KR20160081398A - View port and ingot growing apparatus including the same - Google Patents

Abstract

The present invention relates to a view port and an ingot growing apparatus comprising the same. The view port comprises: a body part communicated with an inner chamber; a first window arranged on the body part and transmitting lights inputted from the outside of the chamber; a window purge mounting the first window and forming an air curtain by using gas sprayed internally; and a second window disposed between the window purge and the body part and fixed by an intermediate structure. It is possible to prevent contamination sources from being deposited to the inner wall of the chamber and the first window as the flow of the sprayed gas is circulated easily in a lower portion of the first window, and the sprayed gas is concentrated to be discharged into the inner chamber through the second window.

Description

VIEW PORT AND INGOT GROWING APPARATUS INCLUDING THE SAME

An embodiment relates to a view pot and an ingot growing apparatus including the same.

In general, a silicon single crystal ingot to be a material of a wafer is manufactured by the Czochralski method (CZ method). The CZ method is a method in which silicon is put into a quartz crucible and the quartz crucible is heated to melt the silicon and then the seed crystal is brought into contact with the silicon melt to solidify the melt on the surface of the seed crystal, It means a method of growing an ingot.

The apparatus for growing such an ingot is configured inside the chamber, and the chamber provided a space in which predetermined processes for growing an ingot for a wafer used as an electronic component material such as a semiconductor are performed.

In addition, since the chamber is sealed to prevent inflow of contaminants and to maintain an inner atmosphere, the chamber includes a separate view port for observing the ingot growing inside the chamber and the view port. In addition, To measure process data such as the diameter of the ingot and the melt gap.

Accurate measurement of process data using these measurement sensors is an important factor in determining the quality of the ingot.

However, a large amount of gas or vaporized oxide particles generated inside the chamber, along with the chamber inner wall, is deposited on the viewport glass (window), thereby providing a cause of contamination of the chamber inner wall and the view port glass, There is a problem that accurate process data can not be obtained due to contamination.

The embodiment provides a view port capable of preventing a contamination deposition phenomenon entering the view port glass and an ingot growing apparatus including the same.

The embodiment includes a body portion communicating with the interior of the chamber; A first window disposed on the body and allowing light to flow outside the chamber; Window purging to seat the first window and form an air curtain using the gas injected into the interior; And a second window disposed between the window purging and the body and fixed by an intermediate structure; As shown in FIG.

The first window including a window body coupled to an upper portion of the window purge; And a first glass inserted into the window body; . ≪ / RTI >

The second window is a second glass that is seated on the intermediate structure; And a gas concentration pipe vertically disposed on the second glass; . ≪ / RTI >

The surface of the gas concentration pipe may be blasted.

The lower surface of the glass toward the chamber and the outer surface of the gas concentration tube may be blasted.

The gas concentration pipe is disposed to be offset in one direction from the center of the second window, and the one direction may be the maximum width direction of the window.

The center of the gas concentration pipe may be disposed at a distance of 20 mm to 25 mm from the center of the second window in the one direction.

The second window has a 'T' shape, and the horizontal cross section of the gas concentration pipe may have a rectangular shape.

The height of the gas concentration pipe perpendicular to the second glass may be 30 mm to 50 mm.

The maximum width of the gas concentration pipe may be 40 mm to 60 mm.

The gas concentration pipe may have a thickness of 2.5 mm to 3.5 mm.

The intermediate structure may be flanged to the body portion and the second window may be flanged to the intermediate structure.

A purge body coupled to the upper side of the intermediate structure to spread the window; And a gas spraying part for spraying gas from one side of the purge body to form an air curtain; . ≪ / RTI >

The intermediate structure and the purge body, and the intermediate structure and the second window may be fastened with an O-ring or an O-ring inserted therebetween, respectively.

The gas injection unit may include a gas nozzle that adjusts the direction of gas injection.

Wherein the purge body comprises: a gas guide portion serving as a passage for gas supplied from the gas spray portion; And a plurality of gas ejection openings disposed between the gas guide and the purge body for ejecting the moved gas; . ≪ / RTI >

The gas outlet may have a shape extending in the transverse direction such that the gas is injected in a wide area.

