KR20190055929A - High capacity waste purifying apparatus for using plasma - Google Patents

Abstract

Provided is an apparatus for purifying a large amount of contaminated water using plasma, which has a compact structure of a small volume while being suitable for purifying a large amount of contaminated water by performing continuous purification treatment in a process of generating flow of contaminated water. The apparatus for purifying a large amount of contaminated water, which supplies plasma-treated gas to flowing contaminated water to purify a large amount of contaminated water, comprises: an inlet through which contaminated water is introduced; a gas mixing unit having a gas suction hole into which the contaminated water is introduced from the inlet and a plasma-treated gas is sucked thereinto; an outlet for discharging the contaminated water mixed with gas in the gas mixing unit; a connection flow path connected to the gas suction hole; and a plasma treating apparatus connected to the connection flow path, and performing plasma treatment on the gas to supply the same to the gas suction hole through the connection flow path. The plasma treating apparatus is connected to a discharge pipe to be continuous, and transmits ultraviolet rays and shock waves to a transparent fluid flow pipe through which the contaminated water passes.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a high-

More particularly, the present invention relates to an apparatus for treating large amounts of polluted water by using plasma, and more particularly, to a method and apparatus for treating a large amount of polluted water by using a plasma, wherein gas activated by plasma is smoothly introduced into and mixed with polluted water flowing in the form of minute bubbles, The present invention relates to a water treatment apparatus capable of decomposing and purifying pollutants contained in a water treatment plant in a relatively short time.

BACKGROUND ART Conventionally, as a method for purifying contaminated water efficiently and removing microorganisms such as bacteria, there is known a method for purifying air or mixed gas generated by plasma in contaminated water in the form of fine bubbles.

1 shows a plasma water treatment apparatus 1 as described in Korean Patent Registration No. 10-0932377.

1, a transparent quartz tube 2, a conductive discharge electrode 3 (plasma generating electrode) inserted in the transparent quartz tube 2, a transparent quartz tube 2, A conductive counter electrode 4 which contacts the outer surface to concentrate the maximum potential gradient in the conductive discharge electrode 3 to form a high density plasma region in the discharge electrode 3 and a conductive counter electrode 4 which injects air or gas into the transparent quartz tube 2 And a torch head 5 having an injection port and a high-voltage line inlet.

In addition, a porous bubble device 6 is provided at the lower end of the transparent quartz tube 2, and fine bubbles are supplied into the water as the gas discharged from the transparent quartz tube 2 is pumped by pumping.

Since the gas is finely divided by the porous bubble device 6 and dispersed in the form of minute bubbles in the water, the time and surface area for contact with water of high concentration active species such as ozone and OH radical of the plasma-treated gas are increased, The water treatment efficiency can be increased by greatly increasing the dissolution rate and catalytic oxidation decomposition of species.

In such a configuration, the porous bubble generator 6 is constituted by a foamed material such as a sponge or a porous structure called an air stone, and functions so that the gas is divided into minute bubbles in the process of passing through the porous structure and discharged into the water .

However, the complicated porous structure of the conventional porous bubble device plays an effective role in breaking down the fine particles while passing through the pressurized gas and discharging the fine particles into the fine particles. However, when the foreign particles are contained in the gas, There is a problem that the permeability of the gas is gradually lowered at the time of use for a long period of time because there is a high possibility of occurrence of an internal jam.

This results in lower efficiency of microbubble generation and lowering of water treatment efficiency.

Further, in the case of the conventional large-capacity pollution water purification apparatus using plasma, the polluted material is purified by spraying the plasma-treated gas in the water tank into the microfilter in a state where the polluted water is contained in the water tank and stagnated.

Accordingly, in order to treat a large amount of contaminated water, it is necessary to repeatedly carry out the process of constructing a large-scale plasma processing apparatus as a whole or purifying the contaminated water in a predetermined amount of water several times in sequence.

However, there is a problem that the installation of a large-scale plasma processing apparatus increases the installation cost and burden of the installation space, and in the case of sequentially repeating the contaminated water of a fixed capacity, there is a problem that the processing time is increased, have.

SUMMARY OF THE INVENTION The present invention has been made in view of the above-described problems, and it is an object of the present invention to provide a plasma processing apparatus and a plasma processing method capable of preventing or minimizing clogging by foreign substances in a region where minute bubbles are generated, And to provide a large-capacity pollution and water purification apparatus using plasma having a structure capable of supplying the polluted water smoothly.

