KR20200069757A - Encapsulating composition - Google Patents

Abstract

The present application relates to a sealing material composition and an organic electronic device including the same, and provides the sealing material composition which: can effectively block moisture and oxygen from infiltrating into the organic electronic device from the outside to ensure a good lifespan for the organic electronic device; enables a front surface emitting-type organic electronic device to be implemented; can be applied by an inkjet method; can provide a thin display; and can effectively prevent electromagnetic interference due to a low permittivity.

Description

Sealant composition {ENCAPSULATING COMPOSITION}

The present application relates to a sealing material composition, an organic electronic device including the same, and a method for manufacturing the organic electronic device.

An organic electronic device (OED) refers to a device including a layer of an organic material that generates an alternating charge using holes and electrons, and examples thereof include a photovoltaic device, a rectifier, and the like. And a transmitter and an organic light emitting diode (OLED).

Among the organic electronic devices, an organic light emitting diode (OLED) has less power consumption, a faster response speed, and is advantageous for thinning of a display device or lighting compared to a conventional light source. In addition, OLED is excellent in space utilization, and is expected to be applied in various fields across various portable devices, monitors, laptops, and TVs.

In the commercialization of OLED and the expansion of its use, the main problem is durability. Organic materials and metal electrodes included in the OLED are very easily oxidized by external factors such as moisture. Therefore, products containing OLED are highly sensitive to environmental factors. Accordingly, various methods have been proposed to effectively block the penetration of oxygen or moisture from the outside to the organic electronic device such as OLED.

As an example, a technique of forming a passivation film by repeatedly stacking an organic layer and an inorganic layer on the front surface of an organic electronic device is well known. However, it is a major research task to form an organic layer of a thin film according to thinning of an OLED. Even if an organic layer is formed, a method of solving the organic layer of the thin film has been studied because it causes an electromagnetic field interference problem.

This application can effectively block the moisture or oxygen flowing into the organic electronic device from the outside to secure the life of the organic electronic device, and it is possible to implement a front emission type organic electronic device, and it can be applied by an inkjet method. It is possible to provide a display, and provides a sealing material composition and an organic electronic device including the same, which effectively prevent interference of an electromagnetic field due to low dielectric constant.

This application relates to a sealant composition. The sealing material composition may be, for example, an encapsulant applied to encapsulating or encapsulating an organic electronic device such as an OLED. In one example, the sealing material composition of the present application may be applied to encapsulating or encapsulating the entire surface of an organic electronic device. Therefore, after the sealing material composition is applied to the encapsulation, it may exist in the form of an organic layer that seals the entire surface of the organic electronic device. In addition, the organic layer may be laminated on an organic electronic device together with a protective layer and/or an inorganic layer, which will be described later, to form a sealing structure.

In an embodiment of the present application, the present application relates to an encapsulant composition for sealing an organic electronic device applicable to an inkjet process, wherein the composition is designed to have appropriate properties when discharged to a substrate using inkjet printing capable of patterning in a non-contact manner Can be.

In the present specification, the term "organic electronic device" refers to an article or device having a structure including an organic material layer that generates an alternating charge by using holes and electrons between a pair of electrodes facing each other, for example The photovoltaic device, a rectifier, a transmitter, an organic light emitting diode (OLED), and the like, but are not limited thereto. In one example of the present application, the organic electronic device may be an OLED.

Exemplary sealant compositions can be photocurable or thermosetting compositions. The sealing material composition includes an epoxy compound, an oxetane compound, and a photoinitiator. The photoinitiator may be an ionic photoinitiator, or may be a photoinitiator comprising a sulfonium salt. The epoxy compound may include, for example, a straight chain monofunctional compound having 7 or more carbon atoms. In the present application, the monofunctional compound is included in the range of 25 to 81 parts by weight, 28 to 80.5 parts by weight, 33 to 70 parts by weight, 40 to 65 parts by weight, or 45 to 58 parts by weight based on 100 parts by weight of the total epoxy compound in the composition. Can be. The sealant composition of the present application may further include, as the epoxy compound, the monofunctional epoxy compound, as well as an alicyclic compound or a linear or branched polyfunctional aliphatic compound, which will be described later. When calculated as 100, a monofunctional epoxy compound may be included in the weight ratio. The present application can effectively prevent interference between circuits by forming the organic layer of the thin film as well as adjusting the dielectric constant to a low level through the combination of the specific composition of the sealing material composition.

In one example, the type of the straight chain monofunctional compound having 7 or more carbon atoms is a compound having one epoxy group, and is not particularly limited. For example, the monofunctional compound is a compound having a straight chain structure, and may not have a branched chain structure or a cyclic structure. In addition, the monofunctional compound may not include an aromatic structure as an aliphatic compound. In addition, the monofunctional compound is a type of epoxy compound, and includes a cyclic ether group, but may not include an ether group in the molecular structure. That is, the monofunctional compound of the present application may not include ether groups other than cyclic ether groups. The straight chain structure may be in the range of 7 to 30, 8 to 25, 9 to 20 or 10 to 15 carbon atoms. In the present application, by adjusting the sealing material composition to the above-mentioned specific composition combination, it is possible to implement the coating properties of the sealing material composition, the curing properties after curing, and the properties of low dielectric constant. Hereinafter, in the present specification, the linear monofunctional compound having 7 or more carbon atoms may be referred to as a monofunctional compound or a monofunctional epoxy compound.

The sealing material composition of the present application may also include a photoinitiator together with the epoxy compound and the oxetane compound. The photoinitiator may be, for example, an ionic photoinitiator. The photoinitiator may be a compound that absorbs a wavelength in the range of 200 nm to 400 nm. By using the photoinitiator of the present application, excellent curing properties can be realized at a specific composition of the present application.

