KR20110074237A - Electrophoretic display device and method for fabricating the same - Google Patents
Electrophoretic display device and method for fabricating the same Download PDFInfo
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- KR20110074237A KR20110074237A KR1020090131145A KR20090131145A KR20110074237A KR 20110074237 A KR20110074237 A KR 20110074237A KR 1020090131145 A KR1020090131145 A KR 1020090131145A KR 20090131145 A KR20090131145 A KR 20090131145A KR 20110074237 A KR20110074237 A KR 20110074237A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/165—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on translational movement of particles in a fluid under the influence of an applied field
- G02F1/166—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on translational movement of particles in a fluid under the influence of an applied field characterised by the electro-optical or magneto-optical effect
- G02F1/167—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on translational movement of particles in a fluid under the influence of an applied field characterised by the electro-optical or magneto-optical effect by electrophoresis
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0412—Digitisers structurally integrated in a display
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- Life Sciences & Earth Sciences (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
Abstract
The present invention relates to an electrophoretic display device and a method of manufacturing the same, the electrophoretic display device according to the present invention includes a thin film transistor and a lower substrate having pixel electrodes connected to the thin film transistor in a matrix form; An electrophoretic display cell unit adhered to the lower substrate and formed of a first common electrode formed on a polyester substrate and an electrophoretic film adhered to the first common electrode; A second common electrode formed on the back surface of the polyester substrate, a plurality of nanowire patterns formed on the second common electrode and spaced apart from each other, a color filter formed on the second common electrode between the plurality of nanowire patterns; It is characterized in that it comprises a touch panel portion consisting of an upper substrate bonded to the polyester substrate.
Description
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrophoretic display device (EPD), and more particularly, to an electrophoretic display device suitable for a color touch EPD using a piezoelectric device and a manufacturing method thereof. .
In general, an electrophoretic display is an image display device using a phenomenon in which colloidal particles move to either polarity when a pair of electrodes to which a voltage is applied is immersed in a colloidal solution. A wide viewing angle, a high reflectance, and a weather without using a backlight are used. It is expected to be spotlighted as an electric paper because it has characteristics such as ease and low power consumption.
Such an electrophoretic display device has a structure in which an electrophoretic film is interposed between two substrates, and at least one of the two substrates must be transparent to display an image in a reflective mode.
When a pixel electrode is formed on a lower substrate of the two substrates and a voltage is applied to the pixel electrode, charged particles in the electrophoretic film move to the pixel electrode side or to the opposite side, whereby a viewing sheet You can see the image through.
Although not shown, a general electrophoretic display device has a structure in which an upper substrate and a lower substrate on which pixel electrodes are formed are disposed to face each other, and an electrophoretic film is interposed between the two substrates.
Here, the electrophoretic film is composed of a solvent (charged) containing charged pigment particles, and made into a microcapsule by a coacervation method, the microcapsules in a binder (binder) The mixture is formed by coating (coating) or laminating (laminating) the base film.
Here, the pigment particles may be colored in different colors, by adding a pigment of B (Black), W (White) to represent the image, the solvent and the binder is formed of a transparent material so that light can pass through do.
Since the electrophoretic film is surrounded by the microcapsule film, the pigment particles can be prevented from moving in an undesired direction by a field of adjacent pixels, thereby realizing better image quality. In this case, a partition wall may be further provided between adjacent pixels to completely block the parasitic field.
In such a general electrophoretic display, when voltage is applied to the pixel electrode, charged pigment particles are moved to an electrode having a polarity opposite to that of the polarity, and a predetermined image is generated according to reflection of light by the pigment particles. Will be displayed.
On the other hand, when moved toward the polarized electrode of the pigment particles, another image is displayed.
Referring to FIG. 1, an electrophoretic display device according to the prior art is as follows.
1 is a schematic cross-sectional view of an electrophoretic display device according to the related art.
As shown in FIG. 1, an electrophoretic display device according to the related art includes: a
Here, the
In addition, a
In addition, a gate wiring (not shown) for transmitting a scan signal and a data wiring (not shown) for transmitting an image data signal are formed on the
In this case, the gate wiring and the data wiring cross each other to define pixels, and each pixel is provided with a thin film transistor T and a storage capacitor (not shown) to control the polarity of the voltage applied to the electrodes and to be applied to the electrodes. It serves to store voltage.
