KR20140058232A - Buffer for care of nails and manufacturing method thereof - Google Patents

Abstract

The present invention relates to a buffer for caring nails manufactured by coating stone powder and a mixture step by step, and a manufacturing method thereof. The buffer comprises: a support layer which is shaped like a stick to help users grab conveniently; a first adhesive layer which is coated on top of the support layer; a buffer layer which is adhered on the support layer by the first adhesive layer to reduce the pressure on nails; a second adhesive layer which is coated on top of the buffer layer; a copy layer which is attached on the buffer layer by the second adhesive layer to form an image layer; a third adhesive layer which is coated on top of the copy layer; a stone powder layer which is attached on top of the copy layer by the third adhesive layer and is formed after being deodorized; and a mixture layer which is made out of a mixture of stone powder and urethane glue for polishing and is formed on top of the stone powder layer. The buffer for caring nails creates immediate, strong, and long lasting polish and can be used for a long term.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to buffers for nail care,

The present invention relates to a buffer for nail care and a method of manufacturing the same, and more particularly, to a buffer for nail care and a method of manufacturing the buffer for nail care buffers in which stone powder and a mixture are applied in a stepwise manner.

Generally, the nails are polished so as to make their nails more distinguishable than others. In order to make the nails glossy, it is necessary to apply enamel-type nail polish to the surface of the nails so that the nails are polished There is a method and a method of polishing the nails with stone powder using a nail care buffer and then polishing the nails of the silicone after polishing.

In particular, the nail trimmer buffer is a cosmetic tool that polishes the nail and cleans the surface of the nail and polishes the surface of the nail. In order to make the appearance of the nail trimmer buffer clear, It is common to print with a pattern.

Korean Patent No. 10-0367728 discloses a buffer for nail care and a method of manufacturing the buffer for nail care which are used for effective nail care more effectively. In the case of two kinds of stone powder having a minute thickness difference A method of forming a polishing mixture by mixing water, a bonding agent and a foaming agent to form two kinds of polishing mixture, and mixing the water, silicone, a bonding agent and a foaming agent to form a polishing mixture, The fabric is naturally dried, and the dried fabric is processed and foamed in a heat transfer machine. Then, the gloss mixture is applied to the fabric, and the processed foamed fabric is attached to one side of the frame by double-sided tape , And the two fabrics to which the abrasive blend was applied and processed and expanded were attached to another side of the frame by double-sided tape And are connected to each other. According to the disclosed technology, a buffer used for gleaming light by nail trim can be used for a long period of time, which is not disposable, thereby providing convenience to the user.

Korean Patent Registration No. 10-0918207 discloses a nail polish device which is excellent in gloss and does not cause damage to the nail and a method of manufacturing the same, wherein the plate has a certain elasticity and rigidity; A first adhesive applied to either side of the plate; A cushioning material for relieving pressure exerted upon contact with the nail; A second adhesive applied to an upper surface of the buffer material; A fabric having a coding layer on both sides; A third adhesive applied to the upper surface of the fabric at a predetermined thickness; A cured polished layer of a mixture of stone powder, water, adhesive and blowing agent; A fourth adhesive applied to the other side of the plate; A cushioning material for relieving pressure exerted upon contact with the nail; A fifth adhesive applied to an upper surface of the buffer material; A fabric having a coding layer on both sides and a picture printed on the upper surface thereof; And a mixture of stone powder, water, an adhesive and a foaming agent are laminated in order, a third adhesive is an oil-based adhesive, and the adhesive included in the gloss layer mixture and the polishing layer mixture is an aqueous adhesive, Is a design containing various patterns and logos and is characterized by being printed by transfer ink and formed by sublimation transfer. According to the disclosed technology, moisture contained in the polishing layer or the gloss layer is prevented from being discharged to the outside by using a coded cloth instead of the transfer paper, and the adhesive strength of the stone powder can be maintained to extend the useful life, Is excellent, sharpness of the picture is excellent, and the nail is not damaged even when the cloth is exposed to the outside during use.

However, in the conventional buffer for nail care and the method of manufacturing the same, a mixture (polishing mixture) of stone powder, water, a bond (adhesive) and a foaming agent, or a mixture of water, silicone, The mixture is blended and mixed at the same time to form a mixture. Thus, there is a disadvantage in that the gloss does not occur immediately but slowly, and the degree of gloss is also slightly weak, which is also a disadvantage in that it can not last long.

