KR20170084814A - Apparatus and Method for treating residual chemical, and Inkjet Printer having the same - Google Patents

Abstract

The printing apparatus includes: a substrate supporting portion for supporting a substrate; An ink jet head in which nozzles for ejecting a chemical liquid are arranged on the substrate; And a residual chemical liquid processing unit for processing the chemical liquid remaining on the nozzle face on which the nozzles of the ink jet head are exposed. Wherein the residual chemical liquid processing unit includes a bath for containing a cleaning liquid capable of removing the residual chemical liquid from the nozzle face, a cleaning liquid supply unit for supplying the cleaning liquid to the bath, and a cleaning liquid discharge unit for discharging the cleaning liquid from the bath, A cleaning liquid processing unit that accommodates the cleaning liquid in the bath according to the opening and closing of the cleaning liquid supply unit and the cleaning liquid discharge unit, or the cleaning liquid flows in the bath; And an ultrasonic wave supplying unit provided to supply ultrasonic waves to the cleaning liquid accommodated in the bath or flowing in the bath.

Description

TECHNICAL FIELD The present invention relates to an apparatus and a method for treating a residual chemical liquid,

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus and a method for treating a residual chemical liquid and a printing apparatus, and more particularly, to an apparatus and a method for treating a chemical liquid remaining on a nozzle surface on which nozzles of an inkjet head are exposed, .

When an alignment film is formed on a substrate (transparent substrate) for manufacturing a liquid crystal display or the like, UV ink is applied, a color filter is coated on a substrate for manufacturing an organic EL display or the like, an inkjet head is provided Is used.

In the inkjet head, nozzles capable of ejecting a chemical solution for forming the alignment layer, applying UV ink, applying a color filter, etc. to the substrate are disposed. However, if the chemical liquid remains on the nozzle surface on which the nozzles of the ink jet head are disposed, it may interfere with the discharge of the chemical liquid. Thus, in the printing process using the printing apparatus, a step of removing the chemical liquid remaining on the nozzle surface is performed.

The removal of the residual chemical liquid includes a step of sucking the remaining chemical liquid into the nozzle surface by vacuum or a step of wiping the nozzle surface.

In the case of the vacuum suction, it is necessary to keep the interval between the nozzle face and the member for vacuum suction constant, but it is difficult to keep the gap constant, so that the residual chemical liquid is completely removed from the vacuum suction It is not easy. If the residual chemical liquid can not be completely removed, the residual chemical liquid is solidified on the nozzle surface and crystal growth occurs. Therefore, it is troublesome to separately clean the nozzle surface from the ink jet head. In addition, since the residual chemical liquid removed from the nozzle surface is sucked into the vacuum suction member, the vacuum suction member may be clogged, so that the vacuum suction member also has to be periodically inspected.

In the step of wiping the nozzle face, the member for wiping the nozzle face remains dipped in the cleaning liquid, and is exposed to the atmosphere only when the nozzle face is wiped, so that the wiping must be performed within a predetermined time have. The residual chemical liquid may be adsorbed on the wiping member. In this case, the residual chemical liquid may be solidified and act as a cause of generating a scratch when wiping the nozzle surface according to the crystal growth.

It is an object of the present invention to provide a residual chemical liquid processing apparatus capable of completely removing a chemical liquid remaining on a nozzle face of an ink jet head.

Another object of the present invention is to provide a printing apparatus provided with a residual chemical liquid processing section capable of completely removing a chemical liquid remaining on a nozzle face of an ink jet head.

It is still another object of the present invention to provide a method of treating a residual chemical liquid that can completely remove a chemical liquid remaining on a nozzle surface of an ink jet head.

