KR20170076114A - Polyamic acid composition comprising novel anhydride monomer and trasparent polyimide film using the same - Google Patents

Polyamic acid composition comprising novel anhydride monomer and trasparent polyimide film using the same Download PDF

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KR20170076114A
KR20170076114A KR1020150185972A KR20150185972A KR20170076114A KR 20170076114 A KR20170076114 A KR 20170076114A KR 1020150185972 A KR1020150185972 A KR 1020150185972A KR 20150185972 A KR20150185972 A KR 20150185972A KR 20170076114 A KR20170076114 A KR 20170076114A
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polyamic acid
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dianhydride
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김동연
이재훈
오현석
안경일
김선영
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주식회사 두산
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    • C08J2379/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
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Abstract

본 발명은 폴리아믹산의 산이무수물로 적용될 수 있는 신규 모노머, 이를 포함하는 폴리아믹산 조성물, 및 상기 조성물로부터 제조된 폴리이미드를 제공한다.
본 발명의 폴리아믹산 조성물은 높은 유리전이온도 및 낮은 황색도, 우수한 기계적 특성을 제공함에 따라, 이로부터 제조된 폴리이미드는 플렉서블 디스플레이의 소재로 유용하게 적용될 수 있다.
The present invention provides novel monomers to which an acid dianhydride of polyamic acid can be applied, a polyamic acid composition containing the same, and a polyimide prepared from the composition.
Since the polyamic acid composition of the present invention has a high glass transition temperature and low yellowing degree and excellent mechanical properties, the polyimide prepared from the polyimic acid composition can be usefully used as a material for a flexible display.

Description

신규 구조의 산이무수물 모노머를 적용한 폴리아믹산 용액 및 이를 포함하는 폴리이미드 필름{POLYAMIC ACID COMPOSITION COMPRISING NOVEL ANHYDRIDE MONOMER AND TRASPARENT POLYIMIDE FILM USING THE SAME}TECHNICAL FIELD The present invention relates to a polyamic acid solution to which an acid anhydride monomer is applied and a polyimide film containing the acidic dianhydride monomer.

본 발명은 신규 구조의 산이무수물 모노머, 이러한 산이무수물 모노머를 포함하여 투명 폴리이미드 수지를 제조하기 위한 폴리아믹산 조성물 및 상기 조성물로부터 제조되고 플렉서블 디스플레이 기판 또는 보호막으로 적용이 가능한 투명 폴리이미드 수지에 관한 것이다.The present invention relates to a polyamic acid composition for producing a transparent polyimide resin comprising a novel structure of anhydride monomer, an acid anhydride monomer, and a transparent polyimide resin prepared from the composition and applicable as a flexible display substrate or a protective film .

플랫 패널 디스플레이(Flat Panel Display, FPD)의 경박화 및 소형화가 진행됨에 따라 플랫 패널 디스플레이 제조시 유리 기판 대신에 투명 플라스틱 기판이 요구되고 있다.As the flat panel display (FPD) has become thinner and smaller, a transparent plastic substrate is required instead of a glass substrate in manufacturing a flat panel display.

이러한 요구에 따라 폴리에틸렌 테레프탈레이트(Polyethylene terephthalate, PET)나 폴리에테르 설폰(Polyether sulfone, PES)과 같은 고분자 수지를 필름화하여 제조된 투명 플라스틱 기판이 개발된 바 있다. 상기 PET 또는 PES와 같은 고분자 수지를 이용한 투명 플라스틱 기판은 유리 기판에 비해 연성이 좋은 반면, 유리전이온도(glass transition temperature, Tg)가 낮기 때문에 내열성이 떨어지는 문제가 있다. 또한, 유리 기판에 비해 열팽창 계수(Coefficient of Thermal Expansion, CTE)가 높기 때문에 디스플레이 제조공정 중 고온에서 이루어지는 공정(예를 들어, 220℃ 이상의 TFT 공정)에 의해 쉽게 변형이 일어나는 문제도 있다.In accordance with this demand, a transparent plastic substrate made by polymerizing a polymer resin such as polyethylene terephthalate (PET) or polyether sulfone (PES) has been developed. The transparent plastic substrate using a polymer resin such as PET or PES has a ductility lower than that of a glass substrate, but has a low glass transition temperature (Tg), thereby deteriorating heat resistance. In addition, since the coefficient of thermal expansion (CTE) of the glass substrate is higher than that of the glass substrate, there is a problem that deformation is easily caused by a process (for example, a TFT process at 220 캜 or more) at a high temperature during a display manufacturing process.

한편, 내열성이 우수하여 열팽창계수가 비교적 낮은 폴리이미드 수지를 이용하여 투명 플라스틱 기판을 제조하는 기술이 주목을 받고 있다. 폴리이미드 수지(polyimide resin, PI)는 전하이동착물(CTC: Change transfer complex)에 의한 영향으로 갈색 또는 황색으로 착색되어 가시광선 영역에서의 투과도가 낮기 때문에 유리 기판과 같은 고투명성을 나타내는데 한계가 있다. 따라서 이러한 문제를 해결하기 위한 수많은 연구가 진행 중에 있다. 일반적으로 폴리이미드(PI) 수지는 방향족 산이무수물과 방향족 디아민 또는 방향족 디이소시아네이트를 용액중합하여 폴리아믹산 유도체를 제조한 후, 고온에서 폐환 탈수시켜 이미드화하여 제조되는 고내열 수지를 일컫는다. On the other hand, a technique for producing a transparent plastic substrate using a polyimide resin having excellent heat resistance and a relatively low coefficient of thermal expansion has attracted attention. The polyimide resin (PI) is colored to brown or yellow due to the effect of a change transfer complex (CTC) and has a low transparency in the visible light region, . Therefore, many studies are under way to solve these problems. Generally, a polyimide (PI) resin refers to a high heat resistant resin prepared by preparing a polyamic acid derivative by combining an aromatic dianhydride, an aromatic diamine or an aromatic diisocyanate in solution, and then dehydrating and cyclizing at a high temperature to imidize it.

상기 폴리이미드 수지를 제조하기 위한 방향족 산이무수물의 성분으로는 피로멜리트산이무수물(PMDA) 또는 비페닐테트라카르복실산이무수물(BPDA) 등을 사용하고 있고, 방향족 디아민 성분으로는 옥시디아닐린(ODA), p-페닐렌 디아민(p-PDA), m-메틸렌 디아민(m-MDA), 메틸렌 디아민(MDA), 비스아미노페닐헥사플로오로프로판(HFDA) 등을 주로 사용하고 있다. 이러한 산이무수물 혹은 디아민 성분은 광학 특성과 열특성, 기계 특성의 연관관계가 trade-off 관계에 있기 때문에, 각 특성에 적합한 성분의 화합물, 즉 투명 PI용 모노머(Monomer)의 개발이 필요한 실정이며, 이에 따라 고투명성을 나타내면서도 내열성이 우수하고 낮은 열팽창 계수와 우수한 기계적 특성을 가지는 플레시블 디스플레이용 투명 폴리아믹산(Polyamic acid) 조성물의 개발이 요구되고 있다.(PMDA), biphenyltetracarboxylic acid dianhydride (BPDA) and the like are used as the components of the aromatic acid dianhydride for producing the polyimide resin, and as the aromatic diamine component, oxydianiline (ODA ), p-phenylenediamine (p-PDA), m-methylenediamine (m-MDA), methylenediamine (MDA) and bisaminophenylhexafluoropropane (HFDA). Since the acid anhydride or diamine component has a trade-off relationship between optical properties, thermal properties and mechanical properties, it is necessary to develop a compound of a component suitable for each property, that is, a monomer for transparent PI, Accordingly, it is required to develop a transparent polyamic acid composition for a flexible display, which exhibits high transparency while exhibiting excellent heat resistance, low thermal expansion coefficient and excellent mechanical properties.

본 발명은 특정 화학구조와 치환기를 가진 모노머를 도입하면 광학적인 특성, 기계적 특성 및 열 특성이 기존에 비하여 개선되는 점을 착안하였다. The present invention has been made in view of the fact that introduction of a monomer having a specific chemical structure and a substituent improves optical characteristics, mechanical properties, and thermal properties compared with the conventional ones.

보다 구체적으로, 기존 폴리이미드 필름(Polyimide Film)은 이미드(Imide) 사슬 내에 존재하는 π 전자들의 Charge Transfer Complex(CTC) 형성으로 인해, 무색이 아닌 짙은 갈색을 띠게 된다. 본 발명에서는 상기 모노머의 특정 치환기로서 -F 혹은 -CF3 등의 강한 Electro Withdrawing group을 적용하므로, π Electron의 이동을 통해 상기 CT-Complex가 일어나지 않도록 함으로써 무색 투명한 PI Film을 제조할 수 있다. More specifically, a conventional polyimide film has a dark brown color rather than a color due to formation of a charge transfer complex (CTC) of π electrons present in an imide chain. In the present invention, specific substituents of the above-mentioned monomers include -F or -CF 3 Since a strong Electro Withdrawing group is applied, it is possible to manufacture a colorless transparent PI film by preventing the CT-Complex from occurring due to the movement of the π electron.

또한 본 발명에서는 우수한 기계적, 열적 특성을 가진 폴리이미드 수지를 얻기 위해서 강직한(Rigid)한 화학구조의 모노머를 도입하는 것이 효과적이라 판단하고, 특정 화학구조의 산이무수물 모노머 유도체를 디자인 및 합성하였으며, 이와 같이 합성된 신규 산이무수물 모노머의 함량을 특정 범위로 조절함으로써, 낮은 YI(Yellow Index), 높은 광투과도, 기계적, 열적 특성 등을 동시에 구현할 수 있는 투명 폴리아믹산 조성물 및 폴리이미드 필름을 제조하는 것을 목적으로 한다.Further, in the present invention, it has been considered effective to introduce a monomer having a rigid chemical structure in order to obtain a polyimide resin having excellent mechanical and thermal characteristics. An acid anhydride monomer derivative having a specific chemical structure has been designed and synthesized, A transparent polyamic acid composition and a polyimide film which can simultaneously realize low YI (Yellow Index), high light transmittance, mechanical and thermal characteristics, etc. can be obtained by controlling the content of the novel synthesized acid dianhydride monomer in a specific range The purpose.

아울러, 본 발명은 LCD 및 OLED의 플렉시블(Flexible) 디스플레이용 플라스틱(Plastic) 투명 기판, TFT 기판, 플렉서블 인쇄회로기판, 플렉서블(Flexible) OLED 면조명 기판, 전자 종이용 기판소재 등에 적용 가능한 투명 폴리아믹산 조성물 및 투명 폴리이미드 필름을 제공하는데 있다.In addition, the present invention relates to a transparent polyamic acid which can be applied to plastic transparent substrates for flexible displays of LCDs and OLEDs, TFT substrates, flexible printed circuit boards, flexible OLED surface illuminated substrates, And a transparent polyimide film.

상술한 목적을 달성하기 위해, 본 발명은 하기 화학식 1로 표시되는 화합물을 제공한다. In order to achieve the above object, the present invention provides a compound represented by the following formula (1).

Figure pat00001
Figure pat00001

상기 화학식 1에서, In Formula 1,

A는 단일결합이거나 또는 C6~C40의 아릴렌기이며, A is a single bond or a C 6 to C 40 arylene group,

X1 및 X2은 서로 동일하거나 상이하며, 각각 독립적으로 수소, 할로겐, C1~C6의 알킬기, 및 하나 이상의 수소가 할로겐 원자로 치환된 C1~C6의 알킬기로 이루어진 군에서 선택되며, X 1 and X 2 are the same or different and are each independently selected from the group consisting of hydrogen, halogen, C 1 -C 6 alkyl, and C 1 -C 6 alkyl substituted with at least one hydrogen,

다만, A가 단일결합인 경우 X1 및 X2 중 적어도 하나 이상은 할로겐 또는 할로겐 원자로 치환된 C1~C6의 알킬기이며, Provided that when A is a single bond, at least one of X 1 and X 2 is a C 1 -C 6 alkyl group substituted by a halogen or a halogen atom,

상기 C6~C40의 아릴렌기는 할로겐 또는 할로겐 원자로 치환된 C1~C6 알킬기로 치환될 수 있으며, m은 0 내지 3의 정수이다. The C 6 -C 40 arylene group may be substituted with a halogen or a C 1 -C 6 alkyl group substituted with a halogen atom, and m is an integer of 0 to 3.

본 발명에서, 상기 X1 및 X2는 각각 독립적으로 F, 또는 CF3인 전자흡인성기(EWG)인 것이 바람직하다. In the present invention, it is preferable that X 1 and X 2 are each independently F or an electron attractive group (EWG) which is CF 3 .

또한 본 발명은 (a) 디아민; (b) 전술한 화학식 1로 표시되는 화합물을 함유하는 산이무수물; 및 (c) 유기용매를 포함하며, 상기 화학식 1로 표시되는 화합물은 전체 산이무수물 100 몰%를 기준으로 10 내지 80 몰% 범위로 포함되는 폴리아믹산 조성물을 제공한다. The present invention also relates to a process for the preparation of (a) a diamine; (b) an acid dianhydride containing a compound represented by the above-mentioned formula (1); And (c) an organic solvent, wherein the compound represented by the formula (1) is contained in an amount of 10 to 80 mol% based on 100 mol% of the total acid dianhydride.

본 발명에서, 상기 산이무수물은 불소화 방향족 제1산이무수물, 지환족 제2산이무수물 및 비불소화 방향족 제3산이무수물로 구성된 군에서 선택되는 1종 이상을 포함할 수 있다. In the present invention, the acid dianhydride may include at least one selected from the group consisting of a fluorinated aromatic primary acid dianhydride, an alicyclic secondary acid dianhydride, and a non-fluorinated aromatic dianhydride.

본 발명에서, 상기 제1산이무수물, 제2산이무수물 및 제3 산이무수물로 구성된 군에서 선택되는 1종 이상의 화합물의 함량은 전체 산이무수물 100 몰%를 기준으로 20 내지 90 몰%일 수 있다. In the present invention, the content of the at least one compound selected from the group consisting of the first acid dianhydride, the second acid dianhydride and the third acid dianhydride may be 20 to 90 mol% based on 100 mol% of the total acid dianhydride.

본 발명에서, 상기 디아민은 불소화 제1디아민; 설폰계 제2디아민, 지환족 제3아민 및 에테르계 제4아민으로 구성된 군으로부터 선택되는 1종 이상을 포함할 수 있다. In the present invention, the diamine is a fluorinated primary diamine; A sulfone-based second diamine, an alicyclic tertiary amine, and an ether-based quaternary amine.

본 발명에서, 상기 불소화 제1디아민, 설폰계 제2디아민, 지환족 제3아민 및 에테르계 제4아민으로 구성된 군에서 선택되는 1종 이상의 디아민의 함량은 전체 디아민 100 몰%를 기준으로 10 내지 100 몰% 범위일 수 있다. In the present invention, the content of the at least one diamine selected from the group consisting of the first fluorinated diamines, the sulfonic second diamines, the alicyclic tertiary amines and the ether-based fourth amines is preferably from 10 to 100 mol% 100 mole%.

본 발명에서, 상기 디아민(a)과 상기 산이무수물(b)의 몰수의 비(a/b)는 0.7 내지 1.3 범위일 수 있다. In the present invention, the ratio (a / b) of the number of moles of the diamine (a) to the number of moles of the acid anhydride (b) may range from 0.7 to 1.3.

아울러, 본 발명은 전술한 폴리아믹산 조성물을 이미드화하여 제조된 투명 폴리이미드 필름을 제공한다. In addition, the present invention provides a transparent polyimide film prepared by imidizing the above-mentioned polyamic acid composition.

