KR20150130971A - Fingerprint-resistant anti-reflection film - Google Patents

Abstract

Reflection film in which a hard coat layer, a high refractive index layer and a low refractive index layer are laminated in this order on one side of a transparent base film. The refractive index of the high refractive index layer is 1.50 to 1.65 and the film thickness is 130 to 180 nm. The refractive index of the low refractive index layer is 1.36 to 1.42, and the film thickness is 70 to 100 nm. (Minimum) is in the range of 350 to 530 nm and the wavelength? (Bending) at the bending point is in the range of 350 to 850 nm in the wavelength range of 350 to 850 nm, ≪? (Bending). The visual sensitivity reflectance of the antiglare antireflection film is 2.0% or less, the reflectance chromaticity C is less than 6.0, and the reflection color difference ΔE before and after adhesion of sebum contamination is less than 7.0.

Description

FINGERPRINT-RESISTANT ANTI-REFLECTION FILM [0002]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present disclosure relates to an antiglare film which is attached to a surface of a touch panel type display, a construction material, a boarding passenger or a glass used in the art field.

Display products such as televisions, PCs, and smart phones are generally equipped with anti-reflection films for reducing or preventing reflection of external light to improve image quality. However, in recent years, such a display product has been made into a touch panel, and even when an antireflection film is mounted on the surface of the antireflection film, fingerprint contamination such as a fingerprint adheres to the surface of the antireflection film. In addition, there is a chance to attach an antireflection film to a window or a glass case in order to improve visibility even in the case of construction materials, boarding passengers, arts and the like. In this case also, the surface of the antireflection film is contaminated with sebum such as fingerprints, There is a problem that the visibility is deteriorated.

Antifouling treatment of fluorine or silicon based antifouling agent is generally applied to the surface of the film in order to counter the contamination of the antifouling film such as the fingerprint of the antireflection film. This anti-fouling treatment makes it possible to prevent sebum contamination such as fingerprints from being adhered well and to wipe off even if sebum contamination is attached.

As such a technique, for example, Japanese Patent Application Laid-Open No. 1996-69995 discloses a method of forming an antifouling layer containing a fluorine compound on the surface of an antireflection layer. In this method, a certain degree of fingerprint effect can be obtained. In this method, adhesion of sebum contamination is not completely prevented, and further a step of forming an antifouling layer is required, which is costly.

Japanese Patent Laid-Open Publication No. 2011-48359 discloses a technique of containing an antifouling agent containing a fluorinated compound in an antireflection layer. According to this method, a certain degree of fingerprint effect can be obtained without increasing the number of processes. In this case as well, adhesion of sebum contamination is not completely prevented.

As described above, in the conventional tofu film, the focus is on preventing the fingerprints from adhering to the film. This causes a problem that the manufacturing process is increased, and it is almost impossible to completely adhere the fingerprints in the beginning. Thus, the inventors of the present application have found that, if the fingerprint is attached, the fingerprint can not be recognized if it can not be recognized, and the present inventors have found that the present invention has been completed.

SUMMARY OF THE INVENTION It is therefore an object of the present invention to solve the problems described above, and its object is to provide an antireflection film which is excellent in antireflection property and which does not completely prevent adhesion of sebum contamination such as fingerprints, Which is small in appearance change and which is not wiped off when wiping off sebum contamination.

That is, the antiglare film of the present disclosure is as follows.

(1) An antiglare film comprising a transparent substrate film and a hard coat layer, a high refractive index layer and a low refractive index layer stacked in this order on one side of the transparent substrate film,

Wherein the high refractive index layer has a refractive index of 1.50 to 1.65 and a film thickness of 130 to 180 nm,

The low refractive index layer has a refractive index of 1.36 to 1.42 and a film thickness of 70 to 100 nm,

The minimum reflectance wavelength? (Minimum) is in the wavelength range of 350 to 530 nm in the wavelength range of 350 nm to 850 nm,

The wavelength? (Bending) at the bending point is in the range of? (Minimum) <? (Bending) in the wavelength range of 350 nm to 850 nm,

The visibility reflectance is 2.0% or less,

The reflection chroma C is less than 6.0,

The reflection chromaticity before the sebum contamination is adhered is 1.49 and the reflection color difference? E of the reflection chromaticity after the sebum contamination with the thickness of 10 nm is attached is less than 7.0. The bending point in the present disclosure indicates a point where the slope on the long wavelength side changes abruptly as compared with the minimum reflectance wavelength in the reflection spectrum as shown in Fig.

(2) The relationship between the reflectance R (minimum) [%] at λ (minimum) and the reflectance R (break) at λ (bending) The antiglare antireflection film according to (1), wherein the antireflection film is [%].

(3) The anti-reflective film according to (2), wherein the low refractive index layer contains an antifouling agent.

(4) The antiglare film according to any one of (1) to (3), wherein an adhesive layer is formed on the other side of the transparent base film.

In the present disclosure, " xx to xx " representing the numerical range means " xx or more xx or less " unless otherwise specified.

The inventors of the present application paid attention to the contamination of sebum such as fingerprints adhered to the antireflection film and measured the reflection spectrum before and after attachment of the sebum contamination and found that the sebum contamination film thickness was 10 nm and the refractive index was around 1.49 Respectively. Based on this fact, sebum contamination was attached to the antireflection film based on the assumption that the reflectance was 2.0% or less, and as a result of examining the change of the appearance and the scrubbing of sebum contamination, the reflection spectrum before the fingerprint was attached was made into a specific shape Next, the reflectance saturation C < 6.0. Also, when the reflection color difference DELTA E < 7.0 before and after the sebum contamination is adhered, the change in the appearance before and after the sebum contamination adheres is small without formation of the stainproof layer, I found out that I could not see what was left without cleaning.

In other words, according to the present disclosure, it is possible to provide an antireflection film which has sufficient antireflection properties and which has a small change in appearance before and after adhesion of sebum contamination without forming an antifouling layer on the surface of the film, An antireflection film can be provided. In other words, the present disclosure can achieve a completely different effect from the conventional one in that it can prevent the sebum contamination from being adhered well as in the conventional method, . Further, if the low refractive index layer contains an antifouling agent, the adhered amount of sebum contamination can be further reduced, and the degree of scrubbing can also be improved.

BRIEF DESCRIPTION OF DRAWINGS FIG. 1 is a graph showing the reflection spectra of the antiglare antireflection films of Examples 2 to 4; FIG.

The antiglare antireflection film of the present disclosure has at least a hard coat layer, a high refractive index layer and a low refractive index layer laminated in this order on one side of a transparent substrate film.

&Quot; Transparent substrate film &

The transparent substrate film used in the antiglare film is not particularly limited as long as it has transparency. Examples of the material for forming such a transparent base film include polyarylate, triacetylcellulose (TAC), or polyether (meth) acrylate in addition to polyesters such as polymethacrylic acid acrylate (PMMA) and polyethylene terephthalate Sulfone, and the like. Of these, TAC is preferable from the viewpoints of handling and refractive index.

