KR20160049349A - Sputtering apparatus and sputtering method using the same - Google Patents
Sputtering apparatus and sputtering method using the same Download PDFInfo
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- KR20160049349A KR20160049349A KR1020140146354A KR20140146354A KR20160049349A KR 20160049349 A KR20160049349 A KR 20160049349A KR 1020140146354 A KR1020140146354 A KR 1020140146354A KR 20140146354 A KR20140146354 A KR 20140146354A KR 20160049349 A KR20160049349 A KR 20160049349A
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Abstract
The present invention relates to a sputtering apparatus, comprising: a first rotating target having a polygonal columnar shape and installed to be rotatable about a central axis; A second rotating target provided parallel to the first rotating target and having a polygonal columnar shape and rotatable about a central axis; A deposition material disposed under the first and second rotating targets and on which deposition materials respectively emitted from the first and second rotation targets are deposited; A main shutter unit installed between the first and second rotary targets and the material to be deposited to cover or expose the material to be deposited; A deposition mask unit movably installed in a horizontal direction between the main shutter unit and the deposition target, the deposition mask unit having a deposition pattern; And a control unit controlling the first rotating target, the second rotating target, the main shutter unit, and the deposition mask unit, wherein a side surface of the polygonal column of the first and second rotating targets, And the deposition target material of the first rotating target facing the deposited material during deposition is different from the deposition material discharged from the target of the second rotating target.
Description
The present invention relates to a sputtering apparatus, and more particularly, to a sputtering apparatus capable of depositing a material to be deposited in a variety of composition ratios using two deposition materials, or depositing a material at a constant composition ratio, and a deposition method using the same.
Generally, a sputtering apparatus using a plasma phenomenon exhibits a high deposition rate, has a high uniformity of a deposited thin film, has good reproducibility, and can be rapidly processed, and is widely used in various industrial fields.
However, in a general sputtering apparatus, only one kind of thin film corresponding to the physical properties of the target can be obtained using only one target in one process. Therefore, additional processes or devices are required to obtain thin films of various physical properties.
Accordingly, it is possible to deposit thin films having various mixing ratios in one process on one substrate using two targets, and also to deposit a thin film having a specific mixing ratio of two deposition materials on one substrate Development of a sputtering apparatus is required.
SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and it is an object of the present invention to provide a method for depositing a mixed thin film of various composition ratios in one process on one substrate using two targets, And a vapor deposition method thereof.
The above object of the present invention can be achieved by a first rotary target having a square column shape and rotatably disposed about a central axis, A second rotating target disposed parallel to the first rotating target, the second rotating target being prismatic and pivotable about a central axis; A deposition material disposed under the first and second rotating targets and on which deposition materials respectively emitted from the first and second rotation targets are deposited; A main shutter unit installed between the first and second rotary targets and the material to be deposited to cover or expose the material to be deposited; A deposition mask unit movably installed in a horizontal direction between the main shutter unit and the deposition target, the deposition mask unit having a deposition pattern; And a control unit controlling the first rotating target, the second rotating target, the main shutter unit, and the deposition mask unit, wherein a side of the square prism of the first and second rotating targets, And the deposition target may be formed so that the target of the first rotating target facing the deposited material during deposition and the deposition material emitted from the target of the second rotating target are different from each other.
A precision shutter unit installed between the main shutter unit and the material to be deposited to determine a deposition area; And a deposited material moving unit that fixes the material to be deposited and moves the material to be deposited in the horizontal direction with respect to the deposition area.
In addition, the first and second rotating targets may be formed into square pellets, respectively.
In addition, a blocking wall may be provided between the first rotating target and the second rotating target.
In addition, the first and second rotating targets may be positioned such that one side of a square column facing the deposited material forms an acute angle with the deposited material.
The precision shutter unit may include first and second precision shutters formed to open a portion where a thin film of a selected composition ratio is formed; And a precision shutter driving unit for linearly moving the first and second precision shutters.
According to another aspect of the present invention, there is provided a deposition method including: forming a deposited thin film having a plurality of composition ratios on a material to be deposited using a deposition mask; Opening a portion corresponding to the deposition hole of the deposition mask having the selected composition ratio to the deposition region using the precision shutter unit; And applying a voltage to the first and second rotating targets to move the deposited material to the deposition area.