In addition, the
In addition, the
In this case, the
Although not shown, the first
In addition, the third
In this way, the
However, the electrophoretic display device according to the prior art has the following problems.
In the electrophoretic display device according to the prior art, the technical infrastructure (infra) for the touch implementation of the electrophoretic display device (EPD) has been lacking.
In addition, the electrophoretic display according to the related art requires an additional layer to implement a touch of the EPD, thereby increasing the thickness of the electrophoretic display (EPD) and reducing panel characteristics such as color reproducibility and reflectance. . In particular, in the related art, a common electrode and a dot spacer are stacked on a separate touch panel, that is, a PET substrate, and a common electrode is further formed on the rear surface of the upper substrate bonded to the polyester substrate (PET). Since additional layers are required to implement touch in the EPD, not only the thickness of the entire electrophoretic display device but also the panel characteristics such as color reproduction and reflectance are reduced.
In addition, the electrophoretic display device according to the related art is difficult to implement a touch sensitive technology in units of several millimeters because the thickness of the electrophoretic display device is increased by requiring additional layers to implement the touch of the EPD. .
Accordingly, the present invention has been made to solve the above-mentioned problems according to the prior art, an object of the present invention to provide an electrophoretic display device and a method of manufacturing the touch technology that can be implemented without the addition of a separate layer.
In addition, another object of the present invention is to provide an electrophoretic display device and a method of manufacturing the same that can reduce the thickness of the panel by reducing the layer compared to the existing process, and improve the reflectance.
According to an aspect of the present invention, there is provided an electrophoretic display device including: a lower substrate having a thin film transistor and a pixel electrode connected to the thin film transistor in a matrix form; An electrophoretic display cell unit adhered to the lower substrate and formed of a first common electrode formed on a polyester substrate and an electrophoretic film adhered to the first common electrode; A second common electrode formed on the back surface of the polyester substrate, a plurality of nanowire patterns formed on the second common electrode and spaced apart from each other, a color filter formed on the second common electrode between the plurality of nanowire patterns; It is characterized in that it comprises a touch panel portion consisting of an upper substrate bonded to the polyester substrate.
According to an aspect of the present invention, there is provided an electrophoretic display device including: a lower substrate having a thin film transistor and a pixel electrode connected to the thin film transistor in a matrix form; A plurality of partitions formed on the lower substrate to be spaced apart from each other, an electrophoretic layer filled between the plurality of partitions, and disposed on the partition and the electrophoretic layer, the first and second common electrodes are formed on the upper and lower surfaces An electrophoretic display cell unit made of a polyester substrate; And a plurality of nanowire patterns spaced apart from each other on a second common electrode formed on the back of the polyester substrate, a color filter formed between the plurality of nanowire patterns, and an upper substrate bonded to an upper portion of the polyester substrate. Touch panel unit; characterized in that comprises a.
According to an aspect of the present invention, there is provided a method of manufacturing an electrophoretic display device, including forming a thin film transistor and a pixel electrode connected to the thin film transistor in a matrix form on a lower substrate; Forming a first common electrode on a polyester substrate; Adhering an electrophoretic film on the first common electrode; Forming a second common electrode on the back surface of the polyester substrate; Bonding a polyester substrate to which the electrophoretic film is adhered to the lower substrate; Forming a plurality of nanowire patterns spaced apart from each other on the second common electrode; Forming a color filter on a second common electrode between the plurality of nanowire patterns; And bonding the upper substrate to the polyester substrate.
According to an aspect of the present invention, there is provided a method of manufacturing an electrophoretic display device, including forming a thin film transistor and a pixel electrode connected to the thin film transistor in a matrix form on a lower substrate; Forming a plurality of partition walls spaced apart from each other on the lower substrate on which the thin film transistor and the pixel electrode are formed; Forming an electrophoretic layer between the plurality of partition walls; Bonding a polyester substrate having first and second common electrodes formed on upper and lower surfaces of the electrophoretic layer and the partition wall; Forming a plurality of nanowire patterns spaced apart from each other on the second common electrode; Forming a color filter between the plurality of nanowire patterns; And bonding the upper substrate to the upper portion of the polyester substrate.
According to the electrophoretic display and the manufacturing method thereof according to the present invention has the following effects.
The electrophoretic display device and the method of manufacturing the same according to the present invention can reduce the number of layers compared to the existing process, thereby reducing the thickness of the panel, it is possible to improve the reflectance.