The thickness of the transparent base film is not particularly limited, but is generally 25 to 400 占 퐉, preferably 50 to 200 占 퐉. When the thickness of the transparent base film is thinner than 25 占 퐉 or thicker than 400 占 퐉, the handling properties during production and use of the antiglare antireflection film are deteriorated. The transparent base film may contain various additives. Such additives include, for example, ultraviolet absorbers, antistatic agents, stabilizers, plasticizers, lubricants and flame retardants.

«Hard coat layer»

The hard coat layer is a layer for securing the surface strength of the antiglare film. The refractive index and the film thickness of the hard coat layer are not particularly limited from the viewpoint of transparency because the difference in refractive index between the high refractive index layer and the low refractive index layer and the film thickness balance are obtained mainly. The refractive index of the hard coat layer is preferably 1.46 to 1.53. When the refractive index of the hard coat layer is less than 1.46 or more than 1.53, interference deviations are remarkable due to the interference caused by the difference in refractive index between the other layer and the hard coat layer. It is preferable that the hard coat layer has a thickness of 1 to 20 mu m. When the film thickness of the hard coat layer is less than 1 탆, a sufficient surface strength can not be obtained, which is not preferable. On the other hand, when the film thickness is more than 20 占 퐉, problems such as lowering of bending resistance occur, which is not preferable.

The hard coat layer is formed by applying a hard coat layer coating liquid composed of a composition containing an ultraviolet ray hardening resin directly to a transparent substrate film, followed by curing.

≪ Ultraviolet ray curable resin &

The type of ultraviolet curable resin forming the hard coat layer is not particularly limited as long as it is a known resin which is generally used conventionally in this kind of transparent film or antireflection film and causes a curing reaction by irradiation of ultraviolet rays . Examples of such a resin include monofunctional (meth) acrylate, polyfunctional (meth) acrylate, epoxy resin, urethane resin, silicone resin and the like. In the present specification, (meth) acrylate means a generic term including both acrylate and methacrylate. The same applies to the description of (meth) acrylic acid, (meth) acrylic, and (meth) acryloyl.

The hard coat layer coating liquid may contain various additives as other components. Examples of the additives include inorganic or organic fine particle fillers, inorganic or organic fine particle pigments, and other inorganic or organic fine particles, polymers, polymerization initiators, polymerization inhibitors, antioxidants, dispersants, surfactants , A light stabilizer and a leveling agent. In addition, any amount of a solvent may be added as long as it is dried after forming the film in the wet coating method.

&Quot; High refractive index layer &

Next, the high refractive index layer will be described. The high refractive index layer is a layer having a refractive index higher than that of the hard coat layer and a low refractive index layer which will be described later. The low refractive index layer and the layer constituting the antireflection layer together with the low refractive index layer, to be. The refractive index of the high refractive index layer is 1.50 to 1.65. When the refractive index of the high refractive index layer is less than 1.50, the difference in refractive index between the low refractive index layer and the low refractive index layer is too small, and reflection at the interface between the high refractive index layer and the low refractive index layer is weakened. When the refractive index of the high refractive index layer exceeds 1.65, the reflection at the interface between the high refractive index layer and the low refractive index layer becomes strong, and the coloration of the reflected light becomes strong. The film thickness of the high refractive index layer is 130 to 180 nm. When the film thickness of the high refractive index layer is less than 130 nm or exceeds 180 nm, the interference balance with the other layer is broken, and the reflectance, the reflection chroma C, and the reflection color difference? So that sufficient antireflection property and / or transparency can not be obtained.

≪ Composition for forming a high refractive index layer &

The high refractive index layer is formed by applying a high refractive index layer coating liquid comprising a composition for forming a high refractive index layer containing an active energy ray curable resin and metal oxide fine particles onto a hard coat layer and then curing.

(Active energy ray curable resin)

The active energy ray-curable resin is not particularly limited as long as it is a polyfunctional (meth) acrylate which causes a curing reaction by irradiating an active energy ray such as ultraviolet rays or electron beams. Examples of the polyfunctional (meth) acrylate include dipentaerythritol hexa (meth) acrylate, tetramethylolmethane tetra (meth) acrylate, tetramethylol methane tri (meth) acrylate, trimethylol propane Polyfunctional alcohols such as tri (meth) acrylate, 1,6-hexanediol di (meth) acrylate and 1,6-bis (3- (meth) acryloyloxy-2-hydroxypropyloxy) (Meth) acrylate, polyethylene glycol di (meth) acrylate, and polyurethane (meth) acrylate.

(Metal oxide fine particles)

The metal oxide fine particles are added to adjust the refractive index of the high refractive index layer. Examples of the metal oxide fine particles include zinc antimonate, zinc oxide, titanium oxide, cerium oxide, aluminum oxide, tantalum oxide, yttrium oxide, ytterbium oxide, zirconium oxide, indium tin oxide, silicon oxide, ≪ / RTI > Particularly, when conductive fine particles such as zinc antimonate, indium tin oxide and antimony-containing tin oxide are used, it is preferable in that the surface resistivity can be lowered and further the antistatic ability can be imparted. The titanium oxide is also preferable in that the high refractive index layer can be adjusted to a higher refractive index. On the other hand, silicon oxide is preferable as a material for lowering the refractive index of the high refractive index layer.

The content of the metal oxide fine particles is preferably 90% by mass or less. When the content of the metal oxide fine particles exceeds 90 mass%, the content of the active energy ray-curable resin serving as the base of the high refractive index layer becomes relatively small, so that the high refractive index layer becomes weak.

&Quot; Low refractive index layer &

Next, the low refractive index layer will be described. The low refractive index layer is a layer having a refractive index lower than that of the hard coat layer and the high refractive index layer and is a layer constituting the antireflection layer together with the high refractive index layer which exhibits an antireflection effect by a difference in refractive index with respect to the high refractive index layer. The refractive index of the low refractive index layer is in the range of 1.36 to 1.42. When the refractive index is less than 1.36, it is difficult to form a sufficiently hard layer. On the other hand, when the refractive index exceeds 1.42, the difference in refractive index between the high refractive index layer and the high refractive index layer becomes too small and reflection at the interface between the high refractive index layer and the low refractive index layer becomes weak , The antireflection performance may not be sufficiently exhibited.

The film thickness of the low refractive index layer is 70 to 100 nm. When the film thickness of the low refractive index layer is less than 70 nm or exceeds 100 nm, the interference balance with the other layers is broken, and the reflectance, the reflection chromaticity C, and the reflection color difference? , Sufficient antireflection properties and / or transparency can not be obtained.

≪ Composition for forming a low refractive index layer &

The low refractive index layer is formed by applying a low refractive index layer coating liquid composed of a composition for forming a low refractive index layer onto the high refractive index layer and then curing. The composition for forming a low refractive index layer contains an active energy ray curable resin and hollow silica fine particles.