1 is a conceptual view showing a sputtering apparatus according to an embodiment of the present invention;
2 is a conceptual diagram showing a case where an accurate shutter unit operates in a sputtering apparatus according to an embodiment of the present invention;
FIG. 3 is a view for explaining a change in concentration of two deposition materials emitted from two targets in a deposited material on a deposited material in a sputtering apparatus according to an embodiment of the present invention; FIG.
4 is a view showing an example of a deposition mask used in a sputtering apparatus according to an embodiment of the present invention;
5 is a view for explaining a case where deposition is performed using a deposition mask in a sputtering apparatus according to an embodiment of the present invention;
6 is a view for explaining the positions of the first and second precision shutters when a deposited thin film having a composition ratio of 70:30 is formed in a sputtering apparatus according to an embodiment of the present invention;
7 is a view for explaining the positions of the first and second precision shutters when forming a deposited thin film having a composition ratio of two deposition materials of 20:80 in a sputtering apparatus according to an embodiment of the present invention;
8 is a flowchart showing a deposition method according to an embodiment of the present invention.
Hereinafter, embodiments of a sputtering apparatus and a deposition method using the same according to the present invention will be described in detail with reference to the accompanying drawings.
It is to be understood that the embodiments described below are provided for illustrative purposes only, and that the present invention may be embodied with various modifications and alterations of the embodiments described herein. In the following description, well-known functions or components are not described in detail to avoid obscuring the subject matter of the present invention. In addition, the attached drawings are not drawn to scale in order to facilitate understanding of the invention, but the dimensions of some of the components may be exaggerated.
FIG. 1 is a conceptual diagram showing a sputtering apparatus according to an embodiment of the present invention, and FIG. 2 is a conceptual diagram showing a state in which a precision shutter unit operates in a sputtering apparatus according to an embodiment of the present invention.
1 and 2, a
The
At the top of the
The first rotating
Also, the first rotating
At this time, the first rotating
The first target
The second rotating
The
The
The
The
The evaporated
The material to be deposited 80 is fixed to the above-described
The
The
The
The
Hereinafter, the operation of the sputtering apparatus according to one embodiment of the present invention will be described in detail with reference to the accompanying drawings.
The
Hereinafter, the deposition method of the first method will be described.
The user fixes the material to be deposited 80 on the
The
Then, the
FIG. 3 is a view for explaining a change in the concentration of two deposited materials released from two targets in a deposited material on a deposited material in a sputtering apparatus according to an embodiment of the present invention. FIG.
Referring to FIG. 3, the first
Accordingly, when the deposition is performed in this manner, the first and second deposition materials S1 and S2, which are emitted from the two
Hereinafter, a deposition method of the second type in which two deposition materials are deposited on the surface of the deposition material at a composition ratio within a certain range will be described.
The deposition method of the second method may include a step of selecting the composition ratio of the deposited thin film and a step of depositing the surface of the deposited material at the selected composition ratio.
First, the step of selecting the composition ratio of the deposited thin film will be described.
The user fixes the material to be deposited 80 on the
The
The
Thereafter, the
5, if deposition is performed in a state where the
The user can select a deposited thin film having desired properties from among the mixed deposition
Alternatively, when the user displays a deposition pattern formed by the
Next, the step of depositing the surface of the material to be deposited 80 at a selected composition ratio will be described.
The
Then, the
The
When the evaporation process is performed while the
For example, in the case where the deposition material S1 of the first
In the case where the deposition material S1 of the first
As described above, the
In addition, the
The
Although the case where both of the
The invention has been described above in an illustrative manner. The terms used herein are for the purpose of description and should not be construed as limiting. Various modifications and variations of the present invention are possible in light of the above teachings. Therefore, unless otherwise indicated, the present invention may be practiced freely within the scope of the claims.
One; Sputtering
12; Blocking
21, 31;
24,34;
40;
44; A main
51, 52;
60; A
64; A deposition
71; A moving
80; The deposited
Claims (7)
A second rotating target disposed parallel to the first rotating target, the second rotating target being prismatic and pivotable about a central axis;
A deposition material disposed under the first and second rotating targets and on which deposition materials respectively emitted from the first and second rotation targets are deposited;
A main shutter unit installed between the first and second rotary targets and the material to be deposited to cover or expose the material to be deposited;
A deposition mask unit movably installed in a horizontal direction between the main shutter unit and the deposition target, the deposition mask unit having a deposition pattern; And
And a control unit for controlling the first rotating target, the second rotating target, the main shutter unit, and the deposition mask unit,
Wherein a target for emitting a different deposition material is provided on a side surface of a regular prism of the first and second rotating targets, and a target of the first rotating target and a target of the second rotating target, Wherein the deposited deposition material is different.