According to an aspect of the present invention, there is provided an apparatus for treating a residual liquid, comprising: a bath accommodating a cleaning liquid capable of removing a residual liquid on a nozzle surface of an inkjet head; a cleaning liquid And a cleaning liquid discharge unit for discharging the cleaning liquid from the bath, wherein the cleaning liquid supply unit and the cleaning liquid discharge unit are opened or closed to allow the cleaning liquid to be received in the bath or the cleaning liquid to flow in the bath; And an ultrasonic wave supplying unit provided to supply ultrasonic waves to the cleaning liquid accommodated in the bath or flowing in the bath.

In the residual chemical liquid processing apparatus according to an embodiment of the present invention, the ultrasonic wave providing unit may be provided to supply the ultrasonic wave to the cleaning liquid in the same direction as the flow direction of the cleaning liquid.

In the apparatus for treating residual chemicals according to an embodiment of the present invention, the cleaning liquid supply unit may include a supply line connected to the bottom of the bathtub and a supply valve for opening and closing the supply line, and the cleaning liquid discharge unit is connected to the bottom surface of the bathtub And a discharge valve for opening and closing the discharge line, and the ultrasonic wave supplying unit may be provided on a side of the bath where the supply line is disposed.

The apparatus for treating residual chemicals according to an embodiment of the present invention may further include a height adjusting unit for adjusting the height of the inkjet head so that the nozzle surface contacts or separates from the cleaning liquid when the inkjet head faces the bath .

In the apparatus for treating residual chemicals according to an embodiment of the present invention, the height of the ink jet head may be adjusted so that ultrasonic waves are supplied to the cleaning liquid when the cleaning liquid flows in the bath, and the nozzle surface is brought into contact with the cleaning liquid.

In the apparatus for treating residual chemicals according to an embodiment of the present invention, when receiving the cleaning liquid in the bath, the height of the inkjet head may be adjusted so that ultrasonic waves are supplied to the cleaning liquid and the nozzle surface is separated from the cleaning liquid.

The residual chemical liquid processing apparatus according to an embodiment of the present invention may further include a wiping unit configured to wipe the nozzle surface of the inkjet head processed with the residual chemical liquid.

In the residual chemical liquid processing apparatus according to an embodiment of the present invention, the wiping unit may be disposed behind the cleaning liquid discharge unit.

According to another aspect of the present invention, there is provided a printing apparatus comprising: a substrate support for supporting a substrate; An ink jet head in which nozzles for ejecting a chemical liquid are arranged on the substrate; And a residual chemical liquid processing unit for processing the chemical liquid remaining on the nozzle surface on which the nozzles of the ink jet head are exposed, wherein the residual chemical liquid processing unit includes a bath accommodating a cleaning liquid capable of removing the residual chemical liquid from the nozzle surface, And a cleaning liquid discharge unit for discharging the cleaning liquid from the bath, wherein the cleaning liquid is accommodated in the bath in accordance with the opening and closing of the cleaning liquid supply unit and the cleaning liquid discharge unit, A cleaning liquid processing unit configured to be flowed; And an ultrasonic wave supplying unit provided to supply ultrasonic waves to the cleaning liquid accommodated in the bath or flowing in the bath.

In the printing apparatus according to an embodiment of the present invention, the cleaning liquid supply unit may include a supply line connected to the bottom surface of the bathtub and a supply valve for opening and closing the supply line, and the cleaning liquid discharge unit may include a discharge And a discharge valve for opening and closing the discharge line, wherein the ultrasonic wave supplying unit is provided on the side of the bath where the supply line is disposed so that the ultrasonic wave is supplied to the cleaning liquid in the same direction as the flow direction of the cleaning liquid .

In the printing apparatus according to an embodiment of the present invention, the residual chemical liquid processing unit further includes a height adjusting unit that adjusts the height of the inkjet head so that the nozzle surface contacts or separates from the cleaning liquid when the inkjet head faces the bath can do.

In the printing apparatus according to an embodiment of the present invention, the height of the ink jet head can be adjusted so that ultrasonic waves are supplied to the cleaning liquid when the cleaning liquid flows in the bath, and the nozzle surface is in contact with the cleaning liquid. The height of the ink jet head can be adjusted so that the ultrasonic wave is supplied to the cleaning liquid and the nozzle surface is separated from the cleaning liquid.

