KR20120059276A - Molding device having surface of multi thin film - Google Patents

Molding device having surface of multi thin film Download PDF

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KR20120059276A
KR20120059276A KR1020100120947A KR20100120947A KR20120059276A KR 20120059276 A KR20120059276 A KR 20120059276A KR 1020100120947 A KR1020100120947 A KR 1020100120947A KR 20100120947 A KR20100120947 A KR 20100120947A KR 20120059276 A KR20120059276 A KR 20120059276A
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intermediate layer
crn
substrate
molding apparatus
thin film
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KR1020100120947A
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Korean (ko)
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KR101210118B1 (en
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여인웅
강혁
박상진
곽길호
오윤석
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현대자동차주식회사
현대하이스코 주식회사
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • C23C14/226—Oblique incidence of vaporised material on substrate in order to form films with columnar structure
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3435—Applying energy to the substrate during sputtering
    • C23C14/345—Applying energy to the substrate during sputtering using substrate bias
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/021—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material including at least one metal alloy layer

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Mounting, Exchange, And Manufacturing Of Dies (AREA)

Abstract

PURPOSE: A molding apparatus having a multi-layered surface is provided to ensure improved structural stability and wear resistance because a Mo intermediate layer is formed between a substrate and a CrN-Mo top layer. CONSTITUTION: A molding apparatus having a multi-layered surface comprises a substrate(10), a Mo intermediate layer(20), and a CrN-Mo top layer(30). The Mo intermediate layer is coated on the upper side of the substrate. The CrN-Mo top layer is coated on the upper side of the Mo intermediate layer. The Mo intermediate layer having a thickness of 0.3-0.7μm and a columnar structure is deposited on the substrate with a magnetron sputtering method.

Description

다층 박막의 표면을 가지는 성형 장치 {MOLDING DEVICE HAVING SURFACE OF MULTI THIN FILM}Molding apparatus having a surface of multilayer thin film {MOLDING DEVICE HAVING SURFACE OF MULTI THIN FILM}

본 발명은 다층 박막의 표면을 가지는 성형 장치에 관한 것으로서, 보다 상세하게는, 밀착력 및 내마모성이 우수한 다층 박막의 표면을 가지는 성형 장치에 관한 것이다.
The present invention relates to a molding apparatus having a surface of a multilayer thin film, and more particularly, to a molding apparatus having a surface of a multilayer thin film excellent in adhesion and wear resistance.

일반적으로, 금형 등의 성형 장치의 표면은 내마모성과 고온에서의 부식 저항성이 향상되도록 TiN 및 CrN과 같은 경질 피막 코팅막이 형성된다. 이에, 성형 장치의 표면의 건조마찰계수는 0.4 이상을 가지고, 경도는 1500HV를 가져, 고온 및 고압과 같은 작동 조건에서도 우수한 성능을 가질 수 있다.In general, hard film coating films such as TiN and CrN are formed on the surface of a molding apparatus such as a mold to improve wear resistance and corrosion resistance at high temperatures. Accordingly, the coefficient of dry friction of the surface of the molding apparatus is 0.4 or more, the hardness is 1500HV, it can have excellent performance even in operating conditions such as high temperature and high pressure.

또한, 성형 장치의 표면은 기판과의 밀착성을 향상시키기 위해 TiN 및 CrN과 같은 경질 피막 코팅막과 기판 사이에 Cr, Ti 등의 중간층이 더 형성되어 있다.In addition, the surface of the molding apparatus is further formed with an intermediate layer such as Cr, Ti or the like between the substrate and a hard coating coating film such as TiN and CrN to improve adhesion to the substrate.

그러나, 제품의 요구 사양이 높아지고 제조 환경이 보다 가혹해짐에 따라, 종래 TiN 및 CrN의 경질 피막 코팅막에 있어서 한계가 있다. 즉, 고경도 코팅막의 경우 경도가 높아 내마모성은 우수하나, 마찰계수가 높아 제품 표면에 소착 등이 발생하여 제품 불량률을 높일 뿐만 아니라 치수 품질 문제를 야기하게 된다. However, as the required specifications of the product become higher and the manufacturing environment becomes more severe, there is a limit in the conventional hard coating film of TiN and CrN. In other words, the high hardness coating film has high hardness and excellent wear resistance, but high friction coefficient causes sintering on the surface of the product to increase product defect rate and cause dimensional quality problems.

