KR20100044673A - Fabrication method of anti-reflection layer for solar cells using nano-sized patterns - Google Patents

Abstract

PURPOSE: A method for manufacturing the anti-reflection layer of a solar cell is provided to minimize the light reflection on the surface of the solar cell by forming nano patterns on the surface of the solar cell with an imprint or an embossing methods. CONSTITUTION: A template with a nano pattern is stamped on a thermoplastic polymer film in order to form the oppose pattern of the nano pattern on the thermoplastic polymer film(S110). The template is removed. An adhesion preventive layer is formed on the surface of the thermoplastic polymer film(S120). A melted resin is dropped on the surface of a surface(S130). The refraction index of the melted resin is 80 to 120% of the refraction index of a substrate material. The thermoplastic polymer film is pressed on the substrate. The resin is hardened to form the nano pattern on the substrate(S140).

Description

Fabrication method of anti-reflection layer for solar cells using nano-sized patterns}

The present invention relates to a method of manufacturing an antireflection film for improving light transmission efficiency of a solar cell, and more particularly, by forming a nanopattern on the surface of the solar cell using an imprint or embossing method, thereby minimizing reflection on the surface of the solar cell. It relates to a method of manufacturing an anti-reflection film of a solar cell can be reduced to.

Recently, the depletion of fossil energy resources such as petroleum and coal is predicted, and as interest in the environment increases, interest in alternative energy to replace them is increasing. Among them, solar cells are attracting attention because they have unlimited energy resources and no problems with environmental pollution.

Solar cells include solar cells that generate steam required to rotate turbines using solar heat, and solar cells that convert photons into electrical energy using properties of semiconductors. The solar cell generally means a solar cell, and the present invention also relates to a solar cell (hereinafter referred to as a solar cell).

In order to increase the efficiency of solar cells, recently, various methods for increasing efficiency by optimizing the photovoltaic effect by p-n junction have been developed. Increasing solar cell efficiency includes optimization of pn junction structure for electron-hole generation, surface passivation method to prevent leakage of generated electrons, optimization of electrode formation method to increase electron collection efficiency, and formation of front anti-reflection film. For this purpose, various studies are underway.

In general, dry etching method using plasma, wet etching method and silicon nitride film (SiNx) are mainly used as methods for increasing the amount of light trapping in solar cells, but the above methods are applicable to polycrystalline and single crystal silicon based solar cells only. This is a possible way. In addition, this method has a problem in that the transmittance rises only in the region of 600 nm wavelength and the other wavelength range shows no change or rather a lower transmittance.

Generally, there are top-down technology and bottom-up technology, which are mainly used in semiconductor manufacturing processes, for forming nanopatterns. However, there is a problem that the process cost is too high to apply the top-down technology in the solar cell manufacturing process, and in the case of the bottom-up technology, the precision of the nanopatterns formed is low and it is difficult to apply to large-area solar cells.

Therefore, in order to maximize the light transmission efficiency of not only silicon-based but also organic-inorganic hybrid solar cells, precise nano-patterns that can be used as anti-reflective films on the surface of solar cells and the protective layers required in the solar cell modularization process are simple processes. There is a need for a method that can be formed.

One object of the present invention is to provide a method capable of manufacturing an antireflection film of a solar cell using an imprint method.

Another object of the present invention is to provide a method for manufacturing an antireflection film of a solar cell using an imprint method and an etching method.

Still another object of the present invention is to provide a method of manufacturing an antireflection film of a solar cell using an embossing method.

The anti-reflection film manufacturing method of the solar cell according to the present invention for achieving the above object is (a) by forming a reverse pattern on the surface of the thermoplastic polymer film by stamping a thermoplastic polymer film with a template on which a nano-pattern is formed, the template Separating the; (b) forming an anti-adhesion film on the surface of the thermoplastic polymer film; (c) dropping the resin in the molten state having a refractive index of 80 to 120% of the refractive index of the material forming the substrate on the surface of the substrate on which the nano pattern is to be formed; And (d) curing the resin in a state in which the thermoplastic polymer film is pressed to fill the resin inside the opposite pattern of the surface of the thermoplastic polymer film, and then separating the thermoplastic polymer film.

