KR20200070511A - Hard Coating film Including Bonding-layer patterned and Fabrication of The same - Google Patents

Abstract

The present invention relates to a hard coating film including a patterned adhesive layer, and a method of manufacturing the same. Particularly, the present invention relates to a hard coating film which satisfies excellent hardness and abrasion resistance while improving flexibility by introducing an adhesive layer on which a pattern is formed, and a method of manufacturing the same.

Description

Hard coating film comprising a patterned adhesive layer and a manufacturing method therefor{Hard Coating film Including Bonding-layer patterned and Fabrication of The same}

The present invention relates to a hard coating film comprising a patterned adhesive layer and a method for manufacturing the same.

Transparent polymer film has been widely used as a core material in the optical and flexible display industry, and has been applied to replace glass in the display industry due to its light weight and ease of processing. However, it has a low surface hardness compared to glass, which has the disadvantage of abrasion resistance.

Accordingly, studies on hard coatings for high hardness are being actively conducted, and flexibility is also required to be applied as a window cover of a foldable display. In order for the transparent polymer film to replace the tempered glass that was used as a window cover for a foldable display, an anti-fingerprint (AF) coating is essential. Flexibility is a very important issue in order to use a transparent polymer film as a window cover of a foldable display, and at the same time, high hardness and wear resistance are required simultaneously.

Accordingly, a hard coating excellent in bendability, hardness, and abrasion resistance is performed on the transparent polymer film, and an AF coating is applied to prevent touch and slip and to prevent fingerprints. However, due to the properties of SiO ₂ to increase AF material adhesion to AF coating, the flexibility of the transparent polymer film after AF coating is remarkably deteriorated, so it is difficult to apply as a window cover of a foldable display when performing AF coating in the conventional method. There is this.

Domestic registration No. 10-1541255 discloses a method of forming a deposition layer of SiO _{2 on top} of a polymer layer of HMDSO (Hexamethyldisiloxan) layer, but only the effect of improving abrasion resistance and salt water resistance can be obtained. There is only, and Japanese Patent Publication No. 2006-095836 discloses a method of irradiating ionizing radiation through a mask to form irregularities on the surface of the hard coating layer, but this only imparts anti-glare properties to suppress glare on the surface. It does not improve the flexibility of the hard coating film including the AF coating layer.

Therefore, when the AF coating layer is included, the development of technology for improving the flexibility is very urgent.

Accordingly, the present invention is to provide a hard coating film and a method of manufacturing the improved coating property while satisfying excellent fingerprint resistance, hardness, and scratch resistance by introducing an adhesive layer having a pattern.

One preferred embodiment of the present invention for solving the above problems is to provide a hard coating film comprising a base film, a hard coating layer and an anti-fingerprint layer, and an adhesive layer having a pattern formed between the hard coating layer and the anti-fingerprint layer. .

The adhesive layer is characterized in that it comprises a pattern formed by crossing a non-deposited portion where an adhesive material is deposited between the hard coating layer and the anti-fingerprint layer and a non-deposited portion where the adhesive material is not deposited between the hard coating layer and the anti-fingerprint layer.

The pattern is characterized in that the vapor-deposited portion and the non-deposited portion are formed in a uniaxial stripe structure, or an island structure in which rectangular vapor-deposited portions are regularly arranged on the non-deposited portion.

When the pattern is a stripe structure, the length of the X-axis of the deposition portion is 150 to 300 μm, and the length of the X-axis of the non-deposition portion is 30 to 300 μm.

When the pattern is an island structure, a ratio between the length of the X-axis (horizontal) and the length of the Y-axis (vertical) of the evaporation portion is 1:0.5 to 1.8.

The length of the Z-axis of the evaporation section is characterized in that it is 200 mm 2 to 1000 mm 2.

It is characterized in that the ratio of the total area occupied by the deposition part existing in the constant area to the total area occupied by the non-deposition part is 5:1 to 0.5:1.

The adhesive layer is characterized in that it comprises at least one adhesive material selected from SiO ₂ and Al ₂ O ₃ .

The substrate is characterized in that it is any one selected from polyethylene terephthalate, polyimide, polycarbonate (PC), triacetyl cellulose (TAC), cyclic olefin copolymer (COC), and methyl polymethacrylate (PMMA). .

