KR20100063986A - Optical filter for plasma display panel and manufacturing method thereof - Google Patents

Abstract

PURPOSE: An optical filter for a plasma display panel and a manufacturing method thereof are provided to reinforce an electromagnetic wave shielding function of a filter with lowering a sheet resistance of a mesh. CONSTITUTION: A conductive mesh(14) is arranged on a single-side of a transparent base(12) includes a mesh hole. A color layer(16) is formed within the mesh hole. A hard coating layer(18) is formed on the conductive mesh and the color layer.

Description

Optical filter for plasma display panel and manufacturing method thereof

The present invention relates to an optical filter for a plasma display panel and a method of manufacturing the same.

Plasma display panel (PDP) is a kind of flat panel display using plasma phenomenon, and is attracting attention as the next generation display device because it can display high-quality digital images and satisfy both size and thickness compared to CRT.

However, the plasma display panel has a problem in that color purity characteristics are deteriorated due to the generation of electromagnetic waves generated by plasma light emitting and driving circuits and unnecessary near-infrared rays caused by inert gas in the panel. In addition, electromagnetic waves and near infrared rays generated in the plasma display panel are harmful to the human body and cause malfunction of precision instruments. Therefore, in the conventional plasma display panel, a front filter is used to block electromagnetic waves and near infrared rays, reduce surface reflection, and improve color purity.

The front filter used in the plasma display panel is generally manufactured by installing a conductive film or a metal mesh on a transparent glass or plastic substrate and stacking a near infrared cut film and / or an anti-radiation film. The conductive film or metal mesh is generally grounded to the chassis base that supports the panel for the discharge of charged charge.

However, the existing front filter is manufactured to have an electromagnetic shielding structure, a near infrared shielding structure, and an anti-radiation structure using at least two transparent substrates. Therefore, the existing front filter has a problem in that the manufacturing process is complicated due to a complicated laminating process, the manufacturing cost is high, and the transmittance of the manufactured front filter is low.

SUMMARY OF THE INVENTION An object of the present invention is to provide an optical filter for a plasma display panel and a method of manufacturing the same, which can simplify the manufacturing process and reduce material costs while securing functions for electromagnetic shielding, near infrared ray blocking, and color correction.

In other words, it is an object of the present invention to provide an optical filter for a plasma display panel and a method for manufacturing the same, wherein the electromagnetic shielding structure, the near infrared shielding structure, and the anti-radiation structure are optimized for a single transparent substrate type front filter.

According to an aspect of the present invention, a transparent substrate; A conductive mesh disposed on one surface of the transparent substrate and having mesh holes; A dye layer formed in the mesh hole; And a hard coat layer disposed on the conductive mesh and the dye layer.

Preferably, the conductive mesh has a thickness of about 10 μm to about 12 μm.

The conductive mesh is made of copper.

The thickness of the pigment layer is about 7 μm to about 12 μm.

The dye layer has at least one function of color correction, near infrared ray blocking and neon light blocking.

The hard coat layer has a thickness of about 5 μm to about 6 μm.

The hard coat layer is made of a fluorine resin.

The optical filter may further include a functional layer for at least one function of anti-reflection, anti-glare and luminance ratio uniformity disposed on one surface of the hard coating layer.

According to another embodiment of the invention, the step of attaching a sheet-like conductive mesh on one surface of the transparent substrate; Forming mesh holes in the conductive mesh; forming a dye layer in the mesh holes; And forming a hard coat layer on the sheet-shaped conductive mesh and the dye layer.

Preferably, the thickness of the dye layer is formed to be equal to or less than the thickness of the sheet-shaped conductive mesh.

The thickness of the dye layer is formed from about 7 μm to about 12 μm.

The hard coat layer is formed to a thickness of about 5㎛ to about 6㎛ using a fluorine-based resin.

According to the present invention, it is possible to lower the sheet resistance of the mesh to enhance the electromagnetic shielding performance of the filter by using the sheet-like conductive mesh instead of the thin-film mesh.

In addition, by filling the mesh hole of the sheet-shaped conductive mesh first with a dye layer and then forming a hard coating layer on the structure, the electromagnetic wave shielding structure by the sheet-shaped mesh, the near-infrared blocking structure by the dye layer, and the anti-reflection structure by the hard coating layer An optical filter having an optimized structure can be provided.

