KR20200008365A - Electroencephalography measuring array device and system using the same - Google Patents

Abstract

The present invention relates to an array device for electroencephalography (EEG) measurement and a system using the same. The array device for EEG measurement comprises: a base portion connected from a frontal region to an occipital region of a user; a longitudinal measuring electrode portion located on one side of the base portion and including a plurality of longitudinal measuring electrodes arranged in a line at a predetermined interval from a center position of the frontal region to a center position of the occipital region; and a transverse measuring electrode portion located on one side of the base portion, wherein a plurality of transverse measuring electrodes are arranged in a horizontal direction with respect to the center of the longitudinal measuring electrodes such that a plurality of columns are formed in a longitudinal direction and the number of the transverse measuring electrodes arranged in the column decreases from the frontal region to a crown region and then, increases from the crown region to the occipital region. The present invention can implement a brain measuring device with more economy and higher sensitivity by concentrating the position of a sensor (measuring electrode) at front and rear positions of the head which are most affected by social and visual interactions.

Description

Electroencephalography measuring array device and system using the same

The present invention relates to electroencephalogram measurements, and more particularly, to an electroencephalogram array device and a system using the same, in which electroencephalogram electrodes are concentrated in front and rear of the head which are most affected by social and visual interaction.

Electroencephalography (EEG) technology is a brain-computer interface for a wide range of applications, from gaming and medicine to military and transportation, and is increasingly in demand due to its wide applicability. In particular, EEG is drawing attention as a reliable and reasonably feasible technology compared to MRI, NIRS or MEG.

Honeywell's Quasar initially focused on deploying sensor arrays inside military helmets for military applications. For Advanced Brain Monitoring, B-Alert initially focused on markets such as Honeywell. Honeywell's Quasar and Advanced Brain Monitoring B-Alert, however, are priced far above the average consumer price. There is a need to provide EEG technology with a wide range of applications at a more economical price.

Emotiv's products, meanwhile, entered the market with low quality that could not clearly detect brain signals. Emotiv's early products also didn't even provide users with raw data. This has since allowed access to raw data only through more expensive versions of the SDK. Emotiv's innovation has focused on enthusiasts, as can be seen in the latest product lines such as Emotiv Insight. Emotiv's latest product, however, only has five channels in layouts or montages that are rarely used. Accordingly, there is a need to measure brain signals with higher sensitivity by concentrating channel positions in an arrangement or arrangement with high practical use.

Korean Laid-Open Patent Publication No. 2003-0002677 United States Patent Application Publication No. 2017-0143228 United States Patent Application Publication No. 9854988

Therefore, the present invention has been proposed in consideration of the above-mentioned matters, and the measurement of the brain with more economical and high sensitivity by concentrating the position of the sensor (measuring electrode) at the front and rear positions of the head which are most affected by social and visual interactions. The purpose is to implement the device.

In addition, an object of the present invention is to select the configuration of the EEG array device to be separated or integrally to fine-tune (detachable) according to the shape and size of the head, or to be easy to wear (integrated).

In addition, an object of the present invention is to implement a more reliable electroencephalography array device by arranging the measuring electrodes in accordance with the standard of 10-20 International Electrode Placement.

In addition, the present invention aims to simplify device design and facilitate additional channel recording by setting Cz as a reference electrode.

In another aspect, the present invention further comprises a Velcro strap (Velcro strap) to facilitate the adjustment of the size of the EEG array device according to the head size.

In addition, an object of the present invention is to implement a more reliable electroencephalography array device and a system using the same by setting the resistance value having the most excellent characteristics compared to the general electroencephalogram array device for each measurement electrode.

It is also an object of the present invention to provide a high-end EEG sensor array that can be integrated into many different brain-computer interfaces to extend to applications in marketing, gaming, emergency medical diagnostics, sports and the like.

The objects of the present invention are not limited to the above-mentioned objects, and other objects that are not mentioned will be clearly understood by those skilled in the art from the following description.

