KR20200039926A - Etchant for microstructure analysis for heat treated medium carbon steel by high frequency currents and etching method using the same - Google Patents

Etchant for microstructure analysis for heat treated medium carbon steel by high frequency currents and etching method using the same Download PDF

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KR20200039926A
KR20200039926A KR1020180119521A KR20180119521A KR20200039926A KR 20200039926 A KR20200039926 A KR 20200039926A KR 1020180119521 A KR1020180119521 A KR 1020180119521A KR 20180119521 A KR20180119521 A KR 20180119521A KR 20200039926 A KR20200039926 A KR 20200039926A
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carbon steel
medium carbon
etching
treated medium
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이대형
반상현
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현대위아 주식회사
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
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    • C23F1/28Acidic compositions for etching iron group metals
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    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
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    • G01N1/28Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
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Abstract

The present invention relates to an etching solution which can be suitably used when observing a microstructure of high-frequency heat-treated carbon steel with a large difference between an internal structure and a surface structure, suppress unevenness of etching on a surface portion and the generation of adsorbents generated in an etching process, and thus enables the acquisition of etching structure to make analysis easy. The etching solution according to the present invention is composed of: 1.8-2.0 wt% of picric acid, 2.4-2.6 wt% of sodium dodecylbenzenesulfonate, 1-2 wt% of hydrochloric acid, 0.01-0.02 wt% of cupric chloride, and 0.004-0.01 wt% of ferric chloride, and a balance solvent.

Description

고주파 열처리된 중탄소강의 미세조직 분석을 위한 에칭 용액, 이를 이용한 에칭 방법 {ETCHANT FOR MICROSTRUCTURE ANALYSIS FOR HEAT TREATED MEDIUM CARBON STEEL BY HIGH FREQUENCY CURRENTS AND ETCHING METHOD USING THE SAME}Etching solution for microstructure analysis of high-frequency heat-treated medium carbon steel, and etching method using the same {ETCHANT FOR MICROSTRUCTURE ANALYSIS FOR HEAT TREATED MEDIUM CARBON STEEL BY HIGH FREQUENCY CURRENTS AND ETCHING METHOD USING THE SAME}

본 발명은 고주파 열처리된 탄소강의 미세조직 관찰 시에 사용되는 에칭 용액과 이 에칭 용액을 이용한 에칭 방법에 관한 것이다.The present invention relates to an etching solution used for observing the microstructure of high-frequency heat-treated carbon steel and an etching method using the etching solution.

금속의 물성/품질을 평가하는 방법의 하나의 기준인 결정 입도를 분석하기 위해서는, 현미경으로 분석하기 전에 경면 연마된 금속의 표면을 에칭하여 결정 입계가 현출되도록 하는 에칭 과정이 필요하다.In order to analyze the crystal grain size, which is one criterion of a method for evaluating the physical properties / quality of a metal, an etching process is required to etch the surface of the mirror-polished metal to reveal crystal grain boundaries before analysis under a microscope.

중탄소강의 표면을 에칭하는 방법으로, 종래, 물 100 ~ 120㎖, 피크린산 4 ~ 5g, 계면활성제 4 ~ 5g, 염산(HCl) 0.4 ~ 1.0㎖으로 이루어진 에칭 용액을 60 ~ 90℃로 가열 유지시키는 단계와, 상기 용액에 시험편을 담근 후 40 ~ 60초간 유지시키는 단계와, 시험편을 용액으로부터 꺼내어 세척 및 건조하는 단계를 포함하는 방법이 알려져 있다.As a method of etching the surface of medium carbon steel, conventionally, an etching solution consisting of 100 to 120 ml of water, 4 to 5 g of picric acid, 4 to 5 g of surfactant, and 0.4 to 1.0 ml of hydrochloric acid (HCl) is heated and maintained at 60 to 90 ° C. A method is known that includes a step, immersing the test piece in the solution and maintaining it for 40 to 60 seconds, and taking the test piece out of the solution, washing and drying it.

