KR20130118053A - Apparatus and method for forming flatness of glass substrate - Google Patents

Abstract

PURPOSE: A device and a method for forming the flat surface of glass substrate are provided to save production costs because expensive pads and slurry used for directly grinding the glass substrate are not required by forming a surface layer on the glass substrate and the flat surface on the surface layer. CONSTITUTION: A device for forming the flat surface of glass substrate comprises a surface layer forming unit, a flat surface forming unit (150), and a transfer unit (190). The surface layer forming unit forms a surface layer (21) on the glass substrate. The flat surface forming unit grinds the surface layer to form the surface layer on the glass substrate. The transfer unit transfers the glass substrate to the surface layer forming unit and the flat surface forming unit.

Description

Apparatus and method for forming flatness of glass substrate}

The present invention relates to a flat surface forming apparatus and method for a glass substrate, and more particularly to a flat surface forming apparatus and method for forming a flat surface on a glass substrate.

Glass substrates are used for PDP (Plasma Display Panel), LCD (Liquid Crystal Display), and AMOLED (Active Matrix Organic Light Emitting Diodes), which have recently become popular as display devices.

Among them, a glass substrate used in a TFT LCD (Thin Film Transistor Liquid Crystal Display) is a substrate attached to a TFT array and a color filter, and is used as a core material of a TFT LCD panel. Therefore, the glass substrate is required to have a flat surface that can not be distinguished from the naked eye, and high quality characteristics such as no deformation due to heat.

However, in the process of producing a glass substrate, melting defects are generated on the surface of the glass substrate, and melting defects cause a problem that it is difficult to use the glass substrate in a display device. Therefore, conventionally, the surface of the glass substrate is polished to remove a melting defect, so that a certain level of waviness is secured on the glass substrate. Such a device for polishing the surface of a glass substrate has already been disclosed in Korean Patent Registration No. 10-0952324 and the like. Conventionally, a glass substrate is directly polished to form a flat surface on a glass substrate.

However, in order to obtain the required thickness and flatness by directly polishing a glass substrate belonging to a relatively hard material, expensive polishing pads and slurries must be used, and thus there is a problem in that the production cost increases.

In addition, there is a problem that the time required to directly polish the glass substrate is also delayed, thereby lowering the productivity.

Korean Patent No. 10-0952324 (published on Aug. 21, 2009)

SUMMARY OF THE INVENTION An object of the present invention is to provide an apparatus and method for forming a flat surface of a glass substrate to improve productivity and to obtain a high quality glass substrate at low cost.

The flat surface forming apparatus of the glass substrate according to the present invention includes a surface layer forming portion for forming a surface layer on the glass substrate and a flat surface forming portion for polishing the surface of the surface layer to form a flat surface on the glass substrate.

The flat surface forming apparatus of the glass substrate may further include a transfer unit for transferring the glass substrate to the surface layer forming unit and transferring the glass substrate having the surface layer formed to the flat surface forming unit.

The flat surface forming apparatus of the glass substrate may further include a hardening portion disposed between the surface layer forming portion and the flat surface forming portion to cure the surface layer.

The surface layer may be made of a thermosetting resin, and the curing unit may include a heat source for radiating heat toward the surface layer.

The surface layer may be made of a photocurable resin, and the cured part may include a light source for irradiating light toward the surface layer.

The surface layer forming unit may include a pressure roller to press the surface layer by rolling contact on the glass substrate.

The flat surface forming apparatus of the glass substrate may further include a film supply unit for supplying a film for forming the surface layer to the pressure roller.

The film supply unit includes an application roller to which the liquid raw material of the film is applied, and an extrusion roller rotated in engagement with the application roller to extrude the liquid raw material, and the pressure roller is installed to engage the extrusion roller, and the liquid raw material is Semi-cured to form the film, the semi-cured film can be supplied onto the glass substrate.

The flat surface forming unit may include a polishing unit for polishing a surface of the surface layer and a coolant supply unit supplying a coolant between the polishing unit and the surface layer.

The coolant may be water.

In addition, the apparatus for forming a flat surface of a glass substrate according to the present invention includes a surface layer forming chamber in which a surface layer is formed on a glass substrate, a curing chamber in which the surface layer is cured, and a curing chamber in which the surface layer is cured, and one side of the curing chamber. A flat surface forming chamber disposed at the surface layer, wherein the surface of the surface layer is polished to form a flat surface on the glass substrate, and a transfer unit for linearly transferring the glass substrate from the front of the surface layer forming chamber to the after the flat surface forming chamber. do.

