KR20110053940A - Black vacuum plating on bezel of a touch panel glass - Google Patents

Black vacuum plating on bezel of a touch panel glass Download PDF

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KR20110053940A
KR20110053940A KR1020110042989A KR20110042989A KR20110053940A KR 20110053940 A KR20110053940 A KR 20110053940A KR 1020110042989 A KR1020110042989 A KR 1020110042989A KR 20110042989 A KR20110042989 A KR 20110042989A KR 20110053940 A KR20110053940 A KR 20110053940A
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touch panel
black color
panel glass
vacuum
bezel
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KR1020110042989A
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KR101074263B1 (en
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김철원
김권원
황윤식
팽경식
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(주)에스아이티
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641Nitrides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04DNON-POSITIVE-DISPLACEMENT PUMPS
    • F04D17/00Radial-flow pumps, e.g. centrifugal pumps; Helico-centrifugal pumps
    • F04D17/08Centrifugal pumps
    • F04D17/16Centrifugal pumps for displacing without appreciable compression
    • F04D17/168Pumps specially adapted to produce a vacuum
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02612Formation types
    • H01L21/02617Deposition types
    • H01L21/02631Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67155Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67207Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Engineering & Computer Science (AREA)
  • Physical Vapour Deposition (AREA)
  • Position Input By Displaying (AREA)

Abstract

PURPOSE: A black collar vacuum plating method of bezel part of touch panel glass is provided to improve productivity and to reduce fault rate by preventing the short-circuit of an ITO pattern due to the thickness deviation between ITO pattern bed and a black color bed. CONSTITUTION: A black collar vacuum plating method of bezel part of touch panel glass comprises the next step. A coating target and a target material are formed in a chamber of vacuum condition. The target material is plated by applying voltage under reactive gas. The coating target is a touch panel glass(10). A black color bed(20) is formed in a bezel of the touch panel glass using a vacuum deposition method.

Description

터치패널글라스 베젤부의 블랙칼라 진공증착방법{ BLACK VACUUM PLATING ON BEZEL OF A TOUCH PANEL GLASS }BLACK VACUUM PLATING ON BEZEL OF A TOUCH PANEL GLASS}

본 발명은 터치 방식으로 구동되는 전자기기의 터치패널글라스 내면의 베젤부의 블랙칼라 코팅에 관한 것으로, 더욱 상세하게는 진공증착을 이용하여 휴대폰, PDA, 태블릿 PC 등과 같은 터치 방식으로 구동되는 전자기기에 채용되는 터치패널글라스 내면의 베젤부에 내마모성 및 우수한 퀄리티를 갖춘 블랙칼라를 구현함과 동시에, 상기 베젤부에 구비되어 있는 ITO(Indium Tin Oxide; 투명전도막) 패턴과 상기 ITO 패턴들의 측단을 잇는 금속배선부분의 패턴과의 통전을 막을 수 있고, 특히 공정상에서 상기 ITO 패턴의 단락을 방지할 수 있는 터치패널글라스 베젤부의 블랙칼라 진공증착방법에 관한 것이다.
The present invention relates to a black color coating of a bezel portion on the inner surface of a touch panel glass of an electronic device driven by a touch method, and more particularly to an electronic device driven by a touch method such as a mobile phone, a PDA, a tablet PC, and the like by using vacuum deposition. It realizes a black color with wear resistance and excellent quality at the bezel portion of the inner surface of the touch panel glass, and connects the indium tin oxide (ITO) pattern provided at the bezel portion with the side ends of the ITO patterns. The present invention relates to a black color vacuum deposition method of the touch panel glass bezel part which can prevent energization with the pattern of the metal wiring part and can prevent the short circuit of the ITO pattern in the process.

이하 본 발명의 배경기술에 대하여 도 1 내지 도3의 도면의 설명과 함께 살펴본다.Hereinafter, the background of the present invention will be described with reference to the drawings of FIGS. 1 to 3.

도 1은 종래기술에 따른 터치패널이 구비된 전자기기의 개략적인 구조도이다. 터치 방식으로 구동되는 전자기기는 도 1에서 보는 바와 같이, 일반적으로 화상패널, 광원, 구동부 등으로 이루어진 화상표시모듈(70)과, 터치에 의한 신호를 인식하는 터치패널, 그리고 기타 부품 등으로 크게 구분된다. 이때 상기 터치패널은 음극선관(CRT), 액정표시장치(LCD), 플라즈마 디스플레이 패널(PDP), 전계발광소자(ELD) 등의 화상표시모듈(70)의 표시면에 구비되어 사용자가 상기 터치패널을 터치함으로써 컴퓨터에 원하는 정보처리를 위한 위치신호를 보내는 장치이다.1 is a schematic structural diagram of an electronic apparatus provided with a touch panel according to the related art. As shown in FIG. 1, an electronic device driven by a touch method is generally divided into an image display module 70 including an image panel, a light source, a driver, and the like, a touch panel that recognizes a signal by a touch, and other components. Are distinguished. In this case, the touch panel is provided on a display surface of an image display module 70 such as a cathode ray tube (CRT), a liquid crystal display (LCD), a plasma display panel (PDP), and an electroluminescent element (ELD). The device sends a position signal to a computer for desired information processing by touching.