In addition, the electrophoretic display device and the method of manufacturing the same according to the present invention can be used in an electrophoretic display device that can realize a color because a cell of a partition structure can be fabricated using a piezoelectric material pattern of nano material. It is possible.
In addition, the electrophoretic display device and a method of manufacturing the same according to the present invention can implement the electrophoretic display device in which the piezoelectric element is in-cellized, and furthermore, the color electrophoretic display device (color EPD). In this case, the cell gap can be configured to be thin to improve image quality.
Hereinafter, an electrophoretic display device according to an exemplary embodiment of the present invention will be described in detail with reference to the accompanying drawings.
2 is a schematic cross-sectional view of an electrophoretic display device having a touch function according to an embodiment of the present invention.
In the electrophoretic display device according to an exemplary embodiment of the present invention, as shown in FIG. 2, a
Here, the
In addition, the
In addition, a gate wiring (not shown) for transmitting a scan signal and a data wiring (not shown) for transferring an image data signal are formed on the
In this case, the gate wiring and the data wiring cross each other to define pixels, and each pixel is provided with a thin film transistor T and a storage capacitor (not shown) to control the polarity of the voltage applied to the electrodes and to be applied to the electrodes. It serves to store voltage.
In addition, the
In addition, although not shown in the drawing, the storage capacitor Cst includes a capacitor upper electrode overlapping the capacitor lower electrode with a capacitor lower electrode and a gate insulating layer interposed therebetween, and the thin film transistor is turned on when the image display is implemented. It maintains the voltage charged in the electrophoretic film in the off section serves to prevent the deterioration of image quality due to parasitic capacitance. In this case, the capacitor lower electrode extends to the outside of the active region to receive a signal, and the capacitor upper electrode is connected to the pixel electrode or the drain electrode to receive a signal.
In addition, the
In this case, the
The
The first
In this way, the
As described above, in the electrophoretic display device according to the present invention, the
A method of manufacturing an electrophoretic display device according to an embodiment of the present invention having the above configuration will be described with reference to FIGS. 3A to 3D.
3A to 3D are cross-sectional views illustrating a manufacturing process of an electrophoretic display device according to an exemplary embodiment.
As shown in FIG. 3A, a metal film (not shown) is first deposited on a
In this case, the metal film material may be selected from Al-based metals such as Al and Al alloys, Ag-based metals such as Ag and Ag alloys, and Mo-based metals such as Mo and Mo alloys, Cr, Ti, and Ta. In addition, they may include two membranes of different material properties, that is, the lower layer and the upper layer thereon. Here, the upper layer is made of a low resistivity metal, for example, an Al-based metal or an Ag-based metal so as to reduce signal delay or voltage drop of the gate wiring.
On the other hand, the lower layer may be made of other materials, particularly materials having excellent physical, chemical and electrical contact properties with indium tin oxide (ITO) or indium zinc oxide (IZO), such as Ti, Ta, Cr, and Mo-based metals. Or an example of the combination of the lower layer and the upper layer is a Cr / Al-Nd alloy.
Subsequently, an inorganic insulating material such as silicon nitride (SiNx) and silicon oxide (SiOx) is deposited on the
Next, although not shown in the drawings, a semiconductor layer (not shown) made of hydrogenated amorphous silicon (hydrogen-nated amorphous silicon) or the like, and silicide or n-type impurities are formed on the
Subsequently, the impurity layer (not shown) and the semiconductor layer (not shown) are selectively patterned by a photolithography process and an etching process to form an
Next, a metal material for forming data wiring is deposited on the
In this case, as the metal material, an Al-based metal, an Ag-based metal, a Mo-based metal, Cr, Ti, Ta, or other materials may be used, and may be formed in multiple layers.
The data line (not shown) is formed to cross the gate line (not shown), and the
Subsequently, an inorganic insulating material or an organic insulating material is deposited on the entire surface of the
Next, a metal material layer (not shown) made of a transparent conductive material such as indium tin oxide (ITO) or indium zinc oxide (IZO) is deposited on the
Therefore, when a data voltage is applied to the
Next, although not shown in the drawing, the
Subsequently, an
Next, the electrophoretic
As shown in FIG. 3B, first, a
In addition, the electrophoretic particles are composed of
Thus, the first
Subsequently, the cover film (not shown) of the electrophoretic
Next, although not shown in the drawings, a process of attaching a protective sheet (not shown) to the rear surface of the electrophoretic
Subsequently, in order to proceed with the process of manufacturing the
Next, as shown in FIG. 3C, a nanowire layer is deposited on the second
Subsequently, red (R), green (G), and
Then, as shown in Figure 3d, by bonding the
In this way, the electrophoretic display and the method of manufacturing the same according to the present invention can reduce the number of layers used in the touch panel as compared to the existing process, thereby reducing the thickness of the panel and improve the reflectance.
