KR20110067182A - Treatment method and apparatus of chlorine ion and hardness in water - Google Patents

Treatment method and apparatus of chlorine ion and hardness in water Download PDF

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KR20110067182A
KR20110067182A KR1020090123668A KR20090123668A KR20110067182A KR 20110067182 A KR20110067182 A KR 20110067182A KR 1020090123668 A KR1020090123668 A KR 1020090123668A KR 20090123668 A KR20090123668 A KR 20090123668A KR 20110067182 A KR20110067182 A KR 20110067182A
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water
ultra
pipe
chamber
bubble
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손덕순
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손덕순
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    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/24Treatment of water, waste water, or sewage by flotation
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/40Devices for separating or removing fatty or oily substances or similar floating material
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/52Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/58Treatment of water, waste water, or sewage by removing specified dissolved compounds
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/66Treatment of water, waste water, or sewage by neutralisation; pH adjustment
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/72Treatment of water, waste water, or sewage by oxidation
    • C02F1/78Treatment of water, waste water, or sewage by oxidation with ozone
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00Apparatus for treatment of water, waste water or sewage
    • C02F2201/002Construction details of the apparatus
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/06Controlling or monitoring parameters in water treatment pH

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)

Abstract

PURPOSE: Underwater chlorine ion and hardness processing unit and method are provided to reduce the processing cost of water by removing heavy metals and cyanogens when removing the hardness from the water. CONSTITUTION: An Underwater chlorine ion and hardness processing method comprises the following steps: diffusing ultra-fine air bubbles in water to be processed, and adding caustic soda for adjusting the water into the strong alkaline water; supplying compressed water to produce ultra-fine ozone bubbles; circulating the water in a sealed space for mixing, crushing, and pressurizing the water using the ultra-fine air bubbles and the ultra-fine ozone bubbles; and discharging the processed water with the underwater pressure for ionizing the processed water.

Description

수중 염소이온·경도 처리장치 및 방법{TREATMENT METHOD AND APPARATUS OF CHLORINE ION AND HARDNESS IN WATER}Underwater Chlorine Ion Hardness Treatment Apparatus and Method {TREATMENT METHOD AND APPARATUS OF CHLORINE ION AND HARDNESS IN WATER}

본 발명은 수중 염소이온·경도 처리장치 및 방법에 관한 것이다.The present invention relates to an apparatus and a method for treating chlorine ion and hardness in water.

물은 쉽게 이용할 수 있는 자원으로서 음용수, 생활용수, 각종 산업분야에서 널리 사용되고, 사용수는 정화처리를 하여 수계로 방류하게 된다.Water is widely used in drinking water, domestic water, and various industrial fields as an easily available resource, and used water is purified and discharged into the water system.

그러나 근래에 와서 물부족이 예견되면서 폐수처리장에서 처리한 처리수의 재이용에 대한 관심을 가지게 되었으며, 특히 물을 많이 사용하는 산업분야에서는 공정수로 이용하기 위한 연구가 가속되고 있다.However, in recent years, as a lack of water is expected, interest in reuse of treated water treated in a wastewater treatment plant has been brought to attention, and research for using it as a process water is particularly accelerated in an industrial field that uses a lot of water.

산업분야에서 발생시킨 폐수는 정화처리 과정에서 여러 가지 약품을 사용하기 때문에 수중 경도 및 염소 이온이 상당히 함유되어 있으며, 이를 제거하는데 고비용이 소요되고, 특히 염소 이온의 제거에는 공정이 매우 어려운 것으로 알려져 있을뿐만 아니라 잘 제거되지 않는 특성을 가지고 있다.Wastewater generated in the industrial field contains a considerable amount of hardness and chlorine ions in water because various chemicals are used in the purification process, and it is expensive to remove them, and in particular, the process is very difficult to remove chlorine ions. In addition, it has a property that is not removed well.

재이용수로 사용하기 위해서는 이를 제거해야 하기 때문에 맴브레인, 역삼투막, 이온교환수지 여과법 등 여러 방법이 이용되지만 비용이 많이 소요되며, 수질의 성상에 따라 막의 수명이 단축되고 효율이 낮은 점 등 문제점을 가지고 있다.In order to use it for reuse, various methods such as membrane, reverse osmosis membrane and ion exchange resin filtration method are used, but it is expensive, but it has a problem of shortening membrane life and low efficiency depending on the water quality. .

본 발명은 위에서 보는 문제점 해결을 위해, 강알카리의 피처리수를 단분자, 또는 이온화시켜 초미세공기기포와 초미세오존기포를 이용하여 피처리수의 염소이온과 경도를 단시간에 산화·환원 제거시키는 방법을 제공하는데 목적을 둔다.In order to solve the problems described above, the present invention is to remove the chlorine ion and hardness of the treated water in a short time by using ultra-microporous bubbles and ultra-fine ozone bubbles by ionizing the treated water of strong alkali. The goal is to provide a way to do this.

수단으로서, 처리탱크(T)는 내부에서 구획 격판(E1·E2·E3·E4)에 의해서 순차로 혼합실(1), 제1순환산화실(2), 제2순환산화실(3), 부상분리실(4), 여과실(5)로 구획되어 4각 장방형으로 되고 유입수의 자연 흐름이 이루어지도록 구성된다.As a means, the treatment tank T is arranged inside the mixing chamber 1, the first circulation oxidation chamber 2, the second circulation oxidation chamber 3, by the partition diaphragm E1, E2, E3, E4 inside, It is divided into a floating separation chamber (4) and a filtration chamber (5) to form a quadrangular shape and configured to allow a natural flow of the influent.

