KR20200047062A - An Apparatus for Treating a Medical Material with a Plasma - Google Patents

Abstract

The present disclosure relates to an apparatus for treating a medical material with plasma. More specifically, the present disclosure relates to a medical plasma treatment apparatus, capable of treating a medical material or a dental material with plasma to improve a treatment effect. The medical plasma treatment apparatus includes: a discharging module (11) having an electrode module arranged for generating plasma; an induction tube (12) to inject discharge gas into the discharging module (11); and a discharging tube (13) to inject a treatment material into the discharging module (11). The electrode module includes a plurality of ring groups (21_1 to 21_K, and 23_1 to 23_K) to surround the discharging tube (13) having a hollowed structure and formed of a dielectric material.

Description

Plasma device for medical treatment {An Apparatus for Treating a Medical Material with a Plasma}

The present invention relates to a plasma processing apparatus for medical materials, and specifically to a medical plasma processing apparatus for treating a medical material or a dental material with plasma so that the treatment effect is increased.

Currently, most dental implant makers blow sand grains on the machined surface with strong pressure to increase the surface area of the machined surface by expanding the surface area of the implant to increase bone adhesion through the expansion of the implant's surface area. A method of further expanding the surface area through solution treatment, a method of treating the acid solution after hitting the aluminum oxide particles strongly on the surface, a method of spraying hot melted titanium particles with a nozzle, and a method of rapidly spraying onto the surface of the implant and hydroxyapatite It is shipped after treatment such as a method of coating the surface, but the effect is lost due to the formation and contamination of the oxide film in the distribution process.

When the plasma generated by the electric discharge between the anode and the cathode contacts the surface of various types of objects, the surface properties of the object may change. For example, by performing a surface treatment with plasma in advance before the implant (dental implant) is performed, bio-films can be created and bacteria can be removed, and the hydrophobicity of the treated surface is made hydrophilic. It promotes cell differentiation and improves activity, and high surface energy by forming a large surface area and imparting hydrophilicity improves adhesion to tissues, thereby increasing osteoblast cell adhesion, which is beneficial for bone regeneration, removing titanium oxide film, emitting ultraviolet and ozone It can also eliminate the inflammatory response of soft tissues by sterilization by shortening the initial treatment time and improving the successful treatment and effectiveness. By treating the surface of the implant with plasma, physical or chemical properties such as surface roughness or hardness can be changed. In addition, by performing a plasma treatment in an appropriate manner, it is possible to prevent various types of side effects caused by the implant procedure. Patent No. 10-1853646 discloses a method for surface treatment of a zirconia implant using atmospheric plasma. In addition, Patent No. 10-1835623 discloses a method of forming a porous oxide film using a plasma electrolytic oxidation method on a titanium-based alloy surface, which is a metal material that is inserted into a bone in a human body and used. However, the prior art does not disclose a plasma treatment apparatus in which an individual doctor or operator can perform plasma treatment by a simple method before the procedure.

The present invention is to solve the problems of the prior art has the following purposes.

Prior Art 1: Patent Registration No. 10-1853646 (Chonnam University Industrial-Academic Cooperation Foundation, announced on May 2, 2018) Surface treatment method of zirconia implant using atmospheric plasma Prior Art 2: Patent Registration No. 10-1835623 (Chosun University Industry-Academic Cooperation Foundation, published on March 07, 2018) Electrolyte composition containing magnesium and silicon in plasma electrolytic oxidation process and magnesium and silicon ions using the composition Method for manufacturing dental implant coated with apatite hydroxide

An object of the present invention is to provide a plasma treatment apparatus for medical treatment that can be easily generated for a short period of time immediately before plasma treatment of a medical material is directly performed at a treatment site by a discharge module capable of generating plasma.

According to a preferred embodiment of the present invention, a medical plasma processing apparatus includes a discharge module in which an electrode module for generating plasma is disposed; An induction tube for injecting discharge gas into the interior of the discharge module; And a discharge tube for injecting a treatment material into the interior of the discharge module, wherein the electrode module is composed of a plurality of electrode ring groups surrounding a discharge tube made of a hollow dielectric material.

According to another suitable embodiment of the present invention, the plurality of electrode ring groups consists of a first electrode ring group and a second electrode ring group that are electrically isolated from each other.

According to another suitable embodiment of the present invention, each electrode unit forming a plurality of electrode ring groups is disposed separately from each other along a discharge tube in a circular ring shape.