The hard coating layer may include one or more alkoxysilanes selected from alkoxysilanes represented by Formula 1 and alkoxysilanes represented by Formula 2 below; And it characterized in that it comprises a siloxane resin prepared by polymerization, including tetraethyl orthosilicate (tetraethyl orthosilicate; TEOS).

<Formula 1>

R ¹ _n Si(OR ² ) _4-n

In Formula 1, R ¹ is a linear, branched or alicyclic alkylene group of C1 to C3 substituted with epoxy or acrylic, R ² is a linear, branched or alicyclic alkyl group of C1 to C8, and n is 1 to 3 Is an integer.

<Formula 2>

Si(OR ³ ) ₄

In Formula 2, R ³ is a C1 to C4 linear or branched alkyl group.

The anti-fingerprint layer may be characterized by including a fluorine-based compound or a silicon-based compound.

The hard coating film is characterized in that the water contact angle is 110° or more, the reverse R value is 1.5 or less, the transmittance is 90% or more, the haze is 1.0% or less, and the hardness is 3H or more.

Another preferred embodiment of the present invention is a step of coating a hard coating composition on a base film to form a hard coating layer (S1); Forming an adhesive layer having a pattern by depositing an adhesive material through a mask on which the pattern is formed on the hard coating layer (S2); And forming an anti-fingerprint layer (S3) on the adhesive layer.

The mask on which the pattern is formed is characterized by having a structure including a transmissive portion and a non-transmissive portion.

The hard coating film including the patterned adhesive layer according to the present invention and a method of manufacturing the same can obtain an effect of improving flexibility while satisfying excellent fingerprint resistance.

Figure 1 schematically shows the structure of a hard coating film comprising a patterned adhesive layer according to an embodiment of the present invention.
Figure 2 schematically shows the surface of the patterned adhesive layer according to an embodiment of the present invention.
Figure 3 schematically shows a perspective view of a hard coating film comprising a patterned adhesive layer according to an embodiment of the present invention.
Figure 4 schematically shows the surface of a patterned adhesive layer according to another embodiment of the present invention.
5 schematically illustrates a perspective view of a hard coating film including a patterned adhesive layer according to another embodiment of the present invention.
6 schematically illustrates the surface of a patterned adhesive layer according to another embodiment of the present invention.
7 schematically illustrates a perspective view of a hard coating film including a patterned adhesive layer according to another embodiment of the present invention.

One preferred embodiment of the present invention is to provide a hard coating film comprising a base film, a hard coating layer and an anti-fingerprint layer, and an adhesive layer having a pattern formed between the hard coating layer and the anti-fingerprint layer.

1 schematically shows a hard coat film comprising a patterned adhesive layer, i.e., a patterned adhesive layer, according to the present invention, as an anti-fingerprint layer 110, a patterned adhesive layer 120, a hard coating layer 130 and a substrate The film 140 includes a structure sequentially stacked.

1, the base film according to the present invention is polyethylene terephthalate, polyimide, polycarbonate (PC), triacetyl cellulose (TAC), cyclic olefin copolymer (COC) and polymethacryl And any one selected from acid methyl (PMMA).

The hard coating layer may include one or more alkoxysilanes selected from alkoxysilanes represented by Formula 1 and alkoxysilanes represented by Formula 2 below; And it is preferable to include a siloxane resin prepared by polymerization including tetraethyl orthosilicate (TEOS).

<Formula 1>

R ¹ _n Si(OR ² ) _4-n

In Formula 1, R ¹ is a linear, branched or alicyclic alkylene group of C1 to C3 substituted with epoxy or acrylic, R ² is a linear, branched or alicyclic alkyl group of C1 to C8, and n is 1 to 3 Is an integer.

<Formula 2>

Si(OR ³ ) ₄

In Formula 2, R ³ is a C1 to C4 linear or branched alkyl group.

The resin of the hard coating layer according to the present invention may be made of a solvent-based hard coating composition based on an organic or inorganic resin, and the type of the resin is not limited, but it is preferable to use a silicon oxide system advantageous for high hardness.