The present invention also provides a method for purifying a large amount of contaminated water by using a plasma having a compact structure with a small volume while being continuously cleaned in the process of flowing the polluted water, And to provide a purification treatment apparatus.

Accordingly, the present invention provides a large-capacity pollution control apparatus for purifying polluted water of a large capacity by supplying the plasma-treated gas to the polluted water to be flowed, the apparatus comprising: an inflow section into which polluted water flows; A gas mixing portion having a gas suction hole into which a plasma-processed gas is sucked as an inflow and flow portion; a discharge portion through which the contaminated water mixed with the gas is mixed in the gas mixing portion; And a plasma processor connected to the connection passage for plasma-processing the gas and supplying the gas to the gas suction hole through the connection passage, wherein the plasma processor is connected to the discharge tube to continuously supply the contaminated And a transparent fluid flow tube through which the water flows, Generates a lightning is characterized in that the ultraviolet transmission and the shock wave into the fluid flow conduit.

The present invention is characterized in that the inflow portion, the gas mixing portion, and the discharge portion are connected to each other by a continuous channel, and the cross-sectional area of the contaminated water flowing in the inflow portion Sectional area where the contaminated water flows in the gas mixing portion is reduced and the gas supplied to the gas suction hole is sucked by the pressure drop due to the increase of the flow rate of the contaminated water as the sectional area of the gas mixing portion is reduced, And flows into the contaminated water.

Further, the present invention is characterized in that the plasma processor has a plasma generating electrode provided outside the fluid flow tube to generate a plasma, a counter electrode provided at an interval from the plasma generating electrode, and a space between the fluid flowing tube A gas flowing into the space between the fluid flow tube and the gas flow tube is plasma-processed by the plasma generation electrode to form the gas inlets Another characteristic is that it is fed into the ball.

According to another aspect of the present invention, there is further provided a flow guide member for guiding a flow of the fluid flowing through the front end portion or the discharge pipe of the fluid flow pipe toward the inner circumferential face of the fluid flow pipe by centrifugal force.

Further, the present invention is characterized in that the flow guide member is provided so as to be provided with a number of flow guide shims around the inner surface of the fixing ring fitted to the inner surface of the fluid flow pipe or the discharge pipe, and to be deflected in one direction along the circumference of the fixing ring, .

The apparatus for treating large-scale polluted water by using the plasma according to the present invention is characterized in that the gas cross-sectional area in the gas mixing pipe of the gas mixing section is reduced and the gas suction hole is formed in the gas mixing pipe, The pressure drop causes the plasma-treated gas to naturally inhale and generate micro-bubbles.

Accordingly, the present invention does not include a porous structure. Therefore, when foreign matter is contained in the plasma-treated gas, it is possible to prevent clogging by foreign matter in a region where minute bubbles are generated, Or minimized, and the fine bubbles can be smoothly supplied to the contaminated water.

In addition, the apparatus for processing large amount of polluted water using the plasma according to the present invention is configured such that the branch pipe is installed at the inlet, flows around the dielectric tube of the plasma processor, The energy can be transmitted to the purification treatment of the contaminated water to the maximum, and the efficiency of the plasma treatment can be greatly improved without waste of energy such as shock wave or ultraviolet ray.

In addition, the apparatus for treating large-scale pollutant-polluting water by using the plasma according to the present invention is characterized in that a discharge pipe is continuously connected to a transparent fluid flow pipe and a plasma discharge is generated around the fluid flow pipe, In addition to the supply box, plasma energy such as shock waves, ultraviolet rays, and the like is additionally supplied to the contaminated water flowing while reacting with the plasma-treated gas.

Accordingly, by the plasma energy supplied with the shock wave, ultraviolet rays, etc., the active substance such as ozone and OH radical contained in the minute bubbles can further accelerate the action of oxidizing and decomposing contaminants in contaminated water, Can be effectively achieved.

In addition, the apparatus for treating large-scale polluted water by using the plasma according to the present invention is configured such that the water treatment apparatus is constituted by a tubular body continuously connected by a single path, and the polluted water flowing in the inside is continuously purified. Particularly, in another embodiment of the present invention, the plasma processing apparatus is constituted by connecting the discharge pipe and the transparent fluid flow pipe continuously so as to generate the plasma discharge at the peripheral outer surface of the fluid flow pipe, And the plasma water such as a shock wave or ultraviolet ray is also supplied as a whole together with the micro-bubbles containing ozone and radical substances.

Thus, a large amount of polluted water such as cooling water of the cooling tower can be purified in a continuous flow state, and the purification treatment operation can be continuously performed without interruption, and a large amount of polluted water can be purified in a short period of time. It is compact and can be installed in a narrow or tight space.