이러한 문제를 해결하기 위해, CrN 코팅막에 금속 단일체를 도핑하여 In-Situ 공정으로 자기 윤활막을 형성할 수 있는 코팅막 및 중간층 설계 기술에 대한 연구가 이루어지고 있는데, 특히 Cr 및 Ti 등의 물질을 이용한 중간층의 경우 CrN 코팅막에 금속 단일체 도핑시 밀착력 및 코팅막의 물성을 저하시키는 문제점이 있다.
In order to solve this problem, research on coating layer and intermediate layer design technology capable of forming a self-lubricating layer by the in-situ process by doping a metal monolithic layer to the CrN coating layer, in particular, an intermediate layer using a material such as Cr and Ti In the case of the metal monolithic doping on the CrN coating film there is a problem in reducing the adhesion and physical properties of the coating film.

따라서, 본 발명의 목적은 밀착력 및 내마모성이 우수한 다층 박막의 표면을 가지는 성형 장치를 제공하는 것이다. Accordingly, it is an object of the present invention to provide a molding apparatus having a surface of a multilayer thin film excellent in adhesion and wear resistance.

상기 목적은 본 발명의 다층 박막의 표면을 가지는 성형 장치에 따라, 기판과; 상기 기판의 상부면에 코팅된 Mo 중간층과; 상기 Mo 중간층의 상부면에 코팅된 CrN-Mo 탑층에 의해 달성된다.The above object is, according to the molding apparatus having the surface of the multilayer thin film of the present invention, a substrate; A Mo intermediate layer coated on the upper surface of the substrate; It is achieved by a CrN-Mo top layer coated on the top surface of the Mo interlayer.

여기서, 상기 Mo 중간층은 마그네트론 스퍼터링법에 의해 상기 기판에 증착되는 것이 바람직하다.Here, the Mo intermediate layer is preferably deposited on the substrate by a magnetron sputtering method.

이 때, 상기 Mo 중간층의 두께는 0.3 ~ 0.7㎛인 것이 좋다. At this time, the thickness of the Mo intermediate layer is preferably 0.3 ~ 0.7㎛.

상기 Mo 중간층은 주상 조직(columnar structure)을 가지는 것이 바람직하다. The Mo intermediate layer preferably has a columnar structure.

한편, 상기 CrN-Mo 탑층은 마그네트론 스퍼터링법 및 아크 이온 플레이팅법을 사용하여 형성되는 것이 바람직하다.On the other hand, the CrN-Mo top layer is preferably formed using a magnetron sputtering method and an arc ion plating method.

상기 CrN-Mo 탑층은 챔버의 내부 초기 진공압력이 1.0 ~ 5.0 x 10-5 torr이고, 공정 압력이 1.0 ~ 10 x 10-3 torr 조건에서 형성되는 것이 좋다. The CrN-Mo top layer preferably has an initial initial vacuum pressure of 1.0 to 5.0 x 10 -5 torr and a process pressure of 1.0 to 10 x 10 -3 torr in the chamber.

상기 기판의 온도는 300 ~ 400℃이며, 상기 기판에 가해지는 바이어스 전압은 -100 ~ -200V 인 것이 바람직하다. The temperature of the substrate is 300 ~ 400 ℃, the bias voltage applied to the substrate is preferably -100 ~ -200V.

여기서, 상기 Mo 중간층 및 상기 CrN-Mo 탑층의 두께는 1.5 ~ 10㎛인 것이 좋다. Here, the thickness of the Mo intermediate layer and the CrN-Mo top layer is preferably 1.5 ~ 10㎛.

이상 설명한 바와 같이, 본 발명에 따르면, 기판과 CrN-Mo 탑층 사이에 Mo 중간층을 형성함으로써, 종래 CrN 경질 피막 코팅막에 비해 구조 안정성 및 밀착력이 향상될 뿐만 아니라 내마모성이 향상될 수 있는 다층 박막의 표면을 가지는 성형 장치가 제공된다.
As described above, according to the present invention, by forming a Mo intermediate layer between the substrate and the CrN-Mo top layer, the surface of the multilayer thin film that can improve the structural stability and adhesion as well as the abrasion resistance compared to the conventional CrN hard film coating film A molding apparatus having a is provided.

