KR20160002593A - Display device - Google Patents

Abstract

According to the present invention, a display device is disclosed. According to the present invention, the disclosed display device comprises: a display panel; and a hard coating layer arranged on the display panel. The hard coating layer is formed by a light-curable resin composition including a fluorine-based polymer. The fluorine-based polymer, of which the content is 15 to 35 weight%, is included in the light-curable resin composition.

Description

Display device

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a display device, and more particularly, to a display device including a hard coating layer.

[0002] In recent years, as the information age has come to a full-fledged information age, a display field for visually expressing electrical information signals has been rapidly developed. In response to this, various flat panel display devices having excellent performance of thinning, light- (Flat Display Device) has been developed to replace CRT (Cathode Ray Tube).

Specific examples of such a display device include a liquid crystal display device (LCD), an organic light emitting display (OLED), an electrophoretic display (EPD) A plasma display panel (PDP), a field emission display (FED), an electroluminescence display device (ELD), and an electro-wetting display (EWD) .

A hard coating film may be applied to protect the surface of the display device and to prevent the display screen from being glare caused by external light. The hard coating film applied to the conventional display device can serve to prevent reflection. At this time, in order to prevent reflection, it is possible to use the reflection of the pattern by forming a small nano-sized fine protrusion pattern by embossing the surface.

However, there is a disadvantage that the production cost for making the hard coating film to have a nano-sized fine pattern is very expensive. Further, in the manufacturing process of etching the material, it is difficult to apply various materials to only a specific compound, and it is difficult to form a hard hard coating film by patterning the surface. If the hardness is low, it may be difficult to protect the screen.

In addition, a conventional hard coating film can be formed by laminating a plurality of coating layers. The plurality of coating layers may be formed by a dry method or a wet method. In the dry method using vacuum equipment, a hard coating layer is formed on the base film, and a high refractive index layer and a low refractive index layer are stacked several times. Further, an inner fingerprint coating layer may be further formed on the hard coating film composed of such a plurality of coating layers by a dry method or a wet method for the purpose of transparency as required.

In the case of using the dry method in the conventional hard coating film production method, the manufacturing cost is very high and a large number of layers are formed over a number of times, so that the manufacturing process itself is complicated and the productivity is low. That is, in the dry method, since at least six layers are conventionally required one by one to deposit a coating process, the process is very complicated, there are restrictions on the quantity and size of the vacuum equipment, and the process time is long.

In the wet process using dip coating or roll coating, a hard coating layer is formed on the base film and a low refractive coating layer is formed on the hard coating layer. That is, at least two or more layers including a hard coating layer are formed on the base film to form a hard coating film. Further, an inner fingerprint coating layer may be further formed on the hard coating film composed of such a plurality of coating layers by a dry method or a wet method for the purpose of transparency as required.

The technique of forming a low refraction coating layer using the wet process in the conventional method of producing a hard coating film has a disadvantage that the adhesion between the hard coating layer and the low refraction coating layer is relatively low and the hardness is very low due to the characteristics of the material itself constituting the low refraction coating layer . That is, the wet method has a problem that it is difficult to bond with the resin composition constituting the hard coating layer and the low refractive coating layer, and the layers are separated from each other.

The present invention is intended to provide a display device in which a hard coating layer is formed on a display panel to improve antireflection characteristics and to omit a separate coating layer if necessary.

It is another object of the present invention to provide a display device having a hard coating layer developed to simplify the manufacturing process and reduce the processing time and cost.

According to one embodiment of the present invention, the display device of the present invention can include, for example, a display panel and a hard coat layer disposed on the display panel, wherein the hard coat layer is represented by the following formula And a fluorine-based polymer containing a compound unit.

[Chemical Formula 8]

D is an integer of 1 to 10, e is an integer of 1 to 10, x is an integer of 1 or more, and R ₁₁ is alkyl having 1 to 4 carbon atoms.

According to another embodiment, a display device manufacturing method of the present invention includes the steps of: manufacturing a display panel; And a fluorine-based polymer containing a compound unit represented by the following formula (8) on the display panel to form a hard coat layer.

[Chemical Formula 8]

In the above formula (8)

d is an integer of 1 to 10, e is an integer of 1 to 10, x is an integer of 1 or more, and R ₁₁ is C _1-4 alkyl.

The display device according to the present invention has a first effect that a hard coating layer is formed on a display panel to improve the antireflection characteristic and to omit a to-be-coated layer even when the contrast is required.

Further, the display device according to the present invention has a second effect of simplifying the process and reducing the process time and process cost by forming the hard coat layer into a single layer.

1 is a view showing a display device according to a first embodiment of the present invention.
2 and 3 are views for explaining a display panel of a display device according to the first embodiment of the present invention.
4 is a view showing a display device according to a second embodiment of the present invention.
5 is a view showing a display device according to a third embodiment of the present invention.
6 and 7 are views for explaining a touch panel of a display device according to a third embodiment of the present invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. The following embodiments are provided by way of example so that those skilled in the art can fully understand the spirit of the present invention. Therefore, the present invention is not limited to the embodiments described below, but may be embodied in other forms. In the drawings, the size and thickness of the device may be exaggerated for convenience. Like reference numerals designate like elements throughout the specification.

A display device according to a first embodiment of the present invention will be described with reference to Figs. 1 to 3. Fig. 1 is a view showing a display device according to a first embodiment of the present invention. 2 and 3 are views for explaining a display panel of a display device according to a first embodiment of the present invention.

Referring to FIG. 1, a display device according to a first embodiment of the present invention includes a display panel 300. A hard coating layer 100 is disposed on the display panel 300.

