KR20170102641A - Metamaterial based color filter and manufacturing method for the same - Google Patents

Metamaterial based color filter and manufacturing method for the same Download PDF

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KR20170102641A
KR20170102641A KR1020160024999A KR20160024999A KR20170102641A KR 20170102641 A KR20170102641 A KR 20170102641A KR 1020160024999 A KR1020160024999 A KR 1020160024999A KR 20160024999 A KR20160024999 A KR 20160024999A KR 20170102641 A KR20170102641 A KR 20170102641A
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South Korea
Prior art keywords
pattern portion
pattern
color filter
metal layer
angle
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KR1020160024999A
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Korean (ko)
Inventor
윤관호
문정호
소순애
김민경
노준석
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포항공과대학교 산학협력단
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Priority to KR1020160024999A priority Critical patent/KR20170102641A/en
Publication of KR20170102641A publication Critical patent/KR20170102641A/en

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films
    • G02B5/286—Interference filters comprising deposited thin solid films having four or fewer layers, e.g. for achieving a colour effect
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties
    • G02F2202/30—Metamaterials

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optical Filters (AREA)

Abstract

The present invention provides a metamaterial based color filter, comprising: a substrate configured to transmit light emitted therefrom; and a metal layer formed on the substrate, wherein the metal layer has a plurality of first pattern parts formed in a first direction, a plurality of second pattern parts formed in a second direction, and a plurality of third pattern parts formed in a third direction. The first pattern part, the second pattern part, and the third pattern part are formed in a nano-scale and are not overlapped with each other. Thereby, the present invention has an effect of implementing thin film filters using nanostructures.

Description

METAMATERIAL BASED COLOR FILTER AND MANUFACTURING METHOD FOR THE SAME

The present invention relates to a metamaterial-based color filter and a method of manufacturing the same. More particularly, the present invention relates to a meta-material-based color filter including a metal layer having a nanostructure pattern and a method of manufacturing the same.

Recently, the display field has been developed in various forms according to the development of the information society. In order to develop such a display field, flat panel displays having various characteristics have been studied. Flat panel displays include liquid crystal displays (LCDs), plasma display panels (Plasma Display Panel) A light emitting display (Electro Luminescent Display), and the like. Among them, the liquid crystal display device is one of the most widely used flat panel display devices.

Liquid crystal displays (LCDs) are used in portable devices because they consume less power, and a color filter is used for color implementation on such LCDs.

The color filter is composed of red, green, and blue (RGB) filters, and passes light from the backlight through the liquid crystal only at the wavelength of the color corresponding to each filter. Therefore, the light that is separated is recognized by the human eye as the correct color.

However, in such a conventional technique, one display pixel must be composed of at least three color filters of R, G, and B, so that the miniaturization of the pixel is restricted, and the miniaturization, thinning, There is a difficulty.

Patent Document 1: Korean Patent Laid-Open No. 10-2011-0047767 (Published May, May, 2011) Patent Document 2: Korean Patent Laid-Open No. 10-2005-0011548 (published on Jan. 29, 2005)

It is an object of the present invention to provide a meta-material-based color filter capable of implementing a thin film filter using a nanostructure and a method of manufacturing the same.

The present invention provides a meta-material-based color filter using a meta-material and a method of manufacturing the same.

It is another object of the present invention to provide a meta-material-based color filter for a display device capable of realizing miniaturization, thinning, and high resolution by including all the red, green, and blue filters in one filter and a method of manufacturing the same.

A metamaterial-based color filter according to an embodiment of the present invention includes: a substrate configured to transmit emitted light; And a metal layer formed on the substrate, wherein the metal layer has a plurality of first pattern portions formed in a first direction, a plurality of second pattern portions formed in a second direction, a plurality of third patterns formed in a third direction, Wherein the first pattern portion, the second pattern portion, and the third pattern portion are each formed in a nano-size, and are not overlapped with each other.

Wherein the first pattern portion corresponds to a red (R) filter, the second pattern portion corresponds to a green (G) filter, and the third pattern portion corresponds to a blue (B) Filter can be provided.

