KR20190142995A - Fluorine-based organic polysilazane or preparation methode thereof - Google Patents
Fluorine-based organic polysilazane or preparation methode thereof Download PDFInfo
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- KR20190142995A KR20190142995A KR1020180070383A KR20180070383A KR20190142995A KR 20190142995 A KR20190142995 A KR 20190142995A KR 1020180070383 A KR1020180070383 A KR 1020180070383A KR 20180070383 A KR20180070383 A KR 20180070383A KR 20190142995 A KR20190142995 A KR 20190142995A
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- Prior art keywords
- fluorine
- organopolysilazane
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- polysilazane
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- 229910052731 fluorine Inorganic materials 0.000 title claims abstract description 40
- 239000011737 fluorine Substances 0.000 title claims abstract description 40
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims abstract description 39
- 229920001709 polysilazane Polymers 0.000 title claims abstract description 35
- 238000002360 preparation method Methods 0.000 title description 10
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims abstract description 23
- 238000000034 method Methods 0.000 claims abstract description 21
- LNUZHCSQTRPPPK-UHFFFAOYSA-N dichloro(difluoro)silane Chemical compound F[Si](F)(Cl)Cl LNUZHCSQTRPPPK-UHFFFAOYSA-N 0.000 claims abstract description 14
- 238000004519 manufacturing process Methods 0.000 claims abstract description 14
- 238000005915 ammonolysis reaction Methods 0.000 claims abstract description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 16
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 12
- 238000006243 chemical reaction Methods 0.000 claims description 9
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 8
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical group CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 claims description 8
- -1 difetylchlorosilane Chemical compound 0.000 claims description 7
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical group Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 claims description 5
- 229910021529 ammonia Inorganic materials 0.000 claims description 4
- 239000002904 solvent Substances 0.000 claims description 4
- YWWDBCBWQNCYNR-UHFFFAOYSA-N trimethylphosphine Chemical compound CP(C)C YWWDBCBWQNCYNR-UHFFFAOYSA-N 0.000 claims description 4
- 238000000354 decomposition reaction Methods 0.000 claims description 3
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 claims description 3
- OHABWQNEJUUFAV-UHFFFAOYSA-N dichloro-methyl-(3,3,3-trifluoropropyl)silane Chemical compound C[Si](Cl)(Cl)CCC(F)(F)F OHABWQNEJUUFAV-UHFFFAOYSA-N 0.000 claims description 3
- 239000005048 methyldichlorosilane Substances 0.000 claims description 3
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims description 2
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 claims description 2
- ZTHJQCDAHYOPIK-UHFFFAOYSA-N 3-methylbut-2-en-2-ylbenzene Chemical compound CC(C)=C(C)C1=CC=CC=C1 ZTHJQCDAHYOPIK-UHFFFAOYSA-N 0.000 claims description 2
- SBJSYSHFIFOUFO-UHFFFAOYSA-N CC(C)CC[SiH](Cl)Cl Chemical compound CC(C)CC[SiH](Cl)Cl SBJSYSHFIFOUFO-UHFFFAOYSA-N 0.000 claims description 2
- LWWFOCUDNWWRTJ-UHFFFAOYSA-N CC=C[SiH](Cl)Cl Chemical compound CC=C[SiH](Cl)Cl LWWFOCUDNWWRTJ-UHFFFAOYSA-N 0.000 claims description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 claims description 2
- XRBZWUQAUXLFDY-UHFFFAOYSA-N benzyl(dichloro)silane Chemical compound Cl[SiH](Cl)CC1=CC=CC=C1 XRBZWUQAUXLFDY-UHFFFAOYSA-N 0.000 claims description 2
- IOBUYOYOZJVCGU-UHFFFAOYSA-N chloro(dicyclohexyl)silane Chemical compound C1CCCCC1[SiH](Cl)C1CCCCC1 IOBUYOYOZJVCGU-UHFFFAOYSA-N 0.000 claims description 2
- WRNUBMATUCAXHM-UHFFFAOYSA-N chloro(prop-2-enyl)silane Chemical compound Cl[SiH2]CC=C WRNUBMATUCAXHM-UHFFFAOYSA-N 0.000 claims description 2
- SGYSOPIROMCESS-UHFFFAOYSA-N chloro-[(4-chlorophenyl)methyl]silane Chemical compound Cl[SiH2]Cc1ccc(Cl)cc1 SGYSOPIROMCESS-UHFFFAOYSA-N 0.000 claims description 2
- LVFFNMMFDNKFDK-UHFFFAOYSA-N chloro-bis(2-methylpropyl)silane Chemical compound CC(C)C[SiH](Cl)CC(C)C LVFFNMMFDNKFDK-UHFFFAOYSA-N 0.000 claims description 2
- WSGBJEXMYYBFCD-UHFFFAOYSA-N chloro-bis(4-methylphenyl)silane Chemical compound Cc1ccc(cc1)[SiH](Cl)c1ccc(C)cc1 WSGBJEXMYYBFCD-UHFFFAOYSA-N 0.000 claims description 2
- ZUKYLGDWMRLIKI-UHFFFAOYSA-N chloro-ethyl-methylsilicon Chemical compound CC[Si](C)Cl ZUKYLGDWMRLIKI-UHFFFAOYSA-N 0.000 claims description 2
- IPAIXTZQWAGRPZ-UHFFFAOYSA-N chloro-methyl-phenylsilicon Chemical compound C[Si](Cl)C1=CC=CC=C1 IPAIXTZQWAGRPZ-UHFFFAOYSA-N 0.000 claims description 2
- UNJIGALTJKOEIR-UHFFFAOYSA-N dibenzyl(chloro)silane Chemical compound C=1C=CC=CC=1C[SiH](Cl)CC1=CC=CC=C1 UNJIGALTJKOEIR-UHFFFAOYSA-N 0.000 claims description 2
- PMRZHVOZUPJRSI-UHFFFAOYSA-N dibromo(propyl)silane Chemical compound CCC[SiH](Br)Br PMRZHVOZUPJRSI-UHFFFAOYSA-N 0.000 claims description 2
- MYWFLJDFFCFHNT-UHFFFAOYSA-N dichloro(2-methylpropyl)silane Chemical compound CC(C)C[SiH](Cl)Cl MYWFLJDFFCFHNT-UHFFFAOYSA-N 0.000 claims description 2
- YUKZTICWNSSDIL-UHFFFAOYSA-N dichloro(cyclohexyl)silane Chemical compound Cl[SiH](Cl)C1CCCCC1 YUKZTICWNSSDIL-UHFFFAOYSA-N 0.000 claims description 2
- PFMKUUJQLUQKHT-UHFFFAOYSA-N dichloro(ethyl)silicon Chemical compound CC[Si](Cl)Cl PFMKUUJQLUQKHT-UHFFFAOYSA-N 0.000 claims description 2
- FRALJFRRPFOSQB-UHFFFAOYSA-N dichloro(fluoro)silane Chemical compound F[SiH](Cl)Cl FRALJFRRPFOSQB-UHFFFAOYSA-N 0.000 claims description 2
- NYKYPUSQZAJABL-UHFFFAOYSA-N dichloro(hexyl)silane Chemical compound CCCCCC[SiH](Cl)Cl NYKYPUSQZAJABL-UHFFFAOYSA-N 0.000 claims description 2