The flat surface forming apparatus of the glass substrate may include a first gate disposed on the other side wall of the surface layer forming chamber to open and close, a second gate installed between the surface layer forming chamber and the curing chamber to open and close, the curing chamber and the flat surface. And a third gate disposed between the surface forming chambers and opened and closed, and a fourth gate disposed on and opened from one side wall of the flat surface forming chamber.

When the first gate is opened, the second gate is closed, and when the glass substrate is transferred into the surface layer forming chamber, the first gate may be closed.

The third gate may be closed when the second gate is opened, and the second gate may be closed when the glass substrate is transferred into the curing chamber.

The fourth gate may be closed when the third gate is opened, and the third gate may be closed when the glass substrate is transferred into the flat surface forming chamber.

The transfer part may include a transfer rail extending from the front of the surface layer forming chamber to the after the flat surface forming chamber and the glass substrate supporting the glass substrate and being transferred along the transfer rail.

Meanwhile, the method for forming a flat surface of a glass substrate according to the present invention includes a surface layer forming step of forming a surface layer on a glass substrate and a flat surface forming step of forming a flat surface on the glass substrate by polishing the surface of the surface layer.

The flat surface forming method of the glass substrate may further include a curing step of curing the surface layer between the bonding step and the flat surface forming step.

The surface layer is made of a thermosetting resin, the curing step may be irradiated with heat to the surface layer to cure the surface layer.

The surface layer is made of a photocurable resin, the curing step may be irradiated with light to the film to cure the surface layer.

In the polishing step, a coolant is supplied onto the surface layer, and the surface layer may be polished.

In the polishing step, water may be used as the coolant.

In the polishing step, the surface layer may be polished while the glass substrate is transferred.

In the polishing step, a single polishing pad in contact with the surface layer may be transferred in the width direction of the glass substrate, and the surface layer may be polished.

In the polishing step, the surface layer may be polished by a plurality of polishing pads which are in contact with the surface layer and disposed in the width direction of the glass substrate.

In the polishing step, the surface layer may be polished while the glass substrate is stopped.

In the polishing step, a single polishing pad in contact with the surface layer is transferred in the longitudinal direction and the width direction of the glass substrate, and the surface layer may be polished.

In the polishing step, a plurality of polishing pads in contact with the surface layer and disposed in the width direction of the glass substrate may be transferred in the longitudinal direction of the glass substrate, and the surface layer may be polished.

In the polishing step, the surface layer may be polished by a plurality of polishing pads disposed in contact with the surface layer and corresponding to the entire area of the surface layer.

Flat surface forming apparatus and method of the glass substrate according to the present invention has the effect of producing a high quality glass substrate.

In addition, the flat surface forming apparatus and method of the glass substrate according to the present invention has the effect of improving the productivity.

In addition, the flat surface forming apparatus and method of the glass substrate according to the present invention can reduce the production cost.

1 is a view schematically showing the configuration of a flat surface forming apparatus of a glass substrate according to the first embodiment.
FIG. 2 is a view briefly illustrating an internal configuration of a flat surface forming chamber in the flat surface forming apparatus of the glass substrate according to the first embodiment.
3 is a view briefly illustrating an internal configuration of a flat surface forming chamber in the flat surface forming apparatus of the glass substrate according to the second embodiment.
4 is a view briefly illustrating an internal configuration of a flat surface forming chamber in a flat surface forming apparatus of a glass substrate according to a third embodiment.
5 is a flowchart illustrating a method of forming a flat surface of a glass substrate according to the present embodiment.
6 is a view briefly showing the configuration of a flat surface forming apparatus for a glass substrate according to the fourth embodiment.

Hereinafter, an embodiment of a flat surface forming apparatus and method of a glass substrate according to the present invention will be described with reference to the accompanying drawings. It should be understood, however, that the invention is not limited to the disclosed embodiments, but may be embodied in various forms and should not be construed as limited to the embodiments set forth herein, Is provided to fully inform the user.

1 is a view schematically showing the configuration of a flat surface forming apparatus of a glass substrate according to the first embodiment.