In addition, the first pattern portion, the second pattern portion, and the third pattern portion are successively arranged at predetermined intervals, respectively.

The first pattern portion, the second pattern portion, and the third pattern portion are each formed at an obtuse angle.

Further, the substrate may be made of glass, and may provide a meta-material-based color filter.

Further, the first direction forms an angle of 120 degrees with the horizontal direction, the second direction forms an angle of 60 degrees with the horizontal direction, and the third direction forms an angle of 0 with the horizontal direction A metamaterial based color filter can be provided.

Further, the metal layer may have a thickness of 35 nm to 45 nm.

The length of the first pattern portion is 50 to 70 nm, the length of the first pattern portion is 130 to 150 nm, the width of the second pattern portion is 20 to 40 nm, and the length of the second pattern portion is 140 nm Wherein the third pattern portion has a transverse length of 80 nm to 100 nm and the third pattern portion has a vertical length of 50 nm to 70 nm.

Also, the first pattern portion, the second pattern portion, and the third pattern portion may be formed in a rectangular shape.

According to another aspect of the present invention, there is provided a method of manufacturing a meta-material-based color filter, comprising: forming a substrate configured to transmit light emitted; Forming a metal layer on the substrate; And forming a plurality of first pattern portions formed in the metal layer in the first direction, a plurality of second pattern portions formed in the second direction, and a plurality of third pattern portions formed in the third direction, The second pattern portion, and the third pattern portion are each formed in a nano size, and are not overlapped with each other.

Wherein the first pattern portion corresponds to a red (R) filter, the second pattern portion corresponds to a green (G) filter, and the third pattern portion corresponds to a blue (B) A method of manufacturing a filter can be provided.

In addition, the first pattern portion, the second pattern portion, and the third pattern portion may be successively arranged at predetermined intervals, respectively.

Also, the first pattern portion, the second pattern portion, and the third pattern portion may each be formed at an obtuse angle.

Further, it is possible to provide a method of manufacturing a meta-material-based color filter, wherein the substrate is made of glass.

Further, the first direction forms an angle of 120 degrees with the horizontal direction, the second direction forms an angle of 60 degrees with the horizontal direction, and the third direction forms an angle of 0 with the horizontal direction A method of manufacturing a meta-material-based color filter can be provided.

Further, it is possible to provide a method of manufacturing a meta-material-based color filter, wherein the metal layer has a thickness of 35 nm to 45 nm.

The length of the first pattern portion is 50 to 70 nm, the length of the first pattern portion is 130 to 150 nm, the width of the second pattern portion is 20 to 40 nm, and the length of the second pattern portion is 140 nm Wherein the third pattern portion has a transverse length of 80 nm to 100 nm and the third pattern portion has a vertical length of 50 nm to 70 nm.

In addition, the pattern portion may be formed in a rectangular shape.

A metamaterial-based color filter according to another embodiment of the present invention, comprising: a substrate configured to transmit emitted light; And a metal layer formed on the substrate; And a polarizing plate for realizing polarization of light, wherein the metal layer has a plurality of first pattern portions formed in a first direction, a plurality of second pattern portions formed in a second direction, and a plurality of third pattern portions formed in a third direction Wherein the first pattern portion, the second pattern portion, and the third pattern portion are formed to have nano-size respectively and are not overlapped with each other, and the color of the first pattern portion, the second pattern portion, And the control is performed through the polarization control of the polarizing plate.

The color filter according to embodiments of the present invention has an effect that a thin film filter can be implemented using a nanostructure.

Further, there is an effect that a color filter using a meta material can be manufactured.

Also, since the red, green, and blue filters are all included in one filter, the color filter can be miniaturized, thereby realizing the thinning of the filter. As the color filter is miniaturized, the number of pixels included in the display device increases , And high resolution can be realized.

1 is a view schematically showing a structure of a general color filter.
2 is a plan view showing a structure of a color filter according to the first embodiment.
3 is a side view of the color filter shown in Fig.
Fig. 4 is an enlarged view of a part of Fig. 2. Fig.
5 is a plan view showing a structure of a color filter according to the second embodiment.
6 is a side view of the color filter shown in Fig.
Fig. 7 is an enlarged view of a portion of Fig. 5. Fig.
8 is a flowchart for explaining a method of manufacturing a color filter according to the first embodiment.
9 is a flowchart for explaining a method of manufacturing a color filter according to the second embodiment.