The anti-reflection film manufacturing method of the solar cell according to the present invention for achieving the above another object is (a) by stamping a thermoplastic polymer film with a template on which a nano pattern is formed to form an opposite pattern on the surface of the thermoplastic polymer film, the template Separating; (b) forming an anti-adhesion film on the surface of the thermoplastic polymer film; (c) dropping the resin in the molten state on the surface of the substrate on which the nano pattern is to be formed; (d) curing the resin in a state in which the thermoplastic polymer film is pressed so that the resin is filled in the opposite pattern on the surface of the thermoplastic polymer film, and then separating the thermoplastic polymer film; (e) etching the resin until the surface of the substrate is exposed using reactive ion etching (RIE) using O ₂ gas as a reaction gas; And (f) etching the substrate until the resin is removed using dry etching.

According to another aspect of the present invention, there is provided a method of manufacturing an anti-reflection film for a solar cell, including: (a) preparing a template on which a reverse pattern of nanopatterns to be formed is formed on a thermoplastic polymer substrate; (b) forming a nanopattern on the surface of the thermoplastic polymer substrate by stamping the thermoplastic polymer substrate with the template; And (c) separating the template.

Anti-reflection film manufacturing method of the solar cell according to the present invention can form a nano-pattern for low reflection on the surface or protective layer of the solar cell by a simple imprint method or embossing method, the anti-reflection film produced by the present invention is a solar cell There is an advantage to increase the light transmission efficiency by reducing the reflection of light on the surface.

In addition, the anti-reflection film formed by the conventional silicon-based etching technology has a high light transmission efficiency only near the 600nm wavelength, the anti-reflection film manufacturing method of the solar cell according to the present invention by forming a nano-pattern to increase the transmittance in a wider wavelength range You can get it.

In addition, the conventional anti-reflection film can be manufactured only for silicon solar cells, the anti-reflection film manufacturing method of the solar cell according to the present invention can be applied to most of the solar cell surface, and also to the protective layer used in the solar cell modularization process There is an advantage that can be applied to a very wide range of applications.

Hereinafter, an antireflection film of a solar cell according to a preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings.

1 is a flowchart illustrating a method of manufacturing an anti-reflection film of a solar cell according to an embodiment of the present invention.

Referring to Figure 1, the anti-reflection film manufacturing method of the solar cell according to an embodiment of the present invention is a polymer mold manufacturing step (S110), the anti-stick film forming step (S120), the resin drop step (S130) and the nano-pattern forming step ( S140) is made.

In the polymer mold manufacturing step (S110), a reverse pattern is formed on the surface of the thermoplastic polymer film by stamping the thermoplastic polymer film with the template on which the nanopattern is formed. In general, since the thermoplastic polymer is flexible at a temperature above the glass temperature (Tg), it can be easily stamped at a temperature higher than the glass temperature (Tg) of the thermoplastic polymer film.

The template is made of a material that can withstand high temperatures and pressures sufficiently, and may be made of materials such as SiC, SiO ₂ , Si ₃ N ₄ , Al ₂ O ₃ , MgO, Si, Ni, and the like.

The nanopattern formed on the template can be manufactured by various methods. For example, after pressurizing a powder mixed with MgO powder, Al ₂ O ₃ powder and SiO ₂ nano powder having a diameter of about 200 nm to 300 nm, only isotropic etching of SiO ₂ such as HF is performed. After selectively etching only SiO _{2 with} an etchant that can be etched, the template on which the nanopattern 31 is formed may be manufactured by sintering. As another example, an aluminum oxide surface on which a nanopattern is formed may be obtained by using an anodized aluminum oxide method. Light transmission efficiency in the anti-reflection film by the nanopattern can be controlled by the size and shape of the nanopattern formed on the template.