The hard coating layer 100 disposed on the display panel 300 is formed as a single layer structure. At this time, the hard coating layer 100 may be formed of a photo-curable resin composition. Since the photo-curable resin composition is a liquid, it can be applied by a coating device. That is, the hard coating layer 100 can be formed by applying a photo-curable resin composition on the display panel 300. As the coating method, known coating methods can be used.

The photo-curable resin composition may contain a fluorine-based polymer and / or a fluorine-based silane. In addition, the photo-curable resin composition may include a cage silsesquioxane resin. In addition, the photo-curable resin composition may contain chain-type siloxane acrylate. In addition, the photo-curable resin composition may include a photopolymerization initiator and an acrylic monomer. In addition, the photo-curable resin composition may include an organic solvent.

The fluorine-based polymer contained in the photo-curable resin composition can be formed using, for example, urethane acrylate. That is, the fluorine-based polymer may be a urethane-modified polymer. More specifically, the fluorine-based polymer may include a compound unit represented by the following general formula (8).

[Chemical Formula 8]

Wherein d is an integer of 1 to 10, and e is an integer of 0 to 10. Also, R11 is hydrogen or alkyl having 1 to 4 carbon atoms. Also, x is at least one integer. The molecular weight of the fluorine-based polymer may be 1000 to 100000.

The fluorinated polymer may be contained in an amount of 15 to 35% by weight of the photo-curable resin composition when the photo-curable resin composition is 100 parts by weight (wt%). At this time, the fluoropolymer can make the hard coating layer 100 have low reflectivity and stain resistance. In addition, the fluorine-based polymer is an urethane-modified polymer, which imparts elasticity to the hard coat layer 100 and can increase the hardness of the hard coat layer 100.

Further, the photo-curable resin composition may contain fluorine-based silane. The fluorine-based silane may include a compound unit represented by the following formula (9).

[Chemical Formula 9]

In the above formula (9), f is an integer of 0 to 10, and g is an integer of 1 to 10. Each of R ₁₂ to R ₁₄ is independently alkyl having 1 to 4 carbon atoms.

The fluorine-based silane may be contained in an amount of 10 to 15% by weight of the photo-curable resin composition when the photo-curable resin composition is 100 parts by weight (wt%). At this time, the fluorine-based silane may simultaneously impart low-reflectivity and stain resistance to the hard coat layer 100. That is, the fluorosilane reduces the refractive index of the hard coat layer 100 to have a low reflection function.

Table 1 below shows experimental results for the hard coating layer 100 formed on the display panel 300 according to an embodiment of the present invention. The following experimental results show that the reflectivity, transmittance and haze of the hard coat layer 100 are influenced by the molar ratio of fluorine.

Fluorine mole ratio reflectivity(%) Transmittance (%) Haze 7 2.48 93.82 0.33 14 2.08 94.08 0.38 17 1.95 93.95 0.35 20 1.92 94.26 0.28 23 1.88 94.21 0.29 25 1.79 94.27 0.28

Referring to Table 1, when the mole fraction of the photo-curable resin composition is 100, the molar ratio of fluoro contained in the photo-curable resin composition may be 17-25. When the molar ratio of fluorine is less than 17, the reflectance is relatively large. If the molar ratio of fluorine is greater than 25, the hard coating layer 100 may not be coated.

The reflectance measurement equipment uses Konica Minolta (CM-2600D). The light source is D65, and the Observer value is 2 degrees. The reflectance is measured by attaching a black adhesive tape (Black Adhesive Film, manufactured by Toyohozai) to the remaining surfaces except the coated surface.

That is, the photo-curable resin composition may include a fluorine-based polymer and a fluorine-based silane and may have a low reflection characteristic. At this time, the hard coating layer 100 may have a reflectance of about 6% or less.

In addition, the photo-curable resin composition may include a fluorine-based polymer and a fluorine-based silane and have water repellency. At this time, the water contact angle of the hard coat layer 100 may be 100 ° or more. For example, the water contact angle of the hard coat layer 100 may be 100 ° or more and 130 ° or less.

On the other hand, the photo-curable resin composition may include a closed silsesquioxane resin. At this time, the closed silsesquioxane resin may include a compound unit represented by the following formula (1).

[Chemical Formula 1]

In the above formula (1), n is an integer of 6 to 18. Preferably, n may be 12, and the closed silsesquioxane resin may be formed as a hexahedron as shown in the following Chemical Formula 2.

(2)

In the above formulas (1) and (2), each of R ₁ to R ₉ may independently be any one selected from the group consisting of functional groups represented by the following formulas (3) to (6)

(3)

[Chemical Formula 4]

[Chemical Formula 5]

[Chemical Formula 6]

In the above Chemical Formulas 3 to 6, m is an integer of 1 to 20, and R ₁₀ is an aliphatic hydrocarbon or aromatic hydrocarbon having 1 to 80 carbon atoms.

The closed silsesquioxane resin may be contained in an amount of 10% by weight to 20% by weight based on 100% by weight (wt%) of the photo-curable resin composition. At this time, the closed silsesquioxane resin can form the hard coat layer 100 with a high hardness.

The hard coating layer 100 formed on the display panel 300 needs to be formed to have a high hardness in order to protect the display device. The hard coating layer 100 may have a pencil hardness of 6H or more. For example, the hard coat layer 100 may have a pencil hardness of 6H to 9H. The pencil hardness was measured by a pencil hardness test as described in JIS K5400 using a test pencil specified in JIS S 6006 after the humidity hardness of the prepared hard coating layer sample was adjusted for 2 hours at a temperature of 25 DEG C and a relative humidity of 60% It is a value measured according to the method. That is, the display device according to the present invention may include the hard coating layer 100 formed by the hardening process, because the photo-curable resin composition includes the closed silsesquioxane resin.

In addition, the photo-curable resin composition may contain chain-type siloxane acrylate. The chain type siloxane acrylate may include a compound unit represented by the following formula (7).