그런데, 고주파 열처리된 중탄소강(C: 0.3 ~ 0.5중량%)의 경우, 내부조직은 페라이트(ferrite)와 펄라이트(pearlite)의 혼합조직으로 이루어지고, 표면조직은 열처리에 의해 마르텐사이트(martensite)로 이루질 수 있는데, 상기한 에칭 방법을 적용할 경우, 내부조직과 표면조직 간의 부식속도 차이에 의해, 내부조직은 과에칭되고 표면조직은 결정립의 경계가 희미하게 현출되는 문제점이 있을 뿐만 아니라, 에칭 조직에 흑색 흡착물이 생성되어 결정립을 분석하는데 어려움을 초래한다.By the way, in the case of medium-high-frequency heat-treated medium carbon steel (C: 0.3 to 0.5% by weight), the internal structure is composed of a mixed structure of ferrite and pearlite, and the surface structure is converted to martensite by heat treatment. When the above-described etching method is applied, the internal structure is over-etched and the surface structure has a problem that the boundary of the crystal grains is faintly etched due to a difference in corrosion rate between the internal and surface tissues. Black adsorbate is formed in the tissue, which causes difficulty in analyzing the grains.

대한민국 공개특허공보 특1995-0019701Republic of Korea Patent Publication No. 1995-0019701

본 발명의 일 목적은, 고주파 열처리된 중탄소강(C: 0.3 ~ 0.5중량%) 표면부의 결정 입도 측정에 있어, 고주파 열처리부의 에칭이 불균일하게 이루어지거나 산화물의 흡착이 생기는 문제를 해결하여, 미세조직을 명확하게 현출할 수 있도록 하는 에칭 용액을 제공하는 것이다.One object of the present invention, in the measurement of the crystal grain size of the surface portion of the high-frequency heat-treated medium carbon steel (C: 0.3 ~ 0.5% by weight), to solve the problem of the non-uniform etching of the high-frequency heat-treated portion or adsorption of oxides, microstructure It is to provide an etching solution that can be clearly manifested.

본 발명의 다른 목적은, 상기 에칭 용액을 이용하여 미세조직을 명확하게 현출할 수 있도록 하는 에칭 방법을 제공하는 것이다.Another object of the present invention is to provide an etching method that allows the microstructure to be clearly exhibited using the etching solution.

상기 일 목적을 달성하기 위한 본 발명의 에칭 용액은, 피크린산: 1.8 ~ 2.0 중량%, 도데실벤젠설폰산나트륨: 2.4 ~ 2.6 중량%, 염산: 1 ~ 2 중량%, 염화 제2구리: 0.01 ~ 0.02 중량%, 염화 제2철: 0.004 ~ 0.01 중량% 및 잔부 용매를 포함하는 것을 특징으로 한다.The etching solution of the present invention for achieving the above object, picric acid: 1.8 ~ 2.0 wt%, sodium dodecylbenzenesulfonate: 2.4 ~ 2.6 wt%, hydrochloric acid: 1 ~ 2 wt%, cupric chloride: 0.01 ~ 0.02% by weight, ferric chloride: 0.004 to 0.01% by weight, and characterized in that it contains a residual solvent.

상기 다른 목적을 달성하기 위한 본 발명의 에칭 방법은, 용매에, 피크린산: 1.8 ~ 2.0 중량%, 도데실벤젠설폰산나트륨: 2.4 ~ 2.6 중량%, 염산: 1 ~ 2 중량%, 염화 제2구리: 0.01 ~ 0.02 중량%, 및 염화 제2철: 0.004 ~ 0.01 중량%를 첨가하는 단계와, 상기 첨가된 물질들을 60 ~ 65℃에서 교반하여 혼합하는 단계와, 상기 혼합된 용매에 경면 연마된 시험편을 소정 시간 침지하는 단계와, 침지된 시험편을 세정 및 건조하는 단계를 포함하는 것을 특징으로 한다.The etching method of the present invention for achieving the other object, in the solvent, picric acid: 1.8 to 2.0% by weight, dodecylbenzenesulfonate: 2.4 to 2.6% by weight, hydrochloric acid: 1 to 2% by weight, cupric chloride : 0.01 to 0.02% by weight, and ferric chloride: adding 0.004 to 0.01% by weight, mixing the added materials by stirring at 60 to 65 ° C., and mirror-polished test pieces in the mixed solvent. It characterized in that it comprises a step of immersing for a predetermined time, and washing and drying the immersed test piece.