- XNAFLNBULDHNJS-UHFFFAOYSA-N dichloro(phenyl)silicon Chemical compound Cl[Si](Cl)C1=CC=CC=C1 XNAFLNBULDHNJS-UHFFFAOYSA-N 0.000 claims description 2
- HAKOAQCVDUCPTM-UHFFFAOYSA-N dichloro(propan-2-yl)silane Chemical compound CC(C)[SiH](Cl)Cl HAKOAQCVDUCPTM-UHFFFAOYSA-N 0.000 claims description 2
- HZHUAESPXGNNFV-UHFFFAOYSA-N diethyl(methyl)phosphane Chemical compound CCP(C)CC HZHUAESPXGNNFV-UHFFFAOYSA-N 0.000 claims description 2
- ZUBAIVQCZYOVOJ-UHFFFAOYSA-N ethyl(difluoro)silane Chemical compound CC[SiH](F)F ZUBAIVQCZYOVOJ-UHFFFAOYSA-N 0.000 claims description 2
- LEMQFDHLRUSMPZ-UHFFFAOYSA-N ethyl(dimethyl)phosphane Chemical compound CCP(C)C LEMQFDHLRUSMPZ-UHFFFAOYSA-N 0.000 claims description 2
- DAZXVJBJRMWXJP-UHFFFAOYSA-N n,n-dimethylethylamine Chemical compound CCN(C)C DAZXVJBJRMWXJP-UHFFFAOYSA-N 0.000 claims description 2
- GNVRJGIVDSQCOP-UHFFFAOYSA-N n-ethyl-n-methylethanamine Chemical compound CCN(C)CC GNVRJGIVDSQCOP-UHFFFAOYSA-N 0.000 claims description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims 1
- KMHWGWIJGRKBTI-UHFFFAOYSA-N dichloro-(4-methylphenyl)silane Chemical compound CC1=CC=C([SiH](Cl)Cl)C=C1 KMHWGWIJGRKBTI-UHFFFAOYSA-N 0.000 claims 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims 1
- 125000001153 fluoro group Chemical group F* 0.000 claims 1
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 9
- 239000003921 oil Substances 0.000 description 8
- 238000003756 stirring Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- PVBMWIXRKLGXPI-UHFFFAOYSA-N dichloro-(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl)-methylsilane Chemical group C[Si](Cl)(Cl)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F PVBMWIXRKLGXPI-UHFFFAOYSA-N 0.000 description 6
- UWGIJJRGSGDBFJ-UHFFFAOYSA-N dichloromethylsilane Chemical compound [SiH3]C(Cl)Cl UWGIJJRGSGDBFJ-UHFFFAOYSA-N 0.000 description 5
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 125000002729 alkyl fluoride group Chemical group 0.000 description 4
- 238000011109 contamination Methods 0.000 description 4
- 239000012467 final product Substances 0.000 description 4
- 239000010702 perfluoropolyether Substances 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 230000005587 bubbling Effects 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- KUDPIUYHGSRVGM-UHFFFAOYSA-N dichloro-(3,3,4,4,5,5,5-heptafluoropentyl)-methylsilane Chemical compound C[Si](Cl)(Cl)CCC(F)(F)C(F)(F)C(F)(F)F KUDPIUYHGSRVGM-UHFFFAOYSA-N 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- 239000005871 repellent Substances 0.000 description 3
- 230000002940 repellent Effects 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 238000005292 vacuum distillation Methods 0.000 description 3
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- RCNRJBWHLARWRP-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane;platinum Chemical compound [Pt].C=C[Si](C)(C)O[Si](C)(C)C=C RCNRJBWHLARWRP-UHFFFAOYSA-N 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- HTDIUWINAKAPER-UHFFFAOYSA-N trimethylarsine Chemical compound C[As](C)C HTDIUWINAKAPER-UHFFFAOYSA-N 0.000 description 2
- GETTZEONDQJALK-UHFFFAOYSA-N (trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1 GETTZEONDQJALK-UHFFFAOYSA-N 0.000 description 1
- NKAMGQZDVMQEJL-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodec-1-ene Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C=C NKAMGQZDVMQEJL-UHFFFAOYSA-N 0.000 description 1
- AVAKDRTWBDKXJJ-UHFFFAOYSA-N Cl[SiH](Cl)C#C Chemical compound Cl[SiH](Cl)C#C AVAKDRTWBDKXJJ-UHFFFAOYSA-N 0.000 description 1
- NZXAQQZPKOVSSQ-UHFFFAOYSA-N FC(C=C)(C(C(F)(F)F)(F)F)F.FC(C=C)(C(C(F)(F)F)(F)F)F Chemical compound FC(C=C)(C(C(F)(F)F)(F)F)F.FC(C=C)(C(C(F)(F)F)(F)F)F NZXAQQZPKOVSSQ-UHFFFAOYSA-N 0.000 description 1
- MZOLOMNHGCTGGL-UHFFFAOYSA-N FC(CC[SiH2]C(Cl)Cl)(F)F.FC(CC[SiH2]C(Cl)Cl)(F)F Chemical compound FC(CC[SiH2]C(Cl)Cl)(F)F.FC(CC[SiH2]C(Cl)Cl)(F)F MZOLOMNHGCTGGL-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 229920001774 Perfluoroether Polymers 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- FXMNVBZEWMANSQ-UHFFFAOYSA-N chloro(silyl)silane Chemical compound [SiH3][SiH2]Cl FXMNVBZEWMANSQ-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000006356 dehydrogenation reaction Methods 0.000 description 1
- WWAUWWYCNBROND-UHFFFAOYSA-N dichloro-(1,1,2,2,5,5,5-heptafluoropentyl)-methylsilane Chemical compound C[Si](Cl)(Cl)C(F)(F)C(F)(F)CCC(F)(F)F WWAUWWYCNBROND-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- UJMWVICAENGCRF-UHFFFAOYSA-N oxygen difluoride Chemical compound FOF UJMWVICAENGCRF-UHFFFAOYSA-N 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/121—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
- C07F7/126—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20 by reactions involving the formation of Si-Y linkages, where Y is not a carbon or halogen atom
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
- C08G77/08—Preparatory processes characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
- C08G77/382—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
- C08G77/385—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing halogens
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/62—Nitrogen atoms
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Chemical & Material Sciences (AREA)
- Silicon Polymers (AREA)
Abstract
Description
본 발명은 불소계 유기폴리실라잔 또는 이의 제조방법에 관한 것으로서, 좀 더 자세하게는 불화알킬 그룹을 도입하여 친유성이 제거된 폴리실라잔 또는 이의 제조방법에 관한 것이다.The present invention relates to a fluorine-based organopolysilazane or a method for preparing the same, and more particularly, to a polysilazane or a method for preparing the lipophilic by introducing an alkyl fluoride group.
