KR20110034727A - Dielectric window contamination protection apparatus, self plasma optical emission spectrum apparatus, and particle measurement apparatus - Google Patents

Abstract

PURPOSE: A dielectric window pollution preventing apparatus, a self plasma light emission spectrum device, and a particle measuring device are provided to prevent a dielectric window from being polluted due to process gas and process byproducts by spraying pollution preventing gas to the dielectric window through a nozzle unit. CONSTITUTION: A dielectric window is combined with a flange attached to a vacuum container. A nozzle unit(520a,520b) is arranged around the dielectric window or flange. The nozzle unit provides the pollution preventing gas to the dielectric window. The flange includes a first flange(515a) and a second flange(515b). The dielectric window includes a first dielectric window(528a) combined with the first flange and a second dielectric window(528b) combined with the second flange.

Description

DIAGECTRIC WINDOW CONTAMINATION PROTECTION APPARATUS, SELF PLASMA OPTICAL EMISSION SPECTRUM APPARATUS, AND PARTICLE MEASUREMENT APPARATUS

The present invention relates to a pollution prevention apparatus, and more particularly to a dielectric window contamination prevention apparatus of a vacuum vessel.

Self Plasma Optical Emission Spectroscopy (SPOES) can form a plasma in an exhaust line of a process vessel and analyze light generated from the plasma to measure whether leakage occurs or whether a gas supply gas is defective. The SPOES requires a dielectric window to measure the optical spectrum. However, the dielectric window is contaminated over time and needs to be cleaned or replaced periodically. What is needed is a technique to prevent contamination of the dielectric window.

Fine particles in the tens to hundreds of nm that occur in semiconductor processes such as deposition, etching, and planarization not only reduce the cleanliness of the process vessels in which the semiconductor process is performed, but also adhere to patterns having similar line widths. Can damage it. Degradation of cleanliness and pattern damage inside the process vessel may seriously degrade the yield of the semiconductor process. Accordingly, monitoring of particles generated in the plasma process used in the semiconductor process is essential. Laser light scattering or laser absorption is a method for determining the size of fine particles present in the plasma. The laser light scattering method irradiates a laser into the plasma to measure the ratio of the intensity between the vertically polarized component and the horizontally polarized component of the scattered light scattered by the particles present in the plasma at a specific scattering angle, and the horizontally polarized component of the scattered light and the horizontal It is a method of determining the size of particles scattering a laser through the ratio of the intensity between polarization components. The laser light scattering method injects light into a dielectric window disposed in a process vessel or exhaust line and measures the scattered light. In addition, unlike the laser scattering method, the particle measuring method using the absorption method is a technique of directly receiving laser transmitted light excluding scattered light and analyzing the particle. However, the dielectric windows used in the two techniques need to be periodically cleaned as they are contaminated as the semiconductor process proceeds. Therefore, there is a need for a technique for preventing contamination of the dielectric window.

One technical problem to be solved of the present invention is to provide a dielectric window contamination prevention apparatus that reduces the contamination on the dielectric window.

One technical problem to be solved by the present invention is to provide a self-plasma light emission spectrum device that reduces the contamination of the dielectric window.

One technical problem to be solved of the present invention is to provide a particle measuring apparatus for reducing contamination on the dielectric window.

Dielectric window contamination prevention apparatus according to an embodiment of the present invention is a dielectric window coupled to the flange attached to the vacuum container, and a nozzle portion disposed around or on the flange of the dielectric window to provide an antifouling gas to the dielectric window Include.

In one embodiment of the present invention, the flange includes a first flange and a second flange facing each other, the dielectric window is coupled to the first dielectric window, and the second flange coupled to the first flange. A second dielectric window may be included, and the nozzle unit may include a first nozzle unit and a second nozzle unit. The first nozzle portion is disposed around the first dielectric window or on the first flange to provide an antifouling gas to the first dielectric window, wherein the second nozzle portion is around the second dielectric window or the second flange. May be disposed in the second dielectric window to provide an antifouling gas.

In one embodiment of the present invention, the vacuum vessel may be a process vessel or an exhaust line.

In one embodiment of the present invention, the nozzle portion includes a nozzle inlet and a nozzle outlet, the nozzle portion is gradually changed in direction as it proceeds from the nozzle inlet to the nozzle outlet to provide a whirlwind to the stigma prevention gas Can be.