The printing apparatus according to an embodiment of the present invention may further include a wiping unit configured to wipe the nozzle surface of the inkjet head that has processed the residual chemical liquid.

According to another aspect of the present invention, there is provided a method of treating residual chemical liquid, comprising the steps of selecting a cleaning liquid capable of removing a remaining chemical liquid on a nozzle surface of an ink jet head, step; Providing ultrasonic waves to the cleaning liquid accommodated in the bath or flowing in the bath; And adjusting the height of the inkjet head so that the nozzle surface is in contact with the cleaning liquid to remove the residual chemical liquid from the nozzle surface when the bath is selected to flow the cleaning liquid, And adjusting the height of the inkjet head so that the nozzle surface is spaced apart from the cleaning liquid, thereby removing the residual chemical liquid from the nozzle surface.

In the residual chemical liquid treatment method according to an embodiment of the present invention, the ultrasonic waves may be provided in the same direction as the flow direction of the cleaning liquid.

The method may further include wiping the nozzle surface of the inkjet head from which the residual chemical liquid has been removed, in the residual chemical liquid processing method according to an embodiment of the present invention.

According to one embodiment of the present invention, ultrasonic waves are supplied to the cleaning liquid when the cleaning liquid is received in the bath or flowed in the bath, and when the cleaning liquid is flowed, When the height of the head is adjusted and the cleaning liquid is received, the height of the inkjet head is adjusted so that the nozzle surface is spaced apart from the cleaning liquid, thereby removing the residual liquid from the nozzle surface.

Therefore, according to one embodiment of the present invention, by providing ultrasonic waves to the cleaning liquid, the chemical liquid remaining on the nozzle surface can be more easily removed by raising the kinetic energy of the cleaning liquid.

When the ink jet head is not in use, ultrasonic waves are supplied to the cleaning liquid accommodated in the bath to induce evaporation of the cleaning liquid, so that vaporized gas due to evaporation of the cleaning liquid is supplied to the nozzle surface positioned apart from the cleaning liquid And as a result, the residual chemical liquid which can be solidified on the nozzle face can also be removed. Accordingly, in the present invention, even when the ink jet head is not used, the maintenance of the nozzle surface of the ink jet head can be more easily and stably performed.

Therefore, since the residual chemical liquid can be easily removed and treated from the nozzle surface, the present invention can more stably perform a printing process such as formation of an orientation film, application of UV ink, application of a color filter, and the like.

1 is a perspective view schematically showing a printing apparatus according to an embodiment of the present invention.
Fig. 2 is a schematic diagram showing a residual chemical liquid processing unit provided in the printing apparatus of Fig. 1; Fig.
3 is a process flow chart for explaining a residual chemical liquid treatment method according to an embodiment of the present invention.

For the embodiments of the invention disclosed herein, specific structural and functional descriptions are set forth for the purpose of describing an embodiment of the invention only, and it is to be understood that the embodiments of the invention may be practiced in various forms, The present invention should not be construed as limited to the embodiments described in Figs.

The present invention is capable of various modifications and various forms, and specific embodiments are illustrated in the drawings and described in detail in the text. It is to be understood, however, that the invention is not intended to be limited to the particular forms disclosed, but on the contrary, is intended to cover all modifications, equivalents, and alternatives falling within the spirit and scope of the invention.

The terms first, second, etc. may be used to describe various components, but the components should not be limited by the terms. The terms may be used for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, the first component may be referred to as a second component, and similarly, the second component may also be referred to as a first component.

It is to be understood that when an element is referred to as being "connected" or "connected" to another element, it may be directly connected or connected to the other element, . On the other hand, when an element is referred to as being "directly connected" or "directly connected" to another element, it should be understood that there are no other elements in between. Other expressions that describe the relationship between components, such as "between" and "between" or "neighboring to" and "directly adjacent to" should be interpreted as well.