In addition, the yield can be increased while simplifying the manufacturing process of the optical filter and lowering the manufacturing cost than the conventional manufacturing process of the optical filter using a plurality of transparent substrates. In addition, since the overall thickness of the manufactured optical filter is thin, the transmittance of visible light is improved.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. The following examples are provided to fully understand the present invention for those skilled in the art, and may be modified in various other forms. The scope of the invention is not limited to the embodiments described below. In describing the present invention, when it is determined that a detailed description of a related known function or configuration may unnecessarily obscure the subject matter of the present invention, the detailed description thereof will be omitted. The same reference numerals in the drawings refer to the same or similar elements, the thickness or size of each element may be exaggerated for convenience and clarity of description. Also when a layer is described as being on top of another layer, it may be directly on top of another layer, and a third layer may be interposed therebetween.

In the following description, the term transparent means not only completely transparent but also having a transmittance of a level that can be generally seen as transparent in the art.

1 is a perspective view of an optical filter according to an embodiment of the present invention. The optical filter of FIG. 1 is partially cut out for convenience of description.

Referring to FIG. 1, the optical filter 10 is a single substrate type film filter and includes a transparent substrate 12, a sheet-like conductive mesh 14, a dye layer 16, and a hard coat layer 18. The optical filter 10 of this embodiment has a single substrate type film filter structure useful for simplifying the manufacturing process, reducing the manufacturing cost, and reducing the defective rate while ensuring the function of the optical filter.

The single substrate type film filter has advantages in that the manufacturing process is simple, the processing cost is low, and the defect rate is lower than that of the conventional film filter using at least two layers of transparent substrates. In other words, a film filter using a multilayer substrate is more complicated in manufacturing process and structure than a single substrate film filter because it takes a lot of time and cost to align and cut in the lamination process and the ground exposure process between the transparent substrates. And the filter price is expensive.

The optical filter 10 of the present embodiment uses a sheet-like mesh 14 having a resistance per unit area, that is, a sheet resistance of 0.04 kPa / sq to 0.05 kPa / sq. Sheet-like mesh 14 is excellent in EMI shielding effect because the sheet resistance is very small compared to the thin-film mesh formed through a film forming process such as printing or deposition. The sheet resistance of the thin-film mesh is 0.2 kW / square to 0.3 kW / square.

In addition, the optical filter 10 of this embodiment is provided with the pigment | dye layer 16 filled in the mesh hole 15 of the sheet-like mesh 14 by predetermined height. The dye layer 16 performs not only color correction of light passing through the mesh hole 15 but also near infrared ray blocking and neon light blocking depending on the added dye. The dye layer 16 may be formed of a plurality of layers each containing pigments for blocking near-infrared rays, blocking neon light, and color correction, or a single layer in which the dyes are combined.

In addition, the optical filter 10 of the present embodiment includes a sheet-like mesh 14 and a hard coat layer 18 disposed on the dye layer 16. The hard coat layer 18 is normally formed in 5-6 micrometers as an appropriate thickness.

The coupling relationship between each component and the components of the above-described optical filter will be described in more detail with reference to FIG. 2. 2 is a cross-sectional view of the optical filter of the present invention. 2 corresponds to a cut plane taken by the line II ′ of FIG. 1.

Referring to FIG. 2, the transparent substrate 12 is a base film that supports the optical film 10. The thickness T1 of the transparent base material 12 is approximately 100 μm. This thickness takes into account the desired intensity and light transmittance. The above-described transparent substrate 12 is polyethersulphone (PES), polyacrylate (PAR, polyacrylate), polyether imide (PEI, polyetherimide), polyethylene naphthalate (PEN, polyethylene napthalate), polyethylene terephthalate ( PET, polyethylene terephthalate (PET), polyphenylene sulfide (PPS), polyallylate, polyimide, polycarbonate (polycabonate), triacetate cellulose (TAC), cellulose acetate propio It consists of at least one material selected from the group consisting of cellulose acetate propionate (CAP).

The sheet-shaped conductive mesh 14 is made of a metal, a metal oxide, an alloy, or the like having excellent electrical conductivity. For example, the sheet-like mesh 14 may be a copper mesh made of copper (Cu). The optimum thickness T2 of the sheet-like mesh 14 is approximately 10 μm to 12 μm although there are some differences depending on the material. If the thickness T2 of the sheet-like mesh 14 is smaller than 10 mu m, it may be too thin to break during operation, and if thicker than 12 mu m, the optical filter may be unnecessarily thickened to lower the light transmittance.