본 발명에 따른 에칭 용액과 이 에칭 용액을 이용한 에칭 방법에 의하면, 고주파 열처리된 중탄소강의 미세조직을 균일하게 현출할 수 있고, 에칭 과정에서 고주파 열처리품 표면에 발생하는 흑색 흡착물 생성을 최소화하여, 미세조직의 분석을 용이하게 한다.According to the etching solution and the etching method using the etching solution according to the present invention, it is possible to uniformly develop the microstructure of the high-frequency heat-treated medium carbon steel, and minimize the generation of black adsorbent generated on the surface of the high-frequency heat-treated product during the etching process. , Facilitates the analysis of microstructures.

도 1은 본 발명의 실시예 1에 따른 에칭 방법을 사용하여 에칭한 고주파 열처리된 중탄소강의 미세조직을 광학 현미경으로 관찰한 것이다.
도 2는 본 발명의 실시예 2에 따른 에칭 방법을 사용하여 에칭한 고주파 열처리된 중탄소강의 미세조직을 광학 현미경으로 관찰한 것이다.
도 3은 비교예에 따른 에칭 방법을 사용하여 에칭한 고주파 열처리된 중탄소강의 미세조직을 광학 현미경으로 관찰한 것이다.
1 is a microstructure of the high-frequency heat-treated medium carbon steel etched using the etching method according to Example 1 of the present invention is observed with an optical microscope.
Figure 2 is a microstructure of the high-frequency heat-treated medium carbon steel etched using the etching method according to the second embodiment of the present invention observed with an optical microscope.
3 is a microstructure of the high-frequency heat-treated medium carbon steel etched using the etching method according to the comparative example is observed with an optical microscope.

이하, 예시적인 구현예들에 따른 에칭 용액과 이를 이용하는 에칭 방법에 관하여 더욱 상세하게 설명한다. 그러나 하기 구현예들은 예시로서 제시되는 것으로, 이에 의해 본 발명이 제한되지는 않으며 본 발명은 후술할 청구범위의 범주에 의해 정의된다.Hereinafter, an etching solution according to exemplary embodiments and an etching method using the same will be described in more detail. However, the following embodiments are presented as examples, whereby the invention is not limited and the invention is defined by the scope of the claims below.

종래, 고주파 열처리된 중탄소강의 표면 부분의 결정립을 현출하기 위하여 사용하는 에칭 용액과 에칭 방법의 경우, 고주파 열처리된 표면 부분에서의 결정립의 명확한 현출이 어렵거나 흑색 흡착물이 생성되어 미세조직의 분석이 용이하지 않은 문제점이 있었고, 본 발명자들은 이 문제를 해결하기 위하여 예의 연구한 결과, 종래의 에칭 용액에 비해 염산 농도를 높이고, 염화 제2구리 및 염화 제2철을 첨가함으로써, 명확한 결정립의 현출이 가능하고, 흑색 흡착물의 생성도 억제할 수 있음을 밝혀내고 본 발명에 이르게 되었다.Conventionally, in the case of an etching solution and an etching method used to express crystal grains on the surface portion of the high-frequency heat-treated medium carbon steel, it is difficult to clearly exhibit crystal grains on the high-frequency heat-treated surface portion or black adsorbents are generated to analyze the microstructure. There was a problem that this was not easy, and the present inventors made extensive studies to solve this problem, and as a result, increased the concentration of hydrochloric acid and added copper chloride and ferric chloride compared to the conventional etching solution, thereby clear crystal grains appeared. It has been found that this is possible and that the generation of black adsorbate can also be suppressed, leading to the present invention.

본 발명의 일 실시형태에 따른 에칭 용액은, 피크린산: 1.8 ~ 2.0 중량%, 도데실벤젠설폰산나트륨: 2.4 ~ 2.6 중량%, 염산: 1 ~ 2 중량%, 염화 제2구리: 0.01 ~ 0.02 중량%, 염화 제2철: 0.004 ~ 0.01 중량% 및 잔부 용매를 포함한다.The etching solution according to an embodiment of the present invention, picric acid: 1.8 ~ 2.0 wt%, sodium dodecylbenzenesulfonate: 2.4 ~ 2.6 wt%, hydrochloric acid: 1 ~ 2 wt%, cupric chloride: 0.01 ~ 0.02 wt %, Ferric chloride: 0.004 to 0.01 wt% and the balance solvent.