The terminology used in this application is used only to describe a specific embodiment and is not intended to limit the invention. The singular expressions include plural expressions unless the context clearly dictates otherwise. In the present application, the terms "comprise", "having", and the like are intended to specify the presence of stated features, integers, steps, operations, elements, components, or combinations thereof, , Steps, operations, components, parts, or combinations thereof, as a matter of principle.

Unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. Terms such as those defined in commonly used dictionaries should be construed as meaning consistent with meaning in the context of the relevant art and are not to be construed as ideal or overly formal in meaning unless expressly defined in the present application .

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. The same reference numerals are used for the same constituent elements in the drawings and redundant explanations for the same constituent elements are omitted.

1 is a perspective view schematically showing a printing apparatus according to an embodiment of the present invention.

Referring to FIG. 1, the printing apparatus 100 of the present invention can apply a chemical liquid on an object by an inkjet method. Examples of the object may be a color filter (CF) substrate or a thin film transistor (TFT) substrate of a liquid crystal display panel. Examples of the liquid chemical include liquid crystal, alignment liquid, red (R) Green (G), or blue (B) ink.

The printing apparatus 100 of the present invention includes a substrate supporting section 11, an inkjet head 21, a residual chemical liquid processing section 41, a gantry 31, and the like.

The substrate support 11 is installed on the upper surface of the base 61. The base 61 may have a rectangular parallelepiped shape having a predetermined thickness. The substrate support 11 may include a support plate 12 on which the substrate 10 is placed. The support plate 12 may have a shape similar to that of the substrate 10. Accordingly, when the substrate 10 is provided with a quadrangular shape, the supporting plate 12 may have a rectangular shape.

And a rotation driving unit 13 may be connected to the lower surface of the support plate 12. The rotation driving unit 13 may be a rotation motor. Accordingly, the rotation driving unit 13 can rotate the support plate 12 around a rotation center axis perpendicular to the support plate 12. [ That is, the substrate 10 can be rotated by the rotation of the support plate 12 by rotating the support plate 12 by the rotation driving unit 13.

And a linear driving unit 14 may be connected to the lower surface of the support plate 12 and the rotation driving unit 13. The linear driving unit 14 may be provided to linearly move the support plate 12 and the rotation driving unit 13 to the front and rear of the base 61 with respect to the base 61.

The linear driving unit 14 may include a slider 15, a guide unit 16, and the like. The slider 15 may be disposed on the lower surface of the rotation driving unit 13. The guide portion 16 may be disposed on the lower surface of the slide 15 and may extend along the front and rear of the base 61. A linear motor may be incorporated in the slider 15 so that the slider 15 linearly moves forward and backward of the base 61 as mentioned above along the guide portion 16 by the linear motor You can.

The gantry 31 may be disposed at an upper portion of a path through which the support plate 12 of the substrate support unit 11 is moved. The gantry 31 may be spaced upward from the upper surface of the base 61. In particular, the gantry 31 may be arranged in a vertical direction with respect to the front and rear paths of the base 61.

The residual chemical liquid processing unit 41 may be disposed on one side of the substrate supporting unit 11. [ Thus, the inkjet head 21 is moved to the upper portion of the residual chemical liquid processing unit 41, whereby the residual chemical liquid such as the residual chemical liquid is removed from the nozzle surface of the inkjet head 21. Since the ink jet head 21 has a structure capable of moving to the upper portion of the residual chemical liquid processing unit 41, the ink jet head 21 can be moved to the upper portion of the residual chemical liquid processing unit 41, It is not necessary to separately separate the ink cartridge 21 from the printing apparatus 100.

