KR20090110795A - Area decontamination via low-level concentration of germicidal agent - Google Patents

Abstract

PURPOSE: A method for decontaminating local areas using a low-level concentration of a germicidal agent is provided to contact local microorganisms with the germicidal agent. CONSTITUTION: A method for decontaminating local areas using a low-level concentration of a germicidal agent(240) comprises the following steps of: emitting the germicidal agent from a sterilizing source(210) to a local area; controlling the concentration of the germicidal agent not to exceed an allowable limit value; and contacting local microorganisms with the germicidal agent. In the emitting step, the germicidal agent is emitted as a form of gas, steam, mist, or their mixture. The germicidal agent is selected from the group consisting of hydrogen peroxide and ozone.

Description

Area decontamination via low-level concentration of germicidal agent

The present invention relates to a method and apparatus for local contaminant purification through low concentrations of fungicides.

The action of microorganisms to contaminate the surrounding surfaces of areas such as hospital rooms is well known. Thus, workers in facilities related to health and well-being have strict prescriptions to reduce or eliminate environmental contamination to prevent the spread of microorganisms from the surfaces to guests, patients or members. The main agent through which microorganisms spread from the surface of the environment to the patient or workers is the hand of the patient or worker. Thus, standard environmental purification is mostly associated with high-touch surfaces, i.e. bed rails and low-touch surfaces, ie floors and ceilings.

Standard procedures for dealing with local contamination include measures such as dusting, vacuuming, cleaning and wiping target areas with or without disinfectant. Surfaces with high contact are typically sterilized using chemicals that are wiped or sprayed, and wiped off after a suitable contact time has elapsed to ensure bactericidal action. Surfaces with many of these contacts are numerous and complex manifolds, so if all surfaces are properly handled, they are likely to fail. Due to the toxicity of the antiseptic drugs, these prescriptions are usually made, for example, during patient residence in the room and between surgical procedures in the operating room. Although medical personnel are very careful to deal with the problem of contamination, it is not difficult to find residual contaminants after cleaning. Another alternative of these treatment methods is to perform local contaminant purification with disinfecting vapors or disinfectant mist agents, where the areas are vacuumed and closed or sealed and then disinfected vapors or disinfect mist agents for a period of time. These procedures require attention to service during the time periods covered by these areas, but it is necessary to ensure disinfection of all exposed surfaces of the treated area.

Inadequate or incomplete cleaning and disinfection operations allow the possibility of the transmission of infectious microorganisms from the surrounding surface to the patient or workers, but downtime the facility to address the contamination problem sufficiently is costly and inefficient. .

Thus, there is a need for pollution cleaning measures that go beyond existing standard procedures for the treatment of biological contamination of various facilities.

In order to solve the problem of the present invention, there is provided a local pollution purification method and related apparatus. The method includes the steps of releasing a fungicide from the sterilization source into the area, controlling the concentration of the fungicide in the area to a predetermined concentration that does not exceed an acceptable exposure limit, and contacting the microorganism in the area with a fungicide to remove the area. Purifying the soil. The apparatus includes a release mechanism configured to release the sterilant at a predetermined concentration from the sterilization source so that the predetermined concentration of the sterilant in the region does not exceed an acceptable exposure limit.

In accordance with the present invention, local pollution purification methods and related apparatuses meet the need for pollution cleaning measures that go beyond existing standard procedures for the treatment of biological contamination of various facilities.

Embodiments of the present invention provide an apparatus and associated method for contaminating microorganisms with low concentrations of fungicides that do not require local attention to service. Therefore, areas such as sickrooms can be used continuously or almost continuously during pollution purification.

Unless otherwise specified or otherwise indicated, all numerical ranges, amounts, values, and ratios, such as the amount of material, time and reaction temperature, ratio of amounts, and others, described in the following sections of this specification, although the term "about" Even if not expressed in amount or range, it may be read as described at the beginning of the word "about." Thus, unless stated to the contrary, the numerical variables set forth in the following specification and claims are approximations that may vary depending upon the desired properties obtained by the present invention. Unless at least not an attempt is made to limit the application of the principles equivalent to the scope of the claims, each numerical variable should be interpreted at least in terms of the reported critical numerical values by applying universal rounding techniques.

While the numerical ranges and variables setting forth the broad scope of the invention are approximations, the numerical values set forth in the specific examples are described as precisely as possible. However, any numerical value may inherently accommodate any error that inevitably arises from the standard deviation identified in each test measurement. In addition, when describing herein a numerical range of varying categories, it can be expected that any combination of the above values, including the stated values, may be used. As used herein, the term "one" and the like is intended to include "at least one" or "one or more" unless stated otherwise.

Any patent publication or other published material, which is incorporated herein by reference in whole or in part, is incorporated herein to the extent that the integrating material does not conflict with existing regulations, descriptions or other published materials described herein. As such and to the extent necessary, the disclosures explicitly set forth herein replace any conflicting material incorporated herein by reference. While incorporated herein by reference, any material or portion thereof that is referred to as conflicting with existing regulations, descriptions, or other published materials described herein, is incorporated only to the extent that there is no conflict between the integrating material and the reference disclosure material. .

