KR20160074781A - Method of manufacturing a photo-functional pattern structure using a photo-interruption material - Google Patents

Abstract

A method for manufacturing a photo-functional pattern using a selective photo-interrupting material comprises the following steps: forming a photo-interrupting layer capable of interrupting non-visible light on a substrate; and forming a functional pattern having an uneven part to scatter or transmit visible light on the photo-interrupting layer.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a photo-

The present invention relates to a method of fabricating a photonic functional pattern structure using a selective light blocking material, and more particularly, to a method of fabricating a photonic functional pattern structure using a selective light blocking material selectively blocking light by wavelength band.

Organic devices such as organic solar cells, organic light emitting devices, and dye-sensitized solar cells have been actively studied.

Organic devices are problematic in that the efficiency is lowered due to ultraviolet / near infrared exposure, which shortens the lifetime of the device. In addition, organic devices have difficulties in commercialization due to their relatively low efficiency compared with inorganic-based devices. Therefore, in order to improve the efficiency of an organic device based on an organic material, the insertion of a photo-functional pattern layer is essential.

Therefore, there is a need for research to easily manufacture a light-shielding film pattern structure capable of suppressing exposure to light in an invisible light area such as ultraviolet / near-infrared light, which shortens the lifetime of the organic device, .

SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and it is an object of the present invention to provide a method of fabricating an optical functional pattern structure using a selective light blocking material capable of simultaneously blocking light in an invisible light region and improving optical functionality will be.

According to another aspect of the present invention, there is provided a method of fabricating a patterned optical functional structure using a selective light blocking material, the method comprising: forming a light blocking layer on the substrate to block light in an invisible light region; Thereby forming a functional pattern in which irregularities are formed so as to scatter or transmit light in the light ray region.

In one embodiment of the present invention, the light shielding film and the functional pattern may be made of the same material.

Here, in order to form the light shielding film and the functional pattern, a preliminary light shielding film may be formed on the substrate, and a part of the preliminary light shielding film may be patterned to convert into a functional pattern and a remaining part of the preliminary light shielding film may be formed as the light shielding film .

Here, the pre-light shielding film may include at least one selected from the group consisting of titanium oxide, zirconium oxide, iron oxide, tungsten oxide, cerium oxide, antimony oxide and zinc oxide dispersed in the polymer organic material and the polymer organic material Metal oxide nanoparticles.

Further, in order to form the functional pattern and the light shielding film, a nanoimprint lithography process using a stamp having a shape corresponding to the irregularities may be performed.

In order to form the functional pattern and the light shielding film, an imprint process may be performed to supply a light shielding material on the mold having a shape corresponding to the irregularities.

In one embodiment of the present invention, the functional pattern may be formed using a material having hydrophobicity or hardness.

According to another aspect of the present invention, there is provided a method for fabricating a photo-functional pattern structure using a selective light blocking material, comprising: providing a functional resin on a recessed polymer mold to form a first functional pattern having recesses and protrusions; Thereby transferring the first functional pattern onto the substrate. Thereafter, a light shielding material for blocking light in an invisible light region is supplied on the first functional pattern to form a second functional pattern and a light shielding film on the one functional pattern.

In the above-described case, a functional pattern for effectively scattering or transmitting light in a visible light region while shielding light in an invisible light region can be realized. When the optical functional pattern structure using the selective light blocking material is applied to an organic device, the lifetime of the device can be increased and the optical characteristics can be improved at the same time. Further, the optical functional pattern structure using the selective light blocking material is additionally provided with the high hardness property or the hydrophobic property, so that the optical functional pattern structure using the selective light blocking material having a complex function can be formed.

1 is a cross-sectional view illustrating a method of fabricating a photo-functional pattern structure using a selective light blocking material according to an embodiment of the present invention.
2 is a cross-sectional view illustrating a method of fabricating a photo-functional pattern structure using a selective light blocking material according to an embodiment of the present invention.
3 is a cross-sectional view illustrating a method of fabricating a photo-functional pattern structure using a selective light blocking material according to an embodiment of the present invention.
4 is a cross-sectional view illustrating a method of fabricating a photo-functional pattern structure using a selective light blocking material according to an embodiment of the present invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. The present invention is capable of various modifications and various forms, and specific embodiments are illustrated in the drawings and described in detail in the text. It should be understood, however, that the invention is not intended to be limited to the particular forms disclosed, but includes all modifications, equivalents, and alternatives falling within the spirit and scope of the invention. In the accompanying drawings, the sizes and the quantities of objects are shown enlarged or reduced from the actual size for the sake of clarity of the present invention.

The terms first, second, etc. may be used to describe various components, but the components should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, the first component may be referred to as a second component, and similarly, the second component may also be referred to as a first component.

The terminology used in this application is used only to describe a specific embodiment and is not intended to limit the invention. The singular expressions include plural expressions unless the context clearly dictates otherwise. In the present application, the terms "comprise", "comprising", and the like are intended to specify that there is a feature, step, function, element, or combination of features disclosed in the specification, Quot; or " an " or < / RTI > combinations thereof.