The inkjet head 21 may be provided to be coupled to the gantry 31 by an inkjet head moving unit 51. The inkjet head 21 can be linearly moved in the longitudinal direction of the gantry 31 by the inkjet head moving part 51 and linearly moved upward and downward in the height direction. In particular, the inkjet head moving unit 51 is a height adjusting unit described later, and the height of the inkjet head 51 can be adjusted by adjusting the height of the inkjet head moving unit 51.

In the printing apparatus 100 of the present invention, a plurality of the inkjet heads 21 may be provided. In this embodiment, three inkjet heads 23, 25, and 27 are provided, but the present invention is not limited thereto .

The inkjet head 21 may be provided with a plurality of nozzles for discharging the chemical liquid. The plurality of nozzles provided in the inkjet head 21 may be mainly 128 or 256 nozzles, and may be arranged in a line at an interval of a predetermined pitch. In addition, the nozzles may be provided with a number of piezoelectric elements corresponding to the nozzles, and the chemical liquid may be ejected so that the chemical liquid is applied onto the substrate 10 through the nozzles by the operation of the piezoelectric element It can be done. Here, when 128 nozzles are provided, 128 piezoelectric elements are provided, and when 256 nozzles are provided, 256 piezoelectric elements are also provided. The discharge amount of the chemical liquid discharged from the nozzles can be independently controlled by controlling the voltage applied to the piezoelectric elements.

As described above, the printing apparatus 100 of the present invention includes the substrate supporting portion 11 for supporting the substrate 10, the inkjet head 21 on which the nozzles for ejecting the chemical liquid are disposed on the substrate 10, And the residual chemical liquid processing unit 41 for processing the chemical liquid remaining on the nozzle surface where the nozzles of the inkjet head 21 are exposed. In addition, in the printing apparatus 100 of the present invention, the ink jet head 21 may have a nozzle surface on which the nozzles are exposed in a direction toward the substrate 10.

When the chemical liquid is continuously ejected by using the inkjet head 21, a chemical liquid may remain on the nozzle surface of the inkjet head 21, and when the inkjet head 21 is not used There is a possibility that the chemical liquid remaining on the nozzle surface of the ink jet head 21 becomes solidified and crystal growth occurs. Therefore, the residual chemical solution on the nozzle surface of the inkjet head 21 is removed using the residual chemical liquid processing unit 41 described in the present invention.

Hereinafter, the residual chemical liquid processing unit 41 provided in the printing apparatus 100 of the present invention will be described in detail.

Fig. 2 is a schematic diagram showing a residual chemical liquid processing unit provided in the printing apparatus of Fig. 1; Fig.

2, the residual chemical liquid processing unit 41 may include a cleaning liquid processing unit, an ultrasonic wave providing unit 44, a wiping unit 47, and the like.

The cleaning liquid processing unit may include a bath 42, a cleaning liquid supply unit 45, a cleaning liquid discharge unit 46, and the like.

The bath 42 accommodates a cleaning liquid 43 capable of removing the remaining chemical liquid on the nozzle face of the ink jet head 21. [ The washing liquid treatment unit according to the present invention not only accommodates the washing liquid 43 in the bath 42 but also the washing liquid supplying unit 45 and the washing liquid discharging unit 46, The flow of the cleaning liquid 43 may be performed.

The cleaning liquid supply unit 45 may be provided to supply the cleaning liquid 43 to the bath 42 and the cleaning liquid discharge unit 46 may be provided to discharge the cleaning liquid 43 from the bath 42 . The cleaning liquid supply unit 45 may include a supply line 45a connected to the bottom of the bath 42 and a supply valve 45b for opening and closing the supply line 45a, A discharge line 46a connected to the bottom of the bath 42 and a discharge valve 46b for opening and closing the discharge line 46a.