1 is a block diagram of a large-capacity pollution water purification apparatus using conventional plasma
FIG. 2 is an external view of the apparatus for treating large-scale polluted water by using plasma according to an embodiment of the present invention
3 is a cross-sectional view of a large-capacity pollution control apparatus using plasma according to an embodiment of the present invention
4 is a cross-sectional view of a large-capacity pollution and water treatment apparatus using plasma according to another embodiment of the present invention
5 and 6 are partially enlarged views of the apparatus for treating large-scale polluted water by using the plasma of FIG.
7 is a perspective view of a flow guide member installed in an apparatus for treating large-scale pollution with pollution using plasma according to another embodiment of the present invention
FIG. 8 (a) is a photograph of an inlet, a gas mixing unit, and a discharging unit actually manufactured in the apparatus for treating large-scale pollution contamination by using plasma according to the embodiment of the present invention, A photograph showing a state in which fine bubbles generated by suction are flowing downstream of the discharge portion through a transparent tube

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

2 and 3, the apparatus for treating large-scale polluted water using the plasma according to the embodiment of the present invention includes an inlet 10 through which polluted water flows, A gas mixing unit 20 having a gas suction hole 25 in which a plasma processed gas is sucked into the gas mixing unit 20 and a discharging unit 30 for discharging contaminated water mixed with the gas in the gas mixing unit 20 A connection channel 40 connected to the gas suction hole 25 and connected to the connection channel 40 to plasma process the gas and supply the gas to the gas suction hole 25 through the connection channel 40 And a plasma processor 50 for processing the plasma.

The inflow portion 10 is a portion into which sewage, wastewater, cutting oil or the like, which is polluted water, flows, and is formed of an inflow pipe 11 having a tubular structure.

The discharge portion 30 is formed as a discharge tube 31 having a tubular structure, which is a portion discharged with the contaminated water mixed with the micro-bubbles of the plasma-treated gas.

The gas mixing section 20 is a section for continuously connecting the inlet 10 and the outlet 30 and forms a continuous conduit between the inlet pipe 11, the gas mixing pipe 21 and the discharge pipe 31, Respectively.

Thus, the contaminated water flowing in the inflow section 10 passes through the inflow section 10, the gas mixing section 20, and the discharge section 30 sequentially.

The gas mixing section 20 is provided with a gas mixing tube 21 for forming a channel through which the contaminated water passes and a gas flow space 41 is formed so as to surround the gas mixing tube 21.

A plurality of gas suction holes 25 are formed on the inner circumferential surface of the gas mixing tube 21 so that the gas can be sucked naturally into the gas mixing tube 21 from the gas flow space 41.

The cross sectional area of the gas mixing pipe 21 through which the contaminated water passes in the gas mixing section 20 is configured to be smaller than the cross sectional area of the inflow pipe 11 through which the contaminated water flows in the inflow section 10. [ The cross-sectional area of the discharge pipe 31 continuously connected to the gas mixing pipe 21 is increased so that the gas mixture pipe 21 and the discharge pipe 31 are continuously connected to each other, (21) is the smallest.

Accordingly, since the contaminated water passing through the interior of the gas mixing tube 21 passes through the region where the same amount of fluid has a reduced cross-sectional area, the flow rate of the contaminated water increases as compared with the flow rate in the inflow pipe 11.

This increase in the flow rate causes a pressure drop in the gas mixing tube 21 and the pressure of the gas mixing tube 21 is reduced in the gas flowing space 21 outside the gas mixing tube 21 through the gas suction hole 25 41) is naturally inhaled.

Meanwhile, the plasma processor 50 is installed to plasma-process the gas and supply it to the gas suction hole 25.

A gas delivery pipe 42 connected to the end of the plasma processor 50 and a gas mixing pipe 21 connected to the plasma processing device 50 by the connection channel 40 are provided between the plasma processor 50 and the gas suction hole 25, The connecting flow path 40 is formed by the surrounding gas flow space 41.

The plasma processor 50 is for decomposing and purifying pollutants by dispersing the plasma-treated gas inside the polluted water in the form of fine bubbles by plasma-treating the gas passing through the inside thereof.

The plasma processor 50 includes a transparent dielectric tube 51 for plasma-processing the gas generated inside the plasma generator 50, a plasma generating electrode 52 provided inside the dielectric tube 51, A counter electrode 53 provided at a predetermined distance from the outside of the tube 51 and a plasma generator for generating plasma in the dielectric tube 51 by applying power to the plasma generating electrode 52 and the counter electrode 53 And power supply means (not shown).

