KR20150083968A - Thin film cluster production system, thin film cluster, thin film, uv protector and cosmetics - Google Patents

Abstract

The present invention provides a thin film cluster production system, producing method, thin film cluster, thin film, UV protector, and cosmetics to produce a thin film cluster in an in-situ status for improved quality and high productivity, and greatly reducing an initial investment cost. In producing a thin film cluster which comprises thin film layers collected in a shape of a plurality of layers piled up with a material to be coated or a separating material in between in the in-situ status, the material to be coated or the separating material including a minimum role to separate at least one thin film and other thin film layers in between a plurality of thin film layers does not include one which is formed in a deposition method, and includes one or more materials selected from fluent materials, room temperature fluent materials, and plastic materials. If the method for supplying to a designated place using fluidity or plasticity of the materials is used, the possibility of vapor diffusion or the like of the materials is excluded, and no adverse effect is given to a thin film deposition process, a vacuum container or a vacuum pumping means. Therefore, productivity and quality are greatly improved and the initial investment costs are also greatly reduced as the structure and composition of the production system is simplified and firm. According to the present invention, the present invention not only settles all the issues in the prior art pointed out herein such as the issue of production of the production system by the prior art, the issue of maintenance, the issue of pollution of the thin film itself, the issue of wasting energy and the like; but also provides the thin film, UV protector, and cosmetics derived from the thin film cluster.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin film clustering apparatus, a thin film cluster, a thin film clustering apparatus,

The present invention relates to a thin-film cluster manufacturing apparatus and thin-film clusters, thin films and ultraviolet screening agents for producing thin-film clusters by physical vapor deposition or chemical vapor deposition.

The physical or chemical vapor deposition method is also referred to as dry plating and is more natural than the wet method and does not cause pollution, which is one of the thin film forming methods used in various fields.

In recent years, techniques for manufacturing products using thin film flakes (FLAKE) have been developed in a wide variety of fields.

The field of thin film flakes and their manufacturing methods and applicable products are as follows. Thin film flakes consisting of silver (Ag), copper (Cu) or silver combined with copper as a material for producing conductive paste are used, and bonding paste of an LED chip called green product, Pigments, cosmetic raw materials, sunblock particles, tinted particles, sintered particles, battery active materials, solar cells, thermoelectric elements, insulating elements, catalyst particles and nanocomposites Has become one of the important materials and technologies.

Most preferably, the thin film flake is produced by a dry plating method by a physical or chemical vapor deposition process in order to improve its quality and purity and characteristics to be realized. However, since the dry plating method by the physical or chemical vapor deposition process is mostly performed in a vacuum container, the productivity is lowered and the production cost is increased. For this reason, a thin film flake production method by a chemical wet process rather than the dry plating method is being used at the production site.

In spite of costly production costs, when thin film flakes are produced by the physical vapor deposition method due to unavoidable reasons, the productivity is very low and the unit price of the products is very expensive, and therefore the fields or products used are extremely limited I can not help it.

Korean Patent Laid-Open Publication No. 10-2004-0068564 (Jul. 31, 2004) discloses a thin film particle production apparatus and a manufacturing method which include typical problems to be solved by the present invention as problems. The cited invention is a rudimentary conceptual concept that is incapable of being practiced in actual production sites due to a great number of problems. Actually, the production apparatus having such a configuration is not used in the production field.

Prior art techniques for mass production of thin film particles using physical or chemical vapor deposition methods are divided into two classes: a large area or a large number of thin film layers are coated in the IN SITU state, And pulverized into thin film clusters or thin film particles.

The technical analysis is as follows.

First, the first class is a device for obtaining thin film clusters or thin film particles by in-situ state formation of a thin film layer to be obtained with a large number of multilayer thin film layers, such as U.S. Patent 6,398,999 BI granted to Avery Dennison Corporation In order to produce such a large number of multilayer thin films, a large number of multilayer thin film clusters in which thin film layers and soluble thin film layers are alternately arranged are prepared by depositing a soluble or releasable thin film layer between a thin film layer and a thin film layer by vapor deposition And then this is first unloaded to the outside of the vacuum container, and then, after the first pulverization, these are dissolved in a solvent or a solvent so as to dissolve the soluble thin-film layers, thereby obtaining thin film particles.

The second class is a process for coating a layer of soluble or releasable thin film prior to depositing the thin film layer to be obtained as an apparatus such as U.S. Pat. No. 4,168,986 to Polaroid Corporation or Korean Patent Application No. 10-2004-0068564 (Jul. 31, 2004) After depositing the thin film layer to be obtained in the vacuum container on the substrate, the thin film layer to be obtained is then deposited and transferred to a separation chamber for separating the thin film layer from the coated substrate in an in situ state to dissolve the deposited thin film layer in a solvent And then repeating the process of moving the coated substrate to the deposition chamber again and again depositing the soluble thin film layer and the thin film layer to be obtained, thereby producing a large amount of thin film particles.

The two types of mass production apparatuses provide an effect of improving the thin film particle productivity by the physical vapor deposition method to some extent and reducing the production cost. However, due to the following problems, The constraints still can not be solved.

In the prior art, the first device is a method in which the thin film layer to be obtained and the soluble thin film layer are alternately deposited in sequence and simultaneously deposited during one circulation period. Therefore, in addition to the EVAPORATION SOURCE for evaporating the thin film layer to be obtained, A separate evaporation shut-off shutter coupled to the evaporation source and / or a separate evaporation source is additionally required in addition to a separate evaporation source for evaporating the evaporation energy, Production and configuration become complicated and large, as well as the implementation and management of the process becomes very difficult.

A larger problem is that the two materials must be evaporated simultaneously in one circulation cycle to alternate the thin film deposition and the soluble thin film deposition to be obtained. At the same time, evaporation of both substances necessarily results in the vapor of the two substances diffusing and interfering with each other in the same vacuum chamber, which results in the inclusion of different substances in each thin film layer. This causes the purity, quality and characteristics of each thin film layer to be greatly degraded.

In addition to the above problems, the soluble thin film layers are mainly formed using organic substances having a high vapor pressure. The contamination of the inside of the vacuum container by the organic vapor and the vacuum piping and especially the vacuum pump system becomes more and more serious Causing problems and causing fatal problems throughout the system.

If the pollutants are fatal to contaminate the vacuum pump and the system through the above processes, the result is that the ultimate function of the production apparatus is completely stopped. Therefore, the first class production apparatus has a serious problem related to the contamination problem of the apparatus and the thin film and the deterioration of the thin film characteristics, and thus has a serious problem to solve.

The second device of the prior art is characterized in that a thin film layer is first deposited on a coated substrate before the thin film layer to be obtained is deposited and then a thin film layer to be obtained on the coated substrate on which the soluble thin film layer is deposited is deposited, The thin film layer to be obtained is desorbed from the coated substrate by using a specified solvent and then the coated substrate after the thin film layer is desorbed is transferred to the deposition region again to repeat the deposition and desorption processes, And is capable of collecting a large amount of thin film particles in a separation vessel in which a desorption process is performed. Thin film particle production apparatus of such a method is good in its conceptual idea, but has a lot of problems in the process of practicing it, so that it is a production apparatus which is almost impossible to realize. There are serious problems in this.

In addition, since the two types of mass-production apparatuses apply the process of depositing the soluble thin film layer in a vapor state, a heating process to a high temperature is necessarily required to increase the vapor pressure of the soluble substance. In order to perform the heating process, electric power must be supplied to an additional heating source, which leads to a problem of energy waste.

In order to desorb the soluble thin film layer, the coated substrate having the thin film layer deposited thereon is transferred to the separation vessel region. In addition, in order to transport the coated substrate again after the thin film desorption has been completed to the deposition vessel region, Should share the same space as an equivalent vacuum atmosphere, even though the degree of vacuum is different. Thus, the vapors of the solvent used to desorb the soluble thin film layer are diffused into the deposition vessel region to a serious level and act as a source of contamination, resulting in many problems in a wide variety of regions and regions.

In order to solve the above problems, the present invention provides a thin film cluster manufacturing apparatus and method, and a thin film cluster manufactured thereby, A manufacturing apparatus capable of manufacturing a large number of thin film clusters in a state of a sheeting, and thin film clusters and thin films manufactured using the same. The method of inserting the coating material between the thin film layer and the thin film layer is performed by removing all of the contamination problems due to the high vapor pressure of each of the materials described above by mixing the thin film layer and the thin film layer, And thin film clusters, thin films, ultraviolet screening agents, and cosmetics manufactured using the same, and all of the above-mentioned problems can be solved.

According to the present invention, there is provided a thin film cluster manufacturing apparatus and method for obtaining a thin film flake having a very high quality and characteristics and being environmentally friendly and safe to the human body, and a thin film cluster, thin film, ultraviolet screening agent, It can supply large quantity with excellent quality and economical price.

As another effect, the size and configuration of the vacuum apparatus for manufacturing the thin film clusters and the thin film particles, and the manufacturing cost of the equipment itself, as well as the space and area required for production can be greatly reduced. Do.