Referring to FIG. 1, a flat surface forming apparatus (hereinafter, referred to as a “flat surface forming apparatus”) 100 of a glass substrate according to the first embodiment may include a surface layer forming unit 110, a hardening unit 130, and a flat surface. And a surface forming part 150 and a conveying part 190. The surface layer forming unit 110, the hardening unit 130, and the flat surface forming unit 150 may be arranged linearly to form a flat surface on the glass substrate 10 in an in-line manner. .

That is, the surface layer forming unit 110 includes a surface layer forming chamber 111, the curing unit 130 includes a curing chamber 131, and the flat surface forming unit 150 forms the flat surface forming chamber 151. It may include. The curing chamber 131 may be disposed on one side of the surface layer forming chamber 111, and the flat surface forming chamber 151 may be disposed on one side of the curing chamber 131. The curing chamber 131 may be in contact with one side wall of the surface layer forming chamber 111, and the flat surface forming chamber 151 may be installed to be in contact with one side wall of the curing chamber 131.

Accordingly, the first gate 171 may be installed on the other side wall of the surface layer forming chamber 111 disposed in the opposite direction of the curing chamber 131. The second gate 172 may be provided between the surface layer forming chamber 111 and the curing chamber 131. The third gate 173 may be installed between the curing chamber 131 and the flat surface forming chamber 151. A fourth gate 174 may be installed on one side wall of the flat surface forming chamber 151 disposed in the opposite direction of the curing chamber 131. The first, second, third, and fourth gates 171, 172, 173, and 174 may be provided in the form of a gate valve, and may be individually controlled to enable individual opening and closing within each chamber.

The transfer unit 190 may be installed to linearly transfer the glass substrate 10 through the surface layer forming chamber 111, the curing chamber 131, and the flat surface forming chamber 151. That is, the conveying unit 190 is a straight line conveying rail 191 and a conveying bogie 193 conveyed along the conveying rail 191 extending from the front of the surface layer forming chamber 111 to the after of the flat surface forming chamber 151. ) May be included. The conveying unit 190 is a linear actuator made of a combination of a conveying rail 191, a conveying bogie 193, a rack & pinion (not shown), and a rotating motor (not shown), or a conveying unit. Linear actuator consisting of a combination of a rail 191, a feed cart 193, a ball screw (not shown), and a rotary motor (not shown), or a feed rail 191, a feed cart 193, and a hydraulic / pneumatic cylinder (not shown) It may be in the form of a linear actuator consisting of a combination of.

Although not shown, the transfer cart 193 includes a chucking device capable of firmly supporting the glass substrate 10, for example, an electrostatic chuck supporting the glass substrate 10 by an electrostatic force, and a glass substrate 10 by a vacuum suction force. ) May be installed, such as a vacuum chuck supporting the clamp, a clamp for mechanically clamping at least three sides of the glass substrate 10. This chucking device is already well known in the art, so detailed description thereof will be omitted.

Meanwhile, the pressure roller 113 and the film supply unit 120 may be disposed in the surface layer forming chamber 111. The pressure roller 113 is installed to be in contact with the glass substrate 10 supported by the feed cart 193. The pressure roller 113 stacks the film 20 supplied from the film supply unit 120, which will be described later, on the glass substrate 10, and rolls and compresses the film 20 to the glass substrate ( To 10). Inside the pressing roller 113, a film semi-curing module 115 such as a heat source or a light source may be installed. When the light source is used as the film semi-curing module 115, the outer wall of the pressure roller 113 may be made of a light transmissive material.

The film supply unit 120 includes a raw material container 121, an application roller 123, and an extrusion roller 125. The liquid raw material of the film 20 is accommodated in the raw material container 121. The liquid raw material may be a liquid raw material of a thermosetting resin or a photo curable resin. The liquid raw material may have a viscosity that can be adhered to the coating roller 123. As the application roller 123 is rotated inside the raw material container 121, the liquid raw material contained in the raw material container 121 is installed to be applied to the surface thereof. The extrusion roller 125 is disposed between the application roller 123 and the pressure roller 113. The extrusion roller 125 is installed to engage the application roller 123 and the pressure roller 113. Therefore, the liquid raw material applied to the application roller 123 is transferred from the application roller 123 to the extrusion roller 125, it is extruded by the extrusion roller 125 can be transferred to the pressure roller 113. Although not shown, a rotary motor (not shown) that provides power may be connected to any one of the rotating shafts of the application roller 123, the extrusion roller 125, and the pressure roller 113. At this time, the rotary motor (not shown) may be controlled so that the rotational speed of the pressure roller 113 can be synchronized with the feed speed of the feed cart 193.