The dye layer 16 is disposed in the mesh hole 15 of the sheet-like mesh 14. The thickness T3 of the dye layer 16 may be selected in the range of about 7 μm to 12 μm. In other words, the thickness T3 of the dye layer 16 is designed to have a thickness of approximately 3 占 퐉 as small as the thickness T2 of the sheet-like mesh 14. It is determined in consideration of the optimum thickness of 5 μm to 6 μm of the hard coat layer 18 disposed on the structure of the sheet-like mesh 14 and the dye layer 16.

The above-described dye layer 16 includes a dye such as a dye or a pigment capable of selectively absorbing light of a specific wavelength in the visible light region. For example, the dye includes a dye capable of blocking unnecessary light near a wavelength of about 585 nm emitted during excitation of neon or a dye capable of blocking near infrared rays. The pigment may be cyanine-based, squarylium-based, azomethine-based, kisantine-based, oxonol-based, or azo-based. based) compounds can be used. The kind and concentration of the dye may be determined by the absorption wavelength and absorption coefficient of the dye, the color tone of the transparent layer, the transmission characteristics and the transmittance required for the film filter, and the like.

The hard coat layer 18 is provided to prevent scratches by various types of external force. The thickness T4 of the hard coat layer 18 is approximately 5 μm to 6 μm. The hard coat layer 18 may be made using a fluorine resin or the like. The hard coat layer 18 may additionally include a silica-based filler to improve strength.

3A to 3D are process flowcharts of the optical filter manufacturing method of the present invention.

As shown in FIG. 3A, first, the transparent substrate 12 is prepared. The transparent substrate 12 may be prepared as follows. For example, polyethylene terephthalate (PET) pellets are melted at 290 ° C. to 300 ° C. and compressed with an extruder to produce a 200 μm thick film. Then, the film is biaxially stretched while being heated again to prepare a PET film 12 having a thickness T1 of 100 µm.

Then, a sheet-shaped mesh disc 14a to be attached to one surface of the transparent substrate 12, that is, the upper surface as shown in FIG. 3A is prepared. The sheet mesh disc 14a is a copper plate with a thickness T2 of 12 μm.

Next, as shown in FIG. 3B, the sheet-shaped mesh disc 14a is attached to the upper surface of the transparent substrate 12. Attachment can be performed through a roll to roll process. Then, the mesh hole 15 is formed through an etching process to prepare the sheet-shaped mesh 14 attached to the transparent substrate 12. The etching process includes a wet etching process or a dry etching process.

Next, as illustrated briefly in FIG. 3C, the dye layer material 16a is applied to the mesh hole 15. The dye layer material 16a is prepared by mixing a cyanine-based or squarylium-based dye with an acryl-based binder. Of course, the formation of the dye layer material 16a may be performed through a film forming process such as an inkjet printing method, a screen printing method, or a deposition method. At this time, the application of the dye layer material 16a is performed such that the thickness of the finally formed dye layer is equal to or slightly smaller than the thickness of the sheet-like mesh.

Next, as shown in FIG. 3D, a hard coat layer material 18 ′ is coated on the upper part of the structure, that is, on the sheet-like mesh 14 and the dye layer 16 disposed on the transparent substrate 12, and this is ultraviolet light. Curing is carried out by a curing method to form a hard coat layer. As the hard coat layer material 18 ', a fluorine resin is used.

Through the above-described processes, an optical filter 10 as shown in FIG. 1 is produced. The fabricated optical filter has a simple manufacturing process compared to the conventional multi-substrate film filter or a single-substrate film filter using a thin-film mesh, thus reducing the manufacturing cost and increasing the yield.

4 is a partial cross-sectional view of a plasma display panel using the optical filter of the present invention.

Referring to FIG. 4, the plasma display panel includes a panel body 50 and an optical filter 10a attached to the viewing surface of the panel body 50.

The optical filter 10a is basically the optical filter described above with reference to FIGS. 1 to 3D. In this embodiment, the optical filter 10a further includes a functional layer 20 disposed on the top surface of the hard coat layer 18. The functional layer 20 may include at least one of anti reflection, anti glare and luminance ratio uniformity to minimize loss of visible light transmitted and to prevent reflection and reflection of external light. With functions.

In the case where the functional layer 20 is integrally formed with the hard coating layer 18, the total thickness of the hard coating layer 18 and the functional layer 20 is to be expected without making the overall thickness of the optical filter 10a too thick. It has a thickness of about 2㎛ 6㎛ on the sheet-like mesh 14 so as to obtain, the optical characteristic is low as about 1 to 3% haze, the visible light transmittance is 30% to 90%, The external light reflectance is as low as 1 to 20%, and is designed to have heat resistance and glass hardness of 2 to 3H or more above the glass transition temperature.

