KR20090024688A - Apparatus and method for coating substrates with approximate process isolation - Google Patents

Abstract

Apparatus for coating a substrate may comprise two process compartments that flank a pump compartment. The pump compartment is in operable communication with the two process compartments and a pathway for pumping gas therefrom via pumps, and is sufficient for approximately isolating the gas associated with the one process compartment and the gas associated with the other process compartment relative to one another in association with a substrate coating process. The pump compartment may be so sufficient when the pathway length is less than two times the path length associated with one process compartment, the path length associated with the other process compartment, or the average of the two path lengths. Apparatus for pumping gas associated with a substrate coating process and methods associated with coating a substrate or pumping gas are also provided.

Description

APPARATUS AND METHOD FOR COATING SUBSTRATES WITH APPROXIMATE PROCESS ISOLATION

The present invention relates to an apparatus and method for coating a substrate with near process isolation.

Apparatuses and methods for coating substrates relate to a variety of useful applications. By way of example, apparatus and methods using vacuum and various process gases in the coating of large substrates, such as large glass sheets, are involved for some time. Large substrates, such as architectural glass sheets, may be coated with various materials for their optical, thermal and / or aesthetic quality modifications. For example, optical coatings can be used to reduce transmission of visible light, reduce energy absorption, reduce reflectivity, and / or seek any combination of properties. Such optical coatings may be referred to as sun control coatings, low emissivity coatings, antireflective coatings, and / or multipurpose coatings, respectively. US Patent No. entitled “Non-reflective coatings and related methods”. 6,589,657 and "Optical Coatings and Related Methods" 2003/0043464, each incorporated herein by reference, discloses the formation and use of coatings that affect the optical properties of glass substrates.

Generally the coating system comprises a coaer and includes some connected remote units. A coater (also called a coating system) generally includes a plurality of process modules, or chambers, arranged in series so that the substrate or substrates can pass from one process module to the next. The substrate is generally supported and moved through the coater along the substrate pass line in the up-to-down direction by rollers. Generally, the substrate enters the coater at one end or at the upstream end, and the substrate passes through a plurality of process modules coated with materials or different materials, leaving the coater at another end, or downstream end. The substrate may be oriented parallel or nearly parallel and oriented to move along a horizontal or nearly horizontal plane through the coater, vertically or nearly perpendicular and oriented to move along a vertical or nearly vertical plane through the coater, or otherwise oriented, You can move along.

Coating of large substrates can be problematic. For example, architectural glass is made from large sheets that are typically measured at 3.2 meters by 6 meters (126 inches by 236 inches), which can make processing and processing in coating systems difficult. For example, a coating system suitable for coating large substrates such as architectural glass can be hundreds of feet in the direction of the substrate pass line, occupy a significant amount of area in the processing facility, House, operation and maintenance can be very expensive.

1 is a schematic illustration of a coating machine 2 that can be used to coat a substrate 4, such as a large substrate as described immediately above, or to coat several such substrates. The figure shows an elevation view of the top, side and downstream ends of the coater, and the substrate 4 is discharged from the downstream end of the coater. The coater 2 may have a plurality of process modules, such as process modules A and B arranged in series as shown, through which the substrate 4 is moved in the upstream-to-downstream direction As shown schematically in the direction). In this example, the substrate 4 has a horizontal orientation, moving along the horizontal plane through the process modules of the coater 2, as shown. The coater 2 may have a plurality of slit valves located between the process modules and the slit valves may be located within the chambers, such as the slit valve chambers 6, 8, 10 shown in Fig.

2 provides a more detailed schematic view of some of these coaters. This figure shows the coater 2 from an elevational view of the same side of the coater in relation to FIG. 1, the top of the coater and a portion of the coater proximate the upstream end of the coater facing the downstream end mentioned in relation to FIG. 1. In this figure the coater 2 comprises a process module A consisting of six compartments 14 or bays including a slit valve chamber 6, compartments A5 and A6, (B) consisting of several compartments (14) including a compartment (8), and compartments (B1, B2). The coater 2 may include several rollers 10 to move the substrate or substrates (not shown) along the substrate pass line 12, the substrate or substrates being up-to-down along the path. Travel through the coater in the direction (shown schematically by the arrow in relation to the substrate pass line). In this figure, the rollers 10 are located in each of the compartments. The rollers 10 may have a substrate width of from about 1000 mm to about 3300 mm to a width suitable for supporting the entire width of the substrate or substrates, for example from about 1000 mm to about 4210 mm (see CW) (FIG. 2) parallel to the substrate passage lines, which are larger or smaller in width, and suitable for supporting the substrate or substrates, according to the invention (Figure 1) It can have a separation interval of (not more than). In general, all the rollers 10 in the coater 2 can rotate at about the same speed and the movement of the substrate or substrates through the coater can be at a substantially constant speed.

The slit valves of the slit valve chambers separating the process modules can be opened to allow substrate passage from one process module to another process module during processing. Thus, the process module is in fluid communication with a plurality of neighboring processing modules through a slit valve opening through a neighboring process module or through a plurality of slit valve openings. Such fluid communication can be reduced in various ways. For example, the slit valve opening or openings may be sized to a feasible or feasible range, for example allowing passage of a substrate, to reduce such fluid communication between process modules. Also, for example, the gap or space between the substrates passing along the substrate pass line may be implemented to a feasible or feasible range to reduce the amount of fluid that can be transported by or at the substrate pass line along the substrate pass line. May be limited.

Each of the process modules of the coater may consist of a plurality of compartments 14. The number of compartments 14 per process module may be the same or different. As such, the dimensions of the process module extending from the entrance of the process module to the exit and parallel to the substrate pass line may be the same as other process modules (as shown in FIG. 1) or may differ from other process modules. . In a conventional manner, a dimension parallel to the substrate pass line may be considered a "length" even if it is not the longest dimension of that item. (See, for example, the length AL of the process module A and the length BL of the process module B of FIGS. 1 and 2.) The compartments of the process modules are, for example, length (eg For example, about 600 mm to about 1005 mm), width (eg, about 1000 mm to about 4210 mm), depth (eg about 350 mm to about 1000 mm), and volume (eg, about 0.2 m ³ to about 3 m ³ ) may be uniform, such that the configuration and / or reconstruction of the process modules, and the entire coater, may be facilitated, as indicated by compartments 14 of FIG. 2. Compartments can be used for similar or different purposes. For example, the compartment can be used for a process such as substrate coating in the process compartment. Also as an example, the compartment may be used for other or additional purposes, such as pumping through one or more pumps operatively coupled with the pump compartment. Process compartments with different functions, such as deposition or coating compartments and pumping compartments, are interchangeable.

1 and 2 can be used in a coating process involving the sputtering of a target material from a cylindrical or planar target on a substrate as the substrate moves past the target. Sputtering of target materials on large substrates may involve the use of cooling water for proper thermal control, such as, for example, overheating prevention, and the use of high power electrical supplies suitable for sputtering. Systems and methods for depositing materials through cylindrical targets or magnetrons are described in U.S. Cylindrical AC / DC Magnetrons with Complementary Drive Systems and Improved Electrical and Thermal Isolation. Patent No. 6,736,948 is disclosed. Systems and methods for depositing materials through planar targets or magnetrons are described in U.S. Pat. Patent No. 4,166,018.

Generally sputtering takes place in a vacuum environment. In this regard, the term “vacuum” may be considered a gas at any pressure below atmospheric pressure. Generally, the sputtering process for glass coating takes place in the millitorr range. In sputtering processes of large glass sheets, the sheets move past the target in a vacuum while the target rotates and the target material is sputtered. The process involves maintaining a vacuum environment suitable for sputtering while moving parts in a vacuum environment. In some sputtering processes, gas can be injected into the sputtering compartment so that reactive sputtering occurs. In general, reactive sputtering involves the interaction or reaction of the gas with the target material sputtered to form a layer on the substrate. The amount of gas that can be injected in the sputtering process is generally small so that the process pressure remains below atmospheric pressure and the process compartment can be considered to be vacuum.