As described above, the glass substrate 10 and the film 20 may be bonded to each other in the bonding chamber 111 to form a surface layer 21 forming the surface of the glass substrate 10.

In the above description, the surface layer 21 is described as being formed by laminating the film 20 formed by the film supply unit 120 on the glass substrate 10, but in another embodiment, the liquid layer is formed on the glass substrate 10. It can be modified by direct injection of the raw material.

Meanwhile, the curing unit 133 may be installed in the curing chamber 131 to cure the surface layer 21. The curing unit 133 may be disposed above the transfer rail 191. As the curing unit 133, a thermal curing apparatus or an optical curing apparatus may be used. When the curing unit 133 is used as a thermal curing apparatus, the thermal curing apparatus may be in the form of a heating coil or a hot air blower. When the curing unit 133 is used as a photocuring apparatus, the photocuring apparatus may use a light source that emits ultraviolet (UV) light.

Meanwhile, a polishing unit 153 and a coolant supply unit 155 for polishing the surface of the surface layer 21 may be installed in the flat surface forming chamber 151.

FIG. 2 is a view briefly illustrating an internal configuration of a flat surface forming chamber in the flat surface forming apparatus of the glass substrate according to the first embodiment.

Referring to FIG. 2, the polishing unit 153 may include a polishing pad 153a, a rotation module 153b, a lifting module 153c, and a transfer module 153d. The polishing pad 153a is disposed above the transfer rail 191. The polishing pad 153a may be made of diamond, ceria, plastic, sand paper, or the like. The rotating module 153b may use a rotating motor for rotating the polishing pad 153a. The elevating module 153c may include a linear actuator supporting the rotating module 153b and elevating the rotating module 153b. The transfer module 153d may be formed of a linear actuator for transferring the rotation module 153b.

As shown in FIG. 2, the polishing pad 153a and the rotation module 153b may be provided in a singular number.

As described above, the transport cart 193 may be transported along the transport rail 191 while supporting the glass substrate 10. Therefore, even if the transfer module 153d transfers the elevating module 153c along the rail 153e disposed in the width direction x of the glass substrate 10, the polishing pad 153a is the entire surface of the surface layer 21. Polishing may be performed.

In another embodiment, the transport cart 193 may be stopped inside the flat surface forming chamber 151 while supporting the glass substrate 10. In this case, the transfer module 153d includes a rail 153e for placing the elevating module 153c in the width direction x of the glass substrate 10, and a rail disposed in the length direction y of the glass substrate 10 ( 153f). Therefore, the polishing pad 153a is transferred along the two rails 153e and 153f, and the polishing pad 153a may be polished to the entire surface of the surface layer 21.

3 is a view briefly illustrating an internal configuration of a flat surface forming chamber in the flat surface forming apparatus of the glass substrate according to the second embodiment.

As illustrated in FIG. 3, a plurality of polishing pads 153a may be provided, and the plurality of polishing pads 153a may be disposed in the width direction of the glass substrate 10.

As described above, the transport cart 193 may be transported in the longitudinal direction y of the glass substrate 10 while supporting the glass substrate 10. Accordingly, the plurality of polishing pads 153a disposed in the width direction x of the glass substrate 10 may polish the entire surface of the surface layer 21 only by adjusting the distance from the film 20 by the elevating module 153c. Can be done. In this case, the configuration of the transfer module 153d may be omitted.

In another embodiment, the transport cart 193 may be stopped inside the flat surface forming chamber 151 while supporting the glass substrate 10. Therefore, the plurality of polishing pads 153a disposed in the width direction x of the glass substrate 10 are transferred along the rail 153f disposed in the longitudinal direction y of the glass substrate 10, and the surface layer 21 Abrasion can be performed for the entire area of the

4 is a view briefly illustrating an internal configuration of a flat surface forming chamber in the flat surface forming apparatus of the glass substrate according to the first embodiment.

As shown in FIG. 4, the plurality of polishing pads 153a and the rotation module 153b may be provided in a number corresponding to the entire surface of the glass substrate 10.

