KR20120081744A - Method for manufacturing patterned phase retardation film without using the mask - Google Patents

Abstract

PURPOSE: A method for manufacturing a patterned phase delay film without a mask is provided to omit a mask process, thereby economically manufacturing a patterned phase delay film. CONSTITUTION: A first alignment layer is rubbed. Second alignment layers are formed on a surface of the first alignment layer at a fixed interval. Light is irradiated onto a substrate(1). The substrate is made of the first and second alignment layers. The second alignment layers are differently aligned from the first alignment layer. Photo curable monomer compositions are coated and hardened on the first and second alignment layers.

Description

Method for Manufacturing Patterned Phase Retardation Film without Using the Mask}

The present invention is a method for producing a patterned phase delay film without using a mask, and more specifically, an alignment material formed by orientation by rubbing and a material formed by orientation by light irradiation are coated in a printing process to obtain a patterned orientation. A method for producing a patterned phase delay film that does not use a mask to form.

As the information society develops, the demand for display devices is increasing in various forms, and various kinds of flat panel display devices have been developed and used. Among them, the liquid crystal display is a flat panel display which is widely used for various purposes. As such, various technical advances have been made in order to serve as a screen display device in various fields, and the goal is to realize high quality images while maintaining the characteristics of light weight, thinness, and low power consumption. Edo is also developing technology. The liquid crystal display includes a twisted nematic (TN) liquid crystal display, a vertically aligned liquid crystal display (VA), an in-plane switching (IPS) liquid crystal display, and an optically compensated bend (OCB) liquid crystal display depending on the arrangement and driving method of the liquid crystal. Etc. In these liquid crystal display devices, the liquid crystals initially form a predetermined array due to the influence of the alignment layer or the properties of the liquid crystal itself, but when the electric field is applied, the arrangement of the liquid crystals is changed. The image is displayed by changing the state depending on the arrangement state of the liquid crystal and making it appear as a difference in the amount of transmitted light using the polarizing plate.

In the birefringent STN-LCD, since the cell itself is birefringent, phase delay (light distortion) occurs in light that has passed through the liquid crystal cell. For this reason, in a STN panel, a phase delay film is used in parallel as a film for color compensation. Phase delay films have been developed initially as optically compensate for STN-specific interference colors (coloring), which are called blue or yellow modes caused by elliptical polarization.In the case of TFT-LCD, phase delay films as color compensation films However, in recent years, various phase delay films have been laminated for the purpose of expanding the viewing angle and improving image quality, and a phase delay film having various functions has been required. As the manufacturing technique of the phase delay film, there are a stretching technique and an alignment technique, and in particular, an alignment technique is necessary to consider all of polarization, reflection, refraction, interference, diffraction, and scattering.

The orientation for determining the initial arrangement of the liquid crystal is mainly performed by rubbing the alignment film in a specific direction using a rubbing method. However, since the rubbing method is a mechanical method, it is difficult to precisely control the initial alignment state of the liquid crystal, and it is difficult to have different pretilts for each minute region. Therefore, in order to solve this problem, an optical alignment method for aligning through light irradiation has been proposed. In this case, it is common to perform two alignment processes to orient the alignment layer of the substrate so as to show different directions for every minute unit area. A mask is used for this process.

That is, in Japanese Patent No. 2650205, first, the rubbing process is performed in one direction, and then the mask is applied in a patterned form, and then the rubbing is performed in a direction opposite to the primary rubbing, so that the opened part of the applied mask is divided into the primary alignment portion. It proposes a technology that can be formed in the opposite direction, in this case, after the first rubbing, a resist is applied to the upper alignment layer and irradiated with light to form a pattern to develop a resist exposed in the pattern. Although the upper alignment layer is etched by the developer, the lower alignment layer is exposed, and second rubbing is performed to form an alignment film oriented in a direction different from the first rubbing, but the process is complicated and is a chemical developer. There is a problem that the alignment performance of the liquid crystal can be lowered by using the, and the finely adhered in the process of attaching the mask in a patterned form To the disadvantage that may be difficult to.

