이미다졸레이트 0.4 g와 N,N,N,N-테트라키스-(2-(5-디부틸아미노싸이오페닐))-1,4-페닐렌디아민 0.7 g을 디클로로메탄 50 ml에 녹인 뒤, 이소부탄올 15 ml을 가하고 2 시간 동안 환류시켰다. 그 후, 과황산나트륨 0.23 g, 물 50 ml을 가하고 2 시간 동안 환류시켰다. 환류 종료 후, 디클로로메탄 100 ml와 물 100 ml를 추가한 뒤 유기용매 층을 분리하고 진공 증류시켜 N,N,N,N-테트라키스-2-(5-디부틸아미노싸이오페닐)-1,4-페닐렌디이모늄 비스4,5-디사이아노-2-트리플루오로메틸 0.9g을 수득하였다. 아래에 생성물의 화학식을 기재하였다.Under argon, 0.4 g of sodium 4,5-dicyano-2-trifluoromethylimidazolate and N,N,N,N-tetrakis-(2-(5-dibutylaminothiophenyl) )) After dissolving 0.7 g of 1,4-phenylenediamine in 50 ml of dichloromethane, 15 ml of isobutanol was added and refluxed for 2 hours. Then, 0.23 g of sodium persulfate and 50 ml of water were added and refluxed for 2 hours. After completion of reflux, 100 ml of dichloromethane and 100 ml of water were added, and the organic solvent layer was separated and vacuum distilled to N,N,N,N-tetrakis-2-(5-dibutylaminothiophenyl)-1 0.9 g of 4-phenylenedimonium bis 4,5-dicyano-2-trifluoromethyl was obtained. The chemical formula of the product is described below.
실시예 1-7. 퀴노이드계 이온화합물 N,N,N,N-테트라키스-2-(5-디부틸아미노피리디닐)-1,4-페닐렌디이모늄 비스4,5-디사이아노-2-트리플루오로메틸 이미다졸레이트의 제조Example 1-7. Quinoid-based ionic compounds N,N,N,N-tetrakis-2-(5-dibutylaminopyridinyl)-1,4-phenylenedimonium bis4,5-dicyano-2-trifluoro Preparation of methyl imidazolate
5-브로모-N,N-디부틸피리딘-2-아민의 제조Preparation of 5-bromo-N,N-dibutylpyridin-2-amine
무수 테트라하이드로퓨란 20 ml에 소듐하이드라이드 0.53 g을 첨가한 후, 테트라하이드로퓨란 10 ml에 녹인 2-아미노-5-브로모피리딘 1.73 g을 천천히 가했다. 온도를 50 ℃까지 올리고 반응시키며 수소 기체가 발생하지 않을 때까지 저었다. 1-브로모부탄 2.1 g을 가해주고 환류시키며 12 시간 동안 반응시켰다. 메탄올을 가해 반응을 종결시키고, 디에틸에테르로 추출했다. 용매를 제거하여 5-브로모-N,N-디부틸피리딘-2-아민 2.3 g을 얻었다.After adding 0.53 g of sodium hydride to 20 ml of anhydrous tetrahydrofuran, 1.73 g of 2-amino-5-bromopyridine dissolved in 10 ml of tetrahydrofuran was slowly added. The temperature was raised to 50°C and reacted, and stirred until no hydrogen gas was generated. 2.1 g of 1-bromobutane was added and refluxed and reacted for 12 hours. The reaction was terminated by adding methanol, and extracted with diethyl ether. The solvent was removed to obtain 2.3 g of 5-bromo-N,N-dibutylpyridin-2-amine.
1H NMR (300 MHz; CDCl3):δ8.11(s), 7.49(d), 7.01(d), 3.56(t), 1.56-1.28(m), 0.91(t). 1 H NMR (300 MHz; CDCl 3 ):δ8.11(s), 7.49(d), 7.01(d), 3.56(t), 1.56-1.28(m), 0.91(t).
N,N,N,N-테트라키스-2-(5-디부틸아미노피리디닐)-1,4-페닐렌디아민의 제조Preparation of N,N,N,N-tetrakis-2-(5-dibutylaminopyridinyl)-1,4-phenylenediamine
마그네슘 0.15 g을 테트라하이드로퓨란 15 ml에 넣은 후 무수 염화리튬 0.22 g을 첨가했다. 2-클로로프로판 0.4 g을 THF 15 ml에 넣은 용액을 상온에서 천천히 앞의 용액에 넣고 12 시간 동안 반응시켰다. 반응이 끝난 용액을 잔여 마그네슘과 분리하기 위해서 주사기로 뽑아 아르곤으로 채워진 새로운 플라스크에 옮겼다. 플라스크의 온도를 -15 ℃로 낮춘 후, 5-브로모-N.N-디부틸피리딘-2-아민 1.4 g을 천천히 섞었다. 용액을 3 시간 동안 섞었다. 상기 용액에 티타늄 이소프로폭사이드 1.5 g을 넣고 온도를 -40 ℃로 낮추었다. 새로운 플라스크를 준비하고 p-페닐렌다이아민 0.13 g과 N-클로로숙신이미드 0.25 g을 테트라하이드로퓨란 10 ml에서 1시간 동안 섞고, 천천히 상기 용액에 넣었다. 천천히 온도를 상온으로 올린 후 3 시간 동안 반응시켰다. 탄산칼륨 포화용액으로 반응을 종결시킨 후, 에틸아세테이트를 부으면서 필터했다. 증류수로 여러 번 씻어주고, 용매를 제거하여 N,N,N,N-테트라키스-(2-(5-디부틸아미노싸이오페닐))-1,4-페닐렌디아민 0.85 g을 얻었다.0.15 g of magnesium was added to 15 ml of tetrahydrofuran, and 0.22 g of anhydrous lithium chloride was added. The solution containing 0.4 g of 2-chloropropane in 15 ml of THF was slowly added to the previous solution at room temperature and reacted for 12 hours. In order to separate the remaining solution from the remaining magnesium, it was pulled with a syringe and transferred to a new flask filled with argon. After lowering the temperature of the flask to -15°C, 1.4 g of 5-bromo-N.N-dibutylpyridin-2-amine was slowly mixed. The solution was mixed for 3 hours. 1.5 g of titanium isopropoxide was added to the solution and the temperature was lowered to -40 °C. A new flask was prepared, 0.13 g of p-phenylenediamine and 0.25 g of N-chlorosuccinimide were mixed in 10 ml of tetrahydrofuran for 1 hour, and slowly added to the solution. After slowly raising the temperature to room temperature, the reaction was carried out for 3 hours. After the reaction was terminated with a saturated potassium carbonate solution, it was filtered while pouring ethyl acetate. Washed several times with distilled water and the solvent was removed to obtain 0.85 g of N,N,N,N-tetrakis-(2-(5-dibutylaminothiophenyl))-1,4-phenylenediamine.
1H NMR (300 MHz; CDCl3):δ7.95(s), 7.11(d), 6.83(d), 6.50(s), 3.51(t), 1.58-1.33(m), 0.94(t). 1 H NMR (300 MHz; CDCl 3 ):δ7.95(s), 7.11(d), 6.83(d), 6.50(s), 3.51(t), 1.58-1.33(m), 0.94(t).