In one example, the photoinitiator may be a cationic photopolymerization initiator. Can be used a known material in the art for cationic photo-polymerization initiator, for example, aromatic sulfonium, aromatic iodonium, aromatic dia cation portion containing jonyum or aromatic ammonium and _{^{AsF 6 -, SbF 6 -,}} PF 6 ^-, or tetrakis (penta-fluorophenyl) may comprise a compound having an anion portion comprising a borate. In addition, as the cationic photopolymerization initiator, an onium salt or an organometallic salt-based ionized cationic initiator or an organic silane or latent sulfonic acid-based or non-ionic cationic photopolymerization initiator may be exemplified. . As an onium salt-based initiator, a diaryliodonium salt, a triarylsulfonium salt, or an aryldiazonium salt may be exemplified, and an organic metal salt-based initiator The iron arene may be exemplified, and examples of the organosilane-based initiator include o-nitrobenzyl triaryl silyl ether and triaryl silyl peroxide. Or acyl silane (acyl silane), etc. may be exemplified, and as a latent sulfuric acid-based initiator, α-sulfonyloxy ketone or α-hydroxymethylbenzoin sulfonate may be exemplified, but is not limited thereto. .

In one example, the sealing material composition of the present application may include a photoinitiator including a sulfonium salt as a photoinitiator in a specific composition described above, so as to be suitable for use in sealing an organic electronic device by an inkjet method. Although the sealing material composition according to the composition is directly sealed on the organic electronic device, it is possible to prevent chemical damage to the device due to a small amount of outgas. In addition, the photoinitiator containing a sulfonium salt is also excellent in solubility, and can be suitably applied to an inkjet process.

In an embodiment of the present application, the photoinitiator may be included in 1 to 15 parts by weight, 3 to 14 parts by weight, or 7 to 13.5 parts by weight based on 100 parts by weight of the epoxy compound. By applying the photoinitiator content range, the present application can minimize physical and chemical damage to the device due to the properties of the sealing material composition of the present application applied directly on the organic electronic device.

In an embodiment of the present application, the sealant composition may have a dielectric constant of 3.05 or less, 3.05 or less, 3.0 or less, 3.0 or less, 2.95 or less, or 2.9 or less at 100 kHz to 400 kHz and 25° C. after curing with a thin film having a thickness of 20 μm or less. . The lower limit of the dielectric constant is not particularly limited, and may be 0.01 or 0.1. In general, the dielectric constant decreases as the thickness increases, but the present application may have the dielectric constant range even though the thickness of the thin film is 20 μm or less. The lower limit of the thickness may be, for example, 1 μm or 3 μm, and the sealing material composition of the present application may have the dielectric constant range of the present application even when cured to the thickness range of the lower limit. After curing, the sealing material composition of the present application may be adjusted to a low dielectric constant in the above range.

In one example, the epoxy compound may be at least monofunctional or bifunctional or higher. That is, the epoxy functional group may be present in the compound 1 or 2 or more, the upper limit is not particularly limited, but may be 10 or less. In one example, the aforementioned monofunctional epoxy compound among the epoxy compounds may be monofunctional, linear or branched polyfunctional aliphatic compounds may be bifunctional or higher, and alicyclic compounds may be monofunctional or bifunctional or higher. In the present specification, the linear or branched polyfunctional aliphatic compound is distinguished from the alicyclic compound in that it does not have an alicyclic structure within the molecular structure. The epoxy compound implements a suitable degree of crosslinking in the ink composition to realize excellent heat resistance and durability at high temperatures and high humidity.

In embodiments of the present application, the epoxy compound may further include an alicyclic compound and/or a linear or branched multifunctional aliphatic compound. That is, the sealing material composition of the present application may further include at least one of an alicyclic compound and a linear or branched polyfunctional aliphatic compound as an epoxy compound, and may also be included together. In one example, the cycloaliphatic compound may have 3 to 10, 4 to 8 or 5 to 7 ring atoms in the molecular structure, and the compound may have 1 or more or 2 or more and 10 or less cyclic structures. When the alicyclic compound and the linear or branched polyfunctional aliphatic compound are included together, the aliphatic compound of the straight chain or branched chain is 15 parts by weight or more, less than 205 parts by weight, 20 parts by weight with respect to 100 parts by weight of the alicyclic compound Above, less than 205 parts by weight, 23 parts by weight to 204 parts by weight, 30 parts by weight to 203 parts by weight, 34 parts by weight to 202 parts by weight, 40 parts by weight to 201 parts by weight, 60 parts by weight to 200 parts by weight, or 100 parts by weight It may be included in the sealing material composition within the range of 173 parts by weight. By applying the above content range, the present application allows the sealing material composition to prevent device damage in the front sealing of the organic electronic device, has appropriate physical properties capable of inkjetting, has excellent curing strength after curing, and is also excellent. It is possible to implement moisture barrier properties together.

In one example, the epoxy compound of the present application may have an epoxy equivalent weight in the range of 50 to 350 g/eq, 73 to 332 g/eq, 94 to 318 g/eq or 123 to 298 g/eq. In addition, the oxetane compound and/or epoxy compound has a weight average molecular weight of 150 to 1,000 g/mol, 173 to 980 g/mol, 188 to 860 g/mol, 210 to 823 g/mol, 330 to 780 g/mol, and 350 to 495 g /mol. The present application is to control the epoxy equivalent of the epoxy compound to be low or to control the weight average molecular weight of the compound to be low, thereby improving the degree of completion of curing after curing of the sealing material and preventing the inkjet process from being impossible because the viscosity of the composition becomes too high. It can provide moisture barrier properties and excellent curing sensitivity at the same time. In the present specification, the weight average molecular weight means a conversion value for standard polystyrene measured by GPC (Gel Permeation Chromatograph). In one example, a column of metal tube having a length of 250 to 300 mm and an inner diameter of 4.5 to 7.5 mm is filled with 3 to 20 mm Polystyrene bead. When a diluted solution in which a substance to be measured is dissolved in a THF solvent is passed through a column, the weight average molecular weight can be indirectly measured according to the elapsed time. The amount separated by size from the column can be detected by plotting by time. In addition, in this specification, the epoxy equivalent is the number of grams (g/eq) of the resin containing 1 gram equivalent of epoxy group, and can be measured according to the method specified in JIS K 7236.

