KR20120132107A - Apparatus and method for depositing antifouling material by using continuous process - Google Patents

Abstract

PURPOSE: An apparatus and a method for depositing an antifouling material using a continuous process are provided to arrange materials to be deposited with antifouling materials so that the materials can be attached and detached easily and to continuously process a small amount of materials within a short time. CONSTITUTION: An apparatus for depositing an antifouling material comprises a vacuum chamber(300), an electrode unit(400), a power unit(500), a gas injection unit(200), and a processed material transfer unit(100). The electrode unit is arranged inside the vacuum chamber and generates plasma with power supplied from the power unit. The gas injection unit supplies gaseous antifouling materials to the vacuum chamber. The processed material transfer unit is arranged in the lower side of the vacuum chamber to hold and move materials to be processed.

Description

Contaminant deposition equipment and deposition method capable of continuous process {APPARATUS AND METHOD FOR DEPOSITING ANTIFOULING MATERIAL BY USING CONTINUOUS PROCESS}

The present invention relates to an apparatus for depositing an antifouling material and a deposition method capable of a continuous process, and more particularly, to supply an antifouling material in the form of a gas during a process, and to arrange the processed material at the bottom in an easily removable form. The present invention relates to an apparatus for depositing an antifouling material and a deposition method.

In recent years, the mobile phone market has become a dominant smartphone, and as the use of smart phones increases, the input device of the mobile phone is being replaced by a touch screen in the existing keypad.

Touch-screen refers to a screen that receives input by a fingertip or other object of the person touching the screen without using a keyboard. The touch-screen receives information by touching a finger directly on the screen. There is a problem that can be easily contaminated, and there is a problem that the high frequency of contact with the surrounding environment may cause contamination such as scratches by the surrounding environment.

Accordingly, it is necessary to deposit a material for preventing the contamination of the touch screen on the touch screen. In the past, an electron beam deposition method or a filament thermal deposition method was used as a method for depositing such a pollution prevention material.

First, the electron beam deposition method refers to a method of depositing an antifouling material by irradiating an electron beam and heating the pellet containing the antifouling material.

In addition, the filament thermal evaporation method means a method of depositing an antifouling material by heating a pellet containing the antifouling material with a plurality of filaments.

However, the electron beam deposition method and the filament thermal deposition method has a disadvantage in that the pellets must be supplied manually in every process because the pollution prevention material must be supplied in pellet form. In addition, due to the structure of the deposition method it is difficult to place the product at the bottom was required a separate method for fixing the product and there was a problem that makes the automation difficult.

Therefore, with respect to the deposition of the antifouling material, the manual feeding process of the pellets is not necessary, and the development of the antifouling material deposition apparatus and the deposition method which can place the deposition treatment at the bottom and can be connected with other processes is required. It is required.

Contamination preventing material deposition apparatus and deposition method capable of a continuous process according to the present invention is to make it possible to continuously supply the antifouling material in the form of gas during the process of the deposition process of the antifouling material.

In addition, the deposition apparatus and the deposition method of the anti-fouling material capable of a continuous process according to the present invention is to make it possible to arrange the processed material on which the anti-fouling material is deposited in a form that can be easily detached to the lower end.

In addition, the deposition apparatus and the deposition method of the anti-fouling material capable of a continuous process according to the present invention is to facilitate the in-line of the process of depositing the anti-fouling material and other processes.

In addition, the deposition apparatus and the deposition method of the anti-pollution material capable of continuous processing according to the present invention is to enable the configuration of the process even in the form capable of continuously processing a small amount of the processed material in a short time. .

In order to solve the above problems, the apparatus for depositing an anti-pollution material in a continuous process according to the present invention includes a vacuum chamber including a plasma generation region; An electrode part disposed inside the vacuum chamber and configured to generate electric power by receiving electric power; A power supply unit supplying power to the electrode unit; A gas injection unit supplying the antifouling material to the vacuum chamber in the form of a gas; And a treatment material transfer part disposed under the vacuum chamber facing the electrode portion and fixed to the treatment material and then moved to fix the treatment material, and supply the pollution prevention material deposited in the form of a gas. The deposited material may be disposed under the vacuum chamber.