In the plasma processor 50, a transparent dielectric tube 51 for generating a plasma in the plasma is disposed inside the plasma processor 50, and a quartz tube is most preferable for the dielectric tube 51.

The transparent dielectric tube 51 is subjected to plasma treatment while passing gas through the plasma generated therein.

Air is most preferable and air is sucked into the inside of the dielectric tube 51 connected to the gas suction hole 25 by the pressure of sucking the gas into the gas mixing tube 21 from the gas suction hole 25 Air is naturally inhaled.

A coil-shaped plasma generating electrode 52 is provided inside the dielectric tube 51.

The coil-shaped plasma generating electrode 52 generates a surface discharge in an area where the inner circumferential surface of the dielectric tube 51 and the plasma generating electrode 52 are in contact with each other, and the surface discharge region is a helical trajectory of the plasma generating electrode 52 Is continuously formed on the inner circumferential surface of the dielectric tube (51).

Accordingly, discharge can be generated in a wide region of the inner circumferential surface of the dielectric tube 51 due to the coil-shaped plasma generating electrode 52, so that the flowing gas can generate plasma and a wide reaction along the discharge region on the inner circumferential surface.

As the gas passes through the discharge region, active substances such as ozone and OH radical are generated, and this substance is brought into contact with the internal pollutants of the polluted water to induce oxidation and decomposition reaction, and purification treatment is performed.

In this embodiment, a branch pipe 61 is provided for connecting the inlet 10 and the plasma processor 50 to supply a part of the contaminated water to the plasma processor 50.

The branch tube 61 branches approximately 20 to 30% of the polluted water flowing into the inlet 10 and flows on the outer surface of the transparent dielectric tube 51 to generate a plasma discharge from the dielectric tube 51 Plasma energy is supplied.

The contaminated water that branches off and flows through the outside of the dielectric tube 51 also serves as a conductor that connects the opposing electrode 53 provided on the outside of the dielectric tube 51 and the dielectric tube 51, So that the plasma discharge can be smoothly generated in the plasma display panel 51.

The plasma energy supplied from the outer surface of the dielectric tube 51 includes the shock wave due to the plasma generation, the ultraviolet ray (UV) transmitted through the transparent dielectric tube 51, and the electrical energy, , And serves to promote decomposition.

The condensed water flowing on the outer surface of the dielectric tube 51 is further provided with a confluence tube 63 for supplying the plasma energy from the dielectric tube 51 and then supplying the plasma energy to the discharge part 30.

The confluent pipe 63 connects the rear end of the plasma processor 50 and the discharge pipe 31 so that the contaminated water that has flowed through the plasma processor 50 flows from the discharge pipe 31 through the gas mixing unit 20 Can be combined.

Hereinafter, the operation of the apparatus for treating large-scale pollution with pollutants using plasma according to the embodiment of the present invention will be described.

When the power supply means of the plasma processor 50 applies power to the plasma generating electrode 52 and the counter electrode 53, the plasma generating electrode 52 is applied to the dielectric tube 51, Thereby generating a plasma discharge inside.

At the same time, contaminated water such as wastewater, sewage or cutting oil flows into the inlet pipe 11 of the inlet portion 10 through the gas mixing pipe 21 of the gas mixing portion 20 by the operation of the pump.

The cross sectional area of the inflow pipe 11 gradually decreases at the portion where the cross sectional area of the inflow pipe 11 meets the gas mixing pipe 21 so that the cross sectional area of the gas mixing pipe 21 becomes smaller than the cross sectional area of the inflow pipe 11, The flow rate of the water increases as the amount of fluid passing through the inlet pipe 11 and the amount of fluid passing through the gas mixing pipe 21 are equal.

This increase in the flow velocity is accompanied by a decrease in the pressure of the fluid, which results in a lower pressure inside the gas mixing tube 21 than a pressure outside the gas mixing tube 21.

3, the action of the gas in the gas flow space 41 outside the gas mixing tube 21 through the gas suction hole 25 is naturally drawn through the gas suction hole 25 Occurs.

As shown in the enlarged view of FIG. 3, the gas suction hole 25 is formed so as to be inclined toward the direction in which the contaminated water flows, so that the polluted water flowing at a high speed passes through the gas suction hole 25, May act smoothly.

At the time of natural aspiration of the gas, the gas is generated in the form of fine bubbles at the time when the gas is introduced into the contaminated water from the suction hole 25, and is dispersed in the gas to be treated.

