KR20190021511A - Control System of Dispersion and Direction of Arc Ion Beam Using Magnetic Field and Plasma Surface Treatment System - Google Patents

Abstract

An objective of the present invention is to provide a device for controlling dispersion and a direction of an arc ion beam capable of dispersing an ion beam, enlarging a diameter, controlling a direction, and applying an ion beam to a large area substrate at a lower cost and in a simplified configuration. According to the objective of the present invention, the present invention provides the device controlling an emission direction of an ion beam generated from a cathodic arc source by disposing an electromagnet or permanent magnet between the cathodic arc source and a substrate to be coated and using a magnetic field change using an electrical signal of the electromagnet or mechanical movement (rotation or reciprocating motion) of the permanent magnet, and a large area surface treatment system.

Description

TECHNICAL FIELD The present invention relates to an arc ion beam dispersion and direction control apparatus using a magnetic field and a plasma surface processing system using the arc ion beam dispersion and direction control apparatus,

TECHNICAL FIELD The present invention relates to an arc ion beam control technique and a plasma surface treatment technique using the arc ion beam control technique, and more particularly, to an arc ion beam dispersion and direction control.

Surface treatment techniques using arc ion beams include thin film deposition, etching, and surface modification. Particularly, since the arc ion beam injects ions into the surface of the substrate, the corrosion resistance, friction characteristics, electrical characteristics, optical characteristics, and the like of the surface of the substrate can be enhanced. In order to uniformly treat the surface of the substrate using such an arc ion beam, the diameter of the ion beam must be increased, which is a technical problem and has limitations. Most of the diameter of the ion beam is difficult to apply to the large-sized substrate even if the ion beam is scanned to the extent of the coin size. That is, in the conventional method in which the target is linearly scanned to the substrate without controlling the direction of the emitted ion beam, the deposition area is proportional to the area of the negative target that generates the arc ion beam.

Therefore, when the surface treatment of a large-sized substrate is performed, it is impossible to make the diameter of the ion beam large, so a plurality of ion beam sources are used, which is difficult to apply due to high cost of equipment, difficulty in controlling the ion beam, Indicates a problem. Despite the excellent surface treatment ability of the ion beam, its application field is limited to the semiconductor manufacturing field, which is also considered to be the limit of the high cost structure and the large area treatment as described above.

Registration No. 10-1434676 describes a beam deflection technique using an electric field. In this publication, the beam irradiation direction is changed by directly exposing the electrodes (the anode and the cathode) not the permanent magnet to the beam movement path, and the electrodes are disposed in the path where the ion beam is externally exposed. It can not be applied to surface treatment of an area substrate. In addition to the above publication, a technique for controlling the divergence angle of the ion beam and improving the accuracy is disclosed, but since the control means is disposed in the path of the ion beam, it can not be applied to the deposition process due to contamination of the coating material caused by the control means.

Accordingly, an object of the present invention is to provide an arc ion beam dispersion and direction control device which can be applied to the surface treatment of a large-area substrate by dispersing the ion beam and enlarging the aperture and controlling the direction, at a lower cost and simplified configuration.

According to the present invention, an electromagnet or permanent magnet is disposed between a cathodic arc source and a substrate to be coated so that a magnetic field change using an electric signal of the electromagnet or a mechanical movement of the permanent magnet An arc ion beam dispersion and direction control device and a large area surface treatment system for controlling the direction of emission of an ion beam generated from a cathode arc source by using a rotating or reciprocating motion.

In the above, when the permanent magnets are disposed, the magnets can be driven only by the motor, which is more preferable because the power consumption is less than that of the electromagnets which must apply the current. In this case, the permanent magnets are arranged along the diameter of the ion beam at two places on the basis of the cross section of the ion beam, or are arranged in four places in the square, and the permanent magnet is rotated in synchronization to disperse the ion beam to enlarge the aperture, So that uniform surface treatment is performed on the large-area substrate.