As described above, the transport cart 193 may be transported in the longitudinal direction y of the glass substrate 10 while supporting the glass substrate 10. Accordingly, the plurality of polishing pads 153a provided in the number corresponding to the entire surface of the glass substrate 10 may be polished on the entire surface of the surface layer 21 only by adjusting the distance from the surface layer 21 by the elevating module 153c. Can be done. In this case, the configuration of the transfer module 153d may be omitted.

On the other hand, the coolant supply unit 155 sprays the coolant onto the surface layer 21 formed on the glass substrate 10. As described above, since the surface layer 21 is made of a thermosetting resin or a photocurable resin, the surface layer 21 can be polished by the coolant alone without using a separate abrasive such as a slurry used when polishing the glass. In this case, water may be used as the coolant used.

Hereinafter, a method of forming a flat surface of the glass substrate according to the present embodiment will be described in detail.

5 is a flowchart illustrating a method of forming a flat surface of a glass substrate according to the present embodiment.

Referring to FIG. 5, the glass substrate 10 is mounted on the transport cart 193. When the glass substrate 10 is mounted on the transport cart 193, the first gate 171 is opened and the second gate 172 is closed. Subsequently, the feed cart 193 is transferred into the surface layer forming chamber 111. When the transfer cart 193 is positioned inside the surface layer forming chamber 111, the first gate 171 is closed.

As described above, in the state in which the interior of the surface layer forming chamber 111 is closed, the bonding process of the glass substrate 10 and the film 20 is performed. That is, the transfer cart 193 is transferred at a constant speed toward the second gate 172.

In addition, the coating roller 123 is rotated, the liquid raw material of the raw material container 121 is applied to the surface of the coating roller 123. The liquid raw material applied to the application roller 123 is transferred to the extrusion roller 125. Liquid raw material () is extruded to a thickness of 0.1 ~ 70㎛ by the extrusion roller 125 is transferred to the pressure roller 113 in the form of a film (20). The film 20 positioned on the surface of the pressure roller 113 is semi-cured by the film semi-curing module 115. The semi-cured film 20 is laminated on the glass substrate 10 according to the rolling motion of the pressure roller 113, and pressed by the pressure roller 113 to be bonded to the glass substrate 10.

As described above, the glass substrate 10 is provided with a surface layer 21 serving as the surface of the glass substrate 10. (Step S11)

When the surface layer 21 is formed on the glass substrate 10 as described above, the second gate 172 is opened and the third gate 173 is closed. Subsequently, the transfer cart 193 is transferred into the curing chamber 131. When the transfer cart 193 is positioned inside the curing chamber 131, the second gate 172 is closed.

As described above, in the state where the inside of the curing chamber 131 is closed, the curing process of the surface layer 21 is performed. That is, the feed cart 193 is transferred at a constant speed toward the third gate 173.

In addition, the curing unit 133 irradiates heat or light toward the surface layer 21. As heat or light is incident on the surface layer 21, the surface layer 21 is heated or exposed and cured. As the surface layer 21 is cured by the curing unit 133 as described above, the surface layer 21 may be tightly coupled to the glass substrate 10. (Step; S13)

As such, when the hardening of the surface layer 21 is completed, the third gate 173 is opened and the fourth gate 174 is closed. Subsequently, the transfer cart 193 is transferred into the flat surface forming chamber 151. When the transfer cart 193 is positioned inside the flat surface forming chamber 151, the third gate 173 is closed.

As described above, in the state where the inside of the flat surface forming chamber 151 is closed, the flat surface forming process of the glass substrate 10 is performed.

That is, the coolant is supplied onto the surface layer 21 by the coolant supply unit 155. The polishing pad 153a may be elevated by the lifting module 153c to contact the surface layer 21. The polishing pad 153a is rotated by the rotation module 153b.

In one embodiment, the transfer cart 193 may be intermittently transferred toward the fourth gate 174.

As described above, when the polishing pad 153a is provided in the singular, the polishing pad 153a is transferred in the width direction of the glass substrate 10, and polishing of the entire surface of the surface layer 21 may be performed. In addition, when the plurality of polishing pads 153a are disposed in the width direction of the glass substrate 10, the entire surface of the surface layer 21 may be polished only by the transfer operation of the transfer cart 193. Similarly, when the polishing pad 153a is provided in a number corresponding to the total area of the glass substrate 10, the entire surface of the surface layer 21 may be polished only by the transfer operation of the conveyance trolley 193.