아르곤 상태 하에서, 소듐 4,5-디사이아노-2-트리플루오로메틸이미다졸레이트 0.4 g와 N,N,N,N-테트라키스-(2-(5-디부틸아미노피리디닐))-1,4-페닐렌디아민 0.8 g을 디클로로메탄 50 ml에 녹인 뒤, 이소부탄올 15 ml을 가하고 2 시간 동안 환류시켰다. 그 후, 과황산나트륨 0.23 g, 물 50 ml을 가하고 2 시간 동안 환류시켰다. 환류 종료 후, 디클로로메탄 100 ml와 물 100 ml를 추가한 뒤 유기용매 층을 분리하고 진공 증류시켜 N,N,N,N-테트라키스-2-(5-디부틸아미노피리디닐)-1,4-페닐렌디이모늄 비스4,5-디사이아노-2-트리플루오로메틸 0.9 g을 수득하였다. 아래에 생성물의 화학식을 기재하였다.Under argon, 0.4 g of sodium 4,5-dicyano-2-trifluoromethylimidazolate and N,N,N,N-tetrakis-(2-(5-dibutylaminopyridinyl)) 0.8 g of -1,4-phenylenediamine was dissolved in 50 ml of dichloromethane, and 15 ml of isobutanol was added and refluxed for 2 hours. Then, 0.23 g of sodium persulfate and 50 ml of water were added and refluxed for 2 hours. After completion of reflux, 100 ml of dichloromethane and 100 ml of water were added, and the organic solvent layer was separated and vacuum distilled to N,N,N,N-tetrakis-2-(5-dibutylaminopyridinyl)-1, 0.9 g of 4-phenylenedimonium bis4,5-dicyano-2-trifluoromethyl was obtained. The chemical formula of the product is described below.
실시예 1-8. 퀴노이드계 이온화합물 N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디이모늄 비스5-트리플로로메틸 테트라졸레이트의 제조Example 1-8. Preparation of quinoid-based ionic compounds N,N,N,N-tetrakis(4-diisobutylaminophenyl)-1,4-phenylenedimonium bis5-trifluoromethyl tetrazolate
소듐 5-트리플로로메틸 테트라졸레이트의 제조Preparation of sodium 5-trifluoromethyl tetrazolate
소듐 아자이드 3.2 g을 무수 아세토나이트릴 50 ml에 녹인 후, 반응 플라스크를 냉각기에 넣어 온도를 -80 ℃로 낮추고 강하게 저어주었다. 상기 플라스크와 관으로 연결된 새로운 플라스크에서 트리플로로아세트아마이드 10.5 g과 피리딘 8.3 g을 천천히 섞어주었다. 반응 시 기체가 발생하는 것을 확인하면서 천천히 저어주었다. 기체 발생이 멈추면 아세토나이트릴 용액이 포함된 플라스크의 온도를 상온으로 올리고 2 일간 반응시켰다. 증류기로 용매를 제거하여 소듐 5-트리플로로메틸 테트라졸레이트 5.2 g을 수득하였다.After dissolving 3.2 g of sodium azide in 50 ml of acetonitrile anhydrous, the reaction flask was placed in a cooler to lower the temperature to -80°C and stir vigorously. 10.5 g of triloacetamide and 8.3 g of pyridine were slowly mixed in a new flask connected to the flask. Stir slowly while confirming that gas was generated during the reaction. When gas evolution was stopped, the temperature of the flask containing the acetonitrile solution was raised to room temperature and reacted for 2 days. The solvent was removed by a distiller to obtain 5.2 g of sodium 5-trifluoromethyl tetrazolate.
13C NMR (300 MHz; DMSO-d6)/ppm: 123.6, 154.1. 13 C NMR (300 MHz; DMSO-d 6 )/ppm: 123.6, 154.1.
아르곤 상태 하에서, 상기 소듐 5-트리플로로메틸 테트라졸레이트 2.5 g와 N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디아민 5.0 g을 디클로로메탄 100 ml에 녹인 뒤, 이소부탄올 50 ml을 가하고 2시간 동안 환류시켰다. 그 후, 과황산나트륨 1.8 g, 물 100 ml을 가하고 2시간 동안 환류시켰다. 환류 종료 후, 디클로로메탄 100 ml와 물 100 ml를 추가한 뒤 유기용매 층을 분리하고 진공 증류시켜 N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디이모늄 비스5-트리플로로메틸 테트라졸레이트 4.2 g을 수득하였다. 아래에 생성물의 화학식을 기재하였다.Under argon, 5.0 g of sodium 5-trifluoromethyl tetrazolate and 5.0 g of N,N,N,N-tetrakis(4-diisobutylaminophenyl)-1,4-phenylenediamine are dichloromethane After dissolving in 100 ml, 50 ml of isobutanol was added and refluxed for 2 hours. Then, 1.8 g of sodium persulfate and 100 ml of water were added and refluxed for 2 hours. After completion of reflux, 100 ml of dichloromethane and 100 ml of water were added, and the organic solvent layer was separated and vacuum distilled to make N,N,N,N-tetrakis(4-diisobutylaminophenyl)-1,4-phenyl. 4.2 g of rendimonium bis5-trifluoromethyl tetrazolate was obtained. The chemical formula of the product is described below.
실시예 1-9. 퀴노이드계 이온화합물 N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디이모늄 비스(2-(1H-이미다조일-2-아미노)-1H-4,5-디사이아노이미다졸레이트의제조Example 1-9. Quinoid-based ionic compounds N,N,N,N-tetrakis(4-diisobutylaminophenyl)-1,4-phenylenedimonium bis(2-(1H-imidazoyl-2-amino)-1H -Preparation of 4,5-dicyanoimidazolate
소듐 (2-(1H-이미다조일-2-아미노)-4,5-디사이아노이미다졸레이트의 제조Preparation of sodium (2-(1H-imidazoyl-2-amino)-4,5-dicyanoimidazolate
아르곤으로 채워진 플라스크에 2-브로모-1H-이미다졸 1.5 g, 2-아미노-4,5-이미다졸디카보나이트릴 1.4 g, 소듐 부톡사이드 1.1 g, 톨루엔 25 ml를 넣고 저어주었다. Pd(dba)2 팔라듐 촉매 0.11 g과 트리뷰틸포스페이트 0.05 g을 넣고 용액이 짙은 보라색이 되는 것을 확인하였다. 용액이 보라색이 되면 온도를 100 ℃까지 올리고 12 시간 동안 반응시켰다. 반응이 완료되면 메탄올에서 석출시켰고, 필터로 걸러진 고체를 메탄올, 헥산, 물로 여러 번 씻어주었다. 얻어진 고체를 디에틸에테르에 녹이고 15% 탄산 나트륨 용액으로 여러 번 추출했다. 증류기로 유기용매 층을 제거하여 소듐 (2-(1H-이미다조일-2-아미노)-4,5-디사이아노이미다졸레이트 0.91 g을 얻었다.In a flask filled with argon, 2-bromo-1H-imidazole 1.5 g, 2-amino-4,5-imidazole dicarbonitrile 1.4 g, sodium butoxide 1.1 g, and toluene 25 ml were stirred. 0.11 g of Pd(dba) 2 palladium catalyst and 0.05 g of tributyl phosphate were added, and it was confirmed that the solution became dark purple. When the solution became purple, the temperature was raised to 100°C and reacted for 12 hours. When the reaction was completed, it was precipitated in methanol, and the filtered solid was washed several times with methanol, hexane, and water. The obtained solid was dissolved in diethyl ether and extracted several times with a 15% sodium carbonate solution. The organic solvent layer was removed by a distiller to obtain 0.91 g of sodium (2-(1H-imidazoyl-2-amino)-4,5-dicyanoimidazolate.