In the above case, when the electromagnet is used, the same effect can be obtained by controlling the winding speed and the current value of the coil. However, in such a case, a power source for the electromagnet must be provided and power consumption is high, which is not as preferable as in the case of using permanent magnets.

That is, the present invention provides an ion source comprising: an ion source;

A target disposed at a front end of the ion source to emit an ion beam containing material particles charged by the ions emitted by the ion source;

A substrate disposed within the chamber in which a charged particle beam emitted to the target is incident and surface treated; And

And a magnet disposed between the ion source and the substrate and disposed at a periphery outside the ion beam to disperse the ion beam and control the direction of the ion beam,

And controlling the magnetic field of the magnet to control the diameter and direction of the ion beam to cover the area occupied by the base material so that the ion beam covers the surface to perform a uniform surface treatment.

In the above, the ion source may be an arc ion plating, a filtered cathodic vacuum arc (FCVA), a gas ion plating, a linear ion gun, or a sputter source wherein the ion beam is injected into a substrate which needs to be surface-modified by ionizing a gas, liquid, or solid precursor material, including any one of a sputter source.

The surface treatment system according to the present invention controls the ion beam path and the surface modification characteristic according to the type of the magnet, the intensity of the magnetic field, the size of the magnet, the position of the magnet, and the rotation of the magnetic field.

In the above, the magnet may be a strontium magnet, a barium magnet, a rare earth magnet, a neodymium (Nd-Fe-B) magnet, a samarium (Smco) magnet, An AlNiCo magnet, or an Alnico magnet, or an electromagnet.

In the above, the measurement value of the magnetic field, which is formed in order to improve the area of the surface of the base material to be modified through the use of the magnetic field and the dispersion of the ion beam and the uniformity of the modifying treatment, Wherein the magnetic field is a magnetic field in a range of the magnetic field.

In this case, the size of the magnet is determined by connecting one magnet or a plurality of magnets in accordance with the diameter of the ion beam.

Wherein the surface of the substrate to be surface-treated is covered by expanding the range of the ion beam by pulling out or pushing out the emitted ion beam into the magnetic field by the magnet.

In the above, the driving of the magnet is controlled so as to rotate, reciprocate, regularly or irregularly move the magnet so that the polarity of the magnet in which the N pole and the S pole coexist can be utilized for controlling the ion beam Thereby providing a surface treatment system.

According to the present invention, the ion beam of the cathode arc source is dispersed to enlarge the aperture, which is suitable for the surface treatment of the large-area substrate. By controlling the direction of the dispersed ion beam, the surface treatment of the large-area substrate can be uniformly performed.

In the above, since the control of the dispersion and the direction of the ion beam uses the drive control of the permanent magnet only by the motor, since the power is not required for each coil like the electromagnet, the configuration is simplified and the power consumption is lower.

1 is a cross-sectional view of an arc ion beam dispersion and direction controllable surface treatment system in accordance with the present invention.
2 is a cross-sectional view of an arc ion beam surface treatment system according to the prior art.
FIGS. 3 and 4 are cross-sectional views showing the surface treatment of the large-area substrate through directional control of the arc ion beam according to the present invention.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

1 is a cross-sectional view of an arc ion beam dispersion and direction controllable surface treatment system according to the present invention, and Fig. 2 is a cross-sectional view of an arc ion beam surface treatment system according to the prior art. The operation of the present invention and the advantages of the present invention over the prior art will be briefly described as follows.

The arc ion plating process by the arc ion beam system according to the present invention is performed as follows.

A power source is connected to the surface of the target 2 to apply a high current.

The target surface trigger 3 or the like is used to generate an arc plasma through charge accumulation and current density increase.

The generated arc plasma spot travels around the surface of the target 2 to melt (or drop) the target material.

The molten particles are ionized and flow toward the target front side and adhere to the substrate, and deposition proceeds.

In an arc ion beam source used for deposition purposes, the area of the arc ion beam (deposition area) is proportional to the target area.

The area (diameter) of the ion beam emitted from the ion source 1 may be widened according to the distance to the substrate, but in this case, the ion density difference between the central part and the outer part of the ion beam causes a deposition thickness deviation, And the uniformity of the surface treatment is lowered.