In addition, in Japanese Patent No. 3596727, in a patterned first region and a second region, the first region is first applied with a mask and the second region is exposed, and then first rubbing is performed and the mask is applied. After removal, a method of manufacturing a patterned phase delay film by providing a birefringent layer and performing a second rubbing has been proposed. However, the boundary line between regions having different processing steps and different orientations in patterning a mask may be unclear. There is a disadvantage.

In order to solve this problem, in the present invention, as a result of diligent effort, the orientation is formed by rubbing, and the material which does not change the orientation characteristic formed by the photoalignment and the material capable of photoalignment are printed in a pattern, or by photoalignment When a phase delay film is manufactured by printing a pattern in which a rubbing orientation and a material capable of rubbing orientation are formed as a pattern while the orientation is formed and the rubbing orientation is formed, the process can be simplified without using a mask process. It was confirmed that the phase-delay film with a pattern can be prepared and completed the present invention.

An object of the present invention is to provide a method for producing a patterned phase delay film by a simple process without using a mask.

In order to achieve the above object, (a) forming a first alignment layer on a substrate; (b) rubbing the first alignment layer; (c) forming a second alignment layer on the surface of the first alignment layer at regular intervals; (d) irradiating light onto a substrate formed of the first alignment layer and the second alignment layer to form alignment in the second alignment layer in a direction different from that of the first alignment layer; And (e) coating and curing the photocurable monomer composition on the first alignment layer and the second alignment layer, thereby providing a method of manufacturing a patterned phase delay film without using a mask.

The present invention also provides a method of manufacturing a semiconductor device, the method comprising: (a) forming a first alignment layer on a substrate; (b) irradiating light on the first alignment layer to form alignment; (c) forming a second alignment layer on the surface of the first alignment layer at regular intervals; (d) performing a rubbing process on the substrate including the first alignment layer and the second alignment layer to form alignment in the second alignment layer in a direction different from that of the first alignment layer; And (e) coating and curing the photocurable monomer composition on the first alignment layer and the second alignment layer, thereby providing a method of manufacturing a patterned phase delay film without using a mask.

The present invention also provides a patterned phase delay film produced by the above method.

According to the present invention, a phase delay film is prepared by printing a pattern of a material which is capable of forming an alignment property by rubbing and does not change the orientation characteristic formed by photo-alignment and a material capable of photo-alignment, or by photo-alignment. When a phase delay film is manufactured by printing a pattern of a material which does not change the orientation characteristics formed by rubbing and a material capable of rubbing orientation as a pattern, it is possible to simplify the process without using a mask process. There is an effect that can produce a phase delay film having a pattern formed.

FIG. 1 shows a process diagram of manufacturing a patterned phase delay film without a mask process by photoalignment after rubbing orientation.
FIG. 2 shows a process diagram of manufacturing a patterned phase delay film without a mask process by rubbing orientation after photoalignment.
3 shows a PI alignment layer photo-aligned by the method of Example 1 as a POM image.

Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. In general, the nomenclature used herein and the experimental methods described below are well known and commonly used in the art.

The present invention in one aspect, (a) forming a first alignment film on a substrate; (b) rubbing the first alignment layer; (c) forming a second alignment layer on the surface of the first alignment layer at regular intervals; (d) irradiating light onto a substrate formed of the first alignment layer and the second alignment layer to form alignment in the second alignment layer in a direction different from that of the first alignment layer; And (e) coating and curing the photocurable monomer composition on the first alignment layer and the second alignment layer, and a method of manufacturing a patterned phase delay film without using a mask.

In the present invention, the alignment agent for forming the first alignment layer is characterized in that the alignment characteristic is not affected by light irradiation. If the alignment characteristic of the first alignment layer is affected by light irradiation, the mask must be formed in a pattern shape before the second alignment process to prevent the alignment characteristic of the first alignment layer from changing. Although a further process was required, the present invention not only simplifies the process by omitting such a process, but also allows a fine pattern to be formed by printing a second alignment layer on the first alignment layer.

