KR20090069542A - Flexible display device and method for fabricating the same - Google Patents

Abstract

A flexible display for preventing the recognition error of a camera by the interference of the light and a manufacturing method thereof are provided to reduce the generation of error without recognizing a key pattern of an optical camera by light which is diffusely reflected. A first buffer film is formed on a metal foil substrate(100). A reflection prevention pattern(121) is formed on the first buffer film. A second buffer layer is formed in the front side of the substrate including the anti-reflection pattern. A key pattern(122) is formed in order to be overlapped with the anti-reflection pattern at the upper part of the second buffer layer. The anti-reflection pattern includes a first anti-reflection pattern and the second anti-reflection pattern. A first key pattern is formed in order to be overlapped with the first anti-reflection pattern.

Description

Flexible display device and method for manufacturing the same

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flexible display. In particular, during the manufacturing process of a flexible display using a metal foil substrate, an exposure process is performed in equipment used in the process by diffuse reflection on the surface of the substrate, particularly in an exposure equipment where accurate alignment of the substrate is important. In the process of aligning the substrate to perform, it is to prevent the problem that the camera is misrecognized by the interference of light.

In accordance with the development of the information society, various flat panel displays have attracted attention in place of the conventional CRT (Cathode Ray Tube) for displaying visual information, and such flat panel displays have a plasma display panel (PDP) and a FED ( Field emission display devices (LCDs), liquid crystal display devices (LCDs), organic light emitting diodes (OLEDs), and the like.

Such flat panel displays generally include a flat panel display panel having a plurality of pixels in which two glass substrates made of glass are bonded to each other and arranged in a matrix form.

However, as a flat panel display device using a glass substrate made of glass that is heavy, fragile and difficult to deform, there is a limitation in implementing a ubiquitous display that is required to output desired image information anytime and anywhere. Have

Accordingly, development of a flexible display using a substrate made of a light and flexible material such as a plastic substrate is being actively developed.

However, in the case of a plastic substrate, when various processes for forming a pattern on the substrate are performed, there is a problem that the plastic substrate is vulnerable to the temperature environment of the process.

In order to solve this problem, the development of a flexible display using a flexible metal foil substrate (Metal Foil) has attracted attention.

Metal foil is used when a transparent display is not required, and a material of stainless steel, which can secure impact resistance and has high corrosion resistance, is mainly used.

As described above, in the flexible display implemented using the metal foil substrate, like the other flat panel display devices, a plurality of panels 20 are simultaneously formed on one metal foil substrate 10 and each panel is formed. Separate from the substrate.

In this case, the micro patterns formed on the panel may be formed by, for example, photolithography using photoresist.

To describe the photolithography method in more detail, first, after depositing a conductive layer, a photoresist is applied on the conductive layer, and then a specific portion is selectively exposed and the photoresist is selectively removed to form a photoresist pattern. .

Subsequently, the conductive layer exposed through the region where the photoresist has been removed is etched away, and then the photoresist pattern is removed to finally complete the micro pattern to be realized.

The micro-pattern finally formed on the panel by such a method is formed to have various layers, so it is important to maintain accurate alignment between the layers.

As such, in order to maintain accurate alignment between the layers, key patterns (22, 24 of FIG. 1), such as a plurality of alignment keys, are formed in the remaining area except the panel, that is, the dummy area, on the substrate. do.

For example, in addition to the alignment key for performing the exposure process among the photolithography process, the key pattern may be formed with an alignment key for performing a scribing process for separating each panel.

However, the following problem occurred when forming the key pattern on the metal foil substrate.

The metal foil substrate has a grain due to its material, i.e., the nature of the metal, so that the surface thereof is not smooth but has a rough surface. In order to smooth such rough surfaces, for example, a polishing process may be performed, but the metal foil substrate surface is not completely smoothed.

Therefore, in order to alleviate the surface roughness, as shown in FIG. 2, a method of forming the buffer film 12 on the metal foil substrate 10 has been proposed.

However, since the buffer film is formed of a transparent inorganic insulating film such as silicon oxide or silicon nitride, it is impossible to prevent diffuse reflection occurring on the rough surface of the substrate.

That is, the camera 50 that recognizes the key pattern 22 formed on the substrate recognizes the light A reflected from the key pattern and aligns the substrate. However, when diffuse reflection occurs on the surface of the substrate, the diffused light B ), The camera may not recognize the key pattern normally.