In addition, the contamination prevention material deposition apparatus capable of a continuous process according to the present invention, characterized in that the workpiece transfer unit, the reciprocating movement in a straight direction during the deposition process.

In addition, a pollution prevention material deposition apparatus capable of a continuous process according to the present invention, the gas injection unit for supplying the gas in the form of a gas by vaporizing the pollution prevention material; And a gas nozzle for supplying the antifouling material into the vacuum chamber.

In addition, the pollution prevention material deposition apparatus capable of a continuous process according to the present invention, the pollution prevention material is characterized in that the fluorosilane (fluorosilane).

In addition, the contamination prevention material deposition apparatus capable of a continuous process according to the present invention, the treatment is characterized in that the glass (glass).

In addition, the pollution prevention material deposition apparatus capable of a continuous process according to the present invention, characterized in that for supplying a gas containing silicon before the gas injection unit supplies the pollution prevention material.

In addition, the contamination prevention material deposition apparatus capable of a continuous process according to the present invention is characterized in that the gas containing silicon is silane (silane), HMDSO (Hexamethyldisiloxane), TEOS (Tetraethyl orthosilicate) or TMOS (Tetramethylorthosilicate).

In addition, according to the present invention, the apparatus for depositing an anti-pollution material according to the present invention may include the electrode part having a plurality of electrode rods and the power supply part having an alternating current power supply, so that discharge is prevented between the electrode part and the workpiece transfer part. It is characterized by not being made.

In addition, in the contamination prevention material deposition apparatus capable of a continuous process according to the present invention, the electrode portion is configured in the form of a mesh electrode (mesh electrode), the workpiece conveying portion is fixed inside the vacuum chamber, the gas injection portion is moved Characterized in that it can.

In addition, the contamination prevention material deposition apparatus capable of a continuous process according to the present invention, the vacuum chamber separated from the pre-treatment chamber; And a chamber gate connecting the vacuum chamber and the pretreatment vacuum chamber and allowing the processing unit to pass therethrough.

In addition, according to the present invention, the apparatus for depositing an antifouling material in a continuous process may include depositing a silicon dioxide (SiO ₂ ) layer in the pretreatment vacuum chamber and depositing the antifouling material in the pretreatment vacuum chamber. Characterized in that.

And, in order to solve the above problems, the method for depositing a pollution-preventing material which can be a continuous process according to the present invention, the process of the processing unit is fixed to the processing unit is disposed under the vacuum chamber; Generating a plasma inside the vacuum chamber, thereby plasma treating the surface of the workpiece; Supplying a gas injector to the inside of the vacuum chamber to prevent contamination of a gas; And depositing the antifouling material on the surface of the workpiece while moving the workpiece transfer part, and supplying the antifouling material to be deposited in a gaseous form, and providing a treatment material on which the antifouling material is deposited. Characterized in that it can be arranged in a movable form on the lower end of the vacuum chamber.

In addition, the method for depositing the anti-pollution material capable of the continuous process according to the present invention is characterized in that the treated material is glass.

In addition, according to the present invention, a method for depositing a contaminant-resistant material according to the present invention may include supplying a gas containing silicon into a vacuum chamber and generating a plasma after the plasma treatment of the surface of the glass. And depositing a silicon dioxide (SiO ₂ ) layer, wherein the antifouling material is deposited on the silicon dioxide (SiO ₂ ) layer.

In addition, the method for depositing an antifouling material in a continuous process according to the present invention is characterized in that a reaction catalyst is added to accelerate the deposition of the antifouling material on the silicon dioxide (SiO ₂ ) layer.

In addition, the method for depositing a contaminant preventable material according to the present invention is characterized in that the contaminant preventive material is fluorosilane.

