KR20160116237A - Making method for antireflection film - Google Patents

Making method for antireflection film Download PDF

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Publication number
KR20160116237A
KR20160116237A KR1020150043243A KR20150043243A KR20160116237A KR 20160116237 A KR20160116237 A KR 20160116237A KR 1020150043243 A KR1020150043243 A KR 1020150043243A KR 20150043243 A KR20150043243 A KR 20150043243A KR 20160116237 A KR20160116237 A KR 20160116237A
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KR
South Korea
Prior art keywords
unit groove
groove
unit
antireflection
film
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KR1020150043243A
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Korean (ko)
Inventor
최기운
안치원
강일석
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한국과학기술원
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Priority to KR1020150043243A priority Critical patent/KR20160116237A/en
Publication of KR20160116237A publication Critical patent/KR20160116237A/en

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/045—Anodisation of aluminium or alloys based thereon for forming AAO templates
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/12—Anodising more than once, e.g. in different baths
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

According to the present invention, there is provided a method of producing an antireflection film having an antireflection groove, the method comprising: preparing an aluminum film; Anodizing the aluminum film to form a first unit groove; Performing anodization in a temperature atmosphere lower than the above-described step to form a second unit groove extending in depth on the first unit groove and a depth greater than that of the first unit groove; Expanding the diameter of the first unit groove and the second unit groove; Supplying an anodic oxidation liquid in a temperature atmosphere higher than the second unit groove forming step and intermittently supplying a voltage to the first unit groove and the second unit groove to supply the third unit groove to the third end, Forming a unit groove; And removing the aluminum layer; Wherein the third unit groove is formed by changing an intermittent time interval of voltage supply to adjust an inclination angle of an inner circumferential surface of the third unit groove.
According to the present invention, an antireflection groove having an inclined inner surface can be formed on the surface of an aluminum film by an anodic oxidation process, and when the antireflection groove is formed, the intermittent time interval of the voltage supply is changed to make the inner peripheral surface of the reflection ring groove convex So that it can be formed concavely.

Description

TECHNICAL FIELD [0001] The present invention relates to a method for manufacturing an antireflection film,

The present invention relates to a method of manufacturing an antireflection film, and more particularly, to a method of manufacturing an antireflection film capable of forming an antireflection groove whose inner circumferential surface is inclined on the surface of an aluminum film.

The antireflection film prevents the light incident from the outside from being reflected on the film surface, thereby increasing the use efficiency of the incident light.

The antireflection film has a structure in which a concave-convex structure called a Moth-Eye structure is formed on the surface, and is configured to effectively prevent reflection as the refractive index of air increases continuously from the refractive index of the material.

As a prior art for producing an antireflective film, Patent Publication No. 2014-39773 is disclosed,

The above-described prior art is a method of forming a nano structure for preventing reflection on the surface of a metal mold for lens fabrication.

In the above-described prior art, although the nano structure for antireflection has a predetermined depth of the groove having a predetermined width, the nanostructure has a problem that the depth of the groove is limited and the anti-reflection efficiency is limited to a certain extent .

An object of the present invention is to provide an antireflection film manufacturing method capable of forming an antireflection groove whose inner end face is inclined on the surface of an aluminum film by an anodic oxidation process .

Another object of the present invention is to provide an anti-reflection film manufacturing method for forming an inner circumferential surface of a reflection ring groove convex or concave by varying the intermittent time interval of voltage supply when forming an antireflection groove.

According to an aspect of the present invention, there is provided a method of manufacturing an antireflection film having an antireflection groove, the method comprising: preparing an aluminum film; Anodizing the aluminum film to form a first unit groove; Performing anodization in a temperature atmosphere lower than the above-described step to form a second unit groove extending in depth on the first unit groove and a depth greater than that of the first unit groove; Expanding the diameter of the first unit groove and the second unit groove; Supplying an anodic oxidation liquid in a temperature atmosphere higher than the second unit groove forming step and intermittently supplying a voltage to the first unit groove and the second unit groove to supply the third unit groove to the third end, Forming a unit groove; And removing the aluminum layer; Wherein the third unit groove is formed by changing an intermittent time interval of voltage supply to adjust an inclination angle of an inner circumferential surface of the third unit groove.