As described above, the residual chemical liquid processing unit 41 of the present invention can allow the washing liquid 43 to be received in the bath 42 or flow in the bath 42. That is, when the supply valve 45b of the cleaning liquid supply unit 45 is opened and the discharge valve 46b of the cleaning liquid discharge unit 46 is closed, the cleaning liquid 43 can be received in the bath 42 When both the supply valve 45b of the cleaning liquid supply unit 45 and the discharge valve 46b of the cleaning liquid discharge unit 46 are opened, the cleaning liquid 43 can flow through the bath 42 will be. In order to accommodate the cleaning liquid 43 in the bath 42, the opened supply valve 45b must be closed after a predetermined time. The cleaning liquid 43 may flow in a direction in which the cleaning liquid discharge unit 46 is provided from the direction in which the cleaning liquid supply unit 45 is provided.

The ultrasonic wave supplying unit 44 may be provided to supply ultrasonic waves to the cleaning liquid 43 accommodated in the bath 42 or flowing in the bath 42. In particular, the ultrasonic wave supplying unit 44 may be provided to supply the ultrasonic wave to the cleaning liquid 43 in the same direction as the flow direction of the cleaning liquid 43. Providing the ultrasonic wave in the same direction as the flowing direction of the cleaning liquid 43 is for maximizing the ultrasonic wave transmitted to the cleaning liquid 43. The ultrasonic wave supplying unit 44 may be provided on the side of the bath 42 where the supply line 45a of the cleaning liquid supply unit 45 is disposed.

The ultrasonic wave is supplied to the cleaning liquid 43 received in the bath 42 or flowed in the bath 42 by using the ultrasonic wave supplying unit 44 to improve the kinetic energy of the cleaning liquid 43 And as a result, the chemical liquid remaining on the nozzle face can be more easily treated. That is, when ultrasonic waves are supplied to the cleaning liquid 43 flowing in the bath 42, a flow of kinetic energy is added to the cleaning liquid 43 to generate a sweep effect of the ultrasonic frequency, Since the dead zone can be eliminated, the solution remaining on the nozzle face can be more easily treated. When ultrasonic waves are supplied to the cleaning liquid 43 contained in the bath 42, a flow of kinetic energy is applied to the cleaning liquid 43 to increase the temperature of the cleaning liquid 43, As a result, the vapor of the cleaning liquid 43 through evaporation of the cleaning liquid 43 contacts the nozzle surface, thereby preventing solidification of the chemical liquid remaining on the nozzle surface.

Accordingly, in the present invention, the height of the inkjet head 21 must be adjusted so that the nozzle surface of the inkjet head 21 is in contact with or separated from the cleaning liquid 43. Therefore, the residual chemical liquid processing unit 41 is provided with a height adjusting unit for adjusting the height of the inkjet head 21 so that the nozzle surface contacts or separates from the cleaning liquid 43 when the inkjet head 21 faces the bath 42, And may include a regulator 51. Here, the height adjusting unit 51 may be the inkjet head moving unit 51 as mentioned above. That is, the height of the inkjet head 21 can be adjusted by using the inkjet head moving unit 51.

Therefore, when the cleaning liquid 43 flows in the bath 42, the ultrasonic wave is supplied to the cleaning liquid 43 and the inkjet head moving unit 51 is used to contact the cleaning liquid 43 The height of the inkjet head 21 can be adjusted and ultrasonic waves are supplied to the cleaning liquid 43 when the cleaning liquid 43 is received in the bath 42 and the nozzle surface is separated from the cleaning liquid 43 The height of the inkjet head 21 can be adjusted by using the inkjet head moving unit 51.

The warping portion 47 may be provided to wipe the nozzle surface of the inkjet head 21 that has treated the residual chemical liquid. The wiping portion 47 may be disposed behind the cleaning liquid discharge portion 46. The wiping unit 47 may include a roller 48 or the like that can contact the nozzle surface of the inkjet head 21.