2 illustrates the polymer mold manufacturing step S110 in more detail.

Referring to FIG. 2, first, the template 10 is prepared on the thermoplastic polymer film 20. Thereafter, heating is performed at a temperature higher than the glass temperature (Tg) of the thermoplastic polymer film 20, and a pressure is applied so that the nanopattern formed on the template may be transferred to the thermoplastic polymer film 20 (embossing process). Thereafter, the template 10 is separated from the thermoplastic polymer film 20 by cooling to a temperature lower than the glass temperature Tg of the thermoplastic polymer film 20. Subsequently, the nanopattern forming step S140 uses a polymer mold (polymer template) manufactured through the above process instead of the template 10.

The reason for producing the polymer mold is to use the imprint method in the nano-pattern forming step (S140) to be described later, because the physical force is applied to the template due to the characteristics of the imprint, in order to prevent wear of the template 10, the embossing method It is used to replicate the reverse pattern of the nanopattern formed on the template 10 on the thermoplastic polymer film 20 in advance.

In this case, the thermoplastic polymer film 20 that can be used is preferably made of a transparent and heat resistant material when considering the imprint method to be described later. In FIG. 2, a polyvinyl chloride (PVC) film, which is a representative thermoplastic polymer film that is transparent and resistant to heat, is exemplified. In addition, the material constituting the thermoplastic polymer film 20 of the present invention is ethylene vinyl acetate (EVA), polyethylene, polypropylene, polyolefin, poly methyl methacrylate, poly methyl acrylate, polystyrene, nitrocellulose, acetyl cellulose, polycarbonate , Polyethylene terephthalate, ABS resins, polyamides, polyimides, polyether sulfones, polyvinyl acetals, polyether ketones, polyurethanes and the like can be used.

Since a template made of a material such as silicon carbide (SiC) has a different thermal expansion coefficient from that of the thermoplastic polymer film, it can be easily separated from the thermoplastic polymer film upon cooling. However, since the thermoplastic polymer film may adhere to the template at or above the glass temperature (Tg), it is preferable to coat the surface with a release material such as graphite on the template in advance.

In the anti-adhesion film forming step (S120), an anti-adhesion film 30 is formed on the surface of the thermoplastic polymer film 20 in which the opposite pattern is formed through the polymer mold manufacturing step (S110). The anti-sticking film 30 is necessary to prevent the thermoplastic polymer film 20 and the resin 50 (FIG. 3) from being adhered in the nanopattern forming step S140 to be described later. The anti-sticking film 30 may be coated with graphite or Teflon on the surface of the thermoplastic polymer film 20, but after forming a SiO ₂ layer of about 5 ~ 20nm on the surface of the thermoplastic polymer film 20 by sputtering or the like of, SiO monomolecular silane series of nm to about the size of a _two-layer formed surface (heptadecafluoro-1,1,2,2-tetra-hydrodecyl ) trichlorosilane, Cl 3 Si (C 2 H 4) C 8 F 17 , etc. It is preferable to coat the material having a low surface energy. As an example, in the case of a silicon substrate, a strong chemical bond is formed at the interface between silicon and SiO ₂ , but only van der Waals forces and electrostatic forces act between the silane-based materials as in the above example. When the SAM (Self Assembled Monolayer) coating on the SiO ₂ layer, the surface energy change due to the coating is large, it can have a variety of functionalities to enable a smooth release.

The above-described polymer mold manufacturing step (S110) and the step of forming an anti-adhesion film on the surface of the thermoplastic polymer film (S120) may be referred to as preparation steps of the following steps for manufacturing the anti-reflection film of the solar cell.

3 illustrates a resin drop step (S130) and a nanopattern forming step (S140) for manufacturing an anti-reflection film. The thermoplastic polymer film 20 in which the opposite pattern of the nanopattern is formed is used as a polymer template.