도 1은 본 발명에 따른 성형 장치의 표면을 나타낸 도면.
도 2는 도 1의 CrN-Mo 탑층을 형성할 때 사용되어지는 마그네트론 스퍼터링법과 아크 이온 플레이팅법을 개략적으로 나타낸 도면.
도 3은 본 발명에 따른 성형 장치의 표면을 SEM(전자주사현미경)을 통해 본 조직 사진.
도 4는 본 발명에 따른 성형 장치의 표면을 TEM(투과전자현미경)을 통해 본 조직 사진.
도 5의 (a)는 Cr 중간층 및 CrN 탑층으로 구성된 종래 성형 장치의 표면과 Mo 중간층 및 CrN-Mo 탑층으로 구성된 본 발명에 따른 성형 장치의 표면의 경도를 비교한 도면, (b)는 Cr 중간층 및 CrN 탑층으로 구성된 종래 성형 장치의 표면과 Mo 중간층 및 CrN-Mo 탑층으로 구성된 본 발명에 따른 성형 장치의 표면의 밀착력을 비교한 도면, (c)는 Cr 중간층 및 CrN 탑층으로 구성된 종래 성형 장치의 표면과 Mo 중간층 및 CrN-Mo 탑층으로 구성된 본 발명에 따른 성형 장치의 표면의 내마모성을 비교한 도면.1 shows a surface of a molding apparatus according to the invention;
FIG. 2 schematically illustrates the magnetron sputtering method and the arc ion plating method used when forming the CrN-Mo top layer of FIG. 1. FIG.
Figure 3 is a tissue photograph of the surface of the molding apparatus according to the present invention through an SEM (electron scanning microscope).
Figure 4 is a tissue photograph of the surface of the molding apparatus according to the present invention through a TEM (transmission electron microscope).
Figure 5 (a) is a view comparing the hardness of the surface of the conventional molding apparatus consisting of Cr intermediate layer and CrN top layer and the surface of the molding apparatus according to the invention consisting of Mo intermediate layer and CrN-Mo top layer, (b) is a Cr intermediate layer And a comparison of the adhesion of the surface of the conventional molding apparatus consisting of a CrN top layer and the surface of the molding apparatus according to the present invention consisting of a Mo intermediate layer and a CrN-Mo top layer, (c) is a Comparison of the wear resistance of the surface and the surface of the molding apparatus according to the present invention composed of a Mo intermediate layer and a CrN-Mo top layer.

이하에서는 첨부도면을 참조하여 본 발명에 대해 상세히 설명한다.Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

본 발명에 따른 성형 장치의 표면은, 도 1에 도시된 바와 같이, 기판(10), Mo 중간층(20), CrN-Mo 탑층(30)의 다층 박막으로 이루어진다. As shown in FIG. 1, the surface of the molding apparatus according to the present invention is composed of a multilayer thin film of the substrate 10, the Mo intermediate layer 20, and the CrN-Mo top layer 30.

기판(10)은 Cr-Mo 합금강으로서, 특히 SCM415 합금강을 사용하였다. The substrate 10 was made of Cr-Mo alloy steel, in particular SCM415 alloy steel.

Mo 중간층(20)은 기판(10)의 상부면에 마그네트론 스퍼터링법에 의해 증착되며, 이 때 Mo 중간층(20)의 두께는 0.3 ~ 0.7㎛인 것이 좋다. Mo intermediate layer 20 is deposited on the upper surface of the substrate 10 by the magnetron sputtering method, the thickness of the Mo intermediate layer 20 is preferably 0.3 ~ 0.7㎛.

CrN-Mo 탑층(30)은 Mo 중간층(20)의 상부면에 마그네트론 스퍼터링법 및 아크 이온 플레이팅법을 사용하여 코팅되며, CrN-Mo 탑층(30)을 형성하기 위한 장치는 도 2에 도시된 바와 같다. The CrN-Mo top layer 30 is coated on the top surface of the Mo interlayer 20 using magnetron sputtering and arc ion plating, and the apparatus for forming the CrN-Mo top layer 30 is shown in FIG. same.

