KR20090084416A - Apparatus of sputtering for coating transparent substrate, method of forming coated film for transparent substrate using sputtering, anti-reflection film and mirror coating film for ophthalmic lens - Google Patents

Abstract

A sputtering apparatus for coating a transparent substrate, a method of forming a coated film for the transparent substrate using sputtering, an anti-reflection film and a mirror coating film for an ophthalmic lens are provided to improve the quality of a coated film of the transparent substrate by using a support having various lens holder holes. A sputtering apparatus for coating a transparent substrate comprises a chamber(60), a support(20), first and second targets(31,32), and first and second gas supply lines. In the support, a plurality of holder holes n which the transparent substrate is mounted are formed. The first and the second target are arranged to face both sides of the transparent substrate mounted on the support. The first and the second gas supply lines inject the oxygen and nitrogen gas inside the chamber. The first and the second targets are made of the silicon(Si). The oxygen gas and the nitrogen gas are supplied to the inside of the chamber and a coated film is formed by laminating a SiO2 thin film and a Si2N4 thin film to be alternated or overlapped.

Description

Apparatus of sputtering for coating transparent substrate, method of forming coated film for transparent substrate using sputtering, anti-reflection film and mirror coating film for ophthalmic lens}

The present invention relates to a sputtering apparatus for coating a transparent substrate, a method for forming a transparent substrate coating film using sputtering, and an antireflection film and a mirror coating film for spectacle lenses using the same, and more particularly, a small transparent substrate such as an eyeglass lens as a sputtering device. Designing the structure of the target and coating film for coating, forming a high-quality coating film on both sides of the transparent substrate at the same time to reduce the coating time, the sputtering apparatus for transparent substrate coating and the transparent substrate coating film forming method that can reduce the sputtering device It is about.

The present invention also relates to a high quality anti-reflection film and a mirror coating film formed by using the above-described sputtering apparatus for coating a transparent substrate and a method of forming a transparent substrate coating film.

The electron beam evaporation system, which is an anti-reflection film coating equipment of conventional spectacle lenses, is economical due to the high deposition rate, but the quality of the coating film is inferior to that of the antireflection film formed by the sputtering device. However, since it requires additional equipment such as an ion assist device or a substrate heating device, there is a disadvantage that it cannot be complicated and miniaturized.

The sputtering method was invented by the British physicist Willian Grove in 1852, and since then has attracted various interests with scientific and commercial interests. Currently, the sputtering method is widely used to form various thin films due to the high adhesion of thin films and the advantage of easily controlling the composition of thin films over other thin film manufacturing methods. In particular, the sputtering method is used to coat an anti-reflection film on a semiconductor or display screen, or to coat a thin film for the purpose of improving the mechanical properties of the material.

Currently, in the case of a large sputter coating system, a high quality lens coating film is formed in large quantities using a closed field magnetron sputtering system at Applied Multilayer in the UK. . In particular, spectacle lenses are used to coat anti-reflective coatings on glass, CR-39, and polycarbonate (PC) spectacle lenses, and in lighting, spectrum-controlled coatings, and charge-coupled devices (CCDs). Is used for anti-glare (AG) coating, and is used for coating of color separation filters in liquid crystal displays.

However, when a large sputter coating system is used for the coating of spectacle lenses, it is not suitable for small spectacle lens coatings in which the coating must be completed in a short time. Therefore, there is a need for a compact sputtering device that can quickly coat spectacle lenses, is suitable for coating spectacle lenses, and can be provided in a narrow space.

Meanwhile, in the case of coating a glass spectacle lens by an evaporation method, a low refractive index film of SiO _{2 and} a high refractive index film of ZrO ₂ are alternately stacked to form an antireflection coating coating having increased transmittance. In the case of coating the anti-reflection film by using two kinds of materials, such as the heat deposition method, the sputtering apparatus becomes larger and more complicated because it requires two kinds of targets.

Therefore, in order to implement a small sputtering apparatus that can be applied to a transparent substrate such as a spectacle lens, it is necessary to design the structure of the target and the coating film.

Accordingly, an object of the present invention is to design a structure of a target and a coating film that can ensure the quality of the coating film of the transparent substrate when coating a transparent substrate, such as a spectacle lens by using a sputtering device, and quickly The present invention provides a sputtering apparatus for coating a transparent substrate and a method for forming a transparent substrate coating film.

