KR20130034127A - A wafer notch wheel and an apparatus for grinding a wafer notch - Google Patents
A wafer notch wheel and an apparatus for grinding a wafer notch Download PDFInfo
- Publication number
- KR20130034127A KR20130034127A KR1020110097987A KR20110097987A KR20130034127A KR 20130034127 A KR20130034127 A KR 20130034127A KR 1020110097987 A KR1020110097987 A KR 1020110097987A KR 20110097987 A KR20110097987 A KR 20110097987A KR 20130034127 A KR20130034127 A KR 20130034127A
- Authority
- KR
- South Korea
- Prior art keywords
- wheel
- notch
- grinding
- unit
- coupling protrusion
- Prior art date
Links
- 230000008878 coupling Effects 0.000 claims abstract description 63
- 238000010168 coupling process Methods 0.000 claims abstract description 63
- 238000005859 coupling reaction Methods 0.000 claims abstract description 63
- 238000000034 method Methods 0.000 claims description 13
- 238000003780 insertion Methods 0.000 claims description 8
- 230000037431 insertion Effects 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 4
- 230000002093 peripheral effect Effects 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 description 23
- 230000002787 reinforcement Effects 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000003014 reinforcing effect Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D5/00—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting only by their periphery; Bushings or mountings therefor
- B24D5/16—Bushings; Mountings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Abstract
The embodiment includes a plurality of unit wheels having a body, a coupling protrusion provided at one end of the body, and a coupling to be inserted into the coupling protrusion and processing a notch of a wafer, and coupled to one end of the coupling protrusion. And a coupling fixing portion for fixing unit wheels to the coupling protrusion.
Description
Embodiments relate to a grinding apparatus and a wafer notch wheel.
Notches are processed to indicate crystal orientation and dopant type on the silicon wafer. Generally, the notch of the silicon wafer is processed by the notch wheel included in the grinding apparatus. The notch wheel may include a notch wheel body capable of rotating the notch wheel in combination with the driving unit and a notch processing unit for processing the notch of the wafer.
12 shows the notch 1 and the
Wafer notching may be performed through a roughing process using a notch processing part of 800 mesh and a grinding process using a notch processing part of 2000 mesh. In general, the notch wheel includes a notch processing part having different meshes, and the roughing process and the grinding process are performed in two steps. Typical notch wheels should be replaced when the notch wheels for grinding or part of the grinding notches are worn or deformed and can no longer be used.
The embodiment provides a notch wheel and grinding device that can replace only a worn, deformed or damaged unit wheel, various types of wafer notch processing, and implement various product specifications in a single device.
The notch wheel according to the embodiment has a body, a coupling protrusion provided at one end of the body, a plurality of unit wheels having a groove (groove) inserted into the coupling protrusion and processing the notch of the wafer, and one end of the coupling protrusion and And a coupling fixing portion for coupling the plurality of unit wheels to the coupling protrusion.
Each of the plurality of unit wheels may be detachable from the coupling protrusion. The coupling protrusion may have a polyhedron shape having a polygonal cross section. The coupling protrusion may be a polyhedron having a cross section.
Each of the plurality of unit wheels may be provided with a through groove into which the engaging protrusion is inserted. The coupling protrusions may be spaced apart from each other, and may include curved outer circumferential surfaces and first inner and second inner surfaces positioned between the outer circumferential surfaces, and the first inner surface and the second inner surface may be perpendicular to each other. have. The coupling fixing part may be provided with an insertion groove into which one end of the coupling protrusion is inserted and engaged. One end of the coupling protrusion may be provided with a first thread, and an inner surface of the insertion groove may be provided with a second thread that is fastened to the first thread.
The plurality of unit wheels may include a roughing unit wheel and a grinding unit wheel, and grooves of the roughing unit wheel and the grinding unit wheel may be different materials, or may have different roughness or hardness.
The grinding apparatus according to the embodiment includes a notch wheel for processing a wafer notch, a notch grinding spindle connected to the notch wheel, and a spindle drive for rotating the notch grinding spindle, wherein the notch wheel may be an embodiment.
The embodiment can replace only the worn, deformed or damaged unit wheel, various types of wafer notch processing, and the specification of various products can be implemented in a single equipment.
1 is a perspective view of a grinding apparatus according to an embodiment.
2 shows a side view of the grinding apparatus shown in FIG. 1.
3 is an exploded perspective view of the notch wheel according to the embodiment.
4 shows a perspective view of the body with the engaging projection shown in FIG. 3.
FIG. 5 shows a side view in the A direction of the body with the engaging projection shown in FIG. 4. FIG.
FIG. 6 shows a side view in B direction of one end of the engaging projection shown in FIG. 4. FIG.
7 is an enlarged perspective view of one end of the engaging protrusion illustrated in FIG. 3.
8 is a perspective view of the unit wheel for grinding shown in FIG.
FIG. 9 shows a front view of the unit wheel for grinding shown in FIG. 8.
10 is a perspective view of the roughing unit wheel shown in FIG. 3.
FIG. 11 shows a perspective view of the coupling fixture shown in FIG. 3.
12 shows notches and round portions of a wafer.
BRIEF DESCRIPTION OF THE DRAWINGS The above and other features and advantages of the present invention will become more apparent from the following detailed description taken in conjunction with the accompanying drawings, in which: FIG. In the description of the embodiments, it is to be understood that each layer (film), region, pattern or structure may be referred to as being "on" or "under" a substrate, each layer It is to be understood that the terms " on "and " under" include both " directly "or" indirectly " do. In addition, the criteria for the top / bottom or bottom / bottom of each layer are described with reference to the drawings.