본 발명에서, 상기 투명이미드 필름은 하기 (i) 내지 (v)의 물성 조건을 만족하는 것일 수 있으며, 보다 구체적으로 (i)유리전이온도(Tg)가 300 내지 400℃ 범위이며, (ii) 막 두께 10~80㎛에서 파장 500nm의 광선 투과율이 90% 이상이며, (iii) ASTM E313 규격에 의한 황색도가 3.3 이하이며 (막 두께 50㎛ 기준), (iv) 인장강도가 125 내지 150 MPa이며, (v) 인장 탄성률이 3.5 내지 5.0 GPa 범위일 수 있다. In the present invention, the transparent imide film may satisfy the following physical conditions (i) to (v), and more specifically, (i) the glass transition temperature (T g ) (iii) a yellowness according to ASTM E313 of 3.3 or less (based on a film thickness of 50 占 퐉); (iv) a tensile strength of 125 to 100 占 퐉; 150 MPa, and (v) the tensile modulus may range from 3.5 to 5.0 GPa.

본 발명에서, 상기 투명이미드 필름은 플렉서블 디스플레이용 기판 및 보호막으로 사용될 수 있다. In the present invention, the transparent imide film can be used as a substrate and a protective film for a flexible display.

본 발명에서는 특정 구조와 치환기를 도입한 산이무수물 모노머를 채택하고 이들의 함량을 특정 범위로 조절함으로써, 우수한 광학특성, 기계적 특성, 열적 특성 등을 동시에 가지는 투명 폴리이미드용 조성물을 제공할 수 있다.In the present invention, it is possible to provide a transparent polyimide composition having excellent optical properties, mechanical properties, and thermal characteristics at the same time by adopting an acid anhydride monomer having a specific structure and a substituent introduced thereinto and adjusting the content thereof to a specific range.

또한 본 발명에서는 우수한 광학 특성, 기계적 특성, 열적 특성 등을 갖는 상기 투명 폴리이미드용 조성물을 기판으로 적용함으로써, 우수한 물성과 제품 신뢰성을 발휘하는 플렉시블 디스플레이용 투명 기판을 제공할 수 있다. In addition, the present invention can provide a transparent substrate for a flexible display that exhibits excellent physical properties and product reliability by applying the composition for transparent polyimide having excellent optical characteristics, mechanical properties, and thermal properties as a substrate.

이하, 본 발명을 상세히 설명한다. 다만, 이는 예시로써 제시되는 것으로, 이에 의해 본 발명이 제한되지는 않으며 본 발명은 후술할 청구항의 범주에 의해 정의될 뿐이다. Hereinafter, the present invention will be described in detail. However, it should be understood that the present invention is not limited thereto, and the present invention is only defined by the scope of the following claims.

<신규 산이무수물 화합물> <Novel acid dianhydride compound>

본 발명은 하기 화학식 1로 표시되는 화합물, 바람직하게는 산이무수물 (dianhydride) 화합물을 제공한다. The present invention provides a compound represented by the following formula (1), preferably a dianhydride compound.

[화학식 1] [Chemical Formula 1]

Figure pat00002
Figure pat00002

상기 화학식 1에서, In Formula 1,

A는 단일결합이거나 또는 C6~C40의 아릴렌기이며, A is a single bond or a C 6 to C 40 arylene group,

X1 및 X2은 서로 동일하거나 상이하며, 각각 독립적으로 수소, 할로겐, C1~C6의 알킬기, 및 하나 이상의 수소가 할로겐 원자로 치환된 C1~C6의 알킬기로 이루어진 군에서 선택되며, X 1 and X 2 are the same or different and are each independently selected from the group consisting of hydrogen, halogen, C 1 -C 6 alkyl, and C 1 -C 6 alkyl substituted with at least one hydrogen,

다만, A가 단일결합인 경우 X1 및 X2 중 적어도 하나 이상은 할로겐 또는 할로겐 원자로 치환된 C1~C6의 알킬기이며, Provided that when A is a single bond, at least one of X 1 and X 2 is a C 1 -C 6 alkyl group substituted by a halogen or a halogen atom,

상기 C6~C40의 아릴렌기는 할로겐 또는 할로겐 원자로 치환된 C1~C6 알킬기로 치환될 수 있으며, m은 0 내지 3의 정수이다. The C 6 -C 40 arylene group may be substituted with a halogen or a C 1 -C 6 alkyl group substituted with a halogen atom, and m is an integer of 0 to 3.

본 발명에서, 상기 화학식 1로 표시되는 화합물은 기존 BPDA (3,3′,4,4′-비페닐테트라카르복실릭 디안하이드라이드)의 구조와 유사하나, 화합물 내 디안하이드라이드 사이에 2가의 아릴렌기 링커(divalent arylene linker)가 도입됨에 따라 보다 강직한(Rigid) 구조를 갖는다. 따라서 열이나 빛에 의해 분해되지 않고 외부 충격에 대해 보다 안정적이므로, 이를 포함하는 폴리아믹산 조성물의 광학 특성, 열적 특성 및 기계적 특성(Modulus, Strength) 등을 유의적으로 개선할 수 있다. In the present invention, the compound represented by the formula (1) is similar to the structure of the existing BPDA (3,3 ', 4,4'-biphenyltetracarboxylic dianhydride), but the divalent And has a rigid structure due to the introduction of a divalent arylene linker. Therefore, since it is not decomposed by heat or light and is more stable against external impact, it is possible to significantly improve the optical characteristics, thermal properties, and mechanical properties (modulus, strength) of the polyamic acid composition containing the same.

또한 본 발명에서는 전술한 화학식 1에 불소(F)나 CF3 등의 전자흡인성기(EWG)를 적어도 하나 이상 도입함에 따라, 이미드(Imide) 사슬 내에 존재하는 π 전자들간의 이동을 통해 CT-Complex가 일어나지 않도록 하여 전술한 광학 특성, 열적 특성을 보다 상승시킬 수 있다.In the present invention, at least one electron-withdrawing group (EWG) such as fluorine (F) or CF 3 is introduced into the above-described formula (1) It is possible to increase the above-described optical characteristics and thermal characteristics by preventing the occurrence of complex.

본 발명의 바람직한 일례에 따르면, 상기 X1 및 X2는 당 업계에 알려진 통상적인 전자흡인성기(electron withdrawing group, EWG) 일 수 있으며, 각각 독립적으로 불소(F) 또는 CF3 인 것이 바람직하다. According to a preferred embodiment of the present invention, X 1 and X 2 may be a conventional electron withdrawing group (EWG), which is known in the art, and is preferably independently fluorine (F) or CF 3 .

또한 상기 A는 당 분야에 알려진 통상적인 C6~C40의 아릴렌기일 수 있으며, 이의 구체적인 예로는 페닐렌, 비페닐렌, 트리페닐렌일 등이 있다. 특히, 상기 A는 하기 화학식으로 표시되는 치환체 군에서 선택되는 것이 바람직하다. Further, A may be a conventional C 6 to C 40 arylene group known in the art, and specific examples thereof include phenylene, biphenylene, triphenylene, and the like. Particularly, it is preferable that A is selected from the group of substituents represented by the following formulas.

Figure pat00003
,
Figure pat00004
,
Figure pat00005
,
Figure pat00006
,
Figure pat00007
,
Figure pat00008
,
Figure pat00009
Figure pat00003
,
Figure pat00004
,
Figure pat00005
,
Figure pat00006
,
Figure pat00007
,
Figure pat00008
,
Figure pat00009

상기 치환체에서, R1 내지 R3는 서로 동일하거나 또는 상이하며, 각각 독립적으로 수소, F, 및 CF3로 이루어진 군에서 선택된다. 바람직하게는 R1 내지 R3가 각각 독립적으로 F 또는 CF3 이다. In these substituents, R 1 to R 3 are the same as or different from each other, and each independently selected from the group consisting of hydrogen, F, and CF 3 . Preferably, R 1 to R 3 are each independently F or CF 3 .

본 발명에 따른 화학식 1로 표시되는 화합물은, 하기 compound 1 내지 compound 30으로 구성된 화합물 군으로 보다 구체화될 수 있으나, 이에 특별히 한정되는 것은 아니다. The compound represented by the formula (1) according to the present invention may be further compounded as a compound group composed of the following compounds 1 to 30, but is not particularly limited thereto.

Figure pat00010
Figure pat00010

Figure pat00011
Figure pat00011

Figure pat00012
Figure pat00012

<투명 폴리아믹산 조성물>&Lt; Transparent polyamic acid composition >

본 발명의 투명 폴리아믹산 조성물은 투명 폴리이미드 필름을 제조하기 위한 것으로, 상기 화학식 1로 표시되는 화합물을 산이무수물(dianhydride) 성분으로 포함하는 것을 특징으로 한다. The transparent polyamic acid composition of the present invention for producing a transparent polyimide film is characterized in that the compound represented by the formula (1) is contained as a dianhydride component.

보다 구체적으로, 상기 폴리아믹산 조성물은 (a) 디아민; (b) 상기 화학식 1의 화합물을 함유하는 산이무수물; 및 (c) 유기용매를 포함한다. More specifically, the polyamic acid composition comprises (a) a diamine; (b) an acid dianhydride containing the compound of Formula 1; And (c) an organic solvent.

본 발명의 투명 폴리아믹산 제조에 사용되는 디아민 단량체(a)는 당 분야에 알려진 통상적인 디아민(diamine)을 사용할 수 있으며, 일례로 디아민 구조를 가지고 있는 방향족, 지환족, 또는 지방족 화합물을 제한 없이 사용할 수 있다. The diamine monomer (a) used in the production of the transparent polyamic acid of the present invention may be a conventional diamine known in the art. For example, an aromatic, alicyclic or aliphatic compound having a diamine structure may be used without limitation .

본 발명에서 사용할 수 있는 디아민은 높은 투과도(High Transmittance), 낮은 Y.I, 낮은 헤이즈(Haze) 등의 광학 특성, 높은 유리전이온도(High Tg), 낮은 열팽창계수(Low CTE) 등의 열 특성, 높은 모듈러스(High Modulus), 높은 표면 경도(High Surface Hardness) 등의 기계적 특성 등을 고려할 때, 불소화 치환기를 가진 직선형 구조 또는 설폰(Sulfone)계, 에테르(Ether)계 등을 포함하는 구조들의 적절한 조합이 필요하다. 이에 따라, 불소 치환기가 도입된 불소화 방향족 제1디아민, 설폰계 제2디아민, 지환족 제3아민, 에테르계 제4아민을 각각 단독으로 사용하거나 또는 이들이 1종 이상 혼합된 형태를 사용할 수 있다. The diamine which can be used in the present invention has a high thermal characteristic such as high transmittance, low YI, low haze, high glass transition temperature (Tg), low thermal expansion coefficient (Low CTE) Considering the mechanical properties such as high modulus and high surface hardness, a proper combination of structures including a linear structure having a fluorinated substituent, a sulfone system, an ether system, need. Accordingly, a fluorinated aromatic first diamine, a sulfonic second diamine, an alicyclic tertiary amine, and an ether-based quaternary amine into which a fluorine substituent has been introduced may be used alone, or a mixture of at least one thereof may be used.

사용 가능한 디아민 단량체(a)의 비제한적인 예로는, 옥시디아닐린(ODA), 2,2'-비스(트리플루오로메틸)-4,4'-디아미노비페닐(2,2'-TFDB), 2,2'-비스(트리플루오로 메틸)-4,3'- 디아미노비페닐 (2,2'-Bis(trifluoromethyl) -4,3'-Diaminobiphenyl), 2,2'-비스 (트리플루오로 메틸)-5,5'-디아미노비페닐 (2,2'-Bis(trifluoromethyl) -5,5'-Diaminobiphenyl), 2,2'-비스(트리플루오로메틸)-4,4'-다이아미노페닐에테르(2,2'-Bis(trifluoromethyl)-4,4'-diaminodiphenyl ether, 6-FODA), 비스 아미노하이드록시 페닐 헥사플르오로프로판(DBOH), 비스 아미노 페녹시 페닐 헥사플루오로프로판(4BDAF), 비스 아미노 페녹시 페닐프로판(6HMDA), 비스 아미노페녹시 디페닐술폰(DBSDA), 비스(4-아미노페닐)설폰(4,4'-DDS), 비스(3-아미노페닐)설폰(3,3'-DDS), 술포닐디프탈릭안하이드라이드(SO2DPA), 비스(카르복시페닐) 디메틸실란, 또는 이들의 1종 또는 2종 이상이 혼합된 형태 등이 적용 가능하다. Non-limiting examples of usable diamine monomers (a) include oxydianiline (ODA), 2,2'-bis (trifluoromethyl) -4,4'- diaminobiphenyl (2,2'-TFDB ), 2,2'-bis (trifluoromethyl) -4,3'-diaminobiphenyl, 2,2'-bis (trifluoromethyl) Bis (trifluoromethyl) -5,5'-diaminobiphenyl), 2,2'-bis (trifluoromethyl) -4,4 '-Diaminodiphenyl ether, 6-FODA), bisaminohydroxyphenylhexafluoropropane (DBOH), bisaminophenoxyphenylhexafluoro (2,2'-bis (trifluoromethyl) (4BDAF), bisaminophenoxyphenylpropane (6HMDA), bisaminophenoxy diphenylsulfone (DBSDA), bis (4-aminophenyl) sulfone (4,4'-DDS), bis ) sulfone (3,3'-DDS), sulfonyl deep Talic anhydride (SO 2 DPA), bis (dicarboxyphenyl) dimethylsilane, or one kind of these addition This mixture of two or more of the like is applicable.

고투명성, 높은 유리전이온도, 및 낮은 황색도를 고려할 때, 상기 불소화 제1디아민은 직선형의 고분자화를 유도할 수 있는 2,2'-비스(트리플루오로 메틸)-4,4'-디아미노비페닐 (2,2'-TFDB)를 사용하는 것이 바람직하다. 또한 상기 설폰계 제2디아민은 비스(4-아미노페닐)설폰(4,4'-DDS)를 사용하는 것이 바람직하다. 또한 상기 에테르계 제4아민은 2,2'-비스(트리플루오로메틸)-4,4'-다이아미노페닐에테르(6-FODA)를 사용하는 것이 바람직하다. Considering the high transparency, high glass transition temperature, and low yellowing, the first fluorinated diamine is a 2,2'-bis (trifluoromethyl) -4,4'-dia Minobiphenyl (2,2'-TFDB) is preferably used. Further, it is preferable to use bis (4-aminophenyl) sulfone (4,4'-DDS) as the second sulfonic diamine. The ether-based quaternary amine is preferably 2,2'-bis (trifluoromethyl) -4,4'-diaminophenyl ether (6-FODA).

본 발명의 디아민 단량체(a)에서, 상기 불소화 제1디아민, 설폰계 제2디아민, 지환족 제3다아민, 에테르계 제4아민 등의 함량은 특별히 한정되지 않으나, 각각 전체 디아민 100 몰%를 기준으로 10 내지 100 몰%일 수 있으며, 바람직하게는 10 내지 90 몰%, 더욱 바람직하게는 20 내지 80 몰% 범위일 수 있다. In the diamine monomer (a) of the present invention, the content of the fluorinated first diamine, the sulfonic second diamine, the alicyclic tertiary amine, the ether tertiary amine and the like is not particularly limited, May be 10 to 100 mol%, preferably 10 to 90 mol%, and more preferably 20 to 80 mol%, based on the total amount of the catalyst.

본 발명의 투명 폴리아믹산 제조에 사용되는 산이무수물(b) 단량체는 상기 화학식 1로 표시되는 화합물을 포함하되, 여기에 당 분야에 알려진 통상적인 불소화, 비불소화, 지환족 등의 산이무수물 등을 제한 없이 혼용(混用)할 수 있다. 일례로, 불소화 제1산이무수물, 지환족 제2산이무수물, 비불소화 제3산이무수물을 각각 사용하거나 또는 이들이 1종 이상 혼합된 혼합물 등이 있다. The acid dianhydride (b) monomer used in the production of the transparent polyamic acid of the present invention includes the compound represented by the above formula (1), and the acid such as the usual fluorinated, nonfluorinated, and alicyclic groups known in the art is limited to anhydride Can be mixed together. For example, a fluorinated primary acid dianhydride, an alicyclic secondary dianhydride, a non-fluorinated dianhydride, or a mixture of at least one of these may be used.