A slanting jaw that resists the injected gas of the window spreading; As shown in FIG.

Another embodiment includes a chamber; A quartz crucible disposed within the chamber and containing a silicon melt; A pulling means for immersing the seed in the silicon melt and rotating and pulling the seed to grow the ingot; And a view port of the above-described embodiment disposed at one side of the chamber; The ingot growing apparatus comprising:

A sensor unit for measuring the diameter of the ingot through the view port in the embodiment of the ingot growing apparatus; As shown in FIG.

The quartz crucible may contain the silicon melt containing antimony (Sb) as a dopant.

The view port of the embodiment and the ingot growing apparatus including the same can circulate the gas flow injected from the window purging smoothly in the lower portion of the first window including the first window and the second window, And it is also effective to suppress the deposition of contaminants on the inner wall of the chamber and the first window by discharging the injected gas.

Thus, it is possible to clearly observe the ingot growing inside the chamber by using the view port of the embodiment and the ingot growing apparatus including the same, and accurately measure the process data in the chamber such as the diameter of the ingot to be grown, To determine ingot growth process conditions to produce high quality ingots and provide advantages not limited to equipment run time.

1 is a schematic diagram illustrating an ingot growing apparatus 1000 according to an embodiment,
2 is a more detailed view of structure A of view port 100 according to one embodiment,
3 is a perspective view illustrating the structure of the second window 140 of the view port 100 according to an exemplary embodiment of the present invention,
4 is a cross-sectional view illustrating the structure of the second window 140 of the view port 100 according to an exemplary embodiment of the present invention,
5 is a plan view of a view port 100 including a window purge 130 according to an embodiment,
6 is a perspective view illustrating window purge 130 according to one embodiment in more detail,
7 is a cutaway perspective view showing a state in which the window purge 130 according to the embodiment is cut,
8 is an exploded perspective view illustrating a window purge 130 according to an exemplary embodiment of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings in order to facilitate understanding of the present invention. However, the embodiments according to the present invention can be modified into various other forms, and the scope of the present invention should not be construed as being limited to the embodiments described below. Embodiments of the invention are provided to more fully describe the present invention to those skilled in the art.

In the description of the embodiment according to the present invention, in the case of being described as being formed "on or under" of each element, the upper (upper) or lower (lower) or under are all such that two elements are in direct contact with each other or one or more other elements are indirectly formed between the two elements. Also, when expressed as "on or under", it may include not only an upward direction but also a downward direction with respect to one element.

The thickness and size of each layer in the drawings are exaggerated, omitted, or schematically shown for convenience and clarity of explanation. Also, the size of each component does not entirely reflect the actual size.

FIG. 1 is a schematic diagram illustrating an ingot growing apparatus 1000 according to an embodiment.

1, an ingot growing apparatus 1000 according to an embodiment includes a chamber 10, a quartz crucible 20, a heater 30, a lifting means (not shown), a heat shield 40, A seed chuck 70, a view port 100, and a sensor unit 200, as shown in FIG.

In the ingot growing apparatus of one embodiment, the chamber 10 provides a space in which predetermined processes for growing a wafer ingot used as an electronic component material such as a semiconductor are performed. Such a chamber 10 can be kept sealed to prevent contaminant inflow and maintain an internal atmosphere.

Next, the quartz crucible 20 according to the present invention is provided inside the chamber 10 to receive the silicon melt S.

1, the heater 30 can heat the quartz crucible 20 to melt the silicon when the silicon melt described above is accommodated in the quartz crucible 20. In the case of the ingot growth apparatus shown in Fig.

In this case, the heater 30 may cause the melt to solidify on the surface of the seed crystal by melting the silicon, then gradually raising the seed crystal while rotating the seed crystal in contact with the silicon melt. Thereby allowing an ingot having a predetermined diameter to grow in the chamber 10.

The seed chuck 70 can be fixed to a seed for pulling the ingot in contact with the silicon melt. In addition, the lifting means can serve to raise and lower the seed chuck 70.