폴리실라잔은 -(SiR2-NR)-를 기본 단위로 갖는 고분자 재료로서, 가열하면 실리카 또는 실리카 물질로 전환되며, 이렇게 형성된 실리카 물질은 절연성이 우수하기 때문에 절연막 등으로 전기·전자 분야에서 주로 이용되고 있다. 또한 폴리실라잔은 물과의 가수분해 반응 시 SiO2 층을 형성하므로, 폴리실라잔이 코팅된 표면은 공기 중의 수분과 반응하여 고내구성의 피막을 형성할 수 있다.Polysilazane is a polymer material having-(SiR 2 -NR)-as a basic unit, and when heated, it is converted into a silica or silica material.Since the silica material is excellent in insulation, it is mainly used in electrical and electronic fields as an insulating film. It is used. In addition, since the polysilazane forms a SiO 2 layer during the hydrolysis reaction with water, the surface coated with the polysilazane may form a highly durable film by reacting with moisture in the air.
폴리실라잔은 광범위한 출발물질을 사용하여 다양한 방법으로 제조될 수 있으며, 일반적으로 암모니아로부터 제조되는 폴리실라잔은 가암모니아 분해물(ammonolysate)로, NH2기를 함유하는 암모니아 외의 아미노 화합물로부터 제조되는 폴리실라잔은 아미노분해물(aminolysate)로서 공지되어 있다.Polysilazanes can be prepared in a variety of ways using a wide range of starting materials. Polysilazanes, which are generally made from ammonia, are ammonolysates, polysilas made from amino compounds other than ammonia containing NH 2 groups. Cups are known as aminolysates.
가암모니아 분해 공정에 의한 폴리실라잔의 제조방법으로서, 미국특허 제4,395,460호에 불활성 용매에 용해된 클로로디실란 용액과 암모니아 기체를 반응시켜 폴리실라잔을 제조하는 공정이 개시되어 있으며, 대한민국 공개특허 제10-2007-0040422호에서는 하나 이상의 Si-H 결합을 가지는 할로실란을 과량의 무수 액체 암모니아에 도입하여 폴리실라잔을 포함하는 가암모니아 분해생성물을 제조하는 방법에 대해 제시하고 있다.As a method for preparing polysilazane by ammonolysis, US Pat. No. 4,395,460 discloses a process for preparing polysilazane by reacting a chlorodisilane solution dissolved in an inert solvent with ammonia gas. 10-2007-0040422 discloses a process for preparing ammonolysis products comprising polysilazane by introducing an excess of anhydrous liquid ammonia having one or more Si—H bonds into an excess of anhydrous liquid ammonia.
그 외에도 SiCl4, SiH2Cl2 등의 실리콘할로겐화물에 아민을 반응시키거나, 전이 금속 착체 촉매를 사용하여 실란 화합물과 아민 화합물의 탈수소 반응에 의해 폴리실라잔을 합성하는 방법 등의 아미노 분해 공정에 의한 방법들도 제안되어 있다.In addition, amino decomposition processes such as a method of synthesizing polysilazane by reacting an amine with a silicon halide such as SiCl 4 , SiH 2 Cl 2 , or dehydrogenation of a silane compound with an amine compound using a transition metal complex catalyst The methods by are also proposed.
그러나 종래의 방법으로 제조된 일반적인 폴리실라잔은 메틸작용기로 인해 발수 성능을 나타내지만 상기 메틸 작용기로 인한 과도한 친유성으로 인해 오염에는 취약하다는 단점이 있다. 이에 이를 개선하기 위하여 물과 기름에 모두 젖지 않는 불소가 도입된 폴리실라잔이 제안되고 있으며, 일본 특허공보 제2010-043251호에 주로 로 표시되는 분지상의 퍼플루오로폴레에테르를 원료로서 실란잔화한 퍼플루오로폴리에테르 변성 폴리실라잔이 개시되어 있다. 또한, 일본 특허공보 제2012-257650호에 직쇄상의 (CF2O)p(CF2CF2O)q를 주쇄 구조에 갖는 퍼플루오로폴리에테르 변성 실라잔이 개시되어 있다.However, the general polysilazane prepared by the conventional method shows a water repellent performance due to the methyl functional group, but has a disadvantage of being vulnerable to contamination due to excessive lipophilic due to the methyl functional group. In order to improve this problem, polysilazane in which fluorine is introduced that does not get wet with both water and oil is proposed, and Japanese Patent Publication No. 2010-043251 is mainly proposed. Disclosed is a perfluoropolyether-modified polysilazane obtained by silanicating a branched perfluoropolyether represented as a raw material. Also, Japanese Patent Publication No. 2012-257650 discloses a perfluoropolyether modified silazane having linear (CF 2 O) p (CF 2 CF 2 O) q in a main chain structure.
그러나 상기의 경우 역시 충분한 오염 닦임성 및 발유성을 갖추지 못하고 있다. 이에 본 발명자들은 불소계 알킬 그룹은 도입함으로써 폴리실라잔의 친유성을 제거하여 쉽게 오염되지 않거나, 오염되더라도 오염의 제거가 용이한 특성을 가지는 폴리실라잔 및 상기 폴리실라잔의 제조방법을 개발하게 되었다.However, the above case also does not have sufficient pollution wipeability and oil repellency. Accordingly, the present inventors have developed a polysilazane and a method for preparing the polysilazane, which have a property of removing lipophilic group and removing the lipophilic property of the polysilazane so that it is not easily contaminated or easy to remove the contamination. .
본 발명의 기술적 사상이 이루고자 하는 기술적 과제는 퍼플루오로다이클로로실란(perfluorodichlorosilane) 및 메틸다이클로로실란(methyldichlorosilane)이 결합되어 제조된 불소계 유기폴리실라잔 또는 이의 제조방법을 제공하는 것이다. The technical problem to be achieved by the present invention is to provide a fluorine-based organic polysilazane or a method for preparing the same by combining perfluorodichlorosilane and methyldichlorosilane.
그러나 이러한 과제는 예시적인 것으로, 본 발명의 기술적 사상은 이에 한정되는 것은 아니다.However, these problems are exemplary, and the technical idea of the present invention is not limited thereto.