Contamination preventing material deposition apparatus and deposition method capable of a continuous process according to the present invention, it is possible to continuously supply the anti-fouling material used during the process in the form of gas. Therefore, unlike the pellet-type feeding method used in the prior art, the process of manually supplying the pellets is not required in every process, and the control of the pollution prevention material supplied is possible, so that the amount of treatment material and the treatment speed at which the pollution prevention material is deposited is increased. Adjustable

In addition, the deposition apparatus and the deposition method of the anti-fouling material capable of a continuous process according to the present invention, it is possible to arrange the processed material on which the anti-fouling material is deposited in a form that can be easily removable. Therefore, it is difficult to place the processing material at the bottom due to the structure of the deposition method, and unlike the conventional method that required a separate method of fixing the product, the automation is easy.

In addition, the deposition apparatus and the deposition method of the anti-fouling material capable of a continuous process according to the present invention can facilitate the in-line of the process of depositing the anti-fouling material and other processes. Therefore, it is easy to automate in conjunction with other processes and improve the efficiency of product production.

In addition, the deposition apparatus and the deposition method of the anti-fouling material capable of a continuous process according to the present invention can enable the configuration of the process even in the form that can continuously process a small amount of the processed material in a short time. Therefore, it is easy to link with other processes, and the equipment can be configured in a small size, thus making efficient use of space.

1 is a block diagram showing a configuration of a pollution prevention material deposition apparatus capable of a continuous process according to an embodiment of the present invention.
Figure 2 is a block diagram showing the configuration of a pollution preventing material deposition apparatus capable of a continuous process according to another embodiment of the present invention.
Figure 3 is a block diagram showing the configuration of a pollution prevention material deposition apparatus capable of a continuous process according to another embodiment of the present invention.
4 is a block diagram showing a configuration of an apparatus for depositing an anti-pollution material in a continuous process according to still another embodiment of the present invention, different from FIG. 3.
5 is a flowchart illustrating a method for depositing an antifouling material capable of a continuous process according to the present invention.

Hereinafter, with reference to the accompanying drawings will be described an apparatus and a method for depositing a pollution prevention material capable of a continuous process according to the present invention. The embodiments are provided so that those skilled in the art can easily understand the technical spirit of the present invention, and thus the present invention is not limited thereto. In addition, matters represented in the accompanying drawings may be different from the form actually embodied in the schematic drawings in order to easily explain the embodiments of the present invention.

Hereinafter, referring to FIG. 1, a contamination prevention material deposition apparatus capable of a continuous process according to an exemplary embodiment of the present invention will be described in detail.

1 is a block diagram showing the configuration of a pollution prevention material deposition apparatus capable of a continuous process according to an embodiment of the present invention.

Referring to FIG. 1, the apparatus for depositing an antifouling material in a continuous process according to an embodiment of the present invention may include a vacuum chamber 300 including a plasma generating region 700 and an upper portion of the vacuum chamber 300. An electrode unit 400 that receives electric power to generate a plasma, a power supply unit 500 that supplies power to the electrode unit 400, and a gas injection unit that supplies an antifouling substance to the vacuum chamber 300 in the form of a gas And a processing material transfer part 100 disposed below the vacuum chamber 300 facing the electrode part 400 and moving after fixing the processing material 110.

Here, the anti-pollution material is a material that prevents contamination by fingerprints or scratches caused by the surrounding environment, which may occur on the surface of an object, and preferably may occur on the surface of a display device such as a touch screen. Means a material to prevent contamination. Such an antifouling material, preferably fluorosilnae (fluorosilnae) may be composed, typically Dow Corning (Dowcorning) 2634 may be used as an antifouling material.

The gas injection unit 200 is configured to supply a process gas to the vacuum chamber 300, and supplies a gas required for the process and materials to be deposited on the processing 110 in the form of a gas, and in particular, prevents contamination. Characterized in that the material can be supplied in the form of a gas. Therefore, unlike the conventional pellet-type supply, it is possible to continuously supply the antifouling material, it is possible to control the supply of the antifouling material according to the treated material (110).

The gas injection unit 200 may include a gas supply device 210 and a gas nozzle 220. First, the gas supply device 210 may vaporize the antifouling material and supply the gas in the form of a gas. It is a constitution. Here, the vaporization method of the antifouling substance may be supplied by vaporization through a heating method, and any method capable of changing the state of the antifouling substance such as a pressure change as well as the heating method may be used.