상기 피크린산은 일반적으로 몇 가지 이성체를 가진 트리니트로페놀 중 2,4,6-트리니트로페놀이라고 불리는 화합물로, 화학식은 C6H3N3O7, 시성식은 C6H2(OH)(NO2)3로 표기되며, 그 수용액은 강한 산성을 띠며, 불안정하고 폭발성을 가진 가연성 물질이다. 본 발명에서 피크린산은 결정립계를 미세하게 부식시키는 역할을 하며, 상기 피크린산의 함량은 1.8 중량% 미만이면 충분한 에칭이 되지 않고, 2.0 중량% 초과하면 에칭 용액의 안정성이 저해되므로, 1.8 ~ 2.0 중량% 내로 포함되는 것이 바람직하다.The picric acid is a compound called 2,4,6-trinitrophenol among trinitrophenols having several isomers, and the chemical formula is C 6 H 3 N 3 O 7 , and the chemical formula is C 6 H 2 (OH) (NO 2 ) 3 , the aqueous solution has a strong acidity, is an unstable and explosive combustible material. In the present invention, picric acid serves to finely corrode grain boundaries, and if the content of picric acid is less than 1.8% by weight, sufficient etching is not performed, and if it exceeds 2.0% by weight, stability of the etching solution is inhibited, so within 1.8 to 2.0% by weight. It is preferably included.

상기 도데실벤젠설폰산나트륨은 음이온 계면활성제의 일종으로 방향족성 화합물을 극성 용매에 용해시키는 역할을 하는 성분으로, 2.4 ~ 2.6 중량% 범위 내로 첨가되지 않으면, 본 발명에서 요구하는 에칭 특성을 얻을 수 없기 어려우므로, 상기 범위를 유지하는 것이 바람직하다.The sodium dodecylbenzenesulfonate is a kind of anionic surfactant, which serves to dissolve an aromatic compound in a polar solvent, and if it is not added within a range of 2.4 to 2.6% by weight, it is possible to obtain etching characteristics required by the present invention. Since it is difficult to be absent, it is preferable to maintain the above range.

상기 염산은, 그 함량이 1 중량% 미만이면 종래의 에칭 용액과 같이 고주파 열처리된 표면부의 에칭이 용이하지 않고, 2 중량%를 초과하면 산도가 과하게 높아져 에칭 조건을 제어하기 어려우므로, 1 ~ 2 중량% 내로 포함되는 것이 바람직하다.When the content of the hydrochloric acid is less than 1% by weight, it is difficult to etch the high-frequency heat-treated surface portion like a conventional etching solution, and when it exceeds 2% by weight, the acidity is excessively high, making it difficult to control the etching conditions, so 1 to 2 It is preferred to be included in weight percent.

상기 염화 제2구리와 염화 제2철은, 각각 에칭 용액에서 약한 산화제 역할을 하는 것으로, 아래 [식 1] 및 [식 2]와 같이, 고주파 열처리된 중탄소강의 표면에 위치한 반응 사이트(site)들과 에칭 용액 속에 함유된 Cu2+ 이온, Fe3+ 이온 간의 전자이동 메커니즘에 의해 에칭을 유도하는 역할을 한다. 상기 염화 제2구리와 염화 제2철은 상기 범위내로 첨가되지 않을 경우, 본 발명에 따른 효과를 얻기 어려우므로, 상기 범위 내로 첨가되는 것이 바람직하다.The cupric chloride and ferric chloride serve as weak oxidizing agents in the etching solution, respectively, as shown in [Formula 1] and [Formula 2] below, a reaction site located on the surface of the high-frequency heat-treated medium carbon steel. It serves to induce etching by an electron transfer mechanism between Cu 2+ ions and Fe 3+ ions contained in the etching solution. When the cupric chloride and ferric chloride are not added within the above range, it is difficult to obtain the effect according to the present invention, so it is preferable to add the above range.

[식 1][Equation 1]

Fe + CuCl2 → FeCl2 + CuFe + CuCl 2 → FeCl 2 + Cu

[식 2][Equation 2]

Fe + 2FeCl3 → 3FeCl2 Fe + 2FeCl 3 → 3FeCl 2

또한, 본 발명의 에칭 용액에 있어서, 상기 용매는 피크린산, 도데실벤젠설폰산나트륨, 염화 제2구리, 염화 제2철을 용해시킬 수 있는 것이면 특별히 제한되지 않으나, 에탄올, 메탄올 및 증류수에서 선택된 하나 이상을 사용하는 것이 바람직하다.In addition, in the etching solution of the present invention, the solvent is not particularly limited as long as it can dissolve picric acid, sodium dodecylbenzenesulfonate, cupric chloride, and ferric chloride, but one selected from ethanol, methanol, and distilled water It is preferable to use the above.