상기 기술적 과제를 달성하기 위한 본 발명의 기술적 사상에 따른 유기폴리실라잔은 하기 화학식 1의 구조를 갖는 불소계 유기폴리실라잔인 것을 특징으로 한다.The organic polysilazane according to the technical idea of the present invention for achieving the above technical problem is characterized in that the fluorine-based organic polysilazane having a structure of formula (1).
[화학식 1][Formula 1]
이때, 상기 n = 0 ~ 7의 정수이며, x 및 y = 1 ~ 120의 정수이다.In this case, n is an integer of 0 to 7, and x and y are an integer of 1 to 120.
또한 본 발명의 불소계 유기폴리실라잔의 수평균분자량(Mn)이 1,000 ~ 50,000인 것을 특징으로 한다.In addition, the number average molecular weight (Mn) of the fluorine-based organopolysilazane of the present invention is characterized in that 1,000 to 50,000.
반면, 상기 특허문헌 3 및 4에는 화학식 1에 나타낸 바와 같이 산소를 포함하지 않는 불화알킬 그룹이 도입된 불소계 유기폴리실라잔에 대해서 구체적인 개시는 없으며, 상기 특헌문헌 3은 주로 로 표시되는 분지상의 반복 단위를 갖는 실라잔을 나타내고, 특허문헌 4는 직쇄상의 (CF2O)p(CF2CF2O)q 구조를 갖는 실라잔을 나타내는 것인 반면, 본 발명은 (CH2)2(CF2)nCF3를 구조로 갖는 것으로서, 에테르기를 포함하지 않는다.On the other hand, Patent Documents 3 and 4 do not have a specific disclosure about the fluorine-based organopolysilazane introduced with an alkyl fluoride group containing no oxygen as shown in Formula 1, the Patent Document 3 is mainly While a silazane having a branched repeating unit represented by is represented, Patent Document 4 shows a silazane having a linear (CF 2 O) p (CF 2 CF 2 O) q structure, while the present invention It has (CH 2 ) 2 (CF 2 ) n CF 3 as a structure and does not contain an ether group.
또한, 본 발명은 실라잔 및 불화알킬 그룹 모두 반복단위로서 제조 가능한 반면, 특허문헌 3 및 4는 퍼플루오로에테르만이 반복단위로서 조절 가능한 바 그 구조의 차이로 인해 본원발명은 특허문헌 3 및 4 대비 발수 및 발유 특성에 있어서 우수한 효과를 보이는 불소계 유기폴리실라잔 및 이의 제조방법을 제공한다. In addition, the present invention can be produced as a repeating unit for both the silazane and alkyl fluoride group, while Patent Documents 3 and 4, only the perfluoroether can be adjusted as a repeating unit, the present invention is due to the difference in the structure of the Patent Document 3 and It provides a fluorine-based organopolysilazane and a method for producing the same having an excellent effect on the water repellent and oil repellent properties.
본 발명의 불소계 유기폴리실라잔은 퍼플루오로디클로로실란(perfluorodichlorosilane) 및 할로실란을 암모니아(ammonia) 가스하에서 가암모니아 분해 반응(aminolysis)시켜 제조할 수 있다.The fluorine-based organopolysilazane of the present invention can be prepared by ammonolysis of perfluorodichlorosilane and halosilane under ammonia gas.
이때, 상기 할로실란은 적어도 하나도 하나 이상의 Si-H 결합을 함유하는 것이 바람직하며, 예를 들어 디클로로실란, 메틸디클로로실란, 에틸디클로로실란, 에틸디아이오도실란, 에틸디플루오로실란, 디클로로모노플루오로실란, 프로필디브로모실란, 이소프로필디클로로실란, 이소부틸디클로로실란, 이소아밀디클로로실란, 벤질디클로로실란, 프로펜일디클로로실란, 나프틸디클로로실란, 페닐디클로로실란, 디페틸클로로실란, 메틸에틸클로로실란, 비닐메틸클로로실란, 페닐메틸클로로실란, 디벤질클로로실란, p-클로로페닐메틸클로로실란, n-헥실디클로로실란, 시클로헥실디클로로실란, 디시클로헥실클로로실란, 디-이소부틸클로로실란, p-톨일디클로로실란, 디-p-톨일클로로실란, p-스티릴디클로로실란, 에티닐 디클로로실란으로 이루어진 군에서 선택된 1종 이상일 수 있다.At this time, the halosilane preferably contains at least one Si-H bond, for example, dichlorosilane, methyldichlorosilane, ethyldichlorosilane, ethyldioodosilane, ethyldifluorosilane, dichloromonofluoro Silane, propyldibromosilane, isopropyldichlorosilane, isobutyldichlorosilane, isoamyldichlorosilane, benzyldichlorosilane, propenyldichlorosilane, naphthyldichlorosilane, phenyldichlorosilane, difetylchlorosilane, methylethylchlorosilane, Vinylmethylchlorosilane, phenylmethylchlorosilane, dibenzylchlorosilane, p-chlorophenylmethylchlorosilane, n-hexyldichlorosilane, cyclohexyldichlorosilane, dicyclohexylchlorosilane, di-isobutylchlorosilane, p-tolyl In the group consisting of dichlorosilane, di-p-tolylchlorosilane, p-styryldichlorosilane, ethynyl dichlorosilane Selected may be more than one kind.
또한, 상기 퍼플루오로디클로로실란은 (3,3,3-트리플루오로프로필)디클로로메틸실란, 3,3,4,4,5,5,5,-헵타플루오로펜틸메틸디클로로실란 및 1H,1H,2H,2H-퍼플루오로데실메틸디클로로실란으로 이루어진 군에서 선택된 1종인 것이 바람직하다.In addition, the perfluorodichlorosilanes are (3,3,3-trifluoropropyl) dichloromethylsilane, 3,3,4,4,5,5,5, -heptafluoropentylmethyldichlorosilane and 1H, It is preferably one kind selected from the group consisting of 1H, 2H, 2H-perfluorodecylmethyldichlorosilane.
상기 퍼플루오로디클로로실란이 (3,3,3-트리플루오로프로필)디클로로메틸실란인 경우 상기 불소계 유기폴리실라잔은 하기 화학식 2의 구조를 갖는 것을 특징으로 한다.When the perfluorodichlorosilane is (3,3,3-trifluoropropyl) dichloromethylsilane, the fluorine-based organopolysilazane has a structure of Formula 2 below.
[화학식 2][Formula 2]
상기 퍼플루오로디클로로실란이 3,3,4,4,5,5,5,-헵타플루오로펜틸메틸디클로로실란인 경우 상기 불소계 유기폴리실라잔은 하기 화학식 3의 구조를 갖는 것을 특징으로 한다. When the perfluorodichlorosilane is 3,3,4,4,5,5,5, -heptafluoropentylmethyldichlorosilane, the fluorine-based organopolysilazane has a structure of Formula 3 below.