In the drawings, dimensions are exaggerated, omitted, or schematically illustrated for convenience and clarity of illustration. In addition, the size of each component does not necessarily reflect the actual size. The same reference numerals denote the same elements throughout the description of the drawings.
1 illustrates a perspective view of a
1 and 2, the
As shown in FIG. 1, the
The
The
The
The
The
The
3 is an exploded perspective view of the
The
FIG. 4 shows a perspective view of the
4 to 6, one
Coupling
FIG. 7 is an enlarged perspective view of one end of the
Referring to FIG. 7, the engaging
Each of the outer
Each of the plurality of unit wheels 330-1 to 330-n, a natural number of n> 1, may be fitted to the
The plurality of unit wheels 330-1 to 330-n, and a natural number of n> 1, includes a roughing unit wheel 330-2 to 320-(2n) and n≥1 of natural number) and a grinding unit wheel 330-1. To 310- (2n-1), n≥1 natural numbers).
FIG. 8 is a perspective view of the grinding unit wheel (eg, 330-1) shown in FIG. 3, and FIG. 9 is a front view of the grinding unit wheel (eg, 330-1) shown in FIG. 8.
7 and 8, the grinding unit wheel (eg, 330-1) may include a
The
The
The through
In this case, the shape of the through
Since the cross-sections of the
10 is a perspective view of the roughing unit wheel (eg, 330-2) shown in FIG. 3. Referring to FIG. 10, the roughing unit wheel (eg, 330-2) includes a
The through groove 510-1 penetrates the roughing unit wheel (eg, 330-2) in the
For example, the through groove 510-1 axially 701 the
The
11 is a perspective view of the
The
A plurality of unit wheels 330-1 to 330-n, where n> 1 by being coupled to each other by the
Since the embodiment has a structure in which the plurality of unit wheels 330-1 to 330-n, a natural number of n> 1, is individually coupled to the
In addition, the embodiment may vary the groove shape and the roughness of each of the plurality of unit wheels 330-1 to 330-n, and n> 1, so that grooves having different shapes and roughness can be selectively configured according to a user's request. Various notch wafers can be processed by one notch wheel, and specifications of various products can be realized on a single device.
Features, structures, effects, and the like described in the above embodiments are included in at least one embodiment of the present invention, and are not necessarily limited to only one embodiment. Further, the features, structures, effects, and the like illustrated in the embodiments can be combined and modified by other persons having ordinary skill in the art to which the embodiments belong. Therefore, it should be understood that the present invention is not limited to these combinations and modifications.
10: control cabinet, 12: device bed
14: platform 16: base
18: first support 19: second support
24: work head 28: first spindle drive
30: vacuum chuck 32: grinding wheel
38: bearing assembly 40: electric motor
44: reinforcing plate 52: second spindle drive
57: notch spindle 210: notch wheel
310: body 320: coupling protrusion
330-1 to 330-n: unit wheels 340: coupling fixing portion
Claims (10)
A coupling protrusion provided at one end of the body;
A plurality of unit wheels inserted into the joining protrusions and having grooves for processing the notches of the wafer; And
A notch wheel that engages with one end of the engagement protrusion and engages the plurality of unit wheels to secure the engagement protrusion.
The notch wheel of each of the plurality of unit wheels is removable from the engaging projection.
Notch wheel in the shape of a polyhedron with polygonal cross section.
The coupling protrusion is a polyhedron cross-sectional cross-sectional notch wheel.
The notch wheel of each of the plurality of unit wheels is provided with a through groove into which the engaging projection is inserted.
The notch wheel is provided with an insertion groove to which one end of the coupling protrusion is inserted and coupled.
Outer peripheral surfaces spaced apart from each other and curved; And
A first inner side and a second inner side positioned between the outer circumferential surfaces,
The notch wheel is perpendicular to the first inner side and the second inner side.
One end of the coupling protrusion is provided with a first thread,
The notch wheel is provided on the inner surface of the insertion groove is provided with a second screw thread that is fastened to the first screw thread.
Including roughing unit wheels and grinding unit wheels,
The grooves of each of the roughing unit wheel and the grinding unit wheel may be different materials, or may have different roughness or hardness.
A notch grinding spindle coupled to the notch wheel; And
A spindle drive for rotating the notch grinding spindle,
The notch wheel,
The grinding device which is the notch wheel in any one of Claims 1-9.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020110097987A KR20130034127A (en) | 2011-09-28 | 2011-09-28 | A wafer notch wheel and an apparatus for grinding a wafer notch |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020110097987A KR20130034127A (en) | 2011-09-28 | 2011-09-28 | A wafer notch wheel and an apparatus for grinding a wafer notch |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20130034127A true KR20130034127A (en) | 2013-04-05 |
Family
ID=48436286
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020110097987A KR20130034127A (en) | 2011-09-28 | 2011-09-28 | A wafer notch wheel and an apparatus for grinding a wafer notch |
Country Status (1)
Country | Link |
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KR (1) | KR20130034127A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108067975A (en) * | 2016-11-17 | 2018-05-25 | 扬明光学股份有限公司 | Combined type emery wheel |
CN110281105A (en) * | 2019-07-24 | 2019-09-27 | 蓝思科技股份有限公司 | A kind of mill skin polissoir and mill skin polishing rod |
-
2011
- 2011-09-28 KR KR1020110097987A patent/KR20130034127A/en not_active Application Discontinuation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108067975A (en) * | 2016-11-17 | 2018-05-25 | 扬明光学股份有限公司 | Combined type emery wheel |
CN110281105A (en) * | 2019-07-24 | 2019-09-27 | 蓝思科技股份有限公司 | A kind of mill skin polissoir and mill skin polishing rod |
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