In one embodiment of the present invention, as the nozzle portion proceeds from the nozzle inlet to the nozzle outlet, the cross-sectional area is gradually reduced to accelerate the pollution prevention gas.

In one embodiment of the present invention, the nozzle portion has a first through-hole in the center and a first support plate including spiral grooves on one surface, disposed around and outside the dielectric window disposed on the first support plate And a gas line connected through the second support plate to one end of the grooves. The other end of the grooves may be connected to the through hole.

In one embodiment of the present invention, the nozzle portion has a first through-hole in the center and a first support plate including spiral grooves on one surface, disposed around and outside the dielectric window disposed on the first support plate The second support plate may be, and a gas line connected to one end of the grooves through the side of the first support plate. The other end of the grooves may be connected to the first through hole.

In one embodiment of the present invention, the nozzle portion has a first through-hole in the center and a first support plate including spiral nozzle passages on one surface, around and outside the dielectric window disposed on the first support plate A second support plate disposed and a gas line connected to one end of the nozzle passages through the side of the first support plate, the other end of the nozzle passages may be connected to the first through hole.

In one embodiment of the present invention, the nozzle portion has an output flange attached to the vacuum container having a through-hole in the center and spiral grooves on one surface thereof, a periphery and an outer upper portion of the dielectric window disposed on the output flange. And a cover plate disposed in the gas pipe connected to one end of the grooves through the side of the output flange, and the other end of the grooves may be connected to the through hole.

The plasma self-emission spectral device according to an embodiment of the present invention is connected to a plasma generator, an exhaust line, a vacuum vessel in which a gas is introduced into a process vessel and plasma is formed by the plasma generator, and is mounted on the vacuum vessel. A dielectric window for transmitting the plasma emitted light generated by the plasma, a nozzle portion disposed around the dielectric window or disposed in the vacuum vessel to provide an antifouling gas to the dielectric window, disposed outside the vacuum vessel, and It may include a spectroscopic unit for receiving the plasma emission light and spectroscopically detect, and a processing unit for monitoring the abnormality of the process vessel by processing the output signal of the spectroscopic unit.

A self-contained plasma light emission spectrum apparatus according to an embodiment of the present invention includes an input flange coupled to an auxiliary line connected to an exhaust line, through which the gas of a process vessel is introduced, and a vacuum vessel including an output flange. And a plasma generating unit for forming a plasma in the vacuum container, a dielectric window coupled to the output flange and transmitting plasma emission light generated by the plasma, and disposed around or around the dielectric window to prevent contamination of the gas. It may include a nozzle portion provided to the dielectric window.

Particle measuring apparatus according to an embodiment of the present invention is a vacuum container including a first and a second flange facing each other, a first dielectric window coupled to the first flange, a second dielectric coupled to the second flange A first nozzle portion disposed around a window, the first dielectric window, or on the first flange to provide an antifouling gas to the first dielectric window, around the second dielectric window, or disposed on the second flange and contaminated And a second nozzle portion for providing the prevention gas to the second dielectric window, and a laser portion provided to the first dielectric window to provide laser light to particles in the vacuum vessel.

Dielectric window contamination prevention apparatus according to an embodiment of the present invention includes a nozzle unit. The nozzle portion may be disposed around the dielectric window to spray the anti-pollution gas onto the dielectric window to suppress contamination of the dielectric window from the process gas and process by-products. The nozzle portion is helical and may reduce the cross-sectional area toward the nozzle outlet to desorb contaminants attached to the dielectric window. The antifouling gas may remain around the dielectric window for a long time to limit access of the pollutant.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the present invention is not limited to the embodiments described herein and may be embodied in other forms. Rather, the embodiments introduced herein are provided so that the disclosure may be made thorough and complete, and to fully convey the spirit of the invention to those skilled in the art. In the drawings, the components have been exaggerated for clarity. Portions denoted by like reference numerals denote like elements throughout the specification.

1 is a view for explaining a dielectric window contamination prevention apparatus according to an embodiment of the present invention.

Referring to FIG. 1, the dielectric window contamination prevention device includes a dielectric window 528a and 528b that engages the flanges 515a and 515b attached to the vacuum container 501, and a circumference of or around the dielectric window 528a and 528b. Nozzles 520a and 520b disposed on the flanges 515a and 515b to provide antifouling gas to the dielectric windows 528a and 528b.