이러한 상기 터치패널은 구동 방식에 따라 저항방식, 정전방식, SAW방식, 적외선방식 등이 있는데, 주로 정전방식의 타입이 많이 사용된다. 상기 정전방식은 사람의 몸에서 발생하는 정전기를 감지해 구동하는 방식으로써, 과거에는 제품의 전면부 표면에 해당하는 강화유리(10) 외에 상기 강화유리(10) 내부에 ITO 패턴(30)을 진공증착하기 위한 별도의 내부유리판을 1매 내지 2매 삽입하여 상기 ITO 패턴(30)을 상기 내부유리판의 양측면 혹은 사이에 각각 형성시킨 후 어셈블리하여 터치패널을 완성하였다. 그러나 상기한 방법으로는 터치패널의 두께가 두꺼워지는 관계로 근래의 차세대 방법으로는 상기 강화유리(10)에 직접 상기 ITO 패턴(30)을 진공증착하는 방법을 사용한다.The touch panel includes a resistance method, an electrostatic method, an SAW method, an infrared method, etc. according to a driving method, and a type of an electrostatic method is mainly used. The electrostatic method is a method of sensing and driving static electricity generated in a human body. In the past, in addition to the tempered glass 10 corresponding to the front surface of the product, the ITO pattern 30 is vacuumed inside the tempered glass 10. One or two separate inner glass plates for deposition were inserted to form the ITO pattern 30 on both sides or between the inner glass plates, and then assembled to complete the touch panel. However, since the thickness of the touch panel is increased as the above method, a recent method of vacuum depositing the ITO pattern 30 directly on the tempered glass 10 is used.

이때 도 1에서 보는 바와 같이, 상기 강화유리(10)에는 내면에 외부에서 내부의 배선이나 상기 ITO 패턴(30)의 측단을 잇는 금속전극 등이 보이지 않도록 하기 위하여 실제 화상이 표시되는 화상표시영역(40) 외에 블랙칼라베젤부(50)가 마련된다. 종래의 기술에 따르면, 상기 블랙칼라는 상기 베젤부(50)에 필름이나 실크스크린 인쇄기법을 이용하여 블랙칼라층(20)을 코팅함으로써 상기 내부 배선이나 금속전극 등을 가리는 소기의 목적을 달성하였다. In this case, as shown in FIG. 1, the tempered glass 10 has an image display area in which an actual image is displayed on the inner surface so that the internal wiring or the metal electrode connecting the side end of the ITO pattern 30 is not visible. In addition to 40), a black color bezel part 50 is provided. According to the related art, the black color achieves the desired purpose of covering the internal wiring or the metal electrode by coating the black color layer 20 on the bezel part 50 using a film or silk screen printing technique. .

그런데 상기 종래의 기술에 따른 상기 블랙칼라 코팅법은 필름 혹은 인쇄기법을 사용하기 때문에 피복되는 칼라층의 두께가 수㎛ 내지 수십㎛ 에 해당하였다. 반면 앞서 살펴본 바와 같이, 최근의 터치패널은 상기 블랙칼라베젤부(50)에 블랙칼라층(20)이 구비된 강화유리(10)에 직접 ITO 패턴(30)을 진공증착하는데 그 두께는 수십㎚에 불과하다.However, since the black color coating method according to the related art uses a film or a printing method, the thickness of the coated color layer corresponds to several μm to several tens of μm. On the other hand, as described above, the recent touch panel vacuum-deposits the ITO pattern 30 directly on the tempered glass 10 provided with the black color layer 20 on the black color bezel part 50 and the thickness thereof is several tens of nm. Is nothing.

때문에 상기 블랙칼라층(20)과 상기 ITO 패턴(30)층의 두께 차이로 인한 편차가 100배 내지 1000배 정도로 커서 상기 ITO 패턴(30)을 형성할 때, 제대로 ITO 패턴(30)이 형성이 되지 않고 단락이 빈번하게 발생한다. 이것은 진공증착에 의한 증착방향이 직진성을 가지는 관계로 상기 칼라층의 측면에는 증착이 잘 되지 않기 때문이다. 물론 증착장비 내에 구비되어 있는 코팅대상체를 장착하기 위한 지그가 회전하거나 각도를 조절할 수 있도록 되어있지만 실질적으로 공정상에서 단락의 발생은 여전히 빈번히 발생하는 실정이었다. Therefore, since the deviation due to the thickness difference between the black color layer 20 and the ITO pattern 30 layer is about 100 to 1000 times, the ITO pattern 30 is not properly formed when the ITO pattern 30 is formed. Short circuits occur frequently. This is because deposition on the side of the color layer is not well performed since the deposition direction by vacuum deposition has a straightness. Of course, the jig for mounting the coating object provided in the deposition equipment is capable of rotating or adjusting the angle, but in practice, the occurrence of short circuit still occurs frequently in the process.