13C NMR (300 MHz; DMSO-d6)/ppm: 112.2, 115.8, 120.2, 127.8, 134.0, 167.7. 13 C NMR (300 MHz; DMSO-d 6 )/ppm: 112.2, 115.8, 120.2, 127.8, 134.0, 167.7.
아르곤 상태 하에서, 상기 소듐 (2-(1H-이미다조일-2-아미노)-4,5-디사이아노이미다졸레이트 0.9 g와 N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디아민 1.6 g을 디클로로메탄 20 ml에 녹인 뒤, 이소부탄올 10 ml을 가하고 2시간 동안 환류시켰다. 그 후, 과황산나트륨 0.95 g, 물 20 ml을 가하고 2시간 동안 환류시켰다. 환류 종료 후, 디클로로메탄 100 ml와 물 100 ml를 추가한 뒤 유기용매 층을 분리하고 진공 증류시켜 N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디이모늄 비스((2-(1H-이미다조일-2-아미노)-4,5-디사이아노이미다졸레이트) 1.7 g을 수득하였다. 아래에 생성물의 화학식을 기재하였다.Under argon, 0.9 g of the sodium (2-(1H-imidazoyl-2-amino)-4,5-dicyanoimidazolate and N,N,N,N-tetrakis(4-diisobutyl) After dissolving 1.6 g of aminophenyl)-1,4-phenylenediamine in 20 ml of dichloromethane, 10 ml of isobutanol was added and refluxed for 2 hours, after which 0.95 g of sodium persulfate was added and 20 ml of water was added for 2 hours. After completion of reflux, 100 ml of dichloromethane and 100 ml of water were added, and then the organic solvent layer was separated and vacuum distilled to make N,N,N,N-tetrakis(4-diisobutylaminophenyl)-1, 1.7 g of 4-phenylenedimonium bis((2-(1H-imidazoyl-2-amino)-4,5-dicyanoimidazolate) was obtained. The chemical formula of the product is described below.
실시예 2-1. N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디이모늄 비스4,5-디니트로-2-트리플루오로메틸 이미다졸레이트를 이용한 근적외선 차단막의 제조Example 2-1. N,N,N,N-tetrakis(4-diisobutylaminophenyl)-1,4-phenylenedimonium bis4,5-dinitro-2-trifluoromethyl imidazolate Produce
클로로포름에 상기 실시예 1-2에서 얻은 N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디이모늄 비스4,5-디니트로-2-트리플루오로메틸 이미다졸레이트를 4.0 질량%로 녹였다. 스프레이 도포법으로 유리에 코팅했다. 코팅 횟수로 두께와 투과도를 조절 하였다.N,N,N,N-tetrakis(4-diisobutylaminophenyl)-1,4-phenylenedimonium bis4,5-dinitro-2-trifluoro obtained in Example 1-2 above in chloroform Romethyl imidazolate was dissolved at 4.0 mass%. It was coated on the glass by spray application. Thickness and permeability were controlled by the number of coatings.
Λmax : 1100 nm ( 두께 ; 20 nm).Λmax: 1100 nm (thickness; 20 nm).
실시예 2-2. N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디이모늄 비스4,5-디니트로-2-트리플루오로메틸 이미다졸레이트를 이용한 근적외선 차단막의 제조Example 2-2. N,N,N,N-tetrakis(4-diisobutylaminophenyl)-1,4-phenylenedimonium bis4,5-dinitro-2-trifluoromethyl imidazolate Produce
클로로포름에 상기 실시예 1-2에서 얻은 N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디이모늄 비스4,5-디니트로-2-트리플루오로메틸 이미다졸레이트를 1.0 질량%로 녹이고, 폴리에테르술폰 (몰평균 분자량 : 16,000)을 6.0 질량%로 녹인다. 회전 도포법으로 유리에 코팅한다. 회전 속도와 횟수로 두께와 투과도를 조절한다.N,N,N,N-tetrakis(4-diisobutylaminophenyl)-1,4-phenylenedimonium bis4,5-dinitro-2-trifluoro obtained in Example 1-2 above in chloroform Dissolve romethyl imidazolate at 1.0 mass%, and dissolve polyethersulfone (molar average molecular weight: 16,000) at 6.0 mass%. It is coated on a glass by a rotating coating method. The thickness and permeability are controlled by the rotation speed and frequency.
Λmax : 1132 nm ( 두께 ; 1 - 3 μm). Λmax: 1132 nm (thickness; 1-3 μm).
광열 필름 온도 : 119.0 ℃ (No filter) / 31.4 ℃ (Filter).Photothermal film temperature: 119.0 ℃ (No filter) / 31.4 ℃ (Filter).
필터의 최대 온도 : 40.1 ℃.The maximum temperature of the filter: 40.1 ℃.
실시예 2-3. N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디이모늄 비스4,5-디사이아노-2-트리플루오로메틸 이미다졸레이트를 이용한 근적외선 차단막의 제조Example 2-3. Near-infrared blocking film using N,N,N,N-tetrakis(4-diisobutylaminophenyl)-1,4-phenylenedimonium bis4,5-dicyano-2-trifluoromethyl imidazolate Manufacture of
톨루엔에 상기 실시예 1-1에서 얻은 N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디이모늄 비스4,5-디사이아노-2-트리플루오로메틸 이미다졸레이트를 1.0 질량%로 녹이고, 폴리메틸메타아크릴레이트 (평균 분자량 : 15,000)를 6.0 질량%로 녹였다. 회전 도포법으로 유리에 코팅한다. 회전 속도와 횟수로 두께와 투과도를 조절했다.N,N,N,N-tetrakis(4-diisobutylaminophenyl)-1,4-phenylenedimonium bis4,5-dicyano-2-tri obtained in Example 1-1 above in toluene Fluoromethyl imidazolate was dissolved at 1.0 mass%, and polymethyl methacrylate (average molecular weight: 15,000) was dissolved at 6.0 mass%. It is coated on a glass by a rotating coating method. Thickness and permeability were controlled by rotation speed and frequency.
Λmax : 1098 nm ( 두께 ; 1 - 3 μm)Λmax: 1098 nm (thickness; 1-3 μm)
광열 필름 온도 : 118.3 ℃ (No filter) / 32.4 ℃ (Filter).Photothermal film temperature: 118.3 ℃ (No filter) / 32.4 ℃ (Filter).