The hard coating composition of the present invention can be prepared through hydrolysis and condensation reaction between alkoxysilane containing organic substances and TEOS in the presence of a hydroxyl group. The hydrolysis and condensation reaction may be performed at room temperature, but may be stirred at 100 rpm using a mechanical stirrer for 1 hour to 120 hours at 50°C to 120°C to promote the reaction, but is not limited thereto. As the catalyst during the reaction, acid catalysts such as hydrochloric acid, acetic acid, hydrogen fluoride, nitric acid, and iodine sulfate, base catalysts such as sodium hydroxide, ammonia, potassium hydroxide, barium hydroxide, imidazole and Amberite Etc. Ion exchange resin can be used. The amount of the catalyst is not particularly limited, but may be added to 0.0001 to about 10 parts by weight, but may not be limited thereto. When the hydrolysis and condensation reactions proceed, by-products such as water or alcohol are generated, and by removing them, the reverse reaction can be reduced to accelerate the forward reaction, and the reaction rate can be controlled. In addition, after the reaction is over, the by-product can be removed by applying heat under reduced pressure. In an embodiment of the present invention, the alkoxysilane for the production of the resin may use one or more selected from the alkoxysilane represented by Formula 1 and the alkoxysilane represented by Formula 2, but may not be limited thereto. have.

In one embodiment of the present invention, an initiator may be further included for polymerization of the siloxane resin, for example, a photopolymerization initiator such as an onium salt or an organometallic salt and a thermal polymerization initiator such as amine or imidazole may be used. However, it may not be limited thereto. The addition amount of the initiator is not particularly limited, but may be added to about 0.01 to 10 parts by weight based on about 100 parts by weight of the siloxane resin, but may not be limited thereto.

The siloxane resin may include an antioxidant to suppress the oxidation reaction resulting from the polymerization reaction, but may not be limited thereto.

The hard coating composition may further include a leveling agent or a coating aid, but may not be limited thereto.

The thickness of the hard coating layer formed of the hard coating composition can be easily adjusted. In one embodiment of the present invention, having a thickness of 5 to 30 μm, preferably 10 to 20 μm, is preferable in that it can secure sufficient hardness and flexibility of the hard coating film.

The hard coating layer has a pencil hardness (750 g) value of 3H or more, preferably 4H or more. When the pencil hardness (750 g) value of the hard coating layer is 4H or more, an excellent effect of scratch resistance can be obtained.

The anti-fingerprint layer may include a fluorine-based compound or a silicon-based compound.

The fluorine-based compound may be used as long as it is a compound containing fluorine commonly used in the field to which the present invention belongs, and a fluorine-based compound capable of orientating CF ₃ and CF ₂ for high-efficiency anti-fingerprint properties is preferred, but is not limited thereto. It does not work.

In addition, the silicon-based compound may be used as long as it is a compound containing fluorine commonly used in the field to which the present invention pertains, and a silicon-based compound capable of orienting CH ₃ to improve anti-fingerprint properties is preferred, but is not limited thereto. .

The adhesive layer according to the present invention is formed between the hard coating layer and the anti-fingerprint layer and has a patterned structure, and thus may have an effect of improving the flexibility of the hard coating film including the anti-fingerprint layer.

If it specifically, the hard coat film comprising a conventional fingerprint preventing layer is of the nature that SiO ₂ has case where to deposit the SiO ₂ to the adhesion of the hard coating and print layer on top of the hard coating layer, the deposition of these SiO ₂ Therefore, after coating the anti-fingerprint layer, there was a problem that the flexibility of the hard coating film was significantly reduced.

That is, the property of SiO ₂ being brittle is very strong, which may degrade the flexibility.

In order to solve this, in the present invention, it is possible to obtain the effect of forming the SiO ₂ pattern to improve the flexibility of the pattern when bending.

Further, Japanese Patent Laid-Open No. 2006-095836 discloses a method of forming irregularities on the surface of the hard coating layer through a mask, but the above document may be vulnerable to scratch resistance due to the irregularities of the hard coating layer, and may be caused by surface irregularities. There is a problem that a uniform anti-fingerprint layer cannot be introduced.

In the present invention, the anti-fingerprint layer including a structure in which a pattern is formed between the hard coat layer and the anti-fingerprint layer is provided to improve flexural properties, while also having excellent properties such as hardness, abrasion resistance, etc. that the hard coat film must satisfy.

The adhesive layer may include a pattern formed by crossing a deposition portion in which an adhesive material is deposited between a hard coating layer and an anti-fingerprint layer and a non-deposition portion in which an adhesive material is not deposited between a hard coating layer and an anti-fingerprint layer.

