KR20180078015A - Silica composition porous structure and a method of fabricating the same - Google Patents

Abstract

The present invention relates to a silica porous structure and a method of manufacturing the same. According to an embodiment of the present invention, the method comprises the steps of: providing a silica compound precursor including a liquid silicate-based compound precursor and a polymer surfactant; providing a dryness control compound helping a reaction of the silica compound precursor; mixing the silica compound precursor and the dryness control compound with a solvent to provide a precursor solution; and forming the silica porous structure by adding a surface modifying agent including a silane-based compound after a gelation process from the precursor solution, thereby modifying the surface of the gelled silica compound. The silica porous structure may have improved specific surface area and porosity.

Description

Technical Field [0001] The present invention relates to a silica pore structure,

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a silica pore structure and a method for producing the same, and more particularly, to a silica pore structure having a surface modified and a method for producing the same.

In general, aerogels are ultra-fine and porous low-density materials, and various applications such as catalyst carrier, insulating material, noise shielding material and particle accelerator are being applied. In particular, polymer aerogels with high porosity and high specific surface area and low density of several hundreds ㎡ / g have a high potential in applications such as insulation due to their low thermal conductivity (~ 30 mW / mK). Due to these excellent physical properties, research on the development of aerogel materials as well as research on applications as transparent insulation materials, environmentally friendly high temperature insulation materials, ultra low dielectric thin films for highly integrated devices, catalysts and catalyst coatings, electrodes for supercapacitors, and seawater desalination .

The biggest advantage of aerogels is super-insulation, which has a thermal conductivity of 0.03 W / m · K or less, which is lower than that of organic insulation materials such as conventional styrofoam. Because of such low thermal conductivity, it is possible to solve the fire fragility which is a fatal weak point of the organic insulating material and the generation of noxious gas in case of fire.

Generally, silica alkoxide is prepared by preparing a wet gel from a precursor to prepare an airgel, and then removing the liquid component in the wet gel without destroying the microstructure. The core technology of this aerogel manufacturing process is a drying process technique which can be manufactured by drying the gel without shrinking while maintaining the structure of the wet gel. A typical drying method is a super ciritical drying process. However, since the supercritical drying process is a process using not only a high production cost but also a high pressure due to high pressure and a high pressure autoclave in which continuous process is impossible, there are many limitations in economical efficiency and continuity of the process.

It is an object of the present invention to provide a silica pore structure in which the manufacturing cost is reduced through a simple process, hydrophobicity is imparted to the surface of the structure, and specific surface area and porosity are improved.

Another technical problem to be solved by the present invention is to provide a method of manufacturing a silica pore structure having the above-described advantages.

According to an aspect of the present invention, there is provided a method for producing a silica pore structure, the method including: providing a silica compound precursor including a liquid silicate compound precursor and a polymer surfactant; Providing a dry conditioning compound to aid in the reaction of said silica compound precursor; Mixing the silica compound precursor and the dry regulating compound into a solvent to provide a precursor solution; And a step of modifying the surface of the gelled silica compound to form a silica pore structure by adding a surface modifier containing a silane compound after the gelation process from the precursor solution, Surface area and porosity may be improved.

In one embodiment, the polymer surfactant is an acrylate surfactant, and the polymer surfactant is selected from the group consisting of polymethyl methacrylate (PMMA), 3-trimethoxysilylpropyl methacrylate, C1-C12 alkyl methacrylate , 2-ethoxyethyl methacrylate, 2-butoxyethyl methacrylate, ethylene glycol methyl ester acrylate, cyclohexyl methacrylate, benzyl methacrylate, phenyl methacrylate, 2- (methylthio) ethyl methacrylate Acrylate, hexafluoroisopropyl acrylate, trifluoroethyl methacrylate, pentafluoropropyl methacrylate, heptafluorobutyl methacrylate, octafluoropentyl methacrylate, tetrafluoropropyl methacrylate, and tetrafluoropropyl methacrylate. Hexafluorobutyl methacrylate, and hexafluorobutyl methacrylate.

