KR20150068305A - Glass sheet, apparatus for producing glass sheet and method for producing glass sheet - Google Patents

Abstract

The present invention provides: a glass plate having increased separation properties with respect to a vacuum suction stage; an apparatus for manufacturing the same; and a method for manufacturing the same. The apparatus includes: a lower end nozzle (16) which supplies slurry (14) on a lower side (G1) of the glass plate (G); and a grinding tool (12) which presses the lower side of the glass plate (G) and rotates around a rotation axis, perpendicular to the lower side (G1) of the glass plate (G). The apparatus supplies the slurry (14) through the lower nozzle (16) to the lower side (G1) of the glass plate (G), and grinds the lower side (G1) with the grinding tool (12) to process the lower side (G1) so that the maximum groove depth Rv (JIS B 0601·2013) of the lower side (G1) is to be 3.0-5.0 nm.

Description

TECHNICAL FIELD [0001] The present invention relates to a glass plate, a manufacturing apparatus for the glass plate, and a manufacturing method of the glass plate.

The present invention relates to a glass plate, a glass plate manufacturing apparatus, and a glass plate manufacturing method.

BACKGROUND ART A glass plate used in a FPD (Flat Panel Display) such as a liquid crystal display, a plasma display, and an organic EL display is formed with a transparent electrode and a semiconductor element on a glass plate. For example, in a liquid crystal display, electronic members such as a transparent electrode, a TFT (Thin Film Transistor), and a CF (Color Filter) are formed on a glass plate.

The formation of the electronic member on the glass plate is performed with respect to the second surface in a state in which the first surface of the glass plate is fixed to the absorption stage by vacuum suction. However, since the first surface of the glass plate is smooth, the glass plate is strongly adhered to the adsorption stage, and if it is forcibly peeled off, the glass plate is damaged. Further, since the glass plate is liable to be charged, there is a problem that when the glass plate is peeled off from the adsorption stage, the glass plate is electrified to cause peeling electrification and electrostatic destruction occurs in the electron member.

Therefore, the first surface of the glass plate adhered to the adsorption stage is roughened to reduce the contact area between the glass plate and the adsorption stage, thereby preventing the glass plate from adhering strongly to the adsorption stage and the glass plate from being peeled off. It is disclosed in documents 1 and 2.

Patent Document 1 discloses that the average surface roughness Ra (JIS B 0601 占 2001 i) of the first surface of the glass plate is defined to be 0.8 to 2.0 nm. In Patent Document 2, the average surface roughness Ra of the first surface of the glass plate is 0.3 to 1.5 nm.

The glass plate of Patent Document 1 is prepared by spraying a slurry containing abrasive grains (cerium oxide) in a liquid with compressed air set at 0.3 to 0.5 MPa to the first surface of the glass plate from the nozzle and roughening the surface.

On the other hand, the glass plate of Patent Document 2 is produced by chemical treatment with a chemical solution containing HF at 0.05 to 5 mass% or a chemical solution containing NH ₄ F at 20 mass% or more.

However, the glass plate for FPD is manufactured by a plurality of processes.

For example, the manufacturing process of the glass plate for FPD by the float method is roughly classified into a glass plate forming process, a polishing process, a cleaning process, a drying process and an inspection process. In the cleaning process, a shower cleaning process, a slurry cleaning process using a disc brush, a shower rinse process, and the like are set.

Japanese Patent Application Laid-Open No. 2008-120638 Japanese Patent Application Laid-Open No. 2010-275167

Even in the case of the glass plates disclosed in Patent Documents 1 and 2, it is possible to prevent the glass plate from being strongly adhered to the adsorption stage and the peeling electrification from occurring on the glass plate, but since the maximum value of the average surface roughness Ra is 2.0 nm, There is a case where the glass plate is strongly adhered to the adsorption stage or peeling electrification occurs on the glass plate in some cases.

In addition, the glass plate manufacturing method disclosed in Patent Documents 1 and 2 can not be manufactured in the manufacturing process of the above-described glass plate, and it is necessary to take out the glass plate from the manufacturing process and perform the roughening treatment.

SUMMARY OF THE INVENTION It is an object of the present invention to provide a glass plate, a manufacturing apparatus for a glass plate, and a manufacturing method for a glass plate which are improved in peelability to an adsorption stage.

In order to achieve the above object, according to one embodiment of the present invention, there is provided a glass plate having a first surface and a second surface facing the first surface, wherein a maximum valley depth Rv (JIS B 0601 · 2013) Is 3.0 nm < Rv < 5.0 nm.