본 발명에서, 상기 화학식 1로 표시되는 산이무수물 모노머의 사용량은 특별히 제한되지 않으며, 일례로 전체 산이무수물 100 몰%를 기준으로 하여 10 내지 80 몰% 범위일 수 있으며, 바람직하게는 20 내지 70 몰% 범위일 수 있다. In the present invention, the amount of the acid dianhydride monomer represented by the formula (1) is not particularly limited, and may be, for example, 10 to 80 mol%, preferably 20 to 70 mol% based on 100 mol% % &Lt; / RTI &gt;

본 발명에서, 상기 불소화 제1산이무수물 단량체는 불소 치환기가 도입된 방향족 산이무수물이라면, 특별히 한정하지 않는다. In the present invention, the first fluorinated acid dianhydride monomer is not particularly limited as long as the aromatic acid into which the fluorine substituent is introduced is an anhydride.

사용 가능한 불소화 제1디안하드라이드의 일례를 들면, 2,2-비스(3,4-디카르복시페닐)헥사플루오로프로판 디안하이드라이드 (2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydrid, 6-FDA), 4-(트리플루오로메틸)피로멜리틱 디안하이드라이드 (4-(trifluoromethyl)pyromellitic dianhydride, 4-TFPMDA) 등이 있다. 이들을 단독으로 사용하거나 또는 2종 이상 혼합하여 사용될 수 있다. 불소화 산이무수물 중 6-FDA는 분자 사슬 간 및 분자 사슬 내 전하이동착물 (CTC: Change transfer complex)의 형성을 제한하는 특성이 매우 커서 투명화하는데 매우 적절한 화합물이다. Examples of usable fluorinated primary dianhydrides include 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydride, 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydride, 6-FDA), 4- (trifluoromethyl) pyromellitic dianhydride (4-TFPMDA), and the like. These may be used alone or in combination of two or more. Among the fluorinated acid dianhydrides, 6-FDA is a very suitable compound for transparency because the property of limiting the formation of molecular transfer chain and intra-molecular charge transfer complex (CTC) is very large.

또한, 본 발명에서 사용할 수 있는 지환족(alicyclic) 제2산이무수물은 화합물 내 방향족고리가 아닌 지환족 고리를 가지면서 산이무수물 구조를 갖는 화합물이라면 특별히 제한되지 않는다. The alicyclic secondary acid dianhydride which can be used in the present invention is not particularly limited as far as it is a compound having an alicyclic ring other than an aromatic ring in the compound and having an acid anhydride structure.

본 발명에서 사용 가능한 지환족 제2디안하이드라이의 일례를 들면, 사이클로부탄 테트라카르복실릭 디안하이드라이드(CBDA), 1,2,3,4-사이클로펜탄 테트라카르복실릭 디안하이드라이드(CPDA), 비사이클로[2,2,2]-7-옥텐-2,3,5,6-테트라카르복실산 디안하이드라이드(BCDA), 또는 이들의 1종 이상의 혼합물 등이 있으나, 이에 특별히 제한되지 않는다. Examples of the alicyclic secondary dianhydride usable in the present invention include cyclic butane tetracarboxylic dianhydride (CBDA), 1,2,3,4-cyclopentane tetracarboxylic dianhydride (CPDA) , Bicyclo [2,2,2] -7-octene-2,3,5,6-tetracarboxylic acid dianhydride (BCDA), or a mixture of at least one of the foregoing. .

상기 비불소화 제3산이무수물 단량체는 불소 치환기가 도입되지 않은 비(非)불소화 방향족 산이무수물이라면, 특별히 한정하지 않는다. The non-fluorinated acid dianhydride monomer is not particularly limited as long as the non-fluorinated aromatic acid to which no fluorine substituent is introduced is an anhydride.

사용 가능한 비불소화 제3산이무수물 단량체의 비제한적인 예로는 피로멜리틱 디안하이드라이드 (Pyromellitic Dianhydride, PMDA), 3,3′,4,4′-비페닐테트라카르복실릭 디안하이드라이드 (3,3′,4,4′-Biphenyl tetracarboxylic acid dianhydride, BPDA) 등이 있다. 이들을 단독으로 사용하거나, 또는 2종 이상 혼용할 수 있다.Non-limiting examples of usable nonfluorinated tertiary acid dianhydride monomers include pyromellitic dianhydride (PMDA), 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (3, 3 ', 4,4'-Biphenyl tetracarboxylic acid dianhydride, BPDA). These may be used alone, or two or more of them may be used in combination.

본 발명에서, 상기 제1산이무수물, 제2산이무수물 및 제3 산이무수물로 구성된 군에서 선택되는 1종 이상의 화합물의 함량은 특별히 한정되지 않는다. 일례로, 이들은 각각 전체 산이무수물 100 몰%를 기준으로 20 내지 90 몰%일 수 있으며, 바람직하게는 30 내지 80 몰% 범위로 사용될 수 있다. In the present invention, the content of at least one compound selected from the group consisting of the first acid dianhydride, the second acid dianhydride and the third acid dianhydride is not particularly limited. For example, they may each be from 20 to 90 mol%, preferably from 30 to 80 mol%, based on 100 mol% of the total acid anhydride.

본 발명의 투명 폴리아믹산 조성물에 있어서, 상기 디아민 성분(a)의 몰수와 상기 디안하이드라이드 성분(b)의 몰수의 비(a/b)는 0.7~1.3 일 수 있으며, 바람직하게는 0.8 내지 1.2이며, 더욱 바람직하게는 0.9 내지 1.1 범위일 수 있다.In the transparent polyamic acid composition of the present invention, the ratio (a / b) of the number of moles of the diamine component (a) to the number of moles of the dianhydride component (b) may be 0.7 to 1.3, preferably 0.8 to 1.2 , And more preferably in the range of 0.9 to 1.1.

본 발명의 폴리아믹산 조성물에 포함되어 전술한 단량체들의 용액 중합반응을 위한 용매 (c)는 당 분야에 공지된 유기용매를 제한 없이 사용할 수 있다. The solvent (c) contained in the polyamic acid composition of the present invention for solution polymerization of the monomers described above can be used without limitation in the organic solvent known in the art.

사용 가능한 용매의 일례를 들면, m-크레졸, N-메틸-2-피롤리돈(NMP), 디메틸포름아미드(DMF), 디메틸아세트아미드(DMAc), 디메틸설폭사이드(DMSO), 아세톤, 디에틸아세테이트, 및 디메틸 프탈레이트(DMP) 중에서 선택된 하나 이상의 극성용매를 사용할 수 있다. 이외에도, 테트라하이드로퓨란(THF), 클로로포름과 같은 저비점 용액 또는 γ-부티로락톤과 같은 저흡수성 용매를 사용할 수 있다. Examples of usable solvents include m-cresol, N-methyl-2-pyrrolidone (NMP), dimethylformamide (DMF), dimethylacetamide (DMAc), dimethylsulfoxide (DMSO) Acetate, and dimethyl phthalate (DMP) may be used. In addition, a low-boiling solution such as tetrahydrofuran (THF), chloroform or a low-absorbent solvent such as? -Butyrolactone can be used.

상기 용매의 함량에 대해서 특별히 한정되어 있지는 않으나, 적절한 폴리아믹산 용액의 분자량과 점도를 얻기 위하여 중합용 용매(제1 용매)의 함량은 전체 폴리아믹산 조성물 중량을 기준으로 하여 50 ~ 95 중량% 범위일 수 있으며, 바람직하게는 70 ~ 90 중량% 범위, 더욱 바람직하게는 75 ~85 중량% 범위이다.Although the content of the solvent is not particularly limited, the content of the solvent for the polymerization (first solvent) may be in the range of 50 to 95% by weight based on the total weight of the polyamic acid composition to obtain the molecular weight and the viscosity of the appropriate polyamic acid solution , Preferably in the range of 70 to 90 wt%, more preferably in the range of 75 to 85 wt%.

본 발명의 폴리아믹산 조성물은, 전술한 산이무수물과 디아민을 유기용매에 투입한 후 반응시켜 제조될 수 있다. 일례로, 디아민, 화학식 1의 산이무수물 및 상기 제1 내지 제3산이무수물 중 적어도 하나의 성분을 포함하되, 유리전이온도 및 황색도 개선을 위해 디아민(a)과 산이무수물(b)을 대략 1:1의 당량비로 하여 투명 폴리아믹산 조성물을 형성할 수 있다.The polyamic acid composition of the present invention can be prepared by reacting the aforementioned acid dianhydride and diamine in an organic solvent and then reacting. For example, the diamine (a) and the acid dianhydride (b) may be added in an amount of from about 1 to about 1 to improve the glass transition temperature and yellowing degree, : 1, the transparent polyamic acid composition can be formed.

상기 폴리아믹산 조성물의 조성은 특별히 제한되지 않으며, 일례로 폴리아믹산 조성물 전체 중량 100 중량%을 기준으로, 산이무수물 2.5 내지 25.0 중량%, 디아민 2.5 내지 25.0 중량%, 및 조성물 100 중량%를 만족시키는 잔량의 유기용매를 포함하여 구성될 수 있다. 한편 본 발명에 따른 폴리아믹산 조성에서, 고형분 100 중량%을 기준으로 할 때, 산이무수물 30 내지 70 중량%, 디아민 30 내지 70 중량% 범위일 수 있으나, 이에 특별히 제한되지 않는다. The composition of the polyamic acid composition is not particularly limited. For example, the composition of the polyamic acid composition may include, for example, 2.5 to 25.0% by weight of anhydride, 2.5 to 25.0% by weight of diamine, and 100% Of an organic solvent. In the polyamic acid composition according to the present invention, the acid anhydride may be in the range of 30 to 70% by weight and the diamine may be in the range of 30 to 70% by weight based on 100% by weight of the solid content, but is not particularly limited thereto.

이러한 본 발명의 투명 폴리아믹산 조성물은 약 1,000 내지 50,000 cps, 바람직하게는 약 3,000 내지 15,000 cps 범위의 점도를 가질 수 있다. 폴리아믹산 용액의 점도가 전술한 범위에 해당되는 경우, 폴리아믹산 용액 코팅 시 두께 조절이 용이하며, 코팅 표면이 균일하게 발휘될 수 있다. Such a transparent polyamic acid composition of the present invention may have a viscosity ranging from about 1,000 to 50,000 cps, preferably from about 3,000 to 15,000 cps. When the viscosity of the polyamic acid solution falls within the above-mentioned range, it is easy to control the thickness of the polyamic acid solution coating, and the coating surface can be uniformly exerted.

또한, 본 발명의 폴리아믹산 용액은 필요에 따라 본 발명의 목적과 효과를 현저히 손상시키지 않는 범위 내에서 가소제, 산화방지제, 난연화제, 분산제, 점도 조절제, 레벨링제 등의 첨가제를 소량 포함할 수 있다.The polyamic acid solution of the present invention may contain a small amount of additives such as a plasticizer, an antioxidant, a flame retardant, a dispersant, a viscosity modifier, and a leveling agent within a range that does not significantly impair the objects and effects of the present invention .

<폴리이미드 필름><Polyimide Film>

본 발명은 상기에서 설명한 폴리아믹산 용액을 고온에서 이미드화 및 열처리하여 제조된 폴리이미드 필름을 제공한다.The present invention provides a polyimide film produced by imidizing and heat-treating the polyamic acid solution described above at a high temperature.

상기 폴리이미드 수지는 이미드(imide) 고리를 함유하는 고분자 물질로서, 내열성, 내화학성, 내마모성 및 전기적 특성이 우수하다. 이때 상기 폴리이미드 수지는 랜덤 공중합체(random copolymer)나 블록 공중합체(block copolymer) 형태일 수 있다. The polyimide resin is a polymer material containing an imide ring and is excellent in heat resistance, chemical resistance, abrasion resistance and electrical properties. The polyimide resin may be in the form of a random copolymer or a block copolymer.

한편 폴리이미드 수지 필름이 플렉서블 디스플레이 등에 적용하기 위해서는 기본적으로 고투명성, 낮은 열팽창계수, 높은 유리전이온도 등의 특징을 가져야 한다. 보다 구체적으로, 막 두께 10㎛에서 400nm의 광투과율이 75% 이상이고, 550nm의 광투과율이 90% 이상이며, 550nm의 황색도 값이 3 이하, 유리전이온도(Tg)가 300℃ 이상 등이 요구된다. On the other hand, polyimide resin films should have characteristics such as high transparency, low thermal expansion coefficient and high glass transition temperature in order to be applied to flexible displays and the like. More specifically, it has a light transmittance of 75% or more at a film thickness of 10 mu m to 400 nm, a light transmittance at 550 nm of 90% or more, a yellowness value at 550 nm of 3 or less, a glass transition temperature (Tg) Is required.

실제로, 전술한 폴리아믹산 조성물을 이미드화하여 제조된 본 발명의 폴리이미드 필름은 반복 단위 내에 강직한(Rigid) 화학구조를 가짐에 따라 고투명성을 나타내면서도 낮은 황색도, 열팽창계수, 높은 유리전이온도(Tg), 높은 인장강도 및 탄성율을 가진다. 보다 구체적으로, 상기 폴리이미드 필름은 하기 (i) 내지 (v)의 물성 조건, 예컨대 (i)유리전이온도(Tg)가 300 내지 400℃ 범위이며, (ii) 막 두께 10~80㎛에서 파장 500nm의 광선 투과율이 90% 이상이며, (iii) ASTM E313 규격에 의한 황색도가 3.3 이하이며, (iv) 인장강도가 125 내지 150 MPa이며, (v) 인장 탄성률이 3.5 내지 5.0 GPa 범위를 모두 만족시킬 수 있다. In fact, the polyimide film prepared by imidizing the polyamic acid composition described above has a rigid chemical structure in the repeating unit, so that the polyimide film exhibits high transparency while exhibiting low yellowing degree, thermal expansion coefficient, high glass transition temperature (Tg), high tensile strength and elastic modulus. More specifically, the polyimide film has the following properties (i) to (T g ) in the range of 300 to 400 ° C, (ii) a film thickness of 10 to 80 μm (Iv) the tensile strength is 125 to 150 MPa, and (v) the tensile elastic modulus is in the range of 3.5 GPa to 5.0 GPa, and the light transmittance at a wavelength of 500 nm is at least 90%; (iii) the yellowness according to the ASTM E313 standard is 3.3 or less; All can be satisfied.

본 발명에 따른 폴리이미드 필름은 당 분야에 알려진 통상적인 방법에 따라 투명 폴리아믹산 용액을 발열 용액중합반응하여 제조될 수 있다. 일례로 상기 투명 폴리아믹산 조성물을 유리기판에 코팅(캐스팅)한 후 30~350℃의 범위에서 온도를 서서히 승온시키면서 0.5 ~ 8시간 동안 이미드 폐환반응 (Imidazation)을 유도시켜 제조될 수 있다. 이때 아르곤이나 질소 등의 불활성 분위기 하에서 반응하는 것이 바람직하다. The polyimide film according to the present invention can be produced by subjecting a transparent polyamic acid solution to an exothermic solution polymerization according to a conventional method known in the art. For example, the transparent polyamic acid composition may be coated (cast) on a glass substrate, and then the imidization may be induced for 0.5 to 8 hours while gradually raising the temperature in the range of 30 to 350 ° C. At this time, the reaction is preferably carried out in an inert atmosphere such as argon or nitrogen.