As another effect, in manufacturing the thin film clusters and the thin film particles, it is possible to improve the quality of the product itself, to greatly reduce the contamination phenomenon and the failure rate of the used vacuum device, and to reduce the manpower required for maintenance and repair, Because it can greatly reduce productivity, ultimately productivity can be improved, so thin clusters, thin films, sunscreens and cosmetics can be supplied with excellent quality and economical price

BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a simplified schematic diagram of a vacuum deposition chamber element that can be configured very simply for the practice of the present invention.
Fig. 2 is a view showing a state in which a coating material is fed into a drum-type rotatable carrier having a central portion of a side thereof opened
Fig. 3 is a view showing a state in which a coating material film is formed on the outer side of the means for supplying the coating material and on the inner surface of the carrier while the drum-
4 shows a state in which a coating thin film layer deposited on the surface of the coating material film is formed while the drum-type rotatable carrier rotates in the direction of the arrow, and the deposition-coated thin film layer is mixed with the coating material by means of collection
Fig. 5 is a view showing a configuration in which a coating material and a thin film layer are coated on the outer surface of a drum-
FIG. 6 is a view illustrating a state in which the coating material moves downward from the upper side of the container containing the designated amount of the coating material and is formed on the upper surface of the coating material, and the coating material and the thin film layer are moved As a mode of moving and collecting (for example) the supplying unit 37 and the collecting unit 39 may be alternately changed according to the telephone in the operating direction of the moving mechanism, the manufacturing process may be performed.
Fig. 7 is a schematic view of a manufacturing apparatus element of a mode in which the thin film layer is coated on the surface of the coated substrate without being coated on the surface of the coated material, and then separated by the separating material,
8 is a schematic view of a manufacturing apparatus element in a configuration similar to that of Fig. 7, in which the separation material supply and collection belt 107 is omitted
Fig. 9 is a schematic view similar to Fig. 8 but showing a summary of manufacturing device elements of different configurations
Fig. 10 is a schematic view similar to Fig. 8 but showing a summary of manufacturing device elements of different configurations
11 is a schematic diagram of a manufacturing apparatus element in which a collecting unit is not provided separately from the collecting unit and the separation result of the separating member and the thin layer is collected while being winded in the form of a web,
Fig. 12 is a schematic diagram of a manufacturing apparatus element in a configuration in which a thin film layer coated on the surface of a coating material is collected by inserting the coating material into a carrier rotating continuously;

In order to solve the above-mentioned problems, in order to manufacture a thin film cluster in which two or more thin film layers are stacked with a coating material interposed therebetween as in the first embodiment of the present invention

A vacuum container for providing a vacuum atmosphere space in which the thin film clusters are manufactured,

A vacuum pumping means for evacuating at least the interior of the vacuum container;

At least one coating source operable to coat a thin film of one or more designated materials on a designated surface within the vacuum vessel;

At least a supply part for supplying the coating material to a designated place

At least a collecting part

A coating zone in an area where thin coating is applied to a designated surface of the coating material by one or more coating sources,

Being present in both the supply section and the collection section and in the coating zone for at least a designated period,

Wherein at least one of a thickness, a configuration, a shape, a phase, and a movement form in the supplying part and the collecting part exists in different states,

The coating material is guided from the supply part to at least move to the collecting part,

One or more thin film layers are coated on at least some of the surfaces of the coating material in the coating zone during transport

In a thin-film cluster manufacturing apparatus having a configuration that is collected at a specified place including at least the collecting unit

At least at a given point in time

The arrangement of the supply part, the coating zone and the collecting part is arranged to move at least in the order of the supply part, the coating zone and the collecting part based on the coating material starting from the supply part

Wherein at least a portion of the coated material coated with one or more thin films including a coating source material in the coating zone is a coating material supplied from the supply portion,

At least a portion of the coating material collected by the collecting portion is collected from the supply portion and is collected together with at least a portion of the thin film layer after being coated in the coating zone,

A coating material deformation zone is provided in at least one of the paths from the supply unit to the collecting unit,

Wherein the deformation zone is a region where at least one of a thickness, a configuration, a shape, a state, and a movement form of the coating material causes deformation,

The coating material is collected after being deformed at least once in the deformation zone provided in the path from the supply part to the collection part,

The maximum thickness of the thin film to be coated on the coating material in the coated state on the surface of the coating material is at least twice as large as the thickness of the thin film layer,

At least a part of the coating material supplied from the supply part to the coating zone is supplied in an in-situ state without being subjected to a process of vapor deposition, while moving to a state having a viscosity within a predetermined range for maintaining the fluidity of the coating material,

The thickness of the thin film layer is 0.1 nanometer or more and 50 microns or less,

At least a part of the coating materials collected by the collecting unit is also collected in an in-situ state without being subjected to a process of vapor deposition, and moving to a state having a viscosity within a predetermined range that maintains fluidity of the coating material without involvement of a solvent ,

Wherein the maximum area of the thin film layer in the coated state is at least two times greater than the maximum area of the thin film layer in the collector,

The coating material includes at least one material selected from a fluid material, a room temperature fluid material, and a plastic material

The saturation vapor pressure at 25 degrees Celsius is less than 100 torr

Melting point is less than 650 degrees Celsius,

Wherein the thin film layer is guided to move to at least a collection part after being coated on the surface of the coating material, and the collection result collected in the collection part includes at least the coating material and the thin film layer, and at least the thin film layer Wherein the thin-film-clusters are stacked in two or more stages.

In this document, the term 'thin film layer' is the same as the concept of 'thin film', but it is mainly used to emphasize the layer shape of the thin film, It was mainly used to emphasize the shape in which the thin film exists as small particles.

The coating material does not use a process of evaporating by heating, but it is preferable that the coating material has a low saturated vapor pressure at atmospheric temperature in a vacuum apparatus. Among the substances having a saturated vapor pressure of at most 100 Torr at least in a room temperature state in a vacuum apparatus, the smaller the saturated vapor pressure is, the more preferable. When a material exceeding 100 Torr is used as the coating material, vapor of the coating material may cause a fatal problem due to the effect of obstructing or contaminating the formation of the thin film layer, depending on the constitution and characteristics of the physical or chemical vapor deposition device.

It is necessary to use a fluid material or to use a plastic material because it requires a process of deforming and / or moving a physical force by applying a physical force for at least a designated period of time in the in-situ state, and the coating material is deformed and / The lower the softening or melting temperature is, the better.

However, in order to broaden the selection of the material to be coated, it is preferable that the melting point is 650 DEG C or less. When a coating material having a higher melting point is used, it takes a lot of energy to raise the temperature up to the melting point. In addition, the configuration of the deposition apparatus requires a complicated and complicated structure and materials to handle a high temperature coating material .

It is required that the coating material mixed with the thin film layer in the in-situ state does not contain a solvent. Most solvent materials are too high in vapor pressure to pollute the vacuum environment in the vacuum system, as well as adversely affect many components, including the vacuum pump. Therefore, a process is required in which the coating material moves and moves together with the thin film layers while causing displacement without solvent intervention.

According to another aspect of the present invention, there is provided a method for manufacturing a thin film cluster in which a thin film layer is wound 10 times or more with a coating material interposed therebetween

A vacuum container for providing a vacuum atmosphere space in which the thin film clusters are manufactured,

A vacuum pumping means for evacuating at least the interior of the vacuum container;

At least one coating source operable to coat a thin film of one or more designated materials on a designated surface within the vacuum vessel;

A supply part for supplying the coating material to a designated place

A collecting unit for collecting at least a coated material in the form of a web;

A coating zone in an area where thin coating is applied to a designated surface of the coating material by one or more coating sources,

Being present in both the supply section and the collection section and in the coating zone for at least a designated period,

At least one of a thickness, a configuration, a shape, a phase, and a movement form in a supply part and a collecting part exists in different states,

And a power unit for transmitting power that causes at least movement and / or deformation of the coating material

The movement of the coated material starts from the supply part and moves to at least the collecting part,

After one or more thin film layers are coated on at least some of the surfaces of the coating material in the coating zone

In a thin film cluster manufacturing apparatus of a constitution which is collected at a designated place including at least a collecting section

At least at a given point in time

The arrangements of the supply unit, the coating zone, and the collecting unit are arranged to move at least in the order of the supply unit, the coating zone, and the collecting unit based on the coating material starting from the supply unit

Wherein at least a portion of the coated material coated with one or more thin films including a coating source material in the coating zone is a coating material supplied from the supply portion,

At least a part of the coated material collected by the collecting part is collected from the collecting part in a web form after being supplied from the supplying part and coated in the coating zone

A coating material deformation zone is provided in at least one of the paths from the supply unit to the collecting unit via the coating zone,

Wherein the deformation zone is a region where at least one of a thickness, a configuration, a shape, a state, and a movement form of the coating material causes deformation,

Wherein the coating material is collected after being deformed at least once in a path starting from the supplying part to the collecting part,

The maximum thickness of the thin film to be coated on the coating material in the coated state on the surface of the coating material is at least twice as large as the thickness of the thin film layer,

At least a part of the coating material supplied from the supply part to the coating zone is supplied in an in-situ state without being subjected to a process of vapor deposition, while moving to a state having a viscosity within a predetermined range for maintaining the fluidity of the coating material,

The thickness of the thin film layer is 0.1 nanometer or more and 50 microns or less,

At least a part of the coating material collected by the collecting part is also wound in a web form in an in-situ state without a process of being deposited in a vapor state without intervention of a solvent,

The coating material includes at least one material selected from a fluid material, a room temperature fluid material, and a plastic material

The saturation vapor pressure at 25 degrees Celsius is less than 100 torr

Melting point is less than 650 degrees Celsius,

Wherein the thin film layer is configured to move to at least a collecting part after being coated on the surface of the coating material, and the collecting result collected in the collecting part includes the coating material and the thin film layer, and at least the thin film layer The thin film is collected in a winding state more than 10 times.