Referring to FIG. 3, in the resin drop step S130, the resin 50 in a molten state is dropped on the surface of the substrate 40 on which the nanopattern is to be formed. The amount of the resin 50 to be dropped should be sufficient to completely fill the inside of the opposite pattern of the surface of the thermoplastic polymer film 20.

The substrate 40 may be made of a material such as silicon constituting the solar cell surface layer, or may be made of a material such as glass, ethylene vinyl acetate (EVA), etc., which forms a protective layer required for the solar cell modularization process.

In the nanopattern forming step (S140), after curing the resin 50 in a state in which the thermoplastic polymer film is pressed so that the resin 50 is filled in the opposite pattern formed on the surface of the thermoplastic polymer film 20, the thermoplastic polymer Separate the film 20.

The curing of the resin may be a thermosetting method, UV curing method and the like, the resin 50 is dropped according to the curing method of the resin is also selected as a thermosetting resin, UV curing resin and the like.

Referring to FIG. 3, in this embodiment, a nanopattern is formed on the cured resin 50 to serve as an antireflection film of a solar cell. The resin 50 may have various refractive indices according to the type. However, when the difference between the refractive indices of the resin 50 and the substrate 40 is large, the amount of light reflected from the incident light increases, so that the resin 50 may be formed of the substrate 40. It is preferable to have a refractive index of 80 to 120% of the refractive index of the material forming. For example, when glass is used as the substrate 40 material, since the refractive index of the glass is about 1.5, it is preferable that the resin 50 also has a similar refractive index. Examples of such a resin include a NIP-K28 ™ UV-curable resin (perfluorinated acrylate monomers mixed with UV photo-initiator) or ZPU resin series manufactured by Chemoptics. For example, NIP-K28 ™, which excludes UV photo-initiator, may be a resin mixed with a thermal initiator. The resins can adjust the refractive index within the range of about 1.4 ~ 1.5.

4 is a flowchart illustrating a method of manufacturing an anti-reflection film of a solar cell according to another embodiment of the present invention.

Referring to Figure 4, the anti-reflection film manufacturing method of the solar cell according to another embodiment of the present invention is a polymer mold manufacturing step (S410), the anti-stick film forming step (S420), the resin drop step (S430), the nano-pattern forming step (S440), the resin etching step (S450) by O ₂ RIE and the substrate etching step (S460) by dry etching is made.

In the polymer mold manufacturing step (S410), the thermoplastic polymer film 20 is stamped with the template 10 having the nanopattern formed thereon to form an opposite pattern on the surface of the thermoplastic polymer film 20, and then the template 10 is separated. In the anti-adhesion film forming step (S420), an anti-adhesion film 30 is formed on the surface of the thermoplastic polymer film 20. In the resin drop step (S430), the resin 50 in a molten state is dropped onto the surface of the substrate 40 on which the nanopattern is to be formed. In the nanopattern forming step (S440), the resin 50 is cured while the thermoplastic polymer film 20 is pressed so that the resin 50 is filled in the opposite pattern on the surface of the thermoplastic polymer film 20, and then the thermoplastic polymer film Remove (20). The polymer mold manufacturing step (S410) to the nanopattern forming step (S440) is the same as in FIG.

FIG. 5 illustrates a resin etching step (S450) by O ₂ RIE and a substrate etching step (S460) by dry etching for manufacturing an anti-reflection film.

Referring to FIG. 5, in the present embodiment, an antireflection film is manufactured by directly patterning a nanopattern on a substrate, unlike in FIG. 3.

The resin etching step (S450) by O ₂ RIE and etching the resin 50 is cured by using a reactive ion etching (RIE) of the O ₂ gas to the reaction gas. Etching is performed until a portion of the surface of the substrate 40 is exposed, that is, until the resin portion A having a relatively thin thickness is removed. In this case, the thickness of the resin to be etched is determined by the distance between the surface of the thermoplastic polymer film 20 and the surface of the substrate 40 when pressed in the nanopattern forming step (S440), and may be about 10 nm. have.