It is also an object of the present invention to provide a high quality antireflection film and a mirror coating film formed by using the above-described sputtering apparatus for transparent substrate coating and a method for forming a transparent substrate coating film.

The present invention for achieving the above object relates to a sputtering apparatus for transparent substrate coating and a method for forming a transparent substrate coating film, and more particularly, in forming a coating film on a transparent substrate using a sputtering method, the coating is performed quickly The present invention relates to a sputtering apparatus for transparent substrate coating and a method for forming a transparent substrate coating film capable of miniaturizing a sputtering apparatus.

Specifically, the sputtering apparatus for coating for transparent substrates according to the present invention includes a chamber, a support, first and second targets, first and second gas supply lines.

The support is provided inside the chamber and has a plurality of holder holes on which a transparent substrate is mounted. The first and second targets are made of silicon (Si) and are provided on both sides of the support, respectively, and face both sides of the transparent substrate mounted on the support. The first and second gas supply lines are provided above the chamber and inject oxygen and nitrogen gas into the chamber, respectively. The oxygen and nitrogen gas are respectively supplied into the chamber, and both surfaces of the transparent substrate are formed of SiO ₂ thin film and Si ₃ N _4. The coating films in which the thin films are alternately or overlapped are formed, respectively.

In an embodiment of the present invention, the support is rotated about an axis of rotation perpendicular to the support, and the respective distances between the support and the first and second targets are variably adjusted.

In addition, the present invention provides an anti-reflection film or a mirror coating film formed on both surfaces of the spectacle lens by using the above sputtering device.

In addition, the method for forming a transparent substrate coating film according to the present invention includes mounting a transparent substrate on a support (S1) and providing the inside of the chamber, and positioning the targets made of silicon (Si) on both sides of the transparent substrate, respectively ( S2); Injecting oxygen gas into the chamber to form SiO ₂ thin films on both sides of the transparent substrate (S3); And injecting nitrogen gas into the chamber to form Si ₃ N ₄ on both sides of the transparent substrate. Forming each thin film (S4) is included. In the present invention, steps S3 and S4 are repeatedly performed, and coating films having the same structure are simultaneously formed on both surfaces of the transparent substrate.

In an embodiment of the present invention, the structure of the coating film may be determined by a macleod program.

In an embodiment of the present invention, when the transparent substrate is an eyeglass lens and the coating film is an antireflection film, SiO ₂ having a thickness of 102 nm on the transparent substrate in steps S3 and S4. Thin film, 15.95 nm thick Si ₃ N ₄ Thin film, 19.21 nm thick SiO ₂ Thin film, 102 nm thick Si ₃ N ₄ Thin film, and 81.3 nm thick SiO ₂ Thin films may be sequentially stacked to form an antireflection film having a five-layer structure.

In an embodiment of the present invention, when the transparent substrate is glasses and the coating film is a mirror coating film, in the step S3 and S4, Si ₃ N ₄ thin film having a thickness of 51.28nm on the transparent substrate, 53.53nm SiO ₂ with thickness Thin film, Si ₃ N ₄ with thickness of 55.4 nm Thin film, SiO ₂ with a thickness of 67.64 nm Thin film, Si ₃ N ₄ with thickness of 135.86 nm Thin film, and SiO ₂ having a thickness of 56.61 nm The thin films may be sequentially stacked to form a blue color coating film having a six-layer structure.

Further, in steps S3 and S4, a 66.2 nm thick Si ₃ N ₄ thin film, a 22.76 nm thick SiO ₂ thin film, a 56.58 nm thick Si ₃ N ₄ thin film, and a 140.35 nm thick Si ₃ N ₄ layer were formed on the transparent substrate. Thin films, 152.35 nm thick SiO ₂ thin films, 70.16 nm thick Si ₃ N ₄ thin films, and 121.87 nm thick SiO ₂ thin films Thin films may be sequentially stacked to form a green color coating film having a seven-layer structure.

Further, in step S3 and step S4, Si having a thickness of 83.59nm on the transparent substrate ₃ N ₄ thin film, Si ₃ N ₄ having a SiO ₂ thin film, the thickness of 11.82nm having a thickness of 144.86nm Thin film, SiO ₂ with a thickness of 129.93 nm A 6-layer gold color coating film in which a thin film, a Si ₃ N ₄ thin film having a thickness of 90.01 nm, and a SiO ₂ thin film having a thickness of 88.37 nm may be sequentially formed.