또한, 본 발명의 에칭 용액은 특히 고주파 열처리된 중탄소강에 적합하게 사용될 수 있으나, 다른 방법에 의해 열처리된 미세조직의 현출에도 사용될 수 있어, 열처리 방법에 특별히 제한되지 않는다.In addition, the etching solution of the present invention can be suitably used for medium-carbon steel, which is particularly high-frequency heat-treated, but can also be used for the appearance of microstructures heat-treated by other methods, and is not particularly limited to the heat-treatment method.

또한, 본 발명의 일 실시형태에 따른 에칭 방법은, 용매에, 피크린산: 1.8 ~ 2.0 중량%, 도데실벤젠설폰산나트륨: 2.4 ~ 2.6 중량%, 염산: 1 ~ 2 중량%, 염화 제2구리: 0.01 ~ 0.02 중량%, 및 염화 제2철: 0.004 ~ 0.01 중량%를 첨가하는 단계와, 상기 첨가된 물질들을 60 ~ 65℃에서 교반하여 혼합하는 단계와, 상기 혼합된 용매에 경면 연마된 시험편을 소정 시간 침지하는 단계와, 침지된 시험편을 세정 및 건조하는 단계를 포함하는 에칭 방법을 제공한다.In addition, the etching method according to an embodiment of the present invention, in the solvent, picric acid: 1.8 to 2.0% by weight, dodecylbenzenesulfonate: 2.4 to 2.6% by weight, hydrochloric acid: 1 to 2% by weight, cupric chloride : 0.01 to 0.02% by weight, and ferric chloride: adding 0.004 to 0.01% by weight, mixing the added materials by stirring at 60 to 65 ° C., and mirror-polished test pieces in the mixed solvent. It provides an etching method comprising the step of immersing a predetermined time, and cleaning and drying the immersed test piece.

상기 첨가된 물질의 혼합시 온도가 60℃ 미만일 경우 혼합 효율이 떨어지고, 65℃를 초과할 경우 에칭액의 농도가 빠르게 증가하여 에칭 공정을 제어하기 어렵기 때문에 60 ~ 65℃를 유지하는 것이 바람직하다.When mixing the added material, when the temperature is less than 60 ° C, the mixing efficiency decreases, and when it exceeds 65 ° C, the concentration of the etchant is rapidly increased, so it is preferable to maintain 60 to 65 ° C because it is difficult to control the etching process.

조직 관찰이 필요한 시험편은 먼저 경면 연마를 수행하여야 한다. 경면 연마에는 거친 연마단계와 미세 연마 단계를 거쳐 수행될 수 있으며, 최종 단계에서는 1 ~ 2㎛의 알루미나 분말을 함유한 연마제를 이용하는 것이 바람직하다.Specimens requiring tissue observation must first be mirror polished. The mirror polishing can be performed through a coarse polishing step and a fine polishing step, and in the final step, it is preferable to use an abrasive containing 1 to 2 μm alumina powder.

상기 시험편의 침지 단계의 침지 시간은 20초 미만일 경우 미세조직이 충분히 현출되지 않을 수 있고, 30초 초과일 경우 미세조직이 과에칭될 수 있으므로, 20 ~ 30초 동안 수행되는 것이 바람직하다.When the immersion time of the immersion step of the test piece is less than 20 seconds, the microstructure may not be sufficiently exhibited, and if it is more than 30 seconds, the microstructure may be overetched, so it is preferably performed for 20 to 30 seconds.

상기 시험편의 세정 단계는 바람직하게 증류수 및/또는 에탄올로 수행될 수 있다.The washing step of the test piece may be preferably performed with distilled water and / or ethanol.

또한, 상기 중탄소강의 탄소 함량은 바람직하게 0.3 ~ 0.5 중량%일 수 있다.In addition, the carbon content of the medium carbon steel may be preferably 0.3 to 0.5% by weight.

