KR20100121895A - Substrate having an antistatic function and method for manufacturing the same - Google Patents

Abstract

PURPOSE: The substrate and manufacturing method thereof having antistatic function is proceed the multifunction of the optical catalyst, antistatic, super-hydrophilicity, in-plane generation of heat, base radiation by improving the conductivity. CONSTITUTION: The substrate(10) comprises the base layer(11) and anti-static layer(12) the base layer is composed of the new glass. By coating the titanium dioxide in which the anti-static layer is doped on the base layer to impurity it is formed. The anti-static layer in advance secludes the formation of the dust or the other contamination layer by giving the conductivity to the photo catalyst substance.

Description

Substrate having an antistatic function and method for manufacturing the same

The present invention relates to a substrate having an antistatic function capable of simultaneously expressing photocatalytic properties, superhydrophilic properties, planar heat generation properties, and low radiation properties by forming an antistatic layer having an antistatic function and a method of manufacturing the same.

Recently, as interest in the environment increases, the need for an environmental purification material having functions such as antifouling, antibacterial, deodorization, and purification increases, and thus, a photocatalytic material is attracting attention as a material having such a function.

A photocatalyst is a substance in which electrons and holes generated by absorbing light are used as a catalyst. Photocatalyst absorbs light where the electrons are free radicals (Super oxide anion; ㅇㅇ O ₂ ^-) generated for, and further holes are hydroxy radical ion; to generate the (Hydroxy radical ion OH ㅇㅇ) decomposing the pollutant environment To cleanse.

In addition, titanium dioxide typically used in photocatalytic materials has superhydrophilic properties. Superhydrophilic water is a phenomenon in which water droplets spread on a film with a contact angle of 5 ° to 10 ° when the water droplets fall on the photocatalyst film. The principle of superhydrophilicity is that when the photocatalytic material is irradiated with light, the organic substances bound to the adsorbed water molecules are decomposed to form hydroxyl groups on the surface, and the surface has hydrophilicity due to the dispersibility and hydrogen bonding. There is.

That is, in the case of titanium dioxide, the hydrophilic property is strongly shown, and thus the superhydrophilic property in which water droplets are widely spread on the surface thereof. Using this superhydrophilic property of titanium dioxide, water droplets penetrate into the dust or contaminants on the membrane, and dust and contaminants can be easily separated from the membrane and used as a photocatalytic material.

However, the practical application of the photocatalyst film has a limitation in that superhydrophilic and photocatalyst functions cannot be expressed by the dust layer formed on the photocatalyst film by the electrostatic charging of a large amount of coal ash, automobile particulates and inorganic particulates due to yellow dust. Therefore, in order to prevent the formation of the electrostatically charged dust layer, it is necessary to develop a photocatalyst and a superhydrophilic material including an antistatic function.

The cause of the charging of dust or contaminants is due to the electrostatic force, and the dust layer is formed by electrostatic adsorption on the surface of the film having high sheet resistance. Therefore, the sheet resistance of the membrane can be lowered to exhaust the charge of the charged dust in contact with the surface of the membrane, thereby preventing the adsorption of the dust layer on the surface of the membrane. In other words, in order to have an antistatic function, it is required to have a low sheet resistance.

Conventionally, in order to solve this problem, a method of lowering sheet resistance by appropriately mixing tin oxide (Tin oxide; SnO ₂ ) with titanium dioxide has been used. However, in this case, the conductivity can be secured, but there is a problem that it is difficult to actually obtain a uniform film because it is not a single compound with the problem that the photocatalytic effect is lowered.

Therefore, it is necessary to develop a single compound having both antistatic function, photocatalyst and superhydrophilic function. To date, a multifunctional film having such antistatic, photocatalyst, and superhydrophilic properties and low radiation and planar fever has not been reported.

Low radiation refers to a function that blocks the transmission of infrared rays so that heat does not escape to the outside when the weather is cold, and serves as an infrared shielding layer that prevents heat from entering inside when it is hot.