 Next, the gas nozzle 220 is configured to supply the pollution prevention material into the vacuum chamber 300 to supply the process gas delivered from the gas supply device 210 to the vacuum chamber 300. It is a configuration that plays a role. The gas nozzle 220 is disposed in the vacuum chamber 300, and is preferably disposed close to the electrode part 400 in order to improve the efficiency of the deposition process.

On the other hand, the pollution prevention material supplied by the gas injection unit 200 may be preferably composed of fluorosilnae (fluorosilnae), typically Dow Corning (Dowcorning) company 2634 can be used as a pollution prevention material.

In addition, when the treatment 110 is glass, silicon dioxide (SiO ₂ ) may be selectively deposited before the deposition of the antifouling material. In this case, the gas injection unit 200 may be deposited. As a result, a gas containing silicon is supplied into the vacuum chamber 300. The silicon-containing gas may be composed of silane, hexamethyldisiloxane (HMDSO), tetraethyl orthosilicate (TEOS), or tetramethylorthosilicate (TMOS) and may be supplied to the vacuum chamber 300 prior to supply of the antifouling material. do.

The workpiece transfer part 100 is equipped with a treatment material 110 on which the antifouling material is deposited, and serves to move the treatment material 110 in the vacuum chamber 300 according to the progress of the process. It is a constitution.

The workpiece transfer part 100 is arranged to be movable in the vacuum chamber 300. Preferably, the workpiece transfer part 100 may be configured to reciprocate in a straight direction during the deposition process. This is because the reciprocating motion can increase the deposition efficiency of the anti-pollution material, and the pollutant can be uniformly formed on the entire surface of the processing material 110.

In addition, the treatment material transfer unit 100 is preferably located under the vacuum chamber 300 in which the deposition process occurs, unlike the conventional method of supplying the antifouling material in the form of pellets the treatment material 110. This is because the lower arrangement of the () is easy. The lower arrangement of the workpiece transporter 100 enables automation of the deposition process in combination with the mobility of the workpiece transporter 100, and enables in-line with other processes such as etching. Let's do it.

The processed material 110 is an object that needs to prevent contamination such as fingerprints or scratches, and may correspond to a display panel or a film. The material of the treatment 110 may be poly ethylene terephthalate (PET), poly carbonate (PC), poly methyl methacrylate (PMMA), and the like. Preferably, the processed material 110 may be made of glass. It may correspond to water 110.

The vacuum chamber 300 is configured to provide a space in which the deposition process is performed, and means a chamber having all or a part of components of the deposition apparatus and having a vacuum inside.

The vacuum chamber 300 may be configured in a form in which the ground line 310 is connected, and the vacuum chamber 300 in which the ground line 310 is connected serves as a ground electrode for generating plasma.

The electrode unit 400 is configured to generate a plasma discharge by receiving power from the power supply unit 500, and is arranged in the vacuum chamber 300 to be electrically connected to the power supply unit 500.

When electric power is supplied to the electrode unit 400 from the power supply unit 500, plasma is generated to generate plasma, which is used to pretreat the treatment 110 before deposition of the antifouling material. Or to deposit other materials prior to the deposition of the antifouling material. Specifically, the treatment 110 is used to improve the contact angle and the contact force of the surface of the treatment 110 by pretreatment with plasma, and before the deposition of the anti-pollution material, another material is PECVD (Plasma Enhanced Chemical Vapor). It is used to deposit through the deposition method.

Meanwhile, the deposition of another material prior to the deposition of the antifouling material may be selectively performed according to the reactivity of the processing material 110 and the antifouling material. Typically, the processing material 110 may be formed of glass ( In the case of glass, a silicon dioxide (SiO ₂ ) layer may be deposited on the treatment 110 prior to the deposition of the antifouling material. This material is first deposited on the treatment 110 to serve to facilitate the deposition of the antifouling material.

The power supply unit 500 is configured to provide power for plasma discharge to the electrode unit 400, and is electrically connected to the electrode unit 400, and supplies power for plasma generation of the electrode unit 400. It is a structure to supply.