In another embodiment, the feed cart 193 may be stopped inside the flat surface forming chamber 151.

As described above, when the polishing pads 153a are provided in the singular, the polishing pads 153a may be formed by the rails 153e disposed in the width direction x of the glass substrate 10 and the longitudinal direction of the glass substrate 10. It is conveyed along the rail 153f arrange | positioned at y), and the grinding | polishing with respect to the whole area of the surface layer 21 can be performed. In addition, when the polishing pads 153a are arranged in the width direction x of the glass substrate 10, the polishing pads 153a are arranged in the longitudinal direction y of the glass substrate 10. Transported along the surface of the surface layer 21 may be polished.

 As such, when the surface layer 21 is polished, a flat surface having a flatness of 0.01 to 0.2 μm or less may be formed on the surface layer 21 (step S15).

As such, when the flat surface is formed on the surface layer 21, the fourth gate 174 is opened. The feed cart 193 is discharged to the outside of the flat surface forming chamber 151.

As described above, since the flat surface forming apparatus 100 of the glass substrate according to the present invention performs a series of processes for forming the flat surface on the glass substrate 10 in an in-line manner, productivity may be improved.

In addition, in the flat surface forming apparatus 100 of the glass substrate according to the present invention, the surface layer 21 is formed on the glass substrate 10 without directly polishing the glass substrate 10, and the flat surface is formed on the surface layer 21. Since it is not necessary to use expensive pads, slurries and the like used to directly polish the glass substrate 10, the production cost can be reduced.

In the above description, the flat surface forming apparatus 100 of the glass substrate according to the first, second, and third embodiments in which the in-line method is adopted is described.

In the glass substrate flat surface forming apparatus 200 according to the fourth embodiment, an off-line batch method may be adopted. That is, as shown in Figure 6, the glass substrate flat surface forming apparatus 200 according to the fourth embodiment includes a transfer robot 210 for transferring the glass substrate 10 to each chamber, the surface layer forming unit ( 110, the hardening unit 130 and the flat surface forming unit 150 may be installed around the transfer robot 210.

The configuration and operation of the glass substrate flat surface forming apparatus 200 according to the fourth embodiment only have a difference in the transfer operation of the glass substrate 10, and the glass substrate according to the first, second and third embodiments described above. Since the planar surface forming apparatus 100 is substantially the same, the detailed description thereof will be omitted.

The embodiments of the present invention described above and shown in the drawings should not be construed as limiting the technical idea of the present invention. The scope of protection of the present invention is limited only by the matters described in the claims, and those skilled in the art will be able to modify the technical idea of the present invention in various forms. Accordingly, such improvements and modifications will fall within the scope of the present invention as long as they are obvious to those skilled in the art.

10: glass substrate 20: film
21: surface layer 100: flat surface forming apparatus of the glass substrate
110: bonding portion 111: bonding chamber
113: pressure roller 115: film semi-hardening module
120: film supply portion 121: raw material container
123: coating roller 124: extrusion roller
130: curing unit 131: curing chamber
133: curing unit 150: flat surface forming portion
151: flat surface forming chamber 153: polishing unit
153a: polishing pad 153b: rotating module
153c: Lift module 153d: Transfer module
153e, 153f: rail 171: first gate
172: second gate 173: third gate
174: fourth gate 190: transfer section
191: transfer rail 193: transfer bogie

Claims (29)