In the conventional nail buffers and the manufacturing method described above, the nail is polished and polished with the polishing layer or the nail is polished with the polishing layer so that the polishing layer or the polishing layer can not be used any longer .

Korean Patent No. 10-0367728 Korean Patent No. 10-0918207

An embodiment of the present invention is to provide a nail care buffer and a method of manufacturing the same which are configured to sequentially apply the stone powder and the mixture in a stepwise manner without mixing the mixture at the time of application of the mixture in the nail care buffer .

An embodiment of the present invention is to provide a buffer for nail care that has a polishing layer or a glossy layer formed in a double layer in a buffer for nail care and a manufacturing method thereof.

Among the embodiments, the nail care buffer comprises a bar-shaped support layer for facilitating gripping during nail repair; A first adhesive layer applied to an upper surface of the support layer; A buffer layer adhered to the support layer by the first adhesive layer so as to alleviate the pressure applied to the nails when the nail is handled; A second adhesive layer applied to an upper surface of the buffer layer; A transfer layer adhered to the buffer layer by the second adhesive layer so as to form a picture layer; A third adhesive layer applied to an upper surface of the transfer layer; A stonewall layer formed on the upper surface of the transfer layer by the third adhesive layer and formed by being deodorized; And a mixed layer formed on the stone powder layer by a mixture of a stone powder and a urethane bond.

In one embodiment, the third adhesive layer may be formed of an acrylic adhesive.

In one embodiment, the stone powder layer may be formed of a stone powder having a particle size of 60 to 9000 mesh.

In one embodiment, when the stover layer is formed on the upper surface of the transfer layer by the third adhesive layer, the stover layer may be formed to have a predetermined thickness using a silk printing method or a roller coating method.

In one embodiment, the mixed layer may use a stone powder having a particle size of 60 to 600 mesh.

In one embodiment, the mixed layer may be formed on the stone powder layer with a silicone or a mixture of a mixture of water, a bond, a perfume, and a foaming agent.

In one embodiment, the mixed layer may be formed on the stone powder layer with a mixture of stone powder or a mixture of water, a bond, a flavor, and a foaming agent.

In one embodiment, the nail buffing buffer comprises: a first adhesive layer applied to a lower surface of the support layer; A buffer layer adhered to the support layer by the first adhesive layer so as to alleviate the pressure applied to the nails when the nail is handled; A second adhesive layer applied to the lower surface of the buffer layer; A transfer layer adhered to the buffer layer by the second adhesive layer so as to form a picture layer; A third adhesive layer applied to the lower surface of the transfer layer; A stonewall layer formed on the lower surface of the transfer layer by the third adhesive layer and formed by being deodorized; And a mixed layer formed on the stone powder layer by a mixture of a stone powder and a urethane bond.

Among the embodiments, the nail care buffer comprises a bar-shaped support layer for facilitating gripping during nail repair; A first adhesive layer applied to an upper surface of the support layer; A buffer layer adhered to the support layer by the first adhesive layer so as to alleviate the pressure applied to the nails when the nail is handled; A second adhesive layer applied to an upper surface of the buffer layer; A transfer layer which is adhered to the buffer layer by the second adhesive layer so as to form an image layer thereon; a third adhesive layer which is applied to the upper surface of the transfer layer; and a second adhesive layer which is adhered to the upper surface of the transfer layer by the third adhesive layer, A first buffer portion including a mixed layer formed on the stone powder layer as a polishing mixture in which a stone powder and a urethane bond are mixed; A third adhesive layer applied to the upper surface of the transfer layer, and a second adhesive layer adhered to the upper surface of the transfer layer by the third adhesive layer and formed as a deodorized and formed stone A second buffer portion including a mixed layer formed on the stone powder layer as a gloss mixture obtained by mixing a stone powder and a urethane bond; And a fastening part for fastening the first buffer part and the second buffer part together with an adhesive member.

In one embodiment, the fastening portion may be a double-sided tape.

In one embodiment, the fastening portion may include an adhesive member formed on the side of the second buffer portion, and may be adhered to the side surface of the first buffer portion.