In an embodiment of the present application, the oxetane compound is 40 to 155 parts by weight, 42 to 150 parts by weight, 45 parts by weight to 145 parts by weight, 48 parts by weight to 144 parts by weight, 63 parts by weight based on 100 parts by weight of the epoxy compound Parts to 143 parts by weight or 68 parts by weight to 142 parts by weight. The term "parts by weight" in the present specification may mean a weight ratio between each component. The present application, by controlling the content ratio of the composition, can form an organic layer in an inkjet method on the organic electronic device, the coated sealant composition has an excellent spreadability within a short time, and after curing the organic layer having excellent curing strength Can provide.

In one example, the oxetane compound may have a boiling point in the range of 90 to 300°C, 98 to 270°C, 110 to 258°C, or 138 to 237°C. This application controls the boiling point of the compound to the above range, and realizes excellent printability even at high temperatures in the inkjet process, and has excellent moisture barrier properties from the outside, and is capable of preventing outgassing and preventing damage to devices. It is possible to provide. The boiling point in this specification may be measured at 1 atmosphere unless otherwise specified.

In the specific example of this application, the kind of the above-mentioned epoxy compound and oxetane compound is not specifically limited.

In one example, the cycloaliphatic epoxy compound is 3,4-epoxycyclohexylmethyl 3',4'-epoxycyclohexanecarboxylate (EEC) and derivatives, dicyclopentadiene dioxide and derivatives, vinylcyclohexene dioxide and derivatives, 1,4-cyclohexanedimethanol bis (3,4-epoxycyclohexane carboxylate) and derivatives may be exemplified, but are not limited thereto. In addition, the linear or branched polyfunctional aliphatic epoxy compound is aliphatic glycidyl ether, 1,4-butanediol diglycidyl ether, ethylene glycol diglycidyl ether, 1,6-hexanediol Diglycidyl ether, propylene glycol diglycidyl ether, diethylene glycol diglycidyl ether, butyl glycidyl ether, 2-ethylhexyl glycidyl ether or neopentyl glycol diglycidyl ether It may include, but is not limited to.

In one example, the structure of the oxetane compound is not limited as long as it has the functional group, for example, OXT-221 of TOAGOSEI, CHOX, OX-SC, OXT101, OXT121, or OXT212, or EHO of ETERNACOLL, OXBP, OXTP or OXMA can be exemplified.

In addition, in one example, a straight chain monofunctional compound having 7 or more carbon atoms is 1,2-epoxyoctane, 1,2-epoxydecane, 1,2-epoxydodecane, 1,2-epoxytetradecane, 1,2-epoxy-9-decene, 1,2-epoxyeicosane, 1,2-epoxyhexadecane or 1,2-epoxyoctadecane, but is not limited thereto.

In an embodiment of the present application, the sealing material composition may further include a surfactant. In one example, the surfactant can include a polar functional group, and the polar functional group can be present at the end of the compound structure of the surfactant. The polar functional group may include, for example, a carboxyl group, hydroxy group, phosphate, ammonium salt, carboxylate group, sulfate or sulfonate. Further, in an embodiment of the present application, the surfactant may be a non-silicone-based surfactant or a fluorine-based surfactant. The non-silicone-based surfactant or fluorine-based surfactant is applied together with the above-described epoxy compound and oxetane compound to provide excellent coating properties on organic electronic devices. On the other hand, in the case of a surfactant including a polar reactor, since the affinity with other components of the above-described sealing material composition is high, it is possible to realize an excellent effect in terms of adhesion. In an embodiment of the present application, a hydrophilic fluorine-based surfactant or a non-silicone-based surfactant can be used to improve inkjet coating properties to a substrate.

Specifically, the surfactant may be a polymer-type or oligomer-type fluorine-based surfactant. The surfactant may be a commercially available product, for example, Glide 100, Glide110, Glide 130, Glide 460, Glide 440, Glide450 or RAD2500 from TEGO, Megaface F-251, F-281, DIC (DaiNippon Ink & Chemicals), F-552, F554, F-560, F-561, F-562, F-563, F-565, F-568, F-570 and F-571, or Surflon S-111, S-112 from Asahi Garas , Fluorad FC-93, FC-95, FC-98, FC-129, FC-135 from S-113, S-121, S-131, S-132, S-141 and S-145 or Sumitomo 3M, FC-170C, FC-430 and FC-4430 or DuPont Zonyl FS-300, FSN, FSN-100 and FSO and BYK BYK-350, BYK-354, BYK-355, BYK-356, BYK-358N, BYK -359, BYK-361N, BYK-381, BYK-388, BYK-392, BYK-394, BYK-399, BYK-3440, BYK-3441, BYKETOL-AQ, BYK-DYNWET 800, etc. You can use

The surfactant is 0.1 parts by weight to 10 parts by weight, 0.05 parts by weight to 10 parts by weight, 0.1 parts by weight to 10 parts by weight, 0.5 parts by weight to 8 parts by weight, or 1 part by weight to 4 parts by weight based on 100 parts by weight of the epoxy compound Can be included. Within the above content range, the present application allows the sealing material composition to be applied to an inkjet method to form an organic layer of a thin film.

In an embodiment of the present application, the sealant composition may further include a light sensitizer to compensate for curability in a long wavelength active energy ray of 300 nm or more. The photosensitizer may be a compound that absorbs a wavelength in the range of 200 nm to 400 nm, 250 nm to 400 nm, 300 nm to 400 nm or 350 nm to 395 nm.