The surface modifier may be methylsilane or methylsilane, and the methylsilane may be trimethylchlorosilane, methyltrimethoxysilane, methyltriethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, trimethylmethoxysilane, But are not limited to, trimethyl ethoxysilane, methyl chlorosilane, methyldichlorosilane, methyl polysilane, dimethyl polysilane, methyltri chloride silane, dimethyltri chloride silane, phenylmethyl chlorosilane, phenyldimethyl chlorosilane, polymethylphenylsilane, , Polysilamethylrenosilane, poly (1,2-dimethylsilazane), (1,2-dimethylsilazane) (1-methylsilazane), N-methylsilazane, methyldisilazane, dimethyldisilazane , Trimethyl disilazane, tetramethyl disilazane, and hexamethyl disilazane. The drying control compound may include at least one of an oxalic acid compound, a formamide compound, an N, N-dimethylformamide compound, and a glycerol compound.

In one embodiment, aging the surface modified silica compound; And drying the aged gel. The method may further include adding an acid or a base catalyst to the precursor solution. The acidic catalyst may include hydrochloric acid, citric acid, phosphoric acid, acetic acid, oxalic acid, sulfuric acid, ammonium fluoride or nitric acid, and the basic catalyst may include ammonia, ammonium hydroxide, sodium hydroxide (NaOH) Piperidine. ≪ / RTI >

In one embodiment, the solvent may be deionized water, alcoholic, carbonate, ether or ketone based. In addition, the gelation step may be carried out by a hydrolysis reaction, a condensation reaction, a ligand substitution reaction, or a combination thereof.

The silica pore structure according to another embodiment of the present invention may be a silica pore structure having a hydrophobically modified surface and an improved specific surface area and porosity. The hydrophobically modified surface may be modified by replacing the surface of the silica pore structure with a hydrophobic methyl group by a surface modifier containing a methyl group and silicon. The surface modifier may be methylsilane or methylsilane, and the methylsilane may be trimethylchlorosilane, methyltrimethoxysilane, methyltriethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, trimethylmethoxysilane, trimethyl But are not limited to, ethoxysilane, methylchlorosilane, methyldichlorosilane, methylpolysilane, dimethylpolysilane, methyltriylchlorosilane, dimethyltrichlorosilane, phenylmethylchlorosilane, phenyldimethylchlorosilane, polymethylphenylsilane, (1,2-dimethylsilazane), (1,2-dimethylsilazane) (1-methylsilazane), N-methylsilazane, methyldisilazane, dimethyldisilazane, Trimethyldisilazane, tetramethyldisilazane, and hexamethyldisilazane. The term " a "

In one embodiment, the silica pore structure can be controlled in specific surface area and porosity by a dry modifying compound. The dry control compound may contain at least one of oxalic acid compound, formamide compound, N, N-dimethylformamide compound, and glycerol compound, and the silica pore structure may contain at least 50 vol% vol%, and may have a specific surface area of from 350 m 2 / g to 1000 m 2 / g.

According to an embodiment of the present invention, a sol-gel process is performed using a silica compound precursor, a surface modifier containing a silane compound precursor, and a drying control compound containing an oxalic acid compound, It is possible to provide a silica pore structure in which hydrophobicity is imparted to the surface during the production without increasing the process, hydrophobicity of the surface is increased during the production process, specific surface area and porosity are improved, and thermal conductivity is decreased.

In addition, according to the embodiment of the present invention, even when a silica pore structure is manufactured by a normal atmospheric pressure process rather than a supercritical drying process by using the drying control compound as a catalyst, its general properties such as high specific surface area and porosity, And a method of manufacturing a silica pore structure in which the characteristics of a large pore size are not deteriorated can be provided.