In the step S3 and S4, the support is rotated based on the axis of rotation perpendicular to the target, the distance between the support and the target can be variably adjusted.

According to the present invention as described above, since the spectacle lens is coated by the sputtering method it is possible to improve the quality of the coating film. Accordingly, the spectacle lens can be upgraded. In addition, it is possible to miniaturize the sputtering device and to prepare a small amount of various kinds of spectacle lenses by using a support having various lens holder holes, thereby preparing for the Rx custom spectacle lens coating market.

Furthermore, since both surfaces of the spectacle lens can be coated, the coating time and cost of the lens can be reduced.

Hereinafter, the present invention will be described in detail by explaining embodiments of the present invention with reference to the accompanying drawings. However, the present invention is not limited by the following examples.

On the other hand, in the embodiment of the present invention will be described only when the transparent substrate is a spectacle lens. However, the present invention is not limited thereto and may be applied to transparent substrates such as glass and transparent plastics other than spectacle lenses.

Before describing the sputtering apparatus, a process of optimizing the structure of the target and the coating layer for forming a high quality coating film (antireflection film and mirror coating film in the embodiment of the present invention) by applying the spectacle lens to the sputtering device will be described. Based on this, a sputtering apparatus is demonstrated.

 In order to miniaturize the sputtering apparatus, a target made of one material is selected, and when the spectacle lens is coated using the target, the structures of the anti-reflection film and the mirror coating film are optimized to realize the anti-reflection film and the mirror coating film having a desired level of reflectance. There is a need.

Specifically, the type of target is set to one Si, oxygen (O ₂ ) Gas to form a low refractive index thin film of SiO ₂ , and nitrogen (N ₂ ) gas is provided thereon to form a Si ₃ N ₄ high refractive index thin film. Since the k (dissipation factor) value of Si ₃ N ₄ is larger than that of other commonly used materials, the macleod program is used to find out whether SiO ₂ and Si ₃ N ₄ materials can be used for anti-reflective coating and mirror coating. The computer simulation was performed as follows. At this time, n (refractive index) and k value of the used SiO ₂ and Si ₃ N ₄ were used in the McLeod program, the results are shown in Table 1.

Structure and Thickness of Spectacle Lens Anti-reflection Film Using Si Target layer matter Packing density Refractive index Extinction Coefficient Optical thickness (QWOT) Physical thickness (nm) materials Glass 1.52092 0 One SiO ₂ One 1.4618 0 1.169442 102 2 Si ₃ N ₄ One 2.03825 0 0.255039  15.95 3 SiO ₂ One 1.4618 0 0.22023  19.21 4 Si ₃ N ₄ One 2.03825 0 1.630603 102 5 SiO ₂ One 1.4618 0 0.932154  81.3 medium air One 0

As shown in Table 1, the optimum condition of the structure of the antireflection film was SiO ₂ on the substrate. A five-layer structure in which a thin film, a Si ₃ N ₄ thin film, a SiO ₂ thin film, a Si ₃ N ₄ thin film, and a SiO ₂ thin film is sequentially stacked is 102 nm, 15.95 nm, 19.21 nm, 102 nm, and 81.3 nm, respectively.

1 is a graph showing the reflectance of the antireflection film designed according to the present invention.

As shown in FIG. 1, the antireflection film of an optimal condition designed according to an embodiment of the present invention has a reflectance near 0% in the visible region of 430 nm and 610 nm and is approximately 1% in the other visible region. . Therefore, the anti-reflection film according to one embodiment of the present invention may be used as an anti-reflection film of the spectacle lens.

In addition, in the case of mirror coating the spectacle lens with the Si target, the reflectance curve according to the color was referred to the mirror coating curve introduced by Leybold, and the computer simulation was performed using the McCleod program. The results are shown in Tables 2 to 4, respectively.

