KR20150021901A - Offset printing composition and printing method using the same, and pattern formed by using the offset printing composition - Google Patents

Abstract

The present disclosure relates to offset printing compositions, printing methods using the same, and patterns formed using offset printing compositions.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to an offset printing composition, a printing method using the same, and a pattern formed using an offset printing composition. BACKGROUND OF THE INVENTION 1. Field of the Invention [0001]

This specification claims the benefit of Korean Patent Application No. 10-2013-0099070 filed on August 21, 2013 with the Korean Intellectual Property Office, the entire contents of which are incorporated herein by reference.

The present disclosure relates to offset printing compositions, printing methods using the same, and patterns formed using offset printing compositions.

2. Description of the Related Art Generally, electronic devices such as a liquid crystal display device and a semiconductor device are fabricated by forming patterns of numerous layers on a substrate. In order to form such a pattern, a photolithography process has been mainly used so far. However, in the photolithography process, a predetermined pattern mask must be prepared, chemical etching, and stripping processes must be repeated. Therefore, the fabrication process is complicated, and a large amount of chemical waste harmful to the environment is generated. This leads to an increase in production costs, which reduces the competitiveness of the product. A roll printing method using a printing roll has been proposed as a new pattern forming method for solving the shortcomings of such a photolithography process.

There are various methods of roll printing, but roughly classified into gravure printing and reverse offset printing.

Gravure printing is a printing method in which extra ink is scraped off by printing ink on a concave plate and is known as a method suitable for printing in various fields such as printing, packaging, cellophane, vinyl, and polyethylene. Studies have been conducted to apply the gravure printing method to the production of active elements or circuit patterns to be applied. Since gravure printing transfers an ink onto a substrate using a transfer roll, by using a transfer roll corresponding to a desired display element area, even in the case of a large-area display element, a pattern can be formed by one transfer . Such gravure printing not only forms an ink pattern for a resist on a substrate but also forms various patterns of a display element, for example, in the case of a liquid crystal display element, a gate line and a data line connected to the TFT, Can be used to pattern metal patterns for capacitors.

However, since the blanket used for gravure printing is manufactured by casting a silicone resin to a hard master mold, the blanket thus manufactured has a limit to be manufactured so as to have a uniform thickness, and it is also difficult to mass-produce it on a pilot scale have. Therefore, a reverse offset printing method is mainly employed for precise fine pattern formation.

The prior art relating to a reverse offset printing method and a printing apparatus can refer to the following documents 1 to 3 filed by the applicant of the present invention.

The entire contents of the following documents 1 to 3 are incorporated into the specification of the present invention as a description of the prior art of the present invention.

Korean Patent Publication No. 10-2008-0090890 Korean Patent Publication No. 10-2009-0020076 Korean Patent Publication No. 10-2009-0003883 Korean Patent Laid-Open No. 10-2009-0108841

The present disclosure provides offset printing compositions, printing methods using them, and patterns comprising offset printing compositions.

BRIEF DESCRIPTION OF THE DRAWINGS Melamine-based curing agents; Thermal acid generators; A first solvent having a boiling point of less than 100 캜; And a second solvent having a boiling point of 180 캜 or higher, and which provides an offset printing composition using a silicone-based blanket.

The present disclosure also relates to a method of forming an offset printing composition comprising the steps of: coating the offset printing composition onto a silicon-based blanket; Contacting the offset printing composition coating film applied on the silicon-based blanket with a cliche to remove a part of the coating film; And transferring the offset printing composition coating film remaining on the silicon-based blanket to a printing medium.

The present disclosure also provides a pattern comprising the offset printing composition.

The offset printing composition according to the present disclosure can realize a fine pattern through an offset printing method, particularly a reverse offset printing method.

Further, the offset printing composition according to the present invention can improve the print waiting margin.

In addition, the offset printing composition according to the present invention is excellent in continuous printing property.

Further, the offset printing composition according to the present invention is excellent in heat resistance and chemical resistance.