도 2 및 도 3을 통해 보다 상세히 살펴본다. 도 2는 종래의 기술에 따라 블랙칼라베젤부(50)에 블랙칼라층(20)과 ITO 패턴(30)층이 형성된 단면도이다. 상기 블랙칼라층(20)은 종래에 필름방식 혹은 실크스크린 인쇄방식으로 형성되기 때문에, 도 2에서 보는 바와 같이, 증착방법으로 형성되는 ITO 패턴(30)층에 비해 그 두께가 현저히 두꺼워 많은 두께 편차를 가진다. 한편 여기서 화살표 방향은 진공증착기에서 ITO 패턴(30)을 형성할 때 증착방향을 나타내는 것으로서 상기 화살표에서 보는 바와 같이 이러한 증착의 방향성 때문에 특히 도 2의 A부분과 같은 부위에는 증착이 잘 되지 않았다.2 and 3 will be described in more detail. 2 is a cross-sectional view in which a black color layer 20 and an ITO pattern 30 layer are formed on the black color bezel part 50 according to the related art. Since the black color layer 20 is conventionally formed by a film method or a silk screen printing method, as shown in FIG. 2, the thickness of the black color layer is significantly thicker than that of the ITO pattern 30 layer formed by the deposition method, and thus a large thickness variation. Has Meanwhile, the arrow direction indicates the deposition direction when the ITO pattern 30 is formed in the vacuum evaporator. As shown in the arrow, the arrow direction is not particularly well deposited in the area as shown in part A of FIG. 2.

도 3은 도 2의 A 부분의 확대도로서 ITO 패턴(30)이 단락된 상태를 나타내는 도면이다. 이는 상기에 설명한 바와 같이, ITO 패턴(30) 증착 시 증착되는 방향의 직선성으로 인하여 상기 ITO 패턴(30)의 특히 A 부분과 같은 수직면에서 ITO 패턴(30)이 형성되지 않아 단락이 빈번하게 발생하게 됨을 잘 보여준다.3 is an enlarged view of a portion A of FIG. 2 and shows a state in which the ITO pattern 30 is short-circuited. As described above, due to the linearity of the deposition direction when the ITO pattern 30 is deposited, a short circuit occurs frequently because the ITO pattern 30 is not formed in a vertical plane such as the A portion of the ITO pattern 30. It shows how well it is done.

한편, 상기 진공증착법은 고진공상태를 만들 수 있는 챔버, 전압을 가하여 전자가 방출되는 캐소드, 타겟물질, 진공펌프, 각종 대상물을 장착하기 위한 지그 등을 구비한 장비에 반응성 가스를 주입하여 가스량, 전압, 시간, 증착 횟수 등의 공정변수를 조절함으로써, 금속 또는 비금속의 상기 타겟물질을 진공상태에서 가열하여 상기 조각에서 발생되는 증기를 상대적으로 낮은 온도의 상태에 있는 피복하고자 하는 물체면에 응축부착시켜 원하는 위치에 원하는 코팅층을 완성하는 방법이다. Meanwhile, the vacuum deposition method injects a reactive gas into equipment having a chamber capable of creating a high vacuum state, a cathode for emitting electrons by applying a voltage, a target material, a vacuum pump, a jig for mounting various objects, and the like. By controlling the process parameters such as time, deposition number, etc., the target material of metal or nonmetal is heated in vacuum to condense and attach the vapor generated from the piece to the surface of the object to be coated at a relatively low temperature. It is a method of completing a desired coating layer at a desired position.

상기 진공증착법은 종래의 기술에서는 각종 전자기기의 케이스(60) 등에 단순히 원하는 색상을 코팅하기 위하여 이용되었을 뿐 비전도의 특성을 갖추지는 못하였다. 또한 비록 비전도의 특성을 갖더라도 블랙 색상에 대한 적용은 없었으며, 더욱이 터치패널글라스(10) 내면의 베젤부(50)에 적용하여 ITO 패턴(30)의 단락으로 인한 공정상의 불량을 해결함과 동시에 비전도 특성을 갖는 블랙칼라의 진공증착방법은 적용이 더더욱 없었다. 전자기기 등에 코팅을 하는 경우에 각종 전기적 간섭, 특히 통신기기의 전파방해의 방지를 위하여 비전도의 특성을 확보하는 것은 매우 중요하다.
The vacuum deposition method has been used in the prior art to simply coat the desired color, such as the case 60 of the various electronic devices did not have the characteristics of non-conductivity. In addition, although it has a non-conductive property, there was no application to the black color, and moreover, it was applied to the bezel part 50 on the inner surface of the touch panel glass 10 to solve the process defect due to the short circuit of the ITO pattern 30. At the same time, the vacuum deposition method of the black color with non-conductive properties was much less applicable. In the case of coating on electronic devices, it is very important to secure the characteristics of non-conductivity in order to prevent various electrical interference, in particular, the interference of communication devices.

본 발명의 목적은 진공증착을 이용하여 터치패널글라스 내면의 베젤부에 종래 방식의 블랙칼라층에 비하여 그 두께가 현저히 얇은 블랙칼라층을 형성함으로써, 상기 블랙칼라층과 ITO 패턴층과의 두께 편차를 줄여 공정 중의 ITO 패턴의 단락으로 인한 불량률을 획기적으로 줄이는 방법을 제공하는 데 있다.An object of the present invention is to form a black color layer having a significantly thinner thickness than that of the conventional black color layer in the bezel portion of the inner surface of the touch panel glass by using vacuum deposition, thereby causing a thickness variation between the black color layer and the ITO pattern layer. It is to provide a way to significantly reduce the failure rate due to short circuit of the ITO pattern during the process.