Figure 2 schematically shows the surface of a patterned adhesive layer according to one embodiment of the present invention, Figure 3 is a patterned adhesive layer according to an embodiment of the present invention, that is, a hard comprising an adhesive layer having the pattern of Figure 2 It is a schematic illustration of a perspective view of a coating film.

In addition, Figure 4 schematically shows the surface of the patterned adhesive layer according to another embodiment of the present invention, Figure 5 is a patterned adhesive layer according to another embodiment of the present invention, that is, the adhesive layer having the pattern of Figure 4 It is a schematic view showing a perspective view of a hard coating film comprising a.

In addition, Figure 6 schematically shows the surface of a patterned adhesive layer according to another embodiment of the present invention, Figure 7 is a patterned adhesive layer according to another embodiment of the present invention, that is, the adhesive layer having a pattern of Figure 6 It is a schematic view showing a perspective view of a hard coating film comprising a.

The patterns shown in FIGS. 2 to 6 illustrate an example of a pattern formed on an adhesive layer according to an embodiment of the present invention, but are not limited thereto, and an adhesive material is deposited between the hard coating layer and the anti-fingerprint layer and It is preferable that the adhesive material includes a pattern including a non-deposited portion that is not deposited between the hard coating layer and the anti-fingerprint layer.

As shown in FIG. 2, the adhesive layer on which the pattern is formed includes the components included in the adhesive layer, that is, the deposition unit 210 and the non-deposited unit 220 which are the portions where the adhesive material is deposited between the hard coating layer and the anti-fingerprint layer. It may be a uniaxial pattern (stripe structure), or may be an island structure in which a rectangular evaporation part 210 is regularly arranged on a non-deposition part 220 as shown in FIG. 4.

3, 5 and 7, the adhesive layer 120 formed with a pattern laminated between the anti-fingerprint layer 110 and the hard coating layer 130 includes a deposition unit 210 and a non-deposition unit 220. Is formed.

2 and 3, when the pattern is a stripe structure, the length of the X-axis of the deposition portion is 150 to 300 µm, preferably 200 to 250 µm, and the length of the X axis of the non-deposition portion is 30 to 300 µm. , Preferably 40 to 250 μm is good in that it can obtain an effect excellent in flexibility while satisfying a water contact angle.

And, as shown in Figures 4-7, a structure in which a portion where an evaporation part and a non-evaporation part cross each other, that is, in the case of an island structure in which a rectangular evaporation part is regularly arranged on a non-evaporation part, the evaporation part ( The ratio of the horizontal axis (a) and the vertical axis (b) of 210) may be 1:0.5 to 1.8, preferably 1: 0.8 to 1.5, and more preferably 1: 1 to 1.3. When the ratio between the horizontal axis and the vertical axis of the non-deposition portion is within the above range, it may have an advantage of being excellent in flexibility while satisfying a water contact angle.

In addition, the length of the Z-axis of the evaporation unit (see FIG. 5) is preferably 200 to 1000 mm, preferably 400 to 700 mm, and more preferably 530 to 650 mm in terms of securing water contact angle and flexibility. When the thickness of the adhesive layer is less than 200 mm 2, the AF layer is not formed properly, resulting in a decrease in the water contact angle, and when it exceeds 1000 mm, the flexibility decreases. At this time, the length of the Z-axis of the deposition portion has the same meaning as the height of the adhesive layer.

In the present invention, the patterned adhesive layer has a ratio of the total area occupied by the deposition part existing within a certain area to the total area occupied by the non-deposition part, preferably from 5:1 to 0.5:1, and more preferably from 3 to 0.5:1. It is preferable to form from 1.2 to 0.8:1 in view of securing the water contact angle and flexibility. When the ratio of the vapor-deposited portion to the non-deposited portion becomes 5:1 or more, the flexibility decreases, and when it is 0.5:1 or less, the wear resistance decreases and the water contact angle decreases. That is, the area of the deposition portion relative to the total area should be 60 to 80%, preferably 70%, so that the AF performance is effective.

The adhesive material included in the adhesive layer includes at least one selected from SiO ₂ and Al ₂ O ₃ .

The anti-fingerprint layer has a thickness of 100 mm to 500 mm, preferably 300 to 400 mm, which is good in securing a water contact angle and securing surface quality. When the thickness of the anti-fingerprint layer is less than 100 mm 2, wear resistance and water contact angle decrease, and when it exceeds 500 mm, haze-like stains are generated on the surface.