In the present invention, the substrate of step (a) is selected from the group consisting of COP (cyclo olefin polymer), TAC (triacetyl cellulose), PI (polyimide), PET (polyethylene terephthalate), PES (polyether sulfone) You can do The substrates are transparent materials, exhibit flexible properties, and can be used only in processes below 200 ° C in the case of COP and TAC due to the glass transition temperature of each substrate, and high heat resistance in the case of PI and PES. There is a characteristic that can be used even at high temperatures. In addition, the PET can be used in the process at less than 200 ℃ or more depending on the heat resistance properties, and excellent in chemical resistance. In addition, transparent and hard substrates made of glass may also be used as the substrate of step (a).

In the present invention, the aligning agent for forming the first alignment layer of step (a) is polyimide, polyvinyl alcohol, polyamic acid, polystylene, polyamide (polyamide) and polyoxyethylene (polyoxyethylene) is characterized in that it is selected from the group consisting of compounds. The polyimide is a kind of resin that is durable against high temperature, friction, radiation, and many chemicals. The polyvinyl alcohol is a colorless powder obtained by hydrolyzing polyvinyl acetate (vinyl acetate resin) with a high molecular compound. It melts and does not dissolve in common organic solvents. In addition, the polyamic acid may be obtained by reacting a diamine compound including a triazine group, a diamine component and an acid dianhydride composition.

In the present invention, the alignment agent for forming the first alignment layer of step (a) is characterized in that it is not affected by the orientation characteristics in the photoalignment process. When the alignment agent used is influenced not only by the rubbing process but also by the optical alignment, the first direction may be changed in performing the alignment in a direction different from the first direction in the alignment process of step (d). May not conform to.

In the present invention, the formation of the first alignment layer in the step (a) is spin (comma), gravure (gravure), dip (dip), slot die (slot die), silk screen (silk screen) It may be carried out through a process such as inkjet printing. In the case of polyimide, it is dissolved in a solvent such as γ-Butyrolactone (GBL), 1,2-butylene carbonate (BC) and NMethyl-pyrrolidone (NMP), and the first rotation is performed at 500 to 700 rpm for 20 to 25 seconds. , By rotating the spin coating at 2500 to 3500 rpm for 70 to 80 seconds to form an alignment layer having a thickness of 0.5 to 1.3 μm. After spin coating, in order to remove the solvent of the alignment film and to cure the alignment film, the mixture is left at 75 to 85 ° C. for 1 to 5 minutes and left at 210 to 230 ° C. for 15 to 30 minutes. Conditions for removing the solvent and curing the alignment layer may vary depending on the boiling point and volatility of the solvent used.

In the present invention, the rubbing process of step (b) may be performed at a rotational speed of the rubbing roll at 600 rpm, and after the rubbing process, impurities may occur in the case of impurities remaining in the alignment material. The cleaning process may be performed by soaking the substrate after the rubbing process so that the cleaning agent may flow on the substrate, or immersing the substrate itself in the cleaning agent for 10 seconds to 5 minutes. For example, the cleaning agent may be performed using an alkali solution, deionized water, and propane-2-ol.

In the present invention, the alignment agent for forming the second alignment layer of step (c) may use a polymer material having an orientation force through at least one reaction of photoisomerization, photolysis, and photocuring. Usable aligning agents include polyimide, polyamic acid, polynorbornene, phenylmaleimide copolymer, polyvinylcinamate, polyazobenzene, Polyethyleneimide, Polyvinyl Alcohol, Polyamide, Polyethylene, Polystylene, Polyphenylenephthalamide, Polyester, CMPI (chloromethylated polyimide) ), PVCI (polyvinylcinnamate) and polymethyl methacrylate (polymethyl methacrylate) may be selected from the group consisting of, preferably having a photoreactive functional group. When using CMPI, cyclohexane, dimethyl sulfoxide (DMSO), tetrahydrofuran (THF), dimethylformamide (DMF), NMethyl-pyrrolidone (NMP), or chloroform (CHCl ₃ ) may be used as a solvent. Coating of the alignment layer is made of an interval of 40 ~ 1000㎛ and a thickness of 0.5 ~ 1.3㎛, the thickness can be adjusted according to the viscosity and printing speed of the alignment agent, it is important to print at a constant interval and thickness. After the printing process is finished, in order to remove the solvent (solvent) of the alignment film and to cure the alignment film, it is left for 1 to 5 minutes at 75 ~ 85 ℃, and left for 15 to 30 minutes at 210 ~ 230 ℃. Conditions for removing the solvent and curing the alignment layer may vary depending on the boiling point and volatility of the solvent used.