또한 본 발명은 상기한 목적과 더불어, 상기 블랙칼라층이 비전도성의 특성을 가지도록 하여 상기 ITO 패턴과 상기 ITO 패턴을 잇는 상기 베젤부에 위치하는 금속전극간의 통전을 막을 수 있고, 내구성 및 보다 나은 퀄리티의 블랙칼라층을 제공하는 데 그 목적이 있다.
In addition, the present invention, in addition to the above object, it is possible to prevent the electrical conduction between the metal electrode located in the bezel portion connecting the ITO pattern and the ITO pattern to have the non-conductive properties of the black color layer, durability and more The aim is to provide a better quality black color layer.

본 발명은 알미늄(Al), 티타늄(Ti), 주석(Sn), 몰리브덴(Mo), 실리콘(Si) 및 이들의 조합 또는 이들의 산화물 혹은 질화물을 타겟물질로 사용하되, 진공증착기 챔버 내의 진공도, 가스량, DC파워, 증착시간 등의 변수를 조정함으로써 터치패널글라스(10) 내면의 베젤부(50)에 종래 방식의 블랙칼라층(20)에 비하여 그 두께가 현저히 얇고 비전도의 특성을 갖춘 블랙칼라층(20)을 구비할 수 있다. The present invention uses aluminum (Al), titanium (Ti), tin (Sn), molybdenum (Mo), silicon (Si) and combinations thereof or oxides or nitrides thereof as a target material, the degree of vacuum in the vacuum vapor deposition chamber, By adjusting parameters such as gas amount, DC power and deposition time, the bezel portion 50 on the inner surface of the touch panel glass 10 is significantly thinner than the black color layer 20 of the conventional method and has a non-conductive property. The color layer 20 may be provided.

예로써 티타늄(Ti)을 타겟으로 사용하는 경우, 진공증착기의 챔버 내부의 진공도를 6.0E-5로 하고 이온소스로 아르곤 가스를 60sccm(standard cubic centimeter per minute) 주입하며 파워는 250V로 하고 시간은 10분으로 하는 전처리 과정을 거친 후, 이후 증착 과정에서는 아르곤 가스를 250sccm, 아세틸렌을 200sccm, 질소를 50sccm 내지 55sccm 으로 주입하고 DC파워를 10.0kw로 유지하여 1시간 30분간 진행한 결과 비전도의 특성을 가지는 블랙칼라으로 증착함으로써 소기의 목적을 달성하고자 한다.
For example, when using titanium (Ti) as a target, the vacuum degree inside the chamber of the vacuum evaporator is 6.0E-5, and 60 sccm (standard cubic centimeter per minute) is injected into the ion source, and the power is 250V. After 10 minutes of pretreatment, in the subsequent deposition process, argon gas was injected at 250sccm, acetylene at 200sccm, nitrogen at 50sccm to 55sccm, and DC power was maintained at 10.0kw for 1 hour and 30 minutes. It is intended to achieve the desired purpose by depositing with a black color having a.

본 발명에 따르면, 알미늄(Al), 티타늄(Ti), 주석(Sn), 몰리브덴(Mo), 실리콘(Si) 및 이들의 조합 또는 이들의 산화물 혹은 질화물을 타겟물질로 사용하되, 진공증착기 챔버 내의 진공도, 가스량, DC파워, 증착시간 등의 공정변수의 조정을 통하여 터치패널글라스 내면의 베젤부에 종래 방식의 블랙칼라층에 비하여 그 두께가 현저히 얇은 블랙칼라층을 구비함으로써, 상기 블랙칼라층과 ITO 패턴층과의 두께편차로 인하여 빈번하게 발생되는 상기 ITO 패턴의 단락을 해결하여 불량을 줄임과 동시에 생산성 향상을 비약적으로 확보할 수 있다.According to the present invention, aluminum (Al), titanium (Ti), tin (Sn), molybdenum (Mo), silicon (Si) and combinations thereof or oxides or nitrides thereof are used as a target material, but in a vacuum deposition chamber By adjusting process variables such as vacuum degree, gas amount, DC power, and deposition time, the black color layer and the black color layer are provided in the bezel portion of the inner surface of the touch panel glass with a significantly thinner thickness than the conventional black color layer. The short-circuit of the ITO pattern, which is frequently generated due to the thickness deviation from the ITO pattern layer, can be solved, thereby reducing defects and attaining a significant productivity improvement.

또한 본 발명은 비전도성을 갖춘 블랙칼라층을 제공하여 상기 터치패널글라스 내면의 베젤부에 구비되어 있는 ITO 패턴과 상기 ITO 패턴의 측단을 잇는 금속배선부분의 패턴과의 통전을 막을 수 있고 전자기기 내의 전기적 간섭 혹은 통신기기의 전파방해를 피할 수 있다. 더불어 극미세의 증발입자가 코팅대상체의 표면에 증착되기 때문에 내구성 및 우수한 퀄리티를 갖춘 블랙칼라를 제공하여 완제품의 외관상의 품질 향상에도 기여할 수 있다.In another aspect, the present invention provides a non-conductive black color layer to prevent the electrical current between the ITO pattern provided in the bezel portion of the inner surface of the touch panel glass and the pattern of the metal wiring portion connecting the side end of the ITO pattern and prevents the electronic device Electrical interference in the interior or jamming of communication equipment can be avoided. In addition, since very fine evaporated particles are deposited on the surface of the coating object, it can contribute to improving the appearance quality of the finished product by providing a black color with durability and excellent quality.