Structure and Thickness of Blue Color Mirror Coating Film for Spectacle Lens Using Si Target layer matter Packing density Refractive index Extinction Coefficient Optical thickness (QWOT) Physical thickness (nm) materials Glass 1.52092 0 One Si ₃ N ₄ One 2.03825 0 0.819835 51.28 2 SiO ₂ One 1.4618 0 0.613704 53.53 3 Si ₃ N ₄ One 2.03825 0 0.885709 55.4 4 SiO ₂ One 1.4618 0 0.775506 67.64 5 Si ₃ N ₄ One 2.03825 0 2.17193 135.86 6 SiO ₂ One 1.4618 0 0.649056 56.61 medium air One 0

As shown in Table 2, the optimum conditions for the blue color mirror coating film were Si ₃ N ₄ thin film, SiO ₂ thin film, Si ₃ N ₄ thin film, SiO ₂ thin film, Si ₃ N ₄ thin film, and SiO ₂ on the substrate. It is a six-layer structure in which thin films are sequentially stacked, and their thicknesses are 51.28 nm, 53.53 nm, 55.4 nm, 67.64 nm, 135.86 nm, and 56.61 nm, respectively.

Structure and Thickness of Green Color Mirror Coating Film for Spectacle Lens Using Si Target layer matter Packing density Refractive index Extinction Coefficient Optical thickness (QWOT) Physical thickness (nm) materials Glass 1.52092 0 One Si ₃ N ₄ One 2.03825 0 1.058355 66.2 2 SiO ₂ One 1.4618 0 0.260945 22.76 3 Si ₃ N ₄ One 2.03825 0 0.904517 56.58 4 Si ₃ N ₄ One 2.03825 0 2.243734 140.35 5 SiO ₂ One 1.4618 0 1.746719 152.35 6 Si ₃ N ₄ One 2.03825 0 1.121659 70.16 7 SiO ₂ One 1.4618 0 1.397307 121.87 medium air One 0

As shown in Table 3, the optimum conditions of the green color mirror coating film were Si ₃ N ₄ thin film, SiO ₂ thin film, Si ₃ N ₄ thin film, Si ₃ N ₄ thin film, SiO ₂ thin film, Si ₃ N ₄ thin film, and SiO ₂ It is a seven-layer structure in which thin films are sequentially stacked, and their thicknesses are 66.2 nm, 22.76 nm, 56.58 nm, 140.35 nm, 152.35 nm, 70.16 nm, and 121.87 nm.

Structure and Thickness of Gold Color Mirror Coating Film for Spectacle Lens Using Si Target layer medium Packing density Refractive index Extinction Coefficient Optical thickness (QWOT) Physical thickness (nm) materials Glass 1.52092 0 One Si ₃ N ₄ One 2.03825 0 1.336252 83.59 2 SiO ₂ One 1.4618 0 1.660877 144.86 3 Si ₃ N ₄ One 2.03825 0 0.18899 11.82 4 SiO ₂ One 1.4618 0 1.489607 129.93 5 Si ₃ N ₄ One 2.03825 0 1.438901 90.01 6 SiO ₂ One 1.4618 0 1.013119 88.37 medium air One 0

As shown in Table 4, the optimum condition of the green color mirror coating film is Si ₃ N ₄ Thin films, SiO ₂ thin films, Si ₃ N ₄ Thin films, SiO ₂ thin films, Si ₃ N ₄ Thin film, SiO ₂ It is a six-layer structure in which thin films are sequentially stacked, and their thicknesses are 83.59 nm, 144.86 nm, 11.82 nm, 129.93 nm, 90.01 nm, and 88.37 nm, respectively.

2 is a graph showing the reflectance of the mirror coating film designed according to the present invention.

As shown in FIG. 2, the blue color coating film having an optimal condition designed according to an embodiment of the present invention has a reflectance curve having a reflectance of up to 50% in the 410 nm area, and the green color coating film having an optimal condition in the 410 nm area. It has a reflectance curve showing a peak having a reflectance of 40% and a peak having a reflectance of 30% in a 510 nm region, and a gold color coated film has a reflectance curve having a reflectance of 25% or greater in a 500 nm region or more. Indicates. Since the reflectance graph of the three color coating film is close to the shape of the mirror coating curve introduced by Raybold, the mirror coating film according to an embodiment of the present invention can be used as a mirror coating film of the spectacle lens.

Hereinafter, a sputtering apparatus for coating a transparent substrate and a method of forming a transparent substrate coating film according to the present invention.