The hard coating film including the adhesive layer on which the above-described pattern is formed has a water contact angle of 110° or more, an inverse R value of 1.5 or less, a transmittance of 90% or more, a haze of 1.0% or less, and a hardness of 3H or more.

The reverse R represents a bending characteristic as a radius (R) at the time when the hard coating film is broken when the hard coating film coated with the hard coating film is bent in the direction of the substrate.

Another preferred embodiment of the present invention is a step of coating a hard coating composition on a base film to form a hard coating layer (S1); Forming an adhesive layer having a pattern by depositing an adhesive material through a mask on which the pattern is formed on the hard coating layer (S2); And forming an anti-fingerprint layer (S3) on the adhesive layer.

First, a step (S1) of forming a hard coating layer by coating a hard coating composition on a base film is performed.

The method of forming a hard coating layer on the base film is any one selected from spray, dip coating, spin coating, die coating, comma coating, screen coating, inkjet printing, pad printing, knife coating, kiss coating, bar coating and gravure coating. The coating may be performed by one method, and the thickness of the hard coating layer formed of the hard coating resin composition may be easily adjusted according to the type or use of the substrate.

The hard coating composition and a method of preparing a coating solution using the same are the same as described above.

A step (S2) of forming an adhesive layer having a pattern by performing an adhesive material deposition is performed through a mask having a pattern formed on the hard coating layer.

The mask on which the pattern is formed preferably has a structure including a transmissive portion and a non-transmissive portion.

In detail, when the adhesive material is deposited on the hard coating layer, the transmissive portion means a portion that passes through the mask and is deposited on the hard coating layer to form a deposition portion of the adhesive layer. In addition, the non-transmissive portion means a portion that forms a non-deposited portion of the adhesive layer when the adhesive material is deposited on the hard coating layer and the adhesive material does not pass through the mask and is not deposited on the hard coating layer.

That is, the pattern of the mask has an embossed relationship with the pattern of the adhesive layer and can be identified.

In this regard, the pattern of the mask according to another embodiment of the present invention is a pattern formed by uniaxially depositing a non-deposited portion and a deposited portion, which is a portion in which an adhesive material is deposited between a hard coating layer and an anti-fingerprint layer in an adhesive layer. It may be, it may be a grid pattern formed by crossing with a spherical structure, or may be a grid pattern crossed by diagonal lines.

The deposition method can be carried out by selecting from a general method widely known in the field to which the present invention belongs, and for example, it can be deposited by a vacuum thermal evaporation method.

A step (S3) of forming an anti-fingerprint layer on the adhesive layer is performed.

The anti-fingerprint layer may be formed by depositing an anti-fingerprint layer on the patterned adhesive layer through the mask on which the above-described pattern is formed.

The anti-fingerprint layer and the deposition method are as described above.

Hard coating film according to an embodiment of the present invention is manufactured by the above-described manufacturing method, the water contact angle is 110 ° or more, the reverse R value is 1.5 or less, the crack elongation is 5% or more, the transmittance is 90% or more, and the haze is 1.0% or less. Physical properties can be satisfied.

Example

Hereinafter, the present invention will be described in more detail through examples. These examples are only intended to illustrate the present invention in more detail, and the present invention is not limited thereby.

<Example 1>

The resin was mixed with KBM-403 (Shinetsu), TEOS (Sigma-Aldrich), and H ₂ O in a molar ratio of 8:2:15 into a 1,000 mL flask, and 0.1 equivalent of sodium hydroxide was added as a catalyst to form 60 Stir at 10° C. for 10 hours. Thereafter, after diluting 2-butanone with 50 wt% of solid content, it was filtered using a 0.45 μm Teflon filter to obtain a siloxane resin. Next, 3 parts by weight of IRGACURE 250 (BASF) was added as a photoinitiator to obtain a siloxane resin composition.

After coating the siloxane resin composition with a bar on the surface of polyimide (CPI ^® , Kolon Industries Co., Ltd.), drying it at 80° C. for 20 minutes, exposing it to a UV lamp having a wavelength of 315 nm for 30 seconds, and having a thickness of 10 μm. A coating layer was formed.