[화학식 3][Formula 3]
상기 퍼플루오로디클로로실란이 1H,1H,2H,2H-퍼플루오로데실메틸디클로로실란인 경우 상기 불소계 유기폴리실라잔은 하기 화학식 4의 구조를 갖는 것을 특징으로 한다.When the perfluorodichlorosilane is 1H, 1H, 2H, 2H-perfluorodecylmethyldichlorosilane, the fluorine-based organopolysilazane has a structure of Formula 4 below.
[화학식 4][Formula 4]
본 발명은 하기 반응식 1에 따른 불소계 유기폴리실라잔의 제조방법을 제공한다.The present invention provides a method for preparing fluorine-based organopolysilazane according to Scheme 1 below.
[반응식 1]Scheme 1
상기 불소계 유기폴리실라잔의 제조방법은, 자세하게는 (1단계)퍼플루오로디클로로실란 및 할로실란을 염기성 용매에 용해시켜 혼합용액을 제조한 후 교반하는 단계;The method of preparing the fluorine-based organopolysilazane includes, in detail, (step 1) dissolving perfluorodichlorosilane and halosilane in a basic solvent to prepare a mixed solution, followed by stirring;
(2단계)상기 혼합용액에 암모니아 가스를 주입하고 교반하는 단계;(Step 2) injecting ammonia gas into the mixed solution and stirring;
(3단계)침전된 염 및 잔류 용매를 제거하는 단계; 및(Step 3) removing the precipitated salt and residual solvent; And
(4단계)최종 생성물을 숙성하여 불소계 유기폴리실라잔을 생성하는 단계;를 포함한다.(Step 4) aging the final product to produce a fluorine-based organopolysilazane; includes.
이때, 1단계에서 상기 염기성 용매는 트리메틸아민, 디메틸에틸아민, 디에틸메틸아민, 트리에틸아민, 피리딘, 피콜린, 디메틸아닐린, 트리메틸포스핀, 디메틸에틸포스핀, 메틸디에틸포스핀, 트리에틸포스핀, 트리메틸아르신, 트리메틸스티핀, 트리메틸아민, 트리에틸아민, 트리아진으로 이루어진 군에서 선택된 1종 이상인 것이 바람직하다. In this step, the basic solvent is trimethylamine, dimethylethylamine, diethylmethylamine, triethylamine, pyridine, picoline, dimethylaniline, trimethylphosphine, dimethylethylphosphine, methyldiethylphosphine, triethyl It is preferable that it is at least 1 type selected from the group which consists of a phosphine, a trimethyl arsine, a trimethyl styrene, a trimethylamine, a triethylamine, and a triazine.
2단계에서 암모니아 가스는 10 ~ 30 ml/min의 속도로 주입되는 것이 바람직하다.In the second step, ammonia gas is preferably injected at a rate of 10 to 30 ml / min.
1단계 및 2단계에서 교반은 -10 ~ 10℃ 범위의 온도에서 수행되는 것이 바람직하다. Stirring in steps 1 and 2 is preferably carried out at a temperature in the range of -10 ~ 10 ℃.
또한 2단계에서 교반은 24 ~ 48시간의 범위로 수행되는 것이 바람직하다. 교반 시간이 24시간 미만일 경우 가암모니아 분해 반응이 충분히 이루어지지 않을 수 있으며, 48시간을 초과하는 경우 시간에 따른 가암모니아 분해 반응의 진행이 미미하므로 바람직하지 않다.In addition, the stirring in the second step is preferably carried out in the range of 24 to 48 hours. If the agitation time is less than 24 hours, the ammonia decomposition reaction may not be sufficiently made, and if it exceeds 48 hours, the progress of the ammonolysis reaction over time is not preferable.
4단계에서 숙성은 70 ~ 80℃의 온도 범위에서 24 ~ 48시간 수행되는 것이 바람직하다. In step 4, the aging is preferably performed for 24 to 48 hours in the temperature range of 70 ~ 80 ℃.
본 발명에서 제공하는 불소계 유기폴리실라잔은 불화알킬 그룹을 포함함으로써, 친유성이 제거되어 쉽게 오염되지 않거나 오염의 제거가 용이하다.Since the fluorine-based organopolysilazane provided by the present invention includes an alkyl fluoride group, the lipophilic is removed so that it is not easily contaminated or the contamination is easily removed.
이하 본 발명의 바람직한 실시예를 상세히 설명하기로 한다. 그러나, 본 발명은 여기서 설명되는 실시예에 한정되지 않고 다른 형태로 구체화될 수도 있다. 오히려, 여기서 소개되는 내용이 철저하고 완전해지도록, 당업자에게 본 발명의 사상을 충분히 전달하기 위해 제공하는 것이다.Hereinafter, a preferred embodiment of the present invention will be described in detail. However, the present invention is not limited to the embodiments described herein and may be embodied in other forms. Rather, it is provided to fully convey the spirit of the present invention to those skilled in the art so that the contents introduced herein are thoroughly and completely.
제조예 1Preparation Example 1
하기 반응식 2에 따라, 불소계 유기폴리실라잔을 제조하였다.According to Scheme 2, fluorine-based organopolysilazane was prepared.
[반응식 2]Scheme 2
이를 상세히 설명하면, 디클로로메틸실란 6ml와 (3,3,3-트리플루오로프로필)디클로로메틸실란[(3,3,3-trifluoropropyl)Dichloromethylsilane] 3.5g을 65ml의 피리딘과 함께 반응기에 넣고 0℃에서 교반하였다. 이어서 용액의 온도를 0℃로 유지하면서 20 ml/min의 속도로 암모니아 가스를 상기 용액 내에 주입하여 버블링하면서 3시간 동안 교반하였다. 이후 암모니아 가스의 주입을 차단하고 0℃에서 24시간동안 추가로 교반을 더 진행하였다. 반응 종료 후 필터를 통해 반응물 내에 침전된 염을 제거하고 남아있는 피리딘은 진공증류하여 제거하였다. 최종 생성물은 70℃의 온도에서 24시간 동안 숙성하여 분자량을 증가시켜 불소계 폴리실라잔을 얻었으며, 상기 불소계 폴리실라잔의 1H-NMR(CDCl3, 300Hz)을 측정하였고, 그 결과는 하기와 같았다.In detail, 6 ml of dichloromethylsilane and 3.5 g of (3,3,3-trifluoropropyl) dichloromethylsilane [(3,3,3-trifluoropropyl) Dichloromethylsilane] were added to a reactor with 65 ml of pyridine and 0 ° C. Stirred at. Ammonia gas was then injected into the solution at a rate of 20 ml / min while maintaining the temperature of the solution at 0 ° C. and stirred for 3 hours while bubbling. After the injection of ammonia gas was cut off and further stirring was continued for 24 hours at 0 ℃. After completion of the reaction, the salt precipitated in the reaction was removed through a filter, and the remaining pyridine was removed by vacuum distillation. The final product was aged for 24 hours at a temperature of 70 ℃ to increase the molecular weight to obtain a fluorine-based polysilazane, 1 H-NMR (CDCl 3 , 300Hz) of the fluorine-based polysilazane was measured, and the results are as follows. It was like
δ = 4.4 ~ 5(m, 1H); 2.1(m, 2H); 0.8(m, 2H); 0.1 ~ 0.4(m, 3H)delta = 4.4 to 5 (m, 1H); 2.1 (m, 2 H); 0.8 (m, 2 H); 0.1 to 0.4 (m, 3H)
제조예 2Preparation Example 2
먼저 하기 반응식 3-1에 따라, 퍼플루오로디클로로실란으로서 3,3,4,4,5,5,5,-헵타플루오로펜틸메틸디클로로실란(3,3,4,4,5,5,5-heptafluoropentylmethyldichlorosilane)을 제조하였다.First, according to Scheme 3-1, 3,3,4,4,5,5,5, -heptafluoropentylmethyldichlorosilane (3,3,4,4,5,5,) as perfluorodichlorosilane 5-heptafluoropentylmethyldichlorosilane) was prepared.