Also, the pattern formed by drying or curing the offset printing composition according to the present invention has an advantage of excellent insulation performance.

Figure 1 illustrates a process schematic diagram of the reverse offset printing method of the present disclosure.

Hereinafter, the present invention will be described in more detail.

BRIEF DESCRIPTION OF THE DRAWINGS Melamine-based curing agents; Thermal acid generators; A first solvent having a boiling point of less than 100 캜; And a second solvent having a boiling point of 180 캜 or higher, and which provides an offset printing composition using a silicone-based blanket.

The present inventors have found that when the above offset printing composition is used, a fine pattern can be easily realized. Furthermore, it has been found that the printing composition has improved printing atmospheric margins and excellent continuous printing properties. Further, it has been found that the above printing composition is excellent in heat resistance, chemical resistance and insulating function.

According to one embodiment of the present disclosure, the hardness of the blanket may be 20 to 70 Shore A hardness. According to one embodiment of the present invention, the silicon-based blanket means that the outer periphery of the blanket is made of a silicon-based material. The silicon-based material is not particularly limited as long as it is a material containing silicon and including a curable group, but it may have a hardness of 20 to 70, and more specifically, a hardness of 30 to 60. [ The hardness means Shore A hardness. Deformation of the blanket can be achieved within an appropriate range by using a silicon-based material within the hardness range. If the hardness of the blanket material is too low, a part of the blanket may touch the engraved portion of the cliché due to the deformation of the blanket during the off process of removing a part of the printing composition coating film from the blanket by the cliche, . Further, in consideration of easiness of selection of the blanket material, a material having a hardness of 70 or less can be selected.

For example, a PDMS (polydimethyl siloxane) curable material may be used as the silicon-based blanket material. To the extent that the object of the present invention is not adversely affected, the blanket material may further include additives known in the art.

According to one embodiment of the present invention, the second solvent may have a swelling parameter of 1% or less for a silicone-based blanket satisfying the following formula (1).

The swelling parameter in the present specification is a numerical value obtained by measuring the degree of swelling of the silicone-based blanket relative to the solvent. Specifically, a silicone blanket, for example, 7 g of PDMS (polydimethylsiloxane) was poured into a Petri dish having a diameter of 4.8 cm, and then cured at room temperature for 24 hours and at 60 ° C for 24 hours. The PDMS specimen was taken out from the PDMS specimen, and the residual solvent remaining on the surface was removed within 30 to 40 seconds. The weight change of the PDMS was measured by swelling using an electronic balance. The swelling parameter can be expressed by the following equation (1).

 [Equation 1]

Swelling parameter (%) = {(weight of silicone blanket after loading / weight of silicone blanket before loading) - 1} x 100

If the swelling parameter for the silicon-based blanket is within the above numerical range, the degree of swelling of the silicon-based blanket by the solvent is low, so that the swelling phenomenon of the blanket can be minimized even if the number of times of printing is repeated, so that the deformation can be minimized. Thus, the printing process time can be kept constant, and even if the number of times of printing is repeated, the formed pattern accuracy can be kept excellent. For this reason, the smaller the swelling parameter for the silicon-based blanket is, the better.

The numerical range for the swelling parameter for the blanket herein is closely related to the material of the blanket. Therefore, the numerical range can be suitably applied in the case where the blanket is a silicon-based material.

According to one embodiment of the present invention, the binder resin may be a novolak resin.

The novolak resin is advantageous not only because it is advantageous for forming a resist pattern, but also because it has excellent compatibility with solvents satisfying the conditions according to the printing composition of the present invention. In addition, the novolak resin is excellent in chemical resistance to etchant, so that it is possible to perform a stable etching process, and is excellent in solubility in a peeling liquid, so that there is an advantage that fewer foreign matters are generated after peeling, and a peeling time is shortened.

According to one embodiment of the present invention, the weight average molecular weight of the novolak resin may be 1,000 or more and 20,000 or less. When the weight average molecular weight is less than 1,000, sufficient chemical resistance to etchant is not secured, cracking and peeling may occur in the resist coating film during the etching process. When the weight average molecular weight is more than 20,000, solubility Can be lowered.