Among the embodiments, a method of manufacturing a nail care buffer comprises the steps of: preparing a rod-shaped support layer to facilitate grasping during nail polishing; Forming a first adhesive layer by applying an adhesive to an upper surface of the support layer; Bonding the buffer layer and the buffer layer by pressing a buffer layer on the first adhesive layer so as to alleviate the pressure applied to the nail when the nail is cleaned; Forming a second adhesive layer by applying an adhesive to an upper surface of the buffer layer; Bonding the buffer layer and the transfer layer by pressing the transfer layer to the second adhesive layer so that a picture layer is formed; Forming a third adhesive layer by applying an adhesive to an upper surface of the transfer layer; Adhering the stone powder onto the third adhesive layer and then deodorizing it to form a stone powder layer; And applying a polishing mixture prepared by mixing a stone powder and a urethane bond onto the stone powder layer to form a mixed layer.

The buffer for nail care and the method of manufacturing the same according to an embodiment of the present invention may be formed by applying the mixture of stones or the mixture in a sequential manner without applying the mixture at the time of application of the mixture in the nail care buffer , The gloss can be immediately generated, and the glossiness is strong so that it can be long-lasting.

According to another aspect of the present invention, there is provided a buffer for nail care and a method for fabricating the same, wherein the buffer layer or the polishing layer is formed of a plurality of layers in a buffer for nail care, Or the gloss layer can be separated to use a new polishing layer or gloss layer, thereby enabling the buffer for nail care to be used for a longer period of time.

1 is a perspective view illustrating a nail care buffer according to an embodiment of the present invention.
Figure 2 is a front view of the nail care buffer of Figure 1;
3 is a perspective view illustrating a nail care buffer according to another embodiment of the present invention.
Figure 4 is a front view of the nail care buffer of Figure 3;
5 is a flowchart illustrating a method of manufacturing a nail care buffer according to an embodiment of the present invention.

The description of the present invention is merely an example for structural or functional explanation, and the scope of the present invention should not be construed as being limited by the embodiments described in the text. That is, the embodiments are to be construed as being variously embodied and having various forms, so that the scope of the present invention should be understood to include equivalents capable of realizing technical ideas.

Meanwhile, the meaning of the terms described in the present invention should be understood as follows.

The terms "first "," second ", and the like are intended to distinguish one element from another, and the scope of the right should not be limited by these terms. For example, the first component may be referred to as a second component, and similarly, the second component may also be referred to as a first component.

It is to be understood that when an element is referred to as being "connected" to another element, it may be directly connected to the other element, but there may be other elements in between. On the other hand, when an element is referred to as being "directly connected" to another element, it should be understood that there are no other elements in between. On the other hand, other expressions that describe the relationship between components, such as "between" and "between" or "neighboring to" and "directly adjacent to" should be interpreted as well.

It should be understood that the singular " include "or" have "are to be construed as including a stated feature, number, step, operation, component, It is to be understood that the combination is intended to specify that it does not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, or combinations thereof.

In each step, the identification code (e.g., a, b, c, etc.) is used for convenience of explanation, the identification code does not describe the order of each step, Unless otherwise stated, it may occur differently from the stated order. That is, each step may occur in the same order as described, may be performed substantially concurrently, or may be performed in reverse order.

The present invention can be embodied as computer-readable code on a computer-readable recording medium, and the computer-readable recording medium includes all kinds of recording devices for storing data that can be read by a computer system . Examples of the computer-readable recording medium include a ROM, a RAM, a CD-ROM, a magnetic tape, a floppy disk, an optical data storage device, and the like, and also implemented in the form of a carrier wave (for example, transmission over the Internet) . In addition, the computer-readable recording medium may be distributed over network-connected computer systems so that computer readable codes can be stored and executed in a distributed manner.

All terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs, unless otherwise defined. Commonly used predefined terms should be interpreted to be consistent with the meanings in the context of the related art and can not be interpreted as having ideal or overly formal meaning unless explicitly defined in the present invention.

FIG. 1 is a perspective view illustrating a nail care buffer according to one embodiment of the present invention, and FIG. 2 is a front view of the nail care buffer shown in FIG. 1. FIG.

1 and 2, the nail care buffer includes a support layer 110, a first adhesive layer 120, a buffer layer 130, a second adhesive layer 140, a transfer layer 150, a third adhesive layer 160 ), A stone powder layer (170), and a mixed layer (180).

The support layer 110 is formed in a bar shape having a predetermined length so that the user can easily grasp it when nails are handled. For example, the support layer 110 may be formed of a plate such as plastic, iron, or the like having a predetermined elasticity and rigidity.