In order to achieve the above object, the EEG array device according to the technical concept of the present invention is located on the base portion, the base portion is connected to the front head to the back head of the user, the predetermined position from the center of the front head to the center position of the front head The vertical measuring electrode part including a plurality of vertical measuring electrodes arranged in a row at intervals of the first electrode, located on one side of the base portion, a plurality of horizontal measuring electrodes are arranged in the left and right direction around the vertical measuring electrode along the longitudinal direction The number of horizontal measuring electrodes arranged in a row in a plurality of rows may include the horizontal measuring electrodes arranged to decrease from the front head to the crown and increase from the head to the back of the head.

At this time, each of the base portion, the vertical measuring electrode portion and the horizontal measuring electrode portion may be formed in a strip shape.

The base part, the vertical measuring electrode part, and the horizontal measuring electrode part may be integrally formed.

The vertical measuring electrode unit may be provided with the measuring electrodes arranged in Fz, Cz and Pz based on the 10-20 International Electrode Placement Method.

In this case, the measurement electrodes arranged in Cz may be reference electrodes.

The measuring electrodes arranged at Fz may have a resistance value of 23.6 Ohms, the measuring electrodes arranged at Cz may have a resistance value of 17.9 Ohms, and the measuring electrodes arranged at Pz may have a resistance value of 14.4 Ohms.

The horizontal measuring electrode may have the measuring electrodes arranged in F3, F4, F7, F8, Fp1, Fp2, O1, O2, P3, P4, T5, and T6 based on the 10-20 international electrode arrangement method.

The vertical measuring electrode part or the horizontal measuring electrode part may be arranged by adding a measuring electrode to Fpz based on the 10-20 international electrode arrangement method.

Measuring electrodes arranged in F3 and F4 are 27.3 Ohms, measuring electrodes arranged in F7 and F8 are 36.7 Ohms, measuring electrodes arranged in Fp1 and Fp2 are 32.1 Ohms, measuring electrodes arranged in O1 and O2 are 8.6 Ohms, P3 and The measuring electrodes arranged in P4 may have a resistance value of 15.5 Ohms, and the measuring electrodes arranged in T5 and T6 may have a resistance value of 12.5 Ohms.

In this case, the measurement electrodes arranged in Fpz may be ground electrodes.

The measuring electrodes arranged in Fpz may have a resistance value of 30.4 Ohms.

The horizontal measuring electrode unit may further include a velcro strap that is elastic on both sides of the column.

In order to achieve the above object, the EEG measuring system according to the present invention is a signal transmission and reception unit for transmitting an electric signal to the EEG array device for receiving the EEG data signal measured according to the transmission, the received EEG data EEG data processing unit for calculating a value indicating a state of the user based on the signal, the interface value output unit for outputting the interface value according to the calculated user state value, the EEG data receiver may include a control unit for controlling the interface value output unit have.

According to the array device for measuring brain waves as described above and a system using the same,

First, by focusing the position of the sensor (measuring electrode) in the front and rear position of the head that is most affected by social and visual interaction, it has the effect of implementing a brain measuring device with more economical and high sensitivity.

Second, by selecting the configuration of the EEG array device to be separated or integrated to have a fine adjustment (detachable) according to the shape and size of the head, or has an effect that can be easily worn (integrated).

Third, by arranging the measuring electrodes in accordance with the standard of the 10-20 International Electrode Placement Method, it is possible to implement a more reliable EEG array device.

Fourth, by setting Cz as the reference electrode, it is possible to simplify the device design and easily record additional channels.

Fifth, the Velcro straps (Velcro strap) is further included, it is easy to adjust the size of the EEG array device according to the head size.

Sixth, by setting the resistance value having the most excellent characteristics compared to the general EEG array device for each measurement electrode, it has the effect of implementing a more reliable EEG array device and a system using the same.

Seventh, by providing a high-end EEG sensor array that can be integrated into a number of different brain-computer interfaces, it has the effect of extending to applications such as marketing, gaming, emergency medical diagnostics, and sports.

1 is a plan view showing an array device for measuring brain waves according to an embodiment of the present invention.
Figure 2 is a block diagram showing a system for measuring brain waves in accordance with an embodiment of the present invention.
Figure 3 is a front view wearing an array device for measuring brain waves designed according to Figure 1;
Figure 4 is a rear view of wearing an EEG array device designed according to Figure 1;
5A and 5B are side views of wearing an EEG array device designed according to FIG.