In the present invention, the formation of the second alignment layer in step (c) may use a printing process such as ink jet, silk-screen, micro gravure, and the like. In addition to the process, photolithography may be used, and other methods may be used in which the alignment agent layer may be formed at a predetermined interval and thickness.

In the present invention, the step of forming the alignment by irradiating the light of the step (d) may be characterized in that the polarization direction of the light is set to be formed in a direction perpendicular to the alignment direction by rubbing. When the orientation directions patterned on the substrate are perpendicular to each other, the completed phase delay film may convert linearly polarized light into left circularly polarized light and right circularly polarized light, and this function may be used as a configuration for implementing a 3D stereoscopic image. In this case, the polarization direction set according to the alignment agent used is different, and in the case of CMPI, since the alignment is formed in the direction orthogonal to the polarization direction, the polarized light is irradiated in a direction parallel to the rubbing direction, and 10 to 50 mW / cm ² . The alignment process may be performed by irradiating the polarized ultraviolet rays in a few tens of seconds (10 to 30 seconds) for a long time (5 to 15 minutes). In addition, the wavelength and the irradiation time of the irradiated light vary depending on the alignment agent, and may be largely classified according to the kind of mechanism of photoalignment (photolysis, photoduplexing, photoisomerization). In the case of the photolysis method, a light alignment process is performed by irradiating light having a wavelength of 200 to 250 nm for 15 to 25 mW / cm ² with polarized ultraviolet rays for 1 to 10 minutes.

In the present invention, the coating of the photocurable monomer composition of step (e) is characterized in that it exhibits a phase delay effect of λ / 4. Λ is a sign indicating a wavelength of light whose phase is to be delayed. The photocurable monomer composition (reactive mesogen; RM) can be carried out by applying a known coating process such as spin, comma, gravure, dip, slot die, silk screen, inkjet printing. When the process is carried out by spin coating, the coating is first rotated for 20 to 25 seconds at 400 to 1000 rpm, and then coated at a thickness of 1 to 6 μm using a method for rotating at 2500 to 3500 rpm for 70 to 80 seconds. After the coating, the curing process is performed by drying at 60 ° C. for 1 minute and irradiating with 20 mW / cm ² ultraviolet rays for 1 minute. These conditions vary depending on the characteristics of the RM material.

Since the RM layer exhibits a phase delay effect of λ / 4, the linearly polarized light can be changed into circularly polarized light. When the alignment direction of the patterned alignment layer is perpendicular to each other, the light passing through the RM layer may be polarized into left circularly polarized light and right circularly polarized light. Accordingly, the 3D stereoscopic image may be realized when the right eye image and the left eye image are transmitted to the left circularly polarized light and the right circularly polarized light, respectively, and the image is viewed through glasses that can pass only one circularly polarized light.

The phase delay effect of the RM layer may depend on the film thickness, the alignment state of the alignment layer, and the composition of the RM material. Changing these parameters may control the structure of the optical film, for example, the inclination angle and the degree of change thereof. RM is a liquid crystalline compound having a polymerizable group, and in particular, may have an acrylic group, a vinyl ether group, or an epoxide functional group, and the composition mixture of RM may have two or more polymerizable functional groups, for example, to increase crosslinking of the polymer. For example, polymerizable mesogenic compounds having monoreactive to direactive and / or nonpolar to polar compounds may be used in combination, and the alignment profile may be altered by changing their composition ratio. The curing conditions of the RM can be changed by the reactivity of the RM material, the thickness of the coating layer, the polymerization initiator, and the output of the UV lamp. The photopolymerization initiator may be appropriately selected according to the RM, and in the case of polymerization using UV light, a radical-producing photoinitiator which decomposes by UV irradiation and initiates a polymerization reaction, for example, a commercially available photoinitiator Irgacure 651 may be used. On the other hand, in the case of having a vinyl and an epoxide polymerizable group, a cationic photoinitiator may be used which photocures using a cation instead of a radical.