The novolak resin can be produced through a condensation reaction of a phenol compound and an aldehyde compound. As the phenolic compound, those known in the art may be used. Examples of the phenolic compound include m-cresol, o-cresol, p-cresol, 2,5-xylenol, 3,4- And 2,3,5-trimethylphenol can be used. As the aldehyde-based compound, those known in the art can be used, and at least one selected from the group consisting of formaldehyde, paraformaldehyde, acetaldehyde, benzaldehyde, phenylaldehyde and salicylaldehyde can be used. The novolak resin may further contain an optional monomer within the range not impairing the object of the present invention.

According to one embodiment of the present invention, the content of the binder resin may be 5 wt% or more and 20 wt% or less based on the weight of the entire offset printing composition.

When the content of the binder resin is within the above range, there is no problem in the storage stability of the offset printing composition comprising the binder resin, and uniform application is possible. Specifically, when the content of the binder resin is less than 5% by weight, the viscosity becomes excessively low, and it is difficult to control the discharge amount at the time of coating. When the content of the binder resin is more than 20% by weight, the solubility in the solvent contained in the offset printing composition is low, so that precipitation occurs during storage for a long period of time, and the viscosity of the solution is excessively increased, .

According to one embodiment of the present invention, the melamine-based curing agent may be a condensation product of a melamine derivative and formaldehyde. MW-30M, MW-390, MW-100LM, and MW-30M of Mitsui Chemicals, Inc., and MW-30M, MW-390, MW-100LM, and MW-40LM of Cytec, Cyme1300, Cyme1301, Cyme1303, Cyme1323, Cyme1325, Cyme1326, Cyme1327, Cyme1370, Cyme1373, Cyme13717, MX-750LM, and the like.

According to one embodiment of the present invention, the content of the melamine-based curing agent may be 0.5% by weight or more and 10% by weight or less based on the weight of the entire offset printing composition.

When the content of the melamine-based curing agent is within the above range, there is an advantage that the offset printing composition is excellent in heat resistance, chemical resistance, adhesion to a substrate, and insulation property. Concretely, when the content of the melamine-based curing agent is less than 0.5% by weight, the curing reaction does not progress sufficiently, and the heat resistance, chemical resistance and insulation characteristics are deteriorated. When the content of the melamine-based curing agent is more than 10% by weight, the adhesion of the melamine-based curing agent to the substrate is lowered due to shrinkage of the pattern due to excessive curing reaction.

According to an embodiment of the disclosure, the first solvent is selected from the group consisting of dimethyl carbonate; Methanol; Methyl ethyl ketone; Acetone; Ethyl acetate; ethanol; Isopropyl alcohol; 1,3-propyl alcohol; Hexane, and n-hexane.

According to one embodiment of the present invention, the content of the first solvent may be 50 wt% or more and 90 wt% or less of the total weight of the offset printing composition.

When the content of the first solvent is within the above range, it is possible to realize a fine pattern of the offset printing composition and uniform application is possible. Specifically, when the content of the first solvent is less than 50% by weight, the viscosity is excessively increased and uniform application is not possible, and the waiting time after application for the implementation of a fine pattern is increased. When the content of the first solvent is more than 90% by weight, the viscosity is excessively lowered, which makes it difficult to control the amount of the solvent to be discharged during coating, and the printing waiting margin is lowered.

According to one embodiment of the disclosure, the second solvent is selected from the group consisting of resorcinol; m-cresol; o-cresol; p-cresol; Benzyl alcohol; Dimethyl sulfoxide; 1,3-propanediol; 1,3-butanediol; 2,3-butanediol; 1,4-butanediol; 1,5-pentadiol; 1,4-pentanediol; 1,3-pentadiol; 2,4-pentadiol; 1,6-hexanediol; 1,5-hexanediol; 1,4-hexanediol; 1,3-hexanediol; 1,2-hexanediol; 2,3-hexanediol; 2,4-hexanediol; 2,5-hexanediol; Hexanediol, and 3,4-hexanediol.