(7)

Wherein a is an integer of 0 to 1000, b is an integer of 1 to 30, and c is an integer of 1 to 25.

When the chain type siloxane acrylate is included in the photo-curable resin composition, the chain type siloxane acrylate is used in an amount of from 2 wt% to 10 wt% of the photo-curing type resin composition when the photo- 4% by weight. At this time, the chain-type siloxane acrylate may serve as an inner fingerprint additive for allowing the hard coating layer 100 to have an inner fingerprint characteristic.

That is, when the hard coat layer 100 is required to have transparency, the photo-curable resin composition may further contain chain-type siloxane acrylate. At this time, the hard coat layer 100 according to the embodiment of the present invention may omit a separate anti-fingerprint layer, and even if the hard coat layer 100 is formed as a single layer, the hard coat layer 100 may have irregularities.

In order to protect the display device, the hard coating layer 100 formed on the display panel 300 needs a water-repellent function so that water is not absorbed when water is deposited, and an inner fingerprint function . Accordingly, when the hard coating layer 100 has no texture, a fingerprint-preventing layer, which is a thin film or a functional film, is separately required.

Since the display device according to the present invention is formed as a single layer and includes the hard coating layer 100 having a textured property, a separate anti-fingerprint layer can be omitted. This can simplify the process and reduce the process cost and process time.

Further, the photo-curing resin composition may include a photopolymerization initiator. The photopolymerization initiator can be applied without limitation as long as it is generally used in the art. The photopolymerization initiator may include at least one selected from the group consisting of hydroxy ketones, aminoketones, and a hydrogen recyclable photopolymerization initiator.

For example, the photopolymerization initiator may be selected from the group consisting of 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropanone-1, diphenylketone benzyldimethylketal, 2- Phenyl-1-one, 4-hydroxycyclophenyl ketone, dimethoxy-2-phenylactetophenone, anthraquinone, fluorene, triphenylamine, carbazole, 3-methylacetophenone, , 4,4-dimethoxyacetophenone, 4,4-diaminobenzophenone, 1-hydroxycyclohexyl phenyl ketone, benzophenone, and combinations thereof. However, it is not limited thereto and may include a known photopolymerization initiator.

The photopolymerization initiator may be included in an amount of 1 to 3% by weight of the photocurable resin composition when the photocurable resin composition is 100 parts by weight (wt%). The content of the photopolymerization initiator may be selected in consideration of the curing rate and hardening of the photocurable resin composition of the hard coat layer 100.

In addition, the photo-curable resin composition may include an acrylic monomer. The acrylic monomer may be a (meth) acrylate monomer. The acrylic monomer may be included to improve hardness and curling characteristics of the hard coating layer 100.

For example, the acrylic monomer may be selected from the group consisting of dipentaerythritol penta / hexa (meth) acrylate, pentaerythritol tri / tetra (meth) acrylate, ditrimethylol propane tetra (meth) acrylate, (meth) (Meth) acrylate, ethylene glycol di (meth) acrylate, propylene glycol (meth) acrylate, glycerol tri (meth) acrylate, tris Acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, neopentyl glycol di (meth) , Diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, dipropylene glycol di (meth) acrylate, bis (2- hydroxyethyl) isocyanurate di (Meth) acrylate, hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, hydroxybutyl (meth) acrylate, isooctyl ) Acrylate, tetrahydrofurfuryl (meth) acrylate, phenoxyethyl (meth) acrylate, isobonol (meth) acrylate, and combinations thereof. However, the present invention is not limited thereto and may include those commonly used in the art.

The content of the acrylic monomer may be 10 to 30% by weight of the photo-curable resin composition when the photo-curable resin composition is 100 parts by weight (wt%).

Further, the photo-curing resin composition may include a solvent. For example, the solvent may comprise an alcoholic organic solvent such as ethanol. The solvent may also be selected from the group consisting of dipropylene glycol (DPG), monoethylene glycol (MEG), diethylene glycol (DEG), triethylene glycol (TEG), tripropylene glycol, 1,4- Pentanediol, 1,6-hexanediol, 1,3-propanediol, 1,2-propanediol, 2,2-dimethyl-1,3-propanediol (neopentyl glycol) and combinations thereof Or the like. However, the solvent is not limited thereto, and may include those commonly used in the art.

The solvent is preferably contained in the photo-curable resin composition as much as the remaining amount excluding the fluorine-based polymer, the fluorine-based silane, the closed silsesquioxane resin, the chain type siloxane acrylate, and the photopolymerization initiator.

The hard coating layer 100 may be formed of a photo-curable resin composition comprising a fluorine-based polymer, a fluorine-based silane, a closed silsesquioxane resin, a chain type siloxane acrylate, a photopolymerization initiator, and an acrylic monomer. The photo-curable resin composition may contain 10 to 20 wt% of a closed silsesquioxane resin, 2 to 5 wt% of a chain siloxane acrylate, 15 to 35 wt% of a fluorinated polymer, 10 to 15 wt% of a fluorinated silane, To 3% by weight of the acrylic monomer and 10% to 30% by weight of the acrylic monomer and the balance solvent.

The thickness of the hard coating layer 100 formed as a single layer may be 80 nm to 5 占 퐉. The thickness of the hard coating layer 100 may be determined in consideration of reflectance and transmittance.

Hereinafter, the present invention will be described in more detail with reference to the following examples. However, the following examples are intended to illustrate the present invention and are not intended to limit the present invention. That is, the embodiments of the present invention may be modified in various forms, and the scope of the present invention should not be construed to be limited by the embodiments described below.

[Examples 1 to 4]

In Example 1, a mixture of 25 wt% of a fluorinated polymer, 20 wt% of a closed silsesquioxane resin, 10 wt% of fluorine silane, 25 wt% of an acrylic monomer, 3 wt% of a photopolymerization initiator, 3 wt% of a chain type siloxane acrylate, Was prepared.