In addition, the planar heat generation refers to a function of maintaining a constant temperature of the film by applying a voltage to the conductive film so that a current flows to the film.

The above-described prior arts may perform their functions when applied individually, but if they are applied together, the effects may be reduced. The above-mentioned photocatalyst, antistatic, superhydrophilic, planar heat generation, low radiation Membrane with multifunction has not been reported yet.

Accordingly, it is an object of the present invention to provide a substrate having an antistatic function and a method of manufacturing the same, which allow the antistatic function to be maximized while maintaining the photocatalytic properties as it is.

It is also an object of the present invention to provide a substrate having an antistatic function that can be used as a photocatalyst, antistatic, superhydrophilic, planar heat generation, low radiation multifunction.

In addition, an object of the present invention is to provide a method of manufacturing a substrate having an antistatic function that can prevent the characteristics expressed by each function even if the antistatic layer to perform a variety of functions.

According to an aspect of the present invention for achieving the above object, a base layer made of a glass material; And an antistatic layer having an antistatic function by crystallizing the titanium dioxide (TiO ₂ ) doped with impurities on the base layer to have an antistatic function.

It characterized in that it further comprises a transparent electrode layer formed between the base layer and the antistatic layer.

In order to increase the charge dissipation efficiency of the antistatic layer, the ground is formed on the antistatic layer or the surface is generated by applying a voltage.

The transparent electrode layer is characterized in that the surface heating by applying a voltage.

The impurity is any one or one selected from niobium (Nb), tantalum (Tantalum; Ta), molybdenum (Molybdenum; Mo), arsenic (As), antimony (Sb), and tungsten (W). It can be used more than.

The impurity is doped with titanium dioxide in a molar ratio of 0.1% to 30%.

The transparent electrode layer includes ITO (Tin doped Indium oxide; In ₂ O ₃ : Sn), FTO (Fluor doped tin oxide (SnO ₂ : F) and AZO (Aluminum dopant zinc oxide; Aluminum) doped zinc oxide; ZnO: Al) characterized in that the coating is made of any one selected from.

The antistatic layer is formed such that the anatase phase has a fraction of 50% or more of the total.

According to another aspect of the present invention for achieving the above object, preparing a base layer made of a glass material; Forming an antistatic layer by depositing doped titanium dioxide (TiO ₂ ) on the base layer in a reducing atmosphere; And it provides a method for producing a substrate having an antistatic function characterized in that it comprises the step of crystallization heat treatment of the antistatic layer.

According to another aspect of the present invention for achieving the above object, preparing a base layer made of a glass material; Coating a transparent electrode layer on the base layer; Forming an antistatic layer by depositing doped titanium dioxide (TiO ₂ ) on the transparent electrode layer in a reducing atmosphere; And it provides a method for producing a substrate having an antistatic function characterized in that it comprises the step of crystallization heat treatment of the antistatic layer.

In order to increase the conductivity of the antistatic layer, the ground is formed on the antistatic layer, and a voltage is applied to the surface heat.

The transparent electrode layer is characterized in that the surface heating by applying a voltage.

The impurity is any one or one selected from niobium (Nb), tantalum (Tantalum; Ta), molybdenum (Molybdenum; Mo), arsenic (As), antimony (Sb), and tungsten (W). Characterized in that can be used over.

The impurities are doped with titanium dioxide in a molar ratio of 0.1% to 30%.

The transparent electrode layer includes ITO (Tin doped Indium oxide; In ₂ O ₃ : Sn), FTO (Fluor doped tin oxide (SnO ₂ : F) and AZO (Aluminum dopant zinc oxide; Aluminum) doped zinc oxide; ZnO: Al) characterized in that the coating is made of any one selected from.

The transparent electrode layer is coated by including any one selected from spin coating method, sol-gel method, vacuum deposition method, sputter deposition, spray coat method and chemical vapor deposition method. .