The vacuum container 501 may be a process container 510. The vacuum container 501 may be exhausted through the exhaust line 512 by the vacuum pump 514.

The flanges 515a and 515b may include a first flange 515a and a second flange 515b facing each other. The dielectric windows 528a and 528b may include a first dielectric window 528a that couples with the first flange 515a, and a second dielectric window 528b that engages with the second flange 515b. .

The nozzle units 520a and 520b may include a first nozzle unit 520a and a second nozzle unit 520b. The first nozzle unit 520a may be disposed around the first dielectric window 528a or on the first flange 515a to provide an antifouling gas to the first dielectric window 528a. The second nozzle portion 528b may be disposed around the second dielectric window 528b or around the second flange 515b to provide an antifouling gas to the second dielectric window 528b. The nozzle portions 520a and 520b include a nozzle inlet and a nozzle outlet, and the nozzle portions 520a and 520b gradually change in direction as they proceed from the nozzle inlet to the nozzle outlet, whirlwinding to the stigma prevention gas. Can be provided. The nozzle portions 520a and 520b may gradually decrease in cross-sectional area as they progress from the nozzle inlet to the nozzle outlet to accelerate the pollution prevention gas.

According to a modified embodiment of the present invention, the vacuum vessel 501 may be the exhaust line 512.

The flange according to the modified embodiment of the present invention may include a first flange 515a, a second flange 515b, and a third flange (not shown) disposed in the same plane. The dielectric window includes a first dielectric window 528a coupling with the first flange 515a, a second dielectric window 528b coupling with the second flange 515b, and a third coupling with the third flange. It may include a dielectric window 528c. The third nozzle unit 520c may be disposed around the third dielectric window 528c or around the third flange 515c to provide an antifouling gas to the third dielectric window 528c.

The particle measuring device will be described below.

Semiconductor processing is mostly done in a plasma environment. Fine particles in the tens to hundreds of nm ranges generated in the plasma process used in semiconductor processes such as deposition, etching, and planarization not only reduce the cleanliness of the process vessel in which the plasma process is performed, but also have similar line widths. It can stick to patterns and damage them. Degradation of cleanliness and pattern damage inside the process vessel may seriously degrade the yield of the semiconductor process. Accordingly, monitoring of particles generated in the plasma process used in the semiconductor process is essential.

The particle measuring device includes a method of measuring scattered light of laser light by fine particles and a method of measuring transmitted light of laser light by fine particles.

The particle measuring apparatus according to an embodiment of the present invention includes a vacuum container 501 including first and second flanges 515a and 515b facing each other, and a first dielectric window coupled to the first flange 515a. 528a, a second dielectric window 528b that engages with the second flange 515b, a periphery of the first dielectric window 528a, or disposed around the first flange 515a to provide an antifouling gas to the first A first nozzle portion 520a for providing the dielectric window 528a, a periphery of the second dielectric window 528b, or the second flange 515b to provide an antifouling gas to the second dielectric window 528b. The second nozzle unit 520b may be provided, and the laser unit 540 may be provided to the first dielectric window 528a to provide the laser light 541 to the particles in the vacuum container.

The laser unit 540 may irradiate the laser light 541 to the fine particles inside the vacuum container 501. The laser light 541 may be provided to the fine particles through the first dielectric window 528a of the vacuum container 501 through the reflector 530. The transmitted light of the laser light 541 may be provided to the light detector 550 through the second dielectric window 528b.

The particle measuring apparatus according to the modified embodiment of the present invention may include a first flange 515a, a second flange 515b, and a third flange (not shown) disposed in the same plane. The dielectric window includes a first dielectric window 528a coupling with the first flange 515a, a second dielectric window 528b coupling with the second flange 515b, and a third coupling with the third flange. It may include a dielectric window 528c. Scattered light of the laser light 541 may be provided through the third dielectric window 528c. The scattered light may be measured by a light detector (not shown).

2 is a view for explaining a dielectric window contamination prevention apparatus according to another embodiment of the present invention.