According to one embodiment of the present invention, the content of the second solvent may be 1 wt% or more and 25 wt% or less of the total weight of the offset printing composition.

When the content of the second solvent is within the above range, the print waiting margin and continuous printing are excellent. Specifically, when the content of the second solvent is less than 1 wt%, drying of the coating film formed between the off process after the application and the set process after the off process occurs rapidly, and the pattern is not realized. When the content of the second solvent is more than 25% by weight, the solvent excessively remains in the coating film, and the line width of the pattern increases.

According to one embodiment of the present invention, the thermal acid generator is selected from the group consisting of 2-hydroxyhexyl paratoluenesulfonate; Triarylsulfonium hexafluoroantimonate; Triarylsulfonium hexafluorophosphate; Tetramethylammonium trifluoromethanesulfonate; Triethylammonium fluorosulfonate; And hexafluoroantimonate. [0033] The term " a "

The thermal acid generator is a compound that accelerates the curing reaction by generating an acid while being decomposed by heat. Further, the decomposition temperature of the thermal acid generator is 150 ° C to 250 ° C, and an acid is generated at a temperature of 250 ° C or lower, thereby promoting the reaction of the offset printing composition even at a relatively low temperature.

According to one embodiment of the present invention, the content of the thermal acid generator may be 0.1 wt% or more and 5 wt% or less of the total weight of the offset printing composition.

When the content of the thermal acid generator is within the above range, the heat resistance and chemical resistance of the printing composition are excellent. Specifically, when the content of the thermal acid generators is less than 0.1% by weight, the curing reaction can not be promoted sufficiently, and heat resistance and chemical resistance are deteriorated. If the content of the thermal acid generators exceeds 5% by weight, there is a problem that the storage stability is deteriorated for a long period of time.

The offset printing composition according to one embodiment herein uses a first solvent and a second solvent together, wherein the first solvent is a solvent which is stable until the printing composition is applied on the blanket, It is possible to maintain the coating property and remove it by volatilization, thereby increasing the viscosity of the printing composition and allowing the formation and maintenance of the pattern on the blanket to be performed well. On the other hand, the second solvent is a solvent exhibiting relatively low volatility and can impart tackiness to the printing composition until the pattern is transferred to the printing medium. By using two or more solvents having different boiling points, the offset printing composition of the present invention can further control the viscosity of the printing composition as described above.

In the present specification, the boiling point of the first solvent may be less than 100 캜, specifically 95 캜 or less, more specifically 90 캜 or less. The printing composition is applied on the blanket by including the first solvent having a boiling point within the numerical range and then the cliche is contacted with the printing composition coating film applied on the blanket to reduce the process waiting time until some coating films are removed And the swelling phenomenon of the blanket can be reduced.

In this specification, the boiling point of the first solvent may be 50 ° C or higher. If the boiling point of the first solvent is too low, there may be a problem that the printing composition dries at the nozzle when the printing composition is applied to the blanket. In addition, the boiling point of the first solvent may be 50 ° C or higher in order to improve the leveling property immediately after application of the printing composition.

The boiling point of the second solvent according to the present specification may be 180 ° C or higher. By including the second solvent having a boiling point within the numerical range, it is possible to impart tackiness to the printing composition until the pattern is transferred to the substrate, reduce the process latency, The phenomenon can be reduced.

The boiling point of the second solvent according to the present disclosure may be 300 ° C or less and may be 250 ° C or less. If the boiling point of the second solvent is 250 DEG C or lower, the problem that the solvent remains in the final printed product and drying or curing takes a long time can be prevented, and the precision of the printing pattern can be improved.

According to an embodiment of the present invention, the offset printing composition may further include one or two additives selected from the group consisting of an adhesion promoting agent and a surfactant.