FIG. 1 is a view for explaining a manufacturing procedure of a silica pore structure according to an embodiment of the present invention.
2 is a graph showing the results of infrared spectroscopic analysis of a silica pore structure and a comparative example according to an embodiment of the present invention.
3A and 3B are images showing a silica pore structure and a comparative example according to an embodiment of the present invention.
4A and 4B are graphs showing the results of analysis of porosity and specific surface area of the silica pore structure and the comparative example according to an embodiment of the present invention.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

The embodiments of the present invention are described in order to more fully explain the present invention to those skilled in the art, and the following embodiments may be modified into various other forms, It is not limited to the embodiment. Rather, these embodiments are provided so that this disclosure will be more faithful and complete, and will fully convey the scope of the invention to those skilled in the art.

Like numbers refer to like elements in the drawings. Also, as used herein, the term "and / or" includes any and all combinations of any of the listed items.

The terms used herein are used to illustrate the embodiments and are not intended to limit the scope of the invention. Also, although described in the singular, unless the context clearly indicates a singular form, the singular forms may include plural forms. Also, the terms "comprise" and / or "comprising" used herein should be interpreted as referring to the presence of stated shapes, numbers, steps, operations, elements, elements and / And does not exclude the presence or addition of other features, numbers, operations, elements, elements, and / or groups.

Reference herein to a layer formed "on" a substrate or other layer refers to a layer formed directly on top of the substrate or other layer, or may be formed on intermediate or intermediate layers formed on the substrate or other layer Layer. ≪ / RTI > It will also be appreciated by those skilled in the art that structures or shapes that are "adjacent" to other features may have portions that overlap or are disposed below the adjacent features.

As used herein, the terms "below," "above," "upper," "lower," "horizontal," or " May be used to describe the relationship of one constituent member, layer or regions with other constituent members, layers or regions, as shown in the Figures. It is to be understood that these terms encompass not only the directions indicated in the Figures but also the other directions of the devices. In addition, reference numerals of members in the drawings refer to the same members throughout the drawings.

1 is a flowchart showing a procedure for manufacturing a silica pore structure according to an embodiment of the present invention.

Referring to Figure 1, a silica compound precursor for producing a silica pore structure in a given vessel can be provided. The silica compound precursor may include a silicate compound and a polymeric surfactant. The silicon-based precursor may include at least one of water glass, sodium metasilicate, sodium silicate, silicic acid, and colloidal silica. The polymeric surfactant may include an acrylate polymer surfactant. The acrylate polymer surfactant may be selected from the group consisting of polymethyl methacrylate (PMMA), 3-trimethoxysilylpropyl methacrylate, C12 alkyl methacrylate, 2-ethoxyethyl methacrylate, 2-butoxyethyl methacrylate, ethylene glycol methyl ester acrylate, cyclohexyl methacrylate, benzyl methacrylate, phenyl methacrylate, 2- (Methylthio) ethyl methacrylate, hexafluoroisopropyl acrylate, trifluoroethyl methacrylate, pentafluoropropyl methacrylate, heptafluorobutyl methacrylate, octafluoropentyl methacrylate, tetra Fluoropropyl methacrylate and hexafluorobutyl methacrylate It may include one. Preferably, the silicon-based precursor is preferably in the form of a water glass. The acrylate-based polymer surfactant may also be polymethyl methacrylate. However, it should be understood that the present invention is not limited thereto.

Then, after a predetermined solvent is prepared in the container, the silicate compound precursor and the polymer surfactant may be mixed with a solvent to form a mixed solution. Thereafter, a stirring process for the mixed solution may be performed. As a result, a precursor solution mixed with the precursors can be obtained. Precursor materials can be uniformly dispersed or dissolved in the precursor solution. The solvent used may include at least one of deionized water, alcohol-based, carbonate-based, ether-based, and ketone-based solvents, preferably ultra pure water. However, the type of the solvent is not limited thereto, and organic solvents may be used. These solvents may be used alone or in combination.