The heat treatment temperature is in the range of 300 ℃ to 550 ℃, heat treatment time is characterized in that 10 minutes to 2 hours.

The crystallization heat treatment is such that the anatase phase has a fraction of 50% or more of the total.

Therefore, the substrate having the antistatic function of the present invention can improve the photocatalytic properties and at the same time maximize the conductivity.

In addition, since the substrate having an antistatic function of the present invention has high conductivity, it is possible to perform a photocatalyst, antistatic, superhydrophilic, planar heating, and low radiation.

Moreover, the method of manufacturing a substrate having an antistatic function of the present invention can prevent the characteristics expressed by each function from falling while performing various functions.

The substrate having an antistatic function according to the present invention forms an antistatic layer using a photocatalyst material, thereby improving the conductivity of the photocatalyst material to impart an antistatic function, thereby exhibiting an efficient photocatalyst and superhydrophilic function. A method of imparting conductivity of the photocatalytic material will be described.

An antistatic layer is formed using a photocatalytic material on a base layer made of a glass material, and titanium dioxide (TiO ₂ ) doped with impurities is used as a photocatalyst material to maximize conductivity.

The impurity used here is a pentavalent cation, niobium (Nobium), tantalum (T), molybdenum (Mo), arsenic (As), antimony (Sb), or tungsten (W). It is used by one or more selected from.

Herein, the doping amount of the impurity is suitably 0.1% or more and 30% or less with respect to titanium (Ti). In order to maintain photocatalytic properties and conductivity at the same time, optimized conditions are required. When the doping amount exceeds 30%, the photocatalytic properties are significantly decreased, and when the content is less than 0.1%, the conductivity is not large enough.

Impurities doped titanium dioxide is formed in the base layer by sputter deposition, pulsed laser deposition (PLD), cluster ion beam deposition, electron beam deposition, resistive heating deposition. , Chemical vapor deposition (CVD), reaction deposition, sol-coating, and the like may be used.

The antistatic layer formed of the photocatalytic material of titanium dioxide doped with impurities may be used as long as it is a deposition method that can be uniformly formed because conductivity is not uniform.

The method of manufacturing a substrate having an antistatic function according to the present invention will be described by using a photocatalyst material used in the antistatic layer, for example, titanium dioxide doped with niobium, and a detailed embodiment will be described below.

First, when the photocatalyst material deposited on the base layer is titanium dioxide doped with niobium, titanium (Ti) is tetravalent and niobium (Nb) is present as a pentavalent ion in the lattice structure. It acts as a defect, producing extra electrons.

When the photocatalytic material in which the electrons are generated is deposited in the oxidizing atmosphere when the electrons are deposited in the base layer, the electrons are oxidized and thus need to be deposited in the reducing atmosphere to maintain the extra electrons to maximize the conductivity of the antistatic layer.

Here, the reducing atmosphere may proceed with O ₂ partial pressure of 0.01 to 50mTorr. If the reducing atmosphere is less than 0.01 mTorr, it is not preferable because it may cause damage to the film by the flame formed during the deposition of the film. If the reducing atmosphere is more than 50 mTorr, the oxygen is excessive, which is not a desirable reducing atmosphere, and a dense thin film may be formed by high gas pressure. It is not desirable because it cannot.

The deposited antistatic layer is crystallized into an anatase phase that exhibits conductivity through a heat treatment to change phase.

That is, titanium dioxide (TiO ₂ ) has three phases, largely amorphous (hereinafter referred to as amorphous), anatase (low temperature phase), and rutile (high temperature phase) according to heat treatment conditions.

Here, in the case of the amorphous having an initial phase without heat treatment, there is no crystallinity, so the photocatalyst characteristics cannot be expressed. In addition, in the case of heat treatment at an excessively high temperature, the rutile phase appears much even in the heat treatment for a short time, so that the effective mass of the electrons is increased, and thus the conductivity is greatly reduced.