On the other hand, unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. Terms such as those defined in commonly used dictionaries are to be interpreted as having a meaning consistent with the contextual meaning of the related art and are to be interpreted as either ideal or overly formal in the sense of the present application Do not.

Fabrication of Photo Functional Pattern Structure Using Selective Light Blocking Material

1 is a cross-sectional view illustrating a method of fabricating a photo-functional pattern structure using a selective light blocking material according to an embodiment of the present invention.

Referring to FIG. 1, in a method of fabricating an optically functional pattern structure using a selective light blocking material according to an embodiment of the present invention, a light blocking material is supplied on a substrate to form a preliminary light blocking layer.

The substrate may include a glass substrate, a sapphire substrate, or the like.

In one embodiment of the present invention, the preliminary light blocking layer may be formed of a light blocking material including a polymer material in which nanoparticles are dispersed. The nanoparticles may include titanium oxide, tin oxide, zinc oxide, iron oxide, cerium oxide, antimony oxide, or zirconium oxide. At this time, the preliminary light blocking layer can maintain a viscosity higher than a certain level. The refractive index of the preliminary light blocking layer can be controlled according to the dispersion amount of the nanoparticles. Thus, the wavelength range of the light blocked by the subsequently formed light blocking layer can be adjusted, so that the light in the non-visible light region can be selectively filtered. . For example, as the dispersion amount of the nanopatactile increases, the preliminary light blocking layer has an increased refractive index, so that the light blocking efficiency can be increased. Alternatively, the preliminary light blocking layer may be formed of an inorganic material in which nanoparticles are dispersed.

Thereafter, the preliminary light blocking layer is pressed with a stamp having a concavo-convex shape to form a functional pattern having irregularities thereon by the concavo-convex shape. At this time, the preliminary light blocking layer is cured by heat or ultraviolet light, and a light blocking layer is formed under the preliminary light blocking layer. Therefore, the photo-functional pattern having irregularities on the substrate can be formed on the substrate. Thus, a light blocking layer and a functional pattern can be formed through a nanoimprint lithography process.

The irregularities may have various shapes such as a circular columnar shape, a conical shape, a polygonal columnar shape, a stripe shape, and the like. Further, in order to increase the light scattering effect, the arrangement of the irregularities can be made random.

Then, by removing the stamp from the photo-functional pattern, a photo-functional pattern structure in which the light-blocking layer and the functional pattern are sequentially laminated on the substrate can be manufactured. Whereby a light blocking layer and a functional pattern can be formed on the substrate using the same material.

In one embodiment of the present invention, the preliminary light blocking layer may have a film form. In this case, the preliminary light blocking layer may be switched to the light blocking layer and the functional layer pattern through a hot embossing process using a stamp for the preliminary light blocking layer in the film form. The temperature of the embossing process may be higher than the transition temperature of the material forming the preliminary light blocking layer.

2 is a cross-sectional view illustrating a method of fabricating a photo-functional pattern structure using a selective light blocking material according to an embodiment of the present invention.

Referring to FIG. 2, a light blocking material is supplied onto a mold having concave and convex portions to form a preliminary light blocking film on the mold.

The preliminary light shielding film may be formed through a spin coating process.

The preliminary light blocking layer may be formed of a polymer material in which nanoparticles are dispersed. The nanoparticles may include titanium oxide, tin oxide, zinc oxide, iron oxide, cerium oxide, antimony oxide, or zirconium oxide. At this time, the preliminary light blocking layer can maintain a viscosity higher than a certain level. The refractive index of the preliminary light blocking layer can be controlled according to the dispersion amount of the nanoparticles. Thus, the wavelength range of the light blocked by the subsequently formed light blocking layer can be adjusted, so that the light in the non-visible light region can be selectively filtered. Also, as the dispersion amount of the nanopatactile increases, the preliminary light blocking layer has an increased refractive index, so that the light blocking efficiency can be increased. Alternatively, the preliminary light blocking layer may be formed of an inorganic material in which nanoparticles are dispersed.

The mold may also be made of a PDMS material. The upper surface of the mold is also provided with concavities and convexities. The unevenness has a shape corresponding to the unevenness of the subsequently formed photo-functional pattern.

Then, the preliminary light shielding film is transferred onto the substrate. At this time, the preliminary light shielding film is cured by heat or ultraviolet light, so that the preliminary light shielding film can be converted to a light blocking film and a functional pattern thereon. As a result, a light shielding film and a functional pattern are formed on the substrate.

Then, by removing the mold, a photo-functional pattern structure using a selective light blocking material in which a light shielding film and a functional pattern are sequentially laminated on the substrate can be formed. In this way, a photo-functional pattern structure using a selective light blocking material in which a light shielding film and a functional pattern are sequentially laminated on a substrate through a direct printing process can be formed.