Therefore, it is necessary to compensate the ion density difference of the ion beam.

In an arc coating apparatus, the difference in the uniformity of the lateral thickness due to the difference in ion density within the area of the emitted ion beam can be solved through the rotation (pre-confinement) operation of the jig system for mounting the substrate.

However, it is difficult to improve longitudinal thickness unevenness only by the jig system, and thus the effective deposition area in the vertical direction (vertical) is inevitably narrowed.

To improve this, there is a method of mounting a large amount of arc ion beam sources in the longitudinal direction and widening the longitudinal deposition area. However, there is a problem that the construction and use of each arc source is considerably expensive and the control becomes complicated when a large amount of arc sources are interlocked.

Accordingly, in the movement of the arc ion beam, the present invention attempts to control the ion beam by the magnetic field by observing the characteristics of the ion particles being pulled or pushed according to the polarity direction of the peripheral magnetic field.

That is, it was confirmed that an artificial ion beam could be deflected by placing a permanent magnet on the outer periphery of a section through which the beam emitted from the arc ion beam source 1 passes, and a permanent magnet was provided outside the vacuum chamber, (Rotation, reciprocation, irregularity, and the like), and it is possible to widen the longitudinal deposition area by regularly controlling the deflection of the ion beam scanned on the substrate.

In order to move the permanent magnet used for the ion beam deflection, a step motor or the like is used. By dividing the deposition region into the upper, middle, and lower sections and varying the scanning time of the ion beam in each region, the uniformity of the deposition thickness can also be maximized.

In particular, the surface treatment method of the present invention for controlling the direction of magnetic field and ion beam emission by using a permanent magnet can be controlled by various methods such as type, intensity, shape, installation position and motion method (rotation, reciprocation, speed) And the configuration of the device required for this is also relatively simple as a magnet fixing device, a motor, and a control device, thus showing a great advantage in terms of cost reduction in application of a commercial facility and convenience in utilizing a composite source.

The configuration of the surface treatment system of FIG. 1 will be described in more detail.

There is provided a jig 7 for connecting the arc ion source 1 to the process chamber and for arranging the substrate to be surface-treated by the ion beam in the chamber. The jig 7 is capable of fixing a plurality of base materials and the jig 7 itself is fixed to a rotating turn table 8-2 and the rotation turn table 8 -2) is fixed so that the substrate is rotated and revolved. The confinement phase overcomes the difference in ion density in the lateral direction of the ion beam as described above.

The target 2 disposed at the front end of the arc ion source 1 provides an ion beam containing material particles charged by the arc ion beam. Trigger 3 causes a short for initial generation of ions. A baffle 5 is disposed in a connecting passage that enters the chamber so as to pass through the baffle 5 before entering the substrate to filter the macro particles among the charged particles and an electromagnet 4 is placed outside the baffle 5 So that the macroparticle path is finely manipulated and efficiently filtered by the baffle 5. A magnet 6 capable of controlling the path of the ion beam up, down, left, and right before the ion beam, which is the flow of charged particles filtered out of the macro particle, enters the chamber is disposed outside the passage through which the ion beam passes. The magnet 6 may be made of a permanent magnet or an electromagnet. In the case of an electromagnet, a separate power source (i.e., a power source other than the ion source driving power source) capable of supplying and controlling a current is required, It is more preferable to constitute the permanent magnet because the consumed electric power is high and the heat generation is severe. In the case of a permanent magnet, it is not necessary to provide a current supplying power source for forming a magnetic field by being driven by a motor, so that facilities are simplified, no heat is generated, and power consumption is also reduced.

That is, according to this embodiment, the direction of the emitted ion beam can be controlled through a regular magnetic field change, so that the ion beam scanned on the substrate can be dispersed in the vertical and horizontal directions. As a result, the diameter of the ion beam can be increased, which is suitable for large-area surface treatment.