혼합실(1)은 상부에 유입관(6)이 부설되고, 유입관(6)에 가성소다 유입관(7)이 연결되며, 혼합실(1)과 제1순환산화실(2) 구획 격판(E1) 하부에 공간을 확보한다.The mixing chamber 1 is provided with an inlet tube 6 at an upper portion thereof, a caustic soda inlet tube 7 is connected to the inlet tube 6, and a partition plate of the mixing chamber 1 and the first circulation oxidation chamber 2 is partitioned. (E1) Secure a space underneath.

제1순환산화실(2)은 수면의 부유물질 회수용 스킴머·부유물질 이송통로·가성소다 유입관(7-1)·이송관(8), 하부에서 토출구를 2개 가진 토출장치(13)가 부설되어 한쪽이 구획 격판(E1) 하부를 넘어 혼합실(1) 쪽으로 향하고, 한쪽은 제1순환산화실(2)에 토출구를 가진다.The first circulating oxidation chamber (2) has a skimmer for recovering suspended solids on the surface of the water, a floating material conveying passage, a caustic soda inflow pipe (7-1), a conveying pipe (8), and a discharge device having two discharge ports at the bottom thereof. ) Is placed so that one side thereof faces the mixing chamber 1 beyond the lower portion of the partition diaphragm E1, and one side has a discharge port in the first circulation oxidation chamber 2.

토출장치(13)는 압송관(14)을 통해 제1초미세기포발생장치(B1)에 연결되고, 제1초미세기포발생장치(B1)는 공급관(19)을 통해 콤프레서(C)에 연결되며, 기포수 공급관(21)을 통해 제1순환산화실(2)에 연결된다.The discharging device 13 is connected to the first ultra-small force generating device (B1) through the pressure feed pipe 14, the first ultra-small force generating device (B1) is connected to the compressor (C) through the supply pipe (19). It is connected to the first circulation oxidation chamber 2 through the bubble water supply pipe (21).

제2순환산화실(3)은 수면의 부유물질 회수용 스킴머·부유물질 이송통로·이송관(9), 하부에 토출장치(15)를 부설한다. The second circulation oxidation chamber 3 is provided with a skimmer for recovering suspended substances on the water surface, a floating material conveying passage, a conveying pipe 9, and a discharge device 15 below.

토출장치(15)는 압송관(16)을 통해 제2초미세기포발생장치(B2)에 연결되고, 제2초미세기포발생장치(B2)는 기포수 공급관(22)을 통해 제2순환산화실(3)에 연결되는 한편 소요의 관을 통해서 오존발생기(A)에 연결되고, 이 오존발생기(A)는 산소발생기(A1)에 연결한다.The discharging device 15 is connected to the second ultra-small microbubble generating device B2 through the pressure feeding tube 16, and the second ultra-small microbubble generating device B2 is subjected to the second circulation oxidation through the bubble water supply pipe 22. It is connected to the chamber (3) while connected to the ozone generator (A) through the required pipe, the ozone generator (A) is connected to the oxygen generator (A1).

부상분리실(4)은 수면의 부유물질 회수용 스킴머·부유물질 이송통로·응집제 유입관(10)·고분자 응집제 유입관(11), 하부에 토출장치(17)를 부설한다. The floating separation chamber 4 is provided with a skimmer for collecting suspended solids on the water, a floating material conveying passage, a coagulant inflow pipe 10, a polymer flocculant inflow pipe 11, and a discharge device 17 in the lower portion.

토출장치(17)는 압송관(18)를 통해 제3초미세기포발생장치(B3)에 연결되고, 제3초미세기포발생장치(B3)는 기포수 공급관(23)을 통해 여과실(5)에 연결되는 한편 공급관(20)을 통해 콤프레서(C)에 연결한다.The discharging device 17 is connected to the third ultra-small microbubble generating device B3 through the pressure feeding tube 18, and the third ultra-small microbubble generating device B3 is filtered through the bubble water supply pipe 23. Is connected to the compressor (C) through the supply pipe (20).

여과실(5)은 내부에 활성탄이 충전된 여과망(S)이 복수로 장착되고, 하부에 여과수 배출관(D)이 부설되어 구성된다.The filtration chamber 5 is configured by mounting a plurality of filter nets S filled with activated carbon therein and installing a filtered water discharge pipe D at a lower portion thereof.

위에서 제1·제2·제3초미세기포발생장치(B1·B2·B3)는 특허등록된 라인믹서방식 초미세기포발생장치(등록제0510405호)가 사용된다.In the above, the first, second, and third ultra-microscopic bubble generators B1, B2, and B3 use a patent-registered line mixer type ultra-micron bubble generator (Registration No. 0510405).

수단의 작동은, 혼합실(1)에 피처리수 및 가성소다가 유입되어 피처리수는 PH 11이상으로 조정되어 제1순환산화실(2)로 이송되는 단계,The operation of the means is a step in which the water to be treated and caustic soda are introduced into the mixing chamber 1, the water to be treated is adjusted to PH 11 or more, and transferred to the first circulating oxidation chamber 2,

제1순환산화실(2)로 이송된 피처리수는 제1초미세기포발생장치(B1)로 순환되어 제1초미세기포발생장치(B1)의 밀폐공간에서 6기압 이상으로 압축공기와 혼합, 분쇄, 가압되어 1기압 이하의 급격한 수중압으로 토출·확산되는 단계,The treated water transferred to the first circulating oxidation chamber (2) is circulated to the first ultra-micro bubble generator (B1) and mixed with compressed air at least 6 atm in the closed space of the first ultra-micro bubble generator (B1). , Pulverized and pressurized to be discharged and diffused at a rapid underwater pressure of 1 atm or less,

피처리수의 토출·확산이 동일 제1순환산화실(2)에 토출되어 피처리수가 미리 정한 시간 동안 반복·순환하는 단계,Discharging / diffusion of the water to be treated is discharged to the same first circulating oxidation chamber 2 to repeat and circulate the water to be treated for a predetermined time;

토출·확산작용에 의해서 압축공기는 초미세공기기포, 피처리수는 물 분자군(CRUST)의 붕괴에 의해서 단분자, 또는 이온화되는 단계,The compressed air is blown out by the dispersing and diffusing action, and the water to be treated is a single molecule or ionized by the collapse of the CRUST.