The photosensitizers include anthracene-based compounds such as anthracene, 9,10-dibutoxyanthracene, 9,10-dimethoxyanthracene, 9,10-diethoxyanthracene and 2-ethyl-9,10-dimethoxyanthracene; Benzophenone, 4,4-bis(dimethylamino)benzophenone, 4,4-bis(diethylamino)benzophenone, 2,4,6-trimethylaminobenzophenone, methyl-o-benzoylbenzoate, 3,3 Benzophenone compounds such as -dimethyl-4-methoxybenzophenone, 3,3,4,4-tetra(t-butylperoxycarbonyl)benzophenone; Acetophenone; Ketone compounds such as dimethoxy acetophenone, diethoxy acetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, and propanone; Perylene; Florenone-based compounds, such as 9-Florenone, 2-Croro-9-Prorenone, and 2-methyl-9-Florenone; Thioxanthone, 2,4-diethyl thioxanthone, 2-chloro thioxanthone, 1-chloro-4-propyloxy thioxanthone, isopropyl thioxanthone (ITX), diisopropyl thioxanthone, etc. Thioxanthone compounds; Xanthone compounds such as xanthone and 2-methylxanthone; Anthraquinone compounds such as anthraquinone, 2-methyl anthraquinone, 2-ethyl anthraquinone, t-butyl anthraquinone, and 2,6-dichloro-9,10-anthraquinone; 9-phenylacridine, 1,7-bis(9-acridinyl)heptane, 1,5-bis(9-acridinylpentane), 1,3-bis(9-acridinyl)propane, etc. Acridine compounds; Dicarbonyl compounds such as benzyl, 1,7,7-trimethyl-bicyclo[2,2,1]heptan-2,3-dione, and 9,10-phenanthrenequinone; Phosphine oxide compounds such as 2,4,6-trimethylbenzoyl diphenylphosphine oxide and bis(2,6-dimethoxybenzoyl)-2,4,4-trimethylpentyl phosphine oxide; Benzoate compounds such as methyl-4-(dimethylamino)benzoate, ethyl-4-(dimethylamino)benzoate, and 2-n-butoxyethyl-4-(dimethylamino)benzoate; 2,5-bis(4-diethylaminobenzal)cyclopentanone, 2,6-bis(4-diethylaminobenzal)cyclohexanone, 2,6-bis(4-diethylaminobenzal)-4- Amino synergists such as methyl-cyclopentanone; 3,3-carbonylvinyl-7-(diethylamino)coumarin, 3-(2-benzothiazolyl)-7-(diethylamino)coumarin, 3-benzoyl-7-(diethylamino)coumarin, 3 -Benzoyl-7-methoxy-coumarin, 10,10-carbonylbis[1,1,7,7-tetramethyl-2,3,6,7-tetrahydro-1H,5H,11H-C1]-benzo Coumarin-based compounds such as pyrano[6,7,8-ij]-quinolinazine-11-one; Chalcone compounds such as 4-diethylamino chalcone and 4-azide benzal acetophenone; 2-benzoylmethylene; And it may be at least one selected from the group consisting of 3-methyl-b-naphthothiazoline.

The photosensitizer may be included in the range of 28 parts by weight to 40 parts by weight, 31 parts by weight to 38 parts by weight, or 32 parts by weight to 36 parts by weight based on 100 parts by weight of the photoinitiator. By applying the content of the photo-sensitizer, the present application may realize a synergistic effect at a desired wavelength, while preventing the photo-sensitizer from dissolving in the inkjet coating, thereby preventing adhesion.

The sealing material composition of the present application may further include a coupling agent. This application can improve the adhesion of the cured material of the sealing material composition to the adherend or the moisture permeability of the cured material. The coupling agent may include, for example, a titanium-based coupling agent, an aluminum-based coupling agent, or a silane coupling agent.

In a specific example of the present application, as the silane coupling agent, specifically, 3-glycidyloxypropyltrimethoxysilane, 3-glycidyloxypropyltriethoxysilane, 3-glycidyloxypropyl (dime Epoxy-based silane coupling agents such as methoxy)methylsilane and 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane; Mercapto-based silane coupling agents such as 3-mercaptopropyltrimethoxysilane, 3-mercaptopropyltriethoxysilane, 3-mercaptopropylmethyldimethoxysilane and 11-mercaptoundecyltrimethoxysilane; 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-aminopropyldimethoxymethylsilane, N-phenyl-3-aminopropyltrimethoxysilane, N-methylaminopropyltrimethoxysilane, Amino silane coupling agents such as N-(2-aminoethyl)-3-aminopropyltrimethoxysilane and N-(2-aminoethyl)-3-aminopropyldimethoxymethylsilane; Ureide-based silane coupling agents such as 3-ureidpropyl triethoxysilane, vinyl-based silane coupling agents such as vinyl trimethoxysilane, vinyl triethoxysilane and vinyl methyl diethoxysilane; styryl-based silane coupling agents such as p-styryl trimethoxysilane; Acrylate-based silane coupling agents such as 3-acryloxypropyl trimethoxysilane and 3-methacryloxypropyl trimethoxysilane; Isocyanate-based silane coupling agents such as 3-isocyanatepropyl trimethoxysilane, sulfide-based silane coupling agents such as bis(triethoxysilylpropyl)disulfide and bis(triethoxysilylpropyl)tetrasulfide; And phenyltrimethoxysilane, methacryloxypropyl trimethoxysilane, imidazole silane, and triazine silane.

In the present application, the coupling agent may be included in an amount of 0.1 to 10 parts by weight or 0.5 to 5 parts by weight based on 100 parts by weight of the epoxy compound. The present application can implement the effect of improving adhesion by adding a coupling agent within the above range.

In one example, the sealing material composition may further include an inorganic filler, if necessary. The specific type of the filler that can be used in the present application is not particularly limited, and for example, a kind or mixture of two or more kinds of clay, talc, alumina, calcium carbonate, or silica can be used.

The sealing material composition of the present application may include 0 to 50 parts by weight, 1 to 40 parts by weight, 1 to 20 parts by weight, or 1 to 10 parts by weight of an inorganic filler relative to 100 parts by weight of the epoxy compound have. The present application may provide an encapsulation structure having excellent moisture or moisture barrier properties and mechanical properties by controlling the inorganic filler to preferably 1 part by weight or more. In addition, the present invention can provide a cured product exhibiting excellent moisture barrier properties even when formed as a thin film by controlling the inorganic filler content to 50 parts by weight or less.

The sealing material composition of the present application, if necessary, may further include a moisture adsorbent. The term "moisture adsorbent" may be used in a general sense to refer to a component capable of adsorbing or removing moisture or moisture introduced from the outside through a physical or chemical reaction or the like. That is, it means a chemically reactive adsorbent or a physical adsorbent, and mixtures thereof can also be used.