In addition, the electrophoretic display device and a method of manufacturing the same according to the present invention can be manufactured using a piezoelectric material pattern of nanomaterials, so that the color filter of the barrier rib structure can be manufactured. Available.
In addition, the electrophoretic display device and a method of manufacturing the same according to the present invention can implement the electrophoretic display device in which the piezoelectric element is in-cellized, and furthermore, the color electrophoretic display device (color EPD). In this case, the cell gap can be configured to be thin to improve image quality.
Meanwhile, an electrophoretic display device according to another embodiment of the present invention will be described with reference to FIG. 4.
4 is a schematic cross-sectional view of an electrophoretic display equipped with a touch panel according to another exemplary embodiment.
As shown in FIG. 4, an electrophoretic display device according to another embodiment of the present invention includes a lower substrate in which a thin film transistor T and
Here, the
In addition, the
In addition, a gate wiring (not shown) for transmitting a scan signal and a data wiring (not shown) for transferring an image data signal are formed on the
In this case, the gate wiring and the data wiring cross each other to define pixels, and each pixel is provided with a thin film transistor T and a storage capacitor (not shown) to control the polarity of the voltage applied to the electrodes and to be applied to the electrodes. It serves to store voltage.
In addition, the
In addition, although not shown in the drawing, the storage capacitor Cst includes a capacitor upper electrode overlapping the capacitor lower electrode with a capacitor lower electrode and a gate insulating layer interposed therebetween, and the thin film transistor is turned on when the image display is implemented. It maintains the voltage charged in the electrophoretic film in the off section serves to prevent the deterioration of image quality due to parasitic capacitance. In this case, the capacitor lower electrode extends outside the active area to receive a signal, and the capacitor upper electrode is connected to the pixel electrode or the drain electrode to receive a signal.
In addition, the
In this case, the
In addition, the
The
In addition, the first
In this way, the
On the other hand, as another embodiment of the present invention, when the
As described above, in the electrophoretic display device according to the present invention, the
On the other hand, the electrophoretic display device manufacturing method according to an embodiment of the present invention having the above configuration will be described with reference to FIGS. 5A to 5F.
5A to 5F are cross-sectional views illustrating a manufacturing process of an electrophoretic display device according to another exemplary embodiment.
As shown in FIG. 5A, a metal film (not shown) is first deposited on a
In this case, the metal film material may be selected from Al-based metals such as Al and Al alloys, Ag-based metals such as Ag and Ag alloys, and Mo-based metals such as Mo and Mo alloys, Cr, Ti, and Ta. In addition, they may include two membranes of different material properties, that is, the lower layer and the upper layer thereon. Here, the upper layer is made of a low resistivity metal, for example, an Al-based metal or an Ag-based metal so as to reduce signal delay or voltage drop of the gate wiring.
On the other hand, the lower layer may be made of other materials, particularly materials having excellent physical, chemical and electrical contact properties with indium tin oxide (ITO) or indium zinc oxide (IZO), such as Ti, Ta, Cr, and Mo-based metals. Or an example of the combination of the lower layer and the upper layer is a Cr / Al-Nd alloy.
Subsequently, an inorganic insulating material such as silicon nitride (SiNx) and silicon oxide (SiOx) is deposited on the
Next, although not shown in the drawings, a high concentration of a semiconductor layer (not shown) and a silicide or n-type impurity are formed on the
Subsequently, the impurity layer (not shown) and the semiconductor layer (not shown) are selectively patterned by a photolithography process and an etching process to form an
Next, a metal material for forming data wiring is deposited on the
In this case, as the metal material, an Al-based metal, an Ag-based metal, a Mo-based metal, Cr, Ti, Ta, or other materials may be used, and may be formed in multiple layers.