The first adhesive layer 120 is applied to the upper surface of the support layer 110 or applied to the lower surface of the buffer layer 130 to bond the support layer 110 and the buffer layer 130 to each other. In one example, the first adhesive layer 120 may be formed of an aqueous adhesive.

The buffer layer 130 is bonded to the upper surface of the support layer 110 by the first adhesive layer 120 and the lower surface of the buffer layer 130 is bonded to the lower surface of the transfer layer 150 by the second adhesive layer 140, The user relaxes the pressure applied to the fingernail so that excessive pressure is not transferred to the fingernail when the fingernail is trimmed, and the contact area between the fingernail and the mixed layer 180 is widened by the buffering force. As an example, the buffer layer 130 may be formed of a sponge having a resilience sufficient to relieve the pressure exerted by the nail.

The second adhesive layer 140 is applied to the upper surface of the buffer layer 130 or the lower surface of the transfer layer 150 to bond the buffer layer 130 and the transfer layer 150 to each other. In one example, the second adhesive layer 140 may be formed of an aqueous adhesive.

The transfer layer 150 is adhered to the upper surface of the cushioning layer 130 by the second adhesive layer 140 and is sublimated and transferred at 110 to 200 degrees for example to form a picture layer . For example, the transfer layer 150 may be formed of a cloth having a coating layer formed on both sides thereof.

The third adhesive layer 160 is applied to the upper surface of the transfer layer 150 to adhere the stone powder layer 170 to the upper surface of the transfer layer 150. In one example, the third adhesive layer 160 may be formed of an acrylic adhesive.

The stone powder layer 170 is formed after being adhered to the upper surface of the transfer layer 150 by the third adhesive layer 160 and being deodorized. For example, the stone powder layer 170 may be formed of a stone powder having a particle size of about 60 to 9000 mesh, and may be made of silica, mica powder, alumina oxide, abrasive stone, TALC, and the like.

Here, the stover layer 170 may be formed using a silk printing method so that the stover layer 170 may be uniformly formed to a predetermined thickness when forming the third adhesive layer 160. At this time, in the silk printing method, a mesh made of silk, nylon, Teflon fiber or stainless steel is spread on a frame, four corners are tightly fixed, a valve film is formed thereon by a hydraulic or photochemical method, If the ink is pushed through the screen by a tool called "squeegee" and the ink is pushed through the mesh of the part without the valve, the ink is printed on the paper or printed matter placed under the plate, . Alternatively, when the stone powder layer 170 is formed on the third adhesive layer 160, it may be formed using a roller coating method in which a roller is used to coat the stone powder layer 170 so that the stone powder layer 170 can be uniformly formed at a predetermined thickness have.

The mixed layer 180 is formed on the stone powder layer 170 after the stone powder layer 170 is deodorized and is formed of a gloss mixture obtained by mixing the stone powder and the urethane bond. For example, the particle size of the stone powder used in the mixed layer 180 may be as fine as about 60 to 600 mesh.

Here, the mixed layer 180 may be formed using a silk printing method or a roller coating method so that the mixed layer 180 may be uniformly formed to a predetermined thickness when formed in the stone powder layer 170.

In one embodiment, the mixed layer 180 may be a glossy layer of silicone, or a mixture of water, a bond, a flavor, a foaming agent, and the like. Alternatively, the mixed layer 180 may be a stone powder or a polishing layer obtained by mixing water, a bond, a perfume, a foaming agent, and the like.

The silicone may be an acrylic resin, a fluororesin emulsion, a urethane, a silicone emulsion, a PVC, a PVA, and the like. The bond may be an oil-based adhesive and the fragrance may be a natural fragrance or an artificial fragrance. , An alcohol, a silver nano-scale antibacterial agent, a colloidal sulfur, a boric acid, and the like. The foaming agent may be selected from the group consisting of hydrazine, microsphere powder, toluenesulfonyl hydrazide, oxybisisoprenyl hydrazide, azodicarbonamide, And so on.

The buffer for nail care according to one embodiment of the present invention having the above-described structure may be configured such that the stone powder layer 170 is transferred to the transfer layer The mixed layer 180 is sequentially formed on the upper surface of the stone powder layer 170 in a stepwise manner so that the stone powder layer 170 is deodorized and then mixed with the stone powder and the urethane bond. The mixed layer 180 formed of the mixture is formed directly on the stone powder layer 170, and the gloss can be immediately generated, and the glossiness is also strong, which makes it possible to last long.