In an embodiment of the present invention, it is preferable that the first surface is a surface which is in contact with the adsorption stage, and the second surface is a surface in which the electron member is formed.

An embodiment of the present invention is preferably used as a glass plate for display.

In an embodiment of the present invention, the resolution of the second surface is preferably 1920 x 1080 or more.

Although the glass plate for high-precision display having the resolution of the second surface of the glass plate for display of 1920 × 1080 or more is high in accuracy, the glass plate of the present invention has the maximum thickness of the first surface Rv (JIS B 0601 2013) is 3.0 nm < Rv < 5.0 nm, the peeling property to the adsorption stage is improved, and the occurrence rate of the electrostatic breakdown failure can be reduced. Therefore, an embodiment of the present invention is effective for the high-precision display glass plate.

According to an aspect of the present invention, there is provided an abrasive material supply apparatus comprising abrasive supply means for supplying abrasives to a first one of two mutually opposing surfaces of a glass plate, Wherein the abrasive material is supplied to the first surface of the glass plate from the abrasive material supply means while grinding the first surface with the abrasive material to form the abrasive material on the first surface of the glass plate, Wherein the first surface is processed such that the maximum valley depth Rv (JIS B 0601 201 2013) of 3.0 nm < Rv < 5.0 nm is obtained.

According to another aspect of the present invention, there is provided an abrasive according to one aspect of the present invention, comprising: abrasive supply means for supplying abrasives to a first one of two mutually opposing surfaces of a glass plate; Wherein the abrasive material is supplied from the abrasive material supply means to the first surface of the glass sheet while the abrasive material is being supplied to the first surface of the glass sheet by the abrasive grains, And processing the first surface so that the maximum valley depth Rv (JIS B 0601 · 2013) on the first surface is 3.0 nm <Rv <5.0 nm by grinding.

According to one embodiment of the present invention, by grinding the first surface by the abrasive while supplying the abrasive from the abrasive supply means to the first surface of the glass plate, the maximum bony depth Rv on the first surface is 3.0 nm < Rv & To prepare a glass plate having a thickness of 5.0 nm.

According to one embodiment of the present invention, the surface roughness of the glass plate is defined as the maximum bone depth Rv, and the range of the maximum bone depth Rv is defined for the following reason. That is, in order to assure the peelability to the adsorption stage, it has been experimentally confirmed that the minimum value of the maximum valley depth Rv needs to exceed 3.0 nm. In addition, it was confirmed by experiments that the maximum depth of the ribs Rv is less than 5.0 nm, which can guarantee the in-plane strength of the glass plate. Based on these reasons, the present invention defines 3.0 nm <Rv <5.0 nm.

Thus, according to one embodiment of the present invention, it is possible to provide a glass plate improved in peelability to a suction stage, and capable of guaranteeing in-plane strength.

In an embodiment of the present invention, it is preferable that the polishing pad has a polishing pad provided on the surface of the cushioning member.

According to one embodiment of the present invention, for example, a polishing pad made of foamed polyurethane is pressed against a first surface of a glass plate to roughen the first surface. At this time, since the polishing pad is provided on the surface of the cushion member made of, for example, a sponge, the first surface is polished following the curvature of the first surface. Thus, the first surface of the glass plate can be processed with uniform illuminance.

In an embodiment of the present invention, it is preferable that a plurality of grooves are provided on the surface of the polishing pad.

According to one embodiment of the present invention, the shape of the first surface of the glass plate formed by the grooves of the polishing pad can be controlled to a desired shape by controlling the number of revolutions of the polishing pad. Further, since the abrasive is held in the groove of the polishing pad, problems such as burn-in due to polishing are prevented, and the surface quality of the first surface can be maintained.

An embodiment of the present invention is preferably provided with a cleaning member pressed against the second surface of the glass plate to clean the second surface.

According to one embodiment of the present invention, the roughening treatment of the first surface by the polishing pad and the cleaning treatment of the other surface by the cleaning member such as a disc brush can be performed at the same time.

INDUSTRIAL APPLICABILITY As described above, according to the glass plate, the glass plate manufacturing apparatus, and the glass plate manufacturing method according to the present invention, it is possible to obtain a glass plate improved in peelability to the absorption stage.