[반응식 3-1]Scheme 3-1
이를 상세히 설명하면, 3,3,4,4,5,5,5-헵타플루오로펜트-1-엔(3,3,4,4,5,5,5-Heptafluoropent-1-ene) 19.6g과 디클로로메틸실란 11g을 100ml의 테트라하이드로퓨란과 함께 반응기에 넣고 교반하였다. 이어서 백금 촉매 반응을 위해 Platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex solution 10 방울을 가하고 상온에서 24시간 교반하였다. 반응 종료 후 반응생성물을 진공 증류하여 3,3,4,4,5,5,5-헵타플루오로펜틸메틸다이클로로실란을 제조하였으며, 상기 3,3,4,4,5,5,5-헵타플루오로펜틸메틸다이클로로실란의 1H-NMR(CDCl3, 300Hz)을 측정하였고, 그 결과는 하기와 같았다.In detail, 19.6 g of 3,3,4,4,5,5,5-heptafluoropent-1-ene (3,3,4,4,5,5,5-Heptafluoropent-1-ene) And 11 g of dichloromethylsilane were added to the reactor together with 100 ml of tetrahydrofuran and stirred. Subsequently, 10 drops of Platinum (0) -1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex solution was added to the platinum catalyst and stirred at room temperature for 24 hours. After completion of the reaction, the reaction product was vacuum distilled to prepare 3,3,4,4,5,5,5-heptafluoropentylmethyldichlorosilane, and the 3,3,4,4,5,5,5- 1 H-NMR (CDCl 3 , 300 Hz) of heptafluoropentylmethyldichlorosilane was measured, and the results were as follows.
δ = 2.30(m, 2H); 1.39(m, 2H); 0.89(s, 3H)delta = 2.30 (m, 2H); 1.39 (m, 2 H); 0.89 (s, 3H)
다음으로 하기 반응식 3-2에 따라, 상기에서 제조된 3,3,4,4,5,5,5-헵타플루오로펜틸메틸다이클로로실란을 통해 불소계 유기폴리실라잔을 제조하였다.Next, according to Scheme 3-2, a fluorine-based organic polysilazane was prepared through the 3,3,4,4,5,5,5-heptafluoropentylmethyldichlorosilane prepared above.
[반응식 3-2]Scheme 3-2
이를 상세히 설명하면, 3,3,4,4,5,5,5-헵타플루오로펜틸메틸다이클로로실란 17.9g 과 다이클로로메틸실란 6ml를 60mL의 피리딘과 함께 반응기에 넣고 0℃에서 교반하였다. 이어서 용액의 온도를 0℃로 유지하면서 20 ml/min의 속도로 암모니아 가스를 상기 용액 내에 주입하여 버블링하면서 3시간 동안 교반하였다. 이후 암모니아 가스의 주입을 차단하고 0℃에서 24시간동안 추가로 교반을 더 진행하였다. 반응 종료 후 필터를 통해 반응물 내에 침전된 염을 제거하고 남아있는 피리딘은 진공증류하여 제거하였다. 최종 생성물은 70℃의 온도에서 24시간 동안 숙성하여 분자량을 증가시켜 불소계 폴리실라잔을 얻었으며, 상기 불소계 폴리실라잔의 1H-NMR(CDCl3, 300Hz)을 측정하였고, 그 결과는 하기와 같았다.In detail, 17.9 g of 3,3,4,4,5,5,5-heptafluoropentylmethyldichlorosilane and 6 ml of dichloromethylsilane were added to a reactor together with 60 mL of pyridine and stirred at 0 ° C. Ammonia gas was then injected into the solution at a rate of 20 ml / min while maintaining the temperature of the solution at 0 ° C. and stirred for 3 hours while bubbling. After the injection of ammonia gas was cut off and further stirring was continued for 24 hours at 0 ℃. After completion of the reaction, the salt precipitated in the reaction was removed through a filter, and the remaining pyridine was removed by vacuum distillation. The final product was aged for 24 hours at a temperature of 70 ℃ to increase the molecular weight to obtain a fluorine-based polysilazane, 1 H-NMR (CDCl 3 , 300Hz) of the fluorine-based polysilazane was measured, and the results are as follows. It was like
δ = 4.4 ~ 5(m, 1H); 2.1(m, 2H); 0.8(m, 2H); 0.1 ~ 0.4(m, 3H)delta = 4.4 to 5 (m, 1H); 2.1 (m, 2 H); 0.8 (m, 2 H); 0.1 to 0.4 (m, 3H)
제조예 3Preparation Example 3
먼저 하기 반응식 4-1에 따라, 퍼플루오로디클로로실란으로서 1H,1H,2H,2H-퍼플루오로데실메틸디클로로실란(1H,1H,2H,2H-Perfluorodecylmethyldichlorosilane)을 제조하였다.First, according to Scheme 4-1, 1H, 1H, 2H, 2H-perfluorodecylmethyldichlorosilane (1H, 1H, 2H, 2H-Perfluorodecylmethyldichlorosilane) was prepared as perfluorodichlorosilane.