Hereinafter, specific embodiments of the present invention will be described in detail with reference to the drawings.

In the following description of the present invention, detailed description of known functions and configurations incorporated herein will be omitted when it may make the subject matter of the present invention rather unclear.

1 is a view schematically showing the structure of a general color filter.

Referring to FIG. 1, a typical color filter structure includes three filters, that is, a red filter 1, a green filter 3, and a blue filter 5. Only the corresponding color is transmitted according to each wavelength, Can be expressed.

As described above, when the pixels of the display are constructed according to the conventional technique, various colors can be expressed by including filters of red, green, and blue. Therefore, since one display pixel must be composed of at least three color filters, there is a restriction on the miniaturization of the pixel, which makes it difficult to develop a high-resolution pixel.

FIG. 2 is a plan view showing the structure of a color filter according to the first embodiment, FIG. 3 is a side view of FIG. 2, and FIG. 4 is an enlarged view of a portion of FIG.

2 to 4, the color filter 10 according to the first embodiment of the present invention includes a substrate 110 formed on the lower side, a metal layer 120 provided on the substrate 110, a metal layer And a plurality of RGB pattern units 130 formed on the display unit 120. In this case, the RGB pattern unit 130 includes a plurality of first pattern units 121 formed in a first direction, a plurality of second pattern units 123 formed in a second direction, and a plurality of third patterns formed in a third direction The first direction, the second direction, and the third direction are different from each other.

In the present embodiment, the color filter 10 may be an optical component in the form of a film that can extract three colors of red, green, and blue on a pixel-by-pixel basis in white light so as to realize color in a liquid crystal display.

Referring to FIG. 2, the color filter 10 may be formed with an RGB pattern unit 130 for color representation. At this time, the RGB pattern unit 130 corresponds to the first pattern unit 131 serving as a red filter, the second pattern unit 133 serving as a green filter, and the blue filter. And a third pattern unit 135 may be included.

The first pattern unit 131 may be formed at a predetermined angle so as to face the first direction. The angle formed by the second pattern part 133 may be different from the angle formed by the first pattern part 131. The second pattern part 133 may be formed to have a predetermined angle with respect to the second direction, . The third pattern portion 135 formed at a predetermined angle toward the third direction may be formed at an angle different from that of the first pattern portion 131 and the second pattern portion 133.

Referring to FIG. 3, the substrate 110 is formed at the bottom of the color filter 10 and may be formed of glass. At this time, the substrate 110 may be coated with ITO (Indium Tin Oxide) for preventing static electricity. ITO has good transmittance and can transmit light well and has good electrical conductivity. Therefore, ITO is deposited on the glass substrate 110 to prevent static electricity from being deteriorated and transmittance to be lowered.

The metal layer 120 may be formed on the substrate 110. At this time, the metal layer 120 may be formed of a meta-material, for example, low-priced aluminum may be used. When a low-priced metal is used, the unit cost is lowered, and it is possible to make it low-priced and mass-produced. However, as the metal layer 120, various metals such as gold, silver, and chromium may be used in addition to aluminum, but the present invention is not limited thereto.

The metal layer 120 may have a constant thickness as in FIG. 3, for example, the metal layer 120 may have a thickness of 40 nm, or 30 nm to 50 nm, or 35 nm to 45 nm. However, the thickness of the metal layer 120 is not limited thereto.

Referring to FIG. 4, the first pattern portion 131 may be formed by forming nano-sized holes in the metal layer 120. In this embodiment, the case where the metal layer 120 is aluminum can be exemplified. In this case, the first pattern portion 131 may be a square having a length of 140 nm and a width of 60 nm, and the size of the first pattern portion 131 is not limited thereto. For example, the first pattern unit 131 may have a rectangular shape with a vertical length of 130 nm. When the metal layer 120 is a metal other than aluminum, for example, gold, silver, chromium, or the like, the size of the first pattern unit 131 may vary.