In addition, the functional layer 20 may be provided in a single layer structure or a multi-layer structure. The single layer structure may be formed by quantifying a thin film of fluorine-based transparent polymer resin, magnesium fluoride, silicon-based resin, or silicon oxide with an optical film thickness of 1/4 wavelength. The multilayer structure may be formed of two or more layers of organic compound thin films of inorganic compounds such as metal oxides, fluorides, silicides, borides, carbides, nitrides and sulfides having different refractive indices, silicone resins, acrylic resins, or fluorine resins. It can be formed by placing.

The functional layer 20 described above may also be disposed between the bottom surface of the hard coat layer 18, that is, between the top surface of the sheet-like mesh 14 and the dye layer 16 and the bottom surface of the hard coat layer 18. Sputtering, ion plating, ion beam assist, vacuum deposition, chemical vapor deposition (CVD), physical vapor deposition (PVD), etc. may be used to form the above-described functional layer 20.

The panel body 50 includes a front plate 51 and a back plate 53 that are disposed to face each other, a partition wall 55 disposed between the top plate 51 and the lower plate 53, and a partition wall 55. A phosphor 57 installed in the discharge space partitioned by the < RTI ID = 0.0 > The upper plate 51 may include a transparent first substrate, a pair of first electrodes disposed on the first substrate, a first dielectric layer covering the first electrode, and a protective film covering the first dielectric layer. The lower plate 53 may include a second substrate, a second electrode disposed on the second substrate, and a second dielectric layer covering the second electrode.

In addition, the panel main body 50 is disposed on a chassis base for supporting a display panel made of an upper plate 51, a lower plate 53, a partition wall 55, and a phosphor 57, and one surface of the chassis base. And a driving circuit board having circuits for driving the same. The detailed structure and operating principle of the panel body 50 described above will be omitted since it will be apparent to those skilled in the art.

The scope of the above-described invention is defined in the claims below, not limited to the description in the text of the specification, all modifications and variations belonging to the equivalent scope of the claims will fall within the scope of the invention.

1 is a perspective view of an optical filter according to an embodiment of the present invention.

2 is a cross-sectional view of an optical filter of the present invention.

3A-3D are process flow diagrams for the optical filter manufacturing method of the present invention.

4 is a partial cross-sectional view of a plasma display panel using the optical filter of the present invention.

<Explanation of symbols for the main parts of the drawings>

10, 10a: optical filter 12: transparent substrate

14 sheet-like conductive mesh 14a mesh disk

15: mesh hole 15a: mesh main surface

16: dye layer 16a: dye layer material

17: printing apparatus 18, 18 ': hard coating layer

20: functional layer 50: plasma display panel body

Claims (12)

Transparent substrates; A conductive mesh disposed on one surface of the transparent substrate and having mesh holes; A dye layer formed in the mesh hole; And And a hard coating layer formed on the conductive mesh and the dye layer. The method of claim 1, The conductive mesh has a thickness of 10 μm to 12 μm. The method of claim 2, The conductive mesh is made of copper optical filter. The method of claim 2, The thickness of the dye layer is 7㎛ to 12㎛ optical filter. The method of claim 4, wherein The dye layer has an optical filter having at least one function of color correction, near infrared blocking, and neon light blocking. The method of claim 4, wherein The hard coating layer has a thickness of 5 μm to 6 μm. The method of claim 6, The hard coating layer is an optical filter made of a fluorine resin. The method of claim 1, The optical filter further comprises a functional layer for at least one function of anti-reflection, anti-glare and brightness ratio uniformity disposed on one surface of the hard coating layer. Attaching a sheet-like conductive mesh on one surface of the transparent substrate; Forming a mesh hole in the conductive mesh: Forming a dye layer in the mesh hole; And Forming a hard coat layer on the sheet-like conductive mesh and the dye layer. 10. The method of claim 9, The thickness of the said dye layer is a manufacturing method of the optical filter formed below the thickness of the said sheet-like conductive mesh. The method of claim 10, The thickness of the dye layer is 7㎛ to 12㎛ manufacturing method of the optical filter. 10. The method of claim 9, The hard coating layer is a method of manufacturing an optical filter to form a thickness of 5㎛ to 6㎛ using a fluorine-based resin.

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