KR20140111484A - Apparatus for detecting defects of patterned retarder - Google Patents
Apparatus for detecting defects of patterned retarder Download PDFInfo
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- KR20140111484A KR20140111484A KR1020130025695A KR20130025695A KR20140111484A KR 20140111484 A KR20140111484 A KR 20140111484A KR 1020130025695 A KR1020130025695 A KR 1020130025695A KR 20130025695 A KR20130025695 A KR 20130025695A KR 20140111484 A KR20140111484 A KR 20140111484A
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- retarder
- patterning
- primary
- polarizing
- patterning retarder
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/8422—Investigating thin films, e.g. matrix isolation method
- G01N2021/8438—Mutilayers
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- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Polarising Elements (AREA)
Abstract
A defect inspection apparatus for a patterning retarder is disclosed. An apparatus for inspecting defects of a patterned retarder according to an embodiment of the present invention includes a patterning retarder and an angle formed between the patterning retarder and a reference axis of the patterning retarder, A first polarizing section arranged so as to be at an angle of 17 to 25 degrees, an illumination section irradiating light at a lower portion of the primary polarizing section, a second polarizing section formed at an upper portion of the patterning retarder, A polarizing portion; And a photographing unit for photographing the patterning retarder through the light passing through the secondary polarization unit.
Description
BACKGROUND OF THE
In general, a patterned retarder can be applied to a stereoscopic image display apparatus using polarizing glasses to be used for realizing a stereoscopic image. In addition, the patterning retarder is provided on one side of a semi-transmissive LCD or the like to function as a compensation film for optimizing the optical characteristics of the reflective portion and the transmissive portion, respectively, so as to obtain a good discrimination power of the LCD image regardless of the brightness of the external light. . The patterned retarder is also referred to as a birefringent medium or a retardation film.
1 is a perspective view showing a general patterning retarder.
Referring to FIG. 1, the patterned
The first
The light transmitted through the first polarizing
On the other hand, if the thickness of the liquid
An embodiment of the present invention is to provide an apparatus for inspecting defects of a patterned retarder that can accurately detect a defective stain of a patterned retarder.
1. An apparatus for defect inspection of patterning retarders according to an embodiment of the present invention includes patterning retarders; A primary polarizing portion formed at a lower portion of the patterning retarder and having an absorption axis formed by the reference axis of the patterning retarder with an angle [theta] of 17 [deg.] To 25 [deg.]; An illumination unit for irradiating light at a lower portion of the primary polarization unit; A secondary polarizing portion formed on the patterning retarder and having an absorption axis perpendicular to the primary polarizing portion; And a photographing unit for photographing the patterning retarder through light passing through the secondary polarizing unit.
2.1, the upper primary polarizing section is disposed such that the angle (?) Formed between the absorption axis and the reference axis of the upper patterning retarder is 19.5 ° to 22.5 °.
In 3. 1, the inspection apparatus of the patterning retarder further includes a detection unit for detecting a defect of the patterning retarder through an image acquired through the above-mentioned image-taking unit.
In 4.1, the upper secondary polarizer is a circular polarized light filter or a linear polarized light filter.
According to the embodiment of the present invention, by disposing the absorption axis of the primary polarization section at an angle of 17 ° to 25 ° with respect to the reference axis of the patterning retarder, a first image of the liquid crystal coating layer The difference in brightness is hardly observed at the boundary between the polarization pattern area and the second polarization pattern area, and only the difference in brightness due to the smear can be mainly displayed. Therefore, the patterning retarder can be accurately detected.
1 is a perspective view showing a general patterning retarder.
BACKGROUND OF THE
3 is a diagram showing the arrangement relationship of a primary polarizer, a patterning retarder, and a secondary polarizer in a defect inspection apparatus according to an embodiment of the present invention.
Figure 4 illustrates a patterned retarder according to one embodiment of the present invention.
5 is a view showing a state in which an absorption axis of a primary polarization section according to an embodiment of the present invention is cut so as to form a predetermined angle? With respect to a reference axis of a patterning retarder.
6 is a diagram showing the degree of visibility of a stain according to a change in an angle [theta] formed between an absorption axis of a primary polarizing portion and a reference axis of a patterning retarder, in an embodiment of the present invention.
FIG. 7 is a graph showing the relationship between the photographed image, the binary image, and the brightness graph of the patterning retarder when the angle θ formed by the absorption axis of the primary polarizing portion with the reference axis of the patterning retarder is 21 ° according to an embodiment of the present invention. Fig.
FIG. 8 is a diagram showing a photographed image, a binary image, and a brightness graph of a patterning retarder when the angle θ formed between the absorption axis of the primary polarizing section and the reference axis of the patterning retarder is 12 °;
FIG. 9 is a view showing a photographed image, a binary image, and a brightness graph of the patterning retarder when the angle? Formed by the absorption axis of the primary polarizing section with the reference axis of the patterning retarder is 30 °;
Hereinafter, a specific embodiment of the defect inspecting apparatus of the patterning retarder of the present invention will be described with reference to FIGS. 2 to 9. However, this is an exemplary embodiment only and the present invention is not limited thereto.