In order to fully understand the present invention, the operational advantages of the present invention, and the objects achieved by the practice of the present invention, reference should be made to the accompanying drawings which illustrate preferred embodiments of the present invention and the contents described in the accompanying drawings. The features and advantages of the present invention will become more apparent from the following detailed description based on the accompanying drawings. Prior to this, terms or words used in the present specification and claims are defined in the technical spirit of the present invention on the basis of the principle that the inventor can appropriately define the concept of terms in order to explain in the best way of their own invention. It should be interpreted to mean meanings and concepts. In addition, it is to be noted that the detailed description of the known functions and configurations related to the present invention has been omitted when it is determined that the gist of the present invention may be unnecessarily obscured.

Referring to FIG. 1, the EEG measuring array device may include a base part 10, a vertical measuring electrode part 20, and a horizontal measuring electrode part 30.

The EEG measuring array apparatus of the present invention may be formed by separating the base portion 10, the vertical measuring electrode portion 20, and the horizontal measuring electrode portion 30 into strips. This is because it can be finely adjusted according to the shape and size of the hair.

In addition, the EEG measuring array apparatus of the present invention may be formed integrally with the base portion 10, the vertical measuring electrode 20 and the horizontal measuring electrode 30. The reason for this is that the wear can be facilitated.

The base unit 10 may be connected to the frontal head of the user from the frontal head. The reason is that the measuring electrode can be arranged around the position from the head to the back of the head, which is most affected by social and visual interactions.

In this case, the base unit 10 may be formed of a 5 mm PET substrate for screen printing a measurement electrode corresponding to a sensor and a trace. However, the base portion 10 can be easily changed to various materials or materials according to the printing method.

The vertical measuring electrode 20 is positioned on one surface of the base 10 and may include a plurality of vertical measuring electrodes. The reason for this is that electroencephalograms can be measured with higher sensitivity by arranging the measuring electrodes at positions from the head to the back of the head, which are most affected by social and visual interactions.

The plurality of vertical measuring electrodes may be arranged in a row at a predetermined interval from the center position of the front head to the center position of the back head. The reason is that brain signals can be detected more clearly by evenly distributing sensor (measuring electrode) positions in the front and rear positions of the head which are most affected by social and visual interactions.

The plurality of vertical measuring electrodes may be formed by screen printing on the base portion 10 through conductive silver ink. Traces may also be screen printed together with a plurality of longitudinal measuring electrodes. The portion corresponding to the electrical contacts may be covered with an oxidation resistance carbon ink layer, and the remaining conductive traces may be sealed with an insulator. Each trace can have 1mm pitch spacing to interface with a separate channel amplifier. However, the plurality of vertical measuring electrodes may be formed in various ways according to a printing method and a manufacturing method.

Meanwhile, the vertical measurement electrode unit 20 may include electrodes in which measurement electrodes are arrayed in Fz, Cz, and Pz based on the 10-20 international electrode placement method. The reason for this is that electroencephalogram measurement can be performed more reliably by arranging the measurement electrodes based on the 10-20 international electrode placement method.

The measuring electrodes arranged at Cz in the vertical measuring electrode unit 20 may be referred to as reference electrodes. This is because setting Cz as the reference electrode simplifies device design and facilitates additional channel recording. In this case, Cz is generally used as a reference electrode, which may be approximately positioned at the center of the other measuring electrode. In addition, the brain type of activity of interest usually does not include the Cz position. Choosing Cz compared to mastoids (mean between both ears) simplifies the design of EEG devices and frees up one recording channel.

At this time, it is possible to set the resistance of the measuring electrode arranged in Fz to 23.6 Ohms, the resistance of the measuring electrode arranged in Cz to 17.9 Ohms, and the resistance of the measuring electrode arranged in Pz to 14.4 Ohms. The reason is that the above resistance has the most excellent characteristics compared to the general EEG array device and the system using the same.

The horizontal measuring electrode part 30 may be positioned on one surface of the base part 10 and may include a plurality of horizontal measuring electrodes. The reason for this is that electroencephalograms can be measured with higher sensitivity by arranging the measuring electrodes at positions from the head to the back of the head, which are most affected by social and visual interactions.