The heat shield 40 forms a silicon melt and a melt gap (M / G) on the quartz crucible 20.

In addition, the inert gas injection unit 50 can control the flow and the atmosphere of the inert gas by supplying an inert gas such as Ar gas into the chamber 10.

1, the view port 100 is provided at one side of the chamber 10 to allow light from the outside to pass therethrough to allow ingot growth progressing inside the chamber 10 to be visually observed .

In addition, the sensor unit 200 shown in FIG. 1 can measure the state of the growing process of the ingot through the view port 100 described above. At this time, if the process conditions such as the ingot diameter are measured and output as raw data, the process conditions such as the pulling rate are determined based on the process data. Therefore, accurate process data measurement has a great influence on the quality of the grown ingot Lt; / RTI >

In particular, whether or not the diameter of the ingot is uniform during the progress of the ingot growing process is an important factor for determining the quality of the ingot. Therefore, it is necessary to precisely measure the diameter of the ingot growing through the view port 100, have.

As the sensor unit 200 for measuring the diameter of the ingot, various sensors such as an infrared sensor (IR sensor), a CCD camera or a pyrometer can be used. The output process data is analyzed to change the pulling rate (P / S) An Automatic Diameter Control (ADC) sensor may be used as a control unit for controlling the diameter of the ingot.

The window provided in the view port 110 may be opaquely contaminated during the progress of the ingot growing process.

For example, during the process of growing an ingot in a silicon melt containing an antimony (Sb) dopant, the vaporized antimony is adsorbed on the window, and the window 110 is contaminated to such an extent that the inside of the chamber 10 can not be observed at all .

Hereinafter, the structure of the view port 100 included in the above-described ingot growing apparatus will be described in more detail.

The view port 100 according to one embodiment may include a plurality of vanes (not shown) to suppress the rise of contaminants and smooth the gas flow in the interior of the chamber 10 so that the source of contamination containing the vaporized antimony or oxide particles, For example, a first window 120, a second window 140, and the like.

Figure 2 is a more detailed view of structure (A) of view port 100 according to one embodiment.

Referring to FIG. 2, the view port 100 of one embodiment includes a body 110, a first window 120, a window purge 130, and a second window 140.

The body 110 according to one embodiment may be configured as a cylindrical tube which is disposed at one side of the chamber 10, for example, at an upper side of the chamber, and communicates with the interior of the chamber to observe the process status therein.

For example, it may have a cylindrical tube structure extending upward from the upper portion of the chamber 10 and having an inner diameter of about 45 cm so as to be able to face a meniscus at the point where the surface of the silicon melt and the ingot to be grown meet. have.

The body 110 may have a window hole on the upper side thereof and may include a first window 120 through which light can pass.

The first window 120 can transmit light entering from outside the chamber.

That is, in the embodiment of FIG. 2, the first window 120 includes a window body 122 coupled to the window purge 130 to be described later, and a first glass (e.g., 121).

At this time, the first glass 121 may be made of various materials capable of transmitting light as well as glass, for example, a quartz glass which is resistant to heat and does not contaminate the ingot.

Referring to FIG. 2, the view port 100 of the embodiment includes a window purge 100 for spraying an inert gas to prevent contaminants from approaching the first window 120 between the body 110 and the first window 120, (130, window purge). At this time, the injected inert gas may be argon (Ar) gas.

The window purge 130 in the embodiment includes a purge body 132 and a purge body 132 disposed on one side of the purge body 132 to seat the first window 120 described above and to be coupled to the intermediate structure 141 to be described later And a gas jetting unit 131.

The gas injection part 131 prevents the contaminants from flowing into the first glass 121 by injecting the inert gas into the lower side of the first glass 121 of the first window 120, The air curtain can be formed so as to be disconnected from the air directed to the first window 120. [

As described above, the gas spraying unit 131 for spraying the inert gas may remove the contaminants adsorbed in the first glass 121 by injecting gas toward the first glass 121 by adjusting the angle of the nozzle .

A second window 140 may be disposed under the window purge 130.

The second window 140 may be disposed between the window purge 130 and the body portion 110 via the intermediate structure 141. In this case,

The second window 140 can concentrate the inert gas supplied from the window purge 130 and discharge the gas toward the chamber 10.