When the AF (anti-fingerprint layer) is coated, SiO _{2, which} is an adhesive material of the adhesive layer applied to improve the adhesion between the AF material and the hard coating layer, is deposited by electron beam deposition, and the AF material is deposited by thermal evaporation. Upon deposition of SiO ₂ , a fine patterned SiO ₂ was formed by using a mask having a fine pattern between the deposition source and the deposited material, and then AF material was deposited to express AF characteristics.

<Examples 2 to 6>

As shown in Table 1 below, it was carried out in the same manner as in Example 1, except that the shape and size of the pattern were differently performed.

division Pattern of adhesive layer Pattern form Deposition Non-deposition Total area of evaporation area: Total area of non-deposition area X axis length Y axis length Z axis length Horizontal axis (a) length Vertical axis (b) length Example 1 Figure 2 200㎛ - 1000Å 200㎛ - 1:1 Example 2 Figure 2 240㎛ - 1000Å 240㎛ - 1:1 Example 3 Fig. 4 180㎛ 180㎛ 1000Å 180㎛ 60㎛ 3:1 Example 4 Fig. 4 240㎛ 240㎛ 1000Å 240㎛ 120㎛ 2:1 Example 5 Fig. 6
Fig. 6 180㎛ 180㎛ 1000Å 180㎛ 60㎛ 3:1 Example 6 240㎛ 240㎛ 1000Å 240㎛ 120㎛ 2:1

* In Examples 1 and 2, since the vapor deposition portion and the non-deposition portion are patterns formed on one axis, the length of the vertical axis (b) of the non-deposition portion is the same as the length of the Y-axis of the deposition portion.

<Comparative Example 1>

The resin was mixed with KBM-403 (Shinetsu), TEOS (Sigma-Aldrich), and H ₂ O in a molar ratio of 8:2:15 into a 1,000 mL flask, and 0.1 equivalent of sodium hydroxide was added as a catalyst to form 60 Stir at 10° C. for 10 hours. Thereafter, after diluting 2-butanone with 50 wt% of solid content, it was filtered using a 0.45 μm Teflon filter to obtain a siloxane resin. Next, 3 parts by weight of IRGACURE 250 (BASF) was added as a photoinitiator to obtain a siloxane resin composition.

After coating the siloxane resin composition with a bar on the surface of polyimide (CPI ^® , Kolon Industries Co., Ltd.), drying it at 80° C. for 20 minutes, exposing it to a UV lamp having a wavelength of 315 nm for 30 seconds, and having a thickness of 10 μm. A coating layer was formed.

<Comparative Example 2>

It is carried out in the same manner as in Example 1, but when the AF (anti-fingerprint layer) is coated, SiO _{2, which} is an adhesive material of the adhesive layer applied to improve the adhesion between the AF material and the hard coating layer, is deposited using an electron beam deposition method, AF The material was deposited using a thermal evaporation method. At this time, no mask was used during the deposition process.

<Measurement Example>

The hard coat film prepared from the above Examples and Comparative Examples was subjected to physical property evaluation according to the following method, and the results are shown in Table 2 below.

(1) The pencil hardness was measured at a load of 750 gf at a speed of 180 mm/min, ASTM D3363 using a pencil hardness tester manufactured by IMOTO of Japan.

(2) Abrasion resistance: Abrasion resistance was evaluated according to the following criteria by confirming whether or not scratches occurred visually by reciprocating 100 times with #0000 Steel Wool under a load of 750g.

-OK: No scratch

-NG: scratch occurs

(3) Reverse R: Using the Bending Tester equipment (Junil Tech Co., Ltd., JIRBT-620), load the sample with the coated surface facing upward, narrow the radius, and measure the radius (R) at the time of cracking of the hard coating layer. Did.

(4) Permeability: measured by ASTM D1003 measurement standard with HM-150 of MURAKAMI.

(5) Haze: It was measured according to ASTM D1003 measurement standard with HM-150 equipment of MURAKAMI.