(Active energy ray-curable resin)

The active energy ray-curable resin forming the low refractive index layer is not particularly limited as long as it is a polyfunctional (meth) acrylate which causes a curing reaction by irradiating an active energy ray such as ultraviolet rays or electron rays. As the resin for forming the low refractive index layer in this kind of film, generally, a reactive silicon compound such as? -Acryloxypropyltrimethoxysilane or the like is used as a starting material in addition to polyfunctional (meth) acrylate , A composition containing an active energy ray-curable polyfunctional (meth) acrylate as a main component is preferable from the standpoint of achieving both productivity and hardness.

The active energy ray-curable polyfunctional (meth) acrylate is not particularly restricted but includes, for example, dipentaerythritol hexa (meth) acrylate, tetramethylolmethane tetra (meth) acrylate, tetramethylol methane tri (Meth) acryloyloxy-2-hydroxypropyloxy) acrylate, trimethylolpropane tri (meth) acrylate, 1,6-hexanediol di (Meth) acrylic derivatives of polyfunctional alcohols such as hexane, and polyethylene glycol di (meth) acrylate and polyurethane (meth) acrylate.

The active energy ray-curable polyfunctional (meth) acrylate may be a fluorinated monomer. A fluorine monomer having a structure in which a fluorine atom is introduced into a molecule as a methylene fluoride group or a fluorinated methine group is a monomer in which almost all of the fluorine atoms are introduced into the molecule as a methylene fluoride group or a fluorinated methine group, All monomers available are available. That is, any of two or more (multifunctional) monomers may be used, or a mixture thereof may be used. These fluorinated compounds can increase the strength and hardness of the cured coating and improve the scratch resistance and wear resistance of the surface of the cured coating. Of the fluorinated compounds, fluorinated polyfunctional (meth) acrylates are preferable because they can form a crosslinked structure and have high strength and hardness of the cured coating.

In the hollow silica fine particles, the porosity of the hollow portion in the hollow silica fine particles is preferably 40 to 45%. If the porosity of the hollow silica fine particles is less than 40%, the refractive index of the hollow silica fine particles themselves becomes high and the refractive index of the low refractive index layer can not be significantly lowered or the content of the hollow silica fine particles must be increased, It becomes. On the other hand, when the porosity exceeds 45%, the hollow silica fine particles themselves become weak. The average particle diameter of the hollow silica fine particles is preferably not more than the film thickness of the low refractive index layer, and specifically, it is preferably 10 to 100 nm. It is also preferable that the hollow silica fine particles are modified with a silane coupling agent having a polymerizable double bond, if necessary. This improves the dispersibility of the active energy ray-curable resin.

(Hollow silica fine particles)

The hollow silica fine particles are fine particles in which silica (silicon dioxide, SiO ₂ ) is formed in a nearly spherical shape and hollow portions are formed in the outer periphery thereof. The average particle diameter is 10 to 100 nm, the thickness of the external angle is 1 to 60 nm, the porosity of the hollow portion is 40 to 45%, and the refractive index is a low refractive index of 1.20 to 1.29. Since the hollow portion contains air having a refractive index of 1.0, it is possible to achieve a low refractive index and a low reflectance with respect to a cured coating formed by curing of a polyfunctional (meth) acrylate, The scratch resistance and abrasion resistance of the cured coating can be improved by the fine particles. When the porosity of the hollow portion is less than 40%, the amount of air in the hollow portion becomes small, so that the low refractive index and low reflectance of the cured coating can not be achieved. On the other hand, when the porosity of the hollow portion exceeds 45%, it is necessary to make the outer angle thin in order to increase the porosity, making it difficult to manufacture.

The hollow silica fine particles are preferably modified by a silane coupling agent if necessary. As a result, it is possible to exhibit an excellent effect which is not found in conventional general (unmodified) fine silica particles or hollow silica fine particles, that is, excellent compatibility with polyfunctional (meth) acrylate. Therefore, when the modified hollow silica fine particles are mixed with the polyfunctional (meth) acrylate, coagulation of the modified hollow silica fine particles can be suppressed, and a cured coating excellent in transparency can be obtained without whitening. In addition, in the cured coating, since the polymerizable double bond of the silane coupling agent and the polymerizable double bond of the polyfunctional (meth) acrylate are copolymerized (chemically bonded) to form a hardened coating, the scratch resistance and abrasion resistance of the cured coating It can dramatically improve.

In this case, in order to enhance the effect of denaturation, the hollow silica fine particles are more preferably modified by a silane coupling agent having a polymerizable double bond represented by the following formula (1).

Z-R1-Si (OR2) ₃ ... (One)

Wherein Z is a (meth) acryloyloxy group, R 1 is an alkylene group having 1 to 4 carbon atoms, and R 2 is a hydrogen atom, a methyl group or an ethyl group.

The modified hollow silica fine particles are produced by subjecting the surface of hollow silica fine particles having an average particle size of 5 to 100 nm and a specific surface area of 50 to 1000 m 2 / g with a silane coupling agent to further describe the modified hollow silica fine particles. Specifically, an organosilyl group (a monoorganosilyl group, a diorganosilyl group, or a triorganosilyl group) is bonded to the surface of the hollow silica fine particles by the hydrolysis reaction between the silanol group and the silane coupling agent on the surface of the hollow silica fine particles And has an organic group directly bonded to a plurality of silicon atoms on its surface.

The refractive index of the low refractive index layer can be set by appropriately adjusting the blending ratio of the active energy ray-curable resin as the base resin and the hollow silica fine particles. Specifically, the content of the hollow silica fine particles is preferably 30 to 80 mass%, and more preferably 50 to 70 mass%, based on the total amount (100 mass%) of the active energy ray-curable resin. When the content is less than 30% by mass, the content of the hollow silica fine particles is small, and the resulting cured film can not be made low in refractive index and low in reflectance. On the other hand, when the amount exceeds 80% by mass, the excess hollow silica fine particles do not react with the active energy ray-curable resin, and hollow silica fine particles remain, and the hardness and abrasion resistance of the surface of the cured coating are insufficient. In the case of using the modified hollow silica fine particles, the (meth) acryloyloxy group contained in the silane coupling agent of the modified hollow silica fine particles and the polymerizable double bond of the polyfunctional (meth) acrylate are copolymerized and bonded, The function of hollow silica fine particles and the function of polyfunctional (meth) acrylate are synergistically and continuously expressed.

The low refractive index layer is obtained by polymerizing a coating liquid for a low refractive index layer with a high energy beam such as an electron beam or by polymerizing and curing in the presence of a thermal decomposition type polymerization initiator or a photopolymerization initiator. Among these, a method of applying a coating liquid for a low refractive index layer containing a photopolymerization initiator to the surface of the high refractive index layer and irradiating ultraviolet rays under an inert gas atmosphere to polymerize and cure it is preferable.