이때, 상기 코팅방법은 당 업계에 알려진 통상적인 방법을 제한 없이 사용할 수 있으며, 일례로 스핀코팅(Spin coating), 딥 코팅(Dip coating), 용매 캐스팅(Solvent casting), 슬롯다이 코팅(Slot die coating) 및 스프레이 코팅으로 이루어진 군에서 선택되는 적어도 어느 하나의 방법에 의해 이루어질 수 있다. 상기 무색투명한 폴리이미드 층의 두께는 수 백 nm에서 수십 ㎛가 되도록 투명 폴리아믹산 조성물을 1회 이상 코팅할 수 있다. In this case, the coating method may be any conventional method known in the art. For example, spin coating, dip coating, solvent casting, slot die coating ), And spray coating. &Lt; IMAGE &gt; The transparent polyamic acid composition may be coated one or more times so that the thickness of the colorless transparent polyimide layer becomes from several hundred nm to several tens of micrometers.

이와 같이 형성된 폴리이미드 필름의 두께는 특별히 제한되지 않으며, 적용되는 분야에 따라 적절히 조절될 수 있다. 일례로 10 내지 150㎛ 범위일 수 있으며, 바람직하게는 10 내지 80㎛ 범위일 수 있다.The thickness of the polyimide film thus formed is not particularly limited and can be appropriately adjusted according to the application to which it is applied. For example, in the range of 10 to 150 mu m, and preferably in the range of 10 to 80 mu m.

본 발명에서, 상기와 같이 제작된 투명 폴리이미드 필름은 다양한 분야에 사용될 수 있으며, 특히 고투명성 및 내열성이 요구되는 유기 EL 소자(OLED)용 디스플레이, 액정 소자용 디스플레이, TFT 기판, 플렉서블 인쇄회로기판, 플렉서블(Flexible) OLED 면조명 기판, 전자 종이용 기판소재와 같은 플렉서블(Flexible) 디스플레이용 기판 및 보호막으로 활용될 수 있다. In the present invention, the transparent polyimide film prepared as described above can be used in various fields, and particularly, a display for an organic EL device (OLED), a display for a liquid crystal device, a TFT substrate, a flexible printed circuit board , A flexible OLED surface light-emitting substrate, and a flexible substrate for a flexible display substrate such as a substrate material for electron bombardment.

이하, 구체적인 실시예를 통해 본 발명을 보다 구체적으로 설명한다. 하기 실시예는 본 발명의 이해를 돕기 위한 예시에 불과하며, 본 발명의 범위가 이에 한정되는 것은 아니다. Hereinafter, the present invention will be described more specifically by way of specific examples. The following examples are provided to aid understanding of the present invention, and the scope of the present invention is not limited thereto.

[화학식 1의 산이무수물 모노머 합성][Synthesis of acid dianhydride monomer of formula (1)

[합성예 1] Compound 1의 합성[Synthesis Example 1] Synthesis of Compound 1

Figure pat00013
Figure pat00013

1-1. 중간체 2의 합성1-1. Synthesis of intermediate 2

1-bromo-3,4-dimethyl-2-(trifluoromethyl)benzene (25.3g, 100mmol), 2-(3,4-dimethyl-2-(trifluoromethyl)phenyl)-4,4,5,5-tetramethyl-1,3,2-dioxaborolane (33g, 110mmol), Pd(PPh3)4 (6.7g, 5 mol%)을 플라스크에 넣었다. Toluene 200 ㎖와 THF 100 ㎖를 넣고 K2CO3 (41.5g, 300mmol)을 증류수 100 ㎖에 녹인 수용액을 첨가한 후 12시간 동안 가열 교반하였다. (25.3 g, 100 mmol), 2- (3,4-dimethyl-2- (trifluoromethyl) phenyl) -4,4,5,5-tetramethyl- 1,3,2-dioxaborolane was added to (33g, 110mmol), Pd ( PPh 3) 4 (6.7g, 5 mol%) to the flask. 200 ml of toluene and 100 ml of THF were added, and an aqueous solution in which K 2 CO 3 (41.5 g, 300 mmol) was dissolved in distilled water (100 ml) was added, followed by heating and stirring for 12 hours.

TLC로 반응이 종결된 것을 확인한 후 반응액을 여과하고 에틸아세테이트 100 ㎖로 2회 추출하였다. 회전 증발기(rotary evaporator)로 용매를 제거한 다음 MeOH을 이용하여 결정화하여 화합물b (32.88g, 수율 95%)를 얻었다.After confirming that the reaction was completed by TLC, the reaction solution was filtered and extracted twice with 100 ml of ethyl acetate. The solvent was removed using a rotary evaporator and crystallization was performed using MeOH to obtain compound b (32.88 g, yield 95%).

Elemental Analysis: C, 62.43; H, 4.66; F, 32.92Elemental Analysis: C, 62.43; H, 4.66; F, 32.92

HRMS [M]+:346HRMS [M] &lt; + & gt ; : 346

1-2. 중간체 3의 합성1-2. Synthesis of intermediate 3

3,4,4',5'-tetramethyl-2,2'-bis(trifluoromethyl)biphenyl (32.88g, 95mmol)을 플라스크에 넣었다. Tert-Butanol 200 ㎖와 H2O 200 ㎖를 넣고 70℃가열 교반하였다. KMnO4 (150.1g, 950mmol)을 조금씩 첨가하고 78℃에서 3시간동안 가열 교반하였다.3,4,4 ', 5'-tetramethyl-2,2'-bis (trifluoromethyl) biphenyl (32.88 g, 95 mmol) was placed in a flask. 200 ml of Tert-Butanol and 200 ml of H 2 O were added and the mixture was heated and stirred at 70 ° C. KMnO 4 (150.1 g, 950 mmol) was added little by little and the mixture was heated and stirred at 78 ° C for 3 hours.

TLC로 반응이 종결된 것을 확인한 후 반응액을 여과하고 Na2S2O3 1 mol 용액 300ml를 조금씩 첨가하였다. 상온에서 반응액을 여과하여 무기물을 제거한 후 회전 증발기(rotary evaporator)로 Tert-Butanol과 H2O를 1/5의 부피로 줄였다. HCl을 조금식 첨가하여pH 1로 산도를 조정하면 White Suspension의 상태가 되고 이를 5℃에서 여과, 세척 및 건조하여 중간체3 (26.56g, 수율 62%)를 얻었다.After confirming that the reaction was completed by TLC, the reaction solution was filtered, and 300 ml of a 1 molar solution of Na 2 S 2 O 3 was added little by little. The reaction solution was filtered at room temperature to remove the inorganic substances, and the volume of Tert-Butanol and H 2 O was reduced to 1/5 by a rotary evaporator. The acidity was adjusted to pH 1 by adding HCl a little, resulting in a white suspension, which was filtered, washed and dried at 5 ° C to give intermediate 3 (26.56 g, 62% yield).

Elemental Analysis: C, 46.37; H, 1.73; F, 24.45; O, 27.45Elemental Analysis: C, 46.37; H, 1.73; F, 24.45; O, 27.45

HRMS [M]+:466HRMS [M] &lt; + & gt ; : 466

1-3. Compound 1의 합성1-3. Synthesis of Compound 1

중간체 3, 26.56g(58.9mmol), 무수 초산 36.05g(354mmol) 및 톨루엔 150 g를 130℃에 가열교반하였다. 30 분뒤 실온으로 식힌 후, 빙냉해 석출한 백색 결정을 취하여 톨루엔으로 세정한 후 감압 건조하여 백색 결정 22.8g(수율90%)를 얻었다.26.56 g (58.9 mmol) of Intermediate 3, 36.05 g (354 mmol) of anhydrous acetic acid and 150 g of toluene were heated and stirred at 130 占 폚. After cooling to room temperature for 30 minutes, the white crystals precipitated by cooling on ice were washed with toluene and dried under reduced pressure to obtain 22.8 g (yield 90%) of white crystals.

Elemental Analysis: C, 50.25; H, 0.94; F, 26.50; O, 22.31Elemental Analysis: C, 50.25; H, 0.94; F, 26.50; O, 22.31

HRMS [M]+:430HRMS [M] &lt; + & gt ; : 430

[합성예 2] Compound 2의 합성[Synthesis Example 2] Synthesis of Compound 2

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 50.25; H, 0.94; F, 26.50; O, 22.31Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 50.25; H, 0.94; F, 26.50; O, 22.31

HRMS [M]+: 430HRMS [M] &lt; + & gt ; : 430

[합성예 3] Compound 3의 합성[Synthesis Example 3] Synthesis of Compound 3

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 50.25; H, 0.94; F, 26.50; O, 22.31Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 50.25; H, 0.94; F, 26.50; O, 22.31

HRMS [M]+: 430HRMS [M] &lt; + & gt ; : 430

[합성예 4] Compound 4의 합성[Synthesis Example 4] Synthesis of Compound 4

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 63.03; H, 2.07; F, 13.00; O, 21.90Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 63.03; H, 2.07; F, 13.00; O, 21.90

HRMS [M]+: 438HRMS [M] &lt; + & gt ; : 438

[합성예 5] Compound 5의 합성[Synthesis Example 5] Synthesis of Compound 5

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 56.93; H, 1.59; F, 22.51; O, 18.96Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 56.93; H, 1.59; F, 22.51; O, 18.96

HRMS [M]+: 506HRMS [M] &lt; + & gt ; : 506

[합성예 6] Compound 6의 합성[Synthesis Example 6] Synthesis of Compound 6

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 56.93; H, 1.59; F, 22.51; O, 18.96Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 56.93; H, 1.59; F, 22.51; O, 18.96

HRMS [M]+: 506HRMS [M] &lt; + & gt ; : 506

[합성예 7] Compound 7의 합성[Synthesis Example 7] Synthesis of Compound 7

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 56.93; H, 1.59; F, 22.51; O, 18.96Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 56.93; H, 1.59; F, 22.51; O, 18.96

HRMS [M]+: 506HRMS [M] &lt; + & gt ; : 506

[합성예 8] Compound 8의 합성[Synthesis Example 8] Synthesis of Compound 8

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 52.28; H, 1.23; F, 29.77; O, 16.72Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 52.28; H, 1.23; F, 29.77; O, 16.72

HRMS [M]+: 574HRMS [M] &lt; + &gt;: 574

[합성예 9] Compound 9의 합성[Synthesis Example 9] Synthesis of Compound 9

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 52.28; H, 1.23; F, 29.77; O, 16.72Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 52.28; H, 1.23; F, 29.77; O, 16.72

HRMS [M]+: 574HRMS [M] &lt; + &gt;: 574

[합성예 10] Compound 10의 합성[Synthesis Example 10] Synthesis of Compound 10

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 56.93; H, 1.59; F, 22.51; O, 18.96Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 56.93; H, 1.59; F, 22.51; O, 18.96

HRMS [M]+: 506HRMS [M] &lt; + & gt ; : 506

[합성예 11] Compound 11의 합성[Synthesis Example 11] Synthesis of Compound 11

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 56.93; H, 1.59; F, 22.51; O, 18.96Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 56.93; H, 1.59; F, 22.51; O, 18.96

HRMS [M]+: 506HRMS [M] &lt; + & gt ; : 506

[합성예 12] Compound 12의 합성[Synthesis Example 12] Synthesis of Compound 12

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 52.28; H, 1.23; F, 29.77; O, 16.72Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 52.28; H, 1.23; F, 29.77; O, 16.72

HRMS [M]+: 574HRMS [M] &lt; + &gt;: 574

[합성예 13] Compound 13의 합성[Synthesis Example 13] Synthesis of Compound 13

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 52.28; H, 1.23; F, 29.77; O, 16.72Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 52.28; H, 1.23; F, 29.77; O, 16.72

HRMS [M]+: 574HRMS [M] &lt; + &gt;: 574

[합성예 14] Compound 14의 합성[Synthesis Example 14] Synthesis of Compound 14

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 52.28; H, 1.23; F, 29.77; O, 16.72Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 52.28; H, 1.23; F, 29.77; O, 16.72

HRMS [M]+: 574HRMS [M] &lt; + &gt;: 574

[합성예 15] Compound 15의 합성[Synthesis Example 15] Synthesis of Compound 15

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 52.28; H, 1.23; F, 29.77; O, 16.72Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 52.28; H, 1.23; F, 29.77; O, 16.72

HRMS [M]+: 574HRMS [M] &lt; + &gt;: 574

[합성예 16] Compound 16의 합성[Synthesis Example 16] Synthesis of Compound 16

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 61.87; H, 2.08; F, 19.57; O, 16.48Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 61.87; H, 2.08; F, 19.57; O, 16.48

HRMS [M]+: 582HRMS [M] &lt; + & gt ; : 582

[합성예 17] Compound 17의 합성[Synthesis Example 17] Synthesis of Compound 17

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 53.50; H, 1.40; F, 31.73; O, 13.36Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 53.50; H, 1.40; F, 31.73; O, 13.36

HRMS [M]+: 718HRMS [M] &lt; + & gt ; : 718

[합성예 18] Compound 18의 합성[Synthesis Example 18] Synthesis of Compound 18

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 47.80; H, 0.94; F, 40.02; O, 11.24Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 47.80; H, 0.94; F, 40.02; O, 11.24

HRMS [M]+: 854HRMS [M] &lt; + & gt ; : 854

[합성예 19] Compound 19의 합성[Synthesis Example 19] Synthesis of Compound 19

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 53.50; H, 1.40; F, 31.73; O, 13.36Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 53.50; H, 1.40; F, 31.73; O, 13.36

HRMS [M]+: 718HRMS [M] &lt; + & gt ; : 718

[합성예 20] Compound 20의 합성[Synthesis Example 20] Synthesis of Compound 20

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 53.50; H, 1.40; F, 31.73; O, 13.36Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 53.50; H, 1.40; F, 31.73; O, 13.36

HRMS [M]+: 718HRMS [M] &lt; + & gt ; : 718

[합성예 21] Compound 21의 합성[Synthesis Example 21] Synthesis of Compound 21

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 61.87; H, 2.08; F, 19.57; O, 16.48Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 61.87; H, 2.08; F, 19.57; O, 16.48

HRMS [M]+: 582HRMS [M] &lt; + & gt ; : 582

[합성예 22] Compound 22의 합성[Synthesis Example 22] Synthesis of Compound 22

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 53.50; H, 1.40; F, 31.73; O, 13.36Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 53.50; H, 1.40; F, 31.73; O, 13.36

HRMS [M]+: 718HRMS [M] &lt; + & gt ; : 718

[합성예 23] Compound 23의 합성[Synthesis Example 23] Synthesis of Compound 23

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 61.87; H, 2.08; F, 19.57; O, 16.48Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 61.87; H, 2.08; F, 19.57; O, 16.48

HRMS [M]+: 582HRMS [M] &lt; + & gt ; : 582

[합성예 24] Compound 24의 합성[Synthesis Example 24] Synthesis of Compound 24

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 54.31; H, 1.52; F, 33.04; O, 11.13Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 54.31; H, 1.52; F, 33.04; O, 11.13

HRMS [M]+: 862HRMS [M] &lt; + & gt ; : 862

[합성예 25] Compound 25의 합성[Synthesis Example 25] Synthesis of Compound 25

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 54.31; H, 1.52; F, 33.04; O, 11.13Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 54.31; H, 1.52; F, 33.04; O, 11.13

HRMS [M]+: 862HRMS [M] &lt; + & gt ; : 862

[합성예 26] Compound 26의 합성[Synthesis Example 26] Synthesis of Compound 26

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 49.85; H, 0.70; F, 32.85; O, 16.60Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 49.85; H, 0.70; F, 32.85; O, 16.60

HRMS [M]+: 578HRMS [M] &lt; + &gt;: 578

[합성예 27] Compound 27의 합성[Synthesis Example 27] Synthesis of Compound 27

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 49.61; H, 0.56; F, 36.62; O, 13.22Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 49.61; H, 0.56; F, 36.62; O, 13.22

HRMS [M]+: 726HRMS [M] &lt; + & gt ; : 726

[합성예 28] Compound 28의 합성[Synthesis Example 28] Synthesis of Compound 28

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 55.06; H, 1.23; F, 29.03; O, 14.67Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 55.06; H, 1.23; F, 29.03; O, 14.67

HRMS [M]+: 654HRMS [M] &lt; + & gt ; : 654

[합성예 29] Compound 29의 합성[Synthesis Example 29] Synthesis of Compound 29

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 49.85; H, 0.70; F, 32.85; O, 16.60Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 49.85; H, 0.70; F, 32.85; O, 16.60

HRMS [M]+: 578HRMS [M] &lt; + &gt;: 578

[합성예 30] Compound 30의 합성[Synthesis Example 30] Synthesis of Compound 30

실시예 1의 Compound 1의 합성과 동일한 방법을 이용하여 합성할 수 있었다. Elemental Analysis: C, 49.45; H, 0.46; F, 39.11; O, 10.98Synthesis was carried out using the same method as the synthesis of Compound 1 of Example 1. Elemental Analysis: C, 49.45; H, 0.46; F, 39.11; O, 10.98

HRMS [M]+: 874HRMS [M] &lt; + & gt ; : 874

[투명 폴리아믹산 조성물의 합성 및 폴리이미드 필름의 제조][Synthesis of transparent polyamic acid composition and production of polyimide film]

[실시예 1][Example 1]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 216.038g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오르메틸)-4,4'- 디아미노바이페닐(2,2'-TFDB) 16.0g을 가하고, 1시간 동안 교반하여 완전히 용해시켰다. 이후 2,2-비스 (3,4- 디카르복시페닐) 헥사플루오로프로판 산이무수물 (2,2-bis(3,4- dicarboxyphenyl)Hexa fluoropropane dianhydride, 6-FDA) 및 compound 1을 각각 순차적으로 19.975g, 2.149g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 20000 CPs의 투명 폴리아믹산 조성물을 얻었다.216.038 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged into a 500-ml three-necked round bottom flask and the temperature of the reactor was raised to 50 ° C to obtain 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl (2,2'-TFDB) was added, and the mixture was stirred for 1 hour to completely dissolve it. Thereafter, 2,2-bis (3,4-dicarboxyphenyl) hexa fluoropropane dianhydride (6-FDA) and compound 1 were sequentially added to the solution in an amount of 19.975 g and 2.149 g, and the mixture was cooled to 30 DEG C and dissolved. At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After completion of the reaction of the monomer, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 20000 CPs at 25 캜.

