KR20090084316A - 광섬유 브래그 격자 제조 방법 - Google Patents
광섬유 브래그 격자 제조 방법 Download PDFInfo
- Publication number
- KR20090084316A KR20090084316A KR1020080010406A KR20080010406A KR20090084316A KR 20090084316 A KR20090084316 A KR 20090084316A KR 1020080010406 A KR1020080010406 A KR 1020080010406A KR 20080010406 A KR20080010406 A KR 20080010406A KR 20090084316 A KR20090084316 A KR 20090084316A
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- KR
- South Korea
- Prior art keywords
- resin
- optical fiber
- bragg grating
- imprinting template
- cladding
- Prior art date
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
- B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
- B81C1/0046—Surface micromachining, i.e. structuring layers on the substrate using stamping, e.g. imprinting
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/887—Nanoimprint lithography, i.e. nanostamp
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
Abstract
Description
Claims (6)
- 광섬유의 클래딩(clading) 일부를 노출시키는 단계;상기 노출된 클래딩 상에 수지를 도포하는 단계;상기 수지 상에 유연성이 있는 고분자 재질로 구비되고 브래그 격자 패턴을 포함하는 임프린팅 형판을 로딩시키는 단계;상기 임프린팅 형판을 상기 수지에 압착시켜 나노 임프린트 공정을 수행하고, 상기 압착된 수지를 경화시키는 단계; 및상기 임프린팅 형판을 제거하여 경화된 수지 패턴을 형성하는 단계를 포함하는 것을 특징으로 하는 광섬유 브래그 격자 제조 방법.
- 제 1 항에 있어서,상기 수지는 상기 클래딩 굴절률의 ±0.1% 차이를 갖는 물질을 사용하는 것을 특징으로 하는 광섬유 브래그 격자 제조 방법.
- 제 1 항에 있어서,상기 수지는 벤질메타크릴레이트(benzylmethacrylate) 또는 퍼플루오네이트 아크릴레이트 모노머(perfluorinated acrylate monomers)를 사용하는 것을 특징으 로 하는 광섬유 브래그 격자 제조 방법.
- 제 1 항에 있어서,상기 유연성을 갖는 고분자 재질은 PDMS, PVA 및 PUA 중 선택된 어느 하나의 재질을 사용하는 것을 특징으로 하는 광섬유 브래그 격자 제조 방법.
- 제 1 항에 있어서,상기 임프린팅 형판을 제거하는 공정은 상기 임프린팅 형판을 용해시킬 수 있는 용액을 이용하여 수행하는 것을 특징으로 하는 광섬유 브래그 격자 제조 방법.
- 청구항 제 1 항에 기재된 제조 방법을 이용하여 형성한 광섬유 브래그 격자를 포함하는 것을 특징으로 하는 광신호검출소자.
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KR1020080010406A KR100949663B1 (ko) | 2008-01-31 | 2008-01-31 | 광섬유 브래그 격자 제조 방법 |
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KR1020080010406A KR100949663B1 (ko) | 2008-01-31 | 2008-01-31 | 광섬유 브래그 격자 제조 방법 |
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KR20090084316A true KR20090084316A (ko) | 2009-08-05 |
KR100949663B1 KR100949663B1 (ko) | 2010-03-30 |
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KR100730300B1 (ko) * | 2005-09-14 | 2007-06-19 | 한국전자통신연구원 | 역방향 클래딩모드 결합을 이용한 광신호 검출장치 |
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