SUMMARY OF THE INVENTION An object of the present invention is to provide a flexible display and a method of manufacturing the same, in a flexible display using a metal foil substrate, which can reduce the malfunction of equipment generated in the alignment process due to the diffuse reflection on the rough surface of the metal foil substrate. do.

In order to achieve the above object, a flexible display according to an embodiment of the present invention,

A first buffer film formed on the metal foil substrate, an antireflection pattern formed on the first buffer film, a second buffer film formed on the entire surface of the substrate including the antireflective pattern, and an antireflective coating on the second buffer film And a key pattern formed to overlap the pattern.

Flexible display according to another embodiment of the present invention for achieving the above object,

A first buffer film formed on the metal foil substrate, an antireflection pattern formed on the first buffer film, and a key pattern formed on the antireflection pattern so as to overlap the antireflection pattern;

The anti-reflection pattern and the key pattern may be formed of materials having different etching ratios.

Flexible display according to an embodiment of the present invention,

By forming a key pattern in an area overlapping the anti-reflective pattern, when the optical camera is used to align with the key pattern, the occurrence of an error that the optical camera does not recognize the key pattern due to the light diffusely reflected from the metal foil substrate can be reduced. Has the effect.

Next, an embodiment of the present invention will be described in more detail.

Flexible display according to an embodiment of the present invention,

A first buffer film formed on the metal foil substrate, an antireflection pattern formed on the first buffer film, a second buffer film formed on the entire surface of the substrate including the antireflection pattern, and the reflection on the second buffer film And a key pattern formed to overlap the prevention pattern.

According to another aspect of the present invention, a flexible display includes: a first buffer layer formed on a metal foil substrate, a first antireflection pattern and a second antireflection pattern formed on the first buffer layer, and the first antireflection A second buffer layer formed on the entire surface of the substrate including the pattern and the second antireflection pattern, a first key pattern formed to have an area overlapping the first antireflection pattern on the second buffer layer, and the first key And an insulating film formed on the entire surface of the substrate including the pattern, and a second key pattern formed to have an area overlapping the second anti-reflective pattern on the insulating film.

The flexible display according to another embodiment of the present invention includes a buffer film formed on a metal foil substrate, an antireflection pattern formed on the buffer film, and a key pattern formed on the antireflection pattern. The material forming the antireflection pattern may have an etching ratio different from that of the material forming the key pattern.

Next, a flexible display according to an exemplary embodiment of the present invention will be described in detail with reference to the accompanying drawings.

3 is a cross-sectional view of the flexible display according to the first embodiment of the present invention.

As shown in FIG. 3, the flexible display according to the first exemplary embodiment of the present invention includes a first buffer layer 110a formed on the front surface of the metal foil substrate 100 and a first buffer layer 110a formed on the first buffer layer 110a. And an antireflection pattern 121, a second buffer layer 110b formed on the entire surface of the substrate including the antireflection pattern 121, and a key pattern 122 formed on the second buffer layer 110b. It is characterized by.

Although not illustrated, the flexible display is divided into an active area and a non-display area defined to surround the active area, and a gate line and a data line defining a pixel area are formed in the active area to cross each other. Pixels operated by switching elements formed at intersections of lines and data lines are arranged in a matrix form.

The switching element may be, for example, a bottom gate thin film transistor, that is, a gate electrode formed on a substrate, an insulating film formed to cover the gate electrode, and a channel region defined on the insulating film. A source electrode and a drain electrode formed on both ends of the electrode and disposed to face each other, and a semiconductor layer formed below the channel region, the source electrode, and the drain electrode.

The metal foil substrate 100 may be formed of, for example, stainless steel, and may have a flexibility to implement a flexible display. In addition, the metal foil substrate has a non-uniform and rough surface by metal-specific grooves.

The first buffer layer 110a may be formed of, for example, an inorganic insulating material such as a silicon oxide film or a silicon nitride film, or may be formed of an organic insulating material. The first buffer layer 110a serves to insulate the metal foil substrate 100 from various patterns formed on the substrate, and simultaneously cover the rough surface of the metal foil substrate to serve as a planarization layer. .

For example, the anti-reflection pattern 121 is formed on a dummy region except for an area where a panel is formed on a substrate on the first buffer layer 110 and is formed of a light blocking metal layer through which light does not pass. . In addition, if necessary, it may be formed in the non-display area inside the panel.

In addition, the anti-reflection pattern 121 may be formed of a resin-based black matrix.