더욱이 종래의 기술에서 인쇄기법을 이용한 방법은 염료를 사용하는 관계로 작업환경에 부정적인 영향을 미쳤는바, 본 발명은 이러한 환경적인 개선효과도 아울러 가지고 있다.
Moreover, the method using the printing technique in the prior art has a negative effect on the working environment due to the use of dyes, the present invention also has such an environmental improvement effect.

도 1은 종래기술의 터치패널이 구비된 전자기기의 개략적인 구조도
도 2는 도 1의 C-C' 부분의 단면도
도 3은 도 2의 A 부분의 확대도
도 4는 본 발명에 따라 터치패널글라스 내면의 베젤부에 블랙칼라층을 형성하는 예시도
도 5는 본 발명에 따라 터치패널글라스 내면의 베젤부에 블랙칼라층이 형성된 예시도
도 6은 본 발명에 따른 블랙칼라층과 ITO 패턴층의 단면도이다.
1 is a schematic structural diagram of an electronic apparatus provided with a touch panel of the related art
FIG. 2 is a cross-sectional view of portion CC ′ of FIG. 1.
3 is an enlarged view of a portion A of FIG.
4 is an exemplary view of forming a black color layer on the bezel portion of the inner surface of the touch panel glass according to the present invention.
5 is an exemplary view in which a black color layer is formed on a bezel portion of an inner surface of a touch panel glass according to the present invention.
6 is a cross-sectional view of the black color layer and the ITO pattern layer according to the present invention.

이상 살펴본 바와 같이, 종래 기술의 문제점이었던 상기 블랙칼라층(20)과 ITO 패턴(30)간의 두께 편차로 인한 ITO 패턴(30)층의 단락을 방지하고, 비전도성, 내구성 및 미려한 색상의 블랙칼라층(20)을 터치패널글라스(10)의 베젤부(50)에 제공하기 위한 구체적인 방법을 이하 도면을 통해 살펴보기로 한다.As described above, the short-circuit of the ITO pattern 30 due to the thickness variation between the black color layer 20 and the ITO pattern 30, which is a problem of the prior art, is prevented, and the black color of non-conductive, durable and beautiful color A method of providing the layer 20 to the bezel part 50 of the touch panel glass 10 will be described with reference to the accompanying drawings.

도 4는 본 발명에 따라 터치패널글라스(10)의 베젤부(50)에 블랙칼라층(20)을 형성하는 도면이다. 도면에서 화살표 방향은 진공증착기 내에서 증착방향을 나타낸다. 본 발명에 따르면 원하는 부위에 두께가 얇고 비전도성을 가진 블랙칼라층(20)을 형성해야 하는 바, 코팅대상체를 진공증착용 지그에 장착하기 전에 상기 터치패널글라스(10) 하면의 화상표시영역(40)에 쉐도우마스크(80)를 구비하여 일체화한다. 여기서 쉐도우마스크(80)를 사용하는 방법 외에 상기 터치패널글라스(10) 내면 전체를 진공증착 후 패턴 등의 방법으로 원하는 부위에만 코팅을 남기는 방법도 있다. 이어 상기 일체화된 코팅대상체를 증착기의 코팅대상체 지그에 장착하고 증착을 실시하면 도 4에서 보는 바와 같이 원하는 부위, 즉 터치패널글라스(10)의 베젤부(50)에 본 발명에 따른 블랙칼라층(20)의 코팅이 완성된다.4 is a diagram illustrating a black color layer 20 formed on the bezel part 50 of the touch panel glass 10 according to the present invention. Arrow direction in the figure indicates the deposition direction in the vacuum evaporator. According to the present invention, the black color layer 20 having a thin thickness and non-conductivity should be formed on a desired portion. Before the coating object is mounted on the vacuum deposition jig, an image display area on the bottom surface of the touch panel glass 10 ( The shadow mask 80 is provided in 40 and integrated. Here, in addition to using the shadow mask 80, the entire surface of the touch panel glass 10 may be vacuum-deposited, and then the coating may be left only on a desired part by a method such as a pattern. Subsequently, when the integrated coating object is mounted on the coating jig of the evaporator and the deposition is carried out, a black color layer according to the present invention is formed on the bezel part 50 of the desired part, that is, the touch panel glass 10 as shown in FIG. The coating of 20) is completed.

이때 상기 진공증착 과정에서 타겟물질은 알미늄(Al), 티타늄(Ti), 주석(Sn), 몰리브덴(Mo), 실리콘(Si) 중 어느 하나이거나 조합도 사용가능하며 상기 메탈물질의 산화물 혹은 질화물도 타겟물질로 사용 가능하다.
At this time, the target material in the vacuum deposition process may be any one or a combination of aluminum (Al), titanium (Ti), tin (Sn), molybdenum (Mo), silicon (Si) and also the oxide or nitride of the metal material Can be used as a target material.