In Example 2, 30% by weight of a fluorinated polymer, 20% by weight of a closed silsesquioxane resin, 15% by weight of a fluorine-based silane, 15% by weight of an acrylic monomer, 3% by weight of a photopolymerization initiator, 4% Was prepared.

In Example 3, a mixture of 35 wt% of a fluorinated polymer, 20 wt% of a closed silsesquioxane resin, 10 wt% of fluorine silane, 15 wt% of an acrylic monomer, 3 wt% of a photopolymerization initiator, 4 wt% of a chain type siloxane acrylate, Was prepared.

In Example 4, a mixture of 25 wt% of a fluorinated polymer, 15 wt% of a closed silsesquioxane resin, 15 wt% of fluorine silane, 20 wt% of an acrylic monomer, 3 wt% of a photopolymerization initiator, 3 wt% of a chain type siloxane acrylate, Was prepared.

One side of a polymethylmethacrylate (PMMA) film was coated with a photo-curable resin composition of Examples 1 to 4 and cured by UV irradiation.

In Examples 1 to 4, the fluorinated polymer is a urethane-modified polymer represented by the following formula (8). In the following formula 8, d is 2, e is 7, and R ₁₁ is C ₂ H ₅ .

[Chemical Formula 8]

In the above-mentioned Examples 1 to 4, the closed silsesquioxane resin is a compound represented by the following formula (2). In the following formula 2, R ₂ to R ₈ may each be an epoxy acrylate.

(2)

In Examples 1 to 4, the fluorine-based silane was tridecafluorooctyltriethoxysilane (3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyltriethoxysilane )to be.

[Comparative Example]

In the comparative example, a polymethylmethacrylate (PMMA) film was used without hard coating.

[Experimental Example]

The water contact angle, reflectance, pencil hardness, transmittance and haze were measured for Examples 1 to 4 and Comparative Example 1. The results are shown in Table 2.

Water contact angle (°) reflectivity(%) Pencil Hardness (H) Transmittance (%) Hayes Example 1 105-110 2.0 8 94.08 0.29 Example 2 103-107 1.7 8-9 94.28 0.28 Example 3 105-110 1.5 8 94.59 0.21 Example 4 100-105 2.1 7-8 93.98 0.31 Comparative Example 70-75 4.2 8-9 91.89 0.28

As shown in Table 2, it was confirmed that the contact angles of water in Examples 1 to 4 were larger than those in Comparative Examples. It can be seen that the surface energy of the coated surface in Examples 1 to 4 is lower and the hydrophobic property is better, and the anti-fouling property is better. That is, the hard coat layer 100 of the present invention is excellent in stain resistance and transparency.

In general, the low-refractive polymer may have a low hardness, but it is confirmed that the pencil hardness of Examples 1 to 4 is not lowered. It was also confirmed that the reflectance was decreased by 2% or more and the transmittance was increased by 2% or more in Examples 1 to 4 as compared with Comparative Examples. Further, it was confirmed that Examples 1 to 4 were formed within a range in which haze was not a problem.

In order to satisfy the reflectance, a plurality of layers have been conventionally required, for example, a plurality of high refractive index layers and low refractive index layers are repeatedly laminated on the hard coating layer by a dry method or a low refractive index layer is formed on the hard coating layer by a wet method. Therefore, there is a problem in that the process is complicated, and in the case of the dry method, there is a problem in that the yield and size are limited and the process time is long. In the case of the wet process, the adhesion between the hard coat layer and the low- There was a problem.

However, the hard coating layer 100 according to the present invention can obtain a desired reflectance without stacking a plurality of layers. In addition, the hard coating layer 100 according to the present invention can be formed as a single layer, simplifying the process, reducing the processing time and process cost, having excellent scratch resistance and excellent antireflection effect.

The display panel 300 may be a liquid crystal display panel or an organic light emitting display panel. Referring to FIG. 2, a case where the display panel 300 is a liquid crystal display panel will be described as follows.

Referring to FIG. 2, the display panel 300 is a liquid crystal display panel. The liquid crystal display panel 300 is formed by bonding a first substrate 301 and a second substrate 302 with a liquid crystal layer 380 therebetween. The hard coating layer 100 may be coated on the exposed surface of the first substrate 301 or the second substrate 302 of the display panel 300.

Although not shown in the drawing, a backlight unit may be disposed under the liquid crystal display panel 300. Also, although not shown in the figure, the display panel 300 may include a polarization unit to which a polarization function is added.

The liquid crystal display panel 300 may be divided into a display area and a non-display area. On one surface of the first substrate 301 in the display area, a gate line and a data line cross each other with a gate insulating layer 352 interposed therebetween to define a pixel region. A thin film transistor (TFT) is provided in the pixel region and is connected in a one-to-one correspondence via a pixel electrode 357 provided in each pixel region and a contact hole formed in the insulating layer 356. That is, the first substrate 301 may be referred to as a thin film transistor substrate.

The thin film transistor TFT includes a gate electrode 351, a gate insulating film 352, a semiconductor layer 353, a source electrode 354, and a drain electrode 355. Although the bottom gate structure in which the gate electrode 351 of the thin film transistor is disposed under the semiconductor layer 353 is shown in the drawing, the gate electrode 351 is formed on the semiconductor layer 353 Or may be formed with a top gate structure in which a gate electrode is disposed. In addition, the configuration and the like of the thin film transistor can be variously modified and modified within a range not departing from the technical idea of the present invention.