Referring to FIG. 2, the dielectric window contamination prevention device includes: dielectric windows 428a and 428b that engage flanges 415a and 415b attached to vacuum vessel 401, and around or around dielectric windows 428a and 428b. And nozzle portions 420a and 420b disposed on the flanges 415a and 415b to provide an antifouling gas to the dielectric windows 428a and 428b.

The vacuum container 401 may be an exhaust line 412. The vacuum container 401 may be exhausted by the vacuum pump 414.

The flanges 415a and 415b may include a first flange 415a and a second flange 415b facing each other. The dielectric windows 428a and 428b may include a first dielectric window 428a coupling with the first flange 415a and a second dielectric window 428b coupling with the second flange 415b. .

The nozzle parts 420a and 420b may include a first nozzle part 420a and a second nozzle part 420b. The first nozzle unit 420a may be disposed around the first dielectric window 428a or on the first flange 415a to provide an antifouling gas to the first dielectric window 428a. The second nozzle portion 428b may be disposed around the second dielectric window 428b or on the second flange 415b to provide an antifouling gas to the second dielectric window 428b. The nozzle portions 420a and 420b include a nozzle inlet and a nozzle outlet, and the nozzle portions 420a and 420b gradually change in direction as the nozzle inlet proceeds from the nozzle inlet to the tornado gas. Can be provided. The nozzle parts 420a and 420b may gradually decrease in cross-sectional area as they progress from the nozzle inlet to the nozzle outlet to accelerate the pollution prevention gas.

The particle measuring apparatus according to an embodiment of the present invention includes a vacuum container 401 including first and second flanges 415a and 415b facing each other, and a first dielectric window coupled to the first flange 415a. 428a, a second dielectric window 428b that engages with the second flange 415b, a periphery of the first dielectric window 428a, or disposed around the first flange 415a to provide an antifouling gas to the first A first nozzle portion 420a for providing the dielectric window 428a, a periphery of the second dielectric window 428b, or the second flange 415b to provide an antifouling gas to the second dielectric window 428b. The second nozzle unit 420b may be provided, and the laser unit 440 may be provided to the first dielectric window 428a to provide the laser light 441 to the particles in the vacuum container. The vacuum container 401 may be an exhaust line 412.

The laser unit 440 may irradiate the laser light 441 to the fine particles in the exhaust line 412. The laser light 441 may be provided to the fine particles through the first dielectric window 428a of the exhaust line 412 through the reflector 430. The transmitted light of the laser light 441 may be provided to the light detector 450 through the second dielectric window 428b.

3 is a diagram illustrating a self plasma light emission spectrum apparatus according to an embodiment of the present invention.

Referring to FIG. 3, the plasma light emission spectrum apparatus 20 of the self is connected to the plasma generator 21 and the exhaust line 12, and the gas of the process vessel 10 is introduced into the plasma generator 21 by the plasma generator 21. A vacuum vessel 29 in which plasma is formed, a dielectric window 28 mounted to the vacuum vessel 29 and transmitting plasma emission light generated by the plasma, disposed around the dielectric window 28 or in the vacuum vessel And a nozzle unit 27 for providing the antifouling gas to the dielectric window 28, a spectroscope 24 disposed outside the vacuum vessel 29 and receiving and detecting the plasma emission light, and detecting the spectroscope 24. The processing unit 25 is configured to process an output signal of the spectroscopic unit 24 to monitor the abnormality of the process vessel 10.

The process container 10 may process a substrate using a process gas. The pressure in the process vessel 10 may be in the range of several milliTorr to several tens of Torr. The process vessel 10 may perform chemical vapor deposition or atomic layer deposition. The use of the process vessel 10 is not limited to deposition. The pumping unit 14 may exhaust the process gas and the by-products of the process vessel 10 through the exhaust line 12.

The vacuum vessel 29 may be connected to the exhaust line 12. The vacuum container 29 may have a straight tubular shape or a toroid shape. The vacuum container 29 may be pumped by the pumping unit 14 without having a separate pump. Process gases and by-products of the process vessel 10 may be introduced into the vacuum vessel 29 by diffusion. The vacuum vessel 29 may include an input flange 23 and an output flange (not shown). The input flange 23 may engage with the first flange 14 of the auxiliary line 13 connected to the exhaust line 12.