In one embodiment, a predetermined catalyst may be added to the precursor solution. The catalyst can induce and / or accelerate the hydrolysis and condensation reactions of the precursor material. The catalyst may be, for example, an acid or base catalyst. As a specific example, the acidic catalyst may be hydrochloric acid, citric acid, phosphoric acid, acetic acid, oxalic acid, sulfuric acid, ammonium fluoride or nitric acid. The basic catalyst may be ammonia, ammonium hydroxide, sodium hydroxide (NaOH) or potassium hydroxide or piperidine. However, the catalytic material is not limited thereto and can be variously changed. After the catalyst is added, a stirring process may be further performed for dispersion. The stirring process may be performed at a speed of several hundred rpm, for example, about 400 rpm. However, the present invention is not limited thereto.

Further, in order to produce the silica pore structure of the present invention, a drying control compound may be further added to the predetermined vessel as a catalyst. The drying control compound can appropriately control the specific surface area and the porosity of the silica pore structure during the gelation process and reduce the shrinkage of the silica pore structure during drying. The drying control compound may include at least one of an oxalic acid compound, glycerol, N, N-dimethylformamide, and formamide, but the present invention is not limited thereto. In one embodiment, the dry modifying compound may comprise an oxalate-based compound, and the oxalate-based compound may include sodium oxalate, potassium oxalate, sodium oxalate, ammonium oxalate, sodium oxalate, and calcium oxalate.

In the vessel, a hydrolysis reaction of the precursor solution by the catalyst is performed, and then a gelation process through a condensation reaction may proceed (S20). For example, when ammonium fluoride, hydrochloric acid, and a drying regulating compound are used as the catalyst, the fluoroammonium serves as a catalyst for the hydrolysis reaction, and the hydrochloric acid serves as a catalyst for the condensation polymerization reaction, -Si bond can be formed and gelation can be completed. At this time, the dry modifying compound can control the specific surface area and porosity of the silica pore structure of the present invention by controlling the mole fraction of the dry modifying compound relative to water glass.

Such a reaction process (hydrolysis reaction, condensation reaction, specific surface area and porosity regulating reaction) can be carried out at a predetermined temperature and pressure. For example, the above reaction process can be carried out at a temperature in the range of about 100 to 300 and at a pressure of about 100 to 250 bar. However, such temperature and pressure conditions are merely illustrative, and may vary widely depending on reaction time and reaction conditions.

Subsequently, the surface of the silica compound can be modified by replacing the hydrophilic compound formed on the surface of the silica compound with the hydrophilic ligand of the surface modifier by treating the surface modifier with the silica compound gelled from the precursor solution (S30) . The surface modifier may be a silane-based compound containing a methyl group, and the silane-based compound may include methylsilane and methylsilazane. The methylsilane may be selected from the group consisting of trimethylchlorosilane, methyltrimethoxysilane, methyltriethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, trimethylmethoxysilane, trimethylethoxysilane, methylchlorosilane, methyldichlorosilane, methylpolysiloxane, A silane coupling agent such as silane, dimethyl polysilane, methyltriylsilane, dimethyltrifluoro silane, phenylmethylchlorosilane, phenyldimethylchlorosilane, polymethylphenylsilane, polydimethyldiphenylsilane, polysilamethylrenosilane, poly (1,2- (1,2-dimethylsilazane) (1-methylsilazane), N-methylsilazane, methyldisilazane, dimethyldisilazane, trimethyldisilazane, tetramethyldisilazane, and hexamethyl Disilazane, and the like. However, these are only exemplary and the present invention is not limited thereto.

The surface hydrophilic compound formed on the gelled silica compound may be substituted with the methyl group of the surface modifier to reduce the degree of shrinkage. The drying control compound used in the gelation process and the silica pore structure of the present invention by the surface modifier can be used not only in the supercritical drying process but also in the case of drying in an atmospheric pressure drying process, have.

Thereafter, a predetermined drying process for the gelled material from the precursor solution may be performed to remove the solvent from the gelled material (S40). As a result, a silica pore structure having hydrophobicity on the surface can be obtained simply without additional surface treatment (S50). In this case, the drying process may be performed at atmospheric pressure drying rather than a supercritical process. Generally, atmospheric pressure drying tends to deteriorate physical properties such as specific surface area, thermal conductivity and porosity as compared with the case of the supercritical drying method, but the silica pore structure of the present invention can be obtained by further using a drying control compound as a catalyst, It is possible to prevent the physical properties from deteriorating. Further, although it has been described that the surface modification step (S30) and the drying step (S40) are performed sequentially, the production method of the present invention may be performed at the same time.