Embodiments of the present disclosure provide a method and apparatus for purifying pollution in a region. The method includes the steps of releasing a fungicide from the sterilization source into the area, controlling the concentration of the fungicide in the area to a predetermined concentration that does not exceed an acceptable exposure limit, and contacting the microorganism in the area with a fungicide to remove the area. Purifying the soil.

The area may be the air and / or surfaces of any room or facility known to those skilled in the art, which wants and / or needs microorganisms to multiply and thrive and maintain hygiene. For example, areas contemplated by the present application may include animals such as offices, homes, hospital facilities, hospital rooms, intensive care units, ambulances, operating rooms, airports, gym facilities, restaurants, rest rooms, laboratories, animal kennels, animal hospitals or animal shelters. Facilities and combinations thereof. The area may be closed or semi-closed in position and the door or window may be slightly open or partially open.

The fungicide can be released into the area from a sterilization source in the form of a gas, vapor, fog or any combination thereof. As used herein, the term "gas" is defined as a particulate state in which molecules are not condensed into a liquid or solid at the general state, that is, at standard temperature and pressure conditions. The term "vapor" is defined as the air dispersion of molecules of matter that are present as a liquid or a solid under normal conditions, ie, standard temperature and pressure. As used herein, the term "mist" refers to a small drop of liquid. As used herein, the term "fog" is used in its generic sense to include droplets of any form suspended in a gaseous composition including aerosol, fog, and the like.

The fungicides are suitable for reducing, eliminating or attenuating microorganisms on the surface of the air and / or the area and may be released into the area at a concentration such that humans or animals can be exposed to long term and safe. Microorganisms contemplated herein for contaminant purification include several infectious agents such as viruses, vegetable bacteria, fungi, mycobacterium, bacterial seeds and combinations thereof, in particular, for example, methicillin-resistant Staphylococcus Aureus [Methicillin-resistant Staphylococcus aureus (MRSA)], Vancomycin-resistant enterococcus (VRE), Norovirus, S. a. S. aureus, C. C. difficile, and the like.

The fungicide can be, for example, hydrogen peroxide or ozone. When hydrogen peroxide is used, the sterilization source may be, for example, a liquid hydrogen peroxide solution or a solid peroxide complex. The liquid hydrogen peroxide solution can be, for example, a H ₂ O / H ₂ O ₂ solution. In certain embodiments, the hydrogen peroxide solutions contain 30% water per weight, in some embodiments 60% water by weight, and in other embodiments no more than 90% water by weight. In some embodiments, the hydrogen peroxide solutions can be used to generate a substantial non-liquid (ie, anhydrous) source of hydrogen peroxide gas, vapor and / or mist that is treated during vaporization to remove water, such as in a vacuum. Thus, in any embodiment where liquid hydrogen peroxide is used, the aqueous complex may be used during the process, as described in US Pat. Nos. 5,667,753, 5,674,450 and 5,785,934, which are incorporated herein by reference in their entirety. It can be converted into a substantial non-liquid hydrogen peroxide fungicide. As described herein, the sterilization source may be heated to facilitate release of the sterilant.

Solid hydrogen peroxide composites have the advantage of not substantially releasing water into the atmosphere by peroxides. A substantially non-liquid (ie, substantially anhydrous) source of hydrogen peroxide generally emits a substantially non-liquid hydrogen peroxide gas or vapor. In one embodiment, the substantially non-liquid hydrogen peroxide vapor is prepared directly from the substantially non-liquid hydrogen peroxide composite. Several solid peroxide composites are also contemplated herein. In one embodiment, for example, the fungicide is hydrogen peroxide released from the urea hydrogen peroxide complex. The urea hydrogen peroxide complex is in the form of a tablet from Fluka chemical Corp., Ronkonkoma, NY, Ronkonkoma, NY, and a powder form of Aldrich Chemical Co., Milwaukee, Wis, Bis Milbauke. to be. This complex is known as urea peroxide, hydrogen peroxide urea complex, peroxide urea, peroxide urea adduct, urea peroxide adduct, percarbamide, carbamide perhydrate, carbamide peroxide. The term "urea peroxide" as used herein encompasses all foreign terms. Several other hydrogen peroxide complexes can be used herein. For example, suitable hydrogen peroxide complexes contemplated herein include poly (vinyl alcohol) -hydrogen peroxide complexes, poly (vinyl methyl ether) -hydrogen peroxide complexes, poly (vinyl methyl ketone) -hydrogen peroxide complexes, poly (acrylic acid) -hydrogen peroxide complexes, poly (Vinyl acetate) -hydrogen peroxide complex, cellulose acetate hydrogen peroxide complex, sodium alginate hydrogen peroxide complex, cellulose sulfate, sodium salt, hydrogen peroxide complex, glycine-hydrogen peroxide complex, poly (4-vinylpyridine) hydrogen peroxide complex, histamine Hydrogen peroxide complex, propionamide hydrogen peroxide complex, 1,3-dimethyluria hydrogen peroxide complex, biuret hydrogen peroxide complex, polyacrylamide hydrogen peroxide complex, nylon 6 hydrogen peroxide complex, nylon 6,6 film hydrogen peroxide complex And a copolymer, a polyether polyurethane, rubidium carbonate hydrogen peroxide complex and the peroxide complex. When excess hydrogen peroxide complex is used, some water may be provided to the system. Some water may be obtained upon decomposition of hydrogen peroxide, thus forming oxygen with water when some byproduct of the water and some hydrogen bonds to the complex occur.