3 is a view showing a sputtering apparatus for coating a transparent substrate according to an embodiment of the present invention. 4 is a plan view showing the support shown in FIG.

3 and 4, the sputtering apparatus 100 for coating a transparent substrate according to an exemplary embodiment of the present invention may include a chamber 60, a support 20, and first and second targets 31 and 32. And first and second gas supply lines 51, 52.

The support 20 is provided at the center of the chamber 10, and the spectacle lens 10 is mounted. As shown in FIG. 4, the support 20 may be formed in a disc shape, for example, and has a plurality of holder holes 21 in which a plurality of spectacle lenses may be mounted. Both surfaces of the spectacle lens are exposed by the holder hole 21. According to the diameter of the spectacle lens 10 mounted on the support, the size of the holder hole 21 can be formed differently, and the number thereof is also adjustable. In the present embodiment, since the support 20 has four holder holes 21, two pairs of eyeglass lenses can be coated at a time.

The support 20 may be formed between the plurality of holder holes 21, and may further include an auxiliary hole 22 having a diameter smaller than the diameter of the holder hole 21. The auxiliary hole 22 is for smoothly extracting the gas in front of the support 20 when forming the inside of the chamber 60 in a vacuum state using a vacuum pump.

In addition, the support 20 is rotated based on a rotation axis perpendicular to the support when forming a coating film of the spectacle lens. By rotating the support 20, it is possible to uniformly form a coating film to improve the characteristics of the coating film.

Referring to FIG. 3 again, the first and second targets 31 and 32 are made of silicon (Si), and are provided at both sides of the support 20 in the chamber 60 to support the support 20. Opposite the both sides of the spectacle lens 10 mounted on the). The first and second targets 31 and 32 are respectively provided on both sides of the spectacle lens 10 to simultaneously coat both surfaces of the spectacle lens 10 when the spectacle lens is coated, thereby shortening the coating time and spectacle lens. The cost of coating can be reduced. The first and second targets 31 and 32 are connected to cathode electrodes, respectively.

Although not shown in FIG. 3, a power line for supplying power is connected to the chamber on the side where the first and second targets 31 and 32 and the cathode electrode are provided. In addition, there is a cooling water supply line next to the power line to cool the heated first and second targets 31 and 32 while forming the coating film.

Meanwhile, the distance between the first target 31 and the support 20 and the distance between the second target 32 and the support 20 may be variably adjusted. The distance may be adjusted to prevent the spectacle lens 10 from being deformed due to the temperature of the plasma. For example, by varying the distance to 12.5cm to 20cm, the deformation of the CR-39 lens due to the plasma temperature could be prevented.

In addition, although not shown in Figure 3, one side of the chamber 60 is provided with a supply for supplying the argon gas to be used for sputtering into the chamber 60.

The first and second gas supply lines 51 and 52 are provided above the chamber 60, and inject oxygen and nitrogen gas into the chamber 60, respectively. The nozzles of the first and second gas supply lines 51 and 52 are connected to the first and second targets 31 so that Si protruding from the first and second targets 31 and 32 reacts well with the oxygen gas and the nitrogen gas. And 32).

The oxygen and nitrogen gas are respectively supplied into the chamber 60, and both surfaces of the spectacle lens 10 are formed of a SiO ₂ thin film and Si ₃ N _4. The coating films in which thin films are alternately stacked or overlapped are formed, respectively. Therefore, by simultaneously coating both surfaces of the spectacle lens 10, the coating time can be shortened, and the coating cost can be reduced.

In addition, an antireflection film or a mirror coating film in which a low refractive index thin film of SiO _{2 and} a high refractive index thin film of Si ₃ N ₄ are alternately or overlapped may be formed on the spectacle lens 10 by using a target composed of only one kind of Si. Therefore, it is possible to simplify and miniaturize the sputtering device than when using a target made of two or more kinds of materials.

The sputtering apparatus 100 according to the present invention may further include a turbo pump 40 for making the interior of the chamber 60 from a low vacuum state to a high vacuum state when the spectacle lens 10 is coated. In this embodiment, the turbo pump 40 is provided below the chamber 60. When using the turbo pump 40, the interior of the chamber 60 can be made in a high vacuum state from a low vacuum state within a few minutes. Therefore, the spectacle lens 10 can shorten the coating time. In addition, although not shown in FIG. 3, a rotary pump for lowering the inside of the chamber 60 is provided in the lower portion of the chamber 60.