When a gas is sucked into the processing object fluid through the gas suction hole 25, a negative pressure is generated in the coupling flow path 40 and the gas inside the dielectric tube 51, that is, air is plasma- And the plasma-treated gas is continuously supplied to the gas suction holes 25 through the gas transfer tube 42 and the gas flow space 41 as the connection flow path 40 and is continuously supplied.

Since the plasma-treated gas includes active materials such as ozone and OH radicals due to reaction with the plasma, it flows into the polluted water in the form of minute bubbles through the gas suction holes 25, The cleansing process proceeds.

8 (a) is a photograph of an apparatus that actually manufactured the inlet 10, the gas mixing unit 20, and the outlet 30 described above, and FIG. 8 (b) And a state in which fine bubbles generated by the natural suction in the mixing portion 20 are flowing downstream of the discharge portion 30 are shown through a transparent tube.

As shown in FIG. 8 (b), in the water treatment apparatus manufactured according to the embodiment of the present invention, it was confirmed that microbubbles were smoothly and abundantly generated in the contaminated water by natural suction of the gas mixing unit 20 have.

FIG. 8 (b) shows a state in which a large amount of fine bubbles are scattered in the wastewater and blurred.

In this embodiment, since the shape of the hole of the gas suction hole 25 is simple and the foreign matter can easily pass through, the foreign substances contained in the gas can easily pass through the gas suction hole 25, Lt; / RTI >

However, since the conventional porous bubble device is formed of a foamed material such as a sponge or a porous structure called an air stone, foreign matter contained in a gas to be fed can be discharged to the outside only after passing through a complex internal porous structure, So that a large amount of the porous structure is blocked by the foreign material during long-time use and the gas can not be discharged smoothly.

3, approximately 20 to 30% of the polluted water flowing into the inlet 10 is branched by the branch pipe 61 installed in the present embodiment, and the clear dielectric pipe 51 (51) of the plasma processor 50 is branched And the contaminated water that has flowed through the plasma processor 50 through the confluent pipe 63 connecting the rear end of the plasma processor 50 and the discharge pipe 31 after flowing through the discharge pipe 31 And mixed with the contaminated water passing through the gas mixing section (20).

The polluted water branched through the branch pipe 61 serves as a conductor connecting the counter electrode 53 provided on the outside of the dielectric pipe 51 and the dielectric pipe 51, So that the plasma discharge is smoothly generated.

In addition, the branched polluted water receives the plasma energy such as ultraviolet rays (UV) transmitted through the transparent dielectric tube 51 through the shock wave generated by the plasma on the outer surface of the dielectric tube 51, The plasma energy is pre-absorbed so that the oxidizing and decomposing action of contaminants caused by plasma-treated microbubbles at the time of joining with the polluted water flowing in the plasma processor 50 through the pipe 63 can be promoted.

Since the plasma energy generated in the plasma processor 50 can be mostly transferred to the purification treatment of the polluted water through the structure of the branch pipe 61, the efficiency of the plasma treatment can be improved without waste of energy such as an impact plate and ultraviolet rays. Can be very high.

Next, an apparatus for large-scale pollution control using plasma will be described according to another embodiment of the present invention.

4 to 6, the water treatment apparatus of the present embodiment includes an inflow pipe 11 into which the contaminated water flows, and a plasma-treated gas as a portion in which the contaminated water flows from the inflow pipe 11, A discharge pipe 31 for discharging the contaminated water mixed with the gas in the gas mixing pipe 21 and a discharge pipe 31 connected to the gas suction hole 25, And a plasma processor 50 connected to the connection passage 40 to plasma-process the gas and supply the gas to the gas suction hole 25 through the connection passage 40.

The constitution of the inflow pipe 11, the gas mixing pipe 21 and the discharge pipe 31 is the same as that of the above-described embodiment.

The present embodiment differs from the above-described embodiment in the configuration of the plasma processor 50.

The plasma processor 50 of this embodiment includes a transparent fluid flow tube 57 through which the polluted water is continuously connected to the discharge tube 31 and discharged therefrom and a fluid flow tube 57 wound around the outer circumferential surface of the fluid flow tube 57, A plasma generating electrode 52 for generating a plasma on the outer circumferential surface and a counter electrode (not shown) provided at an interval from the plasma generating electrode 52 and a space 58a between the fluid flow pipe 57 And a gas flow tube 58 surrounding the fluid flow tube 57 and the outside of the plasma generating electrode 52 to allow gas to flow therethrough.