이 장치에서 마그네트론 스퍼터의 타겟(target)은 몰리브덴(Mo, 99.9% 이상의 순도)을 사용하였고, 아크 이온 플레이팅의 타겟(target)은 크롬(Cr, 99.9% 이상의 순도)을 사용하였다. 한편, CrN-Mo 탑층(30)은 장치의 챔버 내의 진공 상태를 유지하여 In-Situ 공정으로 Mo 중간층(20)의 상부면에 증착하는데, 이 때 챔버의 내부 초기 진공압력은 1.0 ~ 5.0 x 10-5 torr이고, 공정 압력은 1.0 ~ 10 x 10-3 torr이다. 그리고, 반응 가스로는 아르곤(Argon) 및 질소(Nitrogen)를 사용하였으며, 이 때 기판(10)의 온도는 300 ~ 400℃이며, 기판(10)에 가해지는 바이어스 전압은 -100 ~ -200V이다. In this apparatus, the target of magnetron sputters used molybdenum (Mo, purity of 99.9% or more), and the target of arc ion plating used chromium (Cr, purity of 99.9% or more). Meanwhile, the CrN-Mo top layer 30 is deposited on the upper surface of the Mo intermediate layer 20 by In-Situ process by maintaining the vacuum state in the chamber of the device, wherein the initial initial vacuum pressure of the chamber is 1.0 to 5.0 x 10 -5 torr and the process pressure is 1.0 to 10 x 10 -3 torr. In addition, Argon and Nitrogen were used as the reaction gas. At this time, the temperature of the substrate 10 was 300 to 400 ° C, and the bias voltage applied to the substrate 10 was -100 to -200V.

상기와 같이 기판(10)에 코팅된 Mo 중간층(20) 및 상기 CrN-Mo 탑층(30)의 두께는 1.5 ~ 10㎛으로 이루어진다.
As described above, the thickness of the Mo intermediate layer 20 and the CrN-Mo top layer 30 coated on the substrate 10 is 1.5 to 10 μm.

이러한 구성에 의한 본 발명에 따른 성형 장치의 표면의 조직 사진은 도 3 및 도 4에 도시된 바와 같으며, Mo 중간층(20)은 도 4와 같이 주상 조직(columnar structure)을 가지게 된다. The structure photograph of the surface of the molding apparatus according to the present invention by such a configuration is as shown in Figures 3 and 4, the Mo intermediate layer 20 will have a columnar structure (columnar structure) as shown in FIG.

한편, Cr 중간층 및 CrN 탑층으로 구성된 종래 성형 장치의 표면과 Mo 중간층(20) 및 CrN-Mo 탑층(30)으로 구성된 본 발명에 따른 성형 장치의 표면의 경도, 밀착력, 내마모성을 각각 측정한 결과 도 5의 (a), (b), (c)에 도시된 바와 같이, 본 발명의 다층 박막을 가진 성형 장치의 표면이 월등히 향상되었음을 알 수 있다.
On the other hand, the results of measuring the hardness, adhesion, and wear resistance of the surface of the conventional molding apparatus consisting of Cr intermediate layer and CrN top layer and the surface of the molding apparatus according to the present invention composed of Mo intermediate layer 20 and CrN-Mo top layer 30, respectively. As shown in 5 (a), (b), and (c), it can be seen that the surface of the molding apparatus having the multilayer thin film of the present invention is significantly improved.

이와 같이, 본 발명에 따르면, 기판(10)과 CrN-Mo 탑층(30) 사이에 Mo 중간층(20)을 형성함으로써, 종래 CrN 경질 피막 코팅막에 비해 구조 안정성 및 밀착력이 향상될 뿐만 아니라 내마모성이 향상될 수 있는 효과가 있다.
As such, according to the present invention, by forming the Mo intermediate layer 20 between the substrate 10 and the CrN-Mo top layer 30, not only the structural stability and adhesion but also the abrasion resistance are improved as compared with the conventional CrN hard film coating film. There is an effect that can be.