Other hydrogen peroxide solutions or complexes suitable for use herein are the complexes described in US Pat. Nos. 5,667,753 and 5,785,934.

When the fungicide is ozone, the sterilization source is oxygen. In some embodiments, oxygen may be supplied by air, pure oxygen sources, or combinations thereof.

When the fungicide is released into the area, the fungicide can be controlled at any suitable concentration to which humans or animals can be exposed to long term. Typically, the concentration of the fungicide is controlled to a predetermined level which does not exceed the "low concentration level" or "acceptable exposure threshold" in the region. As used herein, "permissible exposure limit (PEL)" refers to the legal limit for the concentration or amount of substances in the air that are given by government or national health authorities. For example, the Occupational Safety & Health Administration (OSHA) defines "permissible exposure limits (PELs)" to protect workers from the effects of exposure to hazardous substances. For hydrogen peroxide, the acceptable exposure limit value (PEL) specified by the Occupational Safety and Health Department is 1.0 ppm. In the same way, the acceptable exposure limit (PEL) specified by the Occupational Safety and Health Administration for ozone is 0.1 ppm. Legal regulations in other countries may have different acceptable exposure limits (PELs).

Thus, in any other embodiment of the present application, it is possible to control the disinfectant released in the region at various predetermined concentrations which are not greater than the given acceptable exposure limit value PEL. In other embodiments, the predetermined concentration is not greater than half of the acceptable exposure limit value PEL. In yet another embodiment, the predetermined concentration is not greater than 1/3 of the acceptable exposure limit value PEL. For example, in some embodiments and with respect to the Department of Occupational Safety and Health (PEL) for 1.0 ppm hydrogen peroxide, the fungicide may be controllably released at 1.0 ppm or less, and in other embodiments, It may be controllably released at 0.75 ppm or less, yet may be controllably released at 0.5 ppm or less in another embodiment, and in another embodiment, may be controllably released at 0.3 ppm or less. If the fungicide is ozone with an acceptable exposure limit (PEL) of 0.1 ppm, the ozone may be controllably released at 0.1 ppm or less, and in some embodiments, controllable release at 0.05 ppm or less Can be. In some embodiments, the concentration level is controlled and / or maintained during standard operation of the device (ie, between times known as "start" and "stop").

Fungicides may be released into the area at various frequencies to allow concentration control at sustained levels. For example, it is expected that the release of fungicides into the area may be in the form of continuous, intermittent, periodic or combinations thereof. The continuous and controlled release of the disinfectant enables the manual and substantially unsupervised operation of the pollutant purification apparatus. In another embodiment, the release of the fungicide is intermittent or periodic. It is expected that intermittent or periodic release of the biocide may consist of several stages of contaminant purification, such as after a low concentration level of the biocide is reached after a predetermined set point. As described in further detail herein, controlling the low level of fungicide concentration in the area to a predetermined concentration may be implemented in a number of ways, such as by placing an optional sensor and monitor in the area. In this way, the discharge can be temporarily stopped by the dispensing mechanism, such as a fan or blower of the device, and / or a sensor device and / or programmable monitor capable of temporarily delaying the release of the disinfectant, such as by turning off the power supply means such as a heater. Can be interrupted for a period of time based on feedback control. Intermittent or periodic release can be based on several setting points described herein that can be incorporated into the device. In addition, the duty cycle can also be varied. For example, rather than continuous exposure, release may be limited to hours per day, days per week, or days. For example, release can be performed only 8 hours per day, for example only late at night in a break room, to minimize human exposure.

The various setting points are for example running time (on time, off time or on / off time), speed (emissions per hour), fungicide concentration and / or area size or condition (area in sealed / closed and vacuum state) and its Incorporating into a device that provides for the selection of a combination state, the fungicide can be controllably released at any low concentration level. In this way, the operator can select one or more operating settings of the device that control the release of the sterilizer into the area. Several setting points make the device more convenient to operate in a region that can command adjustment of operating conditions.