일 실시 예로써 티타늄(Ti), 실리콘(Si)의 두 메탈을 각각 혹은 조합해서 사용했을 경우를 살펴보면 다음과 같다.
As an example, a case in which two metals of titanium (Ti) and silicon (Si) are used in combination or in combination is as follows.

< 실시예 1 : 티타늄(Ti)을 타겟으로 사용한 경우 ><Example 1: Titanium (Ti) is used as a target>

먼저 진공증착기의 챔버 내부의 진공도를 6.0E-5 로 하고 증착 진행 전 전처리 과정을 거친다. 상기 전처리 과정은 이온소스로 아르곤 가스를 60sccm 주입하고파워는 250V로 하며, 상기 전처리 시간은 10분으로 한다. 이후 증착 과정에서는 아르곤 가스를 250sccm, 아세틸렌을 200sccm, 질소를 50sccm 내지 55sccm 으로 주입하고 DC파워를 10.0kw로 유지하여 진공증착을 1시간 30분간 진행한다.
First, the vacuum degree inside the chamber of the vacuum evaporator is 6.0E-5 and is subjected to pretreatment before deposition. In the pretreatment process, 60 sccm of argon gas is injected into the ion source, the power is 250 V, and the pretreatment time is 10 minutes. Thereafter, in the deposition process, 250 sccm of argon gas, 200 sccm of acetylene, and 50 sccm to 55 sccm of nitrogen were injected, and DC power was maintained at 10.0 kw to perform vacuum deposition for 1 hour 30 minutes.

< 실시예 2 : 실리콘(Si)을 타겟으로 사용한 경우 ><Example 2: Using Silicon (Si) as a Target>

먼저 진공증착기의 챔버 내부의 진공도를 6.0E-5 로 하고 증착 진행 전 전처리 과정을 거친다. 상기 전처리 과정은 이온소스로 아르곤 가스를 60sccm 주입하고파워는 250V로 하며, 상기 전처리 시간은 10분으로 한다. 이후 증착 과정에서는 아르곤 가스를 300sccm, 아세틸렌을 200sccm으로 주입하고 DC파워를 5.5kw로 유지하여 진공증착을 1시간 40분간 진행한다.
First, the vacuum degree inside the chamber of the vacuum evaporator is 6.0E-5 and is subjected to pretreatment before deposition. In the pretreatment process, 60 sccm of argon gas is injected into the ion source, the power is 250 V, and the pretreatment time is 10 minutes. In the deposition process, 300 sccm of argon gas and 200 sccm of acetylene were injected, and the DC power was maintained at 5.5 kw to perform vacuum deposition for 1 hour and 40 minutes.

< 실시예 3 : 티타늄(Ti)과 실리콘(Si)을 같이 사용하는 경우 ><Example 3: Using titanium (Ti) and silicon (Si) together>

DC 스퍼터 20KW 2대를 사용하여 DC파워 한대는 티타늄(Ti) 타겟에 연결하고 다른 한대는 실리콘(Si) 타겟에 연결하고 다음으로 챔버 내부의 진공도를 6.0E-5로 이온소스 전처리를 진행한다. 이때 상기 이온소스 전처리 조건은 파워를 250V로 하고 아르곤 가스를 60sccm으로 투입하며 이온소스 전처리시간은 10분으로 한다. 상기 전처리 직후 바로 진공증착을 실시한다. 이때 상기 진공증착 조건은 아르곤 가스, 아세틸렌, 질소를 각각의 독립적인 가스관을 사용하여 동시에 투입하되 상기 아르곤 가스는 250sccm, 상기 아세틸렌은 200sccm, 상기 질소는 50sccm 내지 55sccm으로 투입한다. 이어 상기 티타늄(Ti)을 1시간 가량 증착하면 짙은 갈색정도의 투과율 5% 내지 15%의 코팅층이 형성되는데, 여기서 다시 아르곤을 400sccm 투입 후 실리콘(Si)을 30분 증착하면 투과율 0%의 비전도 특성을 가지는 블랙칼라의 블랙칼라층(20)이 코팅된다.
Using two DC sputters, 20KW, one DC power is connected to a titanium (Ti) target, the other is connected to a silicon (Si) target, and the ion source pretreatment is performed at 6.0E-5. At this time, the ion source pretreatment condition is set to 250V power, argon gas at 60sccm and the ion source pretreatment time is 10 minutes. Immediately after the pretreatment, vacuum deposition is carried out. At this time, the vacuum deposition conditions are introduced into the argon gas, acetylene, nitrogen at the same time using each independent gas pipe, the argon gas is 250sccm, the acetylene is 200sccm, the nitrogen is 50sccm to 55sccm. Subsequently, when titanium is deposited for about 1 hour, a coating layer having a transmittance of about 5% to 15% of dark brown color is formed, wherein when silicon (Si) is deposited for 30 minutes after adding 400 sccm of argon, nonconductivity of 0% of transmittance is obtained. The black color layer 20 of the black color having the characteristic is coated.