Unlike the first embodiment of the present invention, this embodiment is a manufacturing apparatus used when collecting web-shaped thin film clusters wound on the collecting part more than 10 times.

The manufacturing apparatus comprising the coating material of the manufacturing apparatus of the present invention can be described with reference to Figs. 1 to 6 as some non-limiting examples.

The manufacturing apparatus of this embodiment includes a vacuum deposition chamber 1 and a vacuum pump system 11, and a drum-type rotatable carrier 3 having an opening 5 at a side center portion as a non-limiting example, A coated material 13 and a thin film layer coating source 21 provided inside the carrier 3 and containing a coating material supply and / or a deforming means 7 and a coating material collecting means 9 provided in the direction of the carrier 3, And a power unit (not shown) connected to the rotatable carrier 3 containing at least the coating material as an essential component. An overview of the operation of the manufacturing apparatus is as follows:

When all of the components necessary for manufacturing the thin film cluster in the in-situ state in the vacuum deposition chamber are loaded and the inside of the vacuum deposition chamber 1 is filled with the vacuum condition of the specified level using the vacuum pump system 11 Lt; / RTI >

And drives the power unit at a specified time to rotate the rotatable carrier 3. [ The coating material 13 gathered at the lower portion of the carrier is applied by forming the film 15 of the coating material to at least a part of the inner surface of the carrier by the rotation of the carrier.

The thin film layer 17 is coated on the film 15 of the coating material by using the thin film layer coating source 21.

The film 15 and the thin film layer 17 of the coating material rotate and move into the coating material 13 gathered at the inner bottom portion of the carrier and are further rotated to move toward the coating source 21. [ At this time, depending on various factors such as the thickness or viscosity of the film 15 of the coating material or the rotation speed of the carrier, at least a part of the thin film layer including the film of the coating material which has intruded into the coating material 13 is gathered at the inner side of the carrier Through the process of collecting in the coating material, the thin film clusters which are the object of operation of the manufacturing apparatus of the present invention are collected and manufactured. Of course, due to various factors, a part of the collected thin film layer may be coated with an additional thin film layer through the thin coating of the coating material by moving back to the coating source while being contained in the film 15 of the coating material. Such a process may be carried out without the coating and supplying means 7 and the collecting means 9, but the means 7 and the means 9 may be introduced according to the purpose. The means (7) and means (9) may be manufactured in various shapes such as, but not limited to, blades, rolls, brushes, knives and the like,

If the coating material is a plastic material or a fluid material, a heating device for heating the coating material at a specified temperature may be required. In the case of a room temperature fluid material, however, a heating device may be omitted. The introduction of such a heating device can be similarly applied to the separator used in another embodiment of the present invention.

5, the film 55 of the coating material is coated on the outer surface of the carrier, and the feeding means 7 for forming the film of the coating material and the separating knife (59) is used in the thin-film magnetic head manufacturing apparatus.

According to another aspect of the present invention

As an apparatus for producing thin film clusters in which thin film layers are stacked in two or more stages with a coating material interposed therebetween

A vacuum container for providing a vacuum atmosphere space in which the thin film clusters are manufactured,

A vacuum pumping means for evacuating at least the interior of the vacuum container;

At least one coating source operable to coat a thin film of one or more designated materials on a designated surface within the vacuum vessel;

A coating zone in an area where thin coating is applied to a designated surface of the coating material by one or more coating sources,

A coating material provided on a carrier or a container at a thickness equal to or greater than a specified thickness,

And a thin film layer insertion tool for continuously or intermittently inserting the thin film layer coated on the surface of the coating material into the coating material

In a thin-film-cluster producing apparatus having a structure in which the thin-film layer is collected by inserting the thin-film layer into the coating material

At least at a given point in time

The maximum thickness of the thin film to be coated on the coating material in the coated state on the surface of the coating material is at least twice as large as the thickness of the thin film layer,

Wherein the coating material coated in the coating zone contains at least one layer of the inserted thin film layer therein,

Wherein the thin film layer inserting tool collects the thin film layer in the coated material by intermittently or continuously inserting the thin film layer coated on the surface of the coated material into the coated material for a predetermined time,

The thickness of the thin film layer is 0.1 nanometer or more and 50 microns or less,

At least a part of the coating material provided in the coating zone is moved from the in situ state to the specified state in a state of having a specified range of viscosity to maintain the fluidity of the coating material without being vapor deposited,

Wherein the thin film layer is at least twice as large as the maximum thin film layer area in a state where the thin film layer is collected in the coated material,

Said coated material comprising:

A fluid material at room temperature, a fluid material at room temperature, and a plastic material,

The saturation vapor pressure at 25 degrees Celsius is less than 100 torr

Melting point is less than 650 degrees Celsius,

Wherein the thin film layer in the collected product collected in the coating material is obtained in a state of being stacked in two or more stages with the coating material interposed therebetween.

In this manner, the configuration as shown in FIG. 6 or 12 can be provided. A thin film layer inserting tool 119 and a coating source 21. The thin film layer 28 is coated on the surface of the coating material 13 by a coating source and reaches a predetermined thickness, The thin film layer inserting tool 119 is moved in the opposite direction to move the thin film layer 28 into the inside of the coating material 13 and the thin film layer 28 is coated on the surface of the coating material 13 to a predetermined thickness And then moving the thin film layer 28 in the opposite direction to insert the thin film layer 28 into the coating material 13 to collect the thin film layer. Such a device can constitute a manufacturing apparatus with a very simple structure, but the thin film layer 28 can not be formed as a continuous thin film layer and has an intermittently broken portion. However, the coating of the thin film layer having intermittently broken portions is a constitution that can be favorably used unless it is a special case, since it does not cause any trouble for most thin film clusters. In the manufacturing apparatus having such a configuration, it will be easy to understand with reference to the drawings shown in FIG. 6 or FIG. The manufacturing apparatus shown in Fig. 12 can be manufactured by successively inserting a thin film layer continuously coated on a continuously rotating container or a coating material provided on a carrier, as opposed to having an intermittently moving insertion tool 119 And is collected into the coating material. In the manufacturing apparatus of this aspect, it is not necessary to separate the supply unit and the collecting unit separately.

The coated material may be at least a part of which is provided in a carrier or a container, and may be made to have a shape designated as a free-standing mode as a thermoplastic or heat-flowable material. The coating material provided in the self-supporting manner can also be collected by inserting the thin film layer into the self-supporting coating material using a designated thin-film layer inserting tool.

In the process of inserting the thin film layer, a method of inserting the thin film layer may be employed, but a method of inserting the coating material by moving the thin film layer on the thin film layer is also possible. The coating material to be transported over the thin film layer may be, for example, as a non-limiting example, present at the bottom of the thin film layer or may be supplied from another separate supply. In addition to the method of mechanically inserting the thin film layer, a method of inserting the thin film layer by injecting the coating material can also be used. When the above injection method is used, a spray pump or the like not shown in the drawing can be regarded as a thin film layer inserting tool.