3 is a cross-sectional view illustrating a method of fabricating a photo-functional pattern structure using a selective light blocking material according to an embodiment of the present invention.

Referring to FIG. 3, a functional resin is supplied onto a mold having concave and convex portions to form a preliminary functional pattern made of a functional resin. The preliminary functional pattern may have irregularities corresponding to the irregularities. Whereby the pre-functional pattern can have improved scattering properties. The functional resin may also be selected from the group consisting of SOG, methylsilsequioxane (MSQ), hydrogen silsequioxane (HSQ), perhydropolysilazane (SiH2NH) n), polysilazane a high hardness material composed of polysilazane, divinyl siloxane bis-benzocyclobutane, perfluorocyclobutane (PFCB), and a mixture thereof. The functional resin may be a polymer resin coated with a fluorine group and thus may have a hydrophobic property.

On the other hand, a light blocking film made of a light blocking material is formed on a substrate such as a polymer film separately from the preliminary functional pattern.

Thereafter, the photopolymerizable pattern structure using the selective light blocking material including the light shielding film and the functional pattern can be formed by transferring the preliminary functional pattern onto the light blocking film while curing.

Thus, the photo-functional pattern structure using the selective light blocking material may have improved light scattering property, hardness or hydrophobic property, and light blocking property.

4 is a cross-sectional view illustrating a method of fabricating a photo-functional pattern structure using a selective light blocking material according to an embodiment of the present invention.

Referring to FIG. 3, a functional resin is supplied onto a mold having concave and convex portions to form a preliminary functional pattern made of a functional resin. The preliminary functional pattern may have irregularities corresponding to the irregularities. Whereby the pre-functional pattern can have improved scattering properties. The functional resin may also be selected from the group consisting of SOG, methylsilsequioxane (MSQ), hydrogen silsequioxane (HSQ), perhydropolysilazane (SiH2NH) n), polysilazane a high hardness material composed of polysilazane, divinyl siloxane bis-benzocyclobutane, perfluorocyclobutane (PFCB), and a mixture thereof. The functional resin may be a polymer resin coated with a fluorine group and thus may have a hydrophobic property.

Then, the preliminary functional pattern is transferred onto the substrate. At this time, the preliminary functional pattern is subjected to a curing process using heat or ultraviolet rays to form a first functional pattern on the substrate. The first functional pattern may have a high hardness property or a hydrophobic property.

Then, a preliminary light shielding film made of a light blocking material is formed on the first functional pattern. Thereafter, the preliminary light shielding film is cured while being pressurized to convert the preliminary light shielding film into a second functional pattern and a light shielding film. As a result, a photo-functional pattern structure using the selective light blocking material including the first functional pattern, the second functional pattern, and the light shielding film can be formed.

Thus, the photo-functional pattern structure using the selective light blocking material may have improved light scattering property, hardness or hydrophobic property, and light blocking property.

The method of fabricating a photonic functional pattern structure using a selective light blocking material according to embodiments of the present invention can be applied to an organic light emitting device and a thin film solar cell.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the present invention as defined by the following claims. It can be understood that it is possible.

Claims (8)

Forming a light shielding film on the substrate, the light shielding film being capable of blocking light in an invisible light region; And
And forming a concave-convex functional pattern on the light blocking film so as to scatter or transmit light in a visible light region. The method of claim 1, wherein the light blocking film and the functional pattern are made of the same material. 3. The method of claim 2, wherein forming the light shielding film and the functional pattern comprises:
Forming a preliminary light shielding film on the substrate; And
And patterning a part of the preliminary light shielding film to convert into a functional pattern and forming a remaining part of the light shielding film as the light blocking film. The method of claim 3, wherein the pre-
Polymer organic materials; And
And nanoparticles composed of at least one metal oxide selected from the group consisting of titanium oxide, zirconium oxide, iron oxide, tungsten oxide, cerium oxide, antimony oxide and zinc oxide dispersed in the polymer organic material A method of fabricating a photofunctional pattern structure using a selective light blocking material. The method according to claim 3, wherein the step of forming the functional pattern and the light shielding film comprises performing a nanoimprint lithography process using a stamp having a shape corresponding to the unevenness, ≪ / RTI > 4. The selective light blocking material according to claim 3, wherein the functional pattern and the light shielding film are formed through an imprint process of supplying a light shielding material onto a mold having a shape corresponding to the unevenness, Method of Fabricating Photofunctional Pattern Structure Used. The method of claim 1, wherein the functional pattern is formed using a material having hydrophobicity or hardness. Supplying a functional resin onto the polymer mold on which the recess is formed to form a first functional pattern having unevenness;
Transferring the first functional pattern onto a substrate; And
Providing a light shielding material for blocking light in an invisible light region on the first functional pattern and forming a second functional pattern and a light shielding film on the one functional pattern; Method of manufacturing functional pattern structures.

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