또한, 상기 시험편의 침지 단계는, 제1 침지 단계와, 제1 침지 단계를 수행한 시험편의 세정 단계와, 세정된 시험편의 다시 상기 에칭 용액에 침지하는 제2 침지 단계를 포함하는, 2단계 침지로 수행될 수 있는데, 이와 같이, 제1 침지 단계를 짧게 수행한 후 세정하고 제2 침지 단계를 수행하게 되면, 고주파 열처리된 표면 부분에 생성되는 흑색 흡착물의 생성을 보다 억제할 수 있고 에칭 결과의 재현성도 높일 수 있어 바람직하다. 이때, 제1 침지 단계와 제2 침지 단계는, 1회의 침지 단계만을 수행하는 방법에 비해 상대적으로 짧은 시간인 각각 10 ~ 20초 동안 수행될 수 있다.In addition, the immersion step of the test piece includes a first immersion step, a cleaning step of the test piece that has performed the first immersion step, and a second immersion step of immersing the cleaned test piece in the etching solution again. As described above, if the first immersion step is performed after a short period of cleaning and then the second immersion step is performed, the generation of black adsorbent generated on the high-frequency heat-treated surface portion can be further suppressed and the etching result Reproducibility can also be increased, which is preferable. At this time, the first immersion step and the second immersion step may be performed for 10 to 20 seconds, respectively, which is a relatively short time compared to a method of performing only one immersion step.

[실시예][Example]

에칭 용액의 제조Preparation of etching solution

증류수 150ml에 피크린산 3g, 도데실벤젠설폰산나트륨 4g, 염산 2ml, 염화제2구리 0.02g, 염화제2철 0.01g을 첨가하고, 60 ~ 65℃의 온도로 가열한 후, 650~700rpm 수준에서 교반하는 방법을 통해, 본 발명의 실시예에 따른 에칭 용액을 제조하였다.To 150 ml of distilled water, 3 g of picric acid, 4 g of sodium dodecylbenzenesulfonate, 2 ml of hydrochloric acid, 0.02 g of cupric chloride, and 0.01 g of ferric chloride were added, heated to a temperature of 60 to 65 ° C, and then at a level of 650 to 700 rpm. Through the stirring method, an etching solution according to an embodiment of the present invention was prepared.

또한, 본 발명의 실시예에 따른 에칭 용액과의 대비를 위한 비교예로써, 증류수 110ml에 피크린산 4.5g, 도데실벤젠설폰산나트륨 4g, 염산 0.7ml를 혼합한 후 70 ~ 80℃로 가열 유지하면서 교반하는 방법을 사용하여 기존의 에칭 용액을 제조하였다.In addition, as a comparative example for comparison with the etching solution according to the embodiment of the present invention, while mixing 4.5 g of picric acid, 4.5 g of dodecylbenzenesulfonate, and 0.7 ml of hydrochloric acid in 110 ml of distilled water, while maintaining the heating at 70 to 80 ° C Existing etching solutions were prepared using the stirring method.

에칭 방법Etching method

먼저, 고주파 열처리된 중탄소강 시험편을 10×10cm 크기로 절단하여 경연 연마를 하였다.First, the high-frequency heat-treated medium carbon steel test piece was cut to a size of 10 × 10 cm and subjected to light grinding.

경면 연마된 시험편을 본 발명의 실시예에 따라 제조한 에칭 용액에 25초간 침지시킨 후, 증류수로 세정하였다(실시예 1).The mirror-polished test piece was immersed in an etching solution prepared according to an embodiment of the present invention for 25 seconds, and then washed with distilled water (Example 1).

또한, 경면 연마된 시험편을 본 발명의 실시예에 따라 제조한 에칭 용액에 15초간 침지시킨 후(제1 침지단계), 증류수로 세정하고, 다시 상기 에칭 용액에 15초가 침지시킨 후(제2 침지단계), 증류수로 세정하였다(실시예 2).In addition, after the mirror-polished test piece is immersed in an etching solution prepared according to an embodiment of the present invention for 15 seconds (first immersion step), washed with distilled water, and then again immersed in the etching solution for 15 seconds (second immersion) Step), and washed with distilled water (Example 2).

또한, 경면 연마된 시험편을 비교예에 따라 제조한 에칭 용액에 40초 동안 침지시킨 후에 증류수로 세정하였다(비교예).Further, the mirror-polished test piece was immersed in an etching solution prepared according to a comparative example for 40 seconds and then washed with distilled water (comparative example).