As a non-limiting illustrative example, a device may be provided that is primarily used to fabricate thin-film clusters of more or less demanding specifications. To this end, a thin-film layer In order to fabricate thin-film clusters of two or more layers stacked

A vacuum container for providing a vacuum atmosphere space in which the thin film clusters are manufactured,

A vacuum pumping means for evacuating at least the interior of the vacuum container;

At least one coating source operable to coat a thin film of one or more designated materials on a designated surface within the vacuum vessel;

A coated substrate provided around the coating source and providing a surface to be coated with the thin film;

A separating material supply unit for supplying the separating material onto a specified surface of the thin film and /

A separating material collecting part collecting at least the separating material;

A coating zone in an area where a thin film coating is to be applied to a specified surface of the coated substrate by at least one coating source;

A joining zone in which the separating material, the thin film and the coated substrate are bonded together, and

A separating zone of a region where the separating material is separated from the coated substrate together with the thin film,

A separating material present in at least the supply part, the joint zone and the collecting part for at least a designated period, at least one of thickness, configuration, shape, phase and movement form in at least the supply part and the collecting part;

A separation zone provided in at least one of the paths from the supply section to the collecting section via the joint zone,

≪ / RTI >

The movement of the separating member starts from the supply portion and moves to at least the collecting portion and is bonded to the thin film coated on the coated substrate during movement and then separated from the coated substrate together with the thin film so as to be collected at a designated place including at least the collecting portion. In the cluster manufacturing apparatus

At least at a given point in time

The bonding zone may be formed by a thin film of a separating material; That is, a thin film coated on the coated substrate, to a point where the bonded thin film is separated from the coated substrate

The separating material is used for separating the thin film coated on the coated substrate from the coated substrate,

Wherein the deformation zone is a region where at least one of thickness, configuration, shape, and state of the separating member causes deformation,

The maximum length of the thin film in the coated state on the surface of the coated substrate is twice or more as large as the thickness of the thin film layer,

At least a part of the separating material collected by the collecting part is collected after being supplied from the supplying part, being bonded to the thin film in the bonding zone and separated from the coated substrate again,

At least a part of the separating material supplied for bonding with the thin film from the supplying part moves to a state having a viscosity within a specified range which maintains the fluidity of the separating material without being vapor deposited, And,

The thickness of the thin film layer is 0.1 nanometer or more and 50 microns or less,

At least a part of the separating material collected by the collecting part is also collected in the in-situ state without the step of vapor deposition and without the intervention of the solvent,

The arrangement structure of the joining zone, the separation zone, and the collecting section is arranged to move at least in the order of the joining zone, the separation zone, and the collecting section based on the separating material starting from the supplying section,

Wherein the maximum area of the thin film in the coated state is at least two times greater than the area of the maximum thin film in the collector,

The separating material includes at least one material selected from a fluid material, a fluid material at room temperature, and a plastic material. The saturated vapor pressure at 25 deg. C is not more than 100 torr, and the melting point is not more than 650 deg.

Wherein the thin film layer is configured to move in order of at least a bonding zone, a separation zone, and a collection section after being coated on the coated substrate, wherein the collection collected in the collection section includes at least the separation material and the thin film layer, Wherein the thin film layer is collected in two or more stages with a separator interposed therebetween.

The method of separating and collecting the thin film layer from the coated substrate using the separating material after coating the thin film on the coated substrate with the coated substrate is differentiated from the embodiment using the coated material.

An apparatus for manufacturing such an embodiment can be described with reference to FIG. 7 as a non-limiting example.

In order to accomplish this, the coated substrate 101 having a different concept from that of the coated material 13 is first prepared, and the thin film layer 103 is deposited on a surface of the coated substrate 101 rather than the coated material 13 Respectively. Since the thin film layer deposited on the surface of the coated substrate has a very thin thickness and the surface of the coated substrate is a solid solid material, the thin film layer is easily separated from the surface of the coated substrate by a mechanism such as a knife or a brush I can not get it. Therefore, in the present invention, the separating material 23 having an adhesive strength of more than the specified range is introduced, bonded to the surface of the thin film layer 103 deposited on the surface of the coated substrate, and repeatedly peeled off together with the thin film layer bonded to the separating material Thereby separating and separating the separating material and the thin film layer which are deposited on the coated substrate, thereby collecting the thin film layer. Thus, the thin film cluster manufactured by the manufacturing apparatus of the present invention can be manufactured. Preferably, the separating material has fluidity or flexibility during at least a period of bonding with the thin film layer. The process of such an embodiment may be used without limitation, but as a non-limiting example, a condition for depositing a thin film layer may be selected when it is necessary to heat the coated substrate or apply a bias voltage, or to form a thin film layer in the form of fine patterns or three- It can be very usefully used when it is desired to collect by deposition and to produce microfilm flakes which have been shaped or standardized to a specified shape. Non-limiting examples include thin film layers required for silver wire manufacturing, graphene, battery active materials, ultraviolet screening agents, electromagnetic wave shielding agents or absorbents, and pearl pigments.

When separating the separating member 23 from the coated substrate and separating the thin film layer bonded to the separating member from the coated substrate, it is not a method of depositing a separating member, but a means for applying a physical force to the separating member . ≪ / RTI > There are no particular limitations on the mechanism by which a physical force can be applied to or separated from the thin film layer by the separating member, but the present invention is not limited thereto and may be a blade, a knife, a brush, a belt, a roller, or the like .

According to another aspect of the present invention, there is provided a method of manufacturing a thin film clustering type

A vacuum container for providing a vacuum atmosphere space in which the thin film clusters are manufactured,

A vacuum pumping means for evacuating at least the interior of the vacuum container;

At least one coating source operable to coat a thin film of one or more designated materials on a designated surface within the vacuum vessel;

A coated substrate provided around the coating source and providing a surface to be coated with the thin film;

A separating material supply unit for supplying the separating material onto a specified surface of the thin film and /

A separating material collecting part collecting at least the separating material;

A coating zone in an area where a thin film coating is to be applied to a specified surface of the coated substrate by at least one coating source;

A joining zone in which the separating material, the thin film and the coated substrate are bonded together, and

A separating zone of a region where the separating material is separated from the coated substrate together with the thin film,

A separating material present in at least the supply part, the joint zone and the collecting part for at least a designated period, at least one of thickness, configuration, shape, phase and movement form in at least the supply part and the collecting part;

And a separation reforming zone provided at least one of the paths from the supply section to the collecting section via the joint zone

The movement of the separating member starts from the supply portion and moves to at least the collecting portion and is bonded to the thin film coated on the coated substrate during movement and then separated from the coated substrate together with the thin film so as to be collected at a designated place including at least the collecting portion. In the cluster manufacturing apparatus

At least at a specified point in time, the joining zone comprises a thin film of separating material; That is, a thin film coated on the coated substrate, to a point just before being separated from the coated substrate

The separating material is used for separating the thin film coated on the coated substrate from the coated substrate,

Wherein the deformation zone is a region where at least one of thickness, configuration, shape, and state of the separating member causes deformation,

The maximum length of the thin film in the coated state on the surface of the coated substrate is twice or more as large as the thickness of the thin film layer,

 At least a part of the separating material collected by the collecting part is collected after being supplied from the supplying part, being bonded to the thin film in the bonding zone and separated from the coated substrate again,

At least a part of the separating material supplied for bonding with the thin film from the supplying part moves to a state having a viscosity within a specified range which maintains the fluidity of the separating material without being vapor deposited, And,

The thickness of the thin film layer is 0.1 nanometer or more and 50 microns or less,

At least a part of the separating material collected by the collecting part is also collected in the in-situ state without the step of vapor deposition and without the intervention of the solvent,

A separating zone, and a collecting unit in the order of the separating member starting from the supplying unit,

Wherein the thin film layer is configured to move in order of at least a bonding zone, a separation zone, and a collection section after being coated on the coated substrate, wherein the collection collected in the collection section includes at least the separation material and the thin film layer, Wherein the thin film layer is collected in a winding state more than 10 times with a separator interposed therebetween.

It can be seen that the above-mentioned coated substrate used in the constitution of this embodiment is a component completely different from the coated material. As a non-limiting example, it is preferable that the surface of the coated substrate is made of a material having a low adhesive force to the thin film, or the surface is coated with a good releasable surface. So that the thin film layer is more easily separated from the surface of the coated substrate.

Since the thin film layer deposited on the surface of the coated substrate has a very thin thickness and the surface of the coated substrate is a solid solid material, the thin film layer is easily separated from the surface of the coated substrate by a mechanism such as a knife or a brush I can not get it. Therefore, in the present invention, the step of introducing the separating material 9 having an adhesive strength of more than the specified range, joining to the surface of the thin film layer 1 deposited on the surface of the coated substrate, and peeling off again with the thin film layer bonded to the separating material is repeated Thereby separating and collecting the separating material and the thin film layer which are deposited on the coated substrate, and collecting the separated material and the thin film layer. Thus, the thin film clusters of the manufacturing apparatus of the present invention can be manufactured.

As described above, the manufacturing apparatus using the separating material and the coated substrate among the aspects of the present invention is shown in Figs. 7 to 9 are provided with piping means 109 for connecting the separation material supply unit 37 and the collecting unit 39 so as to communicate with each other. However, as shown in FIG. 10, in the single container containing the separation material, (37) and a collecting part (39) are provided together.

The operation overview of the separating material and the manufacturing apparatus using the coated substrate is as follows. First, the coating source 21 is coated on the surface of the coated substrate 101 in a vacuum container pumped to a vacuum level range basically specified as in the first embodiment of the present invention. The thin film layer 103 is coated.

A separation material layer 105 is bonded or formed on the thin film layer 103.

The thin film layer 103 bonded to the separating material film 105 is separated from the coated substrate 101.