In the coater of FIG. 2, process compartments with different functions, such as deposition or coating compartments and pumping compartments, may be interchanged. For example, in such a coater, compartments A5 and B2 may be process compartments used to deposit material on a substrate, for example by sputtering, and compartments located between process compartments A5 and B2 A6 and Bl may be pump compartments used to provide a suitable vacuum. 3 is a schematic view of a portion of the coater 2 seen from the side of the coater shown in vertical section. As shown, from upstream to downstream, the coater 2 includes a pump compartment A6 associated with the process module A, a slit valve chamber 8, and a pump compartment B1 associated with the process module B do. Each of the pump compartments A6, Bl is equipped with several rollers 10 mentioned above, as well as pumps 16, 18, which are respectively located on top of the pump compartment. Each of the pump compartments A6, Bl is typically equipped with one or more pumps 16, 18, respectively. Each of the pumps 16, 18 may be further combined with a backing pump or several auxiliary pumps (not shown).

As mentioned above, the process module may be in fluid communication with a neighboring process module or a plurality of neighboring processing modules. As a result, gas may flow between neighboring process modules, such as process modules A and B of FIGS. 1-3. In general, it is desirable to reduce, minimize or eliminate this gas flow between process modules during processing. In particular, this is the case when processes associated with process modules are not sufficiently compatible or incompatible. In general, incompatible processes do not run in the same process module, but they can run in adjacent process modules.

Similarly, the process compartment may be in fluid communication with a neighboring process compartment or a plurality of neighboring processing compartments. This allows gas to flow between neighboring process compartments such as process modules A5 and A6, A6 and Bl, Bl and B2 in FIG. 2. In general, such gas flow between process compartments during processing is preferably reduced, minimized or eliminated. In particular, this is the case when processes associated with process modules are not sufficiently compatible or incompatible. In general, incompatible processes are not executed in the same process module, but they can be executed in process compartments separated by pump compartments. For example, the process compartment used in the reactive sputtering process using an oxygen environment to create an oxide layer can be located upstream or downstream relative to the process compartment used for processes sensitive to oxygen presence or oxygen contamination. In this case, or in any other case, each of the pump compartments and associated pumps may be located between two process compartments, each being used on one side and another side of the slit valve chamber, or used side by side, It can reduce gas flow or contamination between process compartments. In this way, a gas or contaminant or a sufficiently equal amount associated with one process compartment may be pumped from the coater before reaching the adjacent process compartment or slit valve chamber.

The process compartment A5 and the pump compartment A6 are configured in the process module A and the pump compartment B1 and the process compartment B2 are configured in the process module B as shown in Fig. And when the process module A and the process module B are disposed on opposite sides of the slit valve chamber 8, the pump 16 associated with the pump compartment A6, as shown in Figure 3, It can be used to reduce the amount of gas reaching or diffusing to the slit valve chamber 8 from A6, and the pump 18 associated with the pump compartment B1, as shown in FIG. 3, from the pump compartment B1. It can be used to reduce the amount of gas that reaches or diffuses into process compartment B2. Each of the pump compartments A6, Bl and the associated pumps 16, 18 may reduce the flow of gas from the process compartment A5 to the process compartment B2, or provide a certain level of gas isolation between these process compartments. May be used to provide. Previous systems and methods utilizing the configuration of at least two pump compartments, associated pumps, and slit valve chambers have been used to provide some level of gas isolation between neighboring process compartments and / or modules.

Overall, improvements in apparatus, systems, and methods for coating substrates are needed.

An apparatus for coating a substrate to be passed is provided. The apparatus may include a process compartment sufficient for passing the substrate through the path and coating the substrate through the gas, another process compartment of similar characteristics, and a pump compartment disposed between the two process compartments. For each process compartment, the length of the path may extend from the inlet to the outlet of the process compartment. The gases used in the two process compartments may be the same or different. The pump compartment is sufficient to pass the substrate through a length of passage extending from the inlet to the outlet of the pump compartment. The passageway is in operative communication with a path associated with the two pump compartments.

In the apparatus described above, the pump compartment is operatively in communication with the passageway for the pumping gas via the pumps and the two process compartments. The pump compartment is sufficient to approximately isolate the gas associated with one process compartment and the gas associated with another process compartment relative to each other with respect to the substrate coating process. The pump compartment is sufficient when the passage length is less than twice the path length associated with one process compartment, the path length being associated with another process compartment or the average of two path lengths. The apparatus may be sufficient so that the pressure of the gas associated with one process compartment and the ratio of gas associated with another process compartment is provided about 35 to 1 with respect to the substrate coating process.

A method of pumping gas from an apparatus for coating a substrate to be passed is provided. The method may include providing the apparatus described above and pumping gas from a path and two process compartments through pumps in connection with a substrate coating process. Pumping may be sufficient to approximately isolate the gas associated with one process compartment and the gas associated with another process compartment with respect to the substrate coating process.

Also provided is a gas pumping apparatus associated with a substrate coating process. The device may comprise a pump compartment and high vacuum pumps. The pump compartment is operably configured with a process compartment adjacent to one side of the pump compartment and another process compartment adjacent to another side of the pump compartment. The process compartment on one side has a first length and the process compartment on the other side has a second length. The pump compartment has a passageway for passage of the substrate through the pump compartment. The passage length is less than twice the length associated with one process compartment, which is associated with another process compartment or is the average of these two lengths. The high vacuum pumps are operatively coupled with the pump compartment and are sufficient to approximately isolate the gas associated with one process compartment and the gas associated with another process compartment relative to each other with respect to the substrate coating process. These gases may be the same or different.

A gas pumping method associated with a substrate coating process is provided. The method may include providing the apparatus described above, pumping gas from a passageway, one process compartment and another process compartment via a pump associated with a substrate coating process. The pumping may be sufficient to approximately isolate the gas associated with one process compartment and the gas associated with another process compartment with respect to each other relative to the substrate coating process.

A single pump compartment may be sufficient to provide acceptable gas isolation levels between process or coating compartments, if desired or as desired. When used in a coater, such a single pump compartment may correspond to a gas isolation ratio of about 20 or more, such as, for example, about 35 to 1. The use of a single pump compartment is a large, multi-module coater used to coat a substrate having five or more layers of material, such as, for example, six to eight layers of material, in which significant amounts of gas isolation compartments are used. In this regard, it is desirable in terms of reducing equipment cost, coater footprint, configuration time and effort, operating time and effort, and coater complexity and / or the like. Various multi-module coaters include a configuration of three compartments or bays that are contacted by a single pump by two coating compartments, for example as disclosed herein.

Various other features, features and embodiments of the invention are described below.

Description of various aspects, features, and embodiments is provided with reference to the accompanying drawings, which are briefly described below. The drawings are exemplary and need not necessarily be drawn to scale. The drawings, in whole or in part, represent one or more embodiment (s) or example (s) and illustrate various background materials or various aspects or features. Reference numerals, letters, and / or symbols used in one figure may be used in another figure considered to be a similar member or feature.

1 is a schematic diagram of a modular coater from the perspective disclosed in the present invention.

2 is a schematic illustration of a cut plane of a modular coater, in which some internal features have been visualized for illustration purposes in view of the disclosure herein.

3 is a schematic view of the cut plane of the modular coater as seen from the side of the coater, shown in a vertical section.