Alternatively, the nail buffing buffer according to an embodiment of the present invention may include a first adhesive layer 120, a buffer layer 130, a second adhesive layer 140, a transfer layer 150, The first adhesive layer 120, the buffer layer 130, and the second adhesive layer (not shown) may be formed on the lower surface of the support layer 110 as the third adhesive layer 160, the stone powder layer 170 and the mixed layer 180 are formed stepwise. 140, a transfer layer 150, a third adhesive layer 160, a stone powder layer 170, and a mixed layer 180 are formed stepwise.

Alternatively, the nail buffing buffer according to an embodiment of the present invention may be configured such that the mixed layer 180 formed on the upper surface of the support layer 110 is a glossy layer and the mixed layer 180 formed on the lower surface of the support layer 110 is polished And the mixed layer 180 formed on the upper surface of the support layer 110 is an abrasive layer and the mixed layer 180 formed on the lower surface of the support layer 110 may be a glossy layer.

FIG. 3 is a perspective view illustrating a nail care buffer according to another embodiment of the present invention, and FIG. 4 is a front view of the nail care buffer shown in FIG.

3 and 4, the nail care buffer includes a support layer 310, a first adhesive layer 320, a buffer layer 330, a second adhesive layer 340, a first buffer portion 350, a fastening portion 360, and a second buffer unit 370. Here, the buffer units 350 and 370 have been described as two, but it should be understood that the present invention can be implemented in three or more than one.

The first buffer unit 350 includes a transfer layer 351, an adhesive layer 352, a stone powder layer 353 and a mixed layer 354. The second buffer unit 370 includes a transfer layer 371, An adhesive layer 372, a stone powder layer 373, and a mixed layer 374.

The support layer 310, the first adhesive layer 320, the buffer layer 330 and the second adhesive layer 340 are formed on the support layer 110, the first adhesive layer 120, the buffer layer 130, the second adhesive layer 140 And therefore the description thereof will be omitted. The transfer layer 351, the adhesive layer 352, the dust layer 353 and the mixed layer 354 of the first buffer unit 350 and the transfer layer 371 of the second buffer unit 370 and the adhesive layer 372, the stone powder layer 373 and the mixed layer 374 have the same configuration as the above-described transfer layer 150, the third adhesive layer 160, the stone powder layer 170 and the mixed layer 180, It is omitted.

The fastening part 360 is an adhesive member for fastening the second buffer part 370 to the first buffer part 350. For example, the coupling portion 360 may be a double-sided tape capable of bonding between the first buffer portion 350 and the second buffer portion 370. As another example, the fastening part 360 may have a plurality of adhesive members formed on the side of the second buffer part 370 and may be adhered to the side surface of the first buffer part 350, 1 buffer unit 350 as shown in FIG.

In the nail care buffer according to another embodiment of the present invention having the above-described configuration, when the buffer units 350 and 370 are formed in a plurality of layers and the second buffer unit 370 located on the top is worn The flawed second buffer unit 370 can be separated from the first buffer unit 350 so that the new first buffer unit 350 can be used so that the fancy buffer can be used for a longer period of time.

5 is a flowchart illustrating a method of manufacturing a nail care buffer according to an embodiment of the present invention.

Referring to FIG. 5, first, the support layer 110 is formed in a rod shape having a predetermined length so that the user can easily grasp the nail when the nail is handled (S501). At this time, a plate made of a material such as plastic or iron having a certain elasticity and rigidity can be cut into a bar shape having a constant size by using a cutting machine or the like.

Thereafter, an adhesive such as an aqueous adhesive is applied to the upper surface of the support layer 110 manufactured in step S501 using the adhesive automatic dispensing apparatus or the like to form the first adhesive layer 120 (S502).

A buffer layer 130 for relaxing the pressure applied to the fingernail so that excessive pressure is not transferred to the fingernail when the user cares for the fingernail, or for increasing the contact area between the fingernail and the mixed layer 180 by buffering force, The lower surface of the buffer layer 130 and the upper surface of the support layer 110 are pressed by the first adhesive layer 120 using a press or the like so that the upper surface of the support layer 110 is pressed against the upper surface of the support layer 110, The buffer layer 110 and the buffer layer 130 are bonded to each other (S503).