피처리수의 단분자, 또는 이온화 됨으로서 오염물질은 초미세공기기포에 의한 산화, 환원이 진행되어 오염 부유물질이 수면으로 부상 제거되어 1차처리가 이루어지는 단계,As the monomolecule or ionization of the water to be treated, the pollutants are oxidized and reduced by the ultra-porous air bubbles, and the suspended pollutants are lifted to the surface to remove the first process,

1차처리된 피처리수가 제2순환산화실(3)로 이송되는 단계,Transferring the first treated water to the second circulation oxidation chamber (3),

제2순환산화실(3)로 이송된 피처리수는 제2초미세기포발생장치(B2)로 순환되어 제2초미세기포발생장치(B2)의 밀폐공간에서 6기압 이상으로 오존가스와 혼합, 분쇄, 가압되어 1기압 이하의 급격한 수중압으로 토출·확산되는 단계,The treated water transferred to the second circulating oxidation chamber (3) is circulated to the second ultra-micro bubble generator (B2) and mixed with ozone gas at least 6 atm in the sealed space of the second ultra-micro bubble generator (B2). , Pulverized and pressurized to be discharged and diffused at a rapid underwater pressure of 1 atm or less,

피처리수의 토출·확산이 동일 제2순환산화실(3)에 토출되어 피처리수가 미리 정한 시간 동안 반복·순환하는 단계,Discharging / diffusion of the water to be treated is discharged to the same second circulating oxidation chamber 3 to repeat and circulate the water to be treated for a predetermined time;

토출·확산작용에 의해서 오존가스는 초미세오존기포로, 피처리수는 물 분자군(CRUST)의 붕괴에 의해서 단분자, 또는 이온화되는 단계,Ozone gas is an ultra-fine ozone bubble by discharge and diffusion, and the water to be treated is a single molecule or ionized by the collapse of the CRUST.

피처리수의 단분자, 또는 이온화 됨으로서 오염물질은 초미세오존기포에 의한 산화, 환원이 진행되어 오염 부유물질이 수면으로 부상 제거되어 2차처리가 이루어져서 부상분리실(4)로 이송되는 단계,As the monomolecule or ionization of the water to be treated, the contaminants are oxidized and reduced by ultra-fine ozone bubbles, and the suspended contaminants are floated to the surface, and secondary treatment is carried out to the floating separation chamber 4,

부상분리실(4)로 이송된 2차처리된 피처리수에는 응집제가 주입되면서 중성 으로 조정되고 제3초미세기포발생장치(B3)의 작동으로 토출되는 초미세공기기포에 의해서 미제거된 오염물질은 응집되어 부상분리 제거되고 피처리수는 청징수로 되어 여과실(5)로 이송·여과되는 단계를 거쳐 염소이온 및 경도는 제거된다.Secondary treated water transported to the flotation separation chamber 4 is neutralized as a coagulant is injected, and is not removed by the ultra-microporous bubble that is discharged by the operation of the third ultra-fine bubble generator B3. The substance is agglomerated, floated and removed, and the water to be treated is clarified water, and the chlorine ion and hardness are removed through the step of being transferred and filtered to the filtration chamber 5.

염소 이온과 경도를 동시에 제거처리하고, 또 경도제거처리시에 중금속 및 시안 등도 함께 제거처리되므로 처리비용을 매우 절감시키게 된다.Since chlorine ions and hardness are simultaneously removed and heavy metals and cyan are also removed during hardness removal, the treatment cost is greatly reduced.

이하 본 발명의 구성 및 실시 예에 대하여 설명한다.Hereinafter, the configuration and the embodiment of the present invention will be described.

도 1은 본 발명의 처리 개념도 이다.1 is a process conceptual diagram of the present invention.

도 1에서 처리탱크(T)는 내부에서 구획 격판(E1·E2·E3·E4)에 의해서 순차 혼합실(1), 제1순환산화실(2), 제2순환산화실(3), 부상분리실(4), 여과실(5)로 구획되어 4각 장방형으로 되고 유입수의 자연 흐름이 이루어지도록 구성되어 있다.In Fig. 1, the treatment tank T has a sequential mixing chamber 1, a first circulating oxidation chamber 2, a second circulating oxidation chamber 3, and floating by the partition diaphragm E1, E2, E3 and E4 therein. It is divided into a separation chamber 4 and a filtration chamber 5 to form a quadrangular shape and configured to allow a natural flow of the influent.

혼합실(1)은 상부에 유입관(6)이 부설되고, 이 유입관(6)에 가성소다 유입관(7)이 연결되며, 혼합실(1)과 제1순환산화실(2)을 구획하는 구획 격판(E1)은 하부에서 공간이 확보되고, 이 공간은 피처리수의 이송 통로가 되며, 이 공간에 제1순환산화실(2)에 부설된 토출장치(13)의 한쪽 토출구가 혼합실(1)을 향해 부설되어 초미세공기기포가 확산되어 혼합실(1)에 유입되는 피처리수와 가성소다를 혼합되게 된다.The mixing chamber 1 is provided with an inlet tube 6 at an upper portion thereof, and a caustic soda inlet tube 7 is connected to the inlet tube 6, and the mixing chamber 1 and the first circulating oxidation chamber 2 are provided. The partition diaphragm E1 which divides is secured in the lower part, and this space becomes a conveyance path of the to-be-processed water, and one discharge port of the discharge apparatus 13 attached to the 1st circulation oxidation chamber 2 is provided in this space. It is placed toward the mixing chamber 1 to diffuse the ultra-porous air bubbles, and the treated water and caustic soda flowing into the mixing chamber 1 are mixed.