The power supply unit 500, the power supply unit 500 may be configured in various forms, such as DC power, MF power, RF power, pulse power, such as to be disposed inside or outside the vacuum chamber 300 Can be.

Salping as described above, according to an embodiment of the present invention, the continuous process is possible pollution prevention material deposition apparatus, it is possible to continuously supply the pollution prevention material used in the process in the form of a gas. Therefore, unlike the pellet-type supply method used in the related art, the process of manually supplying the pellets is not required in every process, and since it is possible to control the supplied antifouling material, Volume and processing speed can be adjusted.

In addition, according to an embodiment of the present invention, the deposition apparatus and the deposition method of the anti-fouling material capable of a continuous process, it is possible to arrange the processed material 110 on which the anti-fouling material is deposited in a form that is easily removable at the lower end. do. Therefore, it is difficult to arrange the treatment 110 in the bottom structure of the deposition method, and unlike the conventional method that required a separate method of fixing the product is easy to automate.

In addition, the deposition apparatus and the deposition method of the anti-fouling material capable of a continuous process, according to an embodiment of the present invention, can facilitate the in-line of the process of depositing the anti-fouling material and other processes. have. Therefore, it is easy to automate in conjunction with other processes and improve the efficiency of product production.

Hereinafter, referring to FIG. 2, an apparatus for depositing an antifouling material capable of performing a continuous process according to another exemplary embodiment of the present invention will be described in detail.

Figure 2 is a block diagram showing the configuration of a pollution preventing material deposition apparatus capable of a continuous process according to another embodiment of the present invention.

Referring to FIG. 2, according to another embodiment of the present invention, in an apparatus for depositing an anti-pollution material in a continuous process, the electrode part 400 may be configured in the form of a plurality of electrode rods, and the power supply part 500 may be an AC power source. Can be configured.

Such a contamination prevention material deposition apparatus capable of a continuous process according to another embodiment of the present invention is different from the disclosed invention of FIG. 1 in that the shape of the electrode unit 400 and the shape of the power supply unit 500 are limited. There is an additional advantage of reducing the damage occurring on the surface of the treatment 110 through the limitation of such components.

Specifically, when the electrode unit 400 is composed of two electrode rods, and the power source unit 500 is configured as an AC power source, preferably MF power source, and then power is applied to the electrode unit 400, plasma generation is performed. The discharge will only occur between the two electrodes. Therefore, the discharge between the processing material transfer part 100 and the electrode part 400 is reduced, and it is possible to prevent damage of the processing material 110 that may be caused by the discharge.

Hereinafter, referring to FIG. 3, an apparatus for depositing an antifouling material capable of performing a continuous process according to another exemplary embodiment of the present invention will be described in detail.

Figure 3 is a block diagram showing the configuration of a pollution prevention material deposition apparatus capable of a continuous process according to another embodiment of the present invention.

Referring to FIG. 3, the apparatus for depositing an anti-fouling material in a continuous process according to another embodiment of the present invention may fix the workpiece transfer part 100 and move the gas nozzle 220 instead. It can be configured as. In addition, the shape of the electrode unit 400 may also be configured in the form of a mesh electrode that can cover the entire carrier to be fixed.

Here, the gas nozzle 220 is deposited by supplying the anti-fouling material in the form of gas delivered from the gas supply device 210 to the treatment 110, and added to the mobility to further deposit the anti-pollution material. Make it uniform. In addition, the mesh electrode may generate a plasma to pretreat the entire fixed treatment 110, and to deposit another material selectively deposited according to reactivity prior to deposition of the antifouling material by PECVD. Is used.

Such a contamination prevention material deposition apparatus capable of a continuous process according to another embodiment of the present invention moves the gas nozzle 220 instead of the workpiece transfer part 100, and forms the electrode part 400. There is a difference from the disclosed invention of Figure 1 in that the mesh (mesh) electrode, through this configuration difference can further obtain the advantage that can reduce the size of the processing equipment (size). This is because it is not necessary to secure a space for the movement of the processing unit 100.

Therefore, the process can be configured in a form that can continuously process a small amount of the processing material 110 in a short time, it is easy to link with other processes, and the equipment can be configured in a small size to efficiently utilize space can do.