The second window 140 in the view port of the embodiment includes a second glass 142 that is seated in the intermediate structure 141 and a gas concentration tube 143 that is vertically connected and arranged in the second glass 142 can do.

In this case, the vertical direction may be one direction perpendicular to the horizontal plane of the second glass 142.

The second glass 142 of the second window can physically block impurities entering the first window 120 from the chamber.

In addition, the gas concentration tube 143 of the second window may allow the inert gas injected from the gas injection part 131 of the window purge 130 to form an air curtain while at the same time allowing inert gas to flow toward the chamber .

At this time, the second glass 142 and the gas concentration tube 143 may be made of quartz glass in the same manner as the first glass 121 of the first window 120 described above, but the material of the second window 140 is But is not limited thereto.

The surface of the second window 140 may be blasted.

For example, the outer surface of the second window 140 may be sandblasted to prevent scattering of light transmitted through the first window 120.

In addition, the outer surface of the gas concentration tube 143 of the second window, that is, the outer surface facing the non-interior chamber, which is the discharge pipe of the inert gas, may be a blasted surface.

At this time, when the diameter of the ingot is sensed from the outside of the chamber through the view port by blasting the surface of the gas concentration tube 143, light scattering on the surface of the gas concentration tube 143 can be suppressed as much as possible, Errors, for example errors in measuring the diameter of the ingot, can be minimized.

The inner surface of the gas concentration tube 143 may be blasted as well as the outer surface of the gas concentration tube 143. The second glass 142 of the second window 140 may also be blasted. By blasting the surface of the second glass 142, measurement errors due to light scattering can be minimized as described above.

The second window 140 may be seated on the intermediate structure 141 coupled to the flange part of the body part 110 and may be flanged to the intermediate structure 141.

At this time, the intermediate structure 141 may be flanged to the purge body 132 of the window purge 130 as well as to be flanged by seating the second window 140.

In this case, an O-ring 150 or an insertion-type O-ring 160 is inserted between the intermediate structure 141 and the purge body 132 and between the intermediate structure 141 and the second window 140, By the flange coupling, the hole of the view port 100 can be completely closed to maintain the sealed state of the chamber 10.

However, it goes without saying that the O-ring 150 or the O-ring 160 may have various shapes.

The window purge 130, the intermediate structure 141, and the body 110 are provided with screw grooves, and the bolts 180 are fastened to the screw holes. Thus, the window purge 130, the intermediate medium 141, And the portions 110 can be firmly fixed and coupled.

2, the bolt 180 may be inserted through the window body 122 of the first window, the window purge 130, the intermediate structure 141, and the first window 120, To the intermediate structure 141 on which the first glass 130 and the second glass 132 are seated.

2, the bolts 180 are disposed on only one side of the view port 100. However, the present invention is not limited thereto, and at least one or more bolts 180 may be further disposed.

2, the purge body 132 of the window purge and the intermediate structure 141 of the second window may have protruding portions in the radial direction, and the protruded portions may be coupled to each other by the bolts 180a .

The second window 140 can be coupled with other configurations of the view port by fastening the bolts 180 and 180a and can be easily replaced by disassembling the bolts 180 and 180a.

In addition, as described above, flanges are coupled between the respective components, but it is needless to say that they have various fastening structures.

By including the second window 140 configuration, the view port of one embodiment can prevent glass contamination of the first window 120, allowing accurate observation and measurement of process conditions within the chamber, It is possible to produce high quality ingots by controlling process conditions.

The second window 140 may be coupled to the intermediate structure 141 and may be included in the view port to facilitate detachment of the second window 140 and thus facilitate cleaning or replacement when the second window 140 is contaminated .

Meanwhile, the view port 100 according to one embodiment may be formed to be inclined at an oblique angle to direct the meniscus. In order to form an effective air curtain on the inclined view port 100, gas may be injected from the upper portion of the view port 100 to the lower portion of the view port 100.