유입관(6)은 도시되지 않은 집수관으로 연결되어 피처리수를 유입시키고, 가성소다 유입관(7)은 도시되지 않은 가성소다 탱크와 가성소다 유입 자동조절 장치 에 서로 연결되어 PH 11이상이 유지되도록 가성소다의 유입량은 자동 조절하게 된다.The inlet pipe 6 is connected to a collecting pipe (not shown) to introduce the water to be treated, and the caustic soda inlet pipe (7) is connected to each other to a caustic soda tank (not shown) and the caustic soda inlet automatic control device to have a pH of 11 or more. The flow rate of caustic soda is automatically adjusted to maintain it.

위와 같이 구성된 혼합실(1)은 유입되는 피처리수와 가성소다를 혼합하여 PH 11 이상을 유지시켜서 제1순환산화실(2)로 이송한다.Mixing chamber 1 configured as described above is mixed with the incoming water and caustic soda to maintain a pH of 11 or more to transfer to the first circulating oxidation chamber (2).

제1순환산화실(2)은 상부에서 도시되지 않은 수면의 부유물질 회수용 스킴머·부유물질 이송통로·가성소다 유입관(7-1)·이송관(8), 하부에서 토출장치(13)가 부설되고, 이 토출장치(13)는 압송관(14)을 통해서 외부에 설치된 제1초미세기포발생장치(B1)에 연결되며, 제1초미세기포발생장치(B1)는 기포수를 공급받기 위해 공급관(21)을 통해 제1순환산화실(2)에 연결되는 한편 공급관(19)을 통해서 콤프레서(C)에 연결된다.The first circulating oxidation chamber (2) includes a skimmer for recovering suspended substances on the surface of the water, a floating material conveying passage, a caustic soda inlet (7-1), a conveying pipe (8), and a discharge device (13), which is not shown at the top. ) Is installed, and the discharge device 13 is connected to the first ultra-small force generating device (B1) installed outside through the pressure feed pipe (14), the first ultra-small force generating device (B1) is the number of bubbles It is connected to the first circulating oxidation chamber 2 through the supply pipe 21 to receive the supply, and to the compressor C through the supply pipe 19.

스킴머는 제1순환산화실(2) 수면에 부설되며, 수면으로 부상하는 오염 부유물질을 회전 작용으로 회수하여 부유물질 이송 통로를 통해 외부로 배출시킨다.The skimmer is placed on the surface of the first circulating oxidation chamber (2), and collects the contaminated suspended solids floating on the surface by rotational action and discharges them to the outside through the suspended solids transfer passage.

가성소다 유입관(7-1)은 PH 11로 조정되어 이송된 피처리수의 PH가 급격히 하강할 때 가성소다를 유입하여 PH를 11로 조정·유지하게 하는 제한적인 유입 작용을 하게된다.The caustic soda inflow pipe 7-1 is adjusted to PH 11 so that when the pH of the treated water is drastically lowered, caustic soda flows to restrict and maintain the pH to 11.

이송관(8)은 처리수를 다음 공정으로 이송시킨다.The transfer pipe 8 transfers the treated water to the next process.

토출장치(13)는 제1초미세기포발생장치(B1)에서 생성시킨 초미세공기기포를 제1순환산화실(2)내에 토출·확산시킨다.The discharging device 13 discharges and diffuses the ultra-microporous air bubbles generated by the first ultra-small air bubble generating device B1 into the first circulation oxidation chamber 2.

제1초미세기포발생장치(B1)는 콤프레서(C)로부터 압축공기를 공급받아 초미세공기기포로 생성시켜 토출장치(13)로 압송한다.The first ultra-fine foam generating device B1 receives compressed air from the compressor C, generates the ultra-fine air bubbles, and delivers the compressed air to the discharge device 13.

위에서, 제1순환산화실(2)에 압송관(14)에 연결된 토출장치(13)와 기포수 공급관(21)이 함께 연결됨으로서 제1순환산화실(2)의 피처리수는 제1초미세기포발생장치(B1)에 의해서 반복 순환을 한다.In the above, the discharged device 13 and the bubble water supply pipe 21 connected to the pressure feed pipe 14 are connected together to the first circulation oxidation chamber 2, so that the water to be treated in the first circulation oxidation chamber 2 is not the first ultrafine. The repetitive circulation is performed by the force gun generator B1.

제2순환산화실(3)은 상부에서 도시되지 않은 수면의 부유물질 회수용 스킴머·부유물질 이송통로·이송관(9), 하부에서 토출장치(15)가 부설되며, 이 토출장치(15)는 압송관(16)를 통해서 외부에 설치된 제2초미세기포발생장치(B2)에 연결되고, 제2초미세기포발생장치(B2)는 기포수를 공급받기 위해 공급관(22)을 통해 제2순환산화실(3)에 연결되는 한편 소요의 관을 통해서 오존발생기(A)에 연결되며, 오존발생기(A)는 산소발생기(A1)에 연결된다.The second circulation oxidation chamber 3 is provided with a skimmer for recovering suspended substances on the surface of the water, a floating material conveying passage, a conveying pipe 9, and a discharging device 15 at the lower portion, which is not shown in the upper portion. ) Is connected to the second ultra-small microbubble generating device (B2) installed on the outside through the pressure feeding pipe 16, the second ultra-microbubble generating device (B2) is made through the supply pipe 22 to receive the bubble water It is connected to the second circulation oxidation chamber (3) while connected to the ozone generator (A) through the required pipe, the ozone generator (A) is connected to the oxygen generator (A1).

스킴머는 제2순환산화실(3) 수면에 부설되며, 수면에 부상하는 오염 부유물질을 회전 작용으로 회수하여 부유물질 이송 통로를 통해 외부로 배출시킨다.The skimmer is placed on the water surface of the second circulating oxidation chamber (3), and collects the contaminant floating material floating on the surface by a rotating action and is discharged to the outside through the floating material transport passage.