The plasma treatment apparatus of the medical material according to the present invention prevents side effects caused by the treatment and improves the treatment effect and improves the treatment effect by surface treatment by plasma before various dental materials or medical materials including implant materials are treated Shorten the period. In addition, the plasma processing apparatus according to the present invention is structurally simple and allows medical materials to be processed in various ways. Accordingly, an implant material or a medical material having various materials or structures is subjected to plasma treatment to be suitable for it. In addition, by inserting an implant sample in a discharge module that generates plasma, the sample can be surface-treated for a certain period of time, and a simple timer can be used to apply electrical energy required for the inflow and discharge of necessary gases. It implements device technology that enables users who are not skilled in machinery to use easily and safely.

1 shows an embodiment of a discharge module applied to a plasma processing apparatus of a medical material according to the present invention.
Figure 2 shows an embodiment of an electrode module applied to the plasma processing apparatus of a medical material according to the present invention.
Figure 3 shows an embodiment of a plasma processing apparatus of a medical material according to the present invention.
4 shows an embodiment of a dental implant processed by the treatment apparatus according to the present invention.

The present invention will be described in detail below with reference to the embodiments presented in the accompanying drawings, but the embodiments are intended for a clear understanding of the present invention and the present invention is not limited thereto. In the following description, components having the same reference numerals in different drawings have similar functions, and are not described repeatedly unless necessary for understanding of the invention, and well-known components are briefly described or omitted, but the present invention It should not be understood as being excluded from the embodiment.

Figure 1 shows an embodiment of a plasma processing apparatus of a medical material according to the present invention.

Referring to FIG. 1, a processing apparatus for plasma processing of a medical material includes a discharge module 11 in which an electrode module for generating plasma is disposed; An induction tube 12 for injecting a discharge gas into the discharge module 11; And a discharge tube 13 for injecting a treatment material into the interior of the discharge module 11, the electrode module comprising a plurality of electrode ring groups 21_1 to 21_K surrounding the discharge tube 13 made of a hollow dielectric material, and 23_1 to 23_K).

The plasma processing apparatus includes a discharge module 11; A case in which the discharge module 11 is accommodated; And a control means, and the discharge module 11 may have a function of generating plasma and treating the surface of the implant material or medical material with plasma. The discharge module 11 may be formed of an insulating material module case and an electrode module disposed inside the module case. The module case may be made of synthetic resin or similar insulating material, and a receiving space having a closed structure may be formed therein. The induction tube 12 may be guided to the outside of the module case, and the induction tube 12 may have a structure capable of injecting discharge gas into the discharge tube 13. Specifically, a connection connector 121 for connection of an external tube may be coupled to the module case, and an induction tube 12 may be coupled to the connection connector 121. The induction tube 12 may be made of a structure capable of gas flow, and the discharge gas introduced through the induction tube 12 may be guided to the inside of the discharge tube 13 via the connection connector 121. . Argon (Ar) or a similar inert gas may be injected into the induction tube 12, or nitrogen or a gas located in the same cycle may be injected. The induction tube 12 can be connected to the injection control means through an appropriate induction conduit, and can be connected to the flow measurement means. The controlled amount of discharge gas can be guided to the discharge tube 13 through the induction tube 12.

A portion of the discharge tube 13 may be protruded from the other side of the portion where the connection connector 121 is installed or other suitable location. The discharge tube 13 may extend from the outside of the module case to the inside to be connected to the connection connector 121. The discharge tube 13 can be made of, for example, quartz, tempered glass, ceramic material or similar dielectric material. The discharge tube 13 may be made of a material having a suitable withstand voltage and insulation, for example, a breakdown voltage of 1,000 VDC or more, and a dielectric constant of 16 or more. The discharge tube 13 may have a hollow cylinder structure, and an electrode module for generating plasma may be disposed inside the module case of the discharge tube 13. A pair of electrode cables 141 and 142 connected to the electrode module may be discharged to the outside of the module case. Further, a voltage is induced to the electrode module through the electrode cables 141 and 142, and plasma can be generated from the discharge gas by the discharge voltage.

Figure 2 shows an embodiment of an electrode module applied to the plasma processing apparatus according to the present invention.