As the photopolymerization initiator, any photopolymerization initiator may be used as long as it has polymerization initiating ability by ultraviolet irradiation. Methyl-1 - [4- (methylthio) phenyl] -2-morpholinocyclohexyl phenyl ketone, 2-hydroxy- An acetophenone-based polymerization initiator such as perinopropane-1-one and 1- [4- (2-hydroxyethoxy) phenyl] -2-hydroxy- Benzophenone, [4- (methylphenylthio) phenyl] phenylmethanone, 4-hydroxybenzophenone, 4-hydroxybenzophenone, 4- Benzophenone-based polymerization initiators such as phenylbenzophenone and 3,3 ', 4,4'-tetra (t-butylperoxycarbonyl) benzophenone, 2-chlorothioxanthone, 2,4-diethylthioxanthone Based polymerization initiator, and the like. These photopolymerization initiators may be used alone or as a mixture.

The content of the photopolymerization initiator is preferably 0.1 to 20% by mass with respect to the solid content in the coating liquid for a low refractive index layer. When the content of the photopolymerization initiator is less than 0.1% by mass, the polymerization curing of the coating liquid for the low refractive index layer becomes insufficient, and when it exceeds 20% by mass, the refractive index of the cured coating after polymerization curing is increased. The kind of ultraviolet rays used for ultraviolet irradiation is not particularly limited as long as it is generally used, and for example, low pressure mercury lamp, high pressure mercury lamp, ultra high pressure mercury lamp, metal halide lamp, xenon lamp and the like are used.

As a condition of ultraviolet irradiation, the dose is preferably 10 mJ or more, more preferably 100 mJ or more. The upper limit of the irradiation amount is determined according to a conventional method in this kind of ultraviolet irradiation. When the irradiation dose is less than 10 mJ, sufficient hardness can not be obtained for the cured coating formed after the polymerization curing. After polymerization and curing, post curing may be further performed by ultraviolet irradiation. The oxygen concentration at the time of ultraviolet irradiation is preferably 1000 ppm or less by injecting an inert gas such as nitrogen or argon both during polymerization curing and after curing in order to obtain good polymerization curability.

The low refractive index layer may have other functions as long as it does not impair its function. The low refractive index layer may be provided with one or more functions such as antistatic properties, antifouling properties, slipperiness and ultraviolet absorption by adding an additive or the like . In particular, an additive that exhibits antifouling property can improve mobility by its effect.

(Antifouling agent)

It is preferable to appropriately add a known polysiloxane-based or fluorine-based antifouling agent to the low refractive index layer for the purpose of improving transparency. Preferable examples of the polysiloxane-based compound include polyether-modified polydimethylsiloxane having an acryl group, polyether-modified dimethylsiloxane, polyester-modified dimethylsiloxane having an acryl group, polyether-modified polydimethylsiloxane, polyester-modified polydimethylsiloxane, Aralkyl-modified polymethylalkylsiloxane, and the like.

On the other hand, the fluorine-based compound used as an antifouling agent preferably has a substituent which contributes to bond formation or compatibility with the low refractive index layer. The substituents may be the same or different, or plural substituents may be present. Preferred examples of the substituent include an acryloyl group, a methacryloyl group, a vinyl group, an aryl group, a cinnamoyl group, an epoxy group, an oxetanyl group, a hydroxyl group, a polyoxyalkylene group, a carboxyl group and an amino group. The fluorine-based compound may be a polymer with a compound containing no fluorine atom, or may be an oligomer, and the molecular weight is not particularly limited.

«Adhesive layer»

On the other side of the transparent base film, an adhesive layer is formed in order to impart adhesiveness to the anti-reflective film. The material for forming the pressure-sensitive adhesive layer is not particularly limited, and examples thereof include pressure-sensitive adhesives such as acrylic pressure-sensitive adhesives, silicone pressure-sensitive adhesives, and urethane pressure-sensitive adhesives. Above all, an acrylic pressure-sensitive adhesive is preferable from the viewpoint of adhesive force, and a silicone pressure-sensitive adhesive is preferable from the viewpoint of re-releasability.

The method of forming the pressure-sensitive adhesive layer is not particularly limited, but a conventionally known method of obtaining a cured film by heat curing, ultraviolet curing, electron beam curing or the like after forming a coating film by a wet coating method can be used. The adhesive layer may have other functions as long as the function is not impaired. For example, it is possible to add one or more functions such as blocking of light in a specific wavelength range, improvement of contrast, correction of color tone, and durability by adding an ultraviolet absorber, a dye or an additive.

«Anti-reflective film»

The antiglare antireflection film to be obtained has a minimum reflectance wavelength? (Minimum) at a wavelength of 350 to 530 nm and a wavelength at a bending point of 350 nm to 850 nm in a wavelength range of 350 nm to 850 nm. lambda (bending), and lambda (minimum) &lt; lambda (bending). The reflectance chromaticity and refractive index before the sebum contamination were 1.49 and the reflection chromaticity difference E of the reflectance chromaticity after the sebum contamination with the thickness of 10 nm was 7.0 . The relationship between the reflectance R (minimum) [%] at lambda (minimum) and the reflectance R (elongation) [%] at lambda ]. If the relationship of λ (minimum) is out of 350 to 530 nm or the relation of λ (minimum) <λ (bending) is not satisfied, the reflectance, the reflection saturation C and the rise of the reflection color difference ΔE So that sufficient antireflection property and / or transparency can not be obtained. In addition, when the visibility reflectance exceeds 2.0%, sufficient antireflection properties can not be obtained. Further, when the reflection chroma C is 6.0 or more, or when the reflection chrominance DELTA E before and after adhesion of sebum contamination is 7.0 or more, the sufficient transparency can not be obtained.

Example

Hereinafter, the antiglare film of the present disclosure will be described in more detail with reference to Production Examples, Examples and Comparative Examples. The refractive indices of the cured products of the respective coating liquids forming the hard coat layer, the high refractive index layer and the low refractive index layer prepared in Production Example were measured as follows.

[Refractive index of each layer]

(1) Each coating liquid was applied to each of the dried films by a dip coater (manufactured by Sugiyama Kogyo Co., Ltd.) on an acrylic resin plate having refractive index of 1.49 ("Terra glass A", manufactured by Asahi Chemical Industry Co., Ltd.) And the thickness of the layer was adjusted so that the optical film thickness was about 550 nm.

(2) After drying the solvent, 400 mJ of ultraviolet ray was irradiated using a 120 W high-pressure mercury lamp under an atmosphere of nitrogen by an ultraviolet irradiation apparatus (manufactured by Iwasaki Electric Co., Ltd.) as necessary to cure each coating liquid.

(3) The back of the acrylic resin plate was roughened with a sand paper, and the surface of the acrylic resin plate was coated with a black paint to obtain a 5 (5) layer having a wavelength of 400 to 650 nm by a spectrophotometer ("U- Best V560" ° and -5 °, and the minimum or maximum value of the reflectance was read.

(4) The refractive index was calculated from the extreme value of the reflectance using the following formula.

[Equation 1]

The properties of the obtained antiglare antireflection film were evaluated by the following methods.