이송관(9)은 처리수를 다음 공정으로 이송시킨다.The transfer pipe 9 transfers the treated water to the next process.

토출장치(15)는 제2초미세기포발생장치(B2)에서 생성시킨 초미세오존기포를 제2순환산화실(3)내에 토출·확산시킨다.The discharge device 15 discharges and diffuses the ultra-fine ozone bubbles generated by the second ultra-fine bubble generator B2 into the second circulation oxidation chamber 3.

제2초미세기포발생장치(B2)는 오존발생기(A)로부터 오존을 공급받아 초미세오존기포를 생성시켜 토출장치(15)로 압송하고, 오존발생기(A)는 산소발생기(A1)에서 산소를 공급받아 오존을 발생시키며, 산소발생기(A1)는 산소를 발생시켜 오존발생기(A)에 공급한다. The second ultra-fine bubble generator B2 receives ozone from the ozone generator A, generates ultra-fine ozone bubbles, and pumps them to the discharge device 15. The ozone generator A is oxygen in the oxygen generator A1. Received to generate ozone, the oxygen generator (A1) generates oxygen and supplies it to the ozone generator (A).

위에서, 제2순환산화실(3)에 압송관(16)에 연결된 토출장치(15)와 기포수 공급관(22)이 함께 연결됨으로서 제2순환산화실(3)의 피처리수는 제2초미세기포발생 장치(B2)에 의해서 반복 순환을 한다.In the above, the discharged water 15 and the bubble water supply pipe 22 connected to the pressure feed tube 16 are connected together to the second circulation oxidation chamber 3, so that the water to be treated in the second circulation oxidation chamber 3 is slightly different. The repetitive circulation is performed by the force gun generator B2.

부상분리실(4)은 상부에서 도시되지 않은 수면의 부유물질 회수용 스킴머·부유물질 이송통로·응집제 유입관(10)·고분자 응집제 유입관(11)·이송관(12), 하부에서 토출장치(17)가 부설되고, 이 토출장치(17)는 압송관(18)를 통해서 외부에 설치된 제3초미세기포발생장치(B3)에 연결된다.The floating separation chamber 4 is discharged from a skimmer for recovering suspended solids on the surface of the water, a floating material conveying passage, a coagulant inflow pipe 10, a polymer flocculant inflow pipe 11, a transport pipe 12, and a lower portion of the floating material not shown at the top. An apparatus 17 is provided, which is connected to a third ultra-small force generating device B3 externally installed through the pressure feed pipe 18.

제3초미세기포발생장치(B3)는 기포수를 공급받기 위해 공급관(23)을 통해 여과실(5)에 연결되는 한편 압축공기 공급관(20)을 통해서 콤프레서(C)에 연결되어 압축공기를 공급받아 초미세공기기포로 생성시켜 토출장치(17)로 압송한다.The third ultra-fine air bubble generator (B3) is connected to the filtration chamber (5) through the supply pipe 23 to receive the bubble water, while the compressed air is connected to the compressor (C) through the compressed air supply pipe (20) It is supplied and produced into an ultra-microporous bubble, and then pumped to the discharge device 17.

응집제 유입관(10)은 황산알미늄, 고분자응집제 유입관(11)은 아니온, 또는 카치온을 유입시키게 되며, 유입량은 도시되지 않은 자동제어 장치에 연결되어 조절된다.The coagulant inlet tube 10 is introduced into the aluminum sulfate, the polymer coagulant inlet tube 11, anion, or cationic, the inflow amount is connected to the automatic control device not shown is adjusted.

부상분리실(4)에는 초미세공기기포가 토출·확산되고, 황산알미늄이 주입되면 제3초미세기포발생장치(B3)에 의해서 토출되는 초미세공기기포의 확산력에 의해 수중에 확산되면서 PH는 중성으로 하강하고, 고분자 응집제가 주입되어 산화·환원에 의해서 발생한 부유물질은 응집되어 수면으로 부상하게 된다.Ultra-fine air bubbles are discharged and diffused in the flotation separation chamber 4, and when aluminum sulfate is injected, PH diffuses into the water by the diffusion force of the ultra-fine air bubbles discharged by the third ultra-fine air bubble generator B3, It is lowered to neutral, and the polymer flocculant is injected, and the suspended solids generated by oxidation and reduction are flocculated and floated to the surface.

스킴머는 부상분리실(4) 수면에 부설되며, 수면으로 부상하는 오염 부유물질을 회전 작용으로 회수하여 부유물질 이송 통로를 통해 외부로 배출시킨다.The skimmers are placed on the surface of the floating separation chamber 4, and the polluted suspended solids floating on the surface are recovered by rotational action and discharged to the outside through the suspended solids transfer passage.

이송관(12)은 처리수를 다음 공정으로 이송시킨다.The transfer pipe 12 transfers the treated water to the next process.

토출장치(17)는 제3초미세기포발생장치(B3)에서 생성시킨 초미세공기기포를 부상분리실(4) 내에 토출·확산시킨다.The discharging device 17 discharges and diffuses the ultra-microporous air bubbles generated by the third ultra-fine air bubble generating device B3 into the floating separation chamber 4.

여과실(5)에는 내부에 활성탄 여과망(S)이 복수로 장착되며, 여과망(S)에는 활성탄이 충전되고, 이 여과망(S)은 상부에서 외부로 퇴출하여 교체하도록 되며, 하부에 제3초미세기포발생장치(B3)에 연결되는 기포수 공급관(23)이 부설되고, 여과수 배출관(D)이 부설되어 처리수를 배출하게 된다.The filtration chamber 5 is equipped with a plurality of activated carbon filtration nets (S) therein, the filtration net (S) is filled with activated carbon, the filtration nets (S) is to be replaced from the top to the outside to replace, the third ultra fine The bubble water supply pipe 23 is connected to the strength bubble generator B3, and the filtrate discharge pipe D is installed to discharge the treated water.