4A is a top view of the coater, showing a partial schematic of a modular coater. 4B is a schematic view of a portion of the modular coater as seen from the side of the coater, shown in vertical section. 4A and 4B may be considered collectively as FIG. 4 herein.

5A is a schematic diagram of the structure of a modular, compartment-type coater from the perspective disclosed herein. 5B is a schematic view of the cut of the modular, viewed from the top of the coater, shown in a horizontal cross-sectional view. 5C is a schematic view of the cutout of the modular coater as seen from the side of the coater, shown in vertical section. Figures 5A, 5B and 5C can be collectively considered Figure 5 in the present invention.

6A is a schematic view of the cutout of the modular coater as seen from the top of the coater, shown in a horizontal cross section. 6B is a schematic view of the cutout of the modular coater as seen from the side of the coater, shown in vertical section. 6A and 6B may be considered to be totally FIG. 6 in the present invention.

7A is a schematic view of the pump compartment as seen from the top of the compartment, shown in a horizontal cross section. 7B is a schematic view of the pump compartment shown in vertical section, seen from the end of the compartment. 7A and 7B can be considered to be totally FIG. 7 in the present invention.

8A is a schematic diagram of a pump compartment, shown in a horizontal cross section, as seen from the top of the compartment. 8B is a schematic view of the pump compartment as viewed from the compartment end, shown in one vertical section. 8C is a schematic view of the pump compartment as seen from another end of the compartment, shown in another vertical section. 8A, 8B and 8C may be considered to be totally FIG. 8 in the present invention.

In the present description, it is to be understood that, unless implicitly or explicitly recognized or otherwise stated, words expressed in singular form include a plurality of equivalents, and words represented by a plurality comprise singular equivalents. In addition, for any given part disclosed in the present invention, any possible candidates or alternatives listed for that part are generally referred to separately or in cooperation with each other, unless implicitly or explicitly recognized or otherwise stated. Can be used. In addition, it is to be understood that the list of any such candidates or alternatives is not limited to merely illustrative, unless implicitly or explicitly recognized or otherwise mentioned. Furthermore, any drawings or numbers or amounts presented in the present invention are approximations and any nominal range, unless implicitly or explicitly recognized or otherwise stated, means that the word " inclusive " It will be understood that, including or not used, includes the minimum and maximum number defining the range. It is also to be understood that the headings used arbitrarily are for convenience and not limitation. In addition, any permissive, open, or open-ended language, unless it is implicitly or explicitly recognized or otherwise referred to, It will be appreciated that relative acceptable, less open to closed language, or closed-end includes less open-end to the language. By way of example only, the word “comprising” may be of the type “comprising,” “consisting essentially of,” and / or “consisting of.” It may include a language.

Various terms are used and disclosed in the present invention to assist in understanding the present invention. It will be understood that the use of these terms or their corresponding general descriptions apply to linguistic or grammatical variations or forms of these various terms. In addition, it will be understood that any terminology use or corresponding general description herein may not apply, or may not apply, fully when the term is used in a generic or more specific manner. It is also to be understood that the terminology used in the description of the invention or in the description of the invention for the purpose of describing particular embodiments is not limited. It is also to be understood that the embodiments or applications disclosed herein are not limited and may vary.

As shown in FIG. 4, the coater 40 may include at least one process module 42 having a plurality of compartments or bays 44. The module coater can be configured in any manner, such as process compartments and pump compartments set to uniform size and cannot be calibrated for reconstruction. For example, the modular coater 40 may have a pump compartment P, another pump compartment P, a plurality of process or coating compartments, such as such three compartments, from upstream to downstream end. (CCC), and the process modules 42 of the set configuration of the additional pump compartment P, a set configuration of six compartments 44 (eg PPCCCP) can be formed. A coater for large substrates, such as architectural glass, may be constructed after another such process module. For example, U.S. Patent Application No. entitled "Dual Gate Isolation Maintenance Slit Valve Chamber with Pumping Option" referenced in the present invention. Suitable slit valves or slit valve chambers, such as those disclosed in 11 / 150,360, are shown and described with reference to FIGS. 5-9 of the present application and can be used between adjacent process modules.

Thus, the entire coater may have a set configuration of adjacent process modules (PPCCCP / PPCCCP / PPCCCP, etc., PCCCPP / PCCCPP / PCCCPP, etc., or the like, as shown). Thus, as shown in FIG. 4, such a multi-module coater comprises a configuration of five compartments or bays (CP / PPC, CPP / PC, or the like, as shown). Each of the two compartments 46, 50 arranged adjacent to the coating compartment of the multi-modular configuration (CP / PPC, as shown) is associated with the pump compartments 46, 50 As schematically indicated by the arrows, it can be used to pump adjacent coating compartments, arranged between two pump compartments 46 and 50 in a multi-modular configuration, the remaining pump compartments called so-called isolation bays ( 48 are used for pumping the passages (not shown) associated with the passage of the substrate past the pump compartments 46, 48, 50. Baffling in isolation bay 48 such that portions of the isolation bays or half bays are individually pumped, as schematically indicated by arrows in connection with isolation bays 48 shown in Fig. ) 52 may be used. In addition, the baffle 52 can be considered an internal plenum that creates insulated tunnels within the pump compartment 48. Each of the pump compartments can be equipped with two diffusion pumps 54, which, due to the large footprint, can be supported vertically on each end of the compartment, as shown.

In the modular coater described above, the diffusion pumps 54 are generally high speed hot oil vacuum puffs, which are advantageous over turbo molecular pumps in terms of relatively high pump capacity or pump speed and low cost, This is disadvantageous compared to turbomolecular pumps in terms of relatively high power requirements (eg 9 kW per pump) and large footprints. By way of example only, a hot oil pump, which may have a capacity of, for example, about 9000 liters per second, is particularly suitable for large footprints in view of the associated trenching, which is generally located along the sides of the coating system to accommodate the height of the pump. Related. Such large footprints are associated with equipment costs. Also, for example, oil contaminants generally associated with hot oil pumps occur only during a failure mode, but this is related to labor-intensive cleaning and another equipment cost.

In such a modular coater, at least three full pump compartments (e.g., P / PP) are used to provide an acceptable gas isolation level between the process or coating compartments, if desired or required. As shown in Figure 4B, each fluid communication or gas conductance slot 55,57, 59 associated with each of the three full pump compartments 46, 48, 50 is of a length of about 200 to about 300 millimeters Corresponding. Such conductance slots may be considered conductance tunnels. When the gas isolation ratio is the ratio of the gas pressure upstream of the coating compartment of the three pool pump compartments to the gas pressure downstream of the coating compartment of the three pool pump compartments, the gas isolation ratio of about 20 to about 30 to 1 is converted into such a modular coater. And the processing pumping is done in the pump compartments 46 and 50 and the gas isolation pumping is done via the half bays 47 and 49 to the gas conductance slots 55,57 and 59 as shown It is made in a pump compartment 48 that includes access. As mentioned above, an appropriate baffle 52 can be used to facilitate gas isolation, which baffles block access to gas conductance slots on the near side of the compartment (lowermost shown in FIG. 4A), Provides access to the gas conductance slots 55, 57 on the half-bay 47 on the far side of the compartment (the top shown in FIG. 4A) and provides access to the gas conductance slots 55, 57 on the far side of the compartment Blocking access, provides half bay 49 with access to gas conductance slots 57, 59 on the near side of the compartment (lowermost shown in FIG. 4A).