The data line (not shown) is formed to cross the gate line (not shown), and the
Subsequently, an inorganic insulating material or an organic insulating material is deposited on the
Next, a metal material layer (not shown) made of a transparent conductive material such as indium tin oxide (ITO) or indium zinc oxide (IZO) is deposited on the
Accordingly, when a data voltage is applied to the
Subsequently, a zinc oxide (ZnO) nanowire material, which is one of piezoelectric materials, or a photosensitive resin, an acrylic resin, a polymer organic material, or a sealant is coated on the
Next, as illustrated in FIG. 5B, a plurality of
Subsequently, as illustrated in FIG. 5C, an electrophoretic material is filled on the
Next, an
Subsequently, as shown in FIG. 5D, a transparent conductive material is deposited on the lower surface of the polyester substrate (PET) 251 to form a first
Next, the process of manufacturing the electrophoretic
Subsequently, as shown in FIG. 5D, in order to proceed with the process of manufacturing the
Next, as shown in FIG. 5E, a nanowire layer is deposited on the second
Subsequently, red (R), green (G), and
Next, as illustrated in FIG. 5F, the
In this way, the electrophoretic display device and the method of manufacturing the same according to another embodiment of the present invention can reduce the number of layers used in the touch panel compared to the existing process, thereby reducing the thickness of the panel and improve the reflectance. .
In addition, the electrophoretic display device and the method of manufacturing the same according to the present invention can be implemented because the electrophoretic display cell portion and the touch panel portion of the barrier rib structure can be manufactured using a piezoelectric material pattern of nano material. Available for electrophoretic display devices.
In addition, the electrophoretic display device and a method of manufacturing the same according to the present invention can implement the electrophoretic display device in which the piezoelectric element is in-cellized, and furthermore, the color electrophoretic display device (color EPD). In this case, the cell gap can be made thinner to improve image quality.
On the other hand, with reference to the accompanying drawings, an electrophoretic display device according to another embodiment of the present invention will be described in detail.
6 is a schematic cross-sectional view of an electrophoretic display device having a touch panel structure according to another embodiment of the present invention.
As shown in FIG. 6, an electrophoretic display device according to an embodiment of the present invention includes a lower substrate having a thin film transistor T and a
Here, the
In addition, a
In addition, a gate wiring (not shown) for transmitting a scan signal and a data wiring (not shown) for transmitting an image data signal are formed on the
In this case, the gate wiring and the data wiring cross each other to define pixels, and each pixel is provided with a thin film transistor T and a storage capacitor (not shown) to control the polarity of the voltage applied to the electrodes and to be applied to the electrodes. It serves to store voltage.
In addition, the
In addition, although not shown in the drawing, the storage capacitor Cst includes a capacitor upper electrode overlapping the capacitor lower electrode with a capacitor lower electrode and a gate insulating layer interposed therebetween, and the thin film transistor is turned on when the image display is implemented. It maintains the voltage charged in the electrophoretic film in the off section serves to prevent the deterioration of image quality due to parasitic capacitance. In this case, the capacitor lower electrode extends outside the active area to receive a signal, and the capacitor upper electrode is connected to the pixel electrode or the drain electrode to receive a signal.
In addition, the
In this case, the
The
The first
In this way, by using a pen or a finger (not shown) to press the
As described above, in the electrophoretic display device according to the present invention, by applying the
A method of manufacturing an electrophoretic display device according to another exemplary embodiment of the present invention having the above configuration will be described below with reference to FIGS. 7A to 7F.
7A to 7F are cross-sectional views illustrating a manufacturing process of an electrophoretic display device according to another exemplary embodiment.
As shown in FIG. 7A, a metal film (not shown) is first deposited on a
In this case, the metal film material may be selected from Al-based metals such as Al and Al alloys, Ag-based metals such as Ag and Ag alloys, and Mo-based metals such as Mo and Mo alloys, Cr, Ti, and Ta. In addition, they may include two membranes of different material properties, that is, the lower layer and the upper layer thereon. Here, the upper layer is made of a low resistivity metal, for example, an Al-based metal or an Ag-based metal so as to reduce signal delay or voltage drop of the gate wiring.
On the other hand, the lower layer may be made of other materials, particularly materials having excellent physical, chemical and electrical contact properties with indium tin oxide (ITO) or indium zinc oxide (IZO), such as Ti, Ta, Cr, and Mo-based metals. Or an example of the combination of the lower layer and the upper layer is a Cr / Al-Nd alloy.