The first pattern unit 131 may be formed in a shape having a predetermined angle. The first pattern unit 131 may have an angle of 120 degrees with respect to the horizontal direction, and the angle of the first pattern unit 131 is not limited thereto. For example, it may have an angle of 105 DEG to 135 DEG with respect to the horizontal direction.

The second pattern portion 133 may be formed by forming a nano-sized hole in the metal layer 120, like the first pattern portion 131. The second pattern portion 133 may have a length of 150 nm and a width of 30 nm. However, the size of the second pattern portion 133 is not limited thereto. For example, the vertical length of the second pattern portion 133 may be 160 nm. In the case where the metal layer 120 is a metal other than aluminum, for example, gold, silver, chromium, etc., the size of the second pattern portion 133 may be varied.

The second pattern portion 133 may be formed at an angle corresponding to the first pattern portion 131. The second pattern portion 133 may be formed at an angle of 60 degrees with respect to the horizontal direction, but the angle of the second pattern portion 133 is not limited thereto. For example, the second pattern portion 133 may have an angle of 45 degrees or more and 75 degrees or less with respect to the horizontal direction. At this time, the second pattern portion 133 may have an angle different from that of the first pattern portion 131.

The third pattern portion 135 may be formed by forming nano-sized holes in the metal layer 120, like the first pattern portion 131 and the second pattern portion 133. The third pattern portion 135 may have a length of 60 nm and a width of 90 nm. However, the size of the third pattern portion 135 is not limited thereto. For example, the vertical length of the third pattern portion 135 may be 70 nm. In the case where the metal layer 120 is a metal other than aluminum, for example, gold, silver, chromium, etc., the size of the third pattern portion 135 may be varied.

The third pattern portion 135 may have an angle of 0 degree with respect to the horizontal direction, but the angle of the third pattern portion 135 is not limited thereto. However, the third pattern portion 135 may be formed at an angle different from that of the first pattern portion 131 and the second pattern portion 133.

The first pattern portion 131, the second pattern portion 133, and the third pattern portion 135 may have different angles and may be arranged at equal intervals in different directions. 4, if the second pattern portion 133 and the third pattern portion 135 have an interval of 30 nm, the distance between the second pattern portion 133 and the third pattern portion 135 Lt; RTI ID = 0.0 > 30 nm. ≪ / RTI > However, the gap between the second pattern portion 133 and the third pattern portion 135 is not limited thereto. Similarly, the intervals between the first pattern units 131 and the third pattern units 133 may be the same. In this case, the distance between the first pattern portion 131 and the third pattern portion 133 may be different from the interval between the second pattern portion 133 and the third pattern portion 135.

The interval between the first pattern portion 131 and the first pattern portion 131 may be 200 to 220 nm or 210 nm and the interval between the second pattern portion 133 and the second pattern portion 133 may be 220 nm 240 nm or 230 nm, and the interval between the third pattern portion 135 and the third pattern portion 135 may be 250 nm to 270 nm or 260 nm, but is not limited thereto.

In general, metal surfaces with regularly arranged nano-sized holes are called metasurfaces. Accordingly, the color filter according to the present exemplary embodiment may be a filter using a meta surface since the RGB pattern unit 130 is formed by forming nano-sized holes in the metal layer 120. [

Hereinafter, the function and effect of the color filter 10 according to the first embodiment of the present invention and the method of manufacturing the color filter 10 will be described with reference to FIG.

8 is a view showing a manufacturing method of a color filter according to the first embodiment.

Referring to FIG. 8, a substrate 110 may be formed at the bottom of the color filter 10 (S810). The substrate 110 at this time may be glass.

The metal layer 120 may be formed on the glass substrate 110 at a predetermined thickness (S820). In this case, the metal layer 120 may be aluminum, and the metal layer 120 may be formed to a thickness of 40 nm.

Then, nano-sized holes are formed in the metal layer 120 to form the RGB pattern portion 130 (S830). At this time, the nano-holes formed in the metal layer 120 may be the same as a well-known technique in which a depressed pattern is formed in a semiconductor material. Through the RGB pattern unit 130, a transmissive color filter 10 having various colors can be formed.