1 is a method of manufacturing a patterned retardation film according to an embodiment of the present invention after forming a first alignment layer on a substrate, so that the orientation appears by rubbing, the second alignment layer on the first alignment layer at regular intervals Forming and performing a process to show the orientation by light irradiation, and the step of coating and curing the photocurable monomer composition on the first alignment film and the second alignment film.

In another aspect, the present invention, (a) forming a first alignment layer on the substrate; (b) irradiating light on the first alignment layer to form alignment; (c) forming a second alignment layer on the surface of the first alignment layer at regular intervals; (d) performing a rubbing process on the substrate including the first alignment layer and the second alignment layer to form alignment in the second alignment layer in a direction different from that of the first alignment layer; And (e) coating and curing the photocurable monomer composition on the first alignment layer and the second alignment layer, and a method of manufacturing a patterned phase delay film without using a mask.

In the present invention, the alignment layer for forming the first alignment film is characterized by not being affected by the orientation characteristic by rubbing. When the orientation characteristic of the first alignment layer is affected by rubbing, the mask is formed in a pattern shape before the second alignment process to prevent the orientation characteristic of the first alignment layer from changing, thus forming and removing the mask. In addition to this, the present invention omitted the above-mentioned process to simplify the process as well as to form a fine pattern by printing the second alignment layer on the first alignment layer.

In the present invention, the alignment agent forming the first alignment layer of step (a) may use a polymer material having an orientation force through at least one reaction of photoisomerization, photolysis, and photocuring. Usable aligning agents include polyimide, polyamic acid, polynorbornene, phenylmaleimide copolymer, polyvinylcinamate, polyazobenzene, polyethyleneimide, polyimide Polyvinyl alcohol, polyimide, polyethylene, polystylene, polyphenylenephthalamide, polyester, CMPI (chloromethylated polyimide), PVCI (polyvinylcinnamate) and It can be selected from the group consisting of polymethyl methacrylate, and when using CMPI, cyclohexane, dimethyl sulfoxide (DMSO), tetrahydrofuran (THF), dimethylformamide (DMF), and NMP are used as solvents. (NMethyl-pyrrolidone) and chloroform (CHCl ₃ ) can be used. The photo-alignment agent is characterized in that it is not affected by the orientation characteristics in the rubbing alignment process, which is the first in the alignment process of step (d) when the alignment agent used is affected by the rubbing process as well as the photoalignment process This is because the first direction may be changed when the second direction is oriented in a direction different from the direction, which may not correspond to the object of the present invention.

In the present invention, the formation of the first alignment layer in the step (a) is spin (comma), gravure (gravure), dip (dip), slot die (slot die), silk screen (silk screen) It may be carried out through a process such as inkjet printing.

In the present invention, the step of forming the alignment by irradiating the light of the step (b) is a polarization direction is set according to the alignment agent used, and in the case of CMPI, the alignment is formed in a direction orthogonal to the polarization direction The polarized light in the direction perpendicular to the direction, and irradiated with 10 ~ 50mW / cm ² polarized UV light in a few tens of seconds (10 to 30 seconds) to a long time (5 to 15 minutes) to perform the alignment process Can be. In addition, the wavelength and the irradiation time of the irradiated light vary depending on the alignment agent, and may be largely classified according to the kind of mechanism of photoalignment (photolysis, photoduplexing, photoisomerization). In the case of the photolysis method, a light alignment process may be performed by irradiating light having a wavelength of 200 to 250 nm for 15 to 25 mW / cm ² with polarized ultraviolet light for 1 to 10 minutes.