In the substrate etching step (S460) by dry etching, the substrate 40 is etched by using dry etching until the resin 50 is removed. Resin etching step (S450) of the resin by the O ₂ RIE portion (B) where the resin is not present in the substrate 40, the substrate 40 is etched, the resin 50 is present in the substrate 40 Since the portion C is to be etched the resin 50, when the resin 50 is completely removed from the substrate 40, the same nano-pattern as the pattern of the resin is formed on the substrate 40.

In the present embodiment, since the substrate is directly patterned, there is no restriction on the refractive index of the resin, and thus the resin has a wider selection range.

6 is a flowchart illustrating a method of manufacturing an anti-reflection film of a solar cell according to another embodiment of the present invention.

Referring to FIG. 6, the method of manufacturing an anti-reflection film of a solar cell according to another embodiment of the present invention includes a template preparation step (S610), a nanopattern forming step (S620), and a template separation step (S630).

FIG. 7 illustrates each step of FIG. 6, hereinafter with reference to FIG. 7. In addition, since the substrate of this step is a thermoplastic polymer substrate, and its properties are not different from those of the thermoplastic polymer film shown in Fig. 2, the same reference numerals are used.

In the template preparing step (S610), the template 10 having the opposite pattern of the nanopattern to be formed on the thermoplastic polymer substrate 20 is prepared.

In the nanopattern forming step (S620), the thermoplastic polymer substrate 20 is stamped with the template 10 to form a nanopattern on the surface of the thermoplastic polymer substrate 20.

In the template separation step (S630), the template 10 is separated from the thermoplastic polymer substrate 20.

At this time, the nano-pattern forming step (S620) is heated to a temperature higher than the glass temperature (Tg) of the thermoplastic polymer substrate 20, and the process of template separation (S630) is a glass temperature (of the thermoplastic polymer substrate 20) The process proceeds by cooling to a temperature lower than Tg).

The template 10 is a material resistant to heat and pressure, and may be a material such as SiC, SiO ₂ , Si ₃ N ₄ , Al ₂ O ₃ , MgO, Si, Ni, etc. It is preferred that the graphite is coated.

Preferably, the thermoplastic polymer substrate 20 is made of a transparent and heat resistant material, and the thermoplastic polymer substrate 20 is made of ethylene vinyl acetate (EVA), polyethylene, polypropylene, polyolefin, polyvinyl chloride (PVC), and polymethyl meta. Any of methacrylate, poly methyl acrylate, polystyrene, nitrocellulose, acetylcellulose, polycarbonate, polyethylene terephthalate, ABS resin, polyamide, polyimide, polyether sulfone, polyvinyl acetal, polyether ketone and polyurethane Or two or more materials.

In this embodiment, the anti-reflection film is manufactured by directly forming a nanopattern on the substrate 40 by applying an embossing method. Therefore, since the substrate used in the present embodiment is a transparent, heat resistant thermoplastic polymer substrate, the antireflection film may be directly formed on an EVA film or the like used as a protective layer during the solar cell modularization process.

8A and 8B are SEM photographs showing the results of hot embossing of a PVC film. In FIG. 8A, the template used a nickel (Ni) template. PVC film hot embossing of Figure 8a and 8b may be applied to the polymer mold manufacturing step (S110) of Figure 1, the nanopattern forming step (S620) of Figure 6 and the like. Referring to FIG. 8B, as a result of hot embossing of the PVC film, it can be seen that very regular nanopatterns having a pattern width of approximately 100 nm and a pattern pitch of approximately 250 nm can be formed precisely.

9 is a graph comparing light transmittance according to the presence or absence of a nanopattern of the antireflection film. Referring to FIG. 9, it can be seen that a nanopattern, ie, a moth-eye structure, is formed on the antireflection film to have a higher light transmittance at a broader wavelength band than otherwise. As a result, the light transmission efficiency of the solar cell is increased. It can be seen that the improvement is 6-7%.