Modular coaters can be designed for great flexibility in terms of construction and reconstruction. An example of such a modular coater is a VAC 870 coater commercially available from Applied Films Corporation (Fairfield, Calif.). A schematic diagram of the structure 64 of the modular coater 60 is shown in FIG. 5A from an elevation of the top, side, and downstream ends of the coater. As shown, the compartments 62 may be substantially uniform in size to facilitate configuration and / or reconstruction of the process modules and the entire coater. As such, coater 60 may be considered a modular, compartment-type coater. Compartments 62 may be used for similar or different purposes, depending on whether the coating, pumping or other desired purpose. The structure 64 of the compartment coater 60 is shown in an open structure without top structures or covers and without end structures or covers for the compartments 62. The open structure 64 may be constructed or reconfigured in a manner that is appropriate for a particular application by simply adding superstructures and end structures that are highly flexible and suitable for immediate application. Merely by way of example, an upper structure (not shown) that closes or seals the upper portion of the compartment 62, while allowing access to the compartment, such as pump access, and similarly, access to the compartment, For example, an end structure (not shown) may be added to the open structure to close or seal the end of compartment 62 while allowing pump access. By way of example only, modules, such as pump modules or coating modules, may be compartmentalized, such as, for example, Philip M. Co., entitled “Modular Coating System” as of May 20, 2005, referenced herein. United States Provisional Patent Application No. filed by Petraci. No. 60 / 682,985 and May 8, 2006 named Philip M. Modular and Related Technologies for Coating Systems. It may be combined with the top of the compartment disclosed in co-pending US patent application No .__ / __, __ filed by Petraci. As shown, each of the compartments 62 of the open structure 64 includes openings or slots 66 for passage of the substrate through the compartment and associated openings or slots for fluid communication associated with the compartment, Include.

By way of example, the modular coater 60 may include a pump compartment P, a plurality of coating compartments, such as two coating compartments CC and another pump compartment P, from the upstream end to the downstream end, Composed of process modules 62 in a set configuration, a set configuration of six compartments 62 (eg, PCCPCC) may be formed as shown in FIG. 5A. In this case, when one pump compartment is in contact with adjacent coating compartments and one is upstream of the pump compartment and another is downstream of the pump compartment, the pump compartment pumps the process gas from the upstream side downstream. Enough to do In this case, however, a single pump compartment may allow an acceptable or desired gas sequestration associated with a gas sequestration ratio of about 5 to 1 at the most, especially if the upstream process gas and the downstream gas are different or incompatible. Not enough to provide it.

In addition, for example, large substrates, such as architectural glass coaters, may each be configured after another in the same or different configurations of coating and pump compartments, such that all coaters are formed of adjacent process modules. Have a set configuration (eg, PCCPCC / PCPPCP / PCCPCP, etc.). When one pump compartment is in contact with adjacent coating compartments, one on the upstream side and the other on the downstream side, the pump compartment is not sufficient to provide acceptable or desired gas isolation as described above. However, as shown in Figures 5B and 5C, when two adjacent pump compartments are in contact with adjacent coating compartments, one on the upstream side and the other on the downstream side, the two pump compartments, Gas isolation may be provided.

The modular compartmental coater 60, partially shown in FIGS. 5B and 5C, is downstream at the upstream end of the process or coating compartment 70, two pump compartments 72, 74, and another coating compartment 76. It may comprise an arrangement of four compartments or bays (eg, CPPC, C / PPC, or CPP / C) at the end. As shown in FIG. 5C, by way of example only, a suitable slit valve 63 or slit valve chamber may be used between adjacent process modules, as described above. Each of the pump compartments 72, 74 may be equipped with six turbomolecular pumps 82, such as generally high vacuum spinning rotor pumps that may be supported at the top of the compartment. 5, each of pump compartments 72 and 74 includes two half-bays, one adjacent to the coating compartment on which three pumps 82 are mounted for pumping of adjacent coating compartments, A half bay 78 and another half bay 80 adjacent to the aforementioned half bay 78 with three pumps 82 mounted for pumping passage 86 associated with passing the substrate through the compartment. can do. For example, one half-bay 78 (left half-bay 78 in Figures 5B and 5C) can be used to pump an adjacent coating compartment 70 containing a cathode or target, and another half- 78) (right half bay 78 in FIGS. 5B and 5C) may be used to pump adjacent coating compartment 76 comprising a cathode or target. Pumping of the coating compartments can be accomplished through openings or slots 68, as described above. Appropriate baffles 88 may be used in the pump compartments 72, 74 so that portions or half bays of these compartments can be pumped separately. As another example, one half-bay 80 (right half-bay 80 in Figures 5B and 5C) may be used to pump the path between the conductance slot 71 and the conductance slot 73, Another half bay 80 (right half bay 80 in FIGS. 5B and 5C) may be used to pump the passage between conductance slot 73 and conductance slot 75. Pumping of passage 86 may be accomplished through openings or slots 84. Appropriate baffles 89 may be used within pump compartments 72 and 74 to individually pump portions of the passageway or various conductance slots.

In the modular compartment coater described above, two full pump compartments 72, 74 can be used in combination with conductance slots 71, 73, 75 to provide proper gas isolation. Conductance slots 71, 73, 75 may be lengths that may be the same, approximately the same, or different, as shown in FIG. 5C. Conductance slot lengths, or the total length of conductance slots, may be factors that determine the gas isolation rate associated with pump compartments 72, 74, or their half bays. The length of the conductance slot may be from about 400 millimeters to about 500 millimeters, and the total length of the three conductance slots may be about 1450 millimeters (about 150 millimeters of each of the two openings or gaps between adjacent conductance slots is not included Gas isolation ratio ranges from about 20 to about 30 to 1, related to the pumping capacity associated with the two openings 84 or the number of pumps used.

In the modular compartment coater described above, the turbo molecular pumps 82 are generally preferred over diffusion pumps in terms of relatively low power requirements (e.g., less than 1 kW per pump) and small footprints, It is not preferred over diffusion pumps in terms of pump capacity or pump speed and high cost (eg 2.5 times more expensive). By way of example only, since the turbomolecular pumps are mounted on top of the compartment, there is no side-mount trenching and associated footprint, such as associated with diffusion pumps. In the modular compartment coater described above, at least two full pump compartments may be used between the process or coating compartments to provide an acceptable gas isolation level, if desired or necessary. The two full pump compartments 72, 74 of FIG. 5 may have a length of from about 1400 to about 1800 millimeters and a gas isolation rate of from about 25 to about 35 to 1, such as from about 25 to about 30 to 1, for example. Correspondingly, the gas isolation ratio is the ratio of the gas pressure in the adjacent coating compartment 70 to the gas pressure in the adjacent coating compartment 76.

The multi-module coater 90 shown in Figs. 6A and 6B may be coupled to the process or coating compartment 92, the pump compartment 94 and another coating compartment 96 from the upstream end to the downstream end 3 Compartments or bays (eg, CPC, C / PC or CP / C). The substrate may pass through the coater 90 and the pump compartment 94 via the gaps or slots 114 at the sides of the pump compartment 94. If the substrate to be coated is thin, such as, for example, a thin sheet of glass, the slot 114 is only slightly larger than the thickness of the glass, and at a working pressure used in the coating process, a narrow slot can effectively interfere with gas flow .

The pump compartment 94 may be equipped with six turbomolecular pumps 102 and two pumps 104, which may be supported at the top of the compartment, one of the two pumps 104 being the It is supported at one end and the other at the other end of the compartment vertically. The pump compartment 94 includes one half bay 98 adjacent to the coating compartment 92 on which the two turbo molecular pumps 102 are mounted for pumping two half-bays or coating compartments 92, And another half bay 100 adjacent to the aforementioned half bay 98 and a coating compartment with three pumps 102 mounted to pump the coating compartment 96. Pumping of the coating compartments can be accomplished through openings or slots 112 as shown collectively in FIG. 6 and disclosed above. Diffusion pumps 104 coupled with pump compartment 94 may be used for pumping passage 106 associated with passage of the substrate through the compartment, as shown collectively in FIG. 6. Diffusion pump 104 may be coupled with half bay 98 and another diffuse pump 104 may be coupled with half bay 100, as shown collectively in FIG. 6. Pumping of passage 106 may be accomplished through openings or slots 108, as described above. A suitable baffle ring 110 and a suitable baffle ring 111 are utilized within the pump compartment 94 such that portions of the half bays of the compartments are individually pumped and portions of the passageway or various conductance slots are individually pumped Can be.