미세 조직의 분석Analysis of microstructure

도 1은 본 발명의 실시예 1에 따른 에칭 방법을 사용하여 에칭한 고주파 열처리된 중탄소강의 미세조직을 광학 현미경으로 촬영한 것이고, 도 2는 본 발명의 실시예 2에 따른 에칭 방법을 사용하여 에칭한 고주파 열처리된 중탄소강의 미세조직을 광학 현미경으로 촬영한 것이며, 도 3은 비교예에 따른 에칭 방법을 사용하여 에칭한 고주파 열처리된 중탄소강의 미세조직을 광학 현미경으로 촬영한 것이다.1 is a microstructure of the high-frequency heat-treated medium carbon steel etched using the etching method according to the first embodiment of the present invention is taken with an optical microscope, Figure 2 is using the etching method according to the second embodiment of the present invention The microstructure of the etched high-frequency heat-treated medium carbon steel was photographed with an optical microscope, and FIG. 3 is an optical microscope of the microstructure of the high-frequency heat-treated medium carbon steel etched using the etching method according to the comparative example.

도 1과 도 2에서 확인되는 바와 같이, 본 발명의 실시예에 따라 에칭된 시편의 경우, 고주파 열처리된 중탄소강에서 발생하는 흑색 흡착물의 생성이 거의 없을 뿐 아니라, 표면과 내부의 결정립이 명확하게 현출되어 있음을 알 수 있다. 특히 실시예 2의 경우, 실시예 1에 비해 다양한 강에 대해 흑색 흡착물의 생성이 없이 결정립의 명확한 현출이 가능하여 보다 바람직하다고 할 수 있다.1 and 2, in the case of the specimen etched according to the embodiment of the present invention, there is almost no generation of black adsorbent generated in the high-frequency heat-treated medium carbon steel, and the crystal grains on the surface and inside are clearly You can see that it is on the move. In particular, in the case of Example 2, it can be said that it is more preferable because the crystal grains can be clearly exhibited without generating black adsorbents for various steels compared to Example 1.

이에 비해, 비교예에 다른 에칭 방법을 적용한 경우, 착색이 많이 되어 있을 뿐 아니라, 표면부의 결정립이 명확하게 관찰되지 않으므로, 미세조직의 분석에 적합하지 않았다.On the other hand, when a different etching method was applied to the comparative example, it was not only suitable for the analysis of the microstructure, because it was not only colored, but crystal grains on the surface were not clearly observed.

Claims (8)