A black matrix 371 (not shown) is formed on one surface of the second substrate 302 of the liquid crystal display panel 300 to cover a non-display region such as a thin film transistor Is formed. In addition, R (red), G (green), and B (blue) color filter layers 372 that are sequentially and repeatedly arranged in correspondence to the respective pixel regions in these lattices and a transparent common electrode 373 covering all of them are included . That is, the second substrate 302 may be a color filter substrate.

A first alignment layer 358 and a second alignment layer 374 are interposed between the liquid crystal layer 380 and the pixel electrode 357 and between the liquid crystal layer 380 and the common electrode 373. The first alignment layer 358 and the second alignment layer 374 can align the initial alignment state of the liquid crystal molecules and the alignment direction uniformly.

However, the drawings illustrate the liquid crystal display panel according to the present invention in a simplified manner, but the present invention is not limited thereto. For example, although the thin film transistor is represented by a single thin film transistor in the drawing, the thin film transistor may be composed of one or more thin film transistor combinations depending on the characteristics of operation.

In addition, a method of controlling the arrangement of liquid crystal molecules can be variously applied to an IPS (In Plane Switching) mode or an FFS (Fringe Field Switching) mode in addition to a TN (Twisted Nematic) mode and a VA (Vertical Alignment) mode. Although the pixel electrode 357 is formed on the first substrate 301 and the common electrode 373 is formed on the second substrate 302 in the drawing, the pixel electrode 357 and the common electrode 373 ) Can also be changed and modified. The pixel electrode 357 and the common electrode 373 may be formed on the first substrate 301 in an IPS (In Plane Switching) mode or an FFS (Fringe Field Switching) mode.

The liquid crystal display panel 300 may include a thin film transistor, a color filter layer and a black matrix formed on a first substrate 301 and a second substrate 302 with a liquid crystal layer interposed therebetween. Or a liquid crystal display panel having a color filter on transistor (COT) structure. That is, a thin film transistor may be formed on the first substrate 301, a protective film may be formed on the thin film transistor, and a color filter layer may be formed on the protective film. In addition, a pixel electrode is formed on the first substrate 301 to be in contact with the thin film transistor. At this time, in order to improve the aperture ratio and simplify the mask process, the black matrix may be omitted, and the common electrode may be formed to serve also as the black matrix.

In other words, the liquid crystal display panel 300 is not limited to the representation of the drawings, and the configuration and the like of the thin film transistor can be variously modified and modified as long as the technical idea of the present invention is not deviated.

Next, referring to FIG. 3, the case where the display panel 300 is an organic light emitting display panel will be described.

Referring to FIG. 3, the display panel 300 is an organic light emitting display panel. The organic light emitting display panel 300 includes a first substrate 301 on which a thin film transistor TFT and an organic light emitting diode OL electrically connected to the thin film transistor TFT are formed, And a second substrate 302 for carrying out the present invention. The hard coating layer 100 may be coated on the exposed surface of the first substrate 301 or the second substrate 302 of the display panel 300.

An encapsulation layer 324 may be formed between the first substrate 301 and the second substrate 302. Although the encapsulation layer 324 is shown as a single layer in the drawing, the encapsulation layer 324 may be composed of a plurality of layers such as a protective layer and an adhesive layer. Also, although not shown in the figure, the display panel 300 may include a polarization unit to which a polarization function is added.

The organic light emitting display panel 300 may be divided into a display area and a non-display area. A thin film transistor (TFT) is formed on one surface of the first substrate 301 in a display region of the organic light emitting display panel 300. The thin film transistor (TFT) includes a semiconductor layer 311, a gate electrode 313, a source electrode 315, and a drain electrode 316.

In detail, a semiconductor layer 311 including a source region 311a, a channel region 311b, and a drain region 311c is formed on the first substrate 301. [ A gate insulating film 312 is formed on the semiconductor layer 311 and a gate wiring 313 and a gate electrode 313 branched from the gate wiring are formed on the gate insulating film 312. An interlayer insulating film 314 is formed on the gate wiring and the gate electrode 313.

A source electrode 315 branched from the data line, and a drain electrode 316 spaced apart from the source electrode 315 by a predetermined distance, the data line crossing the gate line with the interlayer insulating film 314 therebetween, Is formed. The source electrode 315 and the drain electrode 316 are electrically connected to each other through an interlayer insulating layer 314 formed on the gate electrode 313 and a contact hole formed through the gate insulating layer 312, And is in contact with the source region 311a and the drain region 311c.

A protective film 317 is formed on the source electrode 315 and the drain electrode 316 and a contact hole exposing the drain electrode 316 is formed on the protective film 317. The exposed drain electrode 316 is electrically connected to the connection electrode 318 formed on the passivation layer 317. A planarization layer 319 is formed on the entire surface of the first substrate 301 including the thin film transistor TFT and a contact hole exposing the connection electrode 318 is formed on the planarization layer 319.

The organic light emitting diode OL is electrically connected to the TFT through a contact hole formed in the planarization layer 319. [ The organic light emitting device OL includes a lower electrode 320, an organic light emitting layer 322, and an upper electrode 323.

More specifically, the lower electrode 320 of the organic light emitting diode OL is formed on the exposed connection electrode 318. Although the lower electrode 320 of the organic light emitting diode OL and the drain electrode 316 of the thin film transistor TFT are shown as being connected through the connection electrode 318 in the drawing, the connection electrode 318 is omitted, The lower electrode 320 of the light emitting device OL and the drain electrode 116 of the thin film transistor TFT may be directly in contact with each other through the planarization film 319 having the contact holes.

A bank pattern 321 is formed on the lower electrode 320 to expose the lower electrode 320 in units of pixel regions. An organic light emitting layer 322 is formed on the exposed lower electrode 320. The organic light emitting layer 322 may be formed of a single layer made of a light emitting material or may include a hole injection layer, a hole transporting layer, an emitting material layer, and an electron transporting layer an electron transporting layer, and an electron injection layer.