The anatase phase used in the present invention can have photocatalyst and antistatic properties simultaneously because the effective mass of the generated excess electrons is small and crystallized. Here, the crystallization heat treatment temperature for obtaining an anatase phase is 300 degreeC-550 degreeC. Especially preferably, it is about 450 degreeC. Here, the crystallization heat treatment time is preferably 10 minutes to 2 hours, if less than 10 minutes is not secure enough time to form the anatase phase, on the contrary, if the heat treatment time is about 2 hours the crystallization treatment is finished, the anatase phase is saturated Any further heat treatment time does not mean anything. Furthermore, if the heat treatment time in the case where the antistatic layer is formed on the transparent electrode layer ITO, which will be described with reference to FIG. 2, exceeds 2 hours, the transparent electrode layer may be damaged.

Therefore, in the antistatic layer used in the present invention, the photocatalytic material of titanium dioxide doped with niobium is deposited in a reducing atmosphere at room temperature, and subjected to crystallization heat treatment at about 450 ° C. for 1 hour to undergo a phase change to the anatase phase. And it may have an antistatic function.

At this time, in order to have the effective effect required in the present invention, the anatase phase must be crystallized to have a fraction of 50% or more of the whole, and the temperature at which the anatase phase is formed is 400 ° C, and the temperature at which the rutile phase is formed is 500 ° C, so that the anatase phase is 50% or more. In order to have a fraction, the heat processing temperature is 300 degreeC-550 degreeC. If the heat treatment temperature is less than 300 ° C., the anatase phase is not formed and is an amorphous phase, so the conductivity required in the present invention is lowered. If the heat treatment temperature is higher than 550 ° C., the rutile phase is formed in a large amount, which is not preferable.

1 shows a cross-sectional view of a substrate having an antistatic layer deposited by the substrate manufacturing method described above.

Referring to FIG. 1, a substrate 10 is formed by coating an impurity doped titanium dioxide (TiO ₂ ) on a base layer 11 made of a glass material to form an antistatic layer 12.

The antistatic layer 12 may impart conductivity to the photocatalytic material to block the formation of dust or other foreign matter layers to express self-purifying functions through efficient photocatalyst and superhydrophilic properties.

The method of manufacturing the substrate 10 having the antistatic layer 12 thus formed is supported by the following embodiments, but is not limited thereto.

Hereinafter, in addition to the photocatalytic property, the superhydrophilic property, and the antistatic function of the substrate 10 described above, various modifications of the substrate 10 including the antistatic layer 12 with reference to FIGS. And having a surface heating function.

2 is a cross-sectional view showing a first modification of the substrate having an antistatic function according to the present invention.

Referring to FIG. 2, the substrate 20 serves to easily escape electrons from the antistatic layer 23 in order to improve photocatalyst, superhydrophilicity, and antistatic function, between the antistatic layer 23 and the base layer 21. The transparent electrode layer 22 is formed on the substrate.

The transparent electrode layer 22 is formed of ITO (Tin doped Indium oxide; In ₂ O ₃ : Sn), FTO (Fluor Doped Tin Oxide; SnO ₂ : F), AZO (Aluminum Dop Zinc Oxide) Aluminum doped zinc oxide, and ZnO: Al).

The transparent electrode layer 22 is coated on the base layer 21. The spin coating method, the sol-gel method, the vacuum deposition method, the sputter deposition method, the spray coat method, the chemical vapor deposition method, and the like are coated on the base layer 21. Can be used, but not limited to Thereafter, the antistatic layer 23 is coated on the transparent electrode layer 22. In this case, a low radiation function of the transparent electrode layer 22 is added to the antistatic layer having a photocatalyst, antistatic, superhydrophilic, and low radiation ( 23) is formed.

In addition, the antistatic layer 23 serves to protect the transparent electrode layer 22, so that the transparent electrode layer 22 is protected from heat, oxidation, weathering, etc., the existing low emission function can be maintained longer.

3 is a cross-sectional view showing a second modified example of the substrate having an antistatic function according to the present invention.