Since the flow of the inert gas in the chamber 10 flows from the upper chamber to the lower chamber in which the ingot grows, the gas jetting portion 131 does not interfere with the flow of the gas, The gas can be injected to the lower part of the chamber.

In this case, the inert gas can be smoothly circulated in the view port 100, and the inert gas circulated to the gas concentration pipe 143 of the second window 140 can be concentrated more reliably toward the chamber 10 Can be discharged.

In the view port of the embodiment, when the gas concentration pipe 143 is discharged into the chamber 10 through the concentration of the inert gas, the existing gas flow (for example, Ar gas) existing in the chamber has a cell shape It is possible to suppress the deposition of the contamination source on the inner wall of the chamber 10 or to remove the deposited source by making the gas flow flowing inside the chamber 10 more smooth.

3 is a perspective view illustrating the structure of the second window 140 of the view port 100 according to an exemplary embodiment of the present invention and FIG. 4 is a sectional view of the second window 140 of the view port 100 as viewed from above .

As shown, the second window 140 of the view port 100 according to an exemplary embodiment of the present invention includes a first glass 142 and a second glass 142 on one horizontal side of the second glass 142, for example, And a gas concentration tube 143 formed to be connected thereto.

The gas concentration tube 143 may be disposed biased in one direction from the center of the second window. At this time, one direction may be the maximum width direction of the second window.

4, the center O1 of the gas concentration tube 143 may be spaced away from the center O2 of the second window in one direction, and between the two centers O1 and O2 in FIG. The spacing can be X.

At this time, the spaced distance X may be 20 mm to 25 mm.

When the spacing distance is out of the range of 20 mm to 25 mm, the second window 140 may cause an interference phenomenon when measuring the ingot diameter in the sensor unit 200.

Referring to FIG. 3, the second glass 142 included in the second window may have a shape having a curved surface on both sides facing each other with a width and a width different from each other and a wide width between the width and the width.

The second window 140 may be made of quartz glass.

At this time, the thickness t of the second glass 142 may range from 0.1 mm to 20 mm. If the thickness of the second glass 142 is less than 0.1 mm, the processing of the second glass may be difficult and the strength may not be ensured. Also, the thickness t may be less than or equal to 20 mm so that light passing through the first window 120 can be transmitted again.

In addition, the gas concentration tube 143 may be disposed in communication with the second glass 142 to have a rectangular shape.

Referring to FIG. 3, the horizontal cross section of the gas concentration tube 143 in the view port of one embodiment may have a rectangular shape.

However, the shape of the gas concentration tube 143 is not limited to the embodiment shown in the drawings, and may have various shapes.

Referring to FIG. 3, the second window 140 including the second glass 142 and the gas concentration tube 143 may have a 'T' shape when viewed from the side. In this second window 140 of the " T " shape, the gas concentration tube 143 may have a height H of 30 mm to 50 mm with respect to the second glass 142.

Further, in the embodiment of FIG. 3, the maximum width L of the gas concentration pipe 143 may be 40 mm to 60 mm. At this time, the maximum width of the gas concentration pipe may be the moving range of the sensor unit (200 in FIG. 1) disposed outside the chamber.

3, the gas concentration tube 143 is positioned at a distance of 40 to 50 mm from the right end of the second glass 142 in the left direction (S1), and the second glass 142 (S2) at a distance of 30 mm to 38 mm in the downward direction. Which may be formed to coincide with the sensing range of the sensor unit 200.

Further, in the embodiment shown in FIG. 3, the gas concentration tube 143 may be manufactured with a thickness T of 2.5 mm to 3.5 mm. If the thickness (T) is less than 2.5 mm, scattering of light may occur, and if the thickness is less than 3.5 mm, the manufacturing cost may be reduced.

FIG. 5 is a plan view of a view port 100 including a window purge 130 according to an exemplary embodiment. FIG. 6 is a perspective view illustrating a window purge 130 according to an exemplary embodiment in more detail. 7 is a cross-sectional perspective view illustrating a state in which the window purge 130 according to an embodiment is cut.

As shown, the view port 100 according to an embodiment may further include a gas supply unit 170 to supply gas to the gas injection unit 131. The gas supply unit 170 may be connected to the gas injection unit 131 through the gas line 171 to supply the inert gas.