In addition, the light shielding metal layer is preferably formed of a metal layer having a low reflectance such as a triple layer structure of chromium / chromium oxide film / chromium nitride film. It may also be possible to apply an anti-reflecting coating on the antireflective pattern.

In addition, the anti-reflection pattern may be formed in a rectangular or square shape, but is not limited thereto.

For example, the second buffer layer 110b may be formed of an organic insulating material so that the top thereof may be planarized, and may be formed of an inorganic insulating material.

The key pattern 122 is formed to overlap the anti-reflection pattern 121 on the second buffer layer 120. Further, the key pattern may be formed of the same layer as the gate line formed in the active region.

The key pattern may be formed in various forms such as, for example, a '+' shape, an 'x' shape, a '○' shape, and a '□' shape.

The key pattern may be formed in a pattern smaller than the size of the anti-reflection pattern. As such, when the size of the anti-reflection pattern is larger than the size of the key pattern, light incident on the optical camera may be blocked more effectively by diffuse reflection on the surface of the metal foil substrate 100.

As described above, the flexible display according to the first exemplary embodiment of the present invention forms a key pattern in an area overlapping the antireflection pattern.

When the optical camera is aligned with the key pattern, the optical camera may reduce an error in which the optical camera does not recognize the key pattern due to light diffusely reflected from the metal foil substrate.

In addition, in the flexible display according to the first exemplary embodiment of the present invention, the switching element of the active region of the panel provided on the substrate is based on the bottom gate method. Could be applied.

Next, a flexible display according to a second embodiment of the present invention will be described. 4 is a cross-sectional view of the flexible display according to the second embodiment of the present invention.

As can be seen in Figure 4, the flexible display according to a second embodiment of the present invention,

The first buffer layer 110a formed on the entire surface of the metal foil substrate 100, the first antireflection pattern 121a and the second antireflection pattern 121b formed on the first buffer layer 110a, and the The second buffer layer 110b formed on the entire surface of the substrate including the first anti-reflection pattern 121a and the second anti-reflection pattern 121b and the first anti-reflection pattern 121a on the second buffer layer 110b. ) And a first key pattern 122a formed to have a region overlapping with each other, an insulating film 130 formed on the entire surface of the substrate including the first key pattern 122a, and an upper portion of the insulating film overlapping the second anti-reflection pattern. And a second key pattern 122b formed to have an area to be formed.

The metal foil substrate 100 may also be formed of a stainless steel material having a flexible property. The surface of the metal foil substrate has a non-uniform and rough surface by metal-specific grooves.

The first buffer layer 110a may be formed of an inorganic insulating material or an organic insulating material such as a silicon oxide film or a silicon nitride film. In addition, the first buffer layer insulates between the metal foil substrate and various patterns formed on the substrate and is formed on the rough surface of the metal foil substrate to perform planarization.

The first antireflection pattern 121a and the second antireflection pattern 121b may be formed on the first buffer layer 110a and formed of the same layer, except for a display area in which a panel is formed on the substrate. The dummy region may be formed. Further, it may be formed of a light shielding metal layer through which light does not transmit, and preferably, a triple layer structure of a metal having a low reflectance, for example, a chromium / chromium oxide film / chromium nitride film. In addition, it will be possible to perform an anti-reflection coating on both the first anti-reflection pattern 121a and the second anti-reflection pattern 121b.

The first key pattern 122a is formed to have a region overlapping with the first anti-reflection pattern 121a on the second buffer layer 120. For example, the first key pattern 122a may be formed of the same layer as the gate line formed in the active region of the panel provided on the substrate.

In addition, the first key pattern may be formed in various shapes such as '+' shape, 'x' shape, '○' shape, and '□' shape.

Preferably, the first key pattern is formed to have a smaller size than the first anti-reflection pattern. That is, when the first key pattern is formed to completely overlap the first antireflection pattern, it is possible to more effectively reduce the occurrence of an error of the optical camera due to the diffuse reflection on the surface of the metal foil substrate.

The insulating layer 130 is formed to cover the entire surface of the substrate including the first key pattern 122a and is formed of the same layer as the gate insulating layer formed to cover the gate line of the active region. The insulating film is formed of a transparent inorganic insulating material such as a silicon nitride film or a silicon oxide film.

The second key pattern 122b is formed to overlap the second antireflection pattern 121b on the insulating layer 130 and is formed to have a size smaller than that of the second antireflection pattern.