[반응식 4-1]Scheme 4-1
이를 상세히 설명하면, 1H,1H,2H-퍼플루오로-1-데센(1H,1H,2H-Perfluoro-1-decene) 44.6g과 디클로로메틸실란 11g을 100ml의 테트라하이드로퓨란과 함께 반응기에 넣고 교반하였다. 이어서 백금 촉매 반응을 위해 Platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex solution 10 방울을 가하고 상온에서 24시간 교반하였다. 반응 종료 후 반응생성물을 진공 증류하여 1H,1H,2H,2H-퍼플루오로데실메틸다이클로로실란을 제조하였으며, 상기 1H,1H,2H,2H-퍼플루오로데실메틸다이클로로실란의 1H-NMR(CDCl3, 300Hz)을 측정하였고, 그 결과는 하기와 같았다.In detail, 44.6 g of 1H, 1H, 2H-Perfluoro-1-decene and 11 g of dichloromethylsilane were added to a reactor with 100 ml of tetrahydrofuran and stirred. It was. Subsequently, 10 drops of Platinum (0) -1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex solution was added to the platinum catalyst and stirred at room temperature for 24 hours. After the reaction was completed and the reaction product was vacuum distilled 1H, 1H, 2H, 2H- perfluoro decyl methyl dichloro silane were prepared, the 1H, 1H, 2H, 2H- perfluoro-decyl-methyl-1 H- of dichloro silane NMR (CDCl 3 , 300 Hz) was measured, and the results were as follows.
δ = 2.30(m, 2H); 1.39(m, 2H); 0.89(s, 3H)delta = 2.30 (m, 2H); 1.39 (m, 2 H); 0.89 (s, 3H)
다음으로 하기 반응식 4-2에 따라, 상기에서 제조된 1H,1H,2H,2H-퍼플루오로데실메틸디클로로실란을 통해 불소계 유기폴리실라잔을 제조하였다.Next, according to Scheme 4-2, fluorine-based organopolysilazane was prepared through 1H, 1H, 2H, 2H-perfluorodecylmethyldichlorosilane prepared above.
[반응식 4-2]Scheme 4-2
이를 상세히 설명하면, 1H,1H,2H,2H-퍼플루오로데실메틸다이클로로실란 32.3g과 다이클로로메틸실란 6ml를 100mL의 피리딘과 함께 반응기에 넣고 0℃에서 교반하였다. 이어서 용액의 온도를 0℃로 유지하면서 20 ml/min의 속도로 암모니아 가스를 상기 용액 내에 주입하여 버블링하면서 3시간 동안 교반하였다. 이후 암모니아 가스의 주입을 차단하고 0℃에서 24시간동안 추가로 교반을 더 진행하였다. 반응 종료 후 필터를 통해 반응물 내에 침전된 염을 제거하고 남아있는 피리딘은 진공증류하여 제거하였다. 최종 생성물은 80℃의 온도에서 24시간 동안 숙성하여 분자량을 증가시켜 불소계 폴리실라잔을 얻었으며, 상기 불소계 폴리실라잔의 1H-NMR(CDCl3, 300Hz)을 측정하였고, 그 결과는 하기와 같았다.In detail, 32.3 g of 1H, 1H, 2H, 2H-perfluorodecylmethyldichlorosilane and 6 ml of dichloromethylsilane were added to a reactor together with 100 mL of pyridine and stirred at 0 ° C. Ammonia gas was then injected into the solution at a rate of 20 ml / min while maintaining the temperature of the solution at 0 ° C. and stirred for 3 hours while bubbling. After the injection of ammonia gas was cut off and further stirring was continued for 24 hours at 0 ℃. After completion of the reaction, the salt precipitated in the reaction was removed through a filter, and the remaining pyridine was removed by vacuum distillation. The final product was aged for 24 hours at a temperature of 80 ℃ to increase the molecular weight to obtain a fluorine-based polysilazane, 1 H-NMR (CDCl 3 , 300 Hz) of the fluorine-based polysilazane was measured, and the results are as follows. It was like
δ = 4.4 ~ 5(m, 1H); 2.1(m, 2H); 0.8(m, 2H); 0.1 ~ 0.4(m, 3H)delta = 4.4 to 5 (m, 1H); 2.1 (m, 2 H); 0.8 (m, 2 H); 0.1 to 0.4 (m, 3H)
실험예Experimental Example 1. 젖음성 평가 1. Wetting
본 발명의 불소계 폴리실라잔의 젖음성을 평가하기 위해 특허문헌 3의 제조방법을 참고하여 으로 이루어진 퍼플루오로 폴리에테르 변성 폴리실라잔(비교예 1) 및 특허문헌 4의 제조방법을 참고하여 F(CF2O)p(C2F4O)q-CF2CH2OC3H6-SiNH1.5 95몰% 및 F(CF2O)p(C2F4O)q-CF3 5몰% (이때, q/p = 0.9, p+q ≒ 1.7)로 이루어진 퍼플루오로폴리에테르 변성 폴리실라잔(비교예 2)을 준비하였다.In order to evaluate the wettability of the fluorine-based polysilazane of the present invention with reference to the manufacturing method of Patent Document 3 F (CF 2 O) p (C 2 F 4 O) q -CF 2 CH 2 OC 3 H 6 with reference to the perfluoro polyether modified polysilazane (Comparative Example 1) and the manufacturing method of Patent Document 4 Perfluoropolyether consisting of 95 mol% of SiSiH 1.5 and 5 mol% of F (CF 2 O) p (C 2 F 4 O) q -CF 3 (where q / p = 0.9, p + q ≒ 1.7) Modified polysilazane (Comparative Example 2) was prepared.
제조예 1 내지 3 및 비교예 1 내지 2를 α,α,α-Trifluorotoluene에 각각 5% 농도로 녹인 후 혼합용액에 세척된 슬라이드 글래스를 담지하여 dip 코팅하고, 이어서 코팅된 슬라이드 글래스를 80℃의 오븐에서 24시간 건조한 후 수접촉각 및 기름접촉각을 측정하였으며, 그 결과를 하기 표 1에 정리하여 나타내었다.Preparation Examples 1 to 3 and Comparative Examples 1 to 2 were dissolved in α, α, α-Trifluorotoluene at a concentration of 5%, respectively, and then dip coated by supporting the washed slide glass in a mixed solution, followed by coating the coated slide glass at 80 ° C. After drying for 24 hours in the oven was measured water contact angle and oil contact angle, the results are summarized in Table 1 below.
상기 표 1을 참고하여, 제조예 1 내지 3의 경우 비교예 1 및 2와 대비하여 기름과의 접촉각이 높음을 볼 수 있으며, 이를 통해 발유성이 현저히 향상되었음을 확인할 수 있었다. 이에 제조예 1 내지 3을 통해 제조된 폴리실라잔을 표면 처리제로 사용하는 경우 발수성 및 발유성이 모두 우수하여 쉽게 오염되지 않으며, 오염의 제거가 용이한 것으로 확인되었다.With reference to Table 1, in the case of Preparation Examples 1 to 3 it can be seen that the contact angle with the oil is high compared to Comparative Examples 1 and 2, through which it was confirmed that the oil repellency is significantly improved. In the case of using the polysilazane prepared in Preparation Examples 1 to 3 as a surface treatment agent, both water repellency and oil repellency are not easily contaminated and it was confirmed that the contamination is easily removed.