At this time, a gas valve 172 and a gas flow meter are installed in the gas line 171 to control the supply pressure and the flow rate of the injected gas, thereby controlling the proper gas supply pressure and the total gas flow rate You may.

For example, argon gas (Ar gas) may be used as an inert gas to be injected from the window purge 130, and a supply pressure of argon gas may be formed between 2.5 kg / cm 2 and 2.8 kg / cm 2. And, the total injected gas flow rate may be less than 20 lpm.

The gas purifier 170 may be separately configured to supply the gas to the window purge 130. However, for the sake of convenience, the line for supplying the inert gas to the inert gas injecting unit 50 is branched to the gas purge line 170 ).

In this case, the window purge 130 according to the embodiment is formed as a flange. Inside the purge body 132 forming the flange, a gas guide 133 (see FIG. 1), which is a passage through which the gas supplied from the gas supply unit 170 is moved, And a gas jet port 134 for jetting the moved gas between the gas guide 133 and the purge body 132. [

When the gas injecting section 131 supplies the gas from one side of the purge body 132 to the inside thereof, the supplied gas moves to the gas jetting port 134 along the gas guiding section 133, whereby the gas jetting port 134 The gas can be ejected to form an air curtain.

That is, when the gas injection port 134 is formed at a position where the gas is to be injected in the purge body 132 and the gas injection port 131 and the gas injection port 134 are connected through the gas guide part 133, The gas can be injected at a desired position irrespective of the position at which the gasket 131 supplies gas.

In other words, in the embodiment, the window purge 130 is provided in the lower purge body 132 of the view port 100, and the gas jet port 134 is provided on the upper side of the view port 100 The gas injection unit 131 and the gas injection port 134 may be connected to each other through the gas guide unit 133 formed along the purge body 132. [

Due to such a structure, the gas injected from the lower side of the view port 100 can be moved along the gas guide portion 133 and injected toward the upper side of the view port 100. [ In this case, in order to increase the area of the air curtain, a plurality of gas outlets 134 may be formed. Alternatively, the gas outlets 134 may be formed in a shape extending in the transverse direction.

In this embodiment, the contamination of the glass 121 of the first window 120 can be prevented, and at the same time, the gas concentration of the second window 140 can be prevented from being caused by the structure of the window purge 130 forming the air curtain, Lt; RTI ID = 0.0 > 143 < / RTI >

8 is an exploded perspective view illustrating the window purge 130 according to an embodiment of the present invention.

Referring to FIG. 8, the window purge 130 according to one embodiment may be a modification of the structure of the window purge 130 in the embodiment described above with reference to FIG. Hereinafter, the same elements as those of the above-described embodiment will be described again. However, the same parts as those of the window purging 130 of the above-described embodiment are also applied to the following embodiments.

The window purge 130 according to an embodiment further includes a tilted jaw 135 that resigns gas injected between the gas jet port 134 and the lower surface of the glass 121 provided in the first window 120 .

When the inclined jaw 135 is provided, the gas ejected from the gas ejection port 134 is resigned through the inclined jaw 135, so that the lower horizontal surface of the glass 121 provided in the first window 120 So that the air curtain can be uniformly and densely formed.

More specifically, the window purge 130 embodiment shown in FIG. 8 may include a first window purge 130a for injecting gas and a second window purge 130b coupled to a lower surface thereof.

At this time, the first window purge 130a includes a gas spraying part 131 for supplying gas, a gas guide part 133 for guiding the supplied gas, a gas spouting part 134 for spraying the guided gas in the vertical direction, And an inclined jaw 135 that resigns the gas.

 The second window purge 130b is coupled to the lower surface of the first window purge 130a so that the gas ejected from the inclined jaw 135 is spaced apart from the inclined jaw 135 by a predetermined distance, So that it can be sprayed to the lower side of the glass 121.