10 : 기판 20 : Mo 중간층
30 : CrN-Mo 탑층10: substrate 20: Mo intermediate layer
30: CrN-Mo top layer

Claims (8)

기판과;
상기 기판의 상부면에 코팅된 Mo 중간층과;
상기 Mo 중간층의 상부면에 코팅된 CrN-Mo 탑층을 포함하는 것을 특징으로 하는 다층 박막의 표면을 가지는 성형 장치.A substrate;
A Mo intermediate layer coated on the upper surface of the substrate;
Molding apparatus having a surface of a multilayer thin film comprising a CrN-Mo top layer coated on the upper surface of the Mo intermediate layer. 청구항 1에 있어서,
상기 Mo 중간층은 마그네트론 스퍼터링법에 의해 상기 기판에 증착되는 것을 특징으로 하는 다층 박막의 표면을 가지는 성형 장치.The method according to claim 1,
And said Mo intermediate layer is deposited on said substrate by a magnetron sputtering method. 청구항 2에 있어서,
상기 Mo 중간층의 두께는 0.3 ~ 0.7㎛인 것을 특징으로 하는 다층 박막의 표면을 가지는 성형 장치.The method according to claim 2,
The thickness of the Mo intermediate layer is a molding apparatus having a surface of a multi-layer thin film, characterized in that 0.3 ~ 0.7㎛. 청구항 3에 있어서,
상기 Mo 중간층은 주상 조직(columnar structure)을 가지는 것을 특징으로 하는 다층 박막의 표면을 가지는 성형 장치.The method according to claim 3,
And the Mo intermediate layer has a columnar structure. 청구항 1에 있어서,
상기 CrN-Mo 탑층은 마그네트론 스퍼터링법 및 아크 이온 플레이팅법을 사용하여 형성되는 것을 특징으로 하는 다층 박막의 표면을 가지는 성형 장치.The method according to claim 1,
The CrN-Mo top layer is formed by using a magnetron sputtering method and an arc ion plating method. 청구항 5에 있어서,
상기 CrN-Mo 탑층은 챔버의 내부 초기 진공압력이 1.0 ~ 5.0 x 10-5 torr이고, 공정 압력이 1.0 ~ 10 x 10-3 torr 조건에서 형성되는 것을 특징으로 하는 다층 박막의 표면을 가지는 성형 장치.The method according to claim 5,
The CrN-Mo top layer is a molding apparatus having a surface of a multilayer thin film, characterized in that the internal initial vacuum pressure of the chamber is 1.0 ~ 5.0 x 10 -5 torr, the process pressure is formed at 1.0 ~ 10 x 10 -3 torr conditions . 청구항 6에 있어서,
상기 기판의 온도는 300 ~ 400℃이며, 상기 기판에 가해지는 바이어스 전압은 -100 ~ -200V 인 것을 특징으로 하는 다층 박막의 표면을 가지는 성형 장치.The method of claim 6,
The temperature of the substrate is 300 ~ 400 ℃, the bias voltage applied to the substrate is a molding apparatus having a surface of a multilayer thin film, characterized in that -100 ~ -200V. 청구항 1이 있어서,
상기 Mo 중간층 및 상기 CrN-Mo 탑층의 두께는 1.5 ~ 10㎛인 것을 특징으로 하는 다층 박막의 표면을 가지는 성형 장치. The method according to claim 1,
The thickness of the Mo intermediate layer and the CrN-Mo top layer is a molding apparatus having a surface of a multilayer thin film, characterized in that 1.5 ~ 10㎛.
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WO2016105082A1 (en) * 2014-12-23 2016-06-30 주식회사 포스코 Plated steel sheet having excellent adhesion property and manufacturing method therefor

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016105082A1 (en) * 2014-12-23 2016-06-30 주식회사 포스코 Plated steel sheet having excellent adhesion property and manufacturing method therefor
KR20160077455A (en) * 2014-12-23 2016-07-04 주식회사 포스코 Coated steel sheet having excellent adhesion and method for manufacturing the same
CN107109666A (en) * 2014-12-23 2017-08-29 Posco公司 The excellent coated steel sheet of adhesiveness and its manufacture method
EP3239358A4 (en) * 2014-12-23 2018-01-10 Posco Plated steel sheet having excellent adhesion property and manufacturing method therefor
JP2018507320A (en) * 2014-12-23 2018-03-15 ポスコＰｏｓｃｏ Plated steel sheet having excellent adhesion and method for producing the same

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