Referring to FIG. 3, the substrate 30 has an antistatic layer 32 formed on an upper portion of the base layer 31, and a ground line on the antistatic layer 32 to allow electrons to easily escape from the antistatic layer 32. 33) is connected. The general grounding method is used.

4 is a cross-sectional view showing a third modified example of the substrate having an antistatic function according to the present invention.

Referring to FIG. 4, the substrate 40 has an antistatic layer 42 formed on the base layer 41, and connects a current supply line 43 for applying a DC voltage to the antistatic layer 32.

In this case, a method of applying a voltage corresponds to a general method that a person skilled in the art can think, such as an alternating current and a pulse.

Since the antistatic layer 42 has low resistance, current flows when a voltage is applied, and thus the antistatic layer 42 acts as a heating element.

Therefore, when applied to the antistatic layer 42 may have a surface heating function to maintain an appropriate temperature by adjusting the temperature as the temperature is high and low. Thereby, the board | substrate which has the multifunctional of a photocatalyst, antistatic, superhydrophilic, low emission, and planar heat generation can be manufactured.

Modifications of FIGS. 2 to 4 to improve the photocatalyst, superhydrophilic and antistatic functions of the conductive antistatic layer 42 and to have low emission and surface heat generation (ie, transparent electrode coating, grounding, and voltage application) ) May be used as one of them, and two or more of them may be combined as shown in FIG. 5.

5 is a cross-sectional view showing a fourth modified example of the substrate having an antistatic function according to the present invention.

Referring to FIG. 5, the substrate 50 is formed of a transparent electrode layer 52 formed on the base layer 51 and an antistatic layer 53 formed on the base layer 51, and in order to apply a pressure to the transparent electrode layer 52. Connect the current supply line 54 to apply the.

Hereinafter, the present invention will be described in more detail with reference to Examples.

(Example 1)

Titanium dioxide (TiO ₂ ): Niobium (Nb) photocatalyst was mixed with titanium dioxide (TiO ₂ ) with a niobium (Nb) doping ratio of 1% by ball-milling, followed by 2 hours at 1300 ° C. Inter sintering made a target 1 inch in diameter.

Using the target thus prepared, a pulsed laser deposition method (PLD) was used to form an antistatic layer by depositing a 200 nm thick layer on a 2 cm X 2 cm quartz in a reducing atmosphere (O ₂ partial pressure of 0.5 mTorr) at room temperature. Was prepared.

The sheet resistance was measured by using a four-point probe device for each substrate when the substrate was not heat-treated and subjected to a one-hour heat treatment at 450 ° C. in the air. The results are shown in Table 1 below. Indicated.

(Example 2)

A substrate was manufactured in the same manner as in Example 1, except that the doping amount of niobium (Nb) to titanium dioxide (TiO ₂ ) was set to 6% by molar ratio.

Similarly, the sheet resistance was measured by using a four-point probe device for each substrate when the substrate was not subjected to heat treatment and subjected to a one-hour heat treatment process at 450 ° C. in the air. 1 is shown.

(Example 3)

A substrate was manufactured in the same manner as in Example 1, except that the doping amount of niobium (Nb) to titanium dioxide (TiO ₂ ) was set at a molar ratio of 10%.

Similarly, the sheet resistance was measured by using a four-point probe device for each substrate when the substrate was not subjected to heat treatment and subjected to a one-hour heat treatment process at 450 ° C. in the air. 1 is shown.

(Comparative Example 1)

Titanium dioxide was sintered at 1300 ° C for 2 hours to form a 1-inch diameter target, followed by pulsed laser deposition at a temperature of 200 nm on a 2 cm x 2 cm sized silica at room temperature with a reducing atmosphere (O ₂ partial pressure of 0.5 mTorr). ) To form a titanium dioxide photocatalyst layer without heat treatment and after 1 hour heat treatment at 450 ° C in air, and then use a 4-point probe device for each substrate. It measured, and the result is shown in Table 1.