In addition, the second key pattern may be formed of the same layer as the data line formed in the active region.

That is, the first key pattern is formed on the first antireflection pattern formed in the dummy area on the substrate, and is aligned with the first key pattern to form the second key pattern on the second antireflection pattern. can do. It is preferable that the process proceeds afterwards by being aligned with respect to the second key pattern.

In addition, the second key pattern may also be formed in various shapes such as '+' shape, 'x' shape, '○' shape, '□' shape, and preferably formed in a shape different from the first key pattern. It is desirable to be. For example, when the first key pattern is formed in the form of '+' and the second key pattern is formed in the form of 'x', the first key pattern is incorrectly recognized when the first key pattern is aligned based on the second key pattern. The case can be prevented.

As described above, when the flexible display according to the second exemplary embodiment of the present invention implements a flexible display having various stacking structures, when a key pattern used in an alignment process is formed of one or more layers to perform a precise process, The anti-reflection pattern is formed under the key pattern to prevent malfunction due to diffuse reflection on the surface of the metal foil substrate.

Next, a flexible display according to a third embodiment of the present invention will be described. 5 is a cross-sectional view illustrating main parts of the flexible display according to the third exemplary embodiment of the present invention.

As can be seen in Figure 5, the flexible display according to the third embodiment of the present invention,

The buffer layer 110 formed on the front surface of the metal foil substrate 100, the antireflection pattern 121 formed on the buffer layer 110, and the key pattern 122 formed on the antireflection pattern 121. The key pattern and the anti-reflection pattern are each formed of a material having a different etching selectivity.

The metal foil substrate 100 may be formed of a stainless steel material, which is also flexible, and has a non-uniform and rough surface by metal-specific grooves.

The buffer layer 110 may be formed of an inorganic insulating material, such as a silicon oxide film or a silicon nitride film, or an organic insulating material. The buffer film may insulate between the metal foil substrate and various patterns formed on the substrate, It is formed on the rough surface of the metal foil substrate to perform a planarization role.

For example, the anti-reflection pattern 121 is formed in a dummy region except for a region where a panel provided on a substrate is formed on the buffer layer 110a and is formed of a light blocking metal layer through which light does not pass. do. In addition, it is also possible to be formed in the non-display area formed to surround the active area in which the image is implemented in the panel as needed.

In addition, the light shielding metal layer is preferably formed of a metal layer having a low reflectance such as a triple layer structure of chromium / chromium oxide film / chromium nitride film. It may also be possible to apply an anti-reflecting coating on the antireflective pattern. In addition, the anti-reflection pattern may be formed in a rectangular or square shape.

The key pattern 122 may be formed on the anti-reflection pattern and have a smaller size than the anti-reflection pattern.

Further, it is preferable that the key pattern is formed of the same layer as the gate line formed in the active region of the panel provided on the substrate. The key pattern may have various shapes such as '+' shape, 'x' shape, '○' shape, and '□' shape.

In the flexible display according to the third embodiment of the present invention, the anti-reflection pattern 121 and the key pattern 122 are formed of a material having different etching selectivity, and have a structure in which the anti-reflection pattern 121 and the key pattern 122 are directly stacked without a separate buffer layer. This has the effect of having a simpler structure.

Next, a method of manufacturing a flexible display according to an embodiment of the present invention will be described.

In the manufacturing method of the flexible display according to the first embodiment of the present invention,

Forming a first buffer film on a metal foil substrate, forming a light shielding metal layer on the first buffer film, patterning the light shielding metal layer to form an antireflection pattern, and forming the antireflection pattern. And forming a second buffer layer to cover the substrate, and forming a key pattern on the second buffer layer to have a region overlapping with the anti-reflective pattern.

6A to 6D are cross-sectional views illustrating a method of manufacturing the flexible display according to the first embodiment of the present invention.

First, as shown in FIG. 6A, the first buffer layer 110a is deposited on the metal foil substrate 100.

The metal foil substrate 100 may be formed of, for example, a stainless steel material, and may have flexibility to implement a flexible display. In addition, the metal foil substrate has a non-uniform and rough surface by metal-specific grooves.

The first buffer layer 110a may be formed by, for example, forming an inorganic insulating material such as a silicon oxide film or a silicon nitride film by a plasma enhanced chemical vapor deposition method (PECVD), or by applying an organic insulating material and firing the same. will be.

The first buffer layer 110a may insulate between the metal foil substrate and various patterns formed on the substrate, and may be formed on the rough surface of the metal foil substrate to perform planarization.