필터의 최대 온도 : 40.3 ℃.The maximum temperature of the filter: 40.3 ℃.
실시예 2-4. 4-((4-(비스(4-(디에틸아미노)페닐)포스피노)페닐) (4-(디에틸아미노)페닐)포스피노)-N,N-디에틸벤젠아민 비스4,5-디니트로-2-트리플루오로메틸 이미다졸레이트를 이용한 근적외선 차단막의 제조Example 2-4. 4-((4-(bis(4-(diethylamino)phenyl)phosphino)phenyl) (4-(diethylamino)phenyl)phosphino)-N,N-diethylbenzeneamine bis4,5- Preparation of near infrared blocking membrane using dinitro-2-trifluoromethyl imidazolate
클로로포름에 상기 실시예 1-3에서 얻은 4-((4-(비스(4-(디에틸아미노)페닐)포스피노)페닐) (4-(디에틸아미노)페닐)포스피노)-N,N-디에틸벤젠아민 비스4,5-디니트로-2-트리플루오로메틸 이미다졸레이트를 1.0 질량%로 녹이고, 폴리에테르술폰 (몰평균 분자량 : 16,000)을 5.0 질량%로 녹였다. 회전 도포법으로 유리에 코팅한다. 회전 속도와 횟수로 두께와 투과도를 조절했다. 4-((4-(bis(4-(diethylamino)phenyl)phosphino)phenyl) (4-(diethylamino)phenyl)phosphino)-N,N obtained in Example 1-3 above in chloroform -Diethylbenzeneamine bis4,5-dinitro-2-trifluoromethyl imidazolate was dissolved at 1.0 mass%, and polyether sulfone (molar average molecular weight: 16,000) was dissolved at 5.0 mass%. It is coated on a glass by a rotating coating method. Thickness and permeability were controlled by rotation speed and frequency.
Λmax : 1257 nm ( 두께 ; 1 - 3 μm).Λmax: 1257 nm (thickness; 1-3 μm).
광열 필름 온도 : 117.7 ℃ (No filter) / 28.8 ℃ (Filter).Photothermal film temperature: 117.7 ℃ (No filter) / 28.8 ℃ (Filter).
필터의 최대 온도 : 43.0 ℃.The maximum temperature of the filter: 43.0 ℃.
실시예 2-5. (4-((4-(비스(4-(디에틸아미노)페닐)포스피노)페닐)(4-(디에틸아미노)페닐)포스피노)-N,N-디에틸벤젠아민 비스트리풀로로메탄술폰이미드를 이용한 근적외선 차단막의 제조Example 2-5. (4-((4-(bis(4-(diethylamino)phenyl)phosphino)phenyl)(4-(diethylamino)phenyl)phosphino)-N,N-diethylbenzeneamine bistrifuro Preparation of near infrared blocking membrane using romethanesulfonimide
톨루엔에 상기 실시예 1-5에서 얻은 (4-((4-(비스(4-(디에틸아미노)페닐)포스피노)페닐)(4-(디에틸아미노)페닐)포스피노)-N,N-디에틸벤젠아민 비스트리풀로로메탄술폰이미드를 1.0 질량%로 녹이고, 폴리에테르술폰(평균 분자량 : 16,000)을 5.0 질량%로 녹였다. 회전 도포법으로 유리에 코팅했다. 회전 속도와 횟수로 두께와 투과도를 조절했다.(4-((4-(bis(4-(diethylamino)phenyl)phosphino)phenyl)(4-(diethylamino)phenyl)phosphino)-N obtained in Example 1-5 above to toluene, N-diethylbenzeneamine bistrifuromethanesulfonimide was dissolved at 1.0% by mass, and polyethersulfone (average molecular weight: 16,000) was dissolved at 5.0% by mass. Thickness and permeability were adjusted by the number of times.
Λmax : 1243 nm ( 두께 ; 1 - 3 μm)Λmax: 1243 nm (thickness; 1-3 μm)
광열 필름 온도 : 117.5 ℃ (No filter) / 29.9 ℃ (Filter).Photothermal film temperature: 117.5 ℃ (No filter) / 29.9 ℃ (Filter).
필터의 최대 온도 : 41.0 ℃.The maximum temperature of the filter: 41.0 ℃.
실시예 2-6. N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디이모늄 비스4,5-디사이아노-2-트리플루오로메틸 이미다졸레이트와 Sol-gel 층을 이용한 근적외선 차단막 제조Example 2-6. N,N,N,N-tetrakis(4-diisobutylaminophenyl)-1,4-phenylenedimonium bis4,5-dicyano-2-trifluoromethyl imidazolate and Sol-gel Preparation of a near-infrared blocking film using a layer
3-글리시독시프로필 트리메톡시 실란, 메틸트리메톡시 실란, 테트라에틸오르토실리케이트, 2-프로피닐[3-(트리에톡시실릴)프로필]카바메이트를 각각 2 : 1 : 1 : 0.25 (몰비)로 혼합하고 혼합물을 60 질량%가 되도록 물에 4시간 이상 잘 섞었다. 그 혼합액에 상기 실시예 1-1에서 얻은 N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디이모늄 비스4,5-디사이아노-2-트리플루오로메틸 이미다졸레이트를 2.0 질량%만큼 넣고, 염산 수용액과 함께 섞어주었다. 혼합액을 닥터블레이드법으로 30 μm 두께만큼 코팅한 후, 100 ℃로 가열하여 열처리하였다.3-glycidoxypropyl trimethoxy silane, methyltrimethoxy silane, tetraethyl orthosilicate, 2-propynyl[3-(triethoxysilyl)propyl]carbamate, respectively 2:1:1:10.2 (molar ratio) ) And the mixture was well mixed with water for at least 4 hours to reach 60% by mass. N,N,N,N-tetrakis(4-diisobutylaminophenyl)-1,4-phenylenedimonium bis 4,5-dicyano-2- obtained in Example 1-1 above was added to the mixed solution. Trifluoromethyl imidazolate was added in an amount of 2.0% by mass, and mixed with an aqueous hydrochloric acid solution. The mixed solution was coated with a thickness of 30 μm by a doctor blade method, and then heated to 100° C. to heat treatment.
