KR20100064400A - Method for depositing thin film of razor blade for razor - Google Patents

Abstract

PURPOSE: A thin film plating method of a razor blade is provided to evaporate a film having two kinds of components using a single target. CONSTITUTION: A first target emits a first component(102) and a second component(104). The first component and the emitted second component are evaporated in edge and razor blade of the razor blade. The first component and the second component are welded to one target form. The first target comprises the first component and the second component. The first component and the second component is one of a metal or a ceramic target which does not include a covalent bond, a metallic bond, and an ionic bond.

Description

Thin film deposition method of razor blades {METHOD FOR DEPOSITING THIN FILM OF RAZOR BLADE FOR RAZOR}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a technique for depositing thin films of razor blades, and more particularly, to a method of thin film deposition of razor blades for increasing the life and quality of razor blades.

In addition, the present invention relates to a hard thin film, and more particularly, to a hard composite thin film having both metallic and ceramic properties for improving durability and hardness at the blade edge and the blade.

The razor blades of wet razors are generally formed using a base material such as stainless steel. In particular, a base material such as stainless steel is subjected to a heat treatment process to increase the hardness of the blade, and then a polishing process is performed to form the blade edge. Then, a process is performed in which various coating materials are deposited on the edges of the final razor blade.

In this case, in order to increase the strength and durability of the blade, a thin film of carbide, nitride, oxide, or the like of metal or ceramic, which is a general hard thin film material, may be used. In addition, after the hard thin film material is coated on the razor blade, organic materials such as PTFE (PolyTetraFluoroEthylene, hereinafter referred to as 'PTFE') are used to reduce the frictional force with the skin during shaving and improve shaving performance. It may also be deposited. However, there is a problem in that the adhesion between the hard thin film materials and the organic material such as PTFE is not good. Therefore, in order to increase the adhesion between the razor blade and the hard thin film and the organic material such as PTFE, a thin metal film such as Cr (Chromium), Ti (Titanium), W (Tungsten), or Nb (Niobium) may be used. It is also deposited between the hard thin film.

The hard thin film generally serves to improve the durability, corrosion resistance and strength of the razor blade, and generally deposits a material on the razor which provides a very good strength such as Cr (Chromium) -Pt (Platinium) alloy. That is, by coating a thin film, such as Cr-Pt, DLC, CrN, TiN, TiAlN on the razor blade edge and the razor blade to improve wear resistance and hardness to improve durability. In more detail, in order to deposit such a material on the razor blade, for example, physical vapor deposition using a target of Cr and Pt is used.

On the other hand, when the hard thin film is deposited on the razor blade edge and the razor blade by physical vapor deposition, a method of rotating the razor blade or the target using two targets and stacking the two materials in a laminated structure is used. In this case, sufficient space inside the deposition chamber (Chamber) is required, making it impossible to use in a narrow space. In this case, the properties of the two targets, i.e., the two materials, are not only difficult to appear at the same time, but also require sufficient time in time. That is, the existing target for depositing such a hard thin film, that is, a deposition method using two targets has a limitation.

It is also very difficult to control the characteristic component ratios of two materials when using a compound, mixture or crystallographically linked target. Accordingly, there is a limit in coating material deposition, that is, hard film deposition, because a case in which components different from the two materials are deposited occurs.

Accordingly, a first object of the present invention is to provide a method for depositing two-component thin films on a razor blade in a single target for increasing the life and improving the quality of the razor blade.

It is a second object of the present invention to provide a method for depositing two components of thin films on a single target when depositing a Cr-DLC hard thin film onto a single target by using physical vapor deposition.

The third object of the present invention is to deposit a Cr-DLC-based hard thin film having the characteristics of two components simultaneously using a physical vapor deposition method on a razor blade, and to deposit the hard thin film on the razor blade. The present invention provides a method for depositing a thin film in which the two components are present by using a single target that does not use a crystallographically coupled target and the Cr and DLC targets, respectively.

In the thin film deposition method according to the present invention, in the method of depositing a thin film on the edge and the blade of the razor blade for the razor, the release process of the first target to release the first component and the second component, and the released first component And depositing a second component on the edge and the blade of the razor blade, wherein the first target includes the first component and the second component, and the first component and the second component are crystallographic. It is characterized in that any one of a metal target or a ceramic target that is not crystallographically bonded, such as covalent bonds, metal bonds, ionic bonds.