활성탄 여과실(5)은 유입수를 상부에서 하부로 흘러내리면서 여과처리가 이루어지며, 배출관(D)은 여과수를 재이용처로 배출한다.The activated carbon filtration chamber 5 is filtered while the inflow water flows from the top to the bottom, and the discharge pipe D discharges the filtered water to the reuse destination.

미세기포를 생성시키는 방법은 여러 방법이 있으며, 일반적으로 사용되고 있는 미세기포발생 방식의 예를 보면, 과류터빈 방식 20-80미크론, 선회방식 10-20, 또는 50-60 미크론, 라인믹서방식 0.5-3미크론 구경의 미세기포를 생성시키는 것으로 알려져 있다.There are several methods for generating microbubbles, and examples of the microbubble generating method that are generally used include: 20-80 microns of the overflow turbine type, 10-20, or 50-60 microns, the line mixer type 0.5- It is known to produce microbubbles of 3 micron diameter.

본 발명에서 이용되는 초미세기포발생장치(B1·B2·B3)는 한국 특허청에 등록된 라인믹서방식 초미세기포발생장치(등록제0510405호)가 사용되며, 라인믹서방식 초미세기포발생장치는 3-0.5미크론의 초미세 구경의 기포를 생성하여 토출하며, 미세기포는 기포의 구경에 따라 특성을 가지게 되며, 그 특성에 따라 아래와 같이 구분해서 사용하며, 라인믹서방식 초미세기포발생장치(등록제0510405호)에서 생성되는 초미세기포는 마이크로-나노기포, 마이크로- 나노오존기포가 되며, 이에 준하는 처리 능력을 가지게 된다.As the ultra-miniature bubble generator (B1, B2, B3) used in the present invention, a line mixer type ultra-fine bubble generator (registered No. 0510405) registered with the Korean Intellectual Property Office is used. It generates and discharges bubbles of -0.5 micron ultra fine aperture, and microbubbles have characteristics according to the diameter of the bubbles, and use them according to the characteristics as follows, and line mixer type ultra-fine bubble generator (Registration 0510405) The ultra-miniature bubbles generated in the arc) become micro-nano bubbles and micro-nano ozone bubbles, and have the same processing capacity.

일본국 행정법인 산업기술총합연구소 환경관리연구부문에서 미세기포를 특성에 따라 분류하였는데, 발생기의 기포 구경이 50미크론 이하 10미크론(㎛) 까지를 마이크로 기포, 10미크론(㎛) 이하에서 300나노(㎚) 까지를 마이크로-나노기포, 200나노(㎚) 이하를 나노기포로 분류하였으며, 마이크로-나노기포는 수축시키면 나노기포로 되고 장기 생존이 되는 특성을 가진다고 정의하였다.Microbubbles were classified according to characteristics in the Environmental Management Research Division of the Institute of Industrial Technology of Japan, which had a bubble diameter of 50 microns or less and 10 microns (μm). Nm) were classified as nano-bubbles and 200 nanometers (nm) or less as nano-bubbles, and micro-nano bubbles were defined as having nano-bubbles and long-term survival when contracted.

본 발명에서 초미세공기기포는 마이크로-나노공기기포, 초미세오존기포는 마이크로-나노오존기포가 된다.In the present invention, the ultra-porous air bubbles are micro-nano air bubbles, and the ultra-fine ozone bubbles are micro-nano ozone bubbles.

이하 본 발명의 실시 예에 대하여 설명한다.Hereinafter will be described an embodiment of the present invention.

처리탱크(T)의 혼합실(1)에 유입관(6)을 통해서 피처리수가 유입되면서 가성소다도 함께 유입되어 처리탱크(T)에는 미리 정한 체류시간에 따라 정해진 양의 피처리수가 유입되고, 피처리수는 PH 11 이상으로 조정되며, 제1·제2·제3초미세기포발생장치(B1·B2·B3)는 작동한다.As the water to be treated flows into the mixing chamber 1 of the treatment tank T through the inlet pipe 6, caustic soda is also introduced into the treatment tank T, and the amount of the water to be treated according to the predetermined residence time flows into the treatment tank T. , The water to be treated is adjusted to PH 11 or more, and the first, second, and third ultra-microscopic bubble generators B1, B2, B3 operate.

제1순환산화실(2)로 이송된 피처리수는 수중압에서 수중의 초미세공기기포와 접촉한 후, 제1초미세기포발생장치(B1)로 순환되어 제1초미세기포발생장치(B1)의 밀폐공간에서 6기압 이상으로 압축공기와 혼합, 분쇄, 가압되어 1기압 이하의 수중압으로 토출·확산되는 작용이 체류시간 동안 반복되며, 이러한 반복·순환 작용에 의해서 압축공기는 초미세공기기포로 미세화되고, 피처리수는 물 분자군(CRUST)의 붕괴에 의해서 단분자, 또는 이온화되어 초미세공기기포에 의한 산화, 환원이 진행 되어 수면에는 부유물질이 부상하며 부상한 부유물질이 제거됨으로서 1차처리는 이루어지고 피처리수는 제2순환산화실(3)로 이송된다.The water to be transferred to the first circulating oxidation chamber (2) is contacted with the ultra-porous air bubbles in the water at underwater pressure, and then circulated to the first ultra-small bubble generator (B1) to generate the first ultra-small bubble generator ( In the sealed space of B1), the action of mixing, pulverizing, and pressurizing with compressed air above 6 atm and discharging and diffusing to underwater pressure below 1 atm is repeated during residence time. The device becomes finer and the treated water becomes monomolecule or ionized by the collapse of the CRUST, and the oxidation and reduction by the ultra-porous air bubbles proceeds, causing the floating material to float and removing the floating material. As a result, the first treatment is performed and the water to be treated is transferred to the second circulating oxidation chamber 3.