In the coater described above, a single pump compartment 94 may be used to provide adequate gas isolation associated with three conductance slots (not shown). The conductance slots are configured in a manner similar to the conductance slots 201, 203, 205 of FIG. 7B disclosed herein. The lengths of the conductance slots may be the same, substantially the same, or different as shown in FIG. 7B. The conductance slot lengths, or the overall length of the conductance slots, can be an important factor in determining the gas isolation rate associated with the pump compartment 94, or their half-bays. By way of example only, the length of the conductance slot may be about 200 to about 300 millimeters, such as, for example, about 250 millimeters, and the total length of the three conductance slots may be about 700 millimeters to about 900 millimeters, such as, for example For example, about 770 millimeters (not including two openings or the length of each of the gaps (about 150 millimeters) between adjacent conductance slots), and the range of gas isolation rates may be the number of pumps used or two openings Depending on the pumping capacity associated with 222), it may be about 20 to about 35 to 1, such as, for example, about 20 to about 30 to 1.

In such coaters, a single pump compartment may be used to provide acceptable gas isolation levels between processes or coating compartments, if desired or required. The single silane conductance length associated with this compartment corresponds to a length of about 200 to about 250 millimeters. When used in a coater, a single pump compartment is considered to correspond to a gas isolation ratio of at least about 20 to 1, such as, for example, about 35 to 1. The use of a single pump compartment in the manner described above is particularly advantageous in terms of equipment cost, coater footprint, configuration time and effort, operating time and effort, and reduced coater complexity and / or the like, For example, with respect to those used to coat a substrate having five or more layers of material, such as, for example, six to eight layers of material, for example, a number of gas isolation compartments are used or used.

As mentioned above, a variety of multi-module coaters can be used, including the configuration of three compartments or bays, where a single pump compartment is abutted by two coating compartments. According to the embodiments shown in FIGS. 7A and 7B, this single pump compartment 200 includes two half bays, one fave bay 202, which can be positioned adjacent to the coating compartment (not shown) It may include another half bay 204 adjacent to the aforementioned half bay 202 which may be located adjacent to another coating compartment (not shown). The substrate (not shown) to be coated may pass through the pump compartment 200 via a gap or slot 224 associated with the sides of the pump compartment, as previously described. Each of the half bays 202, 204 may be equipped with three turbomolecular pumps 206, which may be supported at the top of the half bay for pumping adjacent coating compartments. Each half bay may be equipped with a diffusion pump 208, which, as shown collectively in FIG. 7, may be used to pump the passageway 216 associated with passage of the substrate through the compartment, The two turbo molecular pumps 206 and the end 212 of the half-bay, which can be supported at the end 214 of the half- In Figure 7A, two turbo molecular pumps 206 are shown coupled to each half bay, only the diffusion pump 208 associated with the half bay 202 is visible, and only one turbo per bay Only molecular pump 210 can be seen. Pumping of the adjacent coating compartments (not shown) and passageway 216 may be accomplished through apertures or slots 220, 222, respectively, as previously described. Suitable baffle rings 218 and suitable baffle rings 219 are used in pump compartment 200 so that portions of the half bays of these compartments are individually pumped and portions of the passageway or various conductance slots are individually pumped Can be.

In the coater described above, the single pump compartment 200 may be used with a single pump compartment 200 to provide adequate gas isolation with respect to the three conductance slots 201, 203, 205. Conductance slots 201, 203, 205 may be of the length shown in FIG. 7B, which may be the same, approximately the same, or different. Conductance slot lengths, or the total length of conductance slots, may be factors that determine the gas isolation rate associated with the pump compartment 200 or their half bays. Such parameters may be, for example, those disclosed above in connection with FIG. 6. A single pump compartment may be used in the coater to provide an acceptable gas isolation level between the process or coating compartments, if desired or desired. This pump compartment also corresponds to the length and gas isolation ratios previously disclosed around the pump compartment associated with FIG. 6.

According to another embodiment, the single pump compartment 250 shown in FIGS. 8A, 8B and 8C may be in contact with two coating compartments (not shown) as described above. The substrate to be coated (not shown) may pass through the pump compartment 250 through a gap or slot 266 associated with the sides of the pump compartment, as described above. The pump compartment 250 may also be located adjacent to two half bays, one half bay 252 which may be located adjacent to the coating compartment (not shown) and another coating compartment (not shown). Other half bays 254 may be included. Each half bay is provided with three turbo molecular pumps, which can be supported at the top of the half-bay to pump passages associated with pumping of adjacent coating compartments and passage of the substrate through the compartments, 256 may be mounted. Pumping of the coating compartments (not shown) and passage 262 may be accomplished through openings or slots 258, 260, respectively, as previously described. A suitable baffle ring 264 and a suitable baffle ring 265 are used in the pump compartment 250 so that the portions of the half bays of these compartments are individually pumped and the portions of the passageway Various conductance slots can be pumped individually. Merely by way of example, four turbo molecular pumps 256 may be used to pump adjacent coating compartments while the remaining two of turbo molecular pumps 256 are used to pump passageway 163.

In the above-described coater, a single pump compartment 250 can be used to provide adequate gas isolation with respect to three conductance slots (not shown). Conductance slots are configured in a manner similar to conductance slots 201, 203, and 205 of FIG. 7B as described above. Conductance slots may be the lengths shown in FIG. 7B, which may be the same, approximately the same, or different. The conductance slot lengths or the entire conductance slots may be factors that determine the gas isolation rate associated with the pump compartment 94 or their half bays. Such parameters may be, for example, those disclosed above in connection with FIG. 6. A single pump compartment may be used in the coater to provide an acceptable level of gas isolation between the process or coating compartments, if desired or as desired. This pump compartment also corresponds to the length and gas isolation ratios previously disclosed around the pump compartment associated with FIG. 6.

In connection with the apparatus disclosed and contemplated herein, pumps other than diffusion pumps and turbomolecular pumps, such as cryogenic pumps or other high vacuum pumps, may be provided and used suitably for pumping applications. It will be understood. Such any pump, alone or in combination with other pumps, such as, for example, about 10 ⁻³ Torr to about 10 ⁻⁷ Torr or about 10 ⁻⁸ Torr, such as about 10 ⁻⁴ Torr or less, or It may have a capacity suitable to achieve approximately high vacuum conditions of the target area, at a pressure associated with a molecular or transitional flow regime. In addition, it will be appreciated that any suitable combination and / or number of pumps may be used. By way of example only, in general, where a pump has a sufficiently small footprint and / or a sufficiently small or relatively non-cumbersome support condition, these multiple pumps may be more or less than a large number of pumps with a large footprint. It can be used around multiple pumps with somewhat burdensome support conditions. It will be appreciated that the pumps may be configured in connection with the pump compartment in any suitable manner and in any suitable location. For example, any suitable manner of mounting or support for any suitable pump or pumps may be used, such as through the top and / or bottom (if appropriate) and / or the end of the compartment and / or the like. It will be understood that it can. It will also be appreciated that any suitable pump or combination of pumps may be used in connection with the pumping of one or more coating compartments and / or in connection with the pumping of the substrate passageway.