Referring to FIG. 2, the electrode module is composed of a plurality of electrode ring groups 21_1 to 21_K and 23_1 to 23_K surrounding the discharge tube 13 made of a hollow insulating material. The discharge tube 13 may have a hollow cylinder shape with both sides open, and an electrode module may be disposed on the outer circumferential surface of the discharge tube 13. The electrode module may be formed of a plurality of electrode units 21_1 to 21_K and 23_1 to 23_K each having a circular ring or circular band shape. The plurality of electrode units 21_1 to 21_K and 23_1 to 23_K may be formed of first electrode ring groups 21_1 to 21_K and second electrode ring groups 23_1 to 23_K, but is not limited thereto. For example, the plurality of electrode units 21_1 to 21_K and 23_1 to 23_K may consist of at least two sub-electrode groups, and the at least two sub-electrode groups again include two first electrode ring groups 21_1 to 21_K. It may be divided into two electrode ring groups 23_1 to 23_K. In addition, first and second electrode cables 141 and 142 may be connected to the first electrode ring groups 21_1 to 21_K and the second electrode ring groups 23_1 to 23_K, respectively. Each of the electrode units 21_1 to 21_K and 23_1 to 23_K may have a circular ring shape or a circular band shape, and may be electrically separated or insulated from each other. Further, each of the electrode units 21_1 to 21_K and 23_1 to 23_K may be fixed to the outer circumferential surface of the discharge tube 13 by appropriate bonding means. The electrode units 21_1 to 21_K and 23_1 to 23_K electrically separated from each other may be connected to each other to form the first electrode ring groups 21_1 to 21_K and the second electrode ring groups 23_1 to 23_K. For example, the electrode units 21_1 to 21_K and 23_1 to 23_K, which are separated from each other and continuously disposed along the longitudinal direction of the discharge tube 13, are conductive connecting means 22_1 to 22_L such as a connecting cable, conductive tape or conductive pattern, and 24_1 to 24_L) may be connected to form first electrode ring groups 21_1 to 21_K and second electrode groups 23_1 to 23_K, each of which maintain the potential of the same polarity. The plurality of electrode units 21_1 to 21_K and 23_1 to 23_K are alternately connected to each other by the first conductive connecting means 22_1 to 22_L and the second conductive connecting means 24_1 to 24_L to form the first electrode ring group 21_1 To 21_K) and the second electrode ring groups 23_1 to 23_K. The first and second electrode cables 141 and 141 are respectively connected to one electrode unit (for example, 21_1 and 23_1) forming the first electrode ring groups 21_1 to 21_K and the second electrode ring groups 23_1 to 23_K, respectively. 142) may be connected. The conductive connecting means 22_1 to 22_L and 24_1 to 24_L may be a conductive tape, a conductive pattern, a covering cable or a connecting means having similar conductive properties. Each of the second electrode units 23_1 to 23_K forming the second electrode ring groups 23_1 to 23_K between each of the first electrode units 21_1 to 21_K forming the first electrode ring groups 21_1 to 21_K This can be located. In addition, the first electrode units (for example, 21_1 and 21_2) adjacent to each other may be connected by the first conductive connection means (for example, 22_1). The second electrode units (for example, 23_1 to 23_2) adjacent to each other may be It may be connected by a second conductive connecting means (for example, 24_1). As described above, while each electrode unit 21_1 to 21_K and 23_1 to 23_K is formed in a circular ring or band shape, electrode units 21_1 to 21_K and 23_1 to 23_K having different polarities are alternately arranged to discharge tubes ( As a uniform electric field is formed inside 13), discharge is induced at a low electric potential to generate plasma. The first electrode units 21_1 to 21_K forming the first electrode ring groups 21_1 to 21_K are connected to each other by the first conductive connecting means 22_1 to 22_L and have the same first potential. In addition, the second electrode units 23_1 to 23_K forming the second electrode ring groups 22_1 to 22_K are connected to each other by the second conductive connecting means 24_1 to 24_L, and the second potential having a different polarity from the first potential. Can form. The first electrode cable 141 may be connected to any electrode units 21_1 to 21_K forming the first electrode ring group, and second to any electrode units 23_1 to 23_K forming the second electrode ring group. The electrode cable 142 may be connected. In addition, a voltage difference is maintained between the first electrode ring groups 21_1 to 21_K and the second electrode ring groups 23_1 to 23_K that are electrically separated from each other by connecting power to each of the electrode cables 141 and 142.

Each of the electrode units 21_1 to 21_K and 23_1 to 23_K may be arranged to have the same or different separation intervals. For example, the separation distance between the first electrode unit (for example, 21_1) and the second electrode unit (for example, 23_1) to which the first electrode cable 141 and the second electrode cable 142 are connected is small, and other The separation intervals between the electrode units 21_2 to 21_K and 23_2 to 23_K may be arranged to be relatively uniform while making them relatively large. In addition, conductive tapes or wires may be attached to the first and second electrode cables 141 and the electrode units (for example, 21_1 and 23_1) so that discharge occurs in a low voltage condition, but is not limited thereto. Each of the electrode units 21_1 to 21_K to 23_1 to 23_K and conductive connecting means 22_1 to 22_L and 24_1 to 24_L may be electrically connected by soldering or similar means, but is not limited thereto.