The RGB pattern unit 130 includes a first pattern unit 131 serving as a red filter, a second pattern unit 133 serving as a green filter, a third pattern unit 133 serving as a blue filter, The first pattern portion 131, the second pattern portion 133, and the third pattern portion 135 may all have different angles.

In general, light can not pass through a nano-sized hole, but in the case of a nano-hole in a metal rich in free electrons, the light is converted and transferred into a regular vibration of free electrons, . Accordingly, the light emitted from the light source passes through the nano-sized RGB pattern unit 130 and the first pattern unit 131, the second pattern unit 133, and the third pattern unit 135 ) Are different from each other, the color can be adjusted through the polarizer through which the light passes according to the angle.

According to the method of manufacturing the color filter 10 and the color filter 10 according to the embodiment of the present invention, all of the RGB pattern portions 130 made of nano-sized holes are included in one filter, The implementation of the filter can be enabled.

In addition, since the pixel size can be reduced through the RGB pattern unit 130, the image quality can be improved and a high resolution can be realized.

Hereinafter, a meta-material-based color filter according to a second embodiment of the present invention and a method of manufacturing the same will be described with reference to FIGS. 5 to 7 and 9. FIG. The second embodiment differs from the first embodiment in that it is a reflection type color filter in which RGB pattern portions are formed by using the embossing technique in the metal layer. Therefore, differences will be mainly described, and the same portions will be described with reference to the first embodiment The description and the reference numerals are used.

FIG. 5 is a plan view showing a structure of a color filter according to a second embodiment, FIG. 6 is a side view of FIG. 5, and FIG. 7 is an enlarged view of a portion of FIG.

5 to 7, the color filter 20 according to the second exemplary embodiment of the present invention includes a substrate 210 and a metal layer 220 formed on the substrate 210. Referring to FIG.

In this embodiment, the substrate 210 may be silicon, unlike the first embodiment. In addition, after the metal layer 220 is formed on the substrate 210 formed of silicon, the RGB pattern portion 230 may be formed on the metal layer 220 through the embossing technique.

Referring to FIG. 5, the RGB pattern unit 230 includes a first pattern unit 231 corresponding to a red filter, a second pattern unit 233 corresponding to a green filter, And a third pattern unit 235 corresponding to the second pattern unit 235.

The RGB pattern portion 230 formed on the metal layer 220 through the embossing method may be the same as the embossing method used for a general semiconductor material, but the method of forming the RGB pattern portion 230 is not limited thereto.

The RGB pattern unit 230 may be formed in the metal layer 220 in a nano-scale. In this case, the metal layer 220 may be formed of aluminum, and the RGB pattern portion 230 may be formed of an aluminum bar. As the metal layer 220, various metals such as gold, silver, and chromium may be used in addition to aluminum, but the present invention is not limited thereto.

Referring to FIG. 6, the metal layer 220 may have a constant thickness. For example, the metal layer 120 may have a thickness of 40 nm, or 30 nm to 50 nm, or 35 nm to 45 nm, but the thickness of the metal layer 120 is not limited thereto. Since the RGB pattern unit 230 is formed on the metal layer 220 through the embossing technique, the RGB pattern unit 230 may be formed of aluminum bar having the same thickness as the metal layer 220. The thickness of the RGB pattern unit 230 may vary depending on the thickness of the metal layer 220.

Referring to FIG. 7, the RGB pattern unit 230 includes a first pattern unit 231 corresponding to at least one red filter, a second pattern unit 233 corresponding to the green filter, And a third pattern unit 235 corresponding to the filter. In this case, the first pattern units 231 are formed at a predetermined angle, and the first pattern units 231 may be disposed at the same interval as the plurality of second pattern units 233. The third pattern unit 235 may be disposed at the same interval. In this case, the distance between the first pattern portion 231 and the second pattern portion 233 may be different from the distance between the third pattern portion 235 and the second pattern portion 233. In addition, although the first pattern portion 231 may have an angle of 60 degrees, it is not limited thereto.