In one embodiment, the silica pore structure may have hydrophobic properties due to the surface modifier and polymer surfactant added during the surface modification process. 'Hydrophobic' can be useful in a variety of applications, such as coating materials, for example, because silica pore structures can reduce or inhibit degradation or degradation of properties due to moisture adsorption when they have hydrophobicity. In another application, a silica pore structure can be utilized as an oil absorber and remover.

Such a silica pore structure can have high temperature stability, flexibility and excellent mechanical strength, and can also have high specific surface area, low thermal conductivity, low density (light weight) and hydrophobic surface properties. Also, according to the embodiment of the present invention, the porosity, pore size, density, and mechanical strength of the silica pore structure can be controlled by controlling the kind, concentration, and amount of the precursor, solvent and catalyst. For example, as the concentration of the drying control compound increases, the porosity of the silica pore structure increases, and the degree of shrinkage of the silica pore structure decreases, thereby increasing the surface area.

For example, when the dry controlling compound is added at a certain molar ratio to water glass as the silicate compound precursor, the porosity of the silica pore structure is improved, the degree of shrinkage of the silica pore structure is decreased, and finally the surface area is increased have. Therefore, the silica pore structure of the present invention can provide low thermal conductivity, and can increase the specific surface area to provide high utilization as an oil absorption and remover, drug delivery mediator.

The method described with reference to FIG. 1 is a method of manufacturing a silica pore structure using a sol-gel process. The specific process conditions described in Fig. 1 are merely illustrative, and may be varied in various cases.

In one embodiment, the porosity of the silica pore structure may be in the range of 50% to 99%, preferably in the range of 70% to 99%, and may be suitably adjusted in consideration of the required strength and flexibility. When the silica pore structure has a high porosity, the silica pore structure may be referred to as an aerogel. The higher the porosity, the lower the thermal conductivity due to the lower density, and the lower the porosity, the higher the density of silica and the higher the thermal conductivity. However, in any case, according to the embodiment of the present invention, it is possible to have a thermal conductivity which is high enough to be used as an insulating material while having a high porosity.

In addition, since the silica pore structure does not include a reinforcing additive such as a binder or a fiber, the porosity and specific surface area can be reduced and the thermal conductivity and density can be prevented from rising by the reinforcing additive. Thus, silica pore structures can have high porosity, high specific surface area, low thermal conductivity, and low density.

In one embodiment of the present invention, the silica pore structure may have a specific surface area in the range of about 350 m 2 / g to 1000 m 2 / g. The silica pore structure may have a porosity within the range of 50 vol% to 99 vol%. Also, the thermal conductivity of the silica pore structure may be as low as about 0.03 W / mk or less. On the other hand, the average pore diameter of the silica pore structure may be in the range of 1 nm to 100 nm. The contact angle of the hydrophobic nature of the silica pore structure may be in the range of 90 ° to 180 °.

The pores of the silica pore structure may have a nanoscale, and in this case, the silica pore structure may be referred to as a " nanopore structure ". In some cases, some of the pores of the silica pore structure may have a microscale. In addition, the shape and size of the silica pore structure may be variously changed. For example, the silica pore structure may have a thin film or particle shape other than a bulk shape, and may have various other shapes.

As described above, the silica pore structure according to the embodiment of the present invention can have high temperature stability, and can also have a high specific surface area, a low thermal conductivity, a low density (light weight) and a hydrophobic surface property. Therefore, the silica pore structure can greatly improve the commercialization possibility and utilization value.

FIG. 2 is a graph of an infrared spectroscopic analysis (FT-IR) of a silica pore structure and a comparative example according to an embodiment of the present invention.