2. 투명 폴리이미드 필름의 제조 2. Preparation of transparent polyimide film

상기 투명 폴리아믹산 용액을 LCD용 유리에 스핀 코팅한 후 질소 분위기의 컨벡션 오븐에서 80℃에서 30분, 150℃에서 30분, 200℃에서 1시간, 300℃에서 1시간으로 단계적으로 서서히 승온시키면서 건조 및 이미드 폐환반응(Imidazation)을 진행하였다. 이로써, 이미드화율이 85% 이상인 막 두께 30㎛의 투명 폴리이미드 필름을 제조하였다. 이후 불산으로 유리를 에칭하여 폴리이미드 필름을 취하였다.The transparent polyamic acid solution was spin-coated on LCD glass and dried in a convection oven at 80 ° C for 30 minutes, at 150 ° C for 30 minutes, at 200 ° C for 1 hour, and at 300 ° C for 1 hour, And the imidization reaction proceeded. Thus, a transparent polyimide film having a film thickness of 30 탆 with an imidization ratio of 85% or more was prepared. Thereafter, the glass was etched with hydrofluoric acid to obtain a polyimide film.

[실시예 2][Example 2]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 216.267g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오르메틸)-4,4'- 디아미노바이페닐(2,2'-TFDB) 16.0g을 가하고, 1시간 동안 교반하여 완전히 용해시켰다. 이후 2,2-비스 (3,4- 디카르복시페닐) 헥사플루오로프로판 산이무수물 (2,2-bis(3,4- dicarboxyphenyl)Hexa fluoropropane dianhydride, 6-FDA) 및 compound 4를 각각 순차적으로 19.975g, 2.190g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 21000 CPs의 투명 폴리아믹산 조성물을 얻었다216.267 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged into a 500 ml three-necked round bottom flask, and the temperature of the reactor was raised to 50 ° C to obtain 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl (2,2'-TFDB) was added, and the mixture was stirred for 1 hour to completely dissolve it. Then, 2,2-bis (3,4-dicarboxyphenyl) hexa fluoropropane dianhydride (6-FDA) and compound 4 were sequentially added to the solution in the order of 19.975 g, 2.190 g, and then cooled to 30 DEG C and dissolved. At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 21000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 3][Example 3]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 219.95g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오르메틸)-4,4'- 디아미노바이페닐(2,2'-TFDB) 16.0g을 가하고, 1시간 동안 교반하여 완전히 용해시켰다. 이후 2,2-비스 (3,4- 디카르복시페닐) 헥사플루오로프로판 산이무수물 (2,2-bis(3,4- dicarboxyphenyl)Hexa fluoropropane dianhydride, 6-FDA) 및 compound 7을 각각 순차적으로 17.775g, 5.059g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 19000 CPs의 투명 폴리아믹산 조성물을 얻었다219.95 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged into a 500-ml three-necked round bottom flask and the temperature of the reactor was raised to 50 ° C to obtain 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl (2,2'-TFDB) was added, and the mixture was stirred for 1 hour to completely dissolve it. Then, 2,2-bis (3,4-dicarboxyphenyl) hexa fluoropropane dianhydride (6-FDA) and compound 7 were sequentially added to 17.775 g and 5.059 g, and the mixture was cooled to 30 DEG C and dissolved. At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 19000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 4][Example 4]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 223.801g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오르메틸)-4,4'- 디아미노바이페닐(2,2'-TFDB) 16.0g을 가하고, 1시간 동안 교반하여 완전히 용해시켰다. 이후 2,2-비스 (3,4- 디카르복시페닐) 헥사플루오로프로판 산이무수물 (2,2-bis(3,4- dicarboxyphenyl)Hexa fluoropropane dianhydride, 6-FDA) 및 compound 15을 각각 순차적으로 17.755g, 5.739g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 23000 CPs의 투명 폴리아믹산 조성물을 얻었다223801 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged into a 500-ml three-necked round bottom flask and the temperature of the reactor was raised to 50 ° C to obtain 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl (2,2'-TFDB) was added, and the mixture was stirred for 1 hour to completely dissolve it. Then, 2,2-bis (3,4-dicarboxyphenyl) hexa fluoropropane dianhydride (6-FDA) and compound 15 were sequentially added to 17,755 g and 5.739 g, and the mixture was cooled to 30 DEG C and dissolved. At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 23000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 5][Example 5]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 231.96g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오르메틸)-4,4'- 디아미노바이페닐(2,2'-TFDB) 16.0g을 가하고, 1시간 동안 교반하여 완전히 용해시켰다. 이후 2,2-비스 (3,4- 디카르복시페닐) 헥사플루오로프로판 산이무수물 (2,2-bis(3,4- dicarboxyphenyl)Hexa fluoropropane dianhydride, 6-FDA) 및 compound 17을 각각 순차적으로 17.755g, 7.179g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 20000 CPs의 투명 폴리아믹산 조성물을 얻었다231.96 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged into a 500 ml three-necked round bottom flask and the temperature of the reactor was raised to 50 ° C to obtain 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl (2,2'-TFDB) was added, and the mixture was stirred for 1 hour to completely dissolve it. Then, 2,2-bis (3,4-dicarboxyphenyl) hexa fluoropropane dianhydride (6-FDA) and compound 17 were sequentially added to 17,755 g and 7.179 g, and the mixture was cooled to 30 DEG C and dissolved. At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 20000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 6][Example 6]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 221.203g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오르메틸)-4,4'- 디아미노바이페닐(2,2'-TFDB) 16.0g을 가하고, 1시간 동안 교반하여 완전히 용해시켰다. 이후 2,2-비스 (3,4- 디카르복시페닐) 헥사플루오로프로판 산이무수물 (2,2-bis(3,4- dicarboxyphenyl)Hexa fluoropropane dianhydride, 6-FDA) 및 compound 23을 각각 순차적으로 17.755g, 5.280g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 19000 CPs의 투명 폴리아믹산 조성물을 얻었다221.203 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged into a 500-ml three-necked round bottom flask and the temperature of the reactor was raised to 50 ° C to obtain 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl (2,2'-TFDB) was added, and the mixture was stirred for 1 hour to completely dissolve it. Then, 2,2-bis (3,4-dicarboxyphenyl) hexa fluoropropane dianhydride (6-FDA) and compound 23 were sequentially added to 17,755 g, 5.280 g, and then cooled to 30 DEG C to dissolve. At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 19000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 7][Example 7]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 232.409g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오르메틸)-4,4'- 디아미노바이페닐(2,2'-TFDB) 16.0g을 가하고, 1시간 동안 교반하여 완전히 용해시켰다. 이후 2,2-비스 (3,4- 디카르복시페닐) 헥사플루오로프로판 산이무수물 (2,2-bis(3,4- dicarboxyphenyl)Hexa fluoropropane dianhydride, 6-FDA) 및 compound 27을 각각 순차적으로 17.755g, 7.258g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 20000 CPs의 투명 폴리아믹산 조성물을 얻었다232.409 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged into a 500 ml three-necked round bottom flask, and the temperature of the reactor was raised to 50 ° C to obtain 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl (2,2'-TFDB) was added, and the mixture was stirred for 1 hour to completely dissolve it. Then, 2,2-bis (3,4-dicarboxyphenyl) hexa fluoropropane dianhydride (6-FDA) and compound 27 were sequentially added to 17,755 g, 7.258 g, and then cooled to 30 DEG C to dissolve. At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 20000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다. The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 8][Example 8]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 216.274g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오르메틸)-4,4'- 디아미노바이페닐(2,2'-TFDB) 19.0g을 가하고, 1.5시간 동안 교반하여 완전히 용해시켰다. 이후 3,3`,4,4`-바이페닐테트라카복실릭 산이무수물(3,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) 및 compound 4를 각각 순차적으로 13.965g, 5.201g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 7시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 25000 CPs의 투명 폴리아믹산 조성물을 얻었다216.274 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged in a 500 ml three-necked round bottom flask, and the temperature of the reactor was raised to 50 ° C to obtain 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl (2,2'-TFDB) was added, and the mixture was stirred for 1.5 hours to dissolve completely. Then, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA), 3,3', 4,4'-biphenyltetracarboxylic dianhydride And compound 4 were sequentially added in amounts of 13.965 g and 5.201 g, respectively, and then cooled to 30 ° C and dissolved. At this time, the solid content was 15%, and then stirred for 7 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 25000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다. The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 9][Example 9]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 210.359g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오르메틸)-4,4'- 디아미노바이페닐(2,2'-TFDB) 17.0g을 가하고, 1.5시간 동안 교반하여 완전히 용해시켰다. 이후 3,3`,4,4`-바이페닐테트라카복실릭 산이무수물(3,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) 및 compound 7를 각각 순차적으로 9.371g, 10.751g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 7시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 28000 CPs의 투명 폴리아믹산 조성물을 얻었다210.359 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged into a 500 ml three-necked round bottom flask and the temperature of the reactor was raised to 50 ° C to obtain 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl (2,2'-TFDB) was added thereto, and the mixture was stirred for 1.5 hours to completely dissolve it. Then, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA), 3,3', 4,4'-biphenyltetracarboxylic dianhydride And compound 7 were sequentially added to 9.371 g and 10.751 g, respectively, and then cooled to 30 ° C and dissolved. At this time, the solid content was 15%, and then stirred for 7 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 28000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다. The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 10][Example 10]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 209.995g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오르메틸)-4,4'- 디아미노바이페닐(2,2'-TFDB) 16.0g을 가하고, 1.5시간 동안 교반하여 완전히 용해시켰다. 이후 3,3`,4,4`-바이페닐테트라카복실릭 산이무수물(3,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) 및 compound 19를 각각 순차적으로 10.290g, 10.768g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 6시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 22000 CPs의 투명 폴리아믹산 조성물을 얻었다N, N-dimethylacetamide (DMAc) (209.995 g, 85.0 wt%) was charged into a 500-ml three-necked round bottom flask, and the temperature of the reactor was raised to 50 ° C to obtain 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl (2,2'-TFDB) was added thereto, and the mixture was stirred for 1.5 hours to completely dissolve it. Then, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA), 3,3', 4,4'-biphenyltetracarboxylic dianhydride And compound 19 were sequentially added to 10.290 g and 10.768 g, respectively, and then cooled to 30 ° C and dissolved. At this time, the solid content was 15%, and then stirred for 6 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 22000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다. The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 11][Example 11]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 210.583g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오르메틸)-4,4'- 디아미노바이페닐(2,2'-TFDB) 18.5g을 가하고, 1.5시간 동안 교반하여 완전히 용해시켰다. 이후 3,3`,4,4`-바이페닐테트라카복실릭 산이무수물(3,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) 및 compound 21를 각각 순차적으로 15.279g, 3.364g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 21000 CPs의 투명 폴리아믹산 조성물을 얻었다210.583 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged into a 500-ml three-necked round bottom flask and the temperature of the reactor was raised to 50 캜 to obtain 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl (2,2'-TFDB) was added, and the mixture was stirred for 1.5 hours to be completely dissolved. Then, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA), 3,3', 4,4'-biphenyltetracarboxylic dianhydride And compound 21 were added sequentially in an amount of 15.279 g and 3.364 g, respectively, and then cooled to 30 ° C and dissolved. At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 21000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다. The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 12][Example 12]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 212.938g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오르메틸)-4,4'- 디아미노바이페닐(2,2'-TFDB) 18.5g을 가하고, 1.5시간 동안 교반하여 완전히 용해시켰다. 이후 3,3`,4,4`-바이페닐테트라카복실릭 산이무수물(3,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) 및 compound 28를 각각 순차적으로 15.297g, 3.780g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 7시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 24000 CPs의 투명 폴리아믹산 조성물을 얻었다212.938 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged into a 500-ml three-necked round bottom flask and the temperature of the reactor was raised to 50 ° C to obtain 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl (2,2'-TFDB) was added, and the mixture was stirred for 1.5 hours to be completely dissolved. Then, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA), 3,3', 4,4'-biphenyltetracarboxylic dianhydride And compound 28 were sequentially added in an amount of 15.297 g and 3.780 g, respectively, and then cooled to 30 ° C and dissolved. At this time, the solid content was 15%, and then stirred for 7 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 24000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다. The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 13][Example 13]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 210.837g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오르메틸)-4,4'- 디아미노바이페닐(2,2'-TFDB) 17.0g을 가하고, 1.5시간 동안 교반하여 완전히 용해시켰다. 이후 3,3`,4,4`-바이페닐테트라카복실릭 산이무수물(3,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) 및 compound 27를 각각 순차적으로 12.495g, 7.711g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 7시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 26000 CPs의 투명 폴리아믹산 조성물을 얻었다210.837 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged into a 500-ml three-necked round bottom flask and the temperature of the reactor was raised to 50 ° C to obtain 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl (2,2'-TFDB) was added thereto, and the mixture was stirred for 1.5 hours to completely dissolve it. Then, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA), 3,3', 4,4'-biphenyltetracarboxylic dianhydride And compound 27 were sequentially added in the order of 12.495 g and 7.711 g, respectively, and then cooled to 30 ° C and dissolved. At this time, the solid content was 15%, and then stirred for 7 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 26000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다. The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 14][Example 14]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 211.050g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오로메틸)-4,4'-다이아미노페닐에테르(2,2'-Bis(trifluoromethyl)-4,4'-diaminodiphenyl ether, 6-FODA) 22.5g을 가하고, 1시간 동안 교반하여 완전히 용해시켰다. 이후 1,2,3,4-사이클로부탄 테트라카복실릭 산이무수물 (1, 2, 3, 4-Cyclobutane Tetracarboxylic Dianhydride , CBDA) 및 compound 4를 각각 순차적으로 11.811g, 2.933g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 18000 CPs의 투명 폴리아믹산 조성물을 얻었다N, N-dimethylacetamide (DMAc) (211.050 g, 85.0 wt%) was charged in a 500 ml three-neck round bottom flask, and the temperature of the reactor was raised to 50 ° C to obtain 2,2'- ) 2,2'-bis (trifluoromethyl) -4,4'-diaminodiphenyl ether, 6-FODA) was added to the solution, and the mixture was stirred for 1 hour to completely dissolve it. Then, 11.811 g and 2.933 g of 1,2,3,4-cyclobutane tetracarboxylic acid dianhydride (1, 2, 3, 4-Cyclobutane Tetracarboxylic Dianhydride, CBDA) and compound 4 were sequentially added, Lt; / RTI &gt; At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 18000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다. The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 15][Example 15]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 209.026g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오로메틸)-4,4'-다이아미노페닐에테르(2,2'-Bis(trifluoromethyl)-4,4'-diaminodiphenyl ether, 6-FODA) 20.5g을 가하고, 1시간 동안 교반하여 완전히 용해시켰다. 