It will be appreciated that any suitable form of baffling or internal plenum (s) may be used to differentiate portions of the compartments as and when required. A baffle comprising at least one baffle may be arranged to divide the compartment into separate sections. Individual pumping is associated with each of the individual sections. For example, in the embodiment of FIGS. 6-8, the full pump compartment is divided into four separate sections, each of which may have its own pumping arrangement. As shown, two sections are used for pumping process gas from adjacent compartments and two sections are used for pumping gas from a passage or conductance slots for gas isolation. One of the two gas isolation sections may be associated with or between two sets of two of the three conductance slots and the other may be associated with or reside in another set of two of the three conductance slots Can be. The length of the three conductance slots may be similar or different. Baffling may be used to associate a gas isolation section or stage with one of the sides or top of the coater, or generally any other suitable portion of the coater where pumping occurs. Baffling may be used to separate the process pumping section or stage from another process pumping section stage and / or gas isolation section or stage. Baffling can be used to isolate or seal one section or stage from another section or stage or less to reduce or minimize cross-talk or cross contamination between sections or stages. The baffle associated with the section or stage allows only about 5% or less of the intersection area of the openings for the pump associated with the section or stage to permit gas leakage or crosstalk. For example, if the pump slots associated with the pump stage or gas isolation stage have a total cross-sectional area of 600 square inches, then the gaps or openings of the baffle ring associated with the stage must have a total cross-sectional area of less than about 30 square inches do.

 According to an embodiment, the pumps of the apparatus are at least one diffusion pump for pumping gas from a passage associated with passage of the substrate through the pump compartment and a diffusion pump for pumping gas from at least one of the process compartments in contact with the pump compartment. At least one pump may include. The latter of these pumps can be, for example, turbomolecular pumps. By way of example only, at least two latter pumps may be used.

According to yet another embodiment, the pumps of the apparatus may comprise at least one pump in operative communication with the pump compartment via an end of the pump compartment. Such a pump may be used to pump gas from the bin as an example only. Also by way of example only, such a pump may comprise any suitable pump, such as a diffusion pump, a turbo molecular pump, or a cryopump. When one or more such pumps are used, the pumps may include any suitable pumps, such as, for example, diffusion pumps, turbomolecular pumps, cryogenic pumps, and / or any combination thereof.

According to yet another embodiment, the pumps of the apparatus may comprise at least one pump operatively coupled with the pump compartment through the top of the pump compartment. Such a pump may only be used to pump gas from at least one of the process compartments in contact with the pump compartment. Also, by way of example only, such a pump may comprise any suitable pump, such as, for example, a diffusion pump or a turbomolecular pump. If more than one such pump is used, the pumps may include any suitable pumps, such as, for example, diffusion pumps, turbomolecular pumps, mills, or any combination thereof. In just one example, at least two such pumps may be used.

According to yet another embodiment, the pumps of the apparatus include at least one diffusion pump operatively communicating with the pump compartment through the end of the pump compartment for pumping gas from the passageway associated with passage of the substrate through the pump compartment, and / It may comprise at least one turbomolecular pump in operative communication with the pump compartment through the top of the pump compartment for pumping gas from at least one of the process compartments in contact with the pump compartment. By way of example only, at least two of the latter turbomolecular pumps may be used to pump gas from the pump compartment (s). An example of such a pumping configuration is provided in FIG. 7.

According to yet another embodiment, the pumps of the apparatus pass through the pump compartment through the pump compartment to pump gas from the passageway associated with the passage of the substrate through the pump compartment, the process compartment in contact with the pump compartment and another process compartment in contact with the pump compartment. It may include turbomolecular pumps in operative communication with the pump compartment. An example of such a pumping configuration is provided in FIG. 8.

According to one embodiment, the pump compartment of the device separates another region of the pump compartment associated with the pumping gas from the region of the pump compartment associated with the pumping gas from the process compartment in contact with the pump compartment and from another process compartment in contact with the pump compartment At least one baffle may be included. According to yet another embodiment, the pump compartment of the apparatus includes a pump compartment associated with the pumping gas from the at least one process compartment in contact with the pump compartment and a region of the pump compartment associated with the pumping gas from the passageway associated with passage of the substrate through the pump compartment. It may include at least one baffle to separate another region of the. Examples of such pump compartments are provided in FIGS. 6-8.

Provided is a substrate coating apparatus through which a substrate passes. The apparatus includes a process or coating compartment sufficient for the substrate to pass through a path of length extending from the inlet to the outlet of the compartment. Such a process or coating compartment may sufficiently coat the substrate through a gas that may include the gas (es) of one or more components used in the coating process. The apparatus may include several such processes or coating compartments to coat the substrate in this manner and typically includes several such process or coating compartments. The gas used in one such compartment may be the same or different than that used in another such compartment. Such as any of the isolation pump compartments previously described in connection with Figures 6-8, can isolate the same or different gases used in different process compartments through appropriate pump compartments. The pump compartment is disposed between one process compartment and another process compartment and can sufficiently pass the substrate through a length of passage extending from the inlet to the outlet of the compartment. This passageway is operatively in communication with the path associated with the two process compartments such that the substrate can pass through all three compartments, as can be achieved through the rollers, as described above.

The pump compartment may be operatively in communication with each of the two process compartments as well as the passageway extending the length of the pump compartment, such that gas may be pumped from the compartments and the path via the pumps. Sufficient pumping can be accomplished using less than two full-size pump compartments, such as a full-size pump compartment, for example. In one example, when the process compartments are the same size, the previously described path lengths are the same and multiple pump compartments may be used having an overall path length less than twice the path length of one pump compartment or path compartment having a path length have. Further, by way of example only, when the process compartments and the pump compartment are of the same size, the path lengths and the passage lengths disclosed above are the same so that the pump compartments, or collectively, Pump compartments may be used. In addition, by way of example only, when the process compartments are of different sizes, a plurality of pump compartments may be used, which are two times shorter than the average length of the pump compartment, or collectively two process compartments.

Such a pump compartment or such pump compartments can almost fully isolate the gas used in one of the process compartments from the gas used in the other process compartments. Appropriate levels of gas isolation can vary from user to user and from process to process. Generally, an acceptable gas isolation level between two process compartments utilizing the same gas environment or similar compatible gas environments can be represented, for example, by a gas isolation ratio of from about 1: 1 to about 6: 1. In general, acceptable gas sequestration levels between different or incompatible gas environments are expressed, for example, in gas sequestration ratios of about 20 to 1 to about 35 to 1. The pump configurations disclosed or contemplated in the present invention are considered sufficient for a more optimal gas isolation rate that may be associated with further development, such as the development of more sensitive coatings. It is contemplated that a single such pump compartment is sufficient for proper gas isolation in a coating apparatus or coating process, but that at least one additional such pump compartment may be used. The use of a few or small pump compartments may be useful or desirable for a variety of reasons, such as, for example, reducing equipment footprint, reducing process time and complexity, reducing operating and configuration costs, and / or the like. The use of a larger number of pump compartments may only be useful or desirable, for example for redundancy or larger gas isolation capacity. The choice of how many pump compartments can be used in the coating system may involve finding an appropriate balance point with reference to the factors or other available considerations described above.

As mentioned above, any of the isolation pump compartments disclosed above in connection with FIGS. 6-8 or a pump compartment such as a plurality of such pump compartments is a gas used in one of the process compartments from a gas used in other process compartments. Is enough to isolate approximately. For convenience only, one such pump compartment is described which is considered sufficient for this approximate gas isolation. As disclosed in the present invention, this pump compartment, which is in contact with the two process compartments, has a gas pressure in one of at least about 20 to 1 process compartments in relation to the substrate coating process and a ratio of gas pressure in the other process compartments Is enough to provide. By way of example only, such ratios are considered to be about 20 to 1 or 25 to 1 to 35 to 1 or more. In the coating apparatus, this pump compartment abuts a series of process compartments on one or both sides of the pump compartment. By way of example only, such a series may include as many as about 60 process compartments, such as, for example, about 20 process compartments.