In general, the thermal evaporation method uses a diffusion pump to control the coating from a low vacuum state to a high vacuum state. At this time, the time required to make the inside of the chamber with a high vacuum in the high vacuum state is usually several ten minutes, which is not suitable in an environment in which the spectacle lens is coated in a small amount. Therefore, in the present invention, in order to complete the entire coating process of the spectacle lens within 20 minutes, the gas is supplied after making the inside of the chamber 60 in a high vacuum state within a few minutes using a turbo pump instead of a diffusion pump.

5 is a view showing a sputtering system having a sputtering apparatus for coating a transparent substrate according to an embodiment of the present invention.

As shown in FIG. 5, the sputtering system 500 for coating a transparent substrate includes a sputtering apparatus 100 for coating a transparent substrate, a monitor 200, and a controller 300 according to the present invention. The sputtering apparatus 100 is provided on the upper left side of the sputtering system 500. Although not shown in FIG. 5, first and second gas supply lines are installed on the sputtering apparatus 100. A cathode electrode is provided on the front left side of the sputtering apparatus 100, and a chamber window is provided on the front right side. In addition, there are a turbo pump and a rotary pump under the sputtering apparatus 100.

The monitor 200 is provided on the upper right side of the sputtering system 500, and can easily control the sputtering apparatus 100 through the monitor 200. The controller 300 is electrically connected to the sputtering apparatus 100 to control the sputtering apparatus 100. The controller 300 includes a gas flow controller 310, a vacuum gauge 320, and a power supply 330. The gas flow controller 310 includes an argon (Ar), an oxygen gas, and a mass flow controller (MFC) of nitrogen gas, and may control the supply amounts of the argon (Ar), oxygen gas, and nitrogen gas, respectively, during coating. have. The vacuum gauge 320 may adjust the degree of vacuum in the chamber of the sputtering apparatus 100. The power supply unit 330 may adjust the current, voltage, frequency and efficiency during coating of the spectacle lens.

Hereinafter, a process of forming a coating film on both surfaces of the spectacle lens will be described with reference to FIGS. 3 and 4.

The spectacle lens 10 is mounted in the holder hole 21 of the support 20 to be provided in the chamber 60. First and second targets 31 and 32 made of silicon (Si) are provided on both sides of the support 20, respectively, so that both surfaces of the spectacle lens 10 face the targets 31 and 32, respectively. do. After the interior of the chamber 60 is made into a low vacuum state by using a rotary pump, it is made into a high vacuum state from a low vacuum state by using the turbo pump 40.

Thereafter, argon, oxygen gas, and nitrogen gas are injected into the chamber 60. Specifically, argon and oxygen gas are supplied into the chamber to form SiO ₂ thin films on both surfaces of the spectacle lens 10, respectively. In addition, by supplying argon and nitrogen gas into the chamber, Si ₃ N ₄ on both surfaces of the spectacle lens 20. Each thin film is formed. SiO ₂ thin film and Si ₃ N ₄ The process of forming the thin film is repeated while forming the coating film of the desired structure. In addition, according to the structure of the coating film SiO ₂ thin film and Si ₃ N ₄ The order of formation of the thin film is changed.

While the coating film is formed on both surfaces of the spectacle lens 10, the support 20 is rotated based on a rotation axis perpendicular to the support 20 to form a uniform coating film on both surfaces of the spectacle lens 10. Can be. In addition, by varying the distance between the support 20 and the first and second targets 31 and 32 during coating, deformation of the spectacle lens 10 may be prevented.

As such, when the sputtering apparatus and the coating film forming method according to the present invention are used, coating films having the same structure may be simultaneously formed on both surfaces of the spectacle lens. As a result, the coating film manufacturing time and manufacturing cost can be reduced, and the sputtering apparatus can be miniaturized.

In addition, the present invention provides an anti-reflection film or a mirror coating film formed on both surfaces of the spectacle lens by using the above-mentioned sputtering apparatus for coating a transparent substrate and a method for forming a transparent substrate coating film.

6 is a cross-sectional view showing an antireflection film of the spectacle lens formed by the sputtering apparatus of the present invention.