The specific type of the water adsorbent that can be used in the present application is not particularly limited, and for example, in the case of a chemically reactive adsorbent, a metal oxide, a metal salt, or a mixture of two or more kinds such as phosphorus pentoxide (P ₂ O ₅ ) can be mentioned. In the case of a physical adsorbent, zeolite, zirconia, montmorillonite, etc. may be mentioned.

The sealing material composition of the present application, the water adsorbent, with respect to 100 parts by weight of the epoxy compound, 5 parts by weight to 150 parts by weight, 5 to 110 parts by weight, 5 parts by weight to 90 parts by weight, 10 to 50 parts by weight 12 to 38 parts by weight Or 14 to 23 parts by weight. The sealing material composition of the present application, preferably by controlling the content of the water adsorbent to 5 parts by weight or more, it is possible to make the sealing material composition or its cured product exhibit excellent moisture and moisture barrier properties. In addition, the present application can control the content of the water adsorbent to 150 parts by weight or less, and can be combined with the above-described composition to provide an encapsulation structure of the thin film while having ink-jet properties.

In addition, the water adsorbent has an average particle diameter of 10 to 15000 nm, 30 nm to 10000 nm, 50 nm to 8000 nm, 80 nm to 5 μm, 90 nm to 3 μm, 95 nm to 980 nm or 98 nm to 495 nm. Can be. In the present specification, the particle diameter may be measured by a known method using a D50 particle size analyzer. The moisture adsorbent having the size in the above range can properly control the reaction rate with moisture to effectively block moisture from entering from the outside, and further, in inkjetting, excellent processability can be realized by preventing aggregation of the adsorbent.

As described above, the sealing material composition of the present application may be an ink composition applied to an inkjet process. However, in the inkjet process, it is possible to control the viscosity of the ink composition and realize a composition having properties that can be inkjetted through this, which may correspond to a very detailed operation. However, the above-described moisture adsorbent is included in the composition in the form of particles, and thus, for example, a problem occurs in that the nozzle is clogged or uniform inkjetting is impossible in the inkjetting process due to aggregation or dispersibility in the composition. do. However, the present application provides a sealing material composition having the above-described specific composition, so that even if the moisture absorbent is included, the inkjetting process may be smoothly possible.

In addition to the above-described configuration, the sealing material composition according to the present application may include various additives within a range not affecting the effects of the above-described invention. For example, the sealing material composition may include an antifoaming agent, a tackifier, an ultraviolet stabilizer, or an antioxidant in an appropriate range according to the desired physical properties.

In one example, the sealant composition may be liquid at room temperature, for example, 25°C. In an embodiment of the present application, the sealant composition may be in the form of a solvent-free liquid. The sealing material composition may be applied to encapsulating the organic electronic device, and specifically, may be applied to encapsulating the entire surface of the organic electronic device. The sealing material composition of the present application may have a specific composition and properties so that inkjetting is possible.

In one example, the sealing material composition of the present application may have a contact angle with respect to glass of 15° or less, 12° or less, 10° or less, or 8° or less. The lower limit is not particularly limited, but may be 1° or 3° or more. In the present application, by adjusting the contact angle to 15° or less, spreadability can be secured in a short time in the inkjet coating, and thus an organic layer of a thin film can be formed. In the present application, the contact angle may be measured by applying a drop of the sealing material composition on glass using a measuring method of sessile drop, and may be an average value measured after 5 coatings.

Further, the sealing material composition of the present application may be an ink composition. The sealing material composition of the present application may be an ink composition capable of an inkjetting process. The sealing material composition of the present application may have a specific composition and properties so that inkjetting is possible.

In addition, in an embodiment of the present application, the sealing material composition has a viscosity of 50 cPs or less, 1 to 46 cPs, or 5 to 5, measured by Brookfield's DV-3 at a temperature of 25°C, a torque of 90%, and a shear rate of 100 rpm. 44 cPs. By applying the viscosity of the composition to the above range, the present application can implement ink-jetting physical properties at the time of application to the organic electronic device, and also provide excellent coating properties to provide a thin film encapsulant.

In one example, the sealing material composition has a surface energy of the cured product after curing is 5 mN/m to 45 mN/m, 10 mN/m to 40 mN/m, 15 mN/m to 35 mN/m or 20 mN/m to 30 mN/m. The surface energy may be measured by a method known in the art, for example, by a Ring Method method. The present application can realize excellent coating properties within the surface energy range.

In an embodiment of the present application, surface energy (γ ^surface , mN/m) may be calculated as γ ^surface = γ ^dispersion + γ ^polar . In one example, the surface energy can be measured using a droplet shape analyzer (Drop Shape Analyzer, manufactured by KRUSS, DSA100). For example, the surface energy is applied to a SiNx substrate with a thickness of about 50 μm and a coating area of 4 cm ² (width: 2 cm, length: 2 cm) on the SiNx substrate after formation of the sealing film (spin coater), nitrogen after drying in an atmosphere at room temperature for about 10 minutes then UV cured with the light quantity of 4000mJ / cm ² at an intensity of 1000mW / cm ^2. After curing, the deionized water having a known surface tension on the film is dropped, and the process of obtaining the contact angle is repeated 5 times to obtain the average value of the obtained 5 contact angle values, and equally, the surface tension is known. The diiodomethane is dropped and the process of obtaining the contact angle is repeated 5 times to obtain the average value of the obtained 5 contact angle values. Subsequently, the surface energy can be obtained by substituting a numerical value (Strom value) about the surface tension of the solvent by the Owens-Wendt-Rabel-Kaelble method using the obtained average value of the contact angle for deionized water and diiodmethane.

In one example, the sealing material composition of the present application may have an amount of volatile organic compounds measured after curing of less than 50 ppm. In the present specification, the volatile organic compound may be expressed as outgas. The volatile organic compound can be measured after curing the sealing material composition, and then holding the cured product sample at 110° C. for 30 minutes using a purge trap-gas chromatography/mass spectrometry method. The measurement may be measured using a Purge&Trap sampler (JAI JTD-505III)-GC/MS (Agilent 7890b/5977a) device.