The arrangement of the magnets is formed radially symmetrical around the ion beam, and one pair (two) of magnets may be arranged vertically or horizontally, or four magnets may be arranged vertically and horizontally. The magnet is rotationally driven to periodically change the polarity. The polarity between radially arranged magnets is synchronized with each other to synchronize or harmonize the ion beam to increase the diameter of the ion beam. The ion beam is changed in direction Causing the ion beam to be irradiated onto the arrayed substrate.

FIGS. 3 and 4 show that the ion beam is deflected upward and downward, respectively.

Referring to these drawings, the ion beam that is upward relative to the un-deflected ion beam becomes the lowermost end of the ion beam and the center line of the target 2 becomes the bottom end of the ion beam. .

In FIGS. 3 and 4, the permanent magnets are arranged in the up and down direction around the path of the ion beam, and the two permanent magnets arranged in the vertical direction are rotated synchronously. The orientation of the permanent magnet in Fig. 3 and the orientation in Fig. 4 are different from each other by rotating the permanent magnets by more than 180 degrees so that the ion beam in Fig. 3 moves downward and the ion beam in Fig. 4 moves upward .

By analyzing the ion density according to the upward, downward, and downward states of the ion beam, it is possible to control the time to place the ion beam in the upward, forward, and downward directions, so that the ion beam can not be deflected more than twice Uniform ion beam processing can be performed on the area.

That is, by using the state in which the ion beam is deflected upward and downward, the deposition region having the substrate is divided into the upper, middle, and lower sections, and the deposition thickness or thickness of the entire area, The degree of surface treatment can be made uniform. For this purpose, mechanical movement (rotation, reciprocation, irregularity, etc.) is applied to the permanent magnet to control the deflection of the ion beam scanned on the substrate regularly, resulting in the effect of enlarging the longitudinal deposition area. The upward and downward motions of the ion beam can be changed in the upward direction and the downward angle depending on the rotational motion and the reciprocating motion of the permanent magnet and the mixing or regular repetitive motion of the permanent magnet and the time for maintaining the upward / have. In addition, it can be deflected to the left and right, and irregular movement of the ion beam through the irregular movement of the magnet can result in uniform treatment on the large area as a whole. The motion of the magnet and the deflection control of the ion beam can be set in consideration of the interaction with the substrate to be processed in advance through simulation after analyzing the ion density in the ion beam itself.

The ion source may be one or more of arc ion plating, filtered cathodic vacuum arc (FCVA), gas ion plating, a linear ion gun, or a sputter source Ionizing the gas, liquid, or solid precursor material, including any one, to ion beam the substrate that needs surface modification.

In addition, the magnet may be a strontium magnet, a barium magnet, a rare earth magnet, a neodymium (Nd-Fe-B) magnet, a samarium (Smco) magnet, An Alnico magnet, or an electromagnet.

The size of the magnets may be one type of magnets having a certain size corresponding to the size of the aperture of the ion beam, but a plurality of magnets having a small size may be connected and arranged.

The magnetic field extends the range of the ion beam by pulling out or pushing out the emitted ion beam to the magnetic field by the magnet to cover the surface of the substrates to be surface treated, .

The driving of the magnet is controlled so that the magnet is rotated, reciprocated, regularly or irregularly moved so that the polarity of the magnet in which the N pole and the S pole coexist can be utilized for controlling the ion beam.

As shown in FIG. 2, the result of deposition (etching or etching) on the substrate surface by the conventional arc ion beam shows a large uniformity difference between the center and the outline of the scanned beam. However, So that the surface treatment result on the surface is very uniform. The surface treatment may include various processes such as deposition, etching, and nitriding.

Particularly, in the case of controlling the direction of magnetic field and ion beam emission by using permanent magnets, various types of permanent magnets may be used as variables, such as the type and intensity of the permanent magnet, the shape, the installation position, and the motion method (for example, rotation, . The equipment required for this purpose is a magnet fixing device, a motor, a motor control device, and the like, so that it has a great advantage in terms of cost reduction in application of commercial facilities and ease of use of composite sources.