An upper electrode 323 is formed on the organic light emitting layer 322. When the lower electrode 320 is an anode, the upper electrode 323 is a cathode, and when the lower electrode 320 is a cathode, the upper electrode is an anode .

A sealing portion is formed on the first substrate 301 on which the thin film transistor TFT and the organic light emitting diode OL are formed. For example, on the upper electrode 323, a sealing layer 324 for protecting the display elements is formed. The sealing layer 324 may be formed of a plurality of layers and may be bonded to the second substrate 302. The second substrate 302 may be an encapsulation substrate for encapsulation. However, the sealing part disposed on the first substrate 301 is not limited to the sealing layer 324 and the second substrate 302, and may be formed by various sealing methods known in the art to prevent the inflow of oxygen or moisture. Additional applications can be applied.

The configuration of the display device according to the present invention is not limited to the drawings, and various changes and modifications can be made without departing from the technical idea of the present invention.

Hereinafter, a display device according to a second embodiment of the present invention will be described with reference to FIG. 4 is a view showing a display device according to a second embodiment of the present invention.

The display device according to the second embodiment of the present invention may include the same configuration as the display device according to the first embodiment described above. Description of parts similar to those of the display device according to the embodiment of the present invention described above can be omitted. The same reference numerals are assigned to the same components.

Referring to FIG. 4, the display device according to the second embodiment of the present invention includes a display panel 300 and a base substrate 200 disposed between the hard coating layer 100. That is, a base substrate 200 is formed on the display panel 300, and a hard coating layer 100 is formed on the base substrate 200. The hard coating layer 100 may be coated on the upper surface of the base substrate 200. The hard coating layer 100 and the display panel 300 may be the same as the first embodiment described above.

The base substrate 200 may be a polarizer. In detail, the base substrate 200 may be a linear polarizer or an external light reflection preventive polarizer. When the display panel 300 is a liquid crystal display panel, the base substrate 200 may be a linear polarizer. When the display panel 300 is an organic light emitting display panel, the base substrate 200 may be an external light reflection preventing polarizer.

Although the base substrate 200 is disposed on only the upper portion of the display panel 300 in the drawing, when the base substrate 200 is a polarizer, the base substrate 200 is divided into upper and lower portions of the display panel 300, As shown in FIG. For example, the display panel 300 is a liquid crystal display panel, and the base substrate 200 is a linear polarizer, and may be disposed on the upper and lower surfaces of the display panel 300 of the base substrate 200. At this time, the hard coating layer 100 may be formed on the upper surface of the base substrate 200 disposed on the upper surface of the display panel 300.

In addition, the base substrate 200 may be a transparent substrate. That is, the light transmitted through the base substrate 200 may be unpolarized light. At this time, the base substrate 200 may be glass or plastic. For example, the base substrate 200 can be made of a material selected from the group consisting of glass, cellulose esters (e.g., cellulose triacetate, cellulose propionate, cellulose butyrate, cellulose acetate propionate, and nitrocellulose), polyimide, polycarbonate, For example, polyethylene terephthalate, polyethylene naphthalate, poly-1,4-cyclohexanedimethylene terephthalate, polyethylene 1,2-diphenoxyethane-4,4'-dicarboxylate, and polybutylene terephthalate) , Polystyrenes such as syndiotactic polystyrenes, polyolefins such as polypropylene, polyethylene and polymethylpentene, polysulfone, polyethersulfone, polyarylate, polyether-imide, polymethylmethacrylate Polyether ketones, polyvinyl alcohols and polyvinyl chlorides, and combinations thereof. Is selected may include any of them. However, the present invention is not limited thereto, and a substrate or a film that does not hinder transparency is sufficient for the base substrate 200.

When the base substrate 200 is formed of a transparent substrate through which unpolarized light is transmitted, the hard coating layer 100 may be formed on both sides of the base substrate 200, though not shown in the drawing. When the hard coating layer 100 is formed on both sides of the base substrate 200, the hard coating layer 100 may have a reflectance of about 4% or less.

Hereinafter, a display device according to a third embodiment of the present invention will be described with reference to FIGS. 5 to 7. FIG. 5 is a view showing a display device according to a third embodiment of the present invention. 6 and 7 are views for explaining a touch panel of a display device according to an embodiment of the present invention.

The display device according to the third embodiment of the present invention may include the same configuration as the display device according to the above-described embodiments. Description of parts similar to those of the display device according to the embodiments of the present invention described above can be omitted. The same reference numerals are assigned to the same components.

Referring to FIG. 5, a display device according to a third embodiment of the present invention includes a display panel 300 and a touch panel 400 disposed on the display panel 300. In addition, the display device may include a base substrate 200 disposed on the touch panel 400. At this time, the touch panel 400 may be disposed between the base substrate 200 and the display panel 300.

Although the touch panel 400 is illustrated as being separate from the base substrate 200 and the display panel 300 in the drawing, the touch panel 400 may be formed integrally with the base substrate 200 . The touch panel 400 may be formed integrally with the display panel 300.

In detail, the touch panel 400 may be an add-on type touch panel 400. In addition, the touch panel 400 may be an integrated type touch panel 400.

When the touch panel 400 is an external touch panel 400, the touch panel 400 may have a separate structure from the display panel 300. A transparent adhesive layer may be formed between the touch panel 400 and the display panel 300.

The touch panel 400 may be formed separately from the base substrate 200 or may be formed integrally with the base substrate 200. When the touch panel 400 is formed separately from the base substrate 200, a transparent adhesive layer may be formed between the touch panel 400 and the base substrate 200. When the touch panel 400 is formed integrally with the base substrate 200, a sensing electrode may be formed on the back surface of the base substrate 200. That is, a separate adhesive layer is not required between the touch panel 400 and the base substrate 200.