Another thin film deposition method of the present invention, in the razor blade edge and the razor blade processing method of any one of the first step of heat-treating the stainless steel, and the second process of grinding the heat-treated stainless steel to form a blade edge And after performing a process, a third process of depositing a plurality of coating materials on the edge of the blade.

As described above, the present invention has the advantage of reducing the time required for depositing a thin film on the razor blade by simultaneously depositing thin films of two components on a single target. In addition, there is an advantage that can be used in a narrow space without rotating the target or the blade. And there is an advantage that the component ratio of the material deposited on the surface area of the two components in the target can be adjusted.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. In addition, in describing the present invention, when it is determined that a detailed description of a related known function or configuration may unnecessarily obscure the subject matter of the present invention, the detailed description thereof will be omitted. Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

In an embodiment of the present invention, a Cr-DLC-based hard thin film, ie, crystalline or amorphous, is coated on the razor blade edge and the razor blade using physical vapor deposition (hereinafter, referred to as 'PVD' method). A method of depositing a Cr-DLC-based hard thin film having a thin film structure having characteristics and having a thickness T of 0 <T ≦ 200 nm will be described.

Prior to describing the present invention, the PVD method includes a DC sputter, a DC magnetron sputter, a DC unbalanced magnetron sputter, and a pulse DC unbalanced magnetron sputter. ), RF Sputter, Arc Ion Plating, Electron-Beam Evaporation, Ion-Beam Deposition, Ion-Beam Assisted Deposition) may be any one.

1 is a conceptual diagram illustrating a sputter target of a sputtering apparatus, which is a kind of physical vapor deposition method used to implement the method according to the present invention.

Referring to FIG. 1, the sputter target 100 is divided into a plurality of regions, and the plurality of regions include two components to be deposited on the razor blade.

The first region of the sputter target 100 includes a first component, for example, a metal-based material (hereinafter referred to as a 'metal material') 102, and the second region includes a second component, for example. Ceramic-based material (hereinafter referred to as "ceramic material") 104 is included. In addition, the metal material 102 improves the strength of the razor blade and improves the adhesion of the organic material to the razor blade and the blade edge. The ceramic material 104 increases durability by increasing corrosion resistance and hardness. For example, the metal material 102 of the first region includes Cr, Ti, W, Nb, and the like, and the ceramic material 104 of the second region includes carbon. The shape of the metal material 102 and the ceramic material 104, which are the respective materials inside the sputter target 100, may be, for example, any one of a polygon such as a circle, a triangle, a rectangle, and the like. Of course. In addition, the second component may be included in the first region, and the first component may be included in the second region.

Next, a sputtering apparatus according to the present invention will be described with reference to FIG. 2.

2 is a plan view showing a top view of a sputtering apparatus for performing a hard thin film deposition on the blade and the blade edge using a sputter target according to the present invention.

Referring to FIG. 2, the sputtering apparatus 200 is equipped with a sputter target 208 and a blade 206. The sputtering device 200 is formed in a hexahedral shape, or a cylindrical shape, and of course, can be modified in other forms as necessary. In addition, a vacuum is formed in the sputtering apparatus 200, and an atmosphere by the injection gas 204 and a plasma 202 may be formed. The blade 206 and the sputter target 208 are disposed to face each other, the sputter target 208 is fixed or movable. In addition, the blade 206 is also of course fixed or movable.

First, the sputter target 208 is mounted on the sputtering apparatus 200. The razor blade is mounted to the sputtering apparatus 200 for depositing a thin film by the sputter target 208 on the razor blade 206. When the razor blade 206 is mounted on the sputtering apparatus 200, the sputtering apparatus 200 is in a high vacuum state.

Next, argon (Ar) gas is injected into the sputtering apparatus 200 and DC power is applied. As a result, the Ar gas in the sputtering apparatus 200 is converted into plasma and Ar ions are generated. The generated Ar ions collide with the sputter target 208, and the sputter target 208 collided with the Ar ions is atomized to emit the two components.

At this time, a direct current power of a cathode ('-') is applied to the razor blade 206, and atoms of the released sputter target 208, that is, the two components, are deposited on the razor blade 206.

Meanwhile, an ion gun may be additionally installed in the stuffing device. In addition, the thin film deposition process through the sputter target may be performed using the stuttering apparatus and the arc ion plating method together.

Next, a cross-sectional view of the blade edge will be described with reference to FIG. 3.

Figure 3 is a deposition principle diagram showing the blade edge during the deposition process according to the present invention.

Referring to FIG. 3, the razor blade 300 is formed using a base material such as stainless steel, performs a heat treatment process to increase the hardness of the razor blade 300, and then a grinding process for forming the razor blade edge. Do this.