The electrode units 21_1 to 21_K and 23_1 to 23_K having various structures are disposed on the circumferential surface of the discharge tube 13 and can be connected to each other in various ways and are not limited to the presented embodiments.

3 shows an embodiment of a plasma processing apparatus according to the present invention.

Referring to FIG. 3, the plasma processing apparatus includes a housing 31 having an accommodation space therein; Operation adjustment means formed on one side of the housing 31; Insert clamp 35 for fixing the processing material such as, for example, the implant to fix the inside of the discharge tube; And a treatment inlet 36 into which the material to be treated is inserted. The discharge module may be disposed inside the housing 31, and as described above, a portion of the discharge tube may protrude to the outside of the discharge module to be made into a structure in which the front portion of the insertion clamp 35 can be inserted. have. The housing 31 may have a box shape, and various operation adjusting means may be disposed on the front surface of the housing 31. The operation adjusting means may include, for example, an on / off switch 32, a discharge gas adjusting means 33, a timer for adjusting the exposure time, or similar adjusting means. It can be secured to the insertion clamp 35 for plasma treatment of an implant or similar medical material (IM). The insertion clamp 35 includes a handling block 351; An engaging portion 352 formed on the front side of the handling block 351; And a fixing portion 353 formed on the front side of the coupling portion 352. A medical material (IM) such as an implant can be secured to the fixation portion 353, and can be positioned inside the discharge tube disposed therein through the treatment inlet 36. Discharge gas may be injected into the discharge tube by the operation of the discharge gas regulating means 33, and the exposure time may be set by the timer 34. In addition, a voltage may be applied by the operation of the timer 34 and the on / off switch 32 to generate plasma by discharge between different electrodes, and thus may be a surface treatment of the medical material IM. Thereafter, the insertion clamp 35 is separated from the processing device so that the medical material IM can be used in a predetermined manner.

The processing device can be made in a variety of ways and is not limited to the embodiments presented.

4 shows an embodiment of a dental implant processed by the treatment apparatus according to the present invention.

Referring to FIG. 4, the medical material IM is fixed to the insertion clamp 35 and is injected into the interior of the housing 31 through the processing inlet 36 to be plasma treated. For example, treatment conditions may be 10 to 20 V, argon (Ar) 1 to 10 standard liters per minute (slm), and 10 to 120 seconds. As can be seen from the results of the treatment, it can be seen that the surface of the implant material changes from hydrophobic to hydrophilic. Depending on the treatment conditions, various surface modification effects may be exhibited and are not limited to the presented examples.

The present invention has been described in detail with reference to the presented embodiments, but those skilled in the art will be able to make various modifications and modified inventions without departing from the technical spirit of the present invention with reference to the presented embodiments. . The present invention is not limited by such modified and modified inventions, but is limited by the appended claims.

11: Discharge module 12: Induction tube
13: discharge tube
21_1 to 21_K and 23_1 to 23_K: electrode unit
22_1 to 22_L and 24_1 to 24_L: conductive connecting means
31: housing 32: on / off switch
33: discharge gas control means 34: timer
35: Insert clamp 36: Processing inlet
121: connecting connector 141, 142: electrode cable
351: handling block 352: engaging portion
353: Fixed part IM: Medical material

Claims (3)

In the treatment device for the plasma treatment of a medical material,
A discharge module 11 in which an electrode module for generating plasma is disposed;
An induction tube 12 for injecting a discharge gas into the discharge module 11; And
Discharge module 11 includes a discharge tube 13 for injecting a treatment material into the interior,
The electrode module is a medical plasma processing apparatus comprising a plurality of electrode ring groups (21_1 to 21_K and 23_1 to 23_K) surrounding a discharge tube (13) made of a hollow dielectric material. The method according to claim 1, The plurality of electrode ring groups (21_1 to 21_K and 23_1 to 23_K) is a medical plasma consisting of a first electrode ring group (21_1 to 21_K) and second electrode ring groups (23_1 to 23_K) electrically insulated from each other Processing unit. The method according to claim 1, Each of the electrode units forming a plurality of electrode ring groups (21_1 to 21_K and 23_1 to 23_K) is disposed in a circular ring shape is separated from each other along the discharge tube 25 Medical plasma treatment characterized in that Device.

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