피크린산: 1.8 ~ 2.0 중량%,
도데실벤젠설폰산나트륨: 2.4 ~ 2.6 중량%,
염산: 1 ~ 2 중량%,
염화 제2구리: 0.01 ~ 0.02 중량%,
염화 제2철: 0.004 ~ 0.01 중량%
및 잔부 용매를 포함하는, 열처리된 중탄소강의 미세조직 분석을 위한 에칭 용액.
Picric acid: 1.8-2.0 wt%,
Sodium dodecylbenzenesulfonate: 2.4 to 2.6 wt%,
Hydrochloric acid: 1 to 2% by weight,
Cupric chloride: 0.01 to 0.02% by weight,
Ferric chloride: 0.004 to 0.01 wt%
And a residual solvent, an etching solution for microstructure analysis of the heat-treated medium carbon steel.
제1항에 있어서,
상기 용매는 에탄올, 메탄올 및 증류수에서 선택된 하나 이상인, 열처리된 중탄소강의 미세조직 분석을 위한 에칭 용액.
According to claim 1,
The solvent is at least one selected from ethanol, methanol and distilled water, an etching solution for microstructure analysis of heat-treated medium carbon steel.
제1항에 있어서,
상기 열처리는 고주파 열처리인, 열처리된 중탄소강의 미세조직 분석을 위한 에칭 용액.
According to claim 1,
The heat treatment is a high-frequency heat treatment, an etching solution for microstructure analysis of the heat treated medium carbon steel.
용매에, 피크린산: 1.8 ~ 2.0 중량%, 도데실벤젠설폰산나트륨: 2.4 ~ 2.6 중량%, 염산: 1 ~ 2 중량%, 염화 제2구리: 0.01 ~ 0.02 중량%, 및 염화 제2철: 0.004 ~ 0.01 중량%를 첨가하는 단계와,
상기 첨가된 물질들을 60 ~ 65℃에서 교반하여 혼합하는 단계와,
상기 혼합된 용매에 경면 연마된 시험편을 소정 시간 침지하는 단계와,
침지된 시험편을 세정 및 건조하는 단계를 포함하는,
열처리된 중탄소강의 미세조직 분석을 위한 에칭 방법.
In the solvent, picric acid: 1.8 to 2.0 wt%, sodium dodecylbenzenesulfonate: 2.4 to 2.6 wt%, hydrochloric acid: 1 to 2 wt%, cupric chloride: 0.01 to 0.02 wt%, and ferric chloride: 0.004 Adding ~ 0.01% by weight,
And mixing the added substances by stirring at 60 ~ 65 ℃,
Immersing the mirror-polished test piece in the mixed solvent for a predetermined time,
Cleaning and drying the immersed test piece,
Etching method for microstructure analysis of heat treated medium carbon steel.
제4항에 있어서,
상기 시험편의 침지 단계의 침지 시간은 20 ~ 30초 동안 수행되는, 열처리된 중탄소강의 미세조직 분석을 위한 에칭 방법.
According to claim 4,
The immersion time of the immersion step of the test piece is performed for 20 to 30 seconds, the etching method for microstructure analysis of the heat-treated medium carbon steel.
제4항에 있어서,
상기 시험편의 세정은 증류수 또는 에탄올로 수행하는, 열처리된 중탄소강의 미세조직 분석을 위한 에칭 방법.
According to claim 4,
Cleaning of the test piece is performed with distilled water or ethanol, an etching method for microstructure analysis of heat-treated medium carbon steel.
제4항에 있어서,
상기 중탄소강의 탄소 함량이 0.3 ~ 0.5 중량%인, 열처리된 중탄소강의 미세조직 분석을 위한 에칭 방법.
According to claim 4,
The carbon content of the medium carbon steel is 0.3 ~ 0.5% by weight, an etching method for microstructure analysis of the heat treated medium carbon steel.
제4항에 있어서,
상기 시험편의 침지는, 제1 침지 단계와, 제1 침지 단계를 수행한 시험편의 세정 단계와, 세정된 시험편의 다시 상기 에칭 용액에 침지하는 제2 침지 단계를 포함하여 수행되며,
상기 제1 침지 단계와 제2 침지 단계는 각각 10 ~ 20초 동안 수행되는, 열처리된 중탄소강의 미세조직 분석을 위한 에칭 방법.
According to claim 4,
The immersion of the test piece is performed including a first immersion step, a cleaning step of the test piece that has performed the first immersion step, and a second immersion step of immersing the cleaned test piece in the etching solution again,
The first immersion step and the second immersion step are each performed for 10 to 20 seconds, an etching method for microstructure analysis of the heat treated medium carbon steel.
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Cited By (3)

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CN112798386A (en) * 2020-12-30 2021-05-14 上海大学 In-situ three-dimensional electrolytic etching liquid and electrolytic etching method for second-phase particles in stainless steel
CN114383917A (en) * 2021-12-10 2022-04-22 江苏大学 Microalloyed carbon steel original austenite grain boundary etching method
CN115323378A (en) * 2022-08-18 2022-11-11 西安热工研究院有限公司 Metallographic corrosive agent for displaying sliding band of austenitic material and preparation method and application method thereof

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KR950019701A (en) 1993-12-28 1995-07-24 김무 Solution for measuring austenite grain size of steel and measuring method

Patent Citations (1)

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Publication number Priority date Publication date Assignee Title
KR950019701A (en) 1993-12-28 1995-07-24 김무 Solution for measuring austenite grain size of steel and measuring method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112798386A (en) * 2020-12-30 2021-05-14 上海大学 In-situ three-dimensional electrolytic etching liquid and electrolytic etching method for second-phase particles in stainless steel
CN114383917A (en) * 2021-12-10 2022-04-22 江苏大学 Microalloyed carbon steel original austenite grain boundary etching method
CN114383917B (en) * 2021-12-10 2024-04-09 江苏大学 Method for etching original austenite grain boundary of microalloyed carbon steel
CN115323378A (en) * 2022-08-18 2022-11-11 西安热工研究院有限公司 Metallographic corrosive agent for displaying sliding band of austenitic material and preparation method and application method thereof
CN115323378B (en) * 2022-08-18 2024-04-26 西安热工研究院有限公司 Metallographic corrosive agent for displaying sliding band of austenitic material, and preparation method and use method thereof

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