 According to the deposition principle of the sputtering apparatus shown in FIG. 2, first, an injection gas, for example, an Ar gas, is converted into plasma to become Ar ions. When the Ar ions collide with the sputter target, the target material is atomized (302 ′, 304 ′) by the energy resulting therefrom. The atomized target materials stick to the razor blade 300 such that the same material as the targets 302, 304 is deposited on the razor blade 300 at the same time.

By the same principle as described above, the thin film may be deposited to have the characteristics of the two targets 302 and 304 by rotating or fixing either the blade 300 or the sputter target. Also, in this case, a thin film having crystalline or amorphous characteristics can be deposited in a small space in a shorter time, and a thin film deposited with a mixture of metallic and ceramic materials having a non-laminated single structure can be formed. .

On the other hand, the ratio of the metal-based material and the ceramic-based material included in the sputter target, that is, the ratio of the metal-based material and the ceramic-based material which is a component of the thin film deposited by adjusting the ratio of the surface area in which the materials are included. Easy to adjust In addition, according to this ratio, the thin film can be obtained with crystalline or amorphous properties. In addition, it is possible to easily control the thickness of the thin film required through the amount of power applied to the sputter target and the deposition time.

1. After the razor blade is mounted on the sputtering device, the chamber is maintained at an initial vacuum of 10 ^-6 torr.

2. An etching process using an Ar plasma is performed to remove the foreign matter and the oxide film of the razor blade.

3. Perform the deposition process using Cr and C targets. To clean the target, presputtering is performed for 5 to 20 seconds in an Ar atmosphere.

4. A voltage of -300V to -600V is applied to the razor blade so that the materials to be deposited off the target adhere to the razor blade.

5. The sputter target is applied with a DC power of about 3 kW to 6 kW. The thickness of the thin film to be deposited is about 100 nm to about 300 nm.

Then, the cutting force of the blade according to the thin film will be described with reference to Table 1 below.

Table 1 compares the razor blades on which Cr-DLC thin films are deposited with the razor blades on which Cr and CrN thin films are deposited.

First, the cutting performance and cutting performance, which are considered to be most important when shaving, were measured using a cutting base metal. Next, the corrosion resistance characteristics were compared, and wear resistance and durability were compared using the cutting base material. As a result of the overall comparison, the use of the razor blade deposited with the Cr-DLC thin film showed superior performance in the durability and corrosion resistance than the razor blade deposited with the conventional Cr and CrN thin films. In addition, it was found that cutting performance and cutting performance were also increased when compared to the blades on which CrN thin films were deposited.

Meanwhile, in order to compare the razor blades on which the Cr-DLC thin film is deposited with the razor blades on which Cr or CrN thin films are deposited, the razor blades are applied to an actual razor cartridge to evaluate the shaving performance without informing the user of the type of the razor blade. . As a result, it was evaluated that the razor blades deposited with the Cr-DLC thin film were superior to the conventional razor blades, ie, the blades with the Cr and CrN thin films deposited, in terms of comfort, adhesion, wound presence, safety, and feeling after shaving.

1 is a conceptual diagram illustrating a sputter target of a sputtering apparatus, which is a kind of physical vapor deposition method used to implement the method according to the present invention.

Figure 2 is a plan view showing a plan view of a sputtering apparatus for performing a hard thin film deposition on the blade and the blade edge using a sputter target according to the present invention.

Figure 3 is a deposition principle diagram showing the blade edge during the deposition process according to the present invention.

Claims (34)