When the touch panel 400 is an embedded touch panel 400, the touch panel 400 may be formed integrally with the display panel 300. That is, a separate adhesive layer is not required between the touch panel 400 and the display panel 300. The touch panel 400 may be an on-cell type or an in-cell type.

When the touch panel 400 is an on-cell type, a sensing electrode may be formed on the upper surface of the display panel 300. In detail, a sensing electrode or the like may be formed directly on the substrate disposed on the display panel 300. Like the external touch panel 400, the touch panel 400 may be formed separately from the base substrate 200, or may be integrally formed with the base substrate 200. Referring to FIG.

When the touch panel 400 is an in-cell type, a sensing electrode may be formed between the first substrate and the second substrate of the display panel 300. That is, a sensing electrode or the like may be formed together when the display panel 300 is formed. At this time, the base substrate 200 is formed as a separate structure that is different from the touch panel 400. Further, a transparent adhesive layer may be formed between the base substrate 200 and the display panel 300.

6 and 7, the touch panel 400 will be described in more detail as follows. 6 and 7 show an example in which the external touch panel is formed separately from the base substrate 200. The configuration of the touch panel 400 is not limited to the drawings. The touch panel 400 may be applied to both the external and internal touch panels as described above.

Referring to FIGS. 6 and 7, the touch panel 400 may be divided into a display area AA through which light is transmitted and a non-display area IA through which light is not transmitted. The non-display area IA is a concept opposite to the display area AA and is activated even when the user touches the display area AA. And the touch command input is not performed.

Referring to FIG. 6, the touch panel 400 may include a sensing electrode 421 and a wiring 422 on one surface of a first touch substrate 401. The first touch substrate 401 may include, but is not limited to, tempered glass, semi-tempered glass, soda lime glass, reinforced plastic or soft plastic.

The sensing electrode 421 may be disposed on the display area AA and the wiring 422 may be disposed on the non-display area IA. Although not shown in the drawing, a print layer may be further formed in the non-display area IA of the first touch substrate 401. [ In addition, a wiring 422 may be formed on the print layer.

The sensing electrode 421 may include a conductive material. For example, the sensing electrode 421 may be selected from the group consisting of a transparent conductive material, a metal, a nanowire, a photosensitive nanowire film, a carbon nanotube (CNT), a graphene, a conductive polymer, And may include any one of them.

The sensing electrode 421 may include a first sensing electrode 411 and a second sensing electrode 412. The first sensing electrode 411 and the second sensing electrode 412 may include the same material or may include different materials. The first sensing electrode 411 and the second sensing electrode 412 may be disposed on the same surface of the first touch substrate 401.

When the first sensing electrode 411 and the second sensing electrode 412 are disposed on the same surface of the first touch substrate 401, the first sensing electrode 411 and the second sensing electrode 412 Should not be in contact with each other. To this end, an insulating layer and a bridge electrode may be further disposed.

In detail, one of the first sensing electrode 411 and the second sensing electrode 412 is disposed below the insulating layer, and the other is disposed at both ends of the bridge electrode formed on the insulating layer Can be connected and electrically connected. Accordingly, the first sensing electrode 411 and the second sensing electrode 412 can be electrically connected to each other without being short-circuited by the bridge electrode and the insulating layer.

The first sensing electrode 411 and the second sensing electrode 412 may be disposed on the display area AA to sense a touch. in details. The first sensing electrode 411 may extend in one direction on the display area AA and the second sensing electrode 412 may extend in a direction different from the first direction.

The wiring 420 may include a first wiring 421 and a second wiring 422. In detail, the wiring 420 may include the first wiring 421 connected to the first sensing electrode 411 and the second wiring 422 connected to the second sensing electrode 412. have.

The first wiring 421 and the second wiring 422 may be connected to a printed circuit board (not shown). More specifically, the first wiring 421 and the second wiring 422 are mounted on a driving chip (not shown) through a touch signal detected from the first sensing electrode 411 and the second sensing electrode 412, To the printed circuit board (not shown) to perform a touch operation. The printed circuit board (not shown) may be, for example, a flexible printed circuit board (FPCB).

The first wiring 421 and the second wiring 422 may include a conductive material. For example, the first wiring 421 and the second wiring 422 may include a metal material such as silver (Ag) or copper (Cu).

Although not shown in the drawing, a protective layer (not shown) may be further formed on the wiring 420. The protection layer (not shown) may protect the wiring 420. Specifically, the protective layer (not shown) can prevent the reliability of the wiring 420 from being deteriorated due to oxidation of the wiring 420 due to exposure to oxygen, or moisture penetration.

Referring to FIG. 7, the touch panel 400 may include a first touch substrate 402 and a second touch substrate 403. The first touch substrate 402 and the second touch substrate 403 may include, but are not limited to, tempered glass, semi-tempered glass, soda lime glass, reinforced plastic or soft plastic. The first touch substrate 402 and the second touch substrate 403 may be bonded using a transparent adhesive such as an optical transparent adhesive (OCA).

A first sensing electrode 411 may be disposed on the display area AA of the first touch substrate 402. In addition, a first wiring 421 connected to the first sensing electrode 411 may be disposed in the non-display area IA of the first touch substrate 402.

A second sensing electrode 412 may be disposed on the display area AA of the second touch substrate 403. [ In addition, a second wiring 422 connected to the second sensing electrode 412 may be disposed in the non-display area IA of the second touch substrate 403. The first wiring 421 and the second wiring 422 may be electrically connected to a printed circuit board (not shown), respectively.

However, the touch panel 400 is not limited to the drawings and the above description, and may be an input device capable of inputting in a manner that the touch panel 400 is in contact with the front face of the display device using a finger, a stylus pen, or the like Do. That is, the touch panel 400 can be applied without limitation as long as it is generally used.