1 is a perspective view showing an overall structure of a manufacturing apparatus of a glass plate according to an embodiment.
Fig. 2 is a front view of the manufacturing apparatus shown in Fig. 1; Fig.
3 is a bottom view of the manufacturing apparatus shown in Fig.
Fig. 4 is a perspective view of a polishing pad used in the manufacturing apparatus of Fig. 1; Fig.
5 is an explanatory view showing each step of the manufacturing process of the glass plate for FPD as a block.

DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, preferred embodiments of a glass plate, a glass plate manufacturing apparatus and a glass plate manufacturing method according to the present invention will be described with reference to the accompanying drawings.

[Production process of glass plate]

First, the manufacturing process of the glass plate will be described with reference to FIG. Fig. 5 is an explanatory diagram showing each step of the manufacturing process 100 of the glass plate for FPD as a block.

The manufacturing process 100 in the method of manufacturing an FPD glass plate by the float method includes a glass plate forming step 102, a polishing step (polishing apparatus) 104, a shower washing step 106, a slurry washing step 108, The first high pressure shower washing step 110, the detergent washing step 112, the second high pressure shower washing step 114, the pure water washing step 116, the third high pressure shower washing step 118, the pure shower rinsing step 120, a final rinse process 122, a drying process (drying device) 124, and an inspection process 126. The production method of the glass plate is not limited to the float method, and other manufacturing methods such as the fusion method and the reedrow method may be used.

The glass sheet forming step 102 includes a step of forming a strip-shaped plate glass from the molten glass and a step of cutting the strip-shaped plate glass into a glass plate of a predetermined rectangular size. The glass plate is continuously transported in the horizontal direction by the roller conveyor, from the polishing step 104 to the inspection step 126 after polishing, and predetermined processing is performed in each step. The glass plate having undergone the inspection process 126 of the final process is packed in a pallet and shipped.

In the manufacturing method of the present invention, the step of roughening the first surface of the glass plate so that the maximum depth Rv (JIS B 0601 · 2013) of the first surface is 3.0 nm <Rv <5.0 nm, Cleaning process 108 is performed. In other words, the apparatus for manufacturing a glass plate according to the embodiment is disposed in the slurry cleaning step 108. By this manufacturing apparatus, the first surface of the glass plate is roughened so that the maximum valley depth Rv (JIS B 0601 · 2013) of the first surface of the glass plate becomes 3.0 nm <Rv <5.0 nm.

As an example of the glass plate G, glass having the following composition can be mentioned.

As a percentage of mass based on oxide

SiO ₂ : 50 to 73%

Al ₂ O ₃ : 10 to 27%

B ₂ 0 ₃ : 0 to 12%

MgO: 0 to 10%

CaO: 0 to 15%

SrO: 0 to 24%

BaO: 0 to 15%

MgO + CaO + SrO + BaO: 8 to 29.5%

ZrO ₂ : 0 to 5%

Alkali-free glass.

The thickness of the glass plate G is not particularly limited and is preferably 0.7 mm or less, more preferably 0.5 mm or less, and further preferably 0.3 mm or less.

[Configuration of Manufacturing Apparatus 10]

Fig. 1 is a perspective view showing the entire structure of a manufacturing apparatus 10 according to the embodiment. Fig. Fig. 2 is a front view of the manufacturing apparatus 10 shown in Fig. 1, and Fig. 3 is a bottom view of the manufacturing apparatus 10 shown in Fig.

The manufacturing apparatus 10 includes a plurality of polishing ports 12 which are in press contact with the lower surface G1 (first surface) of the glass plate G as shown in Figs. 2 and 3, (Abrasive material supply means) 16 for supplying a slurry (slurry) 14 to the lower surface G1.

The manufacturing apparatus 10 is also provided with a lower roller group 18 in contact with the lower surface G1 of the glass plate G as shown in Fig. 1 and a lower roller group 18 disposed above the lower roller group 18, And a top pinch roller group 20 that contacts the top surface G2 (second surface) facing the bottom G1 of the sheet G and sandwiches the glass sheet G in the thickness direction between the bottom roller groups 18 do. The glass plate G is conveyed in a horizontal state in the direction indicated by the arrow A by the rotation of the lower roller group 18 in the direction indicated by the arrow B.

The plurality of rollers 22 constituting the lower roller group 18 are linear bar-shaped and have a cylindrical shape. The plurality of rollers 22 are juxtaposed at predetermined intervals along the transport direction. On the other hand, the plurality of rollers 24 constituting the upper pinch roller group 20 are likewise linear-bar-shaped and have a cylindrical shape. The rollers 24 are also juxtaposed at predetermined intervals along the transport direction like the rollers 22.