In certain embodiments, it is contemplated that contaminant purification methods may be used that control the fungicide concentration above and below the acceptable exposure limit value PEL. For example, in one embodiment, the method for contaminating a region controls the concentration of the disinfectant in the region to a predetermined level of standard operation that does not exceed an acceptable exposure limit, and then the region for strong contaminants for a time period. Increasing the concentration of the fungicide to a level above the acceptable exposure limit. Thus, the device is configured to release a predetermined concentration of fungicide in the area that may exceed the allowable exposure limit for a short period of time for robust contamination, without exceeding the allowable exposure limit in normal operation. Can be. As used herein, the term "standard operation" is defined as the time at which the area is occupied by humans and / or animals and used for planned and designated purposes. Standard operations can be executed, for example, during normal business hours. The term "acute decontamination" is defined as the decontamination by a fungicide at a concentration that greatly exceeds the acceptable exposure limit for a short period of time. For example, when hydrogen peroxide is used as bactericide, strong contaminant purification is typically performed at levels ranging from 30 to 1500 ppm up to 6-8 hours. During times when the area is not in standard operation, the area may be contaminated by a fungicide with a concentration above the acceptable exposure limit. In this way, pollution purification of the area can be done more efficiently during time periods outside of normal business hours, or when the area is not in use, such as between weekend nights, closing of holidays, and the like.

1 shows schematically a device 100 in the form of a humidifier for decontaminating area 150. The apparatus 100 includes a sterilization source 110 located within the housing 120 and a release mechanism 130 in communication with the housing 120. The release mechanism 130 transfers a predetermined concentration of sterilizer 140 from the sterilant source 110 to the region 150 such that the predetermined concentration of the sterilizer 140 in the region 150 does not exceed the acceptable exposure limit. Configured to emit.

The housing 120 may include a support 122 for holding the sterilant source 110 when the sterilant source 110 is hydrogen peroxide, and may be, for example, a tank, plate or pan. As shown, the housing 120 may comprise a metal support such as, for example, a fan, ie an aluminum pan. Sterilizer 140 may be manufactured from sterilizer source 110 in the form of gas, vapor and / or mist by various mechanisms such as gas generators, fog generators, humidifiers (shown), heaters, and combinations thereof. In general, as used herein, a “release mechanism” can be any device or mechanism that allows or assists a fungicide to traverse from the source of the fungicide to the area. For example, the release mechanism 130 may include a gas permeable screen or cloth that allows disinfectant to diffuse into the area 150. In some embodiments, the release mechanism 130 may incorporate a fan or blower to assist in the diffusion of the sterilant 140 over the area 150. In small areas or when the device 100 is incorporated into an existing air purifying system, such as the HVAC system described below, a fan or blower may not be needed. The release mechanism 130 may also include a flow controller, such as a controller commercially available from Bronchost high-tech V. V., Netherlands. As used herein, a flow controller is a device or material that controls the release of sterilant 140 into area 150 by its composition, geometry, or mechanical action.

Controlling the low concentrations of the sterilant 140 in the region 150 to a predetermined concentration may be performed by several methods, such as by placing one or more optional sensors 160 in the region 150. A feedback control mechanism, for example in a flow controller, for example configured to provide programmatically monitoring the concentration level of fungicide 140 in the zone 150 and to control the release and concentration of the fungicide in the zone 150. In order to provide the optional sensor 160 may be located in the housing 120 or remotely in the region 150. Release of the bactericide 140 may be continuous, intermittent and / or periodic as described herein. The release frequency of the sterilizer 140 may be based on several set points selected from the set point controller 170. Set points are programmable or manual and may include, for example, running time, bactericide concentration, area size, and combinations thereof. The number of sensors 160 used and their orientation may vary depending on the desired uniformity of the sterilant concentration over region 150. Depending on factors such as the location and configuration of the device 100 within the area 150, the release mechanism 130 may further increase the uniformity of the sterilant 140, or more particularly at selected locations based on sensor feedback control. In order to provide a high or low concentration of sterilizer 140, for example, multiple flow controllers may be controlled independently such that one or more flow controllers directed to any rooms of the facility or to any location in the area may be of a different amount. It can be envisaged that it can be configured to be operable to release sterilant 140 or can be controlled by a microprocessor.

As shown, the device 100 may include other optional forms such as, for example, the life indicator 180 to indicate when the amount of the disinfectant source 110 of the housing 120 is consumed. have. The horizontal indicator may be a hydrogen peroxide detector of the remote sensor, a sensor of the liquid level.

2 schematically shows a device 180 in the form of an ozone generator connected to a conventional HAVC system 185 for pollution purification of a zone 190. The device 180 includes a housing 182 and a release mechanism 184 in fluid communication with the housing 182. The release mechanism 184 is configured to release the sterilizer to a predetermined concentration of the region 190 such that the predetermined concentration of the sterilant of the region 190 does not exceed the acceptable exposure limit value PEL. When the fungicide is ozone, the release mechanism 184 may include an ozone generating device 186 such as, for example, an ultraviolet emission source, such as a UV lamp, an arc discharge, a corona discharge. For example, ozone gas within certain controlled concentrations described herein can be produced using a corona discharge generator. In one embodiment, the corona discharge generator may comprise a sealed glass tube filled with gas. The electrical conductor rod, which at one end passes through the glass tube, can extend over the entire length of the tube. Since the perforated metal grid surrounds the tube, corona is expressed between the glass tube and the grid when a high voltage is applied across the conductor rod and the grid. Oxygen passing through the corona is ionized to produce ozone. Ozone produced by corona may diffuse into the area by an optional fan or blower and / or by ion wind produced by the corona. Ozone concentration may be controlled using sensors and programmable monitors, as described herein, to control concentrations not greater than the allowable exposure limit value (PEL) range described herein. In any of the examples herein, the relative humidity level is maintained at 20% or higher and in some embodiments, at a level level in the range of 70% to 90%. Humidity can be controlled by humidification and humidity sensors.