Then, an adhesive such as an aqueous adhesive is applied to the upper surface of the cushioning layer 130 adhered in step S503 using the adhesive automatic dispenser or the like to form the second adhesive layer 140 (S504).

The transfer layer 150 sublimated and transferred at 110 to 200 degrees, for example, on which a picture layer (e.g., pattern, logo, etc.) is formed, is adhered onto the second adhesive layer 140 applied in step S504. The transfer layer 150 and the buffer layer 130 are bonded to each other by pressing the upper surface of the buffer layer 130 and the lower surface of the transfer layer 150 with a second adhesive layer 140 using a press or the like S505).

Then, an adhesive such as an acrylic adhesive is applied to the upper surface of the transfer layer 150 adhered in step S505 by using an adhesive automatic dispenser or the like to form the third adhesive layer 160 (S506).

In order to be able to be formed uniformly with a predetermined thickness, a stone powder having a particle size of, for example, about 60 to 9000 meshes is formed using the silk printing method (or the roller coating method) And a stover layer 170 is formed on the upper surface of the transfer layer 150 in step S507.

Then, in order to be able to be formed uniformly with a predetermined thickness, it is possible to use a silicate printing method (or a roller coating method), or a glossy mixture obtained by mixing a stone powder and a urethane bond Is applied on the stone powder layer 170 formed in step S507 to form the mixed layer 180 (S508). At this time, the particle size of the stone powder used in the mixed layer 180 is made as small as about 60 to 600 mesh so that the stone powder layer 170 is deodorized and then formed into a gloss mixture mixed with the stone powder and the urethane bond The mixed layer 180 is formed directly on the stone powder layer 170, and the gloss can be immediately generated, and the glossiness is also strong, which makes it possible to stay for a long time.

The mixed layer 180 may be composed of a mixture for polishing mixed with silicon or a mixture of water, a bond, a flavor and a foaming agent or may be composed of a mixture of stone powder or a mixture of water, a bond, a flavor, .

Alternatively, after the operation of steps S501 to S508 described above is performed, a method of manufacturing a nail buffing buffer according to an embodiment of the present invention may include the steps of: The first adhesive layer 120, the buffer layer 130, the second adhesive layer 140, the transfer layer 150, the third adhesive layer 160, the stone powder 160, The layer 170, and the mixed layer 180 may be formed stepwise.

Alternatively, the manufacturing method of the nail buffing buffer according to the embodiment of the present invention may be such that the mixed layer 180 formed on the upper surface of the support layer 110 in step S508 described above is formed as a luster mixture, The mixed layer 180 formed on the upper surface of the support layer 110 may be formed as a polishing mixture and then the support layer 110 may be formed of a brightening mixture.

The method of manufacturing a buffer for nail care according to an embodiment of the present invention may include a step of forming a transfer layer 351 and an adhesive layer 352 by a fastening part 360 after performing the operations of steps S501 to S508, The first buffer portion 350 including the adhesive layer 372, the stone powder layer 353 and the mixed layer 354 is formed of a material containing a transfer layer 371, an adhesive layer 372, a stone powder layer 373, 2 buffer unit 370. When the buffer units 350 and 370 are formed as a plurality of layers and the second buffer unit 370 located at the top is worn out, By separating the first buffer unit 350 from the first buffer unit 350 and using the new first buffer unit 350, it becomes possible to use the buffer for nail care for a longer period of time.

In other words, after the fastening portion 360 such as a double-sided tape is adhered to the first buffer portion 350, the second buffer portion 370 is placed on the fastening portion 360 using a device such as a compactor, The first buffer unit 350 and the second buffer unit 370 are coupled to each other. Alternatively, the second buffer part 370 may be bonded to the side surface of the first buffer part 350 by a fastening part 360 having a plurality of adhesive members formed on the side of the second buffer part 370, 1 buffer unit 350 as shown in FIG.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the present invention as defined by the following claims It can be understood that

110, 310: Support layer
120, 320: first adhesive layer
130, 330: buffer layer
140, 340: second adhesive layer
150, 351, 371: transfer layer
160, 352, 372: third adhesive layer
170, 353, 373: stone powder layer
180, 354, 374: mixed layer
350: first buffer unit
360: fastening portion
370: second buffer unit