The separated thin film layer 103 and the separating material film 105 are collected in a collecting portion, thereby collecting and manufacturing thin film clusters for the purpose of operation of the manufacturing apparatus of the present invention.

In the apparatus of this embodiment, a configuration may also be provided in which a separator and a thin film layer collected as in FIG. 11 are collected in a web (WEB) state.

In the present invention, each part and / or area of the supply part, the deformation zone, the joining zone, the separation zone, the collecting part and the like may be provided at a very close location, but they may also be provided as a combination of performing both functions at one point.

The separator does not use a process of evaporating by heating, but at least it is preferable that the saturated vapor pressure is low at room temperature in a vacuum apparatus. Among the substances having a saturated vapor pressure of at most 100 Torr at least in a room temperature state in a vacuum apparatus, the smaller the saturated vapor pressure is, the more preferable. When a material exceeding 100 Torr is used as the separator, the vapor of the separating material may cause a fatal problem due to the effect of obstructing or contaminating the formation of the thin layer, though it depends on the structure and characteristics of the physical or chemical vapor deposition apparatus.

Since the separating material needs to be deformed and / or moved by applying a physical force for at least a designated period of time in the in-situ state, it is necessary to use a fluid material or a plastic material, and the separating material must be deformed and / The lower the temperature of softening or melting, the better.

However, in order to broaden the selection of the separating material, the melting point is preferably 650 ° C or less. If a separating material having a higher melting point is used, a large amount of energy is consumed to raise the temperature up to the melting point. In addition, the configuration of the deposition apparatus requires a complicated and complicated structure and material .

It is required that the separating material mixed with the thin film layer in the in-situ state does not contain a solvent. Most solvent materials are too high in vapor pressure to pollute the vacuum environment in the vacuum system, as well as adversely affect many components, including the vacuum pump. Therefore, it is required that the separating member moves and moves together with the thin film layers in a state in which there is no solvent intervention.

As a non-limiting example, the process of manufacturing the thin film clusters of the present invention may be performed through the process of the above-described aspects, but the collection process is not particularly limited to the above-described embodiments. That is, in order to allow the position of the coating material or the separating material including the thin film layer to be displaced such as a blade, a knife, a brush or the like in the pre-collecting step due to the gravity, Although the collecting process of the desired mode can be forcibly performed using the collecting devices capable of applying the physical force, there is no need to set specific limitations as mentioned above.

As described above, the forming process of the coated material and the separating material of the present invention is characterized in that it is formed by a non-deposition method in particular.

In addition, as described above, since the coating material vapor heated from the evaporation source and the radiation heat emitted from the evaporation source for evaporation of the coating material can be originally shut off from the factors that give a lethal adverse effect to the vacuum apparatus, It offers a great deal of benefits.

Furthermore, the coating material deposition source and the accessories therefor are omitted, and the solvent intervention in the collecting process in the in situ state is completely prevented, thereby further providing various benefits therefrom.

Further, the physical properties and composition of the coating material and / or the separating material provided in the apparatus for manufacturing a thin-film cluster according to the present invention not only completely solve all the problems encountered in the cited inventions, Thereby enabling continuous production processes in a practical in-situ state, thereby greatly improving productivity and economy.

Preferably, the separating material has fluidity or flexibility during at least a period of bonding with the thin film layer. The process of such an embodiment can be used without limitation, but for non-limiting examples, when it is necessary to heat the coated substrate as a condition for depositing the thin film layer, or when it is desired to deposit the thin film layer in a fine pattern or a precise three- It can be very usefully used when it is desired to produce fine-grained thin film particles in a specified shape.

When separating the separating material 9 from the coated substrate and separating the thin film layer bonded to the separating material from the coated substrate, it is not a method of depositing a separating material but a mechanism capable of applying a physical force to the separating material . ≪ / RTI > There are no particular limitations on the mechanism by which a physical force can be applied to or separated from the thin film layer by the separating member, but the present invention is not limited thereto and may be a blade, a knife, a brush, a belt, a roller, or the like .

It is required that at least a part of at least a process of applying a physical force to at least a part of the coating material or the separating material to collect it together with the thin film layers and move the coating material to the coating zone is performed in the in-situ state in the vacuum chamber.

The thin film cluster provided by the manufacturing apparatus of the present invention is obtained in a form including at least two thin film layers and a coating material or separating material for keeping the thin film layers in a separated state.

The vacuum container may be, but is not limited to, a vacuum deposition chamber, which may be a physical vapor deposition or chemical vapor deposition process, such as sputtering. Can be used.

The shape of the coated material is not limited to a specific condition or shape, and should have a shape and physical properties capable of forming a thin film layer designated by physical or chemical vapor deposition on at least one surface.

The thin film clusters or thin film particles produced by the thin-film cluster manufacturing apparatus may be composed of a single layer, or may have a multi-layer structure including two or more different materials, or may be a thin-film cluster formed three-dimensionally. It can be applied in a wide variety of fields such as paints, medical materials, electronic materials, catalyst particles, battery active materials, and printing ink materials. In addition, a very useful form of the thin film may be a thin film cluster or thin film particle characterized in that the electrical conductivity or the thermal conductivity of at least one layer is higher than that of the other layer. Such a structure can be applied to a wide variety of electrical connection means such as mounting, wiring, connection, joining, soldering, welding, brazing, and sintering of a printed electronic field or an electronic electric component, .

In addition, special sunscreens are provided to provide a variety of beneficial effects. It is more advantageous to prepare an ultraviolet screening agent composed mainly of an inorganic material. The ultraviolet screening agent provided by the present invention is characterized by comprising at least another substance besides the main ultraviolet screening substance.

Since the thin film clusters or thin film particles provided in the production apparatus of the present invention are a flowing material or a plastic material, at least a part of each of the thin film layers is separated from each other without a separate solvent for a designated period of time at a designated time, You can. As described above, the coating material can be selected from a fluid material or a plastic material, and the saturated vapor pressure is sufficiently low so as not to hinder the formation of the physical vapor deposition thin film.

When the length / thickness ratio of the thin film layer in a state of being mixed with the coating material or the separating material in a collected state is less than 2, it is not a THIN FILM type but a substantially NANO PARTICLE type. It is impossible to produce thin film particles of the flake-like form to be desired.

In addition, since the thin film produced by the wet thin film plating method is not environmentally friendly, and the purity of the thin film itself is also a problem, the thin film layer is required to be formed by a physical vapor deposition method. The thin film deposition is required to be formed depending on the surface shape of the coating material in order to maintain the shape of the thin film (THIN FILM).

In order to produce a large number of thin film layers having a specified thickness, it is necessary to mix the coating material or the separating material for distinguishing between the thin film layer and the thin film layer in the in situ state, but it is important that the coating material or the separating material is not mixed in the vapor state. If the vapor state is created and vapor-deposited between the thin film layer and the thin film layer, the vapors of the respective different materials are mutually diffused and mixed to act as contaminants to each other, thereby seriously deteriorating the purity and quality of the thin film In addition, as described above, it causes a lot of problems such as contamination of the vacuum device and the parts and improvement of the production cost.

Therefore, in order to mix the coating material and the separating material between the thin film layer and the thin film layer without passing through the vapor state, the coating material or the separating material in the present invention uses a fluid material or a plastic material, Thereby inducing the thin film layers to be deposited in a separated state from each other. When the coating material or the separating material is a fluid material, especially a fluid material at room temperature, heating is not required at all, and therefore a very convenient process can be performed.

However, in order for the thin film layer to have a three-dimensional shape or a specified shape, precise shape control may be restricted when the coating material is a fluid material. In this case, since a three-dimensional shape of a thin film to be manufactured can be imprinted on the surface of the coating material by using a heated mold (MOLD) by using the imprinting method using a heat fluid material or a thermoplastic material, The thin film corresponding to the three-dimensional shape provided in the metal mold can be produced.

If a coating material or a separating material capable of flowing as described above is used, the coating material or the separating material can be mixed with the mechanical force between the thin film layers without a vapor deposition process using a process of evaporation, There is provided a manufacturing apparatus capable of providing a thin film cluster fabricated in a state in which mutual contamination by vapor molecules pointed out in the present invention and all the additional problems are solved.

When the thickness of the thin film layer is less than 0.1 nanometer, it is difficult to maintain the thin film layer shape. When the thickness of the thin film layer is more than 50 microns, the thin film layer is difficult to be crushed into a fine thin film, .

According to another aspect of the present invention

Wherein at least a part of the thin film layer is a multi-layered thin film layer including at least two or more different materials. For example, the chemical stability of at least one layer contained in the thin film layer is greater than the chemical stability of one layer, or the safety or irritation is at least greater than the safety or irritation of the other layer. Can be provided.

According to another aspect of the present invention

Wherein at least a part of the thin film layers is formed of at least two or more of three or more portions formed in three or more dimensions in a specified shape on the surface of the coated material or the coated substrate at the time when the thin film layer is deposited, Dimensional shape of the thin film cluster. In this case, the thin film layer offers a very advantageous advantage in producing thin film particles that are standardized to a specified shape. As a non-limiting example, the thin film layer may be differentiated into a two-dimensional or two-dimensional shape in a photomultiplier forming standardized thin film particles in a state in which the thin film layer is formed in a primary three-dimensional shape or in a state in which the thin film layer is unloaded.