Between adjacent rollers 24 and 24, a plurality of disc brushes 26 are arranged in a direction perpendicular to the carrying direction. The disc brush 26 is brought into contact with the upper surface G2 of the glass plate G and is also rotated about the vertical rotation axis 26A orthogonal to the upper surface G2 of the glass plate G. [

An upper nozzle 28 is disposed above the disc brush 26 as shown in Fig. 2 and the slurry 30 is supplied to the upper surface G2 of the glass plate G from the upper nozzle 28. [

In the slurry cleaning step 108, the slurry 30 is supplied to the upper surface G2 of the glass plate G, and the upper surface G2 is polished with the disk brush 26 while the slurry residue remaining on the upper surface G2 is removed do. The slurry 14 is supplied to the lower surface G1 of the glass plate G and is polished with the polishing tool 12 to remove the frame slurry remaining on the lower surface G1 and the lower surface G1 to the polishing pad 12 (0.3 nm < Rv < 0.5 nm).

The disk brush 26 is made of PVA (polyvinyl alcohol) sponge and has a cylindrical shape with an outer diameter of 70 to 100 mm. The rotating speed of the disk brush 26 is 100 to 500 rpm. These values are only examples.

The plurality of polishing ports 12 of the manufacturing apparatus 10 are arranged between the adjacent two rollers 22 and 22 of the lower roller group 18 as shown in Fig. 3, in a direction perpendicular to the conveying direction of the glass plate G As shown in Fig. The abrasive grains 12 are pressed against the lower surface G1 of the glass plate G and are also rotated about the vertical rotation axis 12A (see Fig. 2) orthogonal to the lower surface G1 of the glass plate G . The lower surface G1 of the glass plate G is roughened (0.3 nm < Rv < 1) by the plurality of polishing ports 12 rotating with the slurry 14 while passing through the slurry cleaning process 108 0.5 nm).

Fig. 4 is an enlarged perspective view showing the configuration of the polishing tool 12. Fig.

The polishing tool 12 includes a cylindrical base member 32 to which rotational force from a rotation drive source (not shown) is transmitted, a sponge (cushion member) 34 provided at an end portion And a polishing pad 36 made of foamed polyurethane attached to an end portion (upper end in FIG. 2) of the sponge 34. The polishing pad 36 is attached to the lower face G1 of the glass plate G as shown in FIGS. Pressure contact. 4, a plurality of grooves 38 are provided on the surface of the polishing pad 36 so as to cross each other. The lands L of the polishing pad 36 are formed by the flat portions 40 excluding the grooves 38 and the grooves 38. The D hardness of the polishing pad 36 is preferably 50 or more, and the A hardness of the sponge 34 is about 20. Further, the shape of the land L of the polishing pad 36 can be arbitrarily changed by changing the number, the width, and the interval of the grooves 38. [

[Operation of Manufacturing Apparatus 10]

The amount of indentation of the polishing tool 12 to the lower surface G1 of the glass plate G is set to 0.6 mm to 1.0 mm and the number of revolutions of the polishing tool 12 is set to 30 revolutions per minute. Thereafter, the lower surface of the glass plate G is coated with the slurry 14 (14) from the lower end nozzle 16 to the lower surface G1 of the glass plate G so that the maximum trough depth Rv (JIS B 0601 · 2013) on the lower surface G1 becomes 3.0 nm < And the lower surface G1 is ground by the polishing tool 12. The press-in amount and the number of revolutions are merely examples. The press-in amount, the number of revolutions, and the material of the polishing pad 36 are determined in consideration of other factors such as the thickness of the glass plate G, the hardness of the glass plate,

In the embodiment, the roughness of the surface of the glass plate G is defined as the maximum valley depth Rv, not the average surface roughness Ra. That is, it has been experimentally confirmed that the peelability of the glass plate G with respect to the adsorption stage in the process of forming the electronic member such as the transparent electrode or the semiconductor element is improved as the maximum valley depth Rv increases. Also, in the case of a glass plate in which only an average surface roughness Ra is defined as in Patent Documents 1 and 2, a glass plate having a high stickiness can not be stably obtained, and a glass plate strongly adhered to the adsorption stage exists when the adsorption force of the adsorption stage is high Respectively.