The plasma generator 21 may include an energy applying unit 21a and a power source 21b for forming a plasma. The energy applying unit 21a may include an antenna or an electrode. The energy applying unit 21a may be disposed inside or outside the vacuum container 29. The power source 21b may include at least one of a DC power source, an AC power source, an RF power source, and a micro power source. The plasma may produce plasma light emission.

The dielectric window 28 may be disposed on the output flange. At least one of the infrared, visible, and ultraviolet regions may pass through the dielectric window 28. The plasma light may pass through the dielectric window 28.

The nozzle unit 27 may supply the antifouling gas to the dielectric window 28. Accordingly, the antifouling gas may suppress contamination of the dielectric window 28. The antifouling gas may include at least one of an inert gas, nitrogen, an oxygen atom-containing gas, and a halogen-containing gas. The gas containing the haloken group may be Cl 2 or NF 3. The nozzle portion 27 includes a nozzle inlet and a nozzle outlet, and the nozzle portion 27 may gradually change in direction as it progresses from the nozzle inlet to the nozzle outlet, thereby providing a whirlwind to the stigma prevention gas. have. The nozzle unit 27 may accelerate the pollution prevention gas by gradually decreasing the cross-sectional area as it proceeds from the nozzle inlet to the nozzle outlet.

The spectrometer 24 may measure the spectrum of the plasma light. The spectrometer 24 may include a grating and light sensing means. The light sensing means may include at least one of a photo multiplier (PM) tube, a charged coupled device (CCD), and a CMOS image sensor (CIS). The spectroscope 24 may provide the spectrum of the plasma light as an output signal.

The processor 25 may process an output signal of the spectrometer 24 to provide information such as air inflow due to an external leak, an environment change of the process vessel, and a decrease in pumping efficiency. . In addition, the processing unit 25 may provide information regarding dry cleaning and seasoning of the process vessel. The processing unit 25 may provide the information in real time while a process is in progress in the process container 10.

The server 26 may control the plasma generator 23, the spectrometer 24, and the processor 25 and store the results of the processor 25.

4A and 4B are diagrams illustrating a nozzle unit according to an embodiment of the present invention. 4B is a cross-sectional view taken along the line II ′ of FIG. 4A.

4A and 4B, the nozzle portion 27 includes a nozzle inlet 127a and a nozzle outlet 127b. The nozzle portion 27 may gradually change in direction as the nozzle inlet 127a moves from the nozzle inlet 127a to the nozzle outlet 127b to provide a tornado to the stigma prevention gas. The nozzle portion 27 may gradually decrease in cross-sectional area as the nozzle inlet 127a progresses from the nozzle inlet 127a to the nozzle outlet 127b to accelerate the pollution prevention gas.

The nozzle unit 27 has a first through hole 129 at a center thereof, and includes a first support plate 120 including spiral grooves 128 on one surface thereof, and a dielectric window disposed on the first support plate 120. A second support plate 130 disposed at an upper portion of the periphery and the outer side of the 140, and a gas line 129 connected to one end of the grooves 128 through the side surface of the first support plate 120. Can be. The other end of the grooves 128 may be connected to the first through hole 129.

The vacuum vessel 29 may include an output flange 110. The first support plate 120 may be disposed to be coupled to the output flange 110. The output flange 110 may be periodically arranged with a plurality of nut grooves (not shown). The coupling manner of the first support plate and the output flange may be variously modified.

The width and depth of one end of the grooves 128 are w1 and d1, respectively, and the width and depth of the other ends of the grooves 128 are w2 and d2, respectively. The w1 may be greater than w2 and the d1 may be greater than d2. The grooves 128 may be formed on one surface of the first support plate 120. The grooves 128 may provide a trajectory that moves to the central axis of the first support plate 120 while rotating clockwise or counterclockwise.

A plurality of lower through holes 122 may be periodically disposed around the first support plate 120. O-ring grooves 124 and 126 may be disposed on one surface and the other surface of the first support plate 120. An O-ring may be inserted into the O-ring groove. The O-ring may provide a vacuum.

The gas line 129 may be connected to one end of the groove 128. The gas line 129 may be formed by vertically penetrating the side surface of the first support plate 120. The gas line 129 may be provided with the pollution prevention gas.