According to another aspect of the present invention

Wherein the coating material or separating material is supplied to at least a portion of a specified carrier or container, and the carrier or the container is in the form of a film or a roll, or a circulating belt, a drum, or a container.

The most preferred embodiment of the present invention is not aimed at the thin film clusters stacked in two or more layers as described above, but it is to obtain thin film clusters stacked as many layers as possible with the coating material or the separating material therebetween. This is to increase the productivity by collecting and manufacturing as many thin film clusters as possible in a vacuum container of the same volume.

Since the thin film clusters or thin film particles provided in the present invention are a fluid material or a plastic material, at least a part of each thin film layer may be separated from each other without changing the solvent, . As described above, the coating material can be selected from a fluid material or a plastic material, and the saturated vapor pressure is sufficiently low so as not to hinder the formation of the physical vapor deposition thin film.

Also, since the thin film produced by the wet thin film plating method is not environmentally friendly, and the purity of the thin film itself is also a problem, the thin film layer is required to be formed by a deposition method. The thin film deposition is required to be formed by relying on the surface of the coating material or the surface of the coated substrate in order to maintain a thin film (THIN FILM) shape.

In order to produce a large number of thin film layers having a specified thickness, it is necessary to mix the coating material or the separating material for distinguishing between the thin film layer and the thin film layer in the in situ state, but it is important that the coating material or the separating material is not mixed in the vapor state. If the vapor state is created and vapor-deposited between the thin film layer and the thin film layer, the vapors of the respective different materials are mutually diffused and mixed to act as contaminants to each other, thereby seriously deteriorating the purity and quality of the thin film In addition, as described above, it causes a lot of problems such as contamination of the vacuum device and the parts and improvement of the production cost.

Therefore, in order to mix the coating material between the thin film layer and the thin film layer without passing through the vapor state, in the present invention, a fluid material or a plastic material is used as the coating material and the thin film layer and the thin film layer are separated from each other Lt; / RTI > When the coating material is a fluid material, particularly a fluid material at room temperature, heating is not required at all, and therefore a very convenient process can be performed.

However, in order for the thin film layer to have a three-dimensional shape or a specified shape, precise shape control may be restricted when the coating material is a fluid material. In this case, since a three-dimensional shape of a thin film to be manufactured can be imprinted on the surface of the coating material by using a heated mold (MOLD) by using the imprinting method using a heat fluid material or a thermoplastic material, The thin film corresponding to the three-dimensional shape provided in the metal mold can be produced.

When the coating material capable of flowing as described above is used, the coating material can be mixed between the thin film layers by using a mechanical force without a vapor deposition process using a vaporization process. Therefore, It is possible to provide a thin film cluster fabricated in a state in which mutual pollution caused by the cross-contamination due to the substrate is solved and all the additional problems are solved.

The coating material does not use a process of evaporating by heating, but it is preferable that the coating material has a low saturated vapor pressure at atmospheric temperature in a vacuum apparatus. Among the substances having a saturated vapor pressure of at most 100 Torr at least in a room temperature state in a vacuum apparatus, the smaller the saturated vapor pressure is, the more preferable. When a material exceeding 100 Torr is used as the coating material, the vapors of the coating material may cause a fatal problem due to the effect of obstructing or contaminating the thin film layer, though it depends on the structure and characteristics of the physical vapor deposition apparatus.

Since the coated material needs to be subjected to a process of moving a physical force for at least a specified period of time in an in-situ state, it is necessary to use a fluid material or use a plastic material, and the coated material melts or softens The lower the softening point or melting point, the better.

However, in order to broaden the selection of the material to be coated, it is preferable that the melting point is 650 DEG C or less. When a coating material having a higher melting point is used, not only a large amount of energy is consumed to raise the temperature up to the melting point, but also the structure of the physical vapor deposition apparatus has a complicated and complicated structure and materials Because it becomes necessary.

In the in situ state, it is required that the mixed coating material or separating material does not contain a solvent. Most solvent materials have a high vapor pressure, which is not only a cause of polluting the vacuum atmosphere in the vacuum device, but also has the possibility of adversely affecting many parts including the vacuum pump. Therefore, the coating material or the separating material is required to be moved and moved together with the thin film layers in a state in which there is no solvent intervention.

As a non-limiting example, at least a part of the thin film layers finally included in the thin film cluster can be used in a size of 1/100 or less from the size in the deposition process step. Part of the grinding process is performed in the in-situ state And may be carried out at the same time as the mixing step, but may be carried out using a crushing and sorting-only apparatus after taking it out of the vacuum vessel, if necessary. As a non-limiting example, when a physical force is applied to the coating material and the thin film layer using a rotary brush driven by a motor in an in-situ state and the mixture is pulverized, the area of the thin film layer is about 1 square meter m < ² >), at least a part of the thin film layers in a wide sheet form could be pulverized into fine thin film layers having an area of 1 to 100 square microns. At least a part of the rotary brush used for this purpose is preferably installed so as to overlap with at least a part of the coating material and the thin film layer. Since the coating material is a fluid material or a plastic material, it is possible to sufficiently mix the thin film layers and the coating material with physical force in a state where the solvent is completely intervened by using a mixing mechanism such as the brush, By the process, the coating material can be moved or newly supplied onto the surface of one or more thin film layers or on the side of the deposition area facing the thin film deposition source, that is, the coating zone.

When the thickness of the thin film layer is less than 0.1 nanometer, it is difficult to maintain the thin film layer shape. If the thickness of the thin film layer is more than 50 microns, the thin film layer is difficult to be crushed into a fine thin film, and the waste of material is increased and the thin film deposition cost becomes excessive. The thin film clusters obtained under such conditions are not limited to the area at the time of deposition in the in-situ state or in the unloaded state out of the vacuum container as a non-limiting example, It can be used by grinding.

In addition, in the present invention, a method of mixing two or more kinds of materials may be used in order to control physical properties such as viscosity, saturation vapor pressure, and melting point.

The above-described configurations, which are described as non-limiting examples in this document, have been described with reference to only representative element parts to facilitate understanding of the manufacturing apparatus of the present invention. The detailed components and processes used to construct the actual device may be easily added or modified by techniques known in the art to realize the technical idea of the present invention.

According to another aspect of the present invention there is provided a coating apparatus for coating a thin film of a material different from the coating source of at least one of the plurality of coating sources and at least one coating source of the plurality of coating sources, Wherein the thin film is a thin film containing different materials. The manufacturing apparatus of this embodiment is a very advantageous structure for producing a thin film having a multi-layer structure or a thin film having a gradation structure or a thin film having a mixed structure such as an alloy. Examples of thin films of this construction include, by way of non-limiting example, a UV-blocking film of a structure in which at least one side, preferably both sides, of the UV-curable film is coated with a protective layer and / or a hue layer, And an ultraviolet blocking thin film having a gradation structure in which the concentration of the layer becomes thick. As a thin film of another structure, a thin film for an electronic material having a structure in which at least one surface, preferably both surfaces, of the copper thin film is covered with a silver and / or gold thin film or a gradation structure in which the concentration of silver and / And a copper thin film of copper.

The thin film cluster is fabricated according to another embodiment of the present invention by the thin film cluster manufacturing apparatus.

Characterized in that the thin film is obtained by removing at least a part of the coating material or the separating material from the thin film cluster according to another aspect of the present invention.

According to another aspect of the present invention, there is provided a thin film comprising the main functional material M and at least one or more auxiliary materials S.

According to another aspect of the present invention, the main function of the main functional material M is a function of a conductive function, an ultraviolet shielding function, a heat conduction function, a photoelectric function, a thermoelectric function, a catalytic function, , And a coating function.

According to still another aspect of the present invention, there is provided a thin film comprising: at least one structure selected from the group consisting of a multilayer structure, a gradation structure, and a mixed structure.

According to another aspect of the present invention, there is provided an ultraviolet blocking thin film characterized in that the thin film comprises an ultraviolet blocking material.

According to still another aspect of the present invention, there is provided an ultraviolet blocking thin film comprising a main blocking material A made of an inorganic ultraviolet blocking material and at least one or more auxiliary materials S together.

According to another embodiment of the present invention, the auxiliary material S has at least one coloring material having a lower ultraviolet ray blocking rate than the main blocking material A and having a designated hue, wherein at least a part of the coloring material is exposed to the surface of the thin film The present invention provides an ultraviolet shielding thin film comprising: In another possible configuration, the auxiliary material S may be a protective layer or a protective layer on one side of the auxiliary material S, or one or more layers may be provided between the parking layer A and the auxiliary material S .