[Visibility Reflectance]

The back surface of the measurement surface was roughened with a sand paper and the surface was completely coated with black paint by a spectrophotometer (FE3000, trade name, manufactured by OTSUKA ELECTRONICS CO., LTD.) To a wavelength of 380 nm to 780 nm °, -5 ° specular spectra were measured. Using the obtained spectral reflectance of 380 nm to 780 nm and the relative spectral distribution of the CIE standard Illuminant D65, the tristimulus value Y of the object color due to reflection in the XYZ color system assumed in JIS Z 8701 is used as the visibility reflectance %).

[Reflectance Saturation C]

The color space CIE1976L * a * b * color space defined in JIS Z 8729 is calculated using the spectral reflectance at a wavelength of 380 to 780 nm and the relative spectral distribution of the CIE standard Illuminant D65 measured by the visibility reflectance, * and b * values, Cab * = {(a *) 2 + (b *) 2} 1/2 was calculated.

[Reflection color difference? E]

The color space CIE1976L * a * b * color space defined in JIS Z 8729 was calculated using the spectral reflectance at a wavelength of 380 to 780 nm and the relative spectral distribution of the CIE standard Illuminant D65 measured by the visibility reflectance, ? * A * b * = {(? L *) 2 + (? A *) 2 + (? B *) 2} 1/2 defined in Eq.

[Reflectance R (minimum) at minimum reflectance wavelengths? (Minimum) and? (Minimum)] [

The back surface of the measurement surface was roughened with a sand paper and the surface was completely coated with black paint by a spectrophotometer (FE3000, trade name, manufactured by OTSUKA ELECTRONICS CO., LTD.) To a wavelength of 350 nm to 850 nm °, -5 ° specular spectra were measured. The minimum value was read from the obtained reflectance data, the wavelength thereof was set to? (Minimum), and the reflectance at that time was set to R (minimum).

[Reflectance R (Refraction) at Wavelength? (Bending) and? (Bending) at the bending point]

The back surface of the measurement surface was roughened with a sand paper and the surface was completely coated with black paint by a spectrophotometer (FE3000, trade name, manufactured by OTSUKA ELECTRONICS CO., LTD.) To a wavelength of 350 nm to 850 nm °, -5 ° specular spectra were measured. A spectral diagram of the obtained spectral reflectance of 350 nm to 850 nm is shown in the spectrum diagram. In a region where the reflectance is substantially constant or gently increases on the longer wavelength side than the minimum reflectance wavelength, And the wavelength thereof is defined as? (Bending), and the reflectance at that time is defined as R (bending).

[Antireflection property]

The value of the visual sensitivity reflectance before adhesion of the fingerprints was 2.0 or less, and the value of 2.1 or more was x.

[Fingerprints visible]

A fingerprint having a refractive index of 1.49 was laminated on the antiglare antireflection film at 10 nm to evaluate changes in appearance before and after attachment of the component. A glass plate (FL2.0 manufactured by Nihon Itagaras Co., Ltd.) was used as a comparison object. The fingerprints were less visible than when the fingerprints were attached to the glass plate, Was evaluated as &quot; x &quot;.

[Fingerprints]

The fingerprints were wiped off by using a flannel cloth (white flannel and gold grade) with 30 rubbing at 500 gf / cm2 load by attaching the same fingerprints as those of the test where the fingerprints were visible on the test piece. After that, the fingerprint was not seen, and the fingerprint was x. Further, when the fingerprint was wiped out by rubbing 20 round trips, the fingerprint was not seen.

Next, Production Examples, Examples and Comparative Examples will be described. In the examples, parts are parts by mass, and% is% by mass.

(Preparation of composition H-1 for forming high refractive index layer)

(CEREXUS CX-603M-F2, manufactured by NISSAN CHEMICAL INDUSTRY CO., LTD.) As a solid component in an amount of 50 parts by mass, a urethane acrylate (having a molecular weight of 1400 and a viscosity of 2500 to 4500 Pa 占 퐏 (Manufactured by Nippon Synthetic Chemical Industry Co., Ltd., Nikko UV7600B), 5 parts by mass of a photopolymerization initiator (Irgacure 184, manufactured by Chiba Specialty Chemicals Co., Ltd.) and 500 parts by mass of isopropyl alcohol , A composition for forming a high refractive index layer (zinc antimonate fine particle curing coating liquid) was obtained. The refractive index of H-1 was 1.56.

(Preparation of composition H-2 for forming a high refractive index layer)

, 95 parts by mass of a urethane acrylate (molecular weight 1400, viscosity of 2500 to 4500 Pa 占 퐏 at 60 占 폚, Zagyuan UV7600B manufactured by Nippon Synthetic Chemical Industry Co., Ltd.), 10 parts by mass of a photopolymerization initiator (manufactured by Chiba Specialty Chemicals Co., , Irgacure 184), and 500 parts by mass of isopropyl alcohol were mixed to obtain a composition for forming a high refractive index layer. The refractive index of H-2 was 1.50.

(Preparation of composition H-3 for forming a high refractive index layer)

(CEREXUS CX-603M-F2 manufactured by NISSAN CHEMICAL INDUSTRY CO., LTD.) As a solid matter dispersion, 30 parts by mass of urethane acrylate (viscosity at 2500 to 4500 Pa 占 퐏 , 5 parts by mass of a photopolymerization initiator (Irgacure 184, manufactured by Chiba Specialty Chemicals Co., Ltd.), and 500 parts by mass of isopropyl alcohol were mixed , A composition for forming a high refractive index layer (zinc antimonate fine particle curing coating liquid) was obtained. The refractive index of H-3 was 1.53.

(Preparation of composition H-4 for forming a high refractive index layer)

(CEREXUS CX-603M-F2 manufactured by NISSAN CHEMICAL INDUSTRY CO., LTD.) Dispersion in a solid content of 70 parts by mass, urethane acrylate (viscosity at 25 ° C to 4500 Pa · s , 5 parts by mass of a photopolymerization initiator (Irgacure 184, manufactured by Chiba Specialty Chemicals Co., Ltd.) and 500 parts by mass of isopropyl alcohol were mixed , A composition for forming a high refractive index layer (zinc antimonate fine particle curing coating liquid) was obtained. The refractive index of H-4 was 1.58.

(Preparation of composition H-5 for forming a high refractive index layer)

, 20 parts by mass of titanium oxide fine particles, 75 parts by mass of urethane acrylate (having a molecular weight of 1400 and a viscosity of 2500 to 4500 Pa · s at 60 ° C, Zagyuan UV7600B manufactured by Nippon Synthetic Chemical Industry Co., Ltd.), a photopolymerization initiator (Irgacure 184, manufactured by Chemicals, Inc.), and 500 parts by mass of isopropyl alcohol were mixed to obtain a composition for forming a high refractive index layer (titanium dioxide fine particle curing coating solution). The refractive index of H-5 was 1.60.