According to one embodiment of the present invention, the content of the one or two additives may be 0.01 wt% or more and 1 wt% or less, respectively, based on the weight of the entire offset printing composition.

According to one embodiment of the present disclosure, the offset printing composition may further comprise a surfactant. The surfactant may be a conventional leveling agent, a wetting agent and a slip agent. For example, a silicone-based, fluorine-based or polyether-based surfactant may be used.

According to one embodiment of the present disclosure, the content of the surfactant may be 0.01 wt% or more and 1 wt% or less of the total offset printing composition weight, or 0.01 wt% or more and 0.5 wt% or less of the total offset printing composition weight.

When the content of the surfactant is within the above range, uniform coating and patterning properties are advantageous. In particular, when the content of the surfactant is less than 0.01% by weight, the surface energy of the offset printing composition is not sufficiently lowered, resulting in a problem that pinholes and line irregularities occur frequently during coating. When the content of the surfactant is more than 0.5% by weight, bubbles are generated in the offset printing composition and comet unevenness occurs during coating.

According to one embodiment of the present disclosure, the offset printing composition may further comprise an adhesion improving agent. As the adhesion improver, a melamine-based, styrene-based or acrylic oligomer or polymer may be used. The weight average molecular weight of the oligomer or polymer may be 5,000 or less, specifically 3,000 or less, more specifically 1,000 or less.

According to one embodiment of the present invention, the content of the adhesion-promoting agent may be 0.01 wt% or more and 1 wt% or less of the total offset printing composition weight, or 0.01 wt% or more and 0.5 wt% or less of the total offset printing composition weight.

When the content of the adhesion improver is within the above range, the adhesion of the pattern, heat resistance, and chemical resistance are excellent. Specifically, when the content of the adhesion-modifying agent is less than 0.01% by weight, the adhesion of the coating film is not sufficiently secured, thereby causing a problem that the pattern is dropped on the substrate. When the content of the adhesion-modifying agent is more than 0.5% by weight, there is a problem that storage stability is lowered.

According to one embodiment of the present disclosure, the offset printing composition may include both a surfactant and an adhesion improver.

The printing composition according to the present disclosure can be prepared by mixing the above-mentioned components. If necessary, by filtration with a filter. Such foreign matter or dust can be removed by such filtration.

According to one embodiment of the disclosure, the offset printing composition may be for forming a resist pattern or an insulating pattern.

Wherein the offset printing composition is coated on a silicon-based blanket; Contacting the offset printing composition coating film applied on the silicon-based blanket with a cliche to remove a part of the coating film; And transferring the offset printing composition coating film remaining on the silicon-based blanket to a printing medium.

A reverse offset printing method according to one embodiment of the present disclosure is illustrated in FIG. The reverse offset printing method comprises the steps of: i) applying a printing composition to a blanket; ii) forming a pattern of the printing composition corresponding to the pattern on the blanket by contacting the blanket with a cliche formed with an engraved pattern corresponding to the pattern to be formed; and iii) transferring the printing composition pattern on the blanket onto the substrate. At this time, the outer peripheral portion of the blanket is made of a silicon-based material.

1, reference numeral 10 denotes a coater for coating the metal pattern material on the blanket, 20 denotes a roll-shaped support for supporting the blanket, 21 denotes a blanket, 22 denotes a coating on the blanket ≪ / RTI > Reference numeral 30 denotes a cleavage support, and reference numeral 31 denotes a cliche having a pattern, in which a pattern corresponding to a pattern to be formed is formed as a cathode. Reference numeral 40 denotes a print body, and reference numeral 41 denotes a print composition pattern transferred to a substrate.

According to one embodiment of the present disclosure, the offset printing method may further include a step of drying or curing the offset printing composition transferred to the substrate. In the drying or curing step, the process temperature may be selected from room temperature to 350 ° C, and depending on the binder resin, the drying or curing temperature may be selected from room temperature to 350 ° C, specifically, 50 ° C to 300 ° C . The drying or curing time may be selected depending on the composition and composition of the composition, and the processing temperature.