In another embodiment of the present invention, the color of at least one color material included in the auxiliary material S includes at least one of hue, red, and black hue, and the ultraviolet-shielding thin film may have a specified hue characteristic And the whitening phenomenon is reduced or eliminated by the self-retaining of the thin film.

According to another aspect of the present invention, there is provided an ultraviolet screening agent comprising the thin film.

According to still another aspect of the present invention, there is provided a cosmetic comprising the thin film.

The fact that the products which can be manufactured using or using the thin film of the present invention can be provided with various products which can not be listed, can be unlimitedly developed by utilizing the general technical idea in this field to be.

One; A vacuum container 3; A rotatable carrier 5 in the form of a drum with a central portion of the side open; The open opening of the drum-shaped rotatable carrier (in one embodiment, the coating material, the deposition source and the thin film cluster can go in and out of the drum through the opening 7); Coating material feeding and deformation means (rollers or brushes are also possible) (feeding means 7 can be used both as a deforming means for forming the coating material film to a specified thickness range) 9; Collecting means (roller or brush form is also possible) 11; A vacuum pump system 13 for a vacuum deposition chamber; Coating material 15; A film 17 of a coating material on which a flowable coating material is adhered to the inner or outer surface of the carrier by a physical force due to the rotation action of the drum-shaped rotatable carrier (as an example) without going through a vapor deposition process; A deposited thin film layer 19 deposited on the surface of a coating material film formed on the inner or outer surface of the carrier; Deposited thin film layers 21 mixed with the coating material; A thin film layer coated on the surface of the coating material; a thin film layer coated on the surface of the coating material; A coating material or separating material supply unit 38, a moving mechanism 39, a collecting unit 53, a drum-shaped rotatable carrier 55 configured to coat a coating material and a thin film layer on an outer surface of the carrier, A thin film layer 59 coated on the surface of the coating material film 55; a separating knife (or means) 101; a coated substrate 103; a thin film layer 105 formed on the surface of the coated substrate; A separating material layer 107 formed by the separating material supply and collecting belt 109, piping means 115 for returning the separating material and / or the thin film layer from the collecting part back to the supply part 37, A thin film layer inserting tool 177, a separating material supplying and deforming means 201, an auxiliary roller 211 for winding, a thin film layer After the separated separating material is separated from the coated substrate, a collected product 213 in the form of a web having a small outer diameter yet to be wound on the coated substrate and the auxiliary roller 201 is removed. After the separating material bonded to the thin film layer is separated from the coated substrate, And the collected product 211 is wound on the coating material and the auxiliary roller 201, and the outer diameter of the collected product 211 is increased with time,

Claims (20)

In order to fabricate a thin film cluster in which the thin film layers are stacked in two or more stages with the coating material interposed therebetween
A vacuum container for providing a vacuum atmosphere space in which the thin film clusters are manufactured,
A vacuum pumping means for evacuating at least the interior of the vacuum container;
At least one coating source operable to coat a thin film of one or more designated materials on a designated surface within the vacuum vessel;
At least a supply part for supplying the coating material to a designated place
At least a collecting part
A coating zone in an area where thin coating is applied to a designated surface of the coating material by one or more coating sources,
Being present in both the supply section and the collection section and in the coating zone for at least a designated period,
Wherein at least one of a thickness, a configuration, a shape, a phase, and a movement form in the supplying part and the collecting part exists in different states,
The coating material is guided from the supply part to at least move to the collecting part,
One or more thin film layers are coated on at least some of the surfaces of the coating material in the coating zone during transport
In a thin-film cluster manufacturing apparatus having a configuration that is collected at a specified place including at least the collecting unit
At least at a given point in time
The arrangement of the supply part, the coating zone and the collecting part is arranged to move at least in the order of the supply part, the coating zone and the collecting part based on the coating material starting from the supply part
Wherein at least a portion of the coated material coated with one or more thin films including a coating source material in the coating zone is a coating material supplied from the supply portion,
At least a portion of the coating material collected by the collecting portion is collected from the supply portion and is collected together with at least a portion of the thin film layer after being coated in the coating zone,
A coating material deformation zone is provided in at least one of the paths from the supply unit to the collecting unit,
Wherein the deformation zone is a region where at least one of a thickness, a configuration, a shape, a state, and a movement form of the coating material causes deformation,
The coating material is collected after being deformed at least once in the deformation zone provided in the path from the supply part to the collection part,
The maximum thickness of the thin film to be coated on the coating material in the coated state on the surface of the coating material is at least twice as large as the thickness of the thin film layer,
At least a part of the coating material supplied from the supply part to the coating zone is supplied in an in-situ state without being subjected to a process of vapor deposition, while moving to a state having a viscosity within a predetermined range for maintaining the fluidity of the coating material,
The thickness of the thin film layer is 0.1 nanometer or more and 50 microns or less,
At least a part of the coating materials collected by the collecting unit is also collected in an in-situ state without being subjected to a process of vapor deposition, and moving to a state having a viscosity within a predetermined range that maintains fluidity of the coating material without involvement of a solvent ,
The coating material includes at least one material selected from a fluid material, a room temperature fluid material, and a plastic material
The saturation vapor pressure at 25 degrees Celsius is less than 100 torr
Melting point is less than 650 degrees Celsius,
Wherein the thin film layer is guided to move to at least a collection part after being coated on the surface of the coating material, and the collection result collected in the collection part includes at least the coating material and the thin film layer, and at least the thin film layer Wherein the thin film clusters are stacked in two or more stages. In order to fabricate a thin film cluster in which the thin film layer is wound 10 times or more with the coating material interposed therebetween
A vacuum container for providing a vacuum atmosphere space in which the thin film clusters are manufactured,
A vacuum pumping means for evacuating at least the interior of the vacuum container;
At least one coating source operable to coat a thin film of one or more designated materials on a designated surface within the vacuum vessel;
A supply part for supplying the coating material to a designated place
A collecting unit for collecting at least a coated material in the form of a web;
A coating zone in an area where thin coating is applied to a designated surface of the coating material by one or more coating sources,
Being present in both the supply section and the collection section and in the coating zone for at least a designated period,
At least one of a thickness, a configuration, a shape, a phase, and a movement form in a supply part and a collecting part exists in different states,
And a power unit for transmitting power that causes at least movement and / or deformation of the coating material
The movement of the coated material starts from the supply part and moves to at least the collecting part,
After one or more thin film layers are coated on at least some of the surfaces of the coating material in the coating zone
In a thin film cluster manufacturing apparatus of a constitution which is collected at a designated place including at least a collecting section
At least at a given point in time
The arrangements of the supply unit, the coating zone, and the collecting unit are arranged to move at least in the order of the supply unit, the coating zone, and the collecting unit based on the coating material starting from the supply unit
Wherein at least a portion of the coated material coated with one or more thin films including a coating source material in the coating zone is a coating material supplied from the supply portion,
At least a part of the coated material collected by the collecting part is collected from the collecting part in a web form after being supplied from the supplying part and coated in the coating zone
A coating material deformation zone is provided in at least one of the paths from the supply unit to the collecting unit via the coating zone,
Wherein the deformation zone is a region where at least one of a thickness, a configuration, a shape, a state, and a movement form of the coating material causes deformation,
Wherein the coating material is collected after being deformed at least once in a path starting from the supplying part to the collecting part,
The maximum thickness of the thin film to be coated on the coating material in the coated state on the surface of the coating material is at least twice as large as the thickness of the thin film layer,
At least a part of the coating material supplied from the supply part to the coating zone is supplied in an in-situ state without being subjected to a process of vapor deposition, while moving to a state having a viscosity within a predetermined range for maintaining the fluidity of the coating material,
The thickness of the thin film layer is 0.1 nanometer or more and 50 microns or less,
At least a part of the coating material collected by the collecting part is also wound in a web form in an in-situ state without a process of being deposited in a vapor state without intervention of a solvent,
The coating material includes at least one material selected from a fluid material, a room temperature fluid material, and a plastic material
The saturation vapor pressure at 25 degrees Celsius is less than 100 torr
Melting point is less than 650 degrees Celsius,
Wherein the thin film layer is configured to move to at least a collecting part after being coated on the surface of the coating material, and the collecting result collected in the collecting part includes the coating material and the thin film layer, and at least the thin film layer Wherein the thin film clusters are collected in a winding state more than 10 times. As an apparatus for producing thin film clusters in which thin film layers are stacked in two or more stages with a coating material interposed therebetween
A vacuum container for providing a vacuum atmosphere space in which the thin film clusters are manufactured,
A vacuum pumping means for evacuating at least the interior of the vacuum container;
At least one coating source operable to coat a thin film of one or more designated materials on a designated surface within the vacuum vessel;
A coating zone in an area where thin coating is applied to a designated surface of the coating material by one or more coating sources,
A coating material provided on a carrier or a container at a thickness equal to or greater than a specified thickness,
And a thin film layer insertion tool for continuously or intermittently inserting the thin film layer coated on the surface of the coating material into the coating material
In a thin-film-cluster producing apparatus having a structure in which the thin-film layer is collected by inserting the thin-film layer into the coating material
At least at a given point in time
Wherein the coating material coated in the coating zone contains at least one layer of the inserted thin film layer therein,
The maximum thickness of the thin film to be coated on the coating material in the coated state on the surface of the coating material is at least twice as large as the thickness of the thin film layer,