Therefore, in the present invention, by providing the residual chemical liquid processing unit 41, ultrasonic waves are supplied to the cleaning liquid 43 in which the flow is performed to increase the kinetic energy of the particles of the cleaning liquid 43, When the inkjet head 21 is not in use, ultrasonic waves are supplied to the cleaning liquid 43 contained in the bath 42 to induce evaporation of the cleaning liquid 43 It is possible to provide the vaporized gas due to the evaporation of the cleaning liquid 43 to the nozzle surface positioned so as to be spaced apart from the cleaning liquid 43 and to thereby remove the residual chemical liquid which can be solidified on the nozzle surface.

Hereinafter, a method of treating the residual chemical liquid using the residual chemical liquid processing section 41 will be described.

3 is a process flow chart for explaining a residual chemical liquid treatment method according to an embodiment of the present invention.

3, a cleaning liquid 43 capable of removing the remaining chemical liquid on the nozzle surface of the inkjet head 21 is accommodated in the bath 42 or flowed in the bath 42. Step S81)

The ultrasonic waves are supplied to the cleaning liquid 43 accommodated in the bath 42 or flowed in the bath 42. In step S83, the ultrasonic waves are supplied in the same direction as the flow direction of the cleaning liquid 43 .

When the bubbles 42 are selected to flow the cleaning liquid 43, the height of the inkjet head 21 is adjusted so that the nozzle surface is in contact with the cleaning liquid 43, Remove the chemical solution. The height of the inkjet head 21 may be adjusted so that the nozzle surface is spaced apart from the cleaning liquid 43 to accommodate the cleaning liquid 43 in the bath 42, (Step S85)

Then, the nozzle surface of the inkjet head 21 from which the residual chemical liquid is removed is wiped (step S87)

Therefore, when the residual chemical liquid treatment method of the present invention is applied, the chemical liquid remaining on the nozzle face of the ink jet head 21 can be more easily removed, and even when the ink jet head 21 is not used, The residual chemical liquid that can be solidified on the nozzle surface of the inkjet head 21 can be removed through evaporation of the cleaning liquid.

Therefore, since the residual chemical liquid can be easily removed and treated from the nozzle surface, the present invention can stably perform a printing process such as formation of an orientation film, application of UV ink, application of a color filter, An improvement in reliability in the process can be expected.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the present invention as defined by the following claims. It can be understood that it is possible.

10: substrate 11: substrate support
12: Support plate 13:
14: linear driving part 15: slider
16: guide portion 21: ink jet head
31: gantry 41: residual chemical liquid treatment section
42: Bath 43: Cleaning liquid
44: ultrasonic wave supply unit 45: cleaning liquid supply unit
45a: supply line 45b: supply valve
46: cleaning liquid discharge portion 46a: discharge line
46b: discharge valve 47: wiping part
48: roller 51: inkjet head moving part
61: Base 100: Printing device

Claims (16)