In some embodiments, the pressurized and / or heated air may be supplied to the device 180 by the existing HAVC system 185 through the existing ventilation system 188. Thus, in some embodiments, if desired, a separate heating and distribution system may be provided by existing HAVC system 185. The device 180 may be configured to release a disinfectant such as ozone into the region 190 in the form of ozone gas.

As described herein, the ozone gas concentration is at a low level in the region 190 through the use of optional sensors 192 that provide a feedback control mechanism to control the release of ozone gas in the region 190. It can be controlled to a predetermined concentration. Emitting ozone gas may be continuous, intermittent and / or periodic by the controller 194 of the set point, in the manner described herein.

3 schematically illustrates a device 200 in the form of a walled disposable or reusable system for contaminating area 250. Device 200 includes a release mechanism 230 in fluid communication with housing 20 and a disinfectant source located within housing 220. The release mechanism 230 displaces the predetermined concentration of the sterilizer 240 from the sterilant source 210 so that the predetermined concentration of the disinfectant 240 in the region 250 does not exceed the acceptable exposure limit value PEL. It is configured to emit.

The housing 220 includes a support 222 for holding the sterilant source 210 when the sterilant source 210 is a solid peroxide composite or a liquid hydrogen peroxide solution, and may be, for example, a tank, plate or pan. As shown, the housing 220 may, for example, optional heater 290 and a fan, i.e. aluminum, to heat the sterilant source 210 to release the sterilant in the form of gas, vapor and / or mist. It may include a metal support, such as a fan. When the optional heater 290 is used, a temperature monitor, such as a thermometer, may be in communication with the housing 220 to monitor and control the temperature of the support. The sterilant source 210 may be disposed on or directly on the support 222. Alternatively and optionally, if the sterilant source is a solid peroxide composite, the peroxide composite may be disposed between one or more aluminum screens (not shown) disposed on top of the support 222 to heat the solid peroxide composite. have. Peroxide composites are such as layers of SPUNGUARD commercially available from Kimberly Clark Co., Dallas, Texas, or medical grade tea bags (TYVEK) commercially available from Devon de Nemury and Co., of Wilmington, Germany. Because it may be covered with a gas permeable layer, the sterilant 240 released from the sterilant source 210 may pass through the cover before being diffused into the area 250 by the release mechanism 230.

As described herein, the concentration of the sterilizer 240 may be controlled by using optional sensors 260 to provide a feedback control mechanism to control the release of the sterilizer 240, as described herein. The low concentration level of 250 is controlled to a predetermined concentration. Release of the sterilant 240 may be performed continuously, intermittently and / or periodically by the set point controller 270, in the manner described herein. As shown, the device 200 may have other optional forms, such as the life indicator 280.

As shown, the device 200 can include an insulating housing (not shown), the terminal portions 226, 228 of the standard wall mounting plug 224 extend from the insulating housing, and the standard wall mounting plug It may be plugged into a mating socket of a wall outlet, such as a standard bolt wall outlet 120. Plugging the device 200 into the coupling socket of the power supply activates the power supply to heat the sterilant source 210 and release the sterilizer 240. In some embodiments, the voltage of the device is only applied when the device 200 is plugged into the power supply. If desired, device 200 may be locked in place by suitable positioning screws or fixtures. In other embodiments of the present disclosure, the device may be battery operated. It is contemplated that the device 200 is reusable such that when the disinfectant source 210 is consumed, the support 222, such as a replacement cartridge form, can be removed and replaced. Alternatively, device 200 may be a disposable device that is disposed of when disinfectant source 210 is consumed.

4 schematically illustrates a device 300 in the form of a room unit connected to a conventional HVAC system 305 for purifying an area 350 such as a single room. The device 300 includes a disinfectant source 310 disposed within the housing 320 and a release mechanism 330 in communication with the housing 320. The release mechanism 330 removes the concentration of sterilizer 340 from the sterilant source 310 so that the predetermined concentration of the sterilizer 350 in the region 350 does not exceed the acceptable exposure limit value PEL. It is configured to be discharged inward.