On the other hand, the range of the maximum bone depth Rv was specified for the following reason. That is, it has been experimentally confirmed that the minimum value of the maximum valley depth Rv needs to exceed 3.0 nm in order to ensure the peelability to the adsorption stage. In addition, it has been experimentally confirmed that the in-plane strength of the glass plate (G) can be guaranteed when the maximum depth of the ridges Rv is less than 5.0 nm. Based on this reason, the maximum bone depth Rv is defined as 3.0 nm < Rv < 5.0 nm.

As a result, according to the manufacturing apparatus 10 of the embodiment, it is possible to manufacture a glass plate (G) which is improved in peelability to the adsorption stage and ensures the in-plane strength.

In addition, the polishing tool 12 of the embodiment is constituted by providing the polishing pad 36 on the surface of the sponge 34. According to this swarf 12, the polishing pad 36 made of foamed polyurethane is pressed against the lower surface G1 of the glass plate G to roughen the lower surface G1. At this time, since the polishing pad 36 is provided on the surface of the sponge 34, the lower surface G1 is polished while following the curvature of the lower surface G1. Thus, the lower surface G1 of the glass plate G can be processed with uniform illumination.

Since the plurality of grooves 38 are provided on the surface of the polishing pad 36, the number of revolutions of the polishing pad 36 is controlled so that the depth of the lower surface G1 of the glass plate G formed by the grooves 38 The shape can be controlled to a desired shape. Further, since the slurry 14 is held in the groove 38, problems such as burn-in due to polishing can be prevented, and the surface quality of the lower surface G1 can be maintained.

Furthermore, according to the manufacturing apparatus 10, the roughening treatment of the lower surface G1 by the polishing pad 36 and the cleaning treatment of the upper surface G2 by the disc brush 26 can be performed at the same time.

Furthermore, the manufacturing apparatus 10 of the embodiment is effective for a high-precision display glass plate in which the resolution of the second surface of the display glass plate is 1920 x 1080 or more. The glass plate G of the embodiment has a maximum valley depth Rv (JIS B 0601 · 2013) of 3.0 nm <Rv <5.0 nm on the first surface because of the high precision of the glass plate for high precision display , The peeling property to the adsorption stage is improved, and the occurrence rate of the electrostatic breakdown failure can be reduced.

In the embodiment, the example in which the manufacturing apparatus 10 is introduced to the slurry cleaning step 108 in the manufacturing process of the glass plate G is described, but the present invention is not limited thereto. That is, it may be a manufacturing apparatus that performs the roughening treatment while fixing the glass plate G without continuously carrying it. That is, it may be a manufacturing apparatus that processes the glass sheet G in a single sheet.

The supply means of the slurry 14, 30 is not limited to the nozzle, and may be supplied from a hole passing through the polishing pad like a conventional polishing pad. The roughening treatment by the polishing pad 36 is not limited to the simultaneous with the slurry cleaning, and the roughening treatment may be performed alone. 2, the abrasive grains 12 are disposed immediately below between the adjacent two disk brushes 26. However, the abrasive grains 12 may be disposed immediately below the disk brushes 26. [

&Lt; Example of Method of Measuring Surface Roughness of Glass Sheet (G)

As the measuring apparatus, a non-contact surface shape measuring apparatus using optical interference was used. The non-contact surface shape measuring apparatus is an apparatus for precisely measuring the surface roughness of the glass plate G in a noncontact manner using the principle of low coherence interference. A non-contact surface shape measuring apparatus is a method of measuring a surface of a glass plate G by dividing white light emitted from a white light source having a broad spectral wavelength or a so-called low coherence light source into measurement light and reference light, The measurement light reflected from the surface of the glass plate G is interfered with the reference light to measure the illuminance on the surface of the glass plate G irradiating the measurement light.

The measurement points were at least one arbitrary region, preferably two or more arbitrary regions. The shape of the measurement region was a rectangle having a short side of 70 mu m and a long side of 100 mu m. When the measurement area is one point, its measured value is taken as a representative value, and when it is two or more points, its average value is taken as a representative value.

N0. 1 to N0. 3 shows the results of measurement of maximum bone depth Rv, chargeability and in-plane strength of the glass plate. The glass plate is a non-alkali glass having a thickness of 0.7 mm (AN100 (trade name), manufactured by Asahi Glass Co., Ltd.)).

The electrification property of the glass plate when the glass plate adsorbed on the adsorption stage was peeled from the adsorption stage was measured. Quot; A &quot;, &quot; B &quot;, and &quot; C &quot; in the order of smaller absolute value of the maximum charge amount on the surface of the glass plate.