The present application also relates to an organic electronic device. Exemplary organic electronic device 3, as shown in Figure 1, the substrate 31; An organic electronic element 32 formed on the substrate 31; And an organic layer 33 sealing the entire surface of the organic electronic device 32 and including the above-described sealing material composition.

In an embodiment of the present application, the organic electronic device may include a first electrode layer, an organic layer formed on the first electrode layer and including at least a light emitting layer, and a second electrode layer formed on the organic layer. The first electrode layer may be a transparent electrode layer or a reflective electrode layer, and the second electrode layer may also be a transparent electrode layer or a reflective electrode layer. More specifically, the organic electronic device may include a reflective electrode layer formed on a substrate, an organic layer formed on the reflective electrode layer and including at least a light emitting layer, and a transparent electrode layer formed on the organic layer.

In the present application, the organic electronic device 32 may be an organic light emitting diode.

In one example, the organic electronic device according to the present application may be of a top emission type, but is not limited thereto, and may be applied to a bottom emission type.

The organic electronic device may further include a protective layer 35 to protect the electrode and the light emitting layer of the device. The protective layer 35 may be an inorganic protective layer. The protective film may be a protective layer by chemical vapor deposition (CVD, chemical vapor deposition), and the material may be the same or different from the following inorganic layer, and a known inorganic material may be used. For example, silicon nitride (SiNx) may be used as the protective layer. In one example, silicon nitride (SiNx) used as the protective film may be deposited to a thickness of 0.01 μm to 50 μm.

In an embodiment of the present application, the organic electronic device 3 may further include an inorganic layer 34 formed on the organic layer 33. The material of the inorganic layer 34 is not limited, and may be the same as or different from the above-described protective film. In addition, the inorganic layer 34 may be formed in the same way as the protective film 35. In one example, the inorganic layer may be one or more metal oxides or nitrides selected from the group consisting of Al, Zr, Ti, Hf, Ta, In, Sn, Zn and Si. The thickness of the inorganic layer may be 0.01 μm to 50 μm or 0.1 μm to 20 μm or 1 μm to 10 μm. In one example, the inorganic layer of the present application may be an inorganic material containing no dopant, or an inorganic material containing a dopant. The dopant that can be doped is one or more elements selected from the group consisting of Ga, Si, Ge, Al, Sn, Ge, B, In, Tl, Sc, V, Cr, Mn, Fe, Co and Ni or the element It may be an oxide, but is not limited thereto.

In one example, the thickness of the organic layer may be 20 μm or less, 2 μm to 20 μm, 2.5 μm to 15 μm, and 2.8 μm to 9 μm. The present application can provide an organic electronic device of a thin film by providing a thin thickness of the organic layer.

The organic electronic device 3 of the present application may include an encapsulation structure including the above-described organic layer 33 and an inorganic layer 34, and the encapsulation structure includes at least one organic layer and at least one inorganic layer, , The organic layer and the inorganic layer may be repeatedly stacked. For example, the organic electronic device may have a structure of a substrate/organic electronic element/protective film/(organic layer/inorganic layer) n, and n may be a number in the range of 1 to 100. 1 is a cross-sectional view illustrating when n is 1.

In one example, the organic electronic device 3 of the present application may further include a cover substrate present on the organic layer 33. The material of the substrate and/or the cover substrate is not particularly limited, and materials known in the art may be used. For example, the substrate or cover substrate may be a glass, metal substrate, or polymer film. The polymer film is, for example, polyethylene terephthalate film, polytetrafluoroethylene film, polyethylene film, polypropylene film, polybutene film, polybutadiene film, vinyl chloride copolymer film, polyurethane film, ethylene-vinyl acetate film, ethylene -Propylene copolymer film, ethylene-acrylic acid ethyl copolymer film, ethylene-methyl acrylate copolymer film or polyimide film can be used.

In addition, the organic electronic device 3 of the present application, as shown in Figure 2, the cover substrate 38 and the sealing film 37 present between the substrate 31 on which the organic electronic device 32 is formed, It may further include. The encapsulation film 37 may be applied for the purpose of attaching the substrate 31 on which the organic electronic device 32 is formed and the cover substrate 38, for example, an adhesive film solid at room temperature in an uncured state. Or it may be an adhesive film, but is not limited thereto. The encapsulation film 37 may seal the entire surface of the encapsulation structure 36 of the above-described organic and inorganic layers stacked on the organic electronic device 32.

In addition, the present application relates to a method of manufacturing an organic electronic device.

In one example, the manufacturing method includes forming the organic layer 33 so that the above-described sealing material composition seals the entire surface of the organic electronic device 32 on the substrate 31 on which the organic electronic device 32 is formed. It may include.

In the above, the organic electronic device 32 is a substrate 31, for example, a reflective electrode or a transparent electrode is formed on a substrate 31 such as a glass or polymer film by a method such as vacuum deposition or sputtering. It can be produced by forming an organic material layer on a reflective electrode. The organic material layer may include a hole injection layer, a hole transport layer, a light emitting layer, an electron injection layer and/or an electron transport layer. Subsequently, a second electrode is additionally formed on the organic material layer. The second electrode may be a transparent electrode or a reflective electrode.

The manufacturing method of the present application may further include forming a protective layer 35 on the first electrode, the organic material layer, and the second electrode formed on the substrate 31. Then, the above-described organic layer 33 is applied on the substrate 31 to completely cover the organic electronic device 32. At this time, the step of forming the organic layer 33 is not particularly limited, and the above-described sealing material composition on the front surface of the substrate 31 is inkjet printing (Inkjet), gravure coating (Gravure), spin coating, screen printing or reverse offset. Processes such as coating (reverse offset) can be used.

The manufacturing method is also; The method may further include irradiating light to the organic layer. In the present invention, a curing process may be performed on the organic layer encapsulating the organic electronic device. Such curing process) may be performed in, for example, a heating chamber or a UV chamber, and preferably a UV chamber.