(Preparation of composition H-6 for forming a high refractive index layer)

, 37 parts by mass of titanium oxide fine particles, 58 parts by mass of urethane acrylate (having a molecular weight of 1400 and a viscosity of 2500 to 4500 Pa · s at 60 占 폚, Zagyuan UV7600B manufactured by Nippon Synthetic Chemical Industry Co., Ltd.), a photopolymerization initiator (Irgacure 184, manufactured by Chemicals, Inc.), and 500 parts by mass of isopropyl alcohol were mixed to obtain a composition for forming a high refractive index layer (titanium dioxide fine particle curing coating solution). The refractive index of H-6 was 1.65.

(Preparation of composition H-7 for forming high refractive index layer)

, 15 parts by mass of hollow silica fine particles having a particle size of 60 nm, 80 parts by mass of urethane acrylate (molecular weight 1400, viscosity of 2500 to 4500 Pa s at 60 캜, Magnetite UV7600B manufactured by Nippon Synthetic Chemical Industry Co., Ltd.) , 5 parts by mass of an initiator (Irgacure 184, manufactured by Chiba Specialty Chemicals Co., Ltd.) and 500 parts by mass of isopropyl alcohol were mixed to obtain a composition for forming a high refractive index layer (humic silica curable coating liquid). The refractive index of H-7 was 1.48.

(Preparation of composition H-8 for forming a high refractive index layer)

10 parts by mass of hollow silica fine particles having a particle diameter of 60 nm, 85 parts by mass of urethane acrylate (molecular weight 1400, viscosity of 2500 to 4500 Pa 占 퐏 at 60 占 폚, Zagyuan UV7600B manufactured by Nippon Synthetic Chemical Industry Co., Ltd.) , 5 parts by mass of an initiator (Irgacure 184, manufactured by Chiba Specialty Chemicals Co., Ltd.) and 500 parts by mass of isopropyl alcohol were mixed to obtain a composition for forming a high refractive index layer (humic silica curable coating liquid). The refractive index of H-8 was 1.49.

(Preparation of composition H-9 for forming high refractive index layer)

40 parts by mass of titanium oxide fine particles, 55 parts by mass of urethane acrylate (having a molecular weight of 1400 and a viscosity of 2500 to 4500 Pa · s at 60 占 폚, Zagyuan UV7600B manufactured by Nippon Synthetic Chemical Industry Co., Ltd.), a photopolymerization initiator (Irgacure 184, manufactured by Chemicals, Inc.), and 500 parts by mass of isopropyl alcohol were mixed to obtain a composition for forming a high refractive index layer (titanium dioxide fine particle curing coating solution). The refractive index of H-9 was 1.66.

(Preparation of low refractive index layer composition L-1)

, 40 parts by mass of hollow silica fine particles having a particle diameter of 60 nm, 60 parts by mass of dipentaerythritol hexaacrylate (trade name "DPHA", manufactured by Nippon Yakuza Co., Ltd.), 60 parts by mass of a photopolymerization initiator (manufactured by Chiba Specialty Chemicals Co., 5 parts by mass of a silicone additive (BYKUV-3570, manufactured by BICKEM Japan Co., Ltd.), 5 parts by mass of a silicone additive (TIC2457 available from Shin-Etsu Chemical Co., Ltd.) 0.5 part by mass of NANOBYKUV-3601, manufactured by KEMI Japan Co., Ltd.) and 2000 parts by mass of isopropyl alcohol were mixed to obtain a composition for a low refractive index layer (humor silica curing coating liquid). The refractive index of L-1 was 1.39.

(Preparation of Composition L-2 for Low-refractive-index Layer)

, 60 parts by mass of hollow silica fine particles having a particle diameter of 60 nm, 40 parts by mass of dipentaerythritol hexaacrylate (trade name: &quot; DPHA &quot;, manufactured by Nippon Kayaku Co., Ltd.), 40 parts by mass of a photopolymerization initiator (manufactured by Chiba Specialty Chemicals Co., 5 parts by mass of a silicone additive (BYKUV-3570, manufactured by BICKEM Japan Co., Ltd.), 5 parts by mass of a silicone additive (TIC2457 available from Shin-Etsu Chemical Co., Ltd.) 0.5 part by mass of NANOBYKUV-3601, manufactured by KEMI Japan Co., Ltd.) and 2000 parts by mass of isopropyl alcohol were mixed to obtain a composition for a low refractive index layer (humor silica curing coating liquid). The refractive index of L-2 was 1.36.

(Preparation of low refractive index layer composition L-3)

50 parts by mass of hollow silica fine particles having a particle diameter of 60 nm, 50 parts by mass of OD2H2A (1,10-diacryloyloxy-2,9-dihydroxy-4,4,5,5,6,6,7,7-octa , 5 parts by mass of a photopolymerization initiator (Irgacure 907, manufactured by Chiba Specialty Chemicals Co., Ltd.), 8 parts by mass of a silicone additive (BYKUV-3570, , 5 parts by mass of a silicone additive (TIC2457, manufactured by Shin-Etsu Chemical Co., Ltd.), 0.5 parts by mass of an alumina additive (NANOBYKUV-3601 manufactured by Big Chem Japan Co., Ltd.) and 2000 parts by mass of isopropyl alcohol, To obtain a composition for a layer (silica-silica-curable coating liquid). The refractive index of L-3 was 1.37.

(Preparation of low refractive index layer composition L-4)

, 30 parts by mass of hollow silica fine particles having a particle diameter of 60 nm, 70 parts by mass of dipentaerythritol hexaacrylate (trade name: &quot; DPHA &quot;, manufactured by Nippon Kayaku Co., Ltd.), 80 parts by mass of a photopolymerization initiator (manufactured by Chiba Specialty Chemicals Co., 5 parts by mass of a silicone additive (BYKUV-3570, manufactured by BICKEM Japan Co., Ltd.), 5 parts by mass of a silicone additive (TIC2457 available from Shin-Etsu Chemical Co., Ltd.) 0.5 part by mass of NANOBYKUV-3601, manufactured by KEMI Japan Co., Ltd.) and 2000 parts by mass of isopropyl alcohol were mixed to obtain a composition for a low refractive index layer (humor silica curing coating liquid). The refractive index of L-4 was 1.42.

(Preparation of low refractive index layer composition L-5)

, 30 parts by mass of dipentaerythritol hexaacrylate (trade name &quot; DPHA &quot;, manufactured by Nippon Yakuza), 30 parts by mass of a photopolymerization initiator (manufactured by Chiba Specialty Chemicals Co., 5 parts by mass of a silicone additive (BYKUV-3570, manufactured by BICKEM Japan Co., Ltd.), 5 parts by mass of a silicone additive (TIC2457 available from Shin-Etsu Chemical Co., Ltd.) 0.5 part by mass of NANOBYKUV-3601, manufactured by KEMI Japan Co., Ltd.) and 2000 parts by mass of isopropyl alcohol were mixed to obtain a composition for a low refractive index layer (humor silica curing coating liquid). The refractive index of L-5 was 1.34.