A precision shutter unit installed between the main shutter unit and the material to be deposited to determine a deposition area; And
Further comprising: a deposited material moving unit that fixes the deposited material and moves the deposited material in a horizontal direction with respect to the deposited region.
Wherein each of the first and second rotating targets is formed into a square pyramid.
And a blocking wall is provided between the first rotating target and the second rotating target.
Wherein the first rotating target and the second rotating target are positioned such that one side of a regular square column facing the material to be deposited is at an acute angle with the material to be deposited.
The precision shutter unit includes first and second precision shutters formed to open a portion where a thin film of a selected composition ratio is formed; And
And a precision shutter driving unit for linearly moving the first and second precision shutters.
Opening a portion corresponding to the deposition hole of the deposition mask having the selected composition ratio to the deposition region using the precision shutter unit; And
And applying a voltage to the first and second rotating targets to move the deposited material to the deposition area.
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KR1020140146354A KR101664187B1 (en) | 2014-10-27 | 2014-10-27 | Sputtering method using sputtering apparatus |
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KR1020140146354A KR101664187B1 (en) | 2014-10-27 | 2014-10-27 | Sputtering method using sputtering apparatus |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20170126724A (en) * | 2016-05-10 | 2017-11-20 | 삼성전자주식회사 | Sputtering apparatus and method of forming layer using the same |
CN113249699A (en) * | 2021-05-13 | 2021-08-13 | 沈阳仪表科学研究院有限公司 | Method for preparing high-precision wavelength gradient optical filter based on magnetron sputtering technology and device adopted by method |
KR102300488B1 (en) * | 2021-07-22 | 2021-09-09 | 주식회사 세크윈 | Coating System for Semiconductor Package Electromagnetic Interference Shielding Layer |
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JP2000503753A (en) * | 1997-04-22 | 2000-03-28 | サイミックス・テクノロジーズ | Systems and methods for combinatorial synthesis of new substances |
KR20040043360A (en) * | 2002-11-18 | 2004-05-24 | 주식회사 야스 | Apparatus for controlling deposition zone of homogeneously mixed layer in multi source co-deposition |
KR20130059384A (en) * | 2010-06-25 | 2013-06-05 | 캐논 아네르바 가부시키가이샤 | Sputtering device, deposition method, and control device |
KR20130090927A (en) * | 2010-12-27 | 2013-08-14 | 샤프 가부시키가이샤 | Deposition method, deposition film, and method for producing organic electroluminescence display device |
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2014
- 2014-10-27 KR KR1020140146354A patent/KR101664187B1/en active IP Right Grant
Patent Citations (4)
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JP2000503753A (en) * | 1997-04-22 | 2000-03-28 | サイミックス・テクノロジーズ | Systems and methods for combinatorial synthesis of new substances |
KR20040043360A (en) * | 2002-11-18 | 2004-05-24 | 주식회사 야스 | Apparatus for controlling deposition zone of homogeneously mixed layer in multi source co-deposition |
KR20130059384A (en) * | 2010-06-25 | 2013-06-05 | 캐논 아네르바 가부시키가이샤 | Sputtering device, deposition method, and control device |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20170126724A (en) * | 2016-05-10 | 2017-11-20 | 삼성전자주식회사 | Sputtering apparatus and method of forming layer using the same |
CN113249699A (en) * | 2021-05-13 | 2021-08-13 | 沈阳仪表科学研究院有限公司 | Method for preparing high-precision wavelength gradient optical filter based on magnetron sputtering technology and device adopted by method |
CN113249699B (en) * | 2021-05-13 | 2022-11-04 | 沈阳仪表科学研究院有限公司 | Method for preparing high-precision wavelength gradient optical filter based on magnetron sputtering technology and device adopted by method |
KR102300488B1 (en) * | 2021-07-22 | 2021-09-09 | 주식회사 세크윈 | Coating System for Semiconductor Package Electromagnetic Interference Shielding Layer |
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