(6) Water contact angle: The contact angle of DI Water was measured with KRASS DAS100 equipment.

division pencil
Hardness (Hv) Wear resistance
(OK/NG) Station R
(mm) Transmittance
(%) Haze
(%) Male contact angle
(°) Example 1 5H OK 1.0 91 0.2 115 Example 2 5H OK 1.2 91 0.2 115 Example 3 5H OK 1.2 91 0.2 115 Example 4 5H OK 1.2 91 0.2 115 Example 5 5H OK 1.2 91 0.2 115 Example 6 5H OK 1.2 91 0.2 115 Comparative Example 1 5H OK 1.0 91 0.2 80 Comparative Example 2 5H OK 4.0 91 0.2 115

As shown in Table 2, Examples 1 to 6 were able to obtain characteristics having anti-fingerprint and bend properties simultaneously, including an adhesive layer on which a pattern was formed. However, it can be seen that Comparative Examples 1 and 2 have a problem of not satisfying fingerprint resistance and flexibility at the same time. In particular, in Comparative Example 1 in which only the hard coating was performed, the water contact angle was significantly reduced, and in Comparative Example 2 with a patternless adhesion, the abrasion resistance was enhanced, but the flexibility was weakened, so that the trade-off of abrasion resistance and flexibility was not overcome. there was.

Claims (15)

It includes a base film, a hard coating layer and an anti-fingerprint layer,
A hard coating film comprising an adhesive layer having a pattern formed between the hard coating layer and the anti-fingerprint layer. The method of claim 1, wherein the adhesive layer is characterized in that it comprises a pattern formed by crossing a non-deposited portion where an adhesive material is deposited between the hard coating layer and the anti-fingerprint layer and a non-deposited portion where the adhesive material is not deposited between the hard coating layer and the anti-fingerprint layer. Hard coating film. The hard coating film according to claim 2, wherein the pattern is a stripe structure in which the deposition portion and the non-deposition portion are formed uniaxially, or an island structure in which a rectangular deposition portion is regularly arranged on a non-deposition portion. According to claim 3, When the pattern is a stripe structure, the length of the X-axis of the deposition portion is 150 to 300 μm, and the length of the X-axis of the non-deposition portion is 30 to 300 μm. According to claim 3, When the pattern is an island structure, the ratio of the length of the X-axis (horizontal) and the length of the Y-axis (vertical) of the evaporation part is 1:0.5 to 1.8. 3. The hard coating film of claim 2, wherein a length of the Z-axis of the deposition unit is 200 mm 2 to 1000 mm 2. The hard coating film according to claim 2, wherein a ratio of the total area occupied by the deposition part existing in the constant area to the total area occupied by the non-deposition part is 5:1 to 0.5:1. The hard coating film of claim 1, wherein the adhesive layer comprises at least one adhesive material selected from SiO ₂ and Al ₂ O ₃ . The method of claim 1, wherein the substrate is any one selected from polyethylene terephthalate, polyimide, polycarbonate (PC), triacetyl cellulose (TAC), cyclic olefin copolymer (COC) and methyl polymethacrylate (PMMA). Hard coating film, characterized in that one. According to claim 1, The hard coating layer is at least one alkoxysilane selected from alkoxysilane represented by the following formula (1) and alkoxysilane represented by the following formula (2); And a tetrasiloxane orthosilicate (TEOS)-containing siloxane resin prepared by polymerization.
<Formula 1>
R ¹ _n Si(OR ² ) _4-n
In Formula 1, R ¹ is a linear, branched or alicyclic alkylene group of C1 to C3 substituted with epoxy or acrylic, R ² is a linear, branched or alicyclic alkyl group of C1 to C8, and n is 1 to 3 Is an integer.
<Formula 2>
Si(OR ³ ) ₄
In Formula 2, R ³ is a C1 to C4 linear or branched alkyl group. The hard coating film of claim 1, wherein the anti-fingerprint layer comprises a fluorine-based compound or a silicon-based compound. The hard coating film of claim 1, wherein the anti-fingerprint layer comprises a fluorine-based compound or a silicon-based compound. The hard coating film of claim 1, wherein the hard coating film has a water contact angle of 110° or more, an inverse R value of 1.5 or less, a transmittance of 90% or more, a haze of 1.0% or less, and a hardness of 3H or more. Forming a hard coating layer by coating the hard coating composition on the base film (S1);
Forming an adhesive layer having a pattern by depositing an adhesive material through a mask on which the pattern is formed on the hard coating layer (S2); And
Method of manufacturing a hard coating film comprising the step (S3) of forming an anti-fingerprint layer on top of the adhesive layer. 15. The method of claim 14, wherein the patterned mask is a method of manufacturing a hard coating film, characterized in that the structure including a transparent portion and a non-transparent portion.

Images