The second pattern portion 233 and the third pattern portion 235 may include at least one color filter 20 as in the first pattern portion 231 and may be formed at a constant angle. Further, they can be disposed in the color filter 20 at the same interval. For example, the interval between the second pattern portion 233 and the third pattern portion 235 may be 30 nm, but the interval between the RGB pattern portions 230 arranged at regular intervals is not limited thereto.

The interval between the first pattern portion 231 and the first pattern portion 231 may be 200 to 220 nm or 210 nm and the interval between the second pattern portion 233 and the second pattern portion 233 may be 220 nm 240 nm or 230 nm, and the interval between the third pattern portion 235 and the third pattern portion 235 may be 250 nm to 270 nm or 260 nm, but is not limited thereto.

Hereinafter, a method of manufacturing the color filter 20 according to the second embodiment of the present invention will be described with reference to FIG.

9 is a view showing a method of manufacturing a color filter according to the second embodiment.

Referring to FIG. 9, the color filter 20 according to the second embodiment of the present invention may be formed with a substrate 120 at the bottom (S910). The substrate 120 at this time may be silicon.

A metal layer 220 may be formed on the substrate 120 to a predetermined thickness (S920). In this case, the metal layer 220 may be aluminum, and the metal layer 120 may be formed to a thickness of 40 nm.

Then, a nano-sized RGB pattern portion 230 may be formed on the metal layer 220 through a boss-like technique (S930). At this time, the embossing technique in which the RGB pattern portions 230 are formed on the metal layer 220 may be the same as a well-known technique used for a semiconductor material.

The RGB pattern unit 230 includes a first pattern unit 231 serving as a red filter, a second pattern unit 233 serving as a green filter, and a third pattern 233 serving as a blue filter, And at least one or more portions 235 at different angles.

Through the nano-sized RGB pattern portion 230 having such a constant angle, the reflective color filter 20 in which each color is reflected can be formed.

According to the above-described method of manufacturing the color filter 20 and the color filter 20 according to the second embodiment of the present invention, when the light emitting source is present on the upper portion of the color filter 20, It is reflected on the RGB pattern portion 231 having a different angle, and only the hue of the RGB pattern portion 231 corresponding to the corresponding angle can be reflected through the polarizing plate.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, Range. ≪ / RTI > Skilled artisans may implement the pattern of features that have not been explicitly described in combination, substitution of the disclosed embodiments, but which, too, do not depart from the scope of the present invention. It will be apparent to those skilled in the art that various changes and modifications may be readily made without departing from the spirit and scope of the invention as defined by the appended claims.

10, 20: color filter 110, 120: substrate
120, 220: metal layer 130, 230: RGB pattern portion
131, 231: first pattern portion 133, 233: second pattern portion
135, and 235:

Claims (19)