The fluid flow pipe (57) is connected to the rear end of the discharge pipe (31) and connected to the discharge pipe (31) so that the discharged polluted water passes through it.

The fluid flow pipe 57 is a transparent dielectric pipe for promoting the purification treatment of the contaminated water passing through the inside of the fluid flow pipe 57 by a shock wave, ultraviolet (UV) or the like, and a quartz tube Most preferred.

The plasma generating electrode 52 is wound around the outer peripheral surface of the fluid flow tube 57 to generate plasma on the outer peripheral surface of the fluid flow tube 57.

The coil-shaped plasma generating electrode 52 generates a surface discharge in a region where the outer circumferential surface of the fluid flow tube 57 which is a dielectric and the plasma generating electrode 52 are in contact with each other, and the surface discharge region is a spiral of the plasma generating electrode 52 And is continuously formed on the outer circumferential surface of the fluid flow pipe 57 along the locus.

In order to generate such surface discharge, the counter electrode is provided so as to be in contact with the contaminated water inside the fluid flow pipe 57 in which the contaminated water flows.

This is because contaminated water acts as a conductor and electrically connects the fluid flow pipe 57 to cause a wide surface discharge at the outer surface of the fluid flow pipe 57 in which the coil-shaped plasma generating electrode 52 is wound.

An opposite electrode may be provided outside the fluid flow tube 57 where the plasma generating electrode 52 is located so that a discharge is generated in the plasma generating electrode 52.

A gas flow tube 58 surrounds the fluid flow tube 57 at a predetermined interval.

The gas flow tube 58 surrounds the fluid flow tube 57 and the plasma generating electrode 52 and allows the gas to flow through the space 58a between the fluid flow tube 57 and the fluid flow tube 57. [

The gas flowing in the space 58a between the gas flow tube 58 and the fluid flow pipe 57 is air and the flowing gas flows from the outer surface of the fluid flow pipe 57 to the surface plasma generated around the plasma generating electrode 52 And active materials such as ozone and OH radicals are generated.

The gas passing through the space 58a between the gas flow tube 58 and the fluid flow tube 57 is affected by the flow of the spiral plasma generating electrode 52 wound on the outer surface of the fluid flow tube 57, A part of the flow in the circumferential direction of the fluid flow pipe 57 in the direction in which the generating electrode 52 is wound is partially generated and the spiral plasma generating electrode 52 has a wider contact opportunity for a longer time.

Accordingly, the plasma treatment efficiency of the gas passing through the space 58a between the gas flow tube 58 and the fluid flow tube 57 is increased, and the concentration of the active material such as ozone and OH radicals generated can be further increased.

The gas passing through the space 58a between the gas flow tube 58 and the fluid flow tube 57 is supplied to the gas suction hole 25 through the gas transfer tube 42 and the gas flow space 41 sequentially.

5 and 7, a fluid flow is transmitted to the front end of the fluid flow pipe 57 or the discharge pipe 31 through a flow guide (not shown) that induces a flow toward the inner circumferential face of the fluid flow pipe 57 The member 70 is further provided.

The flow guide member 70 is installed so that a plurality of flow guide holes 72 are provided around the inner surface of the stationary ring 71 and are deflected in one direction along the circumference of the stationary ring 71.

When the contaminated water passes through the stationary ring 71 in a state where the stationary ring 71 is fitted to the inner surface of the discharge pipe 31 or the fluid flow pipe 57, The disturbance and rotation occur.

Such rotation is due to the spiral trajectory centering on the central axis of the fluid flow tube 57, so that the centrifugal force due to the rotation tends to flow toward the inner peripheral surface side of the fluid flow tube 57.

The flow guide 72 may disturb the contaminated water flowing in the vicinity of the central axis of the fluid flow tube 57 and may move toward the inner circumferential surface of the fluid flow tube 57. If the flow guiding fin 72 is formed longer toward the center side, fluid disturbance near the central axis is generated more greatly.

Ultraviolet rays (UV) are strongly received by the plasma generated from the outside of the fluid flow tube 57 as the fluid flow tube 57 approaches the inner circumferential surface of the fluid flow tube 57. By the disturbance and rotation by the flow guide member 70, It is possible to smoothly promote the purification treatment.

The flow guiding member 70 is for generating disturbance and rotation for moving contaminated water to the inner circumferential surface side of the fluid flow pipe 57 so that it is possible to have a structure of a normal impeller as well as the structure of the flow guiding fin 72 described above Do.