Λmax : 998 nmΛmax: 998 nm
실시예 2-7. (4-((4-(비스(4-(디에틸아미노)페닐)포스피노)페닐)(4-(디에틸아미노)페닐)포스피노)-N,N-디에틸벤젠아민 비스(비스옥살라토보레이트) 와 Sol-gel층을 이용한 근적외선 차단막 제조Example 2-7. (4-((4-(bis(4-(diethylamino)phenyl)phosphino)phenyl)(4-(diethylamino)phenyl)phosphino)-N,N-diethylbenzeneamine bis(bisoc Production of near-infrared blocking film using salatoborate) and Sol-gel layer
3-글리시독시프로필 트리메톡시 실란, 메틸트리메톡시 실란, 테트라에틸오르토실리케이트, 2-프로피닐[3-(트리에톡시실릴)프로필]카바메이트를 각각 2 : 1 : 1 : 0.25 (몰비) 로 혼합하고 혼합물을 60 질량%가 되도록 물에 4시간 이상 잘 섞어주었다. 그 혼합액에 상기 실시예 1-4에서 얻은 (4-((4-(비스(4-(디에틸아미노)페닐)포스피노)페닐)(4-(디에틸아미노)페닐)포스피노)-N,N-디에틸벤젠아민 비스(비스옥살라토보레이트)를 4.0 질량%만큼 넣고, 염산 수용액과 함께 섞어주었다. 혼합액을 닥터블레이드법으로 30 μm 두께만큼 코팅한 후, 100 ℃로 가열하여 열처리하였다.3-glycidoxypropyl trimethoxy silane, methyltrimethoxy silane, tetraethyl orthosilicate, 2-propynyl[3-(triethoxysilyl)propyl]carbamate, respectively 2:1:1:10.2 (molar ratio) ) And the mixture was well mixed with water for at least 4 hours so as to be 60% by mass. To the mixture, (4-((4-(bis(4-(diethylamino)phenyl)phosphino)phenyl)(4-(diethylamino)phenyl)phosphino)-N obtained in Example 1-4 above. ,N-diethylbenzeneamine bis(bisoxalatoborate) was added in an amount of 4.0% by mass and mixed with an aqueous hydrochloric acid solution The mixture was coated with a 30 μm thick layer by a doctor blade method, and then heated to 100° C. to heat treatment. .
Λmax : 1190 nmΛmax: 1190 nm
비교예 1-1. 디이모늄계 화합물 N,N,N',N,-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디이모늄 비스(비스옥살라토보레이트) 제조Comparative Example 1-1. Preparation of dimonium-based compounds N,N,N',N,-tetrakis(4-diisobutylaminophenyl)-1,4-phenylenedimonium bis(bisoxalatoborate)
N,N,N',N'-테트라키스(p-디이소부틸아미노페닐)-p-페닐렌디아민 5.0g과 리튬비스옥살라토보레이트 2.5 g, 디클로로메탄 100 ml 및 에탄올 50 ml을 넣고 2시간 동안 환류시킨 후, 과황산나트륨 2.0 g과 물 100 ml을 가하고 2시간 동안 환류시켰다. 환류 종료 후, 디클로로메탄 100 ml와 물 100 ml를 추가한 뒤 유기용매 층을 분리하고 진공 증류시켜 N,N,N',N'-테트라키스(p-디이소부틸아미노페닐)-p-페닐렌디이모늄 비스(비스옥살라토보레이트) 5.2 g을 수득하였다.N,N,N',N'-tetrakis(p-diisobutylaminophenyl)-p-phenylenediamine 5.0g, lithium bisoxalatobarate 2.5g, dichloromethane 100ml and ethanol 50ml 2 After refluxing for an hour, 2.0 g of sodium persulfate and 100 ml of water were added and refluxed for 2 hours. After completion of reflux, 100 ml of dichloromethane and 100 ml of water were added, and the organic solvent layer was separated and vacuum distilled to N,N,N',N'-tetrakis(p-diisobutylaminophenyl)-p-phenyl 5.2 g of rendimonium bis(bisoxalatoborate) was obtained.
비교예 2-1. N디이모늄계 화합물 N,N,N',N,-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디이모늄 비스(비스옥살라토보레이트)를 이용한 근적외선 차단막의 제조Comparative Example 2-1. Preparation of a near-infrared blocking film using N-dimonium-based compounds N,N,N',N,-tetrakis(4-diisobutylaminophenyl)-1,4-phenylenedimonium bis(bisoxalatoborate)
클로로포름에 상기 비교예 1-1에서 얻은 N,N,N',N,-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디이모늄 비스(비스옥살라토보레이트)를 1.0 질량%로 녹이고, 폴리에테르술폰 (몰평균 분자량 : 16,000)을 6.0 질량%로 녹였다. 회전 도포법으로 유리에 코팅하였다. 회전 속도와 횟수로 두께와 투과도를 조절하였다.1.0, N,N,N',N,-tetrakis(4-diisobutylaminophenyl)-1,4-phenylenedimonium bis(bisoxalatoborate) obtained in Comparative Example 1-1 was added to chloroform. It was dissolved in mass%, and polyethersulfone (molar average molecular weight: 16,000) was dissolved in 6.0 mass%. It was coated on a glass by a rotating coating method. Thickness and permeability were controlled by rotation speed and frequency.
Λmax : 1103 nm ( 두께 ; 1 - 3 μm). Λmax: 1103 nm (thickness; 1-3 μm).
광열 필름 온도 : 115.2 ℃ (No filter) / 32.2 ℃ (Filter).Photothermal film temperature: 115.2 ℃ (No filter) / 32.2 ℃ (Filter).
필터의 최대 온도 : 39.9 ℃.The maximum temperature of the filter: 39.9 ℃.
실험예 1. UV/VIS 스펙트럼 분석 및 열상승 Experimental Example 1. UV/VIS spectrum analysis and heat rise
상기 실시예 1-1, 1-2 및 비교예 1-1에서 제조된 퀴노이드계 화합물을 클로로포름에 각각 희석하고, UV/VIS 스펙트럼을 측정하였다. The quinoid compounds prepared in Examples 1-1, 1-2 and Comparative Example 1-1 were diluted in chloroform, respectively, and UV/VIS spectra were measured.
도 1은 본 발명의 일 실시예에 따른 퀴노이드계 이온화합물의 용액상 UV-VIS-NIR 흡수 스펙트럼을 나타낸 그래프이다. 상기 도 1에 도시된 바와 같이 실시예 1-1 및 비교예 1-1은 가시광 영역에서 투과도가 90%이상이고, 최대 흡수 파장은 1100 nm 부근으로 거의 유사하였다. 상기 도 1에 나타내지는 않았으나, 실시예 1-2 또한 상기 실시예 1-1 및 비교예 1-1과 유사한 스펙트럼을 가졌다.1 is a graph showing a UV-VIS-NIR absorption spectrum of a solution phase of a quinoid-based ionic compound according to an embodiment of the present invention. As shown in Fig. 1, Example 1-1 and Comparative Example 1-1 had a transmittance of 90% or more in the visible light region, and the maximum absorption wavelength was almost similar to 1100 nm. Although not shown in Figure 1, Example 1-2 also had a spectrum similar to Example 1-1 and Comparative Example 1-1.
한편, 몰흡광계수 측정에서 상기 비교예 1-1의 물질은 140,000 cm-1M-1을 갖는 것에 비하여 실시예 1-1의 퀴노이드계 화합물 N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디이모늄 비스4,5-디사이아노-2-트리플루오로메틸 이미다졸레이트는 200,000 cm-1M-1, 실시예 1-2의 N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디이모늄 비스4,5-디나이트로-2-트리플루오로메틸 이미다졸레이트는 210,000 cm-1M-1로 월등히 높은 몰흡광계수를 보였다.On the other hand, in the molar absorption coefficient measurement, the material of Comparative Example 1-1 had 140,000 cm -1 M -1 compared to the quinoid-based compound N,N,N,N-tetrakis of Example 1-1 (4- Diisobutylaminophenyl)-1,4-phenylenedimonium bis4,5-dicyano-2-trifluoromethyl imidazolate is 200,000 cm -1 M -1 , N of Example 1-2, N,N,N-tetrakis(4-diisobutylaminophenyl)-1,4-phenylenedimonium bis4,5-dinitro-2-trifluoromethyl imidazolate is 210,000 cm -1 M -1 showed a significantly higher molar absorption coefficient.