Referring to FIG. 2, the transparency of the silica pore structure of the present invention (added oxalic acid) is lower than that of Comparative Example (No oxalic acid) at a wavelength of about 500 and 1100 cm ^{- 1} . It can be seen that the silica pore structure according to the embodiment contains more Si-O-Si bonds. In the comparative example, a low peak shape was observed at a wavelength of about 880 and 2975 cm ^-1, which indicates Si-C bond, but a higher type peak was observed in the above silica pore structure. It can be confirmed that the oxalic acid compound, which is a drying regulating compound added in the Examples, participates in the formation of the silica pore structure of the present invention.

3A and 3B are SEM image photographs showing a silica pore structure and a comparative example according to an embodiment of the present invention. FIG. 3A is an SEM photograph of a comparative example in which an oxalic acid compound is not added in the production of silica airgel, and FIG. 3B is an SEM photograph of a silica pore structure according to an embodiment of the present invention prepared by adding an oxalic acid compound.

Referring to FIG. 3A, in the comparative example, it can be seen that the size of the silica particles in the gel is large and different from each other. However, referring to FIG. 3B, it can be seen that the silica pore structure manufactured according to an embodiment of the present invention has a small silica particle size in the gel and a relatively uniform particle size. Thus, since the silica particles in the silica pore structure are uniformly small in size, the pore size of the silica pore structure can be increased, and the pores can have a similar size.

4A and 4B are graphs showing the results of analysis of porosity and specific surface area of the silica pore structure and the comparative example according to an embodiment of the present invention.

Referring to FIG. 4A, as a result of analysis using a BET specific surface area analyzer (Brunauer Emmett Teller Specific Surface Area), specific gases were absorbed and desorbed on the surfaces of the structures of Comparative Examples and Examples, And the adsorption amount was measured. According to the analytical graph, it can be seen that the amount of adsorbed silica in the silica pore structure of the Example is larger than the adsorption amount of the gas of the comparative example (No oxide acid). This shows that the specific surface area of the silica pore structure of the present invention is relatively larger.

Referring to FIG. 4B, the pore distribution of Comparative Examples and Examples was analyzed using BJH (Barrett-Joyner-Halenda) analysis. According to the analysis graph, it was found that the pore size of the silica pore structure (added oxalic acid) of the example formed by adding the oxalic acid compound as the drying control compound was smaller than that of the comparative silica (No oxalic acid) .

While a great many have been described above, they should be construed as illustrative of specific embodiments rather than as limiting the scope of the invention. For example, it will be understood by those skilled in the art that the manufacturing process of the silica pore structure of FIG. 1 can be variously changed. Further, it can be understood that the silica pore structure according to the embodiments can be applied for various purposes in various fields other than the heat insulating material, the sound insulating material, and the space material. For example, based on hydrophobicity and high specific surface area characteristics, the silica pore structure can be utilized in oil absorption and removers. Therefore, the scope of the present invention is not to be determined by the described embodiments, but rather by the technical idea described in the claims.

Claims (17)