Comparative Example 1 Example 1 Example 2 Example 3 Base layer quartz quartz quartz quartz Nb Doping Amount - One% 6% 10% Sheet resistance Before heat treatment 220000Ω / □ 350000Ω / □ 280000Ω / □ 550000Ω / □ 450 ℃, after 1 hour heat treatment 28000Ω / □ 1500Ω / □ 84Ω / □ 6500Ω / □

Referring to Table 1, the antistatic layer prepared in the present invention has a very large sheet resistance since it has an amorphous phase immediately after deposition, but after 450 ℃ heat treatment process, the titanium dioxide is phase-shifted to the anatase phase by crystallization, thereby reducing the sheet resistance. Done.

However, in Examples 1 to 3 of the present invention doped with niobium, the decrease in sheet resistance is very large compared to Comparative Example 1 without doping with niobium, and thus, when niobium is doped, the conductivity is significantly improved as compared with the prior art.

The superhydrophilic characteristics of the substrate in which the antistatic layer was formed on the quartz in Example 4 and the transparent electrode layer on the quartz in Example 5 and the antistatic layer were formed on the quartz in Example 5 will be described below.

(Example 4)

The contact angle was measured after 12 hours in the dark room while irradiating the substrate fabricated by the method of Example 1 in ultraviolet light for 20 minutes, and the contact angle was 6 °.

(Example 5)

Titanium dioxide (TiO ₂ ): Niobium (Nb) photocatalyst was mixed with titanium dioxide (TiO ₂ ) at a molar ratio of 6% niobium (Nb) by ball-milling, followed by 2 hours at 1300 ° C. Sintering made a 1 inch diameter target.

Using a fabricated target, a deposition process was performed in a reducing atmosphere (P02) at room temperature in a reducing atmosphere (O ₂ partial pressure 0.5mTorr) at 200 nm thickness on top of a commercial ITO transparent electrode having a size of 2 cm X 2 cm on quartz, followed by heat treatment. (1 hour at 450 DEG C in air) to form an antistatic layer to prepare a substrate.

The contact angle was measured after 12 hours in the dark room while irradiating the fabricated substrate with ultraviolet light for 20 minutes, and the contact angle was 5 °.

As shown in Examples 4 and 5, both the antistatic layer formed on the quartz and the antistatic layer formed on the transparent electrode on the quartz had a small contact angle of about 5 °, indicating that the superhydrophilic property was excellent. Can be.

As described above, the antistatic layer used in the embodiments may be applied to the coating of the transparent electrode layer between the base layer and the antistatic layer in order to increase the efficiency of the photocatalyst, antistatic, super hydrophilic function, the ground to the antistatic layer Or a voltage may be applied, or all three methods may be applied. In addition, the conductive photocatalyst material may be coated on the transparent electrode layer to provide a low emission function to the antistatic layer or to apply a voltage to have a surface heating function.

The above description is merely illustrative of the technical idea of the present invention, and those skilled in the art to which the present invention pertains may make various modifications and changes without departing from the essential characteristics of the present invention.

Accordingly, the above-described embodiments are merely illustrative and not intended to limit the technical spirit of the present invention. Therefore, the protection scope of the present invention should be interpreted by the claims, and all technical ideas within the equivalent scope should be interpreted as being included in the scope of the present invention.

By using the substrate having an antistatic function according to the present invention, as well as using a photocatalyst, it is widely applicable to the field that requires super hydrophilic properties, antistatic, low radiation, planar heat generation.

1 is a cross-sectional view of a substrate having an antistatic layer according to the present invention described above,

2 is a cross-sectional view showing a first modification of the substrate having an antistatic function according to the present invention;

3 is a cross-sectional view showing a second modification of the substrate having an antistatic function according to the present invention;

4 is a cross-sectional view showing a third modification of the substrate having an antistatic function according to the present invention;

5 is a cross-sectional view showing a fourth modified example of the substrate having an antistatic function according to the present invention in combination.