The in-plane strength was measured by the ball-ring method. The glass plate was placed on the annular ring with the lower surface G1 facing downward, and the glass plate was pressed from above by a ball centered on the center line of the ring. The diameter of the top edge of the ring was 30 mm, and the diameter of the ball was 10 mm. Quot; A &quot; and &quot; B &quot; in the order of increasing in-plane strength of the glass plate.

N0. 1 is a glass plate not subjected to roughening treatment, and N0. 2 and N0. Reference numeral 3 denotes a glass plate on which a lower surface G1 is roughened by an abrasive pad provided with a polishing pad, and N0. 2 and N0. 3 is the D hardness of the polishing pad. N0. 4 is N0. 1 to N0. 3 is a result of calculating the chargeability and the maximum valley depth Rv when the in-plane strength does not satisfy the desired strength of the display glass plate.

N0. 1 to N0. 3 had an average surface roughness Ra of 0.3 to 1.5 nm. 1, N0. 2 and N0. 4 was not in the range of 3.0 nm < Rv < 5.0 nm. As shown in Table 1, those with low chargeability and high in-plane strength were N0. 3, and the maximum valley depth Rv was 3.0 nm < Rv < 5.0 nm.

While the present invention has been described in detail with reference to specific embodiments thereof, it is evident to those skilled in the art that various changes and modifications can be made without departing from the spirit and scope of the present invention.

The present application is based on Japanese Patent Application No. 2013-255802 filed on December 11, 2013, and Japanese Patent Application No. 2014-207780 filed on October 9, 2014, the content of which is incorporated herein by reference .

G: Glass plate
10: Manufacturing apparatus
12: Opening harness
14: Slurry
16: Lower nozzle
18: Lower roller group
20: upper pinch roller group
22: Rollers
24: Roller
26: Disc brush
28: Top nozzle
30: Slurry
32: Base member
34: Sponge
36: Polishing pad
38: home
40: flat part
100: Manufacturing process
102: glass sheet forming process
104: Polishing process
106: shower cleaning process
108: Slurry cleaning process
110: First High Pressure Shower Cleaning Process
112: Detergent cleaning process
114: Second High Pressure Shower Cleaning Process
116: Pure cleaning process
118: Third High Pressure Shower Cleaning Process
120: pure shower rinse process
122: final rinse process
124: Drying process
126: Inspection process

Claims (9)

A glass plate having a first surface and a second surface facing the first surface,
Wherein a maximum valley depth Rv (JIS B 0601 · 2013) of the first surface is 3.0 nm <Rv <5.0 nm. The adsorption apparatus according to claim 1, wherein the first surface is a surface facing the adsorption stage,
Wherein the second surface is a surface on which the electron member is formed. The glass plate according to claim 2, used as a glass plate for display. The glass sheet according to claim 3, wherein the resolution of the second surface is 1920 x 1080 or more. Abrasive material supply means for supplying abrasives to the first surface of the two surfaces of the glass plate facing each other,
And is pressed against the first surface of the glass plate and is rotated about an axis orthogonal to the surface of the glass plate,
And,
Wherein abrasive material is supplied from the abrasive supply means to the first surface of the glass plate, and the first surface is ground by the abrasive grain while the maximum abrasion depth Rv (JIS B 0601 · 2013) on the first surface is 3.0 nm &Lt; Rv < 5.0 nm. 6. The apparatus for manufacturing a glass plate according to claim 5, wherein the polishing pad is provided with a polishing pad on the surface of the cushion member. The apparatus for manufacturing a glass plate according to claim 6, wherein a plurality of grooves are provided on a surface of the polishing pad. The apparatus for manufacturing a glass plate according to any one of claims 5 to 7, further comprising a cleaning member pressed against the second surface of the glass plate to clean the second surface. Abrasive material supply means for supplying abrasives to the first surface of the two surfaces of the glass plate facing each other,
And is pressed against the first surface of the glass plate and is rotated about an axis orthogonal to the surface of the glass plate,
A glass plate manufacturing apparatus comprising:
Wherein abrasive material is supplied from the abrasive supply means to the first surface of the glass plate, and the first surface is ground by the abrasive grain while the maximum abrasion depth Rv (JIS B 0601 · 2013) on the first surface is 3.0 nm &Lt; Rv < 5.0 nm.

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