Housing 320 is for maintaining a sterilant source 310, which may be an optional heater 390, liquid hydrogen peroxide solution or solid peroxide composite described herein to heat an ozone generating device or sterilant source, such as the device described herein. It may include a support 322. The support 322 may include a gas permeable enclosure for packaging the sterilant source 310. In some embodiments, the pressurized and / or heated air may be supplied to the apparatus 300 by the existing HVAC system 305 through an existing ventilation system. Thus, in any embodiment, separate heating and distribution systems may be provided by existing HVAC system 305, if desired. As shown, the housing 320 can include multiple controllable openings 324 to discharge gas, vapor and / or misty disinfectants into the area 350 and to direct air flow. Thus, the release mechanism 330 may include, for example, pressurized air and openings 324 of the HVAC system 305.

As described herein, feedback control to control the release of sterilant 340, such as flow controllers, configured to control the concentration of the sterilant 340 in the area 350 and the release of the sterilant through the opening 324. Through the use of optional sensors 360 that provide a mechanism, the concentration of the sterilant 340 can be controlled to a predetermined concentration at low levels in the area 350. The release of the sterilant 340 may be continuous, intermittent and / or periodic by a set point controller (not shown) in the manner described herein.

FIG. 5 schematically illustrates one or more devices 400, 500 in the form of a multi-room unit connected to a conventional HVAC system 405 to contaminate one or more zones 450. Device 400 includes a disinfectant source 410 located within housing 420 and a release mechanism 430 in communication with housing 420. The release mechanism 430 displaces the desired concentration of the disinfectant 440 from the disinfectant source 410 to the region 450 so that the predetermined concentration of the disinfectant 440 in the region 450 does not exceed the acceptable exposure limit value PEL. Is configured to release).

Housing 420 is for maintaining a sterilizer source 410, which may be an optional heater 490, liquid hydrogen peroxide solution, or a solid peroxide composite described herein to heat an ozone generating device or sterilant source, such as the device described herein. It may include a support 422. As shown, the release mechanism 430 may release the sterilant 440 in the form of gas, vapor, and / or mist into the area 450. The heated and compressed air can be supplied by existing HVAC system 405, as described herein, if desired.

As shown, the regions of one or more regions 450 may also or alternatively include an ozone generator 500 connected to the HVAC system 405 to contaminate the second region of the region 450. have. Apparatus 500 may be used to disinfect the disinfectant 540, such as ozone gas, at a predetermined concentration such that the predetermined concentration of disinfectant 540 in region 450 does not exceed the acceptable exposure limit value PEL in the manner described herein. And a release mechanism 530 configured to release into 450. In some embodiments, the pressurized and / or heated air may be supplied to the apparatus 500 by the existing HVAC system 405 through an existing ventilation system. Thus, in any embodiment, separate heating and distribution systems may be provided by existing HVAC system 405, if desired.

In some embodiments, as shown, region 450 may include one or more devices (such as device 400 and device 500 to operate independently or cooperatively to control the level of disinfectant in region 450). In a state having at least one region including 400, 500, one or more regions may be included. For example, one region may include only a device 400, such as a humidifier, to control the level of fungicides, such as hydrogen peroxide, as provided herein. The second region may include device 500, which may be the same or another device 400, such as an ozone generator, to control the level of ozone gas provided herein. The third region may comprise one or more devices 400, 500, which may be the same or different, for example, a humidifier and an ozone generator. In the third zone, the humidifier controls the level of sterilizer 440 and the ozone generator controls the level of local sterilizer 540. In this manner, it is contemplated that multiple identical or different devices 400, 500 may co-exist in an area of the region that may create a joint effect therein.

In order to control the release of the sterilizers 440 and 540, respectively, through the use of optional sensors 460 and 470 providing a feedback control mechanism, the concentration of the sterilizers 440 and 450 may be controlled to a predetermined concentration at the low level of the area 450. Can be. For example, sensor 460 may be a hydrogen peroxide sensor, and sensor 470 may be an ozone sensor. As described herein, the number and orientations of the sensors 460, 470 used may vary depending on the desired uniformity of the sterilant concentration over the area 450. As a location and configuration of the device 400 within the zone 450, depending on the above factors, the release mechanism 430, 530 can be controlled independently, for example, by the flow restrictor of each room of the zone 450, so that the disinfectant 440, 540 is controlled. Can be configured and controlled by a microprocessor, such that it can be provided at a high or low concentration, particularly at selected locations based on sensor feedback control. In addition, as described herein, release of the disinfectant 440, 540 may be continuous, intermittent and / or periodic, as described herein by the set point controller (not shown) in the manner described herein.

FIG. 6 schematically illustrates an apparatus 600 for contaminating area 650 herein, in the form of a multi-room unit connected to a conventional conventional HVAC system. Device 600 may include a disinfectant source 610 disposed within housing 620 and a release mechanism 630 in communication with the housing 620. The release mechanism 630 may be applied to the disinfectant 640 from the disinfectant source 610 to the region 650 at a predetermined concentration such that the predetermined concentration of the disinfectant 640 of the region 650 does not exceed the acceptable exposure limit value PEL. It can be configured to emit.