In one example, after applying the above-described sealing material composition to form a front organic layer, the composition may be irradiated with light to induce crosslinking. Irradiating the light may include irradiating light having a wavelength range of 250 nm to 450 nm or 300 nm to 450 nm in a range of 0.3 to 6 J/cm ² or 0.5 to 5 J/cm ² .

In addition, the manufacturing method of the present application may further include forming an inorganic layer 34 on the organic layer 33. The step of forming the inorganic material layer, a method known in the art may be used, and may be the same as or different from the aforementioned method for forming a protective film.

This application can effectively block the moisture or oxygen flowing into the organic electronic device from the outside to secure the life of the organic electronic device, and it is possible to implement a front emission type organic electronic device, and it can be applied by an inkjet method. It is possible to provide a display, and provides a sealing material composition and an organic electronic device including the same, which effectively prevent interference of an electromagnetic field due to low dielectric constant.

1 and 2 are cross-sectional views showing an organic electronic device according to an example of the present invention.

Hereinafter, the present invention will be described in more detail through examples according to the present invention and comparative examples not according to the present invention, but the scope of the present invention is not limited by the examples presented below.

Example 1

As an epoxy compound at room temperature, an alicyclic epoxy compound (Celloxide 2021P from Daicel), an aliphatic polyfunctional epoxy compound (HAJIN CHEM TECH, DE203) and a monofunctional epoxy compound (1,2-Epoxydecane), an oxetane compound (OXT- from TOAGOSEI 101), a photoinitiator containing a sulfonium salt (CPI-310B from San-Apro) and a fluorine-based surfactant (F552 from DIC) 20:7.5:15:50:1.5:1.0 (Celloxide2021P: DE203: 1,2-Epoxydecane) : OXT-101: CPI-310B: F552) was added to the mixing vessel.

A uniform sealing material composition was prepared by using the mixing container using a Planetary mixer (Kurabo, KK-250s).

Example 2

A sealing material composition was prepared in the same manner as in Example 1, except that the photoinitiator was changed to I290 by BASF as a photoinitiator containing a sulfonium salt.

Example 3

A sealing material composition was prepared in the same manner as in Example 1, except that the photoinitiator was changed to GSID26-1 of BASF as a photoinitiator containing a sulfonium salt.

Comparative Example 1

Alicyclic epoxy compound, aliphatic polyfunctional epoxy compound, monofunctional epoxy compound, oxetane compound, photoinitiator and surfactant 10:1.5:50:31:1.5:1.0 (Celloxide2021P: DE203: 1,2-Epoxydecane: OXT- 101: CPI-310B: F552) was prepared in a sealing material composition in the same manner as in Example 1, except that it was added to the mixing vessel.

Comparative Example 2

Alicyclic epoxy compounds, aliphatic polyfunctional epoxy compounds, monofunctional epoxy compounds, oxetane compounds, photoinitiators and surfactants 25:7.5:10:50:1.5:1.0 (Celloxide2021P: DE203: 1,2-Epoxydecane: OXT- 101: CPI-310B: F552) was prepared in a sealing material composition in the same manner as in Example 1, except that it was added to the mixing vessel.

Comparative Example 3

Alicyclic epoxy compounds, aliphatic polyfunctional epoxy compounds, monofunctional epoxy compounds, oxetane compounds, photoinitiators and surfactants 25:18:0:49.5:1.5:1.0 (Celloxide2021P: DE203: 1,2-Epoxydecane: OXT- 101: CPI-310B: F552) was prepared in a sealing material composition in the same manner as in Example 1, except that it was added to the mixing vessel.

Comparative Example 4

A sealing material composition was prepared in the same manner as in Example 1, except that the monofunctional epoxy compound was changed to 1,2-Epoxybutane.

Comparative Example 5

A sealing material composition was prepared in the same manner as in Example 1, except that the monofunctional epoxy compound was changed to O-cresyl glycidyl ether.

Comparative Example 6

A sealing material composition was prepared in the same manner as in Example 1, except that the monofunctional epoxy compound was changed to 2-ethylhexyl ether.

Comparative Example 7

A sealant composition was prepared in the same manner as in Example 1, except that the photoinitiator was changed to WPI170 of TOKYO CHEMICAL INDUSTRY (TCI) as a photoinitiator containing iodonium salt.

Comparative Example 8

A sealing material composition was prepared in the same manner as in Example 1, except that the photoinitiator was changed to UV692 of TETRACHEM as a photoinitiator containing iodonium salt.

Comparative Example 9

A sealing material composition was prepared in the same manner as in Example 1, except that the photoinitiator was changed to Irgacure PAG 103 of BASF as a nonionic photoinitiator.

Physical properties in Examples and Comparative Examples were evaluated in the following manner.

1. Contact angle measurement (spreadability)

For the sealing material compositions prepared in Examples and Comparative Examples, the contact angle to glass was measured at 25°C. The sealing material composition is injected into a syringe, dropped to a volume of 5 µl, and photographed with a CCD camera to measure it. The average value of 5 times was used, and the equipment used was DUS100 of KRUSS. When the adhesive angle was less than 10°, the spreadability was excellent.

2. Organic layer thickness

When ink-jetting the sealing material composition prepared in Examples and Comparative Examples, it can be judged as good (O) when the organic layer is formed with a thickness of 20 µm or less, and normal (△) when the organic layer is formed with a thickness of 40 µm or less. , If the organic layer is formed with a thickness of 60㎛ or less, it is classified as defective (X). In the case of Comparative Example 2, as shown in Table 1 below, it was practically impossible to form an organic layer of a thin film having a thickness of 20 μm or less.

3. Measurement of curing sensitivity

The tack free time of the adhesive was measured after irradiating UV of 1 J/cm ² with the strength of 1000 mW/cm ² of the sealing material composition prepared in Examples and Comparative Examples. First, the sealant composition is spin-coated and coated to a thickness of 10 μm and cured. Immediately after curing, when the surface of the sealing material is touched, the tacky feeling disappears, and the time until the sealing material does not come out at all is defined as the tack free time. When the tack free time was less than 1 second, it was classified as ◎, when less than 1 minute, △ when more than 5 minutes, and X when more than 30 minutes.