제2순환산화실(3)로 이송된 피처리수는 수중압에서 수중의 초미세오존기포와 접촉한 후, 제2초미세기포발생장치(B2)로 순환되어 제2초미세기포발생장치(B2)의 밀폐공간에서 6기압 이상으로 오존가스와 혼합·분쇄·가압되어 1기압 이하의 수중압으로 토출·확산되는 작용이 체류시간 동안 반복되며, 이러한 반복·순환 작용에 의해서 오존가스는 초미세오존기포로 미세화되고, 피처리수는 물 분자군(CRUST)의 붕괴에 의해서 단분자, 또는 이온화되어 초미세오존기포에 의한 산화·환원이 진행되어 수면에는 부유물질이 부상하며 부상한 부유물질이 제거됨으로서 2차처리는 이루어지고 피처리수는 부상분리실(4)로 이송된다.The treated water transferred to the second circulating oxidation chamber 3 is circulated to the second ultra-small bubble generator B2 after being in contact with the ultra-fine ozone bubbles in the water at underwater pressure, and then the second ultra-small bubble generator ( In the confined space of B2), the action of mixing, pulverizing and pressurizing with ozone gas above 6 atm and discharging and diffusing to underwater pressure below 1 atm is repeated during residence time. Micronized by ozone bubbles, the water to be treated is monomolecule or ionized by the collapse of CRUST, and oxidation and reduction by ultra-fine ozone bubbles proceeds, causing floating materials to float on the water surface. By being removed, secondary treatment is effected and the water to be treated is transferred to the flotation separation chamber 4.

부상분리실(4)에는 초미세공기기포가 토출·확산되고, 이송된 피처리수에는 황산알미늄이 주입되어 PH는 중성으로 하강하고, 이어서 고분자 응집제가 주입되면서 제1순환산화실(2), 제2순환산화실(3)에서 미제거된 오염물질은 응집되고 풀록을 형성하여 수면으로 부상하며, 부상한 오염물질은 분리되어 외부로 배출되고, 오염물질이 분리된 피처리수는 청징수로 되어 여과실(5)로 이송되어 여과되어 염소이온 및 경도는 제거된다.Ultra-porous air bubbles are discharged and diffused in the flotation separation chamber 4, and aluminum sulfate is injected into the treated water to be transferred, and the pH is lowered to neutral, followed by injection of the polymer flocculant into the first circulating oxidation chamber (2), Uncontaminated contaminants in the second circulating oxidation chamber (3) are agglomerated and form pulleys to rise to the surface, and the injured contaminants are separated and discharged to the outside, and the treated water from which the contaminants are separated is clarified. The ions are transferred to the filtration chamber 5 and filtered to remove chlorine ions and hardness.

이상에서 분리된 청징수는 염소이온 및 경도는 90% 이상이 제거된다. In the clarified water separated above, chlorine ion and hardness are removed by 90% or more.

분리된 청징수는 여과실(5)로 이송되어 잔여 염소이온 및 경도가 여과처리되어 염소이온 및 경도는 제거된다.The separated clarified water is transferred to the filtration chamber 5 so that residual chlorine ions and hardness are filtered to remove chlorine ions and hardness.

위와 같은 과정을 거치면서 피처리수에 함유된 염소이온 및 경도는 고정도로 제거 처리되어 재이용수로 사용할 수 있게 된다.Through the above process, chlorine ions and hardness contained in the water to be treated are removed with high accuracy and can be used as reused water.

도 1은 본 발명의 처리 개념도 이다.1 is a process conceptual diagram of the present invention.

〔부호의 설명〕[Explanation of code]

A: 오존발생기 A1: 산소발생기A: ozone generator A1: oxygen generator

B1·B2·B3: 초미세기포발생장치 C: 콤프레서B1, B2, B3: Ultra-small force generating device C: Compressor

D: 배출관 E1·E2·E3·E4: 격판       D: discharge pipe E1, E2, E3, E4: diaphragm

T: 처리탱크       T: Treatment Tank

1: 혼합실 2: 제1순환산화실       1: mixing chamber 2: first cycle oxidation chamber

3: 제2순환산화실 4: 부상분리실       3: second cycle oxidation chamber 4: flotation separation chamber

5: 여과실 6: 유입관       5: filtration chamber 6: inlet pipe

7·7-1: 가성소다 유입관 8·9·12: 이송관       7 · 7-1: Caustic soda inlet tube 8 · 9 · 12: transfer tube

10·11: 응집제 유입관        10.11: flocculant inflow pipe

14·16·18: 압송관 13·15·17: 토출장치       14, 16, 18: pressure feed pipe 13, 15, 17: discharge device

19·20·21·22·23: 공급관       19, 20, 21, 22, 23: Supply pipe

Claims (3)