In the following description, a detailed description of known functions and configurations incorporated herein will be omitted when it may make the subject matter of the present invention rather unclear. The following terms are defined in consideration of the functions of the present invention, and may be changed according to the intention or custom of the user, the operator, and the like. Therefore, the definition should be based on the contents throughout this specification.
The technical idea of the present invention is determined by the claims, and the following embodiments are merely a means for efficiently describing the technical idea of the present invention to a person having ordinary skill in the art to which the present invention belongs.
FIG. 2 is a view schematically showing the structure of a defect inspection apparatus of a patterning retarder according to an embodiment of the present invention. FIG. 3 is a schematic block diagram of a defect inspection apparatus according to an embodiment of the present invention, The retarder and the secondary polarizer. Hereinafter, a defect inspection apparatus according to an exemplary embodiment of the present invention detects an unevenness defect of the patterned retarder. However, the present invention is not limited thereto, and the defect inspection apparatus may include a patterning retarder It is needless to say that various defects other than the smudge defect can be detected.
2 and 3, the
The
The
The
The
Referring to FIG. 5, the absorption axis of the primary polarizer according to an embodiment of the present invention is cut so as to form a predetermined angle (?) With the reference axis of the patterning retarder. The primary
The secondary
The
The photographing
The
The
6 is a graph showing the degree of visibility of a stain according to a change in an angle? Formed between the absorption axis of the primary polarizing portion and the reference axis of the patterning retarder, in an embodiment of the present invention. Here, the change in brightness of the stain photographed in the specific region was measured while changing the angle (?) Formed between the absorption axis of the primary
6, when the angle θ between the absorption axis of the
FIG. 7 is a graph showing the relationship between the photographed image, the binary image, and the brightness graph of the patterning retarder when the angle θ formed by the absorption axis of the primary polarizing portion with the reference axis of the patterning retarder is 21 ° according to an embodiment of the present invention. Fig.
FIG. 7A shows an image of the
FIG. 7B shows an image obtained by converting the photographed image into a binary image. 7B, the contrast between the first
FIG. 7C shows a brightness graph showing the brightness change of the binary image in gray level. As shown in the figure, the brightness graph does not show the brightness change periodically, and the brightness change rapidly occurs in the specific region. That is, since the brightness difference is hardly observed at the boundary between the first
Comparative Example
8 and 9 are comparative examples according to the embodiment of the present invention. When the angle (?) Formed between the absorption axis of the primary polarizing portion and the reference axis of the patterning retarder is 12 degrees or 30 degrees, A still image, a binary image, and a brightness graph.
Figs. 8 and 9A show images taken by the
Figs. 8 and 9B show images obtained by converting a photographed image into a binary image. 8 and 9 (b), the first
8 and 9 (c), a brightness graph showing the brightness change of the binary image in gray level is shown. Referring to FIGS. 8 and 9C, a brightness change periodically appears in the brightness graph. That is, since the brightness difference is clearly displayed at the boundary between the first
While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is clearly understood that the same is by way of illustration and example only and is not to be taken by way of limitation, I will understand. Therefore, the scope of the present invention should not be limited to the above-described embodiments, but should be determined by equivalents to the appended claims, as well as the appended claims.
102: patterning retarder 104: illumination part
106: primary polarization section 108: secondary polarization section
110: photographing unit 112: detecting unit
121: base film 123: alignment layer
125: liquid crystal coating layer 127: first polarizing pattern area
129: second polarized light pattern area
Claims (4)
A primary polarizing portion formed at a lower portion of the patterning retarder and having an absorption axis formed by the reference axis of the patterning retarder with an angle [theta] of 17 [deg.] To 25 [deg.];
An illumination unit for irradiating light at a lower portion of the primary polarization unit;
A secondary polarizing portion formed on the patterning retarder and having an absorption axis perpendicular to the primary polarizing portion; And
And a photographing unit for photographing the patterning retarder through light passing through the secondary polarizing unit.
Wherein the primary polarizer comprises:
Wherein an angle (?) Formed between the absorption axis and the reference axis of the patterning retarder is 19.5 ° to 22.5 °.
The defect inspection apparatus of the patterning retarder may further comprise:
Further comprising: a detector for detecting a defect of the patterning retarder through an image acquired through the photographing unit.
The secondary polarizing unit includes:
A circularly polarized light filter or a linearly polarized light filter.
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2022163381A1 (en) * | 2021-01-27 | 2022-08-04 | 住友化学株式会社 | Defect inspection method and defect inspection device |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2022163381A1 (en) * | 2021-01-27 | 2022-08-04 | 住友化学株式会社 | Defect inspection method and defect inspection device |
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