이후 1,2,3,4-사이클로부탄 테트라카복실릭 산이무수물 (1, 2, 3, 4-Cyclobutane Tetracarboxylic Dianhydride , CBDA) 및 compound 4를 각각 순차적으로 8.370g, 8.017g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 19000 CPs의 투명 폴리아믹산 조성물을 얻었다N, N-dimethylacetamide (DMAc) (209.026 g, 85.0 wt%) was charged in a 500 ml three-neck round bottom flask, and the temperature of the reactor was raised to 50 ° C to obtain 2,2'- ) -4,4'-diaminodiphenyl ether (6-FODA) were added to the solution, and the mixture was stirred for 1 hour to completely dissolve it. Then, 8.370 g and 8.017 g of 1,2,3,4-cyclobutane tetracarboxylic acid dianhydride (1, 2, 3, 4-Cyclobutane Tetracarboxylic Dianhydride, CBDA) and compound 4 were sequentially added, Lt; / RTI &gt; At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 19000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다. The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 16][Example 16]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 210.804g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오로메틸)-4,4'-다이아미노페닐에테르(2,2'-Bis(trifluoromethyl)-4,4'-diaminodiphenyl ether, 6-FODA) 20g을 가하고, 1시간 동안 교반하여 완전히 용해시켰다. 이후 1,2,3,4-사이클로부탄 테트라카복실릭 산이무수물 (1, 2, 3, 4-Cyclobutane Tetracarboxylic Dianhydride , CBDA) 및 compound 7를 각각 순차적으로 8.166g, 9.035g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 21000 CPs의 투명 폴리아믹산 조성물을 얻었다210.804 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged into a 500 ml three-necked round bottom flask and the temperature of the reactor was raised to 50 ° C to obtain 2,2'- ) -4,4'-diaminodiphenyl ether (6-FODA) was added to the solution, and the mixture was stirred for 1 hour to completely dissolve it. Then, 8.166 g and 9.035 g of 1,2,3,4-cyclobutane tetracarboxylic acid dianhydride (1,2,3,4-Cyclobutane Tetracarboxylic Dianhydride, CBDA) and compound 7 were sequentially added, Lt; / RTI &gt; At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 21000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다. The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 17][Example 17]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 211.706g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오로메틸)-4,4'-다이아미노페닐에테르(2,2'-Bis(trifluoromethyl)-4,4'-diaminodiphenyl ether, 6-FODA) 21g을 가하고, 1시간 동안 교반하여 완전히 용해시켰다. 이후 1,2,3,4-사이클로부탄 테트라카복실릭 산이무수물 (1, 2, 3, 4-Cyclobutane Tetracarboxylic Dianhydride , CBDA) 및 compound 18를 각각 순차적으로 11.024g, 5.336g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 22000 CPs의 투명 폴리아믹산 조성물을 얻었다N, N-dimethylacetamide (DMAc) (211.706 g, 85.0 wt%) was charged in a 500 ml three-necked round bottom flask and the temperature of the reactor was raised to 50 ° C to obtain 2,2'- ) -4,4'-diaminodiphenyl ether (2,2'-bis (trifluoromethyl) -4,4'-diaminodiphenyl ether, 6-FODA) were added and stirred for 1 hour to dissolve completely. Then, 11.024 g and 5.336 g of 1,2,3,4-cyclobutane tetracarboxylic dianhydride (1, 2, 3, 4-Cyclobutane Tetracarboxylic Dianhydride, CBDA) and compound 18 were sequentially added, Lt; / RTI &gt; At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 22000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다. The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 18][Example 18]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 209.102g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오로메틸)-4,4'-다이아미노페닐에테르(2,2'-Bis(trifluoromethyl)-4,4'-diaminodiphenyl ether, 6-FODA) 17g을 가하고, 1시간 동안 교반하여 완전히 용해시켰다. 이후 1,2,3,4-사이클로부탄 테트라카복실릭 산이무수물 (1, 2, 3, 4-Cyclobutane Tetracarboxylic Dianhydride , CBDA) 및 compound 18를 각각 순차적으로 6.941g, 12.960g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 21000 CPs의 투명 폴리아믹산 조성물을 얻었다N, N-dimethylacetamide (DMAc) (209.102 g, 85.0 wt%) was charged in a 500-ml three-necked round bottom flask and the temperature of the reactor was raised to 50 캜 to obtain 2,2'- ) -4,4'-diaminodiphenyl ether (6-FODA) was added to the mixture, and the mixture was stirred for 1 hour to completely dissolve the mixture. Then, 6.941 g and 12.960 g of 1,2,3,4-cyclobutane tetracarboxylic dianhydride (1, 2, 3, 4-Cyclobutane Tetracarboxylic Dianhydride, CBDA) and compound 18 were sequentially added, Lt; / RTI &gt; At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 21000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다. The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 19][Example 19]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 209.026g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오로메틸)-4,4'-다이아미노페닐에테르(2,2'-Bis(trifluoromethyl)-4,4'-diaminodiphenyl ether, 6-FODA) 18g을 가하고, 1시간 동안 교반하여 완전히 용해시켰다. 이후 1,2,3,4-사이클로부탄 테트라카복실릭 산이무수물 (1, 2, 3, 4-Cyclobutane Tetracarboxylic Dianhydride , CBDA) 및 compound 22를 각각 순차적으로 7.349g, 11.538g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 20000 CPs의 투명 폴리아믹산 조성물을 얻었다N, N-dimethylacetamide (DMAc) (209.026 g, 85.0 wt%) was charged in a 500 ml three-neck round bottom flask, and the temperature of the reactor was raised to 50 ° C to obtain 2,2'- ) -4,4'-diaminodiphenyl ether (6-FODA) was added to the solution, and the mixture was stirred for 1 hour to completely dissolve it. Then, 7.349 g and 11.538 g of 1,2,3,4-cyclobutane tetracarboxylic acid dianhydride (1,2,3,4-Cyclobutane Tetracarboxylic Dianhydride, CBDA) and compound 22 were sequentially added, Lt; / RTI &gt; At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 20000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다. The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 20][Example 20]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 207.177g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오로메틸)-4,4'-다이아미노페닐에테르(2,2'-Bis(trifluoromethyl)-4,4'-diaminodiphenyl ether, 6-FODA) 19g을 가하고, 1시간 동안 교반하여 완전히 용해시켰다. 이후 1,2,3,4-사이클로부탄 테트라카복실릭 산이무수물 (1, 2, 3, 4-Cyclobutane Tetracarboxylic Dianhydride, CBDA) 및 compound 26를 각각 순차적으로 7.757g, 9.803g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 20000 CPs의 투명 폴리아믹산 조성물을 얻었다207.177 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged into a 500 ml three-necked round bottom flask and the temperature of the reactor was raised to 50 ° C to obtain 2,2'- ) -4,4'-diaminodiphenyl ether (6-FODA) was added to the solution, and the mixture was stirred for 1 hour to completely dissolve it. Then, 7.757 g and 9.803 g of 1,2,3,4-cyclobutane tetracarboxylic dianhydride (1,2,3,4-Cyclobutane Tetracarboxylic Dianhydride, CBDA) and compound 26 were sequentially added, and then cooled to 30 ° C Lt; / RTI &gt; At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 20000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다. The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 21][Example 21]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 208.690g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오로메틸)-4,4'-다이아미노페닐에테르(2,2'-Bis(trifluoromethyl)-4,4'-diaminodiphenyl ether, 6-FODA) 19.5g을 가하고, 1시간 동안 교반하여 완전히 용해시켰다. 이후 1,2,3,4-사이클로부탄 테트라카복실릭 산이무수물 (1, 2, 3, 4-Cyclobutane Tetracarboxylic Dianhydride , CBDA) 및 compound 29를 각각 순차적으로 7.962g, 9.366g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 23000 CPs의 투명 폴리아믹산 조성물을 얻었다208.690 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged in a 500 ml three-necked round bottom flask and the temperature of the reactor was raised to 50 ° C to obtain 2,2'- ) -4,4'-diaminodiphenyl ether (6-FODA) was added to the solution, and the mixture was stirred for 1 hour to completely dissolve it. Then, 7.962 g and 9.366 g of 1,2,3,4-cyclobutane tetracarboxylic dianhydride (1,2,3,4-Cyclobutane Tetracarboxylic Dianhydride, CBDA) and compound 29 were sequentially added, Lt; / RTI &gt; At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 23000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 22][Example 22]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 212.298g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(4-아미노페닐)설폰(2,2'-Bis(4-aminophenyl)sulfone,4,4'-DDS) 15.5g을 가하고, 1.5시간 동안 교반하여 완전히 용해시켰다. 이후 3,3`,4,4`-바이페닐테트라카복실릭 산이무수물(3,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) 및 compound 4를 각각 순차적으로 11.020g, 10.945g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 22000 CPs의 투명 폴리아믹산 조성물을 얻었다212.298 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged in a 500 ml three-neck round bottom flask and the temperature of the reactor was raised to 50 ° C to obtain 2,2'- ) Sulfone (4-aminophenyl) sulfone, 4,4'-DDS) was added to the solution, and the solution was completely dissolved by stirring for 1.5 hours. Then, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA), 3,3', 4,4'-biphenyltetracarboxylic dianhydride And compound 4 were sequentially added to 11.020 g and 10.945 g, respectively, and then cooled to 30 ° C and dissolved. At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 22000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다. The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 23][Example 23]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 207.603g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(4-아미노페닐)설폰(2,2'-Bis(4-aminophenyl)sulfone,4,4'-DDS) 14.5g을 가하고, 1.5시간 동안 교반하여 완전히 용해시켰다. 이후 3,3`,4,4`-바이페닐테트라카복실릭 산이무수물(3,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) 및 compound 7를 각각 순차적으로 10.309g, 11.827g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 25000 CPs의 투명 폴리아믹산 조성물을 얻었다207.603 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged in a 500 ml three-necked round bottom flask and the temperature of the reactor was raised to 50 ° C to obtain 2,2'- ) 4,5'-bis (4-aminophenyl) sulfone, 4,4'-DDS) was added and stirred for 1.5 hours to dissolve completely. Then, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA), 3,3', 4,4'-biphenyltetracarboxylic dianhydride And compound 7 were sequentially added to 10.309 g and 11.827 g, respectively, and the mixture was cooled to 30 ° C and dissolved. At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 25000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다. The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 24][Example 24]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 211.296g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(4-아미노페닐)설폰(2,2'-Bis(4-aminophenyl)sulfone,4,4'-DDS) 13g을 가하고, 1.5시간 동안 교반하여 완전히 용해시켰다. 이후 3,3`,4,4`-바이페닐테트라카복실릭 산이무수물(3,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) 및 compound 7를 각각 순차적으로 3.081g, 21.207g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 26000 CPs의 투명 폴리아믹산 조성물을 얻었다N, N-dimethylacetamide (DMAc) (211.296 g, 85.0 wt%) was charged in a 500 ml three-necked round bottom flask and the temperature of the reactor was raised to 50 캜 to obtain 2,2'- ) Sulfone (2,2'-bis (4-aminophenyl) sulfone, 4,4'-DDS) was added and stirred for 1.5 hours to dissolve completely. Then, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA), 3,3', 4,4'-biphenyltetracarboxylic dianhydride And compound 7 were sequentially added to 3.081 g and 21.207 g, respectively, and then cooled to 30 ° C and dissolved. At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 26000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 25][Example 25]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 207.051g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(4-아미노페닐)설폰(2,2'-Bis(4-aminophenyl)sulfone,4,4'-DDS) 15g을 가하고, 1.5시간 동안 교반하여 완전히 용해시켰다. 이후 3,3`,4,4`-바이페닐테트라카복실릭 산이무수물(3,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) 및 compound 11를 각각 순차적으로 12.442g, 9.176g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 24000 CPs의 투명 폴리아믹산 조성물을 얻었다207.051 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged in a 500 ml three-necked round bottom flask and the temperature of the reactor was raised to 50 ° C to obtain 2,2'- ) Sulfone (4-aminophenyl) sulfone, 4,4'-DDS) was added to the solution, and the solution was completely dissolved by stirring for 1.5 hours. Then, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA), 3,3', 4,4'-biphenyltetracarboxylic dianhydride And compound 11 were sequentially added to 12.442 g and 9.176 g, respectively, and then cooled to 30 ° C and dissolved. At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 24000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다. The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 26][Example 26]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 212.298g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(4-아미노페닐)설폰(2,2'-Bis(4-aminophenyl)sulfone,4,4'-DDS) 15.5g을 가하고, 1.5시간 동안 교반하여 완전히 용해시켰다. 이후 3,3`,4,4`-바이페닐테트라카복실릭 산이무수물(3,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) 및 compound 16를 각각 순차적으로 14.693g, 7.271g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 25000 CPs의 투명 폴리아믹산 조성물을 얻었다212.298 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged in a 500 ml three-neck round bottom flask and the temperature of the reactor was raised to 50 ° C to obtain 2,2'- ) Sulfone (4-aminophenyl) sulfone, 4,4'-DDS) was added to the solution, and the solution was completely dissolved by stirring for 1.5 hours. Then, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA), 3,3', 4,4'-biphenyltetracarboxylic dianhydride And compound 16 were sequentially added to 14.693 g and 7.271 g, respectively, and then cooled to 30 ° C and dissolved. At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 25000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다. The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 27][Example 27]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 206.915g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(4-아미노페닐)설폰(2,2'-Bis(4-aminophenyl)sulfone,4,4'-DDS) 15.5g을 가하고, 1.5시간 동안 교반하여 완전히 용해시켰다. 이후 3,3`,4,4`-바이페닐테트라카복실릭 산이무수물(3,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) 및 compound 19를 각각 순차적으로 16.530g, 4.485g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 24000 CPs의 투명 폴리아믹산 조성물을 얻었다206.915 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged in a 500 ml three-necked round bottom flask and the temperature of the reactor was raised to 50 ° C to obtain 2,2'- ) Sulfone (4-aminophenyl) sulfone, 4,4'-DDS) was added to the solution, and the solution was completely dissolved by stirring for 1.5 hours. Then, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA), 3,3', 4,4'-biphenyltetracarboxylic dianhydride And compound 19 were sequentially added in an amount of 16.530 g and 4.485 g, respectively, and then cooled to 30 ° C and dissolved. At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 24000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다.The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[실시예 27][Example 27]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 208.624g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(4-아미노페닐)설폰(2,2'-Bis(4-aminophenyl)sulfone,4,4'-DDS) 16g을 가하고, 1.5시간 동안 교반하여 완전히 용해시켰다. 이후 3,3`,4,4`-바이페닐테트라카복실릭 산이무수물(3,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) 및 compound 21를 각각 순차적으로 17.063g, 3.753g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 23000 CPs의 투명 폴리아믹산 조성물을 얻었다208.624 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged into a 500 ml three-necked round bottom flask and the temperature of the reactor was raised to 50 ° C to obtain 2,2'- ) Sulfone (4-aminophenyl) sulfone, 4,4'-DDS) was added to the solution and stirred for 1.5 hours to dissolve completely. Then, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA), 3,3', 4,4'-biphenyltetracarboxylic dianhydride And compound 21 were sequentially added in amounts of 17.063 g and 3.753 g, respectively, and then cooled to 30 DEG C and dissolved. At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 23000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

무색투명한 폴리이미드 필름제작 과정은 상기 실시예 1과 동일한 방법으로 진행하였다. The process for producing a colorless transparent polyimide film was carried out in the same manner as in Example 1 above.