Claims (10)
[화학식 1]
상기 n = 0 ~ 7의 정수이며, x 및 y = 1 ~ 120의 정수이다.Fluorine-based organopolysilazane having the structure of Formula 1 below.
[Formula 1]
Said is an integer of n = 0-7 and an integer of x and y = 1-120.
상기 불소계 유기폴리실라잔은 퍼플루오로디클로로실란 및 할로실란이 결합되어 제조되는 것을 특징으로 하는 불소계 유기폴리실라잔.The method of claim 1,
The fluorine-based organopolysilazane is a fluorine-based organopolysilazane, characterized in that the perfluorodichlorosilane and halosilane is prepared by combining.
상기 불소계 유기폴리실라잔은 하기 화학식 2 내지 4로 이루어진 군에서 선택된 1종으로 표시되는 것을 특징으로 하는 불소계 유기폴리실라잔.
[화학식 2]
[화학식 3]
[화학식 4]
The method of claim 1,
The fluorine-based organopolysilazane is fluorine-based organopolysilazane, characterized in that represented by one species selected from the group consisting of
[Formula 2]
[Formula 3]
[Formula 4]
[화학식 1]
상기 n = 0 ~ 7의 정수이며, x 및 y = 1 ~ 120의 정수이다.A method for producing fluorine-based organopolysilazane, wherein ammonia decomposition of perfluorodichlorosilane and halosilane is carried out under ammonia gas to produce organopolysilazane having the structure of formula (1).
[Formula 1]
Said is an integer of n = 0-7 and an integer of x and y = 1-120.
상기 퍼플루오로디클로로실란은 (3,3,3-트리플루오로프로필)디클로로메틸실란, 3,3,4,4,5,5,5,-헵타플루오로펜틸메틸디클로로실란 및 1H,1H,2H,2H-퍼플루오로데실메틸디클로로실란으로 이루어진 군에서 선택된 1종인 것을 특징으로 하는 불소계 유기폴리실라잔의 제조방법.The method of claim 4, wherein
The perfluorodichlorosilanes are (3,3,3-trifluoropropyl) dichloromethylsilane, 3,3,4,4,5,5,5, -heptafluoropentylmethyldichlorosilane and 1H, 1H, A method for producing a fluorine-based organopolysilazane, characterized in that one selected from the group consisting of 2H, 2H-perfluorodecylmethyldichlorosilane.
상기 할로실란은 디클로로실란, 메틸디클로로실란, 에틸디클로로실란, 에틸디아이오도실란, 에틸디플루오로실란, 디클로로모노플루오로실란, 프로필디브로모실란, 이소프로필디클로로실란, 이소부틸디클로로실란, 이소아밀디클로로실란, 벤질디클로로실란, 프로펜일디클로로실란, 나프틸디클로로실란, 페닐디클로로실란, 디페틸클로로실란, 메틸에틸클로로실란, 비닐메틸클로로실란, 페닐메틸클로로실란, 디벤질클로로실란, p-클로로페닐메틸클로로실란, n-헥실디클로로실란, 시클로헥실디클로로실란, 디시클로헥실클로로실란, 디-이소부틸클로로실란, p-톨일디클로로실란, 디-p-톨일클로로실란, p-스티릴디클로로실란, 에티닐 디클로로실란으로 이루어진 군에서 선택된 1종 이상인 것을 특징으로 하는 불소계 유기폴리실라잔의 제조방법.The method of claim 4, wherein
The halosilane is dichlorosilane, methyldichlorosilane, ethyldichlorosilane, ethyldioodosilane, ethyldifluorosilane, dichloromonofluorosilane, propyldibromosilane, isopropyldichlorosilane, isobutyldichlorosilane, isoamyldichloro Silane, benzyldichlorosilane, propenyldichlorosilane, naphthyldichlorosilane, phenyldichlorosilane, difetylchlorosilane, methylethylchlorosilane, vinylmethylchlorosilane, phenylmethylchlorosilane, dibenzylchlorosilane, p-chlorophenylmethyl Chlorosilane, n-hexyldichlorosilane, cyclohexyldichlorosilane, dicyclohexylchlorosilane, di-isobutylchlorosilane, p-tolyldichlorosilane, di-p-tolylchlorosilane, p-styryldichlorosilane, ethynyl Method for producing fluorine-based organopolysilazane, characterized in that at least one member selected from the group consisting of dichlorosilane.
상기 암모니아 가스는 10 ~ 30 ml/min의 속도로 주입되는 것을 특징으로 하는 불소계 유기폴리실라잔의 제조방법.The method of claim 4, wherein
The ammonia gas is a method of producing a fluorine-based organopolysilazane, characterized in that injected at a rate of 10 to 30 ml / min.
상기 가암모니아 분해 반응은 -10 ~ 10℃의 온도에서 24 ~ 48시간 수행되는 것을 특징으로 하는 불소계 유기폴리실라잔의 제조방법.The method of claim 4, wherein
The ammonolysis reaction is a method for producing a fluorine-based organopolysilazane, characterized in that performed for 24 to 48 hours at a temperature of -10 ~ 10 ℃.
상기 퍼플루오로디클로로실란 및 할로실란은 염기성 용매에 용해되어 반응되는 것을 특징으로 하는 불소계 유기폴리실라잔의 제조방법.The method of claim 4, wherein
The perfluorodichlorosilane and halosilane is dissolved in a basic solvent and the method for producing a fluorine-based organopolysilazane characterized in that the reaction.
상기 염기성 용매는 트리메틸아민, 디메틸에틸아민, 디에틸메틸아민, 트리에틸아민, 피리딘, 피콜린, 디메틸아닐린, 트리메틸포스핀, 디메틸에틸포스핀, 메틸디에틸포스핀, 트리에틸포스핀, 트리메틸아르신, 트리메틸스티핀, 트리메틸아민, 트리에틸아민, 트리아진으로 이루어진 군에서 선택된 1종 이상인 것을 특징으로 하는 불소계 유기 폴리실라잔의 제조방법.The method of claim 9,
The basic solvent is trimethylamine, dimethylethylamine, diethylmethylamine, triethylamine, pyridine, picoline, dimethylaniline, trimethylphosphine, dimethylethylphosphine, methyldiethylphosphine, triethylphosphine, trimethylar Method for producing a fluorine-based organic polysilazane, characterized in that at least one selected from the group consisting of shin, trimethyl styrene, trimethylamine, triethylamine, triazine.
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