Providing a silica compound precursor comprising a liquid silicate compound precursor and a polymeric surfactant;
Providing a dry conditioning compound to aid in the reaction of said silica compound precursor;
Mixing the silica compound precursor and the dry regulating compound into a solvent to provide a precursor solution; And
Forming a silica pore structure by modifying the surface of the gelled silica compound by adding a surface modifier containing a silane compound after the gelation process from the precursor solution;
Wherein the silica pore structure has improved specific surface area and porosity. The method according to claim 1,
The polymeric surfactant is an acrylate-based surfactant,
The polymer surfactant may be selected from the group consisting of polymethyl methacrylate (PMMA), 3-trimethoxysilylpropyl methacrylate, C1-C12 alkyl methacrylate, 2-ethoxyethyl methacrylate, 2- Acrylates such as ethylene glycol methyl ester acrylate, cyclohexyl methacrylate, benzyl methacrylate, phenyl methacrylate, 2- (methylthio) ethyl methacrylate, hexafluoroisopropylacrylate, trifluoroethyl methacrylate A process for producing a silica pore structure comprising one of a perfluoroalkyl methacrylate, a perfluoroalkyl methacrylate, a perfluoropropyl methacrylate, a heptafluorobutyl methacrylate, octafluoropentyl methacrylate, tetrafluoropropyl methacrylate and hexafluorobutyl methacrylate . The method according to claim 1,
The surface modifier may be methylsilane or methylsilazane,
The methylsilane may be selected from the group consisting of trimethylchlorosilane, methyltrimethoxysilane, methyltriethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, trimethylmethoxysilane, trimethylethoxysilane, methylchlorosilane, methyldichlorosilane, methylpolysiloxane, A silane coupling agent such as silane, dimethyl polysilane, methyltriylsilane, dimethyltrifluoro silane, phenylmethylchlorosilane, phenyldimethylchlorosilane, polymethylphenylsilane, polydimethyldiphenylsilane, polysilamethylrenosilane, poly (1,2- (1,2-dimethylsilazane) (1-methylsilazane), N-methylsilazane, methyldisilazane, dimethyldisilazane, trimethyldisilazane, tetramethyldisilazane, and hexamethyl Lt; RTI ID = 0.0 > 1, < / RTI > The method according to claim 1,
Wherein the dry modifying compound comprises at least one of an oxalic acid compound, a formamide compound, an N, N-dimethylformamide compound, and a glycerol compound. The method according to claim 1,
Aging the surface-modified silica compound;
And drying the aged gel. ≪ RTI ID = 0.0 > 21. < / RTI > The method according to claim 1,
Wherein the solvent is deionized water, alcohol-based, carbonate-based, ether-based or ketone-based solvent. The method according to claim 1,
Further comprising adding an acid or base catalyst to the precursor solution. ≪ RTI ID = 0.0 > 11. < / RTI > 8. The method of claim 7,
Wherein the acidic catalyst comprises hydrochloric acid, citric acid, phosphoric acid, acetic acid, oxalic acid, sulfuric acid, ammonium fluoride or nitric acid. 8. The method of claim 7,
Wherein the basic catalyst comprises ammonia, ammonium hydroxide, sodium hydroxide (NaOH) or potassium hydroxide or piperidine. The method according to claim 1,
The gelation process is performed by a hydrolysis reaction, a condensation reaction, a ligand substitution reaction, or a combination thereof. A hydrophobically modified surface, and an improved specific surface area and porosity. 12. The method of claim 11,
Wherein the silica pore structure has a porosity of 70 vol% to 99 vol%. 12. The method of claim 11,
Wherein the silica pore structure has a specific surface area of from 350 m 2 / g to 1000 m 2 / g. 12. The method of claim 11,
The silica pore structure is controlled in specific surface area and porosity by a drying control compound. 15. The method of claim 14,
The dry controlling compound includes at least one of an oxalic acid compound, a formamide compound, an N, N-dimethylformamide compound, and a glycerol compound. 12. The method of claim 11,
Wherein the hydrophobically modified surface is modified by replacing the surface of the silica pore structure with a hydrophobic methyl group by a surface modifier containing a methyl group and silicon. 17. The method of claim 16,
Wherein the surface modifier is methylsilane and methylsilazane,
The methylsilane may be selected from the group consisting of trimethylchlorosilane, methyltrimethoxysilane, methyltriethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, trimethylmethoxysilane, trimethylethoxysilane, methylchlorosilane, methyldichlorosilane, methylpolysiloxane, A silane coupling agent such as silane, dimethyl polysilane, methyltriylsilane, dimethyltrifluoro silane, phenylmethylchlorosilane, phenyldimethylchlorosilane, polymethylphenylsilane, polydimethyldiphenylsilane, polysilamethylrenosilane, poly (1,2- (1,2-dimethylsilazane) (1-methylsilazane), N-methylsilazane, methyldisilazane, dimethyldisilazane, trimethyldisilazane, tetramethyldisilazane, and hexamethyl Disilazane silica pore structure.

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