[비교예 1][Comparative Example 1]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 209.671g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오르메틸)-4,4'- 디아미노바이페닐(2,2'-TFDB) 15.5g 을 가하고, 1.5시간 동안 교반하여 완전히 용해시켰다. 이후 2,2-비스 (3,4- 디카르복시페닐) 헥사플루오로프로판 산이무수물 (2,2-bis(3,4- dicarboxyphenyl)Hexa fluoropropane dianhydride, 6-FDA) 를 21.501g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 18000 CPs의 투명 폴리아믹산 조성물을 얻었다209.671 g (85.0% by weight) of N, N-dimethylacetamide (DMAc) was charged in a 500 ml three-necked round bottom flask and the temperature of the reactor was raised to 50 ° C to obtain 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl (2,2'-TFDB) was added, and the mixture was stirred for 1.5 hours to dissolve completely. Thereafter, 21.501 g of 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydride, 6-FDA was added thereto, To dissolve it. At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 18000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

상기 폴리아믹산 용액을 LCD용 유리에 스핀 코팅한 후 질소 분위기의 컨벡션 오븐에서 80℃에서 30분, 150℃에서 30분, 200℃에서 1시간, 300℃에서 1시간으로 단계적으로 서서히 승온시키면서 건조 및 이미드 폐환반응(Imidazation)을 진행하였다. 이로써, 이미드화율이 85% 이상인 막 두께 10㎛의 투명 폴리이미드 필름을 제조하였다. 이후 불산으로 유리를 에칭하여 폴리이미드 필름을 취하였다.The polyamic acid solution was spin-coated on a glass for LCD and dried in a convection oven at 80 DEG C for 30 minutes, 150 DEG C for 30 minutes, 200 DEG C for 1 hour, and 300 DEG C for 1 hour, Imidazation reaction proceeded. Thus, a transparent polyimide film having a film thickness of 10 탆 with an imidization ratio of 85% or more was produced. Thereafter, the glass was etched with hydrofluoric acid to obtain a polyimide film.

[비교예 2][Comparative Example 2]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 206.585g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(트리플루오르메틸)-4,4'- 디아미노바이페닐(2,2'-TFDB) 19g 을 가하고, 1.5시간 동안 교반하여 완전히 용해시켰다. 이후 3,3`,4,4`-바이페닐테트라카복실릭 산이무수물(,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) 17.456g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 21000 CPs의 투명 폴리아믹산 조성물을 얻었다206.585 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged into a 500 ml three-necked round bottom flask and the temperature of the reactor was raised to 50 ° C to obtain 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl (2,2'-TFDB) was added, and the mixture was stirred for 1.5 hours to dissolve completely. Then, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA) , 3', 4,4'-biphenyltetracarboxylic dianhydride After the addition of 17.456 g, the mixture was cooled to 30 캜 and dissolved. At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 21000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

상기 폴리아믹산 용액을 LCD용 유리에 스핀 코팅한 후 질소 분위기의 컨벡션 오븐에서 80℃에서 30분, 150℃에서 30분, 200℃에서 1시간, 300℃에서 1시간으로 단계적으로 서서히 승온시키면서 건조 및 이미드 폐환반응(Imidazation)을 진행하였다. 이로써, 이미드화율이 85% 이상인 막 두께 10㎛의 투명 폴리이미드 필름을 제조하였다. 이후 불산으로 유리를 에칭하여 폴리이미드 필름을 취하였다.The polyamic acid solution was spin-coated on a glass for LCD and dried in a convection oven at 80 DEG C for 30 minutes, 150 DEG C for 30 minutes, 200 DEG C for 1 hour, and 300 DEG C for 1 hour, Imidazation reaction proceeded. Thus, a transparent polyimide film having a film thickness of 10 탆 with an imidization ratio of 85% or more was produced. Thereafter, the glass was etched with hydrofluoric acid to obtain a polyimide film.

[비교예 3][Comparative Example 3]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 206.352g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2 ,2'-비스(트리플루오로메틸)-4,4'-다이아미노페닐에테르(2,2'-Bis(trifluoromethyl)-4,4'-diaminodiphenyl ether, 6-FODA) 23g을 가하고, 1.5시간 동안 교반하여 완전히 용해시켰다. 이후 31,2,3,4-사이클로부탄 테트라카복실릭 산이무수물 (1, 2, 3, 4-Cyclobutane Tetracarboxylic Dianhydride , CBDA) 13.415g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 18000 CPs의 투명 폴리아믹산 조성물을 얻었다206.352 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged into a 500 ml three-necked round bottom flask, the temperature of the reactor was raised to 50 캜, 23 g of 2'-bis (trifluoromethyl) -4,4'-diaminodiphenyl ether (2,2'-bis (trifluoromethyl) -4,4'-diaminodiphenyl ether, 6-FODA) Lt; / RTI &gt; and completely dissolved by stirring. Then, 13.415 g of 31,2,3,4-cyclobutane tetracarboxylic dianhydride (1,2,3,4-Cyclobutane Tetracarboxylic Dianhydride, CBDA) was added, and the mixture was cooled to 30 DEG C and dissolved. At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 18000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

상기 폴리아믹산 용액을 LCD용 유리에 스핀 코팅한 후 질소 분위기의 컨벡션 오븐에서 80℃에서 30분, 150℃에서 30분, 200℃에서 1시간, 300℃에서 1시간으로 단계적으로 서서히 승온시키면서 건조 및 이미드 폐환반응(Imidazation)을 진행하였다. 이로써, 이미드화율이 85% 이상인 막 두께 10㎛의 투명 폴리이미드 필름을 제조하였다. 이후 불산으로 유리를 에칭하여 폴리이미드 필름을 취하였다.The polyamic acid solution was spin-coated on a glass for LCD and dried in a convection oven at 80 DEG C for 30 minutes, 150 DEG C for 30 minutes, 200 DEG C for 1 hour, and 300 DEG C for 1 hour, Imidazation reaction proceeded. Thus, a transparent polyimide film having a film thickness of 10 탆 with an imidization ratio of 85% or more was produced. Thereafter, the glass was etched with hydrofluoric acid to obtain a polyimide film.

[비교예 4][Comparative Example 4]

1. 투명 폴리아믹산 조성물의 제조1. Preparation of transparent polyamic acid composition

500ml 3구 둥근바닥 플라스크에 N,N-디메틸아세타아미드(DMAc) 210.482g(85.0wt%)을 채운 후, 반응기의 온도를 50℃로 승온하여, 2,2'-비스(4-아미노페닐)설폰(2,2'-Bis(4-aminophenyl)sulfone,4,4'-DDS) 17g을 가하고, 1.5시간 동안 교반하여 완전히 용해시켰다. 이후 3,3`,4,4`-바이페닐테트라카복실릭 산이무수물(,3',4,4'-Biphenyltetracarboxylic dianhydride, BPDA) 20.144g 가한 후, 30℃로 냉각하여 용해시켰다. 이때의 고형분은 15%였으며, 이후 5시간 교반하였다. 모노머의 반응이 완료된 후, 자연 냉각하여 25℃에서의 용액점도 24000 CPs의 투명 폴리아믹산 조성물을 얻었다210.482 g (85.0 wt%) of N, N-dimethylacetamide (DMAc) was charged in a 500 ml three-necked round bottom flask and the temperature of the reactor was raised to 50 ° C to obtain 2,2'- ) Sulfone (2,2'-bis (4-aminophenyl) sulfone, 4,4'-DDS) was added and stirred for 1.5 hours to dissolve completely. Then, 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA) , 3', 4,4'-biphenyltetracarboxylic dianhydride And the mixture was cooled to 30 DEG C and dissolved. At that time, the solid content was 15%, and the mixture was stirred for 5 hours. After the reaction of the monomer was completed, the solution was naturally cooled to obtain a transparent polyamic acid composition having a solution viscosity of 24000 CPs at 25 캜

2. 투명 폴리이미드 필름의 제조2. Preparation of transparent polyimide film

상기 폴리아믹산 용액을 LCD용 유리에 스핀 코팅한 후 질소 분위기의 컨벡션 오븐에서 80℃에서 30분, 150℃에서 30분, 200℃에서 1시간, 300℃에서 1시간으로 단계적으로 서서히 승온시키면서 건조 및 이미드 폐환반응(Imidazation)을 진행하였다. 이로써, 이미드화율이 85% 이상인 막 두께 10㎛의 투명 폴리이미드 필름을 제조하였다. 이후 불산으로 유리를 에칭하여 폴리이미드 필름을 취하였다.The polyamic acid solution was spin-coated on a glass for LCD and dried in a convection oven at 80 DEG C for 30 minutes, 150 DEG C for 30 minutes, 200 DEG C for 1 hour, and 300 DEG C for 1 hour, Imidazation reaction proceeded. Thus, a transparent polyimide film having a film thickness of 10 탆 with an imidization ratio of 85% or more was produced. Thereafter, the glass was etched with hydrofluoric acid to obtain a polyimide film.

상기 실시예 1~28 및 비교예 1~4에서 제조된 폴리아믹산 조성물의 조성은 하기 표 1과 같다. 이때 중량%는 전체 고형분 무게 대비 산이무수물 중 각 모노머의 중량 비율이며, 몰%는 전체 산이무수물 중의 각 모노머의 몰 비율을 나타낸다. The compositions of the polyamic acid compositions prepared in Examples 1 to 28 and Comparative Examples 1 to 4 are shown in Table 1 below. Here, the weight% represents the weight ratio of each monomer in the acid anhydride to the total solid weight, and the mol% represents the molar ratio of the respective monomers in the total acid dianhydride.

디아민Diamine 산이무수물Acid anhydride 제1모노머The first monomer 제2모노머The second monomer 성분ingredient wt%wt% Mol%Mol% 성분ingredient wt%wt% Mol%Mol% 실시예 1Example 1 TFDBTFDB 6FDA 6FDA 52.3952.39 9090 화합물1Compound 1 5.645.64 1010 실시예 2Example 2 TFDBTFDB 6FDA 6FDA 52.3452.34 9090 화합물4Compound 4 5.745.74 1010 실시예 3Example 3 TFDBTFDB 6FDA 6FDA 45.7745.77 8080 화합물 7Compound 7 13.0313.03 2020 실시예 4Example 4 TFDBTFDB 6FDA 6FDA 44.9644.96 8080 화합물 15Compound 15 14.5314.53 2020 실시예 5Example 5 TFDBTFDB 6FDA 6FDA 43.3743.37 8080 화합물 17Compound 17 17.5417.54 2020 실시예 6Example 6 TFDBTFDB 6FDA 6FDA 45.4845.48 8080 화합물 23Compound 23 13.5313.53 2020 실시예 7Example 7 TFDBTFDB 6FDA 6FDA 43.2943.29 8080 화합물 27Compound 27 17.7017.70 2020 실시예 8Example 8 TFDBTFDB BPDA BPDA 36.5936.59 8080 화합물 4Compound 4 13.6313.63 2020 실시예 9Example 9 TFDBTFDB BPDA BPDA 25.2425.24 6060 화합물 7Compound 7 28.9628.96 4040 실시예 10Example 10 TFDBTFDB BPDA BPDA 27.7727.77 7070 화합물 19Compound 19 29.0629.06 3030 실시예 11Example 11 TFDBTFDB BPDA BPDA 41.1441.14 9090 화합물 21Compound 21 9.069.06 1010 실시예 12Example 12 TFDBTFDB BPDA BPDA 40.7140.71 9090 화합물 28Compound 28 10.0610.06 1010 실시예 13Example 13 TFDBTFDB BPDA BPDA 33.5833.58 8080 화합물 27Compound 27 20.7320.73 2020 실시예 14Example 14 6FODA6FODA CBDA CBDA 31.7131.71 9090 화합물 4Compound 4 7.887.88 1010 실시예 15Example 15 6FODA6FODA CBDA CBDA 22.6922.69 7070 화합물 4Compound 4 21.7321.73 3030 실시예 16Example 16 6FODA6FODA CBDA CBDA 21.9521.95 7070 화합물 7Compound 7 24.2924.29 3030 실시예 17Example 17 6FODA6FODA CBDA CBDA 29.5129.51 9090 화합물 18Compound 18 14.2814.28 1010 실시예 18Example 18 6FODA6FODA CBDA CBDA 18.8118.81 7070 화합물 18Compound 18 35.1235.12 3030 실시예 19Example 19 6FODA6FODA CBDA CBDA 19.9219.92 7070 화합물 22Compound 22 31.2831.28 3030 실시예 20Example 20 6FODA6FODA CBDA CBDA 21.2221.22 7070 화합물 26Compound 26 26.8126.81 3030 실시예 21Example 21 6FODA6FODA CBDA CBDA 21.6221.62 7070 화합물 29Compound 29 25.4325.43 3030 실시예 22Example 22 4,4-DDS4,4-DDS BPDA BPDA 29.4129.41 6060 화합물 4Compound 4 29.2129.21 4040 실시예23Example 23 4,4-DDS4,4-DDS BPDABPDA 28.1428.14 6060 화합물 7Compound 7 32.2832.28 4040 실시예24Example 24 4,4-DDS4,4-DDS BPDA BPDA 8.268.26 2020 화합물 7Compound 7 56.8756.87 8080 실시예25Example 25 4,4-DDS4,4-DDS BPDA BPDA 33.9833.98 7070 화합물 11Compound 11 25.0625.06 3030 실시예26Example 26 4,4-DDS4,4-DDS BPDA BPDA 39.2239.22 8080 화합물 16Compound 16 19.4119.41 2020 실시예27Example 27 4,4-DDS4,4-DDS BPDA BPDA 45.2745.27 9090 화합물 19Compound 19 12.2812.28 1010 실시예28Example 28 4,4-DDS4,4-DDS BPDA BPDA 46.3546.35 9090 화합물 21Compound 21 10.1910.19 1010 비교예 1Comparative Example 1 TFDBTFDB 6FDA 6FDA 58.1158.11 100100 -- -- -- 비교예 2Comparative Example 2 TFDBTFDB BPDA BPDA 47.8847.88 100100 -- -- -- 비교예 3Comparative Example 3 6FODA6FODA CBDA CBDA 36.8436.84 100100 -- -- -- 비교예 4Comparative Example 4 4,4-DDS4,4-DDS BPDA BPDA 54.2354.23 100100 -- -- --

[물성 평가][Property evaluation]

실시예 1~28 및 비교예 1~4에서 제조된 투명 폴리이미드 필름의 물성을 하기와 같은 방법으로 평가하였으며, 그 결과를 하기 표 2에 나타내었다.The properties of the transparent polyimide films prepared in Examples 1 to 28 and Comparative Examples 1 to 4 were evaluated by the following methods, and the results are shown in Table 2 below.

<물성평가 방법> &Lt; Property evaluation method &

(1) 광투과도 측정(Trans.)(1) Measurement of light transmittance (Trans.)

550nm 파장에서 UV-Vis NIR Spectrophotometer를 이용하여 ASTM E313-73의 규격인 C광원과 시야각 2도에서 측정하였다. Was measured at a wavelength of 550 nm using a UV-Vis NIR Spectrophotometer at a C light source of ASTM E313-73 and a viewing angle of 2 degrees.

(2) 황색도 측정(Y.I)(2) Yellowness measurement (Y.I)

UV 분광계(코티카 미놀타 CM-3700d)를 이용하여 550nm에서의 황색도를 ASTM E313 규격으로 측정하였다. The yellowness at 550 nm was measured according to the ASTM E313 standard using a UV spectrometer (Kotikaminolta CM-3700d).