(Preparation of low refractive index layer composition L-6)

, 65 parts by mass of hollow silica fine particles having a particle size of 60 nm, 35 parts by mass of dipentaerythritol hexaacrylate (trade name "DPHA", trade name, manufactured by Nippon Yakuza Co., Ltd.) 5 parts by mass of a silicone additive (BYKUV-3570, manufactured by BICKEM Japan Co., Ltd.), 5 parts by mass of a silicone additive (TIC2457 available from Shin-Etsu Chemical Co., Ltd.) 0.5 part by mass of NANOBYKUV-3601, manufactured by KEMI Japan Co., Ltd.) and 2000 parts by mass of isopropyl alcohol were mixed to obtain a composition for a low refractive index layer (humor silica curing coating liquid). The refractive index of L-6 was 1.35.

(Preparation of low refractive index layer composition L-7)

, 25 parts by mass of hollow silica fine particles having a particle diameter of 60 nm, 75 parts by mass of dipentaerythritol hexaacrylate (trade name "DPHA", manufactured by Nippon Yakuza Co., Ltd.), 75 parts by mass of a photopolymerization initiator (manufactured by Chiba Specialty Chemicals Co., 5 parts by mass of a silicone additive (BYKUV-3570, manufactured by BICKEM Japan Co., Ltd.), 5 parts by mass of a silicone additive (TIC2457 available from Shin-Etsu Chemical Co., Ltd.) (NANOBYKUV-3601, manufactured by Chemie Japan K.K.) and 2000 parts by mass of isopropyl alcohol were mixed to obtain a low refractive index layer composition (humic silica curable coating liquid). The refractive index of L-7 was 1.43.

(Preparation of low refractive index layer composition L-8)

, 55 parts by mass of hollow silica fine particles having a particle diameter of 60 nm, 45 parts by mass of dipentaerythritol hexaacrylate (trade name: "DPHA", trade name, manufactured by Nippon Yakuza), a photopolymerization initiator (manufactured by Ciba Specialty Chemicals Co., , 10 parts by mass of a fluorine-containing acrylic compound (KY1203, Shin-Etsu Chemical Co., Ltd.), 5 parts by mass of a silicone additive (BYKUV-3570, manufactured by Big Chemical Co., (NANOBYKUV-3601, manufactured by Big Chem Japan Co., Ltd.) and 2000 parts by mass of isopropyl alcohol were mixed to obtain a composition for a low refractive index layer (humus silica curable coating liquid). The refractive index of L-8 was 1.39.

[Preparation of pressure-sensitive adhesive layer coating liquid P-1]

94.6 parts by mass of n-butyl acrylate, 4.4 parts by mass of acrylic acid, 1 part by mass of 2-hydroxyethyl methacrylate, 0.4 part by mass of azobisisobutyronitrile, 90 parts by mass of ethyl acetate, and 60 parts by mass of toluene, The mixture was heated to 65 占 폚 in a nitrogen atmosphere and polymerization reaction was carried out for 10 hours to prepare an acrylic resin composition. 1 part by mass of Colonate L (polyisocyanate manufactured by Nippon Polyurethane Industry Co., Ltd.) and 99 parts by mass of ethyl acetate were added to 99 parts by mass of the acrylic resin composition so that the solid content concentration of the adhesive resin composition was 20% Was prepared.

&Lt; Example 1-1 &gt;

A composition for forming a hard coat layer (Rio Dylas LAS1303NL, manufactured by Toyoke Ink Co., Ltd.) was coated on a transparent base film made of a triacetylcellulose (TAC) film having a thickness of 80 탆 by a roll coater to a dry film thickness of 4.3 탆 And dried at 80 DEG C for 2 minutes. Thereafter, the composition for forming a hard coat layer was cured by irradiating ultraviolet rays (total light amount: 300 mJ / cm 2) with a 120 W high pressure mercury lamp (manufactured by Nihon Battery Co., Ltd.) in a nitrogen atmosphere to form a hard coat layer. The refractive index of the hard coat layer was 1.53.

Subsequently, a composition H-1 for forming a high refractive index layer was applied on the hard coat layer so as to have a thickness of 155 nm at the time of drying. Then, an ultraviolet ray irradiator (120 W high pressure mercury lamp manufactured by Eye Graphics Co., Ltd.) And the composition for forming a high refractive index layer was cured by irradiation with ultraviolet rays of 300 mJ to form a high refractive index layer.

Finally, the composition for low-refractive index layer L-1 was coated on the high refractive index layer so that the thickness of the low refractive index layer was 70 nm at the time of drying, and then an ultraviolet ray irradiator (120 W high pressure mercury lamp manufactured by Eye Graphics Co., And the composition for a low refractive index layer was cured to form a low refractive index layer. Thus, a film of Example 1-1 was prepared.

&Lt; Example 1-2 &gt;

Except that the composition for forming a high refractive index layer H-2 was used and the film thickness of the high refractive index layer was set to 150 nm and the film thickness of the low refractive index layer was set to 100 nm, A film of Example 1-2 was prepared.

&Lt; Example 1-3 &gt;

The film of Example 1-3 was produced in the same manner as in Example 1-2 except that the thickness of the high refractive index layer was 155 nm and the film thickness of the low refractive index layer was 80 nm.

&Lt; Example 1-4 &gt;

A film of Example 1-4 was produced in the same manner as in Example 1-2 except that the thickness of the low refractive index layer was changed to 90 nm.

&Lt; Example 1-5 &gt;

A film of Example 1-5 was prepared in the same manner as in Example 1-3 except that the composition for high refractive index layer H-3 was used.

&Lt; Example 1-6 &gt;

The film of Example 1-6 was produced in the same manner as in Example 1-3 except that the composition for high refractive index layer formation H-1 was used and the film thickness of the high refractive index layer was 180 nm.

&Lt; Example 2-1 &gt;

The film of Example 2-1 was produced in the same manner as in Example 1-1 except that the composition for high refractive index H-4 was used and the film thickness of the high refractive index layer was 130 nm.

&Lt; Example 2-2 &gt;

The film of Example 2-2 was produced in the same manner as in Example 2-1 except that the thickness of the high refractive index layer was changed to 150 nm.

&Lt; Example 2-3 &gt;

A film of Example 2-3 was prepared in the same manner as in Example 1-1 except that the thickness of the low refractive index layer was changed to 75 nm.

<Example 2-4>

A film of Example 2-4 was produced in the same manner as in Example 1-1 except that the film thickness of the low refractive index layer was 80 nm.

<Example 2-5>

A film of Example 2-5 was produced in the same manner as in Example 2-2 except that the film thickness of the low refractive index layer was 80 nm.

<Example 2-6>

A film of Example 2-6 was produced in the same manner as in Example 1-1 except that the film thickness of the low refractive index layer was changed to 85 nm.

<Example 2-7>

A film of Example 2-7 was produced in the same manner as in Example 1-6 except that the thickness of the high refractive index layer was changed to 135 nm.

<Example 2-8>

A film of Example 2-8 was produced in the same manner as in Example 1-6 except that the high refractive index layer had a thickness of 175 nm.