Next, as shown in FIG. 6B, the light shielding metal layer 125 is deposited on the first buffer layer 110a.

The light shielding metal layer is preferably formed of a metal layer having a low reflectance such as a metal layer having a triple layer structure of chromium / chromium oxide film / chromium nitride film. In addition, after forming the light shielding metal layer, it may be possible to further include an anti-reflective coating on the light shielding metal layer.

Next, as shown in FIG. 6C, the light blocking metal layer is patterned to form an antireflection pattern 121. The anti-reflection pattern 121 may be formed in a dummy region except for a region in which a panel provided on the substrate is formed and may have a rectangular or square shape.

In this case, the anti-reflective pattern 121 may apply a photoresist on the light shielding metal layer, and then may use a blanking photo process in which the photoresist is exposed by setting only the coordinates of a blade without using a mask. It will be possible to form using.

7 is a diagram for explaining a blanking photo process.

As shown in FIG. 7, the blanking photo process uses blades 190a and 190b capable of blocking light emitted from the light source by moving in the x-axis and y-axis directions without using a separate mask.

It may be possible to selectively expose only the opened window region w, that is, the region where the antireflection pattern is to be formed. In this case, since the anti-reflection pattern does not need to be precisely formed, the anti-reflection pattern may be formed by a blanking photo process performed by setting only the coordinate values of the blade.

Although not shown, a photoresist pattern is formed by developing and removing photoresist in the remaining regions except for the exposed region, and selectively etching only the metal layer of the exposed light-shielding metal layer, and stripping the photoresist pattern on the remaining metal layer. It is removed through the process to form an antireflection pattern.

In addition, the anti-reflection pattern 121 may be formed of a resin black matrix. That is, after applying the black matrix photoresist, the photoresist may be selectively exposed to form.

In addition, the anti-reflection pattern 121 may be formed by an inkjet method. That is, since the anti-reflection pattern does not need to be precisely formed, it is also possible to set the coordinates of the ink jet nozzle to the area where the anti-reflection pattern is to be formed, move the nozzle, and then spray the ink jet resist material to form the anti-reflection pattern. It will be possible.

Next, as shown in FIG. 6D, a second buffer layer 110b is formed on the entire surface of the substrate to cover the antireflection pattern. The second buffer layer may be formed of an inorganic insulating material such as a silicon oxide film or a silicon nitride film, or may be formed by applying an organic insulating material.

Next, after the metal layer is formed on the second buffer layer, the metal layer is patterned to form a key pattern 122.

The key pattern may be formed to have a region overlapping with the anti-reflective pattern, and may be formed to have a smaller size than the anti-reflective pattern.

In addition, when the panel provided on the substrate is a bottom gate method, the key pattern may be formed of the same layer as the gate line formed in the active region. In addition, the key pattern may have various shapes such as '+' shape, 'x' shape, '○' shape, and '□' shape.

As described above, the method of manufacturing the flexible display according to the first exemplary embodiment of the present invention forms a key pattern for aligning the upper portion of the antireflection pattern, thereby preventing malfunction due to light that is diffusely reflected on the rough surface of the metal foil substrate. It has an effect that can be done.

Next, a method of manufacturing a flexible display according to a second embodiment of the present invention will be described with reference to the accompanying drawings. 8A to 8E are cross-sectional views illustrating a method of manufacturing the flexible display according to the second embodiment of the present invention.

First, as shown in FIG. 8A, after forming the buffer film 110 on the metal foil substrate 100, the first metal layer 126 and the second metal layer 127 are sequentially deposited on the buffer film. . Subsequently, a first photoresist 180 is coated on the second metal layer 127. In this case, the first metal layer and the second metal layer are formed of a material having a different etching ratio.

The first metal layer may be formed of a metal having a low reflectance in order to block light transmission and block light reflection.

Next, as shown in FIG. 8B, only an area for forming an antireflection pattern or the like is selectively exposed using the blade 190, and then an exposure process is performed.

As a result, the first photoresist is divided into an exposed region 180a and an unexposed region 180b, and the exposed region corresponds to a region where an anti-reflection pattern to be formed later is formed.

Next, after developing and removing the photoresist of the unexposed region 180b except for the region 180a exposed by the first photoresist, the exposed second metal layer and the first metal layer are sequentially etched. At this time, since the first metal layer and the second metal layer have different etching ratios, the first etching process of etching the second metal layer first and the second etching process of etching the first metal layer are sequentially performed.