In the present invention, the alignment agent for forming the second alignment layer of the step (c) is polyimide, polyimide compound, poly vinyl alcohol, polyamic acid, polyamic acid, poly styrene ( It may be characterized in that it is selected from the group consisting of polystylene), polyamide (polyamide) and polyoxyethylene (polyoxyethylene) compound.

In the present invention, the process of forming the second alignment layer of step (c) may be performed through a process such as gravure, silk screen, inkjet printing, photolithography It is possible to use

In the rubbing process of the step (d) in the present invention may be characterized in that the polarization direction of the light is set to be formed in a direction perpendicular to the optical alignment direction. When the orientation directions patterned on the substrate are perpendicular to each other, the completed phase delay film may convert linearly polarized light into left circularly polarized light and right circularly polarized light, and this function may be used as a configuration for implementing a 3D stereoscopic image.

2 is a method of manufacturing a patterned retardation film according to an embodiment of the present invention, after forming a first alignment layer on a substrate, the alignment is shown by light irradiation, and a second alignment layer is fixed on the first alignment layer. Forming at intervals to perform a process to show the orientation by rubbing, and the step of coating and curing the photocurable monomer composition on the first alignment layer and the second alignment layer.

The present invention also provides a patterned phase delay film that does not use a mask produced by the above method in another aspect.

Hereinafter, the present invention will be described in more detail with reference to Examples. These examples are only for illustrating the present invention, and it will be apparent to those skilled in the art that the scope of the present invention is not to be construed as being limited by these examples.

Photo-alignment  Confirmation of the aligning agent not affected by the orientation direction

After cutting and fixing the PI film to a size of 5 x 5 cm, the polyimide as a rubbing alignment agent was dispersed in NMP solvent as a solvent, and 2 ml was dropped, and the thickness was reduced through a spin coating process of rotating 23 seconds at 600 rpm and rotating 70 seconds at 3000 rpm. A PI alignment film having a thickness of 1 μm was formed. The solvent of the PI alignment layer was evaporated and cured by leaving it at 80 ° C. for 1 minute and at 220 ° C. for 20 minutes.

Polyimide, a rubbing alignment agent, was irradiated with polarized ultraviolet rays of 20 mW / cm ² for about 5 minutes to the PI alignment layer to confirm that the alignment characteristics were not changed by photo alignment. The film subjected to the photoalignment process was observed with a polarized optical microscope (POM) to confirm whether the alignment direction was formed by the photoalignment of the PI alignment layer.

3 is a POM image of a film subjected to a photoalignment process according to the present embodiment. As shown in FIG. 3, it was confirmed that the PI alignment layer does not exhibit a specific alignment direction even after performing the photo alignment process.

Without mask process Loving  After orientation Optically Patterned  Manufacture phase delay film

After the PI film was cut out to a size of 6.5 × 6.5 cm and fixed, the polyimide, an aligning agent, which was confirmed as not affected by the orientation direction by photo-alignment in Example 1 was dispersed in 2 ml of NMP solvent, which was added as a solvent, and dropped at 600 rpm. A PI alignment layer (first alignment layer) having a thickness of 1 μm was formed through a spin coating process of rotating at 70 seconds at an initial rotation and 3000 rpm. In order to evaporate and cure the solvent of the first alignment film, the solvent was placed at 80 ° C. for 1 minute and at 220 ° C. for 20 minutes, and then a rubbing process was performed at a rotational speed of 600 rpm for one direction.

Chromiumtylated polyimide (CMPI) dispersed in Cyclohexanone was printed on the surface of the first alignment layer in which the alignment was formed through a rubbing process at a speed of 20 mm / min to form a second alignment layer having a thickness of 1 μm at intervals of 400 μm.