Wherein the thin film layer inserting tool collects the thin film layer in the coated material by intermittently or continuously inserting the thin film layer coated on the surface of the coated material into the coated material for a predetermined time,
The thickness of the thin film layer is 0.1 nanometer or more and 50 microns or less,
At least a part of the coating material provided in the coating zone is moved from the in situ state to the specified state in a state of having a specified range of viscosity to maintain the fluidity of the coating material without being vapor deposited,

Said coated material comprising:
A fluid material at room temperature, a fluid material at room temperature, and a plastic material,
The saturation vapor pressure at 25 degrees Celsius is less than 100 torr
Melting point is less than 650 degrees Celsius,
Wherein the thin film layer in the collected product collected in the coating material is obtained in a state that the thin film layer is stacked in two or more stages with the coating material interposed therebetween. In order to fabricate thin film clusters in which two or more thin film layers are stacked with a separator interposed therebetween
A vacuum container for providing a vacuum atmosphere space in which the thin film clusters are manufactured,
A vacuum pumping means for evacuating at least the interior of the vacuum container;
At least one coating source operable to coat a thin film of one or more designated materials on a designated surface within the vacuum vessel;
A coated substrate provided around the coating source and providing a surface to be coated with the thin film;
A separating material supply unit for supplying the separating material onto a specified surface of the thin film and /
A separating material collecting part collecting at least the separating material;
A coating zone in an area where a thin film coating is to be applied to a specified surface of the coated substrate by at least one coating source;
A joining zone in which the separating material, the thin film and the coated substrate are bonded together, and
A separating zone of a region where the separating material is separated from the coated substrate together with the thin film,
A separating material present in at least the supply part, the joint zone and the collecting part for at least a designated period, at least one of thickness, configuration, shape, phase and movement form in at least the supply part and the collecting part;
And a separation reforming zone provided at least one of the paths from the supply section to the collecting section via the joint zone
The movement of the separating member starts from the supply portion and moves to at least the collecting portion and is bonded to the thin film coated on the coated substrate during movement and then separated from the coated substrate together with the thin film so as to be collected at a designated place including at least the collecting portion. In the cluster manufacturing apparatus
At least at a given point in time
The bonding zone may be formed by a thin film of a separating material; That is, a thin film coated on the coated substrate, to a point where the bonded thin film is separated from the coated substrate
The separating material is used for separating the thin film coated on the coated substrate from the coated substrate,
Wherein the deformation zone is a region where at least one of thickness, configuration, shape, and state of the separating member causes deformation,
The maximum length of the thin film in the coated state on the surface of the coated substrate is twice or more as large as the thickness of the thin film layer,
At least a part of the separating material collected by the collecting part is collected after being supplied from the supplying part, being bonded to the thin film in the bonding zone and separated from the coated substrate again,
At least a part of the separating material supplied for bonding with the thin film from the supplying part moves to a state having a viscosity within a specified range which maintains the fluidity of the separating material without being vapor deposited, And,
The thickness of the thin film layer is 0.1 nanometer or more and 50 microns or less,
At least a part of the separating material collected by the collecting part is also collected in the in-situ state without the step of vapor deposition and without the intervention of the solvent,
The arrangement structure of the joining zone, the separation zone, and the collecting section is arranged to move at least in the order of the joining zone, the separation zone, and the collecting section based on the separating material starting from the supplying section,

The separating material includes at least one material selected from a fluid material, a fluid material at room temperature, and a plastic material. The saturated vapor pressure at 25 deg. C is not more than 100 torr, and the melting point is not more than 650 deg.
Wherein the collection collected in the collecting part includes at least the separating material and the thin film layer and the thin film layer is collected in at least two stages in a stacked manner with the separating material interposed therebetween at a specified time point. Device In order to fabricate thin film clusters in which the thin film layer is wound 10 times or more with the separator interposed therebetween
A vacuum container for providing a vacuum atmosphere space in which the thin film clusters are manufactured,
A vacuum pumping means for evacuating at least the interior of the vacuum container;
At least one coating source operable to coat a thin film of one or more designated materials on a designated surface within the vacuum vessel;
A coated substrate provided around the coating source and providing a surface to be coated with the thin film;
A separating material supply unit for supplying the separating material onto a specified surface of the thin film and /
A separating material collecting part collecting at least the separating material;
A coating zone in an area where a thin film coating is to be applied to a specified surface of the coated substrate by at least one coating source;
A joining zone in which the separating material, the thin film and the coated substrate are bonded together, and
A separating zone of a region where the separating material is separated from the coated substrate together with the thin film,
A separating material present in at least the supply part, the joint zone and the collecting part for at least a designated period, at least one of thickness, configuration, shape, phase and movement form in at least the supply part and the collecting part;
And a separation reforming zone provided at least one of the paths from the supply section to the collecting section via the joint zone
The movement of the separating member starts from the supply portion and moves to at least the collecting portion and is bonded to the thin film coated on the coated substrate during movement and then separated from the coated substrate together with the thin film so as to be collected at a designated place including at least the collecting portion. In the cluster manufacturing apparatus
At least at a specified point in time, the joining zone comprises a thin film of separating material; That is, a thin film coated on the coated substrate, to a point just before being separated from the coated substrate
The separating material is used for separating the thin film coated on the coated substrate from the coated substrate,
Wherein the deformation zone is a region where at least one of thickness, configuration, shape, and state of the separating member causes deformation,
The maximum length of the thin film in the coated state on the surface of the coated substrate is twice or more as large as the thickness of the thin film layer,
At least a part of the separating material collected by the collecting part is collected after being supplied from the supplying part, being bonded to the thin film in the bonding zone and separated from the coated substrate again,
At least a part of the separating material supplied for bonding with the thin film from the supplying part moves to a state having a viscosity within a specified range which maintains the fluidity of the separating material without being vapor deposited, And,
The thickness of the thin film layer is 0.1 nanometer or more and 50 microns or less,
At least a part of the separating material collected by the collecting part is also collected in the in-situ state without the step of vapor deposition and without the intervention of the solvent,
A separating zone, and a collecting unit in the order of the separating member starting from the supplying unit,
Wherein the thin film layer is guided to move in the order of at least a bonding zone, a separation zone, and a collecting portion after being coated on the coated substrate, and the collecting collected in the collecting portion includes at least the separating material and the thin layer, Wherein the thin film layer is collected in a state of being wound 10 times or more with a separator interposed therebetween. The thin-film cluster manufacturing apparatus according to any one of claims 1 to 5, wherein at least a part of the thin-film layers is a thin-film layer having a multilayer structure including at least two or more different materials The method according to any one of claims 1 to 5, wherein, at the time when the thin film layer is deposited, the surface of the coated material or the coated substrate is depressed and / or protruded three- Wherein at least a part of the thin film layers are formed in a three-dimensional shape. A method according to any one of claims 1 to 5, wherein the coated material or separator is fed to at least a portion of a specified carrier or container, wherein the carrier or container is in the form of a film or a roll or a recirculating belt, A thin-film cluster manufacturing apparatus 6. The method according to any one of claims 1 to 5, wherein the coating source is a plurality of coating sources, at least one coating source is for coating a thin film of a material different from the other coating source, And a thin film including a different material. A thin-film cluster according to any one of claims 1 to 5, Characterized in that it is obtained by removing at least a part of the coating material or the separating material from the thin film clusters provided in claim 10 The thin film according to claim 11, wherein the thin film comprises a main functional material (M) and at least one or more auxiliary materials (S) 12. The method according to claim 12, wherein the main function of the main functional material is at least one selected from the group consisting of a conductive function, an ultraviolet shielding function, a heat conduction function, a photoelectric function, a thermoelectric function, a catalytic function, Wherein the thin film The thin film according to claim 11, wherein the thin film comprises at least one of a multilayer structure, a gradation structure, and a mixed structure. The thin film of claim 11, wherein the thin film comprises an ultraviolet blocking material. The thin film according to claim 11, wherein the thin film comprises a main blocking material A made of an inorganic UV blocking material and at least one auxiliary material S together. The method of claim 16, wherein the auxiliary material S has at least one ultraviolet ray blocking rate lower than the ultraviolet blocking rate of the main blocking material A and at least one coloring material having a specified color, wherein at least a part of the coloring material is exposed Wherein the ultraviolet light blocking film 16. The method of claim 16, wherein the at least one hue material color included in the auxiliary material S comprises at least one of hue, red, and black hue, the ultraviolet screening thin film having a specified hue characteristic, And the whitening phenomenon is reduced or eliminated by retaining the ultraviolet light blocking film 12. The ultraviolet screening agent according to claim 11, A cosmetic composition comprising the thin film provided in claim 11

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