The display panel 300 may be the same as the above-described embodiments. That is, the display panel 300 may be a liquid crystal display panel or an organic light emitting display panel. In addition, the hard coating layer 100 may be the same as the above-described embodiments.

In addition, the base substrate 200 may be the same as the above-described embodiments. Preferably, the base substrate 200 disposed on the touch panel 400 may be a transparent substrate. That is, the light transmitted through the base substrate 200 may be unpolarized light. At this time, the base substrate 200 may be glass or plastic.

When the base substrate 200 is formed of a transparent substrate through which unpolarized light is transmitted, the hard coating layer 100 may be formed on both sides of the base substrate 200, though not shown in the drawing. That is, the hard coating layer 100 may be formed on the upper and lower surfaces of the base substrate 200. When the hard coating layer 100 is formed on both sides of the base substrate 200, the hard coating layer 100 may have a reflectance of about 4% or less.

The features, structures, effects and the like described in the foregoing embodiments are included in at least one embodiment of the present invention and are not necessarily limited to one embodiment. Further, the features, structures, effects, and the like illustrated in the embodiments may be combined or modified in other embodiments by those skilled in the art to which the embodiments belong. Therefore, it should be understood that the present invention is not limited to these combinations and modifications.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is clearly understood that the same is by way of illustration and example only and is not to be construed as limiting the scope of the present invention. It can be seen that various modifications and applications are possible. For example, each component specifically shown in the embodiments may be modified and implemented. It is to be understood that the present invention may be embodied in many other specific forms without departing from the spirit or essential characteristics thereof.

100: hard coat layer
200: base substrate
300: Display panel
400: touch panel

Claims (20)

Display panel; And
And a hard coating layer disposed on the display panel,
Wherein the hard coating layer comprises a fluorine-based polymer comprising a compound unit represented by the following formula (8).

[Chemical Formula 8]

In the above formula (8)
d is an integer of 1 to 10, e is an integer of 1 to 10, x is an integer of 1 or more, and R ₁₁ is an alkyl having 1 to 4 carbon atoms.
The method according to claim 1,
Wherein the hard coating layer further comprises a fluorine-based silane containing a compound unit represented by the following formula (9).
[Chemical Formula 9]

In the above formula (9), f is an integer of 1 to 10, g is an integer of 1 to 10, and R ₁₂ to R ₁₄ are each independently alkyl having 1 to 4 carbon atoms.
The method according to claim 1,
Wherein the hard coating layer is a single layer structure.
The method according to claim 1,
Wherein the hard coating layer is provided on one surface of the substrates of the display panel.
The method according to claim 1,
Wherein the polarizing plate is further provided on the display panel,
And the hard coating layer is disposed on one side of the polarizing plate.
The method according to claim 1,
Wherein the display panel further includes a touch panel,
And the hard coating layer is disposed on the touch panel.
The method according to claim 1,
Wherein the hard coating layer has a thickness of 80 nm to 5 占 퐉.
The method according to claim 1,
Wherein the display panel is a liquid crystal display panel or an organic light emitting display panel.
Manufacturing a display panel; And
And forming a hard coating layer on the display panel by using a photo-curable resin composition comprising a fluorine-based polymer containing a compound unit represented by the following formula (8).
[Chemical Formula 8]

In the above formula (8)
d is an integer of 1 to 10, e is an integer of 1 to 10, x is an integer of 1 or more, and R ₁₁ is C _1-4 alkyl.
10. The method of claim 9,
Wherein the fluorine-based polymer is contained in the photocurable resin composition in an amount of 15% by weight to 35% by weight.
10. The method of claim 9,
Wherein the photo-curable resin composition further comprises a closed silsesquioxane resin containing a compound unit represented by the following formula (1).
[Chemical Formula 1]

In Formula 1, n is an integer of 6 to 18,
Wherein R ₁ is any one selected from the group consisting of functional groups represented by the following formulas (3) to (6)
(3)

[Chemical Formula 4]

[Chemical Formula 5]

[Chemical Formula 6]

In the above Chemical Formulas 3 to 6, m is an integer of 1 to 20, and R ₁₀ is an aliphatic hydrocarbon or aromatic hydrocarbon having 1 to 80 carbon atoms.
12. The method of claim 11,
Wherein n of the formula (1) is 12, and the closed silsesquioxane resin is formed of a hexahedron.
12. The method of claim 11,
Wherein the closed silsesquioxane resin is contained in the photocurable resin composition in an amount of 10% by weight to 20% by weight.
10. The method of claim 9,
Wherein the photo-curable resin composition comprises a chain-type siloxane acrylate containing a compound unit represented by the following formula (7).
(7)

Wherein a is an integer of 0 to 1000, b is an integer of 1 to 30, and c is an integer of 1 to 25.
15. The method of claim 14,
Wherein the chain type siloxane acrylate is contained in the photocurable resin composition in an amount of 2 wt% to 4 wt%.
10. The method of claim 9,
Wherein the molar ratio of fluorine is 17 to 25 when the molar ratio of the photo-curable resin composition is 100.
10. The method of claim 9,
Wherein the photo-curable resin composition comprises a fluorine-based silane containing a compound unit represented by the following formula (9).
[Chemical Formula 9]

In the above formula (9), f is an integer of 0 to 10, g is an integer of 1 to 10, and R ₁₂ to R ₁₄ are each independently alkyl having 1 to 4 carbon atoms.
18. The method of claim 17,
Wherein the fluorine-based silane is contained in the photocurable resin composition in an amount of 10% by weight to 15% by weight.
10. The method of claim 9,
Wherein the photo-curable resin composition comprises a photopolymerization initiator.
10. The method of claim 9,
Wherein the photo-curable resin composition comprises an acrylic monomer.

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