(3) 유리전이온도(Glass Transition Temperature, Tg)(3) Glass Transition Temperature (T g )

시차 주사열량계(DSC, TA Instrument사, Q200)를 이용하여 유리전이 온도를 측정하였다. The glass transition temperature was measured using a differential scanning calorimeter (DSC, TA Instrument, Q200).

(4) 두께 측정 (4) Thickness measurement

실리콘 웨이퍼에 투명 폴리아믹산 수지를 막 두께 20㎛ 이하로 코팅한 후 건조 및 이미드 폐환 반응을 진행하였으며, 550nm 파장에서 비접촉식 굴절율 측정 장비 (Ellipso technology의 Elli-RP)를 이용하여 필름의 두께를 측정하였다. The thickness of the film was measured using a non-contact refractive index measuring device (Elli-RP, Ellipso technology) at a wavelength of 550 nm, after coating a transparent polyamic acid resin with a thickness of 20 μm or less on a silicon wafer Respectively.

(5) 인장강도(St.)와 탄성률(Modu.)(5) Tensile strength (St) and modulus (Modu.)

ISO 527-3 규격으로 인장속도 10mm/분으로 인장강도 MPa와 탄성율 GPa를 측정하였다The tensile strength MPa and the modulus of elasticity GPa were measured at a tensile speed of 10 mm / min according to ISO 527-3 standard

두께thickness
(㎛)(탆)
투과도Permeability
(%)(%)
황색도Yellowness
(Y.I)(Y.I)
유리전이온도Glass transition temperature
(Tg, ℃)(Tg, ° C)
인장강도The tensile strength
(Mpa)(Mpa)
탄성율Modulus of elasticity
(Gpa)(Gpa)
실시예 1Example 1 5151 9090 2.52.5 349349 143143 4.84.8 실시예 2Example 2 5252 9191 2.42.4 345345 141141 4.54.5 실시예 3Example 3 5151 9292 2.52.5 347347 147147 4.44.4 실시예 4Example 4 5353 9191 2.42.4 339339 141141 4.24.2 실시예 5Example 5 5555 9090 2.62.6 338338 145145 4.34.3 실시예 6Example 6 4848 9191 3.03.0 345345 135135 4.14.1 실시예 7Example 7 4747 9191 2.42.4 342342 141141 4.54.5 실시예 8Example 8 5151 9090 2.22.2 351351 140140 4.44.4 실시예 9Example 9 4848 9191 2.32.3 350350 142142 4.84.8 실시예 10Example 10 5050 9292 2.52.5 355355 139139 4.34.3 실시예 11Example 11 5151 9191 2.12.1 362362 138138 4.34.3 실시예 12Example 12 5151 9090 2.52.5 368368 139139 4.44.4 실시예 13Example 13 5353 9191 2.72.7 352352 140140 4.24.2 실시예 14Example 14 5656 9191 2.62.6 343343 126126 3.53.5 실시예 15Example 15 4747 9292 2.22.2 338338 131131 4.14.1 실시예 16Example 16 4949 9191 2.22.2 331331 131131 4.04.0 실시예 17Example 17 5050 9292 2.12.1 340340 135135 4.24.2 실시예 18Example 18 4949 9090 2.52.5 336336 130130 3.93.9 실시예 19Example 19 5050 9292 2.42.4 336336 134134 4.44.4 실시예 20Example 20 5151 9090 2.62.6 338338 133133 4.14.1 실시예 21Example 21 5555 9191 2.52.5 335335 137137 4.24.2 실시예 22Example 22 5353 9090 2.92.9 335335 127127 4.14.1 실시예 23Example 23 5454 9191 3.13.1 341341 131131 4.04.0 실시예 24Example 24 4949 9090 3.03.0 345345 131131 4.24.2 실시예 25Example 25 4545 9090 3.13.1 347347 128128 3.83.8 실시예 26Example 26 5050 9090 3.23.2 348348 129129 3.93.9 실시예 27Example 27 4949 9090 3.03.0 343343 131131 3.93.9 실시예 28Example 28 5050 9090 2.92.9 343343 129129 4.04.0 비교예 1Comparative Example 1 5151 8989 3.53.5 334334 124124 3.93.9 비교예 2Comparative Example 2 5050 9090 4.64.6 350350 139139 4.34.3 비교예 3Comparative Example 3 5151 9191 3.43.4 321321 118118 3.23.2 비교예 4Comparative Example 4 5555 8989 5.55.5 334334 124124 3.73.7

상기 표 2를 살펴본 결과, 본 발명에 따른 화학식 1의 신규 산이무수물 모노머가 첨가된 실시예 1 내지 실시예 7의 경우, 비교예 1 대비 황색도가 낮아지고 유리전이온도가 상승하는 결과를 보였으며, 인장강도와 탄성률이 증가함을 확인할 수 있었다. As shown in Table 2, in Examples 1 to 7 in which the novel acid dianhydride monomer of Formula 1 was added according to the present invention, the yellowness degree was lowered and the glass transition temperature was increased compared to Comparative Example 1 , Tensile strength and elastic modulus were increased.

또한 본 발명에 따른 화학식 1의 신규 산이무수물 모노머가 첨가된 실시예 8 내지 실시예 13의 경우, 비교예 2 대비 황색도가 낮아짐을 확인할 수 있었다. 유리전이온도나 기계적 특성의 차이가 크게 없음은 BPDA와 본 발명의 신규 산이무수물 모노머간의 화학구조적 유사성에 따른 것으로 보여진다. In addition, in Examples 8 to 13 in which the novel acid dianhydride monomer of Formula 1 was added according to the present invention, it was confirmed that the yellowness degree of Comparative Example 2 was lowered. The absence of significant differences in glass transition temperature or mechanical properties appears to be due to chemical structural similarities between BPDA and the novel acid anhydride monomers of the present invention.

또한 상기 화학식 1의 신규 산이무수물 모노머가 첨가된 실시예 14 내지 실시예 21의 경우, 비교예 3 대비 유리전이온도, 인장강도, 및 탄성률 면에서 유의적으로 개선되었음을 확인할 수 있었다. 이는 지환족 산이무수물의 구조적 단점인 유리전이온도, 기계적 특성 등을 상기 화학식 1의 신규 모노머가 보완하기 때문인 것으로 보여진다. Also, it was confirmed that Examples 14 to 21, in which the novel acid dianhydride monomer of Formula 1 was added, were significantly improved in terms of glass transition temperature, tensile strength, and elastic modulus as compared with Comparative Example 3. This is because the novel monomers of the above formula (1) are complementary to the glass transition temperature and mechanical properties, which are structural shortcomings of the alicyclic acid anhydride.

또한 상기 화학식 1의 신규 산이무수물 모노머가 첨가된 실시예 22 내지 실시예 28의 경우, 비교예 4 대비 황색도가 현저히 낮아지고, 유리전이온도, 인장강도 및 탄성률이 증가함을 확인할 수 있었다. In Examples 22 to 28 in which the novel acid dianhydride monomer of Formula 1 was added, the yellowness degree was significantly lowered and the glass transition temperature, tensile strength and elastic modulus were increased.

전술한 결과를 종합하여 볼 때, 본 발명에서는 신규 모노머의 사용에 의해 광투과도가 저하되지 않음을 알 수 있었다. 또한 플렉서블 디스플레이 소재 및 기판으로 적용되기 위해서는 550nm 조건에서의 투과도가 90% 이상이고, 황색도 결과가 3 이하인 조건을 충족하여야 하는데, 전술한 결과에 따르면 이러한 조건을 충족하는 것으로 보인다. Taking all the above results into consideration, it has been found that the light transmittance is not lowered by the use of the novel monomer in the present invention. Also, in order to be applied to a flexible display material and a substrate, the transmittance at 550 nm should be 90% or more, and the result of yellowness should be 3 or less.

또한, 기판의 유리전이온도가 300℃~400℃ 범위인 조건도 만족하며 기계적 특성도 우수하므로, 플렉서블 디스플레이 소재로 유용하게 적용할 수 있음을 확인할 수 있었다. In addition, since the glass transition temperature of the substrate is in the range of 300 ° C to 400 ° C and satisfies the mechanical characteristics, it can be applied to a flexible display material.

Claims (13)

하기 화학식 1로 표시되는 화합물:
[화학식 1]
Figure pat00014

상기 화학식 1에서,
A는 단일결합이거나 또는 C6~C40의 아릴렌기이며,
X1 및 X2은 서로 동일하거나 상이하며, 각각 독립적으로 수소, 할로겐, C1~C6의 알킬기, 및 하나 이상의 수소가 할로겐 원자로 치환된 C1~C6의 알킬기로 이루어진 군에서 선택되며,
다만, A가 단일결합인 경우 X1 및 X2 중 적어도 하나 이상은 할로겐 또는 할로겐 원자로 치환된 C1~C6의 알킬기이며,
상기 C6~C40의 아릴렌기는 할로겐 또는 할로겐 원자로 치환된 C1~C6 알킬기로 치환될 수 있으며, m은 0 내지 3의 정수이다.
A compound represented by the following formula (1):
[Chemical Formula 1]
Figure pat00014

In Formula 1,
A is a single bond or a C 6 to C 40 arylene group,
X 1 and X 2 are the same or different and are each independently selected from the group consisting of hydrogen, halogen, C 1 -C 6 alkyl, and C 1 -C 6 alkyl substituted with at least one hydrogen,
Provided that when A is a single bond, at least one of X 1 and X 2 is a C 1 -C 6 alkyl group substituted by a halogen or a halogen atom,
The C 6 -C 40 arylene group may be substituted with a halogen or a C 1 -C 6 alkyl group substituted with a halogen atom, and m is an integer of 0 to 3.
제1항에 있어서,
상기 X1 및 X2는 각각 독립적으로 F 또는 CF3인 전자흡인성기(EWG)인 것을 특징으로 하는 화합물.
The method according to claim 1,
Wherein X 1 and X 2 are each independently F or CF 3 .
제1항에 있어서,
상기 화학식 1에서, A는 하기 화학식으로 표시되는 치환체 군에서 선택되는 것을 특징으로 하는 화합물:
Figure pat00015
,
Figure pat00016
,
Figure pat00017
,
Figure pat00018
,
Figure pat00019
,
Figure pat00020
,
Figure pat00021

상기 치환체에서,
R1 내지 R3는 서로 동일하거나 또는 상이하며, 각각 독립적으로 수소, F, 및 CF3로 이루어진 군에서 선택된다.
The method according to claim 1,
Wherein A is selected from the group of substituents represented by the following formula:
Figure pat00015
,
Figure pat00016
,
Figure pat00017
,
Figure pat00018
,
Figure pat00019
,
Figure pat00020
,
Figure pat00021

In such substituents,
R 1 to R 3 are the same as or different from each other, and each independently selected from the group consisting of hydrogen, F, and CF 3 .
제1항에 있어서,
상기 화학식 1로 표시되는 화합물은 하기 화학식으로 표시되는 화합물 군에서 선택되는 것을 특징으로 하는 화합물.
Figure pat00022

Figure pat00023

Figure pat00024
The method according to claim 1,
Wherein the compound represented by Formula 1 is selected from the group of compounds represented by the following formulas.
Figure pat00022

Figure pat00023

Figure pat00024
(a) 디아민;
(b) 제1항 내지 제4항 중 어느 한 항에 기재된 화학식 1의 화합물을 함유하는 산이무수물; 및
(c) 유기용매를 포함하며,
상기 화학식 1로 표시되는 화합물은 전체 산이무수물 100 몰%를 기준으로 10 내지 80 몰% 범위로 포함되는 것을 특징으로 하는 폴리아믹산 조성물.
(a) a diamine;
(b) an acid dianhydride containing the compound of formula (1) as defined in any one of claims 1 to 4; And
(c) an organic solvent,
Wherein the compound represented by Formula 1 is contained in an amount of 10 to 80 mol% based on 100 mol% of the total acid dianhydride.
제5항에 있어서,
상기 산이무수물은 불소화 방향족 제1산이무수물, 지환족 제2산이무수물 및 비불소화 방향족 제3산이무수물로 구성된 군에서 선택되는 1종 이상을 더 포함하는 것을 특징으로 하는 폴리아믹산 조성물.
6. The method of claim 5,
Wherein the acid dianhydride further comprises at least one selected from the group consisting of a fluorinated aromatic first acid dianhydride, an alicyclic second acid dianhydride, and a non-fluorinated aromatic dianhydride.
제6항에 있어서,
상기 제1산이무수물, 제2산이무수물 및 제3 산이무수물로 구성된 군에서 선택되는 1종 이상의 화합물의 함량은 전체 산이무수물 100 몰%를 기준으로 20 내지 90 몰%인 것을 특징으로 하는 폴리아믹산 조성물.
The method according to claim 6,
Wherein the content of the at least one compound selected from the group consisting of the first acid dianhydride, the second acid dianhydride and the third acid dianhydride is 20 to 90 mol% based on 100 mol% of the total acid dianhydride. .
제5항에 있어서,
상기 디아민은 불소화 제1디아민; 설폰계 제2디아민, 지환족 제3아민 및 에테르계 제4아민으로 구성된 군으로부터 선택되는 1종 이상을 포함하는 것을 특징으로 하는 폴리아믹산 조성물.
6. The method of claim 5,
The diamine may be a fluorinated primary diamine; A sulfone-based second diamine, an alicyclic tertiary amine, and an ether-based quaternary amine, based on the total weight of the polyamic acid composition.
제8항에 있어서,
상기 불소화 제1디아민, 설폰계 제2디아민, 지환족 제3아민 및 에테르계 제4아민의 함량은 각각 전체 디아민 100 몰%를 기준으로 10 내지 100 몰%인 것을 특징으로 하는 폴리아믹산 조성물.
9. The method of claim 8,
Wherein the content of the fluorinated first diamine, the sulfone second diamine, the alicyclic third amine and the ether fourth amine is 10 to 100 mol% based on 100 mol% of the total diamine, respectively.
제5항에 있어서,
상기 디아민(a)과 상기 산이무수물(b)의 몰수의 비(a/b)는 0.7 내지 1.3 범위인 것을 특징으로 하는 폴리아믹산 조성물.
6. The method of claim 5,
Wherein the ratio (a / b) of the number of moles of the diamine (a) to the number of moles of the acid anhydride (b) is in the range of 0.7 to 1.3.
제5항의 폴리아믹산 조성물을 이미드화하여 제조된 투명 폴리이미드 필름. A transparent polyimide film prepared by imidizing the polyamic acid composition of claim 5. 제11항에 있어서,
하기 (i) 내지 (v)의 물성 조건을 만족하는 것을 특징으로 하는 투명 폴리이미드 필름:
(i)유리전이온도(Tg)가 300 내지 400℃ 범위이며,
(ii) 막 두께 10~80㎛에서 파장 500nm의 광선 투과율이 90% 이상이며,
(iii) ASTM E313 규격에 의한 황색도가 3.3 이하이며,
(iv) 인장강도가 125 내지 150 MPa이며,
(v) 인장 탄성률이 3.5 내지 5.0 GPa 범위임.
12. The method of claim 11,
A transparent polyimide film characterized by satisfying the following physical property conditions (i) to (v):
(i) a glass transition temperature (T g ) in the range of 300 to 400 ° C,
(ii) a light transmittance of 90% or more at a wavelength of 500 nm at a film thickness of 10 to 80 탆,
(iii) the yellowness according to the ASTM E313 standard is 3.3 or less,
(iv) a tensile strength of 125 to 150 MPa,
(v) the tensile modulus is in the range of 3.5 to 5.0 GPa.
제11항에 있어서,
플렉서블 디스플레이용 기판 또는 보호막으로 사용되는 것을 특징으로 하는 투명 폴리이미드 필름.
12. The method of claim 11,
A transparent polyimide film characterized by being used as a substrate for a flexible display or a protective film.
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