또한 하기 표 1에 상기 실시예 2-1 내지 2-7에 따라 제조한 근적외선 차단막의 최대 흡수 파장(Λmax, nm)을 측정한 결과를 기재하였다.In addition, Table 1 below shows the results of measuring the maximum absorption wavelength (Λmax, nm) of the near-infrared blocking films prepared according to Examples 2-1 to 2-7.
상기 표 1에 나타낸 바와 같이, 상기 실시예 2-1 내지 2-7에 따른 근적외선 차단막은 998 내지 1257 nm 범위의 최대 흡수 파장을 보여 근적외선 차단 효과가 우수함을 확인할 수 있었다.As shown in Table 1, it was confirmed that the near-infrared blocking films according to Examples 2-1 to 2-7 exhibited a maximum absorption wavelength in the range of 998 to 1257 nm, and excellent near-infrared blocking effect.
(Λmax, nm)Absorption wavelength
(Λmax, nm)
또한, 제조된 근적외선 차단막의 내습, 내열 성능을 분석하였다. 고온 고습 조건에서 본래의 특성을 유지해야 안정한 차단막이라고 할 수 있다. In addition, the moisture resistance and heat resistance performance of the manufactured near-infrared blocking film were analyzed. It can be said to be a stable barrier film only when it maintains its original properties under high temperature and high humidity conditions.
상기 실시예 2-2, 2-4, 2-6 및 비교예 2-1에 의해 제조된 근적외선 차단막을 고습도 조건(80 ℃, 습도>90%) 및 고온 조건(120 ℃)에서 24 시간 보관 시 최대 흡수파장에서 투과도 변화를 확인하였으며, 그 결과를 상기 표 2에 나타내었다. 상기 표 2에 나타낸 바와 같이, 퀴노이드계 화합물에 인이 포함된 경우에 열 안정성에 크게 향상되어 120 ℃에서 장시간 동안 투과도가 거의 변화하지 않는 것을 확인할 수 있었다.When the near-infrared shielding films prepared by Examples 2-2, 2-4, 2-6 and Comparative Example 2-1 were stored for 24 hours in high humidity conditions (80°C, humidity>90%) and high temperature conditions (120°C) The change in transmittance at the maximum absorption wavelength was confirmed, and the results are shown in Table 2 above. As shown in Table 2, when the quinoid-based compound contains phosphorus, the thermal stability was greatly improved, and it was confirmed that the transmittance was hardly changed for a long time at 120°C.
실험예 2. 근적외선 차단막 유무에 따른 열생성 분석Experimental Example 2. Analysis of heat generation according to the presence or absence of a near infrared blocking film
도 2는 상기 실시예 2-2의 근적외선 차단막 유무에 따른 광열 필름의 열상승 그래프이다. 우수한 광열 효과를 갖는 폴리(3,4-에틸렌디옥시싸이오펜) 필름을 레이저 하단에 설치하고, 사이에 근적외선 차단막을 위치시킨 후 레이저를 조사하였다. FIG. 2 is a graph of thermal rise of a photothermal film according to the presence or absence of a near-infrared blocking film of Example 2-2. A poly(3,4-ethylenedioxythiophene) film having an excellent photothermal effect was installed at the bottom of the laser, and a laser was irradiated after placing a near infrared blocking film therebetween.
또한 도 3은 상기 실시예 2-2에 따른 근적외선 차단막 유무에 따른 열생성을 확인한 열화상 사진이다. 상기 도 2 및 도 3에서 나타낸 바와 같이, 상기 근적외선 차단막이 설치되지 않은 경우(도 2의 No filter), 광열 필름은 119 ℃까지 온도가 상승하였으나, 근적외선 차단막이 설치된 경우(도 2의 Filter) 31.4 ℃로 열생성이 감소함을 확인할 수 있었다.In addition, Figure 3 is a thermal image confirming the heat generation according to the presence or absence of the near-infrared blocking film according to Example 2-2. 2 and 3, when the near-infrared blocking film is not installed (No filter in FIG. 2), the temperature of the photothermal film is increased to 119° C., but when the near-infrared blocking film is installed (Filter in FIG. 2) 31.4 It was confirmed that the heat generation decreased to ℃.
하기 표 2에 상기 실시예 2-2, 2-3 및 2-5의 근적외선 차단막 유무에 따른 광열 필름의 온도를 분석한 결과를 나타내었다.Table 2 below shows the results of analyzing the temperature of the photothermal film according to the presence or absence of the near infrared blocking films of Examples 2-2, 2-3, and 2-5.
상기 표 2에서 나타낸 바와 같이, 상기 실시예 2-2, 2-3 및 2-5의 근적외선 차단막을 설치한 경우, 열생성이 현저하게 감소함을 확인할 수 있었다.As shown in Table 2, when the near-infrared blocking films of Examples 2-2, 2-3, and 2-5 were installed, it was confirmed that heat generation was significantly reduced.
실험예 3. NMR 스펙트럼 분석Experimental Example 3. NMR spectrum analysis
상기 실시예 1-1. 1-2와 비교예 1-1에서 제조된 퀴노이드계 화합물들은 이온성 물질로 NMR에서 정확한 피크확인이 어렵다. 때문에, 합성의 성공여부를 확인하기 위해 환원제로 하이드라진을 가하여 본래의 시작물질로 돌아오는지 확인하였다. Example 1-1. The quinoid compounds prepared in 1-2 and Comparative Example 1-1 are ionic substances, making it difficult to accurately identify peaks in NMR. Therefore, to confirm the success of the synthesis, it was confirmed that hydrazine was added as a reducing agent to return to the original starting material.
상기 실시예 1-1, 1-2와 비교예 1-1의 물질 10 mg 을 아세토나이트릴 10 ml에 녹인 후, 하이드라진 10 mg을 가하고 10분 동안 섞었다. 석출된 고체를 필터로 걸러 얻은 후, 90 ℃ 진공상태에서 1시간 동안 말려주었다. 얻어진 고체를 듀테륨 치환된 클로로포름에 녹인 후, 하이드라진 1 mg을 섞은 상태로 NMR을 확인한다. 상기 실시예 1-1, 1-2과 비교예 1-1은 모두 시작 물질로 N,N,N,N-테트라키스(4-디이소부틸아미노페닐)-1,4-페닐렌디아민을 사용하였기 때문에 동일한 피크를 나타내었다.10 mg of the substances of Examples 1-1 and 1-2 and Comparative Example 1-1 were dissolved in 10 ml of acetonitrile, and then 10 mg of hydrazine was added and mixed for 10 minutes. After the precipitated solid was obtained by filtration, it was dried in a vacuum at 90° C. for 1 hour. After dissolving the obtained solid in deuterium-substituted chloroform, NMR was confirmed by mixing 1 mg of hydrazine. In Examples 1-1, 1-2 and Comparative Example 1-1, N,N,N,N-tetrakis(4-diisobutylaminophenyl)-1,4-phenylenediamine is used as a starting material. It showed the same peak.