Hereinafter, referring to FIG. 4, a contamination prevention material deposition apparatus capable of a continuous process according to another embodiment of the present invention will be described in detail.

4 is a block diagram showing a configuration of an apparatus for depositing an anti-pollution material in a continuous process according to still another embodiment of the present invention, different from FIG. 3.

Referring to FIG. 4, the apparatus for depositing an antifouling material in a continuous process according to another embodiment of the present invention may include a pretreatment vacuum chamber 600 and the vacuum chamber 300 separated from the vacuum chamber 300. A pretreatment vacuum chamber 600 may be connected to the pretreatment vacuum chamber 600, and the chamber transfer part 610 may pass through the processing material transfer part 100. The volume of the vacuum chamber 300 may be changed into the pretreatment vacuum chamber 600. It can be configured to be smaller than the volume of.

Here, the pretreatment vacuum chamber 600 is another vacuum chamber 300 which is separated from the vacuum chamber 300, and is configured to perform processes other than deposition of the antifouling material.

In the pretreatment vacuum chamber 600, the process of plasma treatment of the processing material 110 and the deposition of materials other than the anti-pollution material are typically performed, wherein the pretreatment process of the processing material 110 is The surface of the treatment 110 is activated by plasma to facilitate the deposition of the antifouling material. In addition, the deposition process of the material other than the anti-pollution material is a process that is selectively made according to the reactivity of the processing material 110 and the anti-pollution material, a material that facilitates the deposition of the anti-pollution material is processed ( A process of depositing on the substrate 110, typically, when the treatment 110 is glass, a silicon dioxide (SiO ₂ ) layer may be deposited on the treatment 110 before deposition of the antifouling material. .

The chamber gate 610 is configured to connect the pretreatment vacuum chamber 600 and the spiral vacuum chamber 300, which are configured in a separate form, and are configured to be opened and closed, and the processing material transfer part 100. Is a gate that allows movement between the two chambers.

Such a deposition apparatus capable of a continuous process according to another embodiment of the present invention is configured such that all processes other than the deposition process of the antifouling material are performed in the pretreatment vacuum chamber 600, and the vacuum chamber 300 is provided. In only the deposition process of the antifouling material to be made.

In addition, it is configured to further reduce the volume of the vacuum chamber 300 is made of only the deposition process of the anti-fouling material.

Therefore, the use efficiency of the anti-pollution material can be further increased, and this increase in the use efficiency may act as a big advantage in the process in that the anti-pollution material is an expensive material.

Hereinafter, with reference to Figure 5 will be described in detail a method for depositing a pollution prevention material capable of a continuous process according to the present invention.

For reference, the following sequence of steps S10 to S13 are disclosed for the purpose of illustration, and the technical concept of the method for depositing an anti-pollution material capable of a continuous process according to the present invention may be combined even if the steps S10 to S13 are combined in different orders. This can be achieved.

5 is a flowchart illustrating a method for depositing an antifouling material capable of a continuous process according to the present invention.

Referring to FIG. 5, the method for depositing a contaminant-preventable material in a continuous process according to the present invention may include a step of firstly disposing a workpiece transporter 100 fixing the workpiece 110 under the vacuum chamber 300. (S10)

Here, the workpiece transfer part 100 is equipped with a workpiece 110 on which the antifouling material is to be deposited, and is configured to be movable under the vacuum chamber 300. The linear movement as well as the reciprocation during the deposition process It is preferable to be configured in a form that can even exercise.

In addition, the step S10 may also be configured as a process step that is continuously entered after the processing unit 100 undergoes another process such as etching.

After the step S10, the plasma is generated inside the vacuum chamber 300, and the surface of the processing material 110 mounted on the processing material transfer part 100 is plasma-processed (S11).

The plasma treatment of the surface of the processing material 110 is a process for activating the surface of the processing material 110 to facilitate deposition, and moves the processing material transfer part 100 to the plasma generating area 700. While the process proceeds, it is preferable to proceed with the reciprocating motion after entering the processing unit 100 into the plasma generating region (700).