In the method of depositing a thin film on the edge of the razor blade and the razor blade, A release process in which the first target releases the first component and the second component, And depositing the emitted first and second components on the edge and the blade of the blade, The first target includes the first component and the second component, and the first component and the second component are crystallographically targeted metal or ceramic targets that are not crystallographically bound such as covalent bonds, metal bonds, and ionic bonds. Thin film deposition method of the razor blade, characterized in that any one of.  The method of claim 1,  Thin film deposition method of a razor blade characterized in that it further comprises the step of bonding the first component and the second component in the form of a single target.  The method of claim 2, Bonding in the form of one target, the thin film deposition method of the razor blade, characterized in that comprising the step of inserting or bonding in the shape of any one of a circle or polygon.  The method of claim 1,  The metal target is a thin film deposition method of a razor blade, characterized in that any one of Cr, W, Ti, Nb.  The method of claim 1,  The metal target is a thin film of a razor blade characterized in that it comprises any one of oxides, compounds, carbides generated after performing any one of oxidation, nitriding, carbonization for each of Cr, W, Ti, Nb. Deposition method.  The method of claim 1,  The ceramic target is a thin film deposition method of a razor blade, characterized in that any one of diamond, amorphous diamond, pseudo-diamond (DLC), graphite, carbon. The method of claim 1, The deposition process includes a DC sputter, a DC magnetron sputter, a DC unbalanced magnetron sputter, and a pulsed DC unbalanced magnetron on the blade edge and the blade in physical vapor deposition (PVD). Pulse DC Unbalanced Magnetron Sputter, RF Sputter, Arc Ion Plating, Electron-Beam Evaporation, Ion-Beam Deposition, Ion Beam A thin film deposition method of a razor razor blade, characterized in that for depositing a hard thin film having a crystalline or amorphous characteristics using an ion-beam assisted deposition method. The method of claim 1, The deposition process may include depositing the first component included in the first target and the same component as the second component to be deposited on the edge of the razor blade and the razor blade. . The method of claim 1, The razor blade and the first target is arranged parallel to each other, the thin film deposition method of the razor razor blade, characterized in that the razor blade is moved or fixed near the first target is deposited. The method of claim 7, wherein The deposition process may include controlling a deposition time and a deposition power of a thin film in which the first component chromium and the second component DLC (Diamond Like Carbon) are mixed in an atomic form; And depositing the thin film on the razor blade edge and the razor blade. The method of claim 10, Adjusting the deposition time and the deposition power, thin film deposition method of the razor blade, characterized in that the thickness of the blade edge and the blade thin film is between 1nm to 500nm. In the razor blade edge and razor blade processing method, A first process of heat-treating stainless steel, After performing any one of the second process of forming the blade edge by polishing the heat treated stainless steel, and a third process of depositing a plurality of coating materials on the edge of the blade. Razor blade edge and razor blade processing method. The method of claim 12, The third process comprises the steps of depositing a metal thin film or ceramic-based carbide, nitride, oxide thin film of a general hard material on the blade edge, the razor blade edge and razor blade processing method. The method of claim 12, The metal thin film comprises any one of the blades, Cr, Ti, W, Nb. The method of claim 12, The third process is a blade edge and razor blade processing method further comprises the step of depositing an organic material (PolyTetraFluoroEthylene) PTFE on the razor blade. The method of claim 12, And wherein said third step further comprises depositing said metal thin film between said organic material and said thin film of hard material. The method of claim 12, The third step is the blade edge and the blade processing method, characterized in that using a sputtering device The method of claim 17, And a sputter target in said sputtering apparatus, said sputter target comprising said blade edge and a first component and a second component deposited on said blade. The method of claim 18, And the first component is a metal-based material. The method of claim 19, The metal-based material is a blade edge and the blade processing method, characterized in that the shape of any one of a circular and polygonal shape. The method of claim 19, The metal-based material is any one of the Cr, Ti, W, Nb blade edge and blade processing method. The method of claim 18, And the first component is a ceramic-based material. 23. The method of claim 22, The ceramic-based material is any one of the shape of the circular and polygonal blade edge and blade processing method. 23. The method of claim 22, The blade-based blade and blade processing method, characterized in that the ceramic-based material is carbon. The method of claim 18, And said second component is a metal-based material. 26. The method of claim 25, The metal-based material is a blade edge and the blade processing method, characterized in that the shape of any one of a circular and polygonal shape. The method of claim 18, And the second component is a ceramic-based material. 28. The method of claim 27, The ceramic-based material is a blade edge and the blade processing method, characterized in that the shape of any one of a circular and polygonal shape. The method of claim 17, The sputtering device is a razor blade edge and razor blade processing method, characterized in that any one of the form of a hexahedral and cylindrical form. The method of claim 17, The sputtering device is a blade edge and the blade processing method characterized in that the vacuum is formed. The method of claim 12, The third process may include injecting a gas into the sputtering apparatus; Blade edge and blade processing method comprising the step of forming the atmosphere and plasma through the injected gas. The method of claim 12, The third process comprises the steps of placing the razor blade and the sputter target to face each other, The blade or stuffer target is a fixed or movable blade edge and blade processing method characterized in that the. The method of claim 17, The third step, the blade edge and the blade processing method further comprises the step of additionally installing and using the ion gun in the sputtering device. The method of claim 12, The third process further comprises using the sputtering device and the arc ion plating method together.

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