A cleaning liquid supply portion for supplying the cleaning liquid to the bath, and a cleaning liquid discharge portion for discharging the cleaning liquid from the bath, wherein the cleaning liquid supply portion and the cleaning liquid supply portion are provided on the nozzle surface of the ink jet head, A cleaning liquid processing unit for containing the cleaning liquid in the bath or flowing the cleaning liquid in the bath according to opening and closing of the cleaning liquid discharge unit; And
And an ultrasonic wave supplying unit provided to supply ultrasonic waves to the cleaning liquid accommodated in the bath or flowing in the bath. The apparatus according to claim 1, wherein the ultrasonic wave providing unit is provided to supply ultrasonic waves to the cleaning liquid in the same direction as the flow direction of the cleaning liquid. [2] The apparatus according to claim 1, wherein the cleaning liquid supply unit includes a supply line connected to the bottom of the bathtub and a supply valve for opening and closing the supply line, the cleaning liquid discharge unit including a discharge line connected to the bottom of the bath, Wherein the ultrasonic wave supply unit is provided on a side surface of the bath on the side where the supply line is disposed. The apparatus for treating residual chemical liquid according to claim 1, further comprising a height adjuster for adjusting a height of the inkjet head so that the nozzle surface contacts or is spaced from the cleaning liquid when the inkjet head faces the bath. The apparatus for treating residual chemical liquid according to claim 4, wherein when the cleaning liquid is flown in the bath, ultrasonic waves are supplied to the cleaning liquid, and the height of the inkjet head is adjusted so that the nozzle surface is in contact with the cleaning liquid. 5. The apparatus according to claim 4, wherein when the cleaning liquid is received in the bath, ultrasonic waves are supplied to the cleaning liquid, and the height of the inkjet head is adjusted so that the nozzle surface is spaced apart from the cleaning liquid. The apparatus according to claim 1, further comprising a wiping unit configured to wipe a nozzle surface of the inkjet head processed with the residual chemical liquid. The apparatus for treating residual chemical liquid according to claim 7, wherein the wiping unit is disposed behind the cleaning liquid discharge unit. A substrate support for supporting a substrate;
An ink jet head in which nozzles for ejecting a chemical liquid are arranged on the substrate; And
And a residual chemical liquid processing unit for processing the chemical liquid remaining on the nozzle surface on which the nozzles of the ink jet head are exposed,
Wherein the residual chemical liquid processing unit includes a bath for containing a cleaning liquid capable of removing the residual chemical liquid from the nozzle face, a cleaning liquid supply unit for supplying the cleaning liquid to the bath, and a cleaning liquid discharge unit for discharging the cleaning liquid from the bath, A cleaning liquid processing unit that accommodates the cleaning liquid in the bath according to the opening and closing of the cleaning liquid supply unit and the cleaning liquid discharge unit, or the cleaning liquid flows in the bath; And an ultrasonic wave supplying unit provided to supply ultrasonic waves to the cleaning liquid accommodated in the bath or flowing in the bath. 10. The washing machine according to claim 9, wherein the cleaning liquid supply unit includes a supply line connected to the bottom of the bathtub and a supply valve for opening and closing the supply line, the cleaning liquid discharge unit including a discharge line connected to the bottom of the bath, Wherein the ultrasonic wave supplying unit is provided on a side of the bath where the supply line is disposed so that the ultrasonic wave is supplied to the cleaning liquid in the same direction as the flow direction of the cleaning liquid. 10. The ink cartridge according to claim 9, wherein the residual chemical liquid processing unit further comprises a height adjusting unit for adjusting a height of the inkjet head so that the nozzle surface contacts or separates from the cleaning liquid when the inkjet head faces the bath. Device. The method as claimed in claim 11, wherein, when the cleaning liquid is caused to flow through the bath, ultrasonic waves are supplied to the cleaning liquid, and the height of the inkjet head is adjusted so that the nozzle surface is in contact with the cleaning liquid. Wherein a height of the ink jet head is adjusted so as to provide ultrasonic waves to the cleaning liquid and to separate the nozzle surface from the cleaning liquid. 10. The printing apparatus according to claim 9, further comprising a wiping unit configured to wipe the nozzle surface of the inkjet head processed with the residual chemical liquid. Selecting a cleaning liquid capable of removing a chemical liquid remaining on a nozzle surface of an ink jet head to be accommodated in the bath or flow in the bath;
Providing ultrasonic waves to the cleaning liquid accommodated in the bath or flowing in the bath; And
When the bubbles are selected to flow the cleaning liquid, the height of the inkjet head is adjusted so that the nozzle surface is in contact with the cleaning liquid, thereby removing the residual chemical liquid from the nozzle surface, And adjusting the height of the ink jet head so that the nozzle surface is spaced apart from the cleaning liquid, thereby removing the residual chemical liquid from the nozzle surface. 15. The method according to claim 14, wherein the ultrasonic waves are provided in the same direction as the flow direction of the cleaning liquid. 15. The method according to claim 14, further comprising the step of wiping the nozzle surface of the ink jet head from which the residual chemical liquid has been removed.

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