Housing 620 may contain a sterilant source 610, which may be, for example, an ozone generating device or a liquid hydrogen peroxide solution or a solid peroxide composite, as described herein. As shown, the release mechanism 630 may release the sterilant 640 in the form of gas, vapor and / or mist into the area 650. The heated and compressed air can be supplied by existing HVAC system 605, as described herein, if desired. As shown, the device 600 need not be located within the area 650, but can instead be placed side by side with existing ventilation systems.

The concentration of the sterilizer 640 is determined within the allowable exposure limit PEL described herein of the region 650 through the use of optional sensors that provide a feedback control mechanism to control the release of the sterilizer 640. Can be controlled. As described herein, the number and orientation of the sensors 660 used may vary depending on the desired uniformity of the sterilant concentration over the area 660. As shown, the sensor 660 can be placed side by side with an existing ventilation system near the sterilant source, so that the sterilant concentration is evenly distributed over the various regions of the area 650. As the configuration and location of the device 600, depending on the above factors, the release mechanism 630 may be controlled independently, for example, by the flow restrictor, so that the sterilizer 640 is high or low, especially based on sensor feedback control. It can be envisaged that it can be configured and controlled by a microprocessor to be able to emit to region 650 at a concentration. In addition, as described herein, release of the sterilant 640 may be continuous, intermittent and / or periodic, as described herein by the set point controller 670 in the manner described herein.

As demonstrated in the example, by providing a low concentration of disinfectant to the area continuously and in the long term, microbial contamination can be reduced or substantially eliminated in areas where it is likely to be expressed without reducing or eliminating the need for plant shutdowns. have. Embodiments herein provide the option to size the concentration of the fungicide to a concentration above the allowable exposure threshold (PEL), such that the sustained low concentrations described herein in order to accurately treat the area over a period of time. It can provide increased flexibility and efficiency for pollution purification systems. It is necessary to pay attention to the above area in order to continue the correct treatment. The system can then be operated again at low sustained concentration levels. Accordingly, embodiments herein provide an apparatus and associated method for contaminating the area with low concentrations of fungicides that do not require service attention to the area. Therefore, areas such as sickrooms can be used continuously or almost continuously during the contaminant cleanup.

The invention can be further described with reference to the following examples. The following examples are merely illustrative of the invention and are not intended to be limiting. Unless stated otherwise, all parts are by weight.

Examples

View 1

Experiments showed whether viability on stainless steel surfaces is as follows. It was carried out using hydrogen peroxide vapor released from the urea complex at a nominal level of 0.6 ppm to show a reduction of viable G. stearothermophilus spores. Stainless steel scalpel blades are inoculated with 10 μl of inoculum containing 6 × 10 ⁴ spores. The inoculum was then dried on the scalpel surface. Nine inoculated blades were placed in a 1 ft ³ sealed chamber of acrylic. In the chamber, the urea composite was confined to a glass tube having a flow restriction function that could control the peroxide concentration of the chamber. Three identically inoculated blades were placed in a covered petri dish placed near the chamber to serve as a control. At three day intervals, not only one control but also three blades were withdrawn from the chamber. The blade undergoes standard recovery, plating and incubation procedures, from which the viable spore count and log reduction can be determined. The logarithmic decreases as well as the average high and low peroxide concentrations during exposure are shown in Table 1.

Average logarithmic decrease [H ₂ O ₂ ] average, low, high during the exposure cycle After 3 days of exposure 1.5 0.56, 0.40, 0.83ppm 6 days after exposure 2.7 0.66, 0.40, 0.83ppm 9 days after exposure ≥4.8 0.66, 0.40, 0.95ppm

The results for Table 1 show that per day at a nominal concentration of 0.6 ppm of hydrogen peroxide. There is an approximate 0.5 logarithmic decrease in Sterotermophilus spores. G. Sterothermophilus spores are known to have the highest resistance to hydrogen peroxide. s. S. aureus and former spore seeds. The effect of the method on non-spore forming microorganisms such as C. difficile is expected to be even greater.

View 2

Edge of the scalpel blade at peroxide concentration. In order to show the dependence of the logarithmic reduction of the steromophilus spores, the scalpel blade prepared as described in Example 1 was exposed to a nominal H ₂ O ₂ concentration of 0.35 ppm. In this case, the inoculated blades were exposed continuously with a slight change in average peroxide concentration during the exposure cycle. During exposure, mean, high and low peroxide concentrations as well as logarithmic decreases after 3, 6 and 9 days are shown in Table 2.

Average logarithmic decrease [H ₂ O ₂ ] average, low, high during the exposure cycle After 3 days of exposure 1.12 0.35, 0.2, 0.5 ppm 7 days after exposure 1.83 0.30, 0.2, 0.5 ppm 9 days after exposure ≥4.0 0.39, 0.2, 0.6 ppm

The concentrations given above are average values for the total exposure time. As shown, there are some changes at nominal concentrations of 0.35 ppm, but the data in the tables indicate that higher concentrations increase the rate of sterilization of the microorganisms.