As disclosed above, one such pump compartment is considered sufficient to provide adequate gas isolation, but many such compartments may be used. When one or more such pump compartment (s) are used, the number of such pump compartments used to provide adequate gas isolation may be less than the number of pump compartments sufficient to provide such proper gas isolation, or provide adequate gas isolation The total path length used or the total length of these pump compartments may be less than the total path length or the total length of the pump compartments sufficient to provide such proper gas isolation. In one example, where two or three or four pump compartments of constant pump compartment length are used or required to provide acceptable gas isolation between coating compartments, respectively, in connection with FIGS. 6-8, respectively. As disclosed above, two or three or less than four isolation pump compartments of the same pump compartment length may be used instead. In addition, if two or more pump compartments, for example of total or total pump compartment length or path length, are used or required to provide acceptable gas isolation between the coating compartments, described above in connection with FIGS. 6-8. As such, one or more isolation pump compartments of less overall or total pump compartment length or passage length may be used instead. This can be a significant advantage in terms of cost, space, and the like described above.

According to an embodiment, the passage length of the pump compartment or the total or total passage length of the plurality of pump compartments is less than twice the average length of the two process compartments in contact with the pump compartment, or twice the length of the process compartment in contact with the pump compartment. to be. By way of example only, such passage length or total passage length may be greater than or equal to the approximate length of the process compartment in contact with the pump compartment or the approximate average length of two process compartments in contact with the pump compartment. Also just as an example, such passage length or total passage length may be greater than about 600 millimeters and less than about 2010 millimeters. Also by way of example only, such passage length or overall passage length may be, for example, from about 750 millimeters or about 850 millimeters to about 900 millimeters or about 1000 millimeters.

According to an embodiment, the gas passes through the substrate by providing pumping gas from the passageway and each of the process compartments in contact with the pump compartment via the pumps of the apparatus in connection with the apparatus disclosed or contemplated herein and the substrate coating process. Can be pumped from the substrate coating apparatus. According to this method, as described above, an appropriate gas isolation level can be achieved.

In order to evaluate a device comprising a pump compartment as disclosed or contemplated herein, a gas isolation assessment achieved between two coating or process compartments in contact with the pump compartment may be taken. By way of example only, this assessment may be achieved by generating a suitable vacuum condition in two coating compartments, such as, for example, a base pressure of about 8 × 10 ⁻⁶ Torr, a process pressure, such as about 3 × 10 ⁻ Performing a coating process comprising providing a process gas to one of the coating compartments ("compartment 1") to set a process pressure of ³ Torr, operating the pumps associated with the pump compartment, and the coating compartment Measuring the process gas in the other one ("compartment 2"). This assessment may involve previous processes, except that process gas is provided in compartment 2 and measured in compartment 1. From these measurements, the previously disclosed gas sequestration rates can be determined, and success or failure can be determined with reference to the gas sequestration rates suited for a given process or disclosed above. For example, gas isolation levels achieved using the apparatus disclosed or contemplated herein may be about the same or better than those achieved using the modular coater disclosed with reference to FIGS. 4 and 5.

One or both of the evaluations disclosed above may be performed without and / or with a substrate, such as a glass substrate. When evaluation is made in the presence of a substrate, the gas isolation ratio is based on the same evaluation performed in the absence of the substrate, since the presence of glass is expected to impede the flow of gas from one coating compartment to another coating compartment, eg For example, it is expected to be about 20% higher. Such an increase or suitable for a given process or device represents a successful process or device. Similar or similar evaluations are performed by using multiple substrates that pass through the coating compartments, where the substrates moving along the substrate pass line are separated by a gap of about 2 to 3 inches. Gas is believed to carry a given gas from one coating compartment to another. When this evaluation is performed, it is expected that a reduction in gas isolation rate of, for example, about 2% or less, based on the results achieved when the substrates are not separated by a gap, is expected. Such a reduction or suitable for a given process or device represents a successful process or device.

By evaluating the results obtained using different combinations of pumps, such as diffusion, turbo molecular type, cryogenic pumps and / or other high vacuum pumps, with respect to the isolated pump compartments or compartments, the performance, efficiency And / or costs can be optimized. This optimization

Pump capacity or speed, pump footprint, any pump downsides, such as oil or other contaminating potential, and gas backflow potential at process pressure (pressure ranges provided in these compartments may not be a problem in the isolation pump compartment Or any of the pump upsides associated with the cryogenic pump, such as any pump upsides, such as the relative lack of such contamination or the relative lack of such backflow, and / or the like, It may be accompanied. Such optimization may also achieve a proper balance of these and / or other related factors. For example, devices cannot accommodate diffusion pumps that impose a relatively large footprint of such pumps, so sacrifices in pumping capacity and cost must be allowed or accommodated in some manner. As another example, the apparatus is designed to use a few turbomolecular pumps that provide such pumps of relatively high cost, so that sacrifices to pump capacity must be allowed or accommodated in some manner. As another example, some turbomolecular pumps can be replaced with diffusion pumps, although there is a possibility of oil or other contamination, and the relatively high power requirements and relatively large footprint associated with the diffusion pumps are allowed or accepted in some manner. Should be.

Optimization of the coating process or apparatus may comprise the steps of constructing an apparatus with various pumps, such as, for example, any of the pumps disclosed herein, performing the coating process disclosed herein above, and the resulting gas isolation rate. Involves the steps to do so. Successful optimization entails, for example, seeking an acceptable balance between the factors and other factors that are disclosed or contemplated in the present invention. By way of example only, about 2 to about 3 or 4 turbomolecular pumps are disclosed or considered in the present invention (a lower number is desirable in terms of relatively high cost of turbomolecular pumps) which provides gas isolation results suitable for the process. It can be successfully used at the location of the diffusion pump in the coating process or apparatus that is being applied.

Optimization of the coating process or device may involve user suggested processes or operating parameters, such as, for example, gas flows and pressures and related calculations, such as calculations based on a selected device or process design, for example. Optimization may involve design and development testing and / or field testing. Measurements made in connection with optimization may involve varying parameters, such as, for example, the use of the gas flow (s) in the selected pumping configuration or the selected gas flow (s) in the various pumping configurations. Optimization may involve matching or exceeding the gas isolation rate associated with the system in which the user meets or exceeds the GAS isolation rate associated with the requirements or requirements or is provided.

Provided is a substrate coating apparatus through which a substrate passes. A gas pumping apparatus associated with a substrate coating process, such as an apparatus that can be used in combination with a substrate coating apparatus, is provided. Generally, such devices are operably communicatively coupled to another process compartment adjacent a second side of the pump compartment and a process compartment adjacent the first side of the pump compartment, for example, as shown and described in connection with Figures 6-8. It includes a pump compartment. The pump compartment includes a passage length passage for passage of the substrate through the pump compartment. The passage length is less than twice the length of either the average of adjacent process compartments or the length of adjacent process compartments. The apparatus also includes high vacuum pumps operatively associated with the pump compartment, for example, as shown and described with respect to Figures 6-8. The high vacuum pumps can substantially completely isolate the gas associated with another of the adjacent process compartments based on the gas associated with one of the adjacent process compartments and another associated with the substrate coating process. There is provided an associated method comprising providing a pumping gas from two adjacent process compartments and passages through pumps and an apparatus for pumping gas associated with the substrate coating process in connection with the substrate coating process.