The intensity of the magnetic force by the magnet is in the range of 1,000 to 10,000 G.

In addition to the magnetic strength of the magnet, the distance between the magnet and the ion beam is also a very important variable.

In addition, the details of the control of the permanent magnet include the operating mode and the speed.

That is, there are a rotational motion and a reciprocating motion of the permanent magnet, and the motion of the magnet is controlled by a driving device such as a step motor or a servo motor.

The retention time and driving speed for each position of the magnet can be controlled by PLC (Power Line Communication). By controlling the driving device according to the coating effective zone or the coating efficiency, the targeted large area and coating uniformity can be improved .

For example, in a coating effective zone, when the deposition rate in a heavy load is high, the exposure time of the upper and lower portions is increased through control of the driving device, thereby enabling uniform deposition under a heavy load.

The size of the magnet is preferably 30 to 80% of the cross sectional area of the beam transfer outlet.

Preferably, the magnets are arranged at the top and / or bottom of the beam transport path and are spaced from 100 to 300 mm, preferably 150 to 250 mm, in the vertical direction from the center of the transported beam, The interval is a very important parameter because it affects the control speed of the ion beam and the deflection range of the ion beam.

The position of the magnet in the distance from the target to the substrate is mounted from the arc ion beam source part to the chamber entrance which is the beam exit part.

The rotation or reciprocation of the magnet is performed by PLC control of the drive motor such as step motor or servo motor.

It is to be understood that the present invention is not limited to the above-described embodiment, but is defined by the scope of the claims, and those skilled in the art can make various changes and modifications within the scope of the claims It is self-evident.

1: arc ion source
2: Target
3: Trigger
4: Electromagnet
5: Baffle
6: Magnet
7: Jig
8-1, 8-2: Turn table

Claims (8)

Ion source;
A target disposed in front of the ion source to emit an ion beam containing material particles charged by the ions emitted by the ion source;
A substrate disposed within the chamber in which a charged particle beam emitted to the target is incident and surface treated; And
And a magnet disposed between the ion source and the substrate and disposed at a periphery outside the ion beam to disperse the ion beam and control the direction of the ion beam,
Controlling the magnetic field of the magnet so as to control the diameter and direction of the ion beam to cover the area occupied by the base material so that the ion beam covers the surface of the ion beam, . The method of claim 1, wherein the ion source is selected from the group consisting of arc ion plating, filtered cathodic vacuum arc (FCVA), gas ion plating, linear ion gun, Wherein the ion beam is scanned onto a substrate that requires surface modification by ionizing a gas, liquid, or solid precursor material, including any one of a sputter source. The method of claim 1, wherein the ion beam path and the surface modification characteristic are controlled by controlling at least one of the type of the magnet, the intensity of the magnetic field, the size of the magnet, the position of the magnet, Surface treatment system. The magnet according to claim 3, wherein the magnet is at least one selected from the group consisting of a strontium magnet, a barium magnet, a rare earth magnet, a neodymium (Nd-Fe-B) magnet, a samarium (Smco) An Alnico magnet as a magnet, or an electromagnet. The ion beam processing apparatus according to claim 1, wherein the substrate is revolved and revolved by a turntable on which revolving and charring are performed to improve the uniformity of ion beam processing in the transverse direction and to control the magnetic field of the magnet to improve uniformity of ion beam processing in the longitudinal direction Wherein the surface treatment system is a surface treatment system. The surface treatment system according to claim 3, wherein the size of the magnet is arranged by connecting one magnet or a plurality of magnets in correspondence with the size of the aperture of the ion beam. 4. The surface treatment system according to claim 3, wherein the surface of the substrates to be surface-treated is covered by expanding the range of the ion beam by pulling out or pushing out the emitted ion beam into the magnetic field by the magnet. 4. The method according to claim 3, characterized in that driving of the magnet is controlled so as to rotate, reciprocate, regularly or irregularly move the magnet so that the polarity of the magnet in which the N pole and the S pole coexist can be utilized for controlling the ion beam Gt;

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