And expanding the diameter of the first unit groove.

The first unit grooves and the third unit grooves may be formed in an atmosphere of 20 to 80 캜.

The second unit grooves may be formed in a 0 ° C atmosphere.

In the step of forming the third unit grooves, the applied voltage may be 40V.

The inner circumferential surface of the third unit groove may be concave when the intermittent time interval of the voltage supply is increased and the inner circumferential surface of the third unit groove may be convex when the intermittent time interval of the voltage supply is decreased.

The present invention can realize an antireflection film having an antireflection efficiency improved by forming an antireflection groove having an inclined inner surface on the surface of an aluminum film by an anodic oxidation process.

Further, in the present invention, when the antireflection groove is formed, the interval between the interruptions of the voltage supply may be changed so that the inner circumferential surface of the reflection ring groove is convex or concave.

FIG. 1 is a flowchart showing a configuration of an anti-reflection film manufacturing method according to an embodiment of the present invention.
FIG. 2 is a view sequentially showing the production of an anti-reflection film according to the anti-reflection film manufacturing method shown in FIG.
3 is a cross-sectional view showing an example of the configuration of the third unit groove.
4 is a graph showing the change in the intermittency time interval of the voltage supply.
5 is a cross-sectional view showing an example of a configuration of an antireflection groove formed according to a change in intermittent time interval of the voltage shown in FIG.
6 is a cross-sectional view showing an example of the structure of the completed antireflection film.
7 is a cross-sectional view of the antireflection film shown in Fig.
8 is a graph showing the reflectance of the antireflection film shown in Figs. 6 and 7. Fig.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

FIG. 1 is a flowchart showing a configuration of an anti-reflection film manufacturing method according to an embodiment of the present invention.

Referring to FIG. 1, the method for fabricating an anti-reflection film according to the present invention includes preparing an aluminum film (S110), forming a first unit groove (S120), expanding a diameter of a first unit groove (S) A step (S) of forming a second unit groove, a step (S) of expanding the diameter, a step (S) of forming a third unit groove and a step (S) of removing the aluminum layer.

FIG. 2 is a view sequentially showing the production of an anti-reflection film according to the anti-reflection film manufacturing method shown in FIG.

The present invention will be described with reference to Figs. 1 and 2. Fig.

In the aluminum film preparation step (S110), the aluminum film (1), which is a raw material used in the production of the antireflection film, is prepared.

2 (a) is a sectional view of the aluminum film to be prepared. The aluminum film 1 to be prepared has a predetermined thickness required by the user, and a predetermined pattern can be formed on the surface. In addition, the aluminum film 1 to be prepared may be rolled up on a predetermined roll or may be spread on a flat plate according to the needs of the user.

In the step S120 of forming the first unit grooves, an anodic oxidation liquid is supplied to the aluminum film 1, and an anodic oxidation process is performed to form the first unit grooves 110A, . FIG. 2B shows that the first unit groove 110A is formed on the aluminum film 1. FIG. A plurality of first unit grooves 110A are formed on the surface of the aluminum film 1 and are spaced apart from each other by a predetermined distance.

The first unit groove 110A is formed with a predetermined depth and diameter. At this time, the diameter of the first unit groove 110A is uniform from the upper end to the lower end. The formation of the first unit grooves 110A is preferably performed in an atmosphere of 20 to 80 캜.

Step S130 of expanding the diameter of the first unit groove 110A expands the diameter of the first unit groove 110A formed in the step. 2 (c) shows that the diameter of the first unit groove 110A is expanded to a predetermined level.

The step of expanding the diameter of the first unit groove 110A (S130) may be performed by etching after supplying the etching liquid to the first unit groove 110A.

When the diameter of the first unit groove 110A formed at the time of initial formation of the first unit groove 110A is formed to a degree required by the user, the step of extending the diameter of the first unit groove 110A may be omitted.

In the step S140 of forming the second unit grooves, an anodic oxidation liquid is supplied to the first unit grooves 110A and an anodic oxidation process is performed for a predetermined time to form the second unit grooves 110A, Thereby forming unit grooves 110B.