In order to evaporate the solvent of the second alignment film (50 nm of the thickness of the second alignment film after solvent evaporation) and to cure for 1 minute at 80 ° C. and 20 minutes at 220 ° C., rubbing of the first alignment film to the printed second alignment film The polarized light was irradiated so that orientation was formed in the direction orthogonal to the orientation direction formed by. In the CMPI used in this embodiment, since orientation is formed in a direction perpendicular to the polarization direction of light, the polarized light was irradiated in a direction parallel to the rubbing direction, and the optical alignment process was performed by irradiating polarized ultraviolet rays of 20 mW / cm ² for about 5 minutes. Was performed. After performing the photo-alignment process, 5 ml of RM (RMS03-013C, Merck) was added dropwise, and an RM layer having a thickness of 3 μm was formed through spin coating which rotates 23 seconds at 600 rpm and 70 seconds at 3000 rpm. The patterned phase delay film was prepared by curing the RM layer through 1 minute drying at 60 ° C. and 1 minute ultraviolet irradiation at 20 mW / cm ² .

Without mask process Optical orientation  after Loving  In orientation Patterned  Manufacture phase delay film

After cutting and fixing the PI film to a size of 6.5 x 6.5 cm, 2 ml of CMPI, which is a photo-alignment agent, was dispersed in cyclohexanone as a solvent and added dropwise, and the thickness was reduced by spin coating process which rotates 23 seconds at 600 rpm and 70 seconds at 3000 rpm. A first alignment film having a thickness of 1 μm was formed.

In order to evaporate and cure the solvent of the first alignment layer, the solvent was placed at 80 ° C. for 1 minute and at 220 ° C. for 20 minutes, followed by irradiation of polarized ultraviolet rays of 20 mW / cm ² for 5 minutes to perform a photo alignment process.

Polyimide dispersed in NMP was printed on the surface of the first alignment layer in which alignment was formed through a photo alignment process at a speed of 20 mm / min to form a second alignment layer having a thickness of 1 μm at intervals of 400 μm.

In order to evaporate and cure the solvent of the second alignment layer, the solvent was placed at 80 ° C. for 1 minute and at 220 ° C. for 20 minutes (the thickness of the second alignment layer was 50 nm after solvent evaporation), and the light of the first alignment layer was printed on the printed second alignment layer. The rubbing process was performed in one direction at a rotational speed of 600 rpm so that the orientation was formed in the direction orthogonal to the orientation direction formed by the orientation.

After performing the rubbing process, RM (RMS03-013C, Merck) was added dropwise 3m, and after forming a RM layer having a thickness of 3㎛ through spin coating to rotate 23 seconds at 600rpm and 70 seconds at 3000rpm, The patterned phase retardation plate was prepared by curing the RM layer by drying at 60 ° C. for 1 minute and irradiating ultraviolet light at 20 mW / cm ² for about 1 minute.

1: substrate
2: coating and curing of the first alignment layer
3: rubbing orientation
4: second alignment film printing
5: Orientation (Front Exposure)
6: RM coating and curing
10: substrate
20: coating and curing of the first alignment layer
30: optical orientation
40: second alignment film printing
50: rubbing orientation (front rubbing)
60: RM coating and curing

Claims (22)