DESCRIPTION OF THE REFERENCE NUMERALS

10,20,30,40,50: substrate 11,21,31,41,51: base layer

12,23,32,42,53: Antistatic layer 22,52: Transparent electrode layer

Claims (20)

A base layer made of a glass material; And And an antistatic layer having an antistatic function by crystallizing the titanium dioxide (TiO ₂ ) doped with impurities on the base layer to have an antistatic function. The method of claim 1, Substrate having an antistatic function, characterized in that it further comprises a transparent electrode layer formed between the base layer and the antistatic layer. The substrate with an antistatic function according to claim 1, wherein a ground is formed in the antistatic layer to increase the charge exhaustion efficiency of the antistatic layer. The substrate having an antistatic function according to claim 1, wherein the antistatic layer generates surface heat by applying a voltage. The substrate having an antistatic function according to claim 2, wherein the transparent electrode layer generates surface heat by applying a voltage. The method of claim 1, wherein the impurities are selected from niobium (Nb), tantalum (Ta), molybdenum (Mo), arsenic (As), antimony (Sb), and tungsten (W). At least one substrate having an antistatic function, characterized in that can be used. The substrate having an antistatic function according to claim 1, wherein the impurity is doped with titanium dioxide in a molar ratio of 0.1% to 30%. The method of claim 2, wherein the transparent electrode layer is formed of ITO (Tin doped Indium oxide; In ₂ O ₃ : Sn), FTO (Fluor doped tin oxide; SnO ₂ : F) and AZO ( A substrate having an antistatic function, characterized by coating any one selected from aluminum doped zinc oxide (ZnO: Al). The substrate having an antistatic function according to claim 1, wherein the antistatic layer has a fraction of 50% or more of the anatase phase. Preparing a base layer made of a glass material; Forming an antistatic layer by depositing doped titanium dioxide (TiO ₂ ) on the base layer in a reducing atmosphere; And The method of manufacturing a substrate having an antistatic function, characterized in that it comprises the step of crystallization heat treatment of the antistatic layer. Preparing a base layer made of a glass material; Coating a transparent electrode layer on the base layer; Forming an antistatic layer by depositing doped titanium dioxide (TiO ₂ ) on the transparent electrode layer in a reducing atmosphere; And The method of manufacturing a substrate having an antistatic function, characterized in that it comprises the step of crystallization heat treatment of the antistatic layer. The method of claim 10, wherein a ground is formed on the antistatic layer to increase conductivity of the antistatic layer. 11. The method of claim 10, wherein the antistatic layer generates a surface heat by applying a voltage. 12. The method of claim 11, wherein the transparent electrode layer generates a surface heat by applying a voltage. The method of claim 10, wherein the impurities include niobium (Nb), tantalum (Ta), molybdenum (Mo), arsenic (As), antimony (Sb), and tungsten (Tungsten). W) A method for manufacturing a substrate having an antistatic function, characterized in that at least one selected from among can be used. 16. The method of claim 15, wherein the impurity is doped with titanium dioxide in a molar ratio of 0.1% to 30%. The method of claim 11, wherein the transparent electrode layer is formed of ITO (Tin doped Indium oxide; In ₂ O ₃ : Sn), FTO (Fluor doped tin oxide; SnO ₂ : F) and AZO ( A method of manufacturing a substrate having an antistatic function, characterized in that the coating is made of any one selected from aluminum doped zinc oxide (ZnO: Al). The method of claim 11, wherein the transparent electrode layer includes any one selected from spincoating, sol-gel, vacuum deposition, sputter deposition, spray court, and chemical vapor deposition. Method of manufacturing a substrate having a charge-discharge function, characterized in that the coating. The method for manufacturing a substrate with an antistatic function according to claim 10 or 11, wherein the heat treatment temperature is in the range of 300 ° C to 550 ° C, and the heat treatment time is 10 minutes to 2 hours. 12. The method of claim 10 or 11, wherein the crystallization heat treatment comprises a 50% or more fraction of the anatase phase.

Images