Accordingly, the gas ejected in the vertical direction from the gas ejection port 134 is injected into the body of the second window purge 130b at a predetermined interval between the inclined jaw 135 and the body, and then injected to form a dense and uniform Thereby forming an air curtain. Thus, it is possible to more effectively prevent contamination on the lower surface of the glass 121 of the first window 120. [

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, It will be understood that various modifications and applications are possible. For example, each component specifically shown in the embodiments can be modified and implemented. It is to be understood that all changes and modifications that come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein.

1000: Ingot growth apparatus 10: Chamber
20: quartz crucible 30: heater
40: heat shield 50: inert gas injection part
60: water cooling tube 70: seed chuck
100: view port 200: sensor unit
110: Body part 120: First window
121: first glass 122: window body
130: Window purge 131:
132: purge body 133: gas guide part
134: gas outlet 135: inclined jaw
140: second window 141: intermediate structure
142: second glass 143: gas concentration tube
150: O-ring 160: Insertion type O-ring
170: gas supply unit 171: gas line
172: gas valve 180, 180a: bolt

Claims (21)

A body portion communicating with the interior of the chamber;
A first window disposed on the body and allowing light to flow outside the chamber;
Window purging to seat the first window and form an air curtain using the gas injected into the interior; And
And a second window disposed between the window purging and the body part and fixed by an intermediate structure. 2. The apparatus of claim 1, wherein the first window is a window body coupled to an upper portion of the window purging; And
A first glass inserted into the window body; A viewport containing. 2. The apparatus of claim 1, wherein the second window comprises: a second glass seated on the intermediate structure; And
A gas concentration pipe vertically connected to the second glass; A viewport containing. 4. The view port according to claim 3, wherein the surface of the gas concentration tube is blasted. 4. The view port according to claim 3, wherein the lower surface of the second glass toward the chamber and the outer surface of the gas concentration tube are blasted. [5] The apparatus of claim 3, wherein the gas concentration tube is biased in one direction from the center of the second window,
Wherein the one direction is a maximum width direction of the window. The view port according to claim 6, wherein the center of the gas concentration pipe is disposed at a distance of 20 mm to 25 mm from the center of the second window in the one direction. The method of claim 3,
The second window has a 'T' shape,
Wherein the horizontal cross section of the gas concentration pipe has a rectangular shape. The method of claim 3,
And the height of the gas concentration pipe perpendicular to the second glass is 30 mm to 50 mm. The view port according to claim 3, wherein the maximum width of the gas concentration pipe is 40 mm to 60 mm. 4. The view port according to claim 3, wherein the gas concentration pipe has a thickness of 2.5 mm to 3.5 mm. The method according to claim 1,
Wherein the intermediate structure is flanged to the body portion,
And the second window is flanged to the intermediate structure. 13. The method of claim 12,
A purge body coupled to the upper side of the intermediate structure to spread the window; And
A gas spraying part for spraying gas from one side of the purge body to form an air curtain; A viewport containing. 14. The method of claim 13,
Between the intermediate structure and the purge body and between the intermediate structure and the second window
View port which is fastened with O-ring or O-ring inserted. 14. The method of claim 13,
Wherein the gas injection portion includes a gas nozzle for regulating an injection direction of the gas. 14. The method of claim 13,
Wherein the purge body comprises: a gas guide portion serving as a passage for gas supplied from the gas spray portion; And
A plurality of gas ejection openings disposed between the gas guide and the purge body for ejecting the moved gas; A viewport containing. 17. The method of claim 16,
Wherein the gas jetting port has a shape extending in the transverse direction so that the gas is jetted over a large area. 14. The method of claim 13,
A slanting jaw that resists the injected gas of the window spreading; A viewport that further includes a viewport. chamber;
A quartz crucible disposed within the chamber and containing a silicon melt;
A pulling means for immersing the seed in the silicon melt and rotating and pulling the seed to grow the ingot; And
18. The ingot growing apparatus according to any one of claims 1 to 17, wherein the view port is disposed at one side of the chamber. 20. The method of claim 19,
And a sensor unit for measuring the diameter of the ingot through the view port. 20. The method of claim 19,
In the quartz crucible,
An ingot growing apparatus for accommodating the silicon melt containing antimony (Sb) as a dopant.

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