Subsequently, an inorganic insulating material such as silicon nitride (SiNx) and silicon oxide (SiOx) is deposited on the
Next, although not shown in the drawing, a semiconductor layer (not shown) made of hydrogenated amorphous silicon (hydrogen-nated amorphous silicon) or the like and silicide or n-type impurities are formed on the
Subsequently, the impurity layer (not shown) and the semiconductor layer (not shown) are selectively patterned by a photolithography process and an etching process to form an
Next, a metal material for forming data wirings is deposited on the
In this case, as the metal material, an Al-based metal, an Ag-based metal, a Mo-based metal, Cr, Ti, Ta, or other materials may be used, and may be formed in multiple layers.
The data line (not shown) is formed to cross the gate line (not shown), and the
Subsequently, an inorganic insulating material or an organic insulating material is deposited on the entire surface of the
Then, a metal material layer (not shown) made of a transparent conductive material such as indium tin oxide (ITO) or indium zinc oxide (IZO) is deposited on the
Therefore, when a data voltage is applied to the
Subsequently, an Ag doping portion is formed on the TFT common electrode (not shown) formed in each unit cell region of the
Next, an electrophoretic
As shown in FIG. 7B, first, a first
In addition, the electrophoretic particles are composed of
Thus, by forming a first common electrode (343) on the first polyester substrate (PET) 341, the
Subsequently, the cover film (not shown) of the electrophoretic
Next, although not shown in the drawings, a process of attaching a protective sheet (not shown) to the rear surface of the electrophoretic
Subsequently, in order to proceed with the process of manufacturing the
Next, as shown in FIG. 7D, a nanowire layer is deposited on the second
Subsequently, as shown in FIG. 7E, red (R), green (G), and
Next, as shown in FIG. 7F, a
In this way, the electrophoretic display and the method of manufacturing the same according to the present invention can reduce the number of layers used in the touch panel as compared to the existing process, thereby reducing the thickness of the panel and improve the reflectance.
In addition, the electrophoretic display device and the method of manufacturing the same according to the present invention can be applied to a piezoelectric material pattern, which is a nano material, in a touch panel part having a partition structure or an electrophoretic display cell part, and in some cases, nano The piezoelectric element material pattern, which is a material, may be simultaneously applied to the touch panel unit having the partition structure and the electrophoretic display cell unit.
In addition, the electrophoretic display device and a method of manufacturing the same according to the present invention can implement the electrophoretic display device in which the piezoelectric element is in-cellized, and furthermore, the color electrophoretic display device (color EPD). In this case, the cell gap can be made thinner to improve image quality.
Although the preferred embodiments of the present invention have been described in detail above, those skilled in the art will understand that various modifications and equivalent other embodiments are possible therefrom.
Accordingly, the scope of the present invention is not limited thereto, but various modifications and improvements of those skilled in the art using the basic concept of the present invention as defined in the following claims are also within the scope of the present invention.
1 is a schematic cross-sectional view of an electrophoretic display device according to the related art.
2 is a schematic cross-sectional view of an electrophoretic display device having a touch function according to an embodiment of the present invention.
3A to 3D are cross-sectional views illustrating a manufacturing process of an electrophoretic display device according to an exemplary embodiment.
4 is a schematic cross-sectional view of an electrophoretic display device having a touch function according to another exemplary embodiment of the present invention.
5A through 5F are cross-sectional views illustrating a manufacturing process of an electrophoretic display device according to another exemplary embodiment.
6 is a schematic cross-sectional view of an electrophoretic display device having a touch function according to another embodiment of the present invention.
7A to 7F are cross-sectional views illustrating a manufacturing process of an electrophoretic display device according to another exemplary embodiment.
*** Explanation of symbols for the main parts of the drawing ***
101: lower substrate 103: gate electrode
105: gate insulating film 107: active layer
109: ohmic contact layer 121: source electrode
123: drain electrode 125: protective film
127: drain contact hole 129: pixel electrode
131: Ag dotting unit 150: electrophoretic film
151 solvent 153 microcapsules
155a:
160: electrophoresis display cell 171: polyester substrate (PET)
173: first common electrode 175: second common electrode
177:
179b:
180: touch panel unit 181: upper substrate
Claims (19)
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KR1020090131145A KR20110074237A (en) | 2009-12-24 | 2009-12-24 | Electrophoretic display device and method for fabricating the same |
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KR1020090131145A KR20110074237A (en) | 2009-12-24 | 2009-12-24 | Electrophoretic display device and method for fabricating the same |
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2009
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