The plurality of horizontal measuring electrodes may be arranged in left and right directions around the vertical measuring electrodes to form a plurality of columns 31, 33, 35, and 37 along the longitudinal direction. The reason for this is that brain signals are more clearly defined by arranging the measuring electrodes around the vertical measuring electrodes in which the positions of the sensors (measuring electrodes) are evenly distributed in the front and rear positions of the head which are most affected by social and visual interactions. Because it can be detected.

Column 1 (31) and column 2 (33) spacing is 2.717 [inches] in column 31 (33, 33, 35, 37), column 1 (31) and column 3 (35) spacing is 8.150 [inches] The interval between 1 (31) and row 4 (37) may be 10.866 [inches], and the distance between the end of the head of the back of the row 4 (37) and longitudinal measurement unit 20 may be 1.772 [inches]. This is an interval when a general user's head circumference is 56cm, but may be variously changed according to a general user's head circumference standard, a production standard, and the like.

The plurality of rows 31, 33, 35, and 37 may further include a Velcro strap 50 that is elastic on both sides. The reason for this is that it is easy to adjust the size of the array device for measuring EEG according to the head size. The EEG measuring apparatus of the present invention has been designed around the head of the general user 56cm, but can be easily changed in design according to the production criteria, the size can also be adjusted by the Velcro strap (50). Alternatively, the design can be easily changed to various parts that can be adjusted in size in addition to the Velcro strap 50.

The number of horizontal measuring electrodes arranged in a plurality of columns 31, 33, 35, and 37 may be arranged so as to decrease from the front head to the water purification part and increase from the crown to the head. This is because the front and rear positions are the ones most affected by social and visual interaction.

Like the vertical measuring electrode, the plurality of horizontal measuring electrodes may be formed by screen printing on the base portion 10 through conductive silver ink. Traces may also be screen printed together with a plurality of transverse measuring electrodes. The portion corresponding to the electrical contacts may be covered with an oxidation resistance carbon ink layer, and the remaining conductive traces may be sealed with an insulator. Each trace can have 1mm pitch spacing to interface with a separate channel amplifier. However, the plurality of horizontal measuring electrodes may be formed in various ways according to a printing method and a manufacturing method.

On the other hand, the horizontal measuring electrode unit 30 has the measurement electrodes arranged in F3, F4, F7, F8, Fp1, Fp2, O1, O2, P3, P4, T5 and T6 based on the 10-20 international electrode placement method (Montage) It may include an electrode provided. The arrangement positions of the measurement electrodes included in the column 1 (31) are F7, F8, Fp1, and Fp2, and the arrangement positions of the measurement electrodes included in the column 2 (33) are F3, F4, and are included in the column 3 (35). The arrangement positions of the measurement electrodes are P3 and P4, and the arrangement positions of the measurement electrodes included in the column 4 (37) may be O1, O2, T5, and T6. The reason for this is that electroencephalogram measurement can be performed more reliably by arranging the measurement electrodes based on the 10-20 international electrode placement method.

In this case, the resistance values of the measuring electrodes arranged in F3 and F4 are 27.3 Ohms, and the resistance values of the measuring electrodes arranged in F7 and F8 are 36.7 Ohms, and the resistance values of the measuring electrodes arranged in Fp1 and Fp2 are 32.1 Ohms, O1, and O2. The resistance value of the measuring electrodes arranged in the array of 8.6 Ohms, P3 and P4 can be set to 15.5 Ohms, the resistance values arranged in the T5 and T6 of 12.5 Ohms. The reason is that the above resistance has the most excellent characteristics compared to the general EEG array device and the system using the same.

The vertical measuring electrode part 20 or the horizontal measuring electrode part 30 may include electrodes arranged in a montage by further adding a measuring electrode to Fpz. This may be an arrangement position of the measurement electrodes included in the column 1 31 of the columns 31, 33, 35, and 37. The reason for this is that electroencephalogram measurement can be performed more reliably by arranging the measurement electrodes based on the 10-20 international electrode placement method.

The interval between Fpz and Fp1 and Fpz and Fp2 can be 1.083 [inches]. The interval between Fpz and F3, Fpz and F4, Fpz and P3, and Fpz and P4 can be 2.047 [inches]. The interval between Fpz and F7, Fpz and F8, Fpz and T5, and Fpz and T6 can be set to 3.248 [inches]. The interval between F7 and F8 and T5 and T6 can be set at 6.496 [inches]. This is an interval when a general user's head circumference is 56cm, but may be variously changed according to a general user's head circumference standard, a production standard, and the like.