Those skilled in the art will understand that the described embodiments can be varied within the broad scope of the invention. Accordingly, it is to be understood that the invention is not intended to be limited to the particular embodiments described, but is intended to cover all modifications that are made within the spirit and scope of the invention as defined in the appended claims.

The features and advantages of the present invention may be better understood with reference to the accompanying drawings.

1 shows schematically a device for the local pollution purification of the present invention in the form of a humidifier;

FIG. 2 is a schematic illustration of an apparatus for local pollution purification of the present invention in the form of an ozone generator.

FIG. 3 is a schematic illustration of an apparatus for local pollution purification of the present invention in the form of a single use single use or reusable system.

4 is a schematic illustration of an apparatus for local pollution purification of the present invention in the form of a single room unit connected to a conventional HVAC system.

FIG. 5 is a schematic illustration of an apparatus for local pollution purification of the present invention in the form of a multi-room unit connected to a conventional HVAC system.

FIG. 6 is a schematic illustration of an apparatus for local pollution purification of the present invention in the form of a multi-room unit connected to a conventional HVAC system.

Claims (27)

As a way to cleanse the area, Releasing fungicide into the area from a sterile source; Controlling the concentration of fungicide in the area to a predetermined concentration that does not exceed an acceptable exposure limit; And Contaminating the area by contacting microorganisms in the area with a fungicide. The method of claim 1, Wherein said discharging step is carried out in a form selected from the group consisting of gas, vapor, fog and combinations thereof. The method of claim 1, The fungicide is selected from the group consisting of hydrogen peroxide and ozone. The method of claim 1, The sterilizing agent is hydrogen peroxide and the sterilizing source is selected from the group consisting of hydrogen peroxide solution and a solid peroxide complex. The method of claim 1, Wherein said sterilizing agent is ozone and said sterilizing source is oxygen. The method of claim 1, And said controlling step is performed at a frequency selected from the group consisting of continuous, intermittent, periodic and combinations thereof. The method of claim 6, And adjusting the frequency by at least one of a programmable and manually selectable set point. The method of claim 1, The area is selected from the group consisting of rooms, offices, homes, airports, hospital facilities, hospital rooms, intensive care units, ambulances, operating rooms, health club facilities, restaurants, laboratories, lounges, animal facilities and combinations thereof. . The method of claim 1, The microorganism is selected from the group consisting of viruses, vegetable bacteria, fungi, mycobacterium, bacterial seeds and combinations thereof. As a way to cleanse the area, Releasing fungicide into the area from a sterile source; Controlling the concentration of fungicide in the area to a predetermined level of standard operation that does not exceed an acceptable exposure limit; Increasing the concentration of the fungicide in the area to a level above an acceptable exposure limit for strong contaminant purification over a period of time; And Contaminating the area by contacting microorganisms in the area with a fungicide. As a device for polluting the area, And a release mechanism configured to release the sterilant from the sterilization source to the region at a predetermined concentration such that the predetermined concentration of the sterilant in the region does not exceed an acceptable exposure limit. The method of claim 11, The bactericide is selected from the group consisting of hydrogen peroxide and ozone. The method of claim 11, Wherein said sterilizing agent is hydrogen peroxide and said sterilizing source is selected from the group consisting of a hydrogen peroxide solution and a solid peroxide complex. The method of claim 11, Wherein said sterilizing agent is ozone and said sterilizing source is oxygen. The method of claim 11, Wherein said disinfectant is released in at least one form selected from the group consisting of gas, vapor, fog and combinations thereof. The method of claim 15, And the sterilizing agent is prepared by a mechanism selected from the group consisting of a gas generator, a mist generator, a humidifier, a heater, a UV emitter, an arc emitter and a corona emitter and combinations thereof. The method of claim 11, And a controller configured to adjust operation of the device to a frequency selected from the group consisting of continuous, intermittent, periodic and combinations thereof. The method of claim 17, And the controller is configured to adjust the frequency by at least one of a programmable and manually selectable set point. The method of claim 11, Further comprising a sensor configured to provide feedback control. The method of claim 19, And the sensor is located on the device or remotely located in the area. The method of claim 11, Said area is selected from the group consisting of rooms, offices, homes, airports, hospital facilities, hospital rooms, intensive care units, ambulances, operating rooms, health club facilities, restaurants, laboratories, lounges, animal facilities and combinations thereof . The method of claim 11, The microorganism is selected from the group consisting of viruses, vegetable bacteria, fungi, mycobacterium, bacterial seeds and combinations thereof. The method of claim 11, And a flow controller configured to control the sterilant concentration of the region. An HVAC system comprising the apparatus of claim 11. The method of claim 11, Further comprising a fan or a blower. The method of claim 11, Further comprising a service life indicator. As a device for polluting the area, A release mechanism configured to release the bactericide from the sterilization source to the region at a predetermined concentration such that the predetermined concentration of the bactericide in the region does not exceed the acceptable exposure limit in normal operation, Wherein the release mechanism is further configured to release the sterilant from the sterilant source at a concentration that exceeds an acceptable exposure limit for a robust fouling for a period of time.

Images