4. Measurement of dielectric constant

An Al plate (Conductive plate) was deposited on the cleaned bare glass at 500 Pa. Inkjet coating the sealing material composition prepared in Examples and Comparative Examples on the deposited Al plate surface, and curing the coated composition with a light amount of 1000 mJ/cm ² through an LED UV lamp to form an organic layer having a thickness of 8 μm. Did. On the organic layer, an Al plate (Conductive plate) was deposited at 500 Pa.

Thereafter, the capacitance value of the Al plate was measured at 100 kHz and 25° C. using an Impedence meter Agilent 4194A. Through the measured values, the dielectric constant of the organic layer was calculated using the following calculation formula.

C = εr · εo · A/D (C: Capacitance of Al plate, εr: Dielectric constant of organic layer, εo: Vacuum dielectric constant, A: Area of Al plate, D: Distance between two Al plates)

In the present application, the dielectric constant is a relative value (ratio) to the dielectric constant in the vacuum when the dielectric constant in the vacuum is 1.

5. Outgas measurement

After curing the sealing material composition prepared in Examples and Comparative Examples by irradiating 1J/cm ² with UV at a strength of 1000 mW/cm ² , 50 mg of a cured product sample is purged and trapped-gas chromatography/mass After maintaining at 110°C for 30 minutes using an analytical method, the amount of the volatile organic compound was measured. The measurement was measured using a Purge&Trap sampler (JAI JTD-505III)-GC/MS (Agilent 7890b/5977a) instrument. ◎ when the measured amount is less than 50ppm, O when less than 100ppm, X when more than 100ppm.

6. Dark Spot Measurement

The sealing material compositions prepared in Examples and Comparative Examples were coated on an organic electronic device on which an inorganic vapor deposition film (chemical vapor deposition film) was formed. Thereafter, curing was performed by irradiating 1J/cm ² UV with an intensity of 1000 mW/cm ² . With respect to the cured organic layer, the temperature of 85° C. and 85% RH was set at 300° C. for 300 hours, and then the luminous form was observed. When there were no dark spots due to foreign substances, O, 1-2 dark spots were observed, △, and when more than 3 dark spots were generated, it was classified as X.

Spreadability thickness Hardening sensitivity permittivity Outgas Dark Spot Example 1 O O ◎ 2.94 ◎ O Example 2 O O ◎ 2.93 O O Example 3 O O O 2.94 O △ Comparative Example 1 O O △ 2.56 X X Comparative Example 2 △ △ O 3.09 O O Comparative Example 3 O O O 3.46 ◎ O Comparative Example 4 O O ◎ 3.43 ◎ O Comparative Example 5 O O ◎ 3.08 ◎ O Comparative Example 6 O O ◎ 3.12 ◎ O Comparative Example 7 O O O 2.97 X X Comparative Example 8 O O O 2.94 X X Comparative Example 9 O O O 2.95 X X

Although Comparative Examples 1 and 7 to 9 exhibited relatively low dielectric constant, a large amount of outgas was generated and a large amount of dark spots were observed. Highly measured. Therefore, the comparative examples did not simultaneously satisfy the low dielectric constant characteristics, outgas requirements and dark spot suppression.

3: Organic electronic device
31: substrate
32: organic electronic device
33: organic layer
34: inorganic layer
35: protective film
36: bag structure
37: sealing film
38: cover substrate

Claims (18)

An ionic photoinitiator comprising an epoxy compound, an oxetane compound and a sulfonium salt, and the epoxy compound includes a straight chain monofunctional compound having 7 or more carbon atoms,
The monofunctional compound is a sealing material composition contained within a range of 25 to 81 parts by weight based on 100 parts by weight of the total epoxy compound in the composition. The sealing material composition of claim 1, having a dielectric constant of 3.05 or less at 100 kHz to 400 kHz and 25° C. after curing with a thin film having a thickness of 20 μm or less. The sealing material composition of claim 1, wherein the monofunctional compound does not have a branched chain structure. The sealing material composition of claim 1, wherein the monofunctional compound does not have an ether group. The sealing material composition of claim 1, wherein the epoxy compound further comprises an alicyclic compound and/or a linear or branched multifunctional aliphatic compound. The sealant composition according to claim 5, wherein the alicyclic compound has a ring-constituting atom in the molecular structure within a range of 3 to 10. The method of claim 5, wherein the linear or branched polyfunctional aliphatic compound is contained within a range of 15 parts by weight or more and less than 205 parts by weight based on 100 parts by weight of the alicyclic compound. The sealing material composition of claim 1, wherein the oxetane compound is included in a range of 40 parts by weight to 155 parts by weight based on 100 parts by weight of the epoxy compound. The method of claim 1, wherein the epoxy compound or oxetane compound is a sealing material composition having a weight average molecular weight in the range of 150 to 1,000g / mol. The sealant composition of claim 1, wherein the photoinitiator is contained in an amount of 1 to 15 parts by weight based on 100 parts by weight of the epoxy compound. The sealing material composition of claim 1, further comprising a surfactant. 12. The composition of claim 11, wherein the surfactant comprises a polar functional group. The sealing material composition of claim 11, wherein the surfactant is contained in an amount of 0.01 to 10 parts by weight based on 100 parts by weight of the epoxy compound. The sealing material composition according to claim 1, which is a solvent-free ink composition. Board; An organic electronic device formed on a substrate; And an organic layer sealing the entire surface of the organic electronic device and including the sealing material composition according to claim 1. 16. The organic electronic device of claim 15, wherein the organic layer has a thickness of 20 µm or less. A method of manufacturing an organic electronic device, comprising forming an organic layer on the substrate on which the organic electronic device is formed, so that the sealing material composition of claim 1 seals the entire surface of the organic electronic device. 18. The method of claim 17, wherein forming the organic layer comprises inkjet printing, gravure coating, spin coating, screen printing or reverse offset coating.

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