This is because a uniform plasma treatment may be applied to all of the treatments 110 mounted on the treatment unit 100 through the reciprocating motion of the treatment unit 100.

After the step S11, processes for depositing the antifouling material are performed, and may include a step of selectively depositing another material before the deposition process of the antifouling material in earnest. This is because when the reactivity of the antifouling material and the treatment 110 is not good, it is necessary to form an intermediate layer for deposition between the treatment 110 and the contamination prevention material.

Typically, when the treatment 110 is glass, a silicon dioxide (SiO ₂ ) layer may be formed according to the reactivity of the glass with the antifouling material, in which case silicon dioxide ( The SiO ₂ ) layer is deposited first and then the contaminants are deposited.

The deposition of the silicon dioxide (SiO ₂ ) layer is preferably performed through a chemical vapor deposition (CVP) method such as plasma enhanced chemical vapor deposition (PECVD), specifically, the vacuum chamber 300 The silicon-containing gas is supplied to the silicon and a plasma is generated to deposit a silicon dioxide (SiO ₂ ) layer.

When the surface of the treatment 110 is plasma-treated by the step S11 or an intermediate layer is deposited on the treatment 110 through a selective deposition process, an anti-pollution material in the form of gas into the vacuum chamber 300 is formed. This supply becomes (S12).

That is, the anti-contamination material in the form of gas is not supplied into the vacuum chamber 300 in the form of pellets, but after being evaporated by heating or a change in pressure outside the vacuum chamber 300, the vacuum chamber 300. ) Will be supplied internally.

Here, the antifouling material may be preferably composed of fluorosilnae, and representatively, Dow Corning's 2634 may be used as an antifouling material.

After the step S12, while moving the treatment 110 in the vacuum chamber 300 to deposit the anti-fouling material on the surface of the processing 110, the deposition of the anti-fouling material is a gaseous state The anti-pollution material supplied to reacts with the surface of the processed material 110. (S13)

In this case, it is preferable that the treatment material transfer part 100 for moving the treatment material 110 deposits the anti-pollution material while reciprocating near the gas injection part 200 into which the anti-pollution material is introduced. This is because all the processed materials 110 can be uniformly deposited by such a reciprocating motion.

On the other hand, when the treatment 110 is glass, as described above, silicon dioxide (SiO ₂ ) may be deposited on the glass according to reactivity, in this case, the contamination on the silicon dioxide (SiO ₂ ) layer. A catalyst can be added to accelerate the deposition of the inhibitor. Representatively, ammonia (NH ₃ OH) can be used as such a reaction catalyst, and the reaction of the antifouling material and silicon dioxide (SiO ₂ ) is accelerated by the introduction of this catalyst.

Salping as described above, the method for depositing an antifouling material capable of a continuous process according to the present invention continuously supplies the antifouling material used during the process in the form of a gas. Therefore, unlike the pellet-type supply method used in the related art, the process of manually supplying the pellets is not required in every process, and since it is possible to control the supplied antifouling material, Volume and processing speed can be adjusted.

In addition, according to the present invention, the method for depositing a pollution prevention material capable of a continuous process includes disposing the processed material 110 on which the pollution prevention material is deposited in a form of easily detachable at a lower end thereof. Therefore, it is difficult to arrange the treatment 110 in the bottom structure of the deposition method, and unlike the conventional method that required a separate method of fixing the product is easy to automate.

In addition, the method of depositing an antifouling material capable of a continuous process according to the present invention facilitates in-line formation of a process of depositing an antifouling material with another process. Therefore, it is easy to automate in conjunction with other processes and improve the efficiency of product production.

In addition, in the method for depositing a pollution prevention material that can be continuously processed according to the present invention, the process can be configured even in a form in which a small amount of the processed material 110 can be continuously processed in a short time. This is because it is possible to control and supply the pollutant in the gaseous form according to the treated materials. Therefore, it is easy to link with other processes, and the equipment can be configured in a small size, thus making efficient use of space.

It will be apparent to those skilled in the art that various modifications, additions and substitutions are possible, without departing from the spirit and scope of the invention, , Changes and additions should be considered to fall within the scope of the claims of this patent.