따라서 이상의 과정을 거치면 원하는 부위, 즉 터치패널글라스(10)의 베젤부(50)에 비전도의 특성을 가진 블랙칼라의 코팅이 형성된다. 더욱이 상기 블랙칼라층(20)은 미세한 증발입자가 코팅대상체의 표면에 코팅되는 것이므로 종래의 기술에 따른 필름방식이나 인쇄기법의 블랙칼라층(20)보다 내구성의 면에서도 보다 우수한 특성을 갖는다.Therefore, through the above process, a black color coating having a non-conductive property is formed on a desired portion, that is, the bezel part 50 of the touch panel glass 10. Furthermore, since the black color layer 20 is coated with fine evaporated particles on the surface of the coating object, the black color layer 20 has more excellent properties in terms of durability than the black color layer 20 of the film method or the printing method according to the prior art.

도 5는 본 발명에 따라 터치패널 베젤부(50)에 블랙칼라층(20)을 형성하고 쉐도우마스크(80)를 제거한 이후의 도면이다. 증착공정이 완료된 후 상기 쉐도우마스크(80)를 제거하면 도 5에서 보는 바와 같이 터치패널글라스(10)의 베젤부(50)에만 블랙칼라층(20)이 코팅된다. 이때 상기 코팅층은 그 두께가 수십㎚가 된다. 한편, 터치패널글라스(10)의 베젤부(50)에 블랙칼라층(20)을 형성하는 방법은 상기한 방법 외에도 i)코팅대상체에 패턴을 하고 진공증착 후 패턴을 제거하는 방법; ii)코팅대상체에 일정부위를 진공증착 한 후 패턴 등의 기법으로 원하는 부위만 남기는 방법 등이 있다.5 is a view after the black color layer 20 is formed on the touch panel bezel part 50 and the shadow mask 80 is removed according to the present invention. When the shadow mask 80 is removed after the deposition process is completed, the black color layer 20 is coated only on the bezel part 50 of the touch panel glass 10 as shown in FIG. 5. In this case, the coating layer has a thickness of several tens of nm. On the other hand, the method for forming the black color layer 20 on the bezel portion 50 of the touch panel glass 10, in addition to the above-described method i) a pattern on the coating object and the method of removing the pattern after vacuum deposition; ii) After vacuum depositing a certain part on the coating object, there is a method of leaving only the desired part by a technique such as a pattern.

도 6은 본 발명에 따른 블랙칼라층(20)과 ITO 패턴(30)층의 단면도이다. 본 발명에 따른 진공증착에 의한 블랙칼라층(20)은 그 두께가 수십㎚에 해당하여 현저하게 얇기 때문에 도면에서 보는 바와 같이, 블랙칼라층(20)의 세로면에서 종래의 기술처럼 ITO 패턴(30)의 단락이 발생하지 않게 된다.6 is a cross-sectional view of the black color layer 20 and the ITO pattern 30 layer according to the present invention. As shown in the drawing, the black color layer 20 by vacuum deposition according to the present invention is remarkably thin because its thickness corresponds to several tens of nm. The short circuit in 30) does not occur.

이상에서 살펴본 바와 같이, 본 발명은 쉐도우마스크(80) 등을 사용하여 터치패널글라스(10) 내면의 베젤부(50)에 그 두께가 수십㎚ 인 블랙칼라 코팅층을 마련함으로써 ITO 패턴(30) 형성 시 단락의 가능성을 획기적으로 줄이고, 또한 비전도성을 확보하여 상기 베젤부(50)에 위치하는 금속전극과 ITO 패턴(30)층과의 통전과 전파방해 등을 막을 수 있으며 종래의 기술에 따른 필름방식이나 인쇄기법의 블랙칼라층(20)보다 내구성 등의 면에서도 보다 우수한 특성을 갖는 블랙칼라층(20)을 제공한다.
As described above, the present invention forms the ITO pattern 30 by providing a black color coating layer having a thickness of several tens nm on the bezel part 50 of the inner surface of the touch panel glass 10 using a shadow mask 80 or the like. It greatly reduces the possibility of short-circuit time, and also secures non-conductivity to prevent the conduction and interference of the metal electrode and the ITO pattern 30 layer located in the bezel portion 50, and the film according to the prior art A black color layer 20 having better characteristics in terms of durability and the like than the black color layer 20 of a method or a printing technique is provided.

10 : 터치패널글라스 또는 강화유리 20 : 블랙칼라층
30 : ITO 패턴 40 : 화상표시영역
50 : 블랙칼라베젤부 또는 베젤부 60 : 어셈블리 케이스
70 : 화상표시모듈 80 : 쉐도우마스크
10: touch panel glass or tempered glass 20: black color layer
30: ITO pattern 40: image display area
50: black color bezel portion or bezel portion 60: assembly case
70: image display module 80: shadow mask

Claims (4)