As shown in FIG. 8C, the first and second metal layers except for the antireflection pattern 122 and the metal pattern 122c stacked on the antireflection pattern are removed.

Subsequently, a second photoresist 185 is coated on the entire surface of the substrate including the metal pattern 122c.

Subsequently, as shown in FIG. 8D, the second photoresist is selectively exposed to form the photoresist pattern 185a, and then only the metal pattern is selectively etched to form the key pattern 122. In this case, since the metal pattern and the anti-reflection pattern have different etching ratios, the anti-reflection pattern is not removed in the process of forming the metal pattern.

Next, as shown in Fig. 8E, the photoresist pattern is removed.

As described above, in the method of manufacturing the flexible display according to the second embodiment of the present invention, the antireflection pattern and the key pattern are formed of materials having different etch ratios, and thus, the diffuse reflection is performed without additional buffer layers. It provides the effect of manufacturing a flexible display that can prevent malfunction.

On the other hand, the present invention described above is not limited to the above-described embodiment and the accompanying drawings, it is possible that various substitutions, modifications and changes within the scope without departing from the technical spirit of the present invention. It will be apparent to those skilled in the art.

1 is a plan view showing a panel and key pattern arrangement of a conventional metal foil substrate.

2 is a cross-sectional view illustrating a problem of a conventional flexible display.

3 is a cross-sectional view of the flexible display according to the first embodiment of the present invention.

4 is a cross-sectional view of a flexible display according to a second embodiment of the present invention.

5 is a cross-sectional view of the flexible display according to the third embodiment of the present invention.

6A to 6D are cross-sectional views illustrating a method of manufacturing the flexible display according to the first embodiment of the present invention.

7 illustrates a blanking photo process.

8A to 8E are cross-sectional views illustrating a method of manufacturing the flexible display according to the second embodiment of the present invention.

Claims (13)

A first buffer film formed on the metal foil substrate; An anti-reflection pattern formed on the first buffer layer; A second buffer layer formed on an entire surface of the substrate including the anti-reflection pattern; And And a key pattern formed on the second buffer layer so as to overlap with the anti-reflective pattern. The method of claim 1, The antireflection pattern is composed of a first antireflection pattern and a second antireflection pattern, The key pattern is formed to overlap the second anti-reflection pattern on the first key pattern formed on the second buffer layer to overlap the first anti-reflection pattern, and on the insulating film formed on the entire surface of the substrate including the first key pattern. Flexible display, characterized in that formed in a second key pattern. The method of claim 2, The flexible display of claim 1, wherein the first key pattern and the second key pattern are formed to have different shapes. A first buffer film formed on the metal foil substrate; An anti-reflection pattern formed on the first buffer layer; And And a key pattern formed on the antireflective pattern so as to overlap the antireflective pattern. The method of claim 4, wherein The anti-reflection pattern and the key pattern is a flexible display, characterized in that formed of a material having a different etching ratio. The method according to claim 1 or 4, The first buffer layer is formed of an inorganic insulating material, and the second buffer layer is formed of an organic insulating material. The method according to claim 1 or 4, The anti-reflective pattern is formed of a metal having a low reflectance. The method of claim 7, wherein The metal having a low reflectance is formed of a triple layer structure of chromium / chromium oxide film / chromium nitride film /. The method according to claim 1 or 4, Flexible display, characterized in that the anti-reflection layer is further formed on the anti-reflection pattern. Forming a first buffer film on the metal foil substrate; Forming an anti-reflection pattern on the first buffer layer; Forming a second buffer layer on an entire surface of the substrate including the anti-reflection pattern; And And forming a key pattern overlapping the anti-reflective pattern on the second buffer layer. Forming a first buffer film on the metal foil substrate; Sequentially forming a first metal layer and a second metal layer on the first buffer layer; Selectively removing a portion of the second metal layer to form a metal pattern, and selectively removing a portion of the first metal layer to form an anti-reflective pattern under the metal pattern; And Selectively removing a portion of the metal pattern to form a key pattern, The first metal layer and the second metal layer is a method of manufacturing a flexible display, characterized in that formed of a material having a different etching ratio. The method of claim 10 or 11, The forming of the anti-reflective pattern may be performed by using a blanking photo process. The method of claim 10, In the step of forming the anti-reflection pattern, the anti-reflection pattern is formed of a resin black matrix using an inkjet method.

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