As disclosed herein, the coating system may include a single pump compartment sufficient to provide an acceptable gas isolation level between the process or coating compartments as required or necessary. When used in a coater, such a single pump compartment may correspond to a gas isolation ratio of about 20 or more, such as about 35 to 1, for example. The equipment cost of the single pump compartment, the coater footprint, the configuration cost and effort, the operating time and effort and the coater complexity and / or the like, especially the large multi-module coaters, Preference is given with regard to those used to coat a substrate having five or more material layers, such as, for example, six to eight material layers, for which they are used or required. As disclosed herein, a variety of multi-module coaters can be used that include a configuration of three compartments or bays in which a single pump compartment abuts two coating compartments.

Various modifications, processes and numerous structures available for the present invention have been clarified. Various aspects, features, or embodiments have been described and described in connection with understanding, belief, theory, fundamental assumptions, and / or work or illustrative examples, but any particular understanding, belief, theory, fundamental assumptions, and / or work or illustration It will be understood that the examples are not limited. While various aspects and features have been disclosed in connection with various embodiments and specific examples of the invention, it is understood that the disclosure is not limited to any one with respect to the appended claims or the full scope of other claims that may be associated with the present application. Will be.

Claims (30)

A substrate coating apparatus through which a substrate passes, A first process compartment for coating the substrate with a first gas, the first process compartment being able to pass the substrate sufficiently through a first path of a first length extending from the inlet to the outlet of the first process compartment has exist - ; A second process compartment for coating the substrate through a second gas, the second process compartment being able to pass the substrate sufficiently through a second path of a second length extending from the inlet to the outlet of the second process compartment Wherein the first gas and the second gas are the same or different; And A pump compartment disposed between the first process compartment and the second process compartment Wherein the pump compartment is capable of fully passing the substrate through a passageway of passage length extending from an inlet to an outlet of the pump compartment and the passageway is operatively communicated with the first and second paths, , The pump compartment being operably communicated with the first process compartment, the second process compartment, and the passageway for pumping gases from pumps through pumps, Wherein the pump compartment further comprises a plurality of pump compartments, wherein the pump compartment is configured to pump the first gas and the second gas to each other relative to the substrate coating process when the passage length is less than twice the average of the first length, the second length, A substrate coating apparatus, wherein said second gas is almost sufficiently isolated. The method of claim 1, The substrate coating apparatus is capable of sufficiently providing a ratio of the pressure of the first gas in the first process compartment to the pressure of the first gas in the second process compartment of about 35 to 1 with respect to the substrate coating process Substrate coating device characterized in that. The method of claim 1, The substrate coating apparatus is capable of sufficiently providing a ratio of the pressure of the second gas in the second process compartment to the pressure of the second gas in the first process compartment of about 35 to 1 with respect to the substrate coating process Substrate coating device characterized in that. The method of claim 2 or 3, And the substrate coating apparatus provides a sufficient ratio of about 20 to 1 or more with respect to the substrate coating process. The method of claim 1, Wherein the substrate coating apparatus further comprises at least one additional first process compartment adjacent to the first process compartment and / or at least one additional second process compartment adjacent to the second process compartment. The method of claim 5, wherein Wherein the number of the first process compartment and the at least one additional first process compartment or the second process compartment and the at least one additional second process compartment is from about 20 to about 40 per pump compartment. . The method according to claim 1 or 5, Further comprising at least one additional pump compartment adjacent to the pump compartment wherein the number of pump compartments and the number of at least one additional pump compartment is greater than the number of the first gas and the second gas relative to each other Substrate coating apparatus, characterized in that it is less than the number of pump compartments sufficient to almost isolate. The method of claim 1, Wherein the pumps are selected from a diffusion pump, a turbo molecular pump, a cryogenic pump, any other high vacuum pump, and / or combinations thereof. The method of claim 1, The pumps include at least one diffusion pump for pumping gas from the passage and at least one pump for pumping gas from at least one of the first process compartment and the first process compartment and different from the diffusion pump. Substrate coating apparatus. The method of claim 1, The pumps comprising at least one diffusion pump for pumping gas from the passageway and at least one turbo molecular pump for pumping gas from at least one of the first process compartment and the second process compartment. Substrate coating apparatus. The method of claim 1, And the pumps include at least one end pump in operative communication with the pump compartment through an end of the pump compartment. The method of claim 11, wherein And the at least one end pump comprises a pump for pumping gas from the passageway. The method of claim 11, wherein Wherein the at least one end pump is selected from a diffusion pump, a turbo molecular pump, a cryogenic pump, any other high pumping pump, and / or any combination thereof. The method of claim 1, Wherein the pumps comprise at least one upper pump in operative communication with the pump compartment through an upper portion of the pump compartment. The method of claim 14, And said at least one upper pump comprises a pump for pumping gas from said first process compartment or said second process compartment. The method of claim 14, And the at least one upper pump comprises at least two upper pumps. The method of claim 14, Wherein each pump of said at least two upper pumps is independently selected from diffusion pumps, turbomolecular pumps, any other high vacuum pumps and / or any combination thereof. The method of claim 1, And said passage length is less than a passage length of a pumping compartment sufficient to substantially isolate said first gas and said second gas from one another in relation to said substrate coating process. The method of claim 1, And the passage length is less than twice the first length or the second length or less than twice the average of the first length and the second length. The method of claim 19, And the passage length is approximately the first length or approximately the second length or approximately the average of the first length and the second length or more. The method of claim 1, And the passage length is between about 600 millimeters and about 2010 millimeters. The method of claim 1, And the passage length is between about 750 millimeters and about 1000 millimeters. The method of claim 1, Further comprising at least one baffle separating an area of the pump compartment associated with the pumping gas from the first process compartment and another area of the pump compartment associated with pumping gas from the second process compartment. Substrate coating apparatus. The method of claim 1, Further comprising at least one baffle separating an area of the pump compartment associated with pumping gas from the passageway and another area of the pump compartment associated with gas pumping from the first process compartment and / or the second process compartment Substrate coating apparatus, characterized in that. The method of claim 1, The pumps are at least one diffusion pump operatively in communication with the pump compartment through an end of the pump compartment for pumping gas from the passageway, another end of the pump compartment for pumping gas from the pail. At least one turbomolecular pump in operative communication with the at least one, and at least in operative communication with the pump compartment through an upper portion of the pump compartment to pump gas from the first process compartment and the second process compartment. Substrate coating apparatus comprising a turbomolecular pump. The method of claim 1, The pumps include turbomolecular pumps operatively in communication with the pump compartment through an upper portion of the pump compartment to pump gas from the passageway, the first process compartment, and the second process compartment. Substrate coating apparatus. A method of pumping gas from a substrate coating apparatus through which a substrate passes, Providing the apparatus of claim 1; And Pumping gas from the passageway, the first process compartment, and the second process compartment through the pumps in connection with the substrate coating process Including, gas pumping method. The method of claim 27, And said pumping step substantially closes said first gas and said second gas from each other in relation to a substrate coating process. An apparatus for pumping gas associated with a substrate coating process, A pump compartment-the pump compartment is configured to be in operative communication with a first process compartment of a first length adjacent the first side of the pump compartment and a second process compartment of a second length adjacent the second side of the pump compartment; The pump compartment has a passage of a passage length for passing a substrate through the pump compartment, the passage length being two of the first length, the second length, or an average of the first length and the second length; Less than twice; And High vacuum pumps in operative communication with the pump compartment, wherein the high vacuum pumps are capable of bringing a first gas associated with the first process compartment and a second gas associated with the second process compartment to one another relative to the substrate coating process. Fully isolated- Comprising a gas pumping device. A method of pumping a gas associated with a substrate coating process, Providing the apparatus of claim 29; And Pumping gas from the passageway, the first process compartment, and the first process compartment through pumps associated with a substrate coating process Comprising a gas pumping method.

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