100: processing material transfer unit 110: processing material
200: gas injection unit 210: gas supply device
220: gas nozzle 300: vacuum chamber
310: ground wire 400: electrode portion
500: power supply 600: pretreatment vacuum chamber
610: chamber gate 700: plasma generating region

Claims (16)

A vacuum chamber including a plasma generation region;
An electrode part disposed inside the vacuum chamber and configured to generate electric power by receiving electric power;
A power supply unit supplying power to the electrode unit;
A gas injection unit supplying the antifouling material to the vacuum chamber in the form of a gas; And
A workpiece transfer part disposed below the vacuum chamber and configured to move the fixed workpiece after the workpiece is fixed;
Including,
The pollutant to be deposited may be supplied in the form of a gas, and the treatment material on which the pollutant is deposited may be disposed under the vacuum chamber.
The method of claim 1,
The workpiece transport unit, characterized in that the reciprocating movement in a straight direction during the deposition process, pollution prevention material deposition apparatus.
The method of claim 1,
The gas injection unit,
A gas supply device which vaporizes the pollution prevention material and supplies the gas in the form of a gas; And
A gas nozzle for supplying the antifouling material to the inside of the vacuum chamber;
Characterized in that, comprising a pollution prevention material deposition apparatus.
The method of claim 1,
The antifouling material is characterized in that the fluorosilane (fluorosilane), anti-fouling material deposition apparatus.
The method of claim 1,
And the treated material is glass.
The method of claim 5, wherein
The gas injection unit,
Prior to supplying the antifouling material, characterized in that for supplying a gas containing silicon, antifouling material deposition apparatus.
The method according to claim 6,
The gas containing silicon,
A silane, Hexamethyldisiloxane (HMDSO), Tetraethyl orthosilicate (TEOS) or Tetramethylorthosilicate (TMOS), Anti-pollution material deposition apparatus.
The method of claim 1,
The electrode portion is composed of a plurality of electrode rods,
The power supply unit is composed of an AC power supply,
Discharge between the electrode portion and the workpiece transfer portion, characterized in that the pollution prevention material deposition apparatus.
The method of claim 1,
The electrode portion is configured in the form of a mesh electrode (mesh electrode),
The workpiece transfer part is fixed inside the vacuum chamber,
The gas injection unit, characterized in that the movement, pollution prevention material deposition apparatus.
The method of claim 1,
A pretreatment vacuum chamber separated from the vacuum chamber; And
A chamber gate connecting the vacuum chamber and the pretreatment vacuum chamber and passing through the workpiece transfer part;
Characterized in that, further comprising, pollution prevention material deposition apparatus.
11. The method of claim 10,
The treated material is glass,
In the pretreatment vacuum chamber, depositing a silicon dioxide (SiO ₂ ) layer prior to deposition of the antifouling material.
Disposing the workpiece conveying unit to which the workpiece is fixed, under the vacuum chamber;
Generating a plasma inside the vacuum chamber, thereby plasma treating the surface of the workpiece;
Supplying a gas injector to the inside of the vacuum chamber to prevent contamination of a gas;
Depositing the antifouling material on the surface of the workpiece while moving the workpiece transfer part;
Including,
The contaminant to be deposited may be supplied in a gaseous form, and the treatment material on which the contaminant is deposited may be disposed in a movable form below the vacuum chamber.
13. The method of claim 12,
And the treated material is glass.
The method of claim 13,
After plasma treating the surface of the glass,
Depositing a silicon dioxide (SiO ₂ ) layer inside the vacuum chamber by supplying a gas containing silicon and generating a plasma;
Further comprising:
The antifouling material, characterized in that deposited on the silicon dioxide (SiO ₂ ) layer, anti-fouling material deposition method.
15. The method of claim 14,
In order to accelerate the deposition of the antifouling material on the silicon dioxide (SiO ₂ ) layer, characterized in that the reaction catalyst is added, pollution prevention material deposition method.
13. The method of claim 12,
The antifouling material is characterized in that the fluorosilane (fluorosilane), anti-fouling material deposition method.

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