<Example 2-9>

A film of Example 2-9 was produced in the same manner as in Example 2-5 except that the film thickness of the high refractive index layer was 155 nm and the composition for low refractive index layer L-2 was used.

<Example 2-10>

A film of Example 2-10 was produced in the same manner as in Example 2-4 except that the composition for forming a low refractive index layer L-3 was used.

&Lt; Example 2-11 &gt;

A film of Example 2-11 was produced in the same manner as in Example 2-10, except that the composition L-4 for forming a low refractive index layer was used.

&Lt; Example 2-12 &gt;

The film of Example 2-12 was produced in the same manner as in Example 1-3 except that the composition for high refractive index H-5 was used.

&Lt; Examples 2-13 &gt;

A film of Example 2-13 was prepared in the same manner as in Example 1-3 except that the composition for high refractive index H-6 was used.

&Lt; Example 3 &gt;

A film of Example 3 was produced in the same manner as in Example 2-4, except that the composition for low-refractive-index layer L-8 was used.

<Example 4>

The pressure-sensitive adhesive layer coating liquid was applied on a separator film produced by PET using an auto-applicator so that the thickness after drying was 25 占 퐉 and dried at 90 占 폚 for 2 minutes. The hard coat layer of the film produced in Example 3-1 And the laminate was attached to the opposite side and stored at 30 ° C for 5 days to produce a laminated film of Example 4.

&Lt; Comparative Example 1-1 &gt;

A film of Comparative Example 1-1 was produced in the same manner as in Example 2-2 except that the thickness of the low refractive index layer was changed to 60 nm.

&Lt; Comparative Example 1-2 &gt;

A film of Comparative Example 1-2 was prepared in the same manner as in Example 1-1, except that the low refractive index layer had a thickness of 60 nm.

&Lt; Comparative Example 1-3 &gt;

A film of Comparative Example 1-3 was produced in the same manner as in Example 1-1 except that the thickness of the low refractive index layer was changed to 105 nm.

&Lt; Comparative Example 1-4 &gt;

A film of Comparative Example 1-4 was produced in the same manner as in Example 2-2 except that the film thickness of the low refractive index layer was changed to 110 nm.

&Lt; Comparative Example 1-5 &gt;

A film of Comparative Example 1-5 was prepared in the same manner as in Example 2-4 except that the thickness of the high refractive index layer was changed to 110 nm.

&Lt; Comparative Example 1-6 &gt;

A film of Comparative Example 1-6 was produced in the same manner as in Example 2-1 except that the film thickness of the high refractive index layer was 120 nm and the film thickness of the low refractive index layer was 90 nm.

&Lt; Comparative Example 1-7 &

A film of Comparative Example 1-7 was produced in the same manner as in Comparative Example 1-6 except that the thickness of the high refractive index layer was 190 nm.

&Lt; Comparative Example 1-8 &

A film of Comparative Example 1-8 was prepared in the same manner as in Comparative Example 1-5 except that the thickness of the high refractive index layer was changed to 200 nm.

&Lt; Comparative Example 1-9 &

A film of Comparative Example 1-9 was produced in the same manner as in Example 2-9 except that the composition for low-refractive-index layer L-5 was used.

&Lt; Comparative Example 1-10 &

A film of Comparative Example 1-10 was produced in the same manner as in Example 2-2 except that the composition for a low refractive index layer L-6 was used and the film thickness of the low refractive index layer was changed to 90 nm.

&Lt; Comparative Example 1-11 &

A film of Comparative Example 1-11 was produced in the same manner as in Example 2-4, except that the composition for low-refractive-index layer L-7 was used.

&Lt; Comparative Example 1-12 &

A film of Comparative Example 1-12 was produced in the same manner as in Comparative Example 1-10 except that the composition for low refractive index layer L-7 was used.

&Lt; Comparative Example 1-13 &

A film of Comparative Example 1-13 was produced in the same manner as in Example 2-4 except that the composition for high refractive index layer H-7 was used.

&Lt; Comparative Example 1-14 &

A film of Comparative Example 1-14 was produced in the same manner as in Example 1-4 except that the composition for high refractive index layer H-8 was used.

&Lt; Comparative Example 1-15 &

A film of Comparative Example 1-15 was produced in the same manner as in Example 1-4 except that the composition for high refractive index layer H-9 was used.

The various antiglare films thus prepared were evaluated for various physical properties by the above-mentioned method. The results are shown in Tables 1 to 4 together with the structures of the respective Examples and Comparative Examples. In Table 1 to Table 4, "L layer" means a low refractive index layer, "H layer" means a high refractive index layer, and "HC layer" means a hard coat layer.

In Examples 1-1 to 1-6, sufficient antireflection function was obtained, fingerprints were not visible, and fingerprints were good. In Examples 2-1 to 2-13, it was better that the fingerprints were less visible than the film of Example 1 series. Further, in Example 3, the amount of fingerprint adhesion tended to be smaller and the fingerprint cleaning property was better than that of the film of Example 2 series. In Example 4 in which the adhesive layer was formed on the back surface of the transparent base film, sufficient antireflection function was obtained, fingerprints were not visible, and fingerprints were good.

On the other hand, in Comparative Examples 1-1, 1-2, 1-11, 1-12, and 1-13, the reflectance increased. In Comparative Examples 1-3, 1-4, 1-6, 1-13, and 1-15, the fingerprint attachment points were colored and the fingerprints were visible. Also, in Comparative Examples 1-5, 1-7, 1-8, 1-9, 1-10, and 1-14, fingerprints were visible even after the fingerprint cleaning test.

Claims (4)

On one side of the transparent base film,
A hard coat layer, a high refractive index layer and a low refractive index layer laminated in this order,
Wherein the high refractive index layer has a refractive index of 1.50 to 1.65 and a film thickness of 130 to 180 nm,
The low refractive index layer has a refractive index of 1.36 to 1.42 and a film thickness of 70 to 100 nm,
The minimum reflectance wavelength? (Minimum) is in a wavelength range of 350 to 530 nm in a wavelength range of 350 to 850 nm,
The wavelength? (Bending) at the bending point in the wavelength range of 350 to 850 nm is a relation of? (Minimum) &lt;? (Bending)
The visibility reflectance is 2.0% or less,
The reflection chroma C is less than 6.0,
Wherein the reflection chromaticity before the sebum contamination is adhered is 1.49 and the reflection color difference? E of the reflection chromaticity after adhesion of the sebum contamination with the thickness of 10 nm is less than 7.0. The method according to claim 1,
The relationship between the reflectance R (minimum) [%] at the above-mentioned? (Minimum) and the reflectance R (elongation) [%] at the above-
R (bending) - R (minimum) ≤ 0.7 [%]. 3. The method of claim 2,
Wherein the low refractive index layer contains an antifouling agent. 4. The method according to any one of claims 1 to 3,
Wherein an adhesive layer is formed on the other side of the transparent base film.

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