As shown in FIG. 6, when the spectacle lens 10 is coated using the sputtering apparatus of the present invention, an antireflection film AR may be formed on both surfaces of the spectacle lens 10. The anti-reflection film AR was formed according to the optimized structure described above. That is, the anti-reflection film AR is a 102 nm thick SiO ₂ thin film 1, a 15.95 nm thick Si ₃ N ₄ thin film 2, a 19.21 nm thick SiO ₂ thin film 3, a 102 nm thick Si ₃ N ₄ When the thin film 4 and the 5 layer structure of the SiO ₂ thin film 5 of 81.3 nm thickness were formed sequentially, it was confirmed previously that the reflectance of the anti-reflection film AR is minimized in such a structure.

1 is a graph showing the reflectance of the antireflection film designed according to the present invention.

2 is a graph showing the reflectance of the mirror coating film designed according to the present invention.

3 is a view showing a sputtering apparatus for coating a transparent substrate according to an embodiment of the present invention.

4 is a plan view showing the support shown in FIG.

5 is a view showing a sputtering system having a sputtering apparatus for coating a transparent substrate according to an embodiment of the present invention.

6 is a cross-sectional view showing an antireflection film of the spectacle lens formed by the sputtering apparatus of the present invention.

* Description of the symbols for the main parts of the drawings *

10-eyeglass lens 20-support

21-holder holes 31, 32-first and second target

40-turbopump 60-chamber

100-Sputtering Device for Transparent Substrate Coating

Claims (24)