The measuring electrodes arranged in the Fpz in the vertical measuring electrode part 20 or the horizontal measuring electrode part 30 may be ground electrodes.

At this time, the resistance value of the measuring electrodes arranged in Fpz can be set to 30.4 Ohms. The reason is that the above resistance has the most excellent characteristics compared to the general EEG array device and the system using the same.

Meanwhile, the EEG measuring apparatus of FIG. 1 may have all tolerances of +/− 0.007 inch. Magenta is a carbon printed on silver, and carbon ink may have oxidation resistance. Transparent green can be printed with a dielectric insulator. Elastic hook and loop straps can have 4x12 inch, 5/8 inch. However, the tolerance, magenta, material, etc. can be easily changed according to production standards.

Figure 2 is a block diagram showing a system for measuring brain waves in accordance with an embodiment of the present invention.

2, the EEG measuring system of the present invention may include a signal transceiver 600, an EEG data processor 700, an interface value output unit 800, and a controller 900.

The signal transceiver 600 may transmit an electric signal to the EEG measuring array device, and receive an EEG data signal measured according to the transmission. It can use the EEG signal for analysis and output the interface value based on the EEG data signal.

The brain wave data processing unit 700 may calculate a value indicating a state of the user based on the brain wave data signal received from the signal transceiver 600. The EEG data signal may be data for objectively calculating the user's state.

The interface value output unit 800 may output the interface value according to the state value of the user calculated from the EEG data processor 700. This can more clearly provide the interface to be implemented by grasping the state value of the user more clearly.

The controller 900 may control the signal transceiver 600 to the interface value output unit 800. It can provide an overall control of measuring brain waves and using them to provide an interface.

FIG. 3 is a front view of the EEG array device designed according to FIG. 1, FIG. 4 is a rear view of the EEG array device designed according to FIG. 1, and FIGS. 5A and 5B are designed according to FIG. 1. It is a side view which wore the array apparatus for electroencephalogram measurement.

3 to 5B, the EEG measuring array apparatus of the present invention based on the 10-20 international electrode placement method is the front position (Front) and the back position (Back) (Nasion in the nasal region (Insion) (Inion) ), EEG can be measured in the left and right positions (Right auricular to left auricular), and around the head.

At this time, when the actual distance between the nose root point and the back head point is 100, the measuring electrodes can be arranged in 10-20% intervals. Alternatively, the international 10-20 system is a standard brain conduction system (EEG), where the measuring electrodes can be placed 10-20% back and forth along the nose and the protruding bone behind the head. That is, the spacing between the measuring electrodes can be arranged in an array of 10 to 20% based on the circumference of the head.

System Estimated Price Electrodes Electrode Locations Frame Scalp to Electrode Connection Reference Locations Array device for measuring brain waves of the present invention $ 300
(including amplifier) 16 passive Fp1, Fp2, F7, F3, Fz, F4, F8 T5, P3, Pz, P4, T6, O1, O2, Cz Flexible PET / adjustable elastic strips Direct contact, optional gel or foam supplement Cz Honeywell quasar $ 25,000 9 passive F3, Fz, F4, C3, Cz, C4, P3, Pz, P4 Fixed plastic Direct contact P4, Fpz Emotiv EPOC (SDK) $ 850 14 passive AF3, AF4, F7, F3, F4, F8, FC5, FC6, T7, T8, P7, P8, O1, O2 Fixed plastic Saline-infused felt Mastoids and or P3 / P4 B-Alert X10 $ 15,000 (X10)
$ 30,000
(X24) 9 passive F3, Fz, F4, C3, Cz, C4, P3, POz, P4 Semi-flexible plastic Gel-infused foam External

Table 1 is a table comparing the electroencephalography array apparatus and general electroencephalography array apparatus of the present invention. Referring to Table 1, in most EEG array devices, electrode position, placement or arrangement is distributed throughout the head.

B-Alert, the most similar product to the EEG array device of the present invention, is currently sold for $ 15,000 to $ 30,000. In the least expensive Emotiv EPOC (SDK), most of the frames have a low sensitivity that do not fit well into the outline of the head. It primarily takes muscles rather than brain signals.