1HNMR (CDCl3, 400 MHz): 6.92-6.49 (m, 20H), 3.00 (d, J=7.2 Hz, 16H), 2.03-1.96 (m, 8H), and 0.85 (d, J=6.8 Hz, 48H). 1 HNMR (
따라서, 본 발명에 따른 퀴노이드계 이온화합물은 가시광 영역에서 높은 투과도와 근적외선 영역에서 높은 흡광도를 가져 효율적인 근적외선 차단이 가능하며, 유기 용매에 높은 용해도를 가져 박막으로 제조하기가 용이할 뿐만 아니라, 고분자와의 친화성이 우수하여 박막 상태에서 장시간 고내열, 고내습 특성을 유지할 수 있다. 상기 퀴노이드계 이온화합물을 포함하는 근적외선 차단막은 전자기기를 보호하기 위한 보호 필름에 적용되기 적합하며, 단열 필름이나 빛에너지 흡수층으로도 활용될 수 있다.Therefore, the quinoid-based ionic compound according to the present invention has high transmittance in the visible light region and high absorbance in the near-infrared region, so that it can block efficient near-infrared rays, and has a high solubility in organic solvents, making it easy to manufacture into a thin film, as well as polymer It has excellent affinity with and can maintain high heat and moisture resistance for a long time in a thin film state. The near-infrared blocking film containing the quinoid-based ionic compound is suitable for application to a protective film for protecting electronic devices, and can also be used as an insulating film or a light energy absorbing layer.
전술한 실시예 및 비교예는 본 발명을 설명하기 위한 예시로서, 본 발명이 이에 한정되는 것은 아니다. 본 발명이 속하는 기술분야에서 통상의 지식을 가진 자라면 이로부터 다양하게 변형하여 본 발명을 실시하는 것이 가능할 것이므로, 본 발명의 기술적 보호범위는 첨부된 특허청구범위에 의해 정해져야 할 것이다.The above-described examples and comparative examples are examples for explaining the present invention, and the present invention is not limited thereto. Anyone having ordinary knowledge in the technical field to which the present invention pertains will be able to implement the present invention with various modifications therefrom, and thus the technical protection scope of the present invention should be defined by the appended claims.
Claims (15)
[화학식 1]
상기 화학식 1에 있어서,
n은 1 내지 4의 정수이고,
A 및 B는 서로 동일하거나 상이하고, 각각 질소 또는 인이고,
X-는 유기계 음이온으로, 치환 또는 비치환된 벤젠, 치환 또는 비치환된 이미다졸, 치환 또는 비치환된 트리아졸, 치환 또는 비치환된 테트라졸, 탄소수 1 내지 4의 알킬기의 수소가 플루오르로 치환된 술폰이미드 또는 옥살레이트기 사이에 탄소수 0 내지 4의 알킬기를 포함한 옥살라토보레이트이고,
R1 내지 R4는 서로 동일하거나 상이하고, 각각 독립적으로 하기 화학식 2 또는 3으로 표시되는 화합물이다.
[화학식 2]
상기 화학식 2에서, A1은 질소, 인, 산소 또는 황이고,
A2는 질소 또는 인이고,
R29 및 R30은 서로 동일하거나 상이하고, 각각 독립적으로 수소, 치환 또는 비치환된 탄소수 1 내지 10의 선형 또는 가지형 알킬기이다.
[화학식 3]
상기 화학식 3에서 A3 및 A4는 서로 동일하거나 상이하고, 각각 탄소, 질소 또는 인이고,
A5는 질소 또는 인이고,
R31 및 R32은 서로 동일하거나 상이하고, 각각 독립적으로 수소, 치환 또는 비치환된 탄소수 1 내지 10의 선형 또는 가지형 알킬기이다.
A quinoid-based ionic compound represented by Formula 1 below:
[Formula 1]
In Chemical Formula 1,
n is an integer from 1 to 4,
A and B are the same or different from each other, and each is nitrogen or phosphorus,
X - is an organic anion, substituted or unsubstituted benzene, substituted or unsubstituted imidazole, substituted or unsubstituted triazole, substituted or unsubstituted tetrazole, hydrogen of an alkyl group having 1 to 4 carbon atoms is substituted with fluorine Oxalatoborate containing an alkyl group having 0 to 4 carbon atoms between the sulfonimide or oxalate groups,
R 1 to R 4 are the same as or different from each other, and each independently a compound represented by the following Chemical Formula 2 or 3.
[Formula 2]
In Chemical Formula 2, A 1 is nitrogen, phosphorus, oxygen or sulfur,
A 2 is nitrogen or phosphorus,
R 29 and R 30 are the same or different from each other, and each independently hydrogen, a substituted or unsubstituted linear or branched alkyl group having 1 to 10 carbon atoms.
[Formula 3]
In Formula 3, A 3 and A 4 are the same as or different from each other, and each is carbon, nitrogen, or phosphorus,
A 5 is nitrogen or phosphorus,
R 31 and R 32 are the same as or different from each other, and each independently hydrogen, a substituted or unsubstituted linear or branched alkyl group having 1 to 10 carbon atoms.
상기 화힉식 1의 X는 하기 화학식 7 내지 9 중에서 선택되는 어느 하나로 표시되는 화합물인 퀴노이드계 이온화합물:
[화학식 7]
상기 화학식 7에서 R5 내지 R7는 서로 동일하거나 상이하고, 히드록시기, 싸이올기, 술폰기, 할로젠기, 나이트로기, 사이아노기, 카르복시기, 아민기, 알데하이드기, 탄소수 1 내지 10의 알킬기 또는 수소가 플루오르로 치환되거나 비치환된 알콕시기이다.
[화학식 8]
상기 화학식 8에서 R8는 서로 동일하거나 상이하고, 히드록시기, 싸이올기, 술폰기, 할로젠기, 나이트로기, 사이아노기, 카르복시기, 아민기, 알데하이드기, 탄소수 1 내지 10의 알킬기 또는 수소가 플루오르로 치환되거나 비치환된 알콕시기이다.
[화학식 9]
상기 화학식 9에서 R9 내지 R12는 서로 동일하거나 상이하고, 히드록시기, 싸이올기, 술폰기, 할로젠기, 나이트로기, 사이아노기, 카르복시기, 아민기, 알데하이드기, 탄소수 1 내지 10의 알킬기 또는 수소가 플루오르로 치환되거나 비치환된 알콕시기이다.