The nanopattern for forming the anti-reflection film may be formed on both sides as well as the case on which one side of the substrate is formed. In this case, since light transmission is performed at both sides of the substrate, the light transmission efficiency can be further increased. 10 illustrates light transmittance when nano patterns are formed on both sides of a PVC substrate. Referring to FIG. 10, the light transmittance is higher when the nanopattern is formed than when the nanopattern is not formed on the PVC substrate, and the nanopattern is formed on both sides of the PVC substrate than when the nanopattern is formed on only one side of the PVC substrate. It can be seen that the light transmittance is high when this is formed.

As described above, the method for manufacturing an anti-reflection film of a solar cell according to the present invention includes a simple imprint method (FIGS. 1 and 3), an imprint method and an etching method (FIGS. 4 and 5), and an embossing method (FIGS. 6 and 7). The nanopattern can be formed on the surface of the solar cell or the protective layer. Therefore, the anti-reflection film manufactured using the method as described above may reduce the reflection of light on the surface of the solar cell through the nanopattern, thereby increasing the light transmission efficiency of the solar cell.

Although the above has been described with reference to one embodiment of the present invention, various changes and modifications can be made at the level of those skilled in the art. Such changes and modifications may belong to the present invention without departing from the scope of the present invention. Therefore, the scope of the present invention will be determined by the claims described below.

1 is a flowchart illustrating a method of manufacturing an anti-reflection film of a solar cell according to an embodiment of the present invention.

FIG. 2 illustrates a polymer mold manufacturing step of FIG. 1.

FIG. 3 illustrates a resin drop step and a nanopattern forming step of FIG. 1.

4 is a flowchart illustrating a method of manufacturing an anti-reflection film of a solar cell according to another embodiment of the present invention.

FIG. 5 illustrates a resin etching step by O ₂ RIE and a substrate etching step by dry etching of FIG. 4.

6 is a flowchart illustrating a method of manufacturing an anti-reflection film of a solar cell according to another embodiment of the present invention.

FIG. 7 illustrates each step of FIG. 6.

8A and 8B are SEM photographs showing the results of hot embossing of a PVC film.

9 is a graph comparing light transmittance according to the presence or absence of a nanopattern of the antireflection film.

10 illustrates light transmittance when a nanopattern is formed on a PVC substrate.

Claims (18)