상부에 부설된 유입관(6)에 가성소다 유입관(7)이 연결되며, 혼합실(1)과 제1순환산화실(2) 구획 격판(E1) 하부에 공간이 확보되는 혼합실(1), Caustic soda inlet pipe (7) is connected to the inlet pipe (6) installed in the upper, the mixing chamber (1) and the mixing chamber (1) where space is secured below the partition plate (E1) of the first circulation oxidation chamber (2) ), 부유물질 회수용 스킴머·이송통로·가성소다 유입관(7-1)·이송관(8), 하부에서 토출구를 2개 가진 토출장치(13)가 부설되며, 토출장치(13)는 압송관(14)을 통해 제1초미세기포발생장치(B1)에 연결되고, 제1초미세기포발생장치(B1)는 공급관(19)을 통해 콤프레서(C)에 연결되며, 기포수 공급관(21)을 통해 제1순환산화실(2)에 연결되는 제1순환산화실(2),Schemes, conveying passages, caustic soda inflow pipes (7-1), conveying pipes (8), and discharge devices (13) having two discharge ports in the lower part are provided, and the discharge device (13) is a pressure feed pipe. It is connected to the first ultra-small microbubble generating device (B1) through 14, the first ultra-small microbubble generating device (B1) is connected to the compressor (C) through the supply pipe 19, the bubble water supply pipe (21) The first circulating oxidation chamber (2) connected to the first circulating oxidation chamber (2) through, 부유물질 회수용 스킴머·이송통로·이송관(9), 하부에 토출장치(15)가 부설되며,토출장치(15)는 압송관(16)을 통해 제2초미세기포발생장치(B2)에 연결되고, 제2초미세기포발생장치(B2)는 기포수 공급관(22)을 통해 제2순환산화실(3)에 연결되는 한편 소요의 관을 통해서 오존발생기(A)에 연결되고, 이 오존발생기(A)는 산소발생기(A1)에 연결되는 제2순환산화실(3),A discharge device 15 is provided at the bottom of the skimmer, the conveying passage, the conveying pipe 9, and the lower part for recovering the suspended solids, and the discharging device 15 is connected to the second ultra-small force generating device B2 through the feeding pipe 16. It is connected to, the second ultra-miniature bubble generator (B2) is connected to the second circulating oxidation chamber (3) through the bubble water supply pipe 22, while connected to the ozone generator (A) through the required pipe, The ozone generator (A) is a second circulation oxidation chamber (3) connected to the oxygen generator (A1), 부유물질 회수용 스킴머·이송통로·응집제 유입관(10)·고분자 응집제 유입관(11), 하부에 토출장치(17)가 부설되고, 토출장치(17)는 압송관(18)를 통해 제3초미세기포발생장치(B3)에 연결되고, 제3초미세기포발생장치(B3)는 기포수 공급관(23)을 통해 여과실(5)에 연결되는 한편 공급관(20)을 통해 콤프레서(C)에 연결되는 부상분리실(4),A discharge device 17 is provided at the bottom of the skimmer, the conveying passage, the flocculant inflow pipe 10, the polymer flocculant inflow pipe 11, and the lower part, and the discharge device 17 is formed through the pressure feed pipe 18. It is connected to the three ultra-small microbubble generating device (B3), the third ultra-small microbubble generating device (B3) is connected to the filtration chamber (5) through the bubble water supply pipe (23) while the compressor (C) through the supply pipe (20) Float separation chamber (4), 내부에 활성탄이 충전된 여과망(S)이 복수로 장착되고, 하부에 여과수 배출 관(D)이 부설되는 여과실(5)이 순차연결되어 구성되는 것을 특징으로 하는 수중 염소이온 및 경도처리장치.Underwater chlorine ion and hardness treatment apparatus, characterized in that the filtration chamber (5) is filled with a plurality of activated carbon filled inside, and the filtration chamber (5) in which the filtered water discharge pipe (D) is installed in the lower portion is sequentially connected. 제1항에 있어서, 제1순환산화실(2) 및 제2순환산화실(3)의 피처리수는 반복 순환을 위해 공급관(21·22)을 통해 제1·2초미세기포발생장치(B1·B2)로, 압송관(14·16)을 통해 토출장치(13·15)로 연결되어 반복 순환되는 것을 특징으로 하는 수중 염소이온 및 경도처리장치.The method of claim 1, wherein the water to be treated in the first circulating oxidation chamber (2) and the second circulating oxidation chamber (3) passes through the supply pipe (21 · 22) for the first and second ultra-fine air bubble generators ( Underwater chlorine ion and hardness treatment apparatus characterized in that it is repeatedly circulated by B1 · B2, connected to the discharge device (13 · 15) through the pressure feed pipe (14 · 16). 제1·2항에 있어서, PH 11 이상으로 조정된 피처리수는 초미세기포발생장치(B1·B2)의 밀폐 공간으로 반복 순환되면서 6기압 이상으로 압축공기 , 또는 오존가스와 혼합·분쇄·가압되어 1기압 이하의 급격한 수중압으로 토출·확산시켜 압축공기는 초미세공기기포로, 오존가스는 초미세오존기포로, 피처리수는 물 분자군(CRUST)이 붕괴되어 단분자, 또는 이온화되는 것을 특징으로 하는 수중 염소이온 및 경도처리 방법.The water to be treated adjusted to PH 11 or more is mixed, pulverized and mixed with compressed air or ozone gas to 6 atm or more while being repeatedly circulated to the sealed space of the ultra-fine foam generator B1 and B2. It is pressurized and discharged and diffused by rapid underwater pressure of 1 atm or less, so compressed air is ultra-fine air bubbles, ozone gas is ultra-fine ozone bubble, and treated water is decomposed into a single molecule or ionized water group (CRUST). Underwater chlorine ion and hardness treatment method characterized in that.
KR1020090123668A 2009-12-14 2009-12-14 Treatment method and apparatus of chlorine ion and hardness in water KR20110067182A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101978088B1 (en) * 2018-01-05 2019-05-14 (주) 나노에스텍수산 Apparatus and method for nano oxygen liquid fertilizer synthesizing dissloved combustion exhaust gas and nano oxygen
CN111675308A (en) * 2020-06-18 2020-09-18 山东国舜建设集团有限公司 Wastewater ozone dechlorination system and process

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101978088B1 (en) * 2018-01-05 2019-05-14 (주) 나노에스텍수산 Apparatus and method for nano oxygen liquid fertilizer synthesizing dissloved combustion exhaust gas and nano oxygen
CN111675308A (en) * 2020-06-18 2020-09-18 山东国舜建设集团有限公司 Wastewater ozone dechlorination system and process

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