The second support plate 130 may include a second through hole 137 at the center. The second support plate 130 may have a jaw 131. The dielectric window 140 may span the jaw 131. The second support plate 130 may have a plurality of upper through holes (not shown) disposed around it. The upper through hole and the lower through hole 122 may be aligned with each other. The bolt may be inserted into the upper through hole and the lower through hole 122 to be coupled to the nut groove.

According to a modified embodiment of the present invention, the groove 128 may be formed on the other surface of the first support plate 120.

5A and 5B are views illustrating a nozzle unit according to another embodiment of the present invention. FIG. 5B is a cross-sectional view taken along the line II-II 'of FIG. 5A.

5A and 5B, the nozzle portion 27 includes a nozzle inlet 127a and a nozzle outlet 127b. The nozzle portion 27 may gradually change in direction as the nozzle inlet 127a moves from the nozzle inlet 127a to the nozzle outlet 127b to provide a tornado to the stigma prevention gas. The nozzle portion 27 may gradually decrease in cross-sectional area as the nozzle inlet 127a progresses from the nozzle inlet 127a to the nozzle outlet 127b to accelerate the pollution prevention gas.

The nozzle unit 27 has a first through hole 129 at a center thereof, and includes a first support plate 120 including spiral grooves 128 on one surface thereof, and a dielectric window disposed on the first support plate 120. A second support plate 130 disposed at an upper portion of the periphery and the outer side of the 140, and a gas line 136 connected vertically through the second support plate 120 to one end of the grooves 128. Can be. The other end of the grooves 128 may be connected to the first through hole 129.

The vacuum vessel 29 may include an output flange 110. The first support plate 120 may be disposed to be coupled to the output flange 110. A plurality of nut grooves 112 may be periodically disposed around the output flange 110. The coupling manner of the first support plate 120 and the output flange 110 may be variously modified.

The width and depth of one end of the grooves 128 are w1 and d1, respectively, and the width and depth of the other ends of the grooves 128 are w2 and d2, respectively. The w1 may be greater than w2 and the d1 may be greater than d2. The grooves 128 may be formed on one surface of the first support plate 120. The grooves 128 may provide a trajectory that moves to the central axis of the first support plate 120 while rotating clockwise or counterclockwise.

A plurality of lower through holes 122 may be periodically disposed around the first support plate 120. O-ring grooves 124 and 126 may be disposed on one surface and the other surface of the first support plate 120. An O-ring may be inserted into the O-ring groove. The O-ring may provide a vacuum.

The gas line 136 may be connected to one end of the groove 128. The gas line 129 may be formed by vertically penetrating one surface of the second support plate 120. The pollution prevention gas may be provided to the gas line 136.

The second support plate 130 may include a second through hole 137 at the center. The second support plate 130 may have a jaw 131. The dielectric window 140 may span the jaw 131. A plurality of upper through holes 132 may be disposed around the second support plate 130. The upper through hole 132 and the lower through hole 122 may be aligned with each other. The bolt 150 may be inserted into the upper through hole 132 and the lower through hole 122 to be coupled to the nut groove.

According to a modified embodiment of the present invention, the groove 128 may be formed on the other surface of the first support plate 120.

6A and 6B are views illustrating a nozzle unit according to another embodiment of the present invention. FIG. 6B is a cross-sectional view taken along the line III-III ′ of FIG. 6A. Descriptions overlapping with those described in FIGS. 4A and 4B will be omitted.

6A and 6B, the nozzle unit 27 includes a nozzle inlet 327a and a nozzle outlet 327b. The nozzle portion 27 may gradually change in direction as the nozzle inlet 327a moves from the nozzle inlet 327a to the nozzle outlet 327b to provide a whirlwind to the stigma prevention gas. The nozzle portion 27 may gradually decrease in cross-sectional area as the nozzle inlet 327a progresses from the nozzle inlet 327a to the nozzle outlet 327b to accelerate the pollution prevention gas.

The nozzle unit 27 includes a first support plate 120 having a first through hole 129 at the center and spiral nozzle passages 328 at one surface thereof, and a dielectric disposed on the first support plate 120. A second support plate 130 disposed around and outside the window 140, and a gas line 129 connected through the side of the first support plate 120 to one end of the nozzle passages 128. It may include. The other ends of the nozzle passages 328 may be connected to the first through hole 129.