According to claim 1,
X in Chemical Formula 1 is a quinoid-based ionic compound which is a compound represented by any one selected from the following Chemical Formulas 7 to 9:
[Formula 7]
In Formula 7, R 5 to R 7 are the same as or different from each other, and a hydroxy group, a thiol group, a sulfone group, a halogen group, a nitro group, a cyano group, a carboxy group, an amine group, an aldehyde group, and an alkyl group having 1 to 10 carbon atoms. Or an alkoxy group in which hydrogen is substituted or unsubstituted with fluorine.
[Formula 8]
In Formula 8, R 8 is the same or different from each other, and a hydroxy group, a thiol group, a sulfone group, a halogen group, a nitro group, a cyano group, a carboxy group, an amine group, an aldehyde group, an alkyl group having 1 to 10 carbon atoms, or hydrogen It is an alkoxy group unsubstituted or substituted with fluorine.
[Formula 9]
In Formula 9, R 9 to R 12 are the same as or different from each other, and a hydroxy group, a thiol group, a sulfone group, a halogen group, a nitro group, a cyano group, a carboxy group, an amine group, an aldehyde group, or an alkyl group having 1 to 10 carbon atoms. Or an alkoxy group in which hydrogen is substituted or unsubstituted with fluorine.
상기 화학식 1에서 X는 하기 화학식 7로 표시되는 화합물인 퀴노이드계 이온화합물:
[화학식 7]
상기 화학식 7에서 R5는 CF3이고,
R6 및 R7은 서로 동일하고, 나이트로기 또는 사이아노기이다.
According to claim 1,
In Formula 1, X is a quinoid-based ionic compound, which is a compound represented by Formula 7 below:
[Formula 7]
R 5 in Formula 7 is CF 3 ,
R 6 and R 7 are the same as each other and are a nitro group or a cyano group.
상기 퀴노이드계 이온화합물은 하기 화학식 10 또는 11로 표시되는 화합물인 퀴노이드계 이온화합물:
[화학식 10]
상기 화학식 10에서 R13 내지 R20는 서로 동일하거나 상이하고, 탄소수 1 내지 6의 알킬기이다.
[화학식 11]
상기 화학식 11에서 R21 내지 R28는 서로 동일하거나 상이하고, 탄소수 1 내지 6의 알킬기이다.
According to claim 1,
The quinoid-based ionic compound is a quinoid-based ionic compound which is a compound represented by the following Chemical Formulas 10 or 11:
[Formula 10]
In Formula 10, R 13 to R 20 are the same or different from each other, and are alkyl groups having 1 to 6 carbon atoms.
[Formula 11]
In Formula 11, R 21 to R 28 are the same as or different from each other, and are alkyl groups having 1 to 6 carbon atoms.
상기 화학식 1에서 A 및 B는 인이고,
n은 1인 퀴노이드계 이온화합물.
According to claim 1,
In Formula 1, A and B are phosphorus,
n is a quinoid-based ionic compound of 1.
상기 퀴노이드계 이온화합물은 하기 화학식 12 또는 13으로 표시되는 화합물인 퀴노이드계 이온화합물:
[화학식 12]
[화학식 13]
According to claim 1,
The quinoid-based ionic compound is a quinoid-based ionic compound which is a compound represented by the following Chemical Formula 12 or 13:
[Formula 12]
[Formula 13]
상기 퀴노이드계 이온화합물은 하기 화학식 14 또는 15로 표시되는 화합물인 퀴노이드계 이온화합물:
[화학식 14]
[화학식 15]
According to claim 1,
The quinoid-based ionic compound is a quinoid-based ionic compound which is a compound represented by the following Chemical Formula 14 or 15:
[Formula 14]
[Formula 15]
A near-infrared blocking film comprising the quinoid-based ionic compound according to any one of claims 1 to 7.
상기 혼합용액을 이용하여 근적외선 차단막을 제조하는 단계;를 포함하는 근적외선 차단막의 제조방법.
Preparing a mixed solution comprising the quinoid-based ionic compound and a binder according to any one of claims 1 to 7; And
A method of manufacturing a near-infrared blocking film comprising; preparing a near-infrared blocking film using the mixed solution.
상기 바인더는 폴리에틸렌, 폴리스타이렌, 폴리메틸메타아크릴레이트, 폴리에테르술폰, 폴리이미드, 폴리아크릴레이트, 폴리아미드, 폴리우레탄, 폴리펩타이드, 폴리에스테르, 폴리카보네이트 및 폴리락틱그라이콜릭산로 이루어진 군에서 선택되는 1종 이상인 근적외선 차단막의 제조방법.
The method of claim 9,
The binder is selected from the group consisting of polyethylene, polystyrene, polymethyl methacrylate, polyethersulfone, polyimide, polyacrylate, polyamide, polyurethane, polypeptide, polyester, polycarbonate and polylactic glycolic acid Method of manufacturing at least one near-infrared blocking film.
상기 바인더는 실리카, 타이타니아 및 보론옥시드로 이루어진 군에서 선택되는 1종 이상인 근적외선 차단막의 제조방법.
The method of claim 9,
The binder is a method of manufacturing at least one near-infrared blocking film selected from the group consisting of silica, titania and boron oxide.
상기 혼합용액의 용매는 아세톤, 디클로로메탄, 클로로포름, 톨루엔, 디에틸에테르, 페트롤리움에테르, 1,1,2,2-테트라클로로에탄, 아세토나이트릴, 1,4-디옥산, 테트라하이드로퓨란, 에틸아세테이트, 메탄올, 에탄올, 헥산, 디메틸포름아미드, 디메틸아세트아미드 및 디메톡시설폭사이드로 이루어진 군에서 선택되는 1종 이상인 근적외선 차단막의 제조방법.
The method of claim 9,
The solvent of the mixed solution is acetone, dichloromethane, chloroform, toluene, diethyl ether, petroleum ether, 1,1,2,2-tetrachloroethane, acetonitrile, 1,4-dioxane, tetrahydrofuran, Method for producing a near-infrared barrier film selected from the group consisting of ethyl acetate, methanol, ethanol, hexane, dimethylformamide, dimethylacetamide and dimethoxysulfoxide.
상기 혼합용액에서 상기 퀴노이드계 이온화합물의 농도는 0.001 mg/ml 내지 100 mg/ml인 근적외선 차단막의 제조방법.
The method of claim 9,
The method of preparing a near-infrared blocking film in which the concentration of the quinoid-based ionic compound in the mixed solution is 0.001 mg/ml to 100 mg/ml.
상기 퀴노이드계 이온화합물은 상기 혼합용액 중량 대비 0.1 내지 20 중량%로 포함되는 근적외선 차단막의 제조방법.
The method of claim 9,
The quinoid-based ionic compound is a method of manufacturing a near-infrared blocking film containing 0.1 to 20% by weight based on the weight of the mixed solution.
상기 혼합용액을 이용하여 근적외선 차단막을 제조하는 단계는 딥 코팅법, 회전 도포법, 닥터 블레이드법 또는 스프레이 분사법에 의해 수행되는 근적외선 차단막의 제조방법.
The method of claim 9,
The manufacturing method of the near-infrared blocking film using the mixed solution is a method of manufacturing a near-infrared blocking film performed by a dip coating method, a rotation coating method, a doctor blade method, or a spray spraying method.
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