In a metamaterial-based color filter,
A substrate configured to transmit the emitted light; And
And a metal layer formed on the substrate,
Wherein the metal layer includes a plurality of first pattern portions formed in a first direction, a plurality of second pattern portions formed in a second direction, and a plurality of third pattern portions formed in a third direction,
Wherein the first pattern portion, the second pattern portion, and the third pattern portion are each formed in a nano-size, and are not overlapped with each other. The apparatus of claim 1, wherein the first pattern portion corresponds to a red (R) filter, the second pattern portion corresponds to a green (G) filter, and the third pattern portion corresponds to a blue (B) Metamaterial based color filter. The metamaterial-based color filter according to claim 1, wherein the first pattern portion, the second pattern portion, and the third pattern portion are successively arranged at predetermined intervals, respectively. The meta-material-based color filter according to claim 1, wherein each of the first pattern portion, the second pattern portion, and the third pattern portion is formed at an obtuse angle. The metamaterial based color filter of claim 1, wherein the substrate is made of glass. The apparatus of claim 1, wherein the first direction forms an angle of 120 degrees with the horizontal direction, the second direction forms an angle of 60 degrees with the horizontal direction, the third direction forms an angle of 0 degrees The color filter forming a metamaterial based color filter. The meta-material based color filter according to claim 1, wherein the metal layer has a thickness of 35 nm to 45 nm. The method of claim 1, wherein the width of the first pattern portion is 50 nm to 70 nm, the length of the first pattern portion is 130 nm to 150 nm, the width of the second pattern portion is 20 nm to 40 nm, Wherein the length of the third pattern portion is 80 nm to 100 nm, and the length of the third pattern portion is 50 nm to 70 nm. The metamaterial-based color filter according to claim 1, wherein the first pattern portion, the second pattern portion, and the third pattern portion are formed in a rectangular shape. Forming a substrate configured to transmit the emitted light;
Forming a metal layer on the substrate; And
Forming a plurality of first pattern portions formed in the metal layer in the first direction, a plurality of second pattern portions formed in the second direction, and a plurality of third pattern portions formed in the third direction;
Wherein the first pattern portion, the second pattern portion, and the third pattern portion are each formed in a nano-size, and are not overlapped with each other. The apparatus of claim 10, wherein the first pattern portion corresponds to a red (R) filter, the second pattern portion corresponds to a green (G) filter, and the third pattern portion corresponds to a blue (B) A method of manufacturing a metamaterial based color filter. 11. The method according to claim 10, wherein the first pattern portion, the second pattern portion, and the third pattern portion are successively arranged at predetermined intervals, respectively. The method of claim 10, wherein the first pattern portion, the second pattern portion, and the third pattern portion are each formed at an obtuse angle. 11. The method of claim 10, wherein the substrate is made of glass. The method of claim 10, wherein the first direction forms an angle of 120 degrees with the horizontal direction, the second direction forms an angle of 60 degrees with the horizontal direction, the third direction forms an angle of 0 degrees Gt; wherein < / RTI > 11. The method of claim 10, wherein the metal layer has a thickness of 35 nm to 45 nm. The method according to claim 10, wherein the width of the first pattern portion is 50 to 70 nm, the length of the first pattern portion is 130 to 150 nm, the width of the second pattern portion is 20 to 40 nm, Wherein the length of the third pattern portion is from 80 nm to 100 nm and the length of the third pattern portion is from 50 nm to 70 nm. The method according to claim 10, wherein the pattern portion is formed in a rectangular shape. In a metamaterial-based color filter,
A substrate configured to transmit the emitted light; And
A metal layer formed on the substrate; And
And a polarizing plate for realizing polarization of light,
Wherein the metal layer includes a plurality of first pattern portions formed in a first direction, a plurality of second pattern portions formed in a second direction, and a plurality of third pattern portions formed in a third direction,
The first pattern portion, the second pattern portion, and the third pattern portion are each formed in a nano-size and are not overlapped with each other,
Wherein color control of the first pattern portion, the second pattern portion, and the third pattern portion is performed through polarization control of the polarizing plate.


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CN108631065A (en) * 2018-04-19 2018-10-09 合肥工业大学 A kind of biabsorption peak based on liquid crystal is adjustable Meta Materials wave-absorber
CN108873555A (en) * 2018-06-27 2018-11-23 桂林电子科技大学 A method of based on the super surface structure zoom lens of liquid crystal tunable medium
WO2019089124A1 (en) 2017-11-01 2019-05-09 Applied Materials, Inc. Metasurface light-recycling color filter for lcd display
CN112425003A (en) * 2018-07-19 2021-02-26 华为技术有限公司 Beam electronically steerable low-sidelobe composite left-right handed (CRLH) metamaterial array antenna
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WO2019089124A1 (en) 2017-11-01 2019-05-09 Applied Materials, Inc. Metasurface light-recycling color filter for lcd display
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CN108631065A (en) * 2018-04-19 2018-10-09 合肥工业大学 A kind of biabsorption peak based on liquid crystal is adjustable Meta Materials wave-absorber
CN108631065B (en) * 2018-04-19 2020-09-18 合肥工业大学 Double-absorption-peak adjustable metamaterial wave absorber based on liquid crystal
CN108873555A (en) * 2018-06-27 2018-11-23 桂林电子科技大学 A method of based on the super surface structure zoom lens of liquid crystal tunable medium
CN112425003A (en) * 2018-07-19 2021-02-26 华为技术有限公司 Beam electronically steerable low-sidelobe composite left-right handed (CRLH) metamaterial array antenna
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