Hereinafter, the operation of the apparatus for treating large-scale polluted water by using plasma according to the present embodiment will be described with reference to FIG. 4 to FIG.

When the power supply means of the plasma processor 50 applies power to the plasma generating electrode 52 and the counter electrode (not shown), the plasma generating electrode 52 is connected to the fluid flow tube 57 To generate a plasma.

At the same time, contaminated water such as wastewater, sewage, cutting oil, etc. flows in through the inlet pipe 11 and passes through the gas mixing pipe 21 by the operation of the pump.

The cross sectional area of the inlet pipe 11 gradually decreases at the portion where the cross sectional area of the inlet pipe 11 meets the gas mixing pipe 21 so that the cross sectional area of the gas mixing pipe 21 becomes smaller than the cross sectional area of the inlet pipe 11, The amount of the fluid passing through the inlet pipe 11 and the amount of the fluid passing through the gas mixing pipe 21 must be equal to each other so that the flow rate of the polluted water passing through the gas mixing pipe 21 is remarkably high .

This increase in the flow velocity is accompanied by the pressure drop of the fluid, which results in a lower pressure inside the gas mixing tube 21 than the pressure outside the gas mixing tube 21.

Thereby, the action of the gas in the gas flow space 41 outside the gas mixing tube 21 through the gas suction hole 25 is naturally suctioned through the gas suction hole 25.

As shown in FIG. 6, the gas suction hole 25 is formed so as to be inclined toward the direction in which the contaminated water flows, so that the contaminated water flowing at a high speed passes through the gas suction hole 25, May occur smoothly. At the time of such inhalation of the gas, the gas is generated in the form of fine bubbles and dispersed in the gas to be treated at the time when the gas moves from the gas suction hole 25 to the contaminated water.

When a gas is sucked into the contaminated water through the gas suction hole 25, a negative pressure is generated in the connecting flow path 40 and the gas between the fluid flow pipe 57 and the gas flow pipe 58, that is, And is supplied to the gas suction hole 25 through the gas transfer tube 42 and the gas flow space 41, which are the connection passage 40, and is supplied.

Since the plasma-treated gas includes ozone and radical substances due to reaction with the plasma, it flows into the polluted water in the form of minute bubbles through the gas suction holes 25, and oxidizes and decomposes contaminants in the polluted water, The action proceeds.

In this embodiment, since the shape of the hole of the gas suction hole 25 is simple and the foreign matter can easily pass through, the foreign substances contained in the gas can easily pass through the gas suction hole 25, Lt; / RTI >

On the other hand, in this embodiment, the fluid flow pipe 57 is connected to the rear end of the discharge pipe 31 and the polluted water passes through it. The polluted water passing through the fluid flow pipe 57 is in a state in which fine bubbles of the plasma-treated gas flows in a state containing a large amount of air, and is in active contact with contaminants of contaminated water,

In such a state, plasma generated from the outside of the fluid flow pipe 57 is supplied with shock waves, ultraviolet rays, etc. through the transparent fluid flow pipe 57 as contaminated water, and the active material such as ozone and OH radical contained in the fine bubbles is contaminated During the process of oxidizing and decomposing the material, additional plasma energy such as shock waves, magnetic lines and the like is supplied to the plasma.

Accordingly, the oxidizing and decomposing action of contaminants by active substances such as ozone and OH radicals can be further promoted and the sterilizing action can be more effectively achieved.

The gas passing through the space 58a between the gas flow tube 58 and the fluid flow tube 57 strikes the spiral plasma generating electrode 52 wound on the outer surface of the fluid flow tube 57 and the flow thereof is affected, A part of the flow in the circumferential direction of the fluid flow pipe 57 in the direction in which the generating electrode 52 is wound is partially generated and the spiral plasma generating electrode 52 has a wider contact opportunity for a longer time.

Accordingly, the plasma treatment efficiency of the gas passing through the space 58a between the gas flow tube 58 and the fluid flow tube 57 can be increased to increase the concentration of the active material such as ozone and OH radicals, And can be supplied to the suction hole 25.

Meanwhile, the flow guide member 70 provided at the front end of the discharge pipe 31 or the fluid flow pipe 57 receives the disturbance and the rotational force of the fluid flow while the polluted water passes, and the flow toward the inner circumferential face of the fluid flow pipe 57 is induced.

Such a flow flows in a spiral trace centering on the central axis of the fluid flow tube 57, so that the centrifugal force causes a tendency of the contaminated water to adhere to the inner peripheral surface side of the fluid flow tube 57, and the contaminated water flowing along the central axis is disturbed, A flow toward the inner peripheral surface side of the fluid flow tube 57 is induced.