The present specification provides a pattern formed by drying or curing the printing composition.

Specifically, according to one embodiment of the present disclosure, the pattern may be a resist pattern or an insulating pattern.

According to an embodiment of the present invention, the line width of the pattern may be 3 mu m or more and 100 mu m or less.

Hereinafter, the present invention will be described in detail by way of examples with reference to the drawings. However, the embodiments according to the present disclosure can be modified in various other forms, and the scope of the present specification is not construed as being limited to the embodiments described below. Embodiments of the present disclosure are provided to more fully describe the present disclosure to those of ordinary skill in the art.

[Examples and Comparative Examples]

The components of the printing composition according to Examples 1 to 3 and Comparative Examples 1 to 4 and the content of each component (% by weight with respect to the printing composition) are summarized in Table 1 below, and the details of each component are described below.

Example 1 Example 2 Example 3 Comparative Example 1 Comparative Example 2 Comparative Example 3 Comparative Example 4 a 12 12 12 12 12 12 12 b-1 79.8 79.8 79.8 80.8 81.8 b-2 79.8 b-3 79.8 c-1 5 5 5 5 5 c-2 5 c-3 5 d 2 2 2 2 2 2 0 e One One One One One 0 One f 0.2 0.2 0.2 0.2 0.2 0.2 0.2

(a) Novolac resin: meta / para = 5/5, weight average molecular weight 5,000 (manufactured by Sumitomo Bakelite)

(b-1) First solvent: methyl ethyl ketone

(b-2) First solvent: acetone

(b-3) First solvent: n-butanol

(c-1) Second solvent: 1,4-butanediol (swelling parameter 0.021%)

(c-2) Second solvent: benzyl alcohol (swelling parameter: 0.39%)

(c-3) Second solvent: N-methylpyrrolidone (swelling parameter: 1.21%)

(d) Melamine-based curing agent: MW-30M (hexamethoxymethyl melamine, manufactured by Sanwa Chemical)

(e) Thermal acid generator: K-PURE CXC-1612 (hexafluoroantimonate, manufactured by King Industries)

(f) Surfactant: Glide-410 (manufactured by Tego)

 [Experimental Example 1] Evaluation of permeability

The printing compositions according to the Examples and Comparative Examples were printed on a glass substrate to a thickness of about 3 탆 and then cured on a hot plate at 150 캜 for 3 minutes and then measured for transmittance at a wavelength of 400 nm using a UV-Vis spectrophotometer Were measured. In this case, when the transmittance is 90% or more, the symbol is marked as O, when 80% or more is less than 90%, or when the transmittance is less than 80% The results of the permeability evaluation are shown in Table 2 below.

 [Experimental Example 2] Evaluation of heat resistance

After printing a film having a thickness of about 3 占 퐉 on a glass substrate of the printing composition according to the Examples and Comparative Examples, the transmittance at a wavelength of 400 nm was measured in the same manner as in the evaluation of the transmittance, and the resultant was heated at 200 占 폚 for 30 minutes The permeability was measured again. In this case, when the amount of decrease relative to the original transmittance was less than 10%, the mark was marked with?, When the mark was less than 20% The heat resistance evaluation results are shown in Table 2 below.

 [Experimental Example 3] Evaluation of chemical resistance

A film having a thickness of about 3 탆 was printed on a glass substrate and then cured on a hot plate at 200 캜 for 30 minutes. The film thickness (T1) at this time was measured, -methylpyrrolidone) for 1 hour. At this time, the film thickness change rate can be represented by (? T2-T1 | / T1) x100. When the value is less than 10%,?, 10% or more and less than 30% The chemical resistance results in the above permeability are shown in Table 2 below.