The vacuum vessel 29 may include an output flange 110. The first support plate 120 may be disposed to be coupled to the output flange 110. A plurality of nut grooves 112 may be periodically disposed around the output flange 110. The coupling manner of the first support plate 120 and the output flange 110 may be variously modified.

Widths and depths of one end of the nozzle passages 328 are w1 and d1, respectively, and widths and depths of the other ends of the nozzle passages 328 are w2 and d2, respectively. The w1 may be greater than w2 and the d1 may be greater than d2. The nozzle passages 328 may be formed in the first support plate 120. The nozzle passages 328 may provide a trajectory that moves to the central axis of the first support plate 120 while rotating clockwise or counterclockwise.

A plurality of lower through holes 122 may be periodically disposed around the first support plate 120. O-ring grooves 124 and 126 may be disposed on one surface and the other surface of the first support plate 120. An O-ring may be inserted into the O-ring groove. The O-ring may provide a vacuum.

The gas line 136 may be connected to one end of the nozzle passages 328. The gas line 129 may be formed by vertically penetrating the side surface of the first support plate 120. The pollution prevention gas may be provided to the gas line 136.

The second support plate 130 may include a second through hole 137 at the center. The second support plate 130 may have a jaw 131. The dielectric window 140 may span the jaw 131. A plurality of upper through holes 132 may be disposed around the second support plate 130. The upper through hole 132 and the lower through hole 122 may be aligned with each other. The bolt 150 may be inserted into the upper through hole 132 and the lower through hole 122 to be coupled to the nut groove.

7A and 7B are views illustrating a nozzle unit according to another embodiment of the present invention. FIG. 7B is a cross-sectional view taken along the line IV-IV ′ of FIG. 7A.

7A and 7B, the nozzle portion 27 includes a nozzle inlet 213a and a nozzle outlet 213b. The nozzle portion 27 may gradually change in direction as the nozzle inlet 213a moves from the nozzle inlet 213a to the nozzle outlet 213b to provide a whirlwind to the stigma prevention gas. The nozzle unit 27 may accelerate the pollution prevention gas by gradually reducing the cross-sectional area as the nozzle part 27 proceeds from the nozzle inlet 213a to the nozzle outlet 213b.

The nozzle portion 27 has a through hole 209 at the center and an output flange 210 attached to the vacuum vessel 29 including spiral grooves 214 on one surface, on the output flange 210. A cover plate 220 disposed around and outside the dielectric window 140 disposed at the upper surface of the dielectric window 140, and a gas line 216 connected to one end of the grooves 214 through the side of the output flange. It includes. The other end of the grooves 214 may be connected to the through hole 209.

The vacuum vessel 29 may include an output flange 210. The cover plate 220 may be coupled to the output flange 210. A plurality of nut grooves 212 may be periodically disposed around the output flange 210. The coupling method of the cover plate 220 and the output flange 210 may be variously modified.

Widths and depths of one end of the grooves 214 are w1 and d1, respectively, and widths and depths of the other ends of the grooves 214 are w2 and d2, respectively. The w1 may be greater than w2 and the d1 may be greater than d2. The grooves 214 may provide a trajectory that moves to the central axis of the output flange 210 while rotating clockwise or counterclockwise.

A plurality of lower through holes (not shown) may be periodically disposed around the cover plate 220. O-ring grooves 219 may be disposed on one surface of the output flange 220. An O-ring may be inserted into the O-ring groove. The o-ring may provide a vacuum to the dielectric window and the output flange.

The gas line 216 may be connected to one end of the grooves 214. The gas line 129 may be formed to vertically penetrate the side surface of the output flange 210. The gas line 216 may be provided with the anti-fouling gas.

The cover plate 220 may include a cover through hole 227 at the center thereof. The cover plate 220 may have a jaw 221. The dielectric window 140 may span the jaw 221.

So far I looked at the center of the preferred embodiment for the present invention. Those skilled in the art will appreciate that the present invention can be implemented in a modified form without departing from the essential features of the present invention. Therefore, the disclosed embodiments should be considered in descriptive sense only and not for purposes of limitation. The scope of the present invention is shown in the claims rather than the foregoing description, and all differences within the scope will be construed as being included in the present invention.

1 is a view for explaining a dielectric window contamination prevention apparatus according to an embodiment of the present invention.