Accordingly, movement is actively generated toward the inner circumferential surface side of the fluid flow tube 57 strongly receiving the shock wave and the ultraviolet ray (UV), and the purification treatment of the contaminated water can be promoted evenly.

The construction of the water treatment apparatus of the present embodiment is such that the plasma processor 50 is configured to connect the discharge tube 31 with the transparent fluid flow tube 57 continuously and generate the plasma discharge at the outer peripheral surface of the fluid flow tube 57, The water treatment apparatus is composed of a single connected pipe body, and the polluted water flowing through the pipe body is continuously treated.

As a result, it is possible to purify the polluted water such as the cooling water of the cooling tower in a state in which the polluted water is continuously circulated, so that a large amount of polluted water can be cleaned quickly and effectively.

In addition, since the water treatment apparatus has a configuration similar to that of the connection pipe for flowing the polluted water, the water treatment apparatus can be configured to be very compact, so that it is possible to install the water treatment apparatus even in a narrow or leeway installation space.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is clearly understood that the same is by way of illustration and example only and is not to be construed as limited to the particular embodiments set forth herein. It goes without saying that other modified embodiments are possible.

10; An inlet portion 11; Inlet pipe
20; Gas mixing section 21; Gas mixing tube
25; A gas suction hole 30; The discharge portion
31; A discharge pipe 40; Connecting euro
41; Gas flow space 42; Gas transfer tube
50; A plasma processor 51; Dielectric tube
52; A plasma generating electrode 53; Opposite electrode
57; Fluid flow tube 58; Gas flow tube
58a; Space 61; Branch engine
63; Junction 70; The flow guide member
71; A stationary ring 72; Flow guide

Claims (5)

A large-capacity pollution and water purification apparatus for purifying a large amount of polluted water by supplying the plasma-treated gas to polluted water flowing in,
An inflow section 10 through which the contaminated water flows,
A gas mixing portion 20 having a gas suction hole 25 into which a plasma-treated gas is sucked as a portion in which the contaminated water flows from the inlet portion 10 and flows,
A discharge unit 30 for discharging the contaminated water mixed with the gas in the gas mixing unit 20,
A connection passage 40 connected to the gas suction hole 25,
And a plasma processor (50) connected to the connection passage (40) to plasma-process the gas and supply the plasma to the gas suction hole (25) through the connection passage (40)
The plasma processor (50)
And a transparent fluid flow pipe (57) continuously connected to the discharge pipe (31) and passing polluted water discharged from the discharge pipe (31)
And generates a plasma around the fluid flow pipe (57) to transmit ultraviolet rays and shock waves into the fluid flow pipe (57) The method according to claim 1,
The inlet portion 10, the gas mixing portion 20, and the outlet portion 30 are connected to each other through a continuous pipe,
Sectional area in which the contaminated water flows in the gas mixing section 20 is larger than the cross sectional area of the contaminated water flowing in the inlet section 10 so that the flow rate in the gas mixing section 20 is higher than the inlet section 10 And,
The gas supplied to the gas suction hole (25)
Is naturally sucked into the contaminated water due to a pressure drop caused by an increase in the flow rate of the contaminated water as the sectional area of the gas mixing section (20) is reduced. The method according to claim 1,
The plasma processor (50)
A plasma generating electrode 52 provided outside the fluid flow pipe 57 to generate plasma,
An opposing electrode provided at an interval from the plasma generating electrode 52,
And a gas flow tube 58 surrounding the fluid flow tube 57 and the plasma generating electrode 52 to allow gas to flow through the space 58a between the gas flow tube 57 and the fluid flow tube 57,
The gas flowing into the space 58a between the fluid flow pipe 57 and the gas flow tube 58 is plasma-processed by the plasma generating electrode 52 and supplied to the gas suction hole 25. [ Large-volume pollution water treatment system The method according to claim 1,
The flow guide member 70 is further provided at the front end of the fluid flow pipe 57 or the discharge pipe 31 for guiding the flow of the polluted water to the inner circumferential face of the fluid flow pipe 57, A large-capacity pollution water treatment apparatus 5. The method of claim 4,
The flow guide member (70)
A fixing ring 71 fitted to the inner surface of the fluid flow pipe 57 or the discharge pipe 31,
And a plurality of flow guide holes (72) provided around the inner surface of the stationary ring (71)
Wherein the flow guide eyelets (72) are installed so as to be deflected in one direction along the circumference of the fixing ring (71)

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