On the other hand, the EEG array device of the present invention and the system using the same are concentrated by placing the sensor (measuring electrode) at the front (frontal) and rear (back) locations, which are most affected by social and visual interaction. Sensitivity can measure brain signals. This focuses the sensor only on the head position, the position most affected by social and visual interaction, thereby reducing the price increase due to unnecessary sensor position.

Although described and illustrated in connection with a preferred embodiment for illustrating the technical spirit of the present invention above, the present invention is not limited to the configuration and operation as shown and described as such, it is a deviation from the scope of the technical idea It will be understood by those skilled in the art that many changes and modifications can be made to the invention without departing from the scope of the invention. Accordingly, all such suitable changes and modifications should be considered to be within the scope of the present invention.

Base part: 10 Vertical measuring electrode part: 20
Horizontal measuring electrode part: 30 columns1: 31
Row 2: 33 Column 3: 35
Row 4: 37 Velcro strap: 50
Signal transceiver: 600 EEG data processor: 700
Interface value output part: 800 control part: 900

Claims (13)

A base part connected from the frontal part of the user to the back of the head;
A vertical measuring electrode part disposed on one surface of the base part and including a plurality of vertical measuring electrodes arranged in a line from a center position of the front head part to a center position of the back head part at predetermined intervals; And
Located on one surface of the base portion, a plurality of horizontal measuring electrodes are arranged in the left and right direction around the vertical measuring electrode to form a plurality of rows along the longitudinal direction, the number of horizontal measuring electrodes arranged in the column is the front head And a transverse measuring electrode unit arranged to decrease to the parietal and increase from the parietal to the larynx. The method of claim 1,
And each of the base portion, the vertical measurement electrode portion, and the horizontal measurement electrode portion is separated into a band shape. The method of claim 1,
And the base portion, the vertical measurement electrode portion, and the horizontal measurement electrode portion are integrally formed. The method of claim 1, wherein the vertical measuring electrode portion,
An array device for measuring EEG with the measuring electrodes arranged in Fz, Cz and Pz based on the International 10-20 System of Electrode Placement. The method of claim 1, wherein the horizontal measuring electrode unit,
An electroencephalography array device in which measurement electrodes are arranged in F3, F4, F7, F8, Fp1, Fp2, O1, O2, P3, P4, T5, and T6 based on 10-20 international electrode placement method. The method according to claim 4 or 5,
An array device for EEG measurement, in which an additional measurement electrode is arranged in Fpz based on 10-20 International Electrode Placement Method. The method of claim 6, wherein the measuring electrodes arranged in the Cz,
Array device for measuring EEG as a reference electrode. The method of claim 6, wherein the measuring electrodes arranged in the Fpz,
An array device for measuring EEG as a ground electrode. The method of claim 6, wherein the horizontal measuring electrode unit,
And an elastic Velcro strap on both sides of the column. The method of claim 4, wherein
The measurement electrodes arranged in the Fz is 23.6 Ohms,
Measuring electrodes arranged in the Cz is 17.9 Ohms,
The array of measuring electrodes arranged in the Pz EEG array device having a resistance value of 14.4 Ohms. The method of claim 5, wherein
Measuring electrodes arranged in the F3 and F4 is 27.3 Ohms,
Measuring electrodes arranged in the F7 and F8 is 36.7 Ohms,
Measurement electrodes arranged in the Fp1 and Fp2 is 32.1 Ohms,
The measuring electrodes arranged on the O1 and the O2 are 8.6 Ohms,
Measuring electrodes arranged in the P3 and P4 is 15.5 Ohms,
Measuring electrodes arranged in the T5 and T6 array device for measuring EEG having a resistance value of 12.5 Ohms. The method of claim 6,
The measuring electrode arranged in the Fpz array device for measuring EEG having a resistance value of 30.4 Ohms. A signal transmitting / receiving unit which transmits an electric signal to the EEG measuring array apparatus of claim 1 and receives an EEG data signal measured according to the transmission;
An electroencephalogram data processor configured to calculate a value representing a state of a user based on the received electroencephalogram data signal;
An interface value output unit configured to output an interface value according to the calculated state value of the user; And
And a control unit for controlling the brain wave data receiving unit to the interface value output unit.

Images