2 is a view for explaining a dielectric window contamination prevention apparatus according to another embodiment of the present invention.

3 is a diagram illustrating a self plasma light emission spectrum apparatus according to an embodiment of the present invention.

4A and 4B are diagrams illustrating a nozzle unit according to an embodiment of the present invention.

5A and 5B are views illustrating a nozzle unit according to another embodiment of the present invention.

6A and 6B are views illustrating a nozzle unit according to another embodiment of the present invention.

7A and 7B are views illustrating a nozzle unit according to another embodiment of the present invention.

Claims (12)

A dielectric window coupled with the flange attached to the vacuum vessel; And And a nozzle portion disposed around or on the flange of the dielectric window to provide an antifouling gas to the dielectric window. The method of claim 1, The flange includes a first flange and a second flange facing each other, The dielectric window comprises a first dielectric window coupling with the first flange, and a second dielectric window coupling with the second flange, The nozzle unit includes a first nozzle unit and a second nozzle unit, The first nozzle portion is disposed around the first dielectric window or on the first flange to provide an antifouling gas to the first dielectric window, And the second nozzle portion is disposed around the second dielectric window or on the second flange to provide an antifouling gas to the second dielectric window. The method of claim 1, And said vacuum vessel is a process vessel or an exhaust line. According to claim 1, The nozzle portion includes a nozzle inlet and a nozzle outlet, the nozzle portion is gradually changed in direction as it proceeds from the nozzle inlet to the nozzle outlet to provide a whirlwind to the stigma prevention gas . The method of claim 4, wherein And the nozzle portion gradually decreases in cross-sectional area as it progresses from the nozzle inlet to the nozzle outlet to accelerate the pollution prevention gas. According to claim 1, The nozzle unit: A first supporting plate having a first through hole at a center thereof and including spiral grooves at one surface thereof; A second support plate disposed around and outside the dielectric window disposed on the first support plate; And A gas line connected to one end of the grooves through the second support plate; And the other end of the grooves is connected to the through hole. According to claim 1, The nozzle unit: A first supporting plate having a first through hole at a center thereof and including spiral grooves at one surface thereof; A second support plate disposed around and outside the dielectric window disposed on the first support plate; And A gas line connected to one end of the grooves through the side of the first support plate; And the other end of the groove is connected to the first through hole. According to claim 1, The nozzle unit: A first support plate having a first through hole at a center thereof and including spiral nozzle passages on one surface thereof; A second support plate disposed around and outside the dielectric window disposed on the first support plate; And A gas line connected to one end of the nozzle passages through the side of the first support plate; And the other ends of the nozzle passages are connected to the first through hole. According to claim 1, The nozzle unit: An output flange attached to the vacuum vessel having a through hole in the center and including spiral grooves on one surface; A cover plate disposed around and outside the dielectric window disposed on the output flange; And A gas line connected to one end of the grooves through the side of the output flange, And the other end of the grooves is connected to the through hole. A plasma generator; A vacuum container connected to an exhaust line and into which gas from the process container is introduced to form a plasma by the plasma generating unit; A dielectric window mounted to the vacuum vessel and transmitting plasma emission light generated by the plasma; A nozzle portion disposed around the dielectric window or disposed in the vacuum container to provide an antifouling gas to the dielectric window; A spectroscope disposed outside the vacuum vessel and configured to receive and detect the plasma emission light; And And a processing unit for processing the output signal of the spectroscope to monitor the abnormality of the process vessel. A vacuum vessel including an input flange coupled to an auxiliary line connected to an exhaust line, through which the gas of the process vessel flows and including an output flange; A plasma generator for forming a plasma in the vacuum container; A dielectric window coupled with the output flange and transmitting the plasma emitted light generated by the plasma; And And a nozzle portion disposed around the dielectric window or on the output flange to provide an antifouling gas to the dielectric window. A vacuum container including first and second flanges facing each other; A first dielectric window coupled with the first flange; A second dielectric window coupled with the second flange; A first nozzle portion disposed around the first dielectric window or on the first flange to provide an antifouling gas to the first dielectric window; A second nozzle portion disposed around the second dielectric window or on the second flange to provide an antifouling gas to the second dielectric window; And And a laser portion provided to the first dielectric window to provide laser light to particles in the vacuum vessel.

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