(a) forming a reverse pattern on the surface of the thermoplastic polymer film by stamping the thermoplastic polymer film with a template on which a nanopattern is formed, and then separating the template; (b) forming an anti-adhesion film on the surface of the thermoplastic polymer film; (c) dropping a resin in a molten state having a refractive index of 80 to 120% of the refractive index of the material forming the substrate on the surface of the substrate on which the nano pattern is to be formed; And (d) forming the nanopattern on the surface of the substrate by curing the resin in a state in which the thermoplastic polymer film is pressed to fill the resin inside the opposite pattern of the surface of the thermoplastic polymer film, and then, the thermoplastic polymer film Method for producing an anti-reflection film of a solar cell comprising the step of separating. (a) forming a reverse pattern on the surface of the thermoplastic polymer film by stamping the thermoplastic polymer film with a template on which the nanopattern is formed, and then separating the template; (b) forming an anti-adhesion film on the surface of the thermoplastic polymer film; (c) dropping the resin in the molten state on the surface of the substrate on which the nano pattern is to be formed; (d) curing the resin in a state in which the thermoplastic polymer film is pressed to fill the resin inside the opposite pattern of the surface of the thermoplastic polymer film, and then separating the thermoplastic polymer film; (e) etching the resin until the surface of the substrate is exposed using reactive ion etching (RIE) using O ₂ gas as a reaction gas; And (f) etching the substrate until the resin is removed using dry etching to form a nanopattern on the surface of the solar cell. The method according to claim 1 or 2, The anti-reflection film manufacturing method of the solar cell, characterized in that to form the nano-pattern on both sides of the substrate. The method of claim 1 or 2, wherein step (a) comprises: (a1) preparing the template on the thermoplastic polymer film; (a2) stamping at a temperature higher than the glass temperature (Tg) of the thermoplastic polymer film; And (A3) The method of manufacturing an anti-reflection film of a solar cell comprising the step of separating the template at a temperature lower than the glass temperature (Tg) of the thermoplastic polymer film. The method of claim 1 or 2, wherein step (b) After forming a SiO ₂ layer having a thickness of about 5-20 nm on the surface of the thermoplastic polymer film, (heptadecafluoro-1,1,2,2-tetra-hydrodecyl) trichlorosilane or Cl ₃ Si (C ₂ H) on the SiO ₂ layer ₄ ) A method for manufacturing an anti-reflection film of a solar cell, characterized in that the coating of any one material of C ₈ F ₁₇ SAM (Self Assembled Monolayer). The method of claim 1 or 2, wherein the thermoplastic polymer film Ethylene vinyl acetate (EVA), polyethylene, polypropylene, polyolefin, polyvinyl chloride (PVC), poly methyl methacrylate, poly methyl acrylate, polystyrene, nitrocellulose, acetyl cellulose, polycarbonate, polyethylene terephthalate, ABS resin Method of manufacturing an anti-reflection film of a solar cell, characterized in that made of at least one of polyamide, polyimide, polyether sulfone, polyvinyl acetal, polyether ketone and polyurethane. The method of claim 1 or 2, wherein the substrate Method for producing an anti-reflection film of a solar cell, characterized in that made of any one of silicon, glass and ethylene vinyl acetate (EVA). The method of claim 1 or 2, wherein the resin is Method for producing an antireflection film of a solar cell, characterized in that the heat-curable or UV-curable resin. The method of claim 1 or 2, wherein the template Method for producing an anti-reflection film of a solar cell, characterized in that the material of any one of SiC, SiO ₂ , Si ₃ N ₄ , Al ₂ O ₃ , MgO, Si and Ni. The method of claim 1 or 2, wherein the template Method for producing an anti-reflection film of a solar cell, characterized in that the graphite (Graphite) is coated on the surface. (a) preparing a template on which the opposite pattern of the nanopattern to be formed is formed on the thermoplastic polymer substrate; (b) forming a nanopattern on the surface of the thermoplastic polymer substrate by stamping the thermoplastic polymer substrate with the template; And (C) a method of manufacturing an anti-reflection film of a solar cell comprising the step of separating the template. The method of claim 11, The anti-reflection film manufacturing method of the solar cell, characterized in that to form the nano-pattern on both sides of the thermoplastic polymer substrate. The method of claim 11, The step (b) is made at a temperature higher than the glass temperature (Tg) of the thermoplastic polymer substrate, Step (c) is a method of manufacturing an anti-reflection film of a solar cell, characterized in that at a temperature lower than the glass temperature (Tg) of the thermoplastic polymer substrate. The method of claim 11, wherein the template is Method for producing an anti-reflection film of a solar cell, characterized in that the material of any one of SiC, SiO ₂ , Si ₃ N ₄ , Al ₂ O ₃ , MgO, Si and Ni. The method of claim 11, wherein the thermoplastic polymer substrate Ethylene vinyl acetate (EVA), polyethylene, polypropylene, polyolefin, polyvinyl chloride (PVC), poly methyl methacrylate, poly methyl acrylate, polystyrene, nitrocellulose, acetyl cellulose, polycarbonate, polyethylene terephthalate, ABS resin Method for producing an anti-reflection film of a solar cell, characterized in that made of at least one of polyamide, polyimide, poly ether sulfone, polyvinyl acetal, poly ether ketone and polyurethane. The method of claim 11, wherein the template is Method for producing an anti-reflection film of a solar cell, characterized in that the surface is coated with graphite. The solar cell in which the antireflection film manufactured using the manufacturing method in any one of Claims 1, 2, and 11 is formed in the surface. The solar cell in which the antireflection film manufactured using the manufacturing method in any one of Claims 1, 2, and 11 is formed in a protective layer.

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