chamber; A support provided in the chamber and having a plurality of holder holes in which the transparent substrate is mounted; First and second targets respectively provided on both sides of the support and facing both sides of the transparent substrate mounted on the support; And It is provided in the upper portion of the chamber, and includes a first gas supply line for injecting oxygen and nitrogen gas into the chamber, respectively, The first and second targets are made of silicon (Si), and the oxygen and nitrogen gas are supplied into the chamber, respectively, so that the SiO ₂ thin film and the Si ₃ N ₄ thin film are alternately or overlapped on both sides of the transparent substrate. Sputtering apparatus for coating a transparent substrate, characterized in that the coated film is formed respectively. The sputtering apparatus for coating a transparent substrate of claim 1, wherein the support is further formed between the plurality of holder holes and further includes an auxiliary hole having a diameter smaller than the diameter of the holder hole. The sputtering apparatus for coating a transparent substrate of claim 1, wherein the support is rotated based on a rotation axis perpendicular to the support. The sputtering apparatus for coating a transparent substrate of claim 1, wherein each distance between the support and the first and second targets is variably adjusted. The method of claim 1, Sputtering apparatus for coating a transparent substrate, characterized in that it further comprises a turbo pump for maintaining the interior of the chamber in a vacuum state. The sputtering apparatus of claim 1, wherein the sputtering apparatus is electrically connected to a controller for controlling the sputtering apparatus. The sputtering apparatus for coating a transparent substrate of claim 1, wherein the transparent substrate is an eyeglass lens. An antireflection film formed on each of both surfaces of the transparent substrate using the sputtering apparatus according to claim 7. The method of claim 8, wherein the anti-reflection film, 102 nm thick SiO ₂ on the transparent substrate Thin film, 15.95 nm thick Si ₃ N ₄ Thin film, 19.21 nm thick SiO ₂ Thin film, 102 nm thick Si ₃ N ₄ Thin film, and 81.3 nm thick SiO ₂ Antireflection film, characterized in that the thin film is a five-layer structure laminated sequentially. Mirror coating films formed on both surfaces of the transparent substrate by using the sputtering apparatus according to claim 7. The method of claim 10, wherein the mirror coating film, 51.28 nm thick Si ₃ N ₄ thin film, 53.53 nm thick SiO ₂ thin film, 55.4 nm thick Si ₃ N ₄ thin film, 67.64 nm thick SiO ₂ thin film, 135.86 nm thick Si ₃ N ₄ thin film on the transparent substrate And a six-layered blue color coating film in which a SiO ₂ thin film having a thickness of 56.61 nm is sequentially stacked. The method of claim 10, wherein the mirror coating film, 66.2 nm thick Si ₃ N ₄ thin film, 22.76 nm thick SiO ₂ thin film, 56.58 nm thick Si ₃ N ₄ thin film, 140.35 nm thick Si ₃ N ₄ thin film, 152.35 nm thick SiO ₂ thin film on the transparent substrate , A 70.16 nm thick Si ₃ N ₄ thin film, and a 121.87 nm thick SiO ₂ thin film, a seven-layer green color coating film sequentially laminated. The method of claim 10, wherein the mirror coating film, 83.59 nm thick Si ₃ N ₄ thin film, 144.86 nm thick SiO ₂ thin film, 11.82 nm thick Si ₃ N ₄ thin film, 129.93 nm thick SiO ₂ on the transparent substrate A thin film, a Si ₃ N ₄ thin film having a thickness of 90.01 nm, and a SiO ₂ thin film having a thickness of 88.37 nm are a six-layered gold color coating film sequentially stacked. In the method of forming a coating film on a transparent substrate using sputtering, Mounting the transparent substrate on a support and providing the inside of the chamber (S1); Providing a target made of silicon (Si) on each of both surfaces of the transparent substrate such that the target faces both surfaces of the transparent substrate (S2); Injecting oxygen gas into the chamber to form SiO ₂ thin films on both sides of the transparent substrate (S3); And Injecting nitrogen gas into the chamber, Si ₃ N ₄ on both sides of the transparent substrate Forming each of the thin film (S4), Step S3 and step S4 is performed repeatedly, the coating film forming method, characterized in that the coating film of the same structure is formed on both sides of the transparent substrate at the same time. The method of claim 14, The structure of the coating film is a method of forming a transparent substrate coating film, characterized in that determined by the macleod program (macleod program). 15. The method of claim 14, wherein the transparent substrate is a spectacle lens. The method of claim 16, wherein in steps S3 and S4, SiO ₂ thin film, Si ₃ N ₄ thin film, SiO ₂ thin film, Si ₃ N ₄ thin film, and SiO ₂ thin film are sequentially formed on the transparent substrate to form a five-layered antireflection film. Formation method. The method of claim 16, wherein in steps S1 and S2, 102 nm thick SiO ₂ on the transparent substrate Thin film, 15.95 nm thick Si ₃ N ₄ Thin film, 19.21 nm thick SiO ₂ Thin film, 102 nm thick Si ₃ N ₄ Thin film, and 81.3 nm thick SiO ₂ Method of forming a transparent substrate coating film, characterized in that to form a thin film in order to form an antireflection film of a five-layer structure. The method of claim 16, wherein in steps S3 and S4, And forming a mirror coating film by alternately forming a SiO ₂ thin film and a Si ₃ N ₄ thin film on the transparent substrate. The method of claim 19, wherein in steps S3 and S4, 51.28 nm thick Si ₃ N ₄ thin film, 53.53 nm thick SiO ₂ thin film, 55.4 nm thick Si ₃ N ₄ thin film, 67.64 nm thick SiO ₂ thin film, 135.86 nm thick Si ₃ N ₄ thin film on the transparent substrate And 56.61 nm thick SiO ₂ thin film in order to form a six-layered blue color coating film to form a transparent substrate coating film, characterized in that. The method of claim 19, wherein in steps S3 and S4, 66.2 nm thick Si ₃ N ₄ thin film, 22.76 nm thick SiO ₂ thin film, 56.58 nm thick Si ₃ N ₄ thin film, 140.35 nm thick Si ₃ N ₄ thin film, 152.35 nm thick SiO ₂ thin film on the transparent substrate , 70.16 nm thick Si ₃ N ₄ thin film, and 121.87 nm thick SiO ₂ thin film to form a seven-layered green color coating film to form a transparent substrate coating film forming method. The method of claim 19, wherein in steps S3 and S4, 83.59 nm thick Si ₃ N ₄ thin film, 144.86 nm thick SiO ₂ thin film, 11.82 nm thick Si ₃ N ₄ thin film, 129.93 nm thick SiO ₂ on the transparent substrate A method of forming a transparent substrate coating film, comprising: sequentially depositing a thin film, a 90.01 nm thick Si ₃ N ₄ thin film, and a 88.37 nm thick SiO ₂ thin film to form a six-layered gold color coating film. The method of claim 14, wherein in the step S3 and S4, the support is rotated based on a rotation axis perpendicular to the support. The method of claim 14, wherein in steps S3 and S4, Method for forming a transparent substrate coating film, characterized in that the distance between the support and the target is variably controlled.

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