2 (d) shows that the second unit groove 110B is formed on the inner bottom surface of the first unit groove 110A.

The formation of the second unit grooves 110B is performed in a 0 DEG C atmosphere. Here, since the forming temperature of the second unit grooves 110B is lower than the forming temperature of the first unit grooves 110A, the depth of the second unit grooves 110B can be extended more than the diameter of the second unit grooves 110B. The diameter of the second unit groove 110B is smaller than the diameter of the first unit groove 110A and the bottom surface of the second unit groove 110B extends downward from the center of the inner bottom surface of the first unit groove 110A do.

Here, since the degree of depth extension of the second unit groove 110B is proportional to the duration of the anodization, the user can set the anodization execution time according to the depth of the second unit groove 110B required.

Here, the diameter of the second unit groove 110B is uniform as a whole.

The step of expanding the diameter S150 expands the diameters of the first unit groove 110A and the second unit groove 110B formed in the step S150.

2 (e) shows that the diameters of the first unit groove 110A and the second unit groove 110B are expanded. It is preferable that the diameters of the first unit grooves 110A and the second unit grooves 110B are the same in a predetermined error range. In addition, the first unit groove 110A and the second unit groove 110B may be adjacent to each other by a diameter of the first unit groove 110A and the second unit groove 110B.

Here, the diameter of the first unit groove 110A and the second unit groove 110B may be enlarged by etching. The diameter expansion of the first unit grooves 110A and the second unit grooves 110B may be performed in a 35 DEG C atmosphere.

In the step of forming the third unit grooves S160, an anodic oxidation liquid is supplied to the first unit grooves 110A and the second unit grooves 110B and a voltage is applied to the end portions of the second unit grooves 110B, So that the third unit groove 110C is formed. At this time, the applied voltage is 40 V and is applied in an atmosphere of 20 to 80 캜.

2 (f) shows that the third unit groove 110C is formed on the bottom surface of the second unit groove 110B.

The formation of the third unit grooves 110C forms the antireflection grooves 110 including the first unit grooves 110A to the third unit grooves 110C.

The formation of the third unit groove 110C will be described in more detail.

And is formed continuously to an inner end portion of the second unit groove 110B of the third unit groove 110C. Since the third unit groove 110C has an inverted triangular cross section and an anodic oxidation is performed in a state where a predetermined voltage is intermittently applied, the diameter of the third unit groove 110C can be changed at a predetermined ratio. Here, the diameter of the third unit groove 110C is formed as follows.

3 is a cross-sectional view showing an example of a structure of an antireflection groove formed on an aluminum film.

Referring to FIG. 3, if a voltage of 40 V is applied constantly in a 35 ° C atmosphere, as shown in the figure, the third unit groove 110C has a diameter ranging from the end portion of the second unit groove 110B to the inner portion thereof It can be seen that it is reduced in a uniform ratio. Therefore, the third unit groove 110C has an inner circumferential surface at an angle from the inlet to the inner side.

Here, in order to improve the antireflection efficiency, it is necessary that the angle of the inner circumferential surface of the third unit groove 110C varies according to the region.

FIG. 4 is a graph showing the change in the intermittent time interval of the voltage supply, and FIG. 5 is a cross-sectional view showing an example of the structure of the antireflection groove formed according to the variation of the intermittent time interval of the voltage shown in FIG.

Referring to FIGS. 4 and 5, a voltage of 40 V is applied to form the third unit groove 110C, and the supply of the voltage is interrupted at predetermined time intervals to change the angle of the inner peripheral surface.

This will be described in more detail.

Fig. 4 (a) shows the application of the voltage at a constant time interval, and Fig. 4 (b) shows that the application time interval of the voltage gradually increases. 4 (c) shows that the application time interval of the voltage gradually decreases.

5A is a cross-sectional view showing the configuration of the third unit groove 110C formed when the intermittence time interval of the voltage supply is constant, as shown in FIG. 4A. The third unit groove 110C ) From the inlet to the inner side of the tube.