A surface layer forming unit forming a surface layer on the glass substrate; and
And a flat surface forming portion for polishing the surface layer to form a flat surface on the glass substrate. The method of claim 1,
And a transfer unit for transferring the glass substrate to the surface layer forming unit and transferring the glass substrate to the flat surface forming unit. The method of claim 1,
And a hardening portion disposed between the surface layer forming portion and the flat surface forming portion to cure the surface layer. The method of claim 3, wherein
The surface layer is made of a thermosetting resin,
And said hardened portion comprises a heat source for irradiating heat toward said surface layer. The method of claim 3, wherein
The surface layer is made of a photocurable resin,
And the hardened part comprises a light source for irradiating light toward the surface layer. The method of claim 1, wherein the surface layer forming unit
Flat roller forming apparatus comprising a pressure roller for rolling on the glass substrate to press the surface layer. The flat surface forming apparatus of claim 6, further comprising a film supply unit supplying a film forming the surface layer to the pressure roller. The method of claim 7, wherein the film supply unit
An application roller to which the liquid raw material of the film is applied; and
It is engaged with the coating roller is rotated to include an extrusion roller for extruding the liquid raw material,
The pressurizing roller is installed to engage the extrusion roller, the liquid material is semi-cured to form the film, and the flat surface forming apparatus of the glass substrate, characterized in that for supplying the semi-cured film on the glass substrate. According to claim 1, wherein the flat surface forming portion
Polishing unit for polishing the surface of the surface layer; And
And a coolant supply unit for supplying a coolant between the polishing unit and the surface layer. The method of claim 9, wherein the coolant
Flat surface forming apparatus of the glass substrate, characterized in that the water. A surface layer forming chamber in which a surface layer is formed on the glass substrate;
A curing chamber disposed at one side of the surface layer forming chamber and curing the surface layer;
A flat surface forming chamber disposed at one side of the curing chamber, the surface of the surface layer being polished to form a flat surface on the glass substrate; and
And a conveying part for linearly conveying the glass substrate from the front of the surface layer forming chamber to the after of the flat surface forming chamber. 12. The method of claim 11,
A first gate disposed on the other side wall of the surface layer forming chamber and opened and closed;
A second gate installed and opened between the surface layer forming chamber and the curing chamber;
A third gate disposed between the curing chamber and the flat surface forming chamber and opened and closed; and
And a fourth gate disposed on one side wall of the flat surface forming chamber and opened and closed. 13. The method of claim 12,
When the first gate is opened, the second gate is closed,
And the first gate is closed when the glass substrate is transferred into the surface layer forming chamber. The method of claim 13,
When the second gate is opened, the third gate is closed,
And the second gate is closed when the glass substrate is transferred into the curing chamber. The method of claim 13,
When the third gate is opened, the fourth gate is closed,
And the third gate is closed when the glass substrate is transferred into the flat surface forming chamber. The method of claim 12, wherein the transfer unit
A transfer rail extending from the front of the surface layer forming chamber to the rear of the flat surface forming chamber; and
And a conveyance bogie which supports the glass substrate and is conveyed along the conveyance rail. A surface layer forming step of forming a surface layer on the glass substrate; and
And a flat surface forming step of polishing the surface of the surface layer to form a flat surface on the glass substrate. 18. The method of claim 17, wherein between the bonding step and the flat surface forming step
Flat surface forming method characterized in that it further comprises a curing step of curing the surface layer. The method of claim 18, wherein the surface layer is made of a thermosetting resin,
The curing step is a method for forming a flat surface of the glass substrate, characterized in that the surface layer is cured by heat is irradiated to the surface layer. 19. The method of claim 18, wherein the surface layer is a photocurable resin,
The hardening step is a method of forming a flat surface of the glass substrate, characterized in that the surface layer is cured by irradiating light to the surface layer. 18. The method of claim 17, wherein the polishing step
And a coolant is supplied over the surface layer, and the surface layer is polished. 18. The method of claim 17, wherein the polishing step
Method for forming a flat surface of the glass substrate, characterized in that water is used as the coolant. 18. The method of claim 17, wherein the polishing step
And the surface layer is polished while the glass substrate is transferred. The method of claim 23, wherein the polishing step
And a single polishing pad in contact with the surface layer is transferred in the width direction of the glass substrate, and the surface layer is polished. The method of claim 23, wherein the polishing step
And the surface layer is polished by a plurality of polishing pads in contact with the surface layer and disposed in the width direction of the glass substrate. 18. The method of claim 17, wherein the polishing step
And the surface layer is polished while the glass substrate is stopped. The method of claim 26, wherein the polishing step
And a single polishing pad in contact with the surface layer is transferred in the longitudinal direction and the width direction of the glass substrate, and the surface layer is polished. The method of claim 26, wherein the polishing step
And a plurality of polishing pads in contact with the surface layer and disposed in the width direction of the glass substrate are transferred in the longitudinal direction of the glass substrate, and the surface layer is polished. The method of claim 26, wherein the polishing step
And the surface layer is polished by a plurality of polishing pads disposed in contact with the surface layer and corresponding to the entire area of the surface layer.

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