진공상태의 챔버에 코팅대상체, 타겟물질이 등이 구비되고 반응성가스가 주입된 분위기에서 타겟물질에 전압을 가하여 증착하는 진공증착방법에 있어서,
상기 코팅대상체는 터치패널글라스(10)이고, 상기 터치패널글라스(10) 내면의 베젤부(50)에만 진공증착방법으로 블랙칼라층(20)을 형성하는 것을 특징으로 하는 터치패널글라스 베젤부의 블랙칼라 진공증착방법.
In the vacuum deposition method in which a coating object, a target material, etc. are provided in a chamber in a vacuum state, and a voltage is applied to the target material in an atmosphere in which a reactive gas is injected.
The object to be coated is the touch panel glass 10, and the touch panel glass bezel part black is formed on the bezel part 50 of the inner surface of the touch panel glass 10 by vacuum deposition. Color vacuum deposition method.
제 1항에 있어서, 상기 타겟물질은 티타늄(Ti)을 사용하고, 진공증착기의 챔버 내부의 진공도를 6.0E-5 로 하며 이온소스로 아르곤 가스를 60sccm 주입하고 파워는 250V로 하고 시간은 10분으로 하는 전처리 과정을 거친 후, 아르곤 가스를 250sccm, 아세틸렌을 200sccm, 질소를 50sccm 내지 55sccm 으로 주입하고 DC파워를 10.0kw로 유지하여 1시간 30분간 진공증착을 진행함으로써 상기 베젤부(50)에 비전도 특성을 가지는 블랙칼라층(20)을 형성하는 것을 특징으로 하는 터치패널글라스 베젤부의 블랙칼라 진공증착방법.
The method of claim 1, wherein the target material is made of titanium (Ti), the vacuum degree inside the chamber of the vacuum evaporator is 6.0E-5, 60sccm injection of argon gas into the ion source, the power is 250V and the time is 10 minutes After the pretreatment process, 250 sccm of argon gas, 200 sccm of acetylene, 50 sccm to 55 sccm of nitrogen was injected, and DC power was maintained at 10.0 kw to perform vacuum deposition for 1 hour and 30 minutes to vision on the bezel part 50. The black color vacuum deposition method of the touch panel glass bezel portion, characterized in that to form a black color layer 20 having a characteristic.
제 1항에 있어서, 상기 타겟물질은 실리콘(Si)을 사용하고, 진공증착기의 챔버 내부의 진공도를 6.0E-5 로 하며 이온소스로 아르곤 가스를 60sccm 주입하고 파워는 250V로 하고 시간은 10분으로 하는 전처리 과정을 거친 후, 아르곤 가스를 300sccm, 아세틸렌을 200sccm 주입하고 DC파워를 5.5kw로 유지하여 1시간 30분간 진공증착을 진행함으로써 상기 베젤부(50)에 비전도 특성을 가지는 블랙칼라층(20)을 형성하는 것을 특징으로 하는 터치패널글라스 베젤부의 블랙칼라 진공증착방법.
The method of claim 1, wherein the target material is made of silicon (Si), the vacuum degree inside the chamber of the vacuum evaporator is 6.0E-5, 60sccm of argon gas is injected into the ion source, the power is 250V and the time is 10 minutes After the pretreatment process, 300 sccm of argon gas and 200 sccm of acetylene were injected, and the DC power was maintained at 5.5 kw to perform vacuum deposition for 1 hour and 30 minutes, thereby having a black color layer having non-conductive properties on the bezel part 50. A black color vacuum deposition method of forming a touch panel glass bezel, characterized by forming (20).
제 1항에 있어서, 상기 타겟물질은 티타늄(Ti)과 실리콘(Si)을 함께 사용하고 DC스퍼터 2대를 사용하여 한대는 티타늄(Ti) 타겟에 연결하고 다른 한대는 실리콘(Si) 타겟에 연결한 후, 진공증착기의 챔버 내부의 진공도를 6.0E-5로 하고 아르곤 가스를 60sccm 주입하며 파워를 250V로 하고 시간은 10분으로 하는 전처리 과정을 거친 후, 아르곤 가스, 아세틸렌, 질소를 각각의 독립적인 가스관을 사용하여 동시에 투입하되, 상기 아르곤 가스는 250sccm, 상기 아세틸렌은 200sccm, 상기 질소는 50sccm 내지 55sccm으로 투입하고 이어 상기 티타늄(Ti)을 1시간 가량 증착하여 코팅층을 형성한 후, 다시 아르곤을 400sccm 투입한 다음 실리콘(Si)을 30분 증착함으로써 상기 베젤부(50)에 비전도 특성을 가지는 블랙칼라층(20)을 형성하는 것을 특징으로 하는 터치패널글라스 베젤부의 블랙칼라 진공증착방법.The method of claim 1, wherein the target material is a combination of titanium (Ti) and silicon (Si), using two DC sputters, one is connected to the titanium (Ti) target and the other is connected to the silicon (Si) target After the pretreatment process, the vacuum degree inside the chamber of the vacuum evaporator is 6.0E-5, the argon gas is injected 60sccm, the power is 250V, the time is 10 minutes, and the argon gas, acetylene and nitrogen are each independently Using a phosphorus gas pipe at the same time, the argon gas is 250sccm, the acetylene is 200sccm, the nitrogen is 50sccm to 55sccm and then the titanium (Ti) for about 1 hour to form a coating layer, then argon again The touch panel glass bezel part black is formed by adding 400 sccm and then depositing silicon (Si) for 30 minutes to form a black color layer 20 having non-conductive properties on the bezel part 50. Color vacuum deposition method.
KR1020110042989A 2011-05-06 2011-05-06 Black vacuum plating on bezel of a touch panel glass KR101074263B1 (en)

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