5B is a cross-sectional view showing the configuration of the third unit groove 110C formed when the intermittence time interval of the voltage supply is gradually increased as shown in FIG. 4B, and the third unit groove 110C, the inner circumferential surface of the groove from the entrance to the inner side has a concave shape.

5C is a cross-sectional view showing the configuration of the third unit groove 110C formed when the intermittence time interval of the voltage supply gradually decreases as shown in FIG. 4C. In the third unit groove 110C, 110C have a convex shape on the inner circumferential surface of the groove from the entrance to the inside of the groove.

1 and 2 will be referred to again.

The step of removing the aluminum layer (S170) may include a step of removing the portions remaining as aluminum without being converted into alumina by a process such as anodic oxidation during the process of forming the antireflection groove 110, Thereby obtaining a protective film.

2 (g) shows an example of the structure of the antireflection film in which the aluminum layer under the antireflection groove 110 is removed.

7 is a cross-sectional view showing an example of the structure of the completed antireflection film.

Referring to FIG. 7, it can be seen that the antireflection film 100 has a plurality of antireflection grooves, and the refractive index from the entrance to the inside of the antireflection groove changes from 1.0 to 1.77.

8 is a view showing an example of each part of the antireflection groove of the completed antireflection film.

Fig. 7A is a plan view of the antireflection groove, and Fig. 8B is a perspective view of the antireflection groove, showing the structure of the first unit groove.

Fig. 7 (c) shows an example of the configuration of the second unit grooves, and Fig. 7 (d) shows an example of the configuration of the third unit grooves.

8 is a cross-sectional view of the antireflection film shown in Fig. Referring to FIG. 8, it can be seen that a plurality of antireflection grooves are formed in the antireflection film.

8 is a graph showing the reflectance of the antireflection film shown in Figs. 6 and 7. Fig.

Referring to FIG. 8, the reflectance of the aluminum film (A) is 10%, but the antireflection film (B) according to the present invention has a reflectance of 0.1% or less Able to know.

According to the present invention, an antireflection groove having an inclined inner surface can be formed on the surface of an aluminum film by an anodic oxidation process, and when the antireflection groove is formed, the intermittent time interval of the voltage supply is changed to make the inner peripheral surface of the reflection ring groove convex So that it can be formed concavely.

While the present invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims. Accordingly, the true scope of the present invention should be determined by the technical idea of the appended claims.

1: Aluminum film
110: antireflection groove (including first unit groove and second unit groove)

Claims (6)

A method of manufacturing an antireflection film having an antireflection groove,
Preparing an aluminum film;
Anodizing the aluminum film to form a first unit groove;
Performing anodization in a temperature atmosphere lower than the above-described step to form a second unit groove extending in depth on the first unit groove and a depth greater than that of the first unit groove;
Expanding the diameter of the first unit groove and the second unit groove;
Supplying an anodic oxidation liquid in a temperature atmosphere higher than the second unit groove forming step and intermittently supplying a voltage to the first unit groove and the second unit groove to supply the third unit groove to the third end, Forming a unit groove; And
Removing the aluminum layer; Lt; / RTI >
Wherein the third unit groove is formed by changing the intermittent time interval of the voltage supply to adjust the inclination angle of the inner peripheral surface of the third unit groove. The method according to claim 1,
And expanding the diameter of the first unit groove. The method according to claim 1,
Wherein the first unit groove and the third unit groove are formed in an atmosphere of 20 to 80 캜. The method according to claim 1,
Wherein the second unit grooves are formed in an atmosphere of < RTI ID = 0.0 > 0 C. < / RTI > The method according to claim 1,
And the voltage applied in the step of forming the third unit grooves is 40V. 6. The method according to claim 1 or 5,
When the intermittent time interval of the voltage supply is increased, the inner peripheral surface of the third unit groove is concave,
Wherein an inner circumferential surface of the third unit groove is convexly formed when the intermittent time interval of the voltage supply is reduced.
KR1020150043243A 2015-03-27 2015-03-27 Making method for antireflection film KR20160116237A (en)

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KR1020150043243A KR20160116237A (en) 2015-03-27 2015-03-27 Making method for antireflection film

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KR20160116237A true KR20160116237A (en) 2016-10-07

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