 [Experimental Example 4] The initial print waiting time

The ink compositions according to the above Examples and Comparative Examples were applied on a silicon blanket at a rate of 50 mm / sec to form a coating film having a thickness of 15 mu m before drying. After being applied for 10 seconds or more, the cloth was transferred to a cliche having a size of 100 mm × 100 mm with an engraved mesh pattern having a line width of 5 μm and a line distance of 200 μm at an OFF speed of 50 mm / sec and an OFF pressure of 20 μm Was formed on the blanket. The printing composition pattern formed on the blanket was transferred to a glass substrate of 100 mm x 100 mm size at a SET speed of 50 mm / sec and a SET pressure of 20 m to form a final pattern. The minimum waiting time for the normal pattern to be realized by varying the print waiting time after application was confirmed. The criterion of the normal pattern is that the line width change rate of the pattern formed on the glass substrate compared with the cliché is within 20%. The minimum print waiting time is 10 seconds, and the print waiting time can be expressed by the following equation (2). The initial print waiting time results are shown in Table 2 below.

&Quot; (2) "

Printing wait time = OFF start point - When application completion time

 [Experimental Example 5] Continuous printing characteristics

The printing compositions according to the Examples and Comparative Examples were applied on a silicone blanket at a rate of 50 mm / sec to form a coating film having a thickness of 15 mu m before drying. After applying the print waiting time to form a normal pattern after application, a 100 mm x 100 mm size cliche having a negative mesh pattern with a line width of 5 mu m and a line distance of 200 mu m was subjected to a condition of an OFF speed of 50 mm / sec and an OFF pressure of 20 mu m To form a pattern corresponding to the cliche on the blanket. The printing composition pattern formed on the blanket was transferred to a glass substrate of 100 mm x 100 mm size at a SET speed of 50 mm / sec and a SET pressure of 20 m to form a final pattern. Continuous printing was performed by the above method to measure the pattern line width change, and the number of prints to keep the line width change ratio within 10% with respect to the initial print pattern was measured. The results of the continuous printing characteristics are shown in Table 2 below.

 [Experimental Example 6] Measurement of print waiting margin

The printing compositions according to the Examples and Comparative Examples were applied on a silicone blanket at a rate of 50 mm / sec to form a coating film having a thickness of 15 mu m before drying. After applying the print waiting time to form a normal pattern after application, a 100 mm x 100 mm size cliche having a negative mesh pattern with a line width of 5 mu m and a line distance of 200 mu m was subjected to a condition of an OFF speed of 50 mm / sec and an OFF pressure of 20 mu m To form a pattern corresponding to the cliche on the blanket. The printing composition pattern formed on the blanket was transferred to a glass substrate of 100 mm x 100 mm size at a SET speed of 50 mm / sec and a SET pressure of 20 m to form a final pattern. The minimum waiting time and the maximum waiting time at which a normal pattern is implemented are determined by varying the printing waiting time according to the above method. The print waiting margin can be expressed by the following equation (3). The print waiting margin measurement result is shown in Table 2 below.

&Quot; (3) "

Print Wait Margin = Maximum wait time for normal pattern to be implemented - Minimum wait time for normal pattern to be implemented

Example 1 Example 2 Example 3 Comparative Example 1 Comparative Example 2 Comparative Example 3 Comparative Example 4 Permeability ○ ○ ○ ○ ○ △ △ Heat resistance ○ ○ ○ ○ ○ △ △ Chemical resistance ○ ○ ○ ○ ○ X X Initial Print Wait Time 10 10 10 30 10 10 10 Continuous printing characteristics > 100 sheets > 100 sheets 20 sheets 5 pieces 3 pieces > 100 sheets > 100 sheets Print waiting margin 40 seconds 30 seconds 25 seconds 10 seconds 20 seconds 40 seconds 30 seconds

10: Coater for coating metal pattern material on blanket
20: roll-type support for supporting the blanket
21: Blanket
22: Printing composition pattern material applied on blanket
30: Cleese support
31: The cliché with patterns
40:
41: Printed composition pattern transferred to the substrate

Claims (22)

