KR20160142081A - Pipe suitable for system of inhibiting waste gas agglutination reaction using magnetic field - Google Patents
Pipe suitable for system of inhibiting waste gas agglutination reaction using magnetic field Download PDFInfo
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- KR20160142081A KR20160142081A KR1020150077986A KR20150077986A KR20160142081A KR 20160142081 A KR20160142081 A KR 20160142081A KR 1020150077986 A KR1020150077986 A KR 1020150077986A KR 20150077986 A KR20150077986 A KR 20150077986A KR 20160142081 A KR20160142081 A KR 20160142081A
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- KR
- South Korea
- Prior art keywords
- waste gas
- magnetic field
- tube
- protective layer
- pipe
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
Abstract
Description
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a waste gas pipe used for discharging a semiconductor process gas and the like, and more particularly to a structure suitable for a waste gas flocculation suppression system using a magnetic field.
A semiconductor device is manufactured by repeating a high-level process several times, for example, by growing a thin film on a monocrystalline substrate (wafer) of ultra-high purity by vapor deposition or the like and etching the thin film into a desired pattern. Processes such as deposition or etching are carried out in a closed process chamber. The process chamber is filled with the process gas required for the reaction or transportation required in each process. The process gas varies greatly depending on the thin film material or the reaction mechanism. Only a small part of the amount of the process gas is reacted with the wafer, and most of the process gas is discharged as waste gas. Process gases, however, are generally toxic, highly flammable and corrosive and must be safely disposed of in separate processing facilities such as scrubbers. The semiconductor process chamber and the scrubber for waste gas treatment are connected to a separate waste gas pipe. The waste gas tube is a material of good abrasion resistance, corrosion resistance, chemical resistance and heat resistance to process gas, which is very expensive. As a form of such a waste gas tube, Korean Utility Model No. 20-0244239 has proposed that a stainless steel tube having excellent corrosion resistance is coated with a protective film made of fluororesin-based Teflon. As is well known, Teflon is widely used as a lining material for metal tubes due to its excellent chemical resistance, low coefficient of friction, and its property that it does not change its properties even in a wide temperature range.
In the plasma enhanced chemical vapor deposition (PECVD) technique in which a thin film is grown at a low temperature in a thin film growth technique, a device for inducing a plasma in a process chamber in a vacuum atmosphere is used to increase the reactivity of the process gas. In this case The waste gas used in the process is discharged in a plasma state. As is well known, plasma is a state in which negative and positive charged particles that are free to move are mixed with neutral gas with the same charge amount and are electrically neutral as a whole. The waste gas discharged from the piping such as various process gases and impurities in the plasma state coagulates in the form of grain growth in which the charged particles having different polarities are bonded to each other while being out of the condition of generating waste gas in the process chamber, (See Fig. 1).
If the waste gas pipe is clogged due to the waste gas aggregation in the plasma state, the waste gas pipe which is clogged should be immediately replaced because it is an obstacle to the process execution as well as it may lead to serious accidents such as fire or suffocation, It is inevitable to stop moving the process. In addition, since the waste gas pipe is expensive, the replacement cycle is only about three days, and the economic loss due to the replacement is enormous.
2, an
When the plasma deviates from the plasma generation condition of the process chamber, charged particles having different polarities are attracted to each other and adsorbed to the waste gas tube by agglomeration. In order to prevent such waste gas adsorption, it is necessary that the waste gas in a plasma state is suppressed or delayed at least during the movement of the waste gas pipe.
To this end, the inventor of the present application invented a new method and apparatus for suppressing or delaying the coagulation of coagulation by causing a strong rotational motion between charged particles having different polarities by using a magnetic field prior to the present invention, 10-2015-0072283).
However, despite the above-mentioned first invention, since the Teflon protective film coated on the existing waste gas tube is electrically neutral, it is not possible to prevent a part of charged particles in the waste gas passing through the Teflon protective film from contacting and adsorbing with the Teflon protective film. there was. On the other hand, ordinary metal pipes, such as stainless steel pipes without a Teflon protective film, can not be used since their chemical resistance is low.
Accordingly, an object of the present invention is to provide a waste gas tube suitable for a waste gas flocculation suppression system using a magnetic field according to the above-mentioned invention.
The waste gas tube according to the present invention for achieving the above object can be composed of any type of metal or nonmetallic tube in which the inner surface of the tube is protected by a protective layer in which graphene or metal particles are dispersed in a nonmetallic material excellent in chemical resistance against waste gas .
The waste gas pipe according to the present invention for achieving the above object is characterized in that the inner surface of the pipe is protected by a protective layer made of a nonmetallic material excellent in chemical resistance against the waste gas and the surface of the protective layer, It can be composed of all types of metal or nonmetallic tubes that have been surface treated.
The waste gas tube according to the present invention has a polarity such that the metal particles dispersed in the protective layer or dispersed on the surface thereof when they are placed on the magnetic field are magnetic substances to be magnetized in the magnetic field and are the same as charged particles in the waste gas flowing in the tube By magnetization, rotational motion is caused not only between the graphene or the metal particles but also between the charged particles in the waste gas due to the magnetic flux alternating in the magnetic field. Since graphene or metal particles are fixed in the protective layer unlike charged particles in the waste gas, the particles act more strongly in the free charged particles. As such, the charged particles in the waste gas proceed to a more enhanced rotational motion, thereby effectively preventing the waste gas from being adsorbed to the inside of the tube, that is, the protective layer. Therefore, the present invention can remarkably prolong the life of the waste gas tube .
1 is an actual photograph showing the inside of a waste gas tube clogged with waste gas aggregation.
2 is a conventional waste gas exhaust system.
Fig. 3 is a exhaust system exhaust gas flow chart for magnetic field application to which the present invention is applied.
4 (a) and 4 (b) are sectional views of the waste gas tube according to the present invention.
Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. The embodiments of the accompanying drawings are merely preferred embodiments of the present invention in order to facilitate understanding of the present invention, and some of the elements may be exaggerated or omitted.
In Fig. 2, reference numeral 1 denotes a process chamber, 2 denotes an exhaust pump, 3 denotes a scrubber, and 10 denotes a waste gas pipe according to the present invention. The
The
The
1: process chamber, 2: exhaust pump, 3: scrubber, 4: 10: waste gas tube, 11: waste gas pipe body, 12: 13: protective layer, 14: surface of
Claims (2)
Priority Applications (1)
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KR1020150077986A KR20160142081A (en) | 2015-06-02 | 2015-06-02 | Pipe suitable for system of inhibiting waste gas agglutination reaction using magnetic field |
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KR1020150077986A KR20160142081A (en) | 2015-06-02 | 2015-06-02 | Pipe suitable for system of inhibiting waste gas agglutination reaction using magnetic field |
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KR20160142081A true KR20160142081A (en) | 2016-12-12 |
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KR1020150077986A KR20160142081A (en) | 2015-06-02 | 2015-06-02 | Pipe suitable for system of inhibiting waste gas agglutination reaction using magnetic field |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20200009499A (en) | 2018-07-19 | 2020-01-30 | 도창교 | Waste gas treatment system using magnetic field and arc plazma |
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2015
- 2015-06-02 KR KR1020150077986A patent/KR20160142081A/en unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20200009499A (en) | 2018-07-19 | 2020-01-30 | 도창교 | Waste gas treatment system using magnetic field and arc plazma |
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