(a) forming a first alignment layer on the substrate;
(b) rubbing the first alignment layer;
(c) forming a second alignment layer on the surface of the first alignment layer at regular intervals;
(d) irradiating light onto a substrate formed of the first alignment layer and the second alignment layer to form alignment in the second alignment layer in a direction different from that of the first alignment layer; And
(e) A method of manufacturing a patterned phase delay film without using a mask comprising coating and curing the photocurable monomer composition on the first alignment layer and the second alignment layer.
The method of claim 1, wherein the alignment agent forming the first alignment layer of step (a) is polyimide, polyvinyl alcohol, polyamic acid, polystylene, poly A method of manufacturing a patterned phase delay film without a mask, characterized in that selected from the group consisting of amide (polyamide) and polyoxyethylene compound.
The method of claim 2, wherein the alignment agent is not affected by the orientation property by a process of irradiating light to form the alignment property.
The method of claim 1, wherein the forming of the first alignment layer in step (a) is performed by spin, comma, gravure, dip, slot die, and silk screen. And a method selected from the group consisting of inkjet printing.
The method of claim 1, wherein the alignment agent for forming the second alignment layer of step (c) is a photoalignment agent.
The method of claim 5, wherein the photo-alignment agent is polyimide, polyamic acid, polynorbornene, phenylmaleimide copolymer, polyvinyl cinamate, polyvinyl cinamate Azobenzene, Polyethyleneimide, Polyvinyl alcohol, Polyimide, Polyethylene, Polystylene, Polyphenylenephthalamide, Polyester , CMPI (chloromethylated polyimide), PVCI (polyvinylcinnamate) and polymethyl methacrylate (polymethyl methacrylate) is a method for producing a patterned phase delay film without a mask, characterized in that selected from the group consisting of.
The method of claim 1, wherein the second alignment layer of step (c) is formed at regular intervals by ink jet, silk-screen, micro-gravure, or photolithography. Method for producing a patterned phase delay film using no mask, characterized in that.
The method of claim 1, wherein the forming of the alignment property by irradiating the light of the step (d) comprises setting the polarization direction of the light so as to be formed in a direction perpendicular to the alignment direction due to rubbing. Method for producing a phase delay film.
The method of claim 1, wherein the light of step (d) is ultraviolet light polarized at 10 to 50 mW / cm ² .
The method of claim 1, wherein the coating of the photocurable monomer composition of step (e) has a phase retardation effect of λ / 4.
The pattern of claim 1, wherein the substrate is selected from a group consisting of cyclo olefin polymer (COP), triacetyl cellulose (TAC), polyimide (PI), polyether sulfone (PES), and glass. Method of producing a phase delay film.
(a) forming a first alignment layer on the substrate;
(b) irradiating light on the first alignment layer to form alignment;
(c) forming a second alignment layer on the surface of the first alignment layer at regular intervals;
(d) performing a rubbing process on the substrate including the first alignment layer and the second alignment layer to form alignment in the second alignment layer in a direction different from that of the first alignment layer; And
(e) A method of manufacturing a patterned phase delay film without using a mask comprising coating and curing the photocurable monomer composition on the first alignment layer and the second alignment layer.
The method of claim 12, wherein the first alignment layer of step (a) is made of polyimide, polyamic acid, polynorbornene, phenylmaleimide copolymer, polyvinyl cinamate, polyazobenzene (polyazobenzene), polyethyleneimide, polyvinyl alcohol, polyamide, polyethylene, polystylene, polyphenylenephthalamide, polyester, Method for producing a patterned phase delay film without a mask, characterized in that consisting of an alignment agent selected from the group consisting of chloromethylated polyimide (CMPI), polyvinylcinnamate (PVC) and polymethyl methacrylate (polymethyl methacrylate).
The method of claim 12, wherein the first alignment layer of step (a) is made of a material that is not affected by the orientation characteristic in the rubbing alignment process.
The method of claim 12, wherein the photo-alignment agent coating of step (a) is spin, comma, gravure, dip, slot die, silk screen and A method for producing a patterned phase delay film without a mask, characterized in that it is carried out through a process selected from the group consisting of inkjet printing.
The method of claim 12, wherein the light of step (b) is ultraviolet light polarized at 10 to 50 mW / cm ² .
The method of claim 12, wherein the alignment agent of step (c) is a rubbing alignment agent printed on the first alignment layer at a predetermined interval.
18. The method of claim 17, wherein the rubbing aligning agent is polyimide, poly vinyl alcohol, polyamic acid, polystylene, polyamide and polyoxyethylene Method for producing a patterned retardation film without using a mask, characterized in that selected from the group consisting of a compound.
The method of claim 12, wherein the alignment agent layer of step (c) is formed at regular intervals by ink jet, silk-screen, micro-gravure or photolithography. Method for producing a patterned phase delay film using no mask, characterized in that.
The method of claim 12, wherein the coating of the photocurable monomer composition of step (e) has a phase retardation effect of λ / 4.
The pattern of claim 12, wherein the substrate is selected from a group consisting of cyclo olefin polymer (COP), triacetyl cellulose (TAC), polyimide (PI), polyether sulfone (PES), and glass. Method of producing a phase delay film.
A patterned phase delay film made by the method of any one of claims 1 to 21.

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