Claims (12)

A rod-shaped support layer for facilitating gripping of the nail;
A first adhesive layer applied to an upper surface of the support layer;
A buffer layer adhered to the support layer by the first adhesive layer so as to alleviate the pressure applied to the nails when the nail is handled;
A second adhesive layer applied to an upper surface of the buffer layer;
A transfer layer adhered to the buffer layer by the second adhesive layer so as to form a picture layer;
A third adhesive layer applied to an upper surface of the transfer layer;
A stonewall layer formed on the upper surface of the transfer layer by the third adhesive layer and formed by being deodorized; And
And a mixed layer formed on the stone powder layer with a polishing mixture of a stone powder and a urethane bond.
The optical information recording medium according to claim 1,
Characterized in that it is formed of an acrylic adhesive.
The method according to claim 1,
Characterized in that the particle size is formed from 60 to 9000 mesh stone powder.
The method according to claim 1,
Wherein the buffer layer is formed to have a predetermined thickness by a silk printing method or a roller coating method when the transfer layer is formed on the transfer layer by the third adhesive layer.
The organic electroluminescent device according to claim 1,
Characterized in that a stone powder having a particle size of 60 to 600 mesh is used.
The organic electroluminescent device according to claim 1,
Silicone, or a mixture of water, a binder, a perfume, and a foaming agent, is formed on the stone powder layer.
The organic electroluminescent device according to claim 1,
A stone powder, or a mixture of water, a binder, a perfume, and a foaming agent, on the stone powder layer.
The method according to claim 1,
A first adhesive layer applied to a lower surface of the support layer;
A buffer layer adhered to the support layer by the first adhesive layer so as to alleviate the pressure applied to the nails when the nail is handled;
A second adhesive layer applied to the lower surface of the buffer layer;
A transfer layer adhered to the buffer layer by the second adhesive layer so as to form a picture layer;
A third adhesive layer applied to the lower surface of the transfer layer;
A stonewall layer formed on the lower surface of the transfer layer by the third adhesive layer and formed by being deodorized; And
Further comprising a mixed layer formed on the stone powder layer with a polishing mixture of stone powder and urethane bond.
A rod-shaped support layer for facilitating gripping of the nail;
A first adhesive layer applied to an upper surface of the support layer;
A buffer layer adhered to the support layer by the first adhesive layer so as to alleviate the pressure applied to the nails when the nail is handled;
A second adhesive layer applied to an upper surface of the buffer layer;
A transfer layer which is adhered to the buffer layer by the second adhesive layer so as to form an image layer thereon; a third adhesive layer which is applied to the upper surface of the transfer layer; and a second adhesive layer which is adhered to the upper surface of the transfer layer by the third adhesive layer, A first buffer portion including a mixed layer formed on the stone powder layer as a polishing mixture in which a stone powder and a urethane bond are mixed;
A third adhesive layer applied to the upper surface of the transfer layer, and a second adhesive layer adhered to the upper surface of the transfer layer by the third adhesive layer and formed as a deodorized and formed stone A second buffer portion including a mixed layer formed on the stone powder layer as a gloss mixture obtained by mixing a stone powder and a urethane bond; And
And a fastening part for fastening the first buffer part and the second buffer part together with an adhesive member.
10. The connector according to claim 9,
Wherein the tape is a double-sided tape.
10. The connector according to claim 9,
And a plurality of adhesive members formed on a side of the second buffer unit, and bonded to the side surfaces of the first buffer unit.
Forming a rod-like support layer so as to facilitate grasping of nails;
Forming a first adhesive layer by applying an adhesive to an upper surface of the support layer;
Bonding the buffer layer and the buffer layer by pressing a buffer layer on the first adhesive layer so as to alleviate the pressure applied to the nail when the nail is cleaned;
Forming a second adhesive layer by applying an adhesive to an upper surface of the buffer layer;
Bonding the buffer layer and the transfer layer by pressing the transfer layer to the second adhesive layer so that a picture layer is formed;
Forming a third adhesive layer by applying an adhesive to an upper surface of the transfer layer;
Adhering the stone powder onto the third adhesive layer and then deodorizing it to form a stone powder layer; And
A method for manufacturing a nail care buffer, comprising the steps of: applying a polishing mixture obtained by mixing a stone powder and a urethane bond onto the stone powder layer to form a mixed layer.

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