Binder resin;
Melamine-based curing agents;
Thermal acid generators;
A first solvent having a boiling point of less than 100 캜; And
A second solvent having a boiling point of 180 ° C or higher,
An offset printing composition using a silicone-based blanket. The method according to claim 1,
Wherein the blanket has a hardness of Shore A hardness of 20 to 70. < RTI ID = 0.0 > 18. < / RTI > The method according to claim 1,
Wherein the second solvent has a swelling parameter of 1% or less for a silicone blanket satisfying the following formula:
[Equation 1]
Swelling parameter (%) = {(weight of silicone blanket after loading / weight of silicone blanket before loading) - 1} x 100 The method according to claim 1,
Wherein the binder resin is a novolac resin. The method of claim 4,
Wherein the novolac resin has a weight average molecular weight of 1,000 to 20,000. The method according to claim 1,
Wherein the melamine-based curing agent is a condensation product of a melamine derivative and formaldehyde. The method according to claim 1,
Wherein the thermal acid generator is selected from the group consisting of 2-hydroxyhexyl paratoluenesulfonate; Triarylsulfonium hexafluoroantimonate; Triarylsulfonium hexafluorophosphate; Tetramethylammonium trifluoromethanesulfonate; Triethylammonium fluorosulfonate; And hexafluoroantimonate. The offset printing composition according to any one of claims 1 to 3, The method according to claim 1,
The first solvent is selected from the group consisting of dimethyl carbonate; Methanol; Methyl ethyl ketone; Acetone; Ethyl acetate; ethanol; Isopropyl alcohol; 1,3-propyl alcohol; And n-hexane. ≪ RTI ID = 0.0 > 21. < / RTI > The method according to claim 1,
The second solvent is selected from the group consisting of resorcinol; m-cresol; o-cresol; p-cresol; Benzyl alcohol; Dimethyl sulfoxide; 1,3-propanediol; 1,3-butanediol; 2,3-butanediol; 1,4-butanediol; 1,5-pentadiol; 1,4-pentanediol; 1,3-pentadiol; 2,4-pentadiol; 1,6-hexanediol; 1,5-hexanediol; 1,4-hexanediol; 1,3-hexanediol; 1,2-hexanediol; 2,3-hexanediol; 2,4-hexanediol; 2,5-hexanediol; And 3,4-hexanediol. 2. The offset printing composition according to claim 1, The method according to claim 1,
Wherein the content of the binder resin is 5 wt% or more and 20 wt% or less based on the weight of the entire offset printing composition. The method according to claim 1,
Wherein the content of the melamine-based curing agent is 0.5 wt% or more and 10 wt% or less of the total weight of the offset printing composition. The method according to claim 1,
Wherein the content of the first solvent is 50 wt% or more and 90 wt% or less of the total weight of the offset printing composition. The method according to claim 1,
Wherein the content of the second solvent is 1 wt% or more and 25 wt% or less of the total weight of the offset printing composition. The method according to claim 1,
Wherein the content of the thermal acid generator is 0.1 wt% or more and 5 wt% or less of the total weight of the offset printing composition. The method according to claim 1,
Wherein the offset printing composition further comprises one or two additives selected from the group consisting of an adhesion promoting agent and a surfactant. 16. The method of claim 15,
Wherein the content of the one or two additives is 0.01 wt% or more and 1 wt% or less, respectively, based on the weight of the entire offset printing composition. The method according to any one of claims 1 to 16,
Wherein the offset printing composition is for forming a resist pattern or an insulating pattern. Coating an offset printing composition according to any one of claims 1 to 16 on a silicon-based blanket;
Contacting the offset printing composition coating film applied on the silicon-based blanket with a cliche to remove a part of the coating film; And
And transferring the offset printing composition coating film remaining on the silicon-based blanket to the substrate. 19. The method of claim 18,
Further comprising the step of drying or curing the offset printing composition transferred to said substrate. A pattern formed by drying or curing an offset printing composition according to any one of claims 1 to 16. The method of claim 20,
Wherein the pattern is a resist pattern or an insulating pattern. The method